KR19980040774A - Container cleaning system for semiconductor device manufacturing - Google Patents

Abstract

A container cleaning system for manufacturing a semiconductor device for automatically cleaning a container used in a process to maintain cleanliness of a container containing a chemical.

The present invention relates to a container cleaning system for manufacturing a semiconductor device that automatically cleans a container containing chemicals, wherein isopropyl alcohol (IPA), ultrapure water, nitrogen, and chemical are supplied to provide automatic isopropyl circulation cleaning and automatic ultrapure water circulation cleaning. And a cleaning apparatus for sequentially performing a heating and nitrogen purge process and a vacuum exhaust process, a heating means for enclosing and heating the outer portion of the cleaning apparatus with a coil, and controlling operations of the cleaning apparatus and the heating means so that the processes are performed sequentially. It is provided with a control means.

Therefore, according to the present invention, the container can be cleaned to have a considerable level of cleanliness, the cleaning is automated, the operation is convenient, and there is no effect of contamination, thereby improving the chemical purity.

Description

Container cleaning system for semiconductor device manufacturing

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a container cleaning system for manufacturing semiconductor devices, and more particularly, to a container cleaning system for manufacturing semiconductor devices to automatically clean containers used in a process to maintain cleanliness of containers containing chemicals.

In general, a variety of chemicals are used for each process in the process of manufacturing a semiconductor device, and each of these chemicals is stored in a container or supplied.

Containers containing TEOS, TMP, TMB, TEB and TEPI should be recovered and cleaned after use.

After the container containing the conventional chemical is recovered, it is disassembled entirely on the valves, and then various parts and the outer wall of the container are manually cleaned using isopropyl alcohol (IPA), and secondly, manually by using ultra pure water (DI). Washed.

Then, the vessel was washed with IPA and ultrapure water, and then dried and cleaned in an oven for each part, and then reassembled and used to receive chemicals.

However, the conventional cleaning method is easy to damage the parts of the container due to repeated bonding and disassembly, there was a problem that the back environment is exposed to the external environment.

In addition, when toxic chemicals are left during the cleaning, there is a problem of leaking to the outside, causing harmful effects on the environment and the human body, and acting as impurities that lower productivity in the manufacturing line.

In addition, there is a problem in that the purity of the chemical is reduced and the life of the container is reduced due to the contamination caused by the cleaning residue during chemical injection and the leakage problem during the manufacturing of the parts.

In addition, since all the cleaning process of the container is made by hand, there was a problem of poor workability.

An object of the present invention is to provide a container cleaning system for manufacturing a semiconductor device for automatically cleaning a container containing chemicals by being supplied with IPA, ultrapure water, nitrogen gas and chemicals.

1 is a block diagram showing an embodiment of a container cleaning system for manufacturing a semiconductor device according to the present invention.

※ Explanation of symbols for main parts of drawing

10: washing device 12: heater

14 control unit 16 to 22 valve

A container cleaning system for semiconductor device manufacturing according to the present invention for achieving the above object is a container cleaning system for semiconductor device manufacturing for automatically cleaning a container containing a chemical, Isopropyl alcohol (IPA) and ultrapure water, nitrogen and chemical A washing device that performs the automatic isopropyl circulating cleaning process, the automatic ultrapure water circulating cleaning process, the heating and nitrogen purge process, and the vacuum evacuation process sequentially, the heating means surrounding the outside of the cleaning device with a coil, and the processes are sequentially And control means for controlling the operation of the cleaning device and the heating means to be performed.

Hereinafter, with reference to the accompanying drawings, a specific embodiment of the present invention will be described in detail.

Referring to FIG. 1, in a container cleaning system for manufacturing a semiconductor according to the present invention, an outer portion of a cleaning device 10 in which a container is contained and cleaned is surrounded by a coil, and the coil is operated by the heater 12. Is configured to heat, and the control unit 14 is configured to control the operation of the heater 12.

In addition, the cleaning apparatus 10 is configured to supply IPA, ultrapure water (DI), nitrogen gas (N ₂ ), and chemicals required to perform the cleaning through the valves 16 to ₂₂ , and the respective valves 16 to ₂₂ , respectively. 22 is configured to be opened and closed under the control of the control unit 14.

Therefore, according to the embodiment of the present invention, when the cleaning operation is performed after putting the cleaning device 10 in the container to be cleaned, the operation for automatically cleaning the container in a space isolated from the outside is continuously performed.

That is, in the embodiment, the valve 16 is opened to supply the IPA, and then the automatic IPA circulation cleaning process is performed. Then, the valve 18 is opened to supply the ultrapure water to perform the automatic ultrapure water circulation cleaning process. The control unit 14 controls the heater 12 to purge the nitrogen gas while heating the washing apparatus 10. If the air is exhausted while the cleaning apparatus 10 is continuously heated, the inside of the container is in a high vacuum state with minimal contamination, and then the chemical is injected into the container.

The container is then cleaned with an automated system in an isolated environment to prevent contamination by external contaminants, and by heating and nitrogen purge to prevent contamination by moisture, particles, hydrocarbons and metallic contaminants within the chemical. And, since the chemical is injected in a high temperature vacuum state, the purity of the chemical is improved. Therefore, high purity chemicals can be stored and used in a container.

Therefore, according to the present invention, the container can be cleaned to have a considerable level of cleanliness, the cleaning is automated, the operation is convenient, and there is no effect of contamination, thereby improving the chemical purity.

Although the present invention has been described in detail only with respect to the described embodiments, it will be apparent to those skilled in the art that various modifications and variations are possible within the technical scope of the present invention, and such modifications and modifications are within the scope of the appended claims.

Claims (1)

A container cleaning system for manufacturing a semiconductor device for automatically cleaning a container containing chemicals, A washing apparatus which receives isopropyl alcohol (IPA), ultrapure water, nitrogen and chemicals and sequentially performs an automatic isopropyl circulating cleaning process, an automatic ultrapure water circulating cleaning process, a heating and nitrogen purge process, and a vacuum exhaust process; Heating means for heating the outer circumference of the cleaning device with a coil; And Control means for controlling the operation of the cleaning apparatus and the heating means such that the processes are performed sequentially; Container cleaning system for manufacturing a semiconductor device comprising the.