KR102480574B1 - System of manufacturing high concentrated chlorine deoxide - Google Patents

Abstract

In the present invention, the process of dissolving chlorine dioxide gas having excellent sterilization power into nano-bubble potential water, recovering the undissolved chlorine dioxide gas, and re-injecting it into nano-bubble potential water connected in series in the following order to dissolve it is repeated in multiple steps. It is a closed-loop operation method, and it is easy to control the concentration with high-concentration chlorine dioxide water. It produces a large amount of pure chlorine dioxide gas in a small volume, and the remaining chlorine dioxide gas is neutralized and decomposed through collection and multi-stage treatment, and converted to a harmless state before being returned to the atmosphere. It relates to a system for producing high-concentration chlorine dioxide water that is operated in an environmentally friendly manner because it emits a potential water generator that generates nano-bubble potential water in which oxygen converted to a highly activated state by applying a high-voltage potential is dissolved in nano-bubble form in purified water, a A chlorine dioxide generator that generates chlorine dioxide in a pressure-maintained state by mixing sodium chlorate and anhydrous citric acid, is connected to the potential water generator and the chlorine dioxide generator, respectively, and is supplied with nanobubble potential water from the potential water generator A chlorine water preparation unit that receives chlorine dioxide from the chlorine dioxide generation unit and produces chlorine dioxide in multiple stages in a closed loop. It is connected to the chlorine water preparation unit and discharges the chlorine dioxide water produced in multiple stages at a fixed rate, respectively. It monitors each functional part constituting the water manufacturing system and quickly dissolves chlorine dioxide gas in nano-bubble potential water with high activity by the feature including a quantitative control control unit that outputs the corresponding control signal, so that chlorine dioxide water is rapidly mass-produced. By repeating the process of recovering chlorine dioxide gas remaining undissolved in nano-bubble potential water and re-dissolving it in nano-bubble potential water in a multi-step process, it is easy to control the purity of chlorine dioxide water and using a small amount of chlorine dioxide gas It produces a large amount of chlorine dioxide water quickly, forcibly captures excess chlorine dioxide gas, neutralizes it, decomposes it in a harmless state by processing it with a high-temperature filter, and releases it into the atmosphere, so the production process is very eco-friendly.

Description

System of manufacturing high concentrated chlorine dioxide

The present invention relates to a system for producing high-concentration chlorine dioxide water, and more particularly, by dissolving chlorine dioxide gas having excellent sterilizing power into nano-bubble potential water, and recovering the remaining undissolved chlorine dioxide gas to form nano-bubbles connected in series in the following order. It is a closed-loop method in which the process of re-injecting into potential water and dissolving it is operated repeatedly in multiple steps. It is about a high-concentration chlorine dioxide production system that is operated in an eco-friendly way because it is converted into a harmless state by neutralization and decomposition and then released into the atmosphere.

Chlorine dioxide is superior to other chlorine-based disinfectants in disinfection, bleaching, decolorization and deodorization effects due to its strong oxidizing power. In addition, it does not generate carcinogenic organohalogen-based compounds such as trihalomethanes (THMs), haloacetanitriles (HANs), and haloacetac acids (HAAs), and reacts with other organic substances present in water to form organic chlorine-based compounds. Since it does not produce compounds, it is widely used as a disinfectant and deodorizer for tap water and wastewater at water purification plants. In addition, since it is quickly decomposed by sunlight or temperature and does not have residual oil, it is also known as an eco-friendly disinfectant, and interest in it has recently increased.

In places where tens of tons of chlorine dioxide per day is required for bleaching and decoloring of pulp and fibers, sodium chlorate (NaClO3) produced by non-film high-temperature electrolysis of salt and sulfurous acid gas as reducing agents, hydrochloric acid, methyl alcohol, and hydrogen peroxide formalin are used. To prepare chlorine dioxide (ClO2), the reaction schemes are as shown in Chemical Formula 1 and Chemical Formula 2 below.

(Formula 1)

2NaClO3 + H2SO3 → 2ClO2 + Na2SO4 + H2O

(Formula 2)

2NaClO3 + 4HCl → 2ClO2 + 2NaCl + 2H2O

This large-capacity chlorine dioxide manufacturing method is a large-scale facility industry that requires equipment and equipment for large facilities such as salt refinery facilities, salt electrolysis facilities, and sulfurous acid gas generating facilities, so it could not be used where a relatively small amount of chlorine dioxide is required.

When tens to hundreds of Kg of chlorine dioxide is required per day, the method of manufacturing chlorine dioxide using sodium chlorite as a raw material is adopted, so the facility and equipment costs are relatively inexpensive and simple. In this case, chlorine, hydrochloric acid, Sodium hypochlorite and the like were used.

On the other hand, in the case of producing chlorine dioxide using sodium chlorite and chlorine, the following reaction formula (3) is applied.

(Formula 3)

2NaClO2 +Cl2 → 2ClO2 + 2NaCl

However, when chlorine dioxide is produced in the same way as in Chemical Formula 3, it is very dangerous to deal with toxic and high-pressure chlorine gas, and safety facilities and professional personnel must be deployed in case of chlorine leakage, and low-concentration chlorine dioxide with low concentration There is a problem in that it is difficult to prepare a small amount of an aqueous solution.

In addition, another method of producing chlorine dioxide is to use sodium chlorite and sulfuric acid or hydrochloric acid, and the following reaction formulas (4) and (5) are applied.

(Formula 4)

5NaClO2 + H2SO4 → 4ClO2 + 2Na2SO4 + NaCl + 2H2O

(Formula 5)

5NaClO2 + 4HCl → 4ClO2 + 5NaCl + 2H2O

(Formula 6)

2NaClO2 + NaClO + H2SO4 → 2ClO2 + Na2SO4 + NaCl + H2O

(Formula 7)

2NaClO2 + NaClO + 2HCl → 2ClO2 + 3NaCl + H2O

Chlorine dioxide production apparatus using Chemical Formula 6 or 7 appropriately controls the ratio and concentration of reactants, rapid and uniform mixing of reactants, concentration of acid, etc. by-products such as ClO2-, ClO3-, Cl2, ClO-, Cl- to minimize

On the other hand, in this reaction scheme, when chlorite and sulfuric acid or inorganic hydrochloric acid are at a certain concentration or higher, the heterogeneous decomposition reaction of chlorite occurs quickly, and hypochlorous acid (HClO) and chloric acid (HClO3) are generated as shown in the chemical formula 8 below.

(Formula 8)

2NaClO2 + 2HCl → HClO3 + HClO + 2NaCl

In addition, there is a problem in that it is relatively difficult to find out or secure the reaction conditions in which these reactions occur well and the progress conditions in which the reaction proceeds well.

As a prior art that partially solves these problems, there is a 'sterilizing water manufacturing device using chlorine dioxide' according to Korean Patent Registration No. 10-1870282 (2018. 06. 18.).

1 is a functional block diagram of an apparatus for producing chlorine dioxide water according to an embodiment of the prior art.

Hereinafter, the accompanying drawings will be described in detail. After the raw material 10 of chlorine dioxide is injected into the reaction tank by the raw material pump 40, the chlorine dioxide generated by the electric reaction is transmitted through the air pump 20 and the three-terminal valve 50. is driven and transferred to the storage container 200 to generate chlorine dioxide water. Chlorine dioxide water is injected into the water pipe 70 through which water flows by the control pump 300 and the first venturi injector 500 and diluted, and injected into the sensor module 100 by the second venturi injector 600. The concentration is detected, and the control pump 300 is controlled by the detected concentration, thereby controlling the concentration of chlorine dioxide.

The prior art has the advantage of conveniently handling the dilution of the generated chlorine dioxide water, but problems such as difficulty in maintaining the accuracy of the concentration still remain.

Therefore, it is necessary to develop a technology that efficiently uses a small amount of chlorine dioxide gas and uses potential water with high activity to easily control the purity and safely and repeatedly produces high-purity chlorine dioxide in an eco-friendly manner.

Republic of Korea Patent Application No. 10-2018-0064201 (2018. 06. 04.) ‘Chlorine dioxide water manufacturing device’ Republic of Korea Patent Application No. 10-2018-0038352 (2018. 04. 02.) ‘Method for producing pure chlorine dioxide aqueous solution and apparatus for producing the same’ Republic of Korea Patent Registration No. 10-1162536 (2012. 06. 28.) ‘Green-friendly sterilization disinfectant that does not produce THMs, chlorine dioxide aqueous solution production device and its manufacturing method’

The present invention, which was devised to solve the problems and needs of the prior art as described above, is to provide a high-concentration chlorine dioxide water production system that rapidly produces chlorine dioxide water by quickly dissolving chlorine dioxide gas in highly active nanobubble potential water. that's the purpose

On the other hand, the present invention recovers the remaining chlorine dioxide gas that is not dissolved in the highly active nano-bubble potential water in the production of chlorine dioxide water and repeats the process of dissolving it in the nano-bubble potential water in the next step in multiple steps, so that the purity of the chlorine dioxide water can be adjusted. Its object is to provide a high-concentration chlorine dioxide water production system that quickly produces a large amount of chlorine dioxide water using a small amount of chlorine dioxide gas.

In addition, the present invention forcibly captures and neutralizes excess chlorine dioxide gas in the process of producing chlorine dioxide water, processes it with a high-temperature filter, decomposes it in a harmless state to the human body, and releases it into the atmosphere, so that the production process is very environmentally friendly. Its purpose is to provide

The chlorine dioxide water production system of the present invention, devised to achieve the above object, is a potential water that generates nanobubble potential water in which oxygen converted to a highly activated state by applying a high voltage potential is dissolved in the purified water in the form of nanobubbles. generating unit 1000; A chlorine dioxide generating unit (2000) for generating chlorine dioxide under pressure by mixing sodium chlorite and anhydrous citric acid; It is connected and installed to the potential water generator 1000 and the chlorine dioxide generator 2000 respectively, receives nano-bubble potential water from the potential water generator 1000, and supplies chlorine dioxide from the chlorine dioxide generator 2000. Chlorine water preparation unit 3000 for receiving and producing chlorine dioxide in multiple stages of a closed loop; Quantitative adjustment control unit (4000 ); can include

A storage agitation unit 5000 connected to the quantitative control unit 4000 to receive, store, and stir the chlorine dioxide water produced in multiple steps to maintain a uniform concentration; may further include.

The chlorine water preparation unit 3000 and the storage agitation unit 5000 are installed in connection with each other, and the excess chlorine dioxide gas is collected, neutralized, heated, converted into environmentally friendly and harmless air, and then discharged into the atmosphere. Neutralization heating discharge unit ( 6000); may further include.

The potential water generating unit 1000 includes an oxygen generating device 1010 generating oxygen according to a corresponding control signal of the quantitative adjustment control unit 4000; a high voltage generator 1020 generating a high voltage potential signal according to a corresponding control signal of the quantitative adjustment control unit 4000; Purification correction pump 1030 for supplying purified water in a fixed amount according to the corresponding control signal of the quantitative adjustment control unit 4000; An oxygen drying unit 1040 connected to the oxygen generator 1010 and introducing generated oxygen to remove moisture: receiving a high voltage signal from the high voltage generator 1020 and discharging from the oxygen drying unit 1040 Potential generator 1050 for generating activated oxygen by applying a potential to oxygen: An agent connected to the potential generator 1050 and allowing or blocking active oxygen to flow in a selected direction according to a corresponding control signal of the quantitative control unit 4000 1 potential directional valve 1060; A second potential water directional valve 1070 connected to the purified water pump 1030 and allowing or blocking the flow of purified water in a selected direction according to a corresponding control signal of the quantitative adjustment control unit 4000; A first filter 1080 connected to the second directional valve 1070 and filtering foreign substances from the introduced purified water; a nano-bubble potential water production tank 1090 connected to the first filter 1080 and mixing active oxygen with purified water in the form of nano-bubbles to prepare and store nano-bubble potential water; A first level sensor 1100 installed inside the nano-bubble potential water production tank 1090 to measure the level of the incoming purified water and notify the quantitative adjustment control unit 4000; A potential water circulation directional valve 1110 that is connected to the nano-bubble potential water production tank 1090 and circulates nano-bubble potential water in a selected direction according to a corresponding control signal from the quantitative control unit 4000 or blocks the circulation. ; It is connected to the potential water circulation directional valve 1110, and the nanobubble potential water is drawn out from the nanobubble potential water production tank 1090 in a fixed amount according to the corresponding control signal of the quantitative control unit 4000, and the nanobubble potential water again. a nanobubble potential correction volume circulation pump 1120 supplying the production tank 1090; The first potential water directional valve ( a nano bubble generator 1130 which introduces the activated oxygen supplied by 1060) in the form of nano bubbles and supplies it to the nano bubble potential water production tank 1090; a potential water concentration measuring unit 1140 installed inside the nano bubble potential water production tank 1090 and measuring the active oxygen concentration of the nano bubble potential water; A third potential water directional valve (connected to and installed on a part of the lower surface of the nano bubble potential water production tank 1090 and allowing or blocking nano bubble potential water to flow in a selected direction by a corresponding control signal from the quantitative control unit 4000 ( 1150); It is connected to the third potential water directional valve 1150 and by the corresponding control signal of the quantitative adjustment control unit 4000, nano-bubble potential water is quantitatively withdrawn from the nano-bubble potential water production tank 1090, and the chlorine water control unit 3000 ) to supply a nanobubble potential correction amount supply pump 1160; Potential water pressure measurement for measuring the internal pressure of the nano-bubble potential water production tank 1090 connected to the upper part of the nano-bubble potential water production tank 1090 and in accordance with the corresponding control signal of the quantitative adjustment control unit 4000 part 1170; can include

The chlorine dioxide generating unit 2000 includes an agent tank 2010 in which 80 liters of sodium chlorite diluted in purified water with sodium chlorite at a concentration of 24% are stored; An AJ metering pump 2020 connected to the AJ tank 2010 and discharging a fixed amount of sodium chlorite water in response to a corresponding control signal of the AJ tank 2010; An AJ directional valve 2030 connected to the AJ metering pump 2020 and configured to flow or block sodium chlorite water in a selected direction according to a corresponding control signal of the quantitative control unit 4000; A Bizet tank 2040 in which 25 kilograms (Kg) of anhydrous citric acid is dissolved in 40 liters of purified water to store anhydrous citric acid water; A non-jet metering pump 2050 connected to the non-jet tank 2040 and discharging a fixed amount of anhydrous citric acid water according to a corresponding control signal of the quantitative adjustment control unit 4000; A non-made directional valve 2060 connected to the non-made metering pump 2050 and configured to flow or block anhydrous citric acid water in a selected direction according to a corresponding control signal of the quantitative control unit 4000; A BJ reactor 2070 connected to the AJ directional valve 2030 and the BJ directional valve 2060 to receive and react with sodium chlorite and anhydrous citric acid to produce chlorine dioxide; An oxygen generator 2080 generating oxygen according to a corresponding control signal of the quantitative adjustment control unit 4000; An oxygen directional valve 2090 connected to the oxygen generator 2080 and configured to flow or block oxygen generated by a corresponding control signal of the quantitative control unit 4000 in a selected direction; A chlorine gas metering inlet pump 2100 for introducing chlorine dioxide gas in a metered amount according to a corresponding control signal of the metering control unit 4000; Oxygen supplied by the oxygen directional valve 2090 is introduced by the flow of chlorine dioxide gas connected to the lower end of one side of the ABJ reactor 2070 and supplied by the chlorine gas metering inlet pump 2100 in a fixed amount, An oxygen constant pressure venturi unit 2110 supplying the ABJ reactor 2070; A chlorine gas directional valve 2120 connected to one end of the upper side of the ABJ reactor 2070 and configured to flow or block chlorine dioxide gas in a selected direction according to a corresponding control signal of the quantitative control unit 4000; can include

The chlorine water preparation unit 3000 introduces nanobubble potential water from the potential water generation unit 1000 in a fixed amount according to the corresponding control signal of the quantitative control unit 4000, and by the forcibly circulated nanobubble potential water, A first preparation unit 3100 for dissolving chlorine dioxide gas introduced from the chlorine water preparation unit 2000; Nanobubble potential water is introduced in a fixed amount from the potential water generation unit 1000 by the corresponding control signal of the quantitative control control unit 4000, and by the forcibly circulated nanobubble potential water, from the first preparation unit 3100 a second preparation unit 3200 for dissolving the introduced chlorine dioxide gas; The nanobubble potential water is introduced in a fixed amount from the potential water generation unit 1000 by the corresponding control signal of the quantitative adjustment control unit 4000, and the second agent preparation unit 3200 by the forcibly circulated nanobubble potential water. a third preparation unit 3300 for dissolving the introduced chlorine dioxide gas; can include

The first dispensing unit 3100 is a first bi-directional valve that allows or blocks the flow of nanobubble potential water from the potential water generating unit 1000 in a selected direction by a corresponding control signal from the quantitative control unit 4000 ( 3110); The chlorine dioxide gas connected to the first bi-directional valve 3110 and introduced by the corresponding control signal of the quantitative control unit 4000 is dissolved in the nanobubble potential water that is quantitatively introduced from the potential water generator 1000 a first chlorine water tank 3120 to prepare a first chlorine water; A first chlorine water one-way valve (3130) that is connected to the first chlorine water tank 3120 and circulates the first chlorine water in a selected direction in response to a corresponding control signal from the quantitative control unit 4000 or blocks the circulation. ); It is connected to the first chlorine water one-way valve 3130, and the first chlorine water is taken out from the first chlorine water tank 3120 in a fixed amount according to the control signal of the quantitative control unit 4000, and the first chlorine water is returned to the first chlorine water tank 3120. a first chlorine water circulation pump 3140 supplying water to the tank 3120; The chlorine dioxide generator 2000 is supplied by the flow of the first chlorine water connected to the lower end of one side of the first chlorine water tank 3120 and supplied by the first chlorine water circulation pump 3140 in a fixed amount. a first venturi (3150) which introduces chlorine dioxide gas and supplies it to the first chlorine water tank (3120); A first chlorine water level sensor 3160 installed inside the first chlorine water tank 3120 to measure the level of the incoming nanobubble potential water and notify the quantitative adjustment control unit 4000; a first chlorine concentration measuring unit 3170 installed inside the first chlorine water tank 3120 and measuring the concentration of the first chlorine water and notifying the quantitative control unit 4000; A first chlorine pressure measuring unit connected to an upper part of the first chlorine water tank 3120 and measuring the internal pressure of the first chlorine water tank 3120 according to a corresponding control signal from the quantitative control unit 4000 (3180); a first chlorine gas recovery unit 3190 installed inside the first chlorine water tank 3120 and recovering chlorine dioxide gas not dissolved in the first chlorine water; A first chlorine water tank 3120 connected to an upper portion of the first chlorine water tank 3120 and unidirectionally discharging chlorine dioxide gas inside the first chlorine water tank 3120 in response to a corresponding control signal from the quantitative control control unit 4000 1 chlorine gas discharge valve 3192; can include

The second preparation unit 3200 is a second bi-directional valve that allows or blocks the flow of nanobubble potential water from the potential water generator 1000 in a selected direction by a corresponding control signal from the quantitative control unit 4000 ( 3210); The chlorine dioxide gas connected to the second bi-directional valve 3210 and introduced by the corresponding control signal of the quantitative control unit 4000 is dissolved in the nanobubble potential water that is quantitatively introduced from the potential water generator 1000. a second chlorine water tank 3220 for preparing second chlorine water; A second chlorine water one-way valve (3230) installed connected to the second chlorine water tank 3220 and circulating the second chlorine water in a selected direction in response to a corresponding control signal from the quantitative control unit 4000 or blocking the circulation. ); It is connected to the second chlorine water one-way valve 3230, and the second chlorine water is drawn out from the second chlorine water tank 3220 in a fixed amount according to the corresponding control signal of the quantitative control unit 4000, and the second chlorine water is returned again. a second chlorine correction amount circulation pump 3240 supplying the tank 3220; The first preparation unit 3100 is connected to the lower end of one side of the second chlorine water tank 3220 and is connected to the flow of the second chlorine water supplied by the second chlorine water circulation pump 3240 in a fixed amount. a second venturi (3250) for introducing chlorine dioxide gas and supplying it to the second chlorine water tank (3220); A second chlorine water level sensor 3260 installed inside the second chlorine water tank 3220 to measure the level of the incoming nanobubble potential water and notify the quantitative adjustment control unit 4000; a second chlorine water concentration measuring unit 3270 installed inside the second chlorine water tank 3220 and measuring the concentration of the second chlorine water and notifying the quantitative control unit 4000; A second chlorine pressure measurement unit connected to an upper part of the second chlorine water tank 3220 and measuring the internal pressure of the second chlorine water tank 3220 according to a corresponding control signal from the quantitative control unit 4000 (3280); a second chlorine gas recovery unit 3290 installed inside the upper side of the second chlorine water tank 3220 and recovering chlorine dioxide gas not dissolved in the second chlorine water; A device connected to an upper portion of the second chlorine water tank 3220 and unidirectionally discharging chlorine dioxide gas inside the second chlorine water tank 3220 in response to a corresponding control signal from the quantitative control unit 4000 2 chlorine gas discharge valve 3292; a first chlorine gas directional valve 3294 for allowing or blocking the flow of chlorine dioxide gas recovered from the first chlorine water tank 3120 in one direction selected by the corresponding control signal of the quantitative control unit 4000; can include

The third bi-directional valve (the third bi-directional valve ( 3310); The chlorine dioxide gas connected to the third bi-directional valve 3310 and introduced by the corresponding control signal of the quantitative control unit 4000 is dissolved in the nanobubble potential water that is quantitatively introduced from the potential water generator 1000. a third chlorine water tank 3320 for preparing third chlorine water; A third chlorine water one-way valve (3330) installed connected to the third chlorine water tank 3320 and circulating the third chlorine water in a selected one direction according to a corresponding control signal from the quantitative control unit 4000 or blocking the circulation. ); It is connected to the third chlorine water one-way valve 3330, and the third chlorine water is taken out from the third chlorine water tank 3320 in a fixed amount according to the control signal of the quantitative control unit 4000, and the third chlorine water is returned. a third chlorine correction amount circulation pump 3340 supplying the tank 3320; The second preparation unit 3200 is connected to the lower end of one side of the third chlorine water tank 3320 and is connected to the third chlorine water supplied by the third chlorine water circulation pump 3340 in a fixed amount. a third venturi (3350) for introducing chlorine dioxide gas and supplying it to the third chlorine water tank (3320); A third chlorine water level sensor 3360 installed inside the third chlorine water tank 3320 to measure the level of the incoming nanobubble potential water and notify the quantitative adjustment control unit 4000; a third chlorine concentration measuring unit 3370 installed inside the third chlorine water tank 3320 and measuring the concentration of the third chlorine water and notifying the quantitative control unit 4000; A third chlorine pressure measurement unit connected to an upper part of the third chlorine water tank 3320 and measuring the internal pressure of the third chlorine water tank 3320 according to a corresponding control signal from the quantitative control unit 4000 (3380); a third chlorine gas recovery unit 3390 installed inside the upper side of the third chlorine water tank 3320 and recovering chlorine dioxide gas not dissolved in the third chlorine water; A third chlorine water tank 3320 connected to an upper portion of the third chlorine water tank 3320 and unidirectionally discharging chlorine dioxide gas inside the third chlorine water tank 3320 in response to a corresponding control signal from the quantitative control control unit 4000. 3 chlorine gas discharge valve 3392; a second chlorine gas directional valve 3394 for allowing or blocking the flow of chlorine dioxide gas recovered from the second chlorine water tank 3220 in one direction selected by the corresponding control signal of the quantitative control unit 4000; can include

The quantitative adjustment control unit 4000 is a first chlorine water withdrawal valve that allows or blocks the flow of the first chlorine water stored in the first chlorine water tank 3120 of the chlorine water preparation unit 3000 in one direction selected by a corresponding control signal. (4010); a second chlorine water outlet valve 4020 for allowing or blocking the flow of the second chlorine water stored in the second chlorine water tank 3220 of the chlorine water preparation unit 3000 in one direction selected by a corresponding control signal; a third chlorine water withdrawal valve 4030 for allowing or blocking the flow of the third chlorine water stored in the third chlorine water tank 3320 of the chlorine water preparation unit 3000 in one direction selected by the corresponding control signal; A chlorine dioxide central control unit 4040 that monitors each functional unit constituting the high-concentration chlorine dioxide water production system and outputs a corresponding control signal, respectively; A first fixed-rate inlet pump 4050 connected to the first chlorine water withdrawal valve 4010 and injecting the first chlorine water in a fixed amount according to a corresponding control signal of the chlorine dioxide central control unit 4040; a second metering inlet pump 4060 connected to the second chlorine water withdrawal valve 4020 and injecting the second chlorine water in a metered amount according to a corresponding control signal of the chlorine dioxide central control unit 4040; a third constant-rate inlet pump 4070 connected to the third chlorine water withdrawal valve 4030 and injecting the third chlorine water in a fixed amount according to a corresponding control signal of the chlorine dioxide central control unit 4040; A first chlorine water supply valve (4080) connected to the first fixed-rate inlet pump 4050 and allowing or blocking the flow of the first chlorine water introduced in a fixed amount by a corresponding control signal of the chlorine dioxide central control unit 4040 in a selected direction; A second chlorine water supply valve 4090 that is connected to the second fixed-rate inlet pump 4060 and allows or blocks the second chlorine water introduced in a fixed amount by a corresponding control signal from the chlorine dioxide central control unit 4040 in a selected direction; A third chlorine water supply valve 4100 connected to the third fixed-rate inlet pump 4070 and configured to flow or block the third chlorine water introduced in a fixed amount by a corresponding control signal from the chlorine dioxide central control unit 4040 in a selected direction; can include

The storage and agitation unit 5000 is connected to the first chlorine water supply valve 4080, the second chlorine water supply valve 4090, and the third chlorine water supply valve 4100 of the quantitative control and control unit 4000, respectively. A chlorine water production tank for receiving, storing, and mixing the first chlorine water, the second chlorine water, and the third chlorine water into which each predetermined quantity is introduced by the corresponding control signal of the quantitative control unit 4000 to produce chlorine dioxide water ( 5100); It is installed in an inner part of the chlorine water production tank 5100 and measures the level of chlorine dioxide water produced by mixing the first chlorine water, the second chlorine water, and the third chlorine water flowing into each corresponding quantity, and adjusting the quantity A manufacturing tank level sensor 5200 notifying the control unit 4000; a stirring drive unit 5300 installed on an external portion of the chlorine water production tank 5100 and adjusting the rotational speed of a corresponding drive shaft in response to a corresponding control signal from the quantitative control unit 4000; A rotation agitation unit 5400 that is installed in a rotational state at an inner part of the chlorine water production tank 5100 and rotationally drives the agitation blades 5410 by receiving the rotational driving force of the agitation drive unit 5300 connected thereto; A discharge valve 5500 connected to a lower portion of the chlorine water production tank 5100 and discharging chlorine dioxide water produced by the corresponding control signal of the quantitative control control unit 4000; A gas discharge valve 5600 connected to an upper part of the chlorine water production tank 5100 and discharging or blocking chlorine dioxide gas in a selected direction according to a corresponding control signal of the quantitative control unit 4000; can include

The neutralization heating and discharging unit 6000 introduces the chlorine dioxide gas discharged from the chlorine water preparation unit 3000 and the chlorine dioxide gas discharged from the storage stirring unit 5000, respectively, and neutralizes the chlorine gas with sodium thiosulfate to obtain 1 Chlorine neutralization unit 6100 to purify tea; a neutralized gas metering discharge pump 6200 connected to the chlorine neutralization unit 6100 and discharging neutralized gas in a metered amount according to a corresponding control signal of the metering control unit 4000; a heating filter unit 6300 connected to the neutral gas metering discharge pump 6200, heating the inflow gas to a high temperature to secondarily purify it, filtering foreign substances, tertiarily purifying it, and discharging it into the atmosphere; can include

The present invention having the configuration as described above has the advantage of rapidly generating a large amount of chlorine dioxide water because the chlorine dioxide gas is quickly dissolved in the highly active nanobubble potential water.

On the other hand, the present invention recovers the remaining chlorine dioxide gas that is not dissolved in the highly active nanobubble potential water and repeats the process of dissolving it in the nanobubble potential water in the next step in multiple steps, so it is easy to control the purity of the chlorine dioxide water and There is an advantage in rapidly producing a large amount of chlorine dioxide water using chlorine dioxide gas.

In addition, the present invention forcibly collects and neutralizes excess chlorine dioxide gas, processes it with a high-temperature filter, decomposes it in a state harmless to the human body, and releases it into the atmosphere, so the production process is very environmentally friendly.

1 is a functional block diagram of an apparatus for producing chlorine dioxide water according to an embodiment of the prior art;
2 is a functional block diagram of a system for producing high-concentration chlorine dioxide water according to an embodiment of the present invention;
3 is a detailed functional configuration diagram of a potential number generation unit according to an embodiment of the present invention;
4 is a detailed functional configuration diagram of a chlorine dioxide generator according to an embodiment of the present invention;
5 is a detailed functional configuration diagram of a chlorine water preparation unit according to an embodiment of the present invention;
6 is a detailed functional configuration diagram of a quantitative control unit according to an embodiment of the present invention;
7 is a detailed functional configuration diagram of a storage stirring unit according to an embodiment of the present invention;
And
8 is a detailed functional configuration diagram of a neutralization heating discharge unit according to an embodiment of the present invention.

Since the present invention can apply various transformations and have various embodiments, specific embodiments will be illustrated in the drawings and described in detail in the detailed description. However, this is not intended to limit the present invention to specific embodiments, and should be understood to include all conversions, equivalents, or substitutes included in the spirit and scope of the present invention. In describing the present invention, if it is determined that a detailed description of related known technologies may obscure the gist of the present invention, the detailed description will be omitted.

Hereinafter, quantification means a state in which a predetermined capacity flows at a predetermined speed, and the corresponding value of quantification may be different depending on each functional unit, but it will be consistently expressed as quantification.

2 is a functional configuration diagram of a high-concentration chlorine dioxide water production system according to an embodiment of the present invention, FIG. 3 is a detailed functional configuration diagram of a potential water generator according to an embodiment of the present invention, and FIG. It is a detailed functional configuration diagram of a chlorine dioxide generation unit according to an embodiment, and FIG. 5 is a detailed functional configuration diagram of a chlorine water preparation unit according to an embodiment of the present invention, and FIG. 6 is a quantitative control control unit according to an embodiment of the present invention 7 is a detailed functional configuration diagram of the storage agitation unit according to an embodiment of the present invention, and FIG. 8 is a detailed functional configuration diagram of the neutralization heating discharge unit according to an embodiment of the present invention.

The sterilization or disinfection process completely kills or destroys bacteria distributed on the surface or inside of the object to be protected. Sterilization is the process of making it sterile, and disinfection is the surface of the object to be protected. Or it is a process that makes it safe because it kills the pathogens inside and removes the power of transmission or infection, and sterilization is the safest form of disinfection.

That is, disinfection is a process of preventing contamination by microorganisms by suppressing infectivity by removing or inactivating pathogenic microorganisms (hereinafter referred to as 'microorganisms'), and sterilization is a process of completely removing all microorganisms to make them sterile It is a process, and since general microorganisms have weak resistance when exposed to the outside world or the atmosphere, they can be removed more easily than non-pathogenic microorganisms.

Microorganisms have different resistance to sterilization depending on their type. In particular, in the case of spore-forming bacteria, they remain dormant under normal sterilization conditions and proliferate again when conditions improve, and even bacteria of the same type can be used in food, blood, and phlegm. When coexisting with protein, such as feces, the resistance becomes much stronger than when suspended in physiological saline.

When pathogens are transmitted, they usually coexist with proteins, so there are various sterilization or disinfection methods depending on the target and purpose of sterilization.

Disinfection (消毒) removes pathogens to prevent infection or transmission of disease, and in particular, cannot remove microorganisms such as non-resistant bacterial spores. , heat, chemicals, etc. to disinfect.

In general, chemical disinfection is a method of removing bacteria with a disinfectant, and sometimes liquid or gas is used.

The conditions to be provided for the disinfectant are strong sterilization, harmless, simple handling, no damage to the object to be disinfected, easy to produce, inexpensive, and odorless.

As a disinfectant, phenolic acid (C6H5OH), cresol soap solution (cresol, CH3C6H4OH), formaldehyde (HCHO), sublime water (mercuric chloride, HgCl2), alcohol, reverse soap solution, chlorine agent (chlorine, bleaching powder, dibasic chlorine dioxide) , chlorine inorganic compounds), iodine, quicklime, hydrogen peroxide, medicinal soap, marguerochrome liquid, etc. are selectively used depending on the purpose, object, and type of infectious disease.

Phenolic acid uses a 3% concentration aqueous solution and sterilizes according to bacterial protein coagulation, cell lysis, enzyme system, etc. The disadvantages are irritation to the skin mucous membrane, paralysis, metal corrosion, and low effectiveness against viruses and spores. Silver is safe in its sterilizing power and does not undergo chemical change even when stored for a long time, and is known to be suitable for disinfection of clothes, containers, dirt, feces, and vomit.

Since cresol soap solution is not well soluble in water, it is used to make cresol soap solution by diluting it at a ratio of 3 parts of cresol soap solution to 97 parts of water. is known to be highly effective.

Formaldehyde is a gas made by oxidizing methyl alcohol (methanol). It has a strong irritating odor, dissolves well in water, has strong reducing power, has a sterilizing effect even at low concentrations, and has a simple generator using methyl alcohol. It is generated in a box made to sterilize the objects inside.

Formalin is an aqueous solution containing 37% or more of formaldehyde and has strong bactericidal power that microorganisms cannot recover by acting on proteins at high dilution concentration, and has a strong bactericidal effect against spores. It uses a 1.5% aqueous solution and is known to be suitable for disinfection of clothing, ceramics, wood products, celluloid, and rubber products.

Seunghongsoo is colorless, odorless, highly toxic, insoluble in water, and corrosive to metals, so plastic containers are used, and chemical solutions are distinguished by dyeing with fuchsin. It uses 0.5% aqueous solution, kills Escherichia coli and staphylococcus in 5 to 10 minutes, and is highly irritating to mucous membranes, but cannot be used for disinfection of rubber products and metal products.

Methyl alcohol has strong bactericidal power in 70 to 75% aqueous solution and is mainly used for disinfection of resin, skin, instruments, etc.

Inverse soap solution is a surfactant with strong penetrating and sterilizing power and is used as an aqueous solution of 0.1 to 0.5%. It is colorless, odorless, and non-irritating, suitable for sterilization of resins, instruments, and containers, widely used in beauty, has little cleaning power, and is known to be ineffective against tuberculosis bacilli.

Halogen elements, which are chlorine disinfectants, include fluorine, chlorine, and iodine. Chlorine, which mainly forms a protein and halogen complex in living cells to stop cell metabolism and kills cells, has great sterilizing power in a gaseous state but is a strong irritant. It is used for large-scale disinfection of waterworks and sewage due to its hypercorrosiveness, and bleaching powder (chlorolime CaOCl2) generates chlorine generated in water for sterilization, and is used for disinfection of drinking water and swimming pools. In addition, sodium chlorine oxide (NaOCl) has a sterilizing effect by chlorine element generated in the solution.

Iodine has strong bactericidal power like chlorine, but at a high concentration, it has few side effects on the skin and mucous membranes, and uses about 100 times the solution (effective amount of iodine 100 to 200 ppm) for disinfection of resin and instruments, corrosive to metals, There is a disadvantage that hypersensitive skin becomes rough.

Quicklime is used by adding half of the amount of quicklime water to make it into a mud-like state or by making a 5 times (20%) aqueous solution with lime milk. It is used for disinfection of manure bins, trash cans, sewers, water tanks, etc. It has a drawback of not being effective against tuberculosis bacillus and spores, and is suitable for wide area disinfection because it is inexpensive.

Oxidizing agent disinfectant such as hydrogen peroxide (H2O2) is a drug that stops cell metabolism by oxidizing sulfurhydryl (-SH) groups, and is used for disinfection with a 2.5 to 3.5% aqueous solution (oxypool). It is colorless, transparent, and odorless. There is no, but sometimes it sterilizes by oxidizing pathogens with a liquid that smells like ozone.

Medicinal soap is a product in which various disinfectants are added to a soap base, and the soap's cleaning action and the chemical disinfection action by the disinfectant are simultaneously acted, and it is used for hand skin disinfection.

Mercurochrome solution is called red medicine and is a 2% aqueous solution. It is used as it is when disinfecting wounds. It is chemically a mild disinfectant that belongs to inorganic mercury compounds and is non-irritating. People with hypersensitivity should be careful, and the effect of inhibiting the growth of bacteria lasts for a relatively long time. do.

Disinfection targets by type of infectious disease are as follows.

First: Typhoid, Paratyphoid, Cholera. In the case of dysentery, it is an oral infection and is an infectious disease of the digestive system, and the patient's excretion, vomit, residual food, tableware, and toilet are problems.

Second: In the case of smallpox or scarlet fever, the patient's runny nose, sputum, pus, contaminated equipment, clothing, bedding, transport equipment, food utensils for the patient, bedroom floor, and caregiver. Disinfect the body and clothing of contacts.

Third: In the case of diphtheria, disinfect mucus, sputum, contaminated instruments, tableware, books, toys, bedding, other items on the floor in the ward, and the clothes and body of the caregiver.

Fourth: In the case of polio, it is equivalent to disinfection for dysentery, but it is equivalent to disinfection for diphtheria at the beginning of the outbreak.

In order to reduce the damage caused by pathogenic bacteria, continuous quarantine and disinfection is carried out in vulnerable areas using various methods and sanitary pests such as flies and mosquitoes are eliminated to prevent infectious diseases that easily occur.

Foodborne outbreaks include oral infectious diseases such as cholera, dysentery, and typhoid fever, common human infectious diseases such as tuberculosis, anthrax, brucellosis (salmonellosis), and avian flu (AI), and parasitic diseases such as roundworm, pinworm, tapeworm, pedistoma, and candistoma. There is food poisoning (bacteria, natural poison, chemical substances, and other factors), and if classified according to the cause of production, endogenous diseases caused by harmful and toxic components of the original ingredients of food materials, and production, growth, manufacturing, processing, and storage of food In the process of distribution, consumption, etc., harmful or toxic substances are mixed or contaminated from the outside and cause diseases, and toxic substances are generated by physical, chemical, and biological factors in the process of manufacturing, processing, storing, and distribution of food. There is an attraction that causes

In addition, the outbreak of an infectious disease requires the source of infection, the route of infection, and the susceptibility of the host. When a disease occurs, there must be sufficient pathogens in both quality and quantity as sources of infection, sufficient contact opportunities, and people with high pathogen susceptibility.

Most infectious diseases occur and become prevalent when the three conditions of infection source, infection route, and susceptibility are met, and once they occur, they do not end as a transient like food poisoning, but require strict measures such as quarantine or disinfection of the stool of contacts. Habituation such as disinfection is important.

On the other hand, chlorine dioxide (ClO2) was first discovered by Humphrey Davy in 1814, and since its use as a disinfectant for water treatment was proposed by Berge in 1900, it has been widely used in the United States and Europe for drinking water sterilization, odor removal, and bleaching. In particular, since 1972, it has been found that chlorine dioxide, unlike chlorine, does not react with organic contaminants in water to produce trihalomethane, a carcinogen.

However, domestic law restricts its use to the removal of heavy metals such as iron (Fe) and manganese (Mn) by treating it in parallel (post-treatment) with chlorine (in the case of aqueous solution), but the US Food and Drug Administration restricts its use to Listeria and Escherichia coli O157. : H7 (E. coli O157 : H7), Salmonella sp. The efficacy that can reduce to at least 1/100,000 levels is suggested as a standard for disinfectants, and the efficacy of chlorine dioxide is recognized by the Food and Drug Administration It satisfies these regulatory standards and has been found to be more effective in eradicating Listeria bacteria that contaminate fruits and vegetables than any other currently available sterilization method. This is because it is particularly difficult to remove this bacterium. It is known that listeria bacteria have strong enough vitality to survive in refrigerators or freezers, and it is difficult to eliminate their activity.

One of the advantages of chlorine dioxide sterilization is that it is applied to the processing process before and after harvesting apples, and it is used in small-scale units without heat sterilization equipment to remove contaminants, and there is no problem that the taste of fruits changes according to heating.

Chlorine dioxide has a low risk in most environmental fields and kills germs and viruses. The chlorine dioxide solution is effective in maintaining the freshness of food ingredients, disinfecting certain places, sanitary treatment, water purification, and sterilization. Therefore, liquid chlorine dioxide water, which maintains the freshness of all food for the health of humans and animals and provides a living environment that minimizes viruses and bacteria, can be used in all spaces, especially for maintaining the freshness of fruits and vegetables and extending their lifespan. do.

Chlorine dioxide has strong oxidizing and bactericidal properties, has a melting point of -59 ℃, a boiling point of 11 ℃, is a gaseous substance at room temperature, has a solubility of about 3000 ppm (mg/l) in water at room temperature and pressure, and is explosive if the gas concentration in the air is over 10%. It is used for sterilization, disinfection, deodorization, bleaching, etc., and the process of diluting high-concentration chlorine dioxide is essential for the production of sterilizing water using chlorine dioxide.

Since such chlorine dioxide is relatively dangerous to transport and store, transport and storage are prohibited, and it is very secretive to produce it directly with the corresponding generator at the required site.

Therefore, by rapidly dissolving chlorine dioxide gas in highly active nanobubble potential water to quickly mass-produce chlorine dioxide water, the remaining gas is recovered and reused in the next step. Gas is used, surplus gas is forcibly collected and neutralized, and high-temperature filter processing is used to purify it in three stages. Therefore, it is converted or decomposed into environmentally friendly air harmless to the human body and then released into the atmosphere. It is a technical idea.

Hereinafter, when described in detail with reference to all accompanying drawings, the high-concentration chlorine dioxide production system 900 includes a potential water generator 1000, a chlorine dioxide generator 2000, a chlorine water preparation unit 3000, and a quantitative control unit ( 4000), a storage stirring unit 5000, and a neutralization heat discharging unit 6000.

The potential water generator 1000 generates nanobubble potential water in which oxygen converted to a highly activated state by applying a high voltage potential is dissolved in purified water in the form of nanobubbles.

The potential water generator 1000 includes an oxygen generator 1010, a high voltage generator 1020, a purified water pump 1030, an oxygen dryer 1040, a potential generator 1050, and a first potential water directional valve 1060. ), the second potential water directional valve 1070, the first filter 1080, the nano bubble potential water production tank 1090, the first level sensor 1100, the potential water circulation directional valve 1110, and the nano bubble potential water Quantitative circulation pump 1120, nano bubble generator 1130, potential water concentration measurement unit 1140, third potential water directional valve 1150, nano bubble potential correction amount supply pump 1160, and potential water pressure measurement unit ( 1170).

The oxygen generating device 1010 generates oxygen according to a corresponding control signal of the quantitative adjustment control unit 4000. Since the configuration and operation of the oxygen generator are generally well known, a detailed description thereof will be omitted.

The high voltage generator 1020 generates a high voltage potential signal according to the corresponding control signal of the quantitative adjustment control unit 4000, and the generated potential signal generates any one potential selected from the range of 1000 to 5000 volts (V), and 2000 A configuration that generates a potential signal of volts is relatively preferable.

The purified water pump 1030 introduces and supplies the purified water produced externally in a fixed amount according to the corresponding control signal of the quantitative adjustment control unit 4000.

In the following description, the metering pump is a pump that transfers or introduces a liquid of a predetermined capacity by a corresponding control signal, and since it is a well-known configuration, further detailed description will be omitted.

The oxygen drying unit 1040 is connected to the oxygen generator 1010 and introduces the generated oxygen to remove moisture. Oxygen generated by the oxygen generator 1010 generally contains various types of moisture (moisture), so it is necessary to remove the moisture.

The potential generator 1050 receives the high voltage signal from the high voltage generator 1020 and applies a high voltage by any one potential selected from the range of 1000 to 5000 volts to the oxygen discharged from the oxygen drying unit 1040 to generate oxygen atoms. By shifting the bond angle formed by the oxygen atom and the oxygen atom, activated oxygen with a high activation rate is generated.

The first potential water directional valve 1060 is connected to the potential generator 1050 and allows or blocks active oxygen to flow in a selected direction according to a corresponding control signal from the quantitative control unit 4000. In the accompanying drawings, the active oxygen generated by the potential generator 1050 is transported in one direction by the corresponding control signal of the quantitative adjustment control unit 4000 to flow into the nanobubble potential water production tank 1090, or the transport is blocked.

The second potential water directional valve 1070 is connected to the purified water pump 1030 and allows or blocks purified water to flow in a selected direction according to a corresponding control signal from the quantitative adjustment control unit 4000. In the accompanying drawings, the purified water is transferred in one direction by the corresponding control signal of the quantitative adjustment control unit 4000 so that the purified water flows into the nano-bubble potential water production tank 1090, or the transfer is blocked.

The first filter 1080 is connected to the second directional valve 1070 and filters foreign substances of a predetermined size or larger that may be included in the introduced purified water from passing therethrough. The first filter 1080 is very preferably configured to filter foreign substances having a size of 10 micrometers (um) or larger from passing therethrough. In the case of filtering so that foreign substances with a size of 10 micrometers or less do not pass through, there are problems in that the replacement cycle of the filter is accelerated, the price is increased, and the inflow rate of the washing water is slowed, resulting in a decrease in overall productivity.

The nanobubble potential water production tank 1090 is connected to the first filter 1080 and mixes activated oxygen with the incoming purified water in the form of nanobubbles to prepare and store highly activated nanobubble potential water.

The first level sensor 1100 is installed inside the nano-bubble potential water production tank 1090 to measure the level of the incoming purified water and notifies the quantitative control unit 4000. The first level sensor 1100 measures the level so that an appropriate amount of purified water or nanobubble potential water is introduced and stored in the nanobubble potential water production tank 1090, and since the configuration of such a level sensor is well known, more detailed I will omit the explanation.

The potential water circulation directional valve 1110 is connected to the nanobubble potential water production tank 1090 and blocks the flow so that the nanobubble potential water flows in a selected direction or does not flow according to the corresponding control signal of the quantitative control unit 4000.

The nanobubble potential correction quantity circulation pump 1120 is connected to the potential water circulation directional valve 1110 and quantifies the nanobubble potential water from the nanobubble potential water production tank 1090 according to the corresponding control signal of the quantitative control unit 4000. It is withdrawn and circulated so as to be supplied to the nano bubble potential water production tank 1090 again via the nano bubble generator 1130.

The nanobubble generator 1130 is connected to the lower end of one side of the nanobubble potential water production tank 1090, and the first nanobubble potential correction pump 1120 supplies the first potential by the flow of the nanobubble potential water. Activated oxygen supplied by the water-directional valve 1060 is supplied to the nano-bubble potential water production tank 1090 while flowing in the form of nano-sized bubbles.

The potential water concentration measurement unit 1140 is installed in a part of the inner part of the nano bubble potential water production tank 1090, measures the active oxygen concentration of the nano bubble potential water, and notifies the quantitative adjustment control unit 4000. Since the potential number concentration measurement unit 1140 is a generally known configuration, further detailed description thereof will be omitted.

The third potential water directional valve 1150 is installed connected to a part of the bottom surface of the nano bubble potential water production tank 1090 and allows or blocks the flow of nano bubble potential water in a selected direction by a corresponding control signal from the quantitative adjustment control unit 4000. do.

The nanobubble potential correction amount supply pump 1160 is connected to the third potential water directional valve 1150, and the nanobubble potential water is supplied from the nanobubble potential water production tank 1090 by the corresponding control signal of the quantitative adjustment control unit 4000. The amount is taken out and supplied to the chlorine water controller 3000.

The potential water pressure measuring unit 1170 is installed connected to the upper part of the nano-bubble potential water production tank 1090, and the internal pressure of the nano-bubble potential water production tank 1090 is measured by the corresponding control signal from the quantitative adjustment control unit 4000. Measure.

When it is determined that the internal pressure of the nano-bubble potential water production tank 1090 measured by the potential water pressure measurement unit 1170 exceeds the allowable range (limit), the quantitative control control unit 4000 outputs a corresponding control signal to generate the third potential The water directional valve 1150 is controlled to open and the nanobubble potential correction amount supply pump 1160 is controlled to forcibly discharge the nanobubble potential water to the chlorine water preparation unit 3000 until the pressure is lowered to an allowable range. On the other hand, since the quantitative adjustment control unit 4000 outputs the corresponding control signal, the first potential water directional valve 1060 and the second potential water directional valve 1070 are controlled in a cut-off state, and the nano-bubble potential water production tank 1090 is supplied from the outside. ) to block the inflow of oxygen and purified water into the interior. That is, the internal pressure of the nano bubble potential water production tank 1090 is stably maintained by the control signal and monitoring of the quantitative control unit 4000 .

The chlorine dioxide generating unit 2000 mixes sodium chlorite and anhydrous citric acid to generate chlorine dioxide under pressure.

The chlorine dioxide generator 2000 includes an AJ tank 2010, an AJ metering pump 2020, a AJ directional valve 2030, a BJ tank 2040, a BJ metering pump 2050 and a BJ directional valve 2060 And ABJ reactor (2070), oxygen generator (2080), oxygen directional valve (2090), chlorine gas metering inlet pump (2100), oxygen constant pressure venturi unit (2110), chlorine gas directional valve (2120) and reaction water pressure measurement It is a configuration including a part 2130 and a reaction water discharge valve 2140.

The AJ tank (2010) stores 80 liters of sodium chlorite diluted in purified water to a concentration of 24%. The AJ tank 2010 is preferably made of a stainless steel tank, but a plastic type tank containing industrial plastics may be used.

The AJ metering pump 2020 is installed connected to the AJ tank 2010 and discharges a fixed amount of sodium chlorite water according to a corresponding control signal of the quantitative adjustment control unit 4000.

The AJ directional valve 2030 is installed connected to the AJ metering pump 2020 and allows sodium chlorite to flow in a selected direction or blocks the flow according to a corresponding control signal from the quantitative control unit 4000.

The Bizet tank 2040 stores anhydrous citric acid in which 25 kg (Kg) of anhydrous citric acid is dissolved in 40 liters of purified water. The non-jet tank 2040 is preferably made of a stainless steel tank, but a plastic type tank containing industrial plastics may be used.

The non-jet metering pump 2050 is installed connected to the non-jet tank 2040 and discharges a fixed amount of anhydrous arithmetic water according to a corresponding control signal of the metering control unit 4000.

The BJ directional valve 2060 is installed connected to the BJ metering pump 2050 and allows anhydrous arithmetic water to flow in a selected direction or blocks the flow according to a corresponding control signal from the BJ control unit 4000.

The ABJ reactor 2070 is connected to the AJ directional valve 2030 and the BJ directional valve 2060, respectively, to receive and react with sodium chlorite water and anhydrous citric acid water to produce chlorine dioxide water. The ABJ reactor 2070 is preferably made of a stainless steel tank, but a plastic tank containing industrial plastics may be used.

The oxygen generator 2080 generates oxygen according to a corresponding control signal of the quantitative control unit 4000.

The oxygen directional valve 2090 is installed connected to the oxygen generator 2080 and allows oxygen generated by a corresponding control signal of the quantitative control unit 4000 to flow in a selected direction or block the flow.

The chlorine gas metering inlet pump 2100 introduces chlorine dioxide gas in a metered amount from the outside according to a corresponding control signal of the metering control unit 4000.

The oxygen constant pressure venturi unit 2110 is installed connected to the lower part of one side of the ABJ reactor 2070, and the oxygen directional valve 2090 is supplied by the flow of chlorine dioxide gas supplied in a fixed amount by the chlorine gas metering inlet pump 2100 Oxygen is introduced and supplied to the ABJ reactor 2070.

The chlorine gas directional valve 2120 is connected to and installed at one end of the upper side of the ABJ reactor 2070, and discharges chlorine dioxide gas in one direction selected by the corresponding control signal of the quantitative adjustment control unit 4000 to flow or block the discharge flow. .

The reaction water pressure measurement unit 2130 is installed in a part of the inside of the ABJ reactor 2070, measures the pressure of the gas inside the ABJ reactor 2070, and notifies the quantitative control control unit 4000.

The reaction water discharge valve 2140 is installed connected to a portion of the lower end of the ABJ reactor 2070 and discharges the chlorine dioxide water stored inside the ABJ reactor 2070 to the outside by corresponding control. The reaction water discharge valve 2140 can be manually controlled as needed, and although not shown in the drawing, it is described and understood as being connected to a safe facility.

The chlorine water preparation unit 3000 is connected to the potential water generator 1000 and the chlorine dioxide generator 2000, respectively, and is supplied with nanobubble potential water from the potential water generator 1000, and the chlorine dioxide generator 2000 Chlorine dioxide is supplied from the chlorine dioxide, and chlorine dioxide water is produced in multiple stages of a closed loop.

The chlorine water preparation unit 3000 includes a first preparation unit 3100, a second preparation unit 3200, and a third preparation unit 3300.

The first preparation unit 3100 introduces nanobubble potential water in a fixed amount from the potential water generation unit 1000 according to the corresponding control signal of the quantitative control unit 4000, and prepares chlorine water by forcibly circulating nanobubble potential water The chlorine dioxide gas introduced from unit 2000 is dissolved. The detailed configuration of the first preparation unit 3100 will be described again below.

The second preparation unit 3200 introduces the nanobubble potential water in a fixed amount from the potential water generator 1000 by the corresponding control signal of the quantitative control unit 4000, and by the forcibly circulated nanobubble potential water, the first agent The chlorine dioxide gas introduced from the preparation unit 3100 is dissolved. The detailed configuration of the second preparation unit 3200 will be described again below.

The third preparation unit 3300 introduces the nanobubble potential water in a fixed amount from the potential water generator 1000 by the corresponding control signal of the quantitative control unit 4000, and produces the second agent by the forcibly circulated nanobubble potential water. The chlorine dioxide gas introduced from the preparation unit 3200 is dissolved. The detailed configuration of the third preparation unit 3300 will be described again below.

The first preparation unit 3100 includes a first two-way valve 3110, a first chlorine water tank 3120, a first chlorine water one-way valve 3130, a first chlorine water amount circulation pump 3140, and a first A venturi (3150), a first chlorine water level sensor (3160), a first chlorine concentration measuring unit (3170), a first chlorine pressure measuring unit (3180), a first chlorine gas recovery unit (3190), and a first chlorine gas It is a configuration including a discharge valve 3192.

The first bi-directional valve 3110 allows or blocks the flow of nanobubble potential water from the potential water generator 1000 in a selected direction according to a corresponding control signal from the quantitative control unit 4000.

The first chlorine water tank 3120 is installed connected to the first bi-directional valve 3110, and the chlorine dioxide gas introduced by the corresponding control signal of the quantitative control unit 4000 is quantitatively introduced from the potential water generator 1000. It is dissolved in nanobubble potential water to prepare first chlorine water.

The first chlorine water one-way valve 3130 is connected to the first chlorine water tank 3120 and circulates the first chlorine water in a selected direction according to a corresponding control signal from the quantitative control unit 4000 to flow or block the circulation. .

The first chlorine correction amount circulation pump 3140 is connected to the first chlorine water one-way valve 3130 and quantifies the first chlorine water from the first chlorine water tank 3120 according to the corresponding control signal of the quantitative control control unit 4000. It is withdrawn and supplied to the first chlorine water tank 3120 again.

The first venturi 3150 is connected to the lower end of one side of the first chlorine water tank 3120, and the chlorine dioxide generator ( 2000) is introduced and supplied to the first chlorine water tank 3120.

The first chlorine water level sensor 3160 is installed inside the first chlorine water tank 3120 to measure the level of the incoming nanobubble potential water and notifies the quantitative control control unit 4000.

The first chlorine water concentration measuring unit 3170 is installed inside the first chlorine water tank 3120 and measures the concentration of the first chlorine water and notifies the quantitative control unit 4000 of the concentration.

The first chlorine pressure measuring unit 3180 is installed connected to an upper portion of the first chlorine water tank 3120 and measures the internal pressure of the first chlorine water tank 3120 according to a corresponding control signal from the quantitative control unit 4000. do.

The first chlorine gas recovery unit 3190 is installed inside the upper side of the first chlorine water tank 3120 and recovers chlorine dioxide gas that is not dissolved in the first chlorine water.

The first chlorine gas discharge valve 3192 is installed connected to an upper portion of the first chlorine water tank 3120, and the pressure inside the first chlorine water tank 3120 is allowed by the corresponding control signal from the quantitative control unit 4000. Excess chlorine dioxide gas, which must be forcibly discharged when the pressure is higher than the range, is unidirectionally discharged.

The second preparation unit 3200 includes a second bi-directional valve 3210, a second chlorine water tank 3220, a second chlorine water one-way valve 3230, a second chlorine correction amount circulation pump 3240, and a second A venturi (3250), a second chlorine water level sensor (3260), a second chlorine concentration measuring unit (3270), a second chlorine pressure measuring unit (3280), a second chlorine gas recovery unit (3290), and a second chlorine gas It is a configuration including a discharge valve 3292.

The second bi-directional valve 3210 allows or blocks the flow of nanobubble potential water from the potential water generator 1000 in a selected direction according to a corresponding control signal from the quantitative adjustment control unit 4000.

The second chlorine water tank 3220 is installed connected to the second bi-directional valve 3210, and the chlorine dioxide gas introduced by the corresponding control signal of the quantitative control unit 4000 is quantitatively introduced from the potential water generator 1000. It is dissolved in nanobubble potential water to prepare a second chlorine water.

The second chlorine water one-way valve 3230 is connected to the second chlorine water tank 3220 and circulates the second chlorine water in a selected direction according to a corresponding control signal from the quantitative control unit 4000, or blocks the circulation. .

The second chlorine correction amount circulation pump 3240 is connected to the second chlorine water one-way valve 3230 and quantifies the second chlorine water from the second chlorine water tank 3220 according to the corresponding control signal of the quantitative control control unit 4000. It is withdrawn and supplied to the second chlorine water tank 3220 again.

The second venturi 3250 is connected to the lower end of one side of the second chlorine water tank 3220, and the flow of the second chlorine water supplied by the second chlorine water circulation pump 3240 in a fixed amount produces the first preparation unit The chlorine dioxide gas supplied by 3100 is introduced and supplied to the second chlorine water tank 3220.

The second chlorine water level sensor 3260 is installed inside the second chlorine water tank 3220 to measure the level of the incoming nanobubble potential water and notifies the quantitative control control unit 4000.

The second chlorine concentration measuring unit 3270 is installed inside the second chlorine water tank 3220, measures the concentration of the second chlorine water, and notifies the quantitative adjustment control unit 4000.

The second chlorine pressure measuring unit 3280 is installed connected to an upper portion of the second chlorine water tank 3220 and measures the internal pressure of the second chlorine water tank 3220 according to a corresponding control signal from the quantitative adjustment control unit 4000. do.

The second chlorine gas recovery unit 3290 is installed inside the upper side of the second chlorine water tank 3220 and recovers chlorine dioxide gas not dissolved in the second chlorine water.

The second chlorine gas discharge valve 3292 is installed connected to an upper part of the second chlorine water tank 3220, and the pressure inside the second chlorine water tank 3220 is allowed by a corresponding control signal from the quantitative control unit 4000. Excess chlorine dioxide gas, which must be forcibly discharged when the pressure is higher than the range, is unidirectionally discharged.

The first chlorine gas directional valve 3294 is not dissolved in the nano-bubble potential water in the first chlorine water tank 3120, and the chlorine dioxide gas recovered and introduced from the first chlorine water tank 3120 is controlled by the quantitative control unit 4000 It flows in one direction selected by the corresponding control signal of or blocks it.

The third preparation unit 3300 includes a third two-way valve 3310, a third chlorine water tank 3320, a third chlorine water one-way valve 3330, a third chlorine correction amount circulation pump 3340, and a third A venturi (3350), a third chlorine water level sensor (3360), a third chlorine concentration measuring unit (3370), a third chlorine pressure measuring unit (3380), a third chlorine gas recovery unit (3390), and a third chlorine gas It is a configuration including a discharge valve 3392 and a second chlorine gas directional valve 3394.

The third bi-directional valve 3310 allows or blocks the flow of nanobubble potential water from the potential water generator 1000 in a selected direction according to a corresponding control signal from the quantitative adjustment control unit 4000.

The third chlorine water tank 3320 is installed connected to the third bi-directional valve 3310, and chlorine dioxide gas introduced by the corresponding control signal of the quantitative control unit 4000 is quantitatively introduced from the potential water generator 1000. It is dissolved in nanobubble potential water to prepare a third chlorine water.

The third chlorine water one-way valve 3330 is installed connected to the third chlorine water tank 3320 and circulates the third chlorine water in the selected one direction according to the corresponding control signal from the quantitative control unit 4000, or blocks the circulation. .

The third chlorine correction amount circulation pump 3340 is connected to the third chlorine water one-way valve 3330 and quantifies the third chlorine water from the third chlorine water tank 3320 according to the corresponding control signal of the quantitative control control unit 4000. It is withdrawn and supplied to the third chlorine water tank 3320 again.

The third venturi 3350 is connected to the lower part of one side of the third chlorine water tank 3320, and the third chlorine water circulation pump 3340 supplies the third chlorine water in a fixed amount to the second preparation unit The chlorine dioxide gas supplied by 3200 is introduced and supplied to the third chlorine water tank 3320.

The third chlorine water level sensor 3360 is installed inside the third chlorine water tank 3320 to measure the level of the incoming nanobubble potential water and notifies the quantitative control unit 4000.

The third chlorine water concentration measuring unit 3370 is installed inside the third chlorine water tank 3320 and measures the concentration of the third chlorine water and notifies the quantitative adjustment control unit 4000.

The third chlorine pressure measuring unit 3380 is installed connected to an upper part of the third chlorine water tank 3320 and measures the internal pressure of the third chlorine water tank 3320 according to a corresponding control signal from the quantitative adjustment control unit 4000. do.

The third chlorine gas recovery unit 3390 is installed inside the upper side of the third chlorine water tank 3320 and recovers chlorine dioxide gas that is not dissolved in the third chlorine water.

The third chlorine gas discharge valve 3392 is installed connected to an upper portion of the third chlorine water tank 3320, and the chlorine dioxide gas inside the third chlorine water tank 3320 is controlled by a corresponding control signal from the quantitative adjustment control unit 4000. is emitted in one direction.

The second chlorine gas directional valve 3394 is not dissolved in the nano-bubble potential water in the second chlorine water tank 3220, and the chlorine dioxide gas recovered from the first chlorine water tank 3120 and introduced is controlled by the quantitative control unit 4000. It flows in one direction selected by the corresponding control signal of or blocks it.

The quantitative adjustment control unit 4000 is installed in connection with the chlorine water preparation unit 3000 and discharges the chlorine dioxide water produced in multiple stages, respectively, and monitors each function constituting the chlorine dioxide water production system and outputs the corresponding control signal, respectively do.

The quantitative adjustment control unit 4000 includes a first chlorine water withdrawal valve 4010, a second chlorine water withdrawal valve 4020, a third chlorine water withdrawal valve 4030, a chlorine dioxide central control unit 4040, and a first fixed amount inlet pump. 4050, the second metering inlet pump 4060, the third metering inlet pump 4070, the first chlorine water supply valve 4080, the second chlorine water supply valve 4090, and the third chlorine water supply valve 4100 ) is a composition that includes

The first chlorine water withdrawal valve 4010 allows the first chlorine water stored in the first chlorine water tank 3120 of the chlorine water preparation unit 3000 to flow in one direction selected by the corresponding control signal of the chlorine dioxide central control unit 4040 or block

The second chlorine water withdrawal valve 4020 allows the second chlorine water stored in the second chlorine water tank 3220 of the chlorine water preparation unit 3000 to flow in one direction selected by the corresponding control signal of the chlorine dioxide central control unit 4040 or block

The third chlorine water withdrawal valve 4030 allows the third chlorine water stored in the third chlorine water tank 3320 of the chlorine water preparation unit 3000 to flow in one direction selected by the corresponding control signal of the chlorine dioxide central control unit 4040 or block

The chlorine dioxide central control unit 4040 monitors each functional unit and driving unit constituting the high-concentration chlorine dioxide water production system 900, respectively, and outputs a corresponding control signal, respectively.

The first fixed-rate inlet pump 4050 is connected to the first chlorine water withdrawal valve 4010 and quantitatively introduces the first chlorine water according to a corresponding control signal from the chlorine dioxide central control unit 4040.

The second metering inlet pump 4060 is connected to the second chlorine water withdrawal valve 4020 and injects the second chlorine water in a metered amount according to a corresponding control signal from the chlorine dioxide central control unit 4040.

The third quantitative inflow pump 4070 is connected to the third chlorine water withdrawal valve 4030 and quantitatively introduces the third chlorine water according to a corresponding control signal from the chlorine dioxide central control unit 4040.

The first chlorine water supply valve 4080 is connected to the first constant-rate inlet pump 4050 and allows or blocks the flow of the first chlorine water introduced in a fixed amount in a selected direction according to a corresponding control signal from the chlorine dioxide central control unit 4040.

The second chlorine water supply valve 4090 is connected to the second metering inlet pump 4060 and allows or blocks the flow of the second chlorine water introduced in a fixed amount in a selected direction according to a corresponding control signal from the chlorine dioxide central control unit 4040.

The third chlorine water supply valve 4100 is connected to the third fixed-rate inlet pump 4070 and allows or blocks the third chlorine water introduced in a fixed amount in a selected direction according to a corresponding control signal from the chlorine dioxide central control unit 4040.

The storage agitation unit 5000 is connected to the quantitative adjustment control unit 4000 to receive, store, and stir the chlorine dioxide water prepared in multiple steps, respectively, to maintain a uniform concentration.

The storage agitation unit 5000 includes a chlorine water production tank 5100, a production tank level sensor 5200, an agitation drive unit 5300, a rotation agitation unit 5400, a discharge valve 5500, and a gas discharge valve 5600. It is a configuration including a tank pressure measuring unit 5700.

The chlorine water production tank 5100 is installed connected to the first chlorine water supply valve 4080, the second chlorine water supply valve 4090, and the third chlorine water supply valve 4100, respectively, and the corresponding Chlorine dioxide water is produced by receiving, storing, and mixing first chlorine water, second chlorine water, and third chlorine water, each of which is supplied in a predetermined amount by a control signal.

The production tank level sensor 5200 is installed in a part of the interior of the chlorine water production tank 5100, and the amount of chlorine dioxide produced by mixing the first chlorine water, the second chlorine water, and the third chlorine water flowing in each corresponding amount The level is measured and notified to the quantitative adjustment control unit 4000.

The agitation drive unit 5300 is installed on an external portion of the chlorine water production tank 5100, and the rotational speed of the corresponding drive shaft is controlled by a corresponding control signal from the quantitative control unit 4000.

The rotational agitation unit 5400 is installed in a rotational state on an inner part of the chlorine water production tank 5100 and rotationally drives the agitation blades 5410 by receiving the rotational driving force of the agitation drive unit 5300 connected thereto.

The discharge valve 5500 is connected to a lower part of the chlorine water production tank 5100 and discharges the chlorine dioxide water produced by the corresponding control signal of the quantitative control unit 4000.

The discharge valve 5500 can cut off the corresponding control signal of the quantitative control unit 4000 as needed and manually control to discharge the prepared chlorine dioxide water in an arbitrary capacity.

The gas discharge valve 5600 is installed in connection with a portion of the upper end of the chlorine water production tank 5100 and allows or blocks chlorine dioxide gas to be discharged in a selected direction according to a corresponding control signal from the quantitative control unit 4000.

The production tank pressure measurement unit 5700 is installed in connection with an upper portion of the chlorine water production tank 5100 and measures the internal pressure of the chlorine water production tank 5100 according to the corresponding control signal from the quantitative control control unit 4000 for quantitative control. The control unit 4000 is notified. The quantitative adjustment control unit 4000 controls the gas discharge valve 5600 to open when it is determined that the internal pressure of the production tank pressure measurement unit 5700 exceeds the allowable or set range to forcibly discharge chlorine dioxide gas therein.

The neutralization heating discharge unit 6000 is connected to the chlorine water preparation unit 3000 and the storage agitation unit 5000, respectively, and collects, neutralizes, and heats the chlorine dioxide gas that is forcibly discharged by detection of surplus or excess or an appropriate pressure or higher. After converting it into environmentally friendly and harmless air, it is discharged into the atmosphere.

The neutralization heat discharge unit 6000 includes a chlorine neutralization unit 6100, a neutral gas metering discharge pump 6200, and a heating filter unit 6300.

The chlorine neutralization unit 6100 introduces the chlorine dioxide gas discharged from the chlorine water preparation unit 3000 and the chlorine dioxide gas discharged from the storage agitation unit 5000, respectively, and neutralizes the chlorine gas with sodium thiosulfate to first purify it.

The neutralized gas metering discharge pump 6200 is connected to the chlorine neutralization unit 6100 and quantitatively discharges the neutralized gas according to a corresponding control signal from the metering control unit 4000.

The heating filter unit 6300 is connected to the neutral gas metering discharge pump 6200, heats the inflow gas to a high temperature to secondarily purify it, filters foreign substances and thirdly purifies it, converts it into eco-friendly air, and discharges it into the atmosphere.

Since the present invention having the above configuration rapidly dissolves chlorine dioxide gas in highly active nanobubble potential water, chlorine dioxide water is rapidly mass-produced, and chlorine dioxide gas remaining undissolved in nanobubble potential water is recovered for the next step. Since the process of re-dissolving in nano-bubble potential water is repeated in multiple steps, it is easy to control the purity of the chlorine dioxide water, and a large amount of chlorine dioxide water is quickly produced at low production cost using a small amount of chlorine dioxide gas, and excess chlorine dioxide gas is forcibly collected, neutralized, and treated with a high-temperature filter, so it is decomposed in a harmless state to the human body in multiple steps and then released into the atmosphere, so the production process is very environmentally friendly.

Although the present invention has been described in detail with respect to the specific examples described above, it is obvious to those skilled in the art that various changes and modifications are possible within the scope of the technical idea of the present invention, and it is natural that these changes and modifications fall within the scope of the appended claims.

900: high-concentration chlorine dioxide water production system
1000: potential water generator 1010: oxygen generator
1020: high voltage generator 1030: purified water pump
1040: oxygen drying unit 1050: potential generator
1060: first potential directional valve 1070: second potential directional valve
1080: first filter 1090: nanobubble potential water production tank
1100: first level sensor 1110: potential water circulation directional valve
1120: nanobubble potential correction volume circulation pump 1130: nanobubble generator
1140: potential water concentration measurement unit 1150: third potential water directional valve (
1160: nanobubble potential correction amount supply pump 1170: potential water pressure measuring unit
2000: chlorine dioxide generation unit 3000: chlorine water preparation unit
4000: Quantitative control unit 5000; storage stirring section
6000: neutral heating discharge unit

Claims (12)

a potential water generator 1000 generating nanobubble potential water in which oxygen converted to a highly activated state by applying a high voltage potential is dissolved in purified water in the form of nanobubbles;
A chlorine dioxide generating unit (2000) for generating chlorine dioxide under pressure by mixing sodium chlorite and anhydrous citric acid;
It is connected and installed to the potential water generator 1000 and the chlorine dioxide generator 2000 respectively, receives nano-bubble potential water from the potential water generator 1000, and supplies chlorine dioxide from the chlorine dioxide generator 2000. Chlorine water preparation unit 3000 for receiving and producing chlorine dioxide in multiple stages of a closed loop;
Quantitative adjustment control unit (4000 ); including,
The potential number generator 1000
An oxygen generating device 1010 generating oxygen according to a corresponding control signal of the quantitative adjustment control unit 4000;
a high voltage generator 1020 generating a high voltage potential signal according to a corresponding control signal of the quantitative adjustment control unit 4000;
Purification correction pump 1030 for supplying purified water in a fixed amount according to the corresponding control signal of the quantitative adjustment control unit 4000;
An oxygen drying unit 1040 connected to the oxygen generator 1010 and removing moisture by introducing generated oxygen:
A potential generator 1050 receiving a high voltage signal from the high voltage generator 1020 and generating activated oxygen by applying a potential to oxygen discharged from the oxygen drying unit 1040:
A first potential number directional valve 1060 connected to the potential generator 1050 and allowing or blocking active oxygen to flow in a selected direction according to a corresponding control signal of the quantitative control unit 4000;
A second potential water directional valve 1070 connected to the purified water pump 1030 and allowing or blocking the flow of purified water in a selected direction according to a corresponding control signal of the quantitative adjustment control unit 4000;
A first filter 1080 connected to the second directional valve 1070 and filtering foreign substances from the introduced purified water;
a nano-bubble potential water production tank 1090 connected to the first filter 1080 and mixing active oxygen with purified water in the form of nano-bubbles to prepare and store nano-bubble potential water;
A first level sensor 1100 installed inside the nano-bubble potential water production tank 1090 to measure the level of the incoming purified water and notify the quantitative adjustment control unit 4000;
A potential water circulation directional valve 1110 that is connected to the nano-bubble potential water production tank 1090 and circulates nano-bubble potential water in a selected direction according to a corresponding control signal from the quantitative control unit 4000 or blocks the circulation. ;
It is connected to the potential water circulation directional valve 1110, and the nanobubble potential water is drawn out from the nanobubble potential water production tank 1090 in a fixed amount according to the corresponding control signal of the quantitative control unit 4000, and the nanobubble potential water again. a nanobubble potential correction volume circulation pump 1120 supplying the production tank 1090;
The first potential water directional valve ( a nano bubble generator 1130 which introduces the activated oxygen supplied by 1060) in the form of nano bubbles and supplies it to the nano bubble potential water production tank 1090;
a potential water concentration measuring unit 1140 installed inside the nano bubble potential water production tank 1090 and measuring the active oxygen concentration of the nano bubble potential water;
A third potential water directional valve (connected to and installed on a part of the lower surface of the nano bubble potential water production tank 1090 and allowing or blocking nano bubble potential water to flow in a selected direction by a corresponding control signal from the quantitative control unit 4000 ( 1150);
It is connected to the third potential water directional valve 1150 and by the corresponding control signal of the quantitative adjustment control unit 4000, nano-bubble potential water is quantitatively withdrawn from the nano-bubble potential water production tank 1090, and the chlorine water control unit 3000 ) to supply a nanobubble potential correction amount supply pump 1160;
Potential water pressure measurement for measuring the internal pressure of the nano-bubble potential water production tank 1090 connected to the upper part of the nano-bubble potential water production tank 1090 and in accordance with the corresponding control signal of the quantitative adjustment control unit 4000 part 1170; High-concentration chlorine dioxide water production system comprising a.
According to claim 1,
A storage agitation unit 5000 connected to the quantitative control unit 4000 to receive, store, and stir the chlorine dioxide water produced in multiple steps to maintain a uniform concentration; A high-concentration chlorine dioxide production system further comprising a.
According to claim 2,
The chlorine water preparation unit 3000 and the storage agitation unit 5000 are installed in connection with each other, and the excess chlorine dioxide gas is collected, neutralized, heated, converted into environmentally friendly and harmless air, and then discharged into the atmosphere. Neutralization heating discharge unit ( 6000); A high-concentration chlorine dioxide production system further comprising a.
delete According to any one of claims 1 to 3,
The chlorine dioxide generator 2000
An AJ tank (2010) in which 80 liters of sodium chlorite diluted with purified water to a concentration of 24% are stored;
An AJ metering pump 2020 connected to the AJ tank 2010 and discharging a fixed amount of sodium chlorite water in response to a corresponding control signal of the AJ tank 2010;
An AJ directional valve 2030 connected to the AJ metering pump 2020 and configured to flow or block sodium chlorite water in a selected direction according to a corresponding control signal of the quantitative control unit 4000;
A Bizet tank 2040 in which 25 kilograms (Kg) of anhydrous citric acid is dissolved in 40 liters of purified water to store anhydrous citric acid water;
A non-jet metering pump 2050 connected to the non-jet tank 2040 and discharging a fixed amount of anhydrous citric acid water according to a corresponding control signal of the quantitative adjustment control unit 4000;
A non-made directional valve 2060 connected to the non-made metering pump 2050 and configured to flow or block anhydrous citric acid water in a selected direction according to a corresponding control signal of the quantitative control unit 4000;
A BJ reactor 2070 connected to the AJ directional valve 2030 and the BJ directional valve 2060 to receive and react with sodium chlorite and anhydrous citric acid to produce chlorine dioxide;
An oxygen generator 2080 generating oxygen according to a corresponding control signal of the quantitative adjustment control unit 4000;
An oxygen directional valve 2090 connected to the oxygen generator 2080 and configured to flow or block oxygen generated by a corresponding control signal of the quantitative control unit 4000 in a selected direction;
A chlorine gas metering inlet pump 2100 for introducing chlorine dioxide gas in a metered amount according to a corresponding control signal of the metering control unit 4000;
Oxygen supplied by the oxygen directional valve 2090 is introduced by the flow of chlorine dioxide gas connected to the lower end of one side of the ABJ reactor 2070 and supplied by the chlorine gas metering inlet pump 2100 in a fixed amount, An oxygen constant pressure venturi unit 2110 supplying the ABJ reactor 2070;
A chlorine gas directional valve 2120 connected to one end of the upper side of the ABJ reactor 2070 and configured to flow or block chlorine dioxide gas in a selected direction according to a corresponding control signal of the quantitative control unit 4000; High-concentration chlorine dioxide water production system comprising a.
According to any one of claims 1 to 3,
The chlorine water preparation unit 3000
The nanobubble potential water is introduced in a fixed amount from the potential water generator 1000 by the corresponding control signal of the quantitative control control unit 4000, and the chlorine water preparation unit 3000 is introduced by the forcibly circulated nanobubble potential water A first preparation unit 3100 for dissolving chlorine dioxide gas to be;
The nanobubble potential water is introduced in a fixed amount from the potential water generation unit 1000 by the corresponding control signal of the quantitative adjustment control unit 4000, and the first agent preparation unit 3100 by the forcibly circulated nanobubble potential water. a second preparation unit 3200 for dissolving the introduced chlorine dioxide gas;
The nanobubble potential water is introduced in a fixed amount from the potential water generation unit 1000 by the corresponding control signal of the quantitative adjustment control unit 4000, and the second agent preparation unit 3200 by the forcibly circulated nanobubble potential water. a third preparation unit 3300 for dissolving the introduced chlorine dioxide gas; High-concentration chlorine dioxide water production system comprising a.
According to claim 6,
The first preparation unit 3100
a first bi-directional valve 3110 for allowing or blocking nanobubble potential water from the potential water generating unit 1000 to flow in a selected direction according to a corresponding control signal of the quantitative adjustment control unit 4000;
The chlorine dioxide gas connected to the first bi-directional valve 3110 and introduced by the corresponding control signal of the quantitative control unit 4000 is dissolved in the nanobubble potential water that is quantitatively introduced from the potential water generator 1000 a first chlorine water tank 3120 to prepare a first chlorine water;
A first chlorine water one-way valve (3130) that is connected to the first chlorine water tank 3120 and circulates the first chlorine water in a selected direction in response to a corresponding control signal from the quantitative control unit 4000 or blocks the circulation. );
It is connected to the first chlorine water one-way valve 3130, and the first chlorine water is taken out from the first chlorine water tank 3120 in a fixed amount according to the control signal of the quantitative control unit 4000, and the first chlorine water is returned to the first chlorine water tank 3120. a first chlorine water circulation pump 3140 supplying water to the tank 3120;
The chlorine dioxide generator 2000 is supplied by the flow of the first chlorine water connected to the lower end of one side of the first chlorine water tank 3120 and supplied by the first chlorine water circulation pump 3140 in a fixed amount. a first venturi (3150) which introduces chlorine dioxide gas and supplies it to the first chlorine water tank (3120);
A first chlorine water level sensor 3160 installed inside the first chlorine water tank 3120 to measure the level of the incoming nanobubble potential water and notify the quantitative adjustment control unit 4000;
a first chlorine concentration measuring unit 3170 installed inside the first chlorine water tank 3120 and measuring the concentration of the first chlorine water and notifying the quantitative control unit 4000;
A first chlorine pressure measuring unit connected to an upper part of the first chlorine water tank 3120 and measuring the internal pressure of the first chlorine water tank 3120 according to a corresponding control signal from the quantitative control unit 4000 (3180);
a first chlorine gas recovery unit 3190 installed inside the first chlorine water tank 3120 and recovering chlorine dioxide gas not dissolved in the first chlorine water;
A first chlorine water tank 3120 connected to an upper portion of the first chlorine water tank 3120 and unidirectionally discharging chlorine dioxide gas inside the first chlorine water tank 3120 in response to a corresponding control signal from the quantitative control control unit 4000 1 chlorine gas discharge valve 3192; High-concentration chlorine dioxide water production system comprising a.
According to claim 6,
The second preparation unit 3200
a second bi-directional valve 3210 for allowing or blocking nanobubble potential water from the potential water generating unit 1000 to flow in a selected direction according to a corresponding control signal of the quantitative adjustment control unit 4000;
The chlorine dioxide gas connected to the second bi-directional valve 3210 and introduced by the corresponding control signal of the quantitative control unit 4000 is dissolved in the nanobubble potential water that is quantitatively introduced from the potential water generator 1000. a second chlorine water tank 3220 for preparing second chlorine water;
A second chlorine water one-way valve (3230) installed connected to the second chlorine water tank 3220 and circulating the second chlorine water in a selected direction in response to a corresponding control signal from the quantitative control unit 4000 or blocking the circulation. );
It is connected to the second chlorine water one-way valve 3230, and the second chlorine water is drawn out from the second chlorine water tank 3220 in a fixed amount according to the corresponding control signal of the quantitative control unit 4000, and the second chlorine water is returned again. a second chlorine correction amount circulation pump 3240 supplying the tank 3220;
The first preparation unit 3100 is connected to the lower end of one side of the second chlorine water tank 3220 and is connected to the flow of the second chlorine water supplied by the second chlorine water circulation pump 3240 in a fixed amount. a second venturi (3250) for introducing chlorine dioxide gas and supplying it to the second chlorine water tank (3220);
A second chlorine water level sensor 3260 installed inside the second chlorine water tank 3220 to measure the level of the incoming nanobubble potential water and notify the quantitative adjustment control unit 4000;
a second chlorine water concentration measuring unit 3270 installed inside the second chlorine water tank 3220 and measuring the concentration of the second chlorine water and notifying the quantitative control unit 4000;
A second chlorine pressure measurement unit connected to an upper part of the second chlorine water tank 3220 and measuring the internal pressure of the second chlorine water tank 3220 according to a corresponding control signal from the quantitative control unit 4000 (3280);
a second chlorine gas recovery unit 3290 installed inside the upper side of the second chlorine water tank 3220 and recovering chlorine dioxide gas not dissolved in the second chlorine water;
A device connected to an upper portion of the second chlorine water tank 3220 and unidirectionally discharging chlorine dioxide gas inside the second chlorine water tank 3220 in response to a corresponding control signal from the quantitative control unit 4000 2 chlorine gas discharge valve 3292;
a first chlorine gas directional valve 3294 for allowing or blocking the flow of chlorine dioxide gas recovered from the first chlorine water tank 3120 in one direction selected by the corresponding control signal of the quantitative control unit 4000; High-concentration chlorine dioxide water production system comprising a.
According to claim 6,
The third preparation unit 3300
a third bi-directional valve 3310 for allowing or blocking nanobubble potential water from the potential water generating unit 1000 to flow in a selected direction according to a corresponding control signal of the quantitative adjustment control unit 4000;
The chlorine dioxide gas connected to the third bi-directional valve 3310 and introduced by the corresponding control signal of the quantitative control unit 4000 is dissolved in the nanobubble potential water that is quantitatively introduced from the potential water generator 1000. a third chlorine water tank 3320 for preparing third chlorine water;
A third chlorine water one-way valve (3330) installed connected to the third chlorine water tank 3320 and circulating the third chlorine water in a selected one direction according to a corresponding control signal from the quantitative control unit 4000 or blocking the circulation. );
It is connected to the third chlorine water one-way valve 3330, and the third chlorine water is taken out from the third chlorine water tank 3320 in a fixed amount according to the control signal of the quantitative control unit 4000, and the third chlorine water is returned. a third chlorine correction amount circulation pump 3340 supplying the tank 3320;
The second preparation unit 3200 is connected to the lower end of one side of the third chlorine water tank 3320 and is connected to the third chlorine water supplied by the third chlorine water circulation pump 3340 in a fixed amount. a third venturi (3350) for introducing chlorine dioxide gas and supplying it to the third chlorine water tank (3320);
A third chlorine water level sensor 3360 installed inside the third chlorine water tank 3320 to measure the level of the incoming nanobubble potential water and notify the quantitative adjustment control unit 4000;
a third chlorine concentration measuring unit 3370 installed inside the third chlorine water tank 3320 and measuring the concentration of the third chlorine water and notifying the quantitative control unit 4000;
A third chlorine pressure measurement unit connected to an upper part of the third chlorine water tank 3320 and measuring the internal pressure of the third chlorine water tank 3320 according to a corresponding control signal from the quantitative control unit 4000 (3380);
a third chlorine gas recovery unit 3390 installed inside the upper side of the third chlorine water tank 3320 and recovering chlorine dioxide gas not dissolved in the third chlorine water;
A third chlorine water tank 3320 connected to an upper portion of the third chlorine water tank 3320 and unidirectionally discharging chlorine dioxide gas inside the third chlorine water tank 3320 in response to a corresponding control signal from the quantitative control control unit 4000. 3 chlorine gas discharge valve 3392;
a second chlorine gas directional valve 3394 for allowing or blocking the flow of chlorine dioxide gas recovered from the second chlorine water tank 3220 in one direction selected by the corresponding control signal of the quantitative control unit 4000; High-concentration chlorine dioxide water production system comprising a.
According to any one of claims 1 to 3,
The quantitative adjustment control unit 4000
a first chlorine water take-off valve 4010 for allowing or blocking the flow of the first chlorine water stored in the first chlorine water tank 3120 of the chlorine water preparation unit 3000 in one direction selected by a corresponding control signal;
a second chlorine water outlet valve 4020 for allowing or blocking the flow of the second chlorine water stored in the second chlorine water tank 3220 of the chlorine water preparation unit 3000 in one direction selected by a corresponding control signal;
a third chlorine water withdrawal valve 4030 for allowing or blocking the flow of the third chlorine water stored in the third chlorine water tank 3320 of the chlorine water preparation unit 3000 in one direction selected by the corresponding control signal;
A chlorine dioxide central control unit 4040 that monitors each functional unit constituting the high-concentration chlorine dioxide water production system and outputs a corresponding control signal, respectively;
A first fixed-rate inlet pump 4050 connected to the first chlorine water withdrawal valve 4010 and injecting the first chlorine water in a fixed amount according to a corresponding control signal of the chlorine dioxide central control unit 4040;
a second metering inlet pump 4060 connected to the second chlorine water withdrawal valve 4020 and injecting the second chlorine water in a metered amount according to a corresponding control signal of the chlorine dioxide central control unit 4040;
a third constant-rate inlet pump 4070 connected to the third chlorine water withdrawal valve 4030 and injecting the third chlorine water in a fixed amount according to a corresponding control signal of the chlorine dioxide central control unit 4040;
A first chlorine water supply valve (4080) connected to the first fixed-rate inlet pump 4050 and allowing or blocking the flow of the first chlorine water introduced in a fixed amount by a corresponding control signal of the chlorine dioxide central control unit 4040 in a selected direction;
A second chlorine water supply valve 4090 that is connected to the second fixed-rate inlet pump 4060 and allows or blocks the second chlorine water introduced in a fixed amount by a corresponding control signal from the chlorine dioxide central control unit 4040 in a selected direction;
A third chlorine water supply valve 4100 connected to the third fixed-rate inlet pump 4070 and configured to flow or block the third chlorine water introduced in a fixed amount by a corresponding control signal from the chlorine dioxide central control unit 4040 in a selected direction; High-concentration chlorine dioxide water production system comprising a.
According to claim 2 or 3,
The storage stirring unit 5000
Connected to the first chlorine water supply valve 4080, the second chlorine water supply valve 4090, and the third chlorine water supply valve 4100 of the quantitative control control unit 4000, respectively, and corresponding to the corresponding quantitative control control unit 4000 A chlorine water production tank 5100 for receiving, storing, and mixing the first chlorine water, the second chlorine water, and the third chlorine water, each of which is supplied in a predetermined amount by a control signal, to produce chlorine dioxide water;
It is installed in an inner part of the chlorine water production tank 5100 and measures the level of chlorine dioxide water produced by mixing the first chlorine water, the second chlorine water, and the third chlorine water flowing into each corresponding quantity, and adjusting the quantity A manufacturing tank level sensor 5200 notifying the control unit 4000;
a stirring drive unit 5300 installed on an external portion of the chlorine water production tank 5100 and adjusting the rotational speed of a corresponding drive shaft in response to a corresponding control signal from the quantitative control unit 4000;
A rotation agitation unit 5400 that is installed in a rotational state at an inner part of the chlorine water production tank 5100 and rotationally drives the agitation blades 5410 by receiving the rotational driving force of the agitation drive unit 5300 connected thereto;
A discharge valve 5500 connected to a lower portion of the chlorine water production tank 5100 and discharging chlorine dioxide water produced by the corresponding control signal of the quantitative control control unit 4000;
A gas discharge valve 5600 connected to an upper part of the chlorine water production tank 5100 and discharging or blocking chlorine dioxide gas in a selected direction according to a corresponding control signal of the quantitative control unit 4000; High-concentration chlorine dioxide water production system comprising a.
According to claim 3,
The neutralization heating discharge unit 6000
A chlorine neutralization unit (6100) for first purifying the chlorine dioxide gas discharged from the chlorine water preparation unit (3000) and the chlorine dioxide gas discharged from the storage agitation unit (5000) by respectively introducing and neutralizing the chlorine gas with sodium thiosulfate ;
a neutralized gas metering discharge pump 6200 connected to the chlorine neutralization unit 6100 and discharging neutralized gas in a metered amount according to a corresponding control signal of the metering control unit 4000;
a heating filter unit 6300 connected to the neutral gas metering discharge pump 6200, heating the inflow gas to a high temperature to secondarily purify it, filtering foreign substances, tertiarily purifying it, and discharging it into the atmosphere; High-concentration chlorine dioxide production system comprising a.

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