KR102912774B1 - 감광성 착색 조성물, 경화물, 유기 전계 발광 소자 및 화상 표시 장치 - Google Patents

감광성 착색 조성물, 경화물, 유기 전계 발광 소자 및 화상 표시 장치

Info

Publication number
KR102912774B1
KR102912774B1 KR1020237009602A KR20237009602A KR102912774B1 KR 102912774 B1 KR102912774 B1 KR 102912774B1 KR 1020237009602 A KR1020237009602 A KR 1020237009602A KR 20237009602 A KR20237009602 A KR 20237009602A KR 102912774 B1 KR102912774 B1 KR 102912774B1
Authority
KR
South Korea
Prior art keywords
group
mass
preferable
coloring composition
photosensitive coloring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020237009602A
Other languages
English (en)
Korean (ko)
Other versions
KR20230076816A (ko
Inventor
요시타카 사와이
노부오 리키타케
고우타로 미시마
노리코 미야시타
Original Assignee
미쯔비시 케미컬 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미쯔비시 케미컬 주식회사 filed Critical 미쯔비시 케미컬 주식회사
Priority to KR1020267000259A priority Critical patent/KR20260010762A/ko
Publication of KR20230076816A publication Critical patent/KR20230076816A/ko
Application granted granted Critical
Publication of KR102912774B1 publication Critical patent/KR102912774B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional [2D] radiating surfaces
    • H05B33/22Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00Other synthetic dyes of known constitution
    • C09B57/02Coumarine dyes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/006Preparation of organic pigments
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional [2D] radiating surfaces
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30Devices specially adapted for multicolour light emission
    • H10K59/38Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/50OLEDs integrated with light modulating elements, e.g. with electrochromic elements, photochromic elements or liquid crystal elements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/8791Arrangements for improving contrast, e.g. preventing reflection of ambient light

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
KR1020237009602A 2020-09-28 2021-09-27 감광성 착색 조성물, 경화물, 유기 전계 발광 소자 및 화상 표시 장치 Active KR102912774B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020267000259A KR20260010762A (ko) 2020-09-28 2021-09-27 감광성 착색 조성물, 경화물, 유기 전계 발광 소자 및 화상 표시 장치

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2020162460 2020-09-28
JPJP-P-2020-162460 2020-09-28
JP2021024490 2021-02-18
JPJP-P-2021-024490 2021-02-18
PCT/JP2021/035403 WO2022065490A1 (ja) 2020-09-28 2021-09-27 感光性着色組成物、硬化物、有機電界発光素子及び画像表示装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020267000259A Division KR20260010762A (ko) 2020-09-28 2021-09-27 감광성 착색 조성물, 경화물, 유기 전계 발광 소자 및 화상 표시 장치

Publications (2)

Publication Number Publication Date
KR20230076816A KR20230076816A (ko) 2023-05-31
KR102912774B1 true KR102912774B1 (ko) 2026-01-15

Family

ID=80845634

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020237009602A Active KR102912774B1 (ko) 2020-09-28 2021-09-27 감광성 착색 조성물, 경화물, 유기 전계 발광 소자 및 화상 표시 장치
KR1020267000259A Pending KR20260010762A (ko) 2020-09-28 2021-09-27 감광성 착색 조성물, 경화물, 유기 전계 발광 소자 및 화상 표시 장치

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020267000259A Pending KR20260010762A (ko) 2020-09-28 2021-09-27 감광성 착색 조성물, 경화물, 유기 전계 발광 소자 및 화상 표시 장치

Country Status (5)

Country Link
JP (1) JPWO2022065490A1 (https=)
KR (2) KR102912774B1 (https=)
CN (2) CN116323716B (https=)
TW (1) TWI910237B (https=)
WO (1) WO2022065490A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024171841A1 (ja) * 2023-02-16 2024-08-22 富士フイルム株式会社 着色組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および化合物

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016148767A (ja) 2015-02-12 2016-08-18 日立化成株式会社 感光性樹脂組成物、フィルム状接着剤、接着シート、接着剤パターン、接着剤層付半導体ウェハ、及び半導体装置
WO2017169584A1 (ja) 2016-03-31 2017-10-05 富士フイルム株式会社 組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置
JP2019002005A (ja) 2017-06-14 2019-01-10 山陽色素株式会社 顔料分散体及びそれを含む着色組成物
CN109923475A (zh) 2016-10-14 2019-06-21 三菱化学株式会社 感光性着色组合物、固化物、着色间隔物、图像显示装置
WO2020059382A1 (ja) * 2018-09-21 2020-03-26 富士フイルム株式会社 遮光膜、遮光膜の製造方法、光学素子、固体撮像素子、ヘッドライトユニット
WO2020066420A1 (ja) * 2018-09-25 2020-04-02 富士フイルム株式会社 遮光性組成物、硬化膜、遮光膜、固体撮像素子

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102715193B1 (ko) * 2013-09-25 2024-10-11 미쯔비시 케미컬 주식회사 감광성 착색 조성물, 블랙 매트릭스, 착색 스페이서, 화상 표시 장치 및 안료 분산액
CN118151488A (zh) 2016-12-02 2024-06-07 三菱化学株式会社 着色感光性树脂组合物、颜料分散液、间隔壁、有机场致发光元件、图像显示装置及照明
TW202130674A (zh) * 2020-01-20 2021-08-16 日商富士軟片股份有限公司 著色樹脂組成物、膜、濾色器、固體攝像元件及圖像顯示裝置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016148767A (ja) 2015-02-12 2016-08-18 日立化成株式会社 感光性樹脂組成物、フィルム状接着剤、接着シート、接着剤パターン、接着剤層付半導体ウェハ、及び半導体装置
WO2017169584A1 (ja) 2016-03-31 2017-10-05 富士フイルム株式会社 組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置
CN109923475A (zh) 2016-10-14 2019-06-21 三菱化学株式会社 感光性着色组合物、固化物、着色间隔物、图像显示装置
JP2019002005A (ja) 2017-06-14 2019-01-10 山陽色素株式会社 顔料分散体及びそれを含む着色組成物
WO2020059382A1 (ja) * 2018-09-21 2020-03-26 富士フイルム株式会社 遮光膜、遮光膜の製造方法、光学素子、固体撮像素子、ヘッドライトユニット
WO2020066420A1 (ja) * 2018-09-25 2020-04-02 富士フイルム株式会社 遮光性組成物、硬化膜、遮光膜、固体撮像素子

Also Published As

Publication number Publication date
KR20260010762A (ko) 2026-01-21
TW202225842A (zh) 2022-07-01
CN116323716B (zh) 2025-08-08
CN120928648A (zh) 2025-11-11
KR20230076816A (ko) 2023-05-31
TWI910237B (zh) 2026-01-01
WO2022065490A1 (ja) 2022-03-31
CN116323716A (zh) 2023-06-23
JPWO2022065490A1 (https=) 2022-03-31

Similar Documents

Publication Publication Date Title
JP7760914B2 (ja) 感光性着色組成物、硬化物、画像表示装置、及び画像表示装置用の顔料分散液
KR102912774B1 (ko) 감광성 착색 조성물, 경화물, 유기 전계 발광 소자 및 화상 표시 장치
KR102874587B1 (ko) 감광성 착색 수지 조성물, 안료 분산액, 경화물, 격벽, 유기 전계 발광 소자, 컬러 필터 및 화상 표시 장치
JP7823648B2 (ja) 感光性着色組成物、硬化物、隔壁、有機電界発光素子及び画像表示装置
KR20250162774A (ko) 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 컬러 필터 및 화상 표시 장치
KR20250120968A (ko) 감광성 착색 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 컬러 필터 및 화상 표시 장치
KR20250022662A (ko) 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자 및 화상 표시 장치
JP2025153139A (ja) 感光性樹脂組成物、硬化物、隔壁、有機電界発光素子及び画像表示装置
JP2025153271A (ja) 感光性樹脂組成物、硬化物、隔壁、有機電界発光素子及び画像表示装置
JP2025153153A (ja) 樹脂、感光性樹脂組成物、硬化物、隔壁、有機電界発光素子及び画像表示装置
TW202248278A (zh) 感光性著色樹脂組合物、硬化物、阻隔壁、有機電致發光元件、圖像顯示裝置及化合物
JP2025095824A (ja) 感光性樹脂組成物、硬化物、隔壁、有機電界発光素子、カラーフィルター及び画像表示装置
WO2025084407A1 (ja) 感光性着色組成物、硬化物、隔壁、有機電界発光素子、画像表示装置及び顔料分散液

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

D22 Grant of ip right intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D22-EXM-PE0701 (AS PROVIDED BY THE NATIONAL OFFICE)

PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

A16 Divisional, continuation or continuation in part application filed

Free format text: ST27 STATUS EVENT CODE: A-0-1-A10-A16-DIV-PA0104 (AS PROVIDED BY THE NATIONAL OFFICE)

PA0104 Divisional application for international application

St.27 status event code: A-0-1-A10-A16-div-PA0104

F11 Ip right granted following substantive examination

Free format text: ST27 STATUS EVENT CODE: A-2-4-F10-F11-EXM-PR0701 (AS PROVIDED BY THE NATIONAL OFFICE)

PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

U12 Designation fee paid

Free format text: ST27 STATUS EVENT CODE: A-2-2-U10-U12-OTH-PR1002 (AS PROVIDED BY THE NATIONAL OFFICE)

Year of fee payment: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

Q13 Ip right document published

Free format text: ST27 STATUS EVENT CODE: A-4-4-Q10-Q13-NAP-PG1601 (AS PROVIDED BY THE NATIONAL OFFICE)

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000