KR102638088B1 - Cutting tools with hard coating - Google Patents
Cutting tools with hard coating Download PDFInfo
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- KR102638088B1 KR102638088B1 KR1020230119845A KR20230119845A KR102638088B1 KR 102638088 B1 KR102638088 B1 KR 102638088B1 KR 1020230119845 A KR1020230119845 A KR 1020230119845A KR 20230119845 A KR20230119845 A KR 20230119845A KR 102638088 B1 KR102638088 B1 KR 102638088B1
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- 238000005520 cutting process Methods 0.000 title claims abstract description 70
- 238000000576 coating method Methods 0.000 title description 8
- 239000011248 coating agent Substances 0.000 title description 7
- 239000000463 material Substances 0.000 claims abstract description 21
- 239000002344 surface layer Substances 0.000 claims abstract description 21
- 239000000203 mixture Substances 0.000 claims abstract description 16
- 239000010410 layer Substances 0.000 claims abstract description 12
- 229910052796 boron Inorganic materials 0.000 claims abstract description 3
- 229910021476 group 6 element Inorganic materials 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 claims description 2
- 239000002356 single layer Substances 0.000 abstract description 5
- -1 cemented carbide Substances 0.000 abstract description 3
- 239000011195 cermet Substances 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 25
- 230000000052 comparative effect Effects 0.000 description 24
- 229910010038 TiAl Inorganic materials 0.000 description 23
- 238000010849 ion bombardment Methods 0.000 description 5
- 229910010037 TiAlN Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 229910052582 BN Inorganic materials 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 229910017150 AlTi Inorganic materials 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910021480 group 4 element Inorganic materials 0.000 description 1
- 229910021478 group 5 element Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0047—Activation or excitation of reactive gases outside the coating chamber
- C23C14/0052—Bombardment of substrates by reactive ion beams
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Physical Vapour Deposition (AREA)
Abstract
본 발명은 초경합금, 서멧(cermet), CBN과 같은 경질모재 상에 경질피막이 형성된 절삭공구에 관한 것이다.
본 발명에 따른 절삭공구는, 경질모재와, 상기 경질모재 상에 형성된 경질피막을 포함하는 절삭공구로, 상기 경질피막은 단층 또는 2층 이상의 다층 구조로 이루어지고, 표면층은 TiaAlbMecC1-xNxOy(0.5≤x≤1, 0≤y≤0.5, a, b, c, x, y는 원자비, Me는 주기율표의 4족 원소, 5족 원소, 6족 원소, Si, B 및 S로부터 선택되는 1종 이상)로 이루어지고, 상기 절삭공구의 인선부의 조성이 0.6≤a≤0.9, 0.1≤b≤0.3, 0≤c≤0.1 이고, 상기 절삭공구의 여유면의 중앙부 조성이 0.2≤a≤0.55, 0.45≤b≤0.7, 0≤c≤0.1 인 것을 특징으로 한다.The present invention relates to a cutting tool in which a hard film is formed on a hard base material such as cemented carbide, cermet, or CBN.
The cutting tool according to the present invention is a cutting tool including a hard base material and a hard film formed on the hard base material. The hard film has a single layer or a multi-layer structure of two or more layers, and the surface layer is Ti a Al b Me c. C 1- x N (one or more selected from Si, B and S), the composition of the cutting edge of the cutting tool is 0.6≤a≤0.9, 0.1≤b≤0.3, 0≤c≤0.1, and the clearance surface of the cutting tool is It is characterized in that the central composition is 0.2≤a≤0.55, 0.45≤b≤0.7, and 0≤c≤0.1.
Description
본 발명은 절삭공구에 사용되는 초경합금, 써멧, 세라믹, 입방정 질화붕소와 같은 경질모재 상에 형성되는 경질피막에 관한 것이며, 보다 상세하게는, 절삭공구에 형성되는 경질피막의 부위별 조성을 다르게 제어함으로써 개선된 수명을 갖는 절삭공구에 관한 것이다.The present invention relates to a hard film formed on hard base materials such as cemented carbide, cermet, ceramic, and cubic boron nitride used in cutting tools, and more specifically, by controlling the composition of the hard film formed on the cutting tool differently for each part. It relates to cutting tools with improved service life.
절삭공구는 피삭재와의 마찰에 대한 내마모성, 윤활성, 내충격성, 내산화성 등의 다양한 특성이 필요하다. 이를 위해 절삭공구의 수명 향상을 위해 각종 세라믹스로 이루어지는 경질피막을 절삭공구에 형성하는 기술이 채용되고 있다.Cutting tools require various properties such as wear resistance against friction with the workpiece, lubrication, impact resistance, and oxidation resistance. To this end, a technology for forming a hard film made of various ceramics on a cutting tool is being adopted to improve the lifespan of the cutting tool.
Ti와 Al의 질화물로 이루어진 TiAlN계 박막은 Al의 함량이 감소할수록 Pugh's 계수가 감소하는 경향을 보이며 Al 함량이 30at% 이하일 때 0.7 이하의 값을 가진다. 반면 TiAlN계 박막의 경도는 Al 함량이 증가함에 따라 증가하는 경향을 보이며 특히 Al 함량이 45% 이상일 때, 경도 포화점에 근접하게 특성을 보인다.TiAlN-based thin films made of nitrides of Ti and Al show a tendency for Pugh's coefficient to decrease as the Al content decreases, and have a value of 0.7 or less when the Al content is 30 at% or less. On the other hand, the hardness of TiAlN-based thin films tends to increase as the Al content increases, and especially when the Al content is more than 45%, the hardness approaches the saturation point.
한편, 절삭공구의 경우, 예를 들어 지속적인 충격이 가해지는 인선(cutting edge)부와, 칩(chip)과의 마찰이 지속적으로 일어나는 경사면(rake face) 및/또는 여유면(flank face)에 요구되는 경질피막의 특성은 달라질 수 있다.Meanwhile, in the case of cutting tools, for example, it is required for the cutting edge, which is subject to continuous impact, and the rake face and/or flank face, where friction with chips occurs continuously. The properties of the hard film may vary.
본 발명의 과제는 종래의 경질피막에 비해 내마모성과 내치핑성이 보다 향상되는 절삭공구용 경질피막을 제공하는 것이다.The object of the present invention is to provide a hard coating for cutting tools that has improved wear resistance and chipping resistance compared to conventional hard coatings.
본 발명은, 경질모재와, 상기 경질모재 상에 형성된 경질피막을 포함하는 절삭공구로, 상기 경질피막은 단층 또는 2층 이상의 다층 구조로 이루어지고, 표면층은 TiaAlbMecC1-xNxOy(0.5≤x≤1, 0≤y≤0.5, a, b, c, x, y는 원자비, Me는 주기율표의 4족 원소, 5족 원소, 6족 원소, Si, B 및 S로부터 선택되는 1종 이상)로 이루어지고, 상기 절삭공구의 인선부의 조성이 0.6≤a≤0.9, 0.1≤b≤0.3, 0≤c≤0.1이고, 상기 절삭공구의 여유면의 중앙부 조성이 0.2≤a≤0.55, 0.45≤b≤0.7, 0≤c≤0.1 인, 절삭공구를 제공한다.The present invention is a cutting tool comprising a hard base material and a hard film formed on the hard base material, wherein the hard film is made of a single layer or a multi-layer structure of two or more layers, and the surface layer is Ti a Al b Me c C 1-x N _ S), the composition of the edge portion of the cutting tool is 0.6≤a≤0.9, 0.1≤b≤0.3, 0≤c≤0.1, and the composition of the central portion of the relief surface of the cutting tool is 0.2 A cutting tool with ≤a≤0.55, 0.45≤b≤0.7, and 0≤c≤0.1 is provided.
또한, 상기 경질피막의 총 두께는 0.5 ~ 10㎛이고, 상기 표면층의 두께는 0.1 ~ 3㎛ 일 수 있다.Additionally, the total thickness of the hard film may be 0.5 to 10 ㎛, and the thickness of the surface layer may be 0.1 to 3 ㎛.
또한, 상기 표면층에 있어서, 인선부의 Al 원자비(RAl)에 대한 여유면 중앙부의 Al 원자비(CAl)의 비율인, CAl/RAl이 1.5 ~ 7 일 수 있다.Additionally, in the surface layer, C Al /R Al , which is the ratio of the Al atomic ratio (C Al ) in the center of the relief surface to the Al atomic ratio (R Al ) in the edge portion, may be 1.5 to 7 .
또한, 상기 표면층에 있어서, 상기 인선부로부터 500㎛ 떨어진 경사면의 조성이 0.2≤a≤0.55, 0.45≤b≤0.7, 0≤c≤0.1 일 수 있다.Additionally, in the surface layer, the composition of the inclined surface 500㎛ away from the cutting edge may be 0.2≤a≤0.55, 0.45≤b≤0.7, and 0≤c≤0.1.
본 발명에 따른 절삭공구는 절삭가공 시에 지속적인 충격이 가해지는 인선부의 내치핑성을 향상시키고, 칩과 마찰이 지속적으로 일어나는 여유면의 내마모성을 향상시킴으로써, 경질피막의 위치 영역에 맞추어 국소적으로 최적의 절삭성능을 발휘하도록 함으로써, 절삭공구의 수명을 연장할 수 있다.The cutting tool according to the present invention improves the chipping resistance of the cutting edge where continuous impact is applied during cutting, and improves the wear resistance of the flank surface where chips and friction continuously occur, so that it is applied locally to the location area of the hard film. By ensuring optimal cutting performance, the life of the cutting tool can be extended.
도 1은 인써트 형상의 절삭공구의 인선부, 경사면, 여유면 및 여유면의 중심을 나타낸 도면이다.
도 2는 드릴 형상의 절삭공구의 인선부 및 여유면 중심을 나타낸 도면이다.
도 3은 본 발명의 일 실시형태에 따른 경질피막의 Al 함량의 상태를 개략적으로 나타낸 것이다.Figure 1 is a diagram showing the center of the cutting edge, rake surface, relief surface, and relief surface of an insert-shaped cutting tool.
Figure 2 is a diagram showing the cutting edge and the center of the relief surface of a drill-shaped cutting tool.
Figure 3 schematically shows the state of Al content of a hard film according to an embodiment of the present invention.
이하 본 발명을 설명함에 있어, 관련된 공지 기능 또는 구성에 대한 구체적인 설명이 본 발명의 요지를 불필요 하게 흐릴 수 있다고 판단되는 경우에는 그 상세한 설명을 생략할 것이다. 또한, 어떤 부분이 어떤 구성요소를 '포함'한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다.Hereinafter, in describing the present invention, if it is determined that a detailed description of a related known function or configuration may unnecessarily obscure the gist of the present invention, the detailed description will be omitted. Additionally, when a part is said to 'include' a certain component, this does not mean that other components are excluded, but that it can further include other components, unless specifically stated to the contrary.
본 발명은, 경질모재와, 상기 경질모재 상에 형성된 경질피막을 포함하는 절삭공구이다.The present invention is a cutting tool comprising a hard base material and a hard film formed on the hard base material.
[경질모재][Hard base material]
경질모재는 절삭공구에 사용되는 다양한 종류의 물질로 이루어질 수 있으며, 예를 들어, 초경합금, 써멧, 세라믹, 입방정 질화붕소 등의 물질이 사용될 수 있다.The hard base material may be made of various types of materials used in cutting tools. For example, materials such as cemented carbide, cermet, ceramic, and cubic boron nitride may be used.
상기 경질모재는 절삭공구에 요구되는 형상에 맞추어 성형될 수 있으며, 예를 들면, 인써트(insert) 형상 또는 드릴(drill) 형상으로 성형된 것일 수 있다.The hard base material may be molded to fit the shape required for the cutting tool, for example, it may be molded into an insert shape or a drill shape.
인써트(insert) 형상으로 성형된 절삭공구는, 도 1에 도시된 바와 같이, 대략 직육면체 형상으로 형성되고 중심부에 체결공이 형성되어 있다. 도면에서 상면은 경사면(rake face)을 형성하고 도면에서 측면은 여유면(flank face)을 형성하며, 경사면과 여유면의 경계부가 인선(cutting edge)부를 형성하며, 4개의 모서리부분이 노즈부를 형성한다.As shown in FIG. 1, the cutting tool formed into an insert shape is formed in a substantially rectangular parallelepiped shape and has a fastening hole formed in the center. In the drawing, the upper surface forms a rake face, the side surface in the drawing forms a flank face, the boundary between the rake face and the flank face forms a cutting edge, and the four corners form a nose part. do.
인써트(insert) 형상의 절삭공구의 경우, 여유면의 "중앙부"는, 도 1에 도시된 바와 같이, 여유면을 구성하는 4개의 모서리의 대각선이 교차하는 지점을 의미한다.In the case of an insert-shaped cutting tool, the “center” of the relief surface refers to the point where the diagonals of the four corners constituting the relief surface intersect, as shown in FIG. 1.
드릴(drill) 및 엔드밀(Endmill) 형상으로 성형된 절삭공구의 '중앙부'는, 도 2에 도시된 바와 같이, 밑날로부터 2mm 이상 떨어진 날장의 인선부와 수직방향으로 도식할 경우 만나는 다음 절삭날간 거리의 중앙 부분을 의미한다.As shown in Figure 2, the 'central part' of a cutting tool formed in the shape of a drill or endmill is the cutting edge of the blade that is 2 mm or more away from the base edge and the next cutting edge that meets when drawn in the perpendicular direction. It refers to the central part of the street.
[경질피막][Hard membrane]
경질피막은 상기 경질모재 상에 형성되는 피막이다.A hard film is a film formed on the hard base material.
본 발명의 일 실시형태에 있어서, 상기 경질피막은, 상기 경질피막은 단층 또는 2층 이상의 다층 구조로 이루어지고, 표면층은 TiaAlbMecC1-xNxOy(0.5≤x≤1, 0≤y≤0.5, a, b, c, x, y는 원자비, Me는 주기율표의 4족 원소, 5족 원소, 6족 원소, Si, B 및 S로부터 선택되는 1종 이상)로 이루어지고, 상기 절삭공구의 인선부의 조성이 0.6≤a≤0.9, 0.1≤b≤0.3, 0≤c≤0.1이고, 상기 절삭공구의 여유면의 중앙부 조성이 0.2≤a≤0.55, 0.45≤b≤0.7, 0≤c≤0.1 인 것을 특징으로 한다.In one embodiment of the present invention, the hard film is composed of a single layer or a multi-layer structure of two or more layers, and the surface layer is Ti a Al b Me c C 1-x N x O y (0.5≤x≤ 1, 0≤y≤0.5, a, b, c, x, y is the atomic ratio, Me is one or more selected from group 4 elements, group 5 elements, group 6 elements of the periodic table, Si, B and S) The composition of the cutting edge of the cutting tool is 0.6≤a≤0.9, 0.1≤b≤0.3, 0≤c≤0.1, and the composition of the central portion of the relief surface of the cutting tool is 0.2≤a≤0.55, 0.45≤b≤ It is characterized by 0.7, 0≤c≤0.1.
본 발명에 있어서, 상기 인선부란 인선을 기준으로 경사면 및 여유면 방향을 인선부에서 수직한 방향을 따라 각각 50㎛ 이내의 범위를 의미하고, 여유면의 중앙부란 여유면의 중앙 지점과 중앙 지점으로부터 반경 50㎛ 이내의 범위를 의미한다.In the present invention, the cutting edge area refers to a range within 50㎛ in the direction perpendicular to the cutting edge in the direction of the inclined surface and relief surface based on the cutting edge, and the center of the relief surface refers to the area between the center point and the center point of the relief surface. This refers to the range within a radius of 50㎛.
본 발명은, 표면층을 구성하는 TiaAlbMecC1-xNxOy 피막에 있어서, 인선부에 형성되는 표면층의 Al의 원자비는 0.1 ~ 0.3으로 낮게 유지하여 인선부에 지속적으로 가해지는 충격에 대응할 수 있는 인성을 부여하여 인선부의 내치핑성을 향상시킨다. 또한, 표면층을 구성하는 TiaAlbMecC1-xNxOy 피막에 있어서, 여유면의 중앙부에는 Al의 원자비를 0.45 ~ 0.70으로 높게 하여 내마모성을 향상시킴으로써, 칩과 마찰이 지속적으로 일어나는 여유면의 내마모성을 향상시킨다. 즉, 본 발명은 표면층을 구성하는 TiAlN계 피막의 Al의 원자비를 인선부와 여유면을 다르게 조절하여 국소적으로 우선적으로 요구되는 피막의 물성에 대응함으로써, 절삭공구의 수명을 보다 더 연장하는 효과를 얻는다.In the present invention, in the Ti a Al b Me c C 1- x N It improves the chipping resistance of the cutting edge by providing toughness that can respond to applied impacts. In addition, in the Ti a Al b Me c C 1- x N It improves the wear resistance of the relief surface that occurs due to In other words, the present invention adjusts the Al atomic ratio of the TiAlN-based film constituting the surface layer differently at the cutting edge and the relief surface to respond to the physical properties of the film that are locally preferentially required, thereby further extending the life of the cutting tool. get the effect
또한, 상기 표면층에 있어서, 인선부의 Al 원자비(RAl)에 대한 여유면 중앙부의 Al 원자비(CAl)의 비율인, CAl/RAl이 1.5 ~ 7 인 것이 바람직하다. 인선부의 Al 원자비와 여유면 중앙부의 Al 원자비의 차이가 적어도 상기 수치 범위 이상으로 차이가 나는 것이 인선부의 내치핑성 향상 및 여유면의 내마모성 향상의 국소 최적화 효과를 통한 전체적인 절삭공구 수명 연장에 더 바람직하기 때문이다.In addition, in the surface layer, C Al /R Al , which is the ratio of the Al atomic ratio (C Al ) in the center of the relief surface to the Al atomic ratio (R Al ) in the edge portion, is preferably 1.5 to 7 . The difference between the Al atomic ratio in the cutting edge and the Al atomic ratio in the center of the flank is at least greater than the above value range, which extends the overall cutting tool life through the local optimization effect of improving the chipping resistance of the cutting edge and improving the wear resistance of the flank. Because it is more desirable.
또한, 상기 경질피막의 두께는 0.5 ~ 10㎛ 인 것이 바람직한데, 경질피막의 두께가 0.5㎛ 미만일 경우 경질피막이 갖는 효과가 충분하지 않고, 10㎛ 초과일 경우, 내부응력이 커져 내치핑성이 오히려 저하할 수 있기 때문이다.In addition, the thickness of the hard film is preferably 0.5 to 10㎛. If the thickness of the hard film is less than 0.5㎛, the effect of the hard film is not sufficient, and if it is more than 10㎛, the internal stress increases and the chipping resistance is rather poor. This is because it can deteriorate.
또한, 상기 표면층의 두께는 0.5 ~ 10㎛ 인 것이 바람직한데, TiAlN계 피막인 표면층의 두께가 0.5㎛ 미만일 경우 표면층이 갖는 효과가 충분하지 않고, 10㎛ 초과일 경우, 내부응력이 커져 내치핑성이 오히려 저하할 수 있기 때문이다.In addition, the thickness of the surface layer is preferably 0.5 to 10㎛. If the thickness of the surface layer, which is a TiAlN-based film, is less than 0.5㎛, the effect of the surface layer is not sufficient, and if it is more than 10㎛, internal stress increases, reducing chipping resistance. This is because it can actually deteriorate.
또한, 상기 인선부로부터 500㎛ 이상 떨어진 경사면 영역에 있어서, 표면층의 조성이 0.2≤a≤0.55, 0.45≤b≤0.7, 0≤c≤0.1의 조성으로 형성될 수 있다.Additionally, in the inclined surface area more than 500㎛ away from the cutting edge, the surface layer may have a composition of 0.2≤a≤0.55, 0.45≤b≤0.7, and 0≤c≤0.1.
<실시예><Example>
본 발명의 실시예에서는 초경합금으로 이루어진 모재 표면에 2가지의 표면처리(이온 봄바드먼트(Ion Bombardment)와 물리적 기상 증착법(Physical vapor deposition, PVD)인 아크 이온 플레이팅 법을 이용하여, 단층 또는 2층이상의 다층구조 구성 된 경질피막을 형성하였다.In an embodiment of the present invention, two types of surface treatments (ion bombardment and physical vapor deposition (PVD)) are used on the surface of the base material made of cemented carbide to form a single layer or two arc ion plating methods. A hard film composed of more than one layer was formed.
구체적으로, 코팅에 사용한 타겟으로는 Ti, Al, TiAl, AlTi, TiAlSi, AlTiSi의 아크 타겟을 사용하였으며, 상기 모재를 습식 마이크로 블라스팅 및 초순수로 세척한 뒤 건조한 상태에서 코팅로 내 회전 테이블 상의 중심축에서 반경 방향으로 소정 거리 떨어진 위치에 원주를 따라 장착하고 코팅로 내 초기 진공압력을 8.5×10-5 Torr 이하로 감압하였다Specifically, arc targets of Ti, Al, TiAl, AlTi, TiAlSi, and AlTiSi were used as targets for coating. The base material was washed with wet microblasting and ultrapure water, then dried and placed on the central axis on the rotary table in the coating furnace. It was installed along the circumference at a predetermined distance in the radial direction, and the initial vacuum pressure in the coating furnace was reduced to below 8.5×10 -5 Torr.
온도를 400 ~ 600℃로 가열한 후 Ar 가스 분위기 하에서 상기 회전 테이블 상에서 자전하면서 회전하는 모재에 Ar 가스 분위기 하에서 바이어스(bias) 전압을 -400 ~ -200V을 인가하여 30 ~ 90분간 Ar 이온 봄바드먼트(Ion Bombardment)를 수행하였다. 그 후, -1000 ~ -600V의 바이어스 전압을 인가하고, 아크타겟(Ti, Cr 중 하나)에 아크 전류 70 ~ 150A를 공급하여 1 ~ 20분간 금속(반금속 포함) 이온 봄바드먼트(Ion bombardment)를 수행하였다. 금속 이온 봄바드먼트는 Ar 이온 봄바드먼트 수행 전에 이루어질 수도 있다. 코팅을 위한 가스 압력은 50mTorr 이하 바람직하게는 40mTorr 이하로 유지하여, 단층 또는 2층 이상의 다층구조의 박막을 성막하였다.After heating to a temperature of 400 to 600°C, a bias voltage of -400 to -200 V is applied to the rotating base material on the rotary table under an Ar gas atmosphere, and an Ar ion bombard is applied for 30 to 90 minutes. Ion bombardment was performed. After that, a bias voltage of -1000 to -600V is applied, and an arc current of 70 to 150A is supplied to the arc target (either Ti or Cr) to perform metal (including semi-metal) ion bombardment for 1 to 20 minutes. ) was performed. Metal ion bombardment may be performed before performing Ar ion bombardment. The gas pressure for coating was maintained at 50 mTorr or less, preferably 40 mTorr or less, and a thin film with a single-layer or two-layer or more multi-layer structure was formed.
상기 박막은 TiAl, AlCr, TiAlSi 타겟을 사용하여 바이어스 전압 -100 ~ -30V, 아크 전류 100 ~ 150A, 반응가 스로 N2를 주입하여 압력 20 ~ 40mtorr 조건으로 성막하였다. The thin film was formed using TiAl, AlCr, and TiAlSi targets under conditions of bias voltage of -100 to -30V, arc current of 100 to 150A, and N 2 as a reaction gas injected at a pressure of 20 to 40 mtorr.
제2 피막은 TiAl, AlCr, TiAlSi 타겟을 사용하여 바이어스 전압 -100 ~ -30V, 아크 전류 100 ~ 150A, 반응가스로 N2를 주입하여 압력 20 ~ 40mtorr 조건으로 성막하였다.The second film was formed using TiAl, AlCr, and TiAlSi targets at a bias voltage of -100 to -30V, an arc current of 100 to 150A, and N 2 as a reaction gas injected at a pressure of 20 to 40 mtorr.
상기한 조건으로 본 발명의 실시예와 비교예를 제조하였으며, 이에 해당되는 경질 피막의 조건, 두께에 대한 기 본 정보를 아래 표 1에 나타내었다. 코팅조건은 장비특성 및 조건에 따라 달라질 수 있다.The examples and comparative examples of the present invention were manufactured under the above-mentioned conditions, and basic information on the conditions and thickness of the corresponding hard film is shown in Table 1 below. Coating conditions may vary depending on equipment characteristics and conditions.
(조성비)target 1
(Composition fee)
(조성비)target 2
(Composition fee)
(um)thickness
(um)
(조성비)target
(Composition fee)
전압
(V)bias
Voltage
(V)
(um)thickness
(um)
표 1의 조건에 따라 만들어진 샘플에 대해서 부위별 Al함량을 측정하였다. 표 1에 따른 실시예와 비교예의 경질 피막의 단면을 SEM(Scanning Electron Microscope) 15,000배율로 분석하고 EDS(Energy Dispersive Spectrometer)로 조성을 분석하여, 도 1과 같이 절삭공구의 여유면과 경사면이 만나는 지점을 인선부 R이라고 하고, 상기 인선부의 표면층 피막의 Al 원자비를 RAl, 상기 여유면의 중앙 지점을 CAl라고 하고, C의 주변 50㎛ 이내의 표면층의 Al 원자비를 Ca라고 했을 때의 결과를 하기 표 2에 나타내었다.(이때의 Al 함량은 비금속을 제외한 함량이다.)The Al content of each part was measured for samples made according to the conditions in Table 1. The cross sections of the hard films of the examples and comparative examples according to Table 1 were analyzed at a magnification of 15,000 with a SEM (Scanning Electron Microscope) and the composition was analyzed with an EDS (Energy Dispersive Spectrometer), and the point where the relief surface of the cutting tool and the inclined surface meet as shown in Figure 1. is called the cutting edge R, the Al atomic ratio of the surface layer film of the cutting edge part is R Al , the central point of the relief surface is C Al , and the Al atomic ratio of the surface layer within 50㎛ around C is C a . The results are shown in Table 2 below. (The Al content at this time is the content excluding non-metals.)
실시예의 경우 EDS로 분석 결과 표면층의 인선부 Al 함량(원자비)이 0.1<Ra≤0.3을 만족하고, 표면층의 여유면 중앙부의 Al 함량(원자비) 0.45≤Ca≤0.7의 범위를 만족하는 것을 확인할 수 있다. 이와 같이 형성된 경질 피막의 내마모성과 내치핑성을 다음과 같은 조건으로 평가하였다.In the case of the example, as a result of analysis by EDS, the Al content (atomic ratio) of the edge part of the surface layer satisfies 0.1<R a ≤0.3, and the Al content (atomic ratio) of the center of the relief surface of the surface layer satisfies the range of 0.45≤C a ≤0.7. You can check that it does. The wear resistance and chipping resistance of the hard film formed in this way were evaluated under the following conditions.
(1) 내마모성 평가(1) Wear resistance evaluation
피삭재: 탄소강 SM45C (300mm*200mm*100mm)Work material: Carbon steel SM45C (300mm*200mm*100mm)
샘플형번: SNMX1206ANN-MMSample model number: SNMX1206ANN-MM
절삭속도: 250 m/minCutting speed: 250 m/min
절삭이송: 0.2 mm/revCutting feed: 0.2 mm/rev
절삭깊이: 2.0 mmCutting depth: 2.0 mm
절삭유: 사용Coolant: Used
(2) 내치핑성 평가(2) Chipping resistance evaluation
피삭재: 스테인리스강 SUS316 (300mm*200mm*100mm)Work material: Stainless steel SUS316 (300mm*200mm*100mm)
샘플형번: ADKT170608PESR-MFSample model number: ADKT170608PESR-MF
절삭속도: 90 m/minCutting speed: 90 m/min
절삭이송: 0.25 mm/toothCutting feed: 0.25 mm/tooth
절삭깊이: 4mmCutting depth: 4mm
절삭유: 미사용Coolant: Not used
상기와 같이 2가지 조건으로 평가한 가공 결과를 하기 표3에 나타내다.The processing results evaluated under the two conditions as described above are shown in Table 3 below.
(mm)Processing length
(mm)
(mm)Processing length
(mm)
상기 절삭 성능 평가 결과와 같이 실시예 1 ~ 7은, 비교예 1 ~ 7 보다 우수한 공구 수명을 나타내었다. 특히, SM45C 피삭재 가공길이가 현저히 증가하면서 SUS316 피삭재 가공길이도 향상된 결과를 보여주었다. 이를 통해 인선부와 경사면과 여유면의 Al 함량 차이를 통해 내마모와 내치핑성을 보완하여 공구의 수명이 향상됨을 확인할 수 있었다.As shown in the cutting performance evaluation results, Examples 1 to 7 showed superior tool life than Comparative Examples 1 to 7. In particular, as the machining length of SM45C workpiece significantly increased, the machining length of SUS316 workpiece also showed improved results. Through this, it was confirmed that the lifespan of the tool was improved by supplementing wear resistance and chipping resistance through the difference in Al content between the cutting edge, rake surface, and relief surface.
Claims (4)
상기 경질모재 상에 형성된 경질피막을 포함하는 절삭공구로,
상기 경질피막은 2층 이상의 다층 구조로 이루어지고,
상기 다층 구조로 이루어진 경질피막의 표면층은 TiaAlbMecC1-xNxOy(0.5≤x≤1, 0≤y≤0.5, a, b, c, x, y는 원자비, Me는 주기율표의 4족 원소, 5족 원소, 6족 원소, Si, B 및 S로부터 선택되는 1종 이상)로 이루어지고,
상기 절삭공구의 인선부의 조성이 0.6≤a≤0.9, 0.1≤b≤0.3, 0≤c≤0.1이고, 상기 절삭공구의 여유면의 중앙부 조성이 0.2≤a≤0.55, 0.45≤b≤0.7, 0≤c≤0.1 이고,
상기 경질피막의 총 두께는 0.5 ~ 10㎛이고, 상기 표면층의 두께가 0.1 ~ 3㎛ 인, 절삭공구.
Hard base material,
A cutting tool comprising a hard film formed on the hard base material,
The hard film has a multi-layer structure of two or more layers,
The surface layer of the hard film composed of the multilayer structure is Ti a Al b Me c C 1-x N x O y (0.5≤x≤1, 0≤y≤0.5, a, b, c, x, y are atomic ratios, Me consists of one or more elements selected from Group 4, Group 5, Group 6 elements of the periodic table, Si, B, and S,
The composition of the cutting edge of the cutting tool is 0.6≤a≤0.9, 0.1≤b≤0.3, 0≤c≤0.1, and the composition of the central portion of the relief surface of the cutting tool is 0.2≤a≤0.55, 0.45≤b≤0.7, 0 ≤c≤0.1,
A cutting tool wherein the total thickness of the hard film is 0.5 to 10 ㎛, and the thickness of the surface layer is 0.1 to 3 ㎛.
상기 표면층에 있어서, 인선부의 Al 원자비(RAl)에 대한 여유면 중앙부의 Al 원자비(CAl)의 비율인, CAl/RAl이 1.5 ~ 7 인, 절삭공구.
According to claim 1,
In the surface layer, C Al /R Al , which is the ratio of the Al atomic ratio (C Al ) in the center of the relief surface to the Al atomic ratio (R Al ) in the cutting tool, is 1.5 to 7.
상기 표면층에 있어서, 상기 인선부로부터 500㎛ 떨어진 경사면의 조성이 0.2≤a≤0.55, 0.45≤b≤0.7, 0≤c≤0.1 인, 절삭공구.
According to claim 1,
In the surface layer, the composition of the inclined surface 500㎛ away from the cutting edge is 0.2≤a≤0.55, 0.45≤b≤0.7, 0≤c≤0.1.
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KR20060050142A (en) * | 2004-07-13 | 2006-05-19 | 산드빅 인터렉츄얼 프로퍼티 에이비 | Coated insert |
JP5066301B2 (en) | 2010-09-29 | 2012-11-07 | 京セラ株式会社 | Cutting tools |
JP6984108B2 (en) * | 2018-03-07 | 2021-12-17 | 住友電工ハードメタル株式会社 | Surface coating cutting tool and its manufacturing method |
KR20220066455A (en) * | 2020-11-16 | 2022-05-24 | 한국야금 주식회사 | Hard film for cutting tools |
KR20220124167A (en) * | 2020-01-08 | 2022-09-13 | 스미또모 덴꼬오 하드메탈 가부시끼가이샤 | cutting tool |
KR20230102643A (en) * | 2021-12-30 | 2023-07-07 | 한국야금 주식회사 | Cutting tools with hard coating |
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KR20060050142A (en) * | 2004-07-13 | 2006-05-19 | 산드빅 인터렉츄얼 프로퍼티 에이비 | Coated insert |
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