KR102658382B1 - Mask tension welding device and mask tension welding method using the same - Google Patents

Abstract

A mask tension welding device according to an embodiment of the present invention may include a stage, a first fixing part, and a second fixing part. The stage may have a frame disposed on an upper portion, the first fixing portion fixing a mask disposed on the frame, and the second fixing portion may be disposed below the mask and include a plurality of electromagnets. The first fixing part may include a lower clamp including a first electromagnet and an upper clamp including a second electromagnet.

Description

Mask tension welding device and mask tension welding method using the same {MASK TENSION WELDING DEVICE AND MASK TENSION WELDING METHOD USING THE SAME}

The present invention relates to a mask tension welding device and a mask tension welding method using the same.

Among display devices, organic light emitting display devices are self-emitting display devices and have the advantages of a wide viewing angle, excellent contrast, and fast response speed, so they are attracting attention as next-generation display devices. Such an organic light emitting display device may include an intermediate layer including at least a light emitting layer between opposing electrodes.

The intermediate layer can be formed by several methods, one of which is deposition. In order to manufacture an organic light emitting display device using a deposition method, a deposition mask, for example, a fine metal mask (FMM), having openings with the same pattern as the pattern of the thin film to be formed on the substrate is adhered to the substrate. , the deposition material can be deposited on the substrate through a deposition mask to form a thin film with a desired pattern.

The purpose of the present invention is to provide a mask tension welding device with improved reliability and a mask tension welding method using the same.

A mask tension welding device according to an embodiment of the present invention may include a stage, a first fixing part, and a second fixing part. The stage may have a frame disposed on an upper portion, the first fixing portion fixing a mask disposed on the frame, and the second fixing portion may be disposed below the mask and include a plurality of electromagnets. The first fixing part may include a lower clamp including a first electromagnet and an upper clamp including a second electromagnet.

It may further include a tensioning part that is coupled to the first fixing part and tensions the mask in a first direction.

It may further include a welding portion for welding the mask and the frame.

On a plane, the first electromagnet and the second electromagnet may overlap the mask.

The upper surface of the lower clamp and the lower surface of the upper clamp may face each other in parallel.

The upper clamp includes a first protrusion protruding toward the lower clamp, a first groove recessed corresponding to the first protrusion is defined in the lower clamp, and the first protrusion is coupled to the first groove. You can.

A second groove curved to correspond to the shape of the first groove is defined in the first electromagnet, and the second electromagnet may include a second protrusion that protrudes to correspond to the shape of the first protrusion.

A first groove is defined in the lower clamp, a second groove is defined in the upper clamp, and the clamp further includes a coupling portion disposed between the lower clamp and the upper clamp and accommodated in the first groove and the second groove. You can.

The coupling part may include a third electromagnet disposed therein.

Each of the plurality of electromagnets may be arranged to be spaced apart in a first direction and extend in a second direction intersecting the first direction.

Each of the plurality of electromagnets may be arranged to be spaced apart in a first direction, and may be arranged to be spaced apart in a second direction intersecting the first direction.

Each of the plurality of electromagnets may overlap the mask on a plane.

The plurality of electromagnets may operate sequentially in a direction away from the center of the mask.

A mask tension welding method according to an embodiment of the present invention includes the steps of arranging a frame on a stage, arranging a mask on the frame, and sequentially operating a plurality of electromagnets disposed under the mask in a first direction away from the center. A step of fixing both ends of the mask with a lower clamp including a first electromagnet and an upper clamp including a second electromagnet, and welding the mask and the frame.

The method may further include tensioning the mask in the first direction before welding the mask and the frame.

The upper surface of the lower clamp and the lower surface of the upper clamp may face each other in parallel.

The upper clamp includes a first protrusion protruding toward the lower clamp, the lower clamp includes a first groove recessed corresponding to the first protrusion, and the first protrusion is coupled to the first groove. You can.

A first groove is defined in the lower clamp, a second groove is defined in the upper clamp, and the clamp further includes a coupling portion disposed between the lower clamp and the upper clamp and accommodated in the first groove and the second groove. You can.

Each of the plurality of electromagnets may be arranged to be spaced apart in the first direction and extend in a second direction intersecting the first direction.

Each of the plurality of electromagnets may be arranged to be spaced apart in the first direction, and may be arranged to be spaced apart in a second direction intersecting the first direction.

According to the present invention, the first fixing part that fixes both ends of the mask may include a lower clamp including a first electromagnet and an upper clamp including a second electromagnet. The lower clamp and the upper clamp remain parallel to each other and can secure both ends of the mask. The mask tension welding device can prevent the mask from slipping, which occurs when a greater force is applied to a part of the mask, and can prevent both ends of the mask from being twisted when fixing both ends of the mask. A mask assembly formed by a mask tension welding device can improve the precision and uniformity of the deposition process. Therefore, it is possible to provide a mask tension welding device with improved reliability.

Additionally, the mask tension welding device may include a second fixture disposed below the mask. The second fixture may include a plurality of electromagnets. A plurality of electromagnets may operate sequentially from the center of the mask to the ends of the mask. The mask can be maintained in a tensioned state by the second fixing part, and the mask welding device can couple the tensioned mask to the frame. The second fixing part can prevent the problem of the mask being wrinkled. A mask assembly formed by a mask tension welding device can improve the precision and uniformity of the deposition process. Therefore, it is possible to provide a mask tension welding device with improved reliability. .

1 is a perspective view of a mask tension welding device according to an embodiment of the present invention.
Figure 2 is a cross-sectional view of a mask tension welding device according to an embodiment of the present invention.
Figure 3 is a cross-sectional view showing a portion of a mask tension welding device according to an embodiment of the present invention.
Figure 4 is a cross-sectional view showing a portion of a mask tension welding device according to an embodiment of the present invention.
Figure 5 is a cross-sectional view showing a portion of a mask tension welding device according to an embodiment of the present invention.
Figure 6 is a plan view showing a portion of a mask tension welding device according to an embodiment of the present invention.
Figure 7 is a plan view showing a portion of a mask tension welding device according to an embodiment of the present invention.
Figure 8 is a perspective view of a mask assembly according to an embodiment of the present invention.
Figure 9 is a cross-sectional view schematically showing a deposition apparatus according to an embodiment of the present invention.
FIG. 10 is a cross-sectional view showing a portion of an organic light emitting display device in which a light emitting layer is deposited on a substrate using the deposition apparatus of FIG. 9.
Figure 11 is a cross-sectional view of the mask tension welding device showing steps in which the second fixing part operates according to an embodiment of the present invention.
Figure 12 is a cross-sectional view showing a mask tension welding device showing steps in which the first fixing part operates according to an embodiment of the present invention.
Figure 13 is a cross-sectional view of a mask tension welding device showing the step of welding a mask and a frame according to an embodiment of the present invention.

In this specification, when a component (or region, layer, portion, etc.) is referred to as being “on,” “connected to,” or “coupled to” another component, it is directly placed/on the other component. This means that they can be connected/combined or a third component can be placed between them.

Identical reference numerals refer to identical elements. Additionally, in the drawings, the thickness, proportions, and dimensions of components are exaggerated for effective explanation of technical content.

“And/or” includes all combinations of one or more that the associated configurations may define.

Terms such as first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The above terms are used only for the purpose of distinguishing one component from another. For example, a first component may be named a second component, and similarly, the second component may also be named a first component without departing from the scope of the present invention. Singular expressions include plural expressions unless the context clearly dictates otherwise.

Additionally, terms such as “below,” “on the lower side,” “above,” and “on the upper side” are used to describe the relationship between the components shown in the drawings. The above terms are relative concepts and are explained based on the direction indicated in the drawings.

Unless otherwise defined, all terms (including technical terms and scientific terms) used in this specification have the same meaning as commonly understood by a person skilled in the art to which the present invention pertains. Additionally, terms such as those defined in commonly used dictionaries should be construed as having a meaning consistent with their meaning in the context of the relevant technology, and unless interpreted in an idealized or overly formal sense, are explicitly defined herein. It can be.

Terms such as “include” or “have” are intended to designate the presence of features, numbers, steps, operations, components, parts, or combinations thereof described in the specification, but do not include one or more other features, numbers, or steps. , it should be understood that it does not exclude in advance the possibility of the existence or addition of operations, components, parts, or combinations thereof.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

1 is a perspective view of a mask tension welding device according to an embodiment of the present invention.

Referring to Figure 1, the mask tension welding device (MWD) includes a stage (STG), a first fixing part (FX1), a second fixing part (FX2, see Figure 2), a tension part (TN), and a welding part (LZ). may include.

The stage (STG) may support the frame (FR). The stage (STG) may have a square ring shape.

The frame (FR) may be placed on the stage (STG). The frame FR may support the mask MK. An opening (FOP) may be defined in the frame (FR). The opening (FOP) may provide a path for the deposition material to pass through. The frame FR may have a square ring shape. The frame (FR) may be made of invar. However, this is an example and the frame FR may include various metals. For example, the frame FR may be made of stainless steel. The frame (FR) may include a material that has small deformation when welding the mask (MK). For example, the frame FR may include a metal with high rigidity. The frame FR may include a first frame FR1 and a second frame FR2.

The first frame FR1 may extend in the first direction DR1. The second frame FR2 may extend in the second direction DR2. The length of the first frame FR1 may be smaller than the length of the second frame FR2. However, this is an example, and the length of the first frame FR1 and the length of the second frame FR2 may be the same.

The vertical direction of the frame FR may correspond to the thickness direction DR3 (hereinafter referred to as the third direction) of the frame FR.

Meanwhile, the direction indicated by the first to third directions DR1, DR2, and DR3 is a relative concept and can be switched to another direction. Hereinafter, the first to third directions refer to the same reference numerals as the directions indicated by the first to third directions DR1, DR2, and DR3, respectively. Additionally, in this specification, the plane defined by the first direction DR1 and the second direction DR2 is defined as a plane, and “viewed on a plane” may be defined as viewed from the third direction DR3.

The third direction DR3 may intersect the first direction DR1 and the second direction DR2. The first direction DR1, the second direction DR2, and the third direction DR3 may be orthogonal to each other.

The support part ST may be disposed between the frame FR and the mask MK. The support part ST may extend in the second direction DR2. The supports ST may be spaced apart at equal intervals along the first direction DR1. However, this is an example and the support part (ST) may be arranged in various ways. For example, the support part ST may extend in the first direction DR1 and be spaced apart in the second direction DR2. In one embodiment of the present invention, the support part (ST) may be omitted.

The mask MK may be placed on the support part ST. The mask (MK) can be manufactured using a thin plate. Materials for the mask (MK) may include stainless steel, invar, nickel (Ni), cobalt (Co), nickel alloy, nickel cobalt alloy, etc. However, this is an example and various materials may be used as the mask (MK) in the present invention.

The mask MK may be defined parallel to the plane defined by the first direction DR1 and the second direction DR2. For example, the mask MK may have a rectangular shape parallel to each of the first direction DR1 and the second direction DR2. However, this is shown as an example, and the mask MK may have various shapes.

A pattern area (PA) may be defined in the mask (MK). A plurality of holes may be defined in the pattern area (PA). The plurality of holes may provide a path through which the deposition material passes. The plurality of holes aligned on the substrate (SUB, see FIG. 9) may expose the deposition target of the substrate (SUB, see FIG. 9). The pattern area PA may have a planar shape that is substantially the same as the deposition pattern to be formed. However, this is an example and the pattern area PA may have various shapes. For example, the pattern area PA may include a masking pattern that remains fully open, or may include a stripe-shaped pattern. The plurality of holes may be arranged along the first direction DR1 and the second direction DR2.

The first fixing part FX1 may be disposed at both ends of the mask MK. The first fixing part FX1 may fix the mask MK. In FIG. 1, four first fixing units are shown as examples, but the present invention is not limited thereto.

The tension portion TN may be coupled to the first fixing portion FX1. The tensioning portion TN may tension the mask MK in the first direction DR1.

The weld zone LZ may be disposed on the mask MK. The welding zone (LZ) can weld the mask (MK) and the frame (FR).

Figure 2 is a cross-sectional view of a mask tension welding device according to an embodiment of the present invention.

Referring to FIG. 2, the mask MK may include a deposition area (MK1) and a non-deposition area (MK2). The deposition area MK1 may include an area through which the deposition material moves. On a plane, the deposition area MK1 may overlap the opening FOP. The non-deposition area (MK2) may include an area adjacent to the deposition area (MK1). On a plane, the non-deposition area (MK2) may overlap the stage (STG) and the frame (FR).

The first fixing part FX1 may include a lower clamp CL1 and an upper clamp CL2. The mask MK may be disposed between the lower clamp CL1 and the upper clamp CL2. On a plane, the lower clamp CL1 and the upper clamp CL2 may overlap the non-deposition area MK2.

The second fixing part FX2 may be disposed below the mask MK. The second fixing part FX2 may include a plurality of electromagnets MG2-1, MG2-2, MG2-3, MG2-4, and MG2-5.

On a plane, the second fixing part FX2 may overlap the mask MK.

In a plane view, the welding zone LZ may be disposed on the stage STG.

Figure 3 is a cross-sectional view showing a portion of a mask tension welding device according to an embodiment of the present invention.

Referring to FIG. 3, the lower clamp CL1 may include a first electromagnet MG1-1. The strength of the magnetic force of the first electromagnet MG1-1 may be determined by the applied current.

The upper clamp (CL2) may include a second electromagnet (MG1-2). The strength of the magnetic force of the second electromagnet MG1-2 may be determined by the applied current. The second electromagnet (MG1-2) may have substantially the same configuration as the first electromagnet (MG1-1).

The first fixing part FX1 (see FIG. 2) can control the strength of magnetic force to fix the mask MK regardless of the thickness of the mask MK. For example, if the thickness of the mask MK is thin, the strength of the magnetic force can be weakened, and if the thickness of the mask MK is thick, the strength of the magnetic force can be strengthened.

On a plane, the first electromagnet (MG1-1) and the second electromagnet (MG1-2) may overlap the non-deposition area (MK2).

The upper surface (CL1-1) of the lower clamp (CL1) and the lower surface (CL2-1) of the upper clamp (CL2) may face each other in parallel. The upper surface (CL1-1) of the lower clamp (CL1) and the lower surface (CL2-1) of the upper clamp (CL2) may be coupled while remaining parallel.

According to the present invention, the lower clamp CL1 and the upper clamp CL2 can be coupled while maintaining the force applied to the mask MK constant. The lower clamp (CL1) and upper clamp (CL2) can prevent the mask (MK) from being pushed around due to greater force being applied to a portion of the mask (MK). The mask assembly 100 (see FIG. 8) formed by a mask tension welding device (MWD, see FIG. 1) can improve the precision and uniformity of the deposition process. Therefore, it is possible to provide a mask tension welding device (MWD, see FIG. 1) with improved reliability.

Figure 4 is a cross-sectional view showing a portion of a mask tension welding device according to an embodiment of the present invention. Components explained through FIG. 3 are given the same reference numerals and their description is omitted.

Referring to FIG. 4 , the upper clamp CL2a may include a first protrusion CL2a-1 protruding toward the lower clamp CL1a.

A first groove (CL1a-1) corresponding to the first protrusion (CL2a-1) may be defined in the lower clamp (CL1a).

A mask groove (MKa-1) corresponding to the first protrusion (CL2a-1) may be defined in the mask (MKa).

The first protrusion CL2a-1 may be combined with the first groove CL1a-1. A mask groove (MKa-1) may be disposed between the first protrusion (CL2a-1) and the first groove (CL1a-1).

The upper clamp (CL2a) may include a second electromagnet (MG1-2a). The second electromagnet MG1-2a may include a second protrusion MG1-2a1 that protrudes correspondingly to the first protrusion CL2a-1.

The lower clamp CL1a may include a first electromagnet MG1-1a. A second groove (MG1-1a1) bent to correspond to the shape of the first groove (CL1a-1) may be defined in the first electromagnet (MG1-1a).

According to the present invention, the mask tension welding device (MWD, see FIG. 1) is a mask ( MKa) can be prevented from slipping and twisting. The mask tension welding device (MWD, see FIG. 1) can fix the mask (MKa) by the first electromagnet (MG1-1a) and the second electromagnet (MG1-2a). The mask assembly 100 (see FIG. 8) formed by a mask tension welding device (MWD, see FIG. 1) can improve the precision and uniformity of the deposition process. Therefore, it is possible to provide a mask tension welding device (MWD, see FIG. 1) with improved reliability.

Figure 5 is a cross-sectional view showing a portion of a mask tension welding device according to an embodiment of the present invention. Components explained through FIG. 3 are given the same reference numerals and their description is omitted.

Referring to FIG. 5, a first groove (CL1b-1) may be defined in the lower clamp (CL1b). The lower clamp CL1b may include a first electromagnet MG1-1b. A third groove (MG1-1b1) curved to correspond to the shape of the first groove (CL1b-1) may be defined in the first electromagnet (MG1-1b).

A second groove (CL2b-1) may be defined in the upper clamp (CL2b). The upper clamp (CL2b) may include a second electromagnet (MG1-2b). A fourth groove (MG1-2b1) bent to correspond to the shape of the second groove (CL2b-1) may be defined in the second electromagnet (MG1-2b).

The coupling portion CNb may be disposed between the lower clamp CL1b and the upper clamp CL2b. The third electromagnet MG1-3b may be disposed inside the coupling portion CNb.

The mask (MKb) may be coupled to the coupling portion (CNb) by surrounding it. The mask MKb can be fixed by the magnetic force of the third electromagnet MG1-3b. The coupling portion CNb may be accommodated in the first groove CL1b-1 and the second groove CL2b-1.

According to the present invention, the mask MKb can be coupled to the lower clamp CL1b and the upper clamp CL2b while being fixed to the coupling portion CNb. The mask tension welding device (MWD, see FIG. 1) can prevent both ends of the mask MKb from being twisted. The mask assembly 100 (see FIG. 8) formed by a mask tension welding device (MWD, see FIG. 1) can improve the precision and uniformity of the deposition process. Therefore, it is possible to provide a mask tension welding device (MWD, see FIG. 1) with improved reliability.

Figure 6 is a plan view showing a portion of a mask tension welding device according to an embodiment of the present invention.

Referring to FIG. 6, a second fixing part FX2 may be disposed below the mask MK. The width WT1 of the mask MK in the first direction DR1 may be greater than the width WT2 of the mask MK in the second direction DR2.

The second fixing part FX2 may include a plurality of electromagnets MG2-1, MG2-2, MG2-3, MG2-4, and MG2-5. In FIG. 6, five electromagnets are shown as examples, but the present invention is not limited thereto.

Each of the plurality of electromagnets (MG2-1, MG2-2, MG2-3, MG2-4, MG2-5) may be arranged to be spaced apart in the first direction (DR1) and extend in the second direction (DR2). .

On a plane, each of the plurality of electromagnets (MG2-1, MG2-2, MG2-3, MG2-4, MG2-5) may overlap with the deposition area (MK1).

Each of the plurality of electromagnets (MG2-1, MG2-2, MG2-3, MG2-4, MG2-5) can be individually controlled.

Figure 7 is a plan view showing a portion of a mask tension welding device according to an embodiment of the present invention. Components explained through FIG. 6 are given the same reference numerals and their description is omitted.

Referring to FIG. 7 , the second fixing part FX2a may be disposed under the mask MK. The second fixing part FX2a has a plurality of electromagnets (MG2-1a, MG2-1b, MG2-2a, MG2-2b, MG2-3a, MG2-3b, MG2-4a, MG2-4b, MG2-5a, MG2 -5b) may be included. In FIG. 7, 10 electromagnets are shown by way of example, but the present invention is not limited thereto.

A plurality of electromagnets (MG2-1a, MG2-1b, MG2-2a, MG2-2b, MG2-3a, MG2-3b, MG2-4a, MG2-4b, MG2-5a, MG2-5b) are each oriented in a first direction may be spaced apart in (DR1) and may be spaced apart in a second direction (DR2).

Each of the plurality of electromagnets (MG2-1a, MG2-1b, MG2-2a, MG2-2b, MG2-3a, MG2-3b, MG2-4a, MG2-4b, MG2-5a, MG2-5b) on a plane is It can overlap with the pattern area (NPA).

The mask MK according to an embodiment of the present invention may have different thicknesses in the pattern area (PA) and the non-pattern area (NPA). The thickness of the pattern area (PA) may be thinner than the thickness of the non-pattern area (NPA).

If a thin patterned area (PA) is fixed with a strong magnetic force applied to a thick non-patterned area (NPA), wrinkling may occur due to the magnetic force. A plurality of electromagnets (MG2-1a, MG2-1b, MG2-2a, MG2-2b, MG2-3a, MG2-3b, MG2-4a, MG2-4b, MG2-5a, MG2-5b) Each can prevent wrinkles caused by magnetic force that may occur in the pattern area (PA).

Each of the multiple electromagnets (MG2-1a, MG2-1b, MG2-2a, MG2-2b, MG2-3a, MG2-3b, MG2-4a, MG2-4b, MG2-5a, MG2-5b) is individually controlled. It can be.

Figure 8 is a perspective view of a mask assembly according to an embodiment of the present invention.

Referring to FIG. 8, the mask assembly 100 can be manufactured using a mask tension welding device (MWD, see FIG. 1). The mask assembly 100 may include a mask set (MK-1) and a frame set (FS).

The mask set (MK-1) may include one or more masks (MK, hereinafter referred to as masks). In FIG. 8 , six masks MK are shown as examples, but the present invention is not limited thereto.

Each of the masks MK may extend in the first direction DR1 and be arranged along the second direction DR2. When a plurality of masks MK are provided, the width in the second direction DR2 may be reduced compared to when the mask is provided as a single mask. Accordingly, the phenomenon of the masks MK sagging due to gravity can be reduced.

The frameset FS may include a frame FR and a support unit ST.

The length of the frame FR in each of the first direction DR1 and the second direction DR2 may be determined depending on the size and number of masks MK.

The support portion (ST) is disposed below the mask (MK) to prevent the mask (MK) from sagging due to gravity.

After the welding process of the mask set (MK-1) and the frame set (FS) is completed, a portion of the non-deposition area (MK2) may be cut. A partially cut mask assembly (100A, see FIG. 9) can be used in an organic material deposition process.

Figure 9 is a cross-sectional view schematically showing a deposition apparatus according to an embodiment of the present invention.

Referring to FIG. 9, the deposition apparatus 1000 may include a chamber (CHB), a deposition source (S), a stage (STG-1), a moving plate (PP), and a mask assembly (100A).

The deposition source (S), the stage (STG-1), the moving plate (PP), and the mask assembly (100A) may be disposed in the chamber (CHB).

The chamber (CHB) may form a closed space. The chamber (CHB) may have at least one gate (GT). The chamber (CHB) can be opened and closed through the gate (GT). The mask assembly 100A and the substrate SUB can enter and exit through the gate GT provided in the chamber CHB.

The deposition source (S) may be placed at the bottom within the chamber (CHB). The deposition source (S) may include a deposition material. The deposition material is a material capable of sublimation or vaporization and may include one or more of inorganic materials, metals, or organic materials. In this embodiment, the case where the deposition source S contains an organic material for manufacturing an organic light-emitting device (not shown) will be described as an example.

The stage STG-1 may be placed on top of the deposition source S. The mask assembly 100A may be seated on the stage STG-1. The mask assembly 100A may face the deposition source S. On a plane, the stage STG-1 may overlap the frame FR to support the mask assembly 100A. The stage STG-1 may be disposed outside the movement path of the deposition material supplied from the deposition source S to the substrate SUB.

The moving plate PP may be disposed on the substrate SUB. The moving plate PP may align the substrate SUB on the mask assembly 100A. For example, the moving plate PP may generate electrostatic force or magnetic force to move the substrate SUB. The moving plate (PP) can move up and down or left and right.

The moving plate PP may perform the function of fixing the substrate SUB on the mask assembly 100A. Since the substrate SUB is fixed to the mask assembly 100A by the moving plate PP, the precision of the deposition process can be improved.

FIG. 10 is a cross-sectional view showing a portion of an organic light emitting display device in which a light emitting layer is deposited on a substrate using the deposition apparatus of FIG. 9.

Referring to FIG. 10, a circuit element layer (ML), a display element layer (IML), and a thin film encapsulation layer (TFE) may be sequentially disposed on the base layer (BS).

The base layer (BS) may include a synthetic resin film. A synthetic resin layer can be formed on a working substrate used when manufacturing the display panel DP. Afterwards, a conductive layer and an insulating layer can be formed on the synthetic resin layer. When the working substrate is removed, the synthetic resin layer may correspond to the base layer (BS). The synthetic resin layer may include a thermosetting resin. In particular, the synthetic resin layer may be a polyimide-based resin layer, and its material is not particularly limited. Additionally, the base layer (BS) may include a glass substrate, a metal substrate, or an organic/inorganic composite material substrate.

In this embodiment, the circuit element layer ML includes a buffer film (BFL), a first intermediate inorganic film 10, and a second intermediate inorganic film 20, which are inorganic films, and an intermediate organic film 30 is an organic film. ) may include. The materials of the inorganic film and the organic film are not particularly limited, and in one embodiment of the present invention, the buffer film (BFL) can be selectively disposed/omitted.

The semiconductor pattern OSP1 of the transistor T1 may be disposed on the buffer film BFL. The semiconductor pattern (OSP1) may be selected from amorphous silicon, polysilicon, or metal oxide semiconductor.

The first intermediate inorganic layer 10 may be disposed on the semiconductor pattern OSP1. The control electrode GE1 of the transistor T1 may be disposed on the first intermediate inorganic layer 10.

A second intermediate inorganic film 20 covering the control electrode GE1 may be disposed on the first intermediate inorganic film 10. The input electrode (DE1) and the output electrode (SE1) of the transistor (T1) may be disposed on the second intermediate inorganic layer (20).

The input electrode (DE1) and the output electrode (SE1) are connected to the semiconductor through the first through hole (CH1) and the second through hole (CH2) penetrating the first intermediate inorganic film 10 and the second intermediate inorganic film 20. Each can be connected to the pattern (OSP1). Meanwhile, in another embodiment of the present invention, the transistor T1 may be modified to have a bottom gate structure.

An intermediate organic film 30 covering the input electrode (DE1) and the output electrode (SE1) may be disposed on the second intermediate inorganic film 20. The intermediate organic layer 30 may provide a flat surface.

An display element layer (IML) may be disposed on the intermediate organic layer 30. The display element layer (IML) may include a pixel definition layer (PDL) and an organic light emitting diode (OLED). The pixel defining layer (PDL) may include an organic material. The first electrode AE may be disposed on the intermediate organic layer 30. The first electrode AE may be connected to the output electrode SE1 through the third through hole CH3 penetrating the intermediate organic layer 30. An opening (OP) may be defined in the pixel definition layer (PDL). The opening OP may expose at least a portion of the first electrode AE. In one embodiment of the present invention, the pixel defining layer (PDL) may be omitted.

In one embodiment of the present invention, the light emitting area PXA may overlap the transistor T1.

The hole control layer (HCL) may be commonly disposed in the emission area (PXA) and the non-emission area (NPXA). An emission layer (EML) may be disposed on the hole control layer (HCL). The light emitting layer (EML) may be formed by depositing an organic material using a deposition apparatus 1000 (see FIG. 9). The light emitting layer (EML) may be disposed in an area corresponding to the opening OP. The light emitting layer (EML) may include organic and/or inorganic materials. The light emitting layer (EML) can generate predetermined colored light.

An electronic control layer (ECL) may be disposed on the light emitting layer (EML). The second electrode (CE) may be disposed on the electronic control layer (ECL).

A thin film encapsulation layer (TFE) may be disposed on the second electrode (CE). The thin film encapsulation layer (TFE) may cover the second electrode (CE). A capping layer covering the second electrode (CE) may be further disposed between the thin film encapsulation layer (TFE) and the second electrode (CE). At this time, the thin film encapsulation layer (TFE) can directly cover the capping layer.

Figure 11 is a cross-sectional view of the mask tension welding device showing steps in which the second fixing part operates according to an embodiment of the present invention. Components explained through FIGS. 1 to 7 are given the same reference numerals and their descriptions are omitted.

Referring to FIG. 11, the second fixing part FX2 may include a plurality of electromagnets MG2-1, MG2-2, MG2-3, MG2-4, and MG2-5.

A plurality of electromagnets (MG2-1, MG2-2, MG2-3, MG2-4, MG2-5) sequentially move in a first direction DR1 from the center of the mask MK toward both ends of the mask MK. It can operate as For example, the plurality of electromagnets MG2-1, MG2-2, MG2-3, MG2-4, and MG2-5 may operate in a direction away from the center of the mask MK.

For example, the third electromagnet MG2-3 operates to fix the central portion of the mask MK. At this time, the wrinkles of the mask (MK) may be straightened by the magnetic force of the third electromagnet (MG2-3). After the third electromagnet (MG2-3) operates, the second electromagnet (MG2-2) and the fourth electromagnet (MG2-4) can operate. The second to fourth electromagnets (MG2-2, MG2-3, and MG2-4) can fix the mask (MK). At this time, the wrinkles of the mask MK may be straightened by the magnetic force of the second to fourth electromagnets MG2-2, MG2-3, and MG2-4. Next, the first electromagnet (MG2-1) and the fifth electromagnet (MG2-5) can operate. The first to fifth electromagnets (MG2-1, MG2-2, MG2-3, MG2-4, and MG2-5) can fix the mask (MK). At this time, the wrinkles of the mask MK may be straightened by the magnetic force of the first to fifth electromagnets MG2-1, MG2-2, MG2-3, MG2-4, and MG2-5.

The mask MK may be fixed by a plurality of electromagnets MG2-1, MG2-2, MG2-3, MG2-4, and MG2-5.

The plurality of electromagnets (MG2-1, MG2-2, MG2-3, MG2-4, MG2-5) may operate to be symmetrical in the first direction (DR1) with respect to the third electromagnet (MG2-3). .

The second fixing part FX2 can control the strength of the magnetic force to fix the mask MK regardless of the thickness of the mask MK. For example, if the thickness of the mask MK is thin, the strength of the magnetic force can be weakened, and if the thickness of the mask MK is thick, the strength of the magnetic force can be strengthened.

When defining the appropriate strength of magnetic force for the thickness of the mask (MK) as a reference value, if the strength of the magnetic force of the second fixing part (FX2) is weaker than the reference value, the mask (MK) may be wrinkled due to gravity. , the mask MK may not be fixed. As a result, if the strength of the magnetic force of the second fixing part FX2 is stronger than the reference value, the mask MK may be wrinkled due to the magnetic force. Accordingly, the precision and uniformity of the deposition process of the mask assembly 100 (see FIG. 8) formed by the mask tension welding device (MWD, see FIG. 1) may be reduced. According to the present invention, the plurality of electromagnets (MG2-1, MG2-2, MG2-3, MG2-4, MG2-5) can operate sequentially from the center of the mask MK to the end of the mask MK. there is. Each of the plurality of electromagnets (MG2-1, MG2-2, MG2-3, MG2-4, MG2-5) can fix the mask (MK). The mask MK can be maintained in a tensioned state by the second fixing part FX2, and the mask welding device (MWD, see FIG. 1) can couple the tensioned mask MK to the frame FR. The second fixing part FX2 can prevent the mask MK from being wrinkled. The mask assembly 100 (see FIG. 8) formed by a mask tension welding device (MWD, see FIG. 1) can improve the precision and uniformity of the deposition process. Therefore, it is possible to provide a mask tension welding device (MWD, see FIG. 1) with improved reliability.

Figure 12 is a cross-sectional view showing a mask tension welding device showing steps in which the first fixing part operates according to an embodiment of the present invention. Components explained through FIG. 11 are given the same reference numerals and their descriptions are omitted.

Referring to FIG. 12, the mask MK fixed by the second fixing part FX2 may be additionally fixed by the first fixing part FX1. The lower clamp CL1 and the upper clamp CL2 may fix the mask MK.

By controlling the magnetic force of the first electromagnet (MG1-1) and the second electromagnet (MG1-2), the strength of the force that fixes the mask (MK) can be adjusted. At this time, the upper surface (CL1-1, see Figure 3) of the lower clamp (CL1) and the lower surface (CL2-1, see Figure 3) of the upper clamp (CL2) can be kept parallel and fixed. Therefore, it is possible to prevent the mask MK from slipping.

According to the present invention, the lower clamp (CL1) and the upper clamp (CL2) are coupled in parallel to each other, and the mask (MK) can be fixed by the first electromagnet (MG1-1) and the second electromagnet (MG1-2). there is. The mask (MK) can be prevented from slipping and twisting. The mask assembly 100 (see FIG. 8) formed by a mask tension welding device (MWD) can improve the precision and uniformity of the deposition process. Therefore, it is possible to provide a mask tension welding device (MWD) with improved reliability.

Figure 13 is a cross-sectional view of a mask tension welding device showing the step of welding a mask and a frame according to an embodiment of the present invention. Components explained through FIGS. 11 and 12 are given the same reference numerals and their descriptions are omitted.

The tensioning unit TN may tension the mask MK fixed by the first fixing part FX1 and the second fixing part FX2 in the first direction DR1.

The welding zone (LZ) can be tensioned and welded to the fixed mask (MK). The welding zone (LZ) can irradiate a laser (LZ-1) to the surface where the frame (FR) and the mask (MK) are in contact. The mask (MK) and the frame (FR) may be joined to each other by welding using a laser (LZ-1). However, this is an exemplary illustration, and in one embodiment of the present invention, the welding zone LZ may include various welding devices.

Although the present invention has been described above with reference to preferred embodiments, those skilled in the art or have ordinary knowledge in the relevant technical field should not deviate from the spirit and technical scope of the present invention as set forth in the claims to be described later. It will be understood that the present invention can be modified and changed in various ways within the scope of the present invention. Therefore, the technical scope of the present invention should not be limited to what is described in the detailed description of the specification, but should be defined by the scope of the patent claims.

MWD: Mask tension welding device STG: Stage
FX1: First fixing part FX2: Second fixing part
TN: Tensile section LZ: Welded section
FR: Frame MK: Mask
CL1: Lower clamp CL2: Upper clamp
MG1-1: First electromagnet MG1-2: Second electromagnet

Claims (20)

A stage on which a frame is placed at the top;
a first fixing part for fixing a mask disposed on the frame; and
A second fixing part disposed below the mask and including a plurality of electromagnets,
The first fixing part includes a lower clamp including a first electromagnet and an upper clamp including a second electromagnet,
The upper clamp includes a first protrusion protruding toward the lower clamp,
A mask tension welding device in which a first groove recessed corresponding to the first protrusion is defined in the lower clamp, and the first protrusion is coupled to the first groove. According to claim 1,
A mask tension welding device coupled to the first fixing part and further comprising a tension part that tensions the mask in a first direction. According to claim 1,
A mask tension welding device further comprising a welding portion for welding the mask and the frame. According to claim 1,
A mask tension welding device wherein the first electromagnet and the second electromagnet overlap the mask in a plane view. According to claim 1,
A mask tension welding device in which the upper surface of the lower clamp and the lower surface of the upper clamp face each other in parallel. delete According to claim 1,
A second groove curved to correspond to the shape of the first groove is defined in the first electromagnet,
The second electromagnet is a mask tension welding device including a second protrusion that protrudes to correspond to the shape of the first protrusion. delete delete According to claim 1,
Each of the plurality of electromagnets,
A mask tension welding device arranged to be spaced apart in a first direction and extending in a second direction intersecting the first direction. According to claim 1,
Each of the plurality of electromagnets,
A mask tension welding device arranged to be spaced apart in a first direction and spaced apart from a second direction intersecting the first direction. According to claim 1,
A mask tension welding device wherein each of the plurality of electromagnets overlaps the mask on a plane. According to claim 1,
A mask tension welding device in which the plurality of electromagnets operate sequentially in a direction away from the center of the mask. placing a frame on the stage;
placing a mask over the frame;
sequentially operating a plurality of electromagnets disposed under the mask in a first direction away from the center;
fixing both ends of the mask with a lower clamp including a first electromagnet and an upper clamp including a second electromagnet; and
Welding the mask and the frame,
The upper clamp includes a first protrusion protruding toward the lower clamp,
The lower clamp includes a first groove recessed corresponding to the first protrusion, and the first protrusion is coupled to the first groove. According to claim 14,
A mask tension welding method further comprising tensioning the mask in the first direction before welding the mask and the frame. According to claim 14,
A mask tension welding method in which the upper surface of the lower clamp and the lower surface of the upper clamp face each other in parallel. delete delete According to claim 14,
Each of the plurality of electromagnets,
A mask tension welding method arranged to be spaced apart in the first direction and extending in a second direction intersecting the first direction. According to claim 14,
Each of the plurality of electromagnets,
A mask tension welding method arranged to be spaced apart in the first direction and spaced apart in a second direction intersecting the first direction.

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