KR102363755B1 - Colored photosensitive resin composition and color filter using the same - Google Patents
Colored photosensitive resin composition and color filter using the same Download PDFInfo
- Publication number
- KR102363755B1 KR102363755B1 KR1020160037542A KR20160037542A KR102363755B1 KR 102363755 B1 KR102363755 B1 KR 102363755B1 KR 1020160037542 A KR1020160037542 A KR 1020160037542A KR 20160037542 A KR20160037542 A KR 20160037542A KR 102363755 B1 KR102363755 B1 KR 102363755B1
- Authority
- KR
- South Korea
- Prior art keywords
- weight
- photosensitive resin
- resin composition
- colored photosensitive
- pigment
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims description 58
- 239000000049 pigment Substances 0.000 claims abstract description 82
- 150000001875 compounds Chemical class 0.000 claims abstract description 61
- -1 oxime ester Chemical class 0.000 claims abstract description 47
- 239000003999 initiator Substances 0.000 claims abstract description 37
- 239000002904 solvent Substances 0.000 claims abstract description 33
- 239000003086 colorant Substances 0.000 claims abstract description 31
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 30
- 229920005989 resin Polymers 0.000 claims abstract description 28
- 239000011347 resin Substances 0.000 claims abstract description 28
- VLAPMBHFAWRUQP-UHFFFAOYSA-L molybdic acid Chemical compound O[Mo](O)(=O)=O VLAPMBHFAWRUQP-UHFFFAOYSA-L 0.000 claims abstract description 16
- IYDGMDWEHDFVQI-UHFFFAOYSA-N phosphoric acid;trioxotungsten Chemical compound O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.OP(O)(O)=O IYDGMDWEHDFVQI-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000000203 mixture Substances 0.000 claims description 24
- 239000007787 solid Substances 0.000 claims description 13
- 239000002270 dispersing agent Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 239000000654 additive Substances 0.000 claims description 4
- 239000002318 adhesion promoter Substances 0.000 claims description 4
- 239000006096 absorbing agent Substances 0.000 claims description 3
- 239000003963 antioxidant agent Substances 0.000 claims description 3
- 239000000945 filler Substances 0.000 claims description 3
- 230000002744 anti-aggregatory effect Effects 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 40
- 239000000975 dye Substances 0.000 description 24
- 239000006185 dispersion Substances 0.000 description 18
- 230000000052 comparative effect Effects 0.000 description 16
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 14
- 239000000178 monomer Substances 0.000 description 14
- 239000003822 epoxy resin Substances 0.000 description 12
- 229920000647 polyepoxide Polymers 0.000 description 12
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 12
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 11
- 238000004040 coloring Methods 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- 238000002834 transmittance Methods 0.000 description 9
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- 239000012321 sodium triacetoxyborohydride Substances 0.000 description 7
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 229910052717 sulfur Inorganic materials 0.000 description 6
- 239000011593 sulfur Substances 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 5
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 5
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 4
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 4
- 239000002671 adjuvant Substances 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 230000018109 developmental process Effects 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 230000000977 initiatory effect Effects 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 239000001023 inorganic pigment Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 2
- QOSTVEDABRQTSU-UHFFFAOYSA-N 1,4-bis(methylamino)anthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C(NC)=CC=C2NC QOSTVEDABRQTSU-UHFFFAOYSA-N 0.000 description 2
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 2
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 2
- GBOJZXLCJZDBKO-UHFFFAOYSA-N 2-(2-chlorophenyl)-2-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 GBOJZXLCJZDBKO-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- IHZXTIBMKNSJCJ-UHFFFAOYSA-N 3-{[(4-{[4-(dimethylamino)phenyl](4-{ethyl[(3-sulfophenyl)methyl]amino}phenyl)methylidene}cyclohexa-2,5-dien-1-ylidene)(ethyl)azaniumyl]methyl}benzene-1-sulfonate Chemical compound C=1C=C(C(=C2C=CC(C=C2)=[N+](C)C)C=2C=CC(=CC=2)N(CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C=CC=1N(CC)CC1=CC=CC(S(O)(=O)=O)=C1 IHZXTIBMKNSJCJ-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- SEEVRZDUPHZSOX-WPWMEQJKSA-N [(e)-1-[9-ethyl-6-(2-methylbenzoyl)carbazol-3-yl]ethylideneamino] acetate Chemical compound C=1C=C2N(CC)C3=CC=C(C(\C)=N\OC(C)=O)C=C3C2=CC=1C(=O)C1=CC=CC=C1C SEEVRZDUPHZSOX-WPWMEQJKSA-N 0.000 description 2
- JOBBTVPTPXRUBP-UHFFFAOYSA-N [3-(3-sulfanylpropanoyloxy)-2,2-bis(3-sulfanylpropanoyloxymethyl)propyl] 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(COC(=O)CCS)(COC(=O)CCS)COC(=O)CCS JOBBTVPTPXRUBP-UHFFFAOYSA-N 0.000 description 2
- CYGQPMMZQIQYKC-UHFFFAOYSA-N ac1n7ly5 Chemical compound O1[Si](O[Si](CC(C)C)(O2)O[Si](CC(C)C)(O3)O4)(CC(C)C)O[Si]4(CC(C)C)O[Si]4(CC(C)C)O[Si]1(CC(C)C)O[Si]2(CC(C)C)O[Si]3(CCCS)O4 CYGQPMMZQIQYKC-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 230000001588 bifunctional effect Effects 0.000 description 2
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002118 epoxides Chemical class 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000012860 organic pigment Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- LCPDWSOZIOUXRV-UHFFFAOYSA-N phenoxyacetic acid Chemical compound OC(=O)COC1=CC=CC=C1 LCPDWSOZIOUXRV-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- HHQAGBQXOWLTLL-UHFFFAOYSA-N (2-hydroxy-3-phenoxypropyl) prop-2-enoate Chemical compound C=CC(=O)OCC(O)COC1=CC=CC=C1 HHQAGBQXOWLTLL-UHFFFAOYSA-N 0.000 description 1
- HOSJNFCDDCLEBM-UHFFFAOYSA-N (2-phenyloxetan-3-yl)methyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1COC1C1=CC=CC=C1 HOSJNFCDDCLEBM-UHFFFAOYSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- RSHKWPIEJYAPCL-UHFFFAOYSA-N (3-ethyloxetan-3-yl)methyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1(CC)COC1 RSHKWPIEJYAPCL-UHFFFAOYSA-N 0.000 description 1
- 125000000923 (C1-C30) alkyl group Chemical group 0.000 description 1
- 125000001294 (C1-C30) cycloalkyl group Chemical group 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- BOGFHOWTVGAYFK-UHFFFAOYSA-N 1-[2-(2-propoxyethoxy)ethoxy]propane Chemical compound CCCOCCOCCOCCC BOGFHOWTVGAYFK-UHFFFAOYSA-N 0.000 description 1
- MKRBAPNEJMFMHU-UHFFFAOYSA-N 1-benzylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CC1=CC=CC=C1 MKRBAPNEJMFMHU-UHFFFAOYSA-N 0.000 description 1
- KTZVZZJJVJQZHV-UHFFFAOYSA-N 1-chloro-4-ethenylbenzene Chemical compound ClC1=CC=C(C=C)C=C1 KTZVZZJJVJQZHV-UHFFFAOYSA-N 0.000 description 1
- VKQJCUYEEABXNK-UHFFFAOYSA-N 1-chloro-4-propoxythioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C(OCCC)=CC=C2Cl VKQJCUYEEABXNK-UHFFFAOYSA-N 0.000 description 1
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 1
- OZWAPCBQFFIPQH-UHFFFAOYSA-N 1-ethenyl-2-[2-[2-(2-ethenylphenyl)ethoxy]ethyl]benzene Chemical compound C=CC1=CC=CC=C1CCOCCC1=CC=CC=C1C=C OZWAPCBQFFIPQH-UHFFFAOYSA-N 0.000 description 1
- WUPNAQFYNLSXBZ-UHFFFAOYSA-N 1-ethenyl-3-[2-[2-(3-ethenylphenyl)ethoxy]ethyl]benzene Chemical compound C=CC1=CC=CC(CCOCCC=2C=C(C=C)C=CC=2)=C1 WUPNAQFYNLSXBZ-UHFFFAOYSA-N 0.000 description 1
- PECUPOXPPBBFLU-UHFFFAOYSA-N 1-ethenyl-3-methoxybenzene Chemical compound COC1=CC=CC(C=C)=C1 PECUPOXPPBBFLU-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 1
- UIJSCOPBBPNHFC-UHFFFAOYSA-N 2,2-dichloro-2-phenylethanethioic s-acid Chemical compound SC(=O)C(Cl)(Cl)C1=CC=CC=C1 UIJSCOPBBPNHFC-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- XAMXITINZBKDFX-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylethanethioic S-acid Chemical compound COC(C(=S)O)(C1=CC=CC=C1)OC XAMXITINZBKDFX-UHFFFAOYSA-N 0.000 description 1
- UXCIJKOCUAQMKD-UHFFFAOYSA-N 2,4-dichlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC(Cl)=C3SC2=C1 UXCIJKOCUAQMKD-UHFFFAOYSA-N 0.000 description 1
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- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
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- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
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- 238000012545 processing Methods 0.000 description 1
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- AYEKOFBPNLCAJY-UHFFFAOYSA-O thiamine pyrophosphate Chemical compound CC1=C(CCOP(O)(=O)OP(O)(O)=O)SC=[N+]1CC1=CN=C(C)N=C1N AYEKOFBPNLCAJY-UHFFFAOYSA-O 0.000 description 1
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- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
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- 239000012780 transparent material Substances 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Nonlinear Science (AREA)
- Organic Chemistry (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
Abstract
본 발명은 착색제, 알칼리 가용성 수지, 광중합성 화합물, 광중합 개시제, 특정 구조의 실세스퀴옥산계 화합물 및 용제를 포함하며; 상기 착색제는 포스포텅스텐산 및 몰리브덴산으로부터 선택되는 1종 이상의 불용화제와 결합된 안료 또는 염료를 포함하며, 상기 광중합 개시제는 옥심에스테르계 광중합 개시제를 포함하는 것을 특징으로 하는 착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러필터에 관한 것이다.The present invention includes a colorant, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, a silsesquioxane-based compound having a specific structure, and a solvent; The colorant includes a pigment or dye combined with at least one insolubilizing agent selected from phosphotungstic acid and molybdic acid, and the photopolymerization initiator includes an oxime ester-based photopolymerization initiator. It relates to a color filter manufactured using
Description
본 발명은 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터에 관한 것이다.The present invention relates to a colored photosensitive resin composition and a color filter manufactured using the same.
컬러필터는 촬상(撮像)소자, 액정표시장치(LCD), 유기발광다이오드(OLED) 등의 각종 표시장치에 널리 이용되는 것으로, 그 응용 범위가 급속히 확대되고 있다.Color filters are widely used in various display devices such as imaging devices, liquid crystal displays (LCDs), and organic light emitting diodes (OLEDs), and their application range is rapidly expanding.
상기한 표시장치에 사용되는 컬러필터는 레드(Red), 그린(Green) 및 블루(Blue)의 3가지 컬러의 착색패턴으로 이루어지거나, 옐로우(Yellow), 마젠타(Magenta) 및 시안(Cyan)의 3가지 컬러의 착색패턴으로 이루어진다.The color filter used in the above-described display device is composed of a coloring pattern of three colors of red, green, and blue, or yellow, magenta, and cyan. It consists of a coloring pattern of three colors.
상기 컬러필터 각각의 착색패턴은 일반적으로 안료 또는 염료 등의 착색제, 알칼리 가용성 수지, 광중합성 화합물, 광중합 개시제 및 용제를 포함하는 착색 감광성 수지 조성물을 이용하여 형성된다. 상기 착색 감광성 수지 조성물을 이용한 착색패턴 가공은 통상적으로 리소그래피 공정으로 수행되고 있다.The coloring pattern of each of the color filters is generally formed using a colored photosensitive resin composition including a colorant such as a pigment or dye, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent. The coloring pattern processing using the colored photosensitive resin composition is generally performed by a lithography process.
근래, 기존의 음극선관(Cathode Ray Tube) 표시장치를 대체하기 위해 제안된 평판표시장치(Flat Panel Display Device)로는, 액정표시장치(Liquid Crystal Display), 전계방출 표시장치(Field Emission Display), 플라즈마 표시패널(Plasma Display Panel) 및 유기발광다이오드(Organic Light-Emitting Diode Display, OLED Display) 등이 있다.Recently, as a flat panel display device proposed to replace a conventional cathode ray tube display device, a liquid crystal display device, a field emission display device, and a plasma display device are used. Display panels (Plasma Display Panel) and organic light emitting diodes (Organic Light-Emitting Diode Display, OLED Display), and the like.
최근에는 색재현력이 높은 고품질의 디스플레이에 대한 시장의 요구가 커지고 있다. 이에 따라 컬러필터 제조에 사용되는 착색 감광성 수지 조성물에 포함되는 착색제의 함량이 지속적으로 높아지고 있으며, 보다 우수한 착색력을 갖는 착색제의 사용이 검토되고 있다.Recently, the market demand for a high-quality display with high color reproducibility is increasing. Accordingly, the content of the colorant included in the colored photosensitive resin composition used for manufacturing the color filter is continuously increasing, and the use of a colorant having a better coloring power is being considered.
그러나, 착색제의 함량이 높아지게 되면 감도 저하, 패턴의 선뜯김, 직진성 저하 등의 문제가 발생할 수 있다. 또한, 기존에 비해 착색력이 우수한 착색제의 경우 신뢰성 부족 등의 문제가 있다.However, when the content of the colorant is increased, problems such as a decrease in sensitivity, line tearing of a pattern, and a decrease in straightness may occur. In addition, there is a problem such as lack of reliability in the case of a colorant having superior coloring power compared to the conventional one.
본 발명은, 상기 종래 기술의 문제를 해결하기 위하여 안출된 것으로서,The present invention has been devised to solve the problems of the prior art,
고착색력, 고투과율 및 고밀착성의 특성을 가지면서도, 내용제성 등의 신뢰성이 우수한 착색 감광성 수지 조성물을 제공하는 것을 목적으로 한다.An object of the present invention is to provide a colored photosensitive resin composition having excellent reliability, such as solvent resistance, while having characteristics of high coloring power, high transmittance, and high adhesion.
또한, 상기 착색 감광성 수지 조성물을 이용하여 제조된 컬러필터를 제공하는 것을 목적으로 한다.Another object of the present invention is to provide a color filter manufactured using the colored photosensitive resin composition.
본 발명은,The present invention is
착색제, 알칼리 가용성 수지, 광중합성 화합물, 광중합 개시제, 하기 화학식 1의 실세스퀴옥산계 화합물 및 용제를 포함하며,It contains a colorant, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, a silsesquioxane-based compound of the following formula (1), and a solvent,
상기 착색제는 포스포텅스텐산(phosphotungstic acid) 및 몰리브덴산(Molybdic acid)으로부터 선택되는 1종 이상의 불용화제와 결합된 안료 또는 염료를 포함하고,The colorant comprises a pigment or dye combined with at least one insolubilizing agent selected from phosphotungstic acid and Molybdic acid,
상기 광중합 개시제는 옥심에스테르계 광중합 개시제를 포함하는 것을 특징으로 하는 착색 감광성 수지 조성물을 제공한다.The photopolymerization initiator provides a colored photosensitive resin composition comprising an oxime ester-based photopolymerization initiator.
<화학식 1><Formula 1>
상기 화학식 1에서 R1 및 R2는 각각 독립적으로, C1~C30의 지방족 탄화수소, C1~C30의 방향족 탄화수소로; 산소, 규소 또는 황을 포함할 수 있으며;In Formula 1, R 1 and R 2 are each independently a C1-C30 aliphatic hydrocarbon, a C1-C30 aromatic hydrocarbon; may contain oxygen, silicon or sulfur;
산소, 규소 또는 황과 함께, 또는 독립적으로 환을 형성할 수 있다. It may form a ring with or independently of oxygen, silicon or sulfur.
또한, 본 발명은Also, the present invention
상기 착색 감광성 수지 조성물을 이용하여 제조되는 컬러필터를 제공한다. It provides a color filter manufactured by using the colored photosensitive resin composition.
본 발명은 착색력, 투과율, 밀착성 및 내용제성이 우수한 고신뢰성의 착색 감광성 수지 조성물을 제공할 수 있다.The present invention can provide a highly reliable colored photosensitive resin composition excellent in coloring power, transmittance, adhesiveness and solvent resistance.
또한, 상기 조성물을 이용하여 제조되는 컬러필터를 제공할 수 있다.In addition, it is possible to provide a color filter manufactured using the composition.
본 발명자들은 우수한 착색성, 투과율, 밀착성 및 내용제성을 가지는 고신뢰성의 착색 감광성 수지 조성물에 대해 연구하던 중, While the present inventors were researching a highly reliable colored photosensitive resin composition having excellent colorability, transmittance, adhesion and solvent resistance,
특정 불용화제와 결합된 안료 또는 염료를 포함하는 착색제, 알칼리 가용성 수지, 광중합성 화합물, 옥심에스테르계 광중합 개시제, 특정 구조의 실세스퀴옥산계 화합물 및 용제를 포함하는 착색 감광성 수지 조성물이 이러한 효과를 제공하는 것을 확인하고 본 발명을 완성하였다.A colorant including a pigment or dye combined with a specific insolubilizing agent, an alkali-soluble resin, a photopolymerizable compound, an oxime ester-based photopolymerization initiator, a colored photosensitive resin composition comprising a silsesquioxane-based compound of a specific structure and a solvent It was confirmed to provide and completed the present invention.
본 발명은,The present invention is
착색제, 알칼리 가용성 수지, 광중합성 화합물, 광중합 개시제, 하기 화학식 1의 실세스퀴옥산계 화합물 및 용제를 포함하며,It contains a colorant, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, a silsesquioxane-based compound of the following formula (1), and a solvent,
상기 착색제는 포스포텅스텐산(phosphotungstic acid) 및 몰리브덴산(Molybdic acid)으로부터 선택되는 1종 이상의 불용화제와 결합된 안료 또는 염료를 포함하며,The colorant comprises a pigment or dye combined with at least one insolubilizing agent selected from phosphotungstic acid and molybdic acid,
상기 광중합 개시제는 옥심에스테르계 광중합 개시제를 포함하는 것을 특징으로 하는 착색 감광성 수지 조성물을 제공한다.The photopolymerization initiator provides a colored photosensitive resin composition comprising an oxime ester-based photopolymerization initiator.
<화학식 1><Formula 1>
상기 화학식 1에서 R1 및 R2는 각각 독립적으로, C1~C30의 지방족 탄화수소, C1~C30의 방향족 탄화수소로; 산소, 규소 또는 황을 포함할 수 있으며;In Formula 1, R 1 and R 2 are each independently a C1-C30 aliphatic hydrocarbon, a C1-C30 aromatic hydrocarbon; may contain oxygen, silicon or sulfur;
산소, 규소 또는 황과 함께, 또는 독립적으로 환을 형성할 수 있다. It may form a ring with or independently of oxygen, silicon or sulfur.
이하, 본 발명의 착색 감광성 수지 조성물을 구성하는 각 성분에 대하여 설명한다.Hereinafter, each component which comprises the coloring photosensitive resin composition of this invention is demonstrated.
(A) 착색제 (A) Colorant
본 발명의 착색 감광성 수지 조성물에 포함되는 착색제는 포스포텅스텐산(phosphotungstic acid) 및 몰리브덴산(Molybdic acid)으로부터 선택되는 1종 이상의 불용화제와 결합된 안료 또는 염료를 포함한다. 상기 포스포텅스텐산(phosphotungstic acid) 및 몰리브덴산(Molybdic acid)으로부터 선택되는 1종 이상의 불용화제와 결합된 안료 또는 염료는 우수한 착색성을 나타내며 다양한 색상을 나타낼 수 있는 장점이 있다.The colorant included in the colored photosensitive resin composition of the present invention includes a pigment or dye combined with at least one insolubilizing agent selected from phosphotungstic acid and molybdic acid. The pigment or dye combined with at least one insolubilizing agent selected from phosphotungstic acid and molybdic acid has an advantage in that it exhibits excellent colorability and can exhibit various colors.
상기한 결합은 보다 구체적으로는 배위결합일 수 있으며, 안료 또는 염료가 불용화제와 결합하여 불용성을 나타낼 수 있다. 이때, 상기 불용성이라 함은 일례로서 프로필렌글리콜모노메틸에테르 아세테이트(Propylene glycol monomethyl ether acetate, PGMEA)에 대해 용해되지 않는 것을 의미한다.The above-mentioned bond may be more specifically a coordination bond, and a pigment or dye may exhibit insolubility by combining with an insolubilizing agent. In this case, the insoluble means, for example, not being dissolved in propylene glycol monomethyl ether acetate (PGMEA).
일례로서, 불용화제로서 포스포텅스텐산 및/또는 몰리브덴산과 안료 또는 염료를 혼합하여 반응시킴으로써 포스포텅스텐산 및 몰리브덴산으로부터 선택되는 1종 이상의 불용화제와 결합된 안료 또는 염료를 제조할 수 있다.As an example, a pigment or dye combined with at least one insolubilizing agent selected from phosphotungstic acid and molybdic acid may be prepared by mixing and reacting a pigment or dye with phosphotungstic acid and/or molybdic acid as an insolubilizing agent.
상기 안료 또는 염료는 특별히 한정하지 않으며, 당해 분야에서 통상적으로 사용되는 것을 적절하게 선택하여 사용할 수 있다.The pigment or dye is not particularly limited, and those commonly used in the art may be appropriately selected and used.
안료pigment
상기 안료로는 당해 분야에서 일반적으로 사용하는 유기 안료 또는 무기 안료를 사용할 수 있다. 상기 안료는 인쇄 잉크, 잉크젯 잉크 등에 사용되는 각종의 안료를 사용할 수 있으며, 보다 구체적으로는 상기 안료로서 수용성 아조 안료, 불용성 아조 안료, 프탈로시아닌안료, 퀴나크리돈 안료, 이소인돌리논 안료, 이소인돌린 안료, 페리렌 안료, 페리논 안료, 디옥사진 안료, 안트라퀴논 안료, 디안트라퀴노닐 안료, 안트라피리미딘 안료, 안탄트론(anthanthrone) 안료, 인단트론(indanthrone) 안료, 프라반트론 안료, 피란트론(pyranthrone) 안료 및 디케토피로로피롤 안료 등을 들 수 있다.As the pigment, organic or inorganic pigments generally used in the art may be used. As the pigment, various pigments used in printing ink, inkjet ink, etc. may be used, and more specifically, as the pigment, a water-soluble azo pigment, an insoluble azo pigment, a phthalocyanine pigment, a quinacridone pigment, an isoindolinone pigment, isoin Doline pigment, perylene pigment, perinone pigment, dioxazine pigment, anthraquinone pigment, dianthraquinonyl pigment, anthrapyrimidine pigment, anthanthrone pigment, indanthrone pigment, prabanthrone pigment, pyran and pyranthrone pigments and diketopyrroropyrrole pigments.
상기 무기 안료로서는 금속 산화물이나 금속 착염 등의 금속 화합물을 들 수 있고, 구체적으로는 철, 코발트, 알루미늄, 카드뮴, 납, 구리, 티탄, 마그네슘, 크롬, 아연, 안티몬, 카본블랙 등의 금속의 산화물 또는 복합 금속 산화물 등을 들 수 있다.Examples of the inorganic pigment include metal compounds such as metal oxides and metal complex salts, and specifically, oxides of metals such as iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium, zinc, antimony, and carbon black Or a composite metal oxide etc. are mentioned.
상기 안료로서 적색, 황색, 오렌지색, 보라색, 심홍색 계열의 안료가 바람직할 수 있으며, 특히, 상기 유기 안료 및 무기 안료로는 구체적으로 색지수(The society of Dyers and Colourists 출판)에서 피그먼트로 분류되어 있는 화합물 중 C.I. 피그먼트 레드, C.I. 피그먼트 옐로우, C.I. 피그먼트 바이올렛 및 C.I. 피그먼트 오렌지로부터 선택되는 1종 이상을 사용할 수 있으나 이에 한정하지 않는다. 보다 바람직하게는 C.I. 피그먼트 레드 또는 C.I. 피그먼트 옐로우를 사용할 수 있다.As the pigment, red, yellow, orange, purple, and magenta pigments may be preferable, and in particular, the organic and inorganic pigments are specifically classified as pigments in the color index (published by The Society of Dyers and Colorists). CI among the compounds in Pigment Red, C.I. Pigment Yellow, C.I. Pigment Violet and C.I. At least one selected from pigment orange may be used, but the present invention is not limited thereto. More preferably, C.I. Pigment Red or C.I. Pigment yellow can be used.
또한 본 발명의 착색제로서, 불용화제와 결합하지 않은 상기한 안료 중 1종 이상을 사용하는 것도 가능하다.It is also possible to use, as the colorant of the present invention, at least one of the above-mentioned pigments not combined with an insolubilizing agent.
염료dyes
상기 염료는 유기 용제에 대한 용해성을 가지거나 분산 가능한 것이라면 제한 없이 사용할 수 있다. 바람직하게는 알칼리 현상액에 대한 용해성, 내열성 및 내용제성 등의 신뢰성을 확보할 수 있는 염료를 사용하는 것이 좋다. The dye may be used without limitation as long as it has solubility in organic solvents or is dispersible. Preferably, it is preferable to use a dye capable of securing reliability such as solubility in alkali developer, heat resistance and solvent resistance.
이러한 염료는 상술한 바와 같이, 포스포텅스텐산(phosphotungstic acid) 및 몰리브덴산(Molybdic acid)으로부터 선택되는 1종 이상의 불용화제와 결합된 형태로 사용될 수 있다.As described above, the dye may be used in combination with at least one insolubilizing agent selected from phosphotungstic acid and molybdic acid.
상기 염료는 특별히 한정하지 않으며, 구체적으로 컬러 인덱스(The Society of Dyers and Colourists 출판)내에 염료로 분류되어 있는 화합물이나, 염색 노트(색염사)에 기재되어 있는 공지의 염료를 들 수 있으나 이에 한정하지 않는다.The dye is not particularly limited, and specifically, compounds classified as dyes in the color index (published by The Society of Dyers and Colorists) or known dyes described in the dyeing notes (color dyes) may be mentioned, but the present invention is not limited thereto. does not
착색제로서 상기 포스포텅스텐산(phosphotungstic acid) 및 몰리브덴산(Molybdic acid)으로부터 선택되는 1종 이상의 불용화제와 결합된 안료 또는 염료, 또는 안료는 그 입경이 균일하게 분산된 분산액의 형태로 사용하는 것이 바람직하다. 상기 불용화제와 결합된 안료 또는 염료, 또는 안료의 입경을 균일하게 분산시키기 위한 방법의 일례로서, 분산제를 함유시켜 분산 처리하는 방법 등을 들 수 있으며, 이 방법에 따르면 색재가 용액 중에 균일하게 분산된 상태의 분산액을 얻을 수 있다. Pigments or dyes combined with one or more insolubilizing agents selected from phosphotungstic acid and molybdic acid as a colorant, or pigments are used in the form of a dispersion having uniformly dispersed particle diameters. desirable. As an example of a method for uniformly dispersing the particle size of the pigment or dye or pigment combined with the insolubilizing agent, a method of dispersing treatment by containing a dispersing agent may be mentioned, and according to this method, the colorant is uniformly dispersed in a solution A dispersed solution can be obtained.
분산제dispersant
상기 분산제는 착색제의 탈응집 및 안정성 유지를 위해 첨가되는 것으로 당해 분야에서 일반적으로 사용되는 것을 제한 없이 사용할 수 있다. 시판중인 분산제로는 BYK 사의 Disperbyk-101, 103, 107, 108, 110, 111, 112, 116, 130, 140, 142, 154, 161, 162, 163, 164, 165, 166, 167, 168, 170, 171, 174, 180, 181, 182, 183, 184, 185, 190, 2000, 2001, 2009, 2010, 2020, 2025, 2050, 2070, 2095, 2150, 2155, 2163, 2164 및 LPN-6919 등이 있으며, Lubrizol사의 SOLSPERSE-3000, 9000, 13000, 13240, 13650,13940, 16000, 17000, 18000, 20000, 21000, 24000, 26000, 27000, 28000, 31845, 32000, 32500, 32550, 33500, 32600, 34750, 35100, 36600, 38500, 41000, 41090, 53095, 55000, 56000 및 76500 등이 있다. The dispersing agent is added to deagglomerate the colorant and maintain stability, and those generally used in the art may be used without limitation. Commercially available dispersants include BYK's Disperbyk-101, 103, 107, 108, 110, 111, 112, 116, 130, 140, 142, 154, 161, 162, 163, 164, 165, 166, 167, 168, 170 , 171, 174, 180, 181, 182, 183, 184, 185, 190, 2000, 2001, 2009, 2010, 2020, 2025, 2050, 2070, 2095, 2150, 2155, 2163, 2164 and LPN-6919 Lubrizol's SOLSPERSE-3000, 9000, 13000, 13240, 13650,13940, 16000, 17000, 18000, 20000, 21000, 24000, 26000, 27000, 28000, 31845, 32000, 32500, 32550, 33500, 32600, 34750, 35100, 36600, 38500, 41000, 41090, 53095, 55000, 56000 and 76500.
이들은 1종 단독으로 또는 2종 이상을 혼합하여 사용할 수 있으며, 보다 바람직하게는 산성 관능기를 갖는 분산제인 BYK사의 Disperbyk-2000, 2001, BYK사의 LPN-6919, Lubrizol사의 SOLSPERSE-3000, 21000, 26000, 36600, 41000 등을 사용할 수 있으나, 이들로 한정하는 것은 아니다. These may be used alone or in combination of two or more, more preferably BYK's Disperbyk-2000, 2001, BYK's LPN-6919, Lubrizol's SOLSPERSE-3000, 21000, 26000, which are dispersants having an acidic functional group, 36600, 41000, etc. may be used, but is not limited thereto.
상기 분산제는, 사용되는 착색제의 고형분 100 중량부에 대하여 바람직하게는 5 내지 50 중량부, 더욱 바람직하게는 15 내지 50 중량부 범위 이내로 사용하는 것이 좋다. 상기 분산제의 함량이 상기한 기준으로 5 중량부 미만인 경우, 미립화가 어렵거나 분산 후 겔화 등의 문제를 야기할 수 있다. 반면, 함량이 50 중량부를 초과하게 되면 점도가 높아질 수 있다. The dispersant is preferably used in an amount of 5 to 50 parts by weight, more preferably 15 to 50 parts by weight, based on 100 parts by weight of the solid content of the colorant used. When the content of the dispersant is less than 5 parts by weight based on the above-mentioned basis, it may cause problems such as difficulty in atomization or gelation after dispersion. On the other hand, when the content exceeds 50 parts by weight, the viscosity may increase.
본 발명에서, 상기 포스포텅스텐산 및 몰리브덴산으로부터 선택되는 1종 이상의 불용화제와 결합된 안료 또는 염료의 구체적인 예로는, C.I. Pigment Red 81, C.I. Pigment Red 81:3, C.I. Pigment Red 81:4, C.I. Pigment Violet 1, C.I. Pigment Violet 2, C.I. Pigment Violet 2:2, C.I. Pigment Violet 3, C.I. Pigment Violet 39, C.I. Pigment Blue 1, C.I. Pigment Blue 9, C.I. Pigment Blue 14, C.I. Pigment Green 1, C.I. Pigment Green 2 및 C.I. Pigment Green 4 등을 들 수 있으나, 이에 한정하지 않는다.In the present invention, specific examples of pigments or dyes combined with at least one insolubilizing agent selected from phosphotungstic acid and molybdic acid include C.I. Pigment Red 81, C.I. Pigment Red 81:3, C.I. Pigment Red 81:4, C.I. Pigment Violet 1, C.I. Pigment Violet 2, C.I. Pigment Violet 2:2, C.I. Pigment Violet 3, C.I. Pigment Violet 39, C.I. Pigment Blue 1, C.I. Pigment Blue 9, C.I. Pigment Blue 14, C.I. Pigment Green 1, C.I. Pigment Green 2 and C.I. Pigment Green 4 and the like may be mentioned, but the present invention is not limited thereto.
또한, 본 발명의 포스포텅스텐산(phosphotungstic acid) 및 몰리브덴산(Molybdic acid)으로부터 선택되는 1종 이상의 불용화제와 결합된 안료 또는 염료는, 조성물 중의 고형분 총 중량에 대하여 5 내지 40 중량%로 포함되는 것이 바람직하며, 5 내지 20 중량%로 포함되는 것이 보다 바람직하다. 상기한 기준으로 함량이 5 중량% 미만인 경우 명암비의 상승폭이 높지 않다. 반면, 40 중량%를 초과하는 경우 신뢰성 문제가 발생하기 쉽다. In addition, the pigment or dye combined with at least one insolubilizing agent selected from phosphotungstic acid and molybdic acid of the present invention, based on the total weight of solids in the composition 5 to 40% by weight It is preferably included, and it is more preferably included in an amount of 5 to 20% by weight. When the content is less than 5% by weight based on the above criteria, the increase in the contrast ratio is not high. On the other hand, when it exceeds 40% by weight, reliability problems are likely to occur.
상기 착색제는 본 발명의 착색 감광성 수지 조성물 중의 고형분 총 중량에 대하여 5 내지 50 중량%로 포함되는 것이 바람직하며, 5 내지 30 중량%로 포함되는 것이 보다 바람직하다. 상기한 기준으로 함량이 5 중량% 미만인 경우 화소의 색농도가 충분하지 않는 문제가 있고, 50 중량%를 초과하는 경우 점도가 높고 저장안정성이 나쁘며, 분산효율이 낮아 명암비에도 악영향을 미칠 수 있다. The colorant is preferably included in an amount of 5 to 50 wt%, more preferably 5 to 30 wt%, based on the total weight of the solid content in the colored photosensitive resin composition of the present invention. If the content is less than 5% by weight as described above, there is a problem that the color concentration of the pixel is not sufficient, and if it exceeds 50% by weight, the viscosity is high, the storage stability is poor, and the dispersion efficiency is low, which may adversely affect the contrast ratio.
(B) 알칼리 가용성 수지(B) alkali-soluble resin
본 발명의 착색 감광성 수지 조성물에 포함되는 알칼리 가용성 수지는, 패턴을 형성할 때의 현상 처리 공정에서 이용되는 알칼리 현상액에 대해서 가용성을 갖는 수지이면 특별히 한정하지 않으며, 카르복실기를 포함하는 에틸렌성 불포화 단량체를 공중합하여 제조하는 것이 바람직하다.The alkali-soluble resin contained in the colored photosensitive resin composition of the present invention is not particularly limited as long as it is a resin having solubility in an alkali developer used in the developing treatment step at the time of forming a pattern, and an ethylenically unsaturated monomer containing a carboxyl group It is preferable to prepare by copolymerization.
상기 카르복실기를 갖는 에틸렌성 불포화 단량체의 구체적인 예로는 아크릴산, 메타아크릴산, 크로톤산 등의 모노카르복실산류; 푸마르산, 메사콘산, 이타콘산 등의 디카르복실산류; 및 이들의 디카르복실산의 무수물; ω-카르복시폴리카프로락톤모노(메타)아크릴레이트 등의 양 말단에 카르복실기와 수산기를 갖는 폴리머의 모노(메타)아크릴레이트류; 등을 들 수 있다. 이들 중 아크릴산, 메타아크릴산이 바람직하다.Specific examples of the ethylenically unsaturated monomer having a carboxyl group include monocarboxylic acids such as acrylic acid, methacrylic acid, and crotonic acid; dicarboxylic acids such as fumaric acid, mesaconic acid, and itaconic acid; and anhydrides of their dicarboxylic acids; polymer mono(meth)acrylates having a carboxyl group and a hydroxyl group at both terminals, such as ω-carboxypolycaprolactone mono(meth)acrylate; and the like. Among these, acrylic acid and methacrylic acid are preferable.
상기 알칼리 가용성 수지의 제조 시, 상기 카르복실기를 갖는 에틸렌성 불포화 단량체와 공중합 가능한 불포화 단량체를 추가하여 중합할 수 있다. When preparing the alkali-soluble resin, polymerization may be performed by adding an ethylenically unsaturated monomer copolymerizable with the ethylenically unsaturated monomer having a carboxyl group.
상기 공중합 가능한 불포화 단량체의 구체적인 예로는, 글리시딜기를 갖는 불포화 단량체인 글리시딜메타아크릴레이트; 2-히드록시에틸(메타)아크릴레이트, 2-히드록시프로필(메타)아크릴레이트, 4-히드록시부틸(메타)아크릴레이트, 2-히드록시-3-페녹시프로필 (메타)아크릴레이트, N-히드록시에틸 아크릴아마이드 등의 히드록시에틸(메타)아크릴레이트류 등의 수산기를 갖는 에틸렌성 불포화 단량체; 스티렌, 비닐톨루엔, α-메틸스티렌, p-클로로스티렌, o-메톡시스티렌, m-메톡시스티렌, p-메톡시스티렌, o-비닐벤질메틸에테르, m-비닐벤질메틸에테르, p-비닐벤질메틸에테르, o-비닐벤질글리시딜에테르, m-비닐벤질글리시딜에테르, p-비닐벤질글리시딜에테르 등의 방향족 비닐 화합물; N-시클로헥실말레이미드, N-벤질말레이미드, N-페닐말레이미드, N-o-히드록시페닐말레이미드, N-m-히드록시페닐말레이미드, N-p-히드록시페닐말레이미드, N-o-메틸페닐말레이미드, N-m-메틸페닐말레이미드, N-p-메틸페닐말레이미드, N-o-메톡시페닐말레이미드, N-m-메톡시페닐말레이미드, N-p-메톡시페닐말레이미드 등의 N-치환 말레이미드계 화합물; 메틸(메타)아크릴레이트, 에틸(메타)아크릴레이트, n-프로필(메타)아크릴레이트, i-프로필(메타)아크릴레이트, n-부틸(메타)아크릴레이트, i-부틸(메타)아크릴레이트, sec-부틸(메타)아크릴레이트, t-부틸(메타)아크릴레이트 등의 알킬(메타)아크릴레이트류; 시클로펜틸(메타)아크릴레이트, 시클로헥실(메타)아크릴레이트, 2-메틸시클로헥실(메타)아크릴레이트, 트리시클로[5.2.1.0 2,6 ]데칸-8-일(메타)아크릴레이트, 2-디시클로펜타닐옥시에틸(메타)아크릴레이트, 이소보르닐(메타)아크릴레이트 등의 지환족(메타)아크릴레이트류; 페닐(메타)아크릴레이트, 벤질(메타)아크릴레이트 등의 아릴(메타)아크릴레이트류; 3-(메타크릴로일옥시메틸)옥세탄, 3-(메타크릴로일옥시메틸)-3-에틸옥세탄, 3-(메타크릴로일옥시메틸)-2-트리플루오로메틸옥세탄, 3-(메타크릴로일옥시메틸)-2-페닐옥세탄, 2-(메타크릴로일옥시메틸)옥세탄, 2-(메타크릴로일옥시메틸)-4-트리플루오로메틸옥세탄 등의 불포화 옥세탄 화합물 등을 들 수 있다.Specific examples of the copolymerizable unsaturated monomer include glycidyl methacrylate, which is an unsaturated monomer having a glycidyl group; 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, N -ethylenically unsaturated monomers having a hydroxyl group, such as hydroxyethyl (meth)acrylates such as hydroxyethyl acrylamide; Styrene, vinyltoluene, α-methylstyrene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzylmethyl ether, m-vinylbenzylmethyl ether, p-vinyl Aromatic vinyl compounds, such as benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, and p-vinyl benzyl glycidyl ether; N-cyclohexylmaleimide, N-benzylmaleimide, N-phenylmaleimide, No-hydroxyphenylmaleimide, Nm-hydroxyphenylmaleimide, Np-hydroxyphenylmaleimide, No-methylphenylmaleimide, Nm -N-substituted maleimide compounds, such as methylphenylmaleimide, Np-methylphenylmaleimide, No-methoxyphenylmaleimide, Nm-methoxyphenylmaleimide, and Np-methoxyphenylmaleimide; Methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, i-propyl (meth) acrylate, n-butyl (meth) acrylate, i-butyl (meth) acrylate, alkyl (meth)acrylates such as sec-butyl (meth)acrylate and t-butyl (meth)acrylate; Cyclopentyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-methylcyclohexyl (meth) acrylate, tricyclo [5.2.1.0 2,6 ] decan-8-yl (meth) acrylate, 2- alicyclic (meth)acrylates such as dicyclopentanyloxyethyl (meth)acrylate and isobornyl (meth)acrylate; aryl (meth)acrylates such as phenyl (meth)acrylate and benzyl (meth)acrylate; 3-(methacryloyloxymethyl)oxetane, 3-(methacryloyloxymethyl)-3-ethyloxetane, 3-(methacryloyloxymethyl)-2-trifluoromethyloxetane; 3-(methacryloyloxymethyl)-2-phenyloxetane, 2-(methacryloyloxymethyl)oxetane, 2-(methacryloyloxymethyl)-4-trifluoromethyloxetane, etc. of unsaturated oxetane compounds.
상기한 단량체는 각각 단독으로 또는 2종 이상을 조합하여 사용할 수 있으며, 반드시 이들로 한정하는 것은 아니다.The above-described monomers may be used alone or in combination of two or more, but are not necessarily limited thereto.
상기 알칼리 가용성 수지는, 착색 감광성 수지 조성물의 현상성을 확보하기 위해 산가가 30 내지 150 mgKOH/g인 것이 바람직하다. 알칼리 가용성 수지의 산가가 30 mgKOH/g 미만인 경우 착색 감광성 수지 조성물이 충분한 현상속도를 확보하기 어렵다. 반면, 150 mgKOH/g를 초과하는 경우 기판과의 밀착성이 감소되어 패턴의 단락이 발생하기 쉽다.The alkali-soluble resin preferably has an acid value of 30 to 150 mgKOH/g in order to secure the developability of the colored photosensitive resin composition. When the acid value of the alkali-soluble resin is less than 30 mgKOH/g, it is difficult for the colored photosensitive resin composition to secure a sufficient development rate. On the other hand, when it exceeds 150 mgKOH/g, the adhesion to the substrate is reduced, so that a short circuit of the pattern is likely to occur.
상기 알칼리 가용성 수지는 착색 감광성 수지 조성물 중의 고형분에 대하여 10 내지 80 중량%로 포함되는 것이 바람직하며, 10 내지 70 중량%로 포함되는 것이 보다 바람직하다. 알칼리 가용성 수지의 함량이 상기한 기준으로 10 내지 80 중량%의 범위 이내인 경우, 현상액에의 용해성이 충분하여 패턴 형성이 용이하며, 현상시에 노광부의 화소 부분의 막 감소가 방지되어 비화소 부분의 누락성이 양호해지므로 바람직하다. The alkali-soluble resin is preferably contained in an amount of 10 to 80% by weight, more preferably in an amount of 10 to 70% by weight, based on the solid content in the colored photosensitive resin composition. When the content of the alkali-soluble resin is within the range of 10 to 80% by weight based on the above criteria, the solubility in the developer is sufficient to facilitate pattern formation, and the film reduction of the pixel portion of the exposed portion is prevented during development, so that the non-pixel portion It is preferable because the omission property of
(C) (C) 광중합성photopolymerization 화합물 compound
본 발명의 착색 감광성 수지 조성물에 포함되는 광중합성 화합물은, 후술하는 광중합 개시제의 작용으로 중합될 수 있는 화합물로서, 단관능 단량체, 2관능 단량체 또는 다관능 단량체를 사용할 수 있다. 이 중, 2관능 이상의 다관능 단량체를 사용하는 것이 보다 바람직할 수 있다. The photopolymerizable compound contained in the colored photosensitive resin composition of the present invention is a compound that can be polymerized by the action of a photopolymerization initiator described later, and may be a monofunctional monomer, a difunctional monomer, or a polyfunctional monomer. Among them, it may be more preferable to use a polyfunctional monomer having a bifunctional or higher function.
상기 단관능 단량체의 구체적인 예로는, 노닐페닐카르비톨아크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-에틸헥실카르비톨아크릴레이트, 2-히드록시에틸 아크릴레이트 및 N-비닐피롤리돈 등을 들 수 있으나, 이에 한정되는 것은 아니다.Specific examples of the monofunctional monomer include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate and N-vinylpi and rollidone, but is not limited thereto.
상기 2관능 단량체의 구체적인 예로는, 1,6-헥산디올디(메타) 아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 네오펜틸글리콜디(메타) 아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 비스페놀 A의 비스(아크릴로일옥시에틸)에테르 및 3-메틸펜탄디올디(메타)아크릴레이트 등을 들 수 있으나, 이에 한정되는 것은 아니다.Specific examples of the bifunctional monomer include 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and triethylene glycol di (meth) acrylate. , bis(acryloyloxyethyl) ether of bisphenol A and 3-methylpentanediol di(meth)acrylate, but is not limited thereto.
상기 3관능 이상의 다관능 다량체의 구체적인 예로는, 트리메틸올 프로판트리(메타) 아크릴레이트, 에톡실레이티드트리메틸올프로판트리(메타)아크릴레이트, 프로폭실레이티드트리메틸올프로판트리(메타)아크릴레이트, 펜타에리스리톨트리 (메타)아크릴레이트, 펜타에리스리톨테트라(메타)아크릴레이트, 디펜타에리스 리톨펜타(메타)아크릴레이트, 에톡실레이티드디펜타에리스리톨헥사(메타)아크릴 레이트, 프로폭실레이티드디펜타에리스리톨헥사(메타)아크릴레이트 및 디펜타 에리스리톨헥사(메타)아크릴레이트 등을 들 수 있으나, 이에 한정되는 것은 아니다.Specific examples of the trifunctional or higher polyfunctional multimer include trimethylol propane tri (meth) acrylate, ethoxylated trimethylol propane tri (meth) acrylate, propoxylated trimethylol propane tri (meth) acrylate , pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, ethoxylated dipentaerythritol hexa (meth) acrylate, propoxylated dipenta erythritol hexa (meth) acrylate and dipenta erythritol hexa (meth) acrylate, but are not limited thereto.
상기 광중합성 화합물은 본 발명의 착색 감광성 수지 조성물 중의 고형분에 대하여 5 내지 45 중량%로 포함되는 것이 바람직하며, 7 내지 45 중량%로 포함되는 것이 보다 바람직하다. 상기 광중합성 화합물이 상기한 기준으로 5 내지 45 중량%의 범위 내에 포함되는 경우, 화소부의 강도나 평활성이 양호하게 되기 때문에 바람직하다.The photopolymerizable compound is preferably contained in an amount of 5 to 45% by weight, more preferably in an amount of 7 to 45% by weight, based on the solid content in the colored photosensitive resin composition of the present invention. When the photopolymerizable compound is included in the range of 5 to 45% by weight based on the above-mentioned basis, it is preferable because the strength or smoothness of the pixel portion is improved.
(D) (D) 광중합light curing 개시제initiator
본 발명의 착색 감광성 수지 조성물에 포함되는 광중합 개시제는 옥심에스테르계 광중합 개시제를 포함한다. The photoinitiator contained in the coloring photosensitive resin composition of this invention contains an oxime ester type photoinitiator.
상기 옥심에스테르계 광중합 개시제의 구체적인 예로는 1,2-옥탄다이온, 1-[4-(페닐티오) 페닐]-,2-(O-벤조일옥심) (1,2-Octanedione, 1-[4-(phenylthio) phenyl]-,2-(O-benzoyloxime)), 1-[9-에틸-6-(2-메틸벤조일)-9H-카바졸-3-일]에타논 1-(O-아세틸옥심) (1-[9-Ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone 1-(O-acetyloxime)) 및 1-[4-(페닐티오)페닐)]-3-사이클로헥실-프로판-1,2-다이온-2-(O-아세틸옥심) (1-[4-(phenylthio)phenyl)]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime)) 등을 들 수 있다. 또한, 시판품으로는 트론리사의 PBG-327, BASF사의 Irgacure® OXE 01, Irgacure® OXE 02 및 Irgacure® OXE 03 등을 들 수 있다. Specific examples of the oxime ester-based photopolymerization initiator include 1,2-octanedione, 1-[4-(phenylthio)phenyl]-,2-(O-benzoyloxime) (1,2-Octanedione, 1-[4) -(phenylthio)phenyl]-,2-(O-benzoyloxime)), 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone 1-(O-acetyl oxime) (1-[9-Ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone 1-(O-acetyloxime)) and 1-[4-(phenylthio)phenyl)]-3 -Cyclohexyl-propane-1,2-dione-2-(O-acetyloxime) (1-[4-(phenylthio)phenyl)]-3-cyclohexyl-propane-1,2-dione-2-(O -acetyloxime)) and the like. Further, commercially available products include PBG-327 from Tronley, Irgacure® OXE 01, Irgacure® OXE 02 and Irgacure® OXE 03 from BASF.
상기한 옥심계에스테르계 광중합 개시제는 각각 단독으로 또는 2종 이상을 조합하여 사용할 수 있다.The above-described oxime-based ester-based photopolymerization initiators may be used alone or in combination of two or more.
상기 옥심에스테르계 광중합 개시제는, 광중합 개시제 총 중량에 대하여 10 내지 100 중량%로 포함되는 것이 바람직하며, 20 내지 100 중량%로 포함되는 것이 보다 바람직할 수 있다. 상기 옥심에스테르계 광중합 개시제의 함량이 상기한 기준으로 10 중량% 미만인 경우, 착색제에 의한 감도 저하 문제를 해결하지 못하고, 현상 공중 중 패턴의 단락이 발생하기 쉽다.The oxime ester-based photopolymerization initiator is preferably included in an amount of 10 to 100 wt%, more preferably 20 to 100 wt%, based on the total weight of the photopolymerization initiator. When the content of the oxime ester-based photopolymerization initiator is less than 10% by weight based on the above-mentioned basis, the problem of sensitivity degradation due to the colorant cannot be solved, and short circuit of the pattern during development is easy to occur.
또한 본 발명의 조성물은, 본 발명의 효과를 손상하지 않는 범위 내에서 광중합 개시제로서 옥심에스테르계 광중합 개시제 외에 다른 광중합 개시제를 추가로 포함할 수 있다. 상기 다른 광중합 개시제의 대표적인 예로는, 아세토페논계 화합물, 벤조페논계 화합물, 트리아진계 화합물, 비이미다졸계 화합물 및 티오크산톤계 화합물 등을 들 수 있으며, 이로부터 선택되는 1종 이상의 화합물을 사용할 수 있다.In addition, the composition of the present invention may further include other photopolymerization initiators in addition to the oxime ester-based photopolymerization initiator as a photopolymerization initiator within a range that does not impair the effects of the present invention. Representative examples of the other photopolymerization initiator include an acetophenone-based compound, a benzophenone-based compound, a triazine-based compound, a biimidazole-based compound, and a thioxanthone-based compound. can
상기 아세토페논계 화합물의 구체적인 예로는, 디에톡시아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1-온, 벤질디메틸케탈, 2-히드록시-1-[4-(2-히드록시에톡시)페닐]-2-메틸프로판-1-온, 1-히드록시시클로헥실페닐케톤, 2-메틸-1-(4-메틸티오페닐)-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온, 2-히드록시-2-메틸-1-[4-(1-메틸비닐)페닐]프로판-1-온 및 2-(4-메틸벤질)-2-(디메틸아미노)-1-(4-모르폴리노페닐)부탄-1-온 등을 들 수 있다.Specific examples of the acetophenone-based compound include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethyl ketal, 2-hydroxy-1-[4-(2-) Hydroxyethoxy)phenyl]-2-methylpropan-1-one, 1-hydroxycyclohexylphenylketone, 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one , 2-Benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, 2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propane- 1-one and 2-(4-methylbenzyl)-2-(dimethylamino)-1-(4-morpholinophenyl)butan-1-one; and the like.
상기 벤조페논계 화합물의 구체적인 예로는, 벤조페논, 0-벤조일벤조산 메틸, 4-페닐벤조페논, 4-벤조일-4'-메틸디페닐술피드, 3,3',4,4'-테트라(tert-부틸퍼옥시카르보닐)벤조페논 및 2,4,6-트리메틸벤조페논 등을 들 수 있다.Specific examples of the benzophenone-based compound include benzophenone, 0-benzoylbenzoate methyl, 4-phenylbenzophenone, 4-benzoyl-4′-methyldiphenylsulfide, 3,3′,4,4′-tetra( tert-butylperoxycarbonyl)benzophenone, 2,4,6-trimethylbenzophenone, etc. are mentioned.
상기 트리아진계 화합물의 구체적인 예로는, 2,4-비스(트리클로로메틸)-6-(4-메톡시페닐)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시나프틸)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-피페로닐-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(5-메틸퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-1,3,5-트리아진 및 2,4-비스(트리클로로메틸)-6-[2-(3,4-디메톡시페닐)에테닐]-1,3,5-트리아진 등을 들 수 있다.Specific examples of the triazine-based compound include 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)- 6-(4-methoxynaphthyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine, 2,4- Bis(trichloromethyl)-6-(4-methoxystyryl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(5-methylfuran-2) -yl)ethenyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)ethenyl]-1,3,5-tri azine, 2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2-methylphenyl)ethenyl]-1,3,5-triazine and 2,4-bis(trichloro methyl)-6-[2-(3,4-dimethoxyphenyl)ethenyl]-1,3,5-triazine;
상기 비이미다졸계 화합물의 구체적인 예로는, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(알콕시페닐)비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(트리알콕시페닐)비이미다졸, 2,2-비스(2,6-디클로로페닐)-4,4’,5,5’-테트라페닐-1,2’-비이미다졸 또는 4,4',5,5' 위치의 페닐기가 카르보알콕시기에 의해 치환되어 있는 이미다졸 화합물 등을 들 수 있다. Specific examples of the biimidazole-based compound include 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3) -Dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxyphenyl)bi Imidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(trialkoxyphenyl)biimidazole, 2,2-bis(2,6-dichlorophenyl)- 4,4',5,5'-tetraphenyl-1,2'-biimidazole or an imidazole compound in which the phenyl group at the 4,4',5,5' position is substituted with a carboalkoxy group; there is.
이들 중에서 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2-비스(2,6-디클로로페닐)-4,4’,5,5’-테트라페닐-1,2’-비이미다졸이 바람직하게 사용될 수 있다.Among them, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl)-4,4' ,5,5'-tetraphenylbiimidazole, 2,2-bis(2,6-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole is preferably can be used
상기 티오크산톤계 화합물의 구체적인 예로는, 2-이소프로필티오크산톤, 2,4-디에틸티오크산톤, 2,4-디클로로티오 크산톤 및 1-클로로-4-프로폭시티오크산톤 등을 들 수 있다.Specific examples of the thioxanthone-based compound include 2-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone and 1-chloro-4-propoxythioxanthone. can be heard
상기 광중합 개시제는, 본 발명의 착색 감광성 수지 조성물 중의 고형분 총 중량에 대하여 5 내지 40 중량%로 포함되는 것이 바람직하며, 10 내지 30 중량%로 포함되는 것이 보다 바람직하다. 광중합 개시제의 함량이 상기한 기준으로 5 내지 40 중량% 범위 이내인 경우, 착색 감광성 수지 조성물이 고감도화 되어 노광 시간이 단축되므로 생산성이 향상되고, 높은 해상도를 유지할 수 있다. 또한, 화소부의 강도와 상기 화소부의 표면에서의 평활성이 양호해질 수 있다.The photopolymerization initiator is preferably contained in an amount of 5 to 40% by weight, more preferably in an amount of 10 to 30% by weight, based on the total weight of the solid content in the colored photosensitive resin composition of the present invention. When the content of the photopolymerization initiator is within the range of 5 to 40 wt % based on the above-mentioned basis, the colored photosensitive resin composition is highly sensitive and the exposure time is shortened, so that productivity is improved and high resolution can be maintained. In addition, the intensity of the pixel portion and smoothness on the surface of the pixel portion may be improved.
또한, 상기 광중합 개시제는 본 발명의 착색 감광성 수지 조성물의 감도를 향상시키기 위해서, 광중합 개시제를 더 포함할 수 있다. 본 발명에 따른 착색 감광성 수지 조성물은 광중합 개시 보조제를 함유함으로써, 감도가 더욱 높아져 생산성을 향상시킬 수 있다.In addition, the photoinitiator may further include a photoinitiator in order to improve the sensitivity of the colored photosensitive resin composition of the present invention. The colored photosensitive resin composition according to the present invention contains a photopolymerization initiation adjuvant, thereby further increasing the sensitivity and improving productivity.
상기 광중합 개시 보조제로는 예를 들어, 아민 화합물, 카르복실산 화합물 및 다관능 티올화합물로부터 선택되는 1종 이상의 화합물이 바람직하게 사용될 수 있다. As the photopolymerization initiation adjuvant, for example, at least one compound selected from an amine compound, a carboxylic acid compound, and a polyfunctional thiol compound may be preferably used.
상기 아민 화합물로는 방향족 아민 화합물을 사용하는 것이 바람직하며, 구체적으로 트리에탄올아민, 메틸디에탄올아민, 트리이소프로판올아민 등의 지방족 아민 화합물, 4-디메틸아미노벤조산메틸, 4-디메틸아미노벤조산에틸, 4-디메틸아미노벤조산이소아밀, 4-디메틸아미노벤조산2-에틸헥실, 벤조산2-디메틸아미노에틸, N,N-디메틸파라톨루이딘, 4,4'-비스(디메틸아미노)벤조페논(통칭: 미힐러 케톤), 4,4'-비스(디에틸아미노)벤조페논 등을 들 수 있다.It is preferable to use an aromatic amine compound as the amine compound, and specifically, an aliphatic amine compound such as triethanolamine, methyldiethanolamine, and triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, 4- Dimethylaminobenzoic acid isoamyl, 4-dimethylaminobenzoic acid 2-ethylhexyl, benzoic acid 2-dimethylaminoethyl, N,N-dimethylparatoluidine, 4,4'-bis(dimethylamino)benzophenone (common name: Michler ketone) ), 4,4'-bis(diethylamino)benzophenone, etc. are mentioned.
상기 카르복실산 화합물은 방향족 헤테로아세트산류인 것이 바람직하며, 구체적으로 페닐티오아세트산, 메틸페닐티오아세트산, 에틸페닐티오아세트산, 메틸에틸페닐티오아세트산, 디메틸페닐티오아세트산, 메톡시페닐티오아세트산, 디메톡시페닐티오아세트산, 클로로페닐티오아세트산, 디클로로페닐티오아세트산, N-페닐글리신, 페녹시아세트산, 나프틸티오아세트산, N-나프틸글리신 및 나프톡시아세트산 등을 들 수 있다.The carboxylic acid compound is preferably aromatic heteroacetic acid, specifically phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthio Acetic acid, chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid, etc. are mentioned.
상기 다관능 티올화합물로는 트리스-[(3-머캅토프로피오닐록시)-에틸]-이소시아누레이트(Tris-[(3-mercaptopropionyloxy)-ethyl]-isocyanurate), 트리메틸로프로판 트리스-3-머캅토프로피오네이트(Trimethylolpropane tris -3-mercaptopropionate)), 펜타에리트리톨 테트라키스-3-머캅토프로피오네이트(Pentaerythritol tetrakis-3-mercaptopropionate), 디펜타에리트리톨 헥사-3-머캅토프로피오네이트(Dipentaerythritol hexa-3-mercaptopropionate) 등을 들 수 있다. The polyfunctional thiol compound includes tris-[(3-mercaptopropionyloxy)-ethyl]-isocyanurate (Tris-[(3-mercaptopropionyloxy)-ethyl]-isocyanurate), trimethylopropane tris-3- Mercaptopropionate (Trimethylolpropane tris -3-mercaptopropionate), pentaerythritol tetrakis-3-mercaptopropionate (Pentaerythritol tetrakis-3-mercaptopropionate), dipentaerythritol hexa-3-mercaptopropionate (Dipentaerythritol hexa-3-mercaptopropionate) and the like.
상기 광중합 개시 보조제를 사용하는 경우, 상기 광중합 개시 보조제는 본 발명의 착색 감광성 수지 조성물 중의 고형분 총 중량에 대하여 5 내지 40 중량%로 포함되는 것이 바람직하며, 5 내지 30 중량%로 포함되는 것이 보다 바람직하다. 함량이 상기한 기준으로 5 내지 40 중량% 범위 이내인 경우, 착색 감광성 수지 조성물의 감도가 더 높아지고, 상기 조성물을 사용하여 형성되는 컬러필터의 생산성이 향상되는 효과를 제공할 수 있다. When using the photopolymerization initiation adjuvant, the photopolymerization initiation adjuvant is preferably contained in an amount of 5 to 40 wt%, more preferably 5 to 30 wt%, based on the total weight of the solid content in the colored photosensitive resin composition of the present invention. Do. When the content is within the range of 5 to 40% by weight based on the above-mentioned basis, the sensitivity of the colored photosensitive resin composition is higher, and productivity of a color filter formed by using the composition is improved.
(E) 하기 화학식 1의 (E) of the following formula (1) 실세스퀴옥산계Silsesquioxane type 화합물 compound
본 발명의 착색 감광성 수지 조성물은 하기 화학식 1의 실세스퀴옥산(Silsesquioxane)계 화합물을 포함한다. 상기 실세스퀴옥산계 화합물은 고유의 벌크(bulky)한 구조로 인해, 후 공정에서 용제가 착색 감광성 수지 조성물로 형성된 도막에 침투하는 것을 억제한다. 이에 따라, 도막 내의 색재, 특히 본 발명의 조성물에 포함되는 포스포텅스텐산(phosphotungstic acid) 및 몰리브덴산(Molybdic acid)으로부터 선택되는 1종 이상의 불용화제와 결합된 안료 또는 염료를 사용하는 경우에 있어서, 이러한 착색제가 용출되는 것을 방지하는 역할을 한다.The colored photosensitive resin composition of the present invention includes a silsesquioxane-based compound of Formula 1 below. The silsesquioxane-based compound suppresses penetration of a solvent into a coating film formed of the colored photosensitive resin composition in a subsequent process due to its inherent bulky structure. Accordingly, in the case of using a colorant in the coating film, particularly a pigment or dye combined with at least one insolubilizing agent selected from phosphotungstic acid and Molybdic acid included in the composition of the present invention , serves to prevent the dissolution of these colorants.
<화학식 1><Formula 1>
상기 화학식 1에서 R1 및 R2는 각각 독립적으로, C1~C30의 지방족 탄화수소, C1~C30의 방향족 탄화수소로; 산소, 규소 또는 황을 포함할 수 있으며,In Formula 1, R 1 and R 2 are each independently a C1-C30 aliphatic hydrocarbon, a C1-C30 aromatic hydrocarbon; may contain oxygen, silicon or sulfur;
산소, 규소 또는 황과 함께, 또는 독립적으로 환을 형성할 수 있다. It may form a ring with or independently of oxygen, silicon or sulfur.
상기 R1 및 R2는 각각 독립적으로, 보다 구체적으로 치환 또는 비치환된 C1~C30의 알킬기, 치환 또는 비치환된 C1~C30의 사이클로알킬기, 치환 또는 비치환된 C1~C30의 아릴기, 치환 또는 비치환된 C1~C30의 아릴알킬기, 치환 또는 비치환된 C1~C30의 알케닐기, 치환 또는 비치환된 C1~C30의 알키닐기, 치환 또는 비치환된 C1~C30의 아크릴레이트기, 치환 또는 비치환된 C1~C30의 에폭시기, 치환 또는 비치환된 C1~C30의 에스테르기, 치환 또는 비치환된 C1~C30의 알코올기 및 치환 또는 비치환된 C1~C30의 티올기로부터 선택되는 1종 이상의 기(group)이다.Wherein R 1 and R 2 are each independently, more specifically, a substituted or unsubstituted C1-C30 alkyl group, a substituted or unsubstituted C1-C30 cycloalkyl group, a substituted or unsubstituted C1-C30 aryl group, substituted Or an unsubstituted C1-C30 arylalkyl group, a substituted or unsubstituted C1-C30 alkenyl group, a substituted or unsubstituted C1-C30 alkynyl group, a substituted or unsubstituted C1-C30 acrylate group, a substituted or At least one selected from an unsubstituted C1-C30 epoxy group, a substituted or unsubstituted C1-C30 ester group, a substituted or unsubstituted C1-C30 alcohol group, and a substituted or unsubstituted C1-C30 thiol group is a group.
이때, 상기 치환된 치환기로는 알킬기, 알킬렌기, 알키닐기, 벤질기 및 페닐기 등을 들 수 있으나 이에 한정하지 않는다. In this case, the substituted substituent may include, but is not limited to, an alkyl group, an alkylene group, an alkynyl group, a benzyl group, and a phenyl group.
특히, 후 공정 시 색재가 용출되는 것을 보다 효과적으로 방지할 수 있다는 측면에서, 상기 R1 및 R2는 보다 바람직하게는 아릴기, 비닐기, (메타)아크릴기, 에폭시기 및 티올기로부터 선택되는 1종 이상의 기(group)를 포함하는 것이 좋다. In particular, in terms of being able to more effectively prevent the dissolution of the color material in the subsequent process, R 1 and R 2 are more preferably selected from an aryl group, a vinyl group, a (meth)acrylic group, an epoxy group, and a thiol group. It is preferable to include more than one species.
보다 구체적으로, 상기 R1 및 R2는 각각 독립적으로 하기 화학식 1-1 내지 화학식 1-17로부터 선택되는 1종 이상의 기(group)일 수 있으나 이에 한정하지 않는다.More specifically, R 1 and R 2 may each independently be one or more groups selected from the following Chemical Formulas 1-1 to 1-17, but are not limited thereto.
상기 화학식 1의 실세스퀴옥산계 화합물의 구체적인 예로는, PSS-Allyl-Heptaisobutyl substituted, PSS-[2-(3,4-Epoxycyclohexyl)ethyl]-Heptaisobutyl substituted, PSS-(3-Glycidyl)propoxy-Heptaisobutyl substituted, PSS-Octa[(3-glycidyloxypropyl)dimethylsiloxy] substituted, PSS-(3-Mercapto)propyl-Heptaisobutyl substituted, PSS-Methacryl substituted, PSS-Octa[(1,2-epoxy-4-ethylcyclohexyl)dimethylsiloxy] substituted, PSS-Octa[(3-glycidyloxypropyl)dimethylsiloxy] substituted, PSS-Octavinyl substituted, PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted, PSS-Trivinylsilyloxy-Heptacyclopentyl substituted, PSS-Vinyl-Heptacyclopentyl substituted 및 PSS-Vinyl-Heptaisobutyl substituted 등을 들 수 있다. Specific examples of the silsesquioxane-based compound of Formula 1 include PSS-Allyl-Heptaisobutyl substituted, PSS-[2-(3,4-Epoxycyclohexyl)ethyl]-Heptaisobutyl substituted, PSS-(3-Glycidyl)propoxy-Heptaisobutyl substituted, PSS-Octa[(3-glycidyloxypropyl)dimethylsiloxy] substituted, PSS-(3-Mercapto)propyl-Heptaisobutyl substituted, PSS-Methacryl substituted, PSS-Octa[(1,2-epoxy-4-ethylcyclohexyl)dimethylsiloxy] substituted , PSS-Octa[(3-glycidyloxypropyl)dimethylsiloxy] substituted, PSS-Octavinyl substituted, PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted, PSS-Trivinylsilyloxy-Heptacyclopentyl substituted, PSS-Vinyl-Heptacyclopentyl substituted-HeptaisobutylVinyl-Heptacyclopentyl substituted-Heptaisobutyl substituted and PSS-Vinyl substituted and the like.
보다 바람직하게는, 반응성이 우수한 (메타)아크릴, 에폭시 또는 티올기를 포함하는 예로서 PSS-[2-(3,4-Epoxycyclohexyl)ethyl]-Heptaisobutyl substituted, PSS-(3-Glycidyl)propoxy-Heptaisobutyl substituted, PSS-Octa[(3-glycidyloxypropyl)dimethylsiloxy] substituted, PSS-(3-Mercapto)propyl-Heptaisobutyl substituted, PSS-Methacryl substituted, PSS-Octa[(1,2-epoxy-4-ethylcyclohexyl)dimethylsiloxy] substituted 및 PSS-Octa[(3-glycidyloxypropyl)dimethylsiloxy] substituted 등을 들 수 있으나 이에 한정하지 않는다.More preferably, PSS-[2-(3,4-Epoxycyclohexyl)ethyl]-Heptaisobutyl substituted, PSS-(3-Glycidyl)propoxy-Heptaisobutyl substituted as an example containing a (meth)acryl, epoxy or thiol group having excellent reactivity , PSS-Octa[(3-glycidyloxypropyl)dimethylsiloxy] substituted, PSS-(3-Mercapto)propyl-Heptaisobutyl substituted, PSS-Methacryl substituted, PSS-Octa[(1,2-epoxy-4-ethylcyclohexyl)dimethylsiloxy] substituted and PSS-Octa[(3-glycidyloxypropyl)dimethylsiloxy] substituted, and the like, but is not limited thereto.
상기에서 예시한 화합물은 각각 단독으로 또는 2종 이상을 조합하여 사용할 수 있다. Each of the compounds exemplified above may be used alone or in combination of two or more.
상기 화학식 1의 실세스퀴옥산계 화합물은, 본 발명의 착색 감광성 수지 조성물 중의 고형분 총 중량에 대하여 1 중량% 내지 10 중량% 미만으로 포함되는 것이 바람직하며, 1 내지 5 중량%로 포함되는 것이 보다 바람직하다. 상기 실세스퀴옥산계 화합물의 함량이 상기한 기준으로 1 중량% 미만인 경우, 용제의 침투를 효과적으로 억제할 수 없다. 반면 10 중량% 이상인 경우 착색 감광성 수지 조성물의 현상 속도가 저하되어 잔사가 발생하기 쉽다.The silsesquioxane-based compound of Formula 1 is preferably included in an amount of 1 wt% to less than 10 wt%, and is more preferably included in an amount of 1 to 5 wt%, based on the total weight of the solid content in the colored photosensitive resin composition of the present invention. desirable. When the content of the silsesquioxane-based compound is less than 1% by weight based on the above-mentioned basis, the penetration of the solvent cannot be effectively suppressed. On the other hand, when it is 10% by weight or more, the development speed of the colored photosensitive resin composition is lowered, and residues are easily generated.
(F) 용제 (F) solvent
본 발명의 착색 감광성 수지 조성물에 포함되는 용제는, 착색 감광성 수지 조성물에 포함되는 다른 성분들을 용해시키는데 효과적인 것이면, 당해 분야에서 통상적으로 사용되는 용제를 특별히 제한하지 않고 사용할 수 있다.As long as the solvent contained in the colored photosensitive resin composition of the present invention is effective for dissolving other components contained in the colored photosensitive resin composition, a solvent commonly used in the art may be used without particular limitation.
상기 용제의 구체적인 예로서, 에테르류, 아세테이트류, 방향족 탄화수소류, 케톤류, 알코올류, 에스테르류, 및 아미드류 등으로부터 1종 이상을 선택하여 사용할 수 있으나 이에 한정하는 것은 아니다.As a specific example of the solvent, at least one selected from ethers, acetates, aromatic hydrocarbons, ketones, alcohols, esters, and amides may be used, but is not limited thereto.
상기 에테르류 용제는 구체적으로 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸 에테르, 에틸렌글리콜모노프로필에테르, 에틸렌글리콜모노부틸에테르 등의 에틸렌글리콜모노알킬에테르류;The ether solvent is specifically ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether;
디에틸렌글리콜디메틸에테르, 디에틸렌글리콜디에틸에테르, 디에틸렌글리콜디프로필에테르, 디에틸렌글리콜디부틸에테르 등의 디에틸렌글리콜 디알킬에테르류; 등을 들 수 있다.diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, and diethylene glycol dibutyl ether; and the like.
상기 아세테이트류 용제는 구체적으로 메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트 등의 에틸렌글리콜알킬에테르아세테이트류; The acetate solvents are specifically ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate;
프로필렌글리콜모노에틸에테르아세테이트, 프로필렌글리콜모노프로필에테르아세테이트, 메톡시부틸아세테이트, 메톡시펜틸아세테이트 등의 알킬렌글리콜알킬에테르아세테이트류; 등을 들 수 있다.alkylene glycol alkyl ether acetates such as propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate, and methoxypentyl acetate; and the like.
상기 방향족 탄화수소류 용제는 구체적으로 벤젠, 톨루엔, 크실렌, 메시틸렌 등을 들 수 있다. Examples of the aromatic hydrocarbon solvent include benzene, toluene, xylene, and mesitylene.
상기 케톤류 용제는 구체적으로 메틸에틸케톤, 아세톤, 메틸아밀케톤, 메틸이소부틸케톤, 시클로헥사논 등을 들 수 있다.Examples of the ketone solvent include methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone.
상기 알코올류 용제는 구체적으로 에탄올, 프로판올, 부탄올, 헥사놀, 시클로헥산올, 에틸렌글리콜, 글리세린 등을 들 수 있다.Examples of the alcohol solvent include ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, and glycerin.
상기 에스테르류 용제는 구체적으로 γ-부티롤락톤 등의 환상 에스테르류;Specifically, the ester solvents include cyclic esters such as γ-butyrolactone;
3-에톡시프로피온산에틸, 3-메톡시프로피온산메틸 등을 들 수 있다.3-ethoxy ethyl propionate, 3-methoxy methyl propionate, etc. are mentioned.
상기 아미드류 용제는 구체적으로 다이메틸포름아미드, 다이메틸아세트아미드 등을 들 수 있다.Specific examples of the amide solvent include dimethylformamide and dimethylacetamide.
상기 용제는, 도포성 및 건조성 측면에서 비점이 100 내지 200℃인 유기 용제가 보다 바람직할 수 있다. 더욱 바람직하게는 프로필렌글리콜모노에틸에테르아세테이트, 시클로헥사논, 에틸락테이트, 부틸락테이트, 3-에톡시프로피온산에틸 및 3-메톡시프로피온산메틸 등으로부터 선택되는 1종 이상을 이용할 수 있다.The solvent may be more preferably an organic solvent having a boiling point of 100 to 200° C. in terms of applicability and dryness. More preferably, at least one selected from propylene glycol monoethyl ether acetate, cyclohexanone, ethyl lactate, butyl lactate, ethyl 3-ethoxypropionate, and methyl 3-methoxypropionate may be used.
상기 용제는 본 발명의 착색 감광성 수지 조성물 총 중량에 대하여 60 내지 90 중량%로 포함되는 것이 바람직하며, 70 내지 85 중량%로 포함되는 것이 보다 바람직하다. 상기 용제의 함량이 상기한 기준으로 60 내지 90 중량% 이내의 범위인 경우, 롤 코터, 스핀 코터, 슬릿 앤드 스핀 코터, 슬릿 코터(다이 코터라고도 하는 경우가 있음), 잉크젯 등의 도포 장치로 도포했을 때 도포성이 양호해지는 효과를 제공할 수 있다.The solvent is preferably included in an amount of 60 to 90 wt%, more preferably 70 to 85 wt%, based on the total weight of the colored photosensitive resin composition of the present invention. When the content of the solvent is within the range of 60 to 90 wt% based on the above-mentioned criteria, the application is performed using a roll coater, a spin coater, a slit and spin coater, a slit coater (sometimes referred to as a die coater), or an inkjet coating device. When it does, the effect that applicability|paintability becomes favorable can be provided.
(G) 첨가제 (G) additives
본 발명의 착색 감광성 수지 조성물은 상기한 성분 위에 본 발명의 목적을 해치지 않는 범위에서 당업자의 필요에 따라 분산제, 산화방지제, 충진제, 다른 고분자 화합물, 경화제, 밀착 촉진제, 자외선 흡수제 및 응집 방지제 등의 첨가제로부터 선택되는 1종 이상의 첨가제를 더 포함하는 것도 가능하다. The colored photosensitive resin composition of the present invention may contain additives such as dispersants, antioxidants, fillers, other high molecular compounds, curing agents, adhesion promoters, ultraviolet absorbers, and anti-aggregation agents, according to the needs of those skilled in the art, in the range that does not impair the purpose of the present invention on the above components. It is also possible to further include one or more additives selected from.
상기 산화방지제의 구체적인 예로서 시판품으로는, 아데카사의 ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-80, ADK STAB 1178, ADK STAB TPP, ADK STAB 1500, ADK STAB 135A 및 ADK STAB 3010 등을 들 수 있다.As a specific example of the antioxidant, commercially available products include ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-80, ADK STAB 1178, ADK STAB from Adeka. TPP, ADK STAB 1500, ADK STAB 135A and ADK STAB 3010, and the like.
상기 충진제의 구체적인 예로는, 유리, 실리카 및 알루미나 등을 사용할 수 있으나 이에 한정되는 것은 아니다.As a specific example of the filler, glass, silica, alumina, etc. may be used, but the present invention is not limited thereto.
상기 다른 고분자 화합물의 구체적인 예로는, 에폭시 수지, 말레이미드 수지 등의 경화성 수지, 폴리비닐알코올, 폴리아크릴산, 폴리에틸렌글리콜 모노알킬에테르, 폴리플루오로알킬아크릴레이트, 폴리에스테르, 폴리우레탄 등의 열가소성 수지 등을 들 수 있으나, 이에 한정되는 것은 아니다.Specific examples of the other high molecular compound include a curable resin such as an epoxy resin and a maleimide resin, a thermoplastic resin such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ether, polyfluoroalkyl acrylate, polyester, polyurethane, etc. may be mentioned, but is not limited thereto.
상기 경화제는 심부 경화 및 기계적 강도 향상을 위해 사용되며, 구체적인 예로는, 에폭시 화합물, 다관능 이소시아네이트 화합물, 멜라민 화합물 및 옥세탄 화합물 등을 들 수 있으나, 이에 한정되는 것은 아니다.The curing agent is used for deep curing and mechanical strength improvement, and specific examples thereof include, but are not limited to, an epoxy compound, a polyfunctional isocyanate compound, a melamine compound, and an oxetane compound.
상기 에폭시 화합물은 구체적으로, 비스페놀 A계 에폭시 수지, 수소화 비스페놀 A계 에폭시 수지, 비스페놀 F계 에폭시 수지, 수소화 비스페놀 F계 에폭시 수지, 노블락형 에폭시 수지, 기타 방향족계 에폭시 수지, 지환족계 에폭시 수지, 글리시딜에스테르계 수지, 글리시딜아민계 수지, 또는 이러한 에폭시 수지의 브롬화 유도체, 에폭시 수지 및 그 브롬화 유도체 이외의 지방족, 지환족 또는 방향족 에폭시 화합물, 부타디엔 (공)중합체 에폭시화물, 이소프렌 (공)중합체 에폭시화물, 글리시딜(메타)아크릴레이트 (공)중합체, 트리글리시딜이소시아눌레이트 등을 사용할 수 있으나, 이에 한정되는 것은 아니다.Specifically, the epoxy compound is a bisphenol A-based epoxy resin, a hydrogenated bisphenol A-based epoxy resin, a bisphenol F-based epoxy resin, a hydrogenated bisphenol F-based epoxy resin, a novolak-type epoxy resin, other aromatic epoxy resins, alicyclic epoxy resins, gly Cidyl ester-based resins, glycidylamine-based resins, or brominated derivatives of these epoxy resins, aliphatic, alicyclic or aromatic epoxy compounds other than epoxy resins and brominated derivatives thereof, butadiene (co)polymer epoxide, isoprene (co) Polymer epoxide, glycidyl (meth) acrylate (co) polymer, triglycidyl isocyanurate, and the like may be used, but is not limited thereto.
상기 옥세탄 화합물은 구체적으로, 카르보네이트비스옥세탄, 크실렌비스옥세탄, 아디페이트비스옥세탄, 테레프탈레이트비스옥세탄, 시클로헥산 디카르복실산비스옥세탄 등을 사용할 수 있으나, 이에 한정되는 것은 아니다.Specifically, the oxetane compound may include carbonate bisoxetane, xylenebisoxetane, adipate bisoxetane, terephthalate bisoxetane, cyclohexanedicarboxylic acid bisoxetane, and the like, but is limited thereto. it is not
상기 경화제는 경화제와 함께 에폭시 화합물의 에폭시기, 옥세탄 화합물의 옥세탄 골격을 개환 중합하게 할 수 있는 경화 보조 화합물을 병용할 수 있다. 상기 경화 보조 화합물은 구체적으로, 다가 카르본산류, 다가 카르본산 무수물류, 산 발생제 등을 사용할 수 있다. 상기 카르본산 무수물류는 에폭시 수지 경화제로서 시판되는 것을 이용할 수 있다. 시판되는 상기 에폭시 수지 경화제로서는 예를 들면, 상품명(아데카하도나 EH-700)(아데카공업㈜ 제조), 상품명(리카싯도 HH)(신일본이화㈜ 제조), 상품명(MH-700)(신일본이화㈜ 제조) 등을 들 수 있다.The curing agent may be used in combination with a curing auxiliary compound capable of ring-opening polymerization of the epoxy group of the epoxy compound and the oxetane skeleton of the oxetane compound together with the curing agent. Specifically, as the curing auxiliary compound, polyhydric carboxylic acids, polyhydric carboxylic acid anhydrides, acid generators, and the like may be used. As the carboxylic acid anhydride, a commercially available epoxy resin curing agent may be used. The commercially available epoxy resin curing agent includes, for example, a trade name (Adecahadona EH-700) (manufactured by Adeka Industrial Co., Ltd.), a trade name (Rikasiddo HH) (manufactured by Shin-Nippon Ewha Co., Ltd.), trade name (MH-700) (manufactured by Nippon Ewha Co., Ltd.); and the like.
상기에서 예시한 경화제 및 경화 보조 화합물은 각각 단독으로 또는 2종 이상 혼합하여 이용할 수 있다.The curing agent and curing auxiliary compound exemplified above may be used alone or in combination of two or more.
상기 밀착 촉진제는 구체적으로, 비닐트리메톡시실란, 비닐트리에톡시실란, 비닐 트리스(2-메톡시에톡시)실란, N-(2-아미노에틸)-3-아미노프로필메틸디메톡시실란, N-(2-아미노에틸)-3-아미노프로필트리메톡시실란, 3-아미노프로필트리에톡시실란, 3-글리시독시프로필트리메톡시실란, 3-글리시독시프로필메틸디메톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리메톡시실란, 3-클로로프로필메틸디메톡시실란, 3-클로로프로필트리메톡시실란, 3-메타크릴옥시프로필트리메톡시실란, 3-머캅토 프로필트리메톡시실란, 3-이소시아네이트프로필트리메톡시실란 및 3-이소시아네이트프로필트리에톡시실란으로부터 선택되는 1종 이상을 사용할 수 있다. The adhesion promoter is specifically, vinyltrimethoxysilane, vinyltriethoxysilane, vinyl tris(2-methoxyethoxy)silane, N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane, N -(2-aminoethyl)-3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyltri At least one selected from methoxysilane, 3-isocyanatepropyltrimethoxysilane and 3-isocyanatepropyltriethoxysilane may be used.
상기 밀착 촉진제는 조성물 중의 고형분 총 중량에 대하여, 0.01 내지 10 중량%로 포함되는 것이 바람직하며, 보다 바람직하게는 0.05 내지 2 중량%로 포함될 수 있다.The adhesion promoter is preferably included in an amount of 0.01 to 10 wt%, more preferably 0.05 to 2 wt%, based on the total weight of the solid content in the composition.
상기 자외선 흡수제는 구체적으로, 2-(3-tert-부틸-2-히드록시-5-메틸페닐)-5-클로로벤조티리아졸, 알콕시벤조페논 등을 사용할 수 있으나, 이에 한정되는 것은 아니다.Specifically, the UV absorber may include, but is not limited to, 2-(3-tert-butyl-2-hydroxy-5-methylphenyl)-5-chlorobenzotyrazole, alkoxybenzophenone, and the like.
상기 응집 방지제는 구체적으로 폴리아크릴산 나트륨 등을 들 수 있으나, 이에 한정되는 것을 아니다. The aggregation inhibitor may specifically include, but is not limited to, sodium polyacrylate.
<컬러필터><Color filter>
본 발명의 다른 목적을 달성하기 위하여 본 발명은, 기판 상에 본 발명에 따른 착색 감광성 수지 조성물을 도포하고 소정의 패턴으로 노광 및 현상하여 형성되는 컬러층을 포함하여 이루어진 것을 특징으로 하는 컬러필터를 제공한다.In order to achieve another object of the present invention, the present invention provides a color filter comprising a color layer formed by applying the colored photosensitive resin composition according to the present invention on a substrate, and exposing and developing it in a predetermined pattern. to provide.
본 발명의 컬러필터는 기판 및 상기 기판 상에 본 발명의 착색 감광성 수지 조성물로 제조된 착색 패턴을 포함한다. 상기 기판은 투명한 재질로서, 컬러필터의 안정성을 위해 충분한 강도와 지지력을 갖는 소재를 사용할 수 있다. 바람직하게는 화학적 안정성이 우수하며, 강도가 높은 유리를 사용할 수 있다.The color filter of the present invention includes a substrate and a colored pattern made of the colored photosensitive resin composition of the present invention on the substrate. The substrate is a transparent material, and a material having sufficient strength and support for the stability of the color filter may be used. Preferably, a glass having excellent chemical stability and high strength may be used.
즉, 본 발명은 본 발명의 착색 감광성 수지 조성물로 제조된 착색 패턴을 포함하는 컬러필터를 제공하며, 상기 컬러필터의 제조 방법은 당해 분야에서 잘 알려진 통상적인 방법을 이용할 수 있다.That is, the present invention provides a color filter including a colored pattern made of the colored photosensitive resin composition of the present invention, and a conventional method well known in the art may be used for the method of manufacturing the color filter.
이하, 본 발명을 실시예를 이용하여 더욱 상세하게 설명한다. 그러나 하기 실시예는 본 발명을 예시하기 위한 것으로서 본 발명은 하기 실시예에 의해 한정되지 않으며, 본 발명의 범위 내에서 다양하게 수정 및 변경될 수 있다. 본 발명의 범위는 후술하는 특허청구범위의 기술적 사상에 의해 정해질 것이다.Hereinafter, the present invention will be described in more detail using examples. However, the following examples are intended to illustrate the present invention, and the present invention is not limited by the following examples, and may be variously modified and changed within the scope of the present invention. The scope of the present invention will be determined by the technical spirit of the claims to be described later.
<< 합성예Synthesis example > > 알칼리 가용성 수지의 합성Synthesis of alkali-soluble resin
교반기, 온도계 환류 냉각관, 적하 로트 및 질소 도입관을 구비한 플라스크에 프로필렌글리콜모노메틸에테르 아세테이트 120 중량부, 프로필렌글리콜모노메틸에테르 80 중량부, Azobisisobutyronitrile(AIBN) 2 중량부, 아크릴산 13.0 중량부, 벤질메타아크릴레이트 10 중량부, 4-메틸스티렌 57.0 중량부, 메틸메타아크릴레이트 20 중량부 n-도데실머캅토 3 중량부를 투입하고 질소 치환하였다. 그 후 교반하며 반응액의 온도를 110℃로 상승시키고 6시간 동안 반응하였다. 이렇게 합성된 알칼리 가용성 수지의 고형분 산가는 100.2 ㎎KOH/g 이었으며, GPC로 측정한 중량평균분자량 Mw은 약 15,110이었다.120 parts by weight of propylene glycol monomethyl ether acetate, 80 parts by weight of propylene glycol monomethyl ether, 2 parts by weight of Azobisisobutyronitrile (AIBN), 13.0 parts by weight of acrylic acid, 10 parts by weight of benzyl methacrylate, 57.0 parts by weight of 4-methylstyrene, 20 parts by weight of methyl methacrylate, and 3 parts by weight of n-dodecyl mercapto were added, followed by nitrogen substitution. Then, while stirring, the temperature of the reaction solution was raised to 110° C. and reacted for 6 hours. The alkali-soluble resin thus synthesized had a solid content acid value of 100.2 mgKOH/g, and a weight average molecular weight Mw measured by GPC of about 15,110.
<< 제조예production example >>
안료 분산조성물의 제조Preparation of pigment dispersion composition
<안료분산조성물 M1><Pigment dispersion composition M1>
포스포텅스텐산 및 몰리브덴산으로부터 선택되는 1종 이상의 불용화제와 결합된 착색제로서 C.I. Pigment Blue 14 12.0 중량부, 분산제로서 LPN-6919 (BYK사 제조) 6.0 중량부, 용제로서 프로필렌글리콜메틸에테르아세테이트 80.0 중량부를 비드밀에 의해 12시간 동안 혼합 및 분산하여 안료분산조성물 M1을 제조하였다.As a colorant combined with at least one insolubilizing agent selected from phosphotungstic acid and molybdic acid, C.I. Pigment Blue 14 12.0 parts by weight, LPN-6919 (manufactured by BYK) 6.0 parts by weight as a dispersant, and 80.0 parts by weight of propylene glycol methyl ether acetate as a solvent were mixed and dispersed for 12 hours by a bead mill to prepare a pigment dispersion composition M1.
<안료분산조성물 M2><Pigment dispersion composition M2>
착색제로서 C.I. Pigment Blue 15:6 12.0 중량부, 분산제로서 LPN-6919 (BYK사 제조) 6.0 중량부, 용제로서 프로필렌글리콜메틸에테르아세테이트 80.0 중량부를 비드밀에 의해 12시간 동안 혼합 및 분산하여 안료분산조성물 M2을 제조하였다.As a colorant, C.I. Pigment Blue 15:6 12.0 parts by weight, 6.0 parts by weight of LPN-6919 (manufactured by BYK) as a dispersant, and 80.0 parts by weight of propylene glycol methyl ether acetate as a solvent were mixed and dispersed by a bead mill for 12 hours to prepare a pigment dispersion composition M2 did
착색 감광성 수지 조성물의 제조Preparation of colored photosensitive resin composition
하기 실시예 1~2 및 비교예 1~5에 기재된 조성 및 함량으로 조합하여 착색 감광성 수지 조성물을 제조하였다.A colored photosensitive resin composition was prepared by combining the compositions and contents described in Examples 1 to 2 and Comparative Examples 1 to 5 below.
<< 실시예Example 1> 1>
상기 안료분산조성물 M1 25.00 중량부, 상기 합성예의 수지 13.36 중량부, 광중합성 화합물로서 KAYARAD DPHA(닛본가야꾸) 4.45 중량부, 실세스퀴옥산(Silsesquioxane)계 화합물로서 PSS-(3-Glycidyl)propoxy-Heptaisobutyl substituted (알드리치사) 0.27 중량부, 광중합 개시제로 PBG-327 (트론리사 제조) 1.34 중량부, 디아세톤알콜 17.00 중량부, 프로필렌글리콜모노메틸에테르아세테이트 38.58 중량부를 혼합하여 착색 감광성 수지 조성물을 제조하였다.25.00 parts by weight of the pigment dispersion composition M1, 13.36 parts by weight of the resin of the above synthesis example, 4.45 parts by weight of KAYARAD DPHA (Nippon Kayaku) as a photopolymerizable compound, PSS-(3-Glycidyl) propoxy as a silsesquioxane-based compound -Heptaisobutyl substituted (Aldrich) 0.27 parts by weight, PBG-327 (Tronly) 1.34 parts by weight as a photopolymerization initiator, 17.00 parts by weight of diacetone alcohol, and 38.58 parts by weight of propylene glycol monomethyl ether acetate were mixed to prepare a colored photosensitive resin composition did
<< 실시예Example 2> 2>
상기 안료분산조성물 M1 12.50 중량부, 상기 안료분산조성물 M2 12.50 중량부, 상기 합성예의 수지 13.36 중량부, 광중합성 화합물로서 KAYARAD DPHA(닛본가야꾸) 4.45 중량부, 실세스퀴옥산(Silsesquioxane)계 화합물로서 PSS-(3-Glycidyl)propoxy-Heptaisobutyl substituted (알드리치사) 0.27 중량부, 광중합 개시제로 PBG-327 (트론리사 제조) 1.34 중량부, 디아세톤알콜 17.00 중량부, 프로필렌글리콜모노메틸에테르아세테이트 38.58 중량부를 혼합하여 착색 감광성 수지 조성물을 제조하였다.12.50 parts by weight of the pigment dispersion M1, 12.50 parts by weight of the pigment dispersion M2, 13.36 parts by weight of the resin of the above synthesis example, 4.45 parts by weight of KAYARAD DPHA (Nippon Kayaku) as a photopolymerizable compound, silsesquioxane-based compound 0.27 parts by weight of PSS-(3-Glycidyl)propoxy-Heptaisobutyl substituted (Aldrich), 1.34 parts by weight of PBG-327 (manufactured by Tronly) as a photopolymerization initiator, 17.00 parts by weight of diacetone alcohol, 38.58 parts by weight of propylene glycol monomethyl ether acetate The parts were mixed to prepare a colored photosensitive resin composition.
<< 비교예comparative example 1> 1>
상기 안료분산조성물 M1 25.00부, 상기 합성예의 수지 13.36 중량부, 광중합성 화합물로서 KAYARAD DPHA(닛본가야꾸) 4.45 중량부, 광중합 개시제로 PBG-327 (트론리사 제조) 1.34 중량부, 디아세톤알코올 17.00 중량부, 프로필렌글리콜모노메틸에테르아세테이트 38.58 중량부를 혼합하여 착색 감광성 수지 조성물을 제조하였다.25.00 parts of the pigment dispersion composition M1, 13.36 parts by weight of the resin of the above synthesis example, 4.45 parts by weight of KAYARAD DPHA (Nippon Kayaku) as a photopolymerizable compound, 1.34 parts by weight of PBG-327 (manufactured by Tronly) as a photopolymerization initiator, 17.00 parts by weight of diacetone alcohol A colored photosensitive resin composition was prepared by mixing 38.58 parts by weight of propylene glycol monomethyl ether acetate by weight.
<< 비교예comparative example 2> 2>
상기 안료분산조성물 M1 12.50 중량부, 상기 안료분산 조성물 M2 12.50 중량부, 상기 합성예의 수지 13.36 중량부, 광중합성 화합물로서 KAYARAD DPHA(닛본가야꾸) 4.45 중량부, 개시제로 PBG-327 (트론리사 제조) 1.34 중량부, 디아세톤알코올 17.00 중량부, 프로필렌글리콜모노메틸에테르아세테이트 38.58 중량부를 혼합하여 착색 감광성 수지 조성물을 제조하였다.12.50 parts by weight of the pigment dispersion composition M1, 12.50 parts by weight of the pigment dispersion composition M2, 13.36 parts by weight of the resin of the above synthesis example, 4.45 parts by weight of KAYARAD DPHA (Nippon Kayaku) as a photopolymerizable compound, PBG-327 (manufactured by Tronly) as an initiator ) 1.34 parts by weight, 17.00 parts by weight of diacetone alcohol, and 38.58 parts by weight of propylene glycol monomethyl ether acetate were mixed to prepare a colored photosensitive resin composition.
<< 비교예comparative example 3> 3>
상기 안료분산조성물 M1 25.00 중량부, 상기 합성예의 수지 13.36 중량부, 광중합성 화합물로서 KAYARAD DPHA(닛본가야꾸) 4.45 중량부, 실세스퀴옥산(Silsesquioxane)계 화합물로서 PSS-(3-Glycidyl)propoxy-Heptaisobutyl substituted (알드리치사) 0.27 중량부, 광중합 개시제로 Irgacure® 369 (BASF사 제조) 1.34 중량부, 디아세톤알코올 17.00 중량부, 프로필렌글리콜모노메틸에테르아세테이트 38.58 중량부를 혼합하여 착색 감광성 수지 조성물을 제조하였다.25.00 parts by weight of the pigment dispersion composition M1, 13.36 parts by weight of the resin of the above synthesis example, 4.45 parts by weight of KAYARAD DPHA (Nippon Kayaku) as a photopolymerizable compound, PSS-(3-Glycidyl) propoxy as a silsesquioxane-based compound -Heptaisobutyl substituted (Aldrich) 0.27 parts by weight, 1.34 parts by weight of Irgacure® 369 (BASF) as a photopolymerization initiator, 17.00 parts by weight of diacetone alcohol, and 38.58 parts by weight of propylene glycol monomethyl ether acetate were mixed to prepare a colored photosensitive resin composition did
<< 비교예comparative example 4> 4>
상기 안료분산조성물 M1 12.50 중량부, 상기 안료분산조성물 M2 12.50 중량부, 상기 합성예의 수지 13.36 중량부, 광중합성 화합물로서 KAYARAD DPHA(닛본가야꾸) 4.45 중량부, 실세스퀴옥산(Silsesquioxane)계 화합물로서 PSS-(3-Glycidyl)propoxy-Heptaisobutyl substituted (알드리치사) 0.27 중량부, 광중합 개시제로 Irgacure® 369 (BASF사 제조) 1.34 중량부, 디아세톤알코올 17.00 중량부, 프로필렌글리콜모노메틸에테르아세테이트 38.58 중량부를 혼합하여 착색 감광성 수지 조성물을 제조하였다.12.50 parts by weight of the pigment dispersion M1, 12.50 parts by weight of the pigment dispersion M2, 13.36 parts by weight of the resin of the above synthesis example, 4.45 parts by weight of KAYARAD DPHA (Nippon Kayaku) as a photopolymerizable compound, silsesquioxane-based compound 0.27 parts by weight of PSS-(3-Glycidyl)propoxy-Heptaisobutyl substituted (Aldrich), 1.34 parts by weight of Irgacure® 369 (BASF) as a photopolymerization initiator, 17.00 parts by weight of diacetone alcohol, 38.58 parts by weight of propylene glycol monomethyl ether acetate The parts were mixed to prepare a colored photosensitive resin composition.
<< 비교예comparative example 5> 5>
상기 안료분산 조성물 M2 25.00 중량부, 상기 합성예의 수지 13.36 중량부, 광중합성 화합물로서 KAYARAD DPHA(닛본가야꾸) 4.45 중량부, 실세스퀴옥산(Silsesquioxane)계 화합물로서 PSS-(3-Glycidyl)propoxy-Heptaisobutyl substituted (알드리치사) 0.27 중량부, 광중합 개시제로 PBG-327 (트론리사 제조) 1.34 중량부, 디아세톤알코올 17.00 중량부, 프로필렌글리콜모노메틸에테르아세테이트 38.58 중량부를 혼합하여 착색 감광성 수지 조성물을 제조하였다.25.00 parts by weight of the pigment dispersion composition M2, 13.36 parts by weight of the resin of the above synthesis example, 4.45 parts by weight of KAYARAD DPHA (Nippon Kayaku) as a photopolymerizable compound, PSS-(3-Glycidyl) propoxy as a silsesquioxane-based compound -Heptaisobutyl substituted (Aldrich) 0.27 parts by weight, PBG-327 (Tronly) 1.34 parts by weight as a photopolymerization initiator, 17.00 parts by weight of diacetone alcohol, and 38.58 parts by weight of propylene glycol monomethyl ether acetate were mixed to prepare a colored photosensitive resin composition did
<< 실험예Experimental example >>
실험예Experimental example 1. 밀착성 평가 1. Adhesion evaluation
상기 실시예 1~2 및 비교예 1~5에서 제조된 착색 감광성 수지 조성물을 이용하여 컬러필터를 제조하였다.A color filter was prepared using the colored photosensitive resin composition prepared in Examples 1 to 2 and Comparative Examples 1 to 5.
구체적으로, 상기 각각의 착색 감광성 수지 조성물을 스핀 코팅법으로 2인치각의 유리 기판(코닝사 제조, 「EAGLE XG」) 위에 도포한 다음, 가열판 위에 놓고 100℃의 온도에서 3분간 유지하여 박막을 형성시켰다. 이어서 상기 박막 위에 1 ㎛ 내지 100 ㎛의 라인/스페이스 패턴을 갖는 시험 포토마스크를 올려놓고, 시험 포토마스크와의 간격을 300 ㎛로 하여 자외선을 조사하였다. 이때, 자외선 광원은 g, h, i 선을 모두 함유하는 1KW의 고압 수은등을 사용하여 50 mJ/cm2 로 조사하였으며, 특별한 광학 필터는 사용하지 않았다. 상기 자외선이 조사된 박막을 pH 10.5의 KOH 수용액 현상 용액에 2분 동안 담궈 현상하였다. 상기 박막이 도포된 유리판을 증류수를 사용하여 세척한 다음, 질소 가스를 불어서 건조하고, 230℃의 가열 오븐에서 25분간 가열하여 컬러필터를 제조하였다. Specifically, each of the colored photosensitive resin compositions was coated on a 2-inch square glass substrate ("EAGLE XG", manufactured by Corning) by spin coating, placed on a heating plate, and maintained at a temperature of 100° C. for 3 minutes to form a thin film made it Then, a test photomask having a line/space pattern of 1 µm to 100 µm was placed on the thin film, and ultraviolet rays were irradiated with an interval of 300 µm from the test photomask. At this time, the UV light source was irradiated at 50 mJ/cm 2 using a 1KW high-pressure mercury lamp containing all of the g, h, and i lines, and no special optical filter was used. The thin film irradiated with ultraviolet light was developed by immersing it in a developing solution of a KOH aqueous solution having a pH of 10.5 for 2 minutes. The glass plate coated with the thin film was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 230° C. for 25 minutes to prepare a color filter.
이때, 생성된 패턴을 광학현미경을 이용하여 아래와 같은 패턴상의 뜯김 정도를 평가하였고, 그 결과를 하기 표 1에 나타내었다.At this time, the generated pattern was evaluated for tearing on the pattern as follows using an optical microscope, and the results are shown in Table 1 below.
<밀착성 평가 기준><Adhesiveness evaluation criteria>
○: 패턴상 뜯김 없음 ○: No tearing in pattern
△: 패턴상 뜯김 1~4개△: 1-4 pieces torn in pattern
×: 패턴상 뜯김 5개 이상×: 5 or more torn patterns
실험예Experimental example 2. 투과율 평가 2. Transmittance evaluation
시험 포토마스크를 사용하지 않은 것을 제외하고, 상기 실험예 1과 동일한 방법으로 컬러필터를 제조하여 색도계(올림푸스사 제조, OSP-200)를 이용하여 투과율을 측정하였다. 그 결과를 하기 표 1에 기재하였다. Except that the test photomask was not used, a color filter was prepared in the same manner as in Experimental Example 1, and transmittance was measured using a colorimeter (manufactured by Olympus, OSP-200). The results are shown in Table 1 below.
실험예Experimental example 3. 3. 내용제성solvent resistance 평가 evaluation
상기 실험예 2와 동일하게 기판을 제작하여 색도와 투과율이 측정 완료된 기판의 색좌표를 색도계(올림푸스사 제조, OSP-200)로 측정하였다. 색좌표 측정이 완료된 기판을 90℃의 N-메틸피롤리돈에 2분간 침지하였다. 기판을 꺼낸 후, 증류수로 세척하여 색도를 재측정하고 N-메틸피롤리돈 침지 전후의 색차를 ΔE*ab로 산출하였고, 하기 기준으로 평가하였다.A substrate was prepared in the same manner as in Experimental Example 2, and the color coordinates of the substrate, whose chromaticity and transmittance were measured, were measured with a colorimeter (manufactured by Olympus, OSP-200). The substrate on which the color coordinate measurement was completed was immersed in N-methylpyrrolidone at 90° C. for 2 minutes. After taking out the substrate, it was washed with distilled water to measure the chromaticity again, and the color difference before and after immersion in N-methylpyrrolidone was calculated as ΔE*ab, and evaluated according to the following criteria.
<수학식 1><Equation 1>
<평가기준><Evaluation criteria>
○: ΔE*ab가 3.0 이하○: ΔE*ab is 3.0 or less
△: ΔE*ab가 3.0 초과 내지 5.0 이하Δ: ΔE*ab greater than 3.0 to 5.0 or less
Ⅹ: ΔE*ab가 5.0 초과X: ΔE*ab greater than 5.0
상기 표 1의 결과를 통해 알 수 있듯이, 본 발명의 조성물에 해당하는 실시예 1~2의 조성물은 투과율, 내용제성 등의 신뢰성 및 밀착성 평가에서 모두 우수한 결과를 나타내었다.As can be seen from the results in Table 1, the compositions of Examples 1 and 2 corresponding to the compositions of the present invention showed excellent results in reliability and adhesion evaluation such as transmittance and solvent resistance.
반면, 비교예 1~5의 경우 상기한 평가 중 하나 이상에서 불량한 결과를 나타내었다. On the other hand, Comparative Examples 1 to 5 showed poor results in one or more of the above evaluations.
상세하게는 실세스퀴옥산계 화합물을 포함하지 않는 비교예 1~2는 내용제성 평가 결과가 모두 불량하였다. 옥심에스테르계 광중합 개시제를 포함하지 않는 비교예 3~4의 경우, 내용제성 및 밀착성 평가가 불량하였다. In detail, Comparative Examples 1 and 2 not including the silsesquioxane-based compound had poor solvent resistance evaluation results. In the case of Comparative Examples 3 to 4 not containing the oxime ester-based photopolymerization initiator, the evaluation of solvent resistance and adhesion was poor.
또한, 포스포텅스텐산 및 몰리브덴산으로부터 선택되는 1종 이상의 불용화제와 결합된 안료 또는 염료를 포함하지 않는 비교예 5의 경우, 투과율이 불량한 결과를 나타내었다.In addition, in the case of Comparative Example 5, which did not include a pigment or dye combined with at least one insolubilizing agent selected from phosphotungstic acid and molybdic acid, the transmittance was poor.
Claims (8)
상기 착색제는 포스포텅스텐산 및 몰리브덴산으로부터 선택되는 1종 이상의 불용화제와 결합된 안료 또는 염료를 포함하고,
상기 광중합 개시제는 옥심에스테르계 광중합 개시제를 포함하는 것을 특징으로 하는 착색 감광성 수지 조성물:
<화학식 1>
상기 화학식 1에서 R1 및 R2는 각각 독립적으로 하기 화학식 1-1 내지 화학식 1-12 및 화학식 1-14 내지 화학식 1-17로부터 선택되는 1종 이상의 기(group)이다.
A colorant, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, a silsesquioxane-based compound represented by the following formula (1) and a solvent,
the colorant comprises a pigment or dye combined with at least one insolubilizing agent selected from phosphotungstic acid and molybdic acid;
The photopolymerization initiator is a colored photosensitive resin composition comprising an oxime ester-based photopolymerization initiator:
<Formula 1>
In Formula 1, R 1 and R 2 are each independently one or more groups selected from Formulas 1-1 to 1-12 and Formulas 1-14 to 1-17.
조성물 중의 고형분 총 중량에 대하여,
상기 포스포텅스텐산 및 몰리브덴산으로부터 선택되는 1종 이상의 불용화제와 결합된 안료 또는 염료는 5 내지 40 중량%로 포함되는 것을 특징으로 하는 착색 감광성 수지 조성물.The method according to claim 1,
with respect to the total weight of solids in the composition,
The pigment or dye combined with at least one insolubilizing agent selected from phosphotungstic acid and molybdic acid is contained in an amount of 5 to 40% by weight of the colored photosensitive resin composition.
상기 옥심에스테르계 광중합 개시제는 광중합 개시제 총 중량에 대하여 10 내지 100 중량%로 포함되는 것을 특징으로 하는 착색 감광성 수지 조성물.The method according to claim 1,
The oxime ester-based photopolymerization initiator is a colored photosensitive resin composition, characterized in that it is included in an amount of 10 to 100% by weight based on the total weight of the photopolymerization initiator.
조성물 중의 고형분 총 중량에 대하여
상기 화학식 1의 실세스퀴옥산계 화합물은 1 내지 10 중량% 미만으로 포함되는 것을 특징으로 하는 착색 감광성 수지 조성물. The method according to claim 1,
with respect to the total weight of solids in the composition
The colored photosensitive resin composition, characterized in that the silsesquioxane-based compound of Formula 1 is included in an amount of 1 to less than 10 wt%.
분산제, 산화방지제, 충진제, 다른 고분자 화합물, 경화제, 밀착 촉진제, 자외선 흡수제 및 응집 방지제로부터 선택되는 1종 이상의 첨가제를 더 포함하는 것을 특징으로 하는 착색 감광성 수지 조성물.The method according to claim 1,
Colored photosensitive resin composition, characterized in that it further comprises one or more additives selected from dispersants, antioxidants, fillers, other high molecular compounds, curing agents, adhesion promoters, ultraviolet absorbers and anti-aggregation agents.
조성물 중의 고형분 총 중량에 대하여
착색제 5 내지 50 중량%, 알칼리 가용성 수지 10 내지 80 중량%, 광중합성 화합물 5 내지 45 중량% 및 광중합 개시제 5 내지 40 중량%를 포함하며;
조성물 총 중량에 대하여 용제 60 내지 90 중량%를 포함하는 것을 특징으로 하는 착색 감광성 수지 조성물.The method according to claim 1,
with respect to the total weight of solids in the composition
5 to 50% by weight of a colorant, 10 to 80% by weight of an alkali-soluble resin, 5 to 45% by weight of a photopolymerizable compound, and 5 to 40% by weight of a photoinitiator includes;
A colored photosensitive resin composition comprising 60 to 90 wt% of a solvent based on the total weight of the composition.
A color filter manufactured using the colored photosensitive resin composition of claim 1.
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