KR102218628B9 - Source gas supply device for coating of carbonized layer - Google Patents

Source gas supply device for coating of carbonized layer

Info

Publication number
KR102218628B9
KR102218628B9 KR1020170143781A KR20170143781A KR102218628B9 KR 102218628 B9 KR102218628 B9 KR 102218628B9 KR 1020170143781 A KR1020170143781 A KR 1020170143781A KR 20170143781 A KR20170143781 A KR 20170143781A KR 102218628 B9 KR102218628 B9 KR 102218628B9
Authority
KR
South Korea
Prior art keywords
coating
supply device
gas supply
source gas
carbonized layer
Prior art date
Application number
KR1020170143781A
Other languages
Korean (ko)
Other versions
KR20190048651A (en
KR102218628B1 (en
Inventor
최균
Original Assignee
한국세라믹기술원
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 한국세라믹기술원 filed Critical 한국세라믹기술원
Priority to KR1020170143781A priority Critical patent/KR102218628B1/en
Publication of KR20190048651A publication Critical patent/KR20190048651A/en
Application granted granted Critical
Publication of KR102218628B1 publication Critical patent/KR102218628B1/en
Publication of KR102218628B9 publication Critical patent/KR102218628B9/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material using a porous body
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020170143781A 2017-10-31 2017-10-31 Source gas supply device for coating of carbonized layer KR102218628B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020170143781A KR102218628B1 (en) 2017-10-31 2017-10-31 Source gas supply device for coating of carbonized layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020170143781A KR102218628B1 (en) 2017-10-31 2017-10-31 Source gas supply device for coating of carbonized layer

Publications (3)

Publication Number Publication Date
KR20190048651A KR20190048651A (en) 2019-05-09
KR102218628B1 KR102218628B1 (en) 2021-02-22
KR102218628B9 true KR102218628B9 (en) 2022-04-15

Family

ID=66546546

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170143781A KR102218628B1 (en) 2017-10-31 2017-10-31 Source gas supply device for coating of carbonized layer

Country Status (1)

Country Link
KR (1) KR102218628B1 (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10048759A1 (en) * 2000-09-29 2002-04-11 Aixtron Gmbh Method and device for separating organic layers in particular by means of OVPD
US7398605B2 (en) * 2005-02-04 2008-07-15 Eastman Kodak Company Method of feeding particulate material to a heated vaporization surface
CN103732786B (en) * 2011-06-22 2016-08-17 艾克斯特朗欧洲公司 Gas-phase deposition system and supply head
KR101371596B1 (en) * 2011-10-19 2014-03-07 한국과학기술연구원 Deposition Apparatus Having Linear Evaporating Source
KR101465615B1 (en) * 2013-04-11 2014-11-27 한국표준과학연구원 Evaporation Deposition Apparatus

Also Published As

Publication number Publication date
KR20190048651A (en) 2019-05-09
KR102218628B1 (en) 2021-02-22

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E90F Notification of reason for final refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
G170 Re-publication after modification of scope of protection [patent]