KR19980067352U - 화학기상증착장비용 써멀 퍼니스 튜브(Thermal Furnace Tube)의 공정가스 유입관 - Google Patents
화학기상증착장비용 써멀 퍼니스 튜브(Thermal Furnace Tube)의 공정가스 유입관 Download PDFInfo
- Publication number
- KR19980067352U KR19980067352U KR2019970011914U KR19970011914U KR19980067352U KR 19980067352 U KR19980067352 U KR 19980067352U KR 2019970011914 U KR2019970011914 U KR 2019970011914U KR 19970011914 U KR19970011914 U KR 19970011914U KR 19980067352 U KR19980067352 U KR 19980067352U
- Authority
- KR
- South Korea
- Prior art keywords
- process gas
- tube
- gas inlet
- inlet pipe
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45578—Elongated nozzles, tubes with holes
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (2)
- 튜브에 설치된 공정가스 유입관을 상기 튜브내로 연장하여서 됨을 특징으로하는 화학기상증착장비용 써멀 퍼니스 튜브(Thermal Furnace Tube)의 공정가스 유입관.
- 제 1 항에 있어서,상기 공정가스 유입관은 튜브내에서 공정가스의 토출구쪽으로 갈수록 나선의 내경이 좁아지는 코일형태를 이루도록 함을 특징으로하는 화학기상증착장비용 써멀 퍼니스 튜브(Thermal Furnace Tube)의 공정가스 유입관.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019970011914U KR200165744Y1 (ko) | 1997-05-26 | 1997-05-26 | 화학기상증착장비용 써멀 퍼니스 튜브(Thurmal Furnace Tube)의 공정가스 유입관 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019970011914U KR200165744Y1 (ko) | 1997-05-26 | 1997-05-26 | 화학기상증착장비용 써멀 퍼니스 튜브(Thurmal Furnace Tube)의 공정가스 유입관 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19980067352U true KR19980067352U (ko) | 1998-12-05 |
KR200165744Y1 KR200165744Y1 (ko) | 2000-01-15 |
Family
ID=19501643
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019970011914U Expired - Lifetime KR200165744Y1 (ko) | 1997-05-26 | 1997-05-26 | 화학기상증착장비용 써멀 퍼니스 튜브(Thurmal Furnace Tube)의 공정가스 유입관 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR200165744Y1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150077721A (ko) * | 2013-12-30 | 2015-07-08 | 세메스 주식회사 | 유체 공급 장치 및 이를 포함하는 기판 처리 장치 |
-
1997
- 1997-05-26 KR KR2019970011914U patent/KR200165744Y1/ko not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150077721A (ko) * | 2013-12-30 | 2015-07-08 | 세메스 주식회사 | 유체 공급 장치 및 이를 포함하는 기판 처리 장치 |
Also Published As
Publication number | Publication date |
---|---|
KR200165744Y1 (ko) | 2000-01-15 |
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UA0108 | Application for utility model registration |
Comment text: Application for Utility Model Registration Patent event code: UA01011R08D Patent event date: 19970526 |
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UA0201 | Request for examination |
Patent event date: 19970526 Patent event code: UA02012R01D Comment text: Request for Examination of Application |
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Patent event date: 19990928 Comment text: Decision to Grant Registration Patent event code: UE07011S01D |
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