KR102236641B1 - 플라즈마 시스템 내의 모델의 세그먼트화 - Google Patents

플라즈마 시스템 내의 모델의 세그먼트화 Download PDF

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Publication number
KR102236641B1
KR102236641B1 KR1020140055591A KR20140055591A KR102236641B1 KR 102236641 B1 KR102236641 B1 KR 102236641B1 KR 1020140055591 A KR1020140055591 A KR 1020140055591A KR 20140055591 A KR20140055591 A KR 20140055591A KR 102236641 B1 KR102236641 B1 KR 102236641B1
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KR
South Korea
Prior art keywords
module
impedance matching
circuit
model
cable
Prior art date
Application number
KR1020140055591A
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English (en)
Korean (ko)
Other versions
KR20140133475A (ko
Inventor
주니어 존 씨. 발코어
아서 엠. 하월드
Original Assignee
램 리써치 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority claimed from US14/245,803 external-priority patent/US9779196B2/en
Application filed by 램 리써치 코포레이션 filed Critical 램 리써치 코포레이션
Publication of KR20140133475A publication Critical patent/KR20140133475A/ko
Application granted granted Critical
Publication of KR102236641B1 publication Critical patent/KR102236641B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32926—Software, data control or modelling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32697—Electrostatic control
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
KR1020140055591A 2013-05-09 2014-05-09 플라즈마 시스템 내의 모델의 세그먼트화 KR102236641B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201361821523P 2013-05-09 2013-05-09
US61/821,523 2013-05-09
US14/245,803 US9779196B2 (en) 2013-01-31 2014-04-04 Segmenting a model within a plasma system
US14/245,803 2014-04-04

Publications (2)

Publication Number Publication Date
KR20140133475A KR20140133475A (ko) 2014-11-19
KR102236641B1 true KR102236641B1 (ko) 2021-04-06

Family

ID=52454099

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140055591A KR102236641B1 (ko) 2013-05-09 2014-05-09 플라즈마 시스템 내의 모델의 세그먼트화

Country Status (2)

Country Link
KR (1) KR102236641B1 (zh)
TW (2) TWI646570B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180175819A1 (en) * 2016-12-16 2018-06-21 Lam Research Corporation Systems and methods for providing shunt cancellation of parasitic components in a plasma reactor
KR102192299B1 (ko) * 2019-08-28 2020-12-17 세메스 주식회사 기판 처리 장치

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120188007A1 (en) * 2011-01-20 2012-07-26 Advanced Energy Industries, Inc. Impedance-Matching Network Using BJT Switches in Variable-Reactance Circuits

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4408313B2 (ja) * 1999-10-29 2010-02-03 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理方法
US20030094239A1 (en) * 2000-06-02 2003-05-22 Quon Bill H. Apparatus and method for improving electron ecceleration
JP2005284046A (ja) * 2004-03-30 2005-10-13 Kumamoto Univ パターンずれ量検出方法及び露光装置
KR101144018B1 (ko) * 2004-05-28 2012-05-09 램 리써치 코포레이션 복수 ｒｆ 주파수에 반응하는 전극을 갖는 플라즈마 처리기
US7276135B2 (en) * 2004-05-28 2007-10-02 Lam Research Corporation Vacuum plasma processor including control in response to DC bias voltage
CN100530529C (zh) * 2006-07-17 2009-08-19 应用材料公司 具有静电卡盘电压反馈控制的双偏置频率等离子体反应器
US8942650B2 (en) * 2010-04-20 2015-01-27 Rf Micro Devices, Inc. RF PA linearity requirements based converter operating mode selection
US8779662B2 (en) * 2010-10-20 2014-07-15 Comet Technologies Usa, Inc Pulse mode capability for operation of an RF/VHF impedance matching network with 4 quadrant, VRMS/IRMS responding detector circuitry

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120188007A1 (en) * 2011-01-20 2012-07-26 Advanced Energy Industries, Inc. Impedance-Matching Network Using BJT Switches in Variable-Reactance Circuits

Also Published As

Publication number Publication date
TWI646570B (zh) 2019-01-01
TW201511075A (zh) 2015-03-16
TW201901735A (zh) 2019-01-01
KR20140133475A (ko) 2014-11-19
TWI692798B (zh) 2020-05-01

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