KR102485573B1 - Light-emitting device with integrated driving circuit - Google Patents

Light-emitting device with integrated driving circuit Download PDF

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KR102485573B1
KR102485573B1 KR1020210021396A KR20210021396A KR102485573B1 KR 102485573 B1 KR102485573 B1 KR 102485573B1 KR 1020210021396 A KR1020210021396 A KR 1020210021396A KR 20210021396 A KR20210021396 A KR 20210021396A KR 102485573 B1 KR102485573 B1 KR 102485573B1
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light emitting
emitting device
driving circuit
integrated
thin film
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KR20220117725A (en
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박시현
이영웅
손보성
김희진
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영남대학교 산학협력단
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/16Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
    • H01L25/167Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits comprising optoelectronic devices, e.g. LED, photodiodes
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/22Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources
    • G09G3/30Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels
    • G09G3/32Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/075Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
    • H01L25/0753Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00 the devices being arranged next to each other
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/0004Devices characterised by their operation
    • H01L33/0041Devices characterised by their operation characterised by field-effect operation
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02BCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B20/00Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps
    • Y02B20/30Semiconductor lamps, e.g. solid state lamps [SSL] light emitting diodes [LED] or organic LED [OLED]

Abstract

본 발명은 구동회로가 집적된 발광소자에 관한 것으로써, 마이크로 LED의 배선과 소자의 수에 따른 보상회로의 면적을 줄이기 위해 구동회로가 집적된 발광소자에 관한 것이다. 본 발명의 일 측면에 따른 구동회로가 집적된 발광소자는 기판 상에 데이터 라인과 Select 배선이 연결되어 스위칭 동작하는 제1 Pixel circuit 영역; 및 상기 제1 Pixel circuit 영역 상에 적층되어 발광소자를 점등시키는 일부 구동회로를 발광소자와 원칩 소자로 집적하는 제2 Pixel circuit 영역;을 포함하여 구동회로(Pixel circuit)의 면적을 줄일 수 있는 효과가 있다.The present invention relates to a light emitting device in which a driving circuit is integrated, and more particularly, to a light emitting device in which a driving circuit is integrated to reduce the area of a compensation circuit according to the number of micro LED wires and elements. A light emitting device integrated with a driving circuit according to an aspect of the present invention includes a first pixel circuit region in which a data line and a select wiring are connected to a substrate and perform a switching operation; and a second pixel circuit area for integrating some of the driving circuits stacked on the first pixel circuit area and turning on the light emitting element into a light emitting element and a one-chip element; an effect that can reduce the area of the driving circuit (pixel circuit). there is

Description

구동회로가 집적된 발광소자{Light-emitting device with integrated driving circuit}Light-emitting device with integrated driving circuit

본 발명은 구동회로가 집적된 발광소자에 관한 것으로써, 더욱 상세하게는 마이크로 LED의 배선과 소자의 수에 따른 보상회로의 면적을 줄이기 위해 구동회로가 집적된 발광소자에 관한 것이다.The present invention relates to a light emitting device in which a driving circuit is integrated, and more particularly, to a light emitting device in which a driving circuit is integrated in order to reduce the area of a compensation circuit according to the number of micro LED wires and elements.

현재 OLED TV의 3T1C는 외부보상, Mobile OLED 7T1C는 내부보상을 사용하고 있다. 모바일 기기에서는 베젤문제로 인해 내부 보상회로를 사용하는 것이 효율적이다.Currently, 3T1C of OLED TV uses external compensation and Mobile OLED 7T1C uses internal compensation. In mobile devices, it is efficient to use an internal compensation circuit due to the bezel problem.

하지만, 마이크로 LED는 OLED에 비해 더 정교한 구동 회로가 필요하다. 이를 위해서는 트랜지스터와 축전기를 더 많이 사용하여야 한다. 마이크로 LED의 경우 OLED에 비해 크기가 매우 작지만, 보상 회로의 면적은 넓어지는 문제가 발생한다. 선이 많아질수록, 소자가 많아질수록 구동회로(Pixel circuit)의 면적은 넓어지게 되고, 이로써, 발광소자와 발광소자 간의 간격이 넓어지게 된다.However, micro LEDs require more sophisticated driving circuits than OLEDs. This requires the use of more transistors and capacitors. In the case of micro LED, the size is very small compared to OLED, but the area of the compensation circuit is widened. As the number of lines increases and the number of elements increases, the area of the driving circuit (Pixel circuit) widens, thereby widening the gap between the light emitting elements.

기존 OLED 디스플레이 또는 마이크로 LED 디스플레이의 경우, TFT층과 발광소자를 독립적으로 제작한 후 집적하게 된다. 이때, 2D 구조의 TFT층은 넓은 면적의 pixel circuit을 가질 수 밖에 없다. 또한 마이크로 LED의 경우 추가적인 보상회로가 필요함으로, 외부보상회로로 인한 추가 공간을 필요로 한다.In the case of an existing OLED display or micro LED display, a TFT layer and a light emitting element are independently manufactured and then integrated. At this time, the TFT layer of the 2D structure inevitably has a large area pixel circuit. In addition, since an additional compensation circuit is required in the case of a micro LED, additional space is required due to an external compensation circuit.

마이크로 LED의 이점을 가지고 디스플레이를 소형기기에서 구동하기 위해서는 Pixel circuit의 면적을 줄이기 위해 회로 일부를 LED칩에 집적시킬 필요가 있다.In order to drive a display in a small device with the advantage of micro LED, it is necessary to integrate some of the circuit into the LED chip to reduce the area of the pixel circuit.

(특허문헌1)공개특허 10-2016-0070601(2016.06.20.)(Patent Document 1) Patent Publication 10-2016-0070601 (2016.06.20.)

본 발명은 상술한 문제를 해결하고자 고안한 것으로, Pixel circuit의 면적을 줄이기 위해 회로 일부를 LED칩에 집적시킨 원칩소자를 제작함으로써, 구동회로가 집적된 발광소자를 제공함에 목적이 있다.The present invention was conceived to solve the above problems, and an object of the present invention is to provide a light emitting device in which a driving circuit is integrated by manufacturing a one-chip device in which a part of the circuit is integrated into an LED chip in order to reduce the area of the pixel circuit.

본 발명의 일 측면에 따른 구동회로가 집적된 발광소자는 기판 상에 데이터 라인과 Select 배선이 연결되어 스위칭 동작하는 제1 Pixel circuit 영역; 및 상기 제1 Pixel circuit 영역 상에 적층되어 발광소자를 점등시키는 일부 구동회로를 발광소자와 원칩 소자로 집적하는 제2 Pixel circuit 영역;을 포함한다.A light emitting device integrated with a driving circuit according to an aspect of the present invention includes a first pixel circuit region in which a data line and a select wiring are connected to a substrate and perform a switching operation; and a second pixel circuit area stacked on the first pixel circuit area and integrating a part of the driving circuit for turning on the light emitting device into a light emitting device and a one-chip device.

바람직하게 제1 Pixel circuit 영역은 기판 상에 데이터 라인(Vdata)이 형성되는 제1 영역; 상기 제1 영역 상에 적층되어 전원라인(Vdd), Select 배선이 형성되는 제2 영역; 상기 제2 영역 상에 적층되어 그라운드 배선이 형성되는 제3 영역; 상기 데이터 라인과 Select 배선이 연결되어 스위칭 동작하는 제1 박막 트랜지스터(TFT);를 포함한다.Preferably, the first pixel circuit area includes a first area where the data line Vdata is formed on the substrate; a second region stacked on the first region to form a power line (Vdd) and a select wiring; a third region stacked on the second region to form a ground wire; A first thin film transistor (TFT) connected to the data line and the select wire to perform a switching operation.

바람직하게 제2 Pixel circuit 영역은 상기 제1 Pixel circuit 영역의 전원라인과 제1 박막 트랜지스터 및 그라운드 배선에 연결되는 제2 박막 트랜지스터(TFT);를 포함하는 구동회로 영역과 발광소자 영역을 원칩소자로 집적한 것이다.Preferably, the second pixel circuit area includes a driving circuit area including a second thin film transistor (TFT) connected to the power supply line, the first thin film transistor, and ground wiring of the first pixel circuit area, and the light emitting device area as a one-chip device. it is accumulated

바람직하게 발광소자는 마이크로 LED 또는 LET(Light Emitting Transister)이고, 원칩 소자는 mini-LED급 크기이다.Preferably, the light emitting device is a micro LED or a light emitting transistor (LET), and the one-chip device has a mini-LED class size.

바람직하게 원칩 소자에 적어도 두 개 이상의 발광소자 및 해당 구동회로를 포함한다.Preferably, the one-chip device includes at least two or more light emitting devices and corresponding driving circuits.

바람직하게 발광소자를 점등시키는 일부 구동회로는 스위칭 동작하는 제1 Pixel circuit 영역과 결합하여 전원라인을 연결하는 캡부재를 포함한다.Preferably, some of the driving circuits for turning on the light emitting element include a cap member connected to a power line by combining with the first pixel circuit area for switching operation.

바람직하게 제2 Pixel circuit 영역은 기판에 GaN을 채널로 하는 TFT 및 발광소자와 연결하는 구동회로의 일부를 발광소자와 집적하는 원칩 소자이다.Preferably, the second pixel circuit area is a one-chip device in which a TFT using GaN as a channel and a part of a driving circuit connected to a light emitting device are integrated with the light emitting device.

본 발명의 일 실시예에 따른 구동회로가 집적된 발광소자에 의하면, 구동회로(Pixel circuit)의 면적을 줄일 수 있는 효과가 있다. 또한 종래의 마이크로 LED의 전사 문제를 OLED에 적용되는 전사기술을 통해 해결할 수 있고, 종래의 마이크로 LED repair 문제 또한 해결할 수 있다. According to the light emitting device in which the driving circuit is integrated according to an embodiment of the present invention, there is an effect of reducing the area of the driving circuit (Pixel circuit). In addition, the transfer problem of the conventional micro LED can be solved through the transfer technology applied to the OLED, and the conventional micro LED repair problem can also be solved.

도 1은 본 발명의 일 실시예에 따른 구동회로가 집적된 발광소자를 나타낸 도면이다.
도 2는 본 발명의 일 실시예에 따른 구동회로가 집적된 발광소자의 세부 구성을 나타낸 도면이다.
도 3은 본 발명의 일 실시예에 따른 구동회로가 집적된 발광소자의 구동회로 영역을 설명하기 위한 도면이다.
도 4는 본 발명의 다른 실시예에 따른 구동회로가 집적된 발광소자를 나타낸 도면이다.
도 5는 본 발명의 일 실시예에 따른 구동회로가 집적된 발광소자의 원칩소자 형태의 절단면을 간략히 나타낸 도면이다.
도 6은 본 발명의 일 실시예에 따른 구동회로가 집적된 발광소자의 트랜지스터 회로를 설명하기 위한 도면이다.
도 7은 본 발명의 일 실시예에 따른 구동회로가 집적된 발광소자의 원칩 소자 형태를 나타낸 도면이다. 도 7에 나타낸 원칩소자(a)는 nmos 형태이고, (b)는 pmos 형태이다.
1 is a diagram showing a light emitting device integrated with a driving circuit according to an embodiment of the present invention.
2 is a diagram showing a detailed configuration of a light emitting device integrated with a driving circuit according to an embodiment of the present invention.
3 is a diagram for explaining a driving circuit region of a light emitting device in which a driving circuit according to an embodiment of the present invention is integrated.
4 is a view showing a light emitting device integrated with a driving circuit according to another embodiment of the present invention.
5 is a view schematically illustrating a cut surface of a one-chip device shape of a light emitting device integrated with a driving circuit according to an embodiment of the present invention.
6 is a diagram for explaining a transistor circuit of a light emitting device integrated with a driving circuit according to an embodiment of the present invention.
7 is a view showing a one-chip device form of a light emitting device integrated with a driving circuit according to an embodiment of the present invention. The one-chip device (a) shown in FIG. 7 is an nmos type, and (b) is a pmos type.

본 발명의 실시예에서 제시되는 특정한 구조 내지 기능적 설명들은 단지 본 발명의 개념에 따른 실시예를 설명하기 위한 목적으로 예시된 것으로, 본 발명의 개념에 따른 실시예들은 다양한 형태로 실시될 수 있다. 또한, 본 명세서에 설명된 실시예들에 한정되는 것으로 해석되어서는 아니 되며, 본 발명의 사상 및 기술 범위에 포함되는 모든 변경물, 균등물 내지 대체물을 포함하는 것으로 이해되어야 한다.Specific structural or functional descriptions presented in the embodiments of the present invention are merely exemplified for the purpose of explaining embodiments according to the concept of the present invention, and embodiments according to the concept of the present invention may be implemented in various forms. In addition, it should not be construed as being limited to the embodiments described in this specification, but should be understood to include all modifications, equivalents, or substitutes included in the spirit and scope of the present invention.

한편, 본 발명에서 제1 및/또는 제2 등의 용어는 다양한 구성요소들을 설명하는데 사용될 수 있지만, 상기 구성요소들은 상기 용어들에 한정되지는 않는다. 상기 용어들은 하나의 구성요소를 다른 구성요소들과 구별하는 목적으로만, 예컨대 본 발명의 개념에 따른 권리 범위로부터 벗어나지 않는 범위 내에서, 제1 구성요소는 제2 구성요소로 명명될 수 있고, 유사하게 제2 구성요소는 제1 구성요소로도 명명될 수 있다.Meanwhile, in the present invention, terms such as first and/or second may be used to describe various elements, but the elements are not limited to the above terms. The above terms are used only for the purpose of distinguishing one component from other components, for example, within a range not departing from the scope of rights according to the concept of the present invention, a first component may be referred to as a second component, Similarly, the second component may also be referred to as the first component.

이하 첨부된 도면을 참조하여 본 발명의 실시예를 설명한다. 본 발명의 실시예를 설명함에 있어서, 관련된 공지기능 혹은 구성에 대한 설명이 본 발명의 요지를 불필요하게 흐릴 수 있다고 판단되는 경우 그 설명을 생략하였다.Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. In describing the embodiments of the present invention, if it is determined that a description of a related known function or configuration may unnecessarily obscure the subject matter of the present invention, the description is omitted.

도 1은 본 발명의 일 실시예에 따른 구동회로가 집적된 발광소자(10)를 나타낸 도면이다. 도 1에 도시된 바와 같이, 본 발명의 일 실시예에 따른 구동회로가 집적된 발광소자(10)는 구동회로 영역(110)과 발광소자 영역(120)을 포함하는 원칩소자로 집적한 것이다.1 is a diagram showing a light emitting device 10 integrated with a driving circuit according to an embodiment of the present invention. As shown in FIG. 1 , a light emitting device 10 integrated with a driving circuit according to an embodiment of the present invention is integrated as a one-chip device including a driving circuit area 110 and a light emitting device area 120 .

본 실시예에 따른 구동회로가 집적된 발광소자는 기판 상에 데이터 라인과 Select 배선이 연결되어 스위칭 동작하는 제1 Pixel circuit 영역 및 상기 제1 Pixel circuit 영역 상에 적층되어 발광소자를 점등시키는 일부 구동회로를 발광소자와 원칩 소자로 집적하는 제2 Pixel circuit 영역을 포함한다.In the light emitting device integrated with the driving circuit according to the present embodiment, a first pixel circuit region in which a data line and a select wire are connected on a substrate and operated for switching, and a part driving circuit stacked on the first pixel circuit region and turning on the light emitting element It includes a second pixel circuit area for integrating the furnace into a light emitting device and a one-chip device.

제1 Pixel circuit 영역은 기판 상에 데이터 라인(Vdata)이 형성되는 제1 영역; 상기 제1 영역 상에 적층되어 전원라인(Vdd), Select 배선이 형성되는 제2 영역; 상기 제2 영역 상에 적층되어 그라운드 배선이 형성되는 제3 영역; 상기 데이터 라인과 Select 배선이 연결되어 스위칭 동작하는 제1 박막 트랜지스터(TFT);를 포함한다.The first pixel circuit area includes a first area where a data line Vdata is formed on the substrate; a second region stacked on the first region to form a power line (Vdd) and a select wiring; a third region stacked on the second region to form a ground wire; A first thin film transistor (TFT) connected to the data line and the select wire to perform a switching operation.

제2 Pixel circuit 영역은 상기 제1 Pixel circuit 영역의 전원라인과 제1 박막 트랜지스터 및 그라운드 배선에 연결되는 제2 박막 트랜지스터(TFT);를 포함하는 구동회로 영역과 발광소자 영역을 원칩소자로 집적한 형태이다. 이러한 제2 Pixel circuit 영역은 기판에 GaN을 채널로 하는 TFT 및 발광소자와 연결하는 구동회로의 일부를 발광소자와 집적하는 원칩 소자이다.The second pixel circuit area is a driving circuit area including a second thin film transistor (TFT) connected to the power supply line, the first thin film transistor, and ground wiring of the first pixel circuit area, and the light emitting device area integrated into a single-chip device. It is a form. This second pixel circuit region is a one-chip device in which a TFT using GaN as a channel and a part of a driving circuit connected to a light emitting device are integrated with a light emitting device on a substrate.

도 2는 본 발명의 일 실시예에 따른 구동회로가 집적된 발광소자의 세부 구성을 나타낸 도면이다. 도 2에 도시된 바와 같이, 구동회로 영역(110)은 제1 영역(111), 제2 영역(112), 제3 영역(113), 제1 박막 트랜지스터(114), 제2 박막 트랜지스터(115), 캡부재(116)를 포함한다.2 is a diagram showing a detailed configuration of a light emitting device integrated with a driving circuit according to an embodiment of the present invention. As shown in FIG. 2 , the driving circuit region 110 includes a first region 111 , a second region 112 , a third region 113 , a first thin film transistor 114 , and a second thin film transistor 115 . ), and a cap member 116.

제1 영역(111)은 기판 상에 데이터 라인(Vdata)이 형성된다. 이러한 제1 영역의 데이터 라인은 구동회로 영역과 발광소자 영역이 연결된다. 원칩소자의 커패시터와 제1 박막 트랜지스터의 일부분(n-mos에서는 Source, p-mos에서는 Drain )과 적층된다. In the first region 111 , a data line Vdata is formed on the substrate. The data line of the first area connects the driving circuit area and the light emitting device area. It is stacked with the capacitor of the one-chip device and a part of the first thin film transistor (Source in n-mos, Drain in p-mos).

제2 영역(112)은 제1 영역 상에 적층되어 전원라인(Vdd), Select 배선이 형성된다. TFT array의 VDD와 원칩소자의 Vdd선과 적층 연결된다. The second region 112 is stacked on the first region to form a power line (Vdd) and a select wiring. The VDD of the TFT array and the Vdd line of the one-chip device are stacked and connected.

제3 영역(113)은 제2 영역 상에 적층되어 그라운드 배선이 형성된다. 이러한 제3 영역의 그라운드 배선은 구동회로 영역과 발광소자 영역이 연결된다. 또한 제3 영역은 전원라인(Vdd)와 제2 박막 트랜지스터를 연결하고, 캡부재와 연결되어 제1 박막 트랜지스터를 연결한다. 제 3영역은 TFT의 GND와 원칩소자 내의 GND와 적층되어 연결된다.The third region 113 is stacked on the second region to form a ground wire. The ground wiring of the third area connects the driving circuit area and the light emitting device area. Also, the third region connects the power line Vdd and the second thin film transistor, and is connected to the cap member to connect the first thin film transistor. The third region is stacked and connected to the GND of the TFT and the GND of the one-chip device.

제1 박막 트랜지스터(114)는 제1 영역의 데이터 라인과 제2 영역의 Select 배선이 연결되어 스위칭 동작하는 스위칭 박막 트랜지스터(TFT)이다.The first thin film transistor 114 is a switching thin film transistor (TFT) in which the data line of the first area and the select line of the second area are connected to perform a switching operation.

제2 박막 트랜지스터(115)는 제2 영역의 전원라인과 제1 트랜지스터 및 제3 영역의 그라운드 배선에 연결되어 발광소자를 점등시키는 구동 박막 트랜지스터(TFT)이다. 본 실시예에 따른 구동회로 영역에서, 제2 박막 트랜지스터가 GaN을 이용한 3D 적층 구조이다. 이러한 적층구조(3D 구조)로 인해 구동회로(Pixel circuit)의 면적을 줄일 수 있다. 이로써 마이크로 LED 디스플레이의 해상도를 높일 수 있다. 즉, 원칩소자와 TFT array 와 적층하여 pixel circuit의 면적을 줄여 해상도를 높일 수 있다.The second thin film transistor 115 is a driving thin film transistor (TFT) connected to the power line of the second region, the first transistor, and the ground wiring of the third region to turn on the light emitting device. In the driving circuit region according to the present embodiment, the second thin film transistor has a 3D stacked structure using GaN. Due to this layered structure (3D structure), the area of the driving circuit (Pixel circuit) can be reduced. As a result, the resolution of the micro LED display can be increased. In other words, it is possible to increase the resolution by reducing the area of the pixel circuit by stacking the one-chip device and the TFT array.

도 3은 본 발명의 일 실시예에 따른 구동회로가 집적된 발광소자의 구동회로 영역을 설명하기 위한 도면이다. 도 3에 도시된 바와 같이, 제1 박막 트랜지스터(114)와 제2 박막 트랜지스터(115)는 원칩소자를 제작할 때, p-GaN을 이용한 트랜지스터로, 제1 박막 트랜지스터(114)의 게이트는 Select 배선에 연결되고, 드레인이 데이터 라인(Vdata)에 연결되며, 소스는 제2 박막 트랜지스터의 게이트와 연결된다.3 is a diagram for explaining a driving circuit region of a light emitting device in which a driving circuit according to an embodiment of the present invention is integrated. As shown in FIG. 3, the first thin film transistor 114 and the second thin film transistor 115 are transistors using p-GaN when a one-chip device is manufactured, and the gate of the first thin film transistor 114 is selected wiring. , a drain is connected to the data line (Vdata), and a source is connected to the gate of the second thin film transistor.

도 3의 제2 박막 트랜지스터(115)는 nmos 또는 pmos 형태에 따라 소스와 드레인의 연결형태가 달라지게 되는데, 도 6에 도시된 바와 같이 소스 또는 드레인은 발광소자와 연결되고, 소스 또는 드레인은 전원라인(Vdd)과 연결된다. 이때, 제1 박막 트랜지스터와 제2 박막 트랜지스터의 게이트 사이 단에 전원라인(Vdd) 또는 LED/LET에 연결되는 커패시터를 포함한다.The connection type of the source and drain of the second thin film transistor 115 of FIG. 3 varies depending on the type of nmos or pmos. As shown in FIG. 6, the source or drain is connected to the light emitting element, and the source or drain is connected to the power source. It is connected to line (Vdd). At this time, a capacitor connected to the power supply line (Vdd) or LED/LET is included between the gates of the first thin film transistor and the second thin film transistor.

본 실시예에서는 제1 박막 트랜지스터는 스위칭 기능을 위한 구성이고, 제2 박막 트랜지스터는 구동을 위한 구성으로 연결관계를 언급하였지만, 이에 한정되는 되는 것은 아닌 바, 그 연결관계에 있어서, 제2 박막 트랜지스터를 스위칭 기능으로 구성할 수 있고, 제1 박막 트랜지스터를 구동을 위한 구성으로 변경할 수 있다.In this embodiment, the first thin film transistor is a configuration for a switching function, and the second thin film transistor is a configuration for driving. Although the connection relationship is mentioned, it is not limited thereto, and in the connection relationship, the second thin film transistor can be configured as a switching function, and can be changed to a configuration for driving the first thin film transistor.

본 실시예에 따른 제1 및 제2 박막 트랜지스터는 상황에 따라 n-GaN 채널을 이용한 N MOS회로 또는 p-GaN 채널을 이용한 P MOS회로일 수도 있다.The first and second thin film transistors according to the present embodiment may be N MOS circuits using n-GaN channels or P MOS circuits using p-GaN channels, depending on circumstances.

캡부재(116)는 제1 영역(111), 제2 영역(112), 제3 영역(113), 제1 박막 트랜지스터와 제2 박막 트랜지스터를 결합하여 전원라인을 연결하는 구성이다. 도 2의 1, 2, 3번을 통해 TFT array와 원칩소자가 적층되어, 회로가 구성된다. 캡부재의 위치는 회로상의 커패시터를 원칩소자내에 집적한 위치이다.The cap member 116 is configured to connect the power line by combining the first region 111, the second region 112, the third region 113, the first thin film transistor and the second thin film transistor. Through numbers 1, 2, and 3 in FIG. 2, a TFT array and a one-chip device are stacked to form a circuit. The position of the cap member is the position where the capacitor on the circuit is integrated into the one-chip device.

도 2의 좌측에 원칩소자(1,2,3)을 설명하면, 원칩소자의 (1) 위치는 커패시터의 위치이고, 원칩소자의 (2)는 VDD, (3)은 GND이고, 우측은 적층된 구조를 2d형태로 나타낸 것이다.If the one-chip elements 1, 2, and 3 are described on the left side of FIG. 2, the position (1) of the one-chip element is the position of the capacitor, (2) of the one-chip element is VDD, (3) is GND, and the right side is stacked. The structure is shown in 2d form.

발광소자 영역(120)은 마이크로 LED 또는 LET(Light Emitting Transister)로, 발광소자의 크기는 마이크로 LED크기를 유지하면서, 원칩소자는 mini-LED급 크기이므로 마이크로 LED 디스플레이에서의 전사문제를 해결할 수 있다.The light emitting element area 120 is a micro LED or light emitting transistor (LET), and the size of the light emitting element maintains the size of the micro LED while the one-chip element is the size of a mini-LED, so the transfer problem in the micro LED display can be solved. .

도 4는 본 발명의 다른 실시예에 따른 구동회로가 집적된 발광소자를 나타낸 도면이다. 도 4에 도시된 바와 같이, 원칩소자에 적어도 두 개 이상의 발광소자 및 해당 구동회로를 활용할 수 있고, repair 공정에도 쉽게 활용할 수 있다. 4 is a view showing a light emitting device integrated with a driving circuit according to another embodiment of the present invention. As shown in FIG. 4 , at least two or more light emitting devices and corresponding driving circuits can be used in a one-chip device, and can be easily used in a repair process.

또한 본 발명의 일 실시예에 따른 구동회로가 집적된 발광소자는 2T1C pixel circuit 뿐만 아니라, 6T1C, 6T2C, 7T1C 등 다양한 보상회로를 이용할 수 있다. In addition, a light emitting device integrated with a driving circuit according to an embodiment of the present invention may use not only a 2T1C pixel circuit, but also various compensation circuits such as 6T1C, 6T2C, and 7T1C.

도 5는 본 발명의 일 실시예에 따른 구동회로가 집적된 발광소자의 원칩소자 형태의 절단면을 간략히 나타낸 도면이다. 도 5의 (a)는 nmos 채널형성을 위한 형태이고, (b)는 pmos 채널 형성을 위한 구조이다. 즉, 본 실시예에 따른 구동회로가 집적된 발광소자는 원칩소자로 제작할 때, GaN을 이용하여 트랜지스터를 만들어 기판에 GaN을 채널로 하는 TFT 및 발광소자와 연결하는 구동회로의 일부를 발광소자와 집적하는 원칩 소자이다. 도 5의 MQW는 Multi Quantum Wells 발광층으로 이에 대한 설명은 생략하기로 한다.5 is a view schematically illustrating a cut surface of a one-chip device shape of a light emitting device integrated with a driving circuit according to an embodiment of the present invention. (a) of FIG. 5 is a form for forming an nmos channel, and (b) is a structure for forming a pmos channel. That is, when the light emitting device integrated with the driving circuit according to the present embodiment is manufactured as a one-chip device, a transistor is made using GaN and a part of the driving circuit connecting the TFT using GaN as a channel and the light emitting element is formed on the substrate with the light emitting element. It is an integrated one-chip device. The MQW of FIG. 5 is a Multi Quantum Wells light emitting layer, and a description thereof will be omitted.

도 6은 본 발명의 일 실시예에 따른 구동회로가 집적된 발광소자의 트랜지스터 회로를 설명하기 위한 도면이다. 도 6에 도시된 바와 같이, M1, M2소자가 있는 부분이 nmos회로이고, M3, M4 소자가 있는 부분이 pmos회로이다.6 is a diagram for explaining a transistor circuit of a light emitting device integrated with a driving circuit according to an embodiment of the present invention. As shown in FIG. 6, the part where the M1 and M2 elements are located is the nmos circuit, and the part where the M3 and M4 elements are located is the pmos circuit.

도 7은 본 발명의 일 실시예에 따른 구동회로가 집적된 발광소자의 원칩 소자 형태를 나타낸 도면이다. 도 7에 나타낸 원칩소자(a)는 nmos 형태이고, (b)는 pmos 형태이다.7 is a view showing a one-chip device form of a light emitting device integrated with a driving circuit according to an embodiment of the present invention. The one-chip device (a) shown in FIG. 7 is an nmos type, and (b) is a pmos type.

이상에서 설명한 본 발명은 전술한 실시예 및 첨부된 도면에 의해 한정되는 것이 아니고, 본 발명의 기술적 사상을 벗어나지 않는 범위 내에서 여러 가지 치환, 변형 및 변경이 가능함은 당업자에게 명백할 것이다.The present invention described above is not limited by the above-described embodiments and the accompanying drawings, and various substitutions, modifications, and changes are possible without departing from the technical spirit of the present invention will be apparent to those skilled in the art.

110 : 구동회로 영역
111 : 제1 영역
112 : 제2 영역
113 : 제3 영역
114 : 제1 박막 트랜지스터
115 : 제2 박막 트랜지스터
116 : 캡부재
120 : 발광소자 영역
110: driving circuit area
111: first area
112: second area
113: third area
114: first thin film transistor
115: second thin film transistor
116: cap member
120: light emitting element area

Claims (8)

기판 상에 데이터 라인이 형성되는 제1 영역과, 상기 제1 영역 상에 적층되어 전원라인(Vdd), Select 배선이 형성되는 제2 영역, 상기 제2 영역 상에 적층되어 그라운드 배선이 형성되는 제3 영역, 상기 데이터 라인과 select 배선이 연결되어 스위칭 동작하는 제1 박막 트랜지스터(TFT)를 포함하는 제1Pixel circuit 영역; 및
상기 제1 Pixel circuit 영역 상에 적층되어 상기 제1 Pixel circuit 영역의 전원라인과 제1 박막 트랜지스터 및 그라운드 배선에 연결되는 제2 박막 트랜지스터(TFT)를 포함하는 제2 Pixel circuit 영역;을 포함하며,
상기 제1 내지 제3 영역, 제1 박막 트랜지스터(TFT)와 제2 박막 트랜지스터(TFT)를 결합하여 전원라인을 연결하는 캡부재를 포함하고,
상기 제2 영역은 TFT array의 Vdd와 원칩소자의 Vdd선과 적층 연결되며,
상기 제3 영역은 전원라인(Vdd)와 제2 박막 트랜지스터(TFT)를 연결하고, 상기 캡부재와 연결되어 제1 박막 트랜지스터(TFT)를 연결하되, TFT의 GND와 원칩소자 내의 GND와 적층되어 연결되어 발광소자를 점등시키는 일부 구동회로를 발광소자와 원칩 소자로 집적하는 것을 특징으로 하는 구동회로가 집적된 발광소자.
A first region in which data lines are formed on the substrate, a second region in which a power supply line (Vdd) and a select wiring are formed on the first region, and a ground wiring in the second region are formed. 3 area, a first pixel circuit area including a first thin film transistor (TFT) connected to the data line and the select line to perform a switching operation; and
a second pixel circuit area including a second thin film transistor (TFT) stacked on the first pixel circuit area and connected to a power line, a first thin film transistor, and a ground wire of the first pixel circuit area;
A cap member connecting a power line by combining the first to third regions, a first thin film transistor (TFT) and a second thin film transistor (TFT),
The second region is stacked and connected to the Vdd line of the TFT array and the Vdd line of the one-chip device,
The third region connects the power supply line (Vdd) and the second thin film transistor (TFT), and is connected to the cap member to connect the first thin film transistor (TFT), and is stacked with the GND of the TFT and the GND of the one-chip device. A light emitting device integrated with a driving circuit characterized in that some driving circuits that are connected and turn on the light emitting device are integrated into a light emitting device and a one-chip device.
삭제delete 삭제delete 제1항에 있어서,
상기 발광소자는 마이크로 LED 또는 LET(Light Emitting Transister)인 것을 특징으로 하는 구동회로가 집적된 발광소자.
According to claim 1,
The light emitting element is a light emitting element integrated with a driving circuit, characterized in that the micro LED or LET (Light Emitting Transister).
제1항에 있어서,
상기 원칩 소자는 mini-LED급 크기인 것을 특징으로 하는 구동회로가 집적된 발광소자.
According to claim 1,
The one-chip device is a light emitting device integrated with a driving circuit, characterized in that the mini-LED class size.
제1항에 있어서,
상기 원칩 소자에 적어도 두 개 이상의 발광소자 및 해당 구동회로를 포함하는 것을 특징으로 하는 구동회로가 집적된 발광소자.
According to claim 1,
A light emitting device integrated with a driving circuit, characterized in that the one-chip device includes at least two or more light emitting devices and corresponding driving circuits.
삭제delete 제1항에 있어서,
상기 제2 Pixel circuit 영역은
기판에 GaN을 채널로 하는 TFT 및 발광소자와 연결하는 구동회로의 일부를 발광소자와 집적하는 원칩 소자인 것을 특징으로 하는 구동회로가 집적된 발광소자.
According to claim 1,
The second pixel circuit area is
A light emitting device integrated with a driving circuit characterized in that it is a one-chip device in which a part of a driving circuit connecting a TFT using GaN as a channel and a light emitting device is integrated with a light emitting device on a substrate.
KR1020210021396A 2021-02-17 2021-02-17 Light-emitting device with integrated driving circuit KR102485573B1 (en)

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