KR102335254B1 - A low-reflection film - Google Patents

Abstract

The present application relates to an optical film having low reflection properties. The film may include a substrate layer; wet coating layer; deposition layer; and a SiNx layer positioned between the wet coating layer and the deposition layer, wherein the deposition layer includes a low refractive index layer, a medium refractive index layer, and a high refractive index layer.

Description

A low-reflection film

This application relates to an optical film. Specifically, the present application relates to an optical film having low reflection properties.

The low-reflection optical film includes a low-reflection function imparting layer on a light-transmitting base layer. In this case, the low reflection function imparting layer may be formed by vacuum deposition or a wet coating method. In general, a film manufactured by a wet coating method is less durable than a film manufactured by a vapor deposition method, and the uniformity of reflectivity is also poor.

Even when a deposition method is used for manufacturing a low-reflection film, wet coating may be performed between the substrate and the deposition layer in order to secure flatness of the substrate and/or to secure adhesion between the substrate and the deposition layer. At this time, since the layer formed from the wet coating (hereinafter, the wet coating layer) is exposed to the deposition process for forming the deposition layer, it must have resistance to the deposition process. For example, the wet coating layer should have out-gassing properties and plasma resistance in relation to the deposition process. When the wet coating layer does not have the above properties, it is difficult to secure mechanical durability and weather resistance of the film as well as low reflection properties. Meanwhile, even when deposition is performed after forming the wet coating layer on the substrate as described above, damage to the wet coating layer may occur due to oxygen ions generated under deposition conditions.

An object of the present application is to provide an optical film having excellent low reflection properties.

Another object of the present application is to provide an optical film having excellent mechanical durability and weather resistance.

Another object of the present application is to provide an optical film having moisture barrier properties.

The above and other objects of the present application can all be solved by the present application described in detail below.

In an example related to the present application, the present application relates to an optical film having low reflection properties (hereinafter referred to as a low reflection film).

The low reflection film of the present application has a multilayer structure. Specifically, the low-reflection film sequentially includes a base layer, a wet coating layer, and a deposition layer. In addition, the low reflection film includes a SiNx layer positioned between the wet coating layer and the deposition layer in order to prevent damage to the wet coating layer and provide moisture barrier properties to the film when the deposition layer is formed. That is, the low reflection film of the present application sequentially includes a base layer, a wet coating layer, a SiNx layer, and a deposition layer. In this case, a separate layer may exist between the adjacent layer configurations, or the low-reflective film may be configured in a state in which adjacent layers directly contact each other on one surface.

In the present application, "wet coating" is a term used to distinguish it from a so-called dry method such as vapor deposition in forming a layer, and the wet coating layer means a layer formed through, for example, application to a coating composition and curing process. can

In the low reflection film including the base layer, the wet coating layer, the SiNx layer, and the deposition layer, the deposition layer sequentially includes at least three layers having different refractive indices. Specifically, the deposition layer includes a first layer, a second layer and a third layer in an order close to the wet coating layer. In addition, each configuration of the deposition layer satisfies the following relation with respect to refractive index.

[Relational Expression]

n2 > n1 > n3

In the above relation, n1 is the refractive index of the first layer, n2 is the refractive index of the second layer, n3 is the refractive index of the third layer, and n1, n2 and n3 have refractive indices within the range of 1 to 2.5.

That is, the low reflection film of the present application includes a base layer, a wet coating layer, a medium refractive layer, a high refractive index layer, and a low refractive index layer when the properties of the deposition layer are distinguished based on the refractive index. In the case of having the above-described laminated configuration, in particular, when having the above-described deposition layer configuration, it is advantageous to secure a low-reflection function.

The low-reflection film of the laminated configuration has excellent barrier properties against moisture. For example, the low-reflective film may have a water vapor transmission rate (WVTR) of about 0.01 g/m ² ·day or less, measured at a temperature of 38° C. and a relative humidity of 100% for 72 hours. In one example, the upper limit of the moisture permeability is, for example, 0.009 g/m ² ·day or less, 0.008 g/m ² ·day or less, 0.007 g/m ² ·day or less, 0.006 g/m ² ·day or less , 0.005 g/m ² ·day or less or 0.004 g/m ² ·day or less. The lower limit of the moisture permeability is not particularly limited, but may be, for example, 0.0001 g/m ² ·day or more or 0.001 g/m ² ·day or more. The moisture permeability may be measured according to a method known in the art, for example, ISO15506-3.

In one example, the low reflection film of the present application may have a reflectivity of less than 0.3% in a visible light region of a wavelength band of 380 nm to 780 nm. Specifically, the low reflection film may have a reflectivity of less than 0.3% with respect to light having a wavelength of 500 to 650 nm. That is, the reflectivity for all wavelengths within the above range may be less than 0.3%. Specifically, the film of the present application has a reflectivity of 0.29% or less, 0.28% or less, 0.27% or less, 0.26% or less, 0.25% or less, 0.24% or less, 0.23% or less, 0.22% or less, 0.21% or less within the wavelength range. or less, 0.20% or less, 0.19% or less, 0.18% or less, 0.17% or less, 0.16% or less, 0.15% or less, 0.14% or less, 0.13% or less, 0.12% or less, 0.11% or less, or 0.10% or less. The lower limit is not particularly limited, but may be, for example, 0.05%.

In one example, the reflectivity for the 580 nm wavelength of the low reflection film is less than 0.3%, less than 0.29%, less than 0.28%, less than 0.27%, less than 0.26%, less than 0.25%, less than 0.24%, less than 0.23%, less than 0.22 % or less, 0.21% or less, 0.20% or less, 0.19% or less, 0.18% or less, 0.17% or less, 0.16% or less, 0.15% or less, 0.14% or less, 0.13% or less, 0.12% or less, 0.11% or less, or 0.10% or less can The lower limit is not particularly limited, but may be, for example, 0.05%. In the standard for product evaluation, the average reflectivity to visible light of the low-reflection film means the value obtained by multiplying the reflectivity measured at each wavelength by the weighting factor at each wavelength and adding it all. The reflectivity is also increased. However, unlike the prior art, the low reflection film of the present application has a low reflectivity near 580 nm to the level described above, and thus can provide a low average reflectivity for the entire visible light region.

Hereinafter, a specific configuration of the reflective film of the present application will be described in more detail.

base layer

The base layer is a configuration having a support function for the deposition layer that imparts a low-reflection function to the laminate.

The base layer may have transparency or light-transmitting properties. Unless otherwise defined, in this application, "transparent" in relation to the properties of the film (or layer) means a case in which the transmittance for visible light is 80% or more, 85% or more, 90% or more, or 95% or more. can

As long as it has the above-described transparency or light-transmitting properties, the components constituting the base layer are not particularly limited. For example, the base layer may include glass or a polymer resin component. In one example, the base layer may have flexible properties. Although there may be a difference in the degree depending on the thickness, when the base layer includes a polymer resin component rather than a glass component, it may be advantageous to secure flexible properties.

In one example, the base layer is an acrylic film, such as a PC (Polycarbonate) film, a PEN (poly(ethylene naphthalate)) film, a PET (poly(ethylene terephthalate)) a PMMA (poly(methyl methacrylate)) film, or a polyamide (PA) film. ) film, PI(polyimide) film, PVC(poly(vinyl chloride)) film, PS(polystyrene) film, PES(poly(ethersulfone)) film, PEI(poly(ether imide)) film, PE(polyethylene) film, It may include a polypropylene (PP) film, a cyclo-olefin polymer (COP) film, a tri-acetyl-cellulose (TAC) film, or a cycloolefin copolymer (COC) film, but is not limited thereto.

In another example, the base layer may have a configuration in which two or more components are laminated among the films listed above.

Since the refractive index of the substrate layer does not significantly affect the low reflection properties of the low reflection film, the refractive index of the substrate layer is not particularly limited. For example, it may be appropriately selected within the range of 1 to 2.5.

The thickness of the base layer is not particularly limited. For example, the base layer may have a thickness in the range of 10 to 250 ㎛. Specifically, the base layer has a thickness of 20 μm or more, 30 μm or more, 40 μm or more, 50 μm or more, 60 μm or more, or 70 μm or more, and 200 μm or less, 180 μm or less, 160 μm or less, 140 μm or less , may have a thickness of 120 μm or less or 100 μm or less. When having a thickness within the above range, the base layer can secure an appropriate strength as a support, and in some cases, an appropriate level of flexible characteristics.

In one example, the substrate layer may be surface-treated. For example, sputtering, corona discharge, ultraviolet irradiation, acid/base treatment, primer treatment, etc. may be performed on the base layer. Through this surface treatment, the adhesion of the base layer to the adjacent layer can be improved.

wet coating layer

The wet coating layer is located between the substrate layer serving as a support and the deposition layer that provides a low reflection function, and not only improves adhesion between the substrate layer and the deposition layer, but also has deposition resistance, so a deposition layer for imparting low reflection It is a configuration that can prevent deterioration of the film despite the formation process.

The wet coating layer may be formed from a composition including an organic component and an inorganic component. In this case, the inorganic component means inorganic particles. And, the organic component is a component excluding inorganic particles, and means a component capable of forming a matrix in which the inorganic particles can be dispersed through curing.

Specifically, the composition used to form the wet coating layer may include inorganic particles (inorganic filler). The kind of particles is not particularly limited. For example, the particles may be clay, talc, alumina, calcium carbonate, zirconia and/or silica particles. In one example, the particles may be used as colloidal particles dispersed in an organic solvent (eg MEK). When the wet coating layer includes inorganic particles, hardness and deposition resistance of the wet coating layer may be improved.

In one example, the particles included in the wet coating layer may have a diameter (particle diameter) within the range of 0.01 to 1 μm. More specifically, the particles may have an average particle diameter measured by a D50 particle size analyzer in the range of 5 to 100 nm or 8 to 40 nm.

In addition, in the present application, the wet coating layer of the low reflection film includes a predetermined amount of inorganic particles. Specifically, based on the solid content, the wet coating layer includes inorganic particles in the range of 20 to 65 parts by weight. In the present application, "solid content" may mean, for example, a non-volatile component remaining when a composition (coating solution) used to form a wet coating layer is applied and then heat-dried. That is, it may mean the remaining components excluding the solvent among the composition components. The content ratio of the inorganic particles, ie, parts by weight, refers to the weight ratio of the inorganic particles to 100 parts by weight of the total solid content of the wet coating layer composition. For example, the wet coating layer may include 35 to 80 parts by weight of components excluding inorganic particles based on the solid content. More specifically, the wet coating layer may include 25 parts by weight or more, 30 parts by weight or more, 40 parts by weight or more, 45 parts by weight or more, or 50 parts by weight or more of inorganic particles. Although not particularly limited, the upper limit of the content of the inorganic particles may be, for example, 60 parts by weight or less or 55 parts by weight or less. The wet coating layer including the inorganic particles in the above content range may provide excellent hardness, weather resistance and deposition resistance to the low-reflection film.

In particular, since the wet coating layer including the inorganic particles within the above-described range has a very good adhesion degree with the first layer of the configuration described below, it is possible to provide excellent weather resistance to the low-reflection film.

In one example, the wet coating layer may be formed from, for example, a photocurable type composition. As used herein, the term “photocurable composition” refers to a composition in which a curing process is induced by light irradiation, that is, irradiation with electromagnetic waves. In this case, the electromagnetic waves are microwaves, infrared (IR), ultraviolet (UV), X-rays, γ-rays or α-particle beams, proton beams, Neutron beams, and It is used as a generic term for a particle beam such as an electron beam.

When the wet coating layer is formed from a photocurable composition, the composition may include, as an organic component, a compound having a functional group capable of polymerization and/or crosslinking by radical reaction. For example, the composition may include a photocurable oligomer, and thus the cured product or wet coating layer of the composition may include the photocurable oligomer and/or other components in a cured state.

As the photocurable oligomer, an oligomer component used for preparing a photocurable (eg, UV curable) composition in the art may be used without limitation. For example, the oligomer may include a urethane acrylate in which a polyisocyanate having two or more isocyanate groups in a molecule and a hydroxyalkyl (meth)acrylate are reacted; ester-based acrylate obtained by dehydration condensation reaction of polyester polyol and (meth)acrylic acid; an ester-based urethane acrylate obtained by reacting an ester-based urethane resin obtained by reacting a polyester polyol and a polyisocyanate with a hydroxyalkyl acrylate; ether-based acrylates such as polyalkylene glycol di(meth)acrylate; an ether-based urethane acrylate obtained by reacting an ether-based urethane resin obtained by reacting a polyether polyol and a polyisocyanate with a hydroxyalkyl (meth)acrylate; Or it may be an epoxy acrylate obtained by addition reaction of an epoxy resin and (meth)acrylic acid, but is not limited to those listed above.

In one example, the wet coating layer may include urethane acrylate as a photocurable oligomer. More specifically, the wet coating layer may include an aliphatic urethane acrylate or an aromatic urethane acrylate. In this case, the term aliphatic may be used to be distinguished from aromatic, and may be used in a sense including an acyclic aliphatic unit and an aliphatic ring unit. For example, the aliphatic unit included in the aliphatic urethane acrylate may be a C1 to C30 aliphatic compound unit, and when the aliphatic is an aliphatic ring unit, it may be a C3 to C20 aliphatic compound unit. In addition, the aromatic unit included in the aromatic urethane acrylate may be a C6 to C40 aromatic compound unit. A method of forming the urethane acrylate is not particularly limited. For example, as the aliphatic urethane acrylate, a reactant of a mixture comprising an aliphatic polyisocyanate, an aliphatic polyol and a hydroxyalkyl (meth)acrylate may be used. In this case, the ratio between each component may be appropriately adjusted within a range that does not impair the purpose of the present application.

Considering that the first layer is formed by vapor deposition after the wet coating layer is formed, it may be preferable to use an aromatic urethane acrylate having better deposition resistance.

In one example, in order to secure adequate curability and provide durability to the wet coating layer, the urethane acrylate may have two or more radically polymerizable functional groups such as (meth)acryloyl groups. The upper limit of the number of functional groups is not particularly limited, but may be, for example, 8 or less or 6 or less.

In the present application, the wet coating layer or the composition thereof may further include a thiol group-containing compound (hereinafter referred to as a thiol compound). The thiol group-containing compound may be a compound including two or more thiol (-SH) groups in the same molecule. A thiol group of the thiol compound may react with a radical of the photocurable compound activated by an initiator, and a radical of another thiol group in the compound may react with another photocurable compound through a chain transfer reaction. As a result, the wet coating layer may have a sufficient crosslinking density and an increased degree of surface hardening, and thus a wet coating layer having excellent durability may be provided. Although not particularly limited, the thiol group of the thiol group-containing compound may be 6 or less.

The thiol group can suppress inhibition of curing reaction by oxygen. For example, during photocuring, radicals and oxygen (O ₂ ) react to generate -OO·, but -OO· has low reactivity, which may inhibit the curing reaction. By the way, the thiol group (-SH) reacts with -OO· to form a -S radical (-OO· + R-SH → RS· + -OOH), and the -S· radical is, for example, urethane acryl The reaction with the acrylate group in the rate can be continued. As a result, the thiol group-containing compound suppresses the inhibition of the curing reaction by oxygen and reacts with the reactive group of the photocurable compound to provide -SCC=O-. As a result, durability of the wet coating layer may be improved through a sufficient curing reaction, and adhesion of the wet cured layer to the adjacent substrate layer and the first layer may be improved.

In addition, since the thiol compound suppresses inhibition of radical reaction by oxygen as described above, a wet coating layer having improved durability and deposition resistance is provided, and a deposition layer can be stably formed on the wet coating layer. As a result, the low reflection function of the optical film can be stably implemented.

In one example, the thiol compound may be a secondary or tertiary thiol compound. The primary type thiol compound may have poor process stability due to a short pot life due to excessively high activation.

In one example, the thiol compound may be represented by Formula 1 below.

[Formula 1]

However, in Formula 1, R1 is hydrogen or a substituted or unsubstituted C1-C10 alkyl group, R2 is a substituted or unsubstituted C1-C10 alkylene group, and R3 is a substituted or unsubstituted C1-C10 alkyl group. 10 is an alkylene group, and n is a number between 2 and 10.

In one example, R1 may be hydrogen. In another example, R1 is a substituted or unsubstituted alkyl group having 1 to 9, 1 to 8, 1 to 7, 1 to 6, 1 to 5, 1 to 4, 1 to 3, or 1 to 2 carbon atoms. can be

In one example, R2 is substituted or unsubstituted having 1 to 10, 1 to 9, 1 to 8, 1 to 7, 1 to 6, 1 to 5, 1 to 4, 1 to 3, or 1 to 2 carbon atoms. It may be an alkylene group.

In one example, R3 is substituted or unsubstituted having 1 to 10, 1 to 9, 1 to 8, 1 to 7, 1 to 6, 1 to 5, 1 to 4, 1 to 3, or 1 to 2 carbon atoms. It may be an alkylene group.

With respect to Formula 1, the substitution of an alkyl group and/or an alkylene group means that hydrogen contained in the alkyl group or the alkylene group is substituted with an alkyl group having 1 to 5 carbon atoms, an aryl group having 6 to 10 carbon atoms, halogen, a hydroxyl group or an amino group. could mean that

In one example, the composition for forming a wet coating layer may further include a polyfunctional acrylate. Examples of the polyfunctional acrylate include 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, neopentylglycol di(meth)acrylate, polyethylene Glycol di (meth) acrylate, neopentylglycol adipate di (meth) acrylate, hydroxyl puivalic acid neopentyl glycol di (meth) acrylate, dicyclopentanyl di (meth)acrylate, caprolactone-modified dicyclopentenyl di(meth)acrylate, ethylene oxide-modified di(meth)acrylate, di(meth)acryloxyethyl isocyanurate, allylated cyclohexyl Di (meth) acrylate, tricyclodecane dimethanol (meth) acrylate, dimethylol dicyclopentane di (meth) acrylate, ethylene oxide-modified hexahydrophthalic acid di (meth) acrylate, tricyclodecane dimethanol ( Meth) acrylate, neopentyl glycol-modified trimethylpropane di(meth)acrylate, adamantane di(meth)acrylate, or 9,9-bis[4-(2-acryloyloxyethoxy)phenyl ] a bifunctional acrylate such as fluorine; Trimethylolpropane tri(meth)acrylate, dipentaerythritol tri(meth)acrylate, propionic acid modified dipentaerythritol tri(meth)acrylate, pentaerythritol tri(meth)acrylate, propylene oxide trifunctional acrylates such as modified trimethylolpropane tri(meth)acrylate, trifunctional urethane (meth)acrylate, or tris(meth)acryloxyethyl isocyanurate; tetrafunctional acrylates such as diglycerin tetra(meth)acrylate or pentaerythritol tetra(meth)acrylate; pentafunctional acrylates such as propionic acid-modified dipentaerythritol penta(meth)acrylate; And dipentaerythritol hexa (meth) acrylate, caprolactone-modified dipentaerythritol hexa (meth) acrylate or urethane (meth) acrylate (ex. isocyanate monomer and trimethylolpropane tri (meth) acrylate of A hexafunctional acrylate such as a reactant may be used, but the present invention is not limited thereto.

In one example, the wet coating layer comprises, based on 100 parts by weight of the solid content (in the composition), the above-described organic components (eg, a photocurable compound, a thiol group-containing compound, a polyfunctional acrylate, and/or an initiator described below). may be included in a content range of 35 parts by weight to 80 parts by weight. Specifically, the lower limit of the content may be 40 parts by weight or more, 45 parts by weight or more, 50 parts by weight or more, 55 parts by weight or more, 60 parts by weight or more, or 65 parts by weight or more. Although not particularly limited, the upper limit of the content of the organic component may be, for example, 75 parts by weight or less, or 60 parts by weight or less.

In one example, the wet coating layer may include 5 to 40 parts by weight of the thiol compound relative to 100 parts by weight of the photocurable compound based on the solid content (in the composition). When the above range is satisfied, appropriate hardness and deposition resistance may be provided to the wet coating layer by the above mechanism.

The wet coating layer forming composition may further include an initiator. For example, a photoinitiator capable of initiating a polymerization reaction through light irradiation or the like may be used. The type of the initiator is not particularly limited, and any known initiator may be used. For example, alpha-hydroxyketone compounds (ex. IRGACURE 184, IRGACURE 500, IRGACURE 2959, DAROCUR 1173; Ciba Specialty Chemicals (manufactured by); phenylglyoxylate-based compounds (ex. IRGACURE 754, DAROCUR MBF; Ciba Specialty Chemicals (manufactured by Ciba Specialty Chemicals)); benzyl dimethyl ketal compounds (ex. IRGACURE 651; Ciba Specialty Chemicals (manufactured)); a-aminoketone-based compounds (ex. IRGACURE 369, IRGACURE 907, IRGACURE 1300; Ciba Specialty Chemicals (manufactured by)); monoacylphosphine-based compound (MAPO) (ex. DAROCUR TPO; Ciba Specialty Chemicals (manufactured by Ciba Specialty Chemicals)); bisacylphosphene compound (BAPO) (ex. IRGACURE 819, IRGACURE 819DW; Ciba Specialty Chemicals (manufactured by)); phosphine oxide compounds (ex. IRGACURE 2100; Ciba Specialty Chemicals (manufactured)); metallocene compounds (ex. IRGACURE 784; Ciba Specialty Chemicals (manufactured)); iodonium salt (ex. IRGACURE 250; Ciba Specialty Chemicals (manufactured by)); and mixtures of one or more of the above (ex. DAROCUR 4265, IRGACURE 2022, IRGACURE 1300, IRGACURE 2005, IRGACURE 2010, IRGACURE 2020; Ciba Specialty Chemicals (manufactured by)) and the like may be used. And one or more than one of the above may be used, but the present invention is not limited thereto.

In one example, the wet coating layer may include 10 parts by weight or less of the photoinitiator based on 100 parts by weight of the solid content of the composition. Specifically, the wet coating layer contains 10 parts by weight or less, 9 parts by weight or less, 8 parts by weight or less, 7 parts by weight or less, 6 parts by weight or less, or 5 parts by weight or less of the photoinitiator based on 100 parts by weight of the solid content in the cured layer. may include The lower limit of the content is not particularly limited, but may be, for example, 0.1 parts by weight or more or 0.5 parts by weight or more.

The thickness of the wet coating layer is not particularly limited. For example, the wet coating layer may have a thickness in the range of 0.5 μm to 50 μm.

Since the refractive index of the wet coating layer does not significantly affect the low reflection properties of the low reflection film, the refractive index of the wet coating layer is not particularly limited. For example, it may be appropriately selected within the range of 1 to 2.5.

SiNx layer

Even when the wet coating layer is positioned between the base layer and the deposition layer imparting low reflective properties, the wet coating layer may be damaged by oxygen ions generated under deposition conditions for forming the deposition layer. In consideration of this point, the film of the present application may further include a so-called buffer layer. In this application, SiNx is used as the buffer racer.

On the other hand, when the buffer layer is introduced as described above, the overall reflectivity and reflection color of the film may change, and accordingly, there is a problem in that the design (eg, thickness adjustment) of the adjacent layer needs to be re-designed. However, in the case of using the SiNx layer as a buffer layer according to the present application, since changes in film properties can be minimized, the burden on design changes of the optical film can be reduced.

The SiNx layer is positioned between the wet coating layer and the first layer. More specifically, the SiNx layer is in direct contact with the wet coating layer and the first layer. Since the SiNx layer has excellent adhesion to the wet coating layer including inorganic particles in a predetermined content range, it is possible to provide excellent weather resistance to the film of the present application. As a result, the SiNx layer can further increase the adhesion between the wet coating layer and the deposition layer, and improve the durability of the film.

In one example, the SiNx layer may be an inorganic material layer or an organic-inorganic hybrid layer. For example, the SiNx layer may be an inorganic layer formed by a deposition process. Alternatively, the SiNx layer may be a layer formed from a coating composition including the organic component and SiNx particles described in the wet coating layer. In the latter case, the SiNx content may be 85 parts by weight or more based on the solid content of the cured coating composition, and the compounds described in the wet coating layer may be used as the organic component.

The thickness of the SiNx layer is not particularly limited. For example, the SiNx layer may have a thickness within a range of 0.05 to 15 nm.

Since the refractive index of the SiNx layer does not significantly affect the low reflection characteristics of the low reflection film, the refractive index of the SiNx layer is not particularly limited. For example, it may be appropriately selected within the range of 1 to 2.5.

deposited layer

The vapor deposition layer is a configuration that imparts low reflection characteristics. To this end, the deposition layer has a configuration in which at least three layers, ie, a first layer, a second layer and a third layer, are stacked as described above, and these three layers satisfy the refractive index relationship described above.

In one example, at least one of the first layer, the second layer, and the third layer is formed by a deposition method, and may be a deposition layer including a metal oxide. A specific deposition method is not particularly limited, but, for example, sputtering deposition or ion beam deposition may be used when forming the layer. If the refractive index relationship of the deposition layer configuration of the present application can be satisfied, the conditions of the deposition process are not particularly limited.

The first layer, the second layer, and the metal oxide included in the third layer is not particularly limited, for example, zirconium (Zr), antimony (Sb), barium (Ba), gallium (Ga), germanium ( Ge), hafnium (Hf), indium (In), lanthanum (La), magnesium (Mg), selenium (Se), silicon (Si), tantalum (Ta), titanium (Ti), vanadium (V), yttrium (Y), zinc (Zn), aluminum (Al), niobium (Nb), and may be at least one selected from the group consisting of tin (Sn).

In the present application, the first layer may be a layer having a refractive index intermediate between the refractive index of the second layer and the third layer. That is, the first layer may be a medium refractive index layer. Although not particularly limited, the refractive index of the first layer may be, for example, in the range of 1.6 to 1.9.

In this regard, the first layer of the deposition layer may have a metal oxide containing 50 wt% (wt%) or more of zinc (Zn). In this case, the wt% related to the zinc content means a metal or oxygen mass concentration in the metal oxide constituting the first layer, and may be obtained according to a known method. For example, as will be described below, the first layer is a deposited layer including a metal oxide, and includes a zinc (Zn) component as a main component, but may include a metal dopant in addition. The first layer having the above configuration, when compared with the second layer and the third layer, may secure a medium refractive index, and may have excellent low-reflection properties in the film. In addition, the first layer including zinc (Zn) in the above content range may provide excellent adhesion to the SiNX layer positioned on the wet coating layer including inorganic particles.

As described above, when the first layer is a metal oxide layer containing 50 wt% or more of zinc (Zn), it may be advantageous to satisfy [relational expression] related to the refractive index. The upper limit of the content of zinc in the first layer is not particularly limited, but for example, about 90 wt% or less, 85 wt% or less, 80 wt% or less, 75 wt% or less, 70 wt% or less, 65 wt% or less, 60 wt% % or less or 55 wt% or less.

In one example, the first layer may further include a metal other than zinc (Zn). Specifically, the first layer is zirconium (Zr), antimony (Sb), barium (Ba), gallium (Ga), germanium (Ge), hafnium (Hf), indium (In), lanthinium (La), magnesium (Mg), selenium (Se), silicon (Si), tantalum (Ta), titanium (Ti), vanadium (V), yttrium (Y), aluminum (Al), niobium (Nb), and tin (Sn) It may further include one or more selected. The content of the metal included in the first layer other than zinc is not particularly limited, but for example, 25 wt% or less, 20 wt% or less, 15 wt% or less, 10 wt% or less, 5 wt% or less, 4 wt% or less , 3 wt% or less, 2 wt% or less, 1 wt% or less, or 0.5 wt% or less. Metals other than zinc may be referred to as, for example, dopant metals. Although not particularly limited, considering the content of zinc (Zn) in the first layer and the refractive index that the first layer should have in relation to the adjacent layer, aluminum (Al), tin (Sn), or silicon (Si) is It may be further included in the first layer.

In the metal oxide of the first layer, the element content of oxygen is a content excluding the elements, and may be determined at a level that does not interfere with performing the medium refractive function.

Since the first layer including zinc (Zn) in the above content has excellent adhesion to the SiNx layer, it is possible to provide excellent weather resistance to the film of the present application.

In one example, the first layer may be formed directly on the wet coating layer. Since the wet coating layer of the above configuration has deposition resistance and an additional SiNx layer is present on the wet coating layer, the first layer including the metal oxide can be stably formed based on the SiNx layer. In addition, a second layer may be stably formed directly on the stably formed first layer, and a third layer may be stably formed directly on the second layer. Through this configuration, the low reflection function can be sufficiently exhibited.

Among the components constituting the deposition layer of the film of the present application, the second layer may be a high refractive layer, and the third layer may be a low refractive layer.

In one example, the refractive index of the second layer may be in the range of 2.0 to 2.4. The metal oxide forming the second layer may be selected to satisfy the refractive index range of the second layer. For example, the second layer may include zirconium (Zr), antimony (Sb), barium (Ba), gallium (Ga), germanium (Ge), hafnium (Hf), indium (In), lanthium (La), Magnesium (Mg), selenium (Se), silicon (Si), tantalum (Ta), titanium (Ti), vanadium (V), yttrium (Y), zinc (Zn), aluminum (Al), niobium (Nb), And it may include an oxide of one or more metals selected from the group comprising tin (Sn). Although not particularly limited, in consideration of a refractive index relationship with an adjacent layer, the second layer may include an oxide of zirconium (Zr), niobium (Nb), and/or titanium (Ti).

In one example, the refractive index of the third layer may be in the range of 1.4 to 1.6. The metal oxide forming the third layer may be selected to satisfy the refractive index range of the third layer. For example, the second layer may include zirconium (Zr), antimony (Sb), barium (Ba), gallium (Ga), germanium (Ge), hafnium (Hf), indium (In), lanthium (La), Magnesium (Mg), selenium (Se), silicon (Si), tantalum (Ta), titanium (Ti), vanadium (V), yttrium (Y), zinc (Zn), aluminum (Al), niobium (Nb), And it may include an oxide of one or more metals selected from the group comprising tin (Sn). Although not particularly limited, the third layer may include an oxide of magnesium (Mg) or silicon (Si) in consideration of a relation of a refractive index with an adjacent layer.

In one example, the thickness of the first to third layers may be in the range of 20 nm to 350 nm. The specific thickness of each layer is not particularly limited, and may be appropriately adjusted within the thickness range so as to satisfy the relational expression related to the refractive index described above. For example, when the first layer includes Zn, the second layer includes Nb, and the third layer includes Si, the second layer, the third layer, and the first layer may have a thick thickness in that order. have.

antifouling layer

The low reflection film of the present application may further include an antifouling layer. The antifouling layer is configured to prevent damage or contamination of the low-reflection film by the external environment.

The antifouling layer may be formed by a wet coating method, for example, may be formed from a photocurable or thermosetting type composition.

In one example, the composition for forming the antifouling layer may include a photocurable compound. As the photocurable compound, for example, the compound (eg, acrylate) described in relation to the wet coating layer may be used.

In another example, the composition for forming the antifouling layer may include a thermosetting compound. As the thermosetting compound, for example, a siloxane compound may be used.

In one example, the composition for forming an antifouling layer may include a fluorine-based compound. For example, a fluorine-based (meth)acrylate or a fluorine-based siloxane compound may be used. When the compound is used, the stain resistance property of the film can be improved. Although not particularly limited, a perfluorine compound such as perfluoropolyether acrylate may be used as the fluorine-based (meth)acrylate, and an alkoxysilane compound substituted with a fluorine-containing chain may be used as the fluorine-based siloxane compound.

The thickness of the antifouling layer is not particularly limited. For example, the antifouling layer may have a thickness of 100 nm or less. And the lower limit may be, for example, 5 nm. When the thickness exceeds 100 nm, the optical properties of the film may be deteriorated as a rainbow is observed in the appearance of the film.

The refractive index of the antifouling layer may be appropriately adjusted within a range that does not interfere with the low reflection characteristics implemented by the deposition layer. For example, when the deposition layer satisfies the above relational expression, the refractive index of the antifouling layer may be in the range of 1.4 to 1.7.

According to an example of the present application, a low-reflection film having excellent mechanical durability, weather resistance, and moisture barrier properties may be provided.

Hereinafter, the present application will be described in detail through Examples and Comparative Examples. However, the scope of the present application is not limited by the following examples.

How to measure and evaluate

(1) b* value and reflectance: A black sheet is laminated on the back side of the film sample to be measured, and absolute reflection (5° Absolute Specular) is used with Shimadzu’s UV-VIS-NIR Spectrophotometer Solidspec-3700 model. Reflectance) was measured and the results are shown in Table 1.

(2) Water vapor permeability (WVTR): Using Mocon's water permeability meter (Aquatran model 2, Mocon) according to ISO15506-3 at 38 ° C. and 100% relative humidity for 72 hours, the results are shown in Table 1 described.

Example and comparative example

Example One

An optical film in which the layers prepared in (1) to (5) below were sequentially laminated was prepared, and related physical properties were measured.

(1) Base layer: TAC having a thickness of 80 um was used.

(2) Hard coating layer (wet coating layer): A hard coating layer having a thickness of 6 μm was formed on the substrate. Specifically, it was prepared by applying the hard coating layer solution of the following configuration with a bar coater and curing. Based on 100 parts by weight of the solid content in the hard coating layer, 60 parts by weight of the curable resin and 38 parts by weight of inorganic particles (MEK-AC-2140Z, NISSAN CHEMICAL, Colloidal Silica dispersed in Organic Solvent, 10-15 nm in diameter) and 2 parts by weight of a photoinitiator (Irgacure 127) , BASF, and hydroxyacetophenone) are mixed. The curable resin is 80 parts by weight of an aromatic urethane acrylate (Miramer PU640, Miwon, aromatic urethane acrylate) and a thiol compound (Karenz MT PE1, SHOWA DENKO, tetrafunctional secondary when the 60 parts by weight of the curable resin is again 100 parts by weight) SH, pentaerythritol tetrakis (3-mercaptobutylate)) 20 parts by weight. Thereafter, the solution applied on the substrate was dried at 80° C., and UV-cured using an ultra-high pressure mercury lamp under a nitrogen atmosphere at an accumulated light amount of 600 mJ/cm ² to form a wet coating layer as an organic-inorganic hybrid layer.

(3) Buffer layer: SiNx was formed on the wet coating layer by DC sputtering under the conditions of 2.0 W/cm 2 and 3 mTorr (refractive index: 1.75, thickness: 4 nm).

(4) Deposition layer: A deposition layer containing a metal oxide was formed on the hard coating layer by using a DC sputtering method under the conditions of 2.0 W/cm 2 and 3 mTorr. That is, the first layer (refractive index: 1.70, thickness: 60 nm) as a medium refractive layer containing 50 wt% or more of Zn, the second layer as a high refractive layer containing Nb (refractive index: 2.30, thickness: 110 nm), Si A third layer (refractive index: 1.45, thickness: 80 nm), which is a low refractive index layer, was formed by sputtering deposition. Specifically, in the case of the first layer, the metal oxide containing Al and Si in an amount of 20 wt% or less in addition to Zn was formed, and the second layer and the third layer were formed of _{NbOx and SiO 2 , respectively.}

(5) Antifouling layer: An antifouling layer was formed on the third layer. The antifouling layer was formed by applying a solution of a fluorine-based silane compound (OPTOOL DSX, DAIKIN) with a bar coater and drying it at 110°C. The thickness of the prepared antifouling layer was 10 nm and the refractive index was 1.42.

comparative example One

An optical film was prepared in the same manner as in Example 1, except that the SiNx layer was not formed.

comparative example 2

An optical film was prepared in the same manner as in Example 1, except that the SiOx layer was formed instead of the SiNx layer.

[Table 1]

Claims (17)

base layer; wet coating layer; SiNx layer; and a deposition layer sequentially including a first layer, a second layer, and a third layer satisfying the following relational expression;
A low-reflection film further comprising an antifouling layer on the deposition layer, wherein the antifouling layer is a cured product of a composition containing a fluorine-based compound:
[Relational Expression]
n2 > n1 > n3
In this case, n1 is the refractive index of the first layer, n2 is the refractive index of the second layer, n3 is the refractive index of the third layer, and n1, n2 and n3 have refractive indices within the range of 1 to 2.5. The low-reflection film of claim 1 , wherein the wet coating layer contains inorganic particles in an amount of 20 to 65 parts by weight based on a solid content. The low-reflection film of claim 1, wherein the first layer has a metal oxide containing 50 wt% or more of zinc (Zn). According to claim 1, wherein the wet coating layer is urethane acrylate; and a low-reflection film having a cured product of a composition comprising a thiol compound. The low-reflection film according to claim 4, wherein the thiol compound is represented by the following formula (1):
[Formula 1]

However, in Formula 1, R1 is hydrogen or a substituted or unsubstituted C1-C10 alkyl group, R2 is a substituted or unsubstituted C1-C10 alkylene group, and R3 is a substituted or unsubstituted C1-C10 alkyl group. 10 is an alkylene group, and n is a number between 2 and 10. The low-reflection film according to claim 4, wherein the urethane acrylate has an aromatic group. The low-reflection film of claim 4, wherein the thiol compound is included in an amount of 5 to 40 parts by weight based on 100 parts by weight of the urethane acrylate. The low-reflection film of claim 2, wherein the inorganic particles are at least one selected from clay, talc, alumina, calcium carbonate, zirconia, and silica particles. 4. The low reflective film of claim 3, wherein the first layer has a refractive index in the range of 1.6 to 1.9. 10. The method of claim 9, wherein the first layer is zirconium (Zr), antimony (Sb), barium (Ba), gallium (Ga), germanium (Ge), hafnium (Hf), indium (In), lanthinium (La) ), magnesium (Mg), selenium (Se), silicon (Si), tantalum (Ta), titanium (Ti), vanadium (V), yttrium (Y), aluminum (Al), niobium (Nb), and tin ( Sn) a low-reflection film further comprising at least one selected from the group consisting of 20 wt% or less. The low-reflective film of claim 1, wherein the second layer is a metal oxide layer having a refractive index within a range of 2.0 to 2.4, and the third layer is a metal oxide layer having a refractive index within a range of 1.4 to 1.6. According to claim 11, wherein the second and third layers are each independently zirconium (Zr), antimony (Sb), barium (Ba), gallium (Ga), germanium (Ge), hafnium (Hf), indium ( In), lanthinium (La), magnesium (Mg), selenium (Se), silicon (Si), tantalum (Ta), titanium (Ti), vanadium (V), yttrium (Y), aluminum (Al), niobium A low-reflection film comprising at least one selected from (Nb), zinc (Zn), and tin (Sn). The low reflection film of claim 1, wherein the SiNx layer is in contact with the wet coating layer and the first layer, respectively. 14. The low reflection film of claim 13, wherein the first layer, the second layer, and the third layer are in direct contact with each other. delete The low-reflection film of claim 1, wherein the water vapor transmission rate (WVTR) measured for 72 hours at a temperature of 38° C. and a relative humidity of 100% is 0.01 g/m ² ·day or less. The low reflection film of claim 1, wherein the reflectivity to visible light is less than 0.3%.