KR102316645B1 - Photosensitive compositions and novel compounds - Google Patents
Photosensitive compositions and novel compounds Download PDFInfo
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- KR102316645B1 KR102316645B1 KR1020187015982A KR20187015982A KR102316645B1 KR 102316645 B1 KR102316645 B1 KR 102316645B1 KR 1020187015982 A KR1020187015982 A KR 1020187015982A KR 20187015982 A KR20187015982 A KR 20187015982A KR 102316645 B1 KR102316645 B1 KR 102316645B1
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- South Korea
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- carbon atoms
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- 239000000203 mixture Substances 0.000 title claims abstract description 107
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- 125000000623 heterocyclic group Chemical group 0.000 claims abstract description 74
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- 125000003118 aryl group Chemical group 0.000 claims abstract description 53
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 41
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 40
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- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 18
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims abstract description 16
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 14
- 125000004665 trialkylsilyl group Chemical group 0.000 claims abstract description 4
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- 238000002360 preparation method Methods 0.000 description 1
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- NCNISYUOWMIOPI-UHFFFAOYSA-N propane-1,1-dithiol Chemical compound CCC(S)S NCNISYUOWMIOPI-UHFFFAOYSA-N 0.000 description 1
- 125000002755 pyrazolinyl group Chemical group 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical group C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- 125000005495 pyridazyl group Chemical group 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
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- 150000003346 selenoethers Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
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- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
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- 125000005504 styryl group Chemical group 0.000 description 1
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- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
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- 239000011593 sulfur Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- ADXGNEYLLLSOAR-UHFFFAOYSA-N tasosartan Chemical compound C12=NC(C)=NC(C)=C2CCC(=O)N1CC(C=C1)=CC=C1C1=CC=CC=C1C=1N=NNN=1 ADXGNEYLLLSOAR-UHFFFAOYSA-N 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 125000002769 thiazolinyl group Chemical group 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 1
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- 229940103494 thiosalicylic acid Drugs 0.000 description 1
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- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- KJWHEZXBZQXVSA-UHFFFAOYSA-N tris(prop-2-enyl) phosphite Chemical compound C=CCOP(OCC=C)OCC=C KJWHEZXBZQXVSA-UHFFFAOYSA-N 0.000 description 1
- 229940036248 turpentine Drugs 0.000 description 1
- 235000013799 ultramarine blue Nutrition 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- UIYCHXAGWOYNNA-UHFFFAOYSA-N vinyl sulfide Chemical compound C=CSC=C UIYCHXAGWOYNNA-UHFFFAOYSA-N 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/005—Stabilisers against oxidation, heat, light, ozone
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
- C07C43/205—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring the aromatic ring being a non-condensed ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
- C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
- C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
- C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
- C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
- C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
- C07D251/26—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with only hetero atoms directly attached to ring carbon atoms
- C07D251/30—Only oxygen atoms
- C07D251/34—Cyanuric or isocyanuric esters
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
- C07D493/12—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains three hetero rings
- C07D493/20—Spiro-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Abstract
하기 일반식(1)로 나타내는 치환기를 가지는 화합물을 함유하는 감광성 조성물.
(식 중, R1 및 R2는, 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 수산기, 니트로기, 카복실기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기, 탄소 원자 수 2~20의 복소환함유기, 또는 트리알킬실릴기를 나타내고, j는 1~3의 수를 나타내며, *는 *부분에서 인접하는 기와 결합하는 것을 의미한다.)The photosensitive composition containing the compound which has a substituent represented by following General formula (1).
(Wherein, R 1 and R 2 are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms, which may have a substituent, and the number of carbon atoms An aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, a heterocycle-containing group having 2 to 20 carbon atoms, or a trialkylsilyl group, j represents a number from 1 to 3, * is a * part means to combine with an adjacent group in
Description
본 발명은, 특정 구조를 가지고, 상온에서는 불활성이며 소정 온도로 가열함으로써 활성화되어 기능을 발현하는 화합물을 함유하는 감광성 조성물, 및 신규 화합물에 관한 것이다. 또한, 본 발명은, 상기 감광성 조성물에 착색제를 첨가한 착색 감광성 조성물 및 상기 착색 감광성 조성물을 사용한 컬러 필터에 관한 것이다. The present invention relates to a photosensitive composition containing a compound having a specific structure, which is inactive at room temperature, and which is activated by heating to a predetermined temperature to express a function, and a novel compound. Moreover, this invention relates to the coloring photosensitive composition which added the coloring agent to the said photosensitive composition, and the color filter using the said coloring photosensitive composition.
감광성 조성물의 내후성이나 내열성을 향상시키기 위해, 자외선 흡수제나 산화방지제를 첨가하여 안정화시키는 방법이 알려져 있다(특허문헌 1~4). In order to improve the weather resistance and heat resistance of a photosensitive composition, the method of adding and stabilizing a ultraviolet absorber and antioxidant is known (patent documents 1-4).
페놀계 산화방지제 및 자외선 흡수제는 폴리머의 열화(劣化)에 크게 영향을 주는 라디칼을 트랩하는 작용이 있으므로 이들을 중합계 내에 첨가하면, 일반적으로 이른바 중합 금지제로서 작용하고, 경화(硬化) 저해를 일으키는 것이 문제가 되기 때문에 잠재성 첨가제가 개발되어 왔다(특허문헌 5). Since phenolic antioxidants and ultraviolet absorbers have a function of trapping radicals that greatly affect polymer degradation, when they are added to a polymerization system, they generally act as so-called polymerization inhibitors and cause curing inhibition. Since it becomes a problem, a latent additive has been developed (patent document 5).
그러나 종래의 잠재성 첨가제를 사용한 조성물은 아웃 가스가 많고, 그 때문에 가열 장치가 오염되거나 조성물의 물성이 저하된다는 문제가 있다. 장치의 오염이나 물성의 저감화라는 문제가 있다. 또한, 종래의 잠재성 첨가제를 사용한 조성물은 그 경화물의 내용제성(耐溶劑性)이 낮고, 그 때문에 경화물의 용출이 일어나며, 예를 들면 컬러 필터의 휘도를 저하시킨다는 문제도 있다. However, the composition using the conventional latent additive has a problem that there are many outgases, and therefore a heating apparatus is contaminated or the physical property of a composition falls. There is a problem of contamination of the device or reduction of physical properties. Moreover, the composition using the conventional latent additive has a low solvent resistance of the hardened|cured material, and therefore the hardened|cured material elution occurs, for example, there also exists a problem that the brightness|luminance of a color filter is reduced.
또한, 특허문헌 6에는 경화제로서 유용한 트리알릴페놀 화합물이 개시되어 있지만, 상기 트리알릴페놀 화합물을 함유하는 감광성 조성물은 시사되어 있지 않다. Moreover, although the triallyl phenol compound useful as a hardening|curing agent is disclosed by patent document 6, the photosensitive composition containing the said triallyl phenol compound is not suggested.
따라서 본 발명의 목적은, 상온에서는 불활성이고 소정 온도로 가열함으로써 활성화되어 산화방지제나 자외선 흡수제로서의 기능을 발현하는 화합물을 사용한, 아웃 가스가 적고 경화물의 내용제성이 높은 감광성 조성물을 제공하는 것에 있다. 또한, 본 발명의 다른 목적은, 상기 감광성 조성물에 착색제를 첨가한 착색 감광성 조성물, 특히 컬러 필터에 적합한 착색 감광성 조성물을 제공하는 것에 있다. Accordingly, it is an object of the present invention to provide a photosensitive composition with little outgas and high solvent resistance of the cured product, using a compound that is inert at room temperature and activated by heating to a predetermined temperature to exhibit a function as an antioxidant or ultraviolet absorber. Moreover, the other objective of this invention is providing the coloring photosensitive composition which added the coloring agent to the said photosensitive composition, especially the coloring photosensitive composition suitable for a color filter.
본 발명자들은 예의 검토를 거듭한 결과, 특정 보호기를 가지는 화합물을 사용한 감광성 조성물은 아웃 가스가 적고, 그 경화물의 내용제성이 높은 것을 지견하고, 또한 상기 감광성 조성물에 착색제를 첨가한 착색 감광성 조성물이 광학 필터(특히 컬러 필터)의 휘도를 저하시키지 않고, 액정표시패널 등의 화상표시장치용 컬러 필터에 적합한 것을 지견하여 본 발명에 도달하였다. As a result of intensive studies, the present inventors found that the photosensitive composition using a compound having a specific protecting group has little outgas and has high solvent resistance of the cured product, and the colored photosensitive composition obtained by adding a colorant to the photosensitive composition is optical Without reducing the luminance of the filter (especially a color filter), it was found that it is suitable for a color filter for an image display device such as a liquid crystal display panel, and thus the present invention has been reached.
본 발명은, 상기 지견에 기초하여 이루어진 것으로, 하기 일반식(1)로 나타내는 치환기를 가지는 화합물을 함유하는 감광성 조성물을 제공하는 것이다. The present invention has been made based on the above findings, and an object of the present invention is to provide a photosensitive composition containing a compound having a substituent represented by the following general formula (1).
(식 중, R1 및 R2는, 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 수산기, 니트로기, 카복실기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 7~20의 아릴알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~20의 복소환함유기 또는 트리알킬실릴기를 나타내고, (Wherein, R 1 and R 2 are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms which may have a substituent, and a substituent An aryl group having 6 to 20 carbon atoms in some cases, an arylalkyl group having 7 to 20 carbon atoms in some cases having a substituent, a heterocyclic group having 2 to 20 carbon atoms in some cases having a substituent, or represents a trialkylsilyl group,
R1 및 R2로 나타내는 알킬기 또는 아릴알킬기 중의 메틸렌기는, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-, -S-S- 또는 -SO2-에서 선택된 기를 산소 원자가 서로 이웃하지 않는 조건으로 조합한 기로 치환되어 있는 경우도 있고, R'는 수소 원자 또는 탄소 원자 수 1~8의 알킬기를 나타내며, The methylene group in the alkyl group or arylalkyl group represented by R 1 and R 2 is -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -S- CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-, A group selected from -SS- or -SO 2 - may be substituted with a group in which oxygen atoms are not adjacent to each other, R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
j는 1~3의 수를 나타내고, j represents a number from 1 to 3,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * means to combine with an adjacent group in the * part.)
이하, 본 발명에 대해 바람직한 실시형태에 기초하여 상세하게 설명한다. EMBODIMENT OF THE INVENTION Hereinafter, this invention is demonstrated in detail based on preferable embodiment.
본 발명의 감광성 조성물은 상기 일반식(I)로 나타내는 치환기를 가지는 화합물을 함유한다. The photosensitive composition of this invention contains the compound which has a substituent represented by the said general formula (I).
상기 일반식(I)로 나타내는 치환기를 가지는 화합물 중에서도 하기 일반식(I-A)로 나타내는 것이 특히 내열성이 높고 아웃 가스가 적으므로 바람직하다. Among the compounds having a substituent represented by the general formula (I), those represented by the following general formula (I-A) are particularly preferred because of high heat resistance and little outgassing.
(식 중, n은 1~10의 정수를 나타내고, (wherein n represents an integer from 1 to 10,
X1은 n가의 결합기를 나타내며, X 1 represents an n-valent bonding group,
R1, R2 및 j는 상기 일반식(I)과 동일하다.) R 1 , R 2 and j are the same as in the general formula (I).)
R1 및 R2로 나타내는 할로겐 원자로는 불소, 염소, 브롬, 요오드를 들 수 있고, Examples of the halogen atom represented by R 1 and R 2 include fluorine, chlorine, bromine and iodine;
R1 및 R2로 나타내는 탄소 원자 수 1~20의 알킬기로는 메틸, 에틸, 프로필, iso-프로필, 부틸, sec-부틸, tert-부틸, iso-부틸, 아밀, iso-아밀, tert-아밀, 시클로펜틸, 헥실, 2-헥실, 3-헥실, 시클로헥실, 4-메틸시클로헥실, 헵틸, 2-헵틸, 3-헵틸, iso-헵틸, tert-헵틸, 1-옥틸, iso-옥틸, tert-옥틸, 아다만틸 등을 들 수 있으며, Examples of the alkyl group having 1 to 20 carbon atoms represented by R 1 and R 2 include methyl, ethyl, propyl, iso-propyl, butyl, sec-butyl, tert-butyl, iso-butyl, amyl, iso-amyl, tert-amyl , cyclopentyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, 4-methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, iso-heptyl, tert-heptyl, 1-octyl, iso-octyl, tert -octyl, adamantyl, etc. are mentioned,
R1 및 R2로 나타내는 탄소 원자 수 6~20의 아릴기로는 페닐, 나프틸, 안트라세닐, 페난트릴, 플루오레닐, 인데닐, 2-메틸페닐, 3-메틸페닐, 4-메틸페닐, 4-비닐페닐, 3-iso-프로필페닐, 4-iso-프로필페닐, 4-부틸페닐, 4-iso-부틸페닐, 4-tert-부틸페닐, 4-헥실페닐, 4-시클로헥실페닐, 4-옥틸페닐, 4-(2-에틸헥실)페닐, 4-스테아릴페닐, 2,3-디메틸페닐, 2,4-디메틸페닐, 2,5-디메틸페닐, 2,6-디메틸페닐, 3,4-디메틸페닐, 3,5-디메틸페닐, 2,4-디-tert-부틸페닐, 2,5-디-tert-부틸페닐, 2,6-디-tert-부틸페닐, 2,4-디-tert-펜틸페닐, 2,5-디-tert-아밀페닐, 2,5-디-tert-옥틸페닐, 2,4-디쿠밀페닐, 4-시클로헥실페닐, (1,1'-비페닐)-4-일, 2,4,5-트리메틸페닐, 페로세닐 등을 들 수 있고, Examples of the aryl group having 6 to 20 carbon atoms represented by R 1 and R 2 include phenyl, naphthyl, anthracenyl, phenanthryl, fluorenyl, indenyl, 2-methylphenyl, 3-methylphenyl, 4-methylphenyl, 4-vinyl Phenyl, 3-iso-propylphenyl, 4-iso-propylphenyl, 4-butylphenyl, 4-iso-butylphenyl, 4-tert-butylphenyl, 4-hexylphenyl, 4-cyclohexylphenyl, 4-octylphenyl , 4-(2-ethylhexyl)phenyl, 4-stearylphenyl, 2,3-dimethylphenyl, 2,4-dimethylphenyl, 2,5-dimethylphenyl, 2,6-dimethylphenyl, 3,4-dimethyl Phenyl, 3,5-dimethylphenyl, 2,4-di-tert-butylphenyl, 2,5-di-tert-butylphenyl, 2,6-di-tert-butylphenyl, 2,4-di-tert- Pentylphenyl, 2,5-di-tert-amylphenyl, 2,5-di-tert-octylphenyl, 2,4-dicumylphenyl, 4-cyclohexylphenyl, (1,1'-biphenyl)-4 -yl, 2,4,5-trimethylphenyl, ferrocenyl, etc. are mentioned,
R1 및 R2로 나타내는 탄소 원자 수 7~20의 아릴알킬기로는 벤질, 1-메틸-1-페닐에틸, 1-나프틸메틸, 9-안트라세닐메틸, 9-플루오레닐, 3-페닐프로필, 메틸-2-페닐프로판-2-일, 디페닐메틸, 트리페닐메틸, 페네틸, 스티릴, 신나밀 등을 들 수 있으며,Examples of the arylalkyl group having 7 to 20 carbon atoms represented by R 1 and R 2 include benzyl, 1-methyl-1-phenylethyl, 1-naphthylmethyl, 9-anthracenylmethyl, 9-fluorenyl, 3-phenyl propyl, methyl-2-phenylpropan-2-yl, diphenylmethyl, triphenylmethyl, phenethyl, styryl, cinnamyl, and the like;
R1 및 R2로 나타내는 탄소 원자 수 2~20의 복소환함유기로는 피리딘 환(環), 피리미딘 환, 피리다진 환, 피페리딘 환, 피란 환, 피라졸린 환, 트리아진 환, 피롤린 환, 퀴놀린 환, 이소퀴놀린 환, 이미다졸린 환, 벤조이미다졸린 환, 트리아졸린 환, 퓨란 환, 벤조퓨란 환, 티아디아졸린 환, 티아졸린 환, 벤조티아졸린 환, 티오펜 환, 옥사졸린 환, 벤조옥사졸린 환, 이소티아졸린 환, 이소옥사졸린 환, 인돌 환, 피롤리딘 환, 피페리돈 환, 디옥산 환 등의 복소환과 메틸렌 쇄를 조합한 기를 들 수 있고,Examples of the heterocyclic ring-containing group having 2 to 20 carbon atoms represented by R 1 and R 2 include a pyridine ring, a pyrimidine ring, a pyridazine ring, a piperidine ring, a pyran ring, a pyrazoline ring, a triazine ring, and a pyridine ring. Roline ring, quinoline ring, isoquinoline ring, imidazoline ring, benzoimidazoline ring, triazoline ring, furan ring, benzofuran ring, thiadiazoline ring, thiazoline ring, benzothiazoline ring, thiophene ring, and a group combining a methylene chain with a heterocyclic ring, such as an oxazoline ring, a benzoxazoline ring, an isothiazoline ring, an isoxazoline ring, an indole ring, a pyrrolidine ring, a piperidone ring, and a dioxane ring;
R1 및 R2로 나타내는 트리알킬실릴기로는 트리메틸실란, 트리에틸실란, 에틸디메틸실란 등의 탄소 원자 수 1~6의 알킬기(3개의 알킬기는 동일하거나 다름)로 치환된 실릴기를 들 수 있다. Examples of the trialkylsilyl group represented by R 1 and R 2 include a silyl group substituted with an alkyl group having 1 to 6 carbon atoms (the three alkyl groups are the same or different), such as trimethylsilane, triethylsilane, and ethyldimethylsilane.
R'로 나타내는 탄소 원자 수 1~8의 알킬기로는 R1로 나타내는 상기 알킬기 중, 소정의 탄소 원자 수를 충족하는 것을 들 수 있다. Examples of the alkyl group having 1 to 8 carbon atoms represented by R' include those satisfying a predetermined number of carbon atoms among the alkyl groups represented by R 1 .
R1 및 R2로 나타내는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기 또는 탄소 원자 수 2~20의 복소환함유기를 치환하는 치환기로는 비닐, 알릴, 아크릴, 메타크릴 등의 에틸렌성 불포화기; 불소, 염소, 브롬, 요오드 등의 할로겐 원자; 아세틸, 2-클로로아세틸, 프로피오닐, 옥탄오일, 아크릴로일, 메타크릴로일, 페닐카보닐(벤조일), 프탈로일, 4-트리플루오로메틸벤조일, 피발로일, 살리실로일, 옥살로일, 스테아로일, 메톡시카보닐, 에톡시카보닐, t-부톡시카보닐, n-옥타데실옥시카보닐, 카바모일 등의 아실기; 아세틸옥시, 벤조일옥시 등의 아실옥시기; 아미노, 에틸아미노, 디메틸아미노, 디에틸아미노, 부틸아미노, 시클로펜틸아미노, 2-에틸헥실아미노, 도데실아미노, 아닐리노, 클로로페닐아미노, 톨루이디노, 아니시디노, N-메틸-아닐리노, 디페닐아미노, 나프틸아미노, 2-피리딜아미노, 메톡시카보닐아미노, 페녹시카보닐아미노, 아세틸아미노, 벤조일아미노, 포르밀아미노, 피발로일아미노, 라우로일아미노, 카바모일아미노, N,N-디메틸아미노카보닐아미노, N,N-디에틸아미노카보닐아미노, 모르폴리노카보닐아미노, 메톡시카보닐아미노, 에톡시카보닐아미노, t-부톡시카보닐아미노, n-옥타데실옥시카보닐아미노, N-메틸-메톡시카보닐아미노, 페녹시카보닐아미노, 술파모일아미노, N,N-디메틸아미노술포닐아미노, 메틸술포닐아미노, 부틸술포닐아미노, 페닐술포닐아미노 등의 치환 아미노기; 술폰아미드기, 술포닐기, 카복실기, 시아노기, 술포기, 수산기, 니트로기, 메르캅토기, 이미드기, 카바모일기, 술폰아미드기, 포스폰산기, 인산기 또는 카복실기, 술포기, 포스폰산기, 인산기의 염 등을 들 수 있다. A substituent for substituting an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms represented by R 1 and R 2 . Examples include ethylenically unsaturated groups such as vinyl, allyl, acryl and methacryl; halogen atoms such as fluorine, chlorine, bromine and iodine; Acetyl, 2-chloroacetyl, propionyl, octanoyl, acryloyl, methacryloyl, phenylcarbonyl (benzoyl), phthaloyl, 4-trifluoromethylbenzoyl, pivaloyl, salicyloyl, jade acyl groups such as saloyl, stearoyl, methoxycarbonyl, ethoxycarbonyl, t-butoxycarbonyl, n-octadecyloxycarbonyl and carbamoyl; acyloxy groups such as acetyloxy and benzoyloxy; Amino, ethylamino, dimethylamino, diethylamino, butylamino, cyclopentylamino, 2-ethylhexylamino, dodecylamino, anilino, chlorophenylamino, toluidino, anisidino, N-methyl-anilino, Diphenylamino, naphthylamino, 2-pyridylamino, methoxycarbonylamino, phenoxycarbonylamino, acetylamino, benzoylamino, formylamino, pivaloylamino, lauroylamino, carbamoylamino, N,N-dimethylaminocarbonylamino, N,N-diethylaminocarbonylamino, morpholinocarbonylamino, methoxycarbonylamino, ethoxycarbonylamino, t-butoxycarbonylamino, n- Octadecyloxycarbonylamino, N-methyl-methoxycarbonylamino, phenoxycarbonylamino, sulfamoylamino, N,N-dimethylaminosulfonylamino, methylsulfonylamino, butylsulfonylamino, phenylsulfonyl substituted amino groups such as amino; Sulfonamide group, sulfonyl group, carboxyl group, cyano group, sulfo group, hydroxyl group, nitro group, mercapto group, imide group, carbamoyl group, sulfonamide group, phosphonic acid group, phosphoric acid group or carboxyl group, sulfo group, phosphonic group and salts of acid groups and phosphoric acid groups.
R1 및 R2로는, 수소 원자, 탄소 원자 수 1~8의 알킬기, 탄소 원자 수 6~12의 아릴기가 아웃 가스가 적기 때문에 바람직하다. R1 및 R2가 수소 원자 또는 분기를 가지는 탄소 원자 수 1~8의 알킬기, 특히 t-부틸기 중 어느 하나인 것이 아웃 가스가 적기 때문에 더 바람직하다. As R<1> and R<2> , since there is little outgas, a hydrogen atom, a C1-C8 alkyl group, and a C6-C12 aryl group are preferable. Since R<1> and R<2> are a hydrogen atom or a branched C1-C8 alkyl group, especially a t-butyl group, since there is little outgas, it is more preferable.
상기 일반식(I-A)에서 X1은 n가의 결합기를 나타내고, 구체적으로는, 예를 들면 직접 결합, 수소 원자, 질소 원자, 산소 원자, 유황 원자, 인 원자, 하기 (I-a) 혹은 (I-b)로 나타내는 기, -CO-, -NH-CO-, -CO-NH-, -NR3-, -OR3, -SR3, -NR3R4, 또는 n과 동일한 수의 가수(價數)를 가지는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~120의 지방족 탄화수소기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향환함유 탄화수소기, 혹은 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기를 나타내고, R3 및 R4는 수소 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향환함유 탄화수소기 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기를 나타내며, 지방족 탄화수소기, 방향환함유 탄화수소기 및 복소환함유기는 탄소-탄소 이중결합, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -O-CO-NH-, -NR'-, -S-S-, -SO2- 또는 질소 원자에서 선택된 기로 치환되어 있는 경우도 있다. In the above general formula (IA), X 1 represents an n-valent bonding group, specifically, for example, a direct bond, a hydrogen atom, a nitrogen atom, an oxygen atom, a sulfur atom, a phosphorus atom, and the following (Ia) or (Ib) a group represented by, -CO-, -NH-CO-, -CO-NH-, -NR 3 -, -OR 3 , -SR 3 , -NR 3 R 4 , or the same number of valences as n Branch is an aliphatic hydrocarbon group having 1 to 120 carbon atoms which may have a substituent, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms which may have a substituent, or a carbon atom which may have a substituent. represents a heterocyclic ring-containing group having a number of 2 to 35, R 3 and R 4 are a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent, or an aliphatic hydrocarbon group having 6 to carbon atoms which may have a substituent An aromatic ring-containing hydrocarbon group of 35 or a heterocyclic ring-containing group having 2 to 35 carbon atoms which may have a substituent, and an aliphatic hydrocarbon group, an aromatic ring-containing hydrocarbon group and a heterocycle-containing group are a carbon-carbon double bond, -O -, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -O-CO-NH-, -NR'-, -SS-, -SO 2 - or It may be substituted with a group selected from a nitrogen atom.
단, X1이 질소 원자, 인 원자 또는 하기 (I-a) 혹은 (I-b)로 나타내는 결합기인 경우, n은 3이고, X1이 산소 원자 또는 유황 원자, -CO-, -NH-CO-, -CO-NH- 또는 -NR3-인 경우, n은 2이며, X1이 수소 원자, -OR3, -SR3 또는 -NR3R4인 경우, n은 1이고, X1은 벤젠 환과 하나가 되어 환을 형성하고 있는 경우도 있다. However, when X 1 is a nitrogen atom, a phosphorus atom, or a bonding group represented by the following (Ia) or (Ib), n is 3, and X 1 is an oxygen atom or a sulfur atom, -CO-, -NH-CO-, - When CO-NH- or -NR 3 -, n is 2, and when X 1 is a hydrogen atom, -OR 3 , -SR 3 or -NR 3 R 4 , n is 1 and X 1 is one with a benzene ring. In some cases, it becomes a ring and forms a ring.
(*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) (* means combining with an adjacent group in the * part.)
상기 일반식(I-A)로 나타내는 화합물은 X1로 나타내는 n가의 결합기에 n개의 특정 기가 결합한 구조를 가진다. 이 n개의 기는 서로 동일하거나 다르다. n의 값은 1~10이고, 낮은 아웃 가스의 관점에서 바람직하게는 2~6이다. The compound represented by the general formula (IA) has a structure in which n specific groups are bonded to the n-valent bonding group represented by X 1 . These n groups are the same or different from each other. The value of n is 1-10, Preferably it is 2-6 from a viewpoint of a low outgas.
상기 일반식(I-A)에서의 X1로 나타내고, n과 동일한 수의 가수를 가지는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~120의 지방족 탄화수소기로는 n이 1가인 것으로서, 예를 들면 메틸, 에틸, 프로필, 이소프로필, 시클로프로필, 부틸, 제2부틸, 제3부틸, 이소부틸, 아밀, 이소아밀, 제3아밀, 시클로펜틸, 헥실, 2-헥실, 3-헥실, 시클로헥실, 비시클로헥실, 1-메틸시클로헥실, 헵틸, 2-헵틸, 3-헵틸, 이소헵틸, 제3헵틸, n-옥틸, 이소옥틸, 제3옥틸, 2-에틸헥실, 노닐, 이소노닐, 데실 등의 알킬기; 메틸옥시, 에틸옥시, 프로필옥시, 이소프로필옥시, 부틸옥시, 제2부틸옥시, 제3부틸옥시, 이소부틸옥시, 아밀옥시, 이소아밀옥시, 제3아밀옥시, 헥실옥시, 시클로헥실옥시, 헵틸옥시, 이소헵틸옥시, 제3헵틸옥시, n-옥틸옥시, 이소옥틸옥시, 제3옥틸옥시, 2-에틸헥실옥시, 노닐옥시, 데실옥시 등의 알콕시기; 메틸티오, 에틸티오, 프로필티오, 이소프로필티오, 부틸티오, 제2부틸티오, 제3부틸티오, 이소부틸티오, 아밀티오, 이소아밀티오, 제3아밀티오, 헥실티오, 시클로헥실티오, 헵틸티오, 이소헵틸티오, 제3헵틸티오, n-옥틸티오, 이소옥틸티오, 제3옥틸티오, 2-에틸헥실티오 등의 알킬티오기; 비닐, 1-메틸에테닐, 2-메틸에테닐, 2-프로페닐, 1-메틸-3-프로페닐, 3-부테닐, 1-메틸-3-부테닐, 이소부테닐, 3-펜테닐, 4-헥세닐, 시클로헥세닐, 비시클로헥세닐, 헵테닐, 옥테닐, 데세닐, 펜타데세닐, 에이코세닐(eicosenyl), 트리코세닐(tricosenyl) 등의 알케닐기; 및 이들 기가 후술하는 치환기에 의해 치환된 기 등을 들 수 있고, As an aliphatic hydrocarbon group having 1 to 120 carbon atoms, which is represented by X 1 in the general formula (IA), has the same number of valences as n, and may have a substituent, n is monovalent, for example, methyl , ethyl, propyl, isopropyl, cyclopropyl, butyl, sec-butyl, tert-butyl, isobutyl, amyl, isoamyl, tert-amyl, cyclopentyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, bi Cyclohexyl, 1-methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, isoheptyl, tertiary heptyl, n-octyl, isooctyl, tertiary octyl, 2-ethylhexyl, nonyl, isononyl, decyl, etc. an alkyl group; Methyloxy, ethyloxy, propyloxy, isopropyloxy, butyloxy, sec-butyloxy, tert-butyloxy, isobutyloxy, amyloxy, isoamyloxy, tertiary amyloxy, hexyloxy, cyclohexyloxy alkoxy groups such as , heptyloxy, isoheptyloxy, tertiary heptyloxy, n-octyloxy, isooctyloxy, tertiary octyloxy, 2-ethylhexyloxy, nonyloxy, and decyloxy; Methylthio, ethylthio, propylthio, isopropylthio, butylthio, sec-butylthio, tert-butylthio, isobutylthio, amylthio, isoamylthio, tertiary amylthio, hexylthio, cyclohexylthio, heptyl alkylthio groups such as thio, isoheptylthio, tertiary heptylthio, n-octylthio, isooctylthio, tertiary octylthio, and 2-ethylhexylthio; vinyl, 1-methylethenyl, 2-methylethenyl, 2-propenyl, 1-methyl-3-propenyl, 3-butenyl, 1-methyl-3-butenyl, isobutenyl, 3-pentenyl, alkenyl groups such as 4-hexenyl, cyclohexenyl, bicyclohexenyl, heptenyl, octenyl, decenyl, pentadecenyl, eicosenyl, and tricosenyl; and groups in which these groups are substituted by a substituent to be described later, and the like;
n이 2가인 것으로서, 메틸렌, 에틸렌, 프로필렌, 부틸렌, 부틸디일 등의 알킬렌; 상기 알킬렌의 메틸렌 쇄가 -O-, -S-, -CO-O-, -O-CO-로 치환된 것; 에탄디올, 프로판디올, 부탄디올, 펜탄디올, 헥산디올 등의 디올의 잔기; 에탄디티올, 프로판디티올, 부탄디티올, 펜탄디티올, 헥산디티올 등의 디티올의 잔기; 및 이들 기가 후술하는 치환기에 의해 치환된 기 등을 들 수 있고, As what n is divalent, alkylene, such as methylene, ethylene, propylene, a butylene, and a butyldiyl; wherein the methylene chain of the alkylene is substituted with -O-, -S-, -CO-O-, -O-CO-; residues of diols such as ethanediol, propanediol, butanediol, pentanediol, and hexanediol; residues of dithiols such as ethanedithiol, propanedithiol, butanedithiol, pentanedithiol and hexanedithiol; and groups in which these groups are substituted by a substituent to be described later, and the like;
n이 3가인 것으로서, 예를 들면, 프로필리딘, 1,1,3-부틸리딘 등의 알킬리딘; 및 이들 기가 후술하는 치환기에 의해 치환된 기를 들 수 있다. As what n is trivalent, For example, alkylidines, such as propylidine and 1,1, 3- butylidine; and groups in which these groups are substituted by a substituent described later.
n과 동일한 수의 가수를 가지는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향환함유 탄화수소기로는, n이 1가인 것으로서, 벤질, 페네틸, 디페닐메틸, 트리페닐메틸, 스티릴, 신나밀 등의 아릴알킬기; 페닐, 나프틸 등의 아릴기; 페녹시, 나프틸옥시 등의 아릴옥시기; 페닐티오, 나프틸티오 등의 아릴티오기; 및 이들 기가 후술하는 치환기에 의해 치환된 기 등을 들 수 있고, Examples of the aromatic ring-containing hydrocarbon group having the same number of valences as n and optionally having a substituent having 6 to 35 carbon atoms, n is monovalent, benzyl, phenethyl, diphenylmethyl, triphenylmethyl, sty arylalkyl groups such as reel and cinnamyl; aryl groups such as phenyl and naphthyl; aryloxy groups such as phenoxy and naphthyloxy; arylthio groups such as phenylthio and naphthylthio; and groups in which these groups are substituted by a substituent to be described later, and the like;
n이 2가인 것으로서, 페닐렌, 나프틸렌 등의 아릴렌기; 카테콜, 비스페놀 등의 2관능 페놀의 잔기; 2,4,8,10-테트라옥사스피로[5,5]운데칸 등; 및 이들 기가 후술하는 치환기에 의해 치환된 기를 들 수 있으며, As what n is divalent|divalent, Arylene groups, such as phenylene and naphthylene; residues of bifunctional phenols such as catechol and bisphenol; 2,4,8,10-tetraoxaspiro[5,5]undecane and the like; and groups in which these groups are substituted by a substituent to be described later,
n이 3가인 것으로서, 페닐-1,3,5-트리메틸렌 및 이들 기가 후술하는 치환기에 의해 치환된 기를 들 수 있다. Examples of n being trivalent include phenyl-1,3,5-trimethylene and a group in which these groups are substituted by a substituent described later.
n과 동일한 수의 가수를 가지는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기로는, n이 1가인 것으로서, 피리딜, 피리미딜, 피리다질, 피페리딜, 피라닐, 피라졸릴, 트리아질, 피롤일, 퀴놀릴, 이소퀴놀릴, 이미다졸릴, 벤조이미다졸릴, 트리아졸릴, 푸릴, 퓨란일, 벤조퓨란일, 티에닐, 티오페닐, 벤조티오페닐, 티아디아졸릴, 티아졸릴, 벤조티아졸릴, 옥사졸릴, 벤조옥사졸릴, 이소티아졸릴, 이소옥사졸릴, 인돌일, 2-피롤리디논-1-일, 2-피페리돈-1-일, 2,4-디옥시이미다졸리딘-3-일, 2,4-디옥시옥사졸리딘-3-일, 벤조트리아조일 등; 및 이들 기가 후술하는 치환기에 의해 치환된 기 등을 들 수 있고, As a heterocyclic ring-containing group having 2 to 35 carbon atoms, which has the same number of valences as n and may have a substituent, n is monovalent, pyridyl, pyrimidyl, pyridazyl, piperidyl, pyranyl , pyrazolyl, triazyl, pyrrolyl, quinolyl, isoquinolyl, imidazolyl, benzoimidazolyl, triazolyl, furyl, furanyl, benzofuranyl, thienyl, thiophenyl, benzothiophenyl, thiadia Jolyl, thiazolyl, benzothiazolyl, oxazolyl, benzoxazolyl, isothiazolyl, isoxazolyl, indolyl, 2-pyrrolidinone-1-yl, 2-piperidon-1-yl, 2,4- deoxyimidazolidin-3-yl, 2,4-deoxyoxazolidin-3-yl, benzotriazoyl and the like; and groups in which these groups are substituted by a substituent to be described later, and the like;
n이 2가인 것으로서, 피리딘 환, 피리미딘 환, 피페리딘 환, 피페라진 환, 트리아진 환, 퓨란 환, 티오펜 환, 인돌 환 등을 가지는 기; 및 이들 기가 후술하는 치환기에 의해 치환된 기를 들 수 있으며, a group in which n is divalent and has a pyridine ring, a pyrimidine ring, a piperidine ring, a piperazine ring, a triazine ring, a furan ring, a thiophene ring, an indole ring or the like; and groups in which these groups are substituted by a substituent to be described later,
n이 3가인 것으로는, 이소시아눌 환을 가지는 기, 트리아진 환을 가지는 기; 및 이들 기가 후술하는 치환기에 의해 치환된 기를 들 수 있다. Examples of n being trivalent include a group having an isocyanul ring, a group having a triazine ring; and groups in which these groups are substituted by a substituent described later.
R3 및 R4로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기로는, 상기 X1로 나타내는 지방족 탄화수소기 및 상기 지방족 탄화수소기와 상기 치환기의 조합 중, 소정 탄소 원자 수를 충족하는 것을 들 수 있고, As the aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent represented by R 3 and R 4 , a predetermined number of carbon atoms among the aliphatic hydrocarbon group represented by X 1 and the combination of the aliphatic hydrocarbon group and the substituent can be said to satisfy
R3 및 R4로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향환함유 탄화수소기 및 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기로는, 상기 X1로 나타내는 탄소 원자 수 6~35의 방향환함유 탄화수소기 및 탄소 원자 수 2~35의 복소환함유기 그리고 이들 기와 후술하는 치환기를 조합한 기 중, 소정의 탄소 원자 수를 충족하는 것을 들 수 있다. As the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms which may have a substituent and the heterocyclic ring containing group having 2 to 35 carbon atoms which may have a substituent represented by R 3 and R 4 , X 1 among the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, the heterocyclic ring-containing group having 2 to 35 carbon atoms, and groups in which these groups and a substituent described later are combined, those satisfying a predetermined number of carbon atoms are mentioned. have.
치환기로는, 비닐, 알릴, 아크릴, 메타크릴 등의 에틸렌성 불포화기; 불소, 염소, 브롬, 요오드 등의 할로겐 원자; 아세틸, 2-클로로아세틸, 프로피오닐, 옥탄오일, 아크릴로일, 메타크릴로일, 페닐카보닐(벤조일), 프탈로일, 4-트리플루오로메틸벤조일, 피발로일, 살리실로일, 옥살로일, 스테아로일, 메톡시카보닐, 에톡시카보닐, t-부톡시카보닐, n-옥타데실옥시카보닐, 카바모일 등의 아실기; 아세틸옥시, 벤조일옥시 등의 아실옥시기; 아미노, 에틸아미노, 디메틸아미노, 디에틸아미노, 부틸아미노, 시클로펜틸아미노, 2-에틸헥실아미노, 도데실아미노, 아닐리노, 클로로페닐아미노, 톨루이디노, 아니시디노, N-메틸-아닐리노, 디페닐아미노, 나프틸아미노, 2-피리딜아미노, 메톡시카보닐아미노, 페녹시카보닐아미노, 아세틸아미노, 벤조일아미노, 포르밀아미노, 피발로일아미노, 라우로일아미노, 카바모일아미노, N,N-디메틸아미노카보닐아미노, N,N-디에틸아미노카보닐아미노, 모르폴리노카보닐아미노, 메톡시카보닐아미노, 에톡시카보닐아미노, t-부톡시카보닐아미노, n-옥타데실옥시카보닐아미노, N-메틸-메톡시카보닐아미노, 페녹시카보닐아미노, 술파모일아미노, N,N-디메틸아미노술포닐아미노, 메틸술포닐아미노, 부틸술포닐아미노, 페닐술포닐아미노 등의 치환 아미노기; 술폰아미드기, 술포닐기, 카복실기, 시아노기, 술포기, 수산기, 니트로기, 메르캅토기, 이미드기, 카바모일기, 술폰아미드기, 포스폰산기, 인산기 또는 카복실기, 술포기, 포스폰산기, 인산기의 염 등을 들 수 있고, 이들 기는 더 치환되어 있는 경우도 있다. 또한, 카복실기 및 술포기는 염을 형성하고 있는 경우도 있다. Examples of the substituent include ethylenically unsaturated groups such as vinyl, allyl, acryl, and methacryl; halogen atoms such as fluorine, chlorine, bromine and iodine; Acetyl, 2-chloroacetyl, propionyl, octanoyl, acryloyl, methacryloyl, phenylcarbonyl (benzoyl), phthaloyl, 4-trifluoromethylbenzoyl, pivaloyl, salicyloyl, jade acyl groups such as saloyl, stearoyl, methoxycarbonyl, ethoxycarbonyl, t-butoxycarbonyl, n-octadecyloxycarbonyl and carbamoyl; acyloxy groups such as acetyloxy and benzoyloxy; Amino, ethylamino, dimethylamino, diethylamino, butylamino, cyclopentylamino, 2-ethylhexylamino, dodecylamino, anilino, chlorophenylamino, toluidino, anisidino, N-methyl-anilino, Diphenylamino, naphthylamino, 2-pyridylamino, methoxycarbonylamino, phenoxycarbonylamino, acetylamino, benzoylamino, formylamino, pivaloylamino, lauroylamino, carbamoylamino, N,N-dimethylaminocarbonylamino, N,N-diethylaminocarbonylamino, morpholinocarbonylamino, methoxycarbonylamino, ethoxycarbonylamino, t-butoxycarbonylamino, n- Octadecyloxycarbonylamino, N-methyl-methoxycarbonylamino, phenoxycarbonylamino, sulfamoylamino, N,N-dimethylaminosulfonylamino, methylsulfonylamino, butylsulfonylamino, phenylsulfonyl substituted amino groups such as amino; Sulfonamide group, sulfonyl group, carboxyl group, cyano group, sulfo group, hydroxyl group, nitro group, mercapto group, imide group, carbamoyl group, sulfonamide group, phosphonic acid group, phosphoric acid group or carboxyl group, sulfo group, phosphonic group and salts of an acid group and a phosphoric acid group, and these groups may be further substituted in some cases. Moreover, a carboxyl group and a sulfo group may form the salt.
상기 일반식(I-A)에서 n이 2~6일 때, X1은 각각 하기 일반식(1)~(5)와 같이 나타낼 수도 있다. In the general formula (IA), when n is 2 to 6, X 1 may be represented by the following general formulas (1) to (5), respectively.
(상기 일반식(1) 중, Y1은, 단결합, -CR5R6-, -NR7-, 2가의 탄소 원자 수 1~35의 지방족 탄화수소기, 탄소 원자 수 6~35의 방향족 탄화수소기 혹은 탄소 원자 수 2~35의 복소환함유기, 또는 하기 (1-1)~(1-3)으로 나타내는 어느 하나의 치환기를 나타내고, (In the general formula (1), Y 1 is a single bond, -CR 5 R 6 -, -NR 7 -, a divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, and an aromatic hydrocarbon having 6 to 35 carbon atoms. a group or a heterocyclic ring-containing group having 2 to 35 carbon atoms, or any substituent represented by the following (1-1) to (1-3);
상기 지방족 탄화수소기는, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며, The aliphatic hydrocarbon group is, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, or oxygen atoms are not adjacent to each other and these It may be substituted with a combined bonding group,
Z1 및 Z2는, 각각 독립적으로 직접 결합, -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO2-, -SS-, -SO-, -NR7- 또는 -PR7-을 나타내고, Z 1 and Z 2 are each independently a direct bond, -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO 2 -, -SS-, -SO-, -NR 7 - or -PR 7 -,
R5, R6 및 R7은, 각각 독립적으로 수소 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향족 탄화수소기 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기를 나타내며, R 5 , R 6 and R 7 are each independently a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent, or an aromatic hydrocarbon having 6 to 35 carbon atoms which may have a substituent Represents a heterocyclic ring-containing group having 2 to 35 carbon atoms which may have a group or a substituent,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * means to combine with an adjacent group in the * part.)
(상기 식 중, R8은 수소 원자, 또는 치환기를 가지고 있는 경우도 있는 페닐기 혹은 탄소 원자 수 3~10의 시클로알킬기를 나타내고, (In the formula, R 8 represents a hydrogen atom or a optionally substituted phenyl group or a cycloalkyl group having 3 to 10 carbon atoms,
R9는 탄소 원자 수 1~10의 알킬기, 탄소 원자 수 1~10의 알콕시기, 탄소 원자 수 2~10의 알케닐기 또는 할로겐 원자를 나타내며, 상기 알킬기, 알콕시기 및 알케닐기는 치환기를 가지고 있는 경우도 있고, R 9 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms or a halogen atom, wherein the alkyl group, alkoxy group and alkenyl group have a substituent In some cases,
f는 0~5의 정수이며, f is an integer from 0 to 5,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * means to combine with an adjacent group in the * part.)
(*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) (* means combining with an adjacent group in the * part.)
(상기 식 중, R10 및 R11은, 각각 독립적으로 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~10의 알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴옥시기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴티오기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴알케닐기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 7~20의 아릴알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~20의 복소환함유기 또는 할로겐 원자를 나타내고, (Wherein, R 10 and R 11 are each independently an alkyl group having 1 to 10 carbon atoms which may have a substituent, an aryl group having 6 to 20 carbon atoms which may have a substituent, and a substituent An aryloxy group having 6 to 20 carbon atoms which may have a substituent, an arylthio group having 6 to 20 carbon atoms which may have a substituent, and an arylalkyl group having 6 to 20 carbon atoms which may have a substituent represents a nyl group, an arylalkyl group having 7 to 20 carbon atoms which may have a substituent, a heterocycle-containing group having 2 to 20 carbon atoms or a halogen atom which may have a substituent;
상기 알킬기 및 아릴알킬기 중의 메틸렌기는 불포화 결합, -O- 또는 -S-로 치환되어 있는 경우도 있고, The methylene group in the alkyl group and the arylalkyl group may be substituted with an unsaturated bond, -O- or -S-,
R10은 인접하는 R10끼리 환을 형성하고 있는 경우도 있으며, R 10 may form a ring with adjacent R 10 ,
p는 0~4의 수를 나타내고, p represents a number from 0 to 4,
q는 0~8의 수를 나타내며, q represents a number from 0 to 8,
g는 0~4의 수를 나타내고, g represents a number from 0 to 4,
h는 0~4의 수를 나타내며, h represents a number from 0 to 4,
g와 h의 수의 합계는 2~4이고, The sum of the numbers g and h is 2-4,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * means to combine with an adjacent group in the * part.)
(상기 일반식(2) 중, Y11은 3가의 탄소 원자 수 3~35의 지방족 탄화수소기, 탄소 원자 수 3~35의 지환족 탄화수소기, 탄소 원자 수 6~35의 방향족 탄화수소기 혹은 탄소 원자 수 2~35의 복소환함유기를 나타내고, (In the formula (2), Y 11 is a trivalent aliphatic hydrocarbon group having 3 to 35 carbon atoms, an alicyclic hydrocarbon group having 3 to 35 carbon atoms, an aromatic hydrocarbon group having 6 to 35 carbon atoms, or a carbon atom represents a heterocycle-containing group of numbers 2-35,
Z1, Z2 및 Z3은, 각각 독립적으로 직접 결합, -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO2-, -SS-, -SO-, -NR12- 또는 -PR12-를 나타내며, Z 1 , Z 2 and Z 3 are each independently a direct bond, -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO 2 -, -SS-, - SO-, -NR 12- or -PR 12 -,
R12는 수소 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향족 탄화수소기 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기를 나타내고, R 12 is a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent, an aromatic hydrocarbon group having 6 to 35 carbon atoms which may have a substituent or carbon which may have a substituent represents a heterocyclic-containing group having 2 to 35 atoms,
지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며, The aliphatic hydrocarbon group is a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, or oxygen atoms are mutually It may be substituted with a bonding group that is not adjacent to each other and combines them,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * means to combine with an adjacent group in the * part.)
(상기 일반식(3) 중, Y12는 탄소 원자, 또는 4가의 탄소 원자 수 1~35의 지방족 탄화수소기, 탄소 원자 수 6~35의 방향족 탄화수소기 혹은 탄소 원자 수 2~35의 복소환함유기를 나타내고, (In the general formula (3), Y 12 is a carbon atom, or a tetravalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic hydrocarbon group having 6 to 35 carbon atoms, or a heterocyclic ring having 2 to 35 carbon atoms. represents the flag,
상기 지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며, The aliphatic hydrocarbon group is a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, or an oxygen valence In some cases, they are not adjacent to each other and are substituted with a bonding group that combines them,
Z1~Z4는, 각각 독립적으로 상기 일반식(2)에서의 Z1~Z3으로 나타내는 기와 동일한 범위의 기이고, Z 1 to Z 4 are each independently a group in the same range as the group represented by Z 1 to Z 3 in the general formula (2),
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * means to combine with an adjacent group in the * part.)
(상기 일반식(4) 중, Y13은 5가의 탄소 원자 수 2~35의 지방족 탄화수소기, 탄소 원자 수 6~20의 방향족 탄화수소기 또는 탄소 원자 수 2~20의 복소환함유기를 나타내고, (In the general formula (4), Y 13 represents a pentavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms, or a heterocycle-containing group having 2 to 20 carbon atoms,
상기 지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며, The aliphatic hydrocarbon group is a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, or an oxygen valence In some cases, they are not adjacent to each other and are substituted with a bonding group that combines them,
Z1~Z5는, 각각 독립적으로 상기 일반식(2)에서의 Z1~Z3으로 나타내는 기와 동일한 범위의 기이고, Z 1 to Z 5 are each independently a group in the same range as the group represented by Z 1 to Z 3 in the general formula (2),
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * means to combine with an adjacent group in the * part.)
(상기 일반식(5) 중, Y14는 6가의 탄소 원자 수 2~35의 지방족 탄화수소기, 탄소 원자 수 6~35의 방향족 탄화수소기 또는 탄소 원자 수 2~35의 복소환함유기를 나타내고, (In the general formula (5), Y 14 represents a hexavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms, an aromatic hydrocarbon group having 6 to 35 carbon atoms, or a heterocycle-containing group having 2 to 35 carbon atoms,
상기 지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며, The aliphatic hydrocarbon group is a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, or an oxygen valence In some cases, they are not adjacent to each other and are substituted with a bonding group that combines them,
Z1~Z6은, 각각 독립적으로 상기 일반식(2)에서의 Z1~Z3으로 나타내는 기와 동일한 범위의 기이고, Z 1 to Z 6 are each independently a group in the same range as the group represented by Z 1 to Z 3 in the general formula (2),
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * means to combine with an adjacent group in the * part.)
상기 일반식(1)에서, R5, R6 및 R7로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가의 지방족 탄화수소기, 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기를 나타내는 기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있으며, In the general formula (1), the aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent represented by R 5 , R 6 and R 7 is represented by X 1 in the general formula (IA). A predetermined number of carbon atoms among monovalent aliphatic hydrocarbon groups exemplified as n-valent bonding groups, and groups substituted by those exemplified as substituents of groups in which these groups represent an n-valent bonding group represented by X 1 in the above general formula (IA) It can be mentioned that it satisfies
R5, R6 및 R7로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향환함유 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가의 방향환함유 탄화수소기, 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기를 나타내는 기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있고, Examples of the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, which may have a substituent, represented by R 5 , R 6 and R 7 are exemplified as the n-valent bonding group represented by X 1 in the above general formula (IA). Among the monovalent aromatic ring-containing hydrocarbon groups, and groups substituted by those exemplified as substituents of the groups in which these groups represent an n-valent bonding group represented by X 1 in the general formula (IA), those satisfying a predetermined number of carbon atoms and the like,
R5, R6 및 R7로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가의 복소환함유기, 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합을 나타내는 기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있다. As the heterocyclic-containing group having 2 to 35 carbon atoms, which may have a substituent, represented by R 5 , R 6 and R 7 , is one exemplified as the n-valent bonding group represented by X 1 in the general formula (IA). Among the valent heterocyclic-containing groups and groups substituted by those exemplified as substituents of the groups representing the n-valent bond represented by X 1 in the general formula (IA), those satisfying a predetermined number of carbon atoms, etc. can be heard
또한, 상기 일반식(1)에서 Y1로 나타내는, 2가의 탄소 원자 수 1~35의 지방족 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 2가의 지방족 탄화수소기, 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기를 나타내는 기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있고, In addition, as the divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Y 1 in the general formula (1), the divalent aliphatic hydrocarbon group exemplified as the n-valent bonding group represented by X 1 in the general formula (IA). groups and groups substituted by those exemplified as substituents of the groups in which these groups represent an n-valent bonding group represented by X 1 in the general formula (IA) above, those satisfying a predetermined number of carbon atoms;
Y1로 나타내는 2가의 탄소 원자 수 6~35의 방향환함유 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 2가의 방향환함유 탄화수소기, 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기를 나타내는 기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있으며, Examples of the divalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms represented by Y 1 include the divalent aromatic ring-containing hydrocarbon groups exemplified as the n-valent bonding group represented by X 1 in the general formula (IA), and these groups are Among the groups substituted by those exemplified as the substituent of the group representing the n-valent bonding group represented by X 1 in the general formula (IA), those satisfying a predetermined number of carbon atoms are exemplified;
Y1로 나타내는 2가의 탄소 원자 수 2~35의 복소환함유기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 2가의 방향환함유 탄화수소기, 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기를 나타내는 기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있다. As the divalent heterocyclic ring-containing group having 2 to 35 carbon atoms represented by Y 1 , the divalent aromatic ring-containing hydrocarbon group exemplified as the n-valent bonding group represented by X 1 in the general formula (IA), and these groups are the general Among the groups substituted by those exemplified as the substituent of the group representing the n-valent bonding group represented by X 1 in the formula (IA), those satisfying a predetermined number of carbon atoms are exemplified.
상기 (1-1)로 나타내는 치환기에서, R8로 나타내는 탄소 원자 수 3~10의 시클로알킬기로는, 시클로프로필, 시클로부틸, 시클로펜틸, 시클로헵틸, 시클로옥틸 등을 들 수 있고, In the substituent represented by (1-1) above, examples of the cycloalkyl group having 3 to 10 carbon atoms represented by R 8 include cyclopropyl, cyclobutyl, cyclopentyl, cycloheptyl and cyclooctyl;
R9로 나타내는 탄소 원자 수 1~10의 알킬기로는, R1 및 R2로 나타내는 탄소 원자 수 1~40의 알킬기로서 예시한 기 중, 소정의 탄소 원자 수를 충족하는 기 등을 들 수 있으며, Examples of the alkyl group having 1 to 10 carbon atoms represented by R 9 include groups satisfying a predetermined number of carbon atoms among the groups exemplified as the alkyl group having 1 to 40 carbon atoms represented by R 1 and R 2 , ,
R9로 나타내는 탄소 원자 수 1~10의 알콕시기로는, 메틸옥시, 에틸옥시, 프로필옥시, 이소프로필옥시, 부틸옥시, 제2부틸옥시, 제3부틸옥시, 이소부틸옥시, 아밀옥시, 이소아밀옥시, 제3아밀옥시, 헥실옥시, 시클로헥실옥시, 헵틸옥시, 이소헵틸옥시, 제3헵틸옥시, n-옥틸옥시, 이소옥틸옥시, 제3옥틸옥시, 2-에틸헥실옥시, 노닐옥시, 데실옥시 등을 들 수 있고, Examples of the alkoxy group having 1 to 10 carbon atoms represented by R 9 include methyloxy, ethyloxy, propyloxy, isopropyloxy, butyloxy, sec-butyloxy, tert-butyloxy, isobutyloxy, amyloxy, isoamyl Oxy, tertiary amyloxy, hexyloxy, cyclohexyloxy, heptyloxy, isoheptyloxy, tertiary heptyloxy, n-octyloxy, isooctyloxy, tertiary octyloxy, 2-ethylhexyloxy, nonyl oxy and decyloxy;
페닐기, 시클로알킬기, 알킬기, 알콕시기 및 알케닐기의 치환기는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것과 동일하다. The substituents of the phenyl group, the cycloalkyl group, the alkyl group, the alkoxy group and the alkenyl group are the same as those exemplified as the substituents of the n-valent bonding group represented by X 1 in the general formula (IA).
상기 (1-3)으로 나타내는 기에서, R10 및 R11로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~10의 알킬기로는, R1 및 R2로 나타내는 탄소 원자 수 1~40의 알킬기로서 예시한 기 중, 소정의 탄소 원자 수를 충족하는 기 등을 들 수 있고, In the group represented by (1-3) above, the alkyl group having 1 to 10 carbon atoms which may have a substituent represented by R 10 and R 11 includes 1 to 40 carbon atoms represented by R 1 and R 2 . Among the groups exemplified as the alkyl group of
R10 및 R11로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴기로는, R1 및 R2로 나타내는 탄소 원자 수 6~20의 아릴기로서 예시한 기 등을 들 수 있으며, Examples of the optionally substituted aryl group having 6 to 20 carbon atoms represented by R 10 and R 11 include groups exemplified as the aryl group having 6 to 20 carbon atoms represented by R 1 and R 2 . there is,
R10 및 R11로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴옥시기로는, 페닐옥시, 나프틸옥시, 2-메틸페닐옥시, 3-메틸페닐옥시, 4-메틸페닐옥시, 4-비닐페닐옥시, 3-iso-프로필페닐옥시, 4-iso-프로필페닐옥시, 4-부틸페닐옥시, 4-tert-부틸페닐옥시, 4-헥실페닐옥시, 4-시클로헥실페닐옥시, 4-옥틸페닐옥시, 4-(2-에틸헥실)페닐옥시, 2,3-디메틸페닐옥시, 2,4-디메틸페닐옥시, 2,5-디메틸페닐옥시, 2.6-디메틸페닐옥시, 3.4-디메틸페닐옥시, 3.5-디메틸페닐옥시, 2,4-디-tert-부틸페닐옥시, 2,5-디-tert-부틸페닐옥시, 2,6-디-tert-부틸페닐옥시, 2.4-디-tert-펜틸페닐옥시, 2,5-tert-아밀페닐옥시, 4-시클로헥실페닐옥시, 2,4,5-트리메틸페닐옥시, 페로세닐옥시 등의 기를 들 수 있고,Examples of the optionally substituted aryloxy group having 6 to 20 carbon atoms represented by R 10 and R 11 include phenyloxy, naphthyloxy, 2-methylphenyloxy, 3-methylphenyloxy, 4-methylphenyloxy, 4 -Vinylphenyloxy, 3-iso-propylphenyloxy, 4-iso-propylphenyloxy, 4-butylphenyloxy, 4-tert-butylphenyloxy, 4-hexylphenyloxy, 4-cyclohexylphenyloxy, 4- Octylphenyloxy, 4-(2-ethylhexyl)phenyloxy, 2,3-dimethylphenyloxy, 2,4-dimethylphenyloxy, 2,5-dimethylphenyloxy, 2.6-dimethylphenyloxy, 3.4-dimethylphenyloxy , 3.5-dimethylphenyloxy, 2,4-di-tert-butylphenyloxy, 2,5-di-tert-butylphenyloxy, 2,6-di-tert-butylphenyloxy, 2.4-di-tert-pentyl and groups such as phenyloxy, 2,5-tert-amylphenyloxy, 4-cyclohexylphenyloxy, 2,4,5-trimethylphenyloxy, and ferrocenyloxy;
R10 및 R11로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴티오기로는, 상기 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴옥시기의 산소 원자를 유황 원자로 치환한 기 등을 들 수 있고, As the optionally substituted arylthio group having 6 to 20 carbon atoms represented by R 10 and R 11 , the oxygen atom of the optionally substituted aryloxy group having 6 to 20 carbon atoms is replaced with sulfur and groups substituted with atoms;
R10 및 R11로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 8~20의 아릴알케닐기로는, 상기 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴옥시기의 산소 원자를 비닐, 알릴, 1-프로페닐, 이소프로페닐, 2-부테닐, 1,3-부타디에닐, 2-펜테닐, 2-옥테닐 등의 알케닐기로 치환한 기 등을 들 수 있으며, As the optionally substituted arylalkenyl group having 8 to 20 carbon atoms represented by R 10 and R 11 , the oxygen atom of the optionally substituted aryloxy group having 6 to 20 carbon atoms is and groups substituted with alkenyl groups such as vinyl, allyl, 1-propenyl, isopropenyl, 2-butenyl, 1,3-butadienyl, 2-pentenyl, and 2-octenyl;
R10 및 R11로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 7~20의 아릴알킬기로는 R1 및 R2로 나타내는 탄소 원자 수 7~20의 아릴알킬기로서 예시한 기 등을 들 수 있고, Examples of the optionally substituted arylalkyl group having 7 to 20 carbon atoms represented by R 10 and R 11 include the groups exemplified as the arylalkyl group having 7 to 20 carbon atoms represented by R 1 and R 2 . there is,
R10 및 R11로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~20의 복소환함유기로는 R1 및 R2로 나타내는 탄소 원자 수 2~20의 복소환함유기로서 예시한 기 등을 들 수 있다. Examples of the heterocyclic group having 2 to 20 carbon atoms which may have a substituent represented by R 10 and R 11 include the groups exemplified as the heterocyclic group having 2 to 20 carbon atoms represented by R 1 and R 2 , etc. can be heard
상기 일반식(2)에서의 Y11로 나타내는 3가의 탄소 원자 수 1~35의 지방족 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 3가의 지방족 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정 탄소 원자 수를 충족하는 것 등이, Z1, Z2 및 Z3으로 치환된 3가의 기 등을 들 수 있고, Examples of the trivalent aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Y 11 in the general formula (2) include the trivalent aliphatic hydrocarbon group exemplified as the n-valent bonding group represented by X 1 in the general formula (IA); Among the groups substituted by the substituents of the n-valent bonding group represented by X 1 in the general formula (IA), those satisfying a predetermined number of carbon atoms, etc., are substituted with Z 1 , Z 2 and Z 3 . and trivalent groups that have been
상기 일반식(2)에서의 Y11로 나타내는 3가의 탄소 원자 수 3~35의 지환족 탄화수소기로는, 시클로펜틸, 시클로헥실, 시클로헵틸, 시클로옥틸, 시클로데카닐, 1-아다만틸, 2-아다만틸, 노르아다만틸, 2-메틸아다만틸, 노르보르닐, 이소노르보르닐, 퍼하이드로나프틸, 퍼하이드로안트라세닐, 비시클로[1.1.0]부틸, 비시클로[1.1.1]펜틸, 비시클로[2.1.0]펜틸, 비시클로[3.1.0]헥실, 비시클로[2.1.1]헥실, 비시클로[2.2.0]헥실, 비시클로[4.1.0]헵틸, 비시클로[3.2.0]헵틸, 비시클로[3.1.1]헵틸, 비시클로[2.2.1]헵틸, 비시클로[5.1.0]옥틸, 비시클로[4.2.0]옥틸, 비시클로[4.1.1]옥틸, 비시클로[3.3.0]옥틸, 비시클로[3.2.1]옥틸, 비시클로[2.2.2]옥틸, 스피로〔4,4〕노나닐, 스피로〔4,5〕데카닐, 데칼린, 트리시클로데카닐, 테트라시클로도데카닐, 세드롤, 시클로도데카닐 등의 기로부터 유도되는 3가의 기 등을 들 수 있으며, Examples of the trivalent alicyclic hydrocarbon group having 3 to 35 carbon atoms represented by Y 11 in the general formula (2) include cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclodecanyl, 1-adamantyl, 2 -Adamantyl, noradamantyl, 2-methyladamantyl, norbornyl, isonorbornyl, perhydronaphthyl, perhydroanthracenyl, bicyclo[1.1.0]butyl, bicyclo[1.1. 1]pentyl, bicyclo[2.1.0]pentyl, bicyclo[3.1.0]hexyl, bicyclo[2.1.1]hexyl, bicyclo[2.2.0]hexyl, bicyclo[4.1.0]heptyl, bi Cyclo[3.2.0]heptyl, bicyclo[3.1.1]heptyl, bicyclo[2.2.1]heptyl, bicyclo[5.1.0]octyl, bicyclo[4.2.0]octyl, bicyclo[4.1.1 ]octyl, bicyclo[3.3.0]octyl, bicyclo[3.2.1]octyl, bicyclo[2.2.2]octyl, spiro[4,4]nonanyl, spiro[4,5]decanyl, decalin, and trivalent groups derived from groups such as tricyclodecanyl, tetracyclododecanyl, cedrol and cyclododecanyl;
Y11로 나타내는 3가의 탄소 원자 수 6~35의 방향환함유 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 3가의 방향환함유 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있고, As the trivalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms represented by Y 11 , the trivalent aromatic ring-containing hydrocarbon group exemplified as the n-valent bonding group represented by X 1 in the general formula (IA), and these groups are the general Among the groups substituted by those exemplified as the substituent of the n-valent bonding group represented by X 1 in the formula (IA), those satisfying a predetermined number of carbon atoms are exemplified;
Y11로 나타내는 3가의 탄소 원자 수 2~35의 복소환함유기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 3가의 복소환함유기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있다. As the trivalent heterocycle-containing group having 2 to 35 carbon atoms represented by Y 11 , the trivalent heterocycle-containing group exemplified as the n-valent bonding group represented by X 1 in the general formula (IA), and these groups are represented by the general formula ( Among the groups substituted by those exemplified as the substituent of the n-valent bonding group represented by X 1 in IA), those satisfying a predetermined number of carbon atoms are exemplified.
또한, R12로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향족 탄화수소기 및 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기로는, 각각, 상기 일반식(1)에서의 R5, R6 및 R7의 설명에서 예시한 지방족 탄화수소기, 방향환함유 탄화수소기, 복소환함유기를 들 수 있다. In addition, an aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent, an aromatic hydrocarbon group having 6 to 35 carbon atoms which may have a substituent, and a substituent represented by R 12 , which may have a substituent Examples of the heterocycle-containing group having 2 to 35 carbon atoms include the aliphatic hydrocarbon group, aromatic ring-containing hydrocarbon group, and heterocycle-containing group exemplified in the description of R 5 , R 6 and R 7 in the above general formula (1), respectively. can be heard
상기 일반식(3)에서 Y12로 나타내는, 4가의 탄소 원자 수 1~35의 지방족 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 지방족 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 4가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있고, Examples of the tetravalent aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Y 12 in the general formula (3) include the monovalent to trivalent aliphatic groups exemplified as the n-valent bonding group represented by X 1 in the general formula (IA). Among hydrocarbon groups and tetravalent groups derived from groups substituted by those exemplified as substituents of the n-valent bonding group represented by X 1 in the general formula (IA), those satisfying a predetermined number of carbon atoms, etc. can,
Y12로 나타내는 4가의 탄소 원자 수 6~35의 방향환함유 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 방향환함유 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 4가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있으며, Examples of the tetravalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms represented by Y 12 include monovalent to trivalent aromatic ring-containing hydrocarbon groups exemplified as the n-valent bonding group represented by X 1 in the general formula (IA), and these Among the tetravalent groups derived from the group substituted by those exemplified as the substituent of the n-valent bonding group represented by X 1 in the general formula (IA), those satisfying a predetermined number of carbon atoms, etc. are mentioned;
Y12로 나타내는 4가의 탄소 원자 수 2~35의 복소환함유기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 복소환함유기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 4가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있다. Examples of the tetravalent heterocycle-containing group having 2 to 35 carbon atoms represented by Y 12 include the monovalent to trivalent heterocycle-containing groups exemplified as the n-valent bonding group represented by X 1 in the general formula (IA), and these groups are Among the tetravalent groups derived from the groups substituted by those exemplified as the substituents of the n-valent bonding group represented by X 1 in the general formula (IA), those satisfying a predetermined number of carbon atoms are exemplified.
상기 일반식(4)에서의 Y13으로 나타내는 5가의 탄소 원자 수 2~35의 지방족 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 지방족 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 5가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있고, Examples of the pentavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms represented by Y 13 in the general formula (4) include the monovalent to trivalent aliphatic groups exemplified as the n-valent bonding group represented by X 1 in the general formula (IA). Among hydrocarbon groups and pentavalent groups derived from groups substituted by those exemplified as substituents of the n-valent bonding group represented by X 1 in the general formula (IA), those satisfying a predetermined number of carbon atoms, etc. are mentioned. can,
Y14로 나타내는 5가의 탄소 원자 수 6~35의 방향환함유 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 방향환함유 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 5가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있으며, Examples of the pentavalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms represented by Y 14 include monovalent to trivalent aromatic ring-containing hydrocarbon groups exemplified as the n-valent bonding group represented by X 1 in the general formula (IA), and these Among the pentavalent groups derived from the group substituted by those exemplified as the substituent of the n-valent bonding group represented by X 1 in the general formula (IA), those satisfying a predetermined number of carbon atoms are exemplified;
Y14로 나타내는 5가의 탄소 원자 수 2~35의 복소환함유기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 복소환함유기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 5가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있다. Examples of the pentavalent heterocycle-containing group having 2 to 35 carbon atoms represented by Y 14 include the monovalent to trivalent heterocyclic-containing groups exemplified as the n-valent bonding group represented by X 1 in the general formula (IA), and these groups are Among the pentavalent groups derived from the groups substituted by those exemplified as the substituents of the n-valent bonding group represented by X 1 in the general formula (IA), those satisfying a predetermined number of carbon atoms are exemplified.
상기 일반식(5)에서의 Y14로 나타내는 6가의 탄소 원자 수 2~35의 지방족 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 지방족 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 6가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있고, Examples of the hexavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms represented by Y 14 in the general formula (5) include the monovalent to trivalent aliphatic groups exemplified as the n-valent bonding group represented by X 1 in the general formula (IA). Among hydrocarbon groups and hexavalent groups derived from groups substituted by those exemplified as substituents of the n-valent bonding group represented by X 1 in the general formula (IA), those satisfying a predetermined number of carbon atoms, etc. are mentioned. can,
Y14로 나타내는 6가의 탄소 원자 수 6~35의 방향환함유 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 방향환함유 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 6가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있으며, Examples of the hexavalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms represented by Y 14 include monovalent to trivalent aromatic ring-containing hydrocarbon groups exemplified as the n-valent bonding group represented by X 1 in the general formula (IA), and these Among the hexavalent groups in which the group is derived from a group substituted by those exemplified as a substituent of the n-valent bonding group represented by X 1 in the general formula (IA), those satisfying a predetermined number of carbon atoms are exemplified;
Y14로 나타내는 6가의 탄소 원자 수 2~35의 복소환함유기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 복소환함유기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 6가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있다. Examples of the hexavalent heterocyclic-containing group having 2 to 35 carbon atoms represented by Y 14 include the monovalent to trivalent heterocyclic-containing groups exemplified as the n-valent bonding group represented by X 1 in the above general formula (IA), and these groups are Among the hexavalent groups derived from the groups substituted by those exemplified as the substituents of the n-valent bonding group represented by X 1 in the general formula (IA), those satisfying a predetermined number of carbon atoms are exemplified.
상기 일반식(I-A)로 나타내는 화합물 중에서도 하기 일반식(II-1)~(II-3)으로 나타내는 것이 내열성이 높아지므로 바람직하다. Among the compounds represented by the general formula (I-A), those represented by the following general formulas (II-1) to (II-3) are preferable because their heat resistance increases.
(식 중, R82, R83 및 R84는, 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 수산기, 니트로기, 카복실기, 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기 혹은 탄소 원자 수 2~20의 복소환함유기를 나타내고, R1 및 R2는 상기 일반식(I)과 동일하다.) (Wherein, R 82 , R 83 and R 84 are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, or an alkyl group having 1 to 40 carbon atoms which may have a substituent. , an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms or a heterocycle-containing group having 2 to 20 carbon atoms, R 1 and R 2 are the same as those of the general formula (I). )
(식 중, r=2~6이며, X2는, r=2일 때 상기 일반식(1)로 나타내는 기이고, r=3일 때 상기 일반식(2)로 나타내는 기이며, r=4일 때 상기 일반식(3)으로 나타내는 기이고, r=5일 때 상기 일반식(4)이며, r=6일 때 상기 일반식(5)이고, R92 및 R93은, 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 수산기, 니트로기, 카복실기, 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기 혹은 탄소 원자 수 2~20의 복소환함유기를 나타내고, R1 및 R2는 상기 일반식(I)과 동일하다.) (wherein, r=2 to 6, X 2 is a group represented by the general formula (1) when r=2, a group represented by the general formula (2) when r=3, and r=4 a group represented by the above general formula (3) when, r = the fifth day, and the formula (4), r = 6 days when the formula (5) and, r 92 and r 93 are each independently hydrogen An atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, or an alkyl group having 1 to 40 carbon atoms which may have a substituent, an aryl group having 6 to 20 carbon atoms, or an aryl group having 7 to 20 carbon atoms represents an arylalkyl group or a heterocycle-containing group having 2 to 20 carbon atoms, and R 1 and R 2 are the same as in the above general formula (I).)
(식 중, R201, R202, R203, R204, R205, R206, R207, R208은, 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 수산기, 니트로기, 카복실기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기 또는 탄소 원자 수 2~20의 복소환함유기를 나타내고, Y1, Z1 및 Z2는 상기 일반식(1)과 동일하다.) (Wherein, R 201 , R 202 , R 203 , R 204 , R 205 , R 206 , R 207 , and R 208 are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, and a substituent the number is also carbon atom to which the case has 1 to 40 alkyl group, a heterocyclic ring of carbon atoms from 6 to 20 aryl group, a carbon atom number of 7-20 arylalkyl group or 2 to 20 carbon atoms of the monovalent contained, Y 1 , Z 1 and Z 2 are the same as in General Formula (1).)
상기 일반식(II-1)에서의 R82, R83 및 R84로 나타내는 할로겐 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기, 탄소 원자 수 2~20의 복소환함유기로는, 상기 일반식(I)에서의 R1 및 R2의 설명에서 예시한 것을 들 수 있다. A halogen atom represented by R 82 , R 83 and R 84 in the general formula (II-1), an optionally substituted alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, and carbon Examples of the arylalkyl group having 7 to 20 atoms and the heterocyclic group having 2 to 20 carbon atoms include those exemplified in the description of R 1 and R 2 in the general formula (I).
상기 일반식(II-2)에서의 R92 및 R93으로 나타내는 할로겐 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기, 탄소 원자 수 2~20의 복소환함유기로는, 상기 일반식(I)에서의 R1 및 R2의 설명에서 예시한 것을 들 수 있다. A halogen atom represented by R 92 and R 93 in the general formula (II-2), an alkyl group having 1 to 40 carbon atoms which may have a substituent, an aryl group having 6 to 20 carbon atoms, and 7 carbon atoms Examples of the -20 arylalkyl group and the heterocyclic ring-containing group having 2 to 20 carbon atoms include those exemplified in the description of R 1 and R 2 in the general formula (I).
상기 일반식(II-3)에서의 R201, R202, R203, R204, R205, R206, R207, R208로 나타내는 할로겐 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기, 탄소 원자 수 2~20의 복소환함유기로는, 상기 일반식(I)에서의 R1 및 R2의 설명에서 예시한 것을 들 수 있다. A halogen atom represented by R 201 , R 202 , R 203 , R 204 , R 205 , R 206 , R 207 , R 208 in the general formula (II-3), optionally having a substituent, having 1 to carbon atoms As the alkyl group of 40, the aryl group of 6 to 20 carbon atoms, the arylalkyl group of 7 to 20 carbon atoms, and the heterocycle-containing group of 2 to 20 carbon atoms, R 1 and R 2 in the above general formula (I) those exemplified in the description of
상기 일반식(II-1)로 나타내는 화합물 중에서는, Among the compounds represented by the general formula (II-1),
R1이 분기를 가지는 탄소 원자 수 1~8의 알킬기, 특히 t-부틸기이고, R2가 수소 원자인 것; R82, R83 및 R84가, 각각 독립적으로 수소 원자, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~10의 아릴기, 탄소 원자 수 7~12의 아릴알킬기, 탄소 원자 수 1~10의 복소환함유기인 것, 특히, R82, R83 및 R84 중 어느 하나가 탄소 원자 수 1~4의 알킬기 또는 탄소 원자 수 1~10의 복소환함유기인 것이 바람직하다. R 1 is a branched alkyl group having 1 to 8 carbon atoms, particularly t-butyl group, and R 2 is a hydrogen atom; R 82 , R 83 and R 84 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 10 carbon atoms, an arylalkyl group having 7 to 12 carbon atoms, 1 to carbon atoms It is preferable that it is a 10 heterocyclic ring-containing group, especially, that any one of R 82 , R 83 and R 84 is a C1-C4 alkyl group or a C1-C10 heterocyclic-containing group.
상기 일반식(II-2)로 나타내는 화합물 중에서는, Among the compounds represented by the general formula (II-2),
R1이 분기를 가지는 탄소 원자 수 1~8의 알킬기, 특히 t-부틸기이고, R2가 수소 원자인 것; R92 및 R93이, 각각 독립적으로 수소 원자, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~10의 아릴기, 탄소 원자 수 7~12의 아릴알킬기, 탄소 원자 수 1~10의 복소환함유기인 것, 특히, R92 또는 R93이 탄소 원자 수 1~4의 알킬기 또는 탄소 원자 수 1~10의 복소환함유기인 것이 바람직하다. R 1 is a branched alkyl group having 1 to 8 carbon atoms, particularly t-butyl group, and R 2 is a hydrogen atom; R 92 and R 93 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 10 carbon atoms, an arylalkyl group having 7 to 12 carbon atoms, or a compound having 1 to 10 carbon atoms It is preferable that it is a ring-containing group, in particular, that R 92 or R 93 is an alkyl group having 1 to 4 carbon atoms or a heterocyclic group containing 1 to 10 carbon atoms.
X2가 상기 일반식(1)이 되는 경우, Y10이, 유황 원자, 탄소 원자 수 1~20의 알킬렌기, 탄소 원자 수 6~25의 2가의 방향환함유 탄화수소기, 탄소 원자 수 2~21의 2가의 복소환함유기, 2,4,8,10-테트라옥사스피로[5,5]운데칸으로부터 유도되는 2가의 기, 특히, 탄소 원자 수 1~15의 알킬렌기, 탄소 원자 수 6~15의 2가의 방향환함유 탄화수소기, 2,4,8,10-테트라옥사스피로[5,5]운데칸으로부터 유도되는 2가의 기인 것이 바람직하고, When X 2 is the general formula (1), Y 10 is a sulfur atom, an alkylene group having 1 to 20 carbon atoms, a divalent aromatic ring-containing hydrocarbon group having 6 to 25 carbon atoms, and 2 to carbon atoms A divalent heterocyclic-containing group of 21, a divalent group derived from 2,4,8,10-tetraoxaspiro[5,5]undecane, in particular, an alkylene group having 1 to 15 carbon atoms, 6 carbon atoms It is preferable that it is a divalent group derived from a divalent aromatic ring-containing hydrocarbon group of 15, 2,4,8,10-tetraoxaspiro[5,5]undecane,
Z1 및 Z2가 직접 결합, -CO-O-, -O-CO-, 또는 치환기를 가지고 있어도 되는 탄소 원자 수 1~20의 지방족 탄화수소기, 탄소 원자 수 6~10의 방향족 탄화수소기, 특히 치환기를 가지고 있어도 되는 탄소 원자 수 1~8의 지방족 탄화수소기인 것이 바람직하다. Z 1 and Z 2 are a direct bond, -CO-O-, -O-CO-, or an aliphatic hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, an aromatic hydrocarbon group having 6 to 10 carbon atoms, particularly It is preferable that it is a C1-C8 aliphatic hydrocarbon group which may have a substituent.
X2가 상기 일반식(2)가 되는 경우, Y11이, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~10의 아릴기, 탄소 원자 수 7~12의 아릴알킬기 또는 탄소 원자 수 1~10의 복소환함유기로부터 유도되는 3가의 기, 특히, 탄소 원자 수 1~8의 알킬기, 탄소 원자 수 6~9의 아릴기 또는 탄소 원자 수 1~6의 복소환함유기로부터 유도되는 3가의 기인 것이 바람직하고, When X 2 is the formula (2), Y 11 is an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 10 carbon atoms, an arylalkyl group having 7 to 12 carbon atoms, or 1 carbon atom. A trivalent group derived from a ˜10 heterocyclic group, in particular, an alkyl group having 1 to 8 carbon atoms, an aryl group having 6 to 9 carbon atoms, or 3 derived from a heterocyclic group having 1 to 6 carbon atoms It is preferable that it is a group of
Z1, Z2 및 Z3은 Z1 및 Z2와 동일한 것이 바람직하며, Z 1 , Z 2 and Z 3 are preferably the same as Z 1 and Z 2 ,
X2가 상기 일반식(3)이 되는 경우, Y12는, 바람직한 Y11로서 위에서 든 기에 대응하는 4가인 기가 바람직하고, When X 2 is the above general formula (3), Y 12 is preferably a tetravalent group corresponding to the group mentioned above as Y 11 preferred,
Z1~Z4는 Z1 및 Z2와 동일한 것이 바람직하며, Z 1 to Z 4 are preferably the same as Z 1 and Z 2 ,
X2가 상기 일반식(4)가 되는 경우, Y13은, 바람직한 Y11로서 위에서 든 기에 대응하는 5가의 기가 바람직하고, When X 2 is the above general formula (4), Y 13 is preferably a pentavalent group corresponding to the group mentioned above as Y 11 ,
Z1~Z5는 Z1 및 Z2와 동일한 것이 바람직하고, Z 1 to Z 5 are preferably the same as Z 1 and Z 2 ,
X2가 상기 일반식(5)가 되는 경우, Y14는, 바람직한 Y11로서 위에서 든 기에 대응하는 6가인 기가 바람직하고, When X 2 is represented by the general formula (5), Y 14 is preferably a hexavalent group corresponding to the above-mentioned group as preferred Y 11 ,
Z1~Z6은 Z1 및 Z2와 동일한 것이 바람직하다. Z 1 to Z 6 are preferably the same as Z 1 and Z 2 .
상기 일반식(I)로 나타내는 화합물 중, 바람직한 것으로는 하기 화학식으로 나타내는 화합물을 들 수 있는데, 본 발명은 이들 화합물에 제한되지 않는다. Among the compounds represented by the general formula (I), compounds represented by the following formula are preferable, but the present invention is not limited to these compounds.
상기 일반식(I)로 나타내는 치환기를 가지는 화합물의 제조 방법은 특별히 한정되지 않지만, 예를 들면, 일본 공개특허 소57-111375호, 일본 공개특허 평3-173843호, 일본 공개특허 평6-128195호, 일본 공개특허 평7-206771호, 일본 공개특허 평7-252191호, 일본 공표특허 2004-501128의 각 공보에 기재된 방법에 의해 제조된 페놀계 화합물과, 할로겐화 알릴 화합물 등을 반응시켜 얻을 수 있다. Although the manufacturing method of the compound which has a substituent represented by the said general formula (I) is not specifically limited, For example, Unexamined-Japanese-Patent No. 57-111375, Unexamined-Japanese-Patent No. 3-173843, Unexamined-Japanese-Patent No. 6-128195. No. 7-206771, Japanese Patent Application Laid-Open No. Hei 7-252191, and Japanese Patent Application Laid-Open No. 2004-501128 can be obtained by reacting a phenol-based compound prepared by the method described in each of the publications, and an allyl halide compound. have.
상기 일반식(I)로 나타내는 치환기를 가지는 화합물은, 본 발명의 감광성 조성물에 있어서 잠재성 첨가제로 사용할 수 있다. The compound which has a substituent represented by the said general formula (I) can be used as a latent additive in the photosensitive composition of this invention.
상기 잠재성 첨가제란, 상온 혹은 150℃ 이하, 예를 들면 150℃ 이하의 프리 베이킹(pre-baking) 공정에서는 불활성이고, 100~250℃로 가열하거나 산/염기 촉매 존재 하에서 80~200℃로 가열함으로써 보호기가 이탈하여 활성이 되는 것이다. The latent additive is inert in the pre-baking process at room temperature or 150° C. or less, for example, 150° C. or less, and is heated to 100-250° C. or heated to 80-200° C. in the presence of an acid/base catalyst By doing so, the protecting group is released and becomes active.
본 발명의 감광성 조성물에 있어서 잠재성 첨가제로서의 상기 일반식(I)로 나타내는 치환기를 가지는 화합물의 함유량은, 본 발명의 조성물의 고형분 중 0.001~20질량%가 바람직하고, 0.005~5질량%가 보다 바람직하다. In the photosensitive composition of the present invention, the content of the compound having a substituent represented by the general formula (I) as a latent additive is preferably 0.001 to 20 mass%, more preferably 0.005 to 5 mass%, in the solid content of the composition of the present invention. desirable.
본 발명의 감광성 조성물은 광(光) 조사(照射)에 의해 성질이 변하는 조성물이며, 화학반응에 대하여 가용(可溶)이 되는 것에 포지티브형 레지스트, 화학반응에 대하여 불용(不溶)이 되는 것에 네가티브형 레지스트가 있다. 본 발명의 감광성 조성물은, 상기 일반식(I)로 나타내는 치환기를 가지는 화합물을 잠재성 산화방지제로서 포함하는 것 외에, 산가를 가지는 에틸렌성 불포화 결합을 가지는 중합성 화합물 및 광 라디칼 중합 개시제를 필수성분으로 포함한다. The photosensitive composition of the present invention is a composition whose properties change by irradiation with light, a positive resist for being soluble to a chemical reaction, and a negative for being insoluble to a chemical reaction There is a type resist. The photosensitive composition of the present invention contains, as a latent antioxidant, a compound having a substituent represented by the general formula (I), a polymerizable compound having an ethylenically unsaturated bond having an acid value, and a radical photopolymerization initiator as essential components include as
상기 산가를 가지는 에틸렌성 불포화 결합을 가지는 중합성 화합물로는, (메타)아크릴산, α-클로로아크릴산, 이타콘산, 말레산, 시트라콘산, 푸마르산, 히믹산, 크로톤산, 이소크로톤산, 비닐아세트산, 알릴아세트산, 계피산, 소르빈산, 메사콘산, 숙신산모노[2-(메타)아크릴로일옥시에틸], 프탈산모노[2-(메타)아크릴로일옥시에틸], ω-카복시폴리카프로락톤모노(메타)아크릴레이트 등의 양 말단에 카복시기와 수산기를 가지는 폴리머의 모노(메타)아크릴레이트, 하이드록시에틸(메타)아크릴레이트·말레이트(maleate), 하이드록시프로필(메타)아크릴레이트·말레이트, 디시클로펜타디엔·말레이트 혹은 1개의 카복실기와 2개 이상의 (메타)아크릴로일기를 가지는 다관능(메타)아크릴레이트 등의 불포화 다염기산; 페놀 및/또는 크레졸노볼락에폭시 수지, 비페닐 골격, 나프탈렌 골격을 가지는 노볼락에폭시 수지, 비스페놀A노볼락형 에폭시 화합물, 디시클로펜타디엔노볼락형 에폭시 화합물 등의 노볼락형 에폭시 화합물, 다관능 에폭시기를 가지는 폴리페닐메탄형 에폭시 수지, 하기 일반식(III)으로 나타내는 에폭시 화합물 등의 에폭시 수지의 에폭시기에 불포화 일염기산을 작용시킨 수지, 에폭시 수지의 에폭시기에 불포화 일염기산을 작용시키고, 또한 다염기산 무수물을 작용시켜 얻어진 수지, 펜타에리트리톨트리아크릴레이트, 디펜타에리트리톨펜타아크릴레이트 등의 수산기함유 다관능 아크릴레이트와 무수 숙신산, 무수 프탈산, 테트라하이드로 무수 프탈산 등의 이염기산 무수물의 반응물인 산가를 가지는 다관능 아크릴레이트 등을 들 수 있다. Examples of the polymerizable compound having an ethylenically unsaturated bond having an acid value include (meth)acrylic acid, α-chloroacrylic acid, itaconic acid, maleic acid, citraconic acid, fumaric acid, hymic acid, crotonic acid, isocrotonic acid, and vinylacetic acid. , allylacetic acid, cinnamic acid, sorbic acid, mesaconic acid, succinic acid mono[2-(meth)acryloyloxyethyl], phthalic acid mono[2-(meth)acryloyloxyethyl], ω-carboxypolycaprolactone mono(meth) ) Polymer mono (meth) acrylate, hydroxyethyl (meth) acrylate maleate, hydroxypropyl (meth) acrylate maleate, dicy Unsaturated polybasic acids, such as polyfunctional (meth)acrylate which has clopentadiene maleate or one carboxyl group and two or more (meth)acryloyl groups; Novolak epoxy compounds, such as phenol and/or cresol novolac epoxy resins, novolac epoxy resins having a biphenyl skeleton and naphthalene skeleton, bisphenol A novolak epoxy compounds, and dicyclopentadien novolak epoxy compounds, polyfunctional A polyphenylmethane type epoxy resin having an epoxy group, a resin in which an unsaturated monobasic acid is made to act on an epoxy group of an epoxy resin such as an epoxy compound represented by the following general formula (III), an unsaturated monobasic acid is made to act on an epoxy group of an epoxy resin, and A resin obtained by reacting a polybasic acid anhydride, a hydroxyl group-containing polyfunctional acrylate such as pentaerythritol triacrylate and dipentaerythritol pentaacrylate, and an acid value that is a reaction product of a dibasic acid anhydride such as succinic anhydride, phthalic anhydride, and tetrahydrophthalic anhydride and polyfunctional acrylates having
(식 중, X41은 직접 결합, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~4의 알킬렌기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 3~20의 지환식 탄화수소기, -O-, -S-, -SO2-, -SS-, -SO-, -CO-, -OCO- 또는 상기 (1-1)~(1-3)으로 나타내는 치환기를 나타내고, (wherein, X 41 is a direct bond, an alkylene group having 1 to 4 carbon atoms which may have a substituent, an alicyclic hydrocarbon group having 3 to 20 carbon atoms which may have a substituent, -O-, -S-, -SO 2 -, -SS-, -SO-, -CO-, -OCO- or a substituent represented by the above (1-1) to (1-3);
R41, R42, R43 및 R44는, 각각 독립적으로 수소 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~5의 알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~8의 알콕시기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~5의 알케닐기 또는 할로겐 원자를 나타내며, R 41 , R 42 , R 43 and R 44 are each independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms which may have a substituent, or an alkoxy group having 1 to 8 carbon atoms which may have a substituent Represents an alkenyl group or halogen atom having 2 to 5 carbon atoms which may have a group or a substituent,
m은 0~10의 정수이다.) m is an integer from 0 to 10.)
이들 산가를 가지는 에틸렌성 불포화 결합을 가지는 중합성 화합물은, 단독으로 또는 2종 이상을 혼합하여 사용할 수 있고, 또한, 산가를 가지지 않는 에틸렌성 불포화 결합을 가지는 중합성 화합물과 조합하여 사용할 수 있다. 2종 이상을 혼합하여 사용하는 경우에는 그들을 미리 공중합하여 공중합체로 사용하여도 된다. The polymeric compound which has an ethylenically unsaturated bond which has these acid values can be used individually or in mixture of 2 or more types, Moreover, it can use in combination with the polymeric compound which has an ethylenically unsaturated bond which does not have an acid value. When using 2 or more types in mixture, you may copolymerize them beforehand and you may use them as a copolymer.
본 발명의 감광성 조성물에서, 산가를 가지는 에틸렌성 불포화 결합을 가지는 중합성 화합물의 함유량은, 본 발명의 조성물의 고형분 중 20~80질량%가 바람직하고, 고형분 중의 30~70질량%가 더 바람직하다. In the photosensitive composition of the present invention, the content of the polymerizable compound having an ethylenically unsaturated bond having an acid value is preferably 20 to 80 mass %, more preferably 30 to 70 mass % in the solid content of the composition of the present invention. .
상기 산가를 가지지 않는 에틸렌성 불포화 결합을 가지는 중합성 화합물로는, 예를 들면, (메타)아크릴산-2-하이드록시에틸, (메타)아크릴산-2-하이드록시프로필, (메타)아크릴산글리시딜, 하기 화합물 No.A1~No.A4, (메타)아크릴산메틸, (메타)아크릴산부틸, (메타)아크릴산이소부틸, (메타)아크릴산-t-부틸, (메타)아크릴산시클로헥실, (메타)아크릴산n-옥틸, (메타)아크릴산이소옥틸, (메타)아크릴산이소노닐, (메타)아크릴산스테아릴, (메타)아크릴산라우릴, (메타)아크릴산메톡시에틸, (메타)아크릴산디메틸아미노메틸, (메타)아크릴산디메틸아미노에틸, (메타)아크릴산아미노프로필, (메타)아크릴산디메틸아미노프로필, (메타)아크릴산에톡시에틸, (메타)아크릴산폴리(에톡시)에틸, (메타)아크릴산부톡시에톡시에틸, (메타)아크릴산에틸헥실, (메타)아크릴산페녹시에틸, (메타)아크릴산테트라하이드로푸릴, (메타)아크릴산비닐, (메타)아크릴산알릴, (메타)아크릴산벤질, 에틸렌글리콜디(메타)아크릴레이트, 디에틸렌글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 폴리에틸렌글리콜디(메타)아크릴레이트, 프로필렌글리콜디(메타)아크릴레이트, 1,4-부탄디올디(메타)아크릴레이트, 1,6-헥산디올디(메타)아크릴레이트, 트리메틸올에탄트리(메타)아크릴레이트, 트리메틸올프로판트리(메타)아크릴레이트, 디펜타에리트리톨펜타(메타)아크릴레이트, 디펜타에리트리톨헥사(메타)아크릴레이트, 펜타에리트리톨테트라(메타)아크릴레이트, 펜타에리트리톨트리(메타)아크릴레이트, 트리시클로데칸디메틸올디(메타)아크릴레이트, 트리[(메타)아크릴로일에틸]이소시아누레이트, 폴리에스테르(메타)아크릴레이트 올리고머 등의 불포화 일염기산 및 다가 알코올 또는 다가 페놀의 에스테르; (메타)아크릴산아연, (메타)아크릴산마그네슘 등의 불포화 다염기산의 금속염; 말레산 무수물, 이타콘산 무수물, 시트라콘산 무수물, 메틸테트라하이드로 무수 프탈산, 테트라하이드로 무수 프탈산, 트리알킬테트라하이드로 무수 프탈산, 5-(2,5-디옥소테트라하이드로푸릴)-3-메틸-3-시클로헥센-1,2-디카복시산 무수물, 트리알킬테트라하이드로 무수 프탈산-무수 말레산 부가물, 도데세닐 무수 숙신산, 무수 메틸히믹산 등의 불포화 다염기산의 산무수물; (메타)아크릴아미드, 메틸렌비스-(메타)아크릴아미드, 디에틸렌트리아민트리스(메타)아크릴아미드, 크실릴렌비스(메타)아크릴아미드, α-클로로아크릴아미드, N-2-하이드록시에틸(메타)아크릴아미드 등의 불포화 일염기산 및 다가 아민의 아미드; 아크롤레인 등의 불포화 알데히드; (메타)아크릴로니트릴, α-클로로아크릴로니트릴, 시안화 비닐리덴, 시안화 알릴 등의 불포화 니트릴; 스티렌, 4-메틸스티렌, 4-에틸스티렌, 4-메톡시스티렌, 4-하이드록시스티렌, 4-클로로스티렌, 디비닐벤젠, 비닐톨루엔, 비닐 안식향산, 비닐페놀, 비닐술폰산, 4-비닐벤젠술폰산, 비닐벤질메틸에테르, 비닐벤질글리시딜에테르 등의 불포화 방향족 화합물; 메틸비닐케톤 등의 불포화 케톤; 비닐아민, 알릴아민, N-비닐피롤리돈, 비닐피페리딘 등의 불포화 아민 화합물; 비닐메틸에테르, 비닐에틸에테르, n-부틸비닐에테르, 이소부틸비닐에테르, 알릴글리시딜에테르 등의 비닐에테르; 말레이미드, N-페닐말레이미드, N-시클로헥실말레이미드 등의 불포화 이미드류; 인덴, 1-메틸인덴 등의 인덴류; 1,3-부타디엔, 이소프렌, 클로로프렌 등의 지방족 공역 디엔류; 폴리스티렌, 폴리메틸(메타)아크릴레이트, 폴리-n-부틸(메타)아크릴레이트, 폴리실록산 등의 중합체 분자쇄의 말단에 모노(메타)아크릴로일기를 가지는 매크로 모노머류; (메타)아크릴로니트릴, 에틸렌, 프로필렌, 부틸렌, 염화비닐, 아세트산비닐 등의 그 밖의 비닐 화합물, 및 폴리메틸메타크릴레이트 매크로 모노머, 폴리스티렌 매크로 모노머 등의 매크로 모노머류, 트리시클로데칸 골격의 모노메타크릴레이트, N-페닐말레이미드, 메타크릴로일옥시메틸-3-에틸옥세탄 등과, (메타)아크릴산의 공중합체 및 이들에 쇼와 덴코사(주) 제품 카렌즈 MOI, AOI와 같은 불포화 결합을 가지는 이소시아네이트 화합물을 반응시킨 (메타)아크릴산의 공중합체나, 비닐클로라이드, 비닐리덴클로라이드, 디비닐숙시네이트, 디알릴프탈레이트, 트리알릴포스파이트, 트리알릴이소시아누레이트, 비닐티오에테르, 비닐이미다졸, 비닐옥사졸린, 비닐카바졸, 비닐피롤리돈, 비닐피리딘, 수산기함유 비닐 모노머 및 폴리이소시아네이트 화합물의 비닐우레탄 화합물, 수산기함유 비닐 모노머 및 폴리에폭시 화합물의 비닐에폭시 화합물, 펜타에리트리톨트리아크릴레이트, 디펜타에리트리톨펜타아크릴레이트 등의 수산기함유 다관능 아크릴레이트와 톨릴렌디이소시아네이트, 헥사메틸렌디이소시아네이트 등의 다관능 이소시아네이트의 반응물 등을 들 수 있다. Examples of the polymerizable compound having an ethylenically unsaturated bond having no acid value include (meth)acrylic acid-2-hydroxyethyl, (meth)acrylic acid-2-hydroxypropyl, (meth)acrylic acid glycidyl. , the following compounds No. A1 to No. A4, (meth) methyl acrylate, (meth) acrylate, (meth) acrylate isobutyl, (meth) acrylic acid-t-butyl, (meth) acrylic acid cyclohexyl, (meth) acrylic acid n-octyl, (meth) acrylate isooctyl, (meth) acrylate isononyl, (meth) acrylate stearyl, (meth) acrylate lauryl, (meth) acrylate methoxyethyl, (meth) acrylate dimethylaminomethyl, ( Dimethylaminoethyl (meth)acrylate, aminopropyl (meth)acrylate, dimethylaminopropyl (meth)acrylate, ethoxyethyl (meth)acrylate, poly(ethoxy)ethyl (meth)acrylate, butoxyethoxyethyl (meth)acrylate , (meth) ethylhexyl acrylate, (meth) acrylate phenoxyethyl, (meth) acrylate tetrahydrofuryl, (meth) acrylate vinyl, (meth) acrylate allyl, (meth) acrylate benzyl, ethylene glycol di (meth) acrylate , Diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate , 1,6-hexanediol di (meth) acrylate, trimethylolethane tri (meth) acrylate, trimethylol propane tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, tricyclodecanedimethyloldi(meth)acrylate, tri[(meth)acryloylethyl]isocyanu esters of unsaturated monobasic acids and polyhydric alcohols or polyhydric phenols such as esters and polyester (meth)acrylate oligomers; metal salts of unsaturated polybasic acids such as zinc (meth)acrylate and magnesium (meth)acrylate; Maleic anhydride, itaconic anhydride, citraconic anhydride, methyltetrahydrophthalic anhydride, tetrahydrophthalic anhydride, trialkyltetrahydrophthalic anhydride, 5-(2,5-dioxotetrahydrofuryl)-3-methyl-3 - Acid anhydrides of unsaturated polybasic acids, such as cyclohexene-1,2-dicarboxylic anhydride, trialkyltetrahydrophthalic anhydride-maleic anhydride, dodecenyl succinic anhydride, and methylhimic anhydride; (meth)acrylamide, methylenebis-(meth)acrylamide, diethylenetriaminetris(meth)acrylamide, xylylenebis(meth)acrylamide, α-chloroacrylamide, N-2-hydroxyethyl ( amides of unsaturated monobasic acids and polyvalent amines such as meth)acrylamide; unsaturated aldehydes such as acrolein; unsaturated nitriles such as (meth)acrylonitrile, α-chloroacrylonitrile, vinylidene cyanide, and allyl cyanide; Styrene, 4-methylstyrene, 4-ethylstyrene, 4-methoxystyrene, 4-hydroxystyrene, 4-chlorostyrene, divinylbenzene, vinyltoluene, vinylbenzoic acid, vinylphenol, vinylsulfonic acid, 4-vinylbenzenesulfonic acid unsaturated aromatic compounds such as vinyl benzyl methyl ether and vinyl benzyl glycidyl ether; unsaturated ketones such as methyl vinyl ketone; unsaturated amine compounds such as vinylamine, allylamine, N-vinylpyrrolidone and vinylpiperidine; vinyl ethers such as vinyl methyl ether, vinyl ethyl ether, n-butyl vinyl ether, isobutyl vinyl ether, and allyl glycidyl ether; unsaturated imides such as maleimide, N-phenylmaleimide, and N-cyclohexylmaleimide; indene, such as indene and 1-methylindene; aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; macromonomers having a mono(meth)acryloyl group at the terminal of the polymer molecular chain, such as polystyrene, polymethyl(meth)acrylate, poly-n-butyl(meth)acrylate, and polysiloxane; Other vinyl compounds such as (meth)acrylonitrile, ethylene, propylene, butylene, vinyl chloride, and vinyl acetate, and macromonomers such as polymethylmethacrylate macromonomer and polystyrene macromonomer, tricyclodecane skeleton mono Copolymers of methacrylate, N-phenylmaleimide, methacryloyloxymethyl-3-ethyloxetane, etc., and (meth)acrylic acid A copolymer of (meth)acrylic acid reacted with an isocyanate compound having a bond, vinyl chloride, vinylidene chloride, divinyl succinate, diallyl phthalate, triallyl phosphite, triallyl isocyanurate, vinyl thioether, vinyl Imidazole, vinyloxazoline, vinylcarbazole, vinylpyrrolidone, vinylpyridine, vinylurethane compounds of hydroxyl group-containing vinyl monomers and polyisocyanate compounds, vinylepoxy compounds of hydroxyl group-containing vinyl monomers and polyepoxy compounds, pentaerythritol tri The reaction product of polyfunctional acrylates containing hydroxyl groups, such as acrylate and dipentaerythritol pentaacrylate, and polyfunctional isocyanate, such as tolylene diisocyanate and hexamethylene diisocyanate, etc. are mentioned.
산가 조정하여 본 발명의 감광성 조성물의 현상성을 개량하기 위해, 상기 산가를 가지는 에틸렌성 불포화 결합을 가지는 중합성 화합물과 함께, 또한 단관능 또는 다관능 에폭시 화합물을 사용할 수 있다. 상기 산가를 가지는 에틸렌성 불포화 결합을 가지는 중합성 화합물은, 고형분의 산가가 5~120㎎KOH/g의 범위인 것이 바람직하고, 단관능 또는 다관능 에폭시 화합물의 사용량은 상기 산가를 충족하도록 선택하는 것이 바람직하다. In order to improve the developability of the photosensitive composition of this invention by adjusting an acid value, with the polymeric compound which has an ethylenically unsaturated bond which has the said acid value, a monofunctional or polyfunctional epoxy compound can also be used. The polymerizable compound having an ethylenically unsaturated bond having the acid value is preferably in the range of 5 to 120 mgKOH/g with an acid value of solid content, and the amount of monofunctional or polyfunctional epoxy compound used is selected to satisfy the acid value it is preferable
상기 단관능 에폭시 화합물로는, 글리시딜메타크릴레이트, 메틸글리시딜에테르, 에틸글리시딜에테르, 프로필글리시딜에테르, 이소프로필글리시딜에테르, 부틸글리시딜에테르, 이소부틸글리시딜에테르, t-부틸글리시딜에테르, 펜틸글리시딜에테르, 헥실글리시딜에테르, 헵틸글리시딜에테르, 옥틸글리시딜에테르, 노닐글리시딜에테르, 데실글리시딜에테르, 운데실글리시딜에테르, 도데실글리시딜에테르, 트리데실글리시딜에테르, 테트라데실글리시딜에테르, 펜타데실글리시딜에테르, 헥사데실글리시딜에테르, 2-에틸헥실글리시딜에테르, 알릴글리시딜에테르, 프로파르길글리시딜에테르, p-메톡시에틸글리시딜에테르, 페닐글리시딜에테르, p-메톡시글리시딜에테르, p-부틸페놀글리시딜에테르, 크레질글리시딜에테르, 2-메틸크레질글리시딜에테르, 4-노닐페닐글리시딜에테르, 벤질글리시딜에테르, p-쿠밀페닐글리시딜에테르, 트리틸글리시딜에테르, 2,3-에폭시프로필메타크릴레이트, 에폭시화 대두유, 에폭시화 아마인유, 글리시딜부틸레이트, 비닐시클로헥산모노옥시드, 1,2-에폭시-4-비닐시클로헥산, 스티렌옥시드, 피넨옥시드, 메틸스티렌옥시드, 시클로헥센옥시드, 프로필렌옥시드 등을 들 수 있다. Examples of the monofunctional epoxy compound include glycidyl methacrylate, methyl glycidyl ether, ethyl glycidyl ether, propyl glycidyl ether, isopropyl glycidyl ether, butyl glycidyl ether, isobutyl glycidyl ether, Dil ether, t-butyl glycidyl ether, pentyl glycidyl ether, hexyl glycidyl ether, heptyl glycidyl ether, octyl glycidyl ether, nonyl glycidyl ether, decyl glycidyl ether, undecyl glycidyl ether Cidyl ether, dodecyl glycidyl ether, tridecyl glycidyl ether, tetradecyl glycidyl ether, pentadecyl glycidyl ether, hexadecyl glycidyl ether, 2-ethylhexyl glycidyl ether, allyl glycidyl ether Cydyl ether, propargyl glycidyl ether, p-methoxyethyl glycidyl ether, phenyl glycidyl ether, p-methoxy glycidyl ether, p-butylphenol glycidyl ether, crezyl glycidyl ether Dil ether, 2-methylcrezyl glycidyl ether, 4-nonylphenyl glycidyl ether, benzyl glycidyl ether, p-cumylphenyl glycidyl ether, trityl glycidyl ether, 2,3-epoxypropyl Methacrylate, epoxidized soybean oil, epoxidized linseed oil, glycidyl butyrate, vinylcyclohexane monooxide, 1,2-epoxy-4-vinylcyclohexane, styrene oxide, pinene oxide, methylstyrene oxide , cyclohexene oxide, propylene oxide, and the like.
상기 다관능 에폭시 화합물로는, 비스페놀형 에폭시 화합물 및 글리시딜에테르류로 이루어지는 군에서 선택되는 1종 이상을 사용하면, 특성이 한층 양호한 감광성 조성물을 얻을 수 있으므로 바람직하다. 상기 비스페놀형 에폭시 화합물로는, 상기 일반식(III)으로 나타내는 에폭시 화합물을 사용할 수 있는 것 외에, 예를 들면, 수소첨가 비스페놀형 에폭시 화합물 등의 비스페놀형 에폭시 화합물도 사용할 수 있다. 상기 글리시딜에테르류로는, 에틸렌글리콜디글리시딜에테르, 프로필렌글리콜디글리시딜에테르, 1,4-부탄디올디글리시딜에테르, 1,6-헥산디올디글리시딜에테르, 1,8-옥탄디올디글리시딜에테르, 1,10-데칸디올디글리시딜에테르, 2,2-디메틸-1,3-프로판디올디글리시딜에테르, 디에틸렌글리콜디글리시딜에테르, 트리에틸렌글리콜디글리시딜에테르, 테트라에틸렌글리콜디글리시딜에테르, 헥사에틸렌글리콜디글리시딜에테르, 1,4-시클로헥산디메탄올디글리시딜에테르, 1,1,1-트리(글리시딜옥시메틸)프로판, 1,1,1-트리(글리시딜옥시메틸)에탄, 1,1,1-트리(글리시딜옥시메틸)메탄, 1,1,1,1-테트라(글리시딜옥시메틸)메탄을 들 수 있다. As said polyfunctional epoxy compound, when 1 or more types chosen from the group which consists of a bisphenol-type epoxy compound and glycidyl ethers are used, since the photosensitive composition with a further favorable characteristic can be obtained, it is preferable. As said bisphenol-type epoxy compound, besides being able to use the epoxy compound represented by the said General formula (III), bisphenol-type epoxy compounds, such as a hydrogenated bisphenol-type epoxy compound, can also be used, for example. Examples of the glycidyl ethers include ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, 1,4-butanediol diglycidyl ether, 1,6-hexanediol diglycidyl ether, 1, 8-octanediol diglycidyl ether, 1,10-decanediol diglycidyl ether, 2,2-dimethyl-1,3-propanediol diglycidyl ether, diethylene glycol diglycidyl ether, tri Ethylene glycol diglycidyl ether, tetraethylene glycol diglycidyl ether, hexaethylene glycol diglycidyl ether, 1,4-cyclohexanedimethanol diglycidyl ether, 1,1,1-tri(glycidyl ether) Dyloxymethyl) propane, 1,1,1-tri(glycidyloxymethyl)ethane, 1,1,1-tri(glycidyloxymethyl)methane, 1,1,1,1-tetra(glycy diloxymethyl)methane.
그 외, 페놀노볼락형 에폭시 화합물, 비페닐노볼락형 에폭시 화합물, 크레졸노볼락형 에폭시 화합물, 비스페놀A노볼락형 에폭시 화합물, 디시클로펜타디엔노볼락형 에폭시 화합물 등의 노볼락형 에폭시 화합물; 3,4-에폭시-6-메틸시클로헥실메틸-3,4-에폭시-6-메틸시클로헥산카복실레이트, 3,4-에폭시시클로헥실메틸-3,4-에폭시시클로헥산카복실레이트, 1-에폭시에틸-3,4-에폭시시클로헥산 등의 지환식 에폭시 화합물; 프탈산디글리시딜에스테르, 테트라하이드로프탈산디글리시딜에스테르, 다이머산글리시딜에스테르 등의 글리시딜에스테르류; 테트라글리시딜디아미노디페닐메탄, 트리글리시딜-p-아미노페놀, N,N-디글리시딜아닐린 등의 글리시딜아민류; 1,3-디글리시딜-5,5-디메틸히단토인, 트리글리시딜이소시아누레이트 등의 복소환식 에폭시 화합물; 디시클로펜타디엔디옥시드 등의 디옥시드 화합물; 나프탈렌형 에폭시 화합물, 트리페닐메탄형 에폭시 화합물, 디시클로펜타디엔형 에폭시 화합물 등을 사용할 수도 있다. In addition, novolak-type epoxy compounds, such as a phenol novolak-type epoxy compound, a biphenyl novolak-type epoxy compound, a cresol novolak-type epoxy compound, a bisphenol A novolak-type epoxy compound, and a dicyclopentadien novolak-type epoxy compound; 3,4-epoxy-6-methylcyclohexylmethyl-3,4-epoxy-6-methylcyclohexanecarboxylate, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 1-epoxyethyl alicyclic epoxy compounds such as -3,4-epoxycyclohexane; glycidyl esters such as phthalic acid diglycidyl ester, tetrahydrophthalic acid diglycidyl ester and dimer acid glycidyl ester; glycidylamines such as tetraglycidyldiaminodiphenylmethane, triglycidyl-p-aminophenol, and N,N-diglycidylaniline; heterocyclic epoxy compounds such as 1,3-diglycidyl-5,5-dimethylhydantoin and triglycidyl isocyanurate; Dioxide compounds, such as dicyclopentadienedioxide; A naphthalene type epoxy compound, a triphenylmethane type epoxy compound, a dicyclopentadiene type epoxy compound, etc. can also be used.
상기 광 라디칼 중합 개시제는 광 조사를 받음으로써 라디칼 중합을 개시시키는 것이 가능해지는 화합물이면 되고, 예를 들면, 아세토페논계 화합물, 벤질계 화합물, 벤조페논계 화합물, 티옥산톤계 화합물 등의 케톤계 화합물, 옥심계 화합물 등을 바람직한 것으로서 예시할 수 있다. The radical photopolymerization initiator may be any compound capable of initiating radical polymerization upon exposure to light, for example, ketone compounds such as acetophenone compounds, benzyl compounds, benzophenone compounds, and thioxanthone compounds. , an oxime-based compound, and the like can be exemplified as preferable.
아세토페논계 화합물로는 예를 들면, 디에톡시아세토페논, 2-하이드록시-2-메틸-1-페닐프로판-1-온, 4'-이소프로필-2-하이드록시-2-메틸프로피오페논, 2-하이드록시메틸-2-메틸프로피오페논, 2,2-디메톡시-1,2-디페닐에탄-1-온, p-디메틸아미노아세토페논, p-터셔리(tertiary)부틸디클로로아세토페논, p-터셔리부틸트리클로로아세토페논, p-아지드벤잘아세토페논, 1-하이드록시시클로헥실페닐케톤, 2-메틸-1-[4-(메틸티오)페닐]-2-모르폴리노프로파논-1,2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)-부타논-1, 벤조인, 벤조인메틸에테르, 벤조인에틸에테르, 벤조인이소프로필에테르, 벤조인-n-부틸에테르, 벤조인이소부틸에테르, 1-[4-(2-하이드록시에톡시)-페닐]-2-하이드록시-2-메틸-1-프로판-1-온 등을 들 수 있다. Examples of the acetophenone-based compound include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, and 4'-isopropyl-2-hydroxy-2-methylpropiophenone. , 2-hydroxymethyl-2-methylpropiophenone, 2,2-dimethoxy-1,2-diphenylethan-1-one, p-dimethylaminoacetophenone, p-tertiary butyldichloroaceto Phenone, p-tertbutyltrichloroacetophenone, p-azidebenzalacetophenone, 1-hydroxycyclohexylphenylketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinoff Ropanone-1,2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin phosphorus-n-butyl ether, benzoin isobutyl ether, 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-2-methyl-1-propan-1-one, and the like. have.
벤질계 화합물로는 벤질, 아니실 등을 들 수 있다. Benzyl, anisyl, etc. are mentioned as a benzyl-type compound.
벤조페논계 화합물로는, 예를 들면, 벤조페논, o-벤조일 안식향산 메틸, 미힐러케톤, 4,4'-비스디에틸아미노벤조페논, 4,4'-디클로로벤조페논, 4-벤조일-4'-메틸디페닐술피드 등을 들 수 있다. Examples of the benzophenone compound include benzophenone, o-benzoyl methyl benzoate, Michler ketone, 4,4'-bisdiethylaminobenzophenone, 4,4'-dichlorobenzophenone, 4-benzoyl-4 '-methyldiphenyl sulfide, etc. are mentioned.
티옥산톤계 화합물로는 티옥산톤, 2-메틸티옥산톤, 2-에틸티옥산톤, 2-클로로티옥산톤, 2-이소프로필티옥산톤, 2,4-디에틸티옥산톤 등을 들 수 있다. As thioxanthone-based compounds, thioxanthone, 2-methylthioxanthone, 2-ethylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, 2,4-diethylthioxanthone, etc. can be heard
옥심계 화합물로는, 특히, 하기 일반식(IV) 또는 (V)로 나타내는 화합물이 감도 및 내열성의 점에서 바람직하다. As the oxime-based compound, a compound represented by the following general formula (IV) or (V) is particularly preferred in terms of sensitivity and heat resistance.
(식 중, R51 및 R52는, 각각 독립적으로 수소 원자, 시아노기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~20의 알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~30의 아릴기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 7~30의 아릴알킬기 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~20의 복소환함유기를 나타내고, (Wherein, R 51 and R 52 are each independently a hydrogen atom, a cyano group, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkyl group having 6 to 30 carbon atoms which may have a substituent an aryl group, an arylalkyl group having 7 to 30 carbon atoms which may have a substituent, or a heterocyclic ring-containing group having 2 to 20 carbon atoms which may have a substituent;
R53 및 R54는, 각각 독립적으로 할로겐 원자, 니트로기, 시아노기, 수산기, 카복실기, R55, OR56, SR57, NR58R59, COR60, SOR61, SO2R62 또는 CONR63R64를 나타내고, R53 및 R54는 서로 결합하여 환을 형성하고 있는 경우도 있으며, R 53 and R 54 are each independently a halogen atom, a nitro group, a cyano group, a hydroxyl group, a carboxyl group, R 55 , OR 56 , SR 57 , NR 58 R 59 , COR 60 , SOR 61 , SO 2 R 62 or CONR 63 R 64 , R 53 and R 54 may be bonded to each other to form a ring,
R55, R56, R57, R58, R59, R60, R61, R62, R63 및 R64는, 각각 독립적으로 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~20의 알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~30의 아릴기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 7~30의 아릴알킬기 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~20의 복소환함유기를 나타내고, R 55 , R 56 , R 57 , R 58 , R 59 , R 60 , R 61 , R 62 , R 63 and R 64 are each independently an optionally substituted alkyl group having 1 to 20 carbon atoms; An aryl group having 6 to 30 carbon atoms which may have a substituent, an arylalkyl group having 7 to 30 carbon atoms which may have a substituent, or a heterocyclic ring having 2 to 20 carbon atoms which may have a substituent represents a containing group,
X3은 산소 원자, 유황 원자, 셀렌 원자, CR75R76, CO, NR77 또는 PR78을 나타내며, X 3 represents an oxygen atom, a sulfur atom, a selenium atom, CR 75 R 76 , CO, NR 77 or PR 78 ;
X4는 단결합 또는 CO를 나타내고, X 4 represents a single bond or CO,
R75~R78은, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~30의 아릴기 또는 탄소 원자 수 7~30의 아릴알킬기를 나타내고, 상기 알킬기 또는 아릴알킬기 중의 메틸렌기는, 할로겐 원자, 니트로기, 시아노기, 수산기, 카복실기 또는 복소환함유기로 치환되어 있는 경우도 있으며, -O-로 치환되어 있는 경우도 있고, R 75 to R 78 represent an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms or an arylalkyl group having 7 to 30 carbon atoms, and the methylene group in the alkyl group or arylalkyl group is a halogen atom; It may be substituted with a nitro group, a cyano group, a hydroxyl group, a carboxyl group or a heterocyclic group, or may be substituted with -O-;
R53 및 R54는, 각각 독립적으로, 인접하는 어느 쪽인가의 벤젠 환과 하나가 되어 환을 형성하고 있는 경우도 있으며, R 53 and R 54 may each independently form a ring with one of the adjacent benzene rings,
a는 0~4의 정수를 나타내고, a represents an integer of 0 to 4,
b는 0~5의 정수를 나타낸다.) b represents an integer of 0-5.)
(식 중, R101 및 R102는, 각각 독립적으로 R111, OR111, COR111, SR111, CONR112R113 또는 CN을 나타내고, (Wherein, R 101 and R 102 each independently represent R 111 , OR 111 , COR 111 , SR 111 , CONR 112 R 113 or CN,
R111, R112 및 R113은, 각각 독립적으로 수소 원자, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~30의 아릴기, 탄소 원자 수 7~30의 아릴알킬기 또는 탄소 원자 수 2~20의 복소환함유기를 나타내며, R 111 , R 112 and R 113 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or an arylalkyl group having 2 to carbon atoms 20 represents a heterocycle-containing group,
R111, R112 및 R113으로 나타내는 기의 수소 원자는, 또한 R121, OR121, COR121, SR121, NR122R123, CONR122R123, -NR122-OR123, -NCOR122-OCOR123, NR122COR121, OCOR121, COOR121, SCOR121, OCSR121, COSR121, CSOR121, 수산기, 니트로기, CN 또는 할로겐 원자로 치환되어 있는 경우도 있고, The hydrogen atom of the group represented by R 111 , R 112 and R 113 is further R 121 , OR 121 , COR 121 , SR 121 , NR 122 R 123 , CONR 122 R 123 , -NR 122 -OR 123 , -NCOR 122 - OCOR 123 , NR 122 COR 121 , OCOR 121 , COOR 121 , SCOR 121 , OCSR 121 , COSR 121 , CSOR 121 , may be substituted with a hydroxyl group, a nitro group, CN or a halogen atom;
R121, R122 및 R123은, 각각 독립적으로 수소 원자, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~30의 아릴기, 탄소 원자 수 7~30의 아릴알킬기 또는 탄소 원자 수 2~20의 복소환함유기를 나타내며, R 121 , R 122 and R 123 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or an arylalkyl group having 2 to carbon atoms 20 represents a heterocycle-containing group,
R121, R122 및 R123으로 나타내는 기의 수소 원자는 또한 수산기, 니트로기, CN, 할로겐 원자, 수산기 또는 카복실기로 치환되어 있는 경우도 있고, The hydrogen atom of the group represented by R 121 , R 122 and R 123 may be further substituted with a hydroxyl group, a nitro group, CN, a halogen atom, a hydroxyl group or a carboxyl group,
R111, R112, R113, R121, R122 및 R123으로 나타내는 기의 알킬렌 부분은, -O-, -S-, -COO-, -OCO-, -NR124-, -NR124COO-, -OCONR124-, -SCO-, -COS-, -OCS- 또는 -CSO-에 의해 산소 원자가 서로 이웃하지 않는 조건으로 1~5회 치환되어 있는 경우도 있으며, The alkylene moiety of the group represented by R 111 , R 112 , R 113 , R 121 , R 122 and R 123 is -O-, -S-, -COO-, -OCO-, -NR 124 -, -NR 124 In some cases, oxygen atoms are substituted 1 to 5 times by COO-, -OCONR 124 -, -SCO-, -COS-, -OCS- or -CSO- under the condition that they are not adjacent to each other,
R124는, 수소 원자, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~30의 아릴기, 탄소 원자 수 7~30의 아릴알킬기 또는 탄소 원자 수 2~20의 복소환함유기를 나타내고, R 124 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocycle-containing group having 2 to 20 carbon atoms,
R111, R112, R113, R121, R122, R123 및 R124로 나타내는 기의 알킬 부분은 분기측쇄가 있는 경우도 있고, 환상(環狀) 알킬인 경우도 있으며, The alkyl moiety of the group represented by R 111 , R 112 , R 113 , R 121 , R 122 , R 123 and R 124 may have a branched side chain or may be cyclic alkyl,
R103은, 수소 원자, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~30의 아릴기, 탄소 원자 수 7~30의 아릴알킬기 또는 탄소 원자 수 2~20의 복소환함유기를 나타내고, R103으로 나타내는 기의 알킬 부분은 분기측쇄가 있는 경우도 있고, 환상 알킬인 경우도 있으며, 또한, R103과 R107, R103과 R108, R104와 R105, R105와 R106 및 R106과 R107은 각각 하나가 되어 환을 형성하고 있는 경우도 있고, R 103 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocycle-containing group having 2 to 20 carbon atoms, R The alkyl portion of the group represented by 103 may have a branched chain or may be cyclic alkyl, and R 103 and R 107 , R 103 and R 108 , R 104 and R 105 , R 105 and R 106 and R 106 and R 107 may each become one to form a ring,
R103으로 나타내는 기의 수소 원자는, 또한 R121, OR121, COR121, SR121, NR122R123, CONR122R123, -NR122-OR123, -NCOR122-OCOR123, NR122COR121, OCOR121, COOR121, SCOR121, OCSR121, COSR121, CSOR121, 수산기, 니트로기, CN, 할로겐 원자, 또는 COOR121로 치환되어 있는 경우도 있으며, The hydrogen atom of the group represented by R 103 is further R 121 , OR 121 , COR 121 , SR 121 , NR 122 R 123 , CONR 122 R 123 , -NR 122 -OR 123 , -NCOR 122 -OCOR 123 , NR 122 COR 121 , OCOR 121 , COOR 121 , SCOR 121 , OCSR 121 , COSR 121 , CSOR 121 , a hydroxyl group, a nitro group, CN, a halogen atom, or may be substituted with COOR 121 ,
R104, R105, R106 및 R107은, 각각 독립적으로 R111, OR111, SR111, COR114, CONR151R116, NR112COR111, OCOR111, COOR114, SCOR111, OCSR111, COSR114, CSOR111, 수산기, CN 또는 할로겐 원자를 나타내고, R104와 R105, R105와 R106 및 R106과 R107은 각각 하나가 되어 환을 형성하고 있는 경우도 있으며, R 104 , R 105 , R 106 and R 107 are each independently R 111 , OR 111 , SR 111 , COR 114 , CONR 151 R 116 , NR 112 COR 111 , OCOR 111 , COOR 114 , SCOR 111 , OCSR 111 , COSR 114 , CSOR 111 , a hydroxyl group, CN or a halogen atom, R 104 and R 105 , R 105 and R 106 , and R 106 and R 107 may each form a ring as one,
R114, R115 및 R116은 수소 원자 또는 탄소 원자 수 1~20의 알킬기를 나타내고, R 114 , R 115 and R 116 represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms,
R108은, R111, OR111, SR111, COR111, CONR112R113, NR112COR111, OCOR111, COOR111, SCOR111, OCSR111, COSR111, CSOR111, 수산기, CN 또는 할로겐 원자를 나타내며, R 108 is R 111 , OR 111 , SR 111 , COR 111 , CONR 112 R 113 , NR 112 COR 111 , OCOR 111 , COOR 111 , SCOR 111 , OCSR 111 , COSR 111 , CSOR 111 , hydroxyl group, CN or halogen atom represents,
w는 0 또는 1을 나타낸다.) w represents 0 or 1.)
그 밖의 광 라디칼 중합 개시제로는, 2,4,6-트리메틸벤조일디페닐포스핀옥사이드, 비스(시클로펜타디에닐)-비스[2,6-디플루오로-3-(필-1-일)]티타늄 등을 들 수 있다. Examples of other radical photopolymerization initiators include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis(cyclopentadienyl)-bis[2,6-difluoro-3-(pil-1-yl) ]Titanium etc. are mentioned.
이들 광 라디칼 중합 개시제는 1종 혹은 2종 이상의 것을 원하는 성능에 따라 배합하여 사용할 수 있다. These radical photopolymerization initiators may be used alone or in combination of two or more according to desired performance.
이상과 같은 광 라디칼 중합 개시제의 함유량은, 본 발명의 감광성 조성물의 고형분 중 0.1~30질량%, 특히 0.5~10질량%가 바람직하다. 상기 광 라디칼 중합 개시제의 함유량이 0.1질량%보다 작으면 노광에 의한 경화가 불충분해지는 경우가 있고, 30질량%보다 크면 감광성 조성물 중에 개시제가 석출되는 경우가 있다. As for content of the above radical photopolymerization initiators, 0.1-30 mass %, especially 0.5-10 mass % is preferable in solid content of the photosensitive composition of this invention. When content of the said radical photopolymerization initiator is smaller than 0.1 mass %, hardening by exposure may become inadequate, and when larger than 30 mass %, an initiator may precipitate in the photosensitive composition.
본 발명의 감광성 조성물은, 또한 착색제를 첨가하여 착색 감광성 조성물로 할 수도 있다. 상기 착색 감광성 조성물의 경화물은 컬러 필터로서 적합하게 사용된다. The photosensitive composition of this invention can also add a coloring agent and can also be set as a coloring photosensitive composition. The hardened|cured material of the said coloring photosensitive composition is used suitably as a color filter.
본 발명의 착색 감광성 조성물에서, 착색제의 첨가량은, 본 발명의 착색 감광성 조성물의 고형분 중 0.01~50질량%가 바람직하고, 0.1~30질량%가 보다 바람직하다. 상기 착색제의 함유량이 0.01질량%보다 작으면 원하는 색도를 얻을 수 없는 경우가 있고, 50질량%보다 크면 착색 감광성 조성물 중에 착색제가 석출되는 경우가 있다. The coloring photosensitive composition of this invention WHEREIN: 0.01-50 mass % is preferable in solid content of the coloring photosensitive composition of this invention, and, as for the addition amount of a coloring agent, 0.1-30 mass % is more preferable. When content of the said coloring agent is less than 0.01 mass %, desired chromaticity may not be acquired, and when larger than 50 mass %, a coloring agent may precipitate in the coloring photosensitive composition.
상기 착색제로는 염료 혹은 안료를 들 수 있다. Dyes or pigments may be mentioned as the colorant.
염료로는, 380~1200㎚로 흡수를 가지는 화합물이면 특별히 한정되지 않지만, 예를 들면, 아조 화합물, 안트라퀴논 화합물, 인디고이드 화합물, 트리아릴메탄 화합물, 크산텐 화합물, 알리자린 화합물, 아크리딘 화합물, 스틸벤 화합물, 티아졸 화합물, 나프톨 화합물, 퀴놀린 화합물, 니트로 화합물, 인다민 화합물, 옥사진 화합물, 프탈로시아닌 화합물, 시아닌 화합물, 디임모늄 화합물, 시아노에테닐 화합물, 디시아노스티렌 화합물, 로다민 화합물, 페릴렌 화합물, 폴리엔나프토락탐 화합물, 쿠마린 화합물, 스콰리륨 화합물, 크로코늄 화합물, 스피로피란 화합물, 스피로옥사진 화합물, 메로시아닌 화합물, 옥소놀 화합물, 스티릴 화합물, 피릴륨 화합물, 로다닌 화합물, 옥사졸론 화합물, 프탈이미드 화합물, 신놀린 화합물, 나프토퀴논 화합물, 아자안트라퀴논 화합물, 포르피린 화합물, 아자포르피린 화합물, 피로메텐 화합물, 퀴나크리돈 화합물, 디케토피롤로피롤 화합물, 인디고 화합물, 아크리딘 화합물, 아진 화합물, 아조메틴 화합물, 아닐린 화합물, 퀴나크리돈 화합물, 퀴노프탈론 화합물, 퀴논이민 화합물, 이리듐 착체 화합물, 유로퓸 착체 화합물 등의 염료 등을 들 수 있고, 이들은 복수 개를 혼합하여 사용하여도 된다. The dye is not particularly limited as long as it is a compound having absorption at 380 to 1200 nm, and for example, an azo compound, an anthraquinone compound, an indigoid compound, a triarylmethane compound, a xanthene compound, an alizarin compound, an acridine compound , stilbene compound, thiazole compound, naphthol compound, quinoline compound, nitro compound, indamine compound, oxazine compound, phthalocyanine compound, cyanine compound, diimmonium compound, cyanoethenyl compound, dicyanostyrene compound, rhodamine compound , perylene compound, polyennaphtholactam compound, coumarin compound, squarium compound, croconium compound, spiropyran compound, spirooxazine compound, merocyanine compound, oxonol compound, styryl compound, pyrylium compound, rhodanine compound, oxazolone compound, phthalimide compound, cinnoline compound, naphthoquinone compound, azaanthraquinone compound, porphyrin compound, azaporphyrin compound, pyromethene compound, quinacridone compound, diketopyrrolopyrrole compound, indigo compound, and dyes such as acridine compound, azine compound, azomethine compound, aniline compound, quinacridone compound, quinophthalone compound, quinoneimine compound, iridium complex compound, europium complex compound, etc. may be used.
안료로는 무기안료 혹은 유기안료를 사용할 수 있고, 예를 들면, 니트로소 화합물, 니트로 화합물, 아조 화합물, 디아조 화합물, 크산텐 화합물, 퀴놀린 화합물, 안트라퀴논 화합물, 쿠마린 화합물, 프탈로시아닌 화합물, 이소인돌리논 화합물, 이소인돌린 화합물, 퀴나크리돈 화합물, 안탄트론 화합물, 페리논 화합물, 페릴렌 화합물, 디케토피롤로피롤 화합물, 티오인디고 화합물, 디옥사진 화합물, 트리페닐메탄 화합물, 퀴노프탈론 화합물, 나프탈렌테트라카복시산; 아조 염료, 시아닌 염료의 금속착체 화합물; 레이크 안료; 퍼니스법, 채널법, 더말(thermal)법에 의해 얻어지는 카본 블랙, 혹은 아세틸렌 블랙, 케천 블랙 또는 램프 블랙 등의 카본 블랙; 상기 카본 블랙을 에폭시 수지로 조정, 피복한 것, 상기 카본 블랙을 미리 용매 안에서 수지로 분산 처리하고, 20~200㎎/g의 수지를 흡착시킨 것, 상기 카본 블랙을 산성 또는 알카리성 표면 처리한 것, 평균 입경이 8㎚ 이상이고 DBP 흡유량이 90㎖/100g 이하인 것, 950℃에서의 휘발분 중의 CO, CO2로부터 산출한 전체 산소량이, 카본 블랙의 표면적 100㎡당 9㎎ 이상인 것; 흑연, 흑연화 카본 블랙, 활성탄, 탄소섬유, 카본 나노 튜브, 카본 마이크로 코일, 카본 나노혼, 카본 에어로겔, 풀러렌; 아닐린 블랙, 피그먼트 블랙7, 티탄 블랙; 소수성(疏水性) 수지, 산화크롬그린, 밀로리블루, 코발트그린, 코발트블루, 망간계, 페로시안화물, 인산염군청, 감청, 울트라마린, 세룰리안블루, 비리디언, 에메랄드그린, 황산납, 황색납, 아연황, 벵갈라(적색산화철(III)), 카드뮴레드, 합성철흑, 앰버(amber) 등의 무기안료 또는 유기안료를 사용할 수 있다. 이들 안료는 단독으로 혹은 복수 개를 혼합하여 사용할 수 있다. An inorganic pigment or an organic pigment can be used as the pigment, for example, a nitroso compound, a nitro compound, an azo compound, a diazo compound, a xanthene compound, a quinoline compound, an anthraquinone compound, a coumarin compound, a phthalocyanine compound, isoin Dolinone compound, isoindoline compound, quinacridone compound, ananthrone compound, perinone compound, perylene compound, diketopyrrolopyrrole compound, thioindigo compound, dioxazine compound, triphenylmethane compound, quinophthalone compound, naphthalenetetracarboxylic acid; metal complex compounds of azo dyes and cyanine dyes; lake pigment; carbon black obtained by a furnace method, a channel method, or a thermal method, or carbon black such as acetylene black, ketjen black, or lamp black; The carbon black is adjusted and coated with an epoxy resin, the carbon black is previously dispersed with a resin in a solvent, and 20 to 200 mg/g of the resin is adsorbed, and the carbon black is surface-treated with an acidic or alkaline surface , having an average particle size of 8 nm or more and a DBP oil absorption of 90 ml/100 g or less, CO in volatile matter at 950° C., and the total oxygen content calculated from CO 2 is 9 mg or more per 100 m 2 of surface area of carbon black; graphite, graphitized carbon black, activated carbon, carbon fiber, carbon nanotube, carbon microcoil, carbon nanohorn, carbon airgel, fullerene; Aniline Black, Pigment Black 7, Titanium Black; Hydrophobic resin, chromium oxide green, milory blue, cobalt green, cobalt blue, manganese, ferrocyanide, phosphate ultramarine blue, blue blue, ultramarine, cerulean blue, viridian, emerald green, lead sulfate, yellow Inorganic or organic pigments such as lead, zinc sulfur, bengala (red iron (III) oxide), cadmium red, synthetic iron black, and amber can be used. These pigments can be used individually or in mixture of two or more.
상기 무기안료 또는 유기안료로는 시판의 안료를 사용할 수도 있고, 예를 들면, 피그먼트 레드 1, 2, 3, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48, 49, 88, 90, 97, 112, 119, 122, 123, 144, 149, 166, 168, 169, 170, 171, 177, 179, 180, 184, 185, 192, 200, 202, 209, 215, 216, 217, 220, 223, 224, 226, 227, 228, 240, 254; 피그먼트 오렌지 13, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 65, 71; 피그먼트 옐로우 1, 3, 12, 13, 14, 16, 17, 20, 24, 55, 60, 73, 81, 83, 86, 93, 95, 97, 98, 100, 109, 110, 113, 114, 117, 120, 125, 126, 127, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 166, 168, 175, 180, 185; 피그먼트 그린 7, 10, 36; 피그먼트 블루 15, 15:1, 15:2, 15:3, 15:4, 15:5, 15:6, 22, 24, 56, 60, 61, 62, 64; 피그먼트 바이올렛 1, 19, 23, 27, 29, 30, 32, 37, 40, 50 등을 들 수 있다. A commercially available pigment may be used as the inorganic or organic pigment, for example, Pigment Red 1, 2, 3, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48, 49 , 88, 90, 97, 112, 119, 122, 123, 144, 149, 166, 168, 169, 170, 171, 177, 179, 180, 184, 185, 192, 200, 202, 209, 215, 216 , 217, 220, 223, 224, 226, 227, 228, 240, 254; Pigment Orange 13, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 65, 71; Pigment Yellow 1, 3, 12, 13, 14, 16, 17, 20, 24, 55, 60, 73, 81, 83, 86, 93, 95, 97, 98, 100, 109, 110, 113, 114 , 117, 120, 125, 126, 127, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 166, 168, 175, 180, 185; Pigment Green 7, 10, 36; Pigment Blue 15, 15:1, 15:2, 15:3, 15:4, 15:5, 15:6, 22, 24, 56, 60, 61, 62, 64; Pigment violet 1, 19, 23, 27, 29, 30, 32, 37, 40, 50, etc. are mentioned.
본 발명의 감광성 조성물 및 착색 감광성 조성물에는, 또한 용매를 첨가할 수 있다. 상기 용매로는, 통상, 필요에 따라 상기의 각 성분을 용해 또는 분산할 수 있는 용매, 예를 들면, 메틸에틸케톤, 메틸아밀케톤, 디에틸케톤, 아세톤, 메틸이소프로필케톤, 메틸이소부틸케톤, 시클로헥사논, 2-헵타논 등의 케톤류; 에틸에테르, 디옥산, 테트라하이드로퓨란, 1,2-디메톡시에탄, 1,2-디에톡시에탄, 디프로필렌글리콜디메틸에테르 등의 에테르계 용매; 아세트산메틸, 아세트산에틸, 아세트산-n-프로필, 아세트산이소프로필, 아세트산n-부틸, 아세트산시클로헥실, 락트산에틸, 숙신산디메틸, 텍사놀 등의 에스테르계 용매; 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르 등의 셀로솔브계 용매; 메탄올, 에탄올, 이소- 또는 n-프로판올, 이소- 또는 n-부탄올, 아밀알코올, 디아세톤알코올 등의 알코올계 용매; 에틸렌글리콜모노메틸아세테이트, 에틸렌글리콜모노에틸아세테이트, 프로필렌글리콜-1-모노메틸에테르-2-아세테이트(PGMEA), 디프로필렌글리콜모노메틸에테르아세테이트, 3-메톡시부틸아세테이트, 에톡시에틸프로피오네이트, 1-t-부톡시-2-프로판올, 3-메톡시부틸아세테이트, 시클로헥사놀아세테이트 등의 에테르에스테르계 용매; 벤젠, 톨루엔, 크실렌 등의 BTX계 용매; 헥산, 헵탄, 옥탄, 시클로헥산 등의 지방족 탄화수소계 용매; 테레빈유, D-리모넨, 피넨 등의 테르펜계 탄화수소유; 미네랄 스피릿, 스와졸 #310(코스모 마쓰야마 세키유(주)), 솔벳소 #100(엑손 가가쿠(주)) 등의 파라핀계 용매; 사염화탄소, 클로로포름, 트리클로로에틸렌, 염화메틸렌, 1,2-디클로로에탄 등의 할로겐화 지방족 탄화수소계 용매; 클로로벤젠 등의 할로겐화 방향족 탄화수소계 용매; 카르비톨계 용매, 아닐린, 트리에틸아민, 피리딘, 아세트산, 아세토니트릴, 이류화탄소, N,N-디메틸포름아미드, N,N-디메틸아세트아미드, N-메틸피롤리돈, 디메틸술폭시드, 물 등을 들 수 있고, 이들 용매는 1종 또는 2종 이상의 혼합 용매로 사용할 수 있다. 이들 중에서도 케톤류, 에테르에스테르계 용매 등, 특히 프로필렌글리콜-1-모노메틸에테르-2-아세테이트, 시클로헥사논 등이, 감광성 조성물에서 레지스트와 광 라디칼 중합 개시제의 상용성(相溶性)이 좋으므로 바람직하다. 용매를 사용하는 경우, 본 발명의 감광성 조성물 또는 착색 감광성 조성물의 고형분이 25~35질량%가 되는 양으로 사용하는 것이 핸들링 등의 관점에서 바람직하다. A solvent can be further added to the photosensitive composition and coloring photosensitive composition of this invention. The solvent is usually a solvent capable of dissolving or dispersing each of the above components as needed, for example, methyl ethyl ketone, methyl amyl ketone, diethyl ketone, acetone, methyl isopropyl ketone, methyl isobutyl ketone. ketones such as , cyclohexanone and 2-heptanone; ether solvents such as ethyl ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane, 1,2-diethoxyethane, and dipropylene glycol dimethyl ether; ester solvents such as methyl acetate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, cyclohexyl acetate, ethyl lactate, dimethyl succinate, and texanol; cellosolve solvents such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; alcohol solvents such as methanol, ethanol, iso- or n-propanol, iso- or n-butanol, amyl alcohol, and diacetone alcohol; Ethylene glycol monomethyl acetate, ethylene glycol monoethyl acetate, propylene glycol-1-monomethyl ether-2-acetate (PGMEA), dipropylene glycol monomethyl ether acetate, 3-methoxybutyl acetate, ethoxyethyl propionate, ether ester solvents such as 1-t-butoxy-2-propanol, 3-methoxybutyl acetate, and cyclohexanol acetate; BTX solvents such as benzene, toluene, and xylene; aliphatic hydrocarbon solvents such as hexane, heptane, octane, and cyclohexane; terpene hydrocarbon oils such as turpentine, D-limonene and pinene; Paraffinic solvents, such as mineral spirit, Swasol #310 (Cosmo Matsuyama Sekiyu Co., Ltd.), and Solvesso #100 (Exxon Chemical Co., Ltd.); halogenated aliphatic hydrocarbon solvents such as carbon tetrachloride, chloroform, trichloroethylene, methylene chloride and 1,2-dichloroethane; halogenated aromatic hydrocarbon solvents such as chlorobenzene; Carbitol solvent, aniline, triethylamine, pyridine, acetic acid, acetonitrile, carbon disulfide, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, dimethylsulfoxide, water, etc. and these solvents may be used as one type or a mixed solvent of two or more types. Among these, ketones, ether ester solvents, etc., especially propylene glycol-1-monomethyl ether-2-acetate, cyclohexanone, etc. are preferable because they have good compatibility between the resist and the radical photopolymerization initiator in the photosensitive composition. do. When using a solvent, it is preferable from a viewpoint of handling etc. to use it in the quantity used as 25-35 mass % of solid content of the photosensitive composition or coloring photosensitive composition of this invention.
본 발명의 감광성 조성물 및 착색 감광성 조성물에는 또한 무기화합물을 함유시킬 수 있다. 상기 무기화합물로는, 예를 들면, 산화니켈, 산화철, 산화이리듐, 산화티탄, 산화아연, 산화마그네슘, 산화칼슘, 산화칼륨, 실리카, 알루미나 등의 금속산화물; 층상(層狀) 점토광물, 밀로리블루, 탄산칼슘, 탄산마그네슘, 코발트계, 망간계, 유리 분말, 마이카, 탤크, 카올린, 페로시안화물, 각종 금속 황산염, 황화물, 셀렌화물, 알루미늄실리케이트, 칼슘실리케이트, 수산화알루미늄, 백금, 금, 은, 구리 등을 들 수 있다. The photosensitive composition and colored photosensitive composition of the present invention may further contain an inorganic compound. Examples of the inorganic compound include metal oxides such as nickel oxide, iron oxide, iridium oxide, titanium oxide, zinc oxide, magnesium oxide, calcium oxide, potassium oxide, silica and alumina; Layered clay mineral, milori blue, calcium carbonate, magnesium carbonate, cobalt, manganese, glass powder, mica, talc, kaolin, ferrocyanide, various metal sulfates, sulfide, selenide, aluminum silicate, calcium A silicate, aluminum hydroxide, platinum, gold|metal|money, silver, copper, etc. are mentioned.
본 발명의 감광성 조성물 및 착색 감광성 조성물에서, 안료 등의 착색제 및/또는 무기화합물을 사용하는 경우, 분산제를 첨가할 수 있다. 상기 분산제로는 착색제, 무기화합물을 분산, 안정화시킬 수 있는 것이라면 특별히 제한은 없고, 시판의 분산제, 예를 들면 빗쿠케미사 제품, BYK 시리즈 등을 사용할 수 있고, 염기성 관능기를 가지는 폴리에스테르, 폴리에테르, 폴리우레탄으로 이루어지는 고분자 분산제, 염기성 관능기로서 질소 원자를 가지고, 질소 원자를 가지는 관능기가 아민, 및/또는 그 4급염이며, 아민가가 1~100㎎KOH/g인 것이 적합하게 사용된다. In the photosensitive composition and colored photosensitive composition of the present invention, when a colorant such as a pigment and/or an inorganic compound is used, a dispersing agent may be added. The dispersant is not particularly limited as long as it is capable of dispersing and stabilizing colorants and inorganic compounds, and commercially available dispersants such as Bikk Chemie, BYK series, etc. can be used, and polyesters and polyethers having a basic functional group Polymer dispersing agent made of polyurethane, having a nitrogen atom as a basic functional group, the functional group having a nitrogen atom is an amine and/or a quaternary salt thereof, and an amine value of 1 to 100 mgKOH/g is preferably used.
또한, 본 발명의 감광성 조성물 및 착색 감광성 조성물에는, 필요에 따라 p-아니솔, 하이드로퀴논, 피로카테콜, t-부틸카테콜, 페노티아진 등의 열중합 억제제; 가소제; 접착촉진제; 충전제; 소포제; 레벨링제; 표면조정제; 페놀계 산화방지제, 포스파이트계 산화방지제, 티오에테르계 산화방지제 등의 산화방지제; 자외선 흡수제; 분산조제; 응집 방지제; 촉매; 효과촉진제; 가교제; 증점제 등의 관용의 첨가물을 첨가할 수 있다. Moreover, to the photosensitive composition and coloring photosensitive composition of this invention, thermal polymerization inhibitors, such as p-anisole, hydroquinone, pyrocatechol, t-butylcatechol, and phenothiazine, as needed; plasticizer; adhesion promoter; filler; antifoam; leveling agent; surface conditioning agent; antioxidants such as phenolic antioxidants, phosphite antioxidants and thioether antioxidants; UV absorbers; dispersing aid; anti-aggregation agents; catalyst; effect promoter; crosslinking agent; Conventional additives, such as a thickener, can be added.
또한, 상기 산가를 가지는 에틸렌성 불포화 결합을 가지는 중합성 화합물과 함께, 다른 유기중합체를 사용함으로써, 본 발명의 감광성 조성물 및 착색 감광성 조성물의 경화물의 특성을 개선할 수도 있다. 상기 유기중합체로는, 예를 들면, 폴리스티렌, 폴리메틸메타크릴레이트, 메틸메타크릴레이트-에틸아크릴레이트 공중합체, 폴리(메타)아크릴산, 스티렌-(메타)아크릴산 공중합체, (메타)아크릴산-메틸메타크릴레이트 공중합체, 에틸렌-염화비닐 공중합체, 에틸렌-비닐 공중합체, 폴리염화비닐 수지, ABS 수지, 나일론6, 나일론66, 나일론12, 우레탄 수지, 폴리카보네이트폴리비닐부티랄, 셀룰로오스에스테르, 폴리아크릴아미드, 포화 폴리에스테르, 페놀 수지, 페녹시 수지, 폴리아미드이미드 수지, 폴리아믹산 수지, 에폭시 수지 등을 들 수 있고, 이들 중에서도 폴리스티렌, (메타)아크릴산-메틸메타크릴레이트 공중합체, 에폭시 수지가 바람직하다. In addition, by using another organic polymer together with the polymerizable compound having an ethylenically unsaturated bond having an acid value, properties of the cured product of the photosensitive composition and the colored photosensitive composition of the present invention can be improved. Examples of the organic polymer include polystyrene, polymethyl methacrylate, methyl methacrylate-ethyl acrylate copolymer, poly (meth) acrylic acid, styrene-(meth) acrylic acid copolymer, (meth) acrylic acid-methyl Methacrylate copolymer, ethylene-vinyl chloride copolymer, ethylene-vinyl copolymer, polyvinyl chloride resin, ABS resin, nylon 6, nylon 66, nylon 12, urethane resin, polycarbonate polyvinyl butyral, cellulose ester, poly Acrylamide, saturated polyester, phenol resin, phenoxy resin, polyamideimide resin, polyamic acid resin, epoxy resin, etc. are mentioned, Among these, polystyrene, (meth)acrylic acid-methyl methacrylate copolymer, and epoxy resin are mentioned. desirable.
본 발명의 감광성 조성물 및 착색 감광성 조성물에는 또한 연쇄이동제, 증감제, 계면활성제, 실란커플링제, 멜라민 화합물 등을 병용할 수 있다. A chain transfer agent, a sensitizer, a surfactant, a silane coupling agent, a melamine compound, etc. can be used together with the photosensitive composition and colored photosensitive composition of this invention.
상기 연쇄이동제, 증감제로는 일반적으로 유황 원자함유 화합물이 사용된다. 예를 들면 티오글리콜산, 티오말산, 티오살리실산, 2-메르캅토프로피온산, 3-메르캅토프로피온산, 3-메르캅토부티르산, N-(2-메르캅토프로피오닐)글리신, 2-메르캅토니코틴산, 3-[N-(2-메르캅토에틸)카바모일]프로피온산, 3-[N-(2-메르캅토에틸)아미노]프로피온산, N-(3-메르캅토프로피오닐)알라닌, 2-메르캅토에탄술폰산, 3-메르캅토프로판술폰산, 4-메르캅토부탄술폰산, 도데실(4-메틸티오)페닐에테르, 2-메르캅토에탄올, 3-메르캅토-1,2-프로판디올, 1-메르캅토-2-프로판올, 3-메르캅토-2-부탄올, 메르캅토페놀, 2-메르캅토에틸아민, 2-메르캅토이미다졸, 2-메르캅토벤조이미다졸, 2-메르캅토-3-피리디놀, 2-메르캅토벤조티아졸, 메르캅토아세트산, 트리메틸올프로판트리스(3-메르캅토프로피오네이트), 펜타에리트리톨테트라키스(3-메르캅토프로피오네이트) 등의 메르캅토 화합물, 상기 메르캅토 화합물을 산화하여 얻어지는 디술피드 화합물, 요오드아세트산, 요오드프로피온산, 2-요오드에탄올, 2-요오드에탄술폰산, 3-요오드프로판술폰산 등의 요오드화 알킬 화합물, 트리메틸올프로판트리스(3-메르캅토이소부티레이트), 부탄디올비스(3-메르캅토이소부티레이트), 헥산디티올, 데칸디티올, 1,4-디메틸메르캅토벤젠, 부탄디올비스티오프로피오네이트, 부탄디올비스티오글리콜레이트, 에틸렌글리콜비스티오글리콜레이트, 트리메틸올프로판트리스티오글리콜레이트, 부탄디올비스티오프로피오네이트, 트리메틸올프로판트리스티오프로피오네이트, 트리메틸올프로판트리스티오글리콜레이트, 펜타에리트리톨테트라키스티오프로피오네이트, 펜타에리트리톨테트라키스티오글리콜레이트, 트리스하이드록시에틸트리스티오프로피오네이트, 하기 화합물 No.C1, 트리메르캅토프로피온산트리스(2-하이드록시에틸)이소시아누레이트 등의 지방족 다관능 티올 화합물, 쇼와 덴코사 제품 카렌즈 MT BD1, PE1, NR1 등을 들 수 있다. As the chain transfer agent and the sensitizer, a compound containing a sulfur atom is generally used. For example, thioglycolic acid, thiomalic acid, thiosalicylic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, 3-mercaptobutyric acid, N-(2-mercaptopropionyl)glycine, 2-mercaptonicotinic acid, 3 -[N-(2-mercaptoethyl)carbamoyl]propionic acid, 3-[N-(2-mercaptoethyl)amino]propionic acid, N-(3-mercaptopropionyl)alanine, 2-mercaptoethanesulfonic acid , 3-mercaptopropanesulfonic acid, 4-mercaptobutanesulfonic acid, dodecyl (4-methylthio)phenyl ether, 2-mercaptoethanol, 3-mercapto-1,2-propanediol, 1-mercapto-2 -Propanol, 3-mercapto-2-butanol, mercaptophenol, 2-mercaptoethylamine, 2-mercaptoimidazole, 2-mercaptobenzoimidazole, 2-mercapto-3-pyridinol, 2 - Mercapto compounds such as mercaptobenzothiazole, mercaptoacetic acid, trimethylolpropanetris (3-mercaptopropionate), and pentaerythritol tetrakis (3-mercaptopropionate), and the mercapto compound Disulfide compounds obtained by oxidation, iodine acetic acid, iodopropionic acid, 2-iodethanol, 2-iodoethanesulfonic acid, 3-iodopropanesulfonic acid, etc. alkyl iodide compounds, trimethylolpropanetris(3-mercaptoisobutyrate), butanediol Bis(3-mercaptoisobutyrate), hexanedithiol, decanedithiol, 1,4-dimethyl mercaptobenzene, butanediol bisthiopropionate, butanediol bisthioglycolate, ethylene glycol bisthioglycolate, trimethylol Propane tristhioglycolate, butanediolbisthiopropionate, trimethylolpropane tristhiopropionate, trimethylolpropane tristhioglycolate, pentaerythritol tetrakisthiopropionate, pentaerythritol tetrakistioglycolate, tris Aliphatic polyfunctional thiol compounds, such as hydroxyethyl tristhiopropionate, following compound No. C1, trimercaptopropionate tris(2-hydroxyethyl) isocyanurate, Showa Denko company make Karenz MT BD1, PE1 , NR1, and the like.
상기 계면활성제로는, 퍼플루오로알킬인산에스테르, 퍼플루오로알킬카복실산염 등의 불소계면활성제, 고급 지방산 알칼리염, 알킬술폰산염, 알킬황산염 등의 음이온계 계면활성제, 고급 아민 할로겐산염, 제4급 암모늄염 등의 양이온계 계면활성제, 폴리에틸렌글리콜알킬에테르, 폴리에틸렌글리콜 지방산 에스테르, 소르비탄 지방산 에스테르, 지방산 모노글리세라이드 등의 비이온 계면활성제, 양성(兩性) 계면활성제, 실리콘계 계면활성제 등의 계면활성제를 사용할 수 있고, 이들은 조합하여 사용하여도 된다. Examples of the surfactant include fluorosurfactants such as perfluoroalkyl phosphate esters and perfluoroalkyl carboxylates, anionic surfactants such as higher fatty acid alkali salts, alkyl sulfonates, and alkyl sulfates, higher amine halides, and quaternary surfactants. Cationic surfactants such as quaternary ammonium salts, nonionic surfactants such as polyethylene glycol alkyl ethers, polyethylene glycol fatty acid esters, sorbitan fatty acid esters, fatty acid monoglycerides, amphoteric surfactants, and surfactants such as silicone surfactants can be used, and these may be used in combination.
상기 실란 커플링제로는, 예를 들면 신에쓰 가가꾸사 제품 실란 커플링제를 사용할 수 있고, 그 중에서도 KBE-9007, KBM-502, KBE-403 등, 이소시아네이트기, 메타크릴로일기, 에폭시기를 가지는 실란 커플링제가 적합하게 사용된다. As the silane coupling agent, for example, a silane coupling agent manufactured by Shin-Etsu Chemical Co., Ltd. can be used, and among them, KBE-9007, KBM-502, KBE-403, etc., having an isocyanate group, a methacryloyl group, and an epoxy group A silane coupling agent is suitably used.
상기 멜라민 화합물로는, (폴리)메틸올멜라민, (폴리)메틸올글리콜우릴, (폴리)메틸올벤조구아나민, (폴리)메틸올우레아 등의 질소 화합물 중의 활성 메틸올기(CH2OH기)의 전부 또는 일부(적어도 2개)가 알킬에테르화된 화합물을 들 수 있다. 여기서, 알킬에테르를 구성하는 알킬기로는 메틸기, 에틸기 또는 부틸기를 들 수 있고, 서로 동일한 경우도 있고 다른 경우도 있다. 또한, 알킬에테르화되어 있지 않은 메틸올기는, 1분자 내에서 자기축합되어 있는 경우도 있고, 2분자 사이에서 축합되어, 그 결과 올리고머 성분이 형성되어 있는 경우도 있다. 구체적으로는 헥사메톡시메틸멜라민, 헥사부톡시메틸멜라민, 테트라메톡시메틸글리콜우릴, 테트라부톡시메틸글리콜우릴 등을 사용할 수 있다. 이들 중에서도 헥사메톡시메틸멜라민, 헥사부톡시메틸멜라민 등의 알킬에테르화된 멜라민이 바람직하다. Examples of the melamine compound include an active methylol group (CH 2 OH group) in nitrogen compounds such as (poly) methylolmelamine, (poly) methylol glycoluril, (poly) methylol benzoguanamine, and (poly) methylol urea) and compounds in which all or part (at least two) of is alkyletherified. Here, examples of the alkyl group constituting the alkyl ether include a methyl group, an ethyl group, or a butyl group, and may be the same as each other or different from each other. Moreover, the methylol group which is not alkyl-etherified may self-condensate within one molecule, and may condense between two molecules, and as a result, an oligomer component may be formed. Specifically, hexamethoxymethylmelamine, hexabutoxymethylmelamine, tetramethoxymethylglycoluril, tetrabutoxymethylglycoluril, or the like can be used. Among these, alkyl-etherified melamines, such as hexamethoxymethylmelamine and hexabutoxymethylmelamine, are preferable.
본 발명의 감광성 조성물 및 착색 감광성 조성물은, 스핀 코터, 롤 코터, 바 코터, 다이 코터, 커튼 코터, 각종 인쇄, 침지 등의 공지의 수단으로 소다 유리, 석영 유리, 반도체기판, 금속, 종이, 플라스틱 등의 지지체 상에 적용할 수 있다. 또한, 일단 필름 등의 지지체 상에 입힌 후, 다른 지지체 상으로 전사(轉寫)할 수도 있고, 그 적용 방법에 제한은 없다. The photosensitive composition and colored photosensitive composition of the present invention can be prepared by using known means such as a spin coater, a roll coater, a bar coater, a die coater, a curtain coater, various types of printing and immersion, such as soda glass, quartz glass, semiconductor substrate, metal, paper, plastic. It can be applied on a support such as In addition, once coated on a support such as a film, it may be transferred onto another support, and the application method is not limited.
또한, 본 발명의 감광성 조성물 및 착색 감광성 조성물을 경화시킬 때에 사용되는 활성 광의 광원으로는 파장 300~450㎚의 광을 발광하는 것을 사용할 수 있고, 예를 들면, 초고압 수은, 수은증기 아크, 카본 아크, 제논 아크 등을 사용할 수 있다. Moreover, as a light source of the actinic light used when hardening the photosensitive composition and colored photosensitive composition of this invention, what emits light with a wavelength of 300-450 nm can be used, For example, ultra-high pressure mercury, a mercury vapor arc, a carbon arc , a xenon arc, etc. can be used.
또한, 노광 광원에 레이저광을 사용함으로써, 마스크를 사용하지 않고, 컴퓨터 등의 디지털 정보로부터 직접 화상을 형성하는 레이저 직접 묘화법이, 생산성뿐만 아니라 해상성이나 위치 정밀도 등의 향상도 도모할 수 있기 때문에 유용하고, 그 레이저광으로는 340~430㎚의 파장의 광이 적합하게 사용되는데, 아르곤 이온 레이저, 헬륨 네온 레이저, YAG 레이저, 및 반도체 레이저 등의 가시(可視)에서 적외 영역의 광을 발하는 것도 사용된다. 이들 레이저를 사용하는 경우에는 가시에서 적외의 상기 영역을 흡수하는 증감색소가 첨가된다. In addition, by using laser light as the exposure light source, the laser direct drawing method, which directly forms an image from digital information such as a computer without using a mask, can improve not only productivity but also resolution and positional accuracy. Therefore, it is useful, and as the laser beam, light having a wavelength of 340 to 430 nm is suitably used. Argon ion laser, helium neon laser, YAG laser, and semiconductor laser, etc. emit light in the visible to infrared region. is also used In the case of using these lasers, a sensitizing dye that absorbs the above-mentioned region from visible to infrared is added.
본 발명의 감광성 조성물 및 착색 감광성 조성물은, 2개의 감광성 조성물 또는 착색 감광성 조성물을 사용하여 2회에 나누어 패터닝을 실시하는 더블 패터닝 프로세스를 거쳐 패터닝을 실시할 수도 있다. The photosensitive composition and coloring photosensitive composition of this invention can also be patterned through the double patterning process of dividing into two times and patterning using two photosensitive compositions or coloring photosensitive composition.
본 발명의 감광성 조성물 또는 착색 감광성 조성물을 경화시키는 방법은, 상기 스핀 코터, 롤 코터, 바 코터, 다이 코터, 커튼 코터, 각종 인쇄, 침지 등의 공지의 수단으로 소다 유리, 석영 유리, 반도체기판, 금속, 종이, 플라스틱 등의 지지체 상에 도포하여 도막을 형성하는 공정, 및 상기 도막에 상기 활성 광을 노광하여 경화시키는 공정을 포함한다. The method of curing the photosensitive composition or the colored photosensitive composition of the present invention is a method for curing the photosensitive composition or the colored photosensitive composition using a known method such as a spin coater, a roll coater, a bar coater, a die coater, a curtain coater, various types of printing and immersion, such as soda glass, quartz glass, a semiconductor substrate, It includes a step of forming a coating film by applying it on a support such as metal, paper, plastic, and the like, and a step of curing the coating film by exposing the active light to light.
본 발명의 감광성 조성물 및 착색 감광성 조성물(또는 그 경화물)은, 광 경화성 도료 또는 바니시, 광 경화성 접착제 등의 접착제, 프린트 기판, 혹은 컬러 TV, PC 모니터, 휴대정보단말, 디지털 카메라 등의 컬러 표시의 액정표시패널에서의 컬러 필터, CCD 이미지 센서의 컬러 필터, 포토 스페이서, 블랙 컬럼 스페이서, 플라스마 표시 패널용 전극재료, 터치 패널, 터치 센서, 분말 코팅, 인쇄 잉크, 인쇄판, 치과용 조성물, 광 조형용 수지, 겔 코트, 전자공학용 포토레지스트, 전기도금 레지스트, 에칭 레지스트, 액상 및 건조막 쌍방, 땜납 레지스트, 다양한 표시 용도용의 컬러 필터를 제조하기 위한 혹은 플라스마 표시 패널, 전기발광 표시장치, 및 LCD의 제조 공정에서 구조를 형성하기 위한 레지스트, 전기 및 전자부품을 봉입하기 위한 조성물, 솔더 레지스트, 자기(磁氣) 기록 재료, 미소(微小)기계부품, 도파로, 광 스위치, 도금용 마스크, 에칭 마스크, 컬러 시험계, 유리섬유 케이블 코팅, 스크린 인쇄용 스텐실, 스테레오리토그래피에 의해 삼차원 물체를 제조하기 위한 재료, 홀로그래피 기록용 재료, 화상기록 재료, 미세전자회로, 탈색 재료, 화상기록 재료를 위한 탈색 재료, 마이크로캡슐을 사용하는 화상기록 재료용의 탈색 재료, 인쇄 배선판용 포토레지스트 재료, UV 및 가시 레이저 직접 화상계용의 포토레지스트 재료, 프린트 회로 기판의 축차 적층에서의 유전체층 형성에 사용하는 포토레지스트 재료, 3D 실장용 포토레지스트 재료 혹은 보호막 등의 각종 용도로 사용할 수 있고, 그 용도에 특별히 제한은 없다. The photosensitive composition and colored photosensitive composition (or cured product thereof) of the present invention can be used for photocurable paints or varnishes, adhesives such as photocurable adhesives, printed circuit boards, or color TVs, PC monitors, portable information terminals, digital cameras, etc. color filter in liquid crystal display panel, color filter of CCD image sensor, photo spacer, black column spacer, electrode material for plasma display panel, touch panel, touch sensor, powder coating, printing ink, printing plate, dental composition, stereolithography Resins, gel coats, photoresists for electronics, electroplating resists, etching resists, both liquid and dry films, solder resists, for manufacturing color filters for various display applications or for plasma display panels, electroluminescent displays, and LCDs Resists for forming structures in the manufacturing process, compositions for encapsulating electrical and electronic components, solder resists, magnetic recording materials, micromechanical components, waveguides, optical switches, plating masks, etching masks, Color test system, glass fiber cable coating, stencil for screen printing, material for manufacturing three-dimensional objects by stereolithography, material for holographic recording, image recording material, microelectronic circuit, decolorizing material, decolorizing material for image recording material, micro Discoloration materials for image recording materials using capsules, photoresist materials for printed wiring boards, photoresist materials for UV and visible laser direct imaging systems, photoresist materials for dielectric layer formation in successive lamination of printed circuit boards, 3D It can be used for various uses, such as a photoresist material for mounting or a protective film, and there is no restriction|limiting in particular in the use.
본 발명의 감광성 조성물은, 경화시킴으로써 투명 구조체로 사용할 수 있다. 투명 구조체로는, 예를 들면, 포토 스페이서(PS), 컬럼 스페이서(CS)라고 불리는 주형물(柱形物); (나노) 임프린트의 미세 패턴; 대형광고간판 등의 제조나 액정 디스플레이용 컬러 필터나 배향막의 인쇄 등 전자 디바이스 제조에 이용하는 잉크젯 수용층 등을 들 수 있다. 본 발명의 투명 구조체는 표시 디바이스에 적합하게 사용된다. The photosensitive composition of the present invention can be used as a transparent structure by curing. As a transparent structure, For example, the casting material called a photo spacer (PS) and a column spacer (CS); (nano) fine patterns of imprints; The inkjet receiving layer used for manufacture of a large-size advertising signboard, etc., and the manufacture of electronic devices, such as the printing of color filters for liquid crystal displays, and an alignment film, etc. are mentioned. The transparent structure of this invention is used suitably for a display device.
본 발명의 감광성 조성물은 투명 도전막, 반사막, 편광판, 보호막 등에 사용할 수 있고, 투명기판에 원하는 각 층을 순차 도포하고, 소정 패턴 형상을 가지는 마스크를 개재하여 활성 광을 조사하며, 노광 후의 피막을 현상액으로 현상하고, 현상 후의 피막을 가열함으로써 적층한 투명 적층체로 사용할 수 있다. 투명 적층체로는, 예를 들면, 투명 기재에, 산화인듐과 산화세륨의 복합 산화물로 이루어지는 투명 박막층과 금속 박막층이 교대로 되어 있는 것 등을 들 수 있다. 전술한 각 층 각각에 일반식(I)로 나타내는 치환기를 가지는 화합물을 잠재성 첨가제로서 함유하는 본 발명의 감광성 조성물을 사용하여도 되고, 어느 한 층에 상기 감광성 조성물을 사용하여도 된다. 또한, 상기 투명 적층체는 표시장치에 적합하게 사용된다. The photosensitive composition of the present invention can be used for a transparent conductive film, a reflective film, a polarizing plate, a protective film, etc., and each desired layer is sequentially applied to a transparent substrate, irradiated with actinic light through a mask having a predetermined pattern shape, and the film after exposure It can be used as a transparent laminate laminated|stacked by developing with a developing solution and heating the film after image development. Examples of the transparent laminate include a transparent substrate in which a transparent thin film layer and a metal thin film layer made of a complex oxide of indium oxide and cerium oxide are alternated. The photosensitive composition of this invention which contains the compound which has a substituent represented by general formula (I) in each of the above-mentioned layers as a latent additive may be used, and the said photosensitive composition may be used for either layer. In addition, the transparent laminate is suitably used for a display device.
본 발명의 착색 감광성 조성물은 컬러 필터의 화소를 형성하는 목적으로 사용되고, 특히 액정표시패널 등의 화상표시장치용의 표시 디바이스용 컬러 필터를 형성하기 위한 감광성 조성물로서 유용하다. The coloring photosensitive composition of this invention is used for the purpose of forming the pixel of a color filter, and is useful especially as a photosensitive composition for forming the color filter for display devices for image display apparatuses, such as a liquid crystal display panel.
상기 표시 디바이스용 컬러 필터는, (1) 본 발명의 착색 감광성 조성물의 도막을 기판 위에 형성하는 공정, (2) 상기 도막에 소정 패턴 형상을 가지는 마스크를 개재하여 활성 광을 조사하는 공정, (3) 노광 후의 피막을 현상액으로 현상하는 공정, (4) 현상 후의 상기 피막을 가열하는 공정에 의해 바람직하게 형성된다. 또한, 본 발명의 착색 감광성 조성물은 현상 공정이 없는 잉크젯 방식의 착색 감광성 조성물로서도 유용하다. The color filter for a display device includes (1) a step of forming a coating film of the colored photosensitive composition of the present invention on a substrate, (2) a step of irradiating the coating film with actinic light through a mask having a predetermined pattern shape, (3) ) It is formed preferably by the process of developing the coating film after exposure with a developing solution, and (4) the process of heating the said coating film after development. Moreover, the coloring photosensitive composition of this invention is useful also as a coloring photosensitive composition of the inkjet system without a developing process.
상기 마스크로는, 하프톤 마스크 또는 그레이 스케일 마스크 등의 다계조(多階調) 마스크를 사용할 수도 있다. As the mask, a multi-gradation mask such as a halftone mask or a gray scale mask can also be used.
다음으로, 본 발명의 신규 화합물에 대해 설명한다. 본 발명의 신규 화합물은 하기 구조 중 어느 하나로 나타난다. Next, the novel compound of the present invention will be described. The novel compound of the present invention is represented by any one of the following structures.
본 발명의 신규 화합물의 제조 방법은 특별히 한정되지 않지만, 예를 들면, 일본 공개특허 소57-111375호, 일본 공개특허 평3-173843호, 일본 공개특허 평6-128195호, 일본 공개특허 평7-206771호, 일본 공개특허 평7-252191호, 일본 공표특허 2004-501128호의 각 공보에 기재된 방법에 의해 제조된 페놀계 화합물과, 할로겐화 알릴 화합물 등을 반응시켜 얻을 수 있다. Although the manufacturing method of the novel compound of this invention is not specifically limited, For example, Unexamined-Japanese-Patent No. 57-111375, Unexamined-Japanese-Patent No. 3-173843, Unexamined-Japanese-Patent No. 6-128195, Unexamined-Japanese-Patent No. Hei 7, for example. It can be obtained by reacting a phenol-based compound prepared by the methods described in -206771, Japanese Unexamined Patent Publication No. Hei 7-252191, and Japanese Unexamined Patent Publication No. 2004-501128, with an allyl halide compound or the like.
본 발명의 신규 화합물은 잠재성 산화방지제, 잠재성 자외선 흡수제, 용해 조정제 등에 사용할 수 있다. The novel compound of the present invention can be used as a latent antioxidant, a latent ultraviolet absorber, a dissolution modifier, and the like.
실시예Example
이하, 실시예 등을 들어 본 발명을 더 상세하게 설명하겠지만, 본 발명은 이들 실시예 등에 한정되는 것이 아니다. Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to these Examples and the like.
[실시예 1-1] 화합물 No.1의 합성 [Example 1-1] Synthesis of compound No. 1
하기 화합물 No.1'의 페놀 화합물 1당량의 디메틸아세트아미드 용액(이론 수량(收量)의 3배량)에 탄산칼륨(하나의 페놀기에 대하여 2당량)을 첨가하고, 실온에서 30분 교반하였다. 알릴브로마이드(하나의 페놀기에 대하여 1.5당량)를 첨가하고, 60℃에서 5시간 교반하였다. 아세트산에틸을 첨가하여 1% 염산용액으로 세정한 후 유수 분리를 실시하고, 유기층을 무수황산나트륨으로 건조 후, 용매를 증류제거하고, 정석(晶析)을 실시하였다. 얻어진 고체를 60℃에서 3시간 감압 건조시켜 목적물을 얻었다. 얻어진 고체가 목적물인 것은 1H-NMR, IR로 확인하였다. 결과를 [표 1]~[표 2]에 나타낸다. Potassium carbonate (2 equivalents per one phenol group) was added to a dimethylacetamide solution of 1 equivalent of the phenol compound of Compound No. 1' (3 times the theoretical amount), followed by stirring at room temperature for 30 minutes. Allyl bromide (1.5 equivalents per one phenol group) was added, and the mixture was stirred at 60° C. for 5 hours. After adding ethyl acetate, washing with a 1% hydrochloric acid solution, oil-water separation was performed, the organic layer was dried over anhydrous sodium sulfate, the solvent was distilled off, and crystallization was performed. The obtained solid was dried under reduced pressure at 60°C for 3 hours to obtain the target product. It was confirmed by 1 H-NMR and IR that the obtained solid was the target product. A result is shown to [Table 1] - [Table 2].
[실시예 1-2~1-6] 화합물 No.2~6의 합성 [Examples 1-2 to 1-6] Synthesis of compounds No. 2 to 6
실시예 1-1에서, 하기 화합물 No.1'의 페놀 화합물을 대신하여 하기 화합물 No.2'~6'의 페놀 화합물을 사용한 것 이외에는 실시예 1-1과 동일하게 하여 목적물인 화합물 No.2~6을 합성하였다. 얻어진 고체가 목적물인 것은 1H-NMR, IR로 확인하였다. 결과를 [표 1]~[표 2]에 나타낸다. In Example 1-1, in the same manner as in Example 1-1, except that the phenolic compounds of the following compounds No.2' to 6' were used instead of the phenolic compounds of the following compound No.1', the target compound No.2 ~6 was synthesized. It was confirmed by 1 H-NMR and IR that the obtained solid was the target product. A result is shown to [Table 1] - [Table 2].
[실시예 2-1~2-2 및 비교예 2-1~2-3] 감광성 조성물 No.1~No.2 및 비교 감광성 조성물 No.1~No.3의 조제 [Examples 2-1 to 2-2 and Comparative Examples 2-1 to 2-3] Preparation of photosensitive compositions No.1 to No.2 and comparative photosensitive compositions No.1 to No.3
SPC-1000(쇼와 덴코사 제품, 고형분 29%의 PGMEA 용액) 50.0g, 아로닉스 M-450(도아고세이사 제품) 11.6g, NCI-930(ADEKA사 제품) 0.3g, PGMEA 34.7g, FZ2122(도레 다우코닝사 제품, 고형분 1%의 PGMEA 용액) 2.9g 및 [표 3]에 기재된 화합물 0.81g을 혼합하고, 불용물이 없어질 때까지 교반하여 감광성 조성물 No.1~No.2 및 비교 감광성 조성물 No.1~No.3을 얻었다. SPC-1000 (Showa Denko Co., Ltd., PGMEA solution with a solid content of 29%) 50.0 g, Aronix M-450 (Toagosei Co., Ltd.) 11.6 g, NCI-930 (ADEKA Co., Ltd.) 0.3 g, PGMEA 34.7 g, FZ2122 (Toray Dow Corning Co., Ltd., PGMEA solution with a solid content of 1%) 2.9 g and 0.81 g of the compound described in Table 3 were mixed, stirred until insoluble matter disappeared, and photosensitive compositions No. 1 to No. 2 and comparative photosensitivity Compositions No. 1 to No. 3 were obtained.
[평가예 1-1 및 비교 평가예 1-1] 아웃 가스 평가 [Evaluation Example 1-1 and Comparative Evaluation Example 1-1] Outgas evaluation
화합물 No.1, 화합물 No.2 및 비교 화합물 No.2를 각각 5㎎ 칭량하여 넣고, 열질량 측정장치로 실온에서 230℃까지 승온(20℃/min.)시킨 후, 230℃에서 30분간 유지한 시점에서의 중량 감소율을 측정하여, 감광성 조성물 No.1~No.2 및 비교 감광성 조성물 No.2의 아웃 가스 평가로 하였다. 중량 감소가 작을수록 아웃 가스가 적은 것을 나타낸다. 결과를 [표 4]에 나타낸다. 5 mg of each of compound No. 1, compound No. 2 and comparative compound No. 2 were weighed and put in, and the temperature was raised from room temperature to 230 ° C (20 ° C./min.) with a thermal mass measurement device, and then maintained at 230 ° C. for 30 minutes. The weight loss rate at one time point was measured and it was set as outgas evaluation of photosensitive composition No.1-No.2 and comparative photosensitive composition No.2. It shows that there are few outgass, so that a weight loss is small. A result is shown in [Table 4].
상기 결과로부터 본 발명에 따른 화합물은 아웃 가스가 적고, 본 발명에 따른 화합물을 함유하는 본 발명의 감광성 조성물은 아웃 가스가 적어지는 것이 분명하다. From the above results, it is clear that the compound according to the present invention has less outgas, and the photosensitive composition of the present invention containing the compound according to the present invention has less outgas.
[평가예 2-1 및 비교 평가예 2-1~2-2] 내용제성 평가 [Evaluation Example 2-1 and Comparative Evaluation Examples 2-1 to 2-2] Solvent resistance evaluation
상기 실시예 2-1에서 얻어진 감광성 조성물 No.1 및 비교예 2-1 및 2-3에서 얻어진 비교 감광성 조성물 No.1 및 No.3을 각각 유리 기판에 410rpm×7초의 조건으로 코팅하고, 핫플레이트에서 건조(90℃×90초)시켰다. 얻어진 도막에 초고압 수은 램프로 노광(40mJ/㎠)시켰다. 노광 후의 도막을 230℃×30분의 조건으로 소성하였다. 얻어진 도막의 막 두께를 측정한 후, 실온에서 30분간, PGMEA, 시클로헥사논, N-메틸피롤리돈, N-에틸피롤리돈에 침지시키고, 침지 후의 막 두께를 측정하였다. 침지 전후에서의 막 두께 비(침지 후의 막 두께×100/침지 전의 막 두께)가 100%에 가까울수록 내용제성은 높다고 평가하였다. The photosensitive composition No. 1 obtained in Example 2-1 and Comparative Photosensitive composition No. 1 and No. 3 obtained in Comparative Examples 2-1 and 2-3 were coated on a glass substrate under the conditions of 410 rpm × 7 seconds, respectively, and hot The plate was dried (90° C.×90 seconds). The obtained coating film was exposed (40 mJ/cm<2>) with an ultra-high pressure mercury lamp. The coating film after exposure was baked under the conditions of 230 degreeC x 30 minutes. After measuring the film thickness of the obtained coating film, it was made to immerse in PGMEA, cyclohexanone, N-methylpyrrolidone, N-ethylpyrrolidone at room temperature for 30 minutes, and the film thickness after immersion was measured. It evaluated that the solvent resistance was so high that the film thickness ratio (film thickness after immersion x 100/film thickness before immersion) before and behind immersion was close to 100 %.
[표 5]로부터, 산화방지제를 함유하지 않은 비교 감광성 조성물 No.3의 경화물과 비교하여, 종래의 페놀계 산화방지제를 함유하는 비교 감광성 조성물 No.1의 경화물은 내용제성이 저하되지만, 본원에 따른 화합물을 잠재성 첨가제로 사용한 감광성 조성물 No.1은 산화방지제를 함유하지 않은 경우와 동일한 내용제성을 유지하고 있는 것이 분명하다. From [Table 5], compared with the cured product of Comparative Photosensitive Composition No. 3 containing no antioxidant, the cured product of Comparative Photosensitive Composition No. 1 containing the conventional phenolic antioxidant has lowered solvent resistance, It is clear that the photosensitive composition No. 1 using the compound according to the present application as a latent additive maintains the same solvent resistance as the case where the antioxidant is not contained.
이상의 결과로부터, 본 발명의 화합물을 잠재성 첨가제로 사용한 감광성 조성물은 아웃 가스가 적고, 그 경화물이 내용제성이 뛰어난 것은 명백하다. From the above result, it is clear that the photosensitive composition which used the compound of this invention as a latent additive has little outgas, and that the hardened|cured material is excellent in solvent resistance.
본 발명에 의하면, 상온에서는 불활성이고 소정 온도로 가열함으로써 활성화되어 산화방지제나 자외선 흡수제로서의 기능을 발현하는 화합물을 사용한, 아웃 가스가 적고 경화물의 내용제성이 높은 감광성 조성물을 제공할 수 있다. ADVANTAGE OF THE INVENTION According to this invention, the photosensitive composition with little outgas and high solvent resistance of hardened|cured material can be provided using the compound which is inert at normal temperature and is activated by heating to a predetermined temperature and expresses a function as an antioxidant or a ultraviolet absorber.
Claims (11)
(식 중, n은 2~6의 정수를 나타내고,
X1은 하기 일반식(1)~(5)로 나타내는 2~6가의 결합기를 나타내며,
R1 및 R2는, 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 수산기, 니트로기, 카복실기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 7~20의 아릴알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~20의 복소환함유기 또는 트리알킬실릴기를 나타내고,
R1 및 R2로 나타내는 알킬기 또는 아릴알킬기 중의 메틸렌기는, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-, -S-S- 또는 -SO2-에서 선택된 기를 산소 원자가 서로 이웃하지 않는 조건으로 조합한 기로 치환되어 있는 경우도 있고, R'는 수소 원자 또는 탄소 원자 수 1~8의 알킬기를 나타내며,
j는 1~3의 수를 나타낸다.)
(상기 일반식(1) 중, Y1은, 단결합, -CR5R6-, -NR7-, 2가의 탄소 원자 수 1~35의 지방족 탄화수소기, 탄소 원자 수 6~35의 방향족 탄화수소기 혹은 탄소 원자 수 2~35의 복소환함유기, 또는 하기 (1-1)~(1-3)으로 나타내는 어느 하나의 치환기를 나타내고,
상기 지방족 탄화수소기는, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며,
Z1 및 Z2는, 각각 독립적으로 직접 결합, -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO2-, -SS-, -SO-, -NR7- 또는 -PR7-을 나타내고,
R5, R6 및 R7은, 각각 독립적으로 수소 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향족 탄화수소기 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기를 나타내며,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)
(상기 식 중, R8은 수소 원자, 또는 치환기를 가지고 있는 경우도 있는 페닐기 혹은 탄소 원자 수 3~10의 시클로알킬기를 나타내고,
R9는 탄소 원자 수 1~10의 알킬기, 탄소 원자 수 1~10의 알콕시기, 탄소 원자 수 2~10의 알케닐기 또는 할로겐 원자를 나타내며, 상기 알킬기, 알콕시기 및 알케닐기는 치환기를 가지고 있는 경우도 있고,
f는 0~5의 정수이며,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)
(*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)
(상기 식 중, R10 및 R11은, 각각 독립적으로 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~10의 알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴옥시기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴티오기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴알케닐기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 7~20의 아릴알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~20의 복소환함유기 또는 할로겐 원자를 나타내고,
상기 알킬기 및 아릴알킬기 중의 메틸렌기는 불포화 결합, -O- 또는 -S-로 치환되어 있는 경우도 있고,
R10은 인접하는 R10끼리 환을 형성하고 있는 경우도 있으며,
p는 0~4의 수를 나타내고,
q는 0~8의 수를 나타내며,
g는 0~4의 수를 나타내고,
h는 0~4의 수를 나타내며,
g와 h의 수의 합계는 2~4이고,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)
(상기 일반식(2) 중, Y11은 3가의 탄소 원자 수 3~35의 지방족 탄화수소기, 탄소 원자 수 3~35의 지환족 탄화수소기 혹은 탄소 원자 수 2~35의 복소환함유기를 나타내고,
Z1, Z2 및 Z3은, 각각 독립적으로 직접 결합, -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO2-, -SS-, -SO-, -NR12- 또는 -PR12-를 나타내며,
R12는 수소 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향족 탄화수소기 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기를 나타내고,
지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)
(상기 일반식(3) 중, Y12는 탄소 원자, 또는 4가의 탄소 원자 수 1~35의 지방족 탄화수소기, 탄소 원자 수 6~35의 방향족 탄화수소기 혹은 탄소 원자 수 2~35의 복소환함유기를 나타내고,
상기 지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며,
Z1~Z4는, 각각 독립적으로 상기 일반식(2)에서의 Z1~Z3으로 나타내는 기와 동일한 범위의 기이고,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)
(상기 일반식(4) 중, Y13은 5가의 탄소 원자 수 2~35의 지방족 탄화수소기, 탄소 원자 수 6~20의 방향족 탄화수소기 또는 탄소 원자 수 2~20의 복소환함유기를 나타내고,
상기 지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며,
Z1~Z5는, 각각 독립적으로 상기 일반식(2)에서의 Z1~Z3으로 나타내는 기와 동일한 범위의 기이고,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)
(상기 일반식(5) 중, Y14는 6가의 탄소 원자 수 2~35의 지방족 탄화수소기, 탄소 원자 수 6~35의 방향족 탄화수소기 또는 탄소 원자 수 2~35의 복소환함유기를 나타내고,
상기 지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며,
Z1~Z6은, 각각 독립적으로 상기 일반식(2)에서의 Z1~Z3으로 나타내는 기와 동일한 범위의 기이고,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)A photosensitive composition containing a compound represented by the following general formula (IA).
(wherein n represents an integer of 2 to 6,
X 1 represents a divalent to hexavalent bonding group represented by the following general formulas (1) to (5),
R 1 and R 2 are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms which may have a substituent, or a substituent which may have a substituent An aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms which may have a substituent, a heterocyclic group or a trialkylsilyl group having 2 to 20 carbon atoms which may have a substituent indicate,
The methylene group in the alkyl group or arylalkyl group represented by R 1 and R 2 is -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -S- CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-, A group selected from -SS- or -SO 2 - may be substituted with a group in which oxygen atoms are not adjacent to each other, R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
j represents a number from 1 to 3.)
(In the general formula (1), Y 1 is a single bond, -CR 5 R 6 -, -NR 7 -, a divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, and an aromatic hydrocarbon having 6 to 35 carbon atoms. a group or a heterocyclic ring-containing group having 2 to 35 carbon atoms, or any substituent represented by the following (1-1) to (1-3);
The aliphatic hydrocarbon group is, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, or oxygen atoms are not adjacent to each other and these It may be substituted with a combined bonding group,
Z 1 and Z 2 are each independently a direct bond, -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO 2 -, -SS-, -SO-, -NR 7 - or -PR 7 -,
R 5 , R 6 and R 7 are each independently a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent, or an aromatic hydrocarbon having 6 to 35 carbon atoms which may have a substituent Represents a heterocyclic ring-containing group having 2 to 35 carbon atoms which may have a group or a substituent,
* means to combine with an adjacent group in the * part.)
(In the formula, R 8 represents a hydrogen atom or a optionally substituted phenyl group or a cycloalkyl group having 3 to 10 carbon atoms,
R 9 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms or a halogen atom, wherein the alkyl group, alkoxy group and alkenyl group have a substituent In some cases,
f is an integer from 0 to 5,
* means to combine with an adjacent group in the * part.)
(* means combining with an adjacent group in the * part.)
(Wherein, R 10 and R 11 are each independently an alkyl group having 1 to 10 carbon atoms which may have a substituent, an aryl group having 6 to 20 carbon atoms which may have a substituent, and a substituent An aryloxy group having 6 to 20 carbon atoms which may have a substituent, an arylthio group having 6 to 20 carbon atoms which may have a substituent, and an arylalkyl group having 6 to 20 carbon atoms which may have a substituent represents a nyl group, an arylalkyl group having 7 to 20 carbon atoms which may have a substituent, a heterocycle-containing group having 2 to 20 carbon atoms or a halogen atom which may have a substituent;
The methylene group in the alkyl group and the arylalkyl group may be substituted with an unsaturated bond, -O- or -S-,
R 10 may form a ring with adjacent R 10 ,
p represents a number from 0 to 4,
q represents a number from 0 to 8,
g represents a number from 0 to 4,
h represents a number from 0 to 4,
The sum of the numbers g and h is 2-4,
* means to combine with an adjacent group in the * part.)
(In the general formula (2), Y 11 represents a trivalent aliphatic hydrocarbon group having 3 to 35 carbon atoms, an alicyclic hydrocarbon group having 3 to 35 carbon atoms, or a heterocyclic group containing 2 to 35 carbon atoms,
Z 1 , Z 2 and Z 3 are each independently a direct bond, -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO 2 -, -SS-, - SO-, -NR 12 - or -PR 12 -,
R 12 is a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent, an aromatic hydrocarbon group having 6 to 35 carbon atoms which may have a substituent or carbon which may have a substituent represents a heterocyclic-containing group having 2 to 35 atoms,
The aliphatic hydrocarbon group is a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, or oxygen atoms are mutually It may be substituted with a bonding group that is not adjacent to each other and combines them,
* means to combine with an adjacent group in the * part.)
(In the general formula (3), Y 12 is a carbon atom, or a tetravalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic hydrocarbon group having 6 to 35 carbon atoms, or a heterocyclic ring having 2 to 35 carbon atoms. represents the flag,
The aliphatic hydrocarbon group is a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, or an oxygen valence In some cases, they are not adjacent to each other and are substituted with a bonding group that combines them,
Z 1 to Z 4 are each independently a group in the same range as the group represented by Z 1 to Z 3 in the general formula (2),
* means to combine with an adjacent group in the * part.)
(In the general formula (4), Y 13 represents a pentavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms, or a heterocycle-containing group having 2 to 20 carbon atoms,
The aliphatic hydrocarbon group is a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, or an oxygen valence In some cases, they are not adjacent to each other and are substituted with a bonding group that combines them,
Z 1 to Z 5 are each independently a group in the same range as the group represented by Z 1 to Z 3 in the general formula (2),
* means to combine with an adjacent group in the * part.)
(In the general formula (5), Y 14 represents a hexavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms, an aromatic hydrocarbon group having 6 to 35 carbon atoms, or a heterocycle-containing group having 2 to 35 carbon atoms,
The aliphatic hydrocarbon group is a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, or an oxygen valence In some cases, they are not adjacent to each other and are substituted with a bonding group that combines them,
Z 1 to Z 6 are each independently a group in the same range as the group represented by Z 1 to Z 3 in the general formula (2),
* means to combine with an adjacent group in the * part.)
(식 중, R1은 t-부틸기이고,
R2는 수소원자이고,
R82, R83 및 R84는, 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 수산기, 니트로기, 카복실기, 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기 혹은 탄소 원자 수 2~20의 복소환함유기를 나타낸다.)
(식 중, R1은 t-부틸기이고,
R2는 수소원자이고,
r=2~6이며, X2는, r=2일 때 하기 일반식(1)로 나타내는 기이고, r=3일 때 하기 일반식(2)로 나타내는 기이며, r=4일 때 하기 일반식(3)으로 나타내는 기이고, r=5일 때 하기 일반식(4)이며, r=6일 때 하기 일반식(5)이고, R92 및 R93은, 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 수산기, 니트로기, 카복실기, 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기 혹은 탄소 원자 수 2~20의 복소환함유기를 나타낸다.)
(상기 일반식(1) 중, Y1은, 단결합, -CR5R6-, -NR7-, 2가의 탄소 원자 수 1~35의 지방족 탄화수소기, 탄소 원자 수 6~35의 방향족 탄화수소기 혹은 탄소 원자 수 2~35의 복소환함유기, 또는 하기 (1-1)~(1-3)으로 나타내는 어느 하나의 기를 나타내고,
상기 지방족 탄화수소기는, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며,
Z1 및 Z2는, 각각 독립적으로 직접 결합, -O-, -S-, >CO, -CO-O-, -O-CO-, -SO2-, -SS-, -SO-, -NR7- 또는 -PR7-을 나타내고,
R5, R6 및 R7은, 각각 독립적으로 수소 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향족 탄화수소기 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기를 나타내며,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)
(상기 식 중, R8은 수소 원자, 또는 치환기를 가지고 있는 경우도 있는 페닐기 혹은 탄소 원자 수 3~10의 시클로알킬기를 나타내고,
R9는 탄소 원자 수 1~10의 알킬기, 탄소 원자 수 1~10의 알콕시기, 탄소 원자 수 2~10의 알케닐기 또는 할로겐 원자를 나타내며, 상기 알킬기, 알콕시기 및 알케닐기는 치환기를 가지고 있는 경우도 있고,
f는 0~5의 정수이며,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)
(*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)
(상기 식 중, R10 및 R11은, 각각 독립적으로 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~10의 알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴옥시기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴티오기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴알케닐기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 7~20의 아릴알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~20의 복소환함유기, 또는 할로겐 원자를 나타내고,
상기 알킬기 및 아릴알킬기 중의 메틸렌기는 불포화 결합, -O- 또는 -S-로 치환되어 있는 경우도 있고,
R10은 인접하는 R10끼리 환을 형성하고 있는 경우도 있으며,
p는 0~4의 수를 나타내고,
q는 0~8의 수를 나타내며,
g는 0~4의 수를 나타내고,
h는 0~4의 수를 나타내며,
g와 h의 수의 합계는 2~4이고,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)
(상기 일반식(2) 중, Y11은 3가의 탄소 원자 수 1~35의 지방족 탄화수소기, 탄소 원자 수 3~35의 지환족 탄화수소기, 탄소 원자 수 6~35의 방향족 탄화수소기 또는 탄소 원자 수 2~35의 복소환함유기를 나타내고,
Z1, Z2 및 Z3은, 각각 독립적으로 직접 결합, -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO2-, -SS-, -SO-, -NR12 - 또는 -PR12-를 나타내며,
R12는 수소 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향족 탄화수소기 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기를 나타내고,
지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)
(상기 일반식(3) 중, Y12는 탄소 원자, 또는 4가의 탄소 원자 수 1~35의 지방족 탄화수소기, 탄소 원자 수 6~35의 방향족 탄화수소기 혹은 탄소 원자 수 2~35의 복소환함유기를 나타내고,
상기 지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며,
Z1~Z4는, 각각 독립적으로 상기 일반식(2)에서의 Z1~Z3으로 나타내는 기와 동일한 범위의 기이고,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)
(상기 일반식(4) 중, Y13은 5가의 탄소 원자 수 2~35의 지방족 탄화수소기, 탄소 원자 수 6~20의 방향족 탄화수소기 또는 탄소 원자 수 2~20의 복소환함유기를 나타내고,
상기 지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며,
Z1~Z5는, 각각 독립적으로 상기 일반식(2)에서의 Z1~Z3으로 나타내는 기와 동일한 범위의 기이고,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)
(상기 일반식(5) 중, Y14는 6가의 탄소 원자 수 2~35의 지방족 탄화수소기, 탄소 원자 수 6~35의 방향족 탄화수소기 또는 탄소 원자 수 2~35의 복소환함유기를 나타내고,
상기 지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며,
Z1~Z6은, 각각 독립적으로 상기 일반식(2)에서의 Z1~Z3으로 나타내는 기와 동일한 범위의 기이고,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)
(식 중, R201, R202, R203, R204, R205, R206, R207, R208은, 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 수산기, 니트로기, 카복실기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기 또는 탄소 원자 수 2~20의 복소환함유기를 나타내고, Y1, Z1 및 Z2는 상기 일반식(1)과 동일하다.)A photosensitive composition containing a compound represented by the following general formula (II-1), (II-2) or (II-3).
(Wherein, R 1 is a t-butyl group,
R 2 is a hydrogen atom,
R 82 , R 83 and R 84 are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, or an optionally substituted alkyl group having 1 to 40 carbon atoms, the number of carbon atoms represents an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms.)
(Wherein, R 1 is a t-butyl group,
R 2 is a hydrogen atom,
r = 2 to 6, X 2 is a group represented by the following general formula (1) when r = 2, a group represented by the following general formula (2) when r = 3, and the following general formula (2) when r = 4 It is a group represented by formula (3), when r=5, it is the following general formula (4), when r=6, it is the following general formula (5), R 92 and R 93 are each independently a hydrogen atom and a halogen atom , a cyano group, a hydroxyl group, a nitro group, a carboxyl group, or an alkyl group having 1 to 40 carbon atoms which may have a substituent, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or carbon It represents a heterocycle-containing group having 2 to 20 atoms.)
(In the general formula (1), Y 1 is a single bond, -CR 5 R 6 -, -NR 7 -, a divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, and an aromatic hydrocarbon having 6 to 35 carbon atoms. a group or a heterocyclic ring-containing group having 2 to 35 carbon atoms, or any group represented by the following (1-1) to (1-3);
The aliphatic hydrocarbon group is, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, or oxygen atoms are not adjacent to each other and these It may be substituted with a combined bonding group,
Z 1 and Z 2 are each independently a direct bond, -O-, -S-, >CO, -CO-O-, -O-CO-, -SO 2 -, -SS-, -SO-, - NR 7 - or -PR 7 -,
R 5 , R 6 and R 7 are each independently a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent, or an aromatic hydrocarbon having 6 to 35 carbon atoms which may have a substituent Represents a heterocyclic ring-containing group having 2 to 35 carbon atoms which may have a group or a substituent,
* means to combine with an adjacent group in the * part.)
(In the formula, R 8 represents a hydrogen atom or a optionally substituted phenyl group or a cycloalkyl group having 3 to 10 carbon atoms,
R 9 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms or a halogen atom, wherein the alkyl group, alkoxy group and alkenyl group have a substituent In some cases,
f is an integer from 0 to 5,
* means to combine with an adjacent group in the * part.)
(* means combining with an adjacent group in the * part.)
(Wherein, R 10 and R 11 are each independently an alkyl group having 1 to 10 carbon atoms which may have a substituent, an aryl group having 6 to 20 carbon atoms which may have a substituent, and a substituent An aryloxy group having 6 to 20 carbon atoms which may have a substituent, an arylthio group having 6 to 20 carbon atoms which may have a substituent, and an arylalkyl group having 6 to 20 carbon atoms which may have a substituent represents a nyl group, an arylalkyl group having 7 to 20 carbon atoms which may have a substituent, a heterocyclic ring-containing group having 2 to 20 carbon atoms which may have a substituent, or a halogen atom;
The methylene group in the alkyl group and the arylalkyl group may be substituted with an unsaturated bond, -O- or -S-,
R 10 may form a ring with adjacent R 10 ,
p represents a number from 0 to 4,
q represents a number from 0 to 8,
g represents a number from 0 to 4,
h represents a number from 0 to 4,
The sum of the numbers g and h is 2-4,
* means to combine with an adjacent group in the * part.)
(In the general formula (2), Y 11 is a trivalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, an alicyclic hydrocarbon group having 3 to 35 carbon atoms, an aromatic hydrocarbon group having 6 to 35 carbon atoms, or a carbon atom represents a heterocycle-containing group of number 2-35,
Z 1 , Z 2 and Z 3 are each independently a direct bond, -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO 2 -, -SS-, - SO-, -NR 12 - or -PR 12 -,
R 12 is a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent, an aromatic hydrocarbon group having 6 to 35 carbon atoms which may have a substituent or carbon which may have a substituent represents a heterocyclic-containing group having 2 to 35 atoms,
The aliphatic hydrocarbon group is a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, or oxygen atoms are mutually It may be substituted with a bonding group that is not adjacent to each other and combines them,
* means to combine with an adjacent group in the * part.)
(In the general formula (3), Y 12 is a carbon atom, or a tetravalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic hydrocarbon group having 6 to 35 carbon atoms, or a heterocyclic ring having 2 to 35 carbon atoms. represents the flag,
The aliphatic hydrocarbon group is a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, or an oxygen valence In some cases, they are not adjacent to each other and are substituted with a bonding group that combines them,
Z 1 to Z 4 are each independently a group in the same range as the group represented by Z 1 to Z 3 in the general formula (2),
* means to combine with an adjacent group in the * part.)
(In the general formula (4), Y 13 represents a pentavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms, or a heterocycle-containing group having 2 to 20 carbon atoms,
The aliphatic hydrocarbon group is a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, or an oxygen valence In some cases, they are not adjacent to each other and are substituted with a bonding group that combines them,
Z 1 to Z 5 are each independently a group in the same range as the group represented by Z 1 to Z 3 in the general formula (2),
* means to combine with an adjacent group in the * part.)
(In the general formula (5), Y 14 represents a hexavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms, an aromatic hydrocarbon group having 6 to 35 carbon atoms, or a heterocycle-containing group having 2 to 35 carbon atoms,
The aliphatic hydrocarbon group is a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, or an oxygen valence In some cases, they are not adjacent to each other and are substituted with a bonding group that combines them,
Z 1 to Z 6 are each independently a group in the same range as the group represented by Z 1 to Z 3 in the general formula (2),
* means to combine with an adjacent group in the * part.)
(Wherein, R 201 , R 202 , R 203 , R 204 , R 205 , R 206 , R 207 , and R 208 are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, and a substituent the number is also carbon atom to which the case has 1 to 40 alkyl group, a heterocyclic ring of carbon atoms from 6 to 20 aryl group, a carbon atom number of 7-20 arylalkyl group or 2 to 20 carbon atoms of the monovalent contained, Y 1 , Z 1 and Z 2 are the same as in General Formula (1).)
The photosensitive composition containing the compound of the structure shown in any one of the following.
A compound represented by any one of the following structures (B) to (O).
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JP6889151B2 (en) | 2021-06-18 |
CN108473609B (en) | 2022-08-30 |
JPWO2017170182A1 (en) | 2019-02-07 |
TWI771294B (en) | 2022-07-21 |
CN108473609A (en) | 2018-08-31 |
WO2017170182A1 (en) | 2017-10-05 |
KR20180132599A (en) | 2018-12-12 |
TW201806918A (en) | 2018-03-01 |
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