KR19980051207A - Aluminum silicon dioxide composite plated steel sheet with excellent gloss and corrosion resistance and manufacturing method - Google Patents

Aluminum silicon dioxide composite plated steel sheet with excellent gloss and corrosion resistance and manufacturing method Download PDF

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KR19980051207A
KR19980051207A KR1019960070081A KR19960070081A KR19980051207A KR 19980051207 A KR19980051207 A KR 19980051207A KR 1019960070081 A KR1019960070081 A KR 1019960070081A KR 19960070081 A KR19960070081 A KR 19960070081A KR 19980051207 A KR19980051207 A KR 19980051207A
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silicon dioxide
steel sheet
aluminum
corrosion resistance
plated steel
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KR100276336B1 (en
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전재호
정진호
전중환
신정철
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김종진
포항종합제철 주식회사
신창식
재단법인 포항산업과학연구원
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0688Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
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Abstract

본 발명은 전자빔 진공증착방법을 이용한 도금강판 및 그 제조방법에 관한 것이며, 그 목적은 알루미늄과 이산화실리콘을 동시에 복합적으로 도금한 광택도와 내식성이 우수한 복합도금강판 및 그 제조방법을 제공함에 있다.The present invention relates to a plated steel sheet using an electron beam vacuum deposition method and a method for manufacturing the same, and an object thereof is to provide a composite plated steel sheet excellent in gloss and corrosion resistance of a plated aluminum and silicon dioxide at the same time and a method for producing the same.

상기 목적을 달성하기 위하여 본 발명은 1-10중량%의 이산화실리콘을 함유하는 알루미늄-이산화실리콘 증착도금층이 강판평면당 2g/㎡ 이상의 부착량으로 형성되는 광택도와 내식성이 우수한 알루미늄-이산화실리콘 복합도금강판과 전자빔을 이용한 진공증착에 의해 복합도금강판을 제조하는 방법에 있어서, 소지강판을 100-350℃ 범위로 가열한 다음,1-10중량%의 이산화실리콘을 함유하는 알루미늄-이산화실리콘을 상기 강판 편면당 2g/㎡ 이상의 부착량으로 진공증착 하는 광택도와 내식성이 우수한 알루미늄-이산화실리콘 복합도금강판 제조방법에 관한 것을 그 기술적 요지로 한다.In order to achieve the above object, the present invention is an aluminum-silicon dioxide composite plated steel sheet having excellent gloss and corrosion resistance, in which an aluminum-silicon dioxide deposition plating layer containing 1-10% by weight of silicon dioxide is formed with an adhesion amount of 2 g / m 2 or more per steel sheet plane. In the method for producing a composite plated steel sheet by vacuum deposition using an electron beam, heating the base steel sheet in the range of 100-350 ℃, and then the aluminum-silicon dioxide containing 1-10% by weight of silicon dioxide The technical gist of the present invention relates to a method for producing an aluminum-silicon dioxide composite plated steel sheet having excellent glossiness and corrosion resistance by vacuum deposition at an adhesion amount of not less than 2 g / m 2.

Description

광택도와 내식성이 우수한 알루미늄-이산화실리콘 복합도금강판 및 그 제조방법Aluminum-silicon dioxide composite plated steel sheet with excellent gloss and corrosion resistance and manufacturing method

본 발명은 전자빔 진공증착방법을 이용한 도금강판 및 그 제조방법에 관한 것으로써, 보다 상세하게는 알루미늄(Al)과 이산화실리콘(SiO2)을 동시에 복합적으로 도금한 광택도와 내식성이 우수한 복합도금강판 및 그 제조방법에 관한 것이다.The present invention relates to a plated steel sheet using an electron beam vacuum deposition method and a method for manufacturing the same, and more particularly, a composite plated steel sheet having excellent gloss and corrosion resistance in which aluminum (Al) and silicon dioxide (SiO 2 ) are plated at the same time. It relates to a manufacturing method.

통상, 자동차외판용 및 가전 건재에 사용되고 있는 전기도금강판 및 용융도금강판은 수요가의 품질특성 요구에 따라 내식성, 도장성, 용접성 및 광택도 등의 우수한 표면외관 특성이 요구된다.In general, electroplated steel sheets and hot-dip galvanized steel sheets used in automobile exteriors and home appliances are required to have excellent surface appearance characteristics such as corrosion resistance, paintability, weldability, and glossiness according to demand quality characteristics.

종래, 이러한 특성을 향상시키기 위한 여러 가지 방법들이 개발되었는데, 이중 내식성 및 광택도를 증가시키기 위한 대표적인 방법으로 아연도금 용액중에 여러 가지 다른 금속이온이나 산화물 이온을 분산시켜 동시에 도금하는 분산도금방법이 일본 공개특허공보 (소)64-62498 호 및 (평)1-129998 호 등에 제시된 바 있다.Conventionally, various methods have been developed to improve such characteristics. A representative method for increasing the corrosion resistance and glossiness is a dispersion plating method in which various other metal ions or oxide ions are simultaneously plated in a zinc plating solution in Japan. It is disclosed in Japanese Patent Application Laid-Open Nos. (S) 64-62498 and (Pyeong) 1-129998 and the like.

상기 제안은 전기도금법으로 아연을 도금하는데 있어, 도금용액중에 Al2O3, SiO2, TiO2등의 산화물을 분산시킨 후, 도금하는 분산도금방법으로서, 상기 제안된 아연도금 강판은 기존의 아연도금강판이나 아연-니켈 합금도금 강판 보다 내식성 등의 품질특성이 우수하며, NO3이온 등의 첨가로 도금강판의 광택도가 증가되는 특징이 있다. 그러나, 상기 제안된 분산도금법으로 도금강판을 제조하여 생산하기에는 몇가지 문제점이 있다. 우선, 도금용액속에 분산되어 있는 분산제의 응집을 막기 위하여 도금용액 용기인 탱크를 초음파로 처리하기 위한 별도의 탱크 시스템이 필요하다. 그리고 분산제는 0℃이하의 대기 중에서 장기간 노출을 하면 안정한 분산제가 유백색의 겔(gel)상태로 석출하는 경향이 있어, 분산제를 관리하기에 어려움이 있다. 또한 도금층내에 분산제의 균일한 석출을 위하여 도금용액의 농도 및 pH 를정밀하게 관리하여야 한다. 또한 분산도금법은 습식에서 도금을 실시하기 때문에 작업환경이 열악하고, 환경공해문제를 일으키기 쉬우며, 도금용액의 폐수처리를 위한 설비가 별도가 필요하게 된다.In the above-mentioned proposal, in the plating of zinc by the electroplating method, a dispersion plating method in which an oxide, such as Al 2 O 3 , SiO 2 , TiO 2 , is plated in a plating solution and then plated, is used. It is excellent in quality characteristics such as corrosion resistance than plated steel sheet or zinc-nickel alloy plated steel sheet, and has the characteristic that the glossiness of plated steel sheet is increased by the addition of NO 3 ions. However, there are some problems in producing and producing a plated steel sheet by the proposed dispersion plating method. First, a separate tank system is required for ultrasonically treating a tank, which is a plating solution container, to prevent agglomeration of the dispersant dispersed in the plating solution. In addition, when the dispersant is exposed to the air for a long time at 0 ° C. or less for a long time, a stable dispersant tends to precipitate in a milky gel state, which makes it difficult to manage the dispersant. In addition, the concentration and pH of the plating solution must be precisely controlled for uniform precipitation of the dispersant in the plating layer. In addition, the dispersion plating method is performed in the wet plating, so the working environment is poor, it is easy to cause environmental pollution problems, and a separate facility for wastewater treatment of the plating solution is required.

한편, 내식성이 우수한 도금강판을 제조하기 위하여 아연과 이산화실리콘을 물리적증착법으로 동시에 도금하는 방법이 일본 공개특허공보 (소)54-11441 호에 제시된바 있다. 상기 제안은 단층의 아연-이산화실리콘 복합도금강판을 제조함에 있어서,복합도금층내에 이산화실리콘의 첨가량을 0.1에서 80%로 하여 내식성을 향상하도록하였는데, 이산화실리콘의 첨가량이 많으면 많을수록 도금층의 내식성이 증가하지만, 반대로 이산화첨가량이 많으면 많을수록 도금층의 밀착성이 나쁘기 때문에 상업적인 용융 가능성은 거의 없다.Meanwhile, a method of simultaneously plating zinc and silicon dioxide by physical vapor deposition in order to manufacture a plated steel sheet excellent in corrosion resistance has been proposed in Japanese Patent Laid-Open No. 54-11441. The above proposal was to improve the corrosion resistance by producing a single layer of zinc-silicon dioxide composite plated steel sheet, in which the amount of silicon dioxide added in the composite plating layer was 0.1 to 80%, but as the amount of silicon dioxide added increased, the corrosion resistance of the plated layer increased. On the contrary, the greater the amount of dioxide added, the poorer the adhesion of the plated layer, and therefore, there is little possibility of commercial melting.

또한, 물리증착법으로 이산화실리콘을 도금할 때, 이산화실리콘의 증발속도가 아연에 비하여 매우 느려 생산성이 열악한 단점이 있다. 즉, 보통 이산화실리콘의 증발속도는 아연의 증발속도보다 100배 이하이기 때문에 만약 50중량%의 이산화실리콘이 포함된 복합도금층을 만들기 위해서는 이산화실리콘의 증발속도에 맞추어 제품을 생산하여야 하기 때문에, 제품의 생산속도가 매우 떨어질 수밖에 없다.In addition, when the silicon dioxide is plated by physical vapor deposition, the evaporation rate of the silicon dioxide is very slow compared to zinc, which has a disadvantage of poor productivity. That is, since the evaporation rate of silicon dioxide is usually 100 times less than the evaporation rate of zinc, in order to make a composite plating layer containing 50% by weight of silicon dioxide, the product must be produced according to the evaporation rate of silicon dioxide. Production speed is bound to drop very much.

본 방법은 상기한 종래 문제점인 분산제의 응집현상, 환경공해, 폐수처리 등이 없는 진공증착방법을 이용하여 내식성 및 광택성이 보다 더 우수한 알루미늄-이산화실리콘 복합도금강판 및 그 제조방법을 제공하는데, 목적이 있다.The present method provides an aluminum-silicon dioxide composite plated steel sheet having excellent corrosion resistance and glossiness by using a vacuum deposition method without dispersing agent, environmental pollution, wastewater treatment, etc., which is a conventional problem, and a manufacturing method thereof. There is a purpose.

상기 목적을 달성하기 위한 본 발명의 일측면은 1-10중량%의 이산화실리콘을 함유하는 알루미늄-이산화실리콘 증착도금층이 강판 편면당 2g/㎡ 이상의 부착량으로형성되는 광택도와 내식성이 우수한 알루미늄-이산화실리콘 복합도금강판에 관한것이다.One aspect of the present invention for achieving the above object is an aluminum-silicon dioxide having excellent gloss and corrosion resistance that the aluminum-silicon dioxide deposition plating layer containing 1-10% by weight of silicon dioxide is formed with an adhesion amount of 2g / ㎡ or more per sheet steel sheet It is about composite plated steel sheet.

또한, 본 발명의 다른 측면은 전자빔을 이용한 진공증착에 의해 복합도금강판을 제조하는 방법에 있어서, 소지강판을 100-350℃ 범위로 가열한 다음,1-10중량%의 이산파실리콘을 함유하는 알루미늄-이산화실리콘을 상기 강판 편면당 2g/m2이상의부착량으로 진공증착하는 광택도와 내식성이 우수한 알루미늄-이산화실리콘 복합도금강판 제조방법에 관한 것이다.In addition, another aspect of the present invention is a method for producing a composite plated steel sheet by vacuum deposition using an electron beam, the substrate is heated to 100-350 ℃ range, and then containing 1-10% by weight of di-silicon The present invention relates to a method for producing an aluminum-silicon dioxide composite plated steel sheet having excellent gloss and corrosion resistance for vacuum-depositing aluminum-silicon dioxide at a deposition amount of 2 g / m 2 or more per one side of the steel sheet.

이하, 본 발명에 대하여 상세히 설명한다.EMBODIMENT OF THE INVENTION Hereinafter, this invention is demonstrated in detail.

본 발명에 따라 강판표면에 증착된 알루미늄-이산화실리콘 복합도금층 중의 이산화실리콘 함량이 1중량% 이하가 되면 내식성 및 광택도의 증가가 뚜렷하지 않으며 10중량%를 넘게되면 내식성 및 광택도는 증가하지만 도금층의 밀착성이 불량하게 되므로 상기 알루미늄-이산화실리콘 복합도금층중의 이산화실리콘의 함량은 1-10중량%의 범위로 하는 것이 바람직하다.When the content of silicon dioxide in the aluminum-silicon dioxide composite plating layer deposited on the surface of the steel sheet according to the present invention is less than 1% by weight, the increase in corrosion resistance and glossiness is not obvious. Since the adhesion of the resin becomes poor, the content of silicon dioxide in the aluminum-silicon dioxide composite plating layer is preferably in the range of 1 to 10% by weight.

또한, 알루미늄-이산화실리콘 진공증착 복합도금충의 도금 부착량이 2g/㎡미만인경우에는 내식성이 저하되어 도금층 특성이 열악하게 되므로 알루미늄-이산화실리콘 진공증착 복합도금층의 도금부착량은 2g/㎡ 이상으로 하는 것이 바람직하다.In addition, when the plating adhesion amount of the aluminum-silicon dioxide vacuum deposition composite plating insect is less than 2g / m 2, the corrosion resistance is deteriorated and the plating layer properties are poor. Therefore, the plating deposition amount of the aluminum-silicon dioxide vacuum deposition composite plating layer is preferably 2g / m 2 or more. Do.

이하, 본 발명에 따라 고내식성 및 광택도가 우수한 복합도금강판을 제조하는 방법에 대하여 설명한다.Hereinafter, a method of manufacturing a composite plated steel sheet excellent in high corrosion resistance and glossiness according to the present invention will be described.

본 발명에 있어서,1-10중량의 이산화실리콘을 함유하는 알루미늄-이산화실리콘 복합도금층을 강판 편면당 2g/㎡의 부착량으로 강판표면에 증착하는 방법으로는 통상의 전자빔 진공증착방법이 사용된다.In the present invention, a conventional electron beam vacuum deposition method is used as a method of depositing an aluminum-silicon dioxide composite plating layer containing 1-10 weight of silicon dioxide on the surface of a steel sheet with an adhesion amount of 2 g / m 2 per single steel sheet.

본 발명에 따라 전자빔 진공증착방법에 의해 알루미늄-이산화실리콘 복합도금층을형성시키는 대표적인 제조공정을 설명하면 다음과 같다.Referring to the representative manufacturing process for forming the aluminum-silicon dioxide composite plating layer by the electron beam vacuum deposition method according to the present invention.

먼저 소지기판인 기존의 일반 냉연강판을 적절한 크기로 절단한 후, 진공증착 장치의 진공조안에 장입하고 동시에 증착물질인 알루미늄과 이산화실리콘(SiO2)을 낟알(grain) 형태로 하여 동도가니에 장입한다. 그리고, 진공조의 진공도를 10-4torr까지 진공배기 한 후, 전자빔을 가지고 알루미늄과 이산학실리콘을 용융시킨다. 여기서 금속인 알루미늄은 용융되어 증발하기 시작하고. 이산화실리콘은 표면에만 반용융(semi-melted)상태가 되어 증발하게 된다. 상기 증발된 알루미늄과 이산화실리콘의 가스는 강판과 만나서 강판표면 위에 증착하여 알루미늄과 이산화실리콘이 복합적으로 도금된 강판을 제조할 수 있게 된다.First, the existing cold rolled steel sheet, which is a small substrate, is cut to an appropriate size, and then charged into a vacuum chamber of a vacuum deposition apparatus, and at the same time, charged into a copper crucible by depositing aluminum and silicon dioxide (SiO 2 ) as grains. do. Then, the vacuum degree of the vacuum chamber is evacuated to 10 -4 torr, and then aluminum and discrete silicon are melted with an electron beam. Where aluminum, the metal, melts and begins to evaporate. Silicon dioxide is semi-melted only on the surface and evaporates. The vaporized gas of aluminum and silicon dioxide meets the steel sheet and is deposited on the surface of the steel sheet to produce a steel sheet compositely plated with aluminum and silicon dioxide.

이때, 소지기판인 강판의 기판온도가 매우 중요하다. 왜냐하면 강판의 기판온도가100℃ 이하로 너무 낮으면 도금층과 강판과의 밀착성이 약하여 가공시에 박리가 일어나고, 기판온도가 350℃이상이 되면 알루미늄과 기지강판에 있는 철과 합금을 이루기 때문에 도금층의 밀착성을 역시 약하게 만든다. 결국 적당한 기판의 온도는100℃에서 350℃사이에서 실시되는 것이 바람직하다.At this time, the substrate temperature of the steel sheet, which is a small substrate, is very important. If the substrate temperature of the steel sheet is too low below 100 ℃, the adhesion between the plated layer and the steel sheet is weak and peeling occurs during processing. If the substrate temperature is above 350 ℃, it forms an alloy with aluminum in the base steel sheet. It also weakens the adhesion. After all, the temperature of a suitable substrate is preferably carried out between 100 ℃ to 350 ℃.

이하, 본 발명을 실시예를 통하여 구체적으로 설명한다.Hereinafter, the present invention will be described in detail through examples.

실시예Example

하기표1의 발명예(1-6)과 비교예(1-6)의 경우 10×15cm의 크기로 절단한 두께 8mm, 조도범위 0.7-1.2㎛의 일반 냉연강판을 탈지한 후, 진공증착 장치의 진공조안에 장입하고 동시에 증착물질인 알루미늄과 이산화실리콘(SiO2)을 낟알(grain)형태로 하여 동도가니에 장입하였다. 그리고 진공조의 진공도를 10-4torr까지 진공배기 한우, 전자빔을 가지고 알루미늄과 이산화실리콘을 증발시켜, 알루미늄과 이산화실리콘을 복합으로 강판 편면당 20g/㎡의 부착량으로 도금한 복합도금강판을 제조하였다. 이때, 강판표면에 증착된 알루미늄-이산화실리콘 복합도금층중의 이산화실리콘함량 및 기판온도는 하기표1의 조건으로 하였다.In the Invention Example (1-6) and Comparative Example (1-6) of Table 1, a vacuum deposition apparatus after degreasing a general cold rolled steel sheet having a thickness of 8 mm and a roughness range of 0.7-1.2 μm cut to a size of 10 × 15 cm Was loaded into a vacuum crucible, and at the same time, aluminum and silicon dioxide (SiO 2 ), which were deposited, were loaded into the copper crucible. The vacuum degree of the vacuum chamber was evacuated to 10 -4 torr, and the aluminum and silicon dioxide were evaporated with the Hanwoo, the electron beam, and a composite plated steel sheet was plated with an adhesion amount of 20 g / m2 per sheet of steel and composited with aluminum and silicon dioxide. At this time, the silicon dioxide content and the substrate temperature in the aluminum-silicon dioxide composite plating layer deposited on the steel plate surface were set as the conditions shown in Table 1 below.

또한, 하기표 1의 비교예(7-8)의 경우 10×15cm의 크기로 절단한 두께 8mm, 조도범위 0.7-1.2㎛의 일반 냉연강판을 탈지한 후, 진공증착 장치의 진공조안에 장입하고 동시에 증착물질인 아연과 이산화실리큰(SiO2)을 낟알(grain)형태로 하여 각각 그레파이트(graphite) 및 동도가니에 장입하였다. 그리고 진공조의 진공도를 10-4torr까지 진공배기 한 후, 전자빔을 가지고 아연과 이산화실리콘을 증발시켜, 아연과이산화실리콘을 복합으로 강판 편면당 20g/㎡의 부착량으로 도금한 복합도금 강판을 제조하였다.In addition, in Comparative Example (7-8) of Table 1, after degreasing a general cold rolled steel sheet having a thickness of 10 mm and a roughness range of 0.7-1.2 µm, cut into a size of 10 × 15 cm, the product was charged into a vacuum chamber of a vacuum deposition apparatus. At the same time, the deposited materials zinc and silicon dioxide (SiO 2 ) were loaded into graphite and copper crucible in the form of grains. The vacuum degree of the vacuum chamber was evacuated to 10 -4 torr, followed by evaporation of zinc and silicon dioxide with an electron beam, and a composite plated steel sheet coated with zinc and silicon dioxide at a coating amount of 20 g / m2 per sheet steel sheet. .

이때, 도금층중의 이산학실리콘 함량 및 기판온도는 하기표 1의 조건으로 하였다. 비교예(1)의 경우 기존의 전기도금 방법으로 아연을 도금한 경우이다. 여기서 아연의 도금량이 20g/㎡ 이었다.At this time, the discrete silicon content and the substrate temperature in the plating layer was set as the conditions of the following Table 1. In the case of Comparative Example (1), zinc is plated by the conventional electroplating method. The plating amount of zinc was 20 g / m <2> here.

또한, 하기표1의 비교예(10-11)의 경우 기존의 분산도금 방법으로 아연을 도금한 경우이다. 여기서 분산제로는 10-20㎛ 크기의 이산화산화물(SiO2)가 분산되어 있는 일산화학(日産化學(일본))의 Snowtex-0 제품을 사용하였다. 도금 용액은 pH=2에서 Zn2+는 70g/ℓ, Cl1-는 230g/ℓ, SiO2을 40g/ℓ 첨가하였다. 추가로 비교예(10)은 NaNO3을 1.5g/ℓ, 비교예(11)는 Ni2+이온을 30g/ℓ 첨가하였다. 그리고 분산제의 응집현상을 알아보기 위하여 도금용액을 1주일간 대기중에서 방치한 후, 응집여부를 관찰하였다.In addition, in the case of Comparative Example (10-11) of Table 1 is a case where zinc is plated by the conventional dispersion plating method. As a dispersant, Snowtex-0 manufactured by Ilsan Chemical Co., Ltd. (Japan), in which 10-20 μm of dioxide dioxide (SiO 2 ) is dispersed, was used. Plating solution is Zn 2+ at pH = 2 is 70g / ℓ, Cl 1- was added 40g / ℓ to 230g / ℓ, SiO 2. Furthermore, in Comparative Example (10), 1.5 g / L of NaNO 3 was added, and in Comparative Example (11), 30 g / L of Ni 2+ ions were added. In addition, the plating solution was left in the air for one week in order to examine the flocculation phenomenon of the dispersant, and then the aggregation was observed.

상기와 같이 제조된 알루미늄-이산화실리콘 복합도금의 제품특성을 평가하기 위해 밀착성, 광택도 및 내식성을 평가하였다. 먼저 도금층의 밀착성을 평가하기 위해시편을 180도 굴곡 후 접착테이프를 이용하여 박리여부를 관찰하였다. 광택도는 가시당선영역의 광을 이용하여 반사도를 측정하였고, 임사각과 반사각은 시편의 법선방향을 기준으로 60°각도에서 측정하였다. 그리고 표준샘플의 광택도 값을 100으로 기준으로 하고 각 시편의 광택도 값을 측정하였다. 마지막으르 각 제품의 내식성을 평가하기 위하여 ASTM Bl17-73 기준에 의거 5%의 염수분위기에서 염수분무실험을 실시하였다. 그리고 적청발생시간까지의 시간을 관찰하여 내식성을 비교, 평가하였다. 상기와 같이 측정된 결과를 하기표 1에 나타내었다.In order to evaluate the product characteristics of the aluminum-silicon dioxide composite plating prepared as described above, the adhesion, glossiness and corrosion resistance were evaluated. First, in order to evaluate the adhesion of the plating layer, the specimen was bent 180 degrees and then peeled off using an adhesive tape. Glossiness was measured by reflecting light in the visible sugar region, and near-degree and reflection angles were measured at an angle of 60 ° based on the normal direction of the specimen. And the gloss value of the standard sample as a reference 100 was measured for the gloss value of each specimen. Finally, to evaluate the corrosion resistance of each product, a salt spray test was conducted in a salt atmosphere of 5% according to ASTM Bl17-73. The corrosion resistance was compared and evaluated by observing the time until the red blue development time. The results measured as described above are shown in Table 1 below.

주) 밀착성 ◎ : 우수 ○ : 양호 △ : 부분박리 X : 박리Note) Adhesiveness ◎: Excellent ○: Good △: Partial peeling X: Peeling

상기표 1에 나타난 바와 같이, 발명예(1-6)의 경우, 알루미늄과 이산화실리콘을 동시에 증착함에 있어, 기판온도는 100℃에서 350℃사이로 하고, 이산화실리콘의 첨가량을 1중량%에서 10중량% 사이로 하면 양호한 밀착성을 유지하면서 광택 및 내식성이 우수한 도금강판을 제조할 수 있었다.As shown in Table 1, in the invention example (1-6), in the deposition of aluminum and silicon dioxide at the same time, the substrate temperature is between 100 ℃ to 350 ℃, the amount of silicon dioxide added from 1% by weight to 10% by weight If it is set to%, it is possible to manufacture a plated steel sheet excellent in gloss and corrosion resistance while maintaining good adhesion.

그러나, 비교예(1)의 경우 기판온도를 상온에서 유지하면 밀착력이 불량하였고, 또한 비교예(2)의 경우 기판온도를 400℃에서 유지하면 기판의 철과 알루미늄과 합금을 형성하여 밀착성이 불량하였다. 그리고 비교예(3-4)의 경우 이산화실리콘의 첨가량이 0.5중량%)이하이면 내식성의 증가가 없었다. 한편, 비교예(5-6)처럼 이산화실리콘의 첨가량이 15중량%, 20중량% 이면 밀착력이 떨어져, 내식성이 증가하여도 제품으로서의 가치가 떨어진다. 본 발명에 의한 발명예(1-6)은 비교예(9)의 경우처럼 기존의 전기도금으로 아연만을 도금한 경우보다 염수분무에 의한 적청 발생까지의 시간이 최고 10배이상 증가하였다.However, in the case of Comparative Example (1), the adhesion was poor when the substrate temperature was maintained at room temperature, and in the case of Comparative Example (2), when the substrate temperature was maintained at 400 ° C, the adhesion was poor by forming an alloy with iron and aluminum of the substrate. It was. In the case of Comparative Example (3-4), if the amount of added silicon dioxide was 0.5 wt% or less, there was no increase in corrosion resistance. On the other hand, if the added amount of silicon dioxide is 15% by weight and 20% by weight, as in Comparative Example (5-6), the adhesion is reduced, and the value as a product is lowered even if the corrosion resistance is increased. Inventive Example (1-6) according to the present invention, the time until the generation of red blue due to the salt spray was increased up to 10 times or more than in the case of plating only zinc with conventional electroplating as in the case of Comparative Example (9).

한편, 아연과 이산화실리콘을 동시에 도금한 비교예(7)의 경우를 보면 이산화실리콘의 첨가량이 l0중량%인 경우, 같은 첨가량을 도금한 발명예(5)보다 내식성이 떨어지는 것을 알 수 있었다. 이는 이산화실리콘 뿐아니라 알루미늄이 아연보다 염수에 대한 내식성이 우수하기 때문이다. 그리고 이산화실리콘의 침가량을 비교예(8)처럼 50중량% 첨가하면 내식성이 증가하지만 도금층의 밀착성이 나쁘기 때문에 가공시 도금층 박리현상이 발생한다.On the other hand, in the case of the comparative example (7) which plated zinc and silicon dioxide at the same time, when the addition amount of silicon dioxide was 10 weight%, it turned out that corrosion resistance is inferior to the invention example (5) which plated the same addition amount. This is because not only silicon dioxide but also aluminum has better corrosion resistance to salt water than zinc. In addition, when 50 wt% of the silicon dioxide is soaked as in Comparative Example (8), the corrosion resistance is increased, but the adhesion of the plating layer is poor, so that the plating layer peeling phenomenon occurs during processing.

그리고, 본 발명에 의한 제품의 광택도는, 전기아연도금강판인 비교예(1)의 광택도보다 약 5배이상의 높은 수지를 보여주고 있었다. 한편, 비교예(10-11)의 경우처럼 기존의 분산도금뱁으로 아연과 이산화실리콘을 도금하면 분산제인 이산화실리콘의 석출량에 따라 내식성이 증가함을 알 수 있었다. 특히, 비교예(11)의 처럼 Ni 이온을 첨가하면 광택도를 증가시킬 수 있었다. 그러나 앞서 서술하였듯이 분산도금법은 도금용액을 가지고 처리하는 방법이기 때문에 폐수처리 시스템이 필요하고 상기표1에 나타냈듯이 도금용액을 장기간 방치하면 분산제의 응집현상이 생기게 되어 도금용액의 관리를 위한 별도의 시스템이 필요하게 되는 단점이 있다.And the glossiness of the product by this invention showed the resin about 5 times higher than the glossiness of the comparative example (1) which is an electrogalvanized steel sheet. On the other hand, as in the case of Comparative Example (10-11) it can be seen that when the zinc and silicon dioxide is plated with the conventional dispersion plating 뱁 corrosion resistance increases according to the precipitation amount of the silicon dioxide as a dispersant. In particular, the addition of Ni ions as in Comparative Example (11) could increase the glossiness. However, as described above, since the dispersion plating method is a method of treating with a plating solution, a wastewater treatment system is required, and as shown in Table 1 above, when the plating solution is left for a long time, a coagulation phenomenon of the dispersant is generated, and a separate solution for the management of plating solution The disadvantage is the need for a system.

상술한 바와 같이, 본 발명은 전자빔 진공증착방법으로 알루미늄-이산화실리콘을 강판에 증착함으로써, 종래 분산도금법처럼 습식법에 의해 도금을 하는 것이 아니고 진공중에서 도금을 하기 때문에, 환경공해문제가 전혀없고 페수처리를 할 필요가 없으며, 또한 진공증착법은 금속 및 산학물을 동시에 증발시켜 강판에 도금시킬 수 있기 때문에 분산도금법에서 문제가 되는 분산제의 응집현상이 없게 된다. 특히, 알루미늄과 이산화실리콘을 동시에 복합적으로 도금을 하였기 때문에, 아연을 단독으로 도금한 전기아연도금강판이나 아연-이산화실리콘보다 내식성 및 광택도가 우수한 도금강판을 제공할 수 있으며, 상기 제공된 도금강판은 자동차 외판용 및 가전 건재에 적용될 수 있는 효과가 있다.As described above, according to the present invention, since aluminum-silicon dioxide is deposited on a steel sheet by an electron beam vacuum deposition method, plating is performed in a vacuum rather than a wet method as in the conventional dispersion plating method, so there is no environmental pollution problem and wastewater treatment. In addition, since the vacuum evaporation method can simultaneously plate the steel sheet by evaporating the metal and the industrial products, there is no agglomeration phenomenon of the dispersant which is a problem in the dispersion plating method. In particular, since aluminum and silicon dioxide are plated at the same time, it is possible to provide an electrogalvanized steel plate plated with zinc alone or a plated steel plate having better corrosion resistance and glossiness than zinc-silicon dioxide. There is an effect that can be applied to automobile exterior and home appliances building materials.

Claims (2)

1-10중량%의 이산화실리콘을 함유하는 알루미늄-이산화실리콘 증착도금층이 강판편면당 2g/㎡ 이상의 부착량으로 형성됨을 특징으로 하는 광택도와 내식성이 우수한 알루미늄-이산화실리콘 복합도금강판.An aluminum-silicon dioxide composite plated steel sheet having excellent gloss and corrosion resistance, wherein an aluminum-silicon dioxide deposited plating layer containing 1-10% by weight of silicon dioxide is formed at an adhesion amount of 2 g / m 2 or more per sheet steel sheet. 전자빔을 이용한 진공증착에 의해 복합도금강판을 제조하는 방법에 있어서, 소지강판을 100-350℃ 범위로 가열한 다음,1-10중량%의 이산화실리콘을 함유하는 알루미늄-이산화실리콘을 상기 강판 편면당 2g/㎡ 이상의 부착량으로 진공증착하는 것을 특징으로 하는 광택도와 내식성이 우수한 알루미늄-이산화실리콘 복합도금강판 제조방법.In the method for producing a composite plated steel sheet by vacuum deposition using an electron beam, the base steel sheet is heated to a range of 100-350 ° C., and then aluminum-silicon dioxide containing 1-10% by weight of silicon dioxide per sheet steel sheet A method for producing an aluminum-silicon dioxide composite plated steel sheet having excellent gloss and corrosion resistance, characterized by vacuum deposition at an adhesion amount of 2 g / m 2 or more.
KR1019960070081A 1996-12-23 1996-12-23 The al-silico oxide composite sheet and the same method KR100276336B1 (en)

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KR20020051285A (en) * 2000-12-22 2002-06-28 신현준 A METHOD FOR MANUFACTURING PLATED STEEL SHEETS HAVING SUPERIOR CORROSION RESISTANCE BY Si DEPOSITION

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KR100689157B1 (en) 2005-10-12 2007-03-02 주식회사 포스코 Manufacturing method of al-si alloy films

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020051285A (en) * 2000-12-22 2002-06-28 신현준 A METHOD FOR MANUFACTURING PLATED STEEL SHEETS HAVING SUPERIOR CORROSION RESISTANCE BY Si DEPOSITION

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