KR102833599B1 - 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 적외선 센서, 카메라 모듈 및 화합물 - Google Patents

조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 적외선 센서, 카메라 모듈 및 화합물 Download PDF

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KR102833599B1
KR102833599B1 KR1020247021302A KR20247021302A KR102833599B1 KR 102833599 B1 KR102833599 B1 KR 102833599B1 KR 1020247021302 A KR1020247021302 A KR 1020247021302A KR 20247021302 A KR20247021302 A KR 20247021302A KR 102833599 B1 KR102833599 B1 KR 102833599B1
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KR20240110651A (ko
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스구루 사메지마
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후지필름 가부시키가이샤
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00Other synthetic dyes of known constitution
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0071Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
    • C09B67/0084Dispersions of dyes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/18Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H10F39/182Colour image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/805Coatings
    • H10F39/8053Colour filters

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optical Filters (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
KR1020247021302A 2022-02-28 2023-01-27 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 적외선 센서, 카메라 모듈 및 화합물 Active KR102833599B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022028772 2022-02-28
JPJP-P-2022-028772 2022-02-28
PCT/JP2023/002599 WO2023162574A1 (ja) 2022-02-28 2023-01-27 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、赤外線センサ、カメラモジュールおよび化合物

Publications (2)

Publication Number Publication Date
KR20240110651A KR20240110651A (ko) 2024-07-15
KR102833599B1 true KR102833599B1 (ko) 2025-07-14

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KR1020247021302A Active KR102833599B1 (ko) 2022-02-28 2023-01-27 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 적외선 센서, 카메라 모듈 및 화합물

Country Status (4)

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JP (1) JPWO2023162574A1 (https=)
KR (1) KR102833599B1 (https=)
TW (1) TW202336019A (https=)
WO (1) WO2023162574A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI860893B (zh) * 2023-11-20 2024-11-01 光群雷射科技股份有限公司 光阻蒸鍍方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022185493A (ja) * 2021-06-02 2022-12-14 Agc株式会社 二色性色素組成物、液晶素子、位相差板および偏光子
JP2022185494A (ja) * 2021-06-02 2022-12-14 Agc株式会社 重合性液晶組成物および偏光子

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6183255B2 (ja) 2014-03-17 2017-08-23 旭硝子株式会社 近赤外線カットフィルタ
JP6655449B2 (ja) 2016-03-30 2020-02-26 株式会社日本触媒 スクアリリウム化合物
JP7015935B2 (ja) * 2018-09-14 2022-02-03 富士フイルム株式会社 近赤外線吸収性感光性組成物、硬化膜、光学フィルタ、パターン形成方法、積層体、固体撮像素子、画像表示装置及び赤外線センサ
TWI822853B (zh) * 2018-09-14 2023-11-21 日商富士軟片股份有限公司 近紅外線吸收性組成物、分散液之製造方法、膜、濾光器、圖案形成方法、積層體、固體攝像元件、圖像顯示裝置及紅外線感測器
KR102627682B1 (ko) * 2019-08-13 2024-01-24 후지필름 가부시키가이샤 조성물, 막, 광학 필터 및 그 제조 방법, 고체 촬상 소자, 적외선 센서, 카메라 모듈, 및, 화합물

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022185493A (ja) * 2021-06-02 2022-12-14 Agc株式会社 二色性色素組成物、液晶素子、位相差板および偏光子
JP2022185494A (ja) * 2021-06-02 2022-12-14 Agc株式会社 重合性液晶組成物および偏光子

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WO2023162574A1 (ja) 2023-08-31
KR20240110651A (ko) 2024-07-15
TW202336019A (zh) 2023-09-16
JPWO2023162574A1 (https=) 2023-08-31

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