KR102625829B9 - - Fixed-abrasive Polishing Pad and Fabrication Method using Vertically Aligned Carbon Nanotubes - Google Patents

- Fixed-abrasive Polishing Pad and Fabrication Method using Vertically Aligned Carbon Nanotubes

Info

Publication number
KR102625829B9
KR102625829B9 KR1020210089224A KR20210089224A KR102625829B9 KR 102625829 B9 KR102625829 B9 KR 102625829B9 KR 1020210089224 A KR1020210089224 A KR 1020210089224A KR 20210089224 A KR20210089224 A KR 20210089224A KR 102625829 B9 KR102625829 B9 KR 102625829B9
Authority
KR
South Korea
Prior art keywords
fixed
carbon nanotubes
polishing pad
vertically aligned
fabrication method
Prior art date
Application number
KR1020210089224A
Other languages
Korean (ko)
Other versions
KR102625829B1 (en
KR20220152106A (en
Inventor
김산하
강석경
김성재
정지훈
Original Assignee
한국과학기술원
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 한국과학기술원 filed Critical 한국과학기술원
Priority to US17/526,134 priority Critical patent/US20220355435A1/en
Publication of KR20220152106A publication Critical patent/KR20220152106A/en
Application granted granted Critical
Publication of KR102625829B1 publication Critical patent/KR102625829B1/en
Publication of KR102625829B9 publication Critical patent/KR102625829B9/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/24Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
KR1020210089224A 2021-05-07 2021-07-07 Fixed-abrasive Polishing Pad and Fabrication Method using Vertically Aligned Carbon Nanotubes KR102625829B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US17/526,134 US20220355435A1 (en) 2021-05-07 2021-11-15 Fixed-abrasive pad using vertically aligned carbon nanotubes and fabrication method for the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20210058912 2021-05-07
KR1020210058912 2021-05-07

Publications (3)

Publication Number Publication Date
KR20220152106A KR20220152106A (en) 2022-11-15
KR102625829B1 KR102625829B1 (en) 2024-01-15
KR102625829B9 true KR102625829B9 (en) 2024-03-13

Family

ID=84042064

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020210089224A KR102625829B1 (en) 2021-05-07 2021-07-07 Fixed-abrasive Polishing Pad and Fabrication Method using Vertically Aligned Carbon Nanotubes

Country Status (1)

Country Link
KR (1) KR102625829B1 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4049369B2 (en) * 2002-07-31 2008-02-20 京セラキンセキ株式会社 Polishing carrier
JP2004358588A (en) * 2003-06-03 2004-12-24 Unitika Ltd Abrasive pad and its manufacturing method
JP2009190155A (en) * 2008-02-18 2009-08-27 Daiken Chemical Co Ltd Polishing tool
JP6924436B2 (en) * 2017-06-26 2021-08-25 山形県 Carbon nanotube-coated abrasive grains

Also Published As

Publication number Publication date
KR102625829B1 (en) 2024-01-15
KR20220152106A (en) 2022-11-15

Similar Documents

Publication Publication Date Title
ZA202204925B (en) Fiber-optic current transformer based on nitrogen-vacancy (nv) centers in diamond, and measurement method
WO2009088772A3 (en) Interface pad for use between an abrasive article and a support tool
SG11202012350RA (en) Polishing pads formed using an additive manufacturing process and methods related thereto
EP2428984A4 (en) Semiconductor wafer polishing method and polishing pad shaping jig
IL211092A0 (en) Polishing pad and method for manufacturing the same
IL281120A (en) Dual-purpose grinder and operating method thereof
EP4119292A4 (en) Polishing composition and polishing method
EP4095097A4 (en) Metal-adsorbing composite material based on magnetic graphene oxide and method for obtaining same
EP3683019A4 (en) Porous polyurethane polishing pad and method for manufacturing same
KR102625829B9 (en) - Fixed-abrasive Polishing Pad and Fabrication Method using Vertically Aligned Carbon Nanotubes
GB2593786B (en) Apparatus and method for electron irradiation scrubbing
SG10202012033VA (en) Polishing method and polishing apparatus
EP4101588A4 (en) Polishing head and polishing device
KR102447341B9 (en) Mammography apparatus and mammography method
TW200742638A (en) Polishing pad and method thereof
GB2605212B (en) Apparatus and method for electron irradiation scrubbing
KR102509973B9 (en) Polishing pad preparing method of the same and preparing method of semiconductor device using the same
GB202009991D0 (en) Pad and padding
GB202113683D0 (en) Use and method
SG11202103983YA (en) Polyurethane for use in polishing layer, polishing layer, polishing pad, and method for modifying polishing layer
SG10202005366QA (en) Polishing method and polishing apparatus
SG10202004630TA (en) Polishing apparatus and polishing method
SG10202001455RA (en) Polishing method and polishing apparatus
GB202009095D0 (en) Apparatus, method and use
KR102305796B9 (en) Wafer polishing pad apparatus and manufacturing method thereof

Legal Events

Date Code Title Description
E902 Notification of reason for refusal
AMND Amendment
E601 Decision to refuse application
AMND Amendment
X701 Decision to grant (after re-examination)
GRNT Written decision to grant
G170 Re-publication after modification of scope of protection [patent]