KR102498396B1 - Curable silicone composition and optical semiconductor device using the same - Google Patents

Curable silicone composition and optical semiconductor device using the same Download PDF

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KR102498396B1
KR102498396B1 KR1020197016211A KR20197016211A KR102498396B1 KR 102498396 B1 KR102498396 B1 KR 102498396B1 KR 1020197016211 A KR1020197016211 A KR 1020197016211A KR 20197016211 A KR20197016211 A KR 20197016211A KR 102498396 B1 KR102498396 B1 KR 102498396B1
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curable silicone
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카스미 다케우치
마유미 미즈카미
요시츠구 모리타
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다우 도레이 캄파니 리미티드
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Abstract

경화성이 우수하고, 내열 충격성이 높으며, 가스 투과성이 낮은 경화물을 부여하는 경화성 실리콘 조성물을 제공한다. 또한, 당해 경화성 실리콘 조성물을 광반도체 장치에 적용함으로써, 내열 충격성이 우수하고, 높은 발광 효율이 지속된다는 이점을 갖는 광반도체 장치를 제공한다. 알킬페닐비닐실록산 단위(R2R3R4SiO0.5; 식 중, R2는 메틸기 등의 알킬기, R3은 페닐기, R4는 비닐기 등의 알케닐기이다)를 갖는 오르가노폴리실록산을 함유하여 이루어지며, 또한, 조성물 전체에 대해 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 함유량이 0.0 질량%보다 크고, 3.0 질량% 미만인 것을 특징으로 하는 경화성 실리콘 조성물 및 그것을 사용한 광반도체 장치.A curable silicone composition that provides a cured product having excellent curability, high thermal shock resistance and low gas permeability. Furthermore, by applying the curable silicone composition to an optical semiconductor device, an optical semiconductor device having the advantages of being excellent in thermal shock resistance and maintaining high luminous efficiency is provided. An organopolysiloxane having an alkylphenylvinylsiloxane unit (R 2 R 3 R 4 SiO 0.5 ; where R 2 is an alkyl group such as methyl group, R 3 is a phenyl group, and R 4 is an alkenyl group such as vinyl group), and the content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane is greater than 0.0% by mass and less than 3.0% by mass with respect to the entire composition. and an optical semiconductor device using the same.

Description

경화성 실리콘 조성물 및 그것을 사용한 광반도체 장치Curable silicone composition and optical semiconductor device using the same

본 발명은 경화성 실리콘 조성물에 관한 것이며, 상세하게는 발광 다이오드(LED) 등의 광반도체 장치에 있어서의 광반도체 소자의 봉지재 혹은 보호 코팅재로서 바람직하게 사용할 수 있는 경화성 실리콘 조성물 및 그것을 사용한 광반도체 장치에 관한 것이다.The present invention relates to a curable silicone composition, and in detail, a curable silicone composition that can be preferably used as a sealing material or a protective coating material for an optical semiconductor element in an optical semiconductor device such as a light emitting diode (LED), and an optical semiconductor device using the same It is about.

경화성 실리콘 조성물은 발광 다이오드(LED) 등의 광반도체 장치에 있어서의 광반도체 소자의 봉지재 혹은 보호 코팅재에 사용되고 있다. 그러나, 경화성 실리콘 조성물의 경화물은 가스 투과성이 높기 때문에 광의 강도가 강하여, 발열이 큰 고휘도 LED에 사용한 경우에는 부식성 가스에 의한 봉지재의 변색이나 LED 기판에 도금된 은의 부식에 의한 휘도 저하가 문제가 되고 있다. 이들은 광반도체 장치의 발광 효율 감쇠의 원인이 되기 때문이다.BACKGROUND OF THE INVENTION Curable silicone compositions are used for sealing materials or protective coating materials for optical semiconductor elements in optical semiconductor devices such as light emitting diodes (LEDs). However, since the cured product of the curable silicone composition has high gas permeability, the intensity of light is strong, and when used in a high-brightness LED with high heat generation, there is a problem of discoloration of the encapsulant due to corrosive gas or decrease in luminance due to corrosion of silver plated on the LED substrate. It is becoming. It is because these become a cause of the luminous efficiency attenuation of an optical semiconductor device.

한편, 특허문헌 1 및 특허문헌 2에는 메틸페닐비닐실록산 단위를 갖는 분기쇄형의 오르가노폴리실록산, 오르가노하이드로겐폴리실록산, 및 부가 반응용 촉매로 이루어지는 경화성 실리콘 조성물이 제안되어 있으며, 이들 조성물이 가스 투과성이 낮은 경화물을 부여하는 것이 개시되어 있다. 그러나, 이들 경화성 실리콘 조성물은 경화성 및 얻을 수 있는 경화물의 내열 충격성이 불충분하여, 추가적인 개선이 요구되고 있었다.On the other hand, Patent Document 1 and Patent Document 2 propose a curable silicone composition comprising a branched organopolysiloxane having a methylphenylvinylsiloxane unit, an organohydrogenpolysiloxane, and a catalyst for an addition reaction, and these compositions have gas permeability It is disclosed to impart a low cured product. However, these curable silicone compositions have insufficient curability and thermal shock resistance of a cured product to be obtained, and further improvement has been desired.

일본 공개특허공보 2012-052045호Japanese Unexamined Patent Publication No. 2012-052045 일본 공개특허공보 2014-084417호Japanese Unexamined Patent Publication No. 2014-084417

본 발명의 목적은 높은 히드로실릴화 반응성을 갖고, 경화성 및 내열 충격성이 우수하며, 또한, 가스 투과성이 낮은 경화물을 부여하는 경화성 실리콘 조성물을 제공하는 것이다. 또한, 본 발명의 목적은 당해 경화성 실리콘 조성물을 사용함으로써, 내열 충격성이 우수하고, 높은 발광 효율이 지속되는 광반도체 장치 등을 제공하는 것에 있다.An object of the present invention is to provide a curable silicone composition that gives a cured product having high hydrosilylation reactivity, excellent curability and thermal shock resistance, and low gas permeability. Moreover, the objective of this invention is providing the optical semiconductor device etc. which are excellent in thermal shock resistance and maintain high luminous efficiency by using the said curable silicone composition.

본 발명자들은 상기 과제를 해결하기 위해 예의 검토한 결과, 알킬페닐비닐실록산 단위를 함유하는 오르가노폴리실록산을 함유하며, 또한, 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 함유량 범위가 0.0 질량%보다 크고, 3.0 질량% 미만인 것을 특징으로 하는 경화성 실리콘 조성물에 의해 상기 과제를 해결할 수 있다는 것을 알아내어, 본 발명에 도달하였다. 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산은 알킬페닐비닐실록산 단위를 함유하는 분기쇄형 또는 수지형의 오르가노폴리실록산의 합성시에 당해 오르가노폴리실록산 내에 잔존하는 성분이지만, 이 함유량이 상기 범위에 있도록 제어된 경화성 실리콘 조성물을 사용함으로써, 상기 과제를 해결 가능하다.As a result of intensive studies to solve the above problems, the inventors of the present invention have found that an organopolysiloxane containing an alkylphenylvinylsiloxane unit is contained, and 1,3-divinyl-1,3-diphenyl-1,3-dimethyl It was found that the above problems can be solved by a curable silicone composition characterized in that the content range of disiloxane is greater than 0.0% by mass and less than 3.0% by mass, and the present invention has been reached. 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane is a compound that remains in organopolysiloxane during the synthesis of branched or resinous organopolysiloxanes containing alkylphenylvinylsiloxane units. Although it is a component, the said subject is solvable by using the curable silicone composition whose content was controlled so that it might fall within the said range.

본 발명의 경화성 실리콘 조성물은The curable silicone composition of the present invention

알킬페닐알케닐실록산 단위(R2R3R4SiO1/2; R2는 탄소수 1∼12의 알킬기; R3은 페닐기; R4는 탄소수 2∼12의 알케닐기이다)를 갖는 오르가노폴리실록산을 함유하여 이루어지며, 또한, 조성물 전체에 대해 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 함유량이 0.0 질량%보다 크고, 3.0 질량% 미만인 것을 특징으로 한다.Organopolysiloxane having an alkylphenylalkenylsiloxane unit (R 2 R 3 R 4 SiO 1/2 ; R 2 is an alkyl group having 1 to 12 carbon atoms; R 3 is a phenyl group; R 4 is an alkenyl group having 2 to 12 carbon atoms) In addition, the content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane is greater than 0.0% by mass and less than 3.0% by mass with respect to the entire composition. .

바람직하게는, 본 발명의 경화성 실리콘 조성물은Preferably, the curable silicone composition of the present invention

(A) 평균 단위식:(A) average unit formula:

(R1 3SiO1/2)a(R2R3R4SiO1/2)b(R5 2SiO2/2)c(R3SiO3/2)d (R 1 3 SiO 1/2 ) a (R 2 R 3 R 4 SiO 1/2 ) b (R 5 2 SiO 2/2 ) c (R 3 SiO 3/2 ) d

(식 중, R1은 동일하거나 또는 상이한 탄소수 1∼12의 알킬기 혹은 탄소수 2∼12의 알케닐기, 단, 1분자 중의 적어도 하나의 R1은 탄소수 2∼12의 알케닐기; R2는 탄소수 1∼12의 알킬기; R3은 페닐기; R4는 탄소수 2∼12의 알케닐기; R4는 탄소수 2∼12의 알케닐기; R5는 동일하거나 또는 상이한 탄소수 1∼12의 알킬기, 탄소수 2∼12의 알케닐기, 혹은 페닐기; a, b, c, 및 d는 각각, 0.00≤a≤0.45, 0.01≤b≤0.45, 0≤c≤0.7, 0.1≤d<0.9, 또한 a+b+c+d=1을 만족하는 수이다.)(Wherein, R 1 is the same or different C 1 to C 12 alkyl group or C 2 to C 12 alkenyl group, provided that at least one R 1 in one molecule is a C 2 to C 12 alkenyl group; R 2 is C 1 ~12 alkyl group; R 3 is a phenyl group; R 4 is an alkenyl group having 2 to 12 carbon atoms; R 4 is an alkenyl group having 2 to 12 carbon atoms; R 5 is the same or different alkyl group having 1 to 12 carbon atoms; Alkenyl group or phenyl group of; a, b, c, and d are numbers satisfying 0.00≤a≤0.45, 0.01≤b≤0.45, 0≤c≤0.7, 0.1≤d<0.9, and a+b+c+d = 1, respectively. am.)

로 나타내는 오르가노폴리실록산,An organopolysiloxane represented by

(B) 1분자 중에 적어도 2개의 알케닐기를 갖고, 규소 원자 결합 수소 원자를 갖지 않는 직쇄형 오르가노폴리실록산(본 조성물에 대해, 0∼70 질량%),(B) a straight-chain organopolysiloxane having at least two alkenyl groups in one molecule and no silicon atom-bonded hydrogen atoms (0 to 70% by mass relative to the present composition);

(C) 1분자 중에 적어도 2개의 규소 원자 결합 수소 원자를 갖는 오르가노폴리실록산{(A) 성분과 (B) 성분 중의 알케닐기의 합계 1 몰에 대해, 본 성분 중의 규소 원자 결합 수소 원자가 0.1∼5 몰이 되는 양},(C) organopolysiloxane having at least two silicon-bonded hydrogen atoms in one molecule {the silicon-bonded hydrogen atoms in this component are 0.1 to 5 per mole of the total of alkenyl groups in component (A) and component (B) amount to be a mole},

(D) 유효량의 히드로실릴화 반응용 촉매, 및(D) an effective amount of a catalyst for the hydrosilylation reaction, and

임의로, (E) 접착 부여제{상기 (A) 성분∼(D) 성분의 합계 100 질량부에 대해, 0.01∼10 질량부}Optionally, (E) adhesion imparting agent {0.01 to 10 parts by mass relative to 100 parts by mass in total of the components (A) to (D) above}

를 함유하여 이루어지며, 또한,It is made by containing, and also,

조성물 전체에 대해 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 함유량이 0.05 질량%∼2.50 질량%의 범위인 것을 특징으로 한다.It is characterized in that the content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane is in the range of 0.05% by mass to 2.50% by mass with respect to the entire composition.

본 발명의 경화물은 상기 경화성 실리콘 조성물을 경화시켜 이루어지는 것을 특징으로 한다.The cured product of the present invention is characterized in that it is obtained by curing the curable silicone composition.

본 발명의 광반도체 장치는 상기 경화성 실리콘 조성물의 경화물에 의해 광반도체 소자를 봉지하여 이루어지는 것을 특징으로 한다.The optical semiconductor device of the present invention is characterized in that an optical semiconductor element is sealed with a cured product of the curable silicone composition.

본 발명의 경화성 실리콘 조성물은 높은 히드로실릴화 반응성을 갖고, 경화성 및 내열 충격성이 우수하며, 또한, 가스 투과성이 낮은 경화물을 형성한다고 하는 특징이 있다. 나아가, 본 발명의 경화물은 가스 투과성이 낮고, 내열 충격성이 우수하다는 특징이 있어, 당해 경화물을 구비한 본 발명의 광반도체 장치는 신뢰성이 우수하며, 높은 발광 효율이 지속된다는 특징이 있다.The curable silicone composition of the present invention is characterized by forming a cured product having high hydrosilylation reactivity, excellent curability and thermal shock resistance, and low gas permeability. Furthermore, the cured product of the present invention is characterized by low gas permeability and excellent thermal shock resistance, and the optical semiconductor device of the present invention equipped with the cured product is characterized by excellent reliability and sustained high luminous efficiency.

도 1은 본 발명의 광반도체 장치의 일례인 LED의 단면도이다.1 is a cross-sectional view of an LED as an example of an optical semiconductor device of the present invention.

먼저, 본 발명의 경화성 실리콘 조성물에 대해 상세하게 설명한다. First, the curable silicone composition of the present invention will be described in detail.

본 발명의 경화성 실리콘 조성물은 알킬페닐알케닐실록산 단위(R2R3R4SiO1/2; R2는 탄소수 1∼12의 알킬기; R3은 페닐기; R4는 탄소수 2∼12의 알케닐기이다)를 갖는 오르가노폴리실록산을 함유하는 것을 제1 특징으로 하는 당해 오르가노폴리실록산은 히드로실릴화 반응성이 우수하며, 또한, 가스 투과성이 낮은 경화물을 형성할 수 있다. 당해 오르가노폴리실록산은 다른 실록산 단위를 포함하는 것이어도 되며, 특히, 분기쇄형 또는 수지형의 분자 구조를 갖는 것이 바람직하다. 이러한 오르가노폴리실록산은 바람직하게는,The curable silicone composition of the present invention is an alkylphenylalkenylsiloxane unit (R 2 R 3 R 4 SiO 1/2 ; R 2 is an alkyl group having 1 to 12 carbon atoms; R 3 is a phenyl group; R 4 is an alkenyl group having 2 to 12 carbon atoms) The organopolysiloxane characterized as first by containing an organopolysiloxane having a) has excellent hydrosilylation reactivity and can form a cured product having low gas permeability. The organopolysiloxane may contain other siloxane units, and particularly preferably has a branched chain or resin molecular structure. Such an organopolysiloxane is preferably,

평균 단위식:Mean unit formula:

(R1 3SiO1/2)a(R2R3R4SiO1/2)b(R5 2SiO2/2)c(R3SiO3/2)d (R 1 3 SiO 1/2 ) a (R 2 R 3 R 4 SiO 1/2 ) b (R 5 2 SiO 2/2 ) c (R 3 SiO 3/2 ) d

로 나타낸다.represented by

식 중, R1은 동일하거나 또는 상이한 탄소수 1∼12의 알킬기 혹은 탄소수 2∼12의 알케닐기이다. R1의 알킬기로는, 메틸기, 에틸기, 프로필기, 부틸기, 펜틸기, 헥실기, 헵틸기, 옥틸기, 노닐기, 데실기, 운데실기, 도데실기가 예시되며, 바람직하게는 메틸기이다. 또한, R1의 알케닐기로는, 비닐기, 알릴기, 부테닐기, 펜테닐기, 헥세닐기, 헵테닐기, 옥테닐기, 노네닐기, 데세닐기, 운데세닐기, 도데세닐기가 예시되며, 바람직하게는 비닐기이다. 단, 1분자 중의 적어도 하나의 R1은 탄소수 2∼12의 알케닐기이다. 또한, R2는 탄소수 1∼12의 알킬기이고, 상기 R1과 동일한 알킬기가 예시되며, 바람직하게는 메틸기이다. 또한, R3은 페닐기이다. R4는 탄소수 2∼12의 알케닐기이고, 상기 R1과 동일한 알케닐기가 예시되며, 바람직하게는 비닐기이다. 또한, R5는 동일하거나 또는 상이한 탄소수 1∼12의 알킬기, 탄소수 2∼12의 알케닐기, 혹은 페닐기이다. R5의 알킬기로는, 상기 R1과 동일한 알킬기가 예시된다. R5의 알케닐기로는, 상기 R1과 동일한 알케닐기가 예시된다.In formula, R <1> is the same or different C1-C12 alkyl group or C2-C12 alkenyl group. Examples of the alkyl group for R 1 include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, and a dodecyl group, and a methyl group is preferred. Examples of the alkenyl group for R 1 include a vinyl group, an allyl group, a butenyl group, a pentenyl group, a hexenyl group, a heptenyl group, an octenyl group, a nonenyl group, a decenyl group, an undecenyl group, and a dodecenyl group, and preferably It is a vinyl group. However, at least one R 1 in one molecule is an alkenyl group having 2 to 12 carbon atoms. In addition, R 2 is an alkyl group having 1 to 12 carbon atoms, and the same alkyl group as the above R 1 is exemplified, preferably a methyl group. In addition, R 3 is a phenyl group. R 4 is an alkenyl group having 2 to 12 carbon atoms, and the same alkenyl group as the above R 1 is exemplified, preferably a vinyl group. Moreover, R <5> is the same or different C1-C12 alkyl group, C2-C12 alkenyl group, or a phenyl group. Examples of the alkyl group for R 5 include the same alkyl groups as those for R 1 above. As the alkenyl group for R 5 , the same alkenyl groups as those for R 1 are exemplified.

또한, 식 중, a, b, c, 및 d는 각각, 0.00≤a≤0.45, 0.01≤b≤0.45, 0≤c≤0.7, 0.1≤d<0.9, 또한 a+b+c+d=1을 만족하는 수이고, 바람직하게는, 0.00≤a≤0.45, 0.05≤b≤0.45, 0≤c≤0.5, 0.4≤d<0.85, 또한 a+b+c+d=1을 만족하는 수이며, 더욱 바람직하게는, 0.00≤a≤0.4, 0.05≤b≤0.4, 0≤c≤0.4, 0.45≤d<0.8, 또한, a+b+c+d=1을 만족하는 수이다. 이는 a가 상기 범위의 상한 이하이면, 경화물의 낮은 가스 투과성을 실현시킬 수 있기 때문이다. 또한, b가 상기 범위의 하한 이상이면, 경화물의 낮은 가스 투과성을 실현시킬 수 있기 때문이며, 한편, 상기 범위의 상한 이하이면, 경화물에 끈적임이 발생하기 어려워지기 때문이다. 또한, c가 상기 범위의 상한 이하이면, 경화물의 경도가 양호해져, 신뢰성이 향상되기 때문이다. 또한, d가 상기 범위의 하한 이상이면, 경화물의 굴절률이 양호해지기 때문이며, 한편, 상기 범위의 상한 이하이면, 경화물의 기계적 특성이 향상되기 때문이다.In the formula, a, b, c, and d are numbers satisfying 0.00≤a≤0.45, 0.01≤b≤0.45, 0≤c≤0.7, 0.1≤d<0.9, and a+b+c+d = 1, respectively; Preferably, it is a number that satisfies 0.00≤a≤0.45, 0.05≤b≤0.45, 0≤c≤0.5, 0.4≤d<0.85, and a+b+c+d = 1, more preferably 0.00≤a≤0.4, 0.05 ≤b≤0.4, 0≤c≤0.4, 0.45≤d<0.8, and a number that satisfies a+b+c+d=1. This is because low gas permeability of a hardened|cured material can be realized if a is below the upper limit of the said range. When b is equal to or greater than the lower limit of the above range, low gas permeability of the cured product can be achieved, while when b is equal to or less than the upper limit of the above range, it is difficult to cause stickiness in the cured product. Moreover, it is because the hardness of hardened|cured material becomes favorable and reliability improves that c is below the upper limit of the said range. In addition, it is because the refractive index of hardened|cured material becomes favorable when d is more than the lower limit of the said range, and on the other hand, it is because the mechanical properties of hardened|cured material improve when it is less than the upper limit of the said range.

본 발명에 따른 오르가노폴리실록산은 상기 평균 단위식으로 나타내나, 본 발명의 목적을 저해하지 않는 범위에서, 식: R2 2R3SiO1/2로 나타내는 실록산 단위, 식: R2R3 2SiO1/2로 나타내는 실록산 단위, 식: R3 3SiO1/2로 나타내는 실록산 단위, 식: R2SiO3/2로 나타내는 실록산 단위, 식: R4SiO3/2로 나타내는 실록산 단위, 또는 식: SiO4/2로 나타내는 실록산 단위를 가져도 된다. 또한, 식 중, R2는 탄소수 1∼12의 알킬기이고, R3은 탄소수 6∼20의 아릴기 또는 탄소수 7∼20의 아랄킬기이며, R4는 탄소수 2∼12의 알케닐기이고, 각각 상기와 동일한 기가 예시된다. 또한, 본 발명의 오르가노폴리실록산에는 본 발명의 목적을 저해하지 않는 범위에서, 메톡시기, 에톡시기, 프로폭시기 등의 규소 원자 결합 알콕시기, 혹은 규소 원자 결합 수산기를 가지고 있어도 된다.The organopolysiloxane according to the present invention is represented by the above average unit formula, but within a range that does not impair the object of the present invention, a siloxane unit represented by formula: R 2 2 R 3 SiO 1/2 , formula: R 2 R 3 2 A siloxane unit represented by SiO 1/2 , a siloxane unit represented by formula: R 3 3 SiO 1/2 , a siloxane unit represented by formula: R 2 SiO 3/2 , a siloxane unit represented by formula: R 4 SiO 3/2 , or Formula: You may have a siloxane unit represented by SiO 4/2 . In the formula, R 2 is an alkyl group having 1 to 12 carbon atoms, R 3 is an aryl group having 6 to 20 carbon atoms or an aralkyl group having 7 to 20 carbon atoms, and R 4 is an alkenyl group having 2 to 12 carbon atoms, respectively. The same groups as are exemplified. In addition, the organopolysiloxane of the present invention may have a silicon atom-bonded alkoxy group such as a methoxy group, an ethoxy group, or a propoxy group, or a silicon-bonded hydroxyl group, as long as the object of the present invention is not impaired.

이러한 오르가노폴리실록산을 조제하는 방법으로는, 예를 들면, 화학식(I):As a method for preparing such an organopolysiloxane, for example, formula (I):

R3SiX3 R 3 SiX 3

으로 나타내는 실란 화합물, 화학식(II-1):A silane compound represented by Formula (II-1):

R1 3SiOSiR1 3 R 1 3 SiOSiR 1 3

으로 나타내는 디실록산 및/또는 화학식(II-2):A disiloxane represented by and/or formula (II-2):

R1 3SiXR 1 3 SiX

로 나타내는 실란 화합물, 및 화학식(III-1):A silane compound represented by and formula (III-1):

R2R3R4SiOSiR2R3R4 R 2 R 3 R 4 SiOSiR 2 R 3 R 4

로 나타내는 디실록산 및/또는 화학식(III-2):A disiloxane represented by and/or formula (III-2):

R2R3R4SiXR 2 R 3 R 4 SiX

로 나타내는 실란 화합물을, 산 혹은 알칼리의 존재하, 가수 분해·축합 반응시키는 방법을 들 수 있다.The method of carrying out the hydrolysis and condensation reaction of the silane compound represented by in the presence of an acid or an alkali is mentioned.

화학식(I):Formula (I):

R3SiX3 R 3 SiX 3

으로 나타내는 실란 화합물은 오르가노폴리실록산에, 식: R3SiO3/2로 나타내는 실록산 단위를 도입하기 위한 원료이다. 식 중, R3은 탄소수 6∼20의 아릴기 또는 탄소수 7∼20의 아랄킬기이고, 상기와 동일한 기가 예시되며, 바람직하게는 페닐기 또는 나프틸기이다. 또한, 식 중, X는 알콕시기, 아실옥시기, 할로겐 원자, 또는 수산기이다. X의 알콕시기로는, 메톡시기, 에톡시기, 프로폭시기가 예시된다. 또한, X의 아실옥시기로는, 아세톡시기가 예시된다. 또한, X의 할로겐 원자로는, 염소 원자, 브롬 원자가 예시된다.The silane compound represented by is a raw material for introducing a siloxane unit represented by formula: R 3 SiO 3/2 into organopolysiloxane. In the formula, R 3 is an aryl group of 6 to 20 carbon atoms or an aralkyl group of 7 to 20 carbon atoms, and the same groups as described above are exemplified, and preferably a phenyl group or a naphthyl group. In addition, in formula, X is an alkoxy group, an acyloxy group, a halogen atom, or a hydroxyl group. As an alkoxy group of X, a methoxy group, an ethoxy group, and a propoxy group are illustrated. Moreover, as an acyloxy group of X, an acetoxy group is illustrated. Moreover, as a halogen atom of X, a chlorine atom and a bromine atom are illustrated.

이러한 실란 화합물로는, 페닐트리메톡시실란, 페닐트리에톡시실란 등의 알콕시실란; 페닐트리아세톡시실란 등의 아실옥시실란; 페닐트리클로로실란 등의 할로실란; 페닐트리히드록시실란 등의 히드록시실란이 예시된다.Examples of such silane compounds include alkoxysilanes such as phenyltrimethoxysilane and phenyltriethoxysilane; acyloxysilanes such as phenyltriacetoxysilane; halosilanes such as phenyltrichlorosilane; Hydroxysilanes, such as phenyl trihydroxysilane, are illustrated.

또한, 화학식(II-1):Also, formula (II-1):

R1 3SiOSiR1 3 R 1 3 SiOSiR 1 3

으로 나타내는 디실록산은 오르가노폴리실록산에, 식: R1 3SiO1/2로 나타내는 실록산 단위를 도입하기 위한 원료이다. 식 중, R1은 동일하거나 또는 상이한 탄소수 1∼12의 알킬기 혹은 탄소수 2∼12의 알케닐기이다. R1의 알킬기로는, 상기와 동일한 기가 예시되며, 바람직하게는 메틸기이다. 또한, R1의 알케닐기로는, 상기와 동일한 기가 예시되며, 바람직하게는 비닐기이다.The disiloxane represented by is a raw material for introducing a siloxane unit represented by formula: R 1 3 SiO 1/2 into organopolysiloxane. In formula, R <1> is the same or different C1-C12 alkyl group or C2-C12 alkenyl group. As the alkyl group for R 1 , groups similar to those described above are exemplified, and a methyl group is preferred. Moreover, as an alkenyl group of R <1> , the group similar to the above is illustrated, Preferably it is a vinyl group.

이러한 디실록산으로는, 1,1,1,3,3,3-헥사메틸디실록산, 1,1,1,3,3,3-헥사에틸디실록산, 1,3-디비닐-1,1,3,3-테트라메틸디실록산, 1,3-디비닐-1,1,3,3-테트라에틸디실록산, 1,1,3,3-테트라비닐-1,3-디메틸디실록산, 1,1,1,3,3,3-헥사비닐디실록산이 예시된다. 이러한 디실록산을 2종 이상 조합하여 사용할 수도 있지만, 적어도 1,3-디비닐-1,1,3,3-테트라메틸디실록산, 1,3-디비닐-1,1,3,3-테트라에틸디실록산 등의 1,3-디알케닐-1,1,3,3-테트라알킬디실록산을 포함하는 것이 필요하다.As such disiloxane, 1,1,1,3,3,3-hexamethyldisiloxane, 1,1,1,3,3,3-hexaethyldisiloxane, 1,3-divinyl-1,1 ,3,3-tetramethyldisiloxane, 1,3-divinyl-1,1,3,3-tetraethyldisiloxane, 1,1,3,3-tetravinyl-1,3-dimethyldisiloxane, 1 , 1,1,3,3,3-hexavinyldisiloxane is exemplified. Although two or more of these disiloxanes may be used in combination, at least 1,3-divinyl-1,1,3,3-tetramethyldisiloxane and 1,3-divinyl-1,1,3,3-tetra It is necessary to include a 1,3-dialkenyl-1,1,3,3-tetraalkyldisiloxane such as ethyldisiloxane.

또한, 화학식(II-2):Also, formula (II-2):

R1 3SiXR 1 3 SiX

로 나타내는 실란 화합물도, 오르가노폴리실록산에, 식: R1 3SiO1/2로 나타내는 실록산 단위를 도입하기 위한 원료이다. 식 중, R1은 동일하거나 또는 상이한 탄소수 1∼12의 알킬기 혹은 탄소수 2∼12의 알케닐기이다. R1의 알킬기로는, 상기와 동일한 기가 예시되며, 바람직하게는 메틸기이다. 또한, R1의 알케닐기로는, 상기와 동일한 기가 예시되며, 바람직하게는 비닐기이다. 또한, 식 중, X는 알콕시기, 아실옥시기, 할로겐 원자, 또는 수산기이며, 상기와 동일한 기가 예시된다.The silane compound represented by is also a raw material for introducing a siloxane unit represented by formula: R 1 3 SiO 1/2 into organopolysiloxane. In formula, R <1> is the same or different C1-C12 alkyl group or C2-C12 alkenyl group. As the alkyl group for R 1 , groups similar to those described above are exemplified, and a methyl group is preferred. Moreover, as an alkenyl group of R <1> , the group similar to the above is illustrated, Preferably it is a vinyl group. In addition, in formula, X is an alkoxy group, an acyloxy group, a halogen atom, or a hydroxyl group, and the group similar to the above is illustrated.

이러한 실란 화합물로는, 트리메틸메톡시실란, 트리메틸에톡시실란, 디메틸비닐메톡시실란, 디에틸비닐메톡시실란, 디메틸비닐에톡시실란, 디에틸비닐에톡시실란, 디비닐메틸메톡시실란, 트리비닐메톡시실란 등의 알콕시실란; 디메틸비닐아세톡시실란, 디에틸비닐아세톡시실란, 디비닐메틸아세톡시실란, 트리비닐아세톡시실란 등의 아실옥시실란; 트리메틸클로로실란, 디메틸비닐클로로실란, 디에틸비닐클로로실란, 디비닐메틸클로로실란, 트리비닐클로로실란 등의 할로실란; 디메틸비닐히드록시실란, 디에틸비닐히드록시실란, 디비닐메틸히드록시실란, 트리비닐히드록시실란 등의 히드록시실란이 예시된다. 이러한 실란 화합물을 2종 이상 조합하여 사용할 수도 있지만, 적어도 디비닐메틸메톡시실란, 디비닐메틸아세톡시실란, 디비닐메틸클로로실란, 디비닐메틸히드록시실란 등의 알케닐디알킬실란 화합물을 포함하는 것이 필요하다.Such silane compounds include trimethylmethoxysilane, trimethylethoxysilane, dimethylvinylmethoxysilane, diethylvinylmethoxysilane, dimethylvinylethoxysilane, diethylvinylethoxysilane, divinylmethylmethoxysilane, and trimethylmethoxysilane. alkoxysilanes such as vinylmethoxysilane; acyloxysilanes such as dimethylvinylacetoxysilane, diethylvinylacetoxysilane, divinylmethylacetoxysilane, and trivinylacetoxysilane; halosilanes such as trimethylchlorosilane, dimethylvinylchlorosilane, diethylvinylchlorosilane, divinylmethylchlorosilane, and trivinylchlorosilane; and hydroxysilanes such as dimethylvinylhydroxysilane, diethylvinylhydroxysilane, divinylmethylhydroxysilane, and trivinylhydroxysilane. Although two or more of these silane compounds may be used in combination, at least alkenyldialkylsilane compounds such as divinylmethylmethoxysilane, divinylmethylacetoxysilane, divinylmethylchlorosilane, and divinylmethylhydroxysilane are used. need something

화학식(III-1):Formula (III-1):

R2R3R4SiOSiR2R3R4 R 2 R 3 R 4 SiOSiR 2 R 3 R 4

로 나타내는 디실록산은 오르가노폴리실록산에, 식: R2R3R4SiO1/2로 나타내는 실록산 단위를 도입하기 위한 원료이다. 식 중, R2는 탄소수 1∼12의 알킬기이고, 상기와 동일한 기가 예시되며, 바람직하게는 메틸기이다. 식 중, R3은 페닐기이다. 또한, 식 중, R4는 탄소수 2∼12의 알케닐기이고, 상기와 동일한 기가 예시되며, 바람직하게는 비닐기이다.The disiloxane represented by is a raw material for introducing a siloxane unit represented by the formula: R 2 R 3 R 4 SiO 1/2 into organopolysiloxane. In the formula, R 2 is an alkyl group having 1 to 12 carbon atoms, and the same groups as described above are exemplified, preferably a methyl group. In the formula, R 3 is a phenyl group. In addition, in formula, R <4> is an alkenyl group of 2-12 carbon atoms, the group same as the above is illustrated, Preferably it is a vinyl group.

이러한 디실록산으로는, 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산을 들 수 있다.Examples of such disiloxane include 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane.

화학식(III-2):Formula (III-2):

R2R3R4SiXR 2 R 3 R 4 SiX

로 나타내는 실란 화합물도, 오르가노폴리실록산에, 식: R2R3R4SiO1/2로 나타내는 실록산 단위를 도입하기 위한 원료이다. 식 중, R2는 탄소수 1∼12의 알킬기이고, 상기와 동일한 기가 예시되며, 바람직하게는 메틸기이다. 식 중, R3은 페닐기이다. 식 중, R4는 탄소수 2∼12의 알케닐기이고, 상기와 동일한 기가 예시되며, 바람직하게는 비닐기이다. 또한, 식 중, X는 알콕시기, 아실옥시기, 할로겐 원자, 또는 수산기이며, 상기와 동일한 기가 예시된다.The silane compound represented by is also a raw material for introducing a siloxane unit represented by the formula: R 2 R 3 R 4 SiO 1/2 into organopolysiloxane. In the formula, R 2 is an alkyl group having 1 to 12 carbon atoms, and the same groups as described above are exemplified, preferably a methyl group. In the formula, R 3 is a phenyl group. In the formula, R 4 is an alkenyl group having 2 to 12 carbon atoms, and the same groups as described above are exemplified, preferably a vinyl group. In addition, in formula, X is an alkoxy group, an acyloxy group, a halogen atom, or a hydroxyl group, and the group similar to the above is illustrated.

이러한 실란 화합물로는, 메틸페닐비닐메톡시실란, 메틸페닐비닐에톡시실란 등의 알콕시실란; 메틸페닐비닐아세톡시실란 등의 아세톡시실란; 메틸페닐비닐클로로실란 등의 클로로실란; 메틸페닐비닐히드록시실란 등의 히드록시실란이 예시된다.Examples of such silane compounds include alkoxysilanes such as methylphenylvinylmethoxysilane and methylphenylvinylethoxysilane; acetoxysilanes such as methylphenylvinylacetoxysilane; chlorosilanes such as methylphenylvinylchlorosilane; Hydroxysilanes such as methylphenylvinylhydroxysilane are exemplified.

상기 조제 방법에서는 필요에 따라, 오르가노폴리실록산에, 식: R5 2SiO2/2로 나타내는 실록산 단위를 도입하기 위한 실란 화합물 혹은 고리형 실리콘 화합물, 또는, 식: SiO4/2로 나타내는 실록산 단위를 도입하기 위한 실란 화합물 혹은 실란 올리고머를 반응시킬 수 있다. 식 중, R5는 동일하거나 또는 상이한 탄소수 1∼12의 알킬기, 탄소수 2∼12의 알케닐기, 혹은 페닐기이다. R5의 알킬기로는, 상기 R1과 동일한 알킬기가 예시된다. R5의 알케닐기로는, 상기 R1과 동일한 알케닐기가 예시된다.In the preparation method described above, as needed, a silane compound or cyclic silicone compound for introducing a siloxane unit represented by the formula: R 5 2 SiO 2/2 into the organopolysiloxane, or a siloxane unit represented by the formula: SiO 4/2 A silane compound or silane oligomer for introducing may be reacted. In formula, R <5> is the same or different C1-C12 alkyl group, C2-C12 alkenyl group, or a phenyl group. Examples of the alkyl group for R 5 include the same alkyl groups as those for R 1 above. As the alkenyl group for R 5 , the same alkenyl groups as those for R 1 are exemplified.

이러한 실란 화합물로는, 디메틸디메톡시실란, 메틸에틸디메톡시실란, 메틸페닐디메톡시실란, 디페닐디메톡시실란, 테트라메톡시실란, 디메틸디에톡시실란, 메틸에틸디에톡시실란, 메틸페닐디에톡시실란, 디페닐디에톡시실란, 테트라메톡시실란, 테트라에톡시실란 등의 알콕시실란; 디메틸디아세톡시실란, 메틸페닐디아세톡시실란, 디페닐디아세톡시실란, 테트라아세톡시실란 등의 아세톡시실란; 디메틸디클로로실란, 메틸페닐디클로로실란, 디페닐디클로로실란, 테트라클로로실란 등의 할로실란; 디메틸디히드록시실란, 메틸페닐디히드록시실란, 디페닐디히드록시실란 등의 히드록시실란이 예시된다. 또한, 이러한 고리형 실리콘 화합물로는, 고리형 디메틸실록산 올리고머, 고리형 페닐메틸실록산 올리고머, 고리형 디페닐실록산 올리고머가 예시된다. 나아가, 실란 올리고머로는, 테트라메톡시실란의 부분 가수 분해물, 테트라에톡시실란의 부분 가수 분해물이 예시된다.Examples of such silane compounds include dimethyldimethoxysilane, methylethyldimethoxysilane, methylphenyldimethoxysilane, diphenyldimethoxysilane, tetramethoxysilane, dimethyldiethoxysilane, methylethyldiethoxysilane, methylphenyldiethoxysilane, and dimethoxysilane. Alkoxysilanes, such as phenyl diethoxysilane, tetramethoxysilane, and tetraethoxysilane; acetoxysilanes such as dimethyldiacetoxysilane, methylphenyldiacetoxysilane, diphenyldiacetoxysilane, and tetraacetoxysilane; halosilanes such as dimethyldichlorosilane, methylphenyldichlorosilane, diphenyldichlorosilane, and tetrachlorosilane; Hydroxysilanes, such as dimethyldihydroxysilane, methylphenyldihydroxysilane, and diphenyldihydroxysilane, are illustrated. Moreover, as such a cyclic silicone compound, a cyclic dimethylsiloxane oligomer, a cyclic phenylmethylsiloxane oligomer, and a cyclic diphenylsiloxane oligomer are illustrated. Furthermore, as a silane oligomer, the partial hydrolyzate of tetramethoxysilane and the partial hydrolyzate of tetraethoxysilane are illustrated.

상기 조제 방법에서는 실란 화합물(I), 디실록산(II-1) 및/또는 실란 화합물(II-2), 및 디실록산(III-1) 및/또는 실란 화합물(III-2), 나아가 필요에 따라, 그 밖의 실란 화합물, 고리형 실리콘 화합물, 혹은 실란 올리고머를 산 혹은 알칼리의 존재하, 가수 분해·축합 반응시키는 것을 특징으로 한다.In the above preparation method, silane compound (I), disiloxane (II-1) and/or silane compound (II-2), and disiloxane (III-1) and/or silane compound (III-2), furthermore, if necessary Accordingly, it is characterized by subjecting other silane compounds, cyclic silicone compounds, or silane oligomers to hydrolysis/condensation reactions in the presence of acids or alkalis.

사용할 수 있는 산으로는, 염산, 초산, 포름산, 질산, 옥살산, 황산, 인산, 폴리인산, 다가 카르복실산, 트리플루오로메탄술폰산, 이온 교환 수지가 예시된다. 또한, 사용할 수 있는 알칼리로는, 수산화 칼륨, 수산화 나트륨 등의 무기 알칼리; 트리에틸아민, 디에틸아민, 모노에탄올아민, 디에탄올아민, 트리에탄올아민, 암모니아수, 테트라메틸암모늄하이드로옥사이드, 아미노기를 갖는 알콕시실란, 아미노프로필트리메톡시실란 등의 유기 염기 화합물이 예시된다.Examples of acids that can be used include hydrochloric acid, acetic acid, formic acid, nitric acid, oxalic acid, sulfuric acid, phosphoric acid, polyphosphoric acid, polycarboxylic acids, trifluoromethanesulfonic acid, and ion exchange resins. Examples of alkalis that can be used include inorganic alkalis such as potassium hydroxide and sodium hydroxide; organic base compounds such as triethylamine, diethylamine, monoethanolamine, diethanolamine, triethanolamine, aqueous ammonia, tetramethylammonium hydroxide, alkoxysilane having an amino group, and aminopropyltrimethoxysilane.

또한, 상기 조제 방법에 있어서, 유기 용제를 사용할 수 있다. 사용할 수 있는 유기 용제로는, 에테르류, 케톤류, 아세테이트류, 방향족 혹은 지방족 탄화 수소, γ-부티로락톤, 및 이들의 2종 이상의 혼합물이 예시된다. 바람직한 유기 용제로는, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르, 프로필렌글리콜모노프로필에테르, 프로필렌글리콜모노부틸에테르, 프로필렌글리콜모노-t-부틸에테르, γ-부티로락톤, 톨루엔, 자일렌이 예시된다.In addition, in the above preparation method, an organic solvent can be used. Examples of organic solvents that can be used include ethers, ketones, acetates, aromatic or aliphatic hydrocarbons, γ-butyrolactone, and mixtures of two or more thereof. Preferred organic solvents include propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, propylene glycol mono-t-butyl ether, and γ-butyro Lactone, toluene, and xylene are exemplified.

상기 조제 방법에서는 상기 각 성분의 가수 분해·축합 반응을 촉진하기 위해, 물, 혹은 물과 알코올의 혼합액을 첨가하는 것이 바람직하다. 이 알코올로는, 메탄올, 에탄올이 바람직하다. 이 반응은 가열에 의해 촉진되며, 유기 용매를 사용하는 경우에는, 그 환류 온도에서 반응을 행하는 것이 바람직하다.In the above preparation method, it is preferable to add water or a mixture of water and alcohol in order to promote the hydrolysis/condensation reaction of each of the above components. As this alcohol, methanol and ethanol are preferable. This reaction is accelerated by heating, and when using an organic solvent, it is preferable to carry out the reaction at the reflux temperature.

이러한 본 발명의 오르가노폴리실록산은 히드로실릴화 반응성이 양호하므로, 이를 주제(main agent)로 하여, 1분자 중에 적어도 2개의 규소 원자 결합 수소 원자를 갖는 오르가노폴리실록산, 및 히드로실릴화 반응용 촉매를 첨가함으로써 히드로실릴화 반응 경화성 실리콘 조성물을 조제할 수 있다.Since the organopolysiloxane of the present invention has good hydrosilylation reactivity, an organopolysiloxane having at least two silicon atom-bonded hydrogen atoms in one molecule and a catalyst for hydrosilylation reaction using this as a main agent By adding it, a hydrosilylation reaction curable silicone composition can be prepared.

본 발명의 경화성 실리콘 조성물은 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산을 포함하고, 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 조성물 중에서의 함유율이 0.0 질량%보다 크며, 3.0 질량% 미만인 것을 제2 특징으로 한다. 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산은 알킬페닐비닐실록산 단위를 함유하는 분기쇄형 또는 수지형의 오르가노폴리실록산의 합성시에 당해 오르가노폴리실록산 내에 잔존하는 성분이지만, 이 함유량이 상기 범위에 있도록 제어된 경화성 실리콘 조성물을 사용함으로써, 내열 충격성이 개선된다. 특히, 내열 충격성 개선의 견지로부터, 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 조성물 중에서의 함유율이 0.05 질량%∼2.50 질량%의 범위가 보다 바람직하다. 당해 함유량이 상기 하한 미만이거나, 당해 함유량이 상기 상한을 초과하면, 본 명세서의 비교예에 나타내는 바와 같이, 내열 충격성이 저하된다. 또한, 당해 함유량이 상기 상한을 초과하면, 경화성의 악화나 표면 택 등의 원인이 되는 경우가 있다. 즉, 당해 함유량은 본 발명의 범위에 있을 필요가 있으며, 공지된 알킬페닐비닐실록산 단위를 함유하는 분기쇄형 또는 수지형의 오르가노폴리실록산을 함유하는 경화성 실리콘 조성물에 있어서는, 이러한 조건을 충족하는 것은 알려져 있지 않다. 한편, 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산을 완전 제거(0 질량%)하면, 본 명세서의 비교예에 나타내는 바와 같이 내열 충격성이 저하되기 때문에, 본 발명의 기술적 효과라는 점에서, 일정한 함유량을 유지하는 것이 필요하다.The curable silicone composition of the present invention includes 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane, and 1,3-divinyl-1,3-diphenyl-1,3- The second characteristic is that the content of dimethyldisiloxane in the composition is greater than 0.0% by mass and less than 3.0% by mass. 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane is a compound that remains in organopolysiloxane during the synthesis of branched or resinous organopolysiloxanes containing alkylphenylvinylsiloxane units. Although it is a component, thermal shock resistance is improved by using the curable silicone composition whose content is controlled so as to be within the above range. In particular, from the standpoint of improving thermal shock resistance, the content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane in the composition is more preferably in the range of 0.05% by mass to 2.50% by mass. When the said content is less than the said lower limit or the said content exceeds the said upper limit, as shown in the comparative example of this specification, thermal shock resistance will fall. Moreover, when the said content exceeds the said upper limit, it may cause deterioration of hardenability, surface tack, etc. That is, the content needs to be within the range of the present invention, and it is known that curable silicone compositions containing branched or resinous organopolysiloxanes containing known alkylphenylvinylsiloxane units satisfy these conditions. There is not. On the other hand, when 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane is completely removed (0% by mass), thermal shock resistance decreases as shown in the comparative example of this specification. In view of the technical effect of the invention, it is necessary to maintain a constant content.

바람직하게는, 본 발명의 경화성 실리콘 조성물은 상기 (A) 성분∼(D) 성분을 함유하고, 임의로 (E) 성분을 포함하는 것이 바람직하다. 여기서, (A) 성분의 오르가노폴리실록산은 상기한 바와 같다. 또한, 내열 충격성 개선의 견지에서, 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 조성물 중에서의 함유율이 0.05 질량%∼2.50 질량%의 범위인 것이 특히 바람직하다.Preferably, the curable silicone composition of the present invention contains the above components (A) to (D), and optionally contains (E) component. Here, the organopolysiloxane of component (A) is as described above. Further, from the standpoint of improving thermal shock resistance, it is particularly preferred that the content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane in the composition is in the range of 0.05% by mass to 2.50% by mass. .

(B) 성분은 경화물에 유연성, 신장성, 가요성을 부여하기 위한 임의의 성분이며, 1분자 중에 적어도 2개의 알케닐기를 갖고, 규소 원자 결합 수소 원자를 갖지 않는 직쇄형의 오르가노폴리실록산이다. (B) 성분 중의 알케닐기로는, 비닐기, 알릴기, 부테닐기, 펜테닐기, 헥세닐기, 헵테닐기, 옥테닐기, 노네닐기, 데세닐기, 운데세닐기, 도데세닐기 등의 탄소수 2∼12의 알케닐기가 예시되며, 바람직하게는 비닐기이다. (B) 성분 중의 알케닐기 이외의 규소 원자에 결합하는 기로는, 메틸기, 에틸기, 프로필기, 부틸기, 펜틸기, 헥실기, 헵틸기, 옥틸기, 노닐기, 데실기, 운데실기, 도데실기 등의 탄소수 1∼12의 알킬기; 페닐기, 트릴기, 자일릴기, 나프틸기, 안트라세닐기, 페난트릴기, 피레닐기, 및 이들의 아릴기의 수소 원자를 메틸기, 에틸기 등의 알킬기; 메톡시기, 에톡시기 등의 알콕시기; 염소 원자, 브롬 원자 등의 할로겐 원자로 치환한 기 등의 탄소수 6∼20의 아릴기; 벤질기, 페네틸기, 나프틸에틸기, 나프틸프로필기, 안트라세닐에틸기, 페난트릴에틸기, 피레닐에틸기, 및 이들의 아랄킬기의 수소 원자를 메틸기, 에틸기 등의 알킬기; 메톡시기, 에톡시기 등의 알콕시기; 염소 원자, 브롬 원자 등의 할로겐 원자로 치환한 기 등의 탄소수 7∼20의 아랄킬기; 또는 클로로메틸기, 3,3,3-트리플루오로프로필기 등의 탄소수 1∼12의 할로겐화 알킬기가 예시되고, 각각 상기와 동일한 기가 예시되며, 바람직하게는 메틸기, 페닐기이다.Component (B) is an optional component for imparting flexibility, extensibility, and flexibility to the cured product, and is a straight-chain organopolysiloxane having at least two alkenyl groups in one molecule and having no silicon atom-bonded hydrogen atoms. . Examples of the alkenyl group in component (B) include a vinyl group, an allyl group, a butenyl group, a pentenyl group, a hexenyl group, a heptenyl group, an octenyl group, a nonenyl group, a decenyl group, an undecenyl group, and a dodecenyl group having 2 carbon atoms. -12 alkenyl groups are exemplified, and vinyl groups are preferred. Examples of groups bonded to silicon atoms other than alkenyl groups in component (B) include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl and dodecyl groups. C1-C12 alkyl groups, such as; A phenyl group, a tolyl group, a xylyl group, a naphthyl group, anthracenyl group, a phenanthryl group, a pyrenyl group, and the hydrogen atom of these aryl groups can be converted to an alkyl group such as a methyl group or an ethyl group; Alkoxy groups, such as a methoxy group and an ethoxy group; aryl groups having 6 to 20 carbon atoms, such as groups substituted with halogen atoms such as chlorine atoms and bromine atoms; A benzyl group, a phenethyl group, a naphthylethyl group, a naphthylpropyl group, anthracenylethyl group, a phenanthrylethyl group, a pyrenylethyl group, and the hydrogen atom of these aralkyl groups are selected from an alkyl group such as a methyl group and an ethyl group; Alkoxy groups, such as a methoxy group and an ethoxy group; aralkyl groups having 7 to 20 carbon atoms, such as groups substituted with halogen atoms such as chlorine atoms and bromine atoms; or a halogenated alkyl group having 1 to 12 carbon atoms, such as a chloromethyl group and a 3,3,3-trifluoropropyl group, and the same groups as described above, respectively. Preferred examples are a methyl group and a phenyl group.

이러한 (B) 성분으로는, 분자쇄 양말단 트리메틸실록시기 봉쇄 디메틸실록산·메틸비닐실록산 공중합체, 분자쇄 양말단 트리메틸실록시기 봉쇄 메틸비닐폴리실록산, 분자쇄 양말단 트리메틸실록시기 봉쇄 디메틸실록산·메틸비닐실록산·메틸페닐실록산 공중합체, 분자쇄 양말단 디메틸비닐실록시기 봉쇄 디메틸폴리실록산, 분자쇄 양말단 디메틸비닐실록시기 봉쇄 메틸비닐폴리실록산, 분자쇄 양말단 디메틸비닐실록시기 봉쇄 디메틸실록산·메틸비닐실록산 공중합체, 분자쇄 양말단 디메틸비닐실록시기 봉쇄 디메틸실록산·메틸비닐실록산·메틸페닐실록산 공중합체, 및 이들의 오르가노폴리실록산의 2종 이상의 혼합물이 예시된다.Examples of the component (B) include a dimethylsiloxane/methylvinylsiloxane copolymer capped with trimethylsiloxy groups at both molecular ends, a methylvinylpolysiloxane capped with trimethylsiloxy groups at both molecular ends, and a dimethylsiloxane/methylvinyl capped with trimethylsiloxy groups at both molecular ends. Siloxane/methylphenylsiloxane copolymer, dimethylpolysiloxane with dimethylvinylsiloxy groups blocked at both ends of the molecular chain, dimethylvinylpolysiloxane with dimethylvinylsiloxy groups blocked at both molecular ends, dimethylvinylsiloxane copolymer with dimethylvinylsiloxy groups blocked at both molecular ends, Dimethylsiloxane/methylvinylsiloxane/methylphenylsiloxane copolymers capped with dimethylvinylsiloxy groups at both ends of the molecular chain, and mixtures of two or more of these organopolysiloxanes are exemplified.

본 조성물에 있어서, (B) 성분의 함유량은 본 조성물에 대해, 0∼70 질량%의 범위 내이고, 바람직하게는 0∼50 질량%의 범위 내이며, 특히 바람직하게는 0∼40 질량%의 범위 내이다. 이는 (B) 성분의 함유량이 상기 범위의 상한 이하이면, 경화물의 가스 투과성을 높이지 않으며, 경화물에 유연성, 신장성, 가요성을 부여할 수 있고, 나아가서는 본 조성물을 사용하여 제작한 광반도체 장치의 신뢰성을 향상할 수 있기 때문이다.In the present composition, the content of component (B) is within the range of 0 to 70% by mass, preferably within the range of 0 to 50% by mass, particularly preferably 0 to 40% by mass, relative to the present composition. is within range This means that when the content of component (B) is below the upper limit of the above range, the cured product does not increase gas permeability, flexibility, extensibility, and flexibility can be imparted to the cured product, and furthermore, light produced using the present composition can be obtained. This is because the reliability of the semiconductor device can be improved.

(C) 성분은 본 조성물의 가교제이며, 1분자 중에 적어도 2개의 규소 원자 결합 수소 원자를 갖는 오르가노폴리실록산이다. (C) 성분 중의 규소 원자 결합 수소 원자의 결합 위치로는, 분자쇄 말단 및/또는 분자쇄 측쇄가 예시된다. (C) 성분 중의 규소 원자에 결합하는 그 밖의 기로는, 메틸기, 에틸기, 프로필기, 부틸기, 펜틸기, 헥실기, 헵틸기, 옥틸기, 노닐기, 데실기, 운데실기, 도데실기 등의 탄소수 1∼12의 알킬기; 페닐기, 트릴기, 자일릴기, 나프틸기, 안트라세닐기, 페난트릴기, 피레닐기, 및 이들의 아릴기의 수소 원자를 메틸기, 에틸기 등의 알킬기; 메톡시기, 에톡시기 등의 알콕시기; 염소 원자, 브롬 원자 등의 할로겐 원자로 치환한 기 등의 탄소수 6∼20의 아릴기; 벤질기, 페네틸기, 나프틸에틸기, 나프틸프로필기, 안트라세닐에틸기, 페난트릴에틸기, 피레닐에틸기, 및 이들의 아랄킬기의 수소 원자를 메틸기, 에틸기 등의 알킬기; 메톡시기, 에톡시기 등의 알콕시기; 염소 원자, 브롬 원자 등의 할로겐 원자로 치환한 기 등의 탄소수 7∼20의 아랄킬기; 또는 클로로메틸기, 3,3,3-트리플루오로프로필기 등의 탄소수 1∼12의 할로겐화 알킬기가 예시되고, 각각 상기와 동일한 기가 예시되며, 바람직하게는 메틸기, 페닐기이다. 이러한 (C) 성분의 분자 구조로는, 직쇄형, 분기형, 고리형, 망형, 일부 분기를 갖는 직쇄형이 예시된다.Component (C) is a crosslinking agent of the present composition and is an organopolysiloxane having at least two silicon atom-bonded hydrogen atoms in one molecule. (C) As a bonding position of the silicon atom-bonded hydrogen atom in component, molecular chain terminals and/or molecular chain side chains are illustrated. (C) Other groups bonded to silicon atoms in component include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl, dodecyl, etc. Alkyl group of 1 to 12 carbon atoms; A phenyl group, a tolyl group, a xylyl group, a naphthyl group, anthracenyl group, a phenanthryl group, a pyrenyl group, and the hydrogen atom of these aryl groups can be converted to an alkyl group such as a methyl group or an ethyl group; Alkoxy groups, such as a methoxy group and an ethoxy group; aryl groups having 6 to 20 carbon atoms, such as groups substituted with halogen atoms such as chlorine atoms and bromine atoms; A benzyl group, a phenethyl group, a naphthylethyl group, a naphthylpropyl group, anthracenylethyl group, a phenanthrylethyl group, a pyrenylethyl group, and the hydrogen atom of these aralkyl groups are selected from an alkyl group such as a methyl group and an ethyl group; Alkoxy groups, such as a methoxy group and an ethoxy group; aralkyl groups having 7 to 20 carbon atoms, such as groups substituted with halogen atoms such as chlorine atoms and bromine atoms; or a halogenated alkyl group having 1 to 12 carbon atoms, such as a chloromethyl group and a 3,3,3-trifluoropropyl group, and the same groups as described above, respectively. Preferred examples are a methyl group and a phenyl group. Examples of the molecular structure of component (C) include linear, branched, cyclic, network, and partially branched linear structures.

이러한 (C) 성분으로는, 분자쇄 양말단 트리메틸실록시기 봉쇄 메틸하이드로겐폴리실록산, 분자쇄 양말단 트리메틸실록시기 봉쇄 디메틸실록산·메틸하이드로겐실록산 공중합체, 분자쇄 양말단 트리메틸실록시기 봉쇄 디메틸실록산·메틸하이드로겐실록산·메틸페닐실록산 공중합체, 분자쇄 양말단 디메틸하이드로겐실록시기 봉쇄 디메틸폴리실록산, 분자쇄 양말단 디메틸하이드로겐실록시기 봉쇄 디메틸실록산·메틸페닐실록산 공중합체, 분자쇄 양말단 디메틸하이드로겐실록시기 봉쇄 메틸페닐폴리실록산, 화학식: R'3SiO1/2로 나타내는 실록산 단위와 화학식: R'2HSiO1/2로 나타내는 실록산 단위와 식: SiO4/2로 나타내는 실록산 단위로 이루어지는 오르가노폴리실록산 공중합체, 화학식: R'2HSiO1/2로 나타내는 실록산 단위와 식: SiO4/2로 나타내는 실록산 단위로 이루어지는 오르가노폴리실록산 공중합체, 화학식: R'HSiO2/2로 나타내는 실록산 단위와 화학식: R'SiO3/2로 나타내는 실록산 단위 또는 식: HSiO3/2로 나타내는 실록산 단위로 이루어지는 오르가노폴리실록산 공중합체, 및 이들의 오르가노폴리실록산의 2종 이상의 혼합물이 예시된다. 여기서, 식 중의 R'는 탄소수 1∼12의 알킬기, 탄소수 6∼20의 아릴기, 탄소수 7∼20의 아랄킬기, 또는 탄소수 1∼12의 할로겐화 알킬기이며, 각각 상기와 동일한 기가 예시된다.As such component (C), methylhydrogenpolysiloxane capped with trimethylsiloxy groups at both molecular ends, dimethylsiloxane-methylhydrogensiloxane copolymer capped with trimethylsiloxy groups at both molecular ends, and dimethylsiloxane capped with trimethylsiloxy groups at both molecular ends. Methylhydrogensiloxane/methylphenylsiloxane copolymer, blocking dimethylhydrogensiloxy groups at both molecular ends Dimethylpolysiloxane, blocking dimethylhydrogensiloxy groups at both molecular ends Dimethylsiloxane/methylphenylsiloxane copolymer, dimethylhydrogensiloxy groups at both molecular ends Blocked methylphenylpolysiloxane, an organopolysiloxane copolymer composed of a siloxane unit represented by the formula: R' 3 SiO 1/2 and a siloxane unit represented by the formula: R' 2 HSiO 1/2 and a siloxane unit represented by the formula: SiO 4/2 ; An organopolysiloxane copolymer composed of a siloxane unit represented by formula: R' 2 HSiO 1/2 and a siloxane unit represented by formula: SiO 4/2 , a siloxane unit represented by formula: R'HSiO 2/2 and formula: R'SiO An organopolysiloxane copolymer composed of a siloxane unit represented by 3/2 or a siloxane unit represented by the formula: HSiO 3/2 , and a mixture of two or more of these organopolysiloxanes are exemplified. Here, R' in the formula is an alkyl group of 1 to 12 carbon atoms, an aryl group of 6 to 20 carbon atoms, an aralkyl group of 7 to 20 carbon atoms, or a halogenated alkyl group of 1 to 12 carbon atoms, and groups similar to those described above are exemplified.

본 조성물에 있어서, (C) 성분의 함유량은 (A) 성분 중 및 (B) 성분 중의 알케닐기의 합계 1 몰에 대해, 본 성분 중의 규소 원자 결합 수소 원자가 0.1∼5 몰의 범위 내가 되는 양이며, 바람직하게는 0.5∼2 몰의 범위 내가 되는 양이다. 이는 (C) 성분의 함유량이 상기 범위의 하한 이상이면, 조성물이 충분히 경화하기 때문이며, 한편, 상기 범위의 상한 이하이면, 경화물의 내열성이 향상되고, 나아가서는 본 조성물을 사용하여 제작한 광반도체 장치의 신뢰성이 향상되기 때문이다.In the present composition, the content of component (C) is an amount within the range of 0.1 to 5 moles of silicon-bonded hydrogen atoms in the present component relative to the total of 1 mole of alkenyl groups in component (A) and component (B). , It is an amount that is preferably within the range of 0.5 to 2 moles. This is because the composition is sufficiently cured when the content of the component (C) is equal to or greater than the lower limit of the above range, while when the content of the component is equal to or less than the upper limit of the above range, the heat resistance of the cured product is improved, and consequently, an optical semiconductor device produced using the present composition. This is because the reliability of

또한, (D) 성분은 본 조성물의 경화를 촉진하기 위한 히드로실릴화 반응용 촉매이며, 백금계 촉매, 로듐계 촉매, 팔라듐계 촉매가 예시된다. 특히, 본 조성물의 경화를 현저하게 촉진할 수 있다는 점에서, (D) 성분은 백금계 촉매인 것이 바람직하다. 이 백금계 촉매로는, 백금 미세 분말, 염화 백금산, 염화 백금산의 알코올 용액, 백금-알케닐실록산 착체, 백금-올레핀 착체, 백금 카르보닐 착체가 예시되며, 바람직하게는 백금-알케닐실록산 착체이다. 특히, 이 백금-알케닐실록산 착체의 안정성이 양호하다는 점에서, 1,3-디비닐-1,1,3,3-테트라메틸디실록산인 것이 바람직하다. 여기서, 히드로실릴화 반응을 촉진하는 촉매로는, 철, 루테늄, 철/코발트 등의 비백금계 금속 촉매를 사용해도 된다.In addition, component (D) is a catalyst for hydrosilylation reaction for accelerating curing of the present composition, and a platinum-based catalyst, a rhodium-based catalyst, and a palladium-based catalyst are exemplified. In particular, it is preferable that the component (D) is a platinum-based catalyst in terms of remarkably accelerating the curing of the present composition. Examples of the platinum-based catalyst include platinum fine powder, chloroplatinic acid, alcohol solutions of chloroplatinic acid, platinum-alkenylsiloxane complexes, platinum-olefin complexes, and platinum carbonyl complexes, preferably platinum-alkenylsiloxane complexes. . Particularly, 1,3-divinyl-1,1,3,3-tetramethyldisiloxane is preferable in view of the good stability of the platinum-alkenylsiloxane complex. Here, as a catalyst for accelerating the hydrosilylation reaction, a non-platinum metal catalyst such as iron, ruthenium, or iron/cobalt may be used.

또한, 본 조성물에 있어서, (D) 성분의 함유량은 본 조성물의 경화를 촉진하기 위해 유효한 양이다. 구체적으로는, (D) 성분의 함유량은 본 조성물의 경화 반응을 충분히 촉진할 수 있다는 점에서, 본 조성물에 대해 질량 단위로, (D) 성분 중의 촉매 금속이 0.01∼500 ppm의 범위 내가 되는 양인 것이 바람직하고, 나아가서는, 0.01∼100 ppm의 범위 내가 되는 양인 것이 바람직하며, 특히 0.01∼50 ppm의 범위 내가 되는 양인 것이 바람직하다.In addition, in the present composition, the content of component (D) is an effective amount to promote curing of the present composition. Specifically, the content of the component (D) is an amount in which the catalytic metal in the component (D) is in the range of 0.01 to 500 ppm, in terms of mass, relative to the present composition, from the point that the curing reaction of the present composition can be sufficiently accelerated. It is preferable, and furthermore, it is preferable that it is an amount within the range of 0.01 to 100 ppm, and it is particularly preferable that it is an amount within the range of 0.01 to 50 ppm.

본 조성물에는 경화 도중에 접촉하고 있는 기재에 대한 경화물의 접착성을 향상시키기 위해, (E) 접착 부여제를 함유해도 된다. 이 (E) 성분으로는, 규소 원자에 결합한 알콕시기를 1분자 중에 적어도 1개 갖는 유기 규소 화합물이 바람직하다. 이 알콕시기로는, 메톡시기, 에톡시기, 프로폭시기, 부톡시기, 메톡시에톡시기가 예시되고, 특히 메톡시기가 바람직하다. 또한, 이 유기 규소 화합물의 규소 원자에 결합하는 알콕시기 이외의 기로는, 알킬기, 알케닐기, 아릴기, 아랄킬기, 할로겐화 알킬기 등의 치환 혹은 비치환의 1가 탄화 수소기; 3-글리시독시프로필기, 4-글리시독시부틸기 등의 글리시독시알킬기; 2-(3,4-에폭시시클로헥실)에틸기, 3-(3,4-에폭시시클로헥실)프로필기 등의 에폭시시클로헥실알킬기; 4-옥시라닐부틸기, 8-옥시라닐옥틸기 등의 옥시라닐알킬기 등의 에폭시기 함유 1가 유기기; 3-메타크릴옥시프로필기 등의 아크릴기 함유 1가 유기기; 수소 원자가 예시된다. 이 유기 규소 화합물은 규소 원자 결합 알케닐기 또는 규소 원자 결합 수소 원자를 갖는 것이 바람직하다. 또한, 각종 기재에 대해 양호한 접착성을 부여할 수 있다는 점에서, 이 유기 규소 화합물은 1분자 중에 적어도 1개의 에폭시기 함유 1가 유기기를 갖는 것이 바람직하다. 이러한 유기 규소 화합물로는, 오르가노실란 화합물, 오르가노실록산 올리고머, 알킬실리케이트가 예시된다. 이 오르가노실록산 올리고머 혹은 알킬실리케이트의 분자 구조로는, 직쇄형, 일부 분기를 갖는 직쇄형, 분기쇄형, 고리형, 망형이 예시되며, 특히 직쇄형, 분기쇄형, 망형인 것이 바람직하다. 이러한 유기 규소 화합물로는, 3-글리시독시프로필트리메톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리메톡시실란, 3-메타크릴옥시프로필트리메톡시실란 등의 실란 화합물; 1분자 중에 규소 원자 결합 알케닐기 혹은 규소 원자 결합 수소 원자, 및 규소 원자 결합 알콕시기를 각각 적어도 1개씩 갖는 실록산 화합물, 규소 원자 결합 알콕시기를 적어도 1개 갖는 실란 화합물 또는 실록산 화합물과 1분자 중에 규소 원자 결합 히드록시기와 규소 원자 결합 알케닐기를 각각 적어도 1개씩 갖는 실록산 화합물의 혼합물, 메틸폴리실리케이트, 에틸폴리실리케이트, 에폭시기 함유 에틸폴리실리케이트가 예시된다.The composition may contain (E) an adhesion imparting agent in order to improve the adhesion of the cured product to the substrate in contact during curing. As the component (E), an organosilicon compound having at least one alkoxy group bonded to a silicon atom in one molecule is preferable. As this alkoxy group, a methoxy group, an ethoxy group, a propoxy group, a butoxy group, and a methoxyethoxy group are illustrated, and a methoxy group is especially preferable. Examples of groups other than the alkoxy group bonded to the silicon atom of the organic silicon compound include substituted or unsubstituted monovalent hydrocarbon groups such as alkyl groups, alkenyl groups, aryl groups, aralkyl groups, and halogenated alkyl groups; glycidoxyalkyl groups such as 3-glycidoxypropyl group and 4-glycidoxybutyl group; epoxycyclohexylalkyl groups such as 2-(3,4-epoxycyclohexyl)ethyl group and 3-(3,4-epoxycyclohexyl)propyl group; epoxy group-containing monovalent organic groups such as oxiranylalkyl groups such as 4-oxiranylbutyl group and 8-oxiranyloctyl group; acrylic group-containing monovalent organic groups such as 3-methacryloxypropyl group; A hydrogen atom is exemplified. This organosilicon compound preferably has a silicon atom-bonded alkenyl group or a silicon-bonded hydrogen atom. In view of being able to impart good adhesion to various substrates, the organosilicon compound preferably has at least one epoxy group-containing monovalent organic group in one molecule. As such an organosilicon compound, an organosilane compound, an organosiloxane oligomer, and an alkyl silicate are illustrated. Examples of the molecular structure of the organosiloxane oligomer or alkyl silicate include linear, partially branched linear, branched, cyclic, and network structures, and particularly preferably linear, branched, and network structures. Examples of such organosilicon compounds include silane compounds such as 3-glycidoxypropyltrimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, and 3-methacryloxypropyltrimethoxysilane; A siloxane compound having at least one silicon atom-bonded alkenyl group or silicon-bonded hydrogen atom and at least one silicon-bonded alkoxy group in one molecule, a silane compound or siloxane compound having at least one silicon atom-bonded alkoxy group, and a silicon atom bond in one molecule A mixture of siloxane compounds having at least one hydroxyl group and at least one silicon atom-bonded alkenyl group, methyl polysilicate, ethyl polysilicate, and ethyl polysilicate containing an epoxy group are exemplified.

본 조성물에 있어서, (E) 성분의 함유량은 한정되지 않지만, 경화 도중에 접촉하고 있는 기재에 대해 양호하게 접착한다는 점에서, 상기 (A) 성분∼(D) 성분의 합계 100 질량부에 대해, 0.01∼10 질량부의 범위 내인 것이 바람직하다.In the present composition, the content of component (E) is not limited, but it is 0.01 parts by mass relative to the total of 100 parts by mass of components (A) to (D) in terms of good adhesion to the substrate in contact during curing. It is preferably within the range of to 10 parts by mass.

또한, 본 조성물에는 그 밖의 임의의 성분으로서, 2-메틸-3-부틴-2-올, 3,5-디메틸-1-헥신-3-올, 2-페닐-3-부틴-2-올 등의 알킨알코올; 3-메틸-3-펜텐-1-인, 3,5-디메틸-3-헥센-1-인 등의 엔인 화합물; 1,3,5,7-테트라메틸-1,3,5,7-테트라비닐시클로테트라실록산, 1,3,5,7-테트라메틸-1,3,5,7-테트라헥세닐시클로테트라실록산, 벤조트리아졸 등의 반응 억제제를 함유해도 된다. 본 조성물에 있어서, 이 반응 억제제의 함유량은 한정되지 않지만, 상기 (A) 성분∼(D) 성분의 합계 100 질량부에 대해, 0.0001∼5 질량부의 범위 내인 것이 바람직하다.In addition, as other optional components in the present composition, 2-methyl-3-butyn-2-ol, 3,5-dimethyl-1-hexyn-3-ol, 2-phenyl-3-butyn-2-ol, etc. of alkyne alcohol; enein compounds such as 3-methyl-3-penten-1-in and 3,5-dimethyl-3-hexene-1-in; 1,3,5,7-tetramethyl-1,3,5,7-tetravinylcyclotetrasiloxane, 1,3,5,7-tetramethyl-1,3,5,7-tetrahexenylcyclotetrasiloxane , reaction inhibitors such as benzotriazole may be contained. In this composition, although the content of this reaction inhibitor is not limited, It is preferable to fall within the range of 0.0001-5 mass parts with respect to 100 mass parts of the total of said component (A) - (D) component.

또한, 본 조성물에는 그 밖의 임의의 성분으로서, 형광재를 함유할 수 있다. 이 형광체로는, 예를 들면, 발광 다이오드(LED)에 널리 이용되고 있는 산화물계 형광체, 산질화물계 형광체, 질화물계 형광체, 황화물계 형광체, 산황화물계 형광체 등으로 이루어지는 황색, 적색, 녹색, 청색 발광 형광체를 들 수 있다. 산화물계 형광체로는, 세륨 이온을 포함하는 이트륨, 알루미늄, 가닛계의 YAG계 녹색∼황색 발광 형광체, 세륨 이온을 포함하는 테르븀, 알루미늄, 가닛계의 TAG계 황색 발광 형광체, 및, 세륨이나 유로퓸 이온을 포함하는 실리케이트계 녹색∼황색 발광 형광체가 예시된다. 산질화물 형광체로는, 유로퓸 이온을 포함하는 규소, 알루미늄, 산소, 질소계의 사이알론계 적색∼녹색 발광 형광체가 예시된다. 질화물계 형광체로는, 유로퓸 이온을 포함하는 칼슘, 스트론튬, 알루미늄, 규소, 질소계의 카즌계 적색 발광 형광체가 예시된다. 황화물계로는, 구리 이온이나 알루미늄 이온을 포함하는 ZnS계 녹색 발색 형광체가 예시된다. 산황화물계 형광체로는, 유로퓸 이온을 포함하는 Y2O2S계 적색 발광 형광체가 예시된다. 이들 형광재는 1종 혹은 2종 이상의 혼합물을 사용해도 된다. 본 조성물에 있어서, 이 형광재의 함유량은 특별히 한정되지 않지만, 본 조성물 중, 0.1∼70 질량%의 범위 내이며, 나아가서는 1∼20 질량%의 범위 내인 것이 바람직하다.In addition, the composition may contain a fluorescent material as other optional components. Examples of the phosphor include yellow, red, green, and blue, which are composed of oxide-based phosphors, oxynitride-based phosphors, nitride-based phosphors, sulfide-based phosphors, and oxysulfide-based phosphors, which are widely used in light emitting diodes (LEDs), for example. A light emitting phosphor is mentioned. Examples of the oxide phosphor include cerium ion-containing yttrium, aluminum, and garnet-based YAG-based green to yellow light-emitting phosphors, terbium, aluminum, and garnet-based TAG-based yellow light-emitting phosphors containing cerium ions, and cerium and europium ions. Silicate-based green to yellow light emitting phosphors containing are exemplified. As the oxynitride phosphor, silicon, aluminum, oxygen, and nitrogen-based sialon-based red to green light-emitting phosphors containing europium ions are exemplified. Examples of nitride-based phosphors include calcium, strontium, aluminum, silicon, and nitrogen-based Casun-based red light-emitting phosphors containing europium ions. As the sulfide-based phosphor, ZnS-based green phosphor containing copper ions or aluminum ions is exemplified. Examples of the oxysulfide-based phosphor include a Y 2 O 2 S-based red light-emitting phosphor containing europium ions. These fluorescent materials may use 1 type or a mixture of 2 or more types. In the present composition, the content of the fluorescent material is not particularly limited, but is preferably within the range of 0.1 to 70% by mass, more preferably 1 to 20% by mass, in the present composition.

또한, 본 조성물에는 본 발명의 목적을 저해하지 않는 한 그 밖의 임의의 성분으로서, 실리카, 유리, 알루미나, 산화 아연 등의 무기질 충전제; 폴리메타크릴레이트 수지 등의 유기 수지 미세 분말; 내열제, 염료, 안료, 난연성 부여제, 용제 등을 함유해도 된다.In addition, the present composition includes inorganic fillers such as silica, glass, alumina, and zinc oxide as other optional components as long as the object of the present invention is not impaired; organic resin fine powders such as polymethacrylate resin; A heat resistant agent, a dye, a pigment, a flame retardant imparting agent, a solvent, and the like may be contained.

본 조성물은 실온 혹은 가열에 의해 경화가 진행되지만, 신속히 경화시키기 위해서는 가열하는 것이 바람직하다. 이 가열 온도로는, 50∼200℃의 범위 내인 것이 바람직하다. 본 발명의 경화성 실리콘 조성물은 광반도체 장치의 봉지제 등에 바람직하고, 경화성 실리콘 조성물의 경화물에 의해 광반도체 소자를 봉지하여 이루어지는 광반도체 장치를 제공할 수 있다.Although this composition is cured at room temperature or by heating, it is preferable to heat it in order to cure it rapidly. As this heating temperature, it is preferable that it exists in the range of 50-200 degreeC. The curable silicone composition of the present invention is suitable for an optical semiconductor device encapsulant or the like, and can provide an optical semiconductor device formed by encapsulating an optical semiconductor element with a cured product of the curable silicone composition.

다음으로, 본 발명의 경화물에 대해 상세하게 설명한다.Next, the hardened|cured material of this invention is demonstrated in detail.

본 발명의 경화물은 상기 경화성 실리콘 조성물을 경화시켜 이루어지는 것을 특징으로 한다. 경화물의 형상은 특별히 한정되지 않으며, 예를 들면, 시트 형상, 필름 형상을 들 수 있다. 경화물은 이를 단체(single unit)로 취급할 수도 있지만, 광반도체 소자 등을 피복 혹은 봉지한 상태로 취급하는 것도 가능하다.The cured product of the present invention is characterized in that it is obtained by curing the curable silicone composition. The shape of the cured product is not particularly limited, and examples thereof include a sheet shape and a film shape. Although the cured product can be handled as a single unit, it is also possible to handle it in a state in which an optical semiconductor element or the like is covered or sealed.

다음으로, 본 발명의 광반도체 장치에 대해 상세하게 설명한다.Next, the optical semiconductor device of the present invention is explained in detail.

본 발명의 광반도체 장치는 상기 경화성 실리콘 조성물의 경화물에 의해 광반도체 소자를 봉지하여 이루어지는 것을 특징으로 한다. 이러한 본 발명의 광반도체 장치로는, 발광 다이오드(LED), 포토커플러, CCD가 예시된다. 또한, 광반도체 소자로는, 발광 다이오드(LED) 칩, 고체 촬영 소자가 예시된다. 단, 본 발명의 경화성 실리콘 조성물의 용도는 이들로 한정되지 않는다.The optical semiconductor device of the present invention is characterized in that an optical semiconductor element is sealed with a cured product of the curable silicone composition. As such an optical semiconductor device of this invention, a light emitting diode (LED), a photocoupler, and CCD are illustrated. Moreover, as an optical semiconductor element, a light emitting diode (LED) chip and a solid-state imaging element are illustrated. However, the use of the curable silicone composition of the present invention is not limited to these.

본 발명의 광반도체 장치의 일례인 단체의 표면 실장형 LED의 단면도를 도 1에 나타내었다. 도 1에서 나타내는 LED는 LED 칩(1)이 리드 프레임(2) 상에 다이 본드되고, 이 LED 칩(1)과 리드 프레임(3)이 본딩 와이어(4)에 의해 와이어 본딩되어 있다. 이 LED 칩(1)의 주위에는 프레임재(5)가 형성되어 있으며, 이 프레임재(5) 내측의 LED 칩(1)이 본 발명의 경화성 실리콘 조성물의 경화물(6)에 의해 봉지되어 있다.Fig. 1 shows a cross-sectional view of a single surface-mounted LED as an example of the optical semiconductor device of the present invention. In the LED shown in FIG. 1, the LED chip 1 is die-bonded on the lead frame 2, and the LED chip 1 and the lead frame 3 are wire-bonded by the bonding wire 4. A frame material 5 is formed around the LED chip 1, and the LED chip 1 inside the frame material 5 is sealed with a cured product 6 of the curable silicone composition of the present invention. .

도 1에서 나타내는 표면 실장형 LED를 제조하는 방법으로는, LED 칩(1)을 리드 프레임(2)에 다이 본드하고, 이 LED 칩(1)과 리드 프레임(3)을 골드제의 본딩 와이어(4)에 의해 와이어 본드하고, 이어서, LED 칩(1)의 주위에 형성된 프레임재(5)의 내측에 본 발명의 경화성 실리콘 조성물을 충전한 후, 50∼200℃로 가열함으로써 경화시키는 방법이 예시된다. 상기 경화성 실리콘 조성물을 사용함으로써, 내열 충격성이 우수하고, 높은 발광 효율이 지속되는 광반도체 장치 등을 제공할 수 있다.In the method of manufacturing the surface-mounted LED shown in Fig. 1, the LED chip 1 is die-bonded to the lead frame 2, and the LED chip 1 and the lead frame 3 are connected with a gold bonding wire ( A method of wire bonding by 4), then filling the inside of the frame member 5 formed around the LED chip 1 with the curable silicone composition of the present invention, and then curing it by heating at 50 to 200 ° C is exemplified. do. By using the curable silicone composition, it is possible to provide an optical semiconductor device and the like that are excellent in thermal shock resistance and maintain high luminous efficiency.

실시예Example

본 발명의 경화성 실리콘 조성물, 그 경화물, 및 광반도체 장치를 실시예에 의해 상세하게 설명한다. 점도는 25℃에 있어서의 값이다. 여기서, 실시예 중, Me, Vi, Ph, Ep는 각각 메틸기, 비닐기, 페닐기, 3-글리시독시프로필기를 나타낸다.The curable silicone composition of the present invention, a cured product thereof, and an optical semiconductor device are described in detail with reference to examples. A viscosity is a value at 25 degreeC. Here, in Examples, Me, Vi, Ph, and Ep respectively represent a methyl group, a vinyl group, a phenyl group, and a 3-glycidoxypropyl group.

[참고예: 접착 부여제의 합성예][Reference Example: Synthesis Example of Adhesion Agent]

교반기, 환류 냉각관, 온도계가 달린 4구 플라스크에, 1,3-디비닐-1,1,3,3-테트라메틸디실록산 82.2g, 물 143g, 트리플루오로메탄술폰산 0.38g, 및 톨루엔 500g을 투입하고, 교반하, 페닐트리메톡시실란 524.7g을 1 시간에 걸쳐 적하하였다. 적하 종료 후, 1시간 가열 환류하였다. 그 후, 냉각시켜 하층을 분리하고, 톨루엔 용액층을 3회 세정하였다. 세정한 톨루엔 용액층에 메틸글리시독시프로필디메톡시실란 314g과 물 130g과 수산화 칼륨 0.50g을 투입하고, 1시간 가열 환류하였다. 이어서, 메탄올을 증류 제거하여, 과잉인 물을 공비(azeotropic) 탈수로 제거하였다. 4시간 가열 환류한 후, 톨루엔 용액을 냉각시키고 초산 0.55g으로 중화한 후, 3회 세정하였다. 물을 제거한 후, 톨루엔을 감압하에 증류 제거하여, 점도 8,500 mPa·s의 평균 단위식:In a four-necked flask with stirrer, reflux condenser, and thermometer, 82.2 g 1,3-divinyl-1,1,3,3-tetramethyldisiloxane, 143 g water, 0.38 g trifluoromethanesulfonic acid, and 500 g toluene. was added, and 524.7 g of phenyltrimethoxysilane was added dropwise over 1 hour while stirring. After completion of the dropping, the mixture was heated to reflux for 1 hour. Thereafter, it was cooled, the lower layer was separated, and the toluene solution layer was washed three times. 314 g of methylglycidoxypropyldimethoxysilane, 130 g of water, and 0.50 g of potassium hydroxide were added to the washed toluene solution layer, and heated to reflux for 1 hour. Next, methanol was distilled off and excess water was removed by azeotropic dehydration. After heating to reflux for 4 hours, the toluene solution was cooled and neutralized with 0.55 g of acetic acid, followed by washing three times. After removing the water, toluene was distilled off under reduced pressure, and the average unit formula of a viscosity of 8,500 mPa s:

(ViMe2SiO1/2)0.18(PhSiO3/2)0.53(EpMeSiO2/2)0.29(ViMe2SiO1/2)0.18(PhSiO3/2)0.53(EpMeSiO2/2)0.29

로 나타내는 접착 부여제를 조제하였다. (식 중, Vi는 비닐기, Ph는 페닐기, Ep는 에폭시기, Me는 메틸기를 나타낸다)An adhesion imparting agent represented by was prepared. (Wherein, Vi represents a vinyl group, Ph represents a phenyl group, Ep represents an epoxy group, and Me represents a methyl group)

이하, 합성예 1∼3에 의해, 1,3-디비닐-1,3-디페닐디메틸디실록산의 함유량이 상이한 메틸페닐비닐실록산 단위를 함유하는 실리콘 레진 A∼C를 얻었다.Hereinafter, silicone resins A to C containing methylphenylvinylsiloxane units having different contents of 1,3-divinyl-1,3-diphenyldimethyldisiloxane were obtained according to Synthesis Examples 1 to 3.

[합성예 1: 실리콘 레진 A][Synthesis Example 1: Silicone Resin A]

반응 용기에, 페닐트리메톡시실란 100g(0.5 mol) 및 1,3-디비닐-1,3-디페닐디메틸디실록산 23.39g(0.075 mol)을 투입하고, 미리 혼합한 후, 트리플루오로메탄술폰산 0.83g(5.5 mmol)을 투입하고, 교반하, 물 29.95g(1.6 mol)을 투입하고, 2시간 가열 환류를 행하였다. 그 후, 85℃가 될 때까지 가열 상압 증류 제거를 행하였다. 이어서, 톨루엔 22.1g 및 수산화 나트륨 0.4g(10 mmol)을 투입하고, 반응 온도가 120℃가 될 때까지 가열 상압 증류 제거를 행하여, 이 온도에서 6시간 반응시켰다. 실온까지 냉각시키고, 초산 0.95g(15.8 mmol)을 투입하여 중화 반응을 행하였다. 생성한 염을 여과 분리한 후, 투명한 레진 용액을 얻었다. 이 레진은 수평균 분자량이 1,500이고, 질량 평균 분자량이 1,900이며, 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 함유량이 0.47 질량%였다.In a reaction vessel, 100 g (0.5 mol) of phenyltrimethoxysilane and 23.39 g (0.075 mol) of 1,3-divinyl-1,3-diphenyldimethyldisiloxane were added, mixed in advance, and then trifluoromethane 0.83 g (5.5 mmol) of sulfonic acid was added, and 29.95 g (1.6 mol) of water was added while stirring, followed by heating under reflux for 2 hours. Thereafter, heating and atmospheric distillation was performed until the temperature reached 85°C. Then, 22.1 g of toluene and 0.4 g (10 mmol) of sodium hydroxide were introduced, heated and atmospheric distillation was performed until the reaction temperature reached 120°C, and the mixture was reacted at this temperature for 6 hours. After cooling to room temperature, neutralization was performed by adding 0.95 g (15.8 mmol) of acetic acid. After the resulting salt was separated by filtration, a transparent resin solution was obtained. This resin had a number average molecular weight of 1,500, a mass average molecular weight of 1,900, and a content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane of 0.47% by mass.

[합성예 2: 실리콘 레진 B][Synthesis Example 2: Silicone Resin B]

합성예 1에서 작성한 레진을, 톨루엔과 메탄올의 질량비 1:2의 혼합 용매에 의해 5회 세정하여, 실질적으로 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산을 함유하지 않는(=0.0 질량%) 레진을 얻었다.The resin prepared in Synthesis Example 1 was washed 5 times with a mixed solvent of toluene and methanol in a mass ratio of 1:2 to obtain substantially 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane. A resin not containing (= 0.0% by mass) was obtained.

[합성예 3: 실리콘 레진 C][Synthesis Example 3: Silicone Resin C]

합성예 1에서, 수산화 나트륨 대신에 수산화 칼륨 0.488g(8.7 mmol)을 투입한 이외에는 동일하게 하여, 투명한 레진 용액을 얻었다. 이 레진은 수평균 분자량이 1,530이고, 질량 평균 분자량이 1,830이며, 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 함유량이 5.90 질량%였다.A transparent resin solution was obtained in the same manner as in Synthesis Example 1, except that 0.488 g (8.7 mmol) of potassium hydroxide was added instead of sodium hydroxide. This resin had a number average molecular weight of 1,530, a mass average molecular weight of 1,830, and a content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane of 5.90% by mass.

실시예 1∼4, 비교예 1∼4에 있어서, 이하에 나타내는 방법에 의해, 평가 또는 조성물 중의 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 함유량을 정량하였다. 그 결과를 표 1 및 표 2에 나타낸다.In Examples 1 to 4 and Comparative Examples 1 to 4, the content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane in the evaluation or composition was quantified by the method shown below. did The results are shown in Table 1 and Table 2.

[1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 검량 방법][Measurement method for 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane]

미리 질량을 측정한 시료에 규정된 질량의 내부 표준 물질을 첨가해 톨루엔으로 희석하고, 그 톨루엔 용액을 가스 크로마토그래피에서의 내부 표준 물질과의 피크 면적비로부터, 시료 내의 질량%를 계산하였다.An internal standard substance of a prescribed mass was added to a sample whose mass was measured in advance, diluted with toluene, and the mass% in the sample was calculated from the peak area ratio of the toluene solution and the internal standard substance in the gas chromatography.

[경화물의 Shore-D][Shore-D of cured product]

경화물의 경도는 JIS K 7215-1986 "플라스틱의 듀로미터 경도 시험 방법"에 규정된 타입 D 듀로미터에 의해 측정하였다.The hardness of the cured product was measured by a type D durometer specified in JIS K 7215-1986 "Testing method for durometer hardness of plastics".

[광반도체 장치의 내열 충격성][Thermal shock resistance of optical semiconductor device]

경화성 실리콘 조성물을 사용하고, 150℃, 2시간 가열하여 도 1에서 나타내는 광반도체 장치를 20개 제작하였다. 이 광반도체 장치를, -40℃를 30분간 유지 후, 2분 이내에 125℃까지 승온하고 30분간 유지의 공정을 반복하여, 각 사이클수에서의 광반도체 장치의 불점등 개수를 세었다.Using the curable silicone composition, 20 optical semiconductor devices as shown in FIG. 1 were produced by heating at 150°C for 2 hours. After holding this optical semiconductor device at -40°C for 30 minutes, the process of raising the temperature to 125°C within 2 minutes and holding for 30 minutes was repeated, and the number of unlit optical semiconductor devices at each cycle number was counted.

[광반도체 장치의 발광 효율][Luminous Efficiency of Optical Semiconductor Device]

경화성 실리콘 조성물을 사용하고, 100 질량부에 대해, (G) 성분으로서, 형광체 GAL530-L(INTEMATIX사 제조) 50 질량부와 ER6535(INTEMATIX사 제조) 3.91 질량부를 덴탈 믹서로 혼합하여 형광체 함유의 경화성 실리콘 조성물을 조제하고, 이 경화성 실리콘 조성물을 사용해 150℃, 2시간 가열하여, 도 1과 동일한 광반도체 장치를 5개 제작하였다. 이 광반도체 장치에, 400 ㎃의 전하를 가해 85℃, 상대 습도 85%의 조건하에서 1000 시간 점등하고, 광반도체 장치의 시험 개시 직후의 발광 효율을 100%로 하여 각각의 발광 효율 변화를 측정한 후, 그 평균값을 광반도체 장치의 발광 효율로 하였다.Using a curable silicone composition, as component (G), 50 parts by mass of phosphor GAL530-L (manufactured by INTEMATIX) and 3.91 parts by mass of ER6535 (manufactured by INTEMATIX) were mixed with a dental mixer with respect to 100 parts by mass, to obtain a phosphor-containing curing property. A silicone composition was prepared, and it heated at 150 degreeC for 2 hours using this curable silicone composition, and produced 5 optical semiconductor devices similar to FIG. An electric charge of 400 mA was applied to this optical semiconductor device, and the light was turned on for 1000 hours under conditions of 85° C. and 85% relative humidity. After that, the average value was made into the luminous efficiency of the optical semiconductor device.

[실시예 1][Example 1]

합성예 2에서 조제한 실리콘 레진 B 6.83 질량부, 점도 3,000 mPa·s의 분자쇄 양말단 디메틸비닐실록시기 봉쇄 메틸페닐폴리실록산 0.82 질량부, 식: H(CH3)2SiO(C6H5)2SiOSi(CH3)2H로 나타내는 오르가노트리실록산 2.10 질량부(상기 실리콘 레진 내와 상기 메틸페닐폴리실록산 내의 비닐기의 합계 1 몰에 대해, 본 성분 중의 규소 원자 결합 수소 원자가 1이 되는 양), 참고예 1의 접착 부여제 0.25 질량부, 1,3,5,7-테트라메틸-1,3,5,7-테트라비닐시클로테트라실록산을 0.02 질량부, 및 백금-1,3-디비닐-1,1,3,3-테트라메틸디실록산 착체의 1,3,5,7-테트라메틸-1,3,5,7-테트라비닐시클로테트라실록산 용액(백금을 4.0 질량% 함유) 0.00063 질량부, 1,3-디비닐-1,3-디페닐디메틸디실록산 0.01 질량부를 혼합하여, 점도 7,700 mPa·s의 경화성 실리콘 조성물을 조제하였다. 이 조성물을 150℃ 1시간에서 경화시킨 결과, Shore-D 73의 경화물을 얻었다. 경화물의 표면은 택이 없고 평활하였다. 그 특성을 표 1에 나타낸다. 이 경화성 실리콘 조성물 중의 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산은 0.10 질량%였다.6.83 parts by mass of silicone resin B prepared in Synthesis Example 2, 0.82 parts by mass of methylphenylpolysiloxane capped with dimethylvinylsiloxy groups at both ends of the molecular chain having a viscosity of 3,000 mPa s, formula: H(CH3)2SiO(C6H5)2SiOSi(CH3)2H 2.10 parts by mass of organotrisiloxane (an amount in which the number of silicon-bonded hydrogen atoms in this component is 1 relative to the total of 1 mole of vinyl groups in the silicone resin and in the methylphenylpolysiloxane), 0.25 parts by mass of the adhesion imparting agent of Reference Example 1 0.02 parts by mass of 1,3,5,7-tetramethyl-1,3,5,7-tetravinylcyclotetrasiloxane, and platinum-1,3-divinyl-1,1,3,3-tetramethyl 0.00063 parts by mass of a 1,3,5,7-tetramethyl-1,3,5,7-tetravinylcyclotetrasiloxane solution of a disiloxane complex (containing 4.0 mass% of platinum), 1,3-divinyl-1, A curable silicone composition having a viscosity of 7,700 mPa·s was prepared by mixing 0.01 part by mass of 3-diphenyldimethyldisiloxane. As a result of curing this composition at 150°C for 1 hour, a cured product of Shore-D 73 was obtained. The surface of the cured product was smooth without tack. Its characteristics are shown in Table 1. 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane in this curable silicone composition was 0.10% by mass.

[실시예 2][Example 2]

실시예 1에 있어서, 1,3-디비닐-1,3-디페닐디메틸디실록산의 첨가량을 0.10 질량부로 한 것 외에는 동일하게 하여, 점도 6,200 mPa·s의 경화성 실리콘 조성물을 조제하였다. 이 조성물을 150℃ 1시간에서 경화시킨 결과, Shore-D 69의 경화물을 얻었다. 경화물의 표면은 택이 없고 평활하였다. 그 특성을 표 1에 나타낸다. 이 경화성 실리콘 조성물 중의 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산은 0.99 질량%였다.A curable silicone composition having a viscosity of 6,200 mPa·s was prepared in the same manner as in Example 1 except that the amount of 1,3-divinyl-1,3-diphenyldimethyldisiloxane added was 0.10 parts by mass. As a result of curing this composition at 150°C for 1 hour, a cured product of Shore-D 69 was obtained. The surface of the cured product was smooth without tack. Its characteristics are shown in Table 1. 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane in this curable silicone composition was 0.99% by mass.

[실시예 3][Example 3]

실시예 1에 있어서, 1,3-디비닐-1,3-디페닐디메틸디실록산의 첨가량을 0.20 질량부로 한 것 외에는 동일하게 하여, 점도 5,000 mPa·s의 경화성 실리콘 조성물을 조제하였다. 이 조성물을 150℃ 1시간에서 경화시킨 결과, Shore-D 64의 경화물을 얻었다. 경화물의 표면은 택이 없고 평활하였다. 그 특성을 표 1에 나타낸다. 이 경화성 실리콘 조성물 중의 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산은 1.96 질량%였다.A curable silicone composition having a viscosity of 5,000 mPa·s was prepared in the same manner as in Example 1 except that the amount of 1,3-divinyl-1,3-diphenyldimethyldisiloxane added was 0.20 parts by mass. As a result of curing this composition at 150°C for 1 hour, a cured product of Shore-D 64 was obtained. The surface of the cured product was smooth without tack. Its characteristics are shown in Table 1. The amount of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane in this curable silicone composition was 1.96% by mass.

[비교예 1][Comparative Example 1]

실시예 1에 있어서, 1,3-디비닐-1,3-디페닐디메틸디실록산을 첨가하지 않는(=0.0 질량부) 것으로 한 외에는 동일하게 하여, 점도 7,700 mPa·s의 경화성 실리콘 조성물을 조제하였다. 이 조성물을 150℃ 1시간에서 경화시킨 결과, Shore-D 73의 경화물을 얻었다. 경화물의 표면은 택이 없고 평활하였다. 그 특성을 표 1에 나타낸다. 이 경화성 실리콘 조성물 중의 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산은 0.0 질량%였다.A curable silicone composition having a viscosity of 7,700 mPa s was prepared in the same manner as in Example 1 except that 1,3-divinyl-1,3-diphenyldimethyldisiloxane was not added (= 0.0 part by mass) did As a result of curing this composition at 150°C for 1 hour, a cured product of Shore-D 73 was obtained. The surface of the cured product was smooth without tack. Its characteristics are shown in Table 1. 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane in this curable silicone composition was 0.0% by mass.

[비교예 2][Comparative Example 2]

실시예 1에 있어서, 1,3-디비닐-1,3-디페닐디메틸디실록산의 첨가량을 0.50 질량부로 한 것 외에는 동일하게 하여, 점도 2300 mPa·s의 경화성 실리콘 조성물을 조제하였다. 이 조성물을 150℃ 1시간에서 경화시킨 결과, Shore-D 44의 경화물을 얻었다. 경화물의 표면은 택이 없고 평활하였다. 그 특성을 표 1에 나타낸다. 이 경화성 실리콘 조성물 중의 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산은 4.75 질량%였다.A curable silicone composition having a viscosity of 2300 mPa·s was prepared in the same manner as in Example 1 except that the amount of 1,3-divinyl-1,3-diphenyldimethyldisiloxane added was 0.50 parts by mass. As a result of curing this composition at 150°C for 1 hour, a cured product of Shore-D 44 was obtained. The surface of the cured product was smooth without tack. Its characteristics are shown in Table 1. The amount of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane in this curable silicone composition was 4.75% by mass.

[비교예 3][Comparative Example 3]

실시예 1에 있어서, 1,3-디비닐-1,3-디페닐디메틸디실록산의 첨가량을 0.91 질량부로 한 것 외에는 동일하게 하여, 점도 1100 mPa·s의 경화성 실리콘 조성물을 조제하였다. 이 조성물을 150℃ 1시간에서 경화시켰지만, 경화물의 표면은 점착성으로 Shore-D의 측정은 할 수 없었다. 그 특성을 표 1에 나타낸다. 이 경화성 실리콘 조성물 중의 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산은 8.33 질량%였다.A curable silicone composition having a viscosity of 1100 mPa·s was prepared in the same manner as in Example 1 except that the amount of 1,3-divinyl-1,3-diphenyldimethyldisiloxane added was 0.91 parts by mass. Although this composition was cured at 150°C for 1 hour, the surface of the cured product was tacky and Shore-D could not be measured. Its characteristics are shown in Table 1. The amount of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane in this curable silicone composition was 8.33% by mass.

[실시예 4][Example 4]

1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 함유량이 0.47 질량%이며, 비닐메틸페닐실록시기를 함유하는 실리콘 레진 5.95 질량부, 점도 3,000 mPa·s의 분자쇄 양말단 디메틸비닐실록시기 봉쇄 메틸페닐폴리실록산 1.80 질량부, 식: H(CH3)2SiO(C6H5)2SiOSi(CH3)2H로 나타내는 오르가노트리실록산 1.98 질량부(상기 실리콘 레진 내와 상기 메틸페닐폴리실록산 내의 비닐기의 합계 1 몰에 대해, 본 성분 중의 규소 원자 결합 수소 원자가 1이 되는 양), 참고예 1의 접착 부여제 0.25 질량부, 1,3,5,7-테트라메틸-1,3,5,7-테트라비닐시클로테트라실록산을 0.02 질량부, 및 백금-1,3-디비닐-1,1,3,3-테트라메틸디실록산 착체의 1,3,5,7-테트라메틸-1,3,5,7-테트라비닐시클로테트라실록산 용액(백금을 4.0 질량% 함유) 0.00063 질량부를 혼합하여, 점도 2300 mPa·s의 경화성 실리콘 조성물을 조제하였다. 이 조성물을 150℃-1시간에서 경화시킨 결과, Shore-D 53의 경화물을 얻었다. 경화물의 표면은 택이 없고 평활하였다. 이 경화성 실리콘 조성물 중의 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 함유량은 0.28 질량%였다. 상기 방법으로 당해 경화물을 사용한 광반도체 장치의 발광 효율을 평가한 결과, 566시간 및 997시간 경과 후의 발광 효율은 각각 99.07%, 96.13%였다.The content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane is 0.47% by mass, and 5.95 parts by mass of a silicone resin containing a vinylmethylphenylsiloxy group, molecular chain viscosity of 3,000 mPa s 1.80 parts by mass of methylphenylpolysiloxane capped with dimethylvinylsiloxy groups at both ends, 1.98 parts by mass of organotrisiloxane represented by the formula: H(CH3)2SiO(C6H5)2SiOSi(CH3)2H (of the vinyl groups in the silicone resin and in the methylphenylpolysiloxane) 0.25 parts by mass of the adhesion imparting agent of Reference Example 1, 1,3,5,7-tetramethyl-1,3,5,7- 0.02 parts by mass of tetravinylcyclotetrasiloxane and 1,3,5,7-tetramethyl-1,3,5 of platinum-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex A curable silicone composition having a viscosity of 2300 mPa·s was prepared by mixing 0.00063 parts by mass of a 7-tetravinylcyclotetrasiloxane solution (containing 4.0 mass% of platinum). As a result of curing this composition at 150°C for 1 hour, a cured product of Shore-D 53 was obtained. The surface of the cured product was smooth without tack. The content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane in this curable silicone composition was 0.28% by mass. As a result of evaluating the luminous efficiency of the optical semiconductor device using the cured product by the above method, the luminous efficiencies after 566 hours and 997 hours were 99.07% and 96.13%, respectively.

[비교예 4][Comparative Example 4]

1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 함유량이 5.90 질량%이며, 비닐메틸페닐실록시기를 함유하는 실리콘 레진 5.95 질량부, 점도 3,000 mPa·s의 분자쇄 양말단 디메틸비닐실록시기 봉쇄 메틸페닐폴리실록산 1.80 질량부, 식: H(CH3)2SiO(C6H5)2SiOSi(CH3)2H로 나타내는 오르가노트리실록산 1.98 질량부(상기 실리콘 레진 내와 상기 메틸페닐폴리실록산 내의 비닐기의 합계 1 몰에 대해, 본 성분 중의 규소 원자 결합 수소 원자가 1이 되는 양), 참고예 1의 접착 부여제 0.25 질량부, 1,3,5,7-테트라메틸-1,3,5,7-테트라비닐시클로테트라실록산을 0.02 질량부, 및 백금-1,3-디비닐-1,1,3,3-테트라메틸디실록산 착체의 1,3,5,7-테트라메틸-1,3,5,7-테트라비닐시클로테트라실록산 용액(백금을 4.0 질량% 함유) 0.00063 질량부를 혼합하여, 점도 2200 mPa·s의 경화성 실리콘 조성물을 조제하였다. 이 조성물을 150℃ 1시간에서 경화시킨 결과, Shore-D 52의 경화물을 얻었다. 경화물의 표면은 택이 없고 평활하였다. 이 경화성 실리콘 조성물 중의 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 함유량은 3.51 질량%였다. 상기 방법으로 당해 경화물을 사용한 광반도체 장치의 발광 효율을 평가한 결과, 566시간 및 997시간 경과 후의 발광 효율은 각각 95.47%, 91.48%였다.The content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane is 5.90% by mass, 5.95 parts by mass of silicone resin containing a vinylmethylphenylsiloxy group, molecular chain viscosity of 3,000 mPa s 1.80 parts by mass of methylphenylpolysiloxane capped with dimethylvinylsiloxy groups at both ends, 1.98 parts by mass of organotrisiloxane represented by the formula: H(CH3)2SiO(C6H5)2SiOSi(CH3)2H (of the vinyl groups in the silicone resin and in the methylphenylpolysiloxane) 0.25 parts by mass of the adhesion imparting agent of Reference Example 1, 1,3,5,7-tetramethyl-1,3,5,7- 0.02 parts by mass of tetravinylcyclotetrasiloxane and 1,3,5,7-tetramethyl-1,3,5 of platinum-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex A curable silicone composition having a viscosity of 2200 mPa·s was prepared by mixing 0.00063 parts by mass of a 7-tetravinylcyclotetrasiloxane solution (containing 4.0 mass% of platinum). As a result of curing this composition at 150°C for 1 hour, a cured product of Shore-D 52 was obtained. The surface of the cured product was smooth without tack. The content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane in this curable silicone composition was 3.51% by mass. As a result of evaluating the luminous efficiency of the optical semiconductor device using the cured product by the above method, the luminous efficiencies after 566 hours and 997 hours were 95.47% and 91.48%, respectively.

[실시예·비교예의 총괄][Overall of Examples and Comparative Examples]

실시예 1∼3(표 1)에 나타내는 바와 같이, 메틸페닐비닐실록산 단위를 함유하는 실리콘 레진을 함유하는 경화성 실리콘 조성물이며, 1,3-디비닐-1,3-디페닐디메틸디실록산의 함유량이 0.10 질량%, 0.99 질량%, 또는 1.96 질량%인 것은 401 사이클 시점에서도 불량 개수가 2개 이하이고, 우수한 내열 충격성을 나타낸다. 한편, 비교예 1∼3(표 1)에 나타내는 바와 같이, 동일한 경화성 실리콘 조성물이며, 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 함유량이 0.0 질량%, 4.57 질량%인 것은 401 사이클 시점에서도 불량 개수가 8개 이상이 되고, 내열 충격성이 명확히 떨어진다. 또한, 동 함유량이 8.33 질량%인 것은 경화성이 명확하게 떨어진다.As shown in Examples 1 to 3 (Table 1), it is a curable silicone composition containing a silicone resin containing a methylphenylvinylsiloxane unit, and the content of 1,3-divinyl-1,3-diphenyldimethyldisiloxane is 0.10% by mass, 0.99% by mass, or 1.96% by mass shows that the number of defects is 2 or less even at the time of 401 cycles, and exhibits excellent thermal shock resistance. On the other hand, as shown in Comparative Examples 1 to 3 (Table 1), it is the same curable silicone composition, and the content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane is 0.0% by mass; In the case of 4.57% by mass, the number of defects is 8 or more even at the time of 401 cycles, and the thermal shock resistance is clearly inferior. Moreover, hardenability is clearly inferior to the thing whose copper content is 8.33 mass %.

동일하게, 실시예 4의 경화성 실리콘 조성물(1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 함유량이 0.28 질량%)을 사용한 광반도체 장치는 비교예 4(동 함유량 3.51 질량%)와 비교하여 566시간 및 997시간 경과 후의 발광 효율이 우수한 것이다.Similarly, the optical semiconductor device using the curable silicone composition of Example 4 (the content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane is 0.28% by mass) is Comparative Example 4 (the same content 3.51% by mass), the luminous efficiency after 566 hours and 997 hours is excellent.

Figure 112019057713445-pct00001
Figure 112019057713445-pct00001

본 발명의 경화성 실리콘 조성물은 전기·전자용의 접착제, 포팅제, 보호제, 코팅제, 언더필제로서 사용할 수 있으며, 특히 높은 반응성을 갖고, 가스 투과성이 낮으며, 또한, 내열 충격성이 높은 경화물을 형성할 수 있으므로, 발광 다이오드(LED) 등의 광반도체 장치에 있어서의 광반도체 소자의 봉지재 혹은 보호 코팅재로서 바람직하고, 높은 발광 효율이 지속되는 광반도체 장치 등을 제공할 수 있다.The curable silicone composition of the present invention can be used as an electrical/electronic adhesive, potting agent, protective agent, coating agent, or underfill agent, and forms a cured product having particularly high reactivity, low gas permeability, and high thermal shock resistance. Since it can be done, it is suitable as a sealing material or a protective coating material for an optical semiconductor element in an optical semiconductor device such as a light emitting diode (LED), and an optical semiconductor device in which high luminous efficiency continues can be provided.

1 광반도체 소자
2 리드 프레임
3 리드 프레임
4 본딩 와이어
5 프레임재
6 경화성 실리콘 조성물의 경화물
1 optical semiconductor element
2 lead frame
3 lead frame
4 bonding wires
5 frame materials
6 Cured product of curable silicone composition

Claims (5)

알킬페닐알케닐실록산 단위(R2R3R4SiO1/2; R2는 탄소수 1∼12의 알킬기; R3은 페닐기; R4는 탄소수 2∼12의 알케닐기이다)를 갖는 오르가노폴리실록산을 함유하여 이루어지며, 또한,
조성물 전체에 대해 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 함유량이 0.0 질량%보다 크고, 3.0 질량% 미만인 경화성 실리콘 조성물.
Organopolysiloxane having an alkylphenylalkenylsiloxane unit (R 2 R 3 R 4 SiO 1/2 ; R 2 is an alkyl group having 1 to 12 carbon atoms; R 3 is a phenyl group; R 4 is an alkenyl group having 2 to 12 carbon atoms) It is made by containing, and also,
A curable silicone composition wherein the content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane is greater than 0.0% by mass and less than 3.0% by mass with respect to the entire composition.
제 1 항에 있어서,
(A) 평균 단위식:
(R1 3SiO1/2)a(R2R3R4SiO1/2)b(R5 2SiO2/2)c(R3SiO3/2)d
(식 중, R1은 동일하거나 또는 상이한 탄소수 1∼12의 알킬기 혹은 탄소수 2∼12의 알케닐기, 단, 1분자 중의 적어도 하나의 R1은 탄소수 2∼12의 알케닐기; R2는 탄소수 1∼12의 알킬기; R3은 페닐기; R4는 탄소수 2∼12의 알케닐기; R5는 동일하거나 또는 상이한 탄소수 1∼12의 알킬기, 탄소수 2∼12의 알케닐기, 또는 페닐기이고; a, b, c, 및 d는 각각, 0.00≤a≤0.45, 0.01≤b≤0.45, 0≤c≤0.7, 0.1≤d<0.9, 또한 a+b+c+d=1을 만족하는 수이다)
로 나타내는 오르가노폴리실록산,
(B) 1분자 중에 적어도 2개의 알케닐기를 갖고, 규소 원자 결합 수소 원자를 갖지 않는 직쇄형 오르가노폴리실록산(본 조성물에 대해, 0∼70 질량%),
(C) 1분자 중에 적어도 2개의 규소 원자 결합 수소 원자를 갖는 오르가노폴리실록산{(A) 성분과 (B) 성분 중의 알케닐기의 합계 1 몰에 대해, 본 성분 중의 규소 원자 결합 수소 원자가 0.1∼5 몰이 되는 양}, 및
(D) 유효량의 히드로실릴화 반응용 촉매
를 함유하여 이루어지며, 또한,
조성물 전체에 대해 1,3-디비닐-1,3-디페닐-1,3-디메틸디실록산의 함유량이 0.05 질량%∼2.50 질량%의 범위인 경화성 실리콘 조성물.
According to claim 1,
(A) average unit formula:
(R 1 3 SiO 1/2 ) a (R 2 R 3 R 4 SiO 1/2 ) b (R 5 2 SiO 2/2 ) c (R 3 SiO 3/2 ) d
(Wherein, R 1 is the same or different C 1 to C 12 alkyl group or C 2 to C 12 alkenyl group, provided that at least one R 1 in one molecule is a C 2 to C 12 alkenyl group; R 2 is C 1 ∼12 alkyl group; R 3 is a phenyl group; R 4 is an alkenyl group having 2 to 12 carbon atoms; R 5 is an identical or different C 1 to 12 alkyl group, an alkenyl group having 2 to 12 carbon atoms, or a phenyl group; a, b , c, and d are numbers satisfying 0.00≤a≤0.45, 0.01≤b≤0.45, 0≤c≤0.7, 0.1≤d<0.9, and a+b+c+d=1, respectively)
An organopolysiloxane represented by
(B) a straight-chain organopolysiloxane having at least two alkenyl groups in one molecule and no silicon atom-bonded hydrogen atoms (0 to 70% by mass relative to the present composition);
(C) organopolysiloxane having at least two silicon-bonded hydrogen atoms in one molecule {the silicon-bonded hydrogen atoms in this component are 0.1 to 5 per mole of the total of alkenyl groups in component (A) and component (B) molar amount}, and
(D) an effective amount of a catalyst for the hydrosilylation reaction
It is made by containing, and also,
A curable silicone composition wherein the content of 1,3-divinyl-1,3-diphenyl-1,3-dimethyldisiloxane is in the range of 0.05% by mass to 2.50% by mass with respect to the entire composition.
제 1 항 또는 제 2 항에 있어서,
또한, (E) 접착 부여제{상기 (A) 성분∼(D) 성분의 합계 100 질량부에 대해, 0.01∼10 질량부}를 포함하는 경화성 실리콘 조성물.
According to claim 1 or 2,
Further, (E) a curable silicone composition containing an adhesion imparting agent (0.01 to 10 parts by mass based on 100 parts by mass in total of the components (A) to (D)).
제 1 항 또는 제 2 항의 경화성 실리콘 조성물을 경화시켜 이루어지는 경화물.A cured product obtained by curing the curable silicone composition according to claim 1 or 2. 제 1 항 또는 제 2 항의 경화성 실리콘 조성물의 경화물로 광반도체 소자가 봉지된 광반도체 장치.An optical semiconductor device in which an optical semiconductor element is sealed with a cured product of the curable silicone composition according to claim 1 or 2.
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