KR102276561B1 - Complex exhaust gas treatment equipment and control method thereof - Google Patents

Abstract

According to the present invention, provided is a complex exhaust gas treatment facility which includes: an oxidizer input device which inputs an oxidizer to treatment target exhaust gas to oxidize nitrogen monoxide included in the treatment target exhaust gas into nitrogen dioxide; and a reduction treatment bath which makes nitrogen dioxide included in gas passed through the oxidizer input device react with a sulfur compound to be reduced and removed, wherein the reduction treatment bath transforms the gas passed through the oxidizer input device into a form of microbubble in reduction treatment water including a sulfur compound, and sprays the same. According to the present invention, removal efficiency of nitrogen compounds can be improved.

Description

Exhaust gas complex treatment facility and its control method {COMPLEX EXHAUST GAS TREATMENT EQUIPMENT AND CONTROL METHOD THEREOF}

The present invention relates to an exhaust gas treatment technology, and more particularly, to an exhaust gas treatment technology for removing nitrogen oxides, sulfur oxides, and odor-causing substances contained in exhaust gas.

Solid fuel, gaseous fuel, liquid fuel, etc. must be used in boilers or incinerators, and these fuels require combustion air. Air containing excess oxygen is injected into the combustion air to achieve combustion, and as a result of combustion, various types of fine dust such as coal ash, carbon monoxide, carbon dioxide, nitrogen oxides (NO _X ), sulfur oxides (SO _X ), unburned carbon particles (HC), etc. By-products are generated with heat, and unreacted nitrogen and oxygen remain.

Nitrogen oxides are mainly produced by a reaction between oxygen and nitrogen present in the atmosphere at high temperatures where various processes are performed, and are mainly emitted in the form of nitrogen monoxide (NO). These nitrogen oxides not only cause acid rain, but also form ozone and photochemical smog. Accordingly, in terms of environmental protection, large-scale incineration facilities and power plants are typically installed with a denitration device for removing nitrogen oxides in exhaust gas.

Representative nitrogen oxide removal technologies that are currently commercialized include the Selective Non Catalytic Reduction (SNCR) and Selective Non Catalytic Reduction (SCR), which reduce _{nitrogen oxides to nitrogen (N 2 ) by reacting nitrogen oxides with ammonia or urea water.} catalytic reduction). This conventional nitrogen oxide removal technology has the disadvantage that nitrogen oxide can be removed only at a specific temperature, and secondary pollutants such as ammonia slip and catalyst poison are generated.

Republic of Korea Patent Publication No. 10-1277518 "Selective catalytic reduction/selective non-catalytic reduction complex denitrification facility for reducing yellow smoke and nitrogen oxides" (2013.06.21.)

SUMMARY OF THE INVENTION It is an object of the present invention to provide an exhaust gas complex treatment facility for efficiently simultaneously removing nitrogen oxides, sulfur oxides, and odor-causing substances contained in exhaust gas, and a method for controlling the same.

In order to achieve the above object of the present invention, according to one aspect of the present invention, an oxidizing agent input device for oxidizing nitrogen monoxide contained in the treatment target exhaust gas by inputting an oxidizing agent to the target exhaust gas to nitrogen dioxide; and a reduction treatment tank for reducing and removing nitrogen dioxide contained in the gas that has passed through the oxidizing agent input device by reacting it with a sulfur compound, wherein the reduction treatment tank converts the gas that has passed through the oxidizing agent input device with a sulfur compound. There is provided an exhaust gas complex treatment facility that transforms and injects into microbubbles within.

In order to achieve the above object of the present invention, according to another aspect of the present invention, an oxidizing agent input device for oxidizing nitrogen monoxide contained in the treatment target exhaust gas to nitrogen dioxide by inputting an oxidizing agent to the target exhaust gas, and the oxidizing agent As a method of controlling an exhaust gas complex treatment facility having a reduction treatment tank for reducing and removing nitrogen dioxide contained in the gas that has passed through the input device by reacting with a sulfur compound, the final exhaust gas discharged through the reduction treatment tank a gas measuring step in which the concentration of each of the constituent components is measured by a gas measuring unit; a comparison step in which the concentration of each of the components constituting the final exhaust gas measured in the gas measurement step is compared with a reference value by a controller; and a drug supply amount control step in which the input amount of the oxidizing agent and the supply amount of the sulfur compound are controlled by the controller using the comparison result between the concentration of each of the components constituting the final exhaust gas confirmed through the comparison step and the reference value There is provided a control method of an exhaust gas complex treatment facility comprising a.

According to the present invention, all of the objects of the present invention described above can be achieved. Specifically, since the sulfur compound is supplied as a reducing agent for the removal of nitrogen dioxide, the removal efficiency of nitrogen dioxide is improved.

In addition, since the nitrogen monoxide content and the nitrogen dioxide content of the final exhaust gas are independently measured, the input amount of the oxidizer is adjusted according to the nitrogen monoxide content, and the input amount of the reducing agent is adjusted according to the nitrogen dioxide content, the removal efficiency of nitrogen oxides is improved. .

In addition, after chlorine dioxide water, which is an oxidizing agent, is introduced into the exhaust gas, chlorine dioxide water containing unreacted chlorine dioxide is separated by a gas-liquid separator and then introduced into the exhaust gas again, so that the oxidation reaction efficiency by combustion of dioxide is improved.

1 is a block diagram showing the configuration of an exhaust gas complex treatment facility according to an embodiment of the present invention.
FIG. 2 is a diagram illustrating the configuration of an oxidizing agent input device in the exhaust gas complex treatment facility shown in FIG. 1 according to an embodiment.
3 is a view showing the configuration of another embodiment of the oxidizing agent input device in the exhaust gas complex treatment facility shown in FIG. 1 .
FIG. 4 is a diagram illustrating the configuration of an oxidation treatment tank in the exhaust gas complex treatment facility shown in FIG. 1 .
FIG. 5 is a view showing the configuration of a reduction treatment tank in the exhaust gas complex treatment facility shown in FIG. 1 .
FIG. 6 is a diagram illustrating the configuration of a neutralization treatment tank in the exhaust gas complex treatment facility shown in FIG. 1 .
7 is a flowchart schematically illustrating an embodiment of a method for controlling the exhaust gas complex treatment facility shown in FIG. 1 of the present invention.

Hereinafter, the configuration and operation of the embodiment of the present invention will be described in detail with reference to the drawings.

First, with reference to the drawings, a preferred embodiment of the present invention will be described in detail focusing on the configuration. 1 illustrates the configuration of an exhaust gas complex treatment facility according to an embodiment of the present invention for removing nitrogen oxides (NOx), sulfur oxides (SOx) and odor-causing substances included in exhaust gas. Referring to FIG. 1 , the exhaust gas complex treatment facility 100 according to an embodiment of the present invention includes an oxidizing agent input device 101 for introducing an oxidizing agent to a target exhaust gas G, and an oxidizing agent input device 101 . An oxidizing agent supply unit 102 for supplying an oxidizing agent to the oxidizer, and a microbubble gas processing unit 100a for reacting the gas (G1) discharged from the oxidizing agent input device 101 with a sulfur compound and processing using micro bubbles; A sulfur compound supply unit 175a for supplying a sulfur compound to the microbubble gas processing unit 100a, a pH control agent supply unit 175b for supplying a pH control agent to the microbubble gas processing unit 100a, and a microbubble gas processing unit 100a. The gas measuring unit 180 for measuring the concentration of each of the components constituting the gas G4 discharged into the oxidizing agent inputting device 101 using the gas component concentration data measured from the gas measuring unit 180 and a control unit 190 for controlling the amount of the oxidizing agent to be input, the sulfur compound and the pH adjusting agent supplied to the microbubble gas processing unit 100a.

The oxidizing agent input device 101 injects the oxidizing agent into the exhaust gas G to be treated with the oxidizing agent supplied from the oxidizing agent supply unit 102 . Nitrogen monoxide (NO) contained in the exhaust gas to be treated (G) reacts with the oxidizing agent injected by the oxidizing agent input device 101 and is oxidized to _{nitrogen dioxide (NO 2 ).} In this embodiment, chlorine dioxide (ClO ₂ ) or ozone (O ₃ ) is described as being used as the oxidizing agent injected by the oxidizing agent input device 101 . The amount of the oxidizing agent injected into the exhaust gas G to be treated by the oxidizing agent input device 101 is an oxidizing agent input amount control valve installed on the oxidizing agent supply line 103 connecting the oxidizing agent input device 101 and the oxidizing agent supply unit 102 . It is controlled by the operation of (104).

_{In the case of using chlorine dioxide (ClO 2} ) as an oxidizing agent, the oxidation reaction equation of nitrogen monoxide (NO) is as shown in Scheme 1 below.

[Scheme 1]

5NO(g) + 2ClO ₂ (g) + H ₂ O(aq) → 5NO ₂ (g) + 2HCl(aq)

_{In the case of using chlorine dioxide (ClO 2} ) as an oxidizing agent, chlorine dioxide is preferably injected by being sprayed with chlorine dioxide water in the oxidizing agent input device 101 .

_{When ozone (O 3} ) is used as an oxidizing agent, the oxidation reaction equation of nitrogen monoxide (NO) is as shown in Scheme 2 below.

[Scheme 2]

NO(g) + O ₃ (g) + H ₂ O(aq) → NO ₂ (g) + O ₂ (g)

When ozone (O ₃ ) is used as the oxidizing agent, it is preferable that the ozone is injected in the form of a gas from the oxidizing agent input device 101 .

2 shows an embodiment of the oxidizing agent input device 101 . The oxidizing agent input device 101 shown in FIG. 2 is configured to improve the oxidation reaction efficiency when the oxidizing agent is used in the form of an aqueous solution, such as chlorine dioxide water. Referring to FIG. 2 , the oxidizing agent input device 101 includes a first oxidizing agent input unit 105 , a gas-liquid separation unit 106 , an oxidizer aqueous solution storage unit 107 , and a second oxidizer input unit 108 , An oxidizing agent solution supply pump 109 is provided.

The first oxidizing agent input unit 105 includes a first spray nozzle 105a for spraying chlorine dioxide water supplied from the oxidizing agent supply unit 102 on the exhaust gas G to be treated in the form of a spray in the pipe.

The gas-liquid separator 106 is located downstream of the flow direction of the exhaust gas G to be treated rather than the first oxidizer input part 105, and from the exhaust gas G to be treated that has passed through the first oxidizer input part 105 Separate the liquid components. In this embodiment, the gas-liquid separator 106 will be described as a centrifugal separator. The liquid component separated by the gas-liquid separation unit 106 is chlorine dioxide water containing unreacted chlorine dioxide, and is stored in the oxidizing agent aqueous solution storage unit 107 .

The oxidizing agent solution storage unit 107 stores the chlorine dioxide water separated from the gas-liquid separation unit 106 . The chlorine dioxide water stored in the oxidizer solution storage unit 107 is supplied to the second oxidizer input unit 108 by the oxidizer aqueous solution supply pump 109 .

The second oxidizer input unit 108 is located downstream of the flow direction of the exhaust gas G to be treated rather than the gas-liquid separation unit 106, and the chlorine dioxide water supplied from the oxidizer aqueous solution storage unit 107 is discharged from the gas-liquid separation unit in the pipe. A second spray nozzle 108a is provided for spraying the target exhaust gas G discharged from the 106 in the form of a spray.

The oxidizer solution supply pump 109 is installed on the oxidizer supply line 109a connecting the oxidizer aqueous solution storage unit 107 and the second spray nozzle 108a, and the chlorine dioxide water stored in the oxidizer aqueous solution storage unit 107 is supplied. It is supplied to the second spray nozzle 108a.

3 shows another embodiment of the oxidant dosing device 101 . The oxidizing agent input device 201 shown in FIG. 3 is configured to improve the oxidation reaction efficiency even when the oxidizing agent is used in gaseous form, such as _{ozone (O 3 ).} Referring to FIG. 3 , the oxidizer input device 201 includes an oxidizer input unit 105 and an oxidizer mixing unit 206 .

The oxidizer input unit 105 includes a spray nozzle 105a that sprays ozone supplied from the oxidizer supply unit 102 to the exhaust gas G to be treated in the pipe in the form of a spray.

The oxidizer mixing unit 206 is located downstream of the flow direction of the exhaust gas G to be treated rather than the oxidizer input part 105 to increase the reactivity with the exhaust gas G to be treated that has passed through the oxidizer input part 105. Mix with an oxidizing agent. In this embodiment, the oxidizer mixing unit 206 is described as a centrifugal separator.

The oxidizing agent supply unit 102 supplies the oxidizing agent to the oxidizing agent input device 101 . The oxidizer supply unit 102 is connected to the oxidizer input device 101 through the oxidizer supply line 103 . Although not shown, the oxidizer supply unit 102 includes an oxidizer storage tank in which the oxidizer is stored, and an oxidizer supply pump for flowing the oxidizer stored in the oxidizer storage tank to the oxidizer input device 101 through the oxidizer supply line 103. . In this embodiment, the oxidizing agent supplied by the oxidizing agent supply unit 102 is described as chlorine dioxide (ClO ₂ ) aqueous solution or ozone (O ₃ ) gas, and the oxidizing agent input device 101 as shown in FIG. 2 is initially installed. In this case, chlorine dioxide water or ozone can be selected and used.

The amount of the oxidizing agent supplied to the oxidizing agent input device 101 is controlled by the oxidizing agent input amount control valve 104 installed on the oxidizing agent supply line 103 . The operation of the oxidant input amount control valve 104 is controlled by the control unit 190 .

The oxidizing agent injected by the oxidizing agent input device 101 also serves to remove odor-causing substances, and the oxidizing agent removal reaction by the oxidizing agent takes place in the oxidizing agent input device 101 and the microbubble gas processing unit 101a.

Reaction formulas for removing odor-causing substances from chlorine dioxide are shown in Schemes 3 to 13 below.

[Scheme 3]

2NH ₃ + 2ClO ₂ + H ₂ O → NH ₄ ClO ₂ + NHClO ₃

Scheme 3 is a reaction scheme for removing _{ammonia (NH 3} ), which is a odor-causing substance.

[Scheme 4]

5H ₂ S + 8ClO ₂ + 4H ₂ O → 5H ₂ SO ₄ + 8HCl

Scheme 4 is a reaction scheme for removing _{hydrogen sulfide (H 2} S), which is an odor-causing substance.

[Scheme 5]

5CH ₃ SH + 9ClO ₂ + 2H ₂ O → 5CH ₃ SO ₄ + 8HCl

[Scheme 6]

H ₃ SH + ClO ₂ → CH ₃ SO ₃ H

Schemes 5 and 6 are the removal schemes of _{methyl mercaptan (CH 3} SH), which is an odor-causing substance.

[Scheme 7]

2CH ₃ SCH ₃ + 2ClO ₂ → (CH ₃ ) ₂ SO ₄ + 2CH ₃ Cl + S

Scheme 7 is a reaction scheme for removing _{dimethyl sulfide (CH 3} SCH ₃ ), which is an odor-causing substance.

[Scheme 8]

(CH ₃ ) ₂ S + ClO ₂ → (CH ₃ ) ₂ SO

Scheme 8 is a scheme for removing _{methyl sulfide ((CH 3} ) ₂ S), which is an odor-causing substance.

[Scheme 9]

(CH ₃ ) ₂ S ₂ + ClO ₂ → (2CH ₃ ) ₂ S ₂ O

Scheme 9 is a scheme for removing _{methyl sulfide ((CH 3} ) ₂ S ₂ ), which is an odor-causing substance.

[Scheme 10]

(CH ₃ ) ₃ N + ClO ₂ → (CH ₃ ) ₃ HClO ₂

Scheme 10 is a reaction scheme for removing _{amines ((CH 3} ) ₃ N), which are odor-causing substances.

[Scheme 11]

Aldehyde + ClO ₂ → Carboxyl acid

Scheme 11 is a reaction scheme for removing aldehydes, which are odor-causing substances.

[Scheme 12]

2CH ₃ CHO + ClO ₂ → 2CH ₃ COOH + Cl

[Scheme 13]

CH ₃ COOH + NaOH → CH ₃ COONa + H ₂ O

Schemes 12 and 13 are the removal schemes of _{acetaldehyde (CH 3} CHO), which is an odor-causing substance.

Reaction formulas for removing odor-causing substances of ozone (O ₃ ) are shown in Reaction Formulas 14 to 19 below.

[Scheme 14]

_{6NH 3 + 5O 3 → 6NO +} 9H 2 O

Reaction Equation 14 is a reaction equation for removal _{of ammonia (NH 3} ), which is an odor-causing substance.

[Scheme 15]

H ₂ S + O ₃ → SO ₂ + H ₂ O

Scheme 15 is a reaction scheme for removing _{hydrogen sulfide (H 2} S), which is an odor-causing substance.

[Scheme 16]

CH ₃ SH + O ₃ → CH ₃ OH + SO ₂

Scheme 16 is a reaction scheme for removing _{methyl mercaptan (CH 3} SH), which is an odor-causing substance.

[Scheme 17]

CH ₃ SCH ₃ + O ₃ → (CH ₃ ) ₂ SO + O ₂

Scheme 7 is a reaction scheme for removing _{dimethyl sulfide (CH 3} SCH ₃ ), which is an odor-causing substance.

[Scheme 18]

(CH ₃ ) ₂ S + O ₃ → (CH ₃ ) ₂ SO + O ₂

Scheme 8 is a scheme for removing _{methyl sulfide ((CH 3} ) ₂ S), which is an odor-causing substance.

[Scheme 19]

3CH ₃ CHO + 5O ₃ → 6CO ₂ + 6H ₂ O

Scheme 19 is a reaction scheme for removing _{acetaldehyde (CH 3} CHO), which is an odor-causing substance.

The microbubble gas processing unit 100a oxidizes, reduces, neutralizes, and neutralizes the gas G1 discharged from the oxidizing agent input device 101 to discharge the final exhaust gas G4. The microbubble gas processing unit 100a includes an oxidation processing unit 110a for oxidizing the incoming gas G1 and a reduction processing unit 110b for reducing the gas G2 discharged from the oxidation processing unit 110a and and a neutralization processing unit 110c that neutralizes and absorbs the gas G3 discharged from the reduction processing unit 110b.

The oxidation treatment unit 110a reacts the gas G1 discharged from the oxidizing agent input device 101 with the unreacted oxidizing agent as microbubbles to perform final oxidation treatment. The oxidation treatment unit 110a includes an oxidation treatment tank 120 that treats an incoming gas G1 using oxidation treatment water L1 that is an oxidizing agent aqueous solution, and an oxidation treatment tank 120 that discharges the gas from the oxidation treatment tank 120 . The tank exhaust fan 135a, the oxidation treatment water circulation supply device 140a for circulating and supplying the oxidation treatment water L1 discharged from the oxidation treatment tank 120 to the oxidation treatment tank 120, and the oxidation treatment water L1 ) is provided with an oxidation-treated water pH sensor (148a) for measuring the pH.

The oxidation treatment tank 120 oxidizes nitrogen monoxide (NO) contained in the inlet gas G1 to nitrogen dioxide (NO ₂ ) using the oxidation treatment water L1 as an oxidizing agent aqueous solution. At the same time, a reaction of removing odor-causing substances by the oxidizing agent introduced together with the inflow gas G1 also occurs. 4 shows the configuration of the oxidation treatment tank 120 . Referring to FIG. 4 , the oxidation treatment tank 120 provides a first internal space 120a in which oxidation treatment water L1 for treating the inflow gas G1 is stored. The oxidation-treated water L1 is an oxidizing agent aqueous solution. As the first inner space 120a, general industrial water may be supplied and used. The first internal space 120a of the oxidation treatment tank 120 is divided into a 1A storage space 121a and a 2A storage space 121b which are arranged in the lateral direction (horizontal direction) by the first partition wall 121 . are compartmentalized A first connection passage 121c for communicating the 1A storage space 121a and the 2A storage space 121b is formed under the first partition wall 121 . A first intake port 122a is formed at the upper end of the 1A storage space 121a and communicates with the 1A storage space 121a and through which the exhaust gas G1 to be treated is introduced together with the first treated water L1, A first exhaust port 122b communicating with the 2A storage space 121b and discharging gas is formed at an upper end of the 2A storage space 121b. A first connection pipe 131a connected to the second gas treatment tank 110b is connected to the first exhaust port 122b.

The oxidation treatment tank 120 includes a first water tank 123 located in the 1A storage space 121a, a 1A water pipe 124 located in the 1A storage space 121a, and a 1A storage space 121a. ) located in the first mixing barrel 125, the 2A water pipe 126 located in the 1A storage space 121a, and the first atomizing part 127 located in the 2A storage space 121b. and a plurality of first blocking plates 128 positioned in the storage space 2A 121b, and a first eliminator 129 positioned in the storage space 2A 121b.

The first water tank 123 is located adjacent to the bottom of the first inlet 122a in the storage space 1A (121a). The oxidation-treated water L1 supplied from the oxidation-treated water circulation supply device 140a is temporarily stored in the first water tank 123 .

The 1A water flow pipe 124 is located under the first water tank 123 in the 1A storage space 121a. The 1A water flow pipe 124 has a shape that becomes narrower downward, and at the lower end of the 1A water flow pipe 124, the first treated water L1 and the treatment target exhaust gas G1 introduced through the first intake port 122a ) 1A outlet (124a) for discharging downward is formed. As the gas and the oxidation-treated water L1 flow downward along the 1A water flow pipe 124 toward the 1A outlet 124, the contact area between the gas and the oxidation-treated water L1 increases.

The first mixing vessel 125 is located below the 1A outlet 124a formed in the 1A water flow pipe 124 in the 1A storage space 121a. The gas discharged through the 1A outlet 124a and the oxidized water L1 are temporarily stored in the first mixing tank 125 .

The 2A water flow pipe 126 is located below the first mixing tube 125 in the 1A storage space 121a. The 2A water flow pipe 126 has a shape that becomes narrower toward the bottom, and a 2A outlet 126a for discharging the first treated water L1 and gas downward is formed at the lower end of the 2A water flow pipe 126 . As the gas and the oxidized water L1 flow downward along the 2A water flow pipe 126 toward the 2A outlet 126a, the contact area between the gas and the oxidized water L1 increases.

The first atomizing unit 127 is located in the 2A storage space 121b and converts the gas supplied from the 1A storage space 121a into a minute in the first treated water L1 stored in the 2A storage space 121b. The reaction efficiency of the oxidizing agent contained in the oxidized water L1 and the nitrogen monoxide contained in the gas is improved by forming and spraying micro-bubbles (B) as bubbles. The first atomizing part 127 includes a first nozzle 127a extending from the first partition wall 121 and a first collision plate 127b positioned at the end of the first nozzle 127a. Due to the microbubbles B formed by the first atomizing unit 127 , the contact area between the gas and the oxidized water L1 in the storage space 2A 121b increases. In addition, the microbubbles (B) stay in the oxidized water L1 of the second A storage space 121b for a longer time than the general bubbles. Accordingly, the reaction efficiency in the storage space 2A 121b is significantly increased.

The first nozzle 127a is positioned at a relatively lower portion of the storage space 2A 121a and is formed to protrude from the first partition wall 121 . A first inlet 1271a of the first nozzle 127a communicating with the storage space 1A 121a is formed in the first partition wall 121 . An end of the first nozzle 127a extends substantially vertically upward. The first nozzle 127a is formed to have a narrow inner diameter toward the end, so that the gas in the storage space 1A 121a flows toward the end of the first nozzle 127a and increases in speed. A first collision plate 127b is positioned adjacent to an end of the first nozzle 127a that forms the first outlet 127c.

The first collision plate 127b is positioned adjacent to the first outlet 127c, which is an end of the first nozzle 127a. The gas injected from the first nozzle 127a collides with the first collision plate 127b to form microbubbles B. In the present embodiment, the first collision plate 127b is described as having a two-stage structure in which two 1271b and 1272b are disposed in the vertical direction as shown, but the present invention is not limited thereto, and a single-stage structure or A structure having three or more stages is also within the scope of the present invention. In the case of a multi-stage structure, the first upper collision plate 1272b positioned above is larger to cover the entirety of the first lower collision plate 1271b positioned below, and at least one Preferably, the first passage 1273b is formed.

The plurality of first blocking plates 128 are arranged in layers on the first collision plate 127b in the storage space 2A 121b. The rapid rise of the oxidized water L1 stored in the storage space 2A 121b is blocked by the plurality of first blocking plates 128 .

The first eliminator 129 is located between the first uppermost blocking plate 128 and the first exhaust port 122b among the plurality of first blocking plates 128 below in the storage space 2A 121b, to remove The first eliminator 129 is made of a synthetic resin material.

An outlet 1274 through which the oxidized water L1 overflows and is discharged is formed on the sidewall of the storage space 121b 2A. The oxidation treatment water L1 discharged from the oxidation treatment tank 120 through the outlet 1274 is supplied to the oxidation treatment water circulation supply device 140a.

Referring to FIG. 1 , the oxidation treatment tank exhaust fan 135a is installed in the first connection pipe 131a to discharge gas from the oxidation treatment tank 120 through the first exhaust port 122b in FIG. 4 . When the oxidation treatment tank exhaust fan 135a operates, the gas in the 2A storage space 121b of the oxidation treatment tank 120 is discharged to the space above the water surface of the 1A storage space 121a and the 2A storage space 121b. There is a pressure difference between the space above the water surface of Accordingly, the water level of the oxidized water L1 in the storage space 2A 121b rises and the water level of the oxidation treatment water L1 in the storage space 1A 121a decreases.

The oxidation treatment water circulation supply device 140a circulates and supplies the oxidation treatment water L1 which is an oxidizing agent aqueous solution discharged from the first gas treatment tank 120 to the oxidation treatment tank 120 . The oxidation treatment water circulation supply device 140a sends the oxidation treatment water storage tank 141a in which the oxidation treatment water L1 is stored and the oxidation treatment water stored in the oxidation treatment water storage tank 141a to the oxidation treatment tank 120 . A treated water circulation pump 145a is provided.

The oxidation treatment water L1 discharged from the oxidation treatment tank 120 is stored in the oxidation treatment water storage tank 141a. The oxidation-treated water L1 stored in the oxidation-treated water storage tank 141a is an oxidizing agent aqueous solution containing an oxidizing agent introduced from the oxidizing agent input device 101 and introduced into the oxidation treatment tank 120 in an unreacted state. The sulfur compound may be supplied to the oxidation treatment water circulation supply unit 140a by the sulfur compound supply unit 175a. The oxidation treatment water L1 stored in the oxidation treatment water storage tank 141a is transferred to the oxidation treatment tank 120 by the oxidation treatment water circulation pump 145a. The oxidation-treated water storage tank 141a may be supplied with general industrial water.

The oxidation-treated water circulation pump 145a pumps the oxidation-treated water L1 stored in the oxidation-treated water storage tank 141a through the oxidation-treated water supply pipe 146a to the 1A storage space 121a of the oxidation treatment tank 120 . 1 It is supplied through the intake port (122a).

In the oxidation treatment tank 120, the reactions of Schemes 1 to 19 described above may occur depending on the type of the oxidizing agent.

The oxidation-treated water pH sensor 148a measures the pH of the oxidation-treated water L1 and transmits the measured pH value of the oxidation-treated water L1 to the controller 190 . In this embodiment, the oxidation-treated water pH sensor 148a is described as measuring the pH of the oxidation-treated water L1 in the oxidation-treated water storage tank 141a, but unlike this, the oxidation-treated water in the oxidation treatment tank 120 It may be installed to measure the pH of (L1), which is also within the scope of the present invention. The oxidation-treated water (L1) has the highest efficiency of oxidizing nitrogen monoxide (NO) to nitrogen dioxide (NO _{2 ) in the pH range of 4 to 5.} Oxidation treated water (L1) reacts with an oxidizing agent, nitrogen oxides, and sulfur oxides, and _{is converted into hydrochloric acid (HCl), sulfuric acid (H 2} SO ₄ ), and nitric acid (HNO ₃ ) as shown in Reaction Equations 20 and 21 below to change into strong acid.

[Scheme 20]

5SO ₂ + 2ClO ₂ + 6H ₂ O → 5H ₂ SO ₄ + 2HCl

[Scheme 21]

3NO ₂ + H ₂ O → 2HNO ₃ + NO

The pH adjuster is supplied from the pH adjuster supply unit 175b so that the oxidation-treated water L1 maintains a pH of 4 to 5. In this embodiment, it will be described that sodium hydroxide (NaOH, also referred to as 'caustic soda') is used as a pH adjuster. When sodium hydroxide is used as a pH adjuster, nitrogen dioxide (NO ₂ ) and sulfur dioxide (SO ₂ ) are neutralized by sodium hydroxide and thus absorbed and removed. The following reaction equations show the reaction in the oxidation treatment tank 120 by sodium hydroxide.

[Scheme 22]

2NO ₂ + 2NaOH → NaNO ₂ + NaNO ₃ + H ₂ O

[Scheme 23]

Cl ₂ + 2NaOH → NaOCl + NaCl + H ₂ O

[Scheme 24]

2SO ₂ + 4NaOH → 2Na ₂ SO ₃ + 2H ₂ O

[Scheme 25]

H ₂ S + 2NaOH → Na ₂ S + 2H ₂ O

Continuing to refer to FIG. 1 , the reduction treatment unit 110b reacts the oxidation treatment gas G2 discharged from the oxidation treatment unit 110a with a sulfur compound using microbubbles to perform the reduction treatment as a reduction treatment gas G3 . discharge The reduction treatment unit 110b includes a reduction treatment tank 150 that reduces the incoming gas G2 using reduction treatment water L2 that is an aqueous sulfur compound solution, and a reduction treatment tank 150 that discharges the gas from the reduction treatment tank 150 . The treatment tank exhaust fan 135b, the reduced treated water circulation supply device 140b that circulates and supplies the reduced treated water L2 discharged from the reduction treatment tank 150 to the reduction treatment tank 150, and the reduced treated water ( A reduced-treated water pH sensor 148b for measuring the pH of L2) is provided. In the reduction treatment unit 110b, the pH of the reduction treatment water L2 is maintained at 8-10.

The reduction treatment tank 150 reduces and removes _{nitrogen dioxide (NO 2} ) contained in the inlet gas (G2) by using the reduction treatment water (L2), which is an aqueous solution of sulfur compounds. If the oxidizing agent is introduced in excess from the oxidizing agent input device 101 and the unreacted oxidizing agent flows into the reduction treatment tank 150 , an odor caused by chlorine dioxide or ozone, which is an oxidizing agent, is generated. can be removed by reacting with a sulfur compound as shown in Schemes 26 and 27 below.

[Scheme 26]

2ClO ₂ + 5Na ₂ SO ₃ + H ₂ O → 5Na ₂ SO ₄ + 2HCl

[Scheme 27]

O ₃ + 3Na ₂ SO ₃ → 3Na ₂ SO ₄

5 shows the configuration of the reduction treatment tank 150 . Referring to FIG. 5 together with FIG. 1 , the reduction treatment tank 150 has substantially the same configuration as the oxidation treatment tank 120 shown in FIG. 4 , and the reduction treatment water L2 for treating the introduced gas G2 is A second internal space 150a to be stored is provided. The reduced treated water (L2) is an aqueous solution of a sulfur compound in which a reducing agent, a sulfur compound, is added to water. As the second inner space 150a, general industrial water may be supplied and used. The second internal space 150a of the reduction treatment tank 150 is a 1B storage space 151a and a 2B storage space 151b which are arranged along the lateral direction (horizontal direction) by the second partition wall 151 . are compartmentalized A second connection passage 151c for communicating the 1B storage space 151a and the 2B storage space 151b is formed under the second partition wall 151 . At the upper end of the 1B storage space 151a, a second intake port through which the 1B storage space 151a is communicated through the first connection pipe 131a and the inflow gas G2 is introduced together with the second treated water L2 ( 152a) is formed, and a second exhaust port 152b communicating with the 2B storage space 151b and discharging gas is formed at an upper end of the 2B storage space 151b. A second connection pipe 131b connected to the neutralization processing unit 110c is connected to the second exhaust port 152b.

The reduction treatment tank 150 includes a second water tank 153 located in the 1B storage space 151a, a 1B water flow pipe 154 located in the 1B storage space 151a, and a 1B storage space 151a. ) located in the second mixing barrel 155, the 2B water flow pipe 156 located in the 1B storage space 151a, and the second atomizing part 157 located in the 2B storage space 151b. and a plurality of second blocking plates 158 positioned in the 2B storage space 151b and a second eliminator 159 positioned in the 2B storage space 151b.

Since the specific configuration and operation of the reduction treatment tank 150 are substantially the same as those of the oxidation treatment tank 120 described above, a detailed description thereof will be omitted.

Referring to FIG. 1 , the reduction treatment tank exhaust fan 135b is installed in the second connection pipe 131b to discharge gas from the reduction treatment tank 150 through the second exhaust port ( 152b in FIG. 5 ). When the reduction treatment tank exhaust fan 135b operates, the gas in the 2B storage space 151b of the reduction treatment tank 150 is discharged, so that the space above the water surface of the 1B storage space 151a and the 2B storage space 151b. There is a pressure difference between the space above the water surface of Accordingly, the water level of the reduced treated water (L2) in the 2B storage space (151b) rises and the water level of the reduced treated water (L2) in the 1B storage space (151a) is lowered.

The reduced treated water circulation supply device 140b is a device that circulates and supplies the reduced treated water L2 discharged from the reduction treatment tank 150 to the reduction treatment tank 150 . The reduced treated water circulation supply device 140b is a reduced treated water storage tank 141b in which the reduced treated water (L2) is stored, and the reduced treated water (L2) stored in the reduced treated water storage tank 141b is transferred to the reduction treatment tank 150. It has a reduced treated water circulation pump (145b) sent to.

The reduced treatment water L2 discharged from the reduction treatment tank 150 is stored in the reduction treatment water storage tank 141b. The reduced treated water L2 stored in the reduced treated water storage tank 141b is an aqueous solution of sulfur compounds. The sulfur compound is supplied to the reduced treated water circulation supply unit 140b by the sulfur compound supply unit 175a. The reduced treated water L2 stored in the reduced treated water storage tank 141b is transferred to the reduction treated tank 150 by the reduced treated water circulation pump 145b. General industrial water is supplied to the reduced treated water storage tank 141b and may be used.

The reduced treated water circulation pump 145b discharges the reduced treated water (L2) stored in the reduced treated water storage tank 141b through the reduced treated water supply pipe 146b to the 1B storage space 151a of the reduction treatment tank 150. 2 It is supplied through the intake port (152a).

The removal of _{nitrogen dioxide (NO 2} ) by sulfur compounds is as follows.

When the exhaust gas (G) contains both nitrogen oxides (NO _X ) and sulfur oxides (SO _{X ), nitrogen dioxide (NO 2} ) in the oxidation treatment tank 120 is removed as shown in the following Reaction Formulas 28 to 31 through an absorption reaction. do.

[Scheme 28]

SO ₂ (g) → SO ₂ (aq)

[Scheme 29]

SO ₂ (aq) + H ₂ O → H ₂ SO ₃ (aq)

[Scheme 30]

H ₂ SO ₃ ↔ H ⁺ + HSO ₃ ^- ↔ 2H ⁺ + SO ₃ ^2-

[Scheme 31]

2NO ₂ (aq) + SO ₃ ^2- (aq) + H ₂ O → NO ₂ ^- (aq) + SO ₄ ^2- (aq) + 2H ⁺

NO ₂ (aq) is hardly removed due to its low solubility. In Scheme 31, it _{reacts with SO 3} ^2- (aq) and is dissolved and removed as _{NO 2} ^{- (aq).}

When the exhaust gas (G) _{contains almost no sulfur oxides (SO X} ), sulfur oxides are introduced into the reduction treatment tank 150 and nitrogen dioxide (NO ₂ ) is removed as shown in the following Reaction Equations 32 and 33 through a reduction reaction. .

[Scheme 32]

2NO ₂ (g) + Na ₂ S(aq) → N ₂ (g) + Na ₂ SO ₄ (aq)

[Scheme 33]

2NO ₂ (g) + 4Na ₂ SO ₃ (aq) → N ₂ (g) + Na ₂ SO ₄ (aq)

Schemes 32 and 33 show that nitrogen dioxide is removed by reduction with nitrogen.

Reaction Equations 34 to 36 below show that NaHSO ₃ , Na ₂ S ₂ SO _{3 When} used, the nitrogen dioxide removal efficiency is increased by being input to the oxidation treatment tank 120 in which a strong acid is formed.

[Scheme 34]

NaHSO ₃ (aq) + HNO ₃ (aq) → NaNO ₃ (aq) + SO ₂ (aq) + H ₂ O

[Scheme 35]

NaHSO ₃ (aq) + HCl(aq) → NaCl(aq) + SO ₂ (aq) + H ₂ O

[Scheme 36]

Na ₂ S ₂ SO ₃ (aq) + 2HCl(aq) → S + SO ₂ (aq) + 2NaCl + H ₂ O

In Schemes 28 to 36, SO ₂ , Na ₂ S, Na ₂ SO ₃ , NaHSO ₃ , and Na ₂ S ₂ SO ₃ are examples of sulfur compounds that can be used. One sulfur compound may be used or two or more may be mixed, and may be added to the oxidation treatment tank 120 or the reduction treatment tank 150 depending on the type of sulfur compound.

The reduced-treated water pH sensor 148b measures the pH of the reduced-treated water (L2), and transmits the measured pH value of the reduced-treated water (L2) to the controller 190 . In this embodiment, the reduced-treated water pH sensor 148b is described as measuring the pH of the reduced-treated water (L2) in the reduced-treated water storage tank 141b, but unlike this, the reduced-treated water in the reduction treatment tank 150 It may be installed to measure the pH of (L2), which is also within the scope of the present invention. The reduced treated water L2 is supplied with a pH adjuster from the pH adjuster supply unit 175b to maintain a pH of 8 to 10. In this embodiment, it will be described that sodium hydroxide (NaOH, also referred to as 'caustic soda') is used as a pH adjuster. When sodium hydroxide is used as a pH adjuster, nitrogen dioxide (NO ₂ ) and sulfur dioxide (SO ₂ ) may be neutralized or absorbed by sodium hydroxide. In the reduction treatment tank 150 by sodium hydroxide, the reaction is the same as in Schemes 22 to 25 described above.

Continuing to refer to FIG. 1 , the neutralization processing unit 110c processes the reduction processing gas G3 discharged from the reduction processing unit 110c and discharges it as the final exhaust gas G4 . The neutralization treatment unit 110c is a neutralization treatment that treats the reduction treatment gas G3 discharged from the reduction treatment unit 110b using neutralization treatment water L3 which is an aqueous sodium hydroxide solution containing sodium hydroxide as a neutralizing agent as well as a pH adjuster. The treatment tank 160, the neutralization treatment tank exhaust fan 135c for discharging gas from the neutralization treatment tank 160, and the neutralization treatment water L3 discharged from the neutralization treatment tank 160, the neutralization treatment tank 160 and a neutralized treated water circulating supply device 140c that circulates and supplies to the , and a neutralized treated water pH sensor 148c that measures the pH of the neutralized treated water L3. In the neutralization treatment unit 110c, the pH of the neutralized water L3 is maintained at 8 to 10.

_{The neutralization treatment tank 160 absorbs nitrogen dioxide (NO 2} ) and sulfur dioxide (SO ₂ ) contained in the inlet gas (G3) into neutralized water (L3), which is an aqueous sodium hydroxide solution containing sodium hydroxide as a pH adjuster and neutralizer. removed at the same time. 6 shows the configuration of the neutralization treatment tank 160 . Referring to FIG. 6 together with FIG. 1 , the neutralization treatment tank 160 has substantially the same configuration as the oxidation treatment tank 120 shown in FIG. 4 , and neutralization treatment water L3 for neutralizing and absorbing the inflow gas G3. ) provides a third internal space 160a in which it is stored. The neutralized water (L3) is an aqueous sodium hydroxide solution containing sodium hydroxide as a neutralizing agent. As the third inner space 160a, general industrial water may be supplied and used. The third internal space 160a of the neutralization treatment tank 160 is divided into a 1C storage space 161a and a 2C storage space 161b which are arranged in the lateral direction (horizontal direction) by the third partition wall 161 . are compartmentalized A third connection passage 161c for communicating the 1C storage space 161a and the 2C storage space 161b is formed under the third partition wall 161 . At the upper end of the 1C storage space 161a, a third intake port 162a is formed in communication with the 1C storage space 161a and through which the gas G3 flows together with the neutralization treatment water L3, and the 2C storage space ( A third exhaust port 162b communicating with the second C storage space 161b and discharging gas is formed at the upper end of the 161b). An exhaust pipe 131c is connected to the third exhaust port 162b.

The neutralization treatment tank 160 includes a third water tank 163 located in the 1C storage space 161a, a 1C water flow pipe 164 located in the 1C storage space 161a, and a 1C storage space 161a. ) located in the third mixing barrel 155, the 2C water flow pipe 166 located in the 1C storage space 161a, and the third atomizing part 167 located in the 2C storage space 161b, and , and a plurality of third blocking plates 168 positioned in the 2C storage space 161b and a third eliminator 169 positioned in the 2C storage space 161b.

Since the specific configuration and operation of the neutralization treatment tank 160 is substantially the same as the oxidation treatment tank 120 described above, a detailed description thereof will be omitted.

Referring to FIG. 1 , the neutralization tank exhaust fan 135c is installed in the exhaust pipe 131c to discharge gas from the neutralization tank 160 through the third exhaust port 162b in FIG. 6 . When the neutralization treatment tank exhaust fan 135c operates, the gas in the 2C storage space 161b of the neutralization treatment tank 160 is discharged to the space above the water surface of the 1C storage space 161a and the 2C storage space 161b. There is a pressure difference between the space above the water surface of Accordingly, the water level of the neutralized treated water L3 in the 2C storage space 161b rises and the water level of the neutralized treated water L3 in the 1C storage space 161a decreases. The oxidation treatment tank exhaust fan 135a, the reduction treatment tank exhaust fan 135b, and the neutralization treatment tank exhaust fan 135c constitute the exhaust system of the present invention.

The neutralization treatment water circulation supply device 140c is a device for circulating and supplying the neutralization treatment water L3 discharged from the neutralization treatment tank 160 to the neutralization treatment tank 160 . The neutralized treated water circulation supply device 140c is configured to transfer the neutralized treated water storage tank 141c in which the neutralized treated water L3 is stored and the neutralized treated water L3 stored in the neutralized treated water storage tank 141c to the neutralized treatment tank 160 . It is provided with a neutralized treated water circulation pump (145c) sent to.

The neutralized treatment water L3 discharged from the neutralization treatment tank 160 is stored in the neutralization treatment water storage tank 141c. The neutralized treated water L3 stored in the neutralized treated water storage tank 141c is an aqueous sodium hydroxide solution containing sodium hydroxide as a neutralizing agent and a pH adjusting agent. The sodium hydroxide is supplied to the neutralized treated water circulation supply unit 140c by the pH adjuster supply unit 175b. The neutralized treated water L3 stored in the neutralized treated water storage tank 141c is transferred to the neutralized treated water 160 by the neutralized treated water circulation pump 145c. The neutralized treated water storage tank 141c may be supplied with general industrial water.

The neutralization treated water circulation pump 145c pumps the neutralized treated water L3 stored in the neutralized treated water storage tank 141c to the 1C storage space 161a of the neutralized treatment tank 160 through the neutralized treated water supply pipe 146c. 3 It is supplied through the intake port (162a).

The neutralized water pH sensor 148c measures the pH of the neutralized water L3 and transmits the measured pH value of the neutralized water L3 to the controller 190 . In this embodiment, the neutralized water pH sensor 148c is described as measuring the pH of the neutralized water L3 in the neutralized water storage tank 141c, but unlike this, the neutralized water in the neutralized treatment tank 160 It may be installed to measure the pH of (L3), which is also within the scope of the present invention. The neutralized treated water L3 is supplied with a pH adjuster from the pH adjuster supply unit 175b to maintain a pH of 8 to 10. In this embodiment, it will be described that sodium hydroxide (NaOH, also referred to as 'caustic soda') is used as a pH adjuster. When sodium hydroxide is used as a pH adjusting agent, nitrogen dioxide (NO ₂ ) and sulfur dioxide (SO ₂ ) may be neutralized or absorbed by sodium hydroxide as a neutralizing agent. In the neutralization treatment tank 160 by sodium hydroxide, the reaction is the same as in Schemes 22 to 25 described above.

The sulfur compound supply unit 175a supplies a sulfur compound as a reducing agent to the oxidation treatment unit 110a and the reduction treatment unit 110b. The sulfur compound supply unit 175a is connected to the oxidation treatment water supply pipe 146a of the oxidation treatment water circulation supply device 140a through the first sulfur compound supply line 176a, and the reduced treatment water through the second sulfur compound supply line 177a It is connected to the reduced treated water supply pipe (146b) of the circulation supply device (140b). Although not shown, the sulfur compound supply unit 175a includes a sulfur compound storage tank in which the sulfur compound is stored, and the sulfur compound stored in the sulfur compound storage tank through the first sulfur compound supply line 176a and the second sulfur compound supply line 177a through the oxidation treatment water supply pipe. A sulfur compound supply pump for flowing into the 146a and the reduced treated water supply pipe 146b is provided. Oxidation treatment unit 110a by the first sulfur compound supply amount control valve 178a installed on the first sulfur compound supply line 176a and the second sulfur compound supply amount control valve 179a installed on the second sulfur compound supply line 177a ) and the amount of the sulfur compound supplied to the reduction treatment unit 110b are each independently controlled. The operation of the first sulfur compound supply amount control valve 178a and the second sulfur compound supply amount control valve 179a is controlled by the controller 190 .

The pH adjusting agent supply unit 175b supplies sodium hydroxide serving as a pH adjusting agent and a neutralizing agent to the oxidation treatment unit 110a, the reduction treatment unit 110b, and the neutralization treatment unit 110c. The pH control agent supply unit 175b is connected to the oxidation treatment water storage tank 141a of the oxidation treatment water circulation supply device 140a through the first pH control agent supply line 176b, and through the second pH control agent supply line 177b It is connected to the reduced treated water storage tank 141b of the reduced treated water circulation supply device 140b, and the neutralized treated water storage tank 141c of the neutralized treated water circulation supply device 140c through the third pH adjuster supply line 178b and Connected. Although not shown, the pH adjuster supply unit 175b includes a pH adjuster storage tank in which sodium hydroxide as a pH adjuster is stored, and the pH adjuster stored in the pH adjuster storage tank to the first, second, and third pH adjuster supply lines 176b, 177b and 178b), respectively, and a pH adjusting agent supply pump for flowing into the oxidation-treated water storage tank 141a, the reduction-treated water storage tank 141b, and the neutralization-treated water storage tank 141c. The first pH control agent supply amount control valve 179b installed on the first pH control agent supply line 176b, the second pH control agent supply amount control valve 181b installed on the second pH control agent supply line 177b, and the third Each of the oxidation-treated water storage tank 141a, the reduced-treated water storage tank 141b and the neutralized-treated water storage tank 141c is supplied by the third pH control agent supply amount control valve 182b installed on the pH control agent supply line 178b. The feed amount of the pH adjusting agent is independently controlled. The operation of each of the first, second, and third pH control agent supply amount control valves 179b, 181b, and 182b is controlled by the control unit 190 .

The gas measurement unit 180 measures the concentration of each of the components constituting the final exhaust gas G4 discharged from the neutralization treatment tank 160 through the exhaust pipe 131c and transmits the measured gas component data to the control unit 190 . send. The gas component data measured by the gas measurement unit 180 and transmitted to the control unit 190 is the concentration (ppm) of the nitrogen monoxide gas (NO) included in the final exhaust gas G4 and the concentration of the nitrogen dioxide gas (NO ₂ ) ( ppm). As the gas measuring unit 180 , a Tele-Monitoring System (TMS) may be used.

The control unit 190 controls the operation of the oxidant input amount control valve 104 and the first and second sulfur compound supply amount control valves 178a and 179a using the gas component concentration data measured from the gas measurement unit 180, and the pH The first, second, and third pH adjusters using the respective pH values of the oxidation-treated water (L1), the reduction-treated water (L2), and the neutralized-treated water (L3) measured from the sensors 148a, 148b, and 148c Controls the operation of the supply amount control valve (179b, 181b, 182b). A specific control method is as follows.

When the concentration of the nitrogen monoxide gas measured by the gas measuring unit 180 exceeds the reference value, the control unit 190 operates the oxidizing agent input amount control valve 104 so that an oxidizing agent is additionally supplied to increase the oxidation efficiency of nitrogen monoxide. to control The amount of the additionally supplied oxidizing agent may be adjusted in proportion to an amount in which the measured concentration of nitrogen monoxide gas exceeds the reference value. When the concentration of the nitrogen monoxide gas measured by the gas measuring unit 180 is less than the reference value, the input of the oxidizing agent may be stopped. When the concentration of the nitrogen monoxide gas measured by the gas measuring unit 180 is the same as the reference value, the input amount of the oxidizing agent may be maintained the same.

When the concentration of the nitrogen dioxide gas measured by the gas measurement unit 180 exceeds the reference value, the control unit 190 controls the first and second sulfur compound supply amount control valves 178a so that the sulfur compound is additionally supplied to increase the nitrogen dioxide removal efficiency. , 179a) to control the operation. The amount of the additionally supplied sulfur compound may be adjusted in proportion to the amount in which the measured concentration of nitrogen dioxide gas exceeds the reference value. When the concentration of the nitrogen dioxide gas measured by the gas measuring unit 180 is less than the reference value, the introduction of the sulfur oxide may be stopped. When the concentration of the nitrogen dioxide gas measured by the gas measuring unit 180 is the same as the reference value, the input amount of the sulfur oxide may be maintained the same.

Additionally, when the pH of each of the treated water L1 , L2 , and L3 measured from the pH sensors 148a , 148b , and 148c is out of the reference range, the controller 190 controls the pH regulator supply amount control valve to supply the pH regulator. (179b, 181b, 182b) is activated. When the pH of the treated water (L1, L2, L3) satisfies the reference range, the supply of the pH adjuster is stopped.

Now, with reference to Figs. 1 to 6, the above embodiment described above as a center of construction will be described as a center of action.

Initially, the first inner space 120a of the oxidation treatment tank 120, the second inner space 150a of the reduction treatment tank 150, and the third inner space 160a of the neutralization treatment tank 160 are shown in Fig. 4, As shown in FIGS. 5 and 6, each of the treated water (L1, L2, L3) is filled up to the position indicated by the dotted line, and contains nitrogen oxides (NO _X ), sulfur oxides (SO _X ) and odor-causing substances. The exhaust gas (G) to be treated passes through the oxidizer input device 101, and the gas G1 that has passed through the oxidizer input device 101 is stored 1A through the first intake port 122a of the oxidation treatment tank 120 is introduced into the space 121a. In this state, when the oxidation treatment tank exhaust fan 135a, the reduction treatment tank exhaust fan 135b, and the neutralization treatment tank exhaust fan 135c operate, the oxidation treatment tank 120, the reduction treatment tank 150, and the neutralization treatment tank The jaw 160 operates in the form shown in FIGS. 4, 5 and 6, respectively.

First, the operation of the oxidation treatment tank 120 shown in detail in FIG. 4 will be described. Due to the operation of the oxidation treatment tank exhaust fan 135a, the water level in the storage space 1A 121a is lowered and the storage space 2A 121b is lowered. ) is increased, so that a water level difference occurs between the two storage spaces 121a and 121b. The water level in the storage space 121b 2A rises above the first collision plate 127b and the water level in the storage space 1A 121a is lowered to form a first partition wall 121 in the storage space 1A 121a. The first inlet 1271a of the nozzle 127a is opened. Accordingly, the gas of the storage space 1A 121a passes through the first nozzle 127a and is strongly sprayed upward from the storage space 2A 121b. The gas injected from the first nozzle 127a collides with the plurality of first collision plates 127b to form microbubbles B. As the gas is formed into microbubbles (B) and sprayed, the contact area between the gas and the oxidized water (L1) increases, causing nitrogen oxides, sulfur oxides, and odors included in the chemicals and the gas included in the oxidized water (L1). The reaction efficiency of the material is improved. In addition, the microbubbles (B) stay in the oxidized water L1 of the storage space 2A (121b) for a longer time than normal bubbles. Accordingly, the reaction efficiency in the storage space 2A 121b is significantly increased.

The gas G2 discharged from the oxidation treatment tank 120 flows into the 1B storage space 151a through the second intake port 152a of the reduction treatment tank 150 .

When explaining the operation of the reduction treatment tank 150 shown in detail in FIG. 5 , the water level of the 1B storage space 151a is lowered by the operation of the reduction treatment tank exhaust fan 135b and the 2B storage space 151b is operated. The water level rises so that a water level difference occurs between the two storage spaces 151a and 151b. The water level in the 2B storage space 151b rises above the second collision plate 157b and the water level in the 1B storage space 151a lowers, so that the second partition wall 151 is formed in the 1B storage space 151a. The second inlet 1571a of the nozzle 157a is opened. Accordingly, the gas of the 1B storage space 151a introduced through the second intake port 152a passes through the second nozzle 157a and is strongly sprayed upward from the 2B storage space 151b. The gas injected from the second nozzle 157a collides with the plurality of second collision plates 157b to form microbubbles B. As the gas is formed into microbubbles (B) and sprayed, the contact area between the gas and the reduced treated water (L2) is increased, and nitrogen oxides, sulfur oxides, and odors contained in the gas by the chemical contained in the reduced treated water (L2) are increased. The efficiency of the removal reaction of causative substances is improved. In addition, the microbubbles (B) stay in the reduced treatment water (L2) of the 2B storage space (151b) for a longer time than a general bubble. Accordingly, the removal efficiency of harmful components in the 2B storage space 151b is significantly increased.

The gas G3 discharged from the reduction treatment tank 150 is introduced into the 1C storage space 161a through the third intake port 162a of the neutralization treatment tank 160 .

When explaining the operation of the neutralization treatment tank 160 shown in detail in FIG. 6 , the water level of the 1C storage space 161a is lowered by the operation of the neutralization treatment tank exhaust fan 135c and the level of the 2C storage space 161b is lowered. The water level rises and a water level difference occurs between the two storage spaces 161a and 161b. The water level in the 2C storage space 161b rises above the third collision plate 167b and the water level in the 1C storage space 161a lowers, so that the third partition wall 161 is formed in the first C storage space 161a. A third inlet 1571a of the nozzle 167a is opened. Accordingly, the gas of the 1C storage space 161a introduced through the third intake port 162a passes through the third nozzle 167a and is strongly sprayed upward from the 2C storage space 161b. The gas injected from the third nozzle 167a collides with the plurality of third collision plates 167b to form microbubbles B. As the gas is formed into microbubbles (B) and sprayed, the contact area between the gas and the neutralized water (L3) is increased, and nitrogen oxides, sulfur oxides, and odor-causing substances are added to the gas by the chemicals contained in the neutralized water (L3). of the removal reaction efficiency is improved. In addition, the microbubbles (B) stay in the neutralized water (L3) of the second C storage space (161b) for a longer time than normal bubbles. Accordingly, the removal efficiency of harmful components in the second C storage space 161b is significantly increased.

In the above embodiment, it is described that the oxidation treatment tank exhaust fan 135a, the reduction treatment tank exhaust fan 135b, and the neutralization treatment tank exhaust fan 135c are all provided, but unlike this, only the neutralization tank exhaust fan 135c is the main The same action may be achieved by being used as an exhaust fan, and this also falls within the scope of the present invention. In addition, of the oxidation treatment unit 110a, the reduction treatment unit 110b, and the neutralization treatment unit 110c, only the reduction treatment unit 110b is used, or only the oxidation treatment unit 110a and the reduction treatment unit 110b are used, Only the reduction treatment unit 110b and the neutralization treatment unit 110c may be used, and this also falls within the scope of the present invention.

The exhaust gas complex treatment facility 100 shown in FIG. 1 removes nitrogen oxides, sulfur oxides and odor-causing substances contained in the exhaust gas G to be treated, and fine dust contained in the exhaust gas G to be treated. Dust, including , can also be removed. Dust including fine dust included in the exhaust gas G to be treated is absorbed in the treated water L1, L2, L3 of each treatment tank 12, 150, 160 and may be collected in a wet manner.

In the above embodiment, it is described that the gas is exhausted by an exhaust fan installed on the exhaust port side of each treatment tank 120 , 150 , and 160 to move the gas, but unlike this, the intake port of each treatment tank 120 , 150 , 160 is described as A blower is installed on the side so that the gas can move, and this is also within the scope of the present invention.

According to the exhaust gas complex treatment facility 100 shown in FIG. 1, more than 95% of _{nitrogen oxides (NO X ) are removed, more than 99% of sulfur oxides (SO X} ) and dust are removed, and the complex odor is 3,000 times higher. reduced to less than 300 times.

7 is a flowchart schematically illustrating a control method of an exhaust gas complex treatment facility according to an embodiment of the present invention. Since the control method of the exhaust gas complex treatment facility shown in FIG. 7 uses the exhaust gas complex treatment facility 100 shown in FIG. 1 , the control method will be described with reference to FIG. 1 together. Referring to FIG. 1 together with FIG. 7 , the control method of the exhaust gas complex treatment facility includes each of the components constituting the final exhaust gas G4 by the gas measurement unit 180 of the exhaust gas complex treatment facility 100 . A gas measuring step (S110) in which the concentration is measured, and a comparison step (S120) in which the concentration of each of the components constituting the final exhaust gas (G4) measured in the gas measuring step (S110) is compared with a reference value by the controller 190 (S120) ) and the concentration of each of the components constituting the final exhaust gas G4 confirmed through the comparison step S120 and the comparison result with the reference value, the oxidizer input amount control valve 104 and the supply amount of the first and second sulfur compounds Each operation of the control valves 178a and 179a includes a chemical supply amount control step (S130) controlled by the control unit 190.

In the gas measurement step (S110), the concentration of each of the components constituting the final exhaust gas G4 is measured by the gas measurement unit 180 of the exhaust gas complex treatment facility 100, and the measured gas component data is measured by the control unit ( 190) is sent. Specifically, the gas component data measured in the gas measurement step S110 and transmitted to the control unit 190 is the concentration of nitrogen monoxide gas (NO) and the concentration of nitrogen dioxide gas (NO ₂ ) included in the final exhaust gas (G4). include

In the comparison step S120 , the concentration of each of the components constituting the final exhaust gas G4 measured in the gas measurement step S110 is compared with a reference value by the controller 190 . Specifically, in the comparison step ( S120 ), the concentration of nitrogen monoxide gas (NO) and the concentration of nitrogen dioxide gas (NO ₂ ) included in the final exhaust gas ( G4 ) are compared with a reference value.

In the chemical supply amount control step (S130), the oxidizing agent input amount control valve 104 and the first using the comparison result with the concentration and the reference value of each of the components constituting the final exhaust gas (G4) confirmed through the comparison step (S120) , the operation of each of the second sulfur compound supply amount control valves 178a and 179a is controlled by the control unit 190 . This will be described in detail as follows.

When the concentration of the nitrogen monoxide gas measured by the gas measuring unit 180 exceeds the reference value, the control unit 190 operates the oxidizing agent input amount control valve 104 so that an oxidizing agent is additionally supplied to increase the oxidation efficiency of nitrogen monoxide. to control The amount of the additionally supplied oxidizing agent may be adjusted in proportion to an amount in which the measured concentration of nitrogen monoxide gas exceeds the reference value. When the concentration of the nitrogen monoxide gas measured by the gas measuring unit 180 is less than the reference value, the input of the oxidizing agent may be stopped. When the concentration of the nitrogen monoxide gas measured by the gas measuring unit 180 is the same as the reference value, the input amount of the oxidizing agent may be maintained the same.

When the concentration of the nitrogen dioxide gas measured by the gas measurement unit 180 exceeds the reference value, the control unit 190 controls the first and second sulfur compound supply amount control valves 178a so that the sulfur compound is additionally supplied to increase the nitrogen dioxide removal efficiency. , 179a) to control the operation. The amount of the additionally supplied sulfur compound may be adjusted in proportion to the amount in which the measured concentration of nitrogen dioxide gas exceeds the reference value. When the concentration of the nitrogen dioxide gas measured by the gas measuring unit 180 is less than the reference value, the introduction of the sulfur oxide may be stopped. When the concentration of the nitrogen dioxide gas measured by the gas measuring unit 180 is the same as the reference value, the input amount of the sulfur oxide may be maintained the same.

Additionally, when the pH of each of the treated water L1, L2, L3 measured from the pH sensors 148a, 148b, 148c is out of the reference range, the control unit 190 controls the pH adjuster supply amount control valve ( 179b, 181b, 182b) are activated. When the pH of the treated water (L1, L2, L3) satisfies the reference range, the supply of the pH adjuster is stopped.

Although the present invention has been described through the above examples, the present invention is not limited thereto. The above embodiments may be modified or changed without departing from the spirit and scope of the present invention, and those skilled in the art will recognize that such modifications and changes also belong to the present invention.

100: exhaust gas complex treatment facility 100a: microbubble gas processing unit
101: oxidizing agent input device 102: oxidizing agent supply unit
103: oxidizing agent supply line 104: oxidizing agent input amount control valve
105: first oxidizing agent input unit 105a: first spray nozzle
106: gas-liquid separation unit 107: oxidizing agent aqueous solution storage unit
108: second oxidizing agent input unit 108a: second spray nozzle
109: oxidizing agent aqueous solution supply pump 110a: oxidation treatment unit
110b: reduction processing unit 110c: neutralization processing unit
120: oxidation treatment tank 135a: oxidation treatment tank exhaust fan
135b: reduction treatment tank exhaust fan 135c: neutralization treatment tank exhaust fan
140a: oxidized water circulation supply device 140b: reduced treated water circulation supply device
140c: neutralized treated water circulation supply device 148a: oxidized water pH sensor
148b: reduced-treated water pH sensor 148c: neutralized-treated water pH sensor
150: reduction treatment tank 160: neutralization treatment tank
175a: sulfur oxide supply unit 175b: pH adjuster supply unit
178a: first sulfur compound supply amount control valve
179a: second sulfur compound supply amount control valve
179b: first pH control agent supply amount control valve
181b: second pH regulator supply amount control valve
182b: third pH control agent supply amount control valve
180: gas measurement unit 190: control unit

Claims (18)

an oxidizer input device for oxidizing nitrogen monoxide contained in the exhaust gas to be treated to nitrogen dioxide by inputting an oxidizing agent to the exhaust gas to be treated;
a reduction treatment tank for reducing and removing nitrogen dioxide contained in the gas passing through the oxidizing agent input device by reacting it with a sulfur compound;
a gas measuring unit for measuring the concentration of nitrogen monoxide and the concentration of nitrogen dioxide among the components constituting the final exhaust gas discharged through the reduction treatment tank; and
A control unit for controlling the input amount of the oxidizing agent and the supply amount of the sulfur compound by using the concentration data of nitrogen monoxide and the concentration data of nitrogen dioxide measured by the gas measurement unit,
In the reduction treatment tank, the gas that has passed through the oxidizing agent input device is transformed into microbubbles in the reduction treatment water containing the sulfur compound and sprayed,
The control unit improves the oxidation efficiency of nitrogen monoxide to nitrogen dioxide by increasing the input amount of the oxidizing agent when the concentration of nitrogen monoxide exceeds a reference value,
The control unit increases the supply amount of the sulfur compound when the concentration of the nitrogen dioxide exceeds the reference value to improve the removal efficiency of nitrogen dioxide,
Combined exhaust gas treatment facility. The method according to claim 1,
The sulfur compound is SO ₂ , Na ₂ S, Na ₂ SO ₃ , NaHSO ₃ or Na ₂ S ₂ SO _{3 Is} ,
Combined exhaust gas treatment facility. The method according to claim 1,
The sulfur compound is Na ₂ S or Na ₂ SO ₃ ,
In the reduction treatment tank, the nitrogen dioxide is removed by being reduced to nitrogen by reacting with the sulfur compound,
Combined exhaust gas treatment facility. The method according to claim 1,
Further comprising an exhaust device for discharging gas from the reduction treatment tank,
The reduction treatment tank includes a first storage space communicating with the intake port through which the exhaust gas to be treated is introduced and storing the reduced treated water, and a second storage space communicating with the exhaust port through which the gas is discharged and storing the reduced treated water; and an atomizing part located in the second storage space and communicating with the first storage space, and by the operation of the exhaust device, pressure between the space above the water surface of the first storage space and the space above the water surface of the second storage space As a difference occurs, the water level in the second storage space increases and the water level in the first storage space decreases, so that the gas in the first storage space forms microbubbles by the atomizing unit and is injected into the second storage space felled,
Combined exhaust gas treatment facility. The method according to claim 1,
The gas passing through the oxidizing agent input device further includes an oxidation treatment tank for oxidizing the treatment target exhaust gas before the target exhaust gas flows into the reduction treatment tank,
The oxidation treatment tank oxidizes nitrogen monoxide contained in the exhaust gas to be treated to nitrogen dioxide by spraying it in the form of microbubbles in the oxidation treatment water containing the oxidizing agent,
Combined exhaust gas treatment facility. The method according to claim 1,
Further comprising a neutralization treatment tank for neutralizing and absorbing the exhaust gas that has passed through the reduction treatment tank using a neutralizing agent,
The neutralization treatment tank transforms and injects the exhaust gas into microbubbles in the neutralization treatment water containing the neutralizing agent,
Combined exhaust gas treatment facility. 7. The method of claim 6,
The neutralizing agent is sodium hydroxide,
Combined exhaust gas treatment facility. The method according to claim 1,
an oxidation treatment tank for oxidizing the exhaust gas to be treated before the gas passing through the oxidizing agent input device flows into the reduction treatment tank;
Further comprising a neutralization treatment tank for neutralizing and absorbing the exhaust gas that has passed through the reduction treatment tank using a neutralizing agent,
The oxidation treatment tank oxidizes nitrogen monoxide contained in the exhaust gas to be treated to nitrogen dioxide by spraying it in the form of microbubbles in the oxidation treatment water containing the oxidizing agent,
The neutralization treatment tank transforms and injects the exhaust gas into microbubbles in the neutralization treatment water containing the neutralizing agent,
Combined exhaust gas treatment facility. 9. The method of claim 8,
Further comprising a pH adjuster supply unit for supplying a pH adjuster to the neutralized water,
Combined exhaust gas treatment facility. 10. The method of claim 9,
The pH adjusting agent is sodium hydroxide,
Combined exhaust gas treatment facility. 10. The method of claim 9,
It further comprises a neutralized water pH sensor for measuring the pH of the neutralized water,
The control unit adjusts the amount of the pH adjusting agent supplied to the neutralized water according to the pH of the neutralized water measured by the neutralized water pH sensor,
Combined exhaust gas treatment facility. The method according to claim 1,
The oxidizing agent is chlorine dioxide or ozone,
Combined exhaust gas treatment facility. an oxidizer input device for oxidizing nitrogen monoxide contained in the exhaust gas to be treated to nitrogen dioxide by inputting an oxidizing agent to the exhaust gas to be treated; and
and a reduction treatment tank for reducing and removing nitrogen dioxide contained in the gas that has passed through the oxidizing agent input device by reacting it with a sulfur compound,
In the reduction treatment tank, the gas that has passed through the oxidizing agent input device is transformed into microbubbles in the reduction treatment water containing the sulfur compound and sprayed,
The oxidizing agent input device,
A first oxidizer input unit, a gas-liquid separation unit and a second oxidizer input unit are sequentially arranged along the flow direction of the exhaust gas to be treated;
The first oxidizing agent input unit sprays the oxidizing agent in the form of an aqueous solution to the exhaust gas to be treated in the form of a spray,
The gas-liquid separation unit separates the liquid component from the exhaust gas that has passed through the first oxidizing agent input unit,
The second oxidizer input unit sprays the liquid component separated in the gas-liquid separation unit in the form of a spray to the exhaust gas that has passed through the gas-liquid separation unit,
Combined exhaust gas treatment facility. 14. The method of claim 13,
The gas-liquid separation unit having a centrifuge,
Combined exhaust gas treatment facility. 14. The method of claim 13,
The oxidizing agent input device,
a storage unit in which the liquid component separated from the exhaust gas in the gas-liquid separation unit is stored;
Further comprising a supply pump for supplying the liquid stored in the storage unit to the second oxidant input unit,
Combined exhaust gas treatment facility. delete An oxidizer input device for oxidizing nitrogen monoxide contained in the exhaust gas to be treated to nitrogen dioxide by introducing an oxidizing agent to the exhaust gas to be treated, and nitrogen dioxide contained in the gas that has passed through the oxidizer input device to react with sulfur compounds to reduce and remove As a method of controlling an exhaust gas complex treatment facility having a reduction treatment tank,
a gas measuring step in which a concentration of nitrogen monoxide and a concentration of nitrogen dioxide among components constituting the final exhaust gas discharged through the reduction treatment tank is measured by a gas measuring unit;
a comparison step in which the concentration of each of the components constituting the final exhaust gas measured in the gas measurement step is compared with a reference value by a controller; and
A drug supply amount control step in which the input amount of the oxidizing agent and the supply amount of the sulfur compound are controlled by the control unit using the comparison result with the reference value and the concentration of each of the components constituting the final exhaust gas confirmed through the comparison step includes,
In the chemical supply control step, when the concentration of the nitrogen monoxide measured in the gas measurement step exceeds the reference value, the input amount of the oxidizing agent is increased to improve the oxidation efficiency of nitrogen monoxide to nitrogen dioxide,
In the chemical supply amount control step, when the concentration of the nitrogen dioxide measured in the gas measurement step exceeds the reference value, the supply amount of the sulfur compound is increased to improve the nitrogen dioxide removal efficiency,
Control method of exhaust gas complex treatment facility. delete

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