KR102245859B9 - A support separation apparatus and a support separation method - Google Patents

A support separation apparatus and a support separation method

Info

Publication number
KR102245859B9
KR102245859B9 KR1020170069122A KR20170069122A KR102245859B9 KR 102245859 B9 KR102245859 B9 KR 102245859B9 KR 1020170069122 A KR1020170069122 A KR 1020170069122A KR 20170069122 A KR20170069122 A KR 20170069122A KR 102245859 B9 KR102245859 B9 KR 102245859B9
Authority
KR
South Korea
Prior art keywords
support separation
support
separation method
separation apparatus
separation
Prior art date
Application number
KR1020170069122A
Other languages
Korean (ko)
Other versions
KR102245859B1 (en
KR20180002499A (en
Inventor
신고 이시다
김성권
Original Assignee
도오꾜오까고오교 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도오꾜오까고오교 가부시끼가이샤 filed Critical 도오꾜오까고오교 가부시끼가이샤
Publication of KR20180002499A publication Critical patent/KR20180002499A/en
Application granted granted Critical
Publication of KR102245859B1 publication Critical patent/KR102245859B1/en
Publication of KR102245859B9 publication Critical patent/KR102245859B9/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67144Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Laser Beam Processing (AREA)
KR1020170069122A 2016-06-29 2017-06-02 A support separation apparatus, and a support separation method KR102245859B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016129427A JP6622661B2 (en) 2016-06-29 2016-06-29 Support body separating apparatus and support body separating method
JPJP-P-2016-129427 2016-06-29

Publications (3)

Publication Number Publication Date
KR20180002499A KR20180002499A (en) 2018-01-08
KR102245859B1 KR102245859B1 (en) 2021-04-28
KR102245859B9 true KR102245859B9 (en) 2024-03-15

Family

ID=60946469

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170069122A KR102245859B1 (en) 2016-06-29 2017-06-02 A support separation apparatus, and a support separation method

Country Status (3)

Country Link
JP (1) JP6622661B2 (en)
KR (1) KR102245859B1 (en)
TW (1) TWI703670B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019220666A1 (en) 2018-05-17 2019-11-21 信越エンジニアリング株式会社 Workpiece separation device and workpiece separation method
TWI747611B (en) * 2020-11-13 2021-11-21 天虹科技股份有限公司 Wafer pre-cleaning apparatus
TWI799120B (en) * 2020-11-13 2023-04-11 天虹科技股份有限公司 Wafer pre-cleaning apparatus
TWI761270B (en) * 2020-11-13 2022-04-11 天虹科技股份有限公司 Wafer pre-cleaning apparatus

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05136248A (en) * 1991-11-15 1993-06-01 Hitachi Ltd Adhesion control device for adhesive tape and device thereof
JPH05190414A (en) 1992-01-17 1993-07-30 Nikon Corp Substrate suction apparatus
JP2003025174A (en) 2001-07-11 2003-01-29 Nec Yamagata Ltd Substrate suction method and substrate suction mechanism
JP5472616B2 (en) * 2010-01-27 2014-04-16 ウシオ電機株式会社 Light irradiation device
KR101160158B1 (en) * 2010-05-28 2012-06-27 주식회사 엘티에스 substrate detaching apparatus of LLO process
JP6013850B2 (en) * 2012-09-27 2016-10-25 株式会社ディスコ Wafer processing method
JP5926700B2 (en) 2013-04-30 2016-05-25 東京応化工業株式会社 Support body separating apparatus and support body separating method
JP6298393B2 (en) * 2014-10-30 2018-03-20 東京応化工業株式会社 Support separation method
JP6418932B2 (en) * 2014-12-15 2018-11-07 東京応化工業株式会社 Ultraviolet irradiation apparatus, ultraviolet irradiation method, substrate processing apparatus, and manufacturing method of substrate processing apparatus

Also Published As

Publication number Publication date
JP2018006488A (en) 2018-01-11
TWI703670B (en) 2020-09-01
KR102245859B1 (en) 2021-04-28
KR20180002499A (en) 2018-01-08
TW201804563A (en) 2018-02-01
JP6622661B2 (en) 2019-12-18

Similar Documents

Publication Publication Date Title
GB201716759D0 (en) Vehicle-window-transmittance-control apparatus and method
GB2601980B (en) Apparatus and method for support removal
GB2544143B (en) Multi-column separation apparatus and method
HK1245604A1 (en) Apparatus and method for making a resilient unit
GB201609468D0 (en) Apparatus and method
HK1206464A1 (en) A room-controlling method and apparatus
ZA201807400B (en) Apparatus and method
GB201504471D0 (en) Apparatus and method for scanning a structure
GB201409795D0 (en) A Method and apparatus
GB2558708B (en) Method and apparatus
GB201513532D0 (en) A method and an apparatus
GB2555874B (en) Apparatus and method
GB201605232D0 (en) Apparatus and method
KR102245859B9 (en) A support separation apparatus and a support separation method
GB201618501D0 (en) Method and apparatus
GB201600464D0 (en) Apparatus and method
GB201620557D0 (en) Hydrophonics apparatus and method
GB2553063B (en) Method and apparatus for selecting a service instance
GB201615852D0 (en) Method and apparatus
GB201604652D0 (en) Apparatus and method
EP3430197C0 (en) Method for screening and a screening apparatus
GB201607621D0 (en) Apparatus and method
GB201604640D0 (en) Method and apparatus
GB2556117B (en) Method and apparatus
GB2552843B (en) Method and apparatus

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
G170 Re-publication after modification of scope of protection [patent]