KR102581725B1 - A residual gas extraction and filling system for recycling waste gas - Google Patents

Abstract

The present invention involves a first process of activating the remaining gas by heating the cylinder in which the remaining gas remains, extracting the remaining gas using the natural exhaust pressure of the remaining gas, and then charging the remaining gas, and forcing the remaining gas using an external vacuum force. This invention allows the second process of extraction and charging to proceed sequentially, providing the effect of recycling the residual gas remaining in the cylinder after being used as industrial gas through extraction and charging without disposing of it. First cylinder 100, plurality of second cylinders 200, buffer tank 300, booster pump 400, heating jacket 500, vacuum pump unit 600, piping unit 700, control unit 800 ) is characterized in that it is composed of.

Description

{A residual gas extraction and filling system for recycling waste gas}

The present invention relates to a residual gas extraction and charging system, and specifically, to extract and recycle the residual gas remaining in the cylinder after being used as industrial gas, instead of disposing of it, by heating the cylinder in which the residual gas remains. After activating the remaining gas, the first process of extracting the remaining gas using the natural exhaust pressure of the remaining gas and charging it, and the second process of forcibly extracting the remaining gas using an external vacuum force and then charging it are sequentially performed. This relates to a technology that allows the residual gas remaining in the cylinder after being used as industrial gas to be recycled through extraction and charging rather than being disposed of.

In modern society, products with various functions and forms are being produced due to the development of science and technology, and various forms of energy and power are used in industrial sites to produce products with various functions and forms.

Among the various forms of energy and power used in industrial sites, there is industrial gas. Industrial gas can cause various safety accidents and environmental pollution, such as explosions and fires due to careless handling, and poisoning due to gas leaks. Therefore, for safety, use cylinders. It is stored, charged, and used.

The cylinder in which industrial gas is stored is initially in a state of high internal pressure due to the large amount of gas charged inside the cylinder, so the natural discharge pressure for gas to be discharged outside the cylinder is high. However, as gas continues to be used, the pressure inside the cylinder decreases. When the amount of gas discharged to the outside decreases and falls below a certain amount, the natural discharge pressure of the industrial gas remaining inside the cylinder is lowered, making it difficult to use, so it is generally disposed of even though there is industrial gas remaining inside the cylinder.

In particular, when disposing of cylinders with residual industrial gas, there is a problem of incurring additional costs as they must be disposed of through specialized waste gas treatment facilities.

In addition, some industrial gases are expensive, and some special gases cannot be produced domestically and are imported from foreign countries. Therefore, disposing of industrial gases remaining inside the cylinder can be considered a waste of money. .

Therefore, in order to solve the conventional needs and problems, the present invention heats the cylinder in which the residual gas remains so that the residual gas remaining in the cylinder after being used as industrial gas can be extracted and recycled instead of being disposed of. After activation, the first process of extracting the remaining gas using the natural exhaust pressure of the remaining gas and the second process of forcibly extracting the remaining gas using an external vacuum force are sequentially performed to remove the remaining gas in the cylinder after being used as industrial gas. We would like to propose a technology that allows the residual gas to be recycled through extraction and charging rather than being disposed of. The following are related prior arts.

1. Republic of Korea Patent Publication No. 10-1275428 Waste gas treatment device using visible light 2. Republic of Korea Patent Publication No. 10-2107291 Waste gas treatment system 3. Republic of Korea Patent Publication No. 10-2147166 Regeneration and recovery of sulfur dioxide from waste gas

The present invention is to activate the residual gas by heating the cylinder in which the residual gas remains so that the residual gas remaining in the cylinder after being used as industrial gas can be extracted and recycled instead of being disposed of, and then the natural discharge pressure of the residual gas is activated. The purpose is to extract and recharge the remaining gas using .

In addition, the purpose of the present invention is to forcibly extract and charge the remaining remaining gas using an external vacuum force after extracting and charging the remaining gas using natural exhaust pressure.

In order to achieve the above object, the residual gas extraction and charging system of the present invention is,

A plurality of first cylinders (100) to extract residual gas remaining inside;

a plurality of second cylinders (200) filled with residual gas discharged from the plurality of first cylinders (100);

a buffer tank 300 that collects the remaining gas discharged from the plurality of first cylinders 100 and functions as a buffer for the remaining gas moving for charging;

a booster pump 400 that boosts the pressure of the residual gas discharged from the buffer tank 300 so that the residual gas collected in the buffer tank 300 is charged into the plurality of second cylinders 200;

A heating jacket 500 installed in each of the plurality of first cylinders 100 to heat the residual gas remaining inside the first cylinder 100;

A vacuum pump unit 600 installed to form a vacuum for cleaning pipes, discharge residual gas from the plurality of first cylinders 100 using vacuum, and boost the pressure of residual gas discharged from the buffer tank 300;

a piping unit 700 that guides the gas flow so that the residual gas discharged from the first plurality of cylinders 100 is charged into the plurality of second cylinders 200 via the buffer tank 300;

Cleaning control for pipe cleaning and first charging control for charging residual gas naturally discharged by the natural discharge pressure of residual gas heated by the heating jacket 500 and reduction of residual gas heated by the heating jacket 500 It is characterized by including a control unit 800 that sequentially performs a second charging control for charging the remaining gas by boosting the natural pressure and a third charging control for charging the remaining gas forcibly discharged by vacuum pressure.

The present invention involves a first process of activating the remaining gas by heating the cylinder in which the remaining gas remains, extracting the remaining gas using the natural exhaust pressure of the remaining gas, and then charging the remaining gas, and forcing the remaining gas using an external vacuum force. After extraction, the second process of charging can be performed sequentially, providing the effect of recycling the residual gas remaining in the cylinder after being used as industrial gas through extraction and charging without disposing of it.

1 is an overall configuration diagram of the present invention
Figure 2 is an overall schematic diagram of the present invention
Figure 3 is an illustration of the first cleaning control of the present invention
Figure 4 is an exemplary second cleaning control of the present invention
Figure 5 is an illustration of the first charging control of the present invention
6 is an exemplary diagram of a second charging control of the present invention.
Figure 7 is an example of a third charging control of the present invention

Embodiments of the present invention will be described in detail with reference to the attached drawings.

The present invention's residual gas extraction and charging system (hereinafter referred to as the present invention) includes a first process of heating a cylinder in which residual gas remains to activate the residual gas, extracting the residual gas using the natural exhaust pressure of the residual gas, and then charging it; After forcibly extracting the remaining gas using an external vacuum force, the second process of charging can be performed sequentially, so that the residual gas remaining in the cylinder after being used as industrial gas can be recycled through extraction and charging rather than being disposed of. An invention that provides a possible effect includes a plurality of first cylinders 100, a plurality of second cylinders 200, a buffer tank 300, a booster pump 400, a heating jacket 500, and a vacuum pump unit 600. ), a piping unit 700, and a control unit 800.

Specifically, the residual gas extraction and charging system of the present invention, as shown in FIGS. 1 and 2,

A plurality of first cylinders (100) to extract residual gas remaining inside;

a plurality of second cylinders (200) filled with residual gas discharged from the plurality of first cylinders (100);

a buffer tank 300 that collects the remaining gas discharged from the plurality of first cylinders 100 and functions as a buffer for the remaining gas moving for charging;

a booster pump 400 that boosts the pressure of the residual gas discharged from the buffer tank 300 so that the residual gas collected in the buffer tank 300 is charged into the plurality of second cylinders 200;

A heating jacket 500 installed in each of the plurality of first cylinders 100 to heat the residual gas remaining inside the first cylinder 100;

A vacuum pump unit 600 installed to form a vacuum for cleaning pipes, discharge residual gas from the plurality of first cylinders 100 using vacuum, and boost the pressure of residual gas discharged from the buffer tank 300;

a piping unit 700 that guides the gas flow so that the residual gas discharged from the first plurality of cylinders 100 is charged into the plurality of second cylinders 200 via the buffer tank 300;

Cleaning control for pipe cleaning and first charging control for charging residual gas naturally discharged by the natural discharge pressure of residual gas heated by the heating jacket 500 and reduction of residual gas heated by the heating jacket 500 It is characterized by including a control unit 800 that sequentially performs a second charging control for charging the remaining gas by boosting the natural pressure and a third charging control for charging the remaining gas forcibly discharged by vacuum pressure.

The plurality of first cylinders 100 are objects of extraction of residual gas remaining inside, and as shown in FIG. 2, each is connected to the first connection pipe 710, and each has a heating jacket 500. It is installed.

The residual gas remaining inside the first cylinder 100 is first naturally extracted by the natural discharge pressure of the residual gas generated by activating the molecular motion of the residual gas when heating the heating jacket 500, which will be described later, and the first extraction Afterwards, the remaining gas remaining inside the first cylinder 100 is forcibly extracted a second time by an external vacuum force (vacuum force of the first vacuum pump 610).

The plurality of second cylinders 200 are configured to be filled with the residual gas extracted from the plurality of first cylinders 100, and as shown in FIG. 2, are each connected to the fifth connection pipe 750, and The residual gas extracted from the first cylinder 100 is charged to a plurality of second cylinders 200 at a constant pressure by the booster pump 400.

The buffer tank 300 is configured to collect the residual gases discharged from the plurality of first cylinders 100 and discharge them, and the residual gases discharged from the plurality of first cylinders 100 at different discharge pressures flow into the buffer tank 300. After the gas is mixed, it is discharged to form a single residual gas with a uniform pressure, thereby functioning as a buffer for the residual gas moving for charging.

If the residual gas discharged from the plurality of first cylinders 100 with different discharge pressures is directly input to the booster pump 400, which will be described later, the booster pump due to the pressure difference between the residual gases input to the booster pump 400 The operating performance of 400 is reduced, and as a result, the charging efficiency of the discharged residual gas is reduced.

Therefore, it is necessary to ensure that the pressure of the remaining gases input to the booster pump 400 is the same, and the configuration for this is the buffer tank 300, and the buffer tank 300 contains a plurality of first cylinders ( After the residual gas discharged from 100) is introduced, it is mixed to form a residual gas with a uniform pressure and discharged to the booster pump 400.

The booster pump 400 is configured to boost the pressure of the residual gas discharged from the buffer tank 300 so that the plurality of second cylinders 200 are filled with the residual gas discharged from the buffer tank 300.

The residual gas discharged from the plurality of first cylinders 100 with different discharge pressures becomes residual gas with a uniform pressure through the buffer tank 300 and is then discharged from the buffer tank 300. The buffer tank ( The uniform pressure of the residual gas discharged from 300) is not enough to allow the residual gas to be charged into the second cylinder 200, so if there is no pressure boosting process, the residual gas is not in the second cylinder 200. Since it is not charged, the pressure of the remaining gas discharged from the buffer tank 300 is boosted through the booster pump 400 so that the remaining gas is charged into the second cylinder 200.

The heating jacket 500 is installed in each of the plurality of first cylinders 100 to heat the residual gas remaining inside the first cylinder 100.

The residual gas remaining inside the plurality of first cylinders 100 is small, so the pressure of the residual gas remaining inside the first cylinder 100 is low, and the residual gas is discharged from the first cylinder (100) at its own discharge pressure. 100) It is difficult to be discharged naturally to the outside.

Therefore, it is necessary to activate the molecular movement of the residual gas so that the self-discharging pressure of the residual gas increases. In the present invention, a heating jacket 500 is installed in the first cylinder 100, and the residual gas is discharged through the heating jacket 500. When the temperature is increased, the molecular movement of the remaining gas is activated, which increases the self-discharging pressure of the remaining gas, so that the remaining gas is naturally discharged to the outside of the first cylinder 100.

The vacuum pump unit 600 is installed to form a vacuum for cleaning the pipe, discharge residual gas from the plurality of first cylinders 100 using vacuum, and boost the pressure of the residual gas discharged from the buffer tank 300. am.

Specifically, the vacuum pump unit 600, as shown in FIG. 2,

It is installed between the plurality of first cylinders 100 and the buffer tank 300 through a pipe, and uses a vacuum to force the residual gas remaining in the plurality of first cylinders 100 to be discharged, and the discharged residual gas is A first vacuum pump 610 that allows flow into the buffer tank 300,

It is installed between the buffer tank 300 and the booster pump 400 through a pipe, uses vacuum to boost the pressure of the residual gas discharged from the buffer tank 300, and the boosted residual gas flows into the booster pump 400. A second vacuum pump 620 that allows

It is installed between the buffer tank 300 and the booster pump 400 through a pipe, and includes a third vacuum pump 630 that cleans the pipe by discharging foreign substances inside the pipe to the outside atmosphere using vacuum. .

The first vacuum pump 610 is installed between the plurality of first cylinders 100 and the buffer tank 300 through a pipe, and uses vacuum to force the remaining gas remaining in the plurality of first cylinders 100. It is configured to allow the discharged residual gas to flow into the buffer tank 300.

As shown in FIG. 2, a sixth connection pipe 760 is connected to the input end of the first vacuum pump 610, a seventh connection pipe 770 is connected to the output end, and the sixth connection pipe 760 is connected to a plurality of The first cylinders 100 are connected to the first connection pipe 710, and the seventh connection pipe 770 is connected to the front end of the buffer tank 300.

In the present invention, the extraction of the residual gas remaining inside the plurality of first cylinders 100 is performed by heating the first cylinder 100 in which the residual gas remains using a heating jacket 500 to activate the residual gas, and then extracting the residual gas. It includes primary extraction in which the remaining gas is extracted using the natural exhaust pressure of and secondary extraction in which the remaining gas remaining in the first cylinder 100 is forcibly extracted using an external vacuum force after the primary extraction.

The first vacuum pump 610 is a configuration for the secondary extraction. As the primary extraction process of extracting the residual gas using the natural discharge pressure of the residual gas progresses, the residual gas remaining inside the first cylinder 100 The amount gradually decreases, and when the amount of residual gas becomes small, the residual gas cannot be discharged on its own by the natural discharge pressure of the residual gas, so the first cylinder 100 uses the forced vacuum force of the first vacuum pump 610. A secondary extraction process is carried out to forcibly extract the small amount of residual gas remaining in the gas.

The remaining gas discharged by the forced vacuum force of the first vacuum pump 610 flows into the buffer tank 300 through the seventh connection pipe 770.

The second vacuum pump 620 is installed between the buffer tank 300 and the booster pump 400 through a pipe to boost the pressure of the residual gas discharged from the buffer tank 300, and the boosted residual gas is transferred to the booster. It is configured to flow into the pump 400 side.

As shown in FIG. 2, a ninth connection pipe 790 connected to the eighth connection pipe 780 connected to the rear end of the buffer tank 300 is connected to the input terminal of the second vacuum pump 620, and the second vacuum pump (620) A tenth connection pipe 7100 is connected to the output terminal, and the tenth connection pipe 7100 is connected to a third connection pipe 730 connected to the input terminal of the booster pump 400.

The above-described booster pump 400 operates normally only when the pressure of the residual gas input to the booster pump 400 is higher than the standard input pressure (eg, 3 bar) of the booster pump 400. If the pressure of the remaining gas input to the booster pump 400 is less than the standard input pressure of the booster pump 400 (e.g., 3 bar), normal pressure boosting operation is not performed and normal charging is not performed.

The initial natural discharge pressure of the residual gas generated by heating through the heating jacket 500 is more than the standard input pressure of the booster pump 400 (e.g., 3 bar), so the pressure of the residual gas input to the booster pump 400 is the booster pump 400. Since it is above the standard input pressure (e.g., 3 bar) of the pump 400, it does not interfere with the normal pressure boosting operation of the booster pump 400.

However, the natural discharge pressure of the residual gas generated by heating through the heating jacket 500 gradually decreases as the residual gas discharge progresses, and after a certain point, the natural discharge pressure of the residual gas is the standard input of the booster pump 400. The pressure of the remaining gas input to the booster pump 400 is less than the standard input pressure of the booster pump 400 (e.g. 3 bar), which interferes with the normal pressure boosting operation of the booster pump 400. As a result, charging of the remaining gas does not occur normally.

Therefore, it is necessary to boost the pressure of the residual gas discharged while the natural discharge pressure is reduced, and the second vacuum pump 620 is configured for this purpose.

That is, after being discharged below the standard input pressure (e.g., 3 bar) of the booster pump 400, the remaining gas is mixed in the buffer tank 300 to form a single uniform pressure and input into the booster pump 400. Before being input to 400, the pressure is boosted to more than the standard input pressure (e.g., 3 bar) of the booster pump 400 by the second vacuum pump 620, and then input to the booster pump 400.

The third vacuum pump 630 is installed between the buffer tank 300 and the booster pump 400 through a pipe, and cleans the pipe by discharging foreign substances inside the pipe to the outside atmosphere using vacuum.

As shown in FIG. 2, the 11th connection pipe 7110 connected to the third connection pipe 730 is connected to the input terminal of the third vacuum pump 630, and the output terminal of the third vacuum pump 630 is connected to the external atmosphere. connected.

In the present invention, pipe cleaning includes primary pipe cleaning using helium gas having a certain pressure, and secondary pipe cleaning in which helium gas remaining in the pipe and uncleaned foreign substances are cleaned with helium gas after primary pipe cleaning. do.

The third vacuum pump 630 is configured to clean the secondary pipe. After cleaning the primary pipe using helium gas, helium gas for cleaning and foreign substances that have not been cleaned with helium gas may remain in the pipe, Secondary pipe cleaning is performed by using the forced vacuum force of the third vacuum pump 630 to clean residual helium gas and foreign substances remaining in the pipe by discharging them to the outside atmosphere.

The piping unit 700 is configured to guide the gas flow so that the residual gas discharged from the first plurality of cylinders 100 is charged into the second plurality of cylinders 200 via the buffer tank 300.

Specifically, the piping unit 700, as shown in FIG. 2,

On-off valves 711 and 712 are installed at both ends, a first pressure gauge 713 is installed at a position close to the on-off valve 711, and a first connection pipe 710 to which a plurality of first cylinders 100 are connected. )class,

A pair of on-off valves 721 and 722 are installed on one side, a second pressure gauge 723 is installed between the pair of on-off valves 721 and 722, and a first connection pipe 710 and a buffer tank. (300) A second connection pipe 720 connecting the front end,

An on-off valve 731 and a third pressure gauge 732 are installed, and a third connection pipe 730 connects the rear end of the buffer tank 300 and the input end of the booster pump 400,

A fourth connection pipe 740 in which an on-off valve 741 is installed and connects the output end of the booster pump 400 and the fifth connection pipe 750,

A fifth connection pipe 750 that is closed at both ends and to which a plurality of second cylinders 200 are connected,

A sixth connection pipe 760 on which an on-off valve 761 and a first vacuum gauge 762 are installed and which connects the first connection pipe 710 and the input terminal of the first vacuum pump 610,

A seventh connection pipe 770 in which an on-off valve 771 is installed and connects the output end of the first vacuum pump 610 and the front end of the buffer tank 300,

An eighth connection pipe 780 in which an on-off valve 781 is installed and connects the rear end of the buffer tank 300 to the external atmosphere,

An on-off valve 791 and a second vacuum gauge 792 are installed, and a ninth connection pipe 790 connects the eighth connection pipe 780 and the input terminal of the second vacuum pump 620,

A tenth connection pipe 7100 on which an on-off valve 7101 is installed and which connects the output end of the second vacuum pump 620 and the third connection pipe 730,

An on-off valve 7111 and a third vacuum gauge 7112 are installed, and an eleventh connection pipe 7110 connects the third connection pipe 730 and the input terminal of the third vacuum pump 630,

The opening and closing valves are initially in a closed state and then are controlled to open and close under the control of the control unit 800.

The first connection pipe 710 has on-off valves 711 and 712 installed at both ends, a first pressure gauge 713 is installed at a position close to the on-off valve 711, and a plurality of first cylinders 100. It is a configuration in which they are connected.

As shown in FIG. 2, a plurality of first cylinders 100, a second connection pipe 720, and a sixth connection pipe 760 are connected to the first connection pipe 710, respectively.

The opening and closing valves 711 and 712 installed in the first connection pipe 710 are in an initial closed state, and then open and closed under the control of the control unit 800, and the first pressure installed in the first connection pipe 710 The gauge 713 measures pipe pressure for checking pipe leaks and provides the measured pressure value to the control unit 800.

As shown in FIG. 2, a cylinder storing helium gas for pipe cleaning is connected to the end of the first connection pipe 710 at the location where the on-off valve 711 is installed.

The second connection pipe 720 has a pair of on-off valves 721 and 722 installed on one side, a second pressure gauge 723 is installed between the pair of on-off valves 721 and 722, and a second pressure gauge 723 is installed on one side of the second connection pipe 720. 1 This is a configuration that connects the connection pipe 710 and the front end of the buffer tank 300.

The opening and closing valves 721 and 722 installed in the second connection pipe 720 are in an initial closed state and then open and closed under the control of the control unit 800, and the second pressure installed in the second connection pipe 720 The gauge 723 measures pipe pressure for checking pipe leaks and provides the measured pressure value to the control unit 800.

The third connection pipe 730 is equipped with an on-off valve 731 and a third pressure gauge 732, and connects the rear end of the buffer tank 300 and the input end of the booster pump 400.

The opening/closing valve 731 installed in the third connection pipe 730 is in the initial closed state, and then the opening and closing is controlled under the control of the control unit 800, and the third pressure gauge installed in the third connection pipe 730 ( 732) measures the residual gas pressure input to the booster pump 400 and provides the measured pressure value to the control unit 800.

The fourth connection pipe 740 is configured to have an on-off valve 741 installed and connect the output end of the booster pump 400 and the fifth connection pipe 750.

The opening/closing valve 741 installed in the fourth connection pipe 740 is initially in a closed state, and then is controlled to open and close under the control of the control unit 800.

The fifth connection pipe 750 is closed at both ends and is configured to connect a plurality of second cylinders 200. As shown in FIG. 2, the residual gas discharged from the plurality of first cylinders 100 is A plurality of second cylinders 200 to be charged are connected.

The sixth connection pipe 760 is configured to have an on-off valve 761 and a first vacuum gauge 762 installed, and connect the first connection pipe 710 and the input terminal of the first vacuum pump 610.

The opening/closing valve 761 installed in the sixth connection pipe 760 is in the initial closed state, and then the opening and closing is controlled under the control of the control unit 800, and the first vacuum gauge installed in the sixth connection pipe 760 ( 762) is a gauge that measures minute pressure close to vacuum, measures pressure close to vacuum inside the sixth connection pipe 760, and provides the measured pressure value to the control unit 800.

The seventh connection pipe 770 is configured to have an on-off valve 771 installed and connect the output end of the first vacuum pump 610 and the front end of the buffer tank 300.

The opening/closing valve 771 installed in the seventh connection pipe 770 is initially in a closed state, and then is controlled to open and close under the control of the control unit 800.

The eighth connection pipe 780 is equipped with an on-off valve 781 and connects the rear end of the buffer tank 300 with the external atmosphere. When cleaning the primary pipe using helium gas, helium gas and foreign substances in the pipe are removed. Allow this to be discharged to the outside atmosphere.

The opening/closing valve 781 installed in the eighth connection pipe 780 is in an initial closed state, and then is controlled to open/close under the control of the control unit 800.

The ninth connection pipe 790 is equipped with an on-off valve 791 and a second vacuum gauge 792, and connects the eighth connection pipe 780 and the input terminal of the second vacuum pump 620.

The opening/closing valve 791 installed in the ninth connection pipe 790 is in the initial closed state, and then the opening and closing is controlled under the control of the control unit 800, and the second vacuum gauge installed in the ninth connection pipe 790 ( 792) is a gauge that measures minute pressure close to vacuum, measures pressure close to vacuum inside the ninth connection pipe 790, and provides the measured pressure value to the control unit 800.

The tenth connection pipe 7100 is equipped with an on-off valve 7101 and connects the output terminal of the second vacuum pump 620 and the third connection pipe 730.

The opening/closing valve 7101 installed in the tenth connection pipe 7100 is initially in a closed state, and then is controlled to open and close under the control of the control unit 800.

The eleventh connection pipe 7110 is equipped with an on-off valve 7111 and a third vacuum gauge 7112, and connects the third connection pipe 730 and the input terminal of the third vacuum pump 630, helium gas After the first pipe cleaning using , during the second pipe cleaning, helium gas and foreign substances remaining in the pipe are discharged to the outside atmosphere.

The opening/closing valve 7111 installed in the 11th connection pipe 7110 is in the initial closed state, and then the opening and closing is controlled under the control of the control unit 800, and the third vacuum gauge installed in the 11th connection pipe 7110 ( 7112) is a gauge that measures minute pressure close to vacuum, measures pressure close to vacuum inside the 11th connection pipe 7110, and provides the measured pressure value to the control unit 800.

The control unit 800 provides cleaning control for pipe cleaning, first charging control for charging the residual gas naturally discharged by heating of the heating jacket 500, and natural discharge of residual gas naturally discharged by heating of the heating jacket 500. When the pressure decreases, the second charging control, which charges the remaining gas by boosting the pressure of the discharged residual gas, and the third charging control, which charges the forcibly discharged residual gas with vacuum pressure, are sequentially performed.

That is, in the present invention, the control unit 800 sequentially performs cleaning control → first charging control → second charging control → third charging control.

Hereinafter, cleaning control of the control unit 800 will be described.

In the present invention, pipe cleaning involves primary pipe cleaning using helium gas having a certain pressure to clean the residual gas used in the previous charging operation remaining in the pipe, and after primary pipe cleaning, helium gas remaining in the pipe and helium gas. It includes secondary piping cleaning to clean any residual gas used during the previous charging operation that remains uncleaned.

Specifically, the cleaning control of the control unit 800 is:

A first cleaning control that checks pipe leaks using helium gas at a certain pressure and first cleans the pipe by discharging residual gas used in the previous charging operation remaining in the pipe and buffer tank 300 to the outside atmosphere,

After the first cleaning control, the helium gas used during the primary pipe cleaning remaining in the pipe and buffer tank 300 using a vacuum, and the residue used during the previous charging operation that was not cleaned with helium gas during the first pipe cleaning It is characterized by including a second cleaning control that cleans the pipe secondarily by discharging gas to the outside atmosphere.

The first cleaning control uses helium gas at a certain pressure to check pipe leaks and first cleans the pipe by discharging the residual gas used during the previous charging operation remaining in the pipe and the buffer tank 300 to the outside atmosphere. As a control, specifically, the first cleaning control, as shown in FIG. 3,

When the cylinder storing helium gas at a certain pressure is connected to the first connection pipe 710 on the opening/closing valve 711 side, only the opening/closing valves 711, 721, 722, 761, and 771 are opened among the opening/closing valves in the closed state. 1-1 to allow helium gas at a certain pressure to flow into the pipe in the front area of the buffer tank 300 and the buffer tank 300, and then close the opening/closing valve 711 in the open state after a certain period of time. cleaning control,

After the 1-1 control, a 1-2 cleaning control that determines the presence/absence of a pipe leak based on the presence/absence of a change in the measured pressure of the pressure gauges 713 and 723,

If it is determined that there is no leak in the pipe, only the open/close valve 781 is opened among the open/close valves in the closed state, and the helium filled at a certain pressure in the pipe in the front area of the buffer tank 300 and the buffer tank 300 By allowing the gas to be discharged to the outside atmosphere through the eighth connection pipe 780, the residual gas used in the previous charging operation remaining in the pipe in the front area of the buffer tank 300 and the buffer tank 300 is discharged to the outside along with the helium gas. 1st-3rd cleaning control that first cleans the pipe by discharging it into the atmosphere,

After the 1-3 control, the 1-4 cleaning control is performed to close the open and closed valves (721, 722, 761, 771, 781) when the measured pressure of the pressure gauges (713, 723) becomes atmospheric pressure. Includes.

The 1-1 cleaning control is performed when the cylinder storing helium gas at a certain pressure is connected to the first connection pipe 710 on the opening/closing valve 711 side, among the opening/closing valves in the closed state, the opening/closing valves 711, 721, Only 722, 761, and 771) are opened to allow helium gas at a certain pressure to flow into the pipe in the front area of the buffer tank 300 and the buffer tank 300. After a certain period of time has elapsed, the opening/closing valve 711 is in an open state. ) is a control that closes.

When the opening/closing valve 711 is closed, the pipe in the front end area of the buffer tank 300 and the buffer tank 300 are filled with helium gas at a certain pressure.

The reason for using helium gas for pipe cleaning is to take advantage of the inert nature of helium gas. Residual gas used during the previous charging operation may remain in the pipe and buffer tank 300, and the gas used for pipe cleaning is Problems may occur if it reacts with the residual gas remaining in the pipe and buffer tank 300, so helium gas, an inert gas that does not react with the residual gas, is used for pipe cleaning.

The 1-2 cleaning control is a control that determines the presence/absence of a pipe leak based on the presence/absence of a change in the measured pressure of the pressure gauges 713 and 723 after the 1-1 control.

When the opening/closing valve 711 is closed and the piping in the front area of the buffer tank 300 and the buffer tank 300 are filled with helium gas at a certain pressure (e.g., 5 bar), the piping and buffer in the front area of the buffer tank 300 If there is a pipe leak in the tank 300, the pipe in the front area of the buffer tank 300 and the helium gas filled in the buffer tank 300 will not be able to maintain a constant pressure, and will be converted into helium gas that cannot maintain a constant pressure. It becomes impossible to clean the pipes.

Therefore, whether the pipe in the front area of the buffer tank 300 and the helium gas filled in the buffer tank 300 maintains a constant pressure is determined by the presence/absence of a change in the measured pressure of the pressure gauges 713 and 723. The pressure gauges ( If the measured pressure of 713, 723 does not change to a constant pressure (e.g., 5 bar), it is determined that there is no pipe leak in the pipe in the front area of the buffer tank 300 and the buffer tank 300, and the pressure gauges ( If there is a change in which the measured pressures of 713 and 723 gradually decrease, it is determined that there is a pipe leak in the pipe in the front area of the buffer tank 300 and the buffer tank 300.

If it is determined that there is a pipe leak, the manager will repair the part where the pipe leak occurred.

If the 1-3 cleaning control determines that there is no pipe leak, only the open/close valve 781 is opened among the open/close valves in the closed state, thereby opening the pipe in the front area of the buffer tank 300 and the buffer tank 300. ) so that the helium gas filled at a certain pressure is discharged to the external atmosphere through the eighth connection pipe 780, thereby discharging the pipes in the front area of the buffer tank 300 and the water used during the previous charging operation remaining in the buffer tank 300. This is a control that first cleans the pipe by discharging the remaining gas along with helium gas to the outside atmosphere.

When the opening/closing valve 781 is opened while the pipe in the front area of the buffer tank 300 and the buffer tank 300 are filled with helium gas at a certain pressure, the front area of the buffer tank 300 is filled with helium gas at a certain pressure. The pipe and the buffer tank 300 are in communication with the external atmosphere, and the helium gas filled in the pipe in the front end area of the buffer tank 300 and the buffer tank 300 is in communication with the external atmosphere through the eighth connection pipe 780. It is discharged into the atmosphere. At this time, the residual gas used in the previous charging operation remaining in the pipe in the front area of the buffer tank 300 and the buffer tank 300 is discharged to the outside atmosphere along with helium gas to perform primary pipe cleaning.

The 1-4 cleaning control closes the open/close valves 721, 722, 761, 771, and 781 when the measured pressure of the pressure gauges 713 and 723 becomes atmospheric pressure after the 1-3 control. It is a control that does.

As the opening/closing valve 781 is opened, the helium gas filled in the pipe at the front end of the buffer tank 300 and the buffer tank 300 and the residual gas used in the previous charging operation are released into the outside atmosphere through the eighth connection pipe 780. When discharged, the pipe in the front area of the buffer tank 300 and the internal pressure of the buffer tank 300 become atmospheric pressure. When the measured pressure of the pressure gauges 713 and 723 becomes atmospheric pressure, the open and closed valves 721, 722, 761, 771, 781) are closed to end the first cleaning control.

The second cleaning control uses a vacuum after the first cleaning control to remove the helium gas used when cleaning the primary pipe remaining in the pipe and the buffer tank 300 and the helium gas remaining in the pipe and the buffer tank 300 that was not cleaned with helium gas during the primary pipe cleaning. This is a control that cleans the pipe secondarily by discharging the residual gas used during the charging operation to the outside atmosphere. Through the primary pipe cleaning, the helium gas used during the primary pipe cleaning and the primary pipe are cleaned in the pipe and buffer tank 300. There may be residual gas used in the previous charging operation remaining that has not been cleaned with helium gas, and the control for cleaning this is the second cleaning control.

Specifically, the second cleaning control, as shown in FIG. 4,

After the first cleaning control, a 2-1 cleaning control for operating the third vacuum pump 630,

After the 2-1 cleaning control, among the open/close valves in the closed state, all open/close valves except for the open/close valves 711, 712, and 781 are sequentially opened by the vacuum generated by the operation of the third vacuum pump 630. The helium gas used when cleaning the primary pipe remaining in the pipe in the front area of the buffer tank 300 and the pipe in the area behind the buffer tank 300 and the buffer tank 300 and the helium gas remaining in the pipe in the area behind the buffer tank 300 are not cleaned with helium gas when cleaning the primary pipe. A 2-2 cleaning control that secondarily cleans the pipe by discharging the residual gas used in the previous charging operation to the outside atmosphere,

During the 2-2 cleaning control, if the measured value of the third vacuum gauge 7112 installed in the eleventh connection pipe 7110 corresponds to vacuum, all on-off valves in the open state are closed, and the third vacuum gauge in the operating state is closed. It is characterized in that it includes a second-third cleaning control that stops the pump 630.

The 2-1 cleaning control is a control that operates the third vacuum pump 630 after the first cleaning control, and the third vacuum pump 630 cleans the primary pipe remaining in the pipe and buffer tank 300. A vacuum is created to discharge the used helium gas and the residual gas used during the previous charging operation that was not cleaned with helium gas during the primary pipe cleaning to the outside atmosphere.

The 2-2 cleaning control sequentially opens all the opening and closing valves except for the opening and closing valves 711, 712, and 781 among the opening and closing valves in the closed state after the 2-1 cleaning control, and operates the third vacuum pump ( 630) Cleaning the helium gas and primary piping used when cleaning the piping in the front area of the buffer tank 300 and the primary piping remaining in the piping in the buffer tank 300 and the rear area of the buffer tank 300 by the vacuum generated by the operation. This is a control that cleans the piping secondarily by discharging the remaining gas used during the previous charging operation that was not cleaned with helium gas to the outside atmosphere.

When all the open/close valves except the open/close valves 711, 712, and 781 among the open/close valves in the closed state while a vacuum is created by the third vacuum pump 630 are sequentially opened, the front area of the buffer tank 300 Helium gas used in cleaning the primary pipe remaining in the pipe and buffer tank 300 and the pipe in the downstream area of the buffer tank 300 and the helium gas used in the previous charging operation remaining without being cleaned with helium gas during primary pipe cleaning. The remaining gas is discharged to the outside atmosphere by the vacuum pressure generated by the operation of the third vacuum pump 630, thereby performing secondary pipe cleaning.

The 2-3 cleaning control is performed when the measured value of the third vacuum gauge 7112 installed in the 11th connection pipe 7110 corresponds to vacuum (the helium gas remaining in the pipe and the previous charge) during the 2-2 cleaning control. This is a control that closes all open and closed valves (meaning that the residual gas used during work is completely discharged to the external atmosphere) and stops the third vacuum pump 630 in the operating state.

Through the third vacuum pump 630, the helium gas and primary pipe used when cleaning the pipe in the front area of the buffer tank 300 and the primary pipe remaining in the pipe in the buffer tank 300 and the rear area of the buffer tank 300 When the residual gas used in the previous charging operation, which was not cleaned with helium gas during cleaning, is discharged to the external atmosphere, the pipe in the front area of the buffer tank 300 and the buffer tank 300 and the rear end of the buffer tank 300 The pressure inside the pipe in the area becomes a vacuum. When the measured pressure of the third vacuum gauge (7112) becomes a vacuum, the helium gas used during the primary pipe cleaning and the previous charging work remaining without being cleaned with helium gas during the primary pipe cleaning It is determined that the residual gas used during the process has been completely discharged to the external atmosphere, and all open and closed valves are closed to end the second cleaning control.

Hereinafter, the first charging control of the control unit 800 will be described.

In the present invention, the extraction of the residual gas remaining inside the plurality of first cylinders 100 is performed by heating the first cylinder 100 in which the residual gas remains using a heating jacket 500 to activate the residual gas, and then extracting the residual gas. It includes primary extraction in which the remaining gas is extracted using the natural exhaust pressure of and secondary extraction in which the remaining gas remaining in the first cylinder 100 is forcibly extracted using an external vacuum force after the primary extraction.

The first charging control relates to control of charging the residual gas extracted through the first extraction.

Specifically, the first charging control of the control unit 800, as shown in FIG. 5,

A 1-1 charging control that generates heat in the heating jackets 500 installed in each of the plurality of first cylinders 100,

After generating heat in the heating jackets 500, after a certain period of time, among the open/close valves in the closed state, the open/close valves 721, 722, 731 installed on the second, third, and fourth connection pipes (720, 730, 740) 741) is opened and the booster pump 400 is operated at the same time, so that the residual gas discharged by the natural discharge pressure of the residual gas heated by the heating jacket 500 is charged in the plurality of second cylinders 200. It is characterized in that it includes a 1-2 charging control.

The 1-1 charging control is a control that generates heat in the heating jackets 500 installed in each of the plurality of first cylinders 100.

The residual gas remaining inside the plurality of first cylinders 100, which are the target of residual gas extraction, is small and cannot be discharged on its own. Therefore, when the first cylinder 100 is heated using the heating jacket 500 to activate the remaining gas, the remaining gas whose molecular motion is activated by heating by the heating jacket 500 generates a natural discharge pressure that can be discharged on its own. I do it.

The 1-2 charging control generates heat in the heating jackets 500, and after a certain period of time, among the opening and closing valves in the closed state, the opening and closing valves installed in the second, third, and fourth connection pipes (720, 730, and 740) By opening the fields 721, 722, 731, and 741 and simultaneously operating the booster pump 400, the residual gas discharged by the natural discharge pressure of the residual gas heated by the heating jacket 500 is discharged into a plurality of second This is a control that allows the cylinder 200 to be charged.

In a state in which natural discharge pressure of the remaining gas is generated due to heat generation of the heating jacket 500, as shown in Figure 5, among the opening and closing valves in the closed state, the second, third, and fourth connection pipes 720, 730, and 740 are connected. When the installed on-off valves (721, 722, 731, and 741) are opened, the remaining gases discharged from the plurality of first cylinders (100) by different natural discharge pressures are collected in the buffer tank (300) and mixed to form one uniform gas. After becoming a residual gas with a certain pressure, it is discharged to the booster pump 400.

The remaining gas discharged from the buffer tank 300 to the booster pump 400 is pressurized to the pressure required for charging through the booster pump 400, and the remaining gas is charged into the plurality of second cylinders 200 by the boosted pressure. do.

Hereinafter, the second charging control of the control unit 800 will be described.

Meanwhile, the above-mentioned booster pump 400 operates normally only when the pressure of the residual gas input to the booster pump 400 is higher than the standard input pressure (eg, 3 bar) of the booster pump 400. If the pressure of the remaining gas input to the booster pump 400 is less than the standard input pressure of the booster pump 400 (e.g., 3 bar), normal pressure boosting operation is not performed and normal charging is not performed.

The initial natural discharge pressure of the residual gas generated by heating through the heating jacket 500 is more than the standard input pressure of the booster pump 400 (e.g., 3 bar), so the pressure of the residual gas input to the booster pump 400 is the booster pump 400. Since it is above the standard input pressure (e.g., 3 bar) of the pump 400, it does not interfere with the normal pressure boosting operation of the booster pump 400.

However, the natural discharge pressure of the residual gas generated by heating through the heating jacket 500 gradually decreases as the residual gas discharge progresses, and after a certain point, the natural discharge pressure of the residual gas is the standard input of the booster pump 400. pressure (e.g., 3 bar), and as a result, the pressure of the remaining gas input to the booster pump 400 is less than the standard input pressure (e.g., 3 bar) of the booster pump 400, so that the normal boosting pressure of the booster pump 400 This interferes with operation and prevents the remaining gas from being charged properly.

That is, if the pressure of the residual gas input to the booster pump 400 is less than the standard input pressure of the booster pump 400 (e.g., 3 bar), the pressure of the residual gas input to the booster pump 400 is adjusted to the booster pump 400. It is necessary to increase the pressure above the standard input pressure (e.g., 3 bar), and the control related to this is the second charging control, which will be described later.

Specifically, the second charging control of the control unit 800, as shown in FIG. 6,

During the first charge control, when the residual gas pressure input to the booster pump 400 falls below the preset value, the open/close valve 731 installed in the third connection pipe 730 in the open state is closed, and the open/close valve 731 in the closed state is closed. Among the on-off valves, the on-off valves 791 and 7101 installed on the 9th and 10th connection pipes 790 and 7100 are opened and the second vacuum pump 620 is operated at the same time to naturally discharge at a pressure below the preset value. This is a control that allows the remaining gas to be charged into the plurality of second cylinders 200.

During the first charge control described above, the natural discharge pressure of the residual gas generated by heating through the heating jacket 500 gradually decreases as the residual gas discharge progresses, and after a certain point, the pressure input to the booster pump 400 The pressure of the remaining gas falls below the preset value (standard input pressure of the booster pump, for example, 3 bar).

The control unit 800 determines that the pressure of the residual gas input to the booster pump 400 is set to a preset value (the reference input pressure of the booster pump) through measurement information provided by the third pressure gauge 732 installed in the third connection pipe 730. For example, determine whether it is 3 bar or less.

When the residual gas pressure input to the booster pump 400 falls below the preset value, the control unit 800 closes the open/close valve 731 installed in the third connection pipe 730 in the open state, and opens and closes the open/close valve 731 in the closed state. Among the valves, the opening/closing valves 791 and 7101 installed in the 9th and 10th connection pipes 790 and 7100 are opened and the second vacuum pump 620 is operated.

As shown in FIG. 6, among the on-off valves in the closed state, the on-off valves 791 and 7101 installed on the 9th and 10th connection pipes 790 and 7100 are opened and the second vacuum pump 620 operates. Then, the remaining gases discharged from the plurality of first cylinders 100 with different reduced natural discharge pressures are collected and mixed in the buffer tank 300 to produce one uniform pressure (preset value (standard input pressure of the booster pump, e.g. For example, after becoming a residual gas with a pressure of 3 bar or less, it is discharged to the second vacuum pump 620, and is adjusted to a preset value (standard input pressure of the booster pump, for example) through the second vacuum pump 620. For example, the pressure is increased to 3 bar or more and supplied to the booster pump 400, and the pressure required for charging is increased through the booster pump 400, and the remaining gas is charged to a plurality of second cylinders 200 by the increased pressure. do.

Hereinafter, the third charging control of the control unit 800 will be described.

In the present invention, the extraction of the residual gas remaining inside the plurality of first cylinders 100 is performed by heating the first cylinder 100 in which the residual gas remains using a heating jacket 500 to activate the residual gas, and then extracting the residual gas. It includes primary extraction in which the remaining gas is extracted using the natural exhaust pressure of and secondary extraction in which the remaining gas remaining in the first cylinder 100 is forcibly extracted using an external vacuum force after the primary extraction.

The third charging control relates to control of charging the residual gas extracted through the secondary extraction.

Specifically, the third charging control of the control unit 800, as shown in FIG. 7,

During the second charging control, if there is no residual gas input to the booster pump 400, the on-off valves 721 and 722 installed on the second connection pipe 720 in the open state are closed, and the on-off valve in the closed state is closed. By opening the opening and closing valves (761, 771) installed in the middle, sixth, and seventh connection pipes (760, 770) and simultaneously operating the first vacuum pump (610), residual gas that cannot be discharged at the natural discharge pressure is removed. 3-1 charging control to charge the plurality of second cylinders 200 by forcibly discharging them using a vacuum;

During the 3-1 charging control, if there is no residual gas discharged from the plurality of first cylinders 100, all open and closed valves 761, 771, 791, 7101, and 741 are closed and the operating state is maintained. It is characterized in that it includes a 3-2 charging control that stops the first vacuum pump 610, the second vacuum pump 620, and the booster pump 400 in .

The 3-1 charging control closes the opening and closing valves 721 and 722 installed in the second connection pipe 720 in the open state when there is no remaining gas input to the booster pump 400 during the second charging control. And, among the on-off valves in the closed state, the on-off valves (761, 771) installed on the sixth and seventh connection pipes (760, 770) are opened and the first vacuum pump (610) is operated at the same time to generate the natural discharge pressure. This is a control that forcibly discharges the remaining gas that is not discharged using a vacuum and fills the plurality of second cylinders 200.

After heating the first cylinder 100 using the heating jacket 500 to activate the remaining gas, as the primary extraction of extracting the remaining gas using the natural exhaust pressure of the remaining gas progresses, the first cylinder 100 The amount of remaining gas becomes very small, and at some point, the residual gas is no longer discharged at the natural discharge pressure, and as a result, no residual gas is input to the booster pump 400.

The control unit 800 determines the presence or absence of residual gas input to the booster pump 400 through measurement information provided by the second vacuum gauge 792 installed in the ninth connection pipe 790.

As a result, if there is no residual gas input to the booster pump 400 (if the measurement information provided by the second vacuum gauge 792 means vacuum), the open/close valve installed in the second connection pipe 720 is in an open state. The first vacuum pump 610 closes the valves 721 and 722 and opens the valves 761 and 771 installed on the sixth and seventh connection pipes 760 and 770 among the valves in the closed state. ) operates.

As shown in FIG. 7, among the on-off valves in the closed state, the on-off valves 761 and 771 installed on the sixth and seventh connection pipes 760 and 770 are opened and the first vacuum pump 610 operates. Then, a small amount of residual gas remaining in the plurality of first cylinders 100, which is not discharged by natural discharge pressure, is forcibly discharged by the vacuum pressure of the first vacuum pump 610, and the forcibly discharged residual gas is discharged into the buffer tank. After being gathered and mixed at 300 to form a residual gas with a uniform pressure (pressure below a preset value (standard input pressure of the booster pump, for example, 3 bar)), it is directed to the second vacuum pump 620. It is discharged, boosted to a preset value (standard input pressure of the booster pump, for example, 3 bar) or more through the second vacuum pump 620, and supplied to the booster pump 400, and charged through the booster pump 400. The pressure is increased to the required pressure, and the remaining gas is charged into the plurality of second cylinders 200 by the increased pressure.

In the 3-2 charging control, if there is no residual gas discharged from the plurality of first cylinders 100 during the 3-1 charging control, all opening and closing valves 761, 771, 791, 7101, This is a control that closes 741 and stops the first vacuum pump 610, the second vacuum pump 620, and the booster pump 400 that are in an operating state.

As the forced discharge of the residual gas using the first vacuum pump 610 progresses, the residual gas remaining in the plurality of first cylinders 100 decreases, and the residual gas remaining in the plurality of first cylinders 100 decreases. If there is none, there will be no residual gas discharged from the plurality of first cylinders 100.

The control unit 800 determines the presence or absence of residual gas discharged from the plurality of first cylinders 100 through measurement information provided by the first vacuum gauge 762 installed in the sixth connection pipe 760.

As a result, if there is no residual gas discharged from the plurality of first cylinders 100 (if the measurement information provided by the first vacuum gauge 762 indicates vacuum), the plurality of first cylinders 100 are no longer used. It is determined that there is no residual gas to be discharged, so all open and closed valves (761, 771, 791, 7101, 741) are closed, and the first vacuum pump (610) and the second vacuum pump ( 620) and the booster pump 400 are stopped to complete residual gas charging.

Although the technical idea of the present invention has been described above with the accompanying drawings, this is an illustrative description of a preferred embodiment of the present invention and does not limit the present invention, and the scope of the present invention is not limited to the embodiments. It will be obvious to those skilled in the art that this invention includes modifications within the scope of the technical idea of the present invention.

100: first cylinder
200: second cylinder
300: buffer tank
400: Booster pump
500: heated jacket
600: Vacuum pump unit
700: Plumbing department
800: Control unit

Claims (10)

In the residual gas extraction and charging system,
A plurality of first cylinders (100) to extract residual gas remaining inside;
A plurality of second cylinders (200) filled with residual gas discharged from the first plurality of cylinders (100);
a buffer tank 300 for collecting the remaining gases discharged from the plurality of first cylinders 100 and then discharging them;
a booster pump 400 that boosts the pressure of the residual gas discharged from the buffer tank 300 so that the residual gas discharged from the buffer tank 300 fills the plurality of second cylinders 200;
A heating jacket 500 installed in each of the plurality of first cylinders 100 to heat the residual gas remaining inside the first cylinder 100;
A vacuum pump unit 600 installed to form a vacuum for cleaning pipes, discharge residual gas from the plurality of first cylinders 100 using vacuum, and boost the pressure of residual gas discharged from the buffer tank 300;
a piping unit 700 that guides the gas flow so that the residual gas discharged from the first plurality of cylinders 100 is charged into the plurality of second cylinders 200 via the buffer tank 300;
When the cleaning control for pipe cleaning and the first charging control to charge the residual gas naturally discharged by heating of the heating jacket 500 and the natural discharge pressure of the residual gas naturally discharged by heating of the heating jacket 500 decrease, the discharged gas It includes a control unit 800 that sequentially performs a second charging control for charging the remaining gas by boosting the pressure of the remaining gas and a third charging control for charging the remaining gas forcibly discharged with vacuum pressure,

The vacuum pump unit 600,
It is installed between the plurality of first cylinders 100 and the buffer tank 300 through a pipe, and uses a vacuum to force the residual gas remaining in the plurality of first cylinders 100 to be discharged, and the discharged residual gas is A first vacuum pump 610 that allows flow into the buffer tank 300,
A device installed between the buffer tank 300 and the booster pump 400 through a pipe to boost the pressure of the residual gas discharged from the buffer tank 300 and to allow the boosted residual gas to flow into the booster pump 400. 2 vacuum pump 620,
A third vacuum pump 630 is installed between the buffer tank 300 and the booster pump 400 through the pipe and cleans the pipe by discharging foreign substances inside the pipe to the outside atmosphere using vacuum. Residual gas extraction and charging system.
In claim 1,
The buffer tank 300,
After the residual gas discharged from the plurality of first cylinders 100 with different discharge pressures is introduced, they are mixed to form a residual gas with a uniform pressure and discharged, and are used as a buffer for the residual gas moving for charging. A residual gas extraction and charging system characterized in that it functions.
delete In claim 1,
The piping unit 700,
On-off valves 711 and 712 are installed at both ends, a first pressure gauge 713 is installed at a position close to the on-off valve 711, and a first connection pipe 710 to which a plurality of first cylinders 100 are connected. )class,
A pair of on-off valves 721 and 722 are installed on one side, a second pressure gauge 723 is installed between the pair of on-off valves 721 and 722, and a first connection pipe 710 and a buffer tank. (300) A second connection pipe 720 connecting the front end,
An on-off valve 731 and a third pressure gauge 732 are installed, and a third connection pipe 730 connects the rear end of the buffer tank 300 and the input end of the booster pump 400,
A fourth connection pipe 740 in which an on-off valve 741 is installed and connects the output end of the booster pump 400 and the fifth connection pipe 750,
A fifth connection pipe 750 that is closed at both ends and to which a plurality of second cylinders 200 are connected,
A sixth connection pipe 760 on which an on-off valve 761 and a first vacuum gauge 762 are installed and which connects the first connection pipe 710 and the input terminal of the first vacuum pump 610,
A seventh connection pipe 770 in which an on-off valve 771 is installed and connects the output end of the first vacuum pump 610 and the front end of the buffer tank 300,
An eighth connection pipe 780 in which an on-off valve 781 is installed and connects the rear end of the buffer tank 300 to the external atmosphere,
A ninth connection pipe 790 on which an on-off valve 791 and a second vacuum gauge 792 are installed and which connects the eighth connection pipe 780 and the input terminal of the second vacuum pump 620,
A tenth connection pipe 7100 on which an on-off valve 7101 is installed and which connects the output end of the second vacuum pump 620 and the third connection pipe 730,
An on-off valve 7111 and a third vacuum gauge 7112 are installed, and an eleventh connection pipe 7110 connects the third connection pipe 730 and the input terminal of the third vacuum pump 630,
The opening and closing valves are initially in a closed state and then are controlled to open and close under the control of the control unit 800.
In claim 4,
The cleaning control of the control unit 800 is:
A first cleaning control that checks pipe leaks using helium gas at a certain pressure and first cleans the pipe by discharging residual gas used in the previous charging operation remaining in the pipe and buffer tank 300 to the outside atmosphere,
After the first cleaning control, the helium gas used during the primary pipe cleaning remaining in the pipe and buffer tank 300 using a vacuum, and the residue used during the previous charging operation that was not cleaned with helium gas during the first pipe cleaning A residual gas extraction and charging system comprising a second cleaning control that discharges gas to the outside atmosphere to secondarily clean the pipe.
In claim 5,
The first cleaning control is,
When the cylinder storing helium gas at a certain pressure is connected to the first connection pipe 710 on the opening/closing valve 711 side, only the opening/closing valves 711, 721, 722, 761, and 771 are opened among the opening/closing valves in the closed state. 1-1 to allow helium gas at a certain pressure to flow into the pipe in the front area of the buffer tank 300 and the buffer tank 300, and then close the opening/closing valve 711 in the open state after a certain period of time. cleaning control,
After the 1-1 control, a 1-2 cleaning control that determines the presence/absence of a pipe leak based on the presence/absence of a change in the measured pressure of the pressure gauges 713 and 723,
If it is determined that there is no leak in the pipe, only the open/close valve 781 is opened among the open/close valves in the closed state, and the helium filled at a certain pressure in the pipe in the front area of the buffer tank 300 and the buffer tank 300 By allowing the gas to be discharged to the outside atmosphere through the eighth connection pipe 780, the residual gas used in the previous charging operation remaining in the pipe in the front area of the buffer tank 300 and the buffer tank 300 is discharged to the outside along with the helium gas. 1st-3rd cleaning control that first cleans the pipe by discharging it into the atmosphere,
After the 1-3 control, the 1-4 cleaning control is performed to close the open and closed valves (721, 722, 761, 771, 781) when the measured pressure of the pressure gauges (713, 723) becomes atmospheric pressure. A residual gas extraction and charging system comprising:
In claim 5,
The second cleaning control is,
After the first cleaning control, a 2-1 cleaning control for operating the third vacuum pump 630,
After the 2-1 cleaning control, among the open/close valves in the closed state, all open/close valves except for the open/close valves 711, 712, and 781 are sequentially opened by the vacuum generated by the operation of the third vacuum pump 630. The helium gas used when cleaning the primary pipe remaining in the pipe in the front area of the buffer tank 300 and the pipe in the area behind the buffer tank 300 and the buffer tank 300 and the helium gas remaining in the pipe in the area behind the buffer tank 300 are not cleaned with helium gas when cleaning the primary pipe. A 2-2 cleaning control that secondarily cleans the pipe by discharging the residual gas used in the previous charging operation to the outside atmosphere,
During the 2-2 cleaning control, if the measured value of the third vacuum gauge 7112 installed in the eleventh connection pipe 7110 corresponds to vacuum, all on-off valves in the open state are closed, and the third vacuum gauge in the operating state is closed. A residual gas extraction and charging system comprising a second-third cleaning control that stops the pump (630).
In claim 4,
The first charging control of the control unit 800 is:
A 1-1 charging control that generates heat in the heating jackets 500 installed in each of the plurality of first cylinders 100,
After generating heat in the heating jackets 500, after a certain period of time, among the open/close valves in the closed state, the open/close valves 721, 722, 731 installed on the second, third, and fourth connection pipes (720, 730, 740) 741) is opened and the booster pump 400 is operated at the same time, so that the residual gas discharged by the natural discharge pressure of the residual gas heated by the heating jacket 500 is charged in the plurality of second cylinders 200. A residual gas extraction and charging system comprising first and second charging controls.
In claim 4,
The second charging control of the control unit 800 is:
During the first charge control, when the residual gas pressure input to the booster pump 400 falls below the preset value, the open/close valve 731 installed in the third connection pipe 730 in the open state is closed, and the open/close valve 731 in the closed state is closed. Among the on-off valves, the on-off valves 791 and 7101 installed on the 9th and 10th connection pipes 790 and 7100 are opened and the second vacuum pump 620 is operated at the same time to naturally discharge at a pressure below the preset value. A residual gas extraction and charging system characterized in that the remaining gas is charged into a plurality of second cylinders (200).
In claim 4,
The third charging control of the control unit 800 is:
During the second charging control, if there is no residual gas input to the booster pump 400, the on-off valves 721 and 722 installed on the second connection pipe 720 in the open state are closed, and the on-off valve in the closed state is closed. By opening the opening and closing valves (761, 771) installed in the middle, sixth, and seventh connection pipes (760, 770) and simultaneously operating the first vacuum pump (610), residual gas that cannot be discharged at the natural discharge pressure is removed. 3-1 charging control to charge the plurality of second cylinders 200 by forcibly discharging them using a vacuum;
During the 3-1 charging control, if there is no residual gas discharged from the plurality of first cylinders 100, all open and closed valves 761, 771, 791, 7101, and 741 are closed and the operating state is maintained. A residual gas extraction and charging system comprising a 3-2 charging control that stops the first vacuum pump 610, the second vacuum pump 620, and the booster pump 400 in .