KR19980055050A - Filter analysis device for semiconductor device manufacturing - Google Patents

Abstract

The present invention relates to a filter analysis device for semiconductor device manufacturing for analyzing the particles attached to the filter used in the semiconductor device manufacturing process.

The present invention is a filter analysis device for manufacturing a semiconductor device configured to be supplied to the first condensation nucleus counter that can count the number of particles of a specific size or more after the filtered high-purity gas passing through the plurality of filters through the analysis filter. The method according to claim 1, wherein a first branch line is formed between the analysis filter and the first condensation nucleus counter to connect a second condensation nucleus counter capable of counting the number of particles having a specific size or less. 1 Another second branch line is formed between the condensation nucleus counter and the particle collecting device is connected.

Therefore, there is an effect of evaluating the distribution of the particles outgassed in the analysis filter and the size, shape, composition, and the like of the particles.

Description

Filter analysis device for semiconductor device manufacturing

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a filter analysis device for semiconductor device manufacturing, and more particularly, to a filter analysis device for semiconductor device manufacturing for analyzing particles attached to a filter used in a semiconductor device manufacturing process.

Generally, more than 40 kinds of gases having properties such as reactivity, corrosiveness, and toxicity are used in the semiconductor device manufacturing process. These gases are also used as process gases used directly in the semiconductor device manufacturing process and as auxiliary gases to maintain the process environment. It is also used as a carrier gas to move the process gas to the process chamber where the process proceeds.

The gas used for the above-mentioned purposes is passed through the filter for removing impurities, and then supplied to the process chamber and impurities are adsorbed on the filter, which may cause process defects. I'm going.

1 is a block diagram for explaining a conventional filter analysis apparatus for manufacturing semiconductor devices.

Referring to FIG. 1, a gas supply source 10 for supplying high purity gas, a first filter 12 through which a filtering process is performed, a regulator regulating pressure of a gas passing through, and a pressure of gas passing through The first pressure gauge 16 and the three-way valve 18 to be measured are connected.

Then, the three-way valve 18 and the first flow meter 20 for measuring the amount of gas passing through are connected, and the first flow meter 20 and the second pressure gauge 24 are connected. In addition, a branch line is connected to the three-way ball 18 and is merged between the first flow meter 20 and the second pressure gauge 24 and the second flow meter 22 is installed.

The second pressure gauge 24 and the second filter 26 are connected to each other, and the second filter 26 is connected to the pneumatic valve 28 which automatically opens and closes according to a set state.

In addition, the pneumatic valve 28, the third filter 30, the analysis filter 32 and a condensation nucleus counter (Concentration Nuclear Counter: 34) capable of counting the number of particles of a predetermined size or more are sequentially connected. It is.

Therefore, the high-purity gas supplied from the gas supply source 10 passes through the first filter 12 and undergoes a first filtering process in which impurities contained in the gas are removed. The gas then passes through the regulator 14 and the pressure is adjusted, then through the first pressure gauge 16 and the pressure is measured.

Next, after the gas passes through the three-way valve 18, the gas passes through the first flow meter 20 or the second flow meter 22 and the amount of gas is measured, and then the second pressure gauge 24 is turned on. The pressure of the gas passing through and passing back is measured.

Subsequently, the gas passes through the second filter 26 and after the secondary filtering process, the gas passes through the pneumatic valve 28 which automatically opens and closes, and then passes through the third filter 30 again. A final filtering process is performed in which impurities generated in devices such as the pressure gauges 16 and 24 and the regulator 14 are removed.

Subsequently, the gas passes through the analysis filter 32 and is mixed with various kinds of impurities adsorbed inside the filter 32 and supplied to the condensation nucleus counter 34 to filter the number of particles having a predetermined size or more. The performance of 32 is evaluated.

However, since only a condensation nucleus counter capable of counting particles of a specific size or more is installed in the filter analyzer, the number of particles having a predetermined size or less cannot be measured, and thus, the performance of the filter cannot be efficiently evaluated.

In addition, since the particle collecting device is not installed and the shape and composition of the particles removed from the analysis filter cannot be analyzed, the particles counted in the condensation nucleus counter are generated from the filter itself or other parts of the gas supply system. There was a problem that the source and cause of particle generation could not be assessed because it could not be identified whether the particles are due to contamination from the surrounding environment due to leakage of raw material gas or gas supply system.

SUMMARY OF THE INVENTION An object of the present invention is to provide a filter analysis device for manufacturing a semiconductor device capable of evaluating the size distribution of particles adsorbed on a filter used in a semiconductor device manufacturing process.

Another object of the present invention is to provide a filter analysis device for manufacturing a semiconductor device capable of evaluating the shape and composition of particles adsorbed on a filter used in a semiconductor device manufacturing process and evaluating the source of the particles.

1 is a block diagram for explaining a conventional filter analysis apparatus for manufacturing semiconductor devices.

Figure 2 is a block diagram for explaining an embodiment of a filter analysis device for manufacturing a semiconductor device according to the present invention.

Explanation of symbols on the main parts of the drawings

10, 40: gas supply source 12, 42: first filter

14, 44 regulator 16 first pressure gauge

18: three-way valve 20, 50: the first flow meter

22, 56: 2nd flow meter 24: 2nd pressure gauge

26, 54: second filter 28: pneumatic valve

30: third filter 32, 60: analysis filter

34: condensation nucleus counter 46: pressure gauge

48: electromagnetic air valve 52: bending tube

58: third filter 62: particle collecting device

64: constant velocity sampler 66: check valve

68: first condensation nucleus counter 70: second condensation nucleus counter

In order to achieve the above object, a filter analysis device for fabricating a semiconductor device according to the present invention includes a material capable of counting the number of particles having a specific size or more after the filtered high-purity gas passes through a plurality of filters and passes through an analysis filter. 1. A filter analysis device for fabricating a semiconductor device configured to be supplied to a condensation nucleus counter, the filter analysis device comprising: forming a first branch line between the analysis filter and the first condensation nucleus counter and counting the number of particles having a specific size or less; The condensation nucleus counter is connected, and another second branch line is formed between the analysis filter and the first condensation nucleus counter to connect the particle collecting device.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

Figure 2 is a block diagram for explaining an embodiment of a filter analysis device for manufacturing a semiconductor device according to the present invention.

Referring to FIG. 2, a gas supply source 40 for supplying high purity gas, a first filter 42 through which a filtering process is performed, a regulator 44 for adjusting a pressure of a gas passing through, and a pressure of a gas passing therethrough are measured. Pressure gauges 46 are sequentially connected.

In addition, the pressure gauge 46 and the opening and closing operation is performed so that a predetermined amount of gas can pass through a predetermined time, and an electronic air valve (Electronics grade pneumatic valve: 48) having three ports is connected.

One port of the electromagnetic air valve 48 is connected to the first flow meter 50, the flexible tube (52) having a corrugation therein, and the second filter 54 in order, and the other port After the second flow meter 56, the third filter 58, and the analysis filter 60 are connected, they are connected to the second filter 54.

In addition, an isokinetic sampler (64) is formed in which a first branch line (61) branching from a line connecting the analysis filter (60) and the second filter (54) is allowed to pass at a constant velocity. ) Is connected, and the first condensation nucleus counter 68 and the number of particles below a certain size can be counted in parallel with the constant velocity sampler 64 and the first condensation nucleus counter 68 can count the number of particles above a certain size. The second condensation nucleus counter 70 is connected.

In addition, a particle collecting device 62 for collecting impurities contained in the supplied gas is formed by forming a second branching line 63 branching from the line connecting the analysis filter 60 and the second filter 54. It is.

Therefore, the gas supplied from the gas supply source 40 passes through the first filter 42 and the filtering process proceeds, passes through the regulator 44 again, the pressure of the gas is adjusted, and passes through the pressure gauge 46. After the pressure of the gas passing through is measured, it is supplied to the electromagnetic air valve 48.

The predetermined amount of gas supplied to the electromagnetic air valve 48 passes through the bending tube 52 after the amount of gas passing through the first flow meter 50 is measured. At this time, a certain amount of impurities contained in the gas is adsorbed on the inner wall of the bending tube 52. The gas passing through the valley tube 52 passes through the second filter 54 and the filtering process proceeds. The other predetermined amount of gas passing through the electromagnetic air valve 48 passes through the second flow meter 56. The amount is measured, and again passes through the third filter 58, the filtering process proceeds, and again passes through the analysis filter 60 and outgassing the impurities adsorbed inside the analysis filter 60.

Therefore, the gas passing through the second filter 54 and the gas passing through the analysis filter 60 are mixed with each other and supplied to the particle collecting device 62 or pass through the constant velocity sampler 64.

The gas passing through the constant velocity sampler 64 is supplied to the first condensation nucleus collector 68 and the second condensation nucleus collector 70. The number of particles having a predetermined size or more is counted inside the first condensation nucleus counter 68, and the number of particles having a predetermined size or less is counted inside the second condensation nucleus counter 70. The particles collected by the particle collecting device 62 are analyzed by analyzing the shape, size, components, etc. of the particles in an analysis facility such as an electron microscope.

In addition, after the direction of the analysis filter 60 is positioned in the reverse direction, the above-described analysis process is performed.

Accordingly, after placing the analysis filter 60 in the forward direction, the number of particles counted in the condensation nucleus counter and the analysis filter 60 in the reverse direction, and compares the number of particles counted in the condensation nucleus counter By judging, it is possible to determine the contamination of the filter by the contamination source in front of the analysis filter 60 and the contamination of the filter by the contamination source in the rear of the analysis filter 60 in the process facility.

Therefore, according to the present invention, it is possible to evaluate the distribution of the particles outgassed in the analytical filter using two condensation nucleus counters capable of counting the number of particles larger than or equal to a specific size and smaller than a specific size.

In addition, by analyzing the particles collected by the particle collecting device by using an electron microscope, the particle generation source can be inferred by evaluating the shape, size and composition of the particles.

In addition, it is possible to improve the reliability of the analysis results of the analysis process by performing the analysis process by placing the analysis filter in the forward and reverse directions.

Although the present invention has been described in detail only with respect to the described embodiments, it will be apparent to those skilled in the art that various modifications and variations are possible within the technical scope of the present invention, and such modifications and modifications are within the scope of the appended claims.

Claims (1)

In the filter analysis device for manufacturing a semiconductor device configured to be supplied to the first condensation nucleus counter that can count the number of particles of a specific size or more after the filtered high-purity gas passing through a plurality of filters through the analysis filter, A first branch line is formed between the analysis filter and the first condensation nucleus counter to connect a second condensation nucleus counter capable of counting the number of particles having a specific size or less, and the analysis filter and the first condensation nucleus. A filter analysis device for manufacturing a semiconductor device, which is formed by connecting another particle collecting device by forming another second branch line between counters.