KR102284143B1 - SCRUBBER AND PFCs AND NOx REMOVING SYSTEM - Google Patents

Abstract

An object of the present invention is to remove per-fluoro compounds (PFCs) contained in process gas with ammonia converted from urea water and to effectively remove nitrogen oxides (NOx) generated at this time. will provide The system for removing perfluorinated compounds and nitrogen oxides according to an embodiment of the present invention is a urea water converter for converting supplied urea water into ammonia, and a perfluorinated compound contained in a target gas by generating a plasma arc connected to the urea water converter Removes (PFCs) and includes a scrubber that removes nitrogen oxides generated during the removal of perfluorinated compounds with ammonia supplied from the urea water converter.

Description

Perfluorinated compounds and nitrogen oxide removal system {SCRUBBER AND PFCs AND NOx REMOVING SYSTEM}

The present invention relates to a system for removing perfluorinated compounds and nitrogen oxides, and more particularly, perfluorinated compounds (PFCs) included in process gas and per-fluoro compounds (PFCs) for removing nitrogen oxides (NOx) generated at this time; It relates to a nitrogen oxide removal system.

It is known that per-fluoro compounds (PFCs) emitted together with process gases used in semiconductor manufacturing processes and display manufacturing processes should be removed as representative warming gases. The scrubber of the system for removing perfluorinated compounds (PFCs) includes a combustion type (Burn-wet), a plasma type (Plasma), and a heating type (Heat-wet).

When there is N ₂ O in the discharged process gas or air (or oxygen) flows into the inside due to a leak in the pipe connection, the plasma type scrubber operates at a level of thousands of ppm of NOx due to high-temperature reaction conditions. causes

Therefore, a system for removing perfluorinated compounds (PFCs) must remove NOx generated in the process of removing perfluorinated compounds. However, burn-wet, plasma, and heat-wet scrubbers applied to conventional systems have a problem in that they do not provide a means for removing NOx.

An object of the present invention is to remove per-fluoro compounds (PFCs) contained in process gas with ammonia converted from urea water and to effectively remove nitrogen oxides (NOx) generated at this time. will provide

The system for removing perfluorinated compounds and nitrogen oxides according to an embodiment of the present invention is a urea water converter for converting supplied urea water into ammonia, and a perfluorinated compound contained in a target gas by generating a plasma arc connected to the urea water converter Removes (PFCs) and includes a scrubber that removes nitrogen oxides generated during the removal of perfluorinated compounds with ammonia supplied from the urea water converter.

The scrubber may be provided in one or a plurality to be connected to the urea converter.

The scrubber includes a high voltage electrode to which a DC or AC high voltage is applied, and a housing that forms a discharge gap between the high voltage electrode and the high voltage electrode, is grounded by embedding the high voltage electrode, and has a length in a first direction, the housing having an internal A first gas supply port for supplying a discharge gas for generating a plasma arc to the passage, a first gas supply port for supplying a target gas containing perfluorinated compounds (PFCs) to the inner passage through the second direction intersecting the first direction 2 gas supply ports, and a high-temperature region passage that is narrower than the inner passage at the opposite side of the high voltage electrode and has a discharge port at the end of the first direction, forming a temperature higher than the temperature of the inner passage, wherein the urea water converter includes A first ammonia supply pipe may be connected to the high-temperature passage to supply ammonia to the high-temperature passage.

The urea water converter may be connected to the second gas supply port through a second ammonia supply pipe to supply ammonia to the second gas supply port.

The high voltage electrode may have a connection passage connected to the internal passage, and the urea water converter may be connected to the connection passage through a third ammonia supply pipe to supply ammonia to the connection passage.

The discharge port may be formed at an arc point at which a plasma arc generated in the discharge gap and proceeding from an end of the high voltage electrode to the high temperature region passage is fixed.

The first ammonia supply pipe may be installed toward a center in the second direction in the high-temperature region passage.

The first ammonia supply pipe may be installed toward the second direction at a position spaced apart from the center of the second direction of the high-temperature region passage by a distance Δd set in a third direction crossing the second direction.

The first ammonia supply pipe includes an inner tube installed in a circumferential direction around the high-temperature region passage, and a supply hole formed to inject ammonia from the inner tube toward the high-temperature region passage, and the supply hole is in the circumferential direction. It is formed in a plurality of spaced apart from each other, and may be directed in an inclined direction at an angle set in the radial direction of the high-temperature region passage.

The scrubber is a plasma arc generator for generating a plasma arc with the discharge gas supplied to the first gas supply port, and is connected to the plasma arc generator and removes perfluorinated compounds (PFCs) from the target gas supplied to the second gas supply port. and a removal unit for removing the generated nitrogen oxides, wherein the urea water converter is connected to the high temperature region passage of the removal unit through a first ammonia supply pipe to supply ammonia to the removal unit.

The urea water converter may be connected to the second gas supply port of the removal unit through a second ammonia supply pipe to supply ammonia to the second gas supply port.

The scrubber includes a high voltage electrode to which a positive DC voltage is applied, a first housing to which a negative voltage is applied by forming a discharge gap between the high voltage electrode and the built-in high voltage electrode and having a length in a first direction, and the first a second housing connected to the housing in the first direction, wherein the first housing includes a first gas supply port for supplying a discharge gas for forming a plasma arc to the first inner passage, and the high voltage electrode from the opposite side and a high-temperature region passage narrower than the first inner passage and having a temperature higher than a temperature of the first inner passage having a discharge port at the end of the first direction, wherein the second housing crosses the second direction and a second gas supply port for supplying a target gas containing perfluorinated compounds (PFCs) to a second inner passage passing through the direction and connected to the high temperature region passage, wherein the urea water converter is provided to the first inner passage Ammonia may be supplied to the inner passage by being connected to one ammonia supply pipe.

The urea water converter may be connected to the second gas supply port through a second ammonia supply pipe to supply ammonia to the second gas supply port.

As such, an embodiment of the present invention converts urea water into ammonia in a urea water converter, and supplies the converted ammonia to a scrubber to remove the perfluorinated compounds (PFCs) contained in the target gas due to the high heat of the plasma arc, At this time, nitrogen oxides generated can be removed by reacting with ammonia to convert them to nitrogen. In one embodiment, since the generated nitrogen oxide (NOx) is mixed with ammonia under a high temperature condition (eg, 1000° C. or higher) and reacted, the reduction efficiency with _{nitrogen (N 2 ) can be improved.}

1 is a block diagram of a system for removing perfluorinated compounds and nitrogen oxides according to a first embodiment of the present invention.
2 is a block diagram of a system for removing perfluorinated compounds and nitrogen oxides according to a second embodiment of the present invention.
3 is a cross-sectional view of the first scrubber applied to the perfluorinated compound and nitrogen oxide removal system of the present invention.
FIG. 4 is a cross-sectional view of the first ammonia supply pipe and the high-temperature region passage along the line IV-IV of FIG. 3 .
5 is a cross-sectional view of the first ammonia supply pipe and the high-temperature region passage in the second scrubber applied to the perfluorinated compound and nitrogen oxide removal system of the present invention.
6 is another cross-sectional view of the first ammonia supply pipe and the high-temperature region passage in the third scrubber applied to the perfluorinated compound and nitrogen oxide removal system of the present invention.
7 is a cross-sectional view of a fourth scrubber applied to the perfluorinated compound and nitrogen oxide removal system of the present invention.
8 is a cross-sectional view of a fifth scrubber applied to the perfluorinated compound and nitrogen oxide removal system of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those of ordinary skill in the art to which the present invention pertains can easily implement them. However, the present invention may be embodied in many different forms and is not limited to the embodiments described herein. In order to clearly explain the present invention in the drawings, parts irrelevant to the description are omitted, and the same reference numerals are assigned to the same or similar components throughout the specification.

1 is a block diagram of a system for removing perfluorinated compounds and nitrogen oxides according to a first embodiment of the present invention. Referring to FIG. 1 , the perfluorinated compound and nitrogen oxide removal system 1 of the first embodiment includes a urea water converter 10 and a scrubber 20 .

The urea water converter 10 is configured to convert the supplied urea water into ammonia, so that it is possible to remove the nitrogen oxides generated during the operation of the perfluorinated compound and nitrogen oxide removal system 1 , that is, during the removal of the perfluorinated compound. As an example, the scrubber 20 is configured as one and connected to one urea number converter 10 in a 1:1 relationship.

The scrubber 20 is connected to the urea water converter 10 through the first ammonia supply pipe 24 to receive the converted ammonia from the urea water converter 10 . The scrubber 20 is configured to generate a plasma arc to remove perfluorinated compounds (PFCs) contained in the target gas, and to remove nitrogen oxides generated when the perfluorinated compounds are removed with ammonia.

The scrubber 20 suppresses the generation of NOx in the process of removing the perfluorinated compounds (PFCs) contained in the process gas, and induces a SNCR (Selective NonCatalytic Reduction) reaction to remove the generated NOx, To this end, ammonia, which is a reducing agent, is supplied.

The reducing agent used in the first embodiment is ammonia gas. Ammonia gas is decomposed through conversion of urea water, and nitrogen oxidation (NOx) generated in the process of removing perfluorinated compounds (PFCs) is reduced and removed _{to nitrogen (N 2 ).}

Since the urea water converter 10 converts urea water into ammonia and supplies ammonia in gaseous state to the scrubber 20, the first ammonia supply pipe 24 is configured as a double pipe for circulating cooling water as when supplying urea water. you don't have to

That is, since the urea water converter 10 directly supplies ammonia in gaseous state to the scrubber 20, the structure of the first ammonia supply pipe 24 can be simplified compared to the urea water supply pipe for supplying urea water.

2 is a block diagram of a system for removing perfluorinated compounds and nitrogen oxides according to a second embodiment of the present invention. Referring to FIG. 2 , in the perfluorinated compound and nitrogen oxide removal system 2 of the second embodiment, the scrubbers 201 , 202 , 203 , 204 , and 205 are provided in plurality in one urea converter 10 . 1:1 relationship.

At this time, the first ammonia supply pipe 24 is branched into each of the supply pipes 111 , 112 , 113 , 114 , 115 and is connected to each of the scrubbers 201 , 202 , 203 , 204 , 205 to independently convert the converted ammonia gas. can supply

As described above, since one urea water converter 10 with increased capacity is connected to a plurality of scrubbers 201, 202, 203, 204, and 205 to supply ammonia, a perfluorinated compound and nitrogen oxide removal system 2 is manufactured. and operating costs can be reduced.

3 is a cross-sectional view of the first scrubber applied to the perfluorinated compound and nitrogen oxide removal system of the present invention. For convenience, the first scrubber 20 applied to the first embodiment will be described. Referring to FIG. 3 , the first scrubber 20 includes a plasma generating unit 200 and a removing unit 300 .

The plasma generating unit 200 is configured to generate a plasma arc PA with the discharge gas supplied to the first gas supply port 21 . The removal unit 300 is connected to the plasma generating unit 200 to remove the perfluorinated compounds (PFCs) contained in the target gas supplied to the second gas supply port 22, and to remove the nitrogen oxides generated at this time. do.

The urea water converter 10 is connected to the high temperature region passage 23 of the removal unit 300 through the first ammonia supply pipe 24 to supply the converted ammonia gas to the removal unit 300 . The urea water converter 10 may be connected to the second gas supply port 22 of the removal unit 300 through a second ammonia supply pipe 241 to further supply ammonia to the second gas supply port 22 .

Specifically, the first scrubber 20 is configured to generate plasma discharge, and for this purpose, direct current or alternating current It includes a high voltage electrode 30 to which a high voltage (HV) is applied, and a housing 40 in which the high voltage electrode 30 is embedded and electrically grounded.

The housing 40 forms an inner passage P and has a length set in the first direction (x-axis direction). Accordingly, a discharge gap G for generating plasma discharge is formed between the inner surface of the housing 40 and the outer surface of the high voltage electrode 30 .

The high voltage electrode 30 is installed in an electrically insulating state with an insulating member 31 interposed on one side of the housing 40 . The high voltage electrode 30 is formed in an extended structure from the insulating member 31 to the discharge gap G along the first direction, and is formed in a reduced structure again after the discharge gap G.

The high voltage HV is set to a voltage of a magnitude capable of generating a plasma arc PA with a plasma discharge required between the housing 40 acting as a ground electrode and the high voltage electrode 30, and is an alternating voltage. The high voltage electrode 30 may be formed in a streamline shape for smooth flow of the discharge gas, the plasma arc PA, and the target gas.

The housing 40 acts as a ground electrode and accommodates the high voltage electrode 30 to form a discharge gap G between the high voltage electrode 30 and the housing 40 . The housing 40 is formed in a cylindrical structure at the high voltage electrode 30 and the discharge gap (G) side. Therefore, due to the shape of the high voltage electrode 30 , the internal passage P has a wider structure in front and rear of the discharge gap G than in the discharge gap G.

In the first scrubber 20 applied to the first embodiment, the housing 40 includes a first gas supply port 21 , a second gas supply port 22 , a high temperature region passage 23 , and a first ammonia supply pipe ( 24).

The first gas supply port 21 is provided on the installation side of the high voltage electrode 30 in the housing 40 to supply the discharge gas before the discharge gap G. Accordingly, the discharge gas may generate a plasma arc PA in the internal passage P through plasma discharge in the discharge gap G.

The second gas supply port 22 passes through the housing 40 in a second direction (y-axis direction) intersecting the first direction (x-axis direction) to pass a target gas containing perfluorinated compounds (PFCs) into an internal passage ( P) is supplied. That is, the second gas supply port 22 supplies a process gas containing perfluorinated compounds (PFCs).

The second gas supply port 22 is located in the discharge gap (G) and the inner passage (P) after the discharge gap (G) to supply the target gas to the inner passage (P), so that the perfluorinated compound contained in the target gas reacts This allows it to be heated to a temperature sufficient to decompose.

The high temperature region passage 23 is configured to decompose and remove most of the perfluorinated compounds while discharging the flames caused by the perfluorinated compounds to the outlet 25 . As an example, the high-temperature region passage 23 is narrower than the inner passage P on the opposite side of the high voltage electrode 30 in the first direction (x-axis direction) and forms a temperature higher than the temperature of the inner passage P. The high-temperature region passage 23 has a discharge port 25 at the end of the first direction (y-axis direction), that is, in the front.

The first ammonia supply pipe 24 is connected to the high temperature region passage 23 so as to supply the converted ammonia to the high temperature region passage 23 and sufficiently mix with the target gas. The first ammonia supply pipe 24 is connected before the arc point AP where the supplied ammonia is mixed with the target gas in the high temperature region passage 23 and the plasma arc PA is fixed in the high temperature region passage 23 , Ammonia gas is supplied before the point (AP).

The plasma arc PA is connected to the discharge port 25 . That is, the discharge port 25 is formed at a position where the plasma arc PA generated in the discharge gap G and proceeding from the end of the high voltage electrode 30 to the high temperature region passage 23 is fixed.

That is, the discharge port 25 is formed at the arc point AP. In addition, the discharge port 25 is formed at a position where the flame generated by the decomposition and removal of the perfluorinated compound included in the target gas passing through the high temperature region passage 23 is discharged.

The high-temperature region passage 23 is formed to be narrower than the inner passage P, and strongly discharges the plasma arc PA compressed in the high-temperature region passage 23 to the discharge port 25 . Since the plasma arc PA is fixed to the arc point AP of the discharge port 25 , a higher temperature may be formed as the density of the plasma arc PA increases in the high temperature region passage 23 .

Before the plasma arc PA is fixed at the arc point AP of the discharge port 25 , ammonia is supplied and effectively mixed with the target gas due to the high temperature in the high temperature region passage 23 . Therefore, the amount of use of ammonia, which is a reducing agent, can be reduced.

The length Lx of the first direction (x-axis direction) of the high-temperature region passage 23 is the time and space in which perfluorinated compounds passing through the plasma arc PA concentrated in the high-temperature region passage 23 are decomposed in the high-temperature region. provides

The first scrubber 20 applied to the first embodiment supplies water to the water supply pipe 26 in order to fix the fluorine (F) decomposed from the perfluorinated compound in the first scrubber 20 and the high-temperature region passage 23. do. The decomposed fluorine (F) reacts with the supplied water to form hydrogen fluoride (HF).

As an example, the water supply pipe 26 is connected to the reduced portion where the high temperature region passage 23 starts in the housing 40 to supply water. Since water is rapidly vaporized at the beginning of the high-temperature zone passage 23, it improves the mixing characteristics with the fluorine decomposed in the perfluorinated compound.

Therefore, most of the perfluorinated compounds (PFCs) are decomposed and removed in the high temperature region passage (23). As described above, as perfluorinated compounds (PFCs) are decomposed and removed in the high-temperature region passage 23 , nitrogen oxides (NOx) are generated in the high-temperature region passage 23 .

The first ammonia supply pipe 24 supplies ammonia to the high temperature region passage 23 . Ammonia acts as a reducing agent that induces a SNCR (Selective NonCatalytic Reduction) reaction. That is, ammonia is sufficiently mixed with the target gas in the high-temperature region passage 23 to suppress the formation of nitrogen oxides (NOx) and remove the generated nitrogen oxides (NOx).

In the region after the high-temperature region passage 23, there is not enough volume or time to maintain a temperature of 1000° C. or higher. Accordingly, the first ammonia supply pipe 24 supplies ammonia gas to the high temperature region passage 23 .

Water supplied to the water supply pipe 26 is used as a source of H when perfluorinated compounds (PFCs) are removed. Ammonia is supplied to the first ammonia supply pipe 24 . The supplied ammonia (NH _{3 ) is converted to N 2} by reacting with NOx generated when the perfluorinated compounds (PFCs) are removed (see Formula 1).

NOx + NH ₃ → N ₂ + H ₂ O (Formula 1)

The system 1 for removing perfluorinated compounds and nitrogen oxides enables an effective reaction of ammonia supplied to the first ammonia supply pipe 24 in the first scrubber 20, and removes urea water by the urea water coverter 10. When used, it enables safer and easier handling than when ammonia gas is directly used.

FIG. 4 is a cross-sectional view of the first ammonia supply pipe and the high-temperature region passage along the line IV-IV of FIG. 3 . Referring to FIG. 4 , the first ammonia supply pipe 24 may be installed toward the center of the second direction (y-axis direction) in the high-temperature region passage 23 .

That is, the ammonia supplied to the first ammonia supply pipe 24 is supplied to the radial center of the high-temperature region passage 23 and flows in the first direction (x-axis direction) intersecting the plasma arc PA and the high temperature target gas. mixed by the flow of

Therefore, nitrogen oxides (NOx) and ammonia generated simultaneously with the removal and reduction of perfluorinated compounds effectively react in the high-temperature region passage 23, so that nitrogen oxides can be rapidly reduced and removed to _{nitrogen (N 2 ).}

On the other hand, the inner diameter (φ) of the first ammonia supply pipe 24 is formed to be smaller than 1/2 of the inner diameter (D) of the high-temperature region passage 23 (φ < D/2). When the inner diameter (φ) of the first ammonia supply pipe 24 is equal to or greater than 1/2 of the inner diameter (D) of the high-temperature region passage 23, an amount of ammonia greater than the amount of ammonia required to remove nitrogen oxides (NOx) may be supplied. can

Referring back to FIG. 1 , the urea water converter 10 is further connected to the second gas supply port 22 through a second ammonia supply pipe 241 . That is, the first ammonia supply pipe 24 is branched into the second ammonia supply pipe 241 , and the second ammonia supply pipe 241 supplies ammonia to the second gas supply port 22 .

Therefore, ammonia supplied to the second ammonia supply pipe 241 is mixed with the target gas at the second gas supply port 22 and supplied to the internal passage P. Ammonia is pre-mixed with the target gas in the internal passage (P), and reacts more effectively with nitrogen oxides (NOx) generated when the perfluorinated compound is removed in the high-temperature region passage (23), thereby rapidly _{converting nitrogen oxides to nitrogen (N 2 )} to be able to be reduced and removed.

Hereinafter, various embodiments will be described. Compared with the first embodiment and the previously described embodiments, configurations that are identical to each other will be omitted and different configurations will be described.

5 is a cross-sectional view of the first ammonia supply pipe and the high-temperature region passage in the second scrubber applied to the perfluorinated compound and nitrogen oxide removal system of the present invention. Referring to FIG. 5 , in the second scrubber 220 , the first ammonia supply pipe 424 intersects in the second direction at the center of the high temperature region passage 423 in the housing 40 in the second direction (y-axis direction). It is installed toward the second direction at a position spaced apart by a distance Δd set in the third direction (z-axis direction).

That is, the first ammonia supply pipe 424 supplies ammonia to the high-temperature region passage 423 at a position spaced apart from the center by the distance Δd, so that ammonia swirl S is generated while being guided by the inner peripheral surface of the high-temperature region passage 423. .

Ammonia swirl (S) further promotes the mixing of ammonia with the plasma arc (PA) and target gas in the x-axis direction, and suppresses the generation of nitrogen oxides (NOx) when perfluorinated compounds (PFCs) are decomposed and removed. and further removes the generated nitrogen oxides (NOx). Accordingly, the amount of ammonia, which is a reducing agent, can be further reduced.

6 is another cross-sectional view of the first ammonia supply pipe and the high-temperature region passage in the third scrubber applied to the perfluorinated compound and nitrogen oxide removal system of the present invention. Referring to FIG. 6 , in the third scrubber 320 , the first ammonia supply pipe 524 includes an inner pipe 521 and a supply hole 522 .

The inner tube 521 is installed in the circumferential direction around the high temperature region passage 523 in the housing 40 , and the supply hole 522 injects ammonia from the inner tube 521 toward the high temperature region passage 523 . formed to do

The supply holes 522 are formed in plurality to be spaced apart from each other in the circumferential direction. Each of the supply holes 522 is formed toward an inclined direction of an angle θ set in the radial direction of the high temperature region passage 523 .

The inner pipe 521 forms a distribution space of ammonia from the first ammonia supply pipe 524 to the supply holes 522 to uniformly distribute ammonia through the plurality of supply holes 522 arranged along the circumferential direction. make it possible Accordingly, the supply holes 522 improve the mixing characteristics of ammonia and the target gas in the high temperature region passage 523 .

Since the supply holes 522 and the inclined angle θ supply ammonia to the high-temperature passage 523, ammonia swirl occurs at a plurality of positions while being guided by the inner peripheral surface of the high-temperature passage 523.

All ammonia swirls occurring at a plurality of positions promote the mixing of the plasma arc (PA) and the target gas and ammonia in the x-axis direction, so that when the perfluorinated compounds (PFCs) are decomposed and removed, nitrogen oxides (NOx) are generated. and removes the generated nitrogen oxides (NOx). Accordingly, the amount of ammonia, which is a reducing agent, can be further reduced.

7 is a cross-sectional view of a fourth scrubber applied to the perfluorinated compound and nitrogen oxide removal system of the present invention. Referring to FIG. 7 , in the fourth scrubber 420 , the high voltage electrode 610 has a connection passage 67 connected to the internal passage P.

Therefore, the urea water converter 10 is connected to the third ammonia supply pipe 242 in the connection passage 67 , and supplies ammonia to the connection passage 67 . That is, ammonia is supplied to the high temperature region passage 23 through the first ammonia supply pipe 24 , and is further supplied to the internal passage P through the third ammonia supply pipe 242 and the connection passage 67 .

Ammonia is mixed with the target gas in the inner passage (P), and is mixed with the target gas in the high temperature region passage (23). That is, when ammonia is promoted to be mixed with the plasma arc (PA) and target gas that proceeds in the x-axis direction, when the perfluorinated compounds (PFCs) are decomposed and removed, the generation of nitrogen oxides (NOx) is suppressed, and the generated nitrogen oxides (NOx) ) is removed. Accordingly, the amount of ammonia, which is a reducing agent, can be further reduced.

As described above, the ammonia supplied to the third ammonia supply pipe 242 and the connection passage 67 is a reducing agent that induces a selective non-catalytic reduction (SNCR) reaction together with the ammonia supplied to the first ammonia supply pipe 24 . works

8 is a cross-sectional view of a fifth scrubber applied to the perfluorinated compound and nitrogen oxide removal system of the present invention. Referring to FIG. 8 , the fifth scrubber 520 includes a high voltage electrode 510 , a first housing 540 , and a second housing 530 .

A positive DC voltage is applied to the high voltage electrode 510 . The first housing 540 forms a discharge gap G5 between the high voltage electrode 510 and the high voltage electrode 510 , and has a length set in the first direction (x-axis direction). A negative voltage is applied to the first housing 540 . The second housing 530 is connected to the first housing 540 in a first direction (x-axis direction).

The first housing 540 includes a first gas supply port 541 and a high temperature region passage 523 . The first gas supply port 541 supplies the discharge gas forming the plasma arc PA2 to the first internal passage P21 .

The high-temperature region passage 523 is narrower than the first internal passage P21 on the opposite side of the high voltage electrode 510 and has a discharge port 545 at the end of the first direction (x-axis direction). The high temperature region passage 523 forms a temperature higher than the temperature of the first inner passage P21.

The second housing 530 includes a second gas supply port 528 penetrating in a second direction (y-axis direction) crossing the first direction (x-axis direction). The second gas supply port 528 supplies a target gas containing perfluorinated compounds (PFCs) to the second internal passage P22 connected to the high temperature region passage 523 .

The urea water converter 10 is connected to the first internal passage P21 through the first housing 540 through the first ammonia supply pipe 24 . Therefore, the first ammonia supply pipe 24 supplies the ammonia converted in the urea water converter 10 to the first internal passage P21.

In addition, the urea water converter 10 is further connected to the second gas supply port 528 through a second ammonia supply pipe 529 . That is, the first ammonia supply pipe 24 is branched into a second ammonia supply pipe 529 , and the second ammonia supply pipe 529 supplies ammonia to the second gas supply port 528 .

The discharge port 545 is formed after the arc point AP2 at which the plasma arc PA generated in the discharge gap G5 and proceeding from the end of the high voltage electrode 510 to the high temperature region passage 523 is fixed. The first ammonia supply pipe 24 is provided before the arc point AP2 to supply ammonia to the first internal passage P21 , and the second ammonia supply pipe 529 is provided after the arc point AP2 to provide the second internal Ammonia is supplied to the passage P22.

Ammonia supplied to the first ammonia supply pipe 24 is supplied to the first internal passage P21. Ammonia reacts more effectively with nitrogen oxides (NOx) generated during the removal of perfluorinated compounds after the high-temperature region passage 23, thereby rapidly reducing and removing _{nitrogen oxides to nitrogen (N 2 ).}

Ammonia supplied to the second ammonia supply pipe 529 is mixed with the target gas at the second gas supply port 528 and supplied to the second internal passage P22. Ammonia is mixed with the target gas in the second internal passage P22, and reacts more effectively with nitrogen oxide (NOx) generated when the perfluorinated compound is removed in the high temperature region passage 23, converting nitrogen oxide to nitrogen (N ₂ ) Quickly reduce and remove.

Although preferred embodiments of the present invention have been described above, the present invention is not limited thereto, and various modifications can be made within the scope of the claims, the description of the invention, and the accompanying drawings, and this is also It goes without saying that it falls within the scope of the invention.

1, 2: Removal system 10: Urea water converter
20: (first) scrubber 24, 424, 524: first ammonia supply pipe
21, 541: first gas supply port 22, 528: second gas supply port
23, 423, 523: high-temperature region passage 24: first ammonia supply pipe
25, 545: outlet 26: water supply pipe
30, 510, 610: high voltage electrode 31: insulating member
40: housing 67: connection passage
111, 112, 113, 114, 115: supply pipe 200: plasma generating unit
201, 202, 203, 204, 205: scrubber 220: (second) scrubber
241, 529: second ammonia supply pipe 242: third ammonia supply pipe
300: removal unit 320: (third) scrubber
420: (fourth) scrubber 520: (fifth) scrubber
521: inner tube 522: supply hole
530: second housing 540: first housing
AP, AP2: arc point D: inner diameter
G, G5: Discharge gap P: Internal passage
PA, PA2: plasma arc P21: first internal passage
P22: second inner passage S: ammonia swirl
Δd: distance θ: angle
φ: inner diameter

Claims (13)

a urea water converter for converting the supplied urea water into ammonia; and
A scrubber connected to the urea water converter to generate a plasma arc to remove perfluorinated compounds (PFCs) contained in the target gas, and to remove nitrogen oxides generated when the perfluorinated compounds are removed with ammonia supplied from the urea water converter.
includes,
The scrubber is
A discharge gap is formed between the high voltage electrode and the high voltage electrode and includes a housing,
the housing is
A first gas supply port connected to the inner passage, a second gas supply port,
a high-temperature region passage having a discharge port, and
Including a first ammonia supply pipe,
The urea number converter is
The system for removing perfluorinated compounds and nitrogen oxides is connected before the arc point at which the plasma arc is fixed to the first ammonia supply pipe in the high temperature region passage, and supplies ammonia gas before the arc point. According to claim 1,
The scrubber is
A perfluorinated compound and nitrogen oxide removal system that is provided in one or a plurality and is connected to the urea water converter. According to claim 1,
Direct current or alternating current high voltage is applied to the high voltage electrode,
The housing forms a discharge gap between the high voltage electrode and the high voltage electrode and is grounded and has a length in the first direction,
The first gas supply port supplies a discharge gas for generating a plasma arc to the internal passage,
The second gas supply port penetrates in a second direction intersecting the first direction and supplies a target gas containing perfluorinated compounds (PFCs) to the inner passage,
The high temperature region passage is narrower than the inner passage on the opposite side of the high voltage electrode and has a discharge port at the end of the first direction to form a temperature higher than the temperature of the inner passage. 4. The method of claim 3,
The urea number converter is
A perfluorinated compound and nitrogen oxide removal system connected to the second gas supply port through a second ammonia supply pipe to supply ammonia to the second gas supply port. 4. The method of claim 3,
The high voltage electrode is
and a connecting passage connected to the inner passage,
The urea number converter is
A perfluorinated compound and nitrogen oxide removal system connected to the connection passage through a third ammonia supply pipe to supply ammonia to the connection passage. 4. The method of claim 3,
The outlet is
A perfluorinated compound and nitrogen oxide removal system formed at an arc point where a plasma arc generated in the discharge gap and progressing from the tip of the high voltage electrode to the high-temperature region passage is fixed. 4. The method of claim 3,
The first ammonia supply pipe is
A perfluorinated compound and nitrogen oxide removal system installed toward the center of the second direction in the high-temperature region passage. 4. The method of claim 3,
The first ammonia supply pipe is
A perfluorinated compound and nitrogen oxide removal system installed toward the second direction at a position spaced apart by a distance Δd set in a third direction intersecting the second direction from the center of the second direction of the high-temperature region passage. 4. The method of claim 3,
The first ammonia supply pipe is
an inner tube installed in a circumferential direction around the high-temperature region passage, and
A supply hole formed to inject ammonia from the inner tube toward the high-temperature region passage
includes,
The supply hole is
It is formed in a plurality spaced apart along the circumferential direction,
A system for removing perfluorinated compounds and nitrogen oxides directed in a direction inclined at an angle set in the radial direction of the high-temperature zone passage. a urea water converter for converting the supplied urea water into ammonia; and
A scrubber connected to the urea water converter to generate a plasma arc to remove perfluorinated compounds (PFCs) contained in the target gas, and to remove nitrogen oxides generated when the perfluorinated compounds are removed with ammonia supplied from the urea water converter.
includes,
The scrubber is
A plasma arc generator for generating a plasma arc with the discharge gas supplied to the first gas supply port, and
A removal unit connected to the plasma arc generator and removing perfluorinated compounds (PFCs) from the target gas supplied to the second gas supply port and removing nitrogen oxides generated at this time
includes,
The urea number converter is
A perfluorinated compound and nitrogen oxide removal system for supplying ammonia to the removal unit by being connected before the arc point AP at which the plasma arc PA is fixed to the first ammonia supply pipe in the high-temperature region passage of the removal unit. 11. The method of claim 10,
The urea number converter is
A perfluorinated compound and nitrogen oxide removal system connected to the second gas supply port of the removal unit through a second ammonia supply pipe to supply ammonia to the second gas supply port a urea water converter for converting the supplied urea water into ammonia; and
A scrubber connected to the urea water converter to generate a plasma arc to remove perfluorinated compounds (PFCs) contained in the target gas, and to remove nitrogen oxides generated when the perfluorinated compounds are removed with ammonia supplied from the urea water converter.
includes,
The scrubber is
A high voltage electrode to which a positive DC voltage is applied,
a first housing having a length in a first direction to which a negative voltage is applied by forming a discharge gap between the high voltage electrode and the high voltage electrode, and
a second housing connected to the first housing in the first direction
includes,
The first housing is
a first gas supply port for supplying a discharge gas forming a plasma arc to the first internal passage, and
A high-temperature region passage that is narrower than the first inner passage on the opposite side of the high voltage electrode and forms a temperature higher than that of the first inner passage having a discharge port at an end of the first direction
includes,
The second housing is
A second gas supply port for supplying a target gas containing perfluorinated compounds (PFCs) to a second internal passage that penetrates in a second direction intersecting the first direction and is connected to the high temperature region passage
including,
The urea number converter is
A perfluorinated compound and nitrogen oxide removal system for supplying ammonia to the first internal passage by being connected before the arc point AP2 at which the plasma arc PA is fixed from the first internal passage to the first ammonia supply pipe. 13. The method of claim 12,
The urea number converter is
A perfluorinated compound and nitrogen oxide removal system connected to the second gas supply port through a second ammonia supply pipe to supply ammonia to the second gas supply port.

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