KR102374939B9 - Curable composition, cured product and method for producing cured product - Google Patents
Curable composition, cured product and method for producing cured productInfo
- Publication number
- KR102374939B9 KR102374939B9 KR1020187036050A KR20187036050A KR102374939B9 KR 102374939 B9 KR102374939 B9 KR 102374939B9 KR 1020187036050 A KR1020187036050 A KR 1020187036050A KR 20187036050 A KR20187036050 A KR 20187036050A KR 102374939 B9 KR102374939 B9 KR 102374939B9
- Authority
- KR
- South Korea
- Prior art keywords
- cured product
- curable composition
- producing
- producing cured
- product
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/04—Polymers provided for in subclasses C08C or C08F
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/011—Nanostructured additives
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016182210 | 2016-09-16 | ||
| JPJP-P-2016-182210 | 2016-09-16 | ||
| PCT/JP2017/032651 WO2018051941A1 (en) | 2016-09-16 | 2017-09-11 | Curable composition, cured product, and production method for cured product |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| KR20190055020A KR20190055020A (en) | 2019-05-22 |
| KR102374939B1 KR102374939B1 (en) | 2022-03-16 |
| KR102374939B9 true KR102374939B9 (en) | 2023-05-11 |
Family
ID=61619984
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020187036050A KR102374939B1 (en) | 2016-09-16 | 2017-09-11 | Curable composition, cured product, and method for manufacturing cured product |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7043142B2 (en) |
| KR (1) | KR102374939B1 (en) |
| CN (1) | CN109476773B (en) |
| TW (1) | TWI781112B (en) |
| WO (1) | WO2018051941A1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020071261A1 (en) * | 2018-10-03 | 2020-04-09 | 富士フイルム株式会社 | Chemical liquid and chemical liquid housing |
| CN115052934B (en) * | 2020-02-07 | 2024-01-30 | 三菱瓦斯化学株式会社 | Resin composition, prepreg, laminated board, metal foil-clad laminated board, and printed wiring board |
| WO2023125968A1 (en) * | 2021-12-30 | 2023-07-06 | 浙江三花智能控制股份有限公司 | Heat exchanger, thermal management system, composite material, and preparation method therefor |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4465752B2 (en) | 1998-10-08 | 2010-05-19 | 凸版印刷株式会社 | Electrode substrate and liquid crystal display device |
| JP3754065B2 (en) | 2003-06-10 | 2006-03-08 | 三菱化学株式会社 | Photopolymerizable composition and color filter using the same |
| JP2008150428A (en) | 2006-12-14 | 2008-07-03 | Toda Kogyo Corp | Colorant for black matrix, coloring composition for black matrix containing the colorant for black matrix and color filter |
| DE102006061380A1 (en) * | 2006-12-23 | 2008-06-26 | Evonik Degussa Gmbh | Silica and dispersant-containing radiation-curable formulations with increased corrosion protection on metal substrates |
| JP5270113B2 (en) | 2007-06-06 | 2013-08-21 | 新日鉄住金化学株式会社 | Photosensitive resin composition for black resist, light shielding film and color filter using the same |
| CN101855201B (en) * | 2007-12-25 | 2013-09-18 | 株式会社艾迪科 | Oxime esters and photopolymerization initiators containing the same |
| JP2010102322A (en) * | 2008-09-26 | 2010-05-06 | Fujifilm Corp | Method for making lithographic printing plate |
| JP2010201821A (en) * | 2009-03-04 | 2010-09-16 | Asahi Kasei E-Materials Corp | Photopolymerizable resin laminate, and method of manufacturing surface liquid repelling pattern substrate, color filter, organic electroluminescence element and electronic paper using the same |
| JP5498051B2 (en) | 2009-04-24 | 2014-05-21 | 新日鉄住金化学株式会社 | Bulkhead and color filter |
| JP2011116840A (en) * | 2009-12-02 | 2011-06-16 | Fujifilm Corp | Pigment fine particle dispersion, photocurable composition using the same, and color filter |
| JP5880445B2 (en) * | 2010-12-20 | 2016-03-09 | 旭硝子株式会社 | Photosensitive resin composition, partition, color filter, and organic EL device |
| KR101842317B1 (en) * | 2011-04-28 | 2018-03-26 | 아사히 가라스 가부시키가이샤 | Negative photosensitive resin composition, cured film, partition wall, black matrix, method for producing partition wall, method for producing black matrix, color filter, and organic el element |
| CN103782237B (en) | 2011-08-30 | 2017-02-15 | 旭硝子株式会社 | Negative photosensitive resin composition, partition wall, black matrix and optical element |
| JP2013171276A (en) | 2012-02-23 | 2013-09-02 | Toyo Ink Sc Holdings Co Ltd | Blue photosensitive coloring composition and color filter |
| JP5539429B2 (en) | 2012-03-19 | 2014-07-02 | 富士フイルム株式会社 | Colored photosensitive composition, color filter, method for producing color filter, and liquid crystal display device |
| JP6241153B2 (en) | 2012-09-10 | 2017-12-06 | 三菱ケミカル株式会社 | Shielding material, colored resin composition, color filter, and liquid crystal display device |
| TWI641625B (en) * | 2013-03-06 | 2018-11-21 | 日商艾迪科股份有限公司 | Photocurable composition |
| JP2015163671A (en) * | 2013-12-13 | 2015-09-10 | 株式会社Adeka | Radical-polymerizable composition |
| JP6423215B2 (en) * | 2014-09-18 | 2018-11-14 | 株式会社Adeka | Photocurable composition |
-
2017
- 2017-09-11 JP JP2018539700A patent/JP7043142B2/en active Active
- 2017-09-11 WO PCT/JP2017/032651 patent/WO2018051941A1/en active Application Filing
- 2017-09-11 CN CN201780041039.XA patent/CN109476773B/en active Active
- 2017-09-11 KR KR1020187036050A patent/KR102374939B1/en active IP Right Review Request
- 2017-09-13 TW TW106131365A patent/TWI781112B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| CN109476773A (en) | 2019-03-15 |
| CN109476773B (en) | 2022-05-13 |
| KR102374939B1 (en) | 2022-03-16 |
| KR20190055020A (en) | 2019-05-22 |
| TW201819501A (en) | 2018-06-01 |
| TWI781112B (en) | 2022-10-21 |
| WO2018051941A1 (en) | 2018-03-22 |
| JP7043142B2 (en) | 2022-03-29 |
| JPWO2018051941A1 (en) | 2019-07-04 |
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| AMND | Amendment | ||
| X701 | Decision to grant (after re-examination) | ||
| Z072 | Maintenance of patent after cancellation proceedings: certified copy of decision transmitted [new post grant opposition system as of 20170301] | ||
| Z131 | Decision taken on request for patent cancellation [new post grant opposition system as of 20170301] |