KR102576532B1 - Susceptor and substrate disposition apparatus including the same - Google Patents

Abstract

The present embodiments provide a substrate mounting unit and a substrate processing apparatus including the same, which realizes a heating line length deviation, capacity deviation, or resistance deviation of the same or ±5%.
Accordingly, the present embodiments can maintain the heat capacity almost the same by reducing the heat capacity deviation, thereby maintaining the same heater life time and reducing thermal expansion.

Description

Substrate seating unit and substrate processing device including the same {SUSCEPTOR AND SUBSTRATE DISPOSITION APPARATUS INCLUDING THE SAME}

The present embodiments relate to a substrate mounting unit and a substrate processing device including the same. More specifically, a substrate mounting unit and the same for optimally designing the heat capacity of the heating unit (heating unit) and reducing thermal expansion of the heating unit, etc. It relates to a substrate processing device including:

Generally, semiconductor memory devices, liquid crystal displays, organic light emitting devices, etc. are manufactured by performing multiple semiconductor processes on a substrate and stacking structures of a desired shape.

The semiconductor manufacturing process includes a process of depositing a predetermined thin film on a substrate, a photolithography process of exposing a selected area of the thin film, and an etching process of removing the thin film of the selected area. The substrate processing process for manufacturing such semiconductors is carried out in a substrate processing device that includes a process chamber in an optimal environment for the process.

The process chamber is provided with a substrate to be processed and a substrate mounting portion on which the substrate is mounted, and a process gas containing a source material is sprayed onto the substrate. Deposition and etching processes on the substrate are performed using the source material contained in this process gas.

Meanwhile, the above-mentioned substrate mounting unit (substrate mounting unit) may be provided with a plurality of heating wires to proceed with the substrate processing process. Since the plurality of heating wires are designed to have different lengths for each region, A difference in heat capacity occurred, causing the heater lifespan to be shortened or causing the heater lifespan to vary.

In addition, the plurality of heating wires had different straightness maintenance lengths for each area, causing increased thermal expansion, and it was difficult to calculate tolerances for each area to prepare for increased thermal expansion and apply the design of the heating wire to the substrate seating area.

The purpose of the present embodiments is to provide a substrate mounting unit and a substrate processing apparatus including the same for optimally designing the length of the entire heating unit or the length of the heating unit (heating line) for each region.

In addition, the present embodiments have another purpose of providing a substrate seating unit and a substrate processing apparatus including the same for optimally designing the straightness of the heating unit (heating line) for each area.

According to one embodiment, a substrate seating unit used in a substrate processing process includes: an inner region including at least one inner heating unit; Provided is a substrate seating unit including an outer region including at least one outer heating portion disposed surrounding the inner region, wherein the substrate seating unit is disposed on the at least one inner heating portion and the at least one outer heating portion. The length of each heating line is patterned to be the same or within a length deviation of ±5% and disposed in the corresponding inner and outer regions.

The inner heating unit includes a plurality of first heating wires disposed horizontally in the inner region, a plurality of second heating wires spaced apart from the plurality of first heating wires and arranged in a vertical direction, and a plurality of first heating wires arranged in the vertical direction. A plurality of buffer heating disposed between the plurality of first heating wires and between the plurality of second heating wires so that the straight lengths of the heating wire and the plurality of second heating wires are the same or patterned within a length deviation of ±5%. Can include lines.

The inner heating unit includes a plurality of first heating wires having a semicircular zigzag shape for each inner region, and a plurality of second heating wires for each inner region, one end of which is connected to one end of the first heating wire and the other end of which is connected to a power supply. , Each inner region may include a plurality of third heating wires disposed adjacent to the plurality of first heating wires and the second heating wire at a predetermined interval.

The inner heating unit has a semicircular shape so that each straight length of the plurality of third heating lines in each inner region is patterned to be the same or within a length deviation of ±5% compared to the length of the straight heating lines included in the zigzag shape. and a plurality of first buffer heating wires disposed between the plurality of third heating wires, and a plurality of plurality of buffer heating wires connected between the plurality of first heating wires and having a semicircular shape opposite to the first buffer heating wires. It may further include a second buffer heating line.

The outer heating unit includes a plurality of fourth heating wires arranged horizontally in the outer area, a plurality of fifth heating wires arranged vertically in the outer area, and a plurality of fourth heating wires and a plurality of fifth heating wires. It may include a plurality of buffer heating lines disposed between the plurality of fourth heating lines and between the plurality of fifth heating lines so that the straight lengths are the same or are patterned within a length deviation of ±5%.

One heating wire disposed at an arbitrary end of the plurality of fourth heating wires and the plurality of sixth heating wires may be connected to a power supply, and the other heating wire disposed at an arbitrary end may be connected to each other. .

The outer heating unit includes a plurality of sixth heating wires having a semicircular zigzag shape in each outer region, and one end of each outer region is connected to an arbitrary end of the plurality of sixth heating wires, and is connected to the plurality of sixth heating wires. It may include a plurality of seventh heating lines arranged adjacent to each other at a predetermined interval.

The outer heating unit is patterned so that each straight length of the plurality of seventh heating lines in each outer region is the same or within a length deviation of ±5% compared to the length of the straight heating lines included in the zigzag shape. It further includes a semicircular third buffer heating line disposed between six heating lines, and a fourth buffer heating line connected between the plurality of sixth heating lines and having a semicircular shape facing the third buffer heating line. can do.

According to one embodiment, a substrate seating unit used in a substrate processing process includes: an inner region including at least one inner heating unit; Provided is a substrate seating unit including an outer region including at least one outer heating portion disposed surrounding the inner region, wherein the substrate seating unit is disposed on the at least one inner heating portion and the at least one outer heating portion. The length of each heating wire is characterized in that the variation in capacity generated from each heating wire is the same or is determined within a range of ±5%.

According to one embodiment, a substrate seating unit used in a substrate processing process includes: an inner region including at least one inner heating unit; Provided is a substrate seating unit including an outer region including at least one outer heating portion disposed surrounding the inner region, wherein the substrate seating unit is disposed on the at least one inner heating portion and the at least one outer heating portion. The length of each heating wire is characterized in that the variation in resistance generated from each heating wire is determined to be the same or within a range of ±5%.

According to one embodiment, a substrate processing apparatus used in a substrate processing process includes: a substrate provided in a process chamber; an optional substrate seating unit as described above, which seats the substrate on top and heats the placed substrate; a gas distribution device that sprays process gas into the process chamber; and a lifting device disposed below the substrate mounting unit and moving the substrate mounting unit up and down to approach the gas distribution device.

As described above, in the present embodiments, the heat capacity can be kept almost the same by reducing the heat capacity deviation by designing the length of the entire heating wire for each area or the length of each heating wire to be within the deviation, and thus the heater life time can be maintained almost the same. It can be maintained the same and has the effect of reducing thermal expansion.

In addition, the present embodiments extend the life of the heater by preventing an increase in thermal expansion by designing the length of the entire heating wire or the length of each heating wire to maintain the capacity or resistance generated in each heating wire within the deviation. It has an effect.

In addition, the present embodiments design the total length of heating wires for each area or the straight length of each heating wire to be within the deviation, making it easy to calculate tolerances due to thermal expansion, and eliminating the possibility of heater failure by preventing excessive thermal expansion. There is.

It is not limited to the effects mentioned above, and other effects not mentioned can be clearly understood by those skilled in the art to which the present embodiments belong from the description below.

1 is a diagram illustrating an example of a substrate mounting unit according to an embodiment.
Figure 2 is a diagram illustrating in more detail the pattern structure of the inner heating unit according to one embodiment.
Figure 3 is a block diagram schematically showing a substrate processing apparatus equipped with a substrate mounting unit according to an embodiment.

The method and vehicle controllers disclosed in the following embodiments will be described in more detail with reference to the drawings. Terms disclosed in the following examples are used only to describe specific examples and are not limited thereto.

For example, terms such as 'include', 'have', or 'consist' disclosed in the following examples mean that the corresponding component may be included, unless specifically stated to the contrary. It should be understood as including more components rather than excluding other components.

Additionally, terms such as “first” and “second” disclosed in the following embodiments may be used to describe various components, but the components should not be limited by the terms. The above terms are used only for the purpose of distinguishing one component from another. Additionally, terms specifically defined in consideration of the configuration and operation of the embodiment are only for explaining the embodiment and do not limit the scope of the embodiment.

In addition, the singular expression 'above' used in the description and patent claims disclosed in the following examples may be understood to also include plural expressions, unless the context clearly indicates otherwise, and 'or/ 'And' or 'and/or' should be understood to include any and all possible combinations of one or more of the related items listed.

In addition, in the case where it is described as being formed "on or under" each element disclosed in the following examples, it is indicated as being formed "on or under" ( (on or under) includes both elements that are in direct contact with each other or one or more other elements that are formed (indirectly) between the two elements. Additionally, when expressed as “above” or “on or under,” it should be understood to include not only the upward direction but also the downward direction based on one element.

In addition, relational terms such as “top/top/above” and “bottom/bottom/bottom” disclosed in the following embodiments do not necessarily require or imply any physical or logical relationship or order between such entities or elements. However, it may be understood as being used only to distinguish one entity or element from another entity or element.

Hereinafter, the substrate mounting unit and the substrate processing apparatus disclosed based on the above-described aspects will be described in more detail.

<Embodiment of substrate seating unit>

1 is a diagram illustrating an example of a substrate mounting unit according to an embodiment.

As shown in FIG. 1, the substrate seating unit 1000 according to one embodiment includes an inner region 100 including at least one inner heating unit 110 (indicated in the form of a heating line region) and the inner region ( It may include an outer area 200 and a power supply unit 300 including at least one external heating unit 210 (indicated in the form of a heating line area) disposed surrounding the 100).

In one embodiment, the inner region 100 refers to an area separated from the outer region 200 and partitioned (divided) into a plurality of areas, and the outer region 200 is formed by being surrounded by the inner region 100, and at the same time, the inner region 200 Refers to an area that is separated from the area 100 and partitioned (divided) into a plurality of areas.

In the term 'outer area' mentioned, 'outside' does not refer to the outer corner of the substrate seating unit 1000, but refers to the state of the substrate seating unit 1000 adjacent to the inner area 100 as a reference. In the term 'inner region', 'inside' may refer to a state disposed in the substrate seating unit 1000 adjacent to approximately the central starting point of the substrate seating unit 100.

In one embodiment, the inner heating unit 110 disposed in the inner region 100 and the outer heating portion 210 disposed in the outer region each have a plurality of heating lines side by side or in a certain pattern. It can be placed in each corresponding area.

In addition, some of the plurality of heating wires for each of the inner heating unit 110 and the outer heating unit 210 may be designed to be connected to each other at any point of the substrate seating unit 1000.

Each of the inner heating unit 110 and the outer heating unit 210 may be comprised of a plurality.

For example, the inner heating unit 110 includes a first inner heating unit 111 disposed on the left side of the inner region 100 and a second inner heating portion 112 disposed on the right side of the inner region 100. can do.

The mentioned first inner heating part 111 and the second inner heating part 112 each have a plurality of heating wires, and the plurality of heating wires may be patterned in a structure symmetrical to each other.

This inner heating unit 110 will be described in more detail later in FIG. 2.

In one embodiment, the outer heating unit 210 includes a first outer heating unit 211 disposed on the left side of the inner region 100, a second outer heating portion 212 disposed on the right side of the inner region 100, and an inner heating portion 212. It may include a third outer heating unit 213 disposed above the region 100 and a fourth outer heating portion 214 disposed below the inner region 100 .

The mentioned first outer heating part 211 and the second outer heating part 212 each have a plurality of heating wires, and the plurality of heating wires can be patterned in a symmetrical structure, and the third outer heating part 212 has a plurality of heating wires. The heating unit 213 and the fourth outer heating unit 214 each include a plurality of heating wires, and the plurality of heating wires may be patterned into a symmetrical structure.

However, the above-described pattern structure is only an example, and it is of course possible to have various pattern structures of heating lines.

In one embodiment, the power supply unit 300 may be connected to any heating wire provided in the inner heating unit 110 and the outer heating unit 210. For example, the power supply unit 300 shown on the right side of FIG. 1 is connected to an arbitrary heating wire of the second inner heating unit 112, and the second outer heating unit 212 and the fourth outer heating unit 214 Can be connected to each arbitrary heating wire.

On the other hand, the power supply unit 300 shown on the left of FIG. 1 is connected to an arbitrary heating wire of the first inner heating unit 111, and is connected to each of the first external heating unit 211 and the third external heating unit 212. Can be connected to any heating wire.

Here, the lengths of each heating line provided in the at least one inner heating unit 110 and the outer heating unit 210 are patterned to be the same or within a length deviation of ±5% compared to each other, so that the corresponding inner region and outer region is placed in

The reason why the length of each heating wire is the same or has a length deviation of ±5% is that when approximately the same voltage is supplied to the inner heating unit 110 and the outer heating unit 210, the resistance and voltage are as shown in (Table 1) below. and to reduce the variation in heat capacity so that they have almost the same resistance, voltage, and heat capacity.

division inner heating part Upper and lower outer heating parts Left and right outer heating parts length of heating wire 14.678 14.435 14.284 outer diameter 0.48 0.48 0.48 resistance per meter 2.29 2.29 2.29 resistance 33.61 33.06 32.71 Voltage (V) 440 440 440 Capacity (W) 5759.74 5856.70 59118.61 Current (A) 13.09 13.31 13.45 Watt density (W/cm ²⁾ 2.60 2.69 2.75 Number of each area 2 2 2 total capacity 11519.48 11713.40 11837.23 Total(KW) 35.1

In (Table 1), the upper and lower outer heating parts refer to the outer heating parts 210 of the outer region 200 provided at the upper and lower parts of the inner region 100, and the left and right outer heating parts are located on the left and right sides of the inner region 100. It refers to the outer heating unit 210 of the outer area 200 provided on the right side.

In this way, if the difference in heat capacity is not large, the heater life time can ultimately be extended, and various benefits such as extending the heat life, etc. are followed.

Conversely, for example, if the lengths of each heating wire provided in at least one of the inner heating part 110 and the outer heating part 210 are not the same or have a length deviation of ±5%, the inner heating part 110 and the outer heating part 210 The sizes of resistance and capacity (heat capacity/total capacity) generated in the heating unit 210 are greatly different for the inner heating unit 110 and the outer heating unit 210, resulting in a shortened heater life or a decrease in the life time of each heater ( Heater life time changes, and thermal expansion increases.

In order to overcome this shortcoming, the length of each heating wire is adjusted within the deviation as described above, but is not necessarily limited to this.

In other words, without comparing the length of any two heating wires provided in at least one inner heating unit 110 and the outer heating unit 210, the length of the entire heating wire provided in the inner heating unit 110 is compared to the outer heating unit. The entire length of the heating line provided in 210 may be the same or may be patterned within a length deviation of ±5%.

In this way, in this embodiment, the length of all heating wires for each region or the length of each heating wire arranged in the inner region and the outer region is designed to be within the deviation, thereby reducing the heat capacity deviation and maintaining the heat capacity almost the same, thereby maintaining the heater life. It can provide various benefits, such as keeping the heater life time the same.

Meanwhile, unlike the length design of each heating wire described above, looking at it from another perspective, the length of each heating wire disposed in the above-described at least one inner heating part 110 and at least one outer heating part 210 is The variation in capacity that occurs can be determined to be the same or within a range of ±5%.

Alternatively, the length of each heating wire disposed in the above-described at least one inner heating unit 110 and at least one external heating unit 210 may be determined so that the variation in resistance generated from each heating wire is the same or within the range of ±5%. .

To further explain, if the total length of the heating wire for each region or the length of each heating wire of the inner heating unit 110 and the outer heating unit 210 is optimally designed as described above, the calculation results are as shown in (Table 1) Just as each parameter is within an error range and can have the various advantages described above, the deviation of each consequential parameter, such as resistance or capacity, is the same or within ±5% of the total heating wire length or inner heating for each area as described above. It is possible to optimally determine the length of each heating wire of the unit 110 and the outer heating unit 210.

Accordingly, due to the above-mentioned design from a different perspective, in this embodiment, the heat capacity can be maintained almost the same by reducing the heat capacity deviation, and thus various advantages such as maintaining the heater life time the same are provided. It may be possible.

Meanwhile, the above-described first outer heating unit 211 includes a plurality of fourth heating lines 210A formed in the horizontal direction, a plurality of fifth heating lines 210B formed in the vertical direction, and a plurality of fourth heating lines 210A. And/or may include a plurality of buffer heating lines 210C formed at at least one arbitrary point among the plurality of fifth heating lines 210B.

Likewise, the above-described second outer heating unit 212, third outer heating unit 213, and fourth outer heating unit 214 also include a plurality of fourth heating wires 210A and a plurality of fifth heating wires 210B. ) and a plurality of buffer heating lines 210C may be formed, but it should be noted in advance that they are not shown in FIG. 1.

In one embodiment, the plurality of fourth heating lines 210A may have a semicircular zigzag shape or a straight shape disposed in the horizontal direction in each outer area 200.

For example, the plurality of fourth heating lines 210A provided in the first outer heating unit 211 may have a semicircular zigzag shape arranged in the horizontal direction. A 4-1 heating wire located at an arbitrary end of the plurality of fourth heating wires 210A may be connected to the power supply unit 300.

On the other hand, the plurality of fourth heating lines provided in the third outer heating part 213 and the fourth outer heating part 214 are spaced apart from the plurality of fifth heating parts 210B, which will be described later, and have a straight shape in the horizontal direction. It can be arranged in the form of. A 4-2 heating wire located at an arbitrary end of the plurality of fourth heating wires may be connected to the power supply unit 300.

In this case, any other ends of the plurality of fourth heating wires provided in each heating unit that are not connected to the power supply unit 300 may be connected to each other.

In one embodiment, the plurality of fifth heating lines 21B may have a semicircular zigzag shape or a straight shape disposed in the vertical direction in each outer region 200.

For example, the plurality of fifth heating lines 210B provided in the first outer heating part 211 are spaced apart from the plurality of fourth heating parts 210A arranged in the vertical direction and have a straight shape in the vertical direction. It can be arranged in any form. A 5-1 heating wire located at an arbitrary end of the plurality of fifth heating wires 21B may be connected to the power supply unit 300.

On the other hand, the plurality of fifth heating lines provided in the third outer heating unit 213 and the fourth outer heating unit 214 may have a semicircular zigzag shape arranged in the vertical direction. A 5-2 heating wire located at an arbitrary end of the plurality of fifth heating wires may be connected to the power supply unit 300.

In this case, any other ends of the plurality of fifth heating wires provided in each heating unit that are not connected to the power supply unit 300 may be connected to each other.

In one embodiment, the plurality of buffer heating lines 210C are patterned so that the straight lengths of the aforementioned plurality of fourth heating lines 210A and the plurality of fifth heating lines 210B are the same or within a length deviation of ±5%. It may be disposed between the plurality of fourth heating lines 210A and between the plurality of fifth heating lines 210B.

To this end, the plurality of buffer heating lines 210C are randomly selected for each of the first outer heating unit 211, the second outer heating unit 212, the third outer heating unit 213, and the fourth outer heating unit 214. A plurality of first buffer heating wires (210C-1) and second buffer heating wires (210C-2) disposed between the two fourth heating wires (210A) and between any two fifth heating wires (210B). It can be included.

For example, a plurality of first buffer heating lines ( 210C-1) and the second buffer heating wire (210C-2) have the same straight length of the fourth heating wire (210A) and the fifth heating wire (210B) disposed in the first outer heating unit 211 or ±5 The position can be determined within a length deviation of %.

In other words, the horizontal length of the fourth heating wire 210A disposed in the first outer heating unit 211 and the vertical length of the fifth heating wire 120B are the same or within a length deviation of ±5% in each buffer. The position of the heating line 210C may be determined.

Likewise, the first buffer heating wire and the second buffer heating wire disposed between any two fourth heating wires and between any two fifth heating wires provided in the third outer heating unit 213 are connected to the third external heating unit 213. The straight lengths of any fourth and fifth heating lines disposed at 213 may be positioned at the same length or within a length deviation of ±5%.

In other words, the position of each buffer heating wire can be determined if the vertical length of any fourth heating wire disposed in the third outer heating unit 213 and the horizontal length of the fifth heating wire are the same or within a length deviation of ±5%. there is.

Accordingly, in this embodiment, the length between the heating wires provided in each of the plurality of fourth heating wires 210A and the plurality of fifth heating wires 210B is maintained at the same length or a length deviation of ±5%, thereby increasing thermal expansion. It extends the life of the heater, makes it easier to calculate tolerances due to thermal expansion, and eliminates the possibility of heater failure by preventing excessive thermal expansion.

From another perspective, looking at the outer heating unit 210 described above, it is as follows.

The outer heating unit 210 from another perspective according to one embodiment includes a first outer heating unit disposed on the left side of the inner region, a second outer heating portion disposed on the right side of the inner region, and a third outer heating portion disposed on the upper side of the inner region. It includes a fourth outer heating portion disposed below the heating portion and the inner region.

In addition, the first outer heating unit, the second external heating unit, the third external heating unit, and the fourth external heating unit include a plurality of sixth heating lines having a semicircular zigzag shape for each outer region 200, and an outer region ( Each 200) may include a plurality of seventh heating wires, one end of which is connected to an arbitrary end of the plurality of sixth heating wires, and disposed adjacent to the plurality of sixth heating wires at a predetermined interval.

Furthermore, the first outer heating unit 211, the second outer heating unit 212, the third outer heating unit 213, and the fourth outer heating unit 214 according to one embodiment are located in each outer region 200. A third semi-circular heater disposed between the plurality of sixth heating lines such that each straight length of the plurality of seventh heating lines is patterned within the same length or a length deviation of ±5% compared to the length of the straight heating lines included in the zigzag shape. It may further include a fourth buffer heating line connected between the buffer heating line and the plurality of sixth heating lines and having a semicircular shape opposite to the third buffer heating line.

Here, the reason for providing a plurality of third buffer heating lines and a plurality of fourth buffer heating lines is that the length between heating lines provided in the plurality of sixth heating wires and the plurality of seventh heating wires in each outer area 200 is the same or ±5%. By maintaining the length deviation at %, it extends the life of the heater by preventing an increase in thermal expansion, makes it easier to calculate tolerances due to thermal expansion, and helps eliminate the possibility of heater failure by preventing excessive thermal expansion. am.

<Example of the inner heating part>

Figure 2 is a diagram illustrating in more detail the pattern structure of the inner heating unit according to one embodiment. Figure 2 shows only the inner heating part and power supply part of Figure 1 cut out.

Referring to FIG. 2, the inner heating part 110 according to an embodiment includes a first inner heating part 111 and a second inner heating part 112, and the first inner heating part 111 and the second inner heating part 112 2 The inner heating unit 112 may each be made of a plurality of heating wires, for example, a plurality of first heating wires 110A (only one shown in the drawing), a plurality of second heating wires 110B (only one shown in the drawing), and a plurality of heating wires 110B. It may include a buffer heating line (110C).

In one embodiment, the plurality of first heating wires 110A may be connected to each other and may indicate heating wires disposed in the horizontal direction in each inner region 100.

In this case, when the plurality of first heating wires 110A are connected to each other, they may have a semicircular zigzag shape. Among the plurality of first heating wires 110A provided in each inner region 100, a 1-1 heating wire provided at an arbitrary end may each be connected to the power supply unit 300.

The plurality of first heating lines 110A may have a symmetrical semicircular zigzag shape in each inner region 100. If placed symmetrically, it can contribute to improving thermal efficiency.

In one embodiment, the plurality of second heating wires 110B are arranged to be spaced apart from the plurality of first heating wires 110A, and may refer to heating wires arranged in the vertical direction. For example, one end of the plurality of second heating wires 110B is connected to the connection line of the power supply unit 300, and the other end of the plurality of second heating wires 110B is connected to any of the plurality of first heating wires 110A. It may be arranged in the vertical direction and spaced apart from the plurality of first heating wires 110A so as to be connected to the 1-2 heating wires provided at the ends of .

In one embodiment, the plurality of buffer heating lines 110C are patterned such that the straight lengths of the plurality of first heating lines 110A and the plurality of second heating lines 110B are the same or within a length deviation of ±5%. , may be disposed between any of the first heating wires 110A and the plurality of second heating wires 110B.

For this purpose, the plurality of buffer heating lines 110C include a first buffer heating line 110C-1, a second buffer heating line 110C-2, a third buffer heating line 110C-3, and a fourth buffer heating line. (110C-4).

For example, the first buffer heating line 110C-1 includes a plurality of first heating lines 110A provided at the top of the left inner region and a plurality of first heating lines provided at the middle end of the left inner region. It will be disposed between (110A) and at the same time between the plurality of second heating wires 110B provided at the upper end of the left inner region and the plurality of second heating wires 110B provided at the middle end of the left inner region. You can.

For example, the second buffer heating line 110C-2 is provided at the middle end of the plurality of first heating lines 110A provided at the top of the right inner region 100 and the right inner region 100. It is disposed between the plurality of first heating wires 110A, and at the same time, the plurality of second heating wires 110B provided at the upper end of the right internal area 100 and the plurality of second heating wires 110B provided at the middle end of the right internal area 100. It may be disposed between the second heating lines 110B.

In addition, the third buffer heating line 110C-3 includes a plurality of first heating lines 110A provided at the middle end of the left inner region 100 and a plurality of first heating lines 110A provided at the lower end of the left inner region 100. At the same time as being disposed between the first heating wires 110A, a plurality of second heating wires 110B provided at the middle end of the left internal area 100 and a plurality of second heating wires 110B provided at the bottom of the left internal area 100 It may be disposed between the second heating lines 110B.

In addition, the fourth buffer heating line 110C-4 includes a plurality of first heating lines 110A provided at the middle end of the right inner region 100 and a plurality of first heating lines 110A provided at the lower end of the right inner region 100. At the same time as being disposed between the first heating wires 110A, a plurality of second heating wires 110B provided at the middle end of the right internal area 100 and a plurality of second heating wires 110B provided at the bottom of the right internal area 100 It may be disposed between the second heating lines 110B.

Here, the reason for arranging the first buffer heating lines (110C-1) to fourth buffer heating lines (110C-4) as described above is because of the horizontal length and vertical direction of the two heating lines (110A, 110B) described above. By keeping the length the same or with a length deviation of ±5%, it prevents an increase in thermal expansion, extending the life of the heater, making it easier to calculate tolerances due to thermal expansion, and preventing excessive thermal expansion to prevent heater failure. This is to help eliminate the possibility.

From another perspective, looking at the above-described inner heating unit 110 as follows.

The inner heating unit 110 from another perspective according to an embodiment includes a plurality of first heating wires having a semicircular zigzag shape for each inner region 100 and one end of each inner region 100 connected to one end of the plurality of first heating wires. and a plurality of second heating wires, the other ends of which are connected to the power supply unit 300, and a plurality of third heating wires arranged adjacent to the plurality of first heating wires and the second heating wires at a predetermined distance in each inner region 100. May include a heating wire.

In one embodiment, in the inner heating unit 110 from another perspective, the straight length of each of the plurality of third heating lines in each inner region 100 is the same or ±5% compared to the length of the straight heating line included in the semicircular zigzag shape. A plurality of first buffer heating lines having a semicircular shape and disposed between a plurality of third heating lines so as to be patterned within a length deviation of It may further include a plurality of second buffer heating lines facing each other and having a semicircular shape.

Here, the reason for providing a plurality of first buffer heating wires and a plurality of second buffer heating wires is that the lengths between the heating wires provided in the plurality of first heating wires, the plurality of second heating wires, and the plurality of third heating wires are the same or ± By maintaining the length deviation of 5%, it prevents an increase in thermal expansion and extends the life of the heater, makes it easier to calculate tolerances due to thermal expansion, and helps eliminate the possibility of heater failure by preventing excessive thermal expansion. It is for this purpose.

Below, an example of applying the above-described substrate mounting unit to a substrate processing apparatus will be described.

<Embodiment of substrate processing device>

Figure 3 is a block diagram schematically showing a substrate processing apparatus equipped with a substrate mounting unit according to an embodiment.

Referring to FIG. 3, a substrate processing apparatus according to an embodiment includes a process chamber 1100 provided with a reaction space, and a substrate mounting unit provided in the process chamber 1100 to support at least one substrate 1010. 1000), a gas distribution device 1300 provided on the other side of the process chamber 1100 opposite the substrate mounting unit 1000 to spray process gas, and a gas distribution device 1300 provided outside the process chamber 1100 to distribute gas It may include a gas supply unit 1400 that supplies process gas to the device 1300.

Additionally, the substrate processing apparatus may further include an exhaust unit 1500 for exhausting the inside of the process chamber 1100.

In one embodiment, the process chamber 1100 may be provided in a cylindrical shape with a space therein for deposition of the substrate 1001. This process chamber 1100 may be provided in various shapes depending on the shape of the substrate 1010.

Inside this process chamber 1100, a substrate seating unit 1000 and a gas distribution device 1300 may be provided to face each other. For example, the substrate seating unit 1000 may be provided on the lower side of the process chamber 1100, and the gas distribution device 1300 may be provided on the upper side of the process chamber 1100.

Additionally, the process chamber 1100 may be provided with a substrate entrance 1110 through which the substrate 1010 is introduced and extracted. Additionally, the process chamber 1100 may be provided with a gas inlet 1120 connected to a gas supply unit 1400 that supplies process gas into the process chamber 1100.

In addition, in order to adjust the internal pressure of the process chamber 1100 or exhaust foreign substances inside the process chamber 1100, an exhaust port 1130 is provided, and an exhaust unit 1500 may be connected to the exhaust port 1130. .

For example, the substrate entrance 1110 may be provided on one side of the process chamber 1100 with a size large enough to allow the substrate 1010 to enter and exit, and the gas inlet 1120 may be provided on one side of the process chamber 1100. It may be provided through the wall, and the exhaust port 1130 may be provided through the side wall or bottom wall of the process chamber 1100 at a lower position than the substrate mounting unit 1000.

In one embodiment, the substrate seating unit 1000 is provided inside the process chamber 1100 to seat at least one substrate 1010 introduced into the process chamber 1100. This substrate seating unit 1000 may be provided in a position opposite to the gas distribution device 1300.

This substrate mounting unit 1000 may be formed as a substantially circular or square plate when viewed from the top and bottom. However, in the following, the substrate seating unit 1000 formed in a square plate shape will be described as an example.

For example, the substrate seating unit 1000 may be provided on the lower side of the process chamber 1100, and the gas distribution device 1300 may be provided on the upper side of the process chamber 1100.

Furthermore, a lifting device 1210 may be provided at the lower part of the substrate seating unit 1000 to move the substrate seating unit 1000 up and down. The lifting device 1210 is provided to support at least one area, for example, the central portion, of the substrate mounting unit 1000. When the substrate 1010 is mounted on the substrate mounting unit 1000, the substrate mounting unit 1000 is connected to the gas distribution device. It can be moved to be closer to (1300).

In particular, the substrate seating unit 1000 according to one embodiment includes an inner region 100 including at least one inner heating portion 110 and at least one outer heating portion disposed surrounding the inner region 100 ( It includes an outer area 200 including 210 and a power supply unit 300. Since the features resulting from this have been sufficiently explained in FIGS. 1 and 2, their description will be omitted, but it should be noted in advance that the same applies to the present embodiment.

Additionally, at least one of the inner heating unit 110 and the outer heating unit 210 heats the substrate 1010 by generating heat at a predetermined temperature, so that thin film deposition processes and etching processes can be easily performed on the substrate 1010. It can greatly contribute to making it happen.

In one embodiment, the gas distribution device 1300 is provided on the upper inside of the process chamber 1100 and can spray process gas toward the substrate 1010 placed on the substrate seating unit 1000. Like the substrate mounting unit 1000, the gas distribution device 1300 can be manufactured in a shape corresponding to the shape of the substrate 1010, and can be manufactured in a substantially circular or square shape.

Moreover, the gas distribution device 1300 may include a top plate 1310, a showerhead 1320, and a side wall plate 1330. The upper plate 1310, like the upper wall of the process chamber 1100, has a gas inlet 1120 and can be connected to the gas supply unit 1400.

The showerhead 1320 is provided to be spaced apart from the upper plate 1310 by a predetermined distance in the vertical direction, and a plurality of spray holes (not shown) may be formed. The side wall plate 1330 may be provided to seal the space between the top plate 1310 and the shower head 1320.

In one embodiment, the gas supply unit 1400 includes a gas source 1410 that supplies a plurality of process gases, and a gas supply pipe 1420 that supplies the process gas from the gas source 1410 into the inside of the process chamber 1100. It can be included. Process gas may include thin film deposition gas and etching gas.

In one embodiment, the exhaust unit 1500 may include an exhaust device 1510 and an exhaust pipe 1520 connected to the exhaust port 1130 of the process chamber 1100. The exhaust device 1510 may use a vacuum pump or the like, and may be configured to vacuum the inside of the process chamber 1100 to a pressure close to vacuum, for example, a pressure of 0.1 mTorr or less.

Meanwhile, the substrate processing apparatus according to one embodiment includes a power supply unit 300 including an RF power source 1620 and an impedance matching box (I.M.B. (Impedance Matching Box) 1610). Since the connection relationship and voltage supply relationship between the power supply unit 300 and the inner heating unit 110/outer heating unit 210 of the substrate seating unit 1000 are sufficiently explained in FIGS. 1 and 2, their description will be omitted. .

Additionally, the power supply unit 300 may generate plasma in the process gas by using the upper plate 1310 of the gas distribution device 1300 as a plasma electrode.

For this purpose, an RF power source 310 that supplies RF power is connected to the top plate 1310, and an impedance matching device is used to match the impedance so that maximum power can be applied between the top plate 1310 and the RF power source 310. A box 320 may be further provided.

In this way, in this embodiment, by applying the substrate mounting unit 1000 described in FIGS. 1 and 2 to the above-described substrate processing apparatus, the length of the total heating wire for each region or the length of each heating wire disposed in the inner region and the outer region can be changed. By designing within the deviation and reducing the heat capacity deviation, the heat capacity can be kept almost the same, and thus the heater life time can be kept the same, providing various advantages.

Although only a few examples of the embodiments disclosed above are described, various other forms of implementation are possible. The technical contents of the above-described embodiments can be combined in various forms unless they are incompatible technologies, and through this, can be implemented as a new embodiment.

In addition, it is obvious to those skilled in the art that the embodiments disclosed above can be embodied in other specific forms without departing from the spirit and essential characteristics of the present invention.

Accordingly, the above-described embodiments should not be construed as restrictive in all respects and should be considered illustrative. The scope of this embodiment should be determined by reasonable interpretation of the appended claims, and all changes within the equivalent scope of this embodiment are included in the scope of this embodiment.

100: inner area 110: inner heating unit
111: first inner heating unit 112: second inner heating unit
110A: a plurality of first heating wires 110B: a plurality of second heating wires
110C, 210C: Multiple buffer heating lines 200: Outer area
210: outer heating unit 211: first outer heating unit
212: second outer heating unit 213: third outer heating unit
214: fourth outer heating unit 201A: plurality of fourth heating lines
210B: a plurality of fifth heating lines 210C: a plurality of buffer heating lines
300: Power supply unit 1000: Board seating unit

Claims (11)

In the substrate seating unit used in the substrate processing process,
an inner region comprising at least one inner heating portion;
an outer region comprising at least one outer heating unit disposed surrounding the inner region;
Including,
The length of each heating line disposed in the at least one inner heating part and the at least one outer heating part is patterned to be the same or within a length deviation of ±5% and disposed in the corresponding inner region and the outer region, ,
The inner heating unit,
a plurality of first heating wires arranged at predetermined intervals in each inner region;
A plurality of second plurality of second heating wires are disposed at predetermined intervals in each inner region, at least one end of which is connected to one end of the first heating wire of the plurality of first heating wires, and the other end of the heating wire is connected to a power supply. heating wire,
A substrate mounting unit including a plurality of third heating wires arranged adjacent to each other at a predetermined distance between the plurality of first heating wires and the plurality of second heating wires at a predetermined interval in each inner region. In the substrate seating unit used in the substrate processing process,
an inner region comprising at least one inner heating portion;
an outer region comprising at least one outer heating unit disposed surrounding the inner region,
The length of each heating wire disposed in the at least one inner heating part and the at least one outer heating part is patterned to be the same or within a length deviation of ±5% and disposed in the corresponding inner region and the outer region, ,
The inner heating unit,
a plurality of first heating lines disposed horizontally in the inner region;
a plurality of second heating wires arranged to be spaced apart from the plurality of first heating wires and arranged in a vertical direction;
Arranged between the plurality of first heating wires and between the plurality of second heating wires so that the straight lengths of the plurality of first heating wires and the plurality of second heating wires are the same or patterned within a length deviation of ±5%. A substrate seating unit comprising a plurality of buffer heating lines. delete According to paragraph 1,
The plurality of third heating wires are,
a plurality of first buffer heating lines having a semicircular shape and disposed between the plurality of second heating lines;
A substrate seating unit comprising a plurality of second buffer heating wires connected between the plurality of first heating wires and having a semicircular shape opposite to the first buffer heating wire. According to paragraph 2,
The outer heating unit,
a plurality of fourth heating wires arranged horizontally in the outer area, and a plurality of fifth heating wires arranged vertically in the outer area;
Arranged between the plurality of fourth heating wires and between the plurality of fifth heating wires so that the straight lengths of the plurality of fourth heating wires and the plurality of fifth heating wires are the same or patterned within a length deviation of ±5%. A substrate seating unit comprising a plurality of buffer heating lines. According to paragraph 1,
A substrate seating unit, wherein the outer heating part has the same pattern as the inner heating part. According to clause 6,
The outer heating unit,
a plurality of fourth heating lines disposed at predetermined intervals in the outer region;
a plurality of fifth heating wires disposed at predetermined intervals in the outer region, at least one end of which is connected to one end of the plurality of fourth heating wires, and the other end of which is connected to a power supply;
Placing the substrate, including a plurality of sixth heating wires disposed adjacent to each other at a predetermined distance between the plurality of fourth heating wires and the plurality of fifth heating wires at a predetermined interval in each inner region. unit. In clause 7,
The plurality of sixth heating lines are,
a third buffer heating line having a semicircular shape and disposed between the plurality of fifth heating lines;
A substrate seating unit comprising a fourth buffer heating line connected between the plurality of fourth heating lines and having a semicircular shape opposite to the third buffer heating line. In the substrate seating unit used in the substrate processing process,
an inner region comprising at least one inner heating portion;
an outer region comprising at least one outer heating unit disposed surrounding the inner region,
The length of each heating wire disposed in the at least one inner heating unit and the at least one external heating unit is determined so that the variation in capacity generated from each heating wire is the same or within a range of ±5%,
The inner heating unit,
a plurality of first heating wires arranged at predetermined intervals in each inner region;
A plurality of second plurality of second heating wires are disposed at predetermined intervals in each inner region, at least one end of which is connected to one end of the first heating wire of the plurality of first heating wires, and the other end of the heating wire is connected to a power supply. heating wire,
A substrate seating unit comprising a plurality of third heating wires disposed adjacent to each other at a predetermined interval in each inner region and between the plurality of first heating wires and the plurality of second heating wires. In the substrate seating unit used in the substrate processing process,
an inner region comprising at least one inner heating portion;
an outer region comprising at least one outer heating unit disposed surrounding the inner region,
The length of each heating wire disposed in the at least one inner heating unit and the at least one external heating unit is determined such that the variation in resistance generated from each heating wire is the same or within a range of ±5%,
The inner heating unit,
a plurality of first heating wires arranged at predetermined intervals in each inner region;
A plurality of second plurality of second heating wires are disposed at predetermined intervals in each inner region, at least one end of which is connected to one end of the first heating wire of the plurality of first heating wires, and the other end of the heating wire is connected to a power supply. heating wire,
A substrate seating unit comprising a plurality of third heating wires disposed adjacent to each other at a predetermined interval in each inner region and between the plurality of first heating wires and the plurality of second heating wires. In a substrate processing device used in a substrate processing process,
A substrate provided in a process chamber;
A substrate mounting unit according to any one of claims 1, 2, 4 to 10, which seats the substrate on the upper portion and heats the mounted substrate;
a gas distribution device that sprays process gas into the process chamber; and
A lifting device disposed below the substrate mounting unit and moving the substrate mounting unit up and down to approach the gas distribution device.
Including, a substrate processing device.

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