KR102427664B1 - Anodizing processing system capable of linear movement of plated object - Google Patents

Abstract

The present invention provides an anodizing treatment system capable of linear movement of an object to be plated. According to the present invention, the anodizing treatment system comprises: an electrolysis unit (52) filled with an electrolyte solution to perform a degreasing and filming process of an object to be plated; a first cleaning unit (53) which primarily cleans the object to be plated transferred from the electrolysis unit (52); a sealing unit (54) having a sealing tank (546) containing a sealing liquid for sealing the object to be plated transferred from the first cleaning unit (53); a second cleaning unit (55) having a second leaning tank (555) in which the object to be plated transferred from the sealing unit (54) is secondarily washed; a drying unit (56) having a drying chamber in which the object to be plated transferred from the second cleaning unit (55) is dried; and a transfer unit (51) which sequentially transfers each hanger (C), on which a plurality of objects to be plated are mounted, in a linear direction from the electrolysis unit (52) to the drying unit (56). The electrolysis unit (52) includes an electrolysis sensing part for measuring the current of the electrolyte solution contained in an electrolytic tank (527), and an electrolyte replenishing part (22) for replenishing the electrolyte solution under the control of a controller (10) according to the result of the electrolyte detection.

Description

Anodizing processing system capable of linear movement of plating objects

The present invention relates to an anodizing processing system capable of linear movement of an object to be plated.

In general, anodizing (anodic oxidation) involves placing a metal or component on the anode and electrolyzing it in dilute-acid electrolyte. Oxygen generated at the anode creates an oxide film (aluminum oxide: Al2O3) with great adhesion to the base metal. is formed

Anodizing is a compound word of Anode and Oxidizing (Ano-dizing). In addition, it is different from plating metal parts on the cathode in electroplating. Aluminum (Al) is the most representative material for anodization, and anodizing is also applied to metal materials such as magnesium (Mg), zinc (Zn), titanium (Ti), tantalum (Ta), hafnium (Hf), and niobium (Nb). are processing Recently, the use of anodizing treatment of magnesium and titanium materials is gradually increasing.

In Anodizing on Aluminum Alloys, which treats the surface of an aluminum material with an oxide film, when aluminum is electrolyzed at an anode, half of the surface of the aluminum is eroded, and half of the aluminum oxide film is formed. Aluminum anodizing (anodic oxidation) can form a film with different properties depending on the composition and concentration of various electrolyte (treatment) solutions, additives, and temperature, voltage, and current of the electrolyte.

As the characteristics of the anodized film, the film is a dense oxide, which has excellent corrosion resistance and improved decorative appearance. The anode film is quite hard and has excellent wear resistance, improves paint adhesion, improves bonding performance, and lubricity. It can improve the surface quality, exhibit a unique color for decorative purposes, pre-treatment of plating is possible, and can detect surface damage.

In particular, the characteristic of hard anodizing is that low-temperature (or room-temperature) electrolysis due to the alloy properties of aluminum is a low-temperature electrolysis method in H2SO4 solution. If it is more than that, it can be said to be hard. It is a method to change the aluminum metal surface into alumina ceramic using electrical and chemical methods. When this method is applied, the aluminum metal itself is oxidized and changed to alumina ceramics, and the surface properties of aluminum are stronger than steel and have superior wear resistance than hard chrome plating. It does not peel off like plating or painting (coating), and the changed alumina ceramic surface has excellent electrical insulation (1,500V), but electricity flows well inside. A cutting-edge technology using a hard-anodizing surface treatment method is being developed and applied to such aluminum metal.

In the conventional anodizing treatment system, metal plating is completed only through an electrolytic bath, a washing bath, a sealing bath, a drying chamber, etc., which are individually installed for the object to be plated.

Here, the conventional anodizing treatment system sequentially moves the jig on which the object to be plated is mounted to the electrolytic cell, washing tank, sealing tank and drying chamber, and since the electrolytic cell and drying chamber are all independent spaces, the hangers on which a plurality of jigs are mounted are, for example, For example, when moving from the electrolytic bath to the washing bath, the lifting and lowering are repeated.

Therefore, in the conventional anodizing system, as the process of elevating and lowering the hanger has to be repeatedly performed, the moving distance is increased, and the number of parts for configuring it is increased, thereby increasing the manufacturing cost.

In addition, since the conventional anodizing treatment system as described above is provided with a plurality of lifting devices, it cannot seal the inside, so it is installed in a state in which an electrolytic cell or a sealing tank is exposed to the outside. become a risk factor for the health of

US 10-1040101 B1 (2011.06.02)

The present invention has been devised to solve the conventional problems as described above, and an object of the present invention is an anodizing treatment system capable of linear movement of a plating object capable of linear movement of the plating object so as to seal the inside of the anodizing treatment apparatus, and It is to provide a control method.

The present invention provides the following examples in order to achieve the above object.

An embodiment of the present invention provides an electrolysis unit filled with an electrolyte to perform a degreasing and coating process of a plating object, a first washing unit for first washing the plating object moved from the electrolysis unit, and plating moved from the first washing unit A sealing part having a sealing tank in which a sealing liquid for sealing an object is accommodated, a second cleaning part having a second cleaning tank in which the plating object moved from the sealing part is secondarily washed, and the plating object moved from the second cleaning part It includes a drying unit having a drying chamber to be dried and a transfer unit for sequentially moving each of the hangers on which the plurality of plating objects are mounted from the electrolysis unit to the drying unit in a linear direction, and the electrolysis unit measures the current of the electrolyte contained in the electrolytic cell. It includes an anodizing processing system capable of linear movement of a plating object including a sensing unit, and an electrolyte replenishing unit for replenishing the electrolyte under the control of the controller according to the result of the detection of the electrolyte.

Another embodiment of the present invention is a control method of an anodizing processing system capable of linear movement of an object to be plated. Discharging the electrolyte of the electrolytic cell, opening the first sluice gate between the electrolytic cell and the first washing tank to move the plating object to the first washing tank, and lifting the first sluice gate to block between the first washing tank and the electrolytic cell, and controlling the controller After the first washing of the plating object moved to the washing tank by Blocking the space between the first washing tank and the sealing tank by elevating the machine, supplying the sealing liquid to the sealing tank under the control of the controller until a set water level is reached, and discharging the sealing liquid after the set time has elapsed; , opening the third sluice gate between the sealing tub and the second washing tub under the control of the controller, moving the plating object to the second washing tub, and lifting the third sluice gate to block between the sealing tub and the second washing tub; After the second washing of the object to be plated in the second washing tank by control, and after the second washing, the fourth sluice gate between the second washing tank and the drying chamber is opened under the control of the controller, and the object to be plated is moved to the drying room, after which the fourth It may include the steps of blocking between the second washing tank and the drying chamber by elevating the sluice gate, and drying the plating object in the drying chamber under the control of a controller.

Therefore, according to the present invention, the electrolytic cell, sealing tank, washing tank, drying room, etc. constituting the anodizing treatment system can all be sealed with a single housing as the plating object moves in a straight line without raising/lowering operation, thereby improving the working environment.

In addition, the present invention has the effect of reducing the manufacturing cost by omitting the device required for the lifting and lowering of the object to be plated.

1 is a diagram schematically illustrating an anodizing processing system capable of linear movement of an object to be plated according to the present invention.
FIG. 2 is a side cross-sectional view schematically illustrating the electrolytic cell and the first washing tank of FIG. 1 .
3 is a side cross-sectional view schematically illustrating the sealing tank and the second washing tank of FIG. 1 .
4 is a plan view schematically illustrating another embodiment of the present invention.
5 is a side view showing another embodiment of the transfer unit.
6 is a flowchart illustrating a control method of an anodizing processing system capable of linear movement of an object to be plated according to the present invention.
7 is a flowchart illustrating step S20.
8 is a flowchart illustrating step S30.
9 is a flowchart illustrating step S40.

The terms or words used in this specification and claims are not to be construed as limited in their ordinary or dictionary meanings, and on the principle that the inventor can appropriately define the concept of the term in order to best describe the user's invention in the best way. It should be interpreted as meaning and concept consistent with the technical idea of the present invention.

Throughout the specification, when a part "includes" a certain component, it means that other components may be further included, rather than excluding other components, unless otherwise stated. In addition, the “… wealth", "… energy", "… However, terms such as “module”, “device” and the like mean a unit that processes at least one function or operation, which may be implemented as a combination of hardware and/or software.

Terms used in the embodiments of the present invention will be briefly described, and the present embodiments will be described in detail.

The terms used in the embodiments of the present invention have been selected as currently widely used general terms as possible while considering the functions in the present invention, but this may vary depending on the intention or precedent of a person skilled in the art, the emergence of new technology, etc. . In addition, in a specific case, there is a term arbitrarily selected by the applicant, and in this case, the meaning will be described in detail in the description of the corresponding embodiments. Therefore, the terms used in the present embodiments should be defined based on the meaning of the term and the overall contents of the present embodiments, rather than the name of a simple term.

In an embodiment of the present invention, terms including ordinal numbers such as first, second, etc. may be used to describe various elements, but the elements are not limited by the terms. The above terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, a first component may be referred to as a second component, and similarly, a second component may also be referred to as a first component. and/or includes a combination of a plurality of related listed items or any of a plurality of related listed items.

Also, in embodiments of the present invention, the singular expression includes the plural expression unless the context clearly dictates otherwise.

In addition, in an embodiment of the present invention, terms such as "comprise" or "have" are intended to designate that the features, numbers, steps, operations, components, parts, or combinations thereof described in the specification exist, but one It should be understood that it does not preclude the possibility of the presence or addition of or more other features or numbers, steps, operations, components, parts, or combinations thereof.

Hereinafter, a preferred embodiment of an anodizing processing system capable of linear movement of a plating object according to the present invention and a control method thereof will be described with reference to the accompanying drawings.

1 is a diagram schematically illustrating an anodizing processing system capable of linear movement of an object to be plated according to the present invention.

Referring to FIG. 1 , the present invention includes a driving member 50 for moving a hanger C on which a plurality of jigs Z on which a plating object is mounted are installed, and an input unit 40 into which the hangers C are put, and , a discharge unit 60 for discharging the hanger C on which the dried plating object is mounted, a controller 10 for controlling the driving member 50, and a sealing member 30 for supplying and sensing a sealing agent; It includes an electrolytic member 20 for sensing and supplying the electrolytic solution.

The controller 10 controls the driving member 50 . For example, the controller 10 controls the position of the hanger C and the state information of the driving member 50 (whether the motor is operating, whether the nozzle is operating, the capacity of the electrolyte, the capacity of the sealing agent, the device currently in operation) And it may include a plurality of sensors for measuring the position of the object to be plated.

In addition, the controller 10 may include a display for outputting status information, an operation panel for installation or deletion of an operation command or program, and an operation panel for setting a driving condition, an alarm for alarming a failure or abnormality, and the like.

The electrolyte member 20 may include an electrolyte sensing unit 21 for detecting the concentration of the electrolyte charged in the driving member 50 , and an electrolyte replenishing unit 22 for replenishing the electrolyte.

Here, the electrolyte sensing unit 21 senses the current of the electrolyte. For example, when the concentration of sulfuric acid decreases due to the number of times of use of the electrolyte increases or moisture permeates from the outside, the current value decreases as the concentration of sulfuric acid decreases. Therefore, the electrolyte detection unit 21 detects the concentration of the electrolyte by measuring the current.

The electrolyte replenishing unit 22 supplements sulfuric acid or purified water with the driving member 50 according to the detection result of the electrolyte sensing unit 21 . For example, after being supplied to the electrolytic cell 527, the electrolyte is discharged to the electrolyte filtration tank during the operation of the driving member 50 to be described later, and then is re-supplied to the electrolytic cell 527 through a filtering process of filtering out foreign substances. The electrolyte replenisher 22 may re-supply sulfuric acid and/or purified water according to the detection result of the electrolyte detection unit 21 in the re-supply process of the electrolyte.

Here, the electrolyte replenishment unit 22 may further include a sulfuric acid and purified water supply device (eg, a pump or a supply pipe and an electromagnetic on/off valve) for replenishing the electrolyte.

In addition, the electrolyte detection unit 21 may further include a turbidity detection means capable of detecting turbidity in order to measure the level of impurities suspended in the electrolyte.

For example, the electrolytic cell 527 is not accommodated in the electrolytic cell 527 for a long time unlike the conventional one, but is re-supplied through the electrolytic drain tank 523 and the electrolytic replenishment tank 525 each time a different plating object is put in and moved. can be

However, when the electrolytic cell 527 is used for a long period of time, foreign substances may come off from the apparatus of the electrolytic cell 527 itself, such as a wall surface, and other materials other than the electrolyte may permeate according to an unexpected situation.

Therefore, the present invention is characterized in that the turbidity of the electrolyte is sensed to prepare for such an unexpected situation.

The controller 10 may output a notification or warning message through the display according to the turbidity detection result.

The sealing member 30 may include a sealing liquid sensing unit 31 for detecting the sealing liquid, and a sealing liquid replenishing unit 32 for replenishing the sealing liquid.

The sealing liquid detection unit 31 detects the concentration of ions that degrade the performance of the sealing liquid in the sealing tank 546 . For example, the plating object is subjected to the electrolytic bath 527 and a washing process, and then a sealing process is performed. Therefore, the sealing tank 546 may contain various foreign substances such as ions of the electrolyte that are not cleaned from the object to be plated, water during the washing process, or fine metal separated from the object to be plated. Such ions or foreign substances are a factor that deteriorates the performance during the sealing process.

Therefore, the sealing liquid detecting unit 31 detects the concentration of ions in the sealing tank 546 and outputs the result to the sealing liquid replenishing unit 32 .

The sealing liquid replenishment unit 32 receives the detection result of the sealing liquid detection unit 31 , and when an ion concentration exceeding a set standard is detected, drains the current sealing liquid and supplies a new sealing liquid.

Here, the sealing liquid replenishing unit 32 may further include a separate storage tank for re-supply after draining the sealing liquid according to the opening and closing of the sluice gate of the driving member 50, which will be described later, and a sealing liquid storage tank for supplying a new sealing liquid. can

The driving member 50 includes an electrolysis unit 52 having an electrolytic bath 527 , a first washing unit 53 having a first washing bath 535 , a sealing unit 54 having a sealing bath 546 , A second washing unit 55 having a second washing tank 555 and a drying unit 56 having a drying chamber are integrally formed and extend from both sides of the electrolytic unit 52 to the drying unit 56 to hanger It may include a transfer unit 51 for sequentially moving (C).

Here, the electrolytic bath 527, the first washing bath 535, the sealing bath 546, the second washing bath 555, and the drying chamber may be configured as a single enclosure extending in one direction with a space between each other, and both sides of the enclosure The above-described transfer unit 51 is installed to sequentially move the plurality of hangers (C).

In addition, the driving member 50 may further include a plurality of sluice gates dividing each space described above. The plurality of sluice gates are, for example, a first sluice gate g1 dividing the electrolysis unit 52 and the first washing unit 53 , and a second sluice gate dividing the first washing tank 535 and the sealing unit 54 . (g2), a third sluice gate g3 dividing the sealing unit 54 and the second washing unit 55, and a fourth sluice gate g4 dividing the second washing unit 55 and the drying unit 56 ) may be included.

The first to fourth sluice gates g4 may be moved up and down by the control of the controller 10 as described above, and may block or open spaces between each space. In addition, the driving member 50 may further include a mechanical device such as a motor for operating the first to fourth moisture, and a detailed description thereof will be omitted as well-known techniques are applied.

That is, in the present invention, the space is partitioned within a housing in which the electrolytic cell 527 to the drying chamber are integrally formed, and as the transfer unit 51 for moving the hanger C is extended in one direction from both sides of the housing, the upper part is opened. It is possible to configure the electrolytic cell 527 to the sealing tank 546 as a space shielded from the outside.

For example, in the present invention, the above-described controller 10, the sealing member 30, the electrolytic member 20, and the driving member 50 may be installed in a single housing sealed inside.

A description of each of the components will be described in more detail below, and the description of the double electrolytic unit 52 and the first washing unit 53 will be described with reference to FIG. 2 .

FIG. 2 is a side cross-sectional view schematically illustrating the electrolysis unit 52 and the first washing unit 53 of FIG. 1 .

Referring to FIG. 2 , the electrolytic unit 52 includes an electrolytic cell 527 in which an electrolyte is accommodated, an electrolytic drain 523 in which the electrolyte discharged from the electrolytic cell 527 is accommodated, and the discharged electrolyte is returned to the electrolytic cell 527 . Includes an electrolytic replenisher 525 to supply.

The electrolytic cell 527 has an open upper surface, and forms a space partitioned by a bottom surface and an upright wall surface to receive an electrolyte solution. Here, the transfer part 51 is extended to both upper ends of the electrolytic cell 527, respectively.

Here, in the electrolytic cell 527 , a first sluice gate g1 is formed as a wall dividing the adjacent first washing tank 535 . The first sluice gate g1 may open or block between the electrolytic cell 527 and the first washing tank 535 while moving up and down.

In addition, a plurality of first discharge means 522 is provided on the bottom surface 521 of the electrolytic cell 527 . The first discharge means 522 is a device (for example, an electromagnetic on/off valve) for opening or blocking the through hole formed in the bottom surface and/or the installed discharge port under the control of the controller 10, and the electrolytic drain tank ( 523) to discharge the electrolyte or accommodate the electrolyte in the electrolytic cell 527.

The electrolytic drain tank 523 is a space formed below the electrolytic cell 527 and accommodates the electrolyte discharged from the electrolytic cell 527 . Here, the electrolytic drain tank 523 may include one or more foreign substances filters for filtering foreign substances (eg, metal lumps, powders, or dust separated from the plating object) introduced into the electrolyte.

The foreign material filter is, for example, a first filter 524a that is detachably fixed to a position close to the bottom of the electrolytic cell 527, and a wall surface partitioning between the electrolytic replenishment tank 525 and the electrolytic drain tank 523 It may include a second filter (524b) installed in the.

The first filter 524a filters foreign substances contained in the electrolyte discharged from the electrolytic tank 527, for example, as a filtering net, and may be coupled to the rails installed on both side walls of the electrolytic drain tank 523 in a sliding manner.

The second filter 524b is a wall dividing the electrolysis replenishment tank 525 and the electrolytic drain tank 523, and in the process of introducing the electrolytic solution first filtered in the electrolytic drain tank 523 into the electrolytic replenishment tank 525 filter out foreign matter Here, the second filter 524b may be installed in a flow path through which a part of an upright wall surface between the electrolysis replenishment tank 525 and the electrolysis drain tank 523 is opened and the electrolyte moves, or may be installed as a wall surface itself.

The electrolytic replenishment tank 525 receives the electrolyte discharged to the electrolytic drain tank 523 , and re-supply the electrolyte to the electrolytic cell 527 under the control of the controller 10 . To this end, the electrolytic replenishment tank 525 may include a first pump P1 and a supply pipe 526 extending from the electrolytic replenishment tank 525 to the electrolytic cell 527 .

The first pump (P1) is operated by the controller (10) to re-supply the electrolyte contained in the electrolytic replenishment tank (525) to the electrolytic cell (527).

That is, the electrolyte of the electrolytic cell 527 is discharged from the electrolytic cell 527 when the first discharge means 522 is opened under the control of the controller 10, and then through the electrolytic drain tank 523 and the electrolytic replenishment tank 525. It is filtered and re-supplied to the electrolyzer 527 .

Here, the electrolyte detection unit 21 measures the current of the electrolyte through a current detection sensor installed inside the electrolysis water tank 523 .

In addition, the electrolyte replenishment unit 22 supplies sulfuric acid and/or purified water to the electrolysis replenishment tank 525 according to the detection result of the electrolyte detection unit 21 . To this end, the electrolyte replenishment unit 22 may include an electrolyte storage tank and a purified water storage tank.

In addition, the electrolytic replenishment tank 525 may further include a stirring device made of rotary blades for mixing the replenishment electrolyte such as sulfuric acid supplemented in the electrolyte replenishment unit 22 .

The transfer unit 51 includes a rotary roller 511 that is rotated by driving a motor, and a transfer belt 512 meshed with the rotary roller 511 on which both ends of the hanger C are mounted.

The double conveying belt 512 is provided with a protrusion protruding upward for each set distance to support the end of the hanger (C).

Here, the transfer belt 512 extends in a straight direction to the above-described electrolytic bath 527 , the first washing bath 535 , the sealing bath 546 , the second washing bath 555 and the drying chamber.

The hanger (C) is a rod-shaped extending in both directions, and the upper ends of the plurality of jigs (Z) are mounted.

In addition, each jig (Z) is formed with a plurality of support protrusions protruding to the outside of the upright body, the object to be plated is mounted.

That is, a plurality of plating objects are mounted on one jig (Z), and a plurality of jigs (Z) are mounted on a hanger (C) each of which both ends are supported on both sides of the transfer belt 512 .

Accordingly, the transfer unit 51 may move the plurality of hangers C from the electrolytic cell 527 to the drying chamber in a linear direction without changing the direction and/or elevating or lowering.

In addition, the first sluice gate g1 is an upright wall that divides the electrolytic cell 527 and the first washing tank 535, and is raised and lowered up and down under the control of the controller 10 to the electrolytic cell 527 and the first washing tank 535. ) to open or block between them. Here, the lower end of the first sluice gate g1 may be configured as a dam 571 that extends in the transverse direction and is raised from the bottom surface of the electrolytic cell 527 and the first washing tank 535 .

Here, the dams 571 , 572 , 583 , and 574 are installed in at least one of the electrolytic cell 527 , the first washing tank 535 , the second washing tank 555 , the sealing tank 546 , and the drying chamber. The dams 571, 572, 583, and 574 have a set height from the bottom of the space, and extend along the sluice gates g1, g2, g3, g4 to cross between the two walls dividing the space. Prevent overflow of any one of electrolyte, cleaning solution, and sealing solution.

For example, when a set time elapses after the degreasing and coating process in which the object to be plated is put into the electrolytic cell 527 , the controller 10 opens the first discharging means 522 to discharge the electrolyte solution in the electrolytic cell 527 . make it

And when the electrolyte in the electrolytic cell 527 is discharged below a set height, the controller 10 lowers the first sluice gate g1 to open the space between the electrolytic cell 527 and the first washing tank 535 . Then, the controller 10 operates the transfer unit 51 to move the plurality of hangers C located in the electrolytic cell 527 to the first washing tank 535, and if the hanger C is not detected in the electrolytic cell 527, After elevating the first sluice gate g1, the first pump P1 may be operated to re-supply the electrolyte.

At this time, the dam has the height of the hanger (C) of the sluice gate, that is, the height enough to prevent the plating object from being caught during movement. installed to do so.

Therefore, the present invention does not elevate the object to be plated in the electrolytic cell 527 through the first sluice gate g1 elevating and lowering between the electrolytic cell 527 and the first washing tank 535, but in a straight direction to the first washing tank 535. It can be moved, and foreign substances in the electrolyte can be removed at each degreasing and coating process.

The first washing unit 53 may include a first washing tank 535 , a first washing discharge means 532 , washing drain tanks 533 and 523 , and a first discharge pipe 534 .

The first washing tank 535 has an open top surface and an upright wall surface and a bottom surface to accommodate a plurality of plating objects mounted on the hanger C and form a cleaning space.

Here, the bottom surface 531 of the first washing tank 535 is composed of a mesh-shaped plate in which a plurality of discharge holes through which the washing liquid discharged from the first washing discharge means 532 can be immediately discharged, and an upright wall surface is formed. It is formed of a first sluice gate g1 and a second sluice gate g2 that ascend and descend vertically.

The first washing and discharging means 532 sprays the washing solution onto the plating object mounted on the hanger C transferred to the transfer unit 51 as a plurality of pieces fixed on the bottom or wall surface of the first washing tub 535 . Here, the cleaning liquid is supplied from the cleaning liquid storage tank. The washing liquid storage tank may be installed in the housing, or may be connected to a separate pipe and installed outside the housing.

The washing drain tank 533 is formed as a space for receiving the washing liquid discharged from the lower side of the first washing tank 535 . The washing water tank 533 is formed as a space partitioned with the wall surface and the electrolysis water tank 523 of the electrolysis unit 52 interposed therebetween, for example. Here, the washing drain tank 533 includes a first discharge pipe 534 extending to the outside, and a second pump P2 for discharging the washing liquid to the outside through the first discharge pipe 534 .

That is, the washing drain tank 533 temporarily accommodates the washing solution discharged from the upper first washing tank 535 , and pumps the washing solution into the external purification tank by the second pump P2 operated under the control of the controller 10 . discharged with Here, the second pump P2 may be replaced with an electromagnetic valve that opens and closes the outlet of the washing drain tank 533 .

After the hanger C is moved in the electrolytic cell 527 , the controller 10 operates the washing/discharging means 532 to first wash the plating object. And when the set time elapses, after opening the second sluice gate g2 , the transfer unit 51 is operated to move the object to be plated in the first washing tank 535 to the sealing unit 54 .

The sealing part 54 and the sealing member 30 will be described with reference to FIG. 3 .

3 is a side cross-sectional view schematically illustrating a sealing part and a second washing tank.

Referring to FIG. 3 , the sealing part 54 includes a sealing tank 546 for accommodating the sealing liquid, a second discharge means 542 for discharging the sealing liquid from the sealing tank 546 , and the sealing tank 546 . A sealing reservoir 543 for accommodating the discharged sealing solution, a third pump P3 for re-supplying the sealing solution from the sealing reservoir 543 to the sealing tank 546, and a third discharge for discharging the sealing solution to the outside means 544 .

The sealing liquid is injected into the sealing tank 546 to seal pores on the surface of the oxide film in order to prevent corrosion and contamination of the oxide film formed on the surface of the plating object immersed in the electrolyte.

The sealing jaw 546 has an open upper surface, and a transfer belt 512 extends from both sides of the upper surface. In addition, the opposite wall surfaces of the wall surfaces of the sealing tank 546 are composed of a second sluice gate g2 and a third sluice gate g3. In addition, the sealing tank 546 is provided with a sealing discharge means 542 for spraying and/or supplying the sealing liquid supplied from the sealing storage tank 543 and/or the external storage tank.

Therefore, the sealing tank 546 accommodates the sealing liquid as a space between the first washing tank 535 and the second washing tank 555 and accommodates the plating object moved through the second sluice gate g2 . The sealing tank 546 is supplied with a sealing liquid after movement of the object to be plated, and discharges the sealing liquid before movement. Also, the object to be plated is moved to the second washing tank 555 through the third sluice gate g3 opened after the sealing liquid is discharged.

The second discharge means 542 is a plurality of through-holes installed on the bottom surface 541 of the sealing tank 546 or an electromagnetic on-off valve for opening and closing pipes, and the through-holes of the bottom surface 541 under the control of the controller 10 . Alternatively, by opening the pipe, the sealing liquid in the sealing tank 546 is discharged to the sealing storage tank 543 on the lower side.

The sealing reservoir 543 is a space formed below the bottom surface 541 of the sealing tank 546 and receives the sealing liquid discharged from the sealing tank 546 . Here, the sealing reservoir 543 may be provided with a sealing liquid sensing unit 31 .

Here, the sealing storage tank 543 may further include a filter to filter out foreign substances contained in the sealing liquid falling from the sealing tank. The filter (not shown) is configured in the form of a mesh having micro-holes to filter out fine foreign substances, and is fixed in the same shape as the ceiling surface of the sealing reservoir 543 at the upper side of the sealing reservoir (bottom side of the sealing tank). . Here, the side end of the filter (not shown) may be fixed to the wall surface of the sealing reservoir 543 .

The third pump P3 is operated under the control of the controller 10 to re-supply the sealing liquid from the sealing storage tank 543 to the sealing tank 546 . To this end, a sealing supply pipe 526 may be installed between the sealing reservoir 543 and the sealing tank 546 . That is, the sealing liquid is supplied from the sealing tank 546 to the sealing tank 543 by the second discharge means 542 and from the sealing tank 543 to the sealing tank 546 by the operation of the third pump P3. .

Here, the sealing reservoir 543 includes a third discharging means 544 (eg, an electromagnetic valve capable of opening and closing the drain hole) so as to discharge the sealing liquid of the sealing reservoir 543 to an external septic tank.

In addition, the sealing tank 546 and the sealing storage tank 543 may include a heater for maintenance of the sealing tank 546 .

The third discharge means 544 is opened under the control of the controller 10 to discharge the sealing liquid in the sealing storage tank 543 to the outside. Here, the controller 10 discharges the sealing liquid to the outside according to the detection result of the sealing liquid detection unit 31 (eg, a result value that cannot be reused).

For example, the sealing liquid detection unit 31 detects the ion concentration of the sealing liquid discharged from the sealing storage tank 543 . For example, the sealing liquid sensing unit 31 may include an electrolyte component remaining in the plating object and delivered to the sealing tank 546 or a component separated from the plating object (Cu2+, Fe2+, F-, SiO33-, PO42-, S042). -) to detect the concentration.

Alternatively, the sealing liquid sensing unit 31 may detect the PH of the sealing liquid.

And the sealing liquid detecting unit 31 outputs the detection result to the controller 10 and/or the sealing liquid replenishing unit 32 .

The sealing liquid replenishing unit 32 may replenish the sealing liquid according to the detection result of the sealing liquid detecting unit 31 and/or the control of the controller 10 .

Here, the sealing liquid replenishment unit 32 re-supply the sealing liquid stored in a separate sealing liquid storage tank to the sealing tank 546 under the control of the controller 10, or supply a solvent such as sodium hydroxide for pH management into the sealing tank. (546) can be supplied.

When the hanger C is detected at the set position after the second sluice gate g2 is opened, the controller 10 operates the third pump P3 to transfer the sealing liquid stored in the sealing storage tank 543 to the sealing tank 546 . ) to re-supply and count the set time. At this time, the sealing liquid is discharged to the sealing discharge means 542 through a pipe connected from the sealing storage tank 543 to the sealing tank 546 while the third pump P3 is operated.

And when the set time elapses, the controller 10 operates the second discharge means 542 to discharge the sealing liquid in the sealing tank 546 to the sealing storage tank 543. If the level of the sealing liquid is below the set standard, The third sluice gate g3 is opened, and the transfer unit 51 is operated to move the plurality of hangers C on which the object to be plated is mounted to the second washing unit 55 .

The second washing unit 55 includes a second washing tub 555 , a second washing tub 555 accommodating a washing solution, a second washing discharging means 552 for spraying the washing solution, a second discharge pipe 554 , and A fourth pump P4 may be included.

The second washing tank 555 has an open upper surface and is partitioned by an upright wall to form a space for secondary washing of the plating object after the sealing process.

The second washing and discharging means 552 is installed on the bottom or wall surface of the second washing tub 555 to supply the washing solution to the second washing tub 555 . The cleaning liquid is supplied to the second cleaning discharge means 552 through a supply pipe 526 connected from the cleaning liquid storage tank.

Here, the bottom surface 551 of the second washing tank 555 is formed in a mesh shape so that a plurality of outlets are formed or the washing liquid can immediately fall into the second washing drain tank 533 below.

The second washing drain tank 553 forms a space for temporarily accommodating the washing liquid discharged from the second washing tank 555 .

The second discharge pipe 554 extends from the second washing drain tank 553 to an external septic tank or a waste storage tank.

The fourth pump P4 discharges the washing liquid accommodated in the second washing drain tank 553 . The washing liquid is discharged to the outside through the second discharge pipe 554 connected to the second washing drain tank 553 .

Here, the washing liquid may be re-supplied or discharged to a septic tank after passing through a separate purification device. A device for supplying and purifying the washing solution, and the like, generally correspond to well-known techniques, and thus a description thereof will be omitted.

The fourth sluice gate g4 is lowered under the control of the controller 10 to open between the second washing tank 555 and the drying unit 56 .

Accordingly, the object to be plated is moved from the second washing tank 555 to the drying unit 56 by the transfer unit 51 operated under the control of the controller 10 .

The drying unit 56 dries the moved object to be plated. The drying unit 56 is generally omitted as a drying technique of a known anodizing treatment system is applied.

As described above, in the present invention, the electrolysis unit 52 to the drying unit 56 extend in one direction as an integrated housing, and the transfer unit 51 extends in a straight direction from the upper surface of the housing to shield the outside and the inside. can be installed in

Here, the housing may include an input unit 40 capable of putting in the hanger C and a plating object from one side, and a discharge unit 60 discharging the dried hanger C.

The input unit 40 may include a door opened from one side of the housing to allow the hangers C on which the plating object is mounted to be introduced into the housing through the door.

In addition, the discharge unit 60 has an open door, and the hanger C moved by the transfer unit 51 is discharged. The operator may collect the hanger C and the plating object discharged through the discharge unit 60 , and separate and accommodate the collected plating object and the hanger C.

As described above, the present invention consists of a housing in which the electrolytic bath 527, the first washing bath 535, the second washing bath 555, the sealing bath 546, and the drying unit 56 extend in one direction, between A plurality of sluice gates elevating up and down were provided to prevent the plating object moving in a straight direction from being caught on the hanger (C).

Therefore, in the present invention, there is no need to separately provide a lifting device for each section in order to move the object to be plated among the separated devices, unlike the prior art, and thus the time required for moving the object to be plated can be shortened.

In addition, the present invention is provided with a transfer unit 51 for moving the object to be plated in a linear direction, but it is also possible to provide an independent transfer unit 51 for each section so that the object to be plated can be moved independently for each section. This will be described with reference to FIGS. 4 and 5 .

Figure 4 is a plan view schematically showing another embodiment of the present invention, Figure 5 is a side view showing another embodiment of the transfer unit (51).

4 and 5 , another embodiment of the present invention includes an electrolysis unit 52 having an electrolytic bath 527 , a first washing unit 53 having a first washing bath 535 , and a sealing bath 546 . ), a sealing unit 54 having a drying chamber and a drying unit 56 having a drying chamber are partitioned by a plurality of sluice gates in the enclosure extending in one direction.

In addition, the transfer unit 51 extends in a straight direction from the upper surfaces of both sides of the housing as above and sequentially moves a plurality of hangers C on which a plurality of jigs Z in which plating objects are accommodated are mounted under the control of the controller 10 . . Here, the transfer unit 51 may be configured in plurality installed for each section.

For example, the transfer unit 51 includes a first transfer unit 51a extending to the electrolysis unit 52 , a second transfer unit 51b installed in the first washing unit 53 , and a second transfer unit 51b installed in the sealing unit 54 . It may include a third transfer unit 51c, a fourth transfer unit 51d installed in the second washing unit 55 , and a fifth transfer unit 51e installed in the drying unit 56 .

Each of the first to fifth transfer units 51a to 51e may include a plurality of rotating rollers 511 and a transfer belt 512 rotated by the plurality of rotating rollers 511 . The transfer belt 512 may include a plurality of support protrusions that protrude upward to support the hanger C and are spaced apart from each other at a set interval.

Each transfer unit 51 may be disposed such that a section overlaps with another transfer unit 51 having a start end and/or an end adjacent thereto. Accordingly, the hanger C may be moved in a specific section and then moved to another transfer unit 51 in the section where the transfer unit 51 overlaps.

For example, the first transfer unit 51a extends from the input unit 40 to a position passing the first sluice gate g1, and the second transfer unit 51b is the electrolysis unit 52 before the first sluice gate g1. ) side, the start end may be located, and the end may be located in the sealing tank 546 beyond the second sluice gate g2. In addition, the third transfer unit 51c, the fourth transfer unit 51d, and the fifth transfer unit 51e are respectively installed in the sections of the sealing unit 54, the second washing unit 55, and the drying unit 56, respectively, In the section where the start end and the end are installed, it overlaps with the adjacent transfer unit 51 to receive or deliver the hanger (C).

Therefore, the hanger (C) is the first transfer unit 51a in the section of the electrolysis unit 52, the second transfer unit 51b in the section of the first washing unit 53, and the third transfer unit in the section of the sealing unit 54 ( 51c), the fourth transfer unit 51d in the section of the second washing unit 55 and the fifth transfer unit 51e in the space of the drying unit 56 .

The divided transfer unit 51 allows the electrolysis unit 52, the sealing unit 54, the first washing unit 53, the second washing unit 55, and the drying unit 56 to operate simultaneously.

For example, while the first group of objects to be plated is undergoing degreasing and coating processes in the electrolytic bath 527, the second transfer unit 51b and the third transfer unit 51c are operated to operate the second transfer unit 51b and the third transfer unit 51c, and The sealing process may be performed by moving the two groups of plating objects to the sealing tank 546 .

The present invention includes a control method of an anodizing processing system capable of linear movement of a plating object achieved through the configuration as described above. This will be described with reference to the flowcharts of FIGS. 6 to 10 .

6 is a flowchart illustrating a control method of an anodizing processing system capable of linear movement of an object to be plated according to the present invention.

Referring to FIG. 6 , the present invention includes a step S10 of mounting the object to be plated on a hanger (C), a step S20 of immersing the object to be plated in an electrolytic bath 527 to form a degreasing and coating film, and a first washing of the object to be plated It includes a step S30, a step S40 of sealing the object to be plated, a step S50 of secondarily washing the object to be plated, and a step S60 of drying the object to be plated.

Step S10 is a step in which the operator mounts the jig (Z) on which the plating object is mounted on the hanger (C), and inserts the hanger (C) between the support protrusions between the transfer belts (512) and the hanger (C). Here, when the operator inputs the on switch through the operation panel, the controller 10 operates the transfer unit 51 . Accordingly, the conveying unit 51 moves the conveying belt 512 while the rotating roller 511 is operated.

The operator sequentially mounts both ends of the hanger C between the transfer belts 512 through the input unit 40 . At this time, the hanger (C) was placed in the electrolytic cell (527) immediately after the input.

Step S20 is a step in which the object to be plated is degreased and coated in the electrolytic bath 527 for a set time. Here, the controller 10 moves the plating object to the first washing tank 535 by counting the set time. At this time, the controller 10 may discharge the electrolyte to the electrolysis sump 523 before opening the first sluice gate g1, and proceed to step S70 of replenishing the electrolyte according to the detection result of foreign substances in the electrolyte.

Such steps S20 and S70 will be described later with reference to FIG. 7 .

Step S30 is a step of first washing the object to be plated. The controller 10 detects the position of the object to be plated and sprays the cleaning solution through the first cleaning/discharging means 532 to wash the electrolyte components and other foreign substances remaining in the object to be plated. Here, the controller 10 selectively elevates the first sluice gate g1 and the second sluice gate g2. This will be described later with reference to FIG. 8 .

Step S40 is a step of sealing the plating object. After the first washing, the controller 10 lowers the second sluice gate g2 to open the space between the first washing tub 535 and the sealing tub 546, and then drives the transfer unit 51 to transfer the plating object to the sealing tub 546. ), and the second sluice gate g2 is raised and lowered to close the space between the first washing tank 535 and the sealing tank 546 .

And the controller 10 supplies the sealing liquid to the sealing tank 546 to proceed with the sealing process. Here, the controller 10 may detect the sealing liquid and select either replenishment or discharge to proceed. Such step S40 will be described later with reference to FIG. 9 .

Step S50 is a second washing step of the object to be plated. After the sealing is completed, the controller 10 opens the third sluice gate g4 to move the plating object to the secondary washing tub, and raises and lowers the third sluice gate g4 again to the second washing tub 555 and the sealing tub 546. cut off between Then, the controller 10 operates the second cleaning and discharging means 552 to secondarily clean the object to be plated.

Step S60 is a step of drying the object to be plated. After opening the fourth sluice gate g4 between the second washing tank 555 and the drying unit 56, the controller 10 drives the transfer unit 51 to move the plating object to the drying room, and then operates a heater and a fan. Dry the plating object.

And when the work is completed, the controller 10 may output notification information of the work completion through the operation panel or the display.

7 is a flowchart illustrating step S20.

Referring to FIG. 7, step S20 includes a step S21 of counting the time after the object to be plated is put into the electrolyzer 527, a step S22 of draining the electrolyte when the set time is completed, a step S23 of measuring the level of the electrolyte, and , step S24 of opening the first sluice gate g1 , and moving the plating object to the first washing tank 535 .

Step S21 is a step in which the controller 10 counts time. The operator can input the time required for degreasing and film treatment through the operation panel. Accordingly, the controller 10 counts the input time.

Step S22 is a step of discharging the electrolyte in the electrolyzer 527 when the time set by the controller 10 has elapsed. The controller 10 controls the first discharging means 522 to discharge the electrolyte in the electrolytic cell 527 to the electrolytic draining tank 523 .

Step S23 is a step in which the controller 10 detects the level of the electrolyte.

Step S24 is a step of opening the first sluice gate g1 when the level of the electrolyte detected by the controller 10 reaches a set level. The first sluice gate g1 is a wall that blocks between the electrolytic cell 527 and the first washing tank 535 and is raised and lowered up and down. Accordingly, the controller 10 lowers the first sluice gate g1 to open the gap between the electrolytic cell 527 and the first washing tank 535 to form a passage through which the object to be plated can move.

Step S25 is a step in which the controller 10 controls the transfer unit 51 to move the plating object to the first washing tank 535 . Here, the controller 10 stops the transfer unit 51 and raises and lowers the first sluice gate g1 when it is sensed that the plating objects moved to the first washing tub 535 reach their original positions, and thus the electrolytic tub 527 and the second sluice gate g1 are raised and lowered. 1 The washing tank 535 is shut off.

In this step S20, the controller 10 may temporarily accommodate the electrolyte discharged from the electrolyzer 527 and then re-supply it to the electrolyzer 527 after the step S25. This proceeds through step S70.

Step S70 includes a step S71 of filtering impurities from the electrolyte discharged from the electrolyzer 527 and accommodating it in the electrolysis sump 523, a step S72 of measuring the current of the electrolyte accommodated in the electrolysis sump 523, and the current measurement result According to a step S73 of selectively replenishing the electrolyte, a step S74 of elevating the first sluice gate g1, and a step S75 of recharging the electrolyte into the electrolytic cell 527.

Step S71 is a step in which the controller 10 operates the first discharge means 522 of the electrolyzer 527 to drain the electrolyte into the electrolytic drain tank 523 while filtering it to remove foreign substances.

Step S72 is a step in which the electrolyte detection unit 21 measures the current of the electrolyte accommodated in the electrolysis sump 523 .

Step S73 is a step in which the electrolyte replenishing unit 22 replenishes the electrolyte according to the detection result of the electrolyte detecting unit 21. The electrolyte replenishing unit 22 corresponds to the current measurement result set condition, the components of the electrolyte and / or purified water is replenished with the electrolytic replenishment tank (525).

Step S74 is a step in which the controller 10 elevates the first sluice gate g1 according to the position of the plating object after step S25 to seal the electrolytic cell 527 .

Step S75 is a step in which the controller 10 controls the first pump P1 to re-supply the electrolyte contained in the electrolyte replenishment tank 525 to the electrolyte tank 527 .

That is, according to the present invention, the electrolyte may be recovered every time the process of the electrolyte of the object to be plated is completed, while filtering foreign substances, and re-supplied through the replenishment process of the electrolyte. Therefore, according to the present invention, plating failure due to poor electrolyte solution can be prevented.

8 is a flowchart illustrating step S30.

Referring to FIG. 8, step S30 includes a step S31 of detecting the position of the object to be plated, a step S32 of raising and lowering the first sluice gate g1 to close the first washing tank 535, a step S33 of spraying a washing liquid, A step S34 of counting the set time, a step S35 of opening the first sluice gate, and a step S36 of moving the plating object to the sealing tank 546 are included.

Step S31 is a step in which the controller 10 detects whether the object to be plated is located in the first washing tank 535 . The controller 10 detects the position of the plating object through a plurality of sensors installed in the first washing tank 535 .

In step S32, the controller 10 detects that the plating objects reach the set position of the first washing tub 535 through a sensor and raises and lowers the first sluice gate g1 between the first washing tub 535 and the electrolytic bath 527. This is the blocking step.

Step S33 is a step in which the controller 10 controls the first cleaning and discharging means 532 to clean the object to be plated. Here, the washing liquid passes through the bottom surface 531 of the first washing tank 535 and is received in the first washing drain tank 533 . Preferably, the controller 10 may check the capacity of the washing liquid accommodated in the first washing drain tank 533 and drive the second pump P2 when the capacity is greater than or equal to the set capacity.

Step S34 is a step in which the controller 10 detects a set time. When washing is started, the controller 10 counts the time and detects whether the set time has been reached.

Step S35 is a step of opening the second sluice gate g2 after the controller 10 turns off the washing/discharging means 532 when the set time has elapsed. Here, the controller 10 may sense the level of the washing liquid in the first washing tank 535 and open the second sluice gate g2 when the water level is below the set water level.

Therefore, when the second sluice gate g2 is opened, the space between the first washing tank 535 and the sealing tank 546 is opened.

Step S36 is a step in which the controller 10 controls the transfer unit 51 to move the plating object from the first washing tank 535 to the sealing tank 546 . Here, the controller 10 may block between the first washing tank 535 and the sealing tank 546 by elevating the second sluice gate g2 when the object to be plated is located in the sealing tank 546 .

9 is a flowchart illustrating step S40.

Referring to FIG. 9 , step S40 includes a step S41 of detecting the positions of the plating objects in the sealing tank 546 , a step S42 of elevating the second sluice gate g2 to close the sealing tank 546 , and a sealing solution Step S43 of filling the sealing tank 546, step S44 of counting the set time, step S45 of discharging the sealing liquid, step S46 of opening the third sluice gate g3, and step S47 of moving to (555).

Steps S41 and S42 are the same as steps S35 and S36 described above.

Step S43 is a step in which the controller 10 controls the sealing discharging means 542 to fill the sealing liquid in the sealing tank 546 . Here, the sealing liquid is stored in the sealing reservoir 543 formed below the sealing tank 546 , and is supplied to the sealing tank 546 by driving the third pump P3 .

Step S44 is a step in which the controller 10 counts the time set for the sealing process. The controller 10 measures the level of the sealing liquid in the sealing tank 546 and, when the set level is reached, stops the sealing discharging means 542 and counts the time to detect whether the set time has elapsed.

Step S45 is a step of discharging the sealing liquid in the sealing tank 546 by turning on the third discharging means when the set time elapses after the controller 10 fills the sealing liquid. Here, the sealing liquid is discharged to the sealing storage tank 543 .

At this time, the sealing liquid detecting unit 31 measures the impurity concentration and PH of the sealing liquid drained into the sealing storage tank 543 and outputs the results to the controller 10 and/or the sealing liquid replenishing unit 32 .

In addition, the sealing liquid replenishment unit 32 injects the supplement into the sealing drainage agent to adjust the PH according to the control of the controller 10 or the result of the sensing of the PH of the sealing liquid by the sealing liquid sensing unit 31 .

Alternatively, when the impurity concentration of the sealing liquid is greater than or equal to a preset standard, the controller 10 opens the third discharge means 544 to discharge the sealing liquid to the external septic tank and then controls to supply the new sealing liquid.

Step S46 is a step of opening the third sluice gate g3 when the controller 10 detects that the sealing tank 546 is below the set water level. The third sluice gate g3 descends under the control of the controller 10 . Accordingly, between the sealing tank 546 and the second washing tank 555 is opened.

Step S47 is a step in which the controller 10 moves the plating object from the sealing tank 546 to the second washing tank 555 . The transfer unit 51 is driven under the control of the controller 10 to move the plating object to the second washing tank 555 .

After that, the controller 10 proceeds to step S50 to wash the object to be plated second, opens the fourth sluice gate g4 to move the object to the drying room, and then proceeds to step S60 to discharge the dried object to be plated to the discharge unit 60 ) to control the discharge through

In the above-described process, the transfer unit 51 performs an anodizing process such as an electrolytic bath 527, a first washing bath 535, a sealing bath 546, a second washing bath 555, and a drying chamber, such as a direction change or a series of elevating and lowering. It was possible to move the plating object only in the horizontal direction without any movement. Therefore, in the present invention, there is no need to add devices necessary for changing the position or direction in the process of moving the object to be plated, and the movement distance of the object to be plated can be shortened, so that the process time can be shortened.

A person of ordinary skill in the art related to this embodiment will understand that it can be implemented in a modified form within a range that does not deviate from the essential characteristics of the above description. Therefore, the disclosed methods should be considered in an illustrative and not a restrictive sense. The scope of the present invention is indicated in the claims rather than the foregoing description, and all differences within the scope equivalent thereto should be construed as being included in the present invention.

10: controller 20: electrolytic member
21: electrolyte detection unit 22: electrolyte replenishment unit
30: sealing member 31: sealing liquid sensing unit
32: sealing liquid replenishment part 40: input part
50: driving member
51, 51a, 51b, 51c, 51d, 51e: transfer part
52: electrolysis unit 53: first washing unit
54: sealing part 55: second washing part
56: drying unit 60: discharge unit
511: rotary roller 512: transfer belt
521, 531, 541, 551: bottom surface
522: first discharge means 523: electrolytic sump tank
524a, 524b filter 525 electrolytic replenishment tank
526: supply pipe 527: electrolytic cell
532: first washing discharge means 533: first washing drain tank
534, 545, 554: discharge pipe 535: first washing tank
542: second discharge means 543: sealing storage tank
544: third discharge means 546: sealing jaw
552: second washing discharge means 553: second washing drain tank
555: second washing tank 571, 572, 573, 574: dam
P1, P2, P3, P4: pump g1, g2, g3, g4: sluice gate

Claims (6)

an electrolytic unit 52 having an electrolytic cell 527 filled with an electrolytic solution to perform degreasing and coating processes on the object to be plated;
a first washing unit 53 having a first washing tank 535 for first washing the plating object moved from the electrolytic unit 52;
a sealing unit 54 having a sealing tank 546 in which a sealing liquid for sealing the object to be plated moved in the first washing unit 53 is accommodated;
a second washing unit 55 having a second washing tank 555 in which the plating object moved from the sealing unit 54 is secondarily washed;
a drying unit 56 having a drying chamber in which the plating object moved in the second washing unit 55 is dried; and
a transfer unit 51 for sequentially moving each of the hangers C on which a plurality of plating objects are mounted from the electrolysis unit 52 to the drying unit 56 in a straight direction;
The electrolytic cell 527, the first washing tank 535, the sealing tank 546, the second washing tank 555, and the drying chamber are sequentially extended in one direction and formed as a partitioned space, and each partitioned space is raised and lowered to be adjacent to each other. a sluice gate that divides the space by opening or closing passages with the spaces;
Electrolytic sensing unit 21 for measuring the current of the electrolyte accommodated in the electrolytic cell 527;
an electrolyte replenishing unit 22 for replenishing the electrolyte under the control of the controller 10 according to the detection result of the electrolyte;
a sealing liquid sensing unit 31 for detecting at least one of ion concentration and PH of the sealing liquid accommodated in the sealing tank 546; and
a sealing solution replenishing unit 32 for supplying at least one of a new sealing solution and sodium hydroxide to the sealing tank according to the detection result of the sealing solution detecting unit 31 or the control of the controller; including,
The transfer unit 51 is
a first transfer unit 51a extending to the electrolysis unit 52 to transfer the hanger;
a second transfer unit 51b extended along the first washing unit 53 to receive the hanger transferred by the first transfer unit and move the section of the first washing unit 53;
a third transfer unit 51c installed along the sealing unit 54 to receive the hanger C transferred from the second transfer unit 51b and transfer it within the section of the sealing unit 54;
a fourth transfer unit 51d extended along the second washing unit 55 to receive the hanger C transferred by the third transfer unit 51c and transfer it within the section of the second washing unit 55; and
A fifth transfer unit (51e) extended along the drying unit (56) to receive the hanger (C) transferred by the fourth transfer unit (51d) and transfer it within the section of the drying unit (56);
Each of the first to fifth transfer units 51a to 51e is provided with a plurality of support protrusions that protrude upward to support a plurality of rotating rollers 511 and the hanger C and are spaced apart from each other at a set interval. Containing a conveying belt 512 rotated by a rotating roller 511,
The first to fifth transfer units (51a to 51e) are arranged so that at least one of the start end and the end overlaps at least one of the start end and end of the other transfer unit adjacent to receiving the hanger (C) transferred in another section; characterized by,
Electrolyzer 52 is
a first discharging means 522 for discharging the electrolyte of the electrolytic cell 527 by opening a through hole or pipe formed on the bottom surface of the electrolytic cell 527 by the controller 10;
an electrolytic drain tank 523 formed on the lower side of the electrolytic cell 527 to receive the electrolyte discharged by the first discharging means, and having one or more filters for removing foreign substances;
An electrolytic replenishment tank 525 in which a stirring device made of rotary blades is installed and the electrolyte introduced through the electrolytic drain tank 523 and the replenishment material supplemented in the electrolyte replenishment unit 22 are stirred; and
a first pump (P1) for re-supplying the electrolyte stored in the electrolytic replenishment tank (525) to the electrolytic cell (527) under the control of the controller (10); including,
The filter of the electrolytic sump 523 is
A first filter (524a) that is fastened in a sliding manner to the rails installed on both wall surfaces of the electrolysis tank 523 as a position close to the lower side of the bottom surface of the electrolytic cell and fixed to be detachable; and
a second filter (524b) installed in the flow path between the wall surface dividing the electrolytic replenishment tank (525) and the electrolytic drain tank (523);
The first washing unit 53 is
a first washing and discharging means 532 fixed to the bottom or wall surface of the first washing tub 535 and spraying the washing solution onto the plating object mounted on the hanger; and
A space for accommodating the washing liquid discharged from the lower side of the first washing tank 535, the first discharge pipe 534 extending to the outside and partitioned with the electrolysis drain tank 523 and the wall surface interposed therebetween; a first washing drain tank 533 including a second pump P2 for discharging the washing liquid to the outside through the first discharge pipe 534; including,
The first washing tank 535 has a plurality of first and second sluice gates, an upright wall surface, and a bottom surface composed of a mesh-shaped plate in which a plurality of discharge holes for discharging the washing liquid are formed and mounted on a hanger (C). to accommodate the plating object of
The sealing part 54 is
a second discharging means 542 for discharging the sealing liquid in the sealing tank as a valve for opening and closing a through-hole or connection pipe penetrated from the bottom surface of the sealing tank 546;
A sealing storage tank 543 that stores the sealing liquid discharged by the second discharging means 542 and includes a filter that is configured in the form of a mesh having a through hole and fixed to the ceiling surface so as to filter out foreign substances contained in the sealing liquid. ;
a third pump (P3) for re-supplying the sealing liquid stored in the sealing storage tank 543 to the sealing tank 546 under the control of the controller 10; and
Sealing discharge means 542 for discharging the sealing liquid supplied by the third pump (P3) to the sealing tank (546); including,
The second washing unit 55 is
a second washing discharging means 552 installed on the bottom or wall surface of the second washing tub 555 to supply a washing solution to the second washing tub 555;
a second washing drain tank 553 forming a space for temporarily accommodating the washing liquid discharged from the second washing tank 555;
a second discharge pipe 554 extending from the second washing drain tank 553 to an external septic tank or a waste storage tank; and
a fourth pump (P4) for discharging the washing liquid to the outside through the second discharge pipe (554); including,
The second washing tank 555 has a mesh shape so that the upper surface is opened and the third and fourth sluice gates, upright wall surfaces and multiple outlets are formed, or the washing liquid can immediately fall to the second washing drain tank 553 below. forming a space for secondary washing of the plating object after the sealing process by partitioning the bottom surface; Anodizing processing system capable of linear movement of the plating object, characterized in that.
delete delete The method according to claim 1, wherein in at least one of the electrolytic bath (527), the first washing bath (535), the sealing bath (546), the second washing bath (555) and the drying chamber
a dam having a set height from the floor and extending along the sluice gate to prevent overflow of any one of an electrolyte solution, a washing solution, and a sealing solution; Anodizing processing system capable of linear movement of the plating object further comprising a.

delete delete

Images