KR19980075593A - Carbon nitride (CxNy) thin film coating equipment - Google Patents

Abstract

A trigger electrode for generating an arc on the surface of the carbon ion source target metal attached to the cathode body and an arc control means for restraining the discharge arc by forming a magnetic field of the cylindrical electromagnet and the target metal provided at the outer periphery of the cathode body. A negative arc arc power source including a permanent magnet variably provided at the rear of the arc generating surface, a cylindrical vacuum chamber bent to receive the negative arc arc power source and a substrate disposed to face the arc arc power source, and to block the atmosphere; It includes a magnetic field filter surrounding the outer circumference of the chamber so that the carbon charged particles evaporated from the metal can be transferred to the substrate by the formation of a magnetic field, and the carbon ions emitted from the target metal and the nitrogen ions of the active gas injected into the chamber react. the carbon nitride (C _X N _Y) thin film magnetic filter using a cathodic arc discharge to be deposited on the substrate The carbon nitride thin-film coating apparatus is disclosed.

Description

Carbon Nitride (CXNY) Thin Film Coating Equipment

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a carbon nitride (C _X N _Y ) thin film coating apparatus. In particular, a plasma generated from a graphite target by a cathode arc discharge is moved to a base material by a magnetic field and deposited in a thin film state. It relates to a filter type carbon nitride thin film coating apparatus.

Carbon Nitride (hereinafter referred to as C _X N _Y ), which has recently emerged as a new surface coating layer coating material, is a nitride material having high hardness corresponding to the hardness of diamond and having better heat resistance than diamond. In order to provide special functions such as wear resistance, corrosion resistance, heat resistance and high hardness to base materials such as molds and tools, thin film coating by chemical vapor deposition (CVD) or physical vapor deposition (PVD) has been attempted.

Figure 1 shows an example of a conventional C _X N _Y thin film coating apparatus, a schematic cross-sectional view of a plasma enhanced CVD (Plasma Enhanced CVD) apparatus. In the illustrated C _X N _Y thin film coating apparatus, the substrate 1 is installed inside the vacuum chamber 10 in a vacuum state of 10 ⁻³ to several Torr, and the plasma connected to the vacuum chamber 10 is installed. A high frequency current is applied to the coil 21 wound around the outer periphery of the tube 20 and at the same time, high purity (99.9999%) of argon (Ar) and nitrogen gas (N ₂ ) are injected into the plasma tube 20. Generates. In addition, a negative voltage is applied to the substrate 1 and methane gas CH ₄ is introduced into the periphery of the substrate 1 through an active gas supply pipe 31 so that an activated gas is ionized in the plasma, thereby allowing the substrate to be ionized. It can be deposited in (1).

Although not shown, carbon ions are generated by sputtering from a high-purity (99.9999%) graphite target by a high frequency magnetron sputtering apparatus using physical vapor deposition, and at the same time, plasma is generated around the base metal using argon and nitrogen gas. There is also a sputtering method in which nitrogen ions and oxygen ions mixed in the plasma react to deposit a C _X N _Y thin film on the base material.

However, the conventional C _X N _Y thin film coating apparatus is not only deteriorate the quality of the coating film because the C _X N _Y thin film deposition is performed in a low vacuum state of 10 ^-3 to several Torr, the coating film is slow As a result, there is a problem in that the deposition efficiency is lowered. In addition, since the energy of the carbon particles (neutrons and ions) necessary for generating the C _X N _Y thin film is small, there is a problem in that a large amount of energy for C _X N _Y generation is required. Therefore, the synthesis of useful C _X N _Y coating film in the complete crystalline state is not well achieved yet.

The technical problem to be achieved by the present invention is to improve the problems of the conventional C _X N _Y deposition apparatus as described above, the present invention is to form a plasma generated from a graphite target by a cathode arc discharge by a magnetic field filter Magnetic field filter type C _X N _Y thin film coating apparatus using cathode arc discharge which improves the performance and deposition efficiency of C _X N _Y coating by moving to the base material along magnetic field lines and depositing as thin film through reaction with nitrogen gas. There is a purpose.

1 is a schematic cross-sectional view showing a conventional carbon nitride thin film coating apparatus,

Figure 2 is a schematic plan view showing a carbon nitride thin film coating apparatus according to the present invention,

3 is a schematic plan view showing an extract of the negative arc arc power source in FIG.

4 is a graph showing the voltage distribution around the carbon anode arc discharge power source in the carbon nitride thin film coating apparatus according to the present invention, and

5 is a schematic plan view showing a magnetic field distribution formed by the magnetic field filter of the carbon nitride thin film coating apparatus according to the present invention.

Explanation of symbols for main parts of the drawings

100 .. cathode arc discharge power supply 110. cathode body

120. Target metal 130. Trigger electrode

140.Electromagnet 150.Permanent magnet

160..Secondary Anode 161..Protrusion

`170..Active gas supply means 171. Donut type supply pipe

171a .. Pore 200 .. Chamber

201 substrate 240 chamber

300. Magnetic filter 310. First electromagnet

320..2 Electromagnet 330..3 Electromagnet

340..Fourth Electromagnet

Magnetic field filter type C _X N _Y thin film coating apparatus using a cathode arc discharge according to the present invention to achieve the above object, the target metal attached to the ion source cathode body and the trigger for generating an arc on the surface of the target metal A cathode arc discharge power source having an arc control means for constraining and controlling the discharge arc by forming an electrode and a magnetic field, a chamber for receiving the cathode arc discharge power source and a substrate disposed to be opposed thereto, and blocking the atmosphere from the target metal; In the magnetic field filter type C _X N _Y coating apparatus using a negative electrode arc discharge comprising a magnetic field filter installed to surround the outer peripheral portion of the chamber to move the charged particles evaporated in the substrate by the magnetic field formation, the chamber A first straight portion proximate the target metal and a second straight portion proximate the substrate, and a central portion of the first straight portion and the second straight portion Consists of a curved portion bent at an angle of 30 to 120 degrees formed in a tubular shape so that the opposite surface of the target metal and the substrate is blocked by the curved portion, the magnetic field filter is the outer peripheral portion of the first straight portion and the second straight portion of the chamber A ring-shaped first electromagnet and a second electromagnet disposed to wrap, a ring-shaped third electromagnet positioned around the curved portion of the chamber and installed to surround the outer periphery, and the curved portion between the first electromagnet and the third electromagnet It is characterized in that it comprises a fourth electromagnet provided on the outer side to interfere with the magnetic field formed by the first electromagnet and the third electromagnet.

In the magnetic field filter type C _X N _Y thin film coating apparatus using a cathode arc discharge according to the present invention, the chamber is formed by a plurality of non-magnetic protrusion plates extending from the inner wall in the direction of the central axis at regular intervals or Or it is preferable to have the baffles continuously formed spirally. The first electromagnet, the second electromagnet and the third electromagnet preferably include a flange member made of a magnetic material, a pipe member made of a nonmagnetic material coupled to the flange member, and a coil wound on the pipe member. In addition, the arc control means is a cylindrical electromagnet provided on the outer periphery of the cathode body to form a magnetic field, and a permanent magnet provided behind the arc generating surface of the target metal to interfere with the magnetic field formed by the electromagnet, and It is preferable to include an auxiliary anode body provided around the target metal to be located between the electromagnet and the permanent magnet to restrain the movement of the charged particles emitted from the surface of the target metal.

Hereinafter, a magnetic field filter type C _X N _Y thin film coating apparatus using a cathode arc discharge according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings.

Figure 2 is a magnetic filter type C _X N _Y as a schematic plan view showing show a thin-film coating apparatus, magnetic filter type C _X N _Y thin film coating apparatus using a cathodic arc discharge according to the present invention using a cathodic arc discharge according to the invention The negative electrode arc discharge power source 100 for generating carbon ion particles by the negative electrode arc discharge, and the negative electrode arc discharge power source 100 and the substrate 201 disposed so as to face the C _X N _Y thin film is coated It includes a chamber 200 for receiving and blocking the atmosphere and the magnetic field filter 300 is installed to surround the outer periphery of the chamber 200 to move the carbon ion particles to the substrate 201 by forming a magnetic field; It is composed.

FIG. 3 is an excerpt of the negative arc arc power source 100 of FIG. 2, wherein the target metal 120 is formed of carbon or graphite in solid state attached to the ion source cathode body 110, and the target metal ( And a triggering electrode 130 rotatably installed to generate an arc on the surface of the 120, and arc control means for restraining the discharge arc by forming a magnetic field.

The arc control means is provided on the outer periphery of the cathode body 110, the cylindrical electromagnet 140 to form a magnetic field, and the arc generation of the target metal 120 to interfere with the magnetic field formed by the electromagnet 140 The target to be positioned between the electromagnet 140 and the permanent magnet 150 in order to restrain the movement of the charged particles emitted from the surface of the target metal 120 and the permanent magnet 150 is provided behind the surface It comprises a secondary anode body 160 provided around the outer peripheral surface of the metal (120).

The permanent magnet 150 is variably installed in the cathode body 110 to move the position of the target metal 120 with respect to the arc generating surface. That is, the permanent magnet 150 is provided at the end of the coupling member 151 such as a bolt member detachably coupled to the cathode body 110, and the coupling member 151 is the cathode body ( The position coupled to the 110 is adjusted to allow the positional movement of the permanent magnet 150 with respect to the arc generating surface of the target metal 120.

The auxiliary cathode body 160 is a ring-shaped magnetic material, and has a protrusion 161 protruding in parallel or perpendicular to a line of magnetic force output from the electromagnet 140 and the permanent magnet 150. That is, the protrusion 161 is disposed at an angle of 0 to 90 degrees with respect to the magnetic force line output from the electromagnet 140 and the permanent magnet 150.

Meanwhile, the chamber 200 has a first straight portion 210 adjacent to the target metal 120 and a second straight portion 220 adjacent to the substrate 201 and the first straight portion 210. ) And the center portion of the second straight portion 220 has a curved portion 230 bent to form an angle between 30 and 120 degrees, the opposite surface of the target metal 120 and the substrate 201 is the curved portion ( It is formed into a tubular, preferably cylindrical, to be blocked by 230). In addition, the chamber 200 is provided with a plurality of plates made of nonmagnetic materials protruding from the inner wall surface of the chamber 200 at regular intervals, or a baffle 240 continuously formed in a spiral shape.

The magnetic field filter 300 is a ring-shaped first electromagnet 310 and the second electromagnet 320 are installed to surround the outer peripheral portion of the first linear portion 210 and the second linear portion 220 of the chamber 200, respectively. And a ring-shaped third electromagnet 330 disposed around the curved portion 230 of the chamber 200 to surround the outer circumferential portion, and between the first electromagnet 310 and the third electromagnet 330. It is configured to include a fourth electromagnet 340 provided on the outer bent portion of the curved portion 230 to interfere with the magnetic field formed by the first electromagnet 310 and the third electromagnet 330.

In the magnetic field filter 300 of the above configuration, the first electromagnet 310, the second electromagnet 320 and the third electromagnet 330 are made of a flange member made of a magnetic material, and a nonmagnetic material coupled to the flange member. It is preferable to include a coil wound on the pipe member.

Reference numeral 111 is an arc power source for supplying an arc generating current to the cathode body (110). In addition, 141 denotes a magnetic field power source for applying a magnetic field current to the electromagnet 140, and applies an alternating current waveform such as a sine wave or a triangular wave whose current is changed over time. 170 is an active gas supply means for supplying an active gas to react with the charged particles emitted from the surface of the target metal 120, it is disposed around the edge of the target metal 120 as shown in EH 3 A donut type exhaust pipe 171 having a plurality of pores 171a is provided. In addition, the opening direction of the pores 171a is adjustable to have a gas injection angle of 0 degrees to 180 degrees with respect to the arc generating surface of the target metal 120. 301 is a magnetic field filter power supply for supplying current to each electromagnet of the magnetic field filter, and 400 is a bias power source connected to the substrate 201. In addition, 500 is a vacuum source for making the interior of the chamber 200 into a vacuum state, and 501 is a duct installed to be connected to the vacuum source 500 and the substrate 201 is accommodated.

According to the magnetic field filter type C _X N _Y thin film coating apparatus using the negative electrode arc discharge according to the present invention having the configuration as described above, the negative electrode body 110 and the target metal 120 from the arc power source 111 A voltage (0 to -100V) is applied, and the trigger electrode 130 instantaneously comes into contact with the surface of the target metal 120 to fall off and at the same time an arc is generated. The arc moves in a spot or ring shape on the surface of the target metal 120 under the influence of the magnetic field formed by the electromagnet 140 and the permanent magnet 150. As a result, carbon charged particles (electrons, carbon ions, carbon particles) are released from the surface of the target metal 120. At this time, the carbon charged particles form a voltage hill on the surface of the target metal 120 with a voltage distribution as shown in FIG. When the active gas (N ₂ , Ar, CH ₄ ) is supplied to the voltage hill portion through the pores 171a of the exhaust pipe 171 of the active gas supply means 170, the active gas is partially ionized to target metal 120. Along with the charged particles generated in FIG. 5, they are moved toward the substrate 201 along a magnetic force line having a distribution as shown in FIG. 5. In this case, the neutral particles and the neutral microparticles are ionized again by the frequent collision of electrons and ions, and are deposited on the substrate 201, and a part of the neutral particles is adsorbed on the baffle 240 while moving.

A bias voltage of 0 to -1,000 V is applied to the substrate 201, whereby charged particles moving along the magnetic field lines are accelerated and deposited by hitting the substrate 201 with more energy, which is partially neutral nitrogen gas. And carbon particles are also ionized by the discharge in the vicinity of the substrate 201 and deposited on the substrate 201.

According to the magnetic field filter type C _X N _Y coating apparatus using the cathode arc discharge according to the present invention as described above, the synthetic energy required to form a C _X N _Y thin film on the substrate 201, carbon or graphite target metal (120) Carbon ions and nitrogen ions can be obtained as particle energy in the voltage hill formed at the surface portion of the c), and can be obtained as acceleration energy of the charged particles by the bias voltage applied to the substrate 201. Therefore, since high energy ions collide with the substrate and are deposited, an excellent crystalline C _X N _Y coating film can be obtained.

On the other hand, in the negative arc arc power source 100, the magnetic field distribution formed by the electromagnet 140 and the permanent magnet 150 by applying an alternating current waveform such as a sine wave or a triangular wave to the electromagnet 140 By continuously changing in various forms, the discharge arc can stably move evenly over the entire surface of the target metal 120 to uniformly evaporate the carbon charged particles. Charged particles emitted from the target metal 120 by the magnetic field change of the electromagnet 140 and the permanent magnet 150 is moved to the substrate 201 while repeatedly focused and diverged along the magnetic force line, the electromagnet 140 And the protrusion 161 of the auxiliary cathode body 160 to have an angle between 0 and 90 degrees with respect to the magnetic force line output from the permanent magnet 150 to prevent the discharge of charged particles by the protrusion 161. can do.

In the magnetic field filter 300, the fourth electromagnet 340 is a magnetic force line formed by the first electromagnet 310, the second electromagnet 320, and the third electromagnet 330. In the curved portion 230 of the interference with the deviation to the outside of the center line is moved to the center line side. Therefore, the magnetic force line is flexibly bent along the curved portion 230 of the chamber 200, so that the transport of charged particles is made stable.

As described above, the magnetic field filter type C _X N _Y thin film coating apparatus using the cathode arc discharge according to the present invention is capable of depositing C _X N _Y thin films in a high vacuum state of 10 ^-4 Torr or more, thereby providing high quality C. _X N _Y thin film can be produced. In addition, Because of the high amount of current of the ion emitted from the cathode arc discharge source it is high per unit area C _X N _Y coated foil generation efficiency of the substrate, in particular by adjusting the magnetic field distribution around the ion outlet in the vicinity of the substrate to a magnetic field filter C _X N _Y Since the deposition area of the coating film can be appropriately adjusted, the C _X N _Y coating efficiency can be improved.

Claims (14)

A negative electrode arc discharge power source having a target metal attached to an ion source cathode, a trigger electrode for generating an arc on the surface of the target metal, and an arc control means for constraining the discharge arc by forming a magnetic field; A vacuum chamber for receiving a discharge source and a substrate disposed to face the discharge source and blocking the atmosphere, and a magnetic field installed to surround an outer circumference of the chamber so that charged particles evaporated from the target metal can be moved to the substrate by forming a magnetic field. In the magnetic field filter type carbon-nitride (C _X N _Y ) thin film coating apparatus using a cathode arc discharge including a filter, The chamber has a first straight portion proximate to the target metal and a second straight portion proximate to the substrate, wherein the center portion of the first straight portion and the second straight portion includes a curved portion bent at an angle of 30 to 120 degrees. And the opposite surface of the substrate is formed in a tubular shape so as to be blocked by the curved portion, The magnetic field filter may include a ring-shaped first electromagnet and a second electromagnet installed to surround the outer circumferential portions of the first linear portion and the second linear portion of the chamber, and a ring-shaped circumferential portion positioned around the curved portion of the chamber. And a third electromagnet, and a fourth electromagnet provided at an outer side of the curved portion between the first electromagnet and the third electromagnet to interfere with a magnetic field formed by the first electromagnet and the third electromagnet. Magnetic field filter carbon-nitride (C _X N _Y ) thin film coating apparatus using. The method of claim 1, The chamber includes a magnetic field filter-type carbon-nitride (C _X N _Y ) using a cathode arc discharge, characterized in that the baffle is formed by a plurality of protruding plates extending from the inner wall in the direction of the central axis at a predetermined interval. Thin film coating equipment. The method of claim 1, The chamber is a magnetic field filter-type carbon-nitride (C _X N _Y ) thin film coating apparatus using a cathode arc discharge, characterized in that the protruding plate extending in the direction of the center axis from the inner wall comprises a spiral baffle . The method according to claim 2 or 3, The projecting plate is a magnetic field filter type carbon-nitride (C _X N _Y ) thin film coating apparatus using a negative electrode arc discharge, characterized in that the nonmagnetic material. The method of claim 1, The first electromagnet, the second electromagnet and the third electromagnet include a flange member made of a magnetic material, a pipe member made of a nonmagnetic material coupled to the flange member, and a cathode wound to the pipe member. Magnetic field filter type carbon-nitride (C _X N _Y ) thin film coating apparatus using electric discharge. The method of claim 1, wherein the arc control means, A cylindrical electromagnet provided at the outer periphery of the cathode to form a magnetic field, a permanent magnet provided behind the arc generating surface of the target metal to interfere with the magnetic field formed by the electromagnet, and emitted from the surface of the target metal; Magnetic filter-type carbon-nitride using a negative electrode arc discharge, characterized in that it comprises a secondary anode body provided around the target metal to be located between the electromagnet and the permanent magnet to restrain the movement of the charged particles (C _X N _Y ) Thin Film Coating Equipment. The method of claim 6, The permanent magnet is a magnetic field filter type carbon-nitride (C _X N _Y ) thin film coating using a negative electrode arc discharge, characterized in that it is installed variably on the negative electrode body to be able to move the position relative to the arc generating surface of the target metal Device. The method of claim 6, Magnetic field filter-type carbon-nitride (C _X N _Y ) thin film coating apparatus using a cathode arc discharge, characterized in that the magnetic field distribution is continuously changed by applying an alternating current waveform to the electromagnet. The method of claim 6, The auxiliary anode body is a magnetic field filter-type carbon-nitride using a negative electrode arc discharge, characterized in that the ring-shaped magnetic body having a protrusion disposed at an angle between 0 and 90 degrees with respect to the magnetic force line output from the electromagnet and the permanent magnet ( C _X N _Y ) Thin Film Coating Equipment. The method of claim 1, The target metal is a magnetic field filter-type carbon-nitride (C _X N _Y ) thin film coating apparatus using a negative electrode arc discharge, characterized in that any one of carbon or graphite is formed in a solid state. The method of claim 1, Magnetic filter-type carbon-nitride using a negative electrode arc discharge (C _X N _Y ) comprising an active gas supply means for supplying an active gas to react with the arc discharge ions around the arc generating surface of the target metal Thin film coating equipment. The method of claim 11, The active gas supply means is a magnetic field filter-type carbon-nitride (C _X N _Y ) thin film using a cathode arc discharge, characterized in that it comprises a donut-type exhaust pipe having a plurality of pores disposed around the edge of the target metal Coating equipment. The method of claim 12, The pores are magnetic filter-type carbon-nitride (C _X N _Y ) thin film coating apparatus using a cathode arc discharge, characterized in that the opening to have a gas injection angle of 0 to 180 degrees with respect to the arc generating surface of the target metal . The method of claim 1, Magnetic field filter-type carbon-nitride (C _X N _Y ) thin film coating apparatus using an active gas supply means for supplying an active gas for supplying the active gas reacts with the arc discharge ions around the substrate.