KR102663349B1 - Exhaust gas treatment equipment capable of removing carbon dioxide and producing sodium bicarbonate - Google Patents

Abstract

According to the present invention, a first gas that reacts carbon dioxide contained in the exhaust gas to be treated with sodium carbonate contained in the first treated water to remove carbon dioxide, generate sodium bicarbonate, and discharge a primary treatment gas containing unreacted carbon dioxide. processing unit; a second gas treatment device that reacts the unreacted carbon dioxide with sodium hydroxide contained in the second treated water to remove the unreacted carbon dioxide, generate sodium carbonate, and discharge a secondary treated gas; a first treated water supply unit that circulates and supplies the first treated water to the first gas treatment device; and a second treated water supply unit that circulates and supplies the second treated water to the second gas treatment device, wherein the sodium carbonate generated in the second gas treatment device is supplied to the first treated water to treat the exhaust gas. It is used for reaction with carbon dioxide contained in the gas, and the first gas processing device forms microbubbles in the exhaust gas to be treated within the first treated water, thereby forming the carbon dioxide contained in the exhaust gas to be treated into microbubbles and the first gas treatment device. It is provided with a first gas processing unit that increases the contact time and contact area between sodium carbonate contained in the treated water, and the second gas processing device forms the primary treated gas into microbubbles in the second treated water. An exhaust gas treatment facility is provided including a second gas treatment unit that increases the contact time and contact area between the unreacted carbon dioxide and sodium hydroxide contained in the second treated water.

Description

Exhaust gas treatment equipment capable of removing carbon dioxide and manufacturing sodium bicarbonate {EXHAUST GAS TREATMENT EQUIPMENT CAPABLE OF REMOVING CARBON DIOXIDE AND PRODUCING SODIUM BICARBONATE}

The present invention relates to exhaust gas treatment technology, and more specifically, to an exhaust gas treatment facility capable of producing sodium bicarbonate while removing carbon dioxide contained in exhaust gas.

As the problem of global warming has become a major issue, various studies are being conducted to effectively capture and remove carbon dioxide, focusing on power plants and steel mills that emit large amounts of carbon dioxide (CO ₂ ), one of the greenhouse gases.

Sodium bicarbonate (NaHCO ₃ ) is a substance that can be used in a variety of industries such as soap, detergents, leather, and food additives, and is evaluated as a compound with not only high added value but also great commercial potential.

In Patent Publication No. 10-2022-0116407, which is a patent document related to the technical field of the present invention, exhaust gas containing carbon dioxide and an aqueous sodium carbonate solution are introduced into a reaction tank with a diffusion plate disposed inside, thereby producing a reaction product of carbon dioxide and sodium carbonate (Na ₂ CO ₃ ). A technique for forming phosphorus sodium bicarbonate is described.

Republic of Korea Patent Publication No. 10-2022-0116407 (2022.08.23.)

The purpose of the present invention is to provide an exhaust gas treatment facility capable of efficiently producing sodium bicarbonate while removing carbon dioxide contained in the exhaust gas.

In order to achieve the problem that the present invention aims to solve above, according to one aspect of the present invention, carbon dioxide contained in the exhaust gas to be treated reacts with sodium carbonate contained in the first treated water to remove carbon dioxide and produce sodium bicarbonate. a first gas processing device that discharges a first processing gas containing unreacted carbon dioxide; a second gas treatment device that reacts the unreacted carbon dioxide with sodium hydroxide contained in the second treated water to remove the unreacted carbon dioxide, generate sodium carbonate, and discharge a secondary treated gas; a first treated water supply unit that circulates and supplies the first treated water to the first gas treatment device; and a second treated water supply unit that circulates and supplies the second treated water to the second gas treatment device, wherein the sodium carbonate generated in the second gas treatment device is supplied to the first treated water to treat the exhaust gas. It is used for reaction with carbon dioxide contained in the gas, and the first gas processing device forms microbubbles in the exhaust gas to be treated within the first treated water, thereby forming the carbon dioxide contained in the exhaust gas to be treated into microbubbles and the first gas treatment device. It is provided with a first gas processing unit that increases the contact time and contact area between sodium carbonate contained in the treated water, and the second gas processing device forms the primary treated gas into microbubbles in the second treated water. An exhaust gas treatment facility is provided including a second gas treatment unit that increases the contact time and contact area between the unreacted carbon dioxide and sodium hydroxide contained in the second treated water.

In order to achieve the problem that the present invention aims to solve above, according to another aspect of the present invention, carbon dioxide contained in the exhaust gas to be treated reacts with sodium hydroxide contained in the first treated water to remove carbon dioxide and produce sodium carbonate. a first gas processing device that discharges a first processing gas containing unreacted carbon dioxide; a second gas processing device that reacts the unreacted carbon dioxide with sodium carbonate contained in the second treated water to remove the unreacted carbon dioxide, generate sodium bicarbonate, and discharge a secondary treated gas; a first treated water supply unit that circulates and supplies the first treated water to the first gas treatment device; and a second treated water supply unit that circulates and supplies the second treated water to the second gas treatment device, wherein the sodium carbonate generated in the first gas treatment device is supplied to the second treated water to provide the unreacted carbon dioxide. It is used for a reaction with, and the first gas treatment device forms microbubbles in the exhaust gas to be treated within the first treated water, thereby forming the carbon dioxide contained in the exhaust gas to be treated and the first treated water. It is provided with a first gas processing unit that increases the contact time and contact area between sodium hydroxide, and the second gas processing device forms the primary treatment gas into microbubbles in the second treatment water to remove the unreacted carbon dioxide. An exhaust gas treatment facility is provided including a second gas treatment unit that increases the contact time and contact area between sodium carbonate contained in the second treated water.

In order to achieve the problem that the present invention aims to solve above, according to another aspect of the present invention, carbon dioxide contained in the first exhaust gas to be treated is reacted with sodium hydroxide contained in the first treated water to remove carbon dioxide. a first gas processing device that generates sodium carbonate and discharges a first processing gas; a second gas treatment device that reacts carbon dioxide contained in the exhaust gas to be treated with sodium carbonate contained in the second treated water, removes carbon dioxide, generates sodium bicarbonate, and discharges a second treated gas; a first treated water supply unit that circulates and supplies the first treated water to the first gas treatment device; and a second treated water supply unit that circulates and supplies the second treated water to the second gas treatment device, wherein the sodium carbonate generated in the first gas treatment device is supplied to the second treated water to perform the second treatment. It is used for reaction with carbon dioxide contained in the target exhaust gas, and the first gas processing device forms the first exhaust gas to be treated into microbubbles in the first treatment water to be included in the first exhaust gas to be treated. A first gas processing unit is provided to increase the contact time and contact area between the carbon dioxide and the sodium hydroxide contained in the first treated water, and the second gas processing device is configured to perform the second treatment within the second treated water. Exhaust gas having a second gas processing unit that forms the target exhaust gas into microbubbles to increase the contact time and contact area between carbon dioxide contained in the second exhaust gas to be treated and sodium carbonate contained in the second treated water. Processing equipment is provided.

According to the present invention, all of the objectives of the present invention described above can be achieved. Specifically, sodium carbonate is produced by reacting carbon dioxide and sodium hydroxide contained in the exhaust gas, and sodium bicarbonate produced through the reaction of carbon dioxide and sodium hydroxide is reacted with carbon dioxide contained in the exhaust gas to produce sodium bicarbonate, thereby eliminating carbon dioxide. and sodium bicarbonate can be produced effectively.

In addition, the reactivity is improved by forming microbubbles in the treated water containing sodium hydroxide or sodium carbonate through the exhaust gas containing carbon dioxide through the gas injection nozzle, thereby eliminating carbon dioxide and producing sodium carbonate through the reaction of carbon dioxide and sodium hydroxide. , the production of sodium bicarbonate by the reaction of carbon dioxide and sodium carbonate can be carried out efficiently.

Figure 1 is a diagram schematically showing the configuration of an exhaust gas treatment facility capable of removing carbon dioxide and producing sodium bicarbonate according to an embodiment of the present invention.
FIG. 2 shows in detail the configuration of a first gas processing device and a second gas processing device in the exhaust gas treatment facility capable of removing carbon dioxide and producing sodium bicarbonate shown in FIG. 1, in which exhaust gas treatment is in progress. It shows.
FIG. 3 shows in detail the configuration of a first gas processing device and a second gas processing device in the exhaust gas treatment facility capable of removing carbon dioxide and producing sodium bicarbonate shown in FIG. 1, before processing the exhaust gas. It shows the state.
Figure 4 is a diagram schematically showing the configuration of an exhaust gas treatment facility capable of removing carbon dioxide and producing sodium bicarbonate according to another embodiment of the present invention.
Figure 5 is a diagram schematically showing the configuration of an exhaust gas treatment facility capable of removing carbon dioxide and producing sodium bicarbonate according to another embodiment of the present invention.
FIG. 6 shows in detail the configuration of the first gas processing device in the exhaust gas treatment facility capable of removing carbon dioxide and producing sodium bicarbonate shown in FIG. 5, and shows a state in which treatment of exhaust gas is in progress.
FIG. 7 shows in detail the configuration of the first gas processing device in the exhaust gas treatment facility capable of removing carbon dioxide and producing sodium bicarbonate shown in FIG. 5, and shows a state before treatment of the exhaust gas is performed.
FIG. 8 shows in detail the configuration of a second gas processing device in the exhaust gas treatment facility capable of removing carbon dioxide and producing sodium bicarbonate shown in FIG. 5, and shows a state in which treatment of exhaust gas is in progress.
FIG. 9 shows in detail the configuration of the second gas processing device in the exhaust gas treatment facility capable of removing carbon dioxide and producing sodium bicarbonate shown in FIG. 5, and shows a state before treatment of the exhaust gas is performed.

Hereinafter, the configuration and operation of an embodiment of the present invention will be described in detail with reference to the drawings.

Figure 1 shows a schematic configuration of an exhaust gas treatment facility capable of removing carbon dioxide and producing sodium bicarbonate according to an embodiment of the present invention. Referring to Figure 1, an exhaust gas treatment facility (hereinafter abbreviated as 'exhaust gas treatment facility') capable of removing carbon dioxide and producing sodium bicarbonate according to an embodiment of the present invention (1000) is an exhaust gas to be treated (G0). It is a facility that efficiently produces sodium bicarbonate (NaHCO ₃ ) while removing carbon dioxide (CO ₂ ) contained in it, comprising a gas flow fan (1050) that creates a flow pressure in the gas on the gas flow line, and a gas flow fan (1050) on the gas flow line. A first gas processing device 1100 is installed to treat the exhaust gas G0 to be treated using first treatment water L1, and is installed on the gas flow line to discharge the exhaust gas G0 from the first gas processing device 1100. A second gas processing device 1200 that processes the primary treatment gas (G1) using second treatment water (L2), and is installed on the gas flow line and discharged from the second gas processing device 1200. A gas-liquid separator 1500 that separates the liquid component from the secondary treatment gas (G2), a first treated water supply unit 1600 that supplies first treated water (L1) to the first gas treatment device 1100, and a first treated water supply unit (1600) 2 A second treated water supply unit 1700 that supplies second treated water (L2) to the gas treatment device 1200, and a solid-liquid separation filter that separates solid components including sodium bicarbonate from the first treated water (L1) 1800) and a chemical recovery tank 1900 in which the liquid component discharged from the solid-liquid separation filter 1800 is stored.

Gas flow fan 1050 creates flow pressure in the gas on the gas flow line. In this embodiment, the gas flow fan 1050 is described as being located downstream of the second gas processing device 1200 on the gas flow line, but the present invention is not limited thereto. The gas flow fan 1050 may be located upstream of the first gas processing device 1100, or may be located downstream of the first gas processing device 1100 and upstream of the second gas processing device 1200, and may also be located upstream of the first gas processing device 1100. It falls within the scope of the present invention. By operating the gas flow fan 1050, gas flows sequentially through the first gas processing device 1100, the second gas processing device 1200, and the gas-liquid separator 1500.

The first gas processing device 1100 is installed on the gas flow line and processes the exhaust gas G0 to be treated using first treatment water L1. The exhaust gas to be treated (G0) flows into the first gas processing device 1100 by the operation of the gas flow fan 1050, is processed, and is then discharged from the first gas processing device 1100 as the primary processing gas (G1). do. The primary processing gas (G1) discharged from the first gas processing device 1100 flows into the second gas processing device 1200. The first treated water (L1) used to treat the exhaust gas (G0) to be treated in the first gas treatment device 1100 is an aqueous sodium carbonate solution containing sodium carbonate (Na ₂ CO ₃ ), which is the first chemical. The first gas treatment device 1100 receives first treated water L1 containing sodium carbonate through the first treated water supply unit 1600. The first gas processing device 1100 is also supplied with industrial water. In the first gas processing device 1100, chemical reactions as shown in Reaction Equation 1, Reaction Equation 2, and Reaction Equation 3 below mainly occur.

[Scheme 1]

CO ₂ + H ₂ O → HCO ₃ ^- + H ⁺

[Scheme 2]

H ₂ CO ₃ (aq) + Na ₂ CO ₃ (aq) → 2NaHCO ₃ (c)

[Scheme 3]

CO ₂ (g) + Na ₂ CO ₃ (aq) + H ₂ O(l) → 2NaHCO ₃ (c)

That is, carbon dioxide is removed in the first gas processing device 1100 and sodium bicarbonate (NaHCO ₃ ) is generated. This reaction in which sodium bicarbonate is produced is an exothermic reaction, and in order to maintain high reaction efficiency, the first treated water (L1) is controlled to maintain a set standard hydrogen ion concentration range and a set standard temperature range. In this embodiment, the set standard hydrogen ion concentration range of the first treated water (L1) is 9.5 to 12 pH, and the set standard temperature range is 10 to 25°C. Unreacted carbon dioxide that is not removed from the first gas processing device 1100 is included in the first processing gas G1 and flows into the second gas processing device 1200.

The first gas processing device 1100 also performs dedusting treatment and acid gas removal functions for the exhaust gas G0 to be treated.

Referring to FIG. 2, which specifically shows the structure of the first gas processing device 1100, there is a first inlet 1110 through which the exhaust gas to be treated (G0) and the first treated water (L1) flow, and a microbubble ( The first microbubble processing unit 1130 processes the gas (G11) discharged from the first introduction unit 1110 using a micro-bubble, and the first introduction unit 1110 communicates with the first microbubble treatment unit 1130. Shiki is provided with a first connection passage (1190).

Exhaust gas to be treated (G0) and first treated water (L1) are introduced into the first introduction part 1110. The first introduction part 1110 provides a first introduction space 1111 formed therein. The first introduction space 1111 communicates with the first microbubble processing unit 1130 through the first passage part 1190. A first intake port 1113 is located at the top of the first introduction space 1111, and a first introduction space drain 1115 is located at the bottom of the first introduction space 1111. Exhaust gas G0 to be treated flows into the first introduction space 1111 through the first intake port 1113. Drainage occurs through the first introduction space drain 1115. The first introduction space 1111 communicates with the first connection passage 1190 at a position lower than the first intake port 1113 and higher than the first introduction space drain 1115.

In the first introduction space 1111, between the first intake port 1113 and the first introduction space drain 1115, there is a first water tank 1117, a 1A water flow pipe 1119, a 1A diffusion plate 1121, and a 1st introduction space 1111. A 1B water flow pipe 1123, a 1B diffusion plate 1125, and a first treated water inlet supply means 1126 are installed.

The first water tank 1117 is located adjacent to the bottom of the first intake port 1113 in the first introduction space 1111. The first treated water L1 supplied from the first treated water supply unit (1600 in FIG. 1) is temporarily stored in the first water tank 1117. Industrial water flowing into the first introduction space 1111 may also be temporarily stored in the first water tank 1117. The first treated water (L1) overflowing from the first water tank (1117) flows downward through the first A water flow pipe (1119).

The 1A water flow pipe 1119 is located below the first water tank 1117 in the first introduction space 1111. The 1A water flow pipe 1119 has a shape that becomes narrower as it goes downward, and a 1A water flow pipe outlet 1120 is formed at the bottom of the 1A water flow pipe 1119 to discharge the first treated water (L1) and gas downward. do. As the gas and the first treated water (L1) flow downward along the 1A water flow pipe 1119 toward the 1A water flow pipe outlet 1120, the contact area between the gas and the first treated water (L1) increases, The reaction efficiency between carbon dioxide contained in the gas and sodium carbonate contained in the first treated water (L1) is improved.

The 1A diffusion plate 1121 is located below the 1A water flow pipe outlet 1120 in the first introduction space 1111. The 1A diffusion plate 1121 is inclined radially outward from the center downward to the water channel to widely disperse the first treated water L1 discharged from the 1A water flow pipe outlet 1120 outward.

The 1B water flow pipe 1123 is located below the 1A diffusion plate 1121 in the first introduction space 1111. The 1B water flow pipe 1123 has a shape that narrows as it goes downward, and a 1B water flow pipe outlet 1124 is formed at the bottom of the 1B water flow pipe 1123 to discharge the first treated water (L1) and gas downward. do. As the gas and the first treated water (L1) flow downward along the 1B water flow pipe 1123 toward the 1B water flow pipe outlet 1124, the contact area between the gas and the first treated water (L1) increases, The reaction efficiency between carbon dioxide contained in the gas and sodium carbonate contained in the first treated water (L1) is improved.

The 1B diffusion plate 1125 is located below the 1B water flow pipe outlet 1124 in the first introduction space 1111. The 1B diffusion plate 1125 is inclined radially outward from the center downward to the water channel to widely disperse the first treated water L1 discharged from the 1B water flow pipe outlet 1124 outward.

The first treated water introduction unit supply means 1126 supplies first treated water L1 supplied from the first treated water supply unit (1600 in FIG. 1) to the first introduction space 1111. The first treated water inlet supply means 1126 is located above the first water tank 1117 and supplies the first treated water L1 to the first water tank 1117.

The first microbubble processing unit 1130 processes the gas G11 discharged from the first introduction unit 1110 using microbubbles. The first microbubble processing unit 1130 provides a first microbubble processing space 1131 therein. The first microbubble treatment space 1131 communicates with the first introduction space 1111 through the first connection passage 1190. A first exhaust port 1132 is located at the top of the first microbubble treatment space 1131, and a first treatment space drain 1133 is located at the bottom of the first microbubble treatment space 1131. Gas inside the first microbubble treatment space 1131 is discharged through the first exhaust port 1132. Drainage occurs through the first treatment space drain 1133. The first microbubble treatment space 1131 communicates with the first connection passage 1190 at a position lower than the first exhaust hole 1132 and higher than the first treatment space drain 1133.

In the first microbubble processing space 1131, a 1A gas processing unit 1140 and a 1B gas are arranged sequentially from bottom to top along the height direction between the first connection passage 1190 and the first exhaust port 1132. A processing unit 1160 is provided. The gas (G11) flowing into the first microbubble processing space (1131) through the first connection passage (1190) rises upward and passes through the first A gas processing unit 1140 and the first B gas processing unit 1160 in turn. do.

The 1A gas processing unit 1140 includes a 1A bottom plate 1142, a 1A atomizing unit 1144 installed on the 1A bottom plate 1142, a 1A water level control unit 1150, and a 1A bottom plate 1142. A treated water reaction unit supply means (1157) is provided.

The 1A bottom plate 1142 is plate-shaped and installed substantially horizontally in the internal space of the 1A gas processing unit 1140, and is located above the first connection passage 1190. The internal space of the 1A gas processing unit 1140 is divided into a 1A lower space 1141 and a 1A upper space 1143 with a 1A bottom plate 1142 in between, with the 1A upper space 1141 First treated water (L1) supplied from the first treated water supply unit (1600 in FIG. 1) is stored. A 1A atomizing unit 1144 is installed on the 1A bottom plate 1142.

The 1A atomizing unit 1144 sprays the gas G11 existing in the 1A lower space 1141 into the 1A upper space 1143 where the first treated water L1 is stored. The gas G11 sprayed by the first A atomizing unit 1144 forms micro-bubbles B11 in the first treated water L1. The 1A atomizing unit 1144 includes a 1A gas injection nozzle 1145 that injects gas G11 into the 1A upper space 1143, and a 1A collision plate located at the end of the 1A gas injection nozzle 1145. (1146) is provided. The contact area between the gas and the first treated water (L1) in the 1A upper space (1143) increases due to the microbubbles (B11) formed by the 1A atomizing unit (1146). In addition, the microbubbles (B11) rise more slowly than regular bubbles in the first treated water (L1), so they stay for a longer time. Accordingly, the reaction efficiency between carbon dioxide, a component to be treated, contained in the gas G11 in the first A upper space 1143, and sodium carbonate contained in the first treated water L1 is significantly increased, thereby removing carbon dioxide and producing sodium bicarbonate. Efficiency is also significantly improved.

The 1A gas injection nozzle 1145 is formed to protrude upward from the 1A bottom plate 1142 and is located in the 1A upper space 1143. The gas G11 in the 1A lower space 1141 is injected upward into the 1A upper space 1143 by the 1A gas injection nozzle 1145. As shown, a section is formed in the 1A gas injection nozzle 1145 where the internal passage becomes narrower toward the end where the injection hole is formed so that the speed of the gas increases as the gas flows along the 1A gas injection nozzle 1145. A 1A collision plate 1146 is located adjacent to the end of the 1A gas injection nozzle 1145.

The 1A collision plate 1146 is located in the 1A upper space 1143 adjacent to the end of the 1A gas injection nozzle 1145. The gas G11 sprayed from the 1A gas injection nozzle 1145 strongly collides with the 1A collision plate 1146 submerged in the first treated water L1 to form micro bubbles B11. In this embodiment, the 1A lower collision plate 1146 is described as having a two-stage structure in which the 1A lower collision plate 1147 and the 1A upper collision plate 1148 are arranged sequentially along the height direction, as shown. The present invention is not limited to this, and a single-stage structure or a three-stage or more structure also falls within the scope of the present invention. In the case of a multi-stage structure, the 1A upper collision plate 1148 located above is larger so as to cover the entire 1A lower collision plate 1147 located below, and there is at least one space between the 1A upper collision plates 1148. It is preferable that the first A passage 1149 is formed. Although not shown, in order to adjust the gas processing capacity, the installation height of the 1A collision plate 1146 can be changed to adjust the distance from the 1A gas injection nozzle 1145.

The 1A water level control unit 1150 is located on the side of the 1A upper space 1143 and adjusts the water level of the first treated water (L1) through overflow in the 1A upper space 1143. The 1A water level control unit 1150 is provided with a 1A water level control water tank 1152 that communicates with the 1A upper space 1143 through the first water level control opening 1151 formed on the side wall of the 1A upper space 1143. do. The 1A water level control opening 1151 is located in the 1A upper space 1143 corresponding to the water level control height of the 1A treated water (L1). The first treated water (L1) overflowed from the 1A upper space 1143 is stored in the 1A water level control tank 1152. The first treated water (L1) stored in the 1A water level control tank 1152 is discharged and supplied to the first treated water supply unit (1600 in FIG. 1). The solution discharged from the 1A water level control tank 1152 and supplied to the first treated water supply unit (1600 in FIG. 1) contains produced sodium bicarbonate and unreacted sodium carbonate.

The 1A treated water reaction unit supply means 1157 supplies the first treated water L1 supplied from the first treated water supply unit (1600 in FIG. 1) to the 1A upper space 1143.

The 1B gas processing unit 1160 is located above the 1A gas processing unit 1140, and includes a 1B bottom plate 1162, a 1B atomizing unit 1164 installed on the 1B bottom plate 1162, and , a 1B water level control unit 1170, and a 1B treated water reaction unit supply means 1177.

The 1B bottom plate 1162 is plate-shaped and installed substantially horizontally in the internal space of the 1B gas processing unit 1160. The internal space of the 1B gas processing unit 1160 is divided into a 1B lower space 1161 and a 1B upper space 1163 with the 1B bottom plate 1162 interposed therebetween. The 1B lower space 1161 is in communication with the 1A upper space 1143 of the 1A gas processing unit 1140, and the 1B upper space 1163 is supplied from the first treated water supply unit (1600 in FIG. 1). The first treated water (L1) is stored. The 1B atomizing unit 1164 is installed on the 1B bottom plate 1162.

The 1B atomizing unit 1164 sprays the gas G12 existing in the 1B lower space 1161 into the 1B upper space 1163 where the first treated water L1 is stored. The gas G12 existing in the 1B lower space 1161 is a gas processed in the 1A gas processing unit 1140. The gas G12 sprayed by the first B atomizing unit 1644 forms micro-bubbles B12 in the first treated water L1. The 1B atomizing unit 1164 includes a 1B gas injection nozzle 1165 that injects gas G12 into the 1B upper space 1163, and a 1B collision plate located at the end of the 1B gas injection nozzle 1164. (1166) is provided. The contact area between the gas and the first treated water L1 in the 1B upper space 1163 increases due to the microbubbles B12 formed by the 1B atomizing unit 1644. In addition, the microbubbles (B12) rise more slowly than regular bubbles in the first gas treated water (L1), so they stay for a longer time. Accordingly, the reaction efficiency between carbon dioxide, which is a treatment target component contained in the gas G12, and sodium carbonate contained in the first gas treated water L1 in the first B upper space 1163 is significantly increased, thereby removing carbon dioxide and removing sodium bicarbonate. Generation efficiency is also significantly improved.

The 1B gas injection nozzle 1165 is formed to protrude upward from the 1B bottom plate 1162 and is located in the 1B upper space 1163. The gas G12 in the 1B lower space 1161 is injected upward into the 1B upper space 1163 by the 1B gas injection nozzle 1165. As shown, a section is formed in the 1B gas injection nozzle 1165 where the internal passage becomes narrower toward the end where the injection hole is formed so that the speed of the gas increases as the gas flows along the 1B gas injection nozzle 1165. A 1B collision plate 1166 is located adjacent to the end of the 1B gas injection nozzle 1165.

The 1B collision plate 1166 is located in the 1B upper space 1163 adjacent to the end of the 1B gas injection nozzle 1165. The gas G12 sprayed from the 1B gas injection nozzle 1165 strongly collides with the 1B collision plate 1166 submerged in the first treated water L1 in the 1B upper space 1163, creating micro bubbles B12. is formed. In this embodiment, the 1B collision plate 1166 is described as having a two-stage structure in which the 1B lower collision plate 1167 and the 1B upper collision plate 1168 are arranged sequentially along the height direction, as shown. The present invention is not limited to this, and a single-stage structure or a three-stage or more structure also falls within the scope of the present invention. In the case of a multi-stage structure, the 1B upper collision plate 1168 located above is larger so as to cover the entire 1B lower collision plate 1167 located below, and there is at least one space between the 1B upper collision plates 1168. It is preferable that the 1B passage 1169 is formed. Although not shown, in order to adjust the gas processing capacity, the installation height of the 1B collision plate 1166 can be changed to adjust the distance from the 1B gas injection nozzle 1165.

The 1B water level control unit 1170 is located on the side of the 1B upper space 1163 and adjusts the water level of the first treated water (L1) through overflow in the 1B upper space 1163. The 1B water level control unit 1170 is provided with a 1B water level control water tank 1172 that communicates with the 1B upper space 1163 through the 1B water level control opening 1171 formed on the side wall of the 1B upper space 1163. do. The 1B water level control opening 1171 is located in the 1B upper space 1163 corresponding to the water level control height of the first treated water (L1). The first treated water (L1) overflowed from the 1B upper space 1163 is stored in the 1B water level control tank 1172. The first treated water (L1) stored in the 1B water level control tank 1172 is discharged and supplied to the first treated water supply unit (1600 in FIG. 1). The solution discharged from the 1B water level control tank 1172 and supplied to the first treated water supply unit (1600 in FIG. 1) contains produced sodium bicarbonate and unreacted sodium carbonate.

The 1B treated water reaction unit supply means 1177 supplies the first treated water L1 supplied from the first treated water supply unit (1600 in FIG. 1) to the 1B upper space 1163.

The reaction using microbubbles in the first microbubble processing unit 1130 further promotes the sodium bicarbonate production reaction according to Scheme 3 above.

In the above embodiment, the first microbubble processing unit 1130 is described as having a 1A gas processing unit 1140 and a 1B gas processing unit 1160 arranged sequentially from bottom to top along the height direction, but this is different. Only the 1A gas processing unit 1140 may be provided, or three or more gas processing units may be arranged in succession along the height direction, and this also falls within the scope of the present invention.

The first treated water (L1) discharged through the first introduction space drain 1115 and the first treatment space drain 1133 contains generated sodium bicarbonate and unreacted sodium carbonate, and is supplied to the first treated water supply unit (FIG. 1 of 1600).

The first connection passage 1190 communicates the first introduction space 1111 of the first introduction part 1110 and the first microbubble treatment space 1131 of the first microbubble treatment unit 1130. The first connection passage 1190 is located below the first intake port 1113 and the first exhaust port 1132, and is located above the first introduction space drain 1115 and the first treatment space drain 1133.

Referring to FIG. 1, the second gas processing device 1200 is installed on the gas flow line and converts the primary processing gas (G1) discharged from the first gas processing device (1100) into second treated water (L2). Process it using The primary processing gas (G1) discharged from the first gas processing device 1100 flows into the second gas processing device 1200 by the operation of the gas flow fan 1050 and is processed to produce the secondary processing gas (G2). is discharged from the second gas processing device 1200. The secondary processing gas (G2) discharged from the second gas processing device 1200 flows into the gas-liquid separator 1500. The second treated water (L2) used to treat the first treated gas (G1) in the second gas treatment device 1200 is an aqueous sodium hydroxide solution containing sodium hydroxide (NaOH), which is a second chemical. The second gas treatment device 1200 receives second treated water (L2) containing sodium hydroxide through the second treated water supply unit 1700. The second gas processing device 1200 is also supplied with industrial water. In the second gas processing device 1200, chemical reactions as shown in Scheme 4, Scheme 5, and Scheme 6 below mainly occur.

[Scheme 4]

CO ₂ + H ₂ O → HCO ₃ ^- + H ⁺

[Scheme 5]

H ₂ CO ₃ (aq) + 2NaOH(aq) → Na ₂ CO ₃ (aq) + H ₂ O(l)

[Scheme 6]

CO ₂ (g) + 2NaOH(aq) → Na ₂ CO ₃ (aq) + H ₂ O(l)

That is, carbon dioxide is removed in the second gas processing device 1200 and sodium carbonate (Na ₂ CO ₃ ) is generated. This reaction in which sodium carbonate is produced is an exothermic reaction, and in order to maintain high reaction efficiency, the second treated water (L2) is controlled to maintain a set standard hydrogen ion concentration range and a set standard temperature range. In this embodiment, it is explained that the set standard hydrogen ion concentration range of the second treated water (L2) is 9.5 to 13 pH, and the set standard temperature range is 45 to 60°C.

The second gas processing device 1200 also performs dedusting treatment and acid gas removal functions for the primary treatment gas (G1).

Referring to FIG. 2, which shows the structure of the second gas processing device 1200 in detail, a second introduction portion 1210 through which the first treatment gas (G1) and the second treatment water (L2) flow, and microbubbles ( The second microbubble processing unit 1230 processes the gas (G21) discharged from the second introduction unit 1210 using a micro-bubble, and the second introduction unit 1210 communicates with the second microbubble treatment unit 1230. Shiki is provided with a second connection passage (1290).

First treatment gas (G1) and second treatment water (L2) are introduced into the second introduction part 1210. The second introduction part 1210 provides a second introduction space 1211 formed therein. The second introduction space 1211 communicates with the second microbubble processing unit 1230 through the second passage unit 1290. A second intake port 1213 is located at the top of the second introduction space 1211, and a second introduction space drain 1215 is located at the bottom of the second introduction space 1211. The primary processing gas (G1) flows into the second introduction space (1211) through the second intake port (1213). Drainage is performed through the second introduction space drain 1215. The second introduction space 1211 communicates with the second connection passage 1290 at a position lower than the second intake port 1213 and higher than the second introduction space drain 1215.

In the second introduction space 1211, between the second intake port 1213 and the second introduction space drain 1215, there is a second water tank 1217, a 2A water flow pipe 1219, a 2A diffusion plate 1221, and a second introduction space 1211. A 2B water flow pipe 1223, a 2B diffusion plate 1225, and a second treated water inlet supply means 1226 are installed.

The second water tank 1217 is located adjacent to the bottom of the second intake port 1213 in the second introduction space 1211. The second treated water L2 supplied from the second treated water supply unit (1700 in FIG. 1) is temporarily stored in the second water tank 1217. Industrial water flowing into the second introduction space 1211 may also be temporarily stored in the second water tank 1217. The second treated water (L2) overflowing from the second water tank (1217) flows downward through the second A water flow pipe (1219).

The 2A water flow pipe 1219 is located below the second water tank 1217 in the second introduction space 1211. The 2A water flow pipe 1219 has a shape that narrows as it goes downward, and a 2A water flow pipe outlet 1220 is formed at the bottom of the 2A water flow pipe 1219 to discharge the second treated water (L2) and gas downward. do. As the gas and the second treated water (L2) flow downward along the 2A water flow pipe 1219 toward the 2A water flow pipe outlet 1220, the contact area between the gas and the second treated water (L2) increases, The reaction efficiency between carbon dioxide contained in the gas and sodium hydroxide contained in the second treated water (L2) is improved.

The 2A diffusion plate 1221 is located below the 2A water flow pipe outlet 1220 in the second introduction space 1211. The 2A diffusion plate 1221 is inclined radially outward from the center downward to the water channel to widely disperse the second treated water L2 discharged from the 2A water flow pipe outlet 1220 outward.

The 2B water flow pipe 1223 is located below the 2A diffusion plate 1221 in the second introduction space 1211. The 2B water flow pipe 1223 has a shape that becomes narrower as it goes downward, and a 2B water flow pipe outlet 1224 is formed at the bottom of the 2B water flow pipe 1223 to discharge the second treated water (L2) and gas downward. do. As the gas and the second treated water (L2) flow downward along the 2B water flow pipe 1223 toward the 2B water flow pipe outlet 1224, the contact area between the gas and the second treated water (L2) increases, The reaction efficiency between carbon dioxide contained in the gas and sodium hydroxide contained in the second treated water (L2) is improved.

The 2B diffusion plate 1225 is located below the 2B water flow pipe outlet 1224 in the second introduction space 1211. The 2B diffusion plate 1225 is inclined radially outward from the center downward to the water channel to widely disperse the second treated water L2 discharged from the 2B water flow pipe outlet 1224 outward.

The second treated water introduction unit supply means 1226 supplies the second treated water L2 supplied from the second treated water supply unit (1700 in FIG. 1) to the second introduction space 1211. The second treated water inlet supply means 1226 is located above the second water tank 1217 and supplies the second treated water L2 to the second water tank 1217.

The second microbubble processing unit 1230 processes the gas G21 discharged from the second introduction unit 1210 using microbubbles. The second microbubble processing unit 1230 provides a second microbubble processing space 1231 therein. The second microbubble treatment space 1231 is connected to the second introduction space 1211 through the second connection passage 1290. A second exhaust port 1232 is located at the top of the second microbubble treatment space 1231, and a second treatment space drain 1233 is located at the bottom of the second microbubble treatment space 1231. Gas inside the second microbubble treatment space 1231 is discharged through the second exhaust port 1232. Drainage occurs through the second treatment space drain 1233. The second microbubble treatment space 1231 communicates with the second connection passage 1290 at a position lower than the second exhaust port 1232 and higher than the second treatment space drain 1233.

The second microbubble processing space 1231 is provided with a second gas processing unit 1240 disposed between the second connection passage 1290 and the second exhaust port 1232. The gas G21 flowing into the second microbubble processing space 1231 through the second connection passage 1290 rises upward and passes through the second gas processing unit 1240.

The second gas processing unit 1240 includes a second bottom plate 1242, a second atomizing unit 1244 installed on the second bottom plate 1242, a second water level control unit 1250, and a second bottom plate 1242. A treated water reaction unit supply means (1257) is provided.

The second bottom plate 1242 is plate-shaped and installed substantially horizontally in the internal space of the second gas processing unit 1240, and is located above the second connection passage 1290. The internal space of the second gas processing unit 1240 is divided into a second lower space 1241 and a second upper space 1243 with the second bottom plate 1142 in between, and the second upper space 1241 The second treated water (L2) supplied from the second treated water supply unit (1700 in FIG. 1) is stored. A second atomizing unit 1244 is installed on the 2A bottom plate 1242.

The second atomizing unit 1244 sprays the gas G21 existing in the second lower space 1241 into the second upper space 1243 where the second treated water L2 is stored. The gas G21 sprayed by the second atomizing unit 1244 forms micro-bubbles B2 within the second treated water L2. The second atomizing unit 1244 includes a second gas injection nozzle 1245 that injects gas G2 into the second upper space 1243, and a second collision plate located at the end of the second gas injection nozzle 1245. (1246) is provided. The contact area between the gas and the second treated water L2 in the second upper space 1243 increases due to the microbubbles B2 formed by the second atomizing unit 1246. In addition, microbubbles (B2) rise more slowly than regular bubbles in the second treated water (L2), so they stay for a longer time. Accordingly, the reaction efficiency between carbon dioxide, a component to be treated, contained in the gas G21, and sodium hydroxide contained in the second treated water L2 in the second upper space 1243 is significantly increased, thereby removing carbon dioxide and producing sodium carbonate. Efficiency is also significantly improved.

The second gas injection nozzle 1245 is formed to protrude upward from the second bottom plate 1242 and is located in the second upper space 1243. The gas G21 in the second lower space 1241 is injected upward into the second upper space 1243 by the second gas injection nozzle 1245. As shown, a section is formed in the second gas injection nozzle 1245 where the internal passage becomes narrower toward the end where the injection hole is formed so that the speed of the gas increases as the gas flows along the second gas injection nozzle 1245. A second collision plate 1246 is located adjacent to the end of the second gas injection nozzle 1245.

The second collision plate 1246 is located in the second upper space 1243 adjacent to the end of the second gas injection nozzle 1245. The gas G21 sprayed from the second gas injection nozzle 1245 strongly collides with the second collision plate 1246 submerged in the second treated water L2 to form micro bubbles B2. In this embodiment, the second collision plate 1246 is described as having a two-stage structure in which the second lower collision plate 1247 and the second upper collision plate 1248 are arranged sequentially along the height direction, as shown. The present invention is not limited to this, and a single-stage structure or a three-stage or more structure also falls within the scope of the present invention. In the case of a multi-stage structure, the second upper collision plate 1248 located above is larger so as to cover the entire second lower collision plate 1247 located below, and there is at least one space between the second upper collision plates 1248. It is preferable that the second passage 1249 is formed. Although not shown, in order to adjust the gas processing capacity, the installation height of the second collision plate 1246 can be changed to adjust the distance from the second gas injection nozzle 1245.

The second water level control unit 1250 is located on the side of the second upper space 1243 and adjusts the water level of the second treated water (L2) through overflow in the second upper space 1243. The second water level control unit 1250 is provided with a second water level control water tank 1252 that communicates with the second upper space 1243 through a second water level control opening 1251 formed on the side wall of the second upper space 1243. do. The second water level control opening 1251 is located in the second upper space 1243 to correspond to the water level control height of the second treated water (L2). The second treated water (L2) overflowing from the second upper space (1243) is stored in the second water level control tank (1252). The second treated water (L2) stored in the second water level control tank 1252 is discharged and supplied to the second treated water supply unit (1700 in FIG. 1). The solution discharged from the second water level control tank 1252 and supplied to the second treated water supply unit (1700 in FIG. 1) contains generated sodium carbonate and unreacted sodium hydroxide.

The second treated water reaction unit supply means 1257 supplies the second treated water L2 supplied from the second treated water supply unit (1700 in FIG. 1) to the second upper space 1243.

The reaction using micro-bubbles in the second microbubble processing unit 1230 further promotes the sodium carbonate production reaction according to Scheme 6.

In the above embodiment, the second microbubble processing unit 1230 is described as having one second gas processing unit 1240, but differently from this, a plurality of units may be arranged in series along the height direction, which is also provided in this example. It falls within the scope of the invention.

The second treated water (L2) discharged through the second introduction space drain 1215 and the second treatment space drain 1233 contains generated sodium carbonate and unreacted sodium hydroxide, and is supplied to the second treated water supply unit (FIG. 1 of 1700).

The second connection passage 1290 communicates the second introduction space 1211 of the second introduction part 1210 and the second microbubble treatment space 1231 of the second microbubble treatment unit 1230. The second connection passage 1290 is located below the second intake port 1213 and the second exhaust port 1232, and is located above the second introduction space drain 1215 and the second treatment space drain 1233.

Referring to FIG. 1, a gas-liquid separator 1500 is installed on the gas flow line to separate liquid components from the secondary treatment gas (G2) discharged from the second gas processing device 1200. The liquid component separated in the gas-liquid separator 1500 is supplied to the second treated water supply unit 1700. In this embodiment, the gas-liquid separator 1500 is described as being located upstream of the gas flow fan 1050.

The first treated water supply unit 1600 circulates and supplies first treated water L1 containing sodium carbonate (Na ₂ CO ₃ ), the first chemical, as an aqueous solution to the first gas treatment device 1100. The first treated water supply unit 1600 includes a first treated water storage tank 1610 in which first treated water (L1) is stored, a first chemical storage tank 1650 in which sodium carbonate, the first chemical, is stored in an aqueous solution, and a first chemical storage tank 1650 that stores sodium carbonate as an aqueous solution. It is provided with a first treated water heat exchanger 1680 that adjusts the first treated water L1 supplied to the gas treatment device 1100 to a set reference temperature.

The first treated water storage tank 1610 stores the first treated water L1 discharged from the first gas treatment device 1100 and the sodium carbonate aqueous solution discharged from the second treated water supply unit 1700. The first treated water L1 stored in the first treated water storage tank 1610 is supplied to the first gas treatment device 1100 through the first treated water supply line 1620. In the first treated water storage tank 1610, the first treated water L1 is controlled to maintain the set standard hydrogen ion concentration range and the set standard temperature range. Industrial water may be supplied to the first treated water storage tank 1610. As the first treated water (L1) stored in the first treated water storage tank (1610) is circulated and supplied to the first gas treatment device (1100), the content of sodium bicarbonate generated in the first treated water (L1) increases. In addition, the first treated water (L1) stored in the first treated water storage tank 1610 contains microbubbles discharged from the first gas treatment device 1100, so that carbon dioxide and sodium carbonate also exist in the first treated water storage tank 1610. The reaction may produce sodium bicarbonate. The first treated water storage tank 1610 may be integrally formed by being coupled to the first gas processing device 1100. The first treated water (L1) containing sodium bicarbonate stored in the first treated water storage tank (1610) is supplied to the solid-liquid separation filter (1800).

The first chemical storage tank 1650 stores the first chemical, sodium carbonate, as an aqueous solution. The sodium carbonate aqueous solution stored in the first chemical storage tank 1650 is supplied to the first chemical mixer 1622 installed on the first treated water supply line 1620, so that the first chemical, sodium carbonate, is added to the first treated water (L1). is added. The aqueous solution of sodium carbonate, which is the first chemical, is uniformly mixed with the first treated water (L1) flowing along the first treated water supply line 1620 in the first chemical mixer 1622, thereby improving reactivity. In this embodiment, it is explained that a line mixer is used as the first chemical mixer 1622. Supply of the sodium carbonate aqueous solution by the first chemical storage tank 1650 can be performed only at the beginning of operation of the exhaust gas treatment facility 1000, and thereafter, only the sodium carbonate generated in the second gas processing device 1200 can be used.

The first treated water heat exchanger 1680 lowers the temperature of the first treated water (L1) supplied to the first gas treatment device 1100 on the first treated water supply line 1620 and maintains it at a set reference temperature. 1 Improves sodium bicarbonate production reaction efficiency in the gas processing device 1100. The first treated water heat exchanger 1680 exchanges heat with the first treated water L1 discharged from the first treated water storage tank 1610 with cold water. The first treated water heat exchanger 1680 is located upstream of the first chemical mixer 1622 in the first treated water supply line 1620.

The second treated water supply unit 1700 supplies second treated water L2 containing sodium hydroxide (NaOH), a second chemical, as an aqueous solution to the second gas treatment device 1200. The second treated water supply unit 1700 includes a second treated water storage tank 1710 that stores second treated water (L2), a second chemical storage tank 1750 that stores sodium hydroxide, a second chemical, in an aqueous solution, and a second chemical storage tank 1750 that stores sodium hydroxide as an aqueous solution. 2. It is provided with a second treated water heat exchanger (1780) that adjusts the second treated water (L2) supplied to the gas treatment device (1200) to a set reference temperature.

The second treated water storage tank 1710 stores the second treated water L2 discharged from the second gas treatment device 1200. In the second treated water storage tank 1710, the second treated water (L2) is controlled to maintain the set standard hydrogen ion concentration range and the set standard temperature range. The second treated water storage tank 1710 also stores a liquid component containing sodium carbonate discharged from the gas-liquid separator 1500. The second treated water (L2) stored in the second treated water storage tank 1710 is supplied to the second gas treatment device 1200 through the second treated water supply line 1720. Industrial water may be supplied to the second treated water storage tank 1710. As the second treated water (L2) stored in the second treated water storage tank (1710) is circulated and supplied to the second gas treatment device (1200), the content of sodium carbonate generated in the second treated water (L2) increases, The treated water (L2) ultimately becomes a sodium carbonate aqueous solution, and the second treated water (L2) of the sodium carbonate aqueous solution stored in the second treated water storage tank (1710) is the first treated water storage tank (1610) of the first treated water supply unit (1600). ) is supplied. In this embodiment, the supply of the second treated water (L2) stored in the second treated water storage tank 1710 to the first treated water storage tank 1610 is explained by using natural discharge due to its own weight. In addition, the second treated water (L2) stored in the second treated water storage tank 1710 includes microbubbles discharged from the second gas treatment device 1200, so that the second treated water storage tank 1710 also contains carbon dioxide and sodium hydroxide. This reaction can produce sodium carbonate. The second treated water storage tank 1710 may be integrally formed by being coupled to the second gas processing device 1200.

The second chemical storage tank 1750 stores the second chemical, sodium hydroxide, as an aqueous solution. The sodium hydroxide aqueous solution stored in the second chemical storage tank 1750 is supplied to the second chemical mixer 1722 installed on the second treated water supply line 1720, and the second chemical, hydroxide, is added to the second treated water (L2). Sodium is added. The second chemical, an aqueous sodium hydroxide solution, is uniformly mixed with the second treated water (L2) flowing along the second treated water supply line 1720 in the second chemical mixer 1722, thereby improving reactivity. In this embodiment, it is explained that a line mixer is used as the second chemical mixer 1722.

The second treated water heat exchanger 1780 lowers the temperature of the second treated water (L2) supplied to the second gas treatment device 1200 on the second treated water supply line 1720 and maintains it at a set reference temperature. 2 Improves sodium carbonate production reaction efficiency in the gas processing device 1200. The second treated water heat exchanger 1780 heat-exchanges the second treated water (L2) discharged from the second treated water storage tank 1710 with cold water. The second treated water heat exchanger 1780 is located upstream of the second chemical mixer 1722 in the second treated water supply line 1720.

The solid-liquid separation filter 1800 separates solid components including sodium bicarbonate from the first treated water (L1) discharged from the first treated water reservoir 1610. The solid-liquid separation filter 1800 may be a solid-liquid separator of a typical configuration. The solid component separated from the first treated water (L1) discharged from the first treated water reservoir 1610 by the solid-liquid separation filter 1800 forms a sodium bicarbonate cake. Sodium bicarbonate produced by the solid-liquid separation filter 1800 can be used to remove acid gas contained in an incinerator or flue gas. The solution of the liquid component containing sodium carbonate discharged from the solid-liquid separation filter 1800 is supplied to the chemical recovery tank 1900 and stored.

The chemical recovery tank 1900 stores the solution of the liquid component discharged from the solid-liquid separation filter 1800. The solution stored in the drug recovery tank 1900 contains an aqueous solution of sodium carbonate, which is the first drug. The solution containing sodium carbonate stored in the chemical recovery tank 1900 is supplied to the first treated water storage tank 1610.

Now, with reference to FIGS. 2 and 3 , the operation process of the first gas processing device 1100 and the second gas processing device 1200 will be described as follows. FIG. 3 shows the states of the first gas processing device 1100 and the second gas processing device 1200 when the gas flow fan (1050 in FIG. 1) does not operate before processing the exhaust gas. It is done. Referring to FIG. 3, the water level of the first treated water (L1) in the 1A gas processing unit 1140 of the first gas processing device 1100 is below the end where the injection hole of the 1A gas injection nozzle 1145 is located. is located, and the water level of the first treated water (L1) in the 1B gas processing unit 1160 of the first gas processing device 1100 is located below the end where the injection hole of the 1B gas injection nozzle 1165 is located. , the first treated water (L1) does not leak downward through the 1A gas injection nozzle 1145 and the 1B gas injection nozzle 1165. In addition, the water level of the second treated water (L2) in the second gas processing unit 1240 of the second gas processing device 1200 is located below the end where the injection port of the second gas injection nozzle 1245 is located, The second treated water (L2) does not leak downward through the second gas injection nozzle (1245).

When the gas flow fan (1050 in FIG. 1) operates in the state shown in FIG. 3, the gas in the second lower space 1241 is discharged from the second gas processing device 1200 through the second gas injection nozzle 1245. 2 The gas in the 1B lower space 1161 is injected into the upper space 1243 through the 1B gas injection nozzle 1165 from the first gas processing device 1100 in communication with the second gas processing device 1200. It is injected into the 1B upper space 1163, and the gas in the 1A lower space 1141 is injected into the 1A upper space 1143 through the 1A gas injection nozzle 1145. In this state, the first treated water supply unit (1600 in FIG. 1) and the second treated water supply unit (1700 in FIG. 1) operate, so that the first treated water (L1) is supplied to the first gas treatment device (1100) and the second treated water supply unit (1700 in FIG. 1) operates. 2 When the treated water (L2) is supplied to the second gas processing device 1200, the 1A upper space 1143 and the 1B upper space 1163 of the first gas processing device 1100 as shown in FIG. In each case, the water level of the first treated water (L1) is high enough to form microbubbles (B11, B12), and the second treated water ( The water level of L2) becomes high enough for microbubbles (B2) to be formed. The level of the first treated water (L1) in each of the 1A upper space 1143 and the 1B upper space 1163 of the first gas processing device 1100 is controlled by the 1A water level control unit 1150 and the 1B water level control unit. The level of the second treated water L2 in the second upper space 1243 of the second gas processing device 1200 is appropriately maintained by the second water level control unit 1250 .

Figure 4 shows a schematic configuration of an exhaust gas treatment facility according to another embodiment of the present invention. Referring to FIG. 4, an exhaust gas treatment facility 2000 according to another embodiment of the present invention efficiently produces sodium bicarbonate (NaHCO ₃ ) while removing carbon dioxide (CO ₂ ) contained in the exhaust gas (G0) to be treated. It is a facility that includes a gas flow fan 1050 that creates a flow pressure in the gas on the gas flow line, and is installed on the gas flow line to treat the exhaust gas (G0) to be treated using the first treated water (L1). a first gas processing device 2100, which is installed on the gas flow line and processes the primary processing gas G1 discharged from the first gas processing device 2100 using second processing water L2. A second gas processing device 2200, a gas-liquid separator 1500 installed on the gas flow line to separate a liquid component from the secondary processing gas (G2) discharged from the second gas processing device 2200, and a second gas-liquid separator 1500. 1 A first treated water supply unit 2600 that supplies first treated water (L1) to the gas treatment device 2100, and a second treatment device that supplies second treated water (L2) to the second gas treatment device 2200. A water supply unit 2700, a solid-liquid separation filter 1800 that separates solid components including sodium bicarbonate from the second treated water (L2), and a chemical recovery tank in which the liquid components discharged from the solid-liquid separation filter 1800 are stored. Includes (2900).

Gas flow fan 1050 creates flow pressure in the gas on the gas flow line. Since the configuration and operation of the gas flow fan 1050 are the same as the gas flow fan 1050 described in the embodiment of FIG. 1, detailed description thereof is omitted here.

The first gas processing device 2100 is installed on the gas flow line and processes the exhaust gas G0 to be treated using first treatment water L1. The exhaust gas (G0) to be treated flows into the first gas processing device (2100) by the operation of the gas flow fan (1050), is processed, and is then discharged from the first gas processing device (2100) as the primary processing gas (G1). do. The primary processing gas (G1) discharged from the first gas processing device 2100 flows into the second gas processing device 2200. The first treated water L1 used to treat the exhaust gas G0 to be treated in the first gas treatment device 2100 is an aqueous sodium hydroxide solution containing sodium hydroxide (NaOH), which is the first chemical. The first gas treatment device 2100 receives first treated water L1 containing sodium hydroxide through the first treated water supply unit 2600. The first gas processing device 2100 is also supplied with industrial water. In the first gas processing device 2100, chemical reactions such as Scheme 4, Scheme 5, and Scheme 6 described above mainly occur. That is, carbon dioxide is removed in the first gas processing device 2100 and sodium carbonate (Na ₂ CO ₃ ) is generated. Carbon dioxide that is not removed from the first gas processing device 2100 is included in the primary processing gas G1 and flows into the second gas processing device 2200. The first gas processing device 2100 also performs dedusting treatment and acid gas removal functions for the exhaust gas G0 to be treated. Since the specific configuration of the first gas processing device 2100 is substantially the same as the configuration of the first gas processing device 1100 described in the embodiment of FIG. 2, detailed description thereof is omitted here.

The second gas processing device 2200 is installed on the gas flow line and processes the primary treatment gas (G1) discharged from the first gas processing device (2100) using second treatment water (L2). The primary treatment gas (G1) discharged from the second gas processing device 2100 flows into the second gas processing device 2200 by the operation of the gas flow fan 1050 and is processed, and then becomes the secondary processing gas (G2). is discharged from the second gas processing device 2200. The secondary processing gas (G2) discharged from the second gas processing device 2200 flows into the gas-liquid separator 1500. The second treated water (L2) used to treat the primary treated gas (G1) in the second gas treatment device 2200 is an aqueous sodium carbonate solution containing sodium carbonate (Na ₂ CO ₃ ), which is a second chemical. The second gas treatment device 2200 receives second treated water (L2) containing sodium carbonate through the second treated water supply unit 2700. The second gas processing device 2200 is also supplied with industrial water. In the second gas processing device 2200, chemical reactions such as Scheme 1, Scheme 2, and Scheme 3 described above mainly occur. That is, carbon dioxide is removed in the second gas processing device 2200 and sodium bicarbonate (NaHCO ₃ ) is generated. The second gas processing device 2200 also performs dedusting treatment and acid gas removal functions for the primary treatment gas (G1). Since the specific configuration of the second gas processing device 2200 is substantially the same as the configuration of the second gas processing device 1200 described in the embodiment of FIG. 2, detailed description thereof is omitted here.

The gas-liquid separator 1500 is installed on the gas flow line to separate the liquid component from the secondary treatment gas (G2) discharged from the second gas processing device 2200. The liquid component separated in the gas-liquid separator 1500 is supplied to the second treated water supply unit 2700. In this embodiment, the gas-liquid separator 1500 is described as being located upstream of the gas flow fan 1050.

The first treated water supply unit 2600 circulates and supplies first treated water L1 containing sodium hydroxide (NaOH), the first chemical, as an aqueous solution to the first gas treatment device 2100. The first treated water supply unit 2600 includes a first treated water storage tank 2610 in which first treated water L1 is stored, a first chemical storage tank 2650 in which sodium hydroxide, the first chemical, is stored in an aqueous solution, and 1 It is provided with a first treated water heat exchanger 2680 that adjusts the temperature of the first treated water L1 supplied to the gas treatment device 2100 to a set reference temperature.

The first treated water storage tank 2610 stores the first treated water L1 discharged from the first gas treatment device 2100. In the first treated water storage tank 2610, the first treated water (L1) is controlled to maintain the set standard hydrogen ion concentration range and the set standard temperature range. In this embodiment, the set standard hydrogen ion concentration range of the first treated water (L1) is 9.5 to 13 pH, and the set standard temperature range is 45 to 60°C. The first treated water L1 stored in the first treated water storage tank 2610 is supplied to the first gas treatment device 2100 through the first treated water supply line 2620. Industrial water may be supplied to the first treated water storage tank 2610. As the first treated water (L1) stored in the first treated water storage tank (2610) is circulated and supplied to the first gas treatment device (2100), the content of sodium carbonate generated in the first treated water (L1) increases, The treated water (L1) ultimately becomes an aqueous sodium carbonate solution, and the first treated water (L1) of the aqueous sodium carbonate solution stored in the first treated water storage tank (2610) is supplied to the second treated water supply unit (2700). In addition, the first treated water (L1) stored in the first treated water storage tank 2610 includes microbubbles discharged from the first gas treatment device 2100, so that the first treated water storage tank 2610 also contains carbon dioxide and sodium hydroxide. This reaction can produce sodium carbonate. The first treated water storage tank 2610 may be integrally formed by being coupled to the first gas processing device 1100.

The first chemical storage tank 2650 stores the first chemical, sodium hydroxide, as an aqueous solution. The sodium hydroxide aqueous solution stored in the first chemical storage tank 2650 is supplied to the first chemical mixer 2622 installed on the first treated water supply line 2620, and the first chemical, hydroxide, is added to the first treated water (L1). Sodium is added. The aqueous solution of sodium hydroxide, which is the first chemical, is uniformly mixed with the first treated water (L1) flowing along the first treated water supply line 2620 in the first chemical mixer 2622, thereby improving reactivity. In this embodiment, it is explained that a line mixer is used as the first chemical mixer 2622.

The first treated water heat exchanger 2680 is installed on the first treated water supply line 2620 to lower the temperature of the first treated water (L1) supplied to the first gas treatment device 2100 to the set reference temperature. By maintaining this, the efficiency of the sodium carbonate production reaction in the first gas processing device 2100 is improved. The first treated water heat exchanger 2680 exchanges heat with the first treated water L1 discharged from the first treated water storage tank 2610 with cold water. The first treated water heat exchanger 2680 is located upstream from the point where the sodium hydroxide aqueous solution is supplied by the first chemical storage tank 2650 in the first treated water supply line 2620.

The second treated water supply unit 2700 supplies second treated water L2 containing sodium carbonate (Na ₂ CO ₃ ), a second chemical, as an aqueous solution to the second gas treatment device 2200. The second treated water supply unit 2700 includes a second treated water storage tank 2710 in which second treated water (L2) is stored, a second chemical storage tank 2750 in which sodium carbonate, a second chemical, is stored in an aqueous solution, and a second chemical It is provided with a second treated water heat exchanger 2780 that adjusts the temperature of the second treated water L2 supplied to the gas treatment device 2200 to a set reference temperature.

The second treated water storage tank 2710 stores the second treated water (L2) discharged from the second gas treatment device 2200 and the sodium carbonate aqueous solution discharged from the first treated water storage tank 2610. In this embodiment, the supply of the sodium carbonate aqueous solution discharged from the first treated water storage tank 2610 to the second treated water storage tank 2710 is explained by using natural discharge due to its own weight. In the second treated water storage tank 2710, the second treated water (L2) is controlled to maintain the set standard hydrogen ion concentration range and the set standard temperature range. In this embodiment, the set standard hydrogen ion concentration range of the second treated water (L2) is 9.5 to 12 pH, and the set standard temperature range is 10 to 25°C. The second treated water storage tank 2710 also stores a liquid component containing sodium carbonate discharged from the gas-liquid separator 1500. The second treated water (L2) stored in the second treated water storage tank 2710 is supplied to the second gas treatment device 2200 through the second treated water supply line 2720. Industrial water may be supplied to the second treated water storage tank 2710. As the second treated water (L2) stored in the second treated water storage tank (2710) is circulated and supplied to the second gas treatment device (2200), the content of sodium bicarbonate generated in the second treated water (L2) increases. In addition, the second treated water (L2) stored in the second treated water storage tank 2710 contains microbubbles discharged from the second gas treatment device 3200, so that carbon dioxide and sodium carbonate are also released in the second treated water storage tank 2710. The reaction may produce sodium bicarbonate. The second treated water storage tank 2710 may be integrally formed by being coupled to the second gas processing device 2200. The second treated water (L2) containing sodium bicarbonate stored in the second treated water storage tank (2710) is supplied to the solid-liquid separation filter (1800).

The second chemical storage tank 2750 stores the second chemical, sodium carbonate, as an aqueous solution. The sodium carbonate aqueous solution stored in the second chemical storage tank 2750 is supplied to the second chemical mixer 2722 installed on the second treated water supply line 2720, so that the second chemical, sodium carbonate, is added to the second treated water (L2). is added. The second chemical, an aqueous sodium carbonate solution, is uniformly mixed with the second treated water (L2) flowing along the second treated water supply line 2720 in the second chemical mixer 2622, thereby improving reactivity. In this embodiment, it is explained that a line mixer is used as the second chemical mixer 2722. Supply of the sodium carbonate aqueous solution by the second chemical storage tank 2750 can be performed only at the beginning of operation of the exhaust gas treatment facility 2000, and thereafter, only the sodium carbonate generated in the first gas processing device 2100 can be used.

The second treated water heat exchanger 2780 is installed on the second treated water supply line 2720 to lower the temperature of the second treated water (L2) supplied to the second gas treatment device 2200 to the set reference temperature. By maintaining this, the efficiency of the sodium bicarbonate production reaction in the second gas processing device 2200 is improved. The second treated water heat exchanger 2780 heat-exchanges the second treated water (L2) discharged from the second treated water storage tank 2710 with cold water. The second treated water heat exchanger 2780 is located upstream from the point where the sodium carbonate aqueous solution is supplied by the second chemical storage tank 2750 in the second treated water supply line 2720.

The solid-liquid separation filter 1800 separates solid components including sodium bicarbonate from the second treated water (L2) discharged from the second treated water reservoir 2710. The solid-liquid separation filter 1800 may be a solid-liquid separator of a typical configuration. Since the configuration and operation of the solid-liquid separation filter 1800 are the same as the solid-liquid separation filter 1800 of the embodiment shown in FIG. 1, detailed description thereof is omitted here.

The chemical recovery tank 2900 stores the solution of the liquid component discharged from the solid-liquid separation filter 1800. The solution stored in the drug recovery tank 2900 contains sodium carbonate, the first drug. The solution containing sodium carbonate stored in the chemical recovery tank 2900 is supplied to the second treated water storage tank 2710.

Figure 5 shows a schematic configuration of an exhaust gas treatment facility according to another embodiment of the present invention. Referring to FIG. 5, an exhaust gas treatment facility 3000 according to another embodiment of the present invention efficiently removes sodium bicarbonate (NaHCO ₃ ) while removing carbon dioxide (CO ₂ ) contained in the exhaust gas (G0) to be treated. A manufacturing facility comprising: a first gas flow fan (1050a) that creates a flow pressure in the gas on a first gas flow line, a second gas flow fan (1050b) that creates a flow pressure in the gas on a second gas flow line, and , a first gas processing device 3100 installed on the first gas flow line to treat the first exhaust gas (G01) to be treated using first treatment water (L1), and a first gas treatment device (3100) on the second gas flow line. a second gas processing device 3200 installed on the first gas flow line to process the second exhaust gas G02 using second treatment water L2; and a first gas processing device 3200 installed on the first gas flow line. A first gas-liquid separator (1500a) that separates the liquid component from the first processing gas (G1) discharged from (3100), and a first gas-liquid separator (1500a) installed on the second gas flow line and discharged from the second gas processing device (3200). 2 A second gas-liquid separator (1500b) that separates the liquid component from the treatment gas (G2), a first treated water supply unit (2600) that supplies first treated water (L1) to the first gas treatment device (3100), A second treated water supply unit 2700 that supplies second treated water (L2) to the second gas treatment device (3200), and a solid-liquid separation filter that separates solid components including sodium bicarbonate from the second treated water (L2). It includes (1800) and a chemical recovery tank (1900) in which the liquid component discharged from the solid-liquid separation filter (1800) is stored.

The first gas flow fan 1050a creates a flow pressure in the gas on the first gas flow line. In this embodiment, the first gas flow fan 1050a is described as being located downstream of the first gas processing device 3100 on the first gas flow line, but the present invention is not limited thereto. The first gas flow fan 1050a may be located upstream of the first gas processing device 3100, and is also within the scope of the present invention. By operating the first gas flow fan 1050a, gas flows sequentially through the first gas processing device 3100 and the first gas-liquid separator 1500a.

The second gas flow fan 1050b creates a flow pressure in the gas on the second gas flow line. In this embodiment, the second gas flow fan 1050b is described as being located downstream of the second gas processing device 3200 on the second gas flow line, but the present invention is not limited thereto. The second gas flow fan 1050b may be located upstream of the second gas processing device 3200, and is also within the scope of the present invention. By operating the second gas flow fan 1050b, gas flows sequentially through the second gas processing device 3200 and the second gas-liquid separator 1500b.

The first gas processing device 3100 is installed on the first gas flow line and processes the first exhaust gas to be treated (G01) using first treated water (L1). The first exhaust gas to be treated (G01) flows into the first gas processing device 3100 by the operation of the first gas flow fan 1050a, is processed, and then is discharged into the first gas processing device (G1) as the first processing gas (G1). 3100). The first processing gas G1 discharged from the first gas processing device 3100 flows into the first gas-liquid separator 1500a. The first treated water L1 used to treat the exhaust gas G01 to be treated in the first gas treatment device 3100 is an aqueous sodium hydroxide solution containing sodium hydroxide (NaOH), which is the first chemical. The first gas treatment device 3100 receives first treated water L1 containing sodium hydroxide through the first treated water supply unit 2600. The first gas processing device 3100 is also supplied with industrial water. In the first gas processing device 3100, chemical reactions such as Scheme 4, Scheme 5, and Scheme 6 described above mainly occur. That is, carbon dioxide is removed in the first gas processing device 3100 and sodium carbonate (Na ₂ CO ₃ ) is generated. This reaction in which sodium carbonate is produced is an exothermic reaction, and in order to maintain high reaction efficiency, the first treated water (L1) is controlled to maintain a set standard hydrogen ion concentration range and a set standard temperature range. In this embodiment, the set standard hydrogen ion concentration range of the first treated water (L1) is 9.5 to 13 pH, and the set standard temperature range is 45 to 60°C. The first gas processing device 3100 also performs dedusting treatment and miscellaneous gas removal functions on the first exhaust gas (G01) to be treated.

Referring to Figures 6 and 7, which specifically show the structure of the first gas processing device 3100, the first gas processing device 3100 includes a first exhaust gas to be treated (G01) and a first treated water (L1). A first introduction part 3110 into which gas flows in, a first microbubble processing part 3130 that processes the gas (G11) discharged from the first introduction part 3110 using micro-bubbles, and a first introduction part It is provided with a first connection passage 3190 that communicates 3110 with the first microbubble treatment unit 3130.

The first exhaust gas to be treated (G01) and the first treated water (L1) are introduced into the first inlet 3110. The first introduction part 3110 provides a first introduction space 3111 formed therein. The first introduction space 3111 communicates with the first microbubble processing unit 3130 through the first passage part 3190. A first intake port 3113 is located at the top of the first introduction space 3111, and a first introduction space drain 3115 is located at the bottom of the first introduction space 3111. The first exhaust gas to be treated (G01) flows into the first introduction space 3111 through the first intake port 3113. Drainage occurs through the first introduction space drain 3115. The first introduction space 3111 communicates with the third connection passage 3190 at a position lower than the first intake port 3113 and higher than the first introduction space drain 3115.

In the first introduction space 3111, between the first intake port 3113 and the first introduction space drain 3115, there is a first water tank 3117, a 1A water flow pipe 3119, a 1A diffusion plate 3121, and a 1st introduction space 3111. A 1B water flow pipe 3123, a 1B diffusion plate 3125, and a first treated water inlet supply means 3126 are installed.

The first water tank 3117 is located adjacent to the bottom of the first intake port 3113 in the first introduction space 3111. The first treated water L1 supplied from the first treated water supply unit (2600 in FIG. 5) is temporarily stored in the first water tank 3117. Industrial water flowing into the first introduction space 3111 may also be temporarily stored in the first water tank 3117. The first treated water (L1) overflowing from the first water tank (3117) flows downward through the first A water flow pipe (3119).

The 1A water flow pipe 3119 is located below the first water tank 3117 in the first introduction space 3111. The 1A water flow pipe 3119 has a shape that becomes narrower as it goes downward, and a 1A water flow pipe outlet 3120 is formed at the bottom of the 1A water flow pipe 3119 to discharge the first treated water (L1) and gas downward. do. As the gas and the first treated water (L1) flow downward along the 1A water flow pipe 3119 toward the 1A water flow pipe outlet 3120, the contact area between the gas and the first treated water (L1) increases, The reaction efficiency between carbon dioxide contained in the gas and sodium hydroxide contained in the first treated water (L1) is improved.

The 1A diffusion plate 3121 is located below the 1A water flow pipe outlet 3120 in the first introduction space 3111. The 1A diffusion plate 3121 is inclined radially outward from the center downward to the water channel to widely disperse the first treated water L1 discharged from the 1A water flow pipe outlet 3120 outward.

The 1B water flow pipe 3123 is located below the 1A diffusion plate 3121 in the first introduction space 3111. The 1B water flow pipe 3123 has a shape that becomes narrower as it goes downward, and a 1B water flow pipe outlet 3124 is formed at the bottom of the 1B water flow pipe 3123 to discharge the first treated water (L1) and gas downward. do. As the gas and the first treated water (L1) flow downward along the 1B water flow pipe 3123 toward the 1B water flow pipe outlet 3124, the contact area between the gas and the first treated water (L1) increases, The reaction efficiency between carbon dioxide contained in the gas and sodium hydroxide contained in the first treated water (L1) is improved.

The 1B diffusion plate 3125 is located below the 1B water flow pipe outlet 3124 in the first introduction space 3111. The 1B diffusion plate 3125 is inclined radially outward from the center downward to the water channel to widely disperse the first treated water L1 discharged from the 1B water flow pipe outlet 3124 outward.

The first treated water introduction unit supply means 3126 supplies the first treated water L1 supplied from the first treated water supply unit (2600 in FIG. 5) to the first introduction space 3111. The first treated water inlet supply means 3126 is located above the first water tank 3117 and supplies the first treated water L1 to the first water tank 3117.

The first microbubble processing unit 3130 processes the gas G11 discharged from the first introduction unit 3110 using microbubbles. The first microbubble treatment unit 3130 provides a first microbubble treatment space 3131 therein. The first microbubble treatment space 3131 communicates with the first introduction space 3111 through a first connection passage 3190. A first exhaust port 3132 is located at the top of the first microbubble treatment space 3131, and a first treatment space drain 3133 is located at the bottom of the first microbubble treatment space 3131. Gas inside the first microbubble treatment space 3131 is discharged through the first exhaust port 3132. Drainage occurs through the first treatment space drain 3133. The first microbubble treatment space 3131 communicates with the first connection passage 3190 at a position lower than the first exhaust port 3132 and higher than the first treatment space drain 3133.

The first microbubble processing space 3131 is provided with a first gas processing unit 3140 disposed between the first connection passage 3190 and the first exhaust port 3132. The gas G11 flowing into the first microbubble processing space 3131 through the first connection passage 3190 rises upward and sequentially passes through the first gas processing unit 3140.

The first gas processing unit 3140 includes a first bottom plate 3142, a first atomizing unit 3144 installed on the first bottom plate 3142, a first water level control unit 3150, and a first A treated water reaction unit supply means (3157) is provided.

The first bottom plate 3142 is plate-shaped and installed substantially horizontally in the internal space of the first gas processing unit 3140, and is located above the first connection passage 3190. The internal space of the first gas processing unit 3140 is divided into a first lower space 3141 and a first upper space 3143 with a first bottom plate 3142 in between, and the first upper space 3141 First treated water (L1) supplied from the first treated water supply unit (2600 in FIG. 5) is stored. A first atomizing unit 3144 is installed on the first bottom plate 3142.

The first atomizing unit 3144 sprays the gas G11 existing in the first lower space 3141 into the first upper space 3143 where the first treated water L1 is stored. The gas G11 sprayed by the first atomizing unit 3144 forms micro-bubbles B1 within the first treated water L3. The first atomizing unit 3144 includes a first gas injection nozzle 3145 that sprays gas G11 into the first upper space 3143, and a first collision plate located at the end of the first gas injection nozzle 3145. (3146) is provided. The contact area between the gas and the first treated water (L1) in the first upper space (3143) increases due to the microbubbles (B1) formed by the first atomizing unit (3146). In addition, microbubbles (B1) rise more slowly than regular bubbles in the first treated water (L1), so they stay for a longer time. Accordingly, the reaction efficiency between carbon dioxide, which is a component to be treated contained in the gas G11, and sodium hydroxide contained in the first treated water L1 in the first upper space 3143 is significantly increased, thereby removing carbon dioxide and producing sodium carbonate. Efficiency is also significantly improved.

The first gas injection nozzle 3145 is formed to protrude upward from the first bottom plate 3142 and is located in the first upper space 3143. The gas G11 in the first lower space 3141 is injected upward into the first upper space 3143 by the first gas injection nozzle 3145. As shown, a section is formed in the first gas injection nozzle 3145 where the internal passage becomes narrower toward the end where the injection hole is formed so that the speed of the gas increases as the gas flows along the first gas injection nozzle 3145. A first collision plate 3146 is located adjacent to the end of the first gas injection nozzle 3145.

The first collision plate 3146 is located in the first upper space 3143 adjacent to the end of the first gas injection nozzle 3145. The gas (G11) sprayed from the first gas injection nozzle (3145) strongly collides with the first collision plate (3146) submerged in the first treated water (L1) to form micro bubbles (B1). In this embodiment, the first collision plate 3146 is described as having a two-stage structure in which the first lower collision plate 3147 and the first upper collision plate 3148 are arranged sequentially along the height direction, as shown. The present invention is not limited to this, and a single-stage structure or a three-stage or more structure also falls within the scope of the present invention. In the case of a multi-stage structure, the first upper collision plate 3148 located above is larger to cover the entire first lower collision plate 3147 located below, and at least one collision plate is located between the first upper collision plates 3148. It is preferable that the first passage 3149 is formed. Although not shown, in order to adjust the gas processing capacity, the installation height of the first collision plate 3146 may be changed to adjust the distance from the first gas injection nozzle 3145.

The first water level control unit 3150 is located on the side of the first upper space 3143 and adjusts the water level of the first treated water L1 through overflow in the first upper space 3143. The first water level control unit 3150 is provided with a first water level control water tank 3152 that communicates with the first upper space 3143 through a first water level control opening 3151 formed on the side wall of the first upper space 3143. do. The first water level control opening 3151 is located in the first upper space 3143 to correspond to the water level control height of the first treated water (L1). The first treated water (L1) that overflowed from the first upper space (3143) is stored in the first water level control tank (3152). The first treated water (L1) stored in the first water level control tank 3152 is discharged and supplied to the first treated water supply unit (2600 in FIG. 5). The solution discharged from the first water level control tank 3152 and supplied to the first treated water supply unit (2600 in FIG. 5) contains produced sodium carbonate and unreacted sodium hydroxide.

The first treated water reaction unit supply means 3157 supplies the first treated water L1 supplied from the first treated water supply unit (2600 in FIG. 5) to the first upper space 3143.

In the above embodiment, the first microbubble processing unit 3130 is described as having one first gas processing unit 3140, but differently from this, a plurality of units may be arranged in series along the height direction, which is also provided in this example. It falls within the scope of the invention.

The first treated water (L1) discharged through the first introduction space drain 3115 and the first treatment space drain 3133 contains generated sodium carbonate and unreacted sodium hydroxide, and is supplied to the first treated water supply unit (FIG. 5 of 2600).

The first connection passage 3190 communicates the first introduction space 3111 of the first introduction part 3110 and the first microbubble treatment space 3131 of the first microbubble treatment unit 3130. The first connection passage 3190 is located below the first intake port 3113 and the first exhaust port 3132, and is located above the first introduction space drain 3115 and the first treatment space drain 3133.

Referring to FIG. 5, the second gas processing device 3200 is installed on the second gas flow line and processes the second exhaust gas (G02) to be treated using the second treated water (L2). The second exhaust gas to be treated (G02) flows into the second gas processing device 3200 by the operation of the second gas flow fan 1050b, is processed, and then is processed as the second processing gas (G2) by the second gas processing device ( 3200). The second processing gas G2 discharged from the second gas processing device 3200 flows into the second gas-liquid separator 1500b. The second treated water (L2) used to treat the exhaust gas (G02) to be treated in the second gas treatment device 3200 is an aqueous sodium carbonate solution containing sodium carbonate (Na ₂ CO ₃ ), which is the second chemical. The second gas treatment device 3200 receives second treated water (L2) containing sodium carbonate through the second treated water supply unit 2700. The second gas processing device 3200 is also supplied with industrial water. In the second gas processing device 3200, chemical reactions such as Scheme 1, Scheme 2, and Scheme 3 mainly occur. That is, carbon dioxide is removed in the second gas processing device 3200 and sodium bicarbonate (NaHCO ₃ ) is generated. This reaction in which sodium bicarbonate is produced is an exothermic reaction, and in order to maintain high reaction efficiency, the second treated water (L2) is controlled to maintain a set standard hydrogen ion concentration range and a set standard temperature range. In this embodiment, the set standard hydrogen ion concentration range of the second treated water (L2) is 9.5 to 12 pH, and the set standard temperature range is 10 to 25°C. The second gas processing device 3200 also performs dedusting treatment and acid gas removal functions on the second treatment target exhaust gas (G02).

Referring to FIGS. 8 and 9 , which specifically show the structure of the second gas processing device 3200, the second gas processing device 3200 processes a second exhaust gas to be treated (G02) and a second treated water (L2). A second introduction part 3210 into which gas flows in, a second microbubble processing part 3230 that processes the gas (G21) discharged from the second introduction part 3210 using micro-bubbles, and a second introduction part It is provided with a second connection passage 3290 that communicates 3210 with the second microbubble treatment unit 3230.

The second exhaust gas to be treated (G02) and the second treated water (L2) are introduced into the second inlet 3210. The second introduction part 3210 provides a second introduction space 3211 formed therein. The second introduction space 3211 communicates with the second microbubble processing unit 3230 through the second passage unit 3290. A second intake port 3213 is located at the top of the second introduction space 3211, and a second introduction space drain 3215 is located at the bottom of the second introduction space 3211. The second exhaust gas to be treated (G02) flows into the second introduction space 3211 through the second intake port 3213. Drainage is performed through the second introduction space drain 3215. The second introduction space 3211 communicates with the second connection passage portion 3290 at a position lower than the second intake port 3213 and higher than the second introduction space drain 3215.

In the second introduction space 3211, between the second intake port 3213 and the second introduction space drain 3215, there is a second water tank 3217, a 2A water flow pipe 3219, a 2A diffusion plate 3221, and a second introduction space 3211. A 2B water flow pipe 3223, a 2B diffusion plate 3225, and a second treated water inlet supply means 3226 are installed.

The second water tank 3217 is located adjacent to and below the second intake port 3213 in the second introduction space 3211. The second treated water L2 supplied from the second treated water supply unit (2700 in FIG. 5) is temporarily stored in the second water tank 3217. Industrial water flowing into the second introduction space 3211 may also be temporarily stored in the second water tank 3217. The second treated water (L2) overflowing from the second water tank (3217) flows downward through the second A water flow pipe (3219).

The 2A water flow pipe 3219 is located below the second water tank 3217 in the second introduction space 3211. The 2A water flow pipe 3219 has a shape that becomes narrower as it goes downward, and a 2A water flow pipe outlet 3220 that discharges the second treated water (L2) and gas downward is formed at the bottom of the 2A water flow pipe 3219. do. As the gas and the second treated water (L2) flow downward along the 2A water flow pipe 3219 toward the 2A water flow pipe outlet 3220, the contact area between the gas and the second treated water (L2) increases, The reaction efficiency between carbon dioxide contained in the gas and sodium carbonate contained in the second treated water (L2) is improved.

The 2A diffusion plate 3221 is located below the 2A water flow pipe outlet 3220 in the second introduction space 3211. The 2A diffusion plate 3221 is inclined radially outward from the center downward to the water channel to widely disperse the second treated water L2 discharged from the 2A water flow pipe outlet 3220 outward.

The 2B water flow pipe 3223 is located below the 2A diffusion plate 3221 in the second introduction space 3211. The 2B water flow pipe 3223 has a shape that narrows as it goes downward, and a 2B water flow pipe outlet 3224 is formed at the bottom of the 2B water flow pipe 3223 to discharge the second treated water (L2) and gas downward. do. As the gas and the second treated water (L2) flow downward along the 2B water flow pipe 3223 toward the 2B water flow pipe outlet 3224, the contact area between the gas and the second treated water (L2) increases, The reaction efficiency between carbon dioxide contained in the gas and sodium carbonate contained in the second treated water (L2) is improved.

The 2B diffusion plate 3225 is located below the 2B water flow pipe outlet 3224 in the second introduction space 3211. The 2B diffusion plate 3225 is inclined radially outward from the center downward to the water channel to widely disperse the second treated water L2 discharged from the 2B water flow pipe outlet 3224 outward.

The second treated water introduction unit supply means 3226 supplies the second treated water L2 supplied from the second treated water supply unit (2700 in FIG. 5) to the second introduction space 3211. The second treated water inlet supply means 3226 is located above the second water tank 3217 and supplies the second treated water L2 to the second water tank 3217.

The second microbubble processing unit 3230 processes the gas (G21) discharged from the second introduction unit 3210 using microbubbles. The second microbubble processing unit 3230 provides a second microbubble processing space 3231 therein. The second microbubble treatment space 3231 is connected to the second introduction space 3211 through the second connection passage 3290. A second exhaust port 3232 is located at the top of the second microbubble treatment space 3231, and a second treatment space drain 3233 is located at the bottom of the second microbubble treatment space 3231. Gas inside the second microbubble treatment space 3231 is discharged through the second exhaust port 3232. Drainage occurs through the second treatment space drain 3233. The second microbubble treatment space 3231 communicates with the second connection passage 3290 at a position lower than the second exhaust port 3232 and higher than the second treatment space drain 3233.

In the second microbubble processing space 3231, a 2A gas processing unit 3240 and a 2B gas are sequentially arranged from bottom to top along the height direction between the second connection passage 3290 and the second exhaust port 3232. A processing unit 3260 is provided. The gas G21 flowing into the second microbubble processing space 3231 through the second connection passage 3290 rises upward and passes through the 2A gas processing unit 3240 and the 2B gas processing unit 3260 in turn. do.

The 2A gas processing unit 3240 includes a 2A bottom plate 3242, a 2A atomizing unit 3244 installed on the 2A bottom plate 3242, a 2A water level control unit 3250, and a 2A bottom plate 3242. A treated water reaction unit supply means (3257) is provided.

The 2A bottom plate 3242 is plate-shaped and installed substantially horizontally in the internal space of the 2A gas processing unit 3240, and is located above the second connection passage 3290. The internal space of the 2A gas processing unit 3240 is divided into a 2A lower space 3241 and a 2A upper space 3243 with the 2A bottom plate 3242 in between, and the 2A upper space 3241 The second treated water (L2) supplied from the second treated water supply unit (2700 in FIG. 5) is stored. The 2A atomizing unit 3244 is installed on the 2A bottom plate 3242.

The 2A atomizing unit 3244 sprays the gas G21 existing in the 2A lower space 3241 into the 2A upper space 3243 where the second treated water L2 is stored. The gas G21 sprayed by the 2A atomizing unit 3244 forms micro-bubbles B21 in the second treated water L2. The 2A atomizing unit 3244 includes a 2A gas injection nozzle 3245 that injects gas G21 into the 2A upper space 3243, and a 2A collision plate located at the end of the 2A gas injection nozzle 3245. (3246) is provided. The contact area between the gas and the second treated water L2 in the 2A upper space 3243 increases due to the microbubbles B21 formed by the 2A atomizing unit 3246. In addition, the microbubbles (B21) rise more slowly than regular bubbles in the second treated water (L2), so they stay for a longer time. Accordingly, the reaction efficiency between carbon dioxide, which is a treatment target component contained in the gas G21, and sodium carbonate contained in the second treated water L2 in the 2A upper space 3243 is significantly increased, thereby removing carbon dioxide and producing sodium bicarbonate. Efficiency is also significantly improved.

The 2A gas injection nozzle 3245 is formed to protrude upward from the 2A bottom plate 3242 and is located in the 2A upper space 3243. The gas G21 in the 2A lower space 3241 is injected upward into the 2A upper space 3243 by the 2A gas injection nozzle 3245. As shown, a section is formed in the 2A gas injection nozzle 3245 where the internal passage narrows toward the end where the injection hole is formed so that the speed of the gas increases as the gas flows along the 2A gas injection nozzle 3245. A 2A collision plate 3246 is located adjacent to the end of the 2A gas injection nozzle 3245.

The 2A collision plate 3246 is located in the 2A upper space 3243 adjacent to the end of the 2A gas injection nozzle 3245. The gas G21 sprayed from the 2A gas injection nozzle 3245 strongly collides with the 2A collision plate 3246 submerged in the second treated water L2 to form micro bubbles B21. In this embodiment, the 2A collision plate 3246 is described as having a two-stage structure in which the 2A lower collision plate 3247 and the 2A upper collision plate 3248 are arranged sequentially along the height direction, as shown. The present invention is not limited to this, and a single-stage structure or a three-stage or more structure also falls within the scope of the present invention. In the case of a multi-stage structure, the 2A upper collision plate 3248 located above is larger so as to cover the entire 2A lower collision plate 3247 located below, and there is at least one space between the 2A upper collision plates 3248. It is preferable that the second A passage 3249 is formed. Although not shown, in order to adjust the gas processing capacity, the installation height of the 2A collision plate 3246 can be changed to adjust the distance from the 2A gas injection nozzle 3245.

The 2A water level control unit 3250 is located on the side of the 2A upper space 3243 and adjusts the water level of the second treated water (L2) through overflow in the 2A upper space 3243. The 2A water level control unit 3250 is provided with a 2A water level control water tank 3252 that communicates with the 2A upper space 3243 through the 2A water level control opening 3251 formed on the side wall of the 2A upper space 3243. do. The 2A water level control opening 3251 is located in the 2A upper space 3243 corresponding to the water level control height of the second treated water (L2). The second treated water (L2) overflowed from the 2A upper space 3243 is stored in the 2A water level control tank 3252. The second treated water (L2) stored in the 2A water level control tank 3252 is discharged and supplied to the second treated water supply unit (2700 in FIG. 5). The solution discharged from the 2A water level control tank 3252 and supplied to the second treated water supply unit (2700 in FIG. 5) contains produced sodium bicarbonate and unreacted sodium carbonate.

The 2A treated water reaction unit supply means 3257 supplies the second treated water L2 supplied from the second treated water supply unit (2700 in FIG. 5) to the 2A upper space 3243.

The 2B gas processing unit 3260 is located above the 2A gas processing unit 3240, and includes a 2B bottom plate 3262, a 2B atomizing unit 3264 installed on the 2B bottom plate 3262, and , a 2B water level control unit 3270, and a 2B treated water reaction unit supply means 3277.

The 2B bottom plate 3262 is plate-shaped and installed substantially horizontally in the internal space of the 2B gas processing unit 3260. The internal space of the 2B gas processing unit 3260 is divided into a 2B lower space 3261 and a 2B upper space 3263 with the 2B bottom plate 3262 interposed therebetween. The 2B lower space 3261 is in communication with the 2A upper space 3243 of the 2A gas processing unit 3240, and the 2B upper space 3263 is supplied with water from the second treated water supply unit (2700 in FIG. 5). The second treated water (L2) is stored. The 2B atomizing unit 3264 is installed on the 2B bottom plate 3262.

The 2B atomizing unit 3264 sprays the gas G22 existing in the 2B lower space 3261 into the 2B upper space 3263 where the second treated water L2 is stored. The gas G22 existing in the 2B lower space 3261 is a gas processed in the 2A gas processing unit 3240. The gas G22 sprayed by the second B atomizing unit 3264 forms micro-bubbles B22 in the second treated water L2. The 2B atomizing unit 3264 includes a 2B gas injection nozzle 3265 that injects gas G22 into the 2B upper space 3263, and a 2B collision plate located at the end of the 2B gas injection nozzle 3264. (3266) is provided. The contact area between the gas and the second treated water L2 in the 2B upper space 3263 increases due to the microbubbles B22 formed by the 2B atomizing unit 3264. In addition, the microbubbles (B22) rise more slowly than regular bubbles in the second gas treated water (L2), so they stay for a longer time. Accordingly, the reaction efficiency between carbon dioxide, which is a treatment target component contained in the gas G22, and sodium carbonate contained in the second gas treated water L2 in the second B upper space 3263 is significantly increased, thereby removing carbon dioxide and removing sodium bicarbonate. Generation efficiency is also significantly improved.

The 2B gas injection nozzle 3265 is formed to protrude upward from the 2B bottom plate 3262 and is located in the 2B upper space 3263. The gas G22 in the 2B lower space 3261 is injected upward into the 2B upper space 3263 by the 2B gas injection nozzle 3265. As shown, a section is formed in the 2B gas injection nozzle 3265 where the internal passage becomes narrower toward the end where the injection hole is formed so that the speed of the gas increases as the gas flows along the 2B gas injection nozzle 3265. A 2B collision plate 3266 is located adjacent to the end of the 2B gas injection nozzle 3265.

The 2B collision plate 3266 is located in the 2B upper space 3263 adjacent to the end of the 2B gas injection nozzle 3265. The gas G22 injected from the 2B gas injection nozzle 3265 strongly collides with the 2B collision plate 3266 submerged in the second treated water L2 in the 2B upper space 3263 to generate micro bubbles B22. is formed. In this embodiment, the 2B collision plate 3266 is described as having a two-stage structure in which the 2B lower collision plate 3267 and the 2B upper collision plate 3268 are arranged sequentially along the height direction, as shown. The present invention is not limited to this, and a single-stage structure or a three-stage or more structure also falls within the scope of the present invention. In the case of a multi-stage structure, the 2B upper collision plate 3268 located above is larger so as to cover the entire 2B lower collision plate 3267 located below, and there is at least one space between the 2B upper collision plates 3268. It is preferable that the second B passage 3269 is formed. Although not shown, in order to adjust the gas processing capacity, the installation height of the 2B collision plate 3266 can be changed to adjust the distance from the 2B gas injection nozzle 3265.

The 2B water level control unit 3270 is located on the side of the 2B upper space 3263 and adjusts the water level of the second treated water (L2) through overflow in the 2B upper space 3263. The 2B water level control unit 3270 is provided with a 2B water level control water tank 3272 that communicates with the 2B upper space 3263 through the 2B water level control opening 3271 formed on the side wall of the 2B upper space 3263. do. The 2B water level control opening 3271 is located in the 2B upper space 3263 corresponding to the water level control height of the second treated water (L2). The second treated water (L2) overflowed from the 2B upper space 3263 is stored in the 2B water level control tank 3272. The second treated water (L2) stored in the 2B water level control tank 3272 is discharged and supplied to the second treated water supply unit (2700 in FIG. 5). The solution discharged from the 2B water level control tank 3272 and supplied to the second treated water supply unit (2700 in FIG. 5) contains produced sodium bicarbonate and unreacted sodium carbonate.

The 2B treated water reaction unit supply means 3277 supplies the second treated water L2 supplied from the second treated water supply unit (2700 in FIG. 5) to the 2B upper space 3263.

In the above embodiment, the second microbubble processing unit 3230 is described as having a 2A gas processing unit 3240 and a 2B gas processing unit 3260 arranged sequentially from bottom to top along the height direction, but this is different. Only the 2A gas processing unit 3240 may be provided, or three or more gas processing units may be arranged in succession along the height direction, and this also falls within the scope of the present invention.

The second treated water (L2) discharged through the second introduction space drain 3215 and the second treatment space drain 3233 contains generated sodium bicarbonate and unreacted sodium carbonate, and is connected to the second treated water supply unit (FIG. 5 of 2700).

The second connection passage 3290 communicates the second introduction space 3211 of the second introduction part 3210 and the second microbubble treatment space 3231 of the second microbubble treatment unit 3230. The second connection passage 3290 is located below the second intake port 3213 and the second exhaust port 3232, and is located above the second introduction space drain 3215 and the second treatment space drain 3233.

Referring to FIG. 5, the first gas-liquid separator 1500a is installed on the first gas flow line to separate the liquid component from the first processing gas G1 discharged from the first gas processing device 3100. In this embodiment, the first gas-liquid separator 1500a is described as being located upstream of the first gas flow fan 1050a.

The second gas-liquid separator 1500b is installed on the second gas flow line to separate the liquid component from the second processing gas G2 discharged from the second gas processing device 3200. The liquid component separated in the second gas-liquid separator (1500b) is supplied to the second treated water supply unit (1700). In this embodiment, the second gas-liquid separator 1500b is described as being located upstream of the second gas flow fan 1050b.

The first treated water supply unit 2600 circulates and supplies first treated water L1 containing sodium hydroxide (NaOH), the first chemical, as an aqueous solution to the first gas treatment device 3100. The first treated water supply unit 2600 includes a first treated water storage tank 2610 in which first treated water (L1) is stored, a chemical storage tank 2650 in which sodium hydroxide, the first chemical, is stored in an aqueous solution, and a first gas. It is provided with a first treated water heat exchanger 2680 that adjusts the first treated water L1 supplied to the treatment device 3100 to a set reference temperature.

The first treated water storage tank 2610 stores the first treated water L1 discharged from the first gas treatment device 3100. In the first treated water storage tank 2610, the first treated water (L1) is controlled to maintain the set standard hydrogen ion concentration range and the set standard temperature range. The first treated water L1 stored in the first treated water storage tank 2610 is supplied to the first gas treatment device 3100 through the first treated water supply line 2620. Industrial water may be supplied to the first treated water storage tank 2610. As the first treated water (L1) stored in the first treated water storage tank (2610) is circulated and supplied to the first gas treatment device (3100), the content of sodium carbonate generated in the first treated water (L1) increases, The treated water (L1) ultimately becomes an aqueous sodium carbonate solution, and the first treated water (L1) of the aqueous sodium carbonate solution stored in the first treated water storage tank (2610) is supplied to the second treated water supply unit (2700). In addition, the first treated water (L1) stored in the first treated water storage tank 2610 includes microbubbles discharged from the second gas treatment device 3100, so that the first treated water storage tank 2610 also contains carbon dioxide and sodium hydroxide. This reaction can produce sodium carbonate. The first treated water storage tank 2610 may be integrally formed by being coupled to the first gas processing device 3100.

The drug storage tank 2650 stores the first drug, sodium hydroxide, as an aqueous solution. The sodium hydroxide aqueous solution stored in the chemical storage tank 2650 is supplied to the chemical mixer 2622 installed on the first treated water supply line 2620, and sodium hydroxide, the first chemical, is added to the first treated water (L1). . The aqueous solution of sodium hydroxide, which is the first chemical, is uniformly mixed with the first treated water (L1) flowing along the first treated water supply line 2620 in the chemical mixer 2622, thereby improving reactivity. In this embodiment, it is explained that a line mixer is used as the chemical mixer 1622.

The first treated water heat exchanger 2680 lowers the temperature of the first treated water (L1) supplied to the first gas treatment device 3100 on the first treated water supply line 2620 and maintains it at a set reference temperature. 1 Improves sodium carbonate production reaction efficiency in the gas processing device 3100. The first treated water heat exchanger 2680 exchanges heat with the first treated water L1 discharged from the first treated water storage tank 2610 with cold water. The first treated water heat exchanger 2680 is located upstream of the chemical mixer 2622 in the first treated water supply line 2620.

The second treated water supply unit 2700 supplies second treated water L2 containing the second chemical, sodium carbonate (Na ₂ CO ₃ ) as an aqueous solution, to the second gas treatment device 3200. The second treated water supply unit 2700 includes a second treated water storage tank 2710 in which the second treated water (L2) is stored, and a second treated water heat exchanger ( 2780).

The second treated water storage tank 2710 stores the second treated water (L2) discharged from the second gas treatment device 3200 and the sodium carbonate aqueous solution discharged from the first treated water storage tank 2610. In this embodiment, the supply of the first treated water L1 stored in the first treated water storage tank 2610 to the second treated water storage tank 2710 is explained by using natural discharge due to its own weight. In the second treated water storage tank 2710, the second treated water (L2) is controlled to maintain the set standard hydrogen ion concentration range and the set standard temperature range. The second treated water storage tank 2710 also stores a liquid component containing sodium carbonate discharged from the second gas-liquid separator 1500b. The second treated water L2 stored in the second treated water storage tank 2710 is supplied to the second gas treatment device 3200 through the second treated water supply line 2720. Industrial water may be supplied to the second treated water storage tank 2710. As the second treated water (L2) stored in the second treated water storage tank (2710) is circulated and supplied to the second gas treatment device (3200), the content of sodium bicarbonate generated in the second treated water (L2) increases. In addition, the second treated water (L2) stored in the second treated water storage tank 2710 contains microbubbles discharged from the second gas treatment device 3200, so that carbon dioxide and sodium carbonate are also released in the second treated water storage tank 2710. The reaction may produce sodium bicarbonate. The second treated water storage tank 2710 may be integrally formed by being coupled to the second gas processing device 3200. The second treated water (L2) containing sodium bicarbonate stored in the second treated water storage tank (2710) is supplied to the solid-liquid separation filter (1800).

The second treated water heat exchanger 2780 lowers the temperature of the second treated water (L2) supplied to the second gas treatment device 3200 on the second treated water supply line 2720 and maintains it at a set reference temperature. 2 Improves sodium bicarbonate production reaction efficiency in the gas processing device 3200. The second treated water heat exchanger 2780 heat-exchanges the second treated water (L2) discharged from the second treated water storage tank 2710 with cold water.

The solid-liquid separation filter 1800 separates solid components including sodium bicarbonate from the second treated water (L2) discharged from the second treated water reservoir 2710. The solid-liquid separation filter 1800 may be a solid-liquid separator of a typical configuration. The solid component separated from the second treated water (L2) discharged from the second treated water reservoir 2710 by the solid-liquid separation filter 1800 forms a sodium bicarbonate cake. Sodium bicarbonate produced by the solid-liquid separation filter 1800 can be used to remove acid gas contained in an incinerator or flue gas. The solution of the liquid component containing sodium carbonate discharged from the solid-liquid separation filter 1800 is supplied to the chemical recovery tank 1900 and stored.

The chemical recovery tank 1900 stores the solution of the liquid component discharged from the solid-liquid separation filter 1800. The solution stored in the drug recovery tank 1900 contains an aqueous solution of sodium carbonate, which is the second drug. The solution containing sodium carbonate stored in the chemical recovery tank 1900 is supplied to the chemical storage tank 2650 and the first treated water storage tank 2610. Sodium carbonate supplied to the first treated water storage tank 2610 is supplied to the second treated water storage tank 2710 and used for reaction with carbon dioxide contained in the second exhaust gas to be treated (G02).

Now, with reference to FIGS. 6 and 7, the operating process of the first gas processing device 3100 will be described as follows. FIG. 7 shows the state of the first gas processing device 3100 before processing the exhaust gas when the first gas flow fan (1050a in FIG. 1) does not operate. Referring to FIG. 7, the water level of the first treated water (L1) in the first gas processing unit 3140 of the first gas processing device 3100 is below the end where the injection hole of the first gas injection nozzle 3145 is located. Located at , the first treated water (L1) does not leak downward through the first gas injection nozzle (3145).

When the first gas flow fan (1050a in FIG. 5) operates in the state shown in FIG. 7, the gas in the first lower space 3141 is discharged from the first gas processing device 3100 through the first gas injection nozzle 3145. is injected into the first upper space 3143. In this state, when the first treated water supply unit (1600 in FIG. 5) operates and supplies the first treated water (L1) to the first gas processing device 3100, as shown in FIG. 6, the first gas processing device 3100 The water level of the first treated water (L1) in the first upper space (1143) of 3100 is sufficiently high to allow microbubbles (B1) to be formed. The level of the first treated water L1 in the first upper space 3143 of the first gas processing device 3100 is appropriately maintained by the first water level adjuster 3150.

Now, with reference to FIGS. 8 and 9, the operating process of the second gas processing device 3200 will be described as follows. FIG. 9 shows the state of the second gas processing device 3200 before processing the exhaust gas when the second gas flow fan (1050b in FIG. 5) does not operate. Referring to FIG. 9, the water level of the second treated water (L2) in the 2A gas processing unit 3240 of the second gas processing device 3200 is below the end where the injection hole of the 2A gas injection nozzle 3245 is located. is located, and the water level of the second treated water (L2) in the 2B gas processing unit 3260 of the second gas processing device 3200 is located below the end where the injection hole of the 2B gas injection nozzle 3265 is located. , the second treated water (L2) does not leak downward through the 2A gas injection nozzle 3245 and the 2B gas injection nozzle 3265.

When the second gas flow fan (1050b in FIG. 5) operates in the state shown in FIG. 9, the gas in the 2B lower space 3261 is discharged from the second gas processing device 3200 through the 2B gas injection nozzle 3265. is injected into the 2B upper space 3263, and the gas in the 2A lower space 3241 is injected into the 2A upper space 3243 through the 2A gas injection nozzle 3245. In this state, when the second treated water supply unit (1700 in FIG. 5) operates and supplies the second treated water (L2) to the second gas processing device 3200, the second gas processing device 3200 as shown in FIG. The water level of the second treated water (L2) in each of the 2A upper space 3243 and the 2B upper space 3263 of 3200 is sufficiently high to allow microbubbles B21 and B22 to be formed. The level of the second treated water (L2) in each of the 2A upper space 3243 and the 2B upper space 3263 of the second gas processing device 3200 is controlled by the 2A water level control unit 3250 and the 2B water level control unit. It is properly maintained by (3270).

Although the present invention has been described through the above examples, the present invention is not limited thereto. The above embodiments may be modified or changed without departing from the spirit and scope of the present invention, and those skilled in the art will recognize that such modifications and changes also fall within the present invention.

1000: exhaust gas treatment equipment 1050: gas flow fan
1100: first gas processing device 1110: first introduction unit
1111: first introduction space 1113: first intake port
1130: first microbubble processing unit 1131: first microbubble processing space
1140: 1A gas processing unit 1144: 1A atomizing unit
1145: 1A gas injection nozzle 1146: 1A collision plate
1150: 1A water level control unit 1160: 1B gas processing unit
1164: 1B atomizing unit 1165: 1B gas injection nozzle
1166: 1B collision plate 1170: 1B water level control unit
1132: first exhaust port 1190: first connection passage
1200: second gas processing device 1210: second introduction unit
1211: second introduction space 1213: second intake port
1230: Second microbubble processing unit 1231: Second microbubble processing space
1232: second exhaust port 1240: second gas processing unit
1244: Second atomizing unit 1245: Second gas injection nozzle
1246: second collision plate 1250: second water level control unit
1290: second connection passage 1500: gas-liquid separator
1600: First treated water supply unit 1650: First chemical storage tank
1680: First treated water heat exchanger 1700: Second treated water supply unit
1750: Second chemical storage tank 1780: Second treated water heat exchanger
1800: Solid-liquid separation filter 1900: Chemical recovery tank
2000: Exhaust gas treatment facility 2100: First gas treatment device
2200: second gas treatment device 2600: first treated water supply unit
2650: first chemical storage tank 2680: first treated water heat exchanger
2700: Second treated water supply unit 2710: Second treated water storage tank
2750: Second chemical storage tank 2780: Second treated water heat exchanger
2900: Chemical recovery tank 3000: Exhaust gas treatment facility
3100: first gas processing device 3200: second gas processing device

Claims (27)

a first gas treatment device that reacts carbon dioxide contained in the exhaust gas to be treated with sodium carbonate contained in the first treated water to remove carbon dioxide, generate sodium bicarbonate, and discharge a primary treatment gas containing unreacted carbon dioxide;
a second gas treatment device for reacting the unreacted carbon dioxide contained in the primary treatment gas with sodium hydroxide contained in the second treatment water to remove the unreacted carbon dioxide, generate sodium carbonate, and discharge secondary treatment gas;
After the exhaust gas to be treated flows into the first gas processing device and is discharged from the first gas processing device as the primary processing gas, and after the primary processing gas flows into the second gas processing device, the 2 a gas flow fan that creates a gas flow pressure such that it is discharged from the second gas processing device as a secondary processing gas;
a first treated water supply unit that circulates and supplies the first treated water to the first gas treatment device; and
It includes a second treated water supply unit that circulates and supplies the second treated water to the second gas treatment device,
The sodium carbonate generated in the second gas treatment device is supplied to the first treated water and used for reaction with carbon dioxide contained in the exhaust gas to be treated,
The first gas processing device forms microbubbles in the exhaust gas to be treated within the first treated water, and determines the contact time and contact between carbon dioxide contained in the exhaust gas to be treated and sodium carbonate contained in the first treated water. having a first gas processing unit that increases the area,
The second gas treatment device forms the primary treatment gas into microbubbles in the second treatment water to increase the contact time and contact area between the unreacted carbon dioxide and the sodium hydroxide contained in the second treatment water. and a second gas processing unit,
The first treated water circulation supply unit includes a first treated water heat exchanger that lowers the temperature of the first treated water discharged from the first gas treatment device,
The second treated water circulation supply unit includes a second treated water heat exchanger that lowers the temperature of the second treated water discharged from the second gas treatment device,
Exhaust gas treatment equipment. In claim 1,
Further comprising a solid-liquid separation filter to separate solid components from the first treated water to obtain a sodium bicarbonate cake,
Exhaust gas treatment equipment. In claim 2,
The liquid component discharged from the solid-liquid separation filter is supplied to the first treated water, so that sodium carbonate contained in the liquid component is used for reaction with carbon dioxide contained in the exhaust gas to be treated,
Exhaust gas treatment equipment. In claim 1,
The first treated water supply unit includes a first chemical storage tank in which an aqueous sodium carbonate solution is stored, and a first chemical mixer installed in a first treated water supply line through which the first treated water flowing into the first gas treatment device flows. And
The sodium carbonate aqueous solution stored in the first chemical storage tank is supplied to the first chemical mixer and mixed with the first treated water,
Exhaust gas treatment equipment. In claim 1,
The second treated water supply unit includes a second chemical storage tank in which an aqueous sodium hydroxide solution is stored, and a second chemical mixer installed in a second treated water supply line through which the second treated water flowing into the second gas treatment device flows. Equipped with
The sodium hydroxide aqueous solution stored in the second chemical storage tank is supplied to the second chemical mixer and mixed with the second treated water,
Exhaust gas treatment equipment. A first gas treatment device that reacts carbon dioxide contained in the exhaust gas to be treated with sodium hydroxide contained in the first treated water, removes carbon dioxide, generates sodium carbonate, and discharges a primary treatment gas containing unreacted carbon dioxide;
a second gas processing device that reacts the unreacted carbon dioxide contained in the primary treatment gas with sodium carbonate contained in the second treated water to remove the unreacted carbon dioxide, generate sodium bicarbonate, and discharge secondary treatment gas;
After the exhaust gas to be treated flows into the first gas processing device and is discharged from the first gas processing device as the primary processing gas, and after the primary processing gas flows into the second gas processing device, the 2 a gas flow fan that creates a gas flow pressure such that it is discharged from the second gas processing device as a secondary processing gas;
a first treated water supply unit that circulates and supplies the first treated water to the first gas treatment device; and
It includes a second treated water supply unit that circulates and supplies the second treated water to the second gas treatment device,
The sodium carbonate generated in the first gas treatment device is supplied to the second treated water and used for reaction with the unreacted carbon dioxide,
The first gas treatment device forms microbubbles in the exhaust gas to be treated within the first treated water to determine a contact time between carbon dioxide contained in the exhaust gas to be treated and sodium hydroxide contained in the first treated water, and a first gas handling unit that increases the contact area;
The second gas treatment device forms microbubbles in the primary treatment gas within the second treatment water to increase the contact time and contact area between the unreacted carbon dioxide and sodium carbonate contained in the second treatment water. It has 2 gas processing units,
The first treated water circulation supply unit includes a first treated water heat exchanger that lowers the temperature of the first treated water discharged from the first gas treatment device,
The second treated water circulation supply unit includes a second treated water heat exchanger that lowers the temperature of the second treated water discharged from the second gas treatment device,
Exhaust gas treatment equipment. In claim 6,
Further comprising a solid-liquid separation filter to separate solid components from the second treated water to obtain a sodium bicarbonate cake,
Exhaust gas treatment equipment. In claim 7,
The liquid component discharged from the solid-liquid separation filter is supplied to the second treated water, and sodium carbonate contained in the liquid component is used for reaction with the unreacted carbon dioxide.
Exhaust gas treatment equipment. In claim 6,
The first treated water supply unit includes a first chemical storage tank in which an aqueous sodium hydroxide solution is stored, and a first chemical mixer installed in the first treated water supply line through which the first treated water flowing into the first gas treatment device flows. Equipped with
The sodium hydroxide aqueous solution stored in the first chemical storage tank is supplied to the first chemical mixer and mixed with the first treated water,
Exhaust gas treatment equipment. In claim 6,
The second treated water supply unit includes a second chemical storage tank in which an aqueous sodium carbonate solution is stored, and a second chemical mixer installed in a second treated water supply line through which the second treated water flowing into the second gas treatment device flows. And
The sodium carbonate aqueous solution stored in the second chemical storage tank is supplied to the second chemical mixer and mixed with the second treated water,
Exhaust gas treatment equipment. delete In claim 1 or claim 6,
The first gas processing unit includes a bottom plate that divides the internal space of the first gas processing unit into a lower space and an upper space in which the first treated water is stored, and a bottom plate that divides the internal space of the first gas processing unit into an upper space where the first treated water is stored, and the gas flowing into the lower space is transferred to the upper space. It has a gas injection nozzle that injects toward, and a collision plate disposed above the gas injection nozzle so that the gas injected from the gas injection nozzle collides with it,
When the gas flow fan starts operating while the water level of the first treated water is lower than the injection hole of the gas injection nozzle, the gas in the lower space is injected into the upper space, and the first treated water is injected into the upper space. Additional supply increases the water level in the upper space, and the gas in the lower space injected into the upper space prevents the first treated water stored in the upper space from flowing downward through the injection hole due to gravity. When the impingement plate is submerged by the first treated water, the gas sprayed from the gas injection nozzle collides with the impingement plate to form the microbubbles in the first treated water.
Exhaust gas treatment equipment. In claim 1 or claim 6,
The second gas processing unit includes a bottom plate that divides the internal space of the second gas processing unit into a lower space and an upper space where the second treated water is stored, and a bottom plate that divides the internal space of the second gas processing unit into an upper space where the second treated water is stored, and flows the gas flowing into the lower space into the upper space. It has a gas injection nozzle that injects toward, and a collision plate disposed above the gas injection nozzle so that the gas injected from the gas injection nozzle collides with it,
When the gas flow fan starts operating while the level of the second treated water is lower than the injection hole of the gas injection nozzle, the gas in the lower space is injected into the upper space, and the second treated water is injected into the upper space. Additional supply increases the water level in the upper space, and the gas in the lower space injected into the upper space prevents the second treated water stored in the upper space from flowing downward through the injection hole due to gravity. When the impingement plate is submerged by the second treated water, the gas sprayed from the gas injection nozzle collides with the impingement plate to form the microbubbles in the second treated water.
Exhaust gas treatment equipment. In claim 1 or claim 6,
It further includes a gas-liquid separator that separates the liquid component from the secondary treatment gas,
The liquid component separated by the gas-liquid separator is supplied to the second treated water,
Exhaust gas treatment equipment. a first gas treatment device that reacts carbon dioxide contained in the exhaust gas to be treated with sodium hydroxide contained in the first treated water, removes carbon dioxide, generates sodium carbonate, and discharges the first treated gas;
a second gas treatment device that reacts carbon dioxide contained in the exhaust gas to be treated with sodium carbonate contained in the second treated water, removes carbon dioxide, generates sodium bicarbonate, and discharges a second treated gas;
a first treated water supply unit that circulates and supplies the first treated water to the first gas treatment device; and
It includes a second treated water supply unit that circulates and supplies the second treated water to the second gas treatment device,
The sodium carbonate generated in the first gas treatment device is supplied to the second treated water and used for reaction with carbon dioxide contained in the exhaust gas to be treated for the second time,
The first gas treatment device forms microbubbles in the first exhaust gas to be treated within the first treated water, thereby creating a gap between carbon dioxide contained in the first exhaust gas to be treated and sodium hydroxide contained in the first treated water. It has a first gas processing unit that increases the contact time and contact area,
The second gas treatment device forms microbubbles in the second exhaust gas to be treated within the second treated water to create a gap between carbon dioxide contained in the second treated exhaust gas and sodium carbonate contained in the second treated water. a second gas processing unit that increases contact time and contact area;
The first treated water circulation supply unit includes a first treated water heat exchanger that lowers the temperature of the first treated water discharged from the first gas treatment device,
The first treated water is maintained at a temperature of 45 to 60° C. in the first gas treatment device by the first treated water heat exchanger,
The second treated water circulation supply unit includes a second treated water heat exchanger that lowers the temperature of the second treated water discharged from the second gas treatment device,
The second treated water is maintained at a temperature of 10 to 25° C. in the second gas treatment device by the second treated water heat exchanger.
Exhaust gas treatment equipment. In claim 15,
Further comprising a solid-liquid separation filter to separate solid components from the second treated water to obtain a sodium bicarbonate cake,
Exhaust gas treatment equipment. In claim 16,
The liquid component discharged from the solid-liquid separation filter is supplied to the second treated water, so that sodium carbonate contained in the liquid component is used for reaction with carbon dioxide contained in the exhaust gas to be treated second,
Exhaust gas treatment equipment. In claim 15,
The first treated water supply unit includes a chemical storage tank in which an aqueous sodium hydroxide solution is stored, and a chemical mixer installed in a first treated water supply line through which the first treated water flowing into the first gas treatment device flows,
The aqueous sodium hydroxide solution stored in the chemical storage tank is supplied to the chemical mixer and mixed with the first treated water,
Exhaust gas treatment equipment. In claim 15,
Further comprising a first gas flow fan that creates a gas flow pressure such that the first exhaust gas to be treated passes through the first gas processing device,
Exhaust gas treatment equipment. In claim 19,
The first gas processing unit includes a bottom plate that divides the internal space of the first gas processing unit into a lower space and an upper space in which the first treated water is stored, and a bottom plate that divides the internal space of the first gas processing unit into an upper space where the first treated water is stored, and the gas flowing into the lower space is transferred to the upper space. It has a gas injection nozzle that injects toward, and a collision plate disposed above the gas injection nozzle so that the gas injected from the gas injection nozzle collides with it,
When the first gas flow fan starts operating while the water level of the first treated water is lower than the injection hole of the gas injection nozzle, the gas in the lower space is injected into the upper space, and the first gas flow fan is injected into the upper space. The treated water is additionally supplied so that the water level in the upper space rises, and the first treated water stored in the upper space by the gas in the lower space injected into the upper space flows out to the lower part through the injection hole by gravity. This is prevented, and when the impingement plate is submerged by the first treated water, the gas injected from the gas injection nozzle collides with the impingement plate to form the microbubbles in the first treated water.
Exhaust gas treatment equipment. In claim 15,
Further comprising a second gas flow fan that creates a gas flow pressure such that the second exhaust gas to be treated passes through the second gas processing device,
Exhaust gas treatment equipment. In claim 21,
The second gas processing unit includes a bottom plate that divides the internal space of the second gas processing unit into a lower space and an upper space where the second treated water is stored, and a bottom plate that divides the internal space of the second gas processing unit into an upper space where the second treated water is stored, and flows the gas flowing into the lower space into the upper space. It has a gas injection nozzle that injects toward, and a collision plate disposed above the gas injection nozzle so that the gas injected from the gas injection nozzle collides with it,
When the second gas flow fan starts operating while the water level of the second treated water is lower than the injection hole of the gas injection nozzle, the gas in the lower space is injected into the upper space, and the second gas flow fan is injected into the upper space. The treated water is additionally supplied so that the water level in the upper space rises, and the second treated water stored in the upper space by the gas in the lower space injected into the upper space flows out to the lower part through the injection hole by gravity. This is prevented, and when the impingement plate is submerged by the second treated water, the gas injected from the gas injection nozzle collides with the impingement plate to form the microbubbles in the second treated water.
Exhaust gas treatment equipment. In claim 15,
It further includes a gas-liquid separator that separates a liquid component from the second processing gas,
The liquid component separated by the gas-liquid separator is supplied to the second treated water,
Exhaust gas treatment equipment. According to any one of claims 1, 6, and 15,
The first treated water circulation supply unit further includes a first treated water storage tank in which the first treated water is stored,
In the first treated water storage tank, the first treated water is adjusted to maintain a set standard hydrogen ion concentration range,
Exhaust gas treatment equipment. According to any one of claims 1, 6, and 15,
The second treated water circulation supply unit further includes a second treated water storage tank in which the second treated water is stored,
The second treated water in the second treated water storage tank is adjusted to maintain a set standard hydrogen ion concentration range,
Exhaust gas treatment equipment. delete delete

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