KR102152125B1 - Composition for optical material comprising a ester polythiol mixture, Quantum dot film, Backlight unit, and Liquid crystal display - Google Patents
Composition for optical material comprising a ester polythiol mixture, Quantum dot film, Backlight unit, and Liquid crystal display Download PDFInfo
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- KR102152125B1 KR102152125B1 KR1020190175152A KR20190175152A KR102152125B1 KR 102152125 B1 KR102152125 B1 KR 102152125B1 KR 1020190175152 A KR1020190175152 A KR 1020190175152A KR 20190175152 A KR20190175152 A KR 20190175152A KR 102152125 B1 KR102152125 B1 KR 102152125B1
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- optical material
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- 239000000203 mixture Substances 0.000 title claims abstract description 107
- 150000002148 esters Chemical class 0.000 title claims abstract description 104
- 229920006295 polythiol Polymers 0.000 title claims abstract description 96
- 239000000463 material Substances 0.000 title claims abstract description 53
- 230000003287 optical effect Effects 0.000 title claims abstract description 52
- 239000002096 quantum dot Substances 0.000 title claims description 53
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 12
- 150000001875 compounds Chemical class 0.000 claims abstract description 149
- 150000007970 thio esters Chemical group 0.000 claims abstract description 29
- 238000004448 titration Methods 0.000 claims abstract description 4
- -1 thiol compound Chemical class 0.000 claims description 46
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 33
- 150000003573 thiols Chemical class 0.000 claims description 18
- 230000004888 barrier function Effects 0.000 claims description 17
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 claims description 12
- 238000004811 liquid chromatography Methods 0.000 claims description 11
- 239000004593 Epoxy Substances 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 239000012948 isocyanate Substances 0.000 claims description 8
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 125000002947 alkylene group Chemical group 0.000 claims description 7
- 239000001257 hydrogen Substances 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- JJSYPAGPNHFLML-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;3-sulfanylpropanoic acid Chemical compound OC(=O)CCS.OC(=O)CCS.OC(=O)CCS.CCC(CO)(CO)CO JJSYPAGPNHFLML-UHFFFAOYSA-N 0.000 claims description 4
- 125000004122 cyclic group Chemical group 0.000 claims description 4
- 239000007983 Tris buffer Substances 0.000 claims description 3
- 125000003700 epoxy group Chemical group 0.000 claims description 3
- 125000005842 heteroatom Chemical group 0.000 claims description 3
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 3
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims description 3
- 238000001228 spectrum Methods 0.000 claims description 3
- HAQZWTGSNCDKTK-UHFFFAOYSA-N 2-(3-sulfanylpropanoyloxy)ethyl 3-sulfanylpropanoate Chemical compound SCCC(=O)OCCOC(=O)CCS HAQZWTGSNCDKTK-UHFFFAOYSA-N 0.000 claims description 2
- CFKONAWMNQERAG-UHFFFAOYSA-N 2-[2,4,6-trioxo-3,5-bis[2-(3-sulfanylpropanoyloxy)ethyl]-1,3,5-triazinan-1-yl]ethyl 3-sulfanylpropanoate Chemical compound SCCC(=O)OCCN1C(=O)N(CCOC(=O)CCS)C(=O)N(CCOC(=O)CCS)C1=O CFKONAWMNQERAG-UHFFFAOYSA-N 0.000 claims description 2
- NTYQWXQLHWROSQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;2,2,2-tris(sulfanyl)acetic acid Chemical compound OC(=O)C(S)(S)S.CCC(CO)(CO)CO NTYQWXQLHWROSQ-UHFFFAOYSA-N 0.000 claims description 2
- VSZSIEBALNXIFG-UHFFFAOYSA-N 2-hydroxyethyl 2,2-bis(sulfanyl)acetate Chemical compound OCCOC(=O)C(S)S VSZSIEBALNXIFG-UHFFFAOYSA-N 0.000 claims description 2
- LABQKWYHWCYABU-UHFFFAOYSA-N 4-(3-sulfanylbutanoyloxy)butyl 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCCCCOC(=O)CC(C)S LABQKWYHWCYABU-UHFFFAOYSA-N 0.000 claims description 2
- HPFVBGJFAYZEBE-XNBTXCQYSA-N [(8r,9s,10r,13s,14s)-10,13-dimethyl-3-oxo-1,2,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl] 3-cyclopentylpropanoate Chemical compound C([C@H]1[C@H]2[C@@H]([C@]3(CCC(=O)C=C3CC2)C)CC[C@@]11C)CC1OC(=O)CCC1CCCC1 HPFVBGJFAYZEBE-XNBTXCQYSA-N 0.000 claims description 2
- JOBBTVPTPXRUBP-UHFFFAOYSA-N [3-(3-sulfanylpropanoyloxy)-2,2-bis(3-sulfanylpropanoyloxymethyl)propyl] 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(COC(=O)CCS)(COC(=O)CCS)COC(=O)CCS JOBBTVPTPXRUBP-UHFFFAOYSA-N 0.000 claims description 2
- YAAUVJUJVBJRSQ-UHFFFAOYSA-N [3-(3-sulfanylpropanoyloxy)-2-[[3-(3-sulfanylpropanoyloxy)-2,2-bis(3-sulfanylpropanoyloxymethyl)propoxy]methyl]-2-(3-sulfanylpropanoyloxymethyl)propyl] 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(COC(=O)CCS)(COC(=O)CCS)COCC(COC(=O)CCS)(COC(=O)CCS)COC(=O)CCS YAAUVJUJVBJRSQ-UHFFFAOYSA-N 0.000 claims description 2
- 229920001610 polycaprolactone Polymers 0.000 claims description 2
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- 238000006243 chemical reaction Methods 0.000 description 42
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- 239000010410 layer Substances 0.000 description 20
- 229910052760 oxygen Inorganic materials 0.000 description 17
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- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 9
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- 150000001412 amines Chemical class 0.000 description 7
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- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 6
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- 239000000376 reactant Substances 0.000 description 6
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 6
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 5
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- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C327/00—Thiocarboxylic acids
- C07C327/20—Esters of monothiocarboxylic acids
- C07C327/32—Esters of monothiocarboxylic acids having sulfur atoms of esterified thiocarboxyl groups bound to carbon atoms of hydrocarbon radicals substituted by carboxyl groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/30—Low-molecular-weight compounds
- C08G18/38—Low-molecular-weight compounds having heteroatoms other than oxygen
- C08G18/3855—Low-molecular-weight compounds having heteroatoms other than oxygen having sulfur
- C08G18/3876—Low-molecular-weight compounds having heteroatoms other than oxygen having sulfur containing mercapto groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements with at least one potential jump barrier, e.g. PN, PIN junction
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G02F1/1333—Constructional arrangements; Manufacturing methods
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Abstract
본 발명은 하기 화학식 1로 표시되는 에스터 폴리티올 화합물, 및
하기 화학식 2로 표시되는 티오에스터 작용기를 포함하는 에스터 폴리티올 화합물을 포함하며,
상기 광학 재료용 조성물은 습식 적정으로 측정된 SH 값(g/eq.) α와 이론적으로 계산된 SH 값(g/eq.) β를 이용하여 계산한 하기 수학식 2의 P 값이 1.03 내지 1.07 인 것을 특징으로 하는 광학 재료용 조성물을 제공한다:
[수학식 2]
[화학식 1]
[화학식 2]
The present invention is an ester polythiol compound represented by the following formula (1), and
It includes an ester polythiol compound containing a thioester functional group represented by the following formula (2),
The composition for an optical material has a P value of 1.03 to 1.07 calculated by using the SH value (g/eq.) α measured by wet titration and the theoretically calculated SH value (g/eq.) β. It provides a composition for an optical material, characterized in that:
[Equation 2]
[Formula 1]
[Formula 2]
Description
본 발명은 에스터 폴리티올 혼합물을 포함하는 광학 재료용 조성물, 상기 에스터 폴리티올 혼합물의 제조방법, 양자점 필름, 백라이트 유닛, 및 액정표시장치에 관한 것이다. The present invention relates to a composition for an optical material comprising an ester polythiol mixture, a method for preparing the ester polythiol mixture, a quantum dot film, a backlight unit, and a liquid crystal display.
최근 정보화 시대에 발맞추어 디스플레이(display) 분야 또한 급속도로 발전해 왔고, 이에 부응해서 박형화, 경량화, 저소비전력화 장점을 지닌 평판표시장치(FPD, Flat Panel Display)로서 액정표시장치(LCD, Liquid Crystal Display), 플라즈마표시장치(PDP, Plasma Display Panel device), 전기발광표시장치(ELD, ElectroLuminescence Display), 전계방출표시장치(FED, Field Emission Display) 등이 소개되어 기존의 브라운관(CRT, Cathode Ray Tube)을 빠르게 대체하며 각광받고 있다. In line with the recent information age, the display field has also developed rapidly, and in response to this, it is a liquid crystal display (LCD) as a flat panel display (FPD) with advantages of thinner, lighter, and low power consumption. , Plasma display device (PDP, Plasma Display Panel device), electroluminescence display device (ELD, ElectroLuminescence Display), field emission display device (FED, Field Emission Display), etc., were introduced, and the existing CRT (Cathode Ray Tube) was introduced. It is rapidly being replaced and in the spotlight.
상기 액정표시장치는 그 자체가 발광하여 화상을 형성하지 못하고, 외부로부터 빛이 입사되어 화상을 형성하는 수광형 디스플레이 장치이기 때문에, 광을 제공하기 위한 광원이 필수적으로 요구된다. 종래에는 액정표시장치의 광원으로 냉음극 형광램프(CCFL, Cold Cathode Fluorescent Lamp)가 주로 사용되어 왔으나, 냉음극 형광 램프는 장치가 대형화될 경우 휘도 균일성을 확보하기 어렵고, 색 순도가 떨어진다는 문제점이 있다.Since the liquid crystal display is a light-receiving type display device in which light is incident from the outside to form an image, and cannot emit light by itself, a light source for providing light is essentially required. Conventionally, a cold cathode fluorescent lamp (CCFL) has been mainly used as a light source of a liquid crystal display device, but the cold cathode fluorescent lamp has a problem in that it is difficult to secure uniformity of luminance and color purity when the device becomes large. There is this.
따라서, 최근에는 액정표시장치의 광원으로 냉음극 형광 램프 대신 삼색 발광다이오드(LED, Light Emitting Diode)를 사용하고 있는 추세이다. 삼색 LED를 광원으로 사용할 경우, 높은 색순도를 재현할 수 있어 고품질의 화상을 구현할 수 있다는 장점이 있으나, 가격이 매우 비싸기 때문에 제조 비용이 상승한다는 단점이 있다. 따라서, 광원으로 비교적 가격이 저렴한 청색 발광다이오드를 사용하고, 양자점(QD, Quantum Dot)을 포함하는 광 변환 필름을 이용하여 청색광을 적색광 및 녹색광으로 변환시켜 백색광을 구현하는 기술들이 제안되고 있다.Accordingly, in recent years, a three-color light emitting diode (LED) has been used as a light source of a liquid crystal display instead of a cold cathode fluorescent lamp. When a three-color LED is used as a light source, there is an advantage in that high color purity can be reproduced and a high-quality image can be realized, but there is a disadvantage in that the manufacturing cost is increased because the price is very high. Accordingly, technologies for implementing white light by converting blue light into red light and green light using a blue light-emitting diode, which is relatively inexpensive as a light source, and a light conversion film including a quantum dot (QD), have been proposed.
상기 양자점(QD, Quantum Dot)은 산소나 수분에 의해 산화되는 특징을 갖는다. 따라서 양자점을 포함하는 광 변환 필름의 산소 및 수분 베리어가 매우 중요하다. 따라서 광 변환 필름은 상면과 하면에 배리어 필름을 부착하여 제조되고 있다. 그러나, 필름의 측면부에는 별도의 배리어 수단을 포함하고 있지 않아 측면부를 통해 산소나 수분이 침투하므로, 산소와 수분에 대한 투과율이 낮은 매트릭스 수지를 사용하여 양자점층을 형성하려는 노력이 이루어지고 있다.The quantum dot (QD) has a characteristic of being oxidized by oxygen or moisture. Therefore, the oxygen and moisture barrier of the light conversion film including quantum dots is very important. Therefore, the light conversion film is manufactured by attaching a barrier film to the upper and lower surfaces. However, since a separate barrier means is not included in the side portion of the film, oxygen or moisture penetrates through the side portion, so efforts have been made to form a quantum dot layer using a matrix resin having a low transmittance for oxygen and moisture.
또한, 양자점을 포함하는 매트릭스의 경우 경화시 수축하면서 양자점층의 형태에 변화를 야기시키는 경우가 많고, 기재 계면과의 접착력이 약하여 내구성을 약화시키는 문제가 노출되어 이에 대한 해결방안이 모색되고 있다. In addition, in the case of a matrix including quantum dots, shrinkage during curing causes a change in the shape of the quantum dot layer in many cases, and a problem of weakening durability due to weak adhesion to the substrate interface is exposed, and solutions for this are being sought.
상기와 같은 문제의 해결을 위하여 제안된 종래의 기술로서 일본 등록 특허 JP 4820865호는 고속액체크로마토그래피(HPLC) 측정에 있어서 머캅토 카르본산과 그 분자간 축합 티오에스터 화합물과의 피크 면적 합계를 100%로 한 경우, 이분자 간 축합 티오에스터 화합물 함유량이 5% 이하(면적 백분율)인 머캅토카르본산과 펜타에리스리톨을 반응시키는, 펜타에리스리톨 머캅토카르본산 에스터의 제조방법을 제공한다. 그러나 5% 이하의 불순물 함량으로 제조하는 경우, 정제공정으로 제조 비용이 상승하고 경화공정시 수축률이 올라가 계면 밀착력이 감소하는 단점이 있다. As a conventional technique proposed to solve the above problems, Japanese Patent No. JP 4820865 has 100% of the total peak area of mercapto carboxylic acid and its intermolecular condensation thioester compound in high-speed liquid chromatography (HPLC) measurement. In the case of, there is provided a method for producing a pentaerythritol mercaptocarboxylic acid ester by reacting a mercaptocarboxylic acid having a content of 5% or less (area percentage) of a condensed thioester compound between two molecules and pentaerythritol. However, in the case of manufacturing with an impurity content of 5% or less, there is a disadvantage in that the manufacturing cost increases due to the refining process and the shrinkage rate increases during the curing process, thereby reducing the interfacial adhesion.
또한, 대한민국 등록특허 KR 10-1363198호는 알칼리금속 및 알칼리토금속을 함유하지 않거나, 또는, 적어도 그 1 종을 함유하는 경우에, 그 함유량이 합계로 1.0 중량% 이하가 되게 하는 펜타에리스리톨 머캅토카본산 에스터의 제조방법을 제공한다. 그러나 펜타에리스리톨 내의 불순물을 감소시키더라도 광학재료의 색상이 크게 좋아지거나 공정성이 우수해지지 않는 반면, 상기 금속 불순물의 제거를 위한 정제 공정으로 제조 비용이 크게 상승하므로 바람직한 방법으로 보기 어렵다.In addition, Korean Patent Registration No. KR 10-1363198 discloses pentaerythritol mercaptocarboxylic acid whose content is 1.0% by weight or less in total when it does not contain alkali metal and alkaline earth metal, or contains at least one of them. Provides a method for producing an ester. However, even if impurities in pentaerythritol are reduced, the color of the optical material is not greatly improved or fairness is not improved. However, the purification process for removing the metallic impurities greatly increases the manufacturing cost, and thus it is difficult to view as a preferred method.
본 발명자들은 에스터 폴리티올 화합물 제조시 불순물을 제거하여 순도를 높이는 것보다 인위적으로 특정의 부반응물을 생성시키는 경우, 광학 재료용 조성물 및 이를 이용한 광학 필름의 수축률, 기재 계면 간의 접착력, 및 수분이나 산소의 침투 방지 등에 대한 물성이 더 향상되는 것을 발견하여 본 발명을 완성하였다. In the case of artificially generating a specific side-reactant rather than increasing the purity by removing impurities in the preparation of the ester polythiol compound, the present inventors believe that the composition for an optical material and the shrinkage rate of the optical film using the same, adhesion between the substrate interface, and moisture or oxygen The present invention was completed by finding that the physical properties for prevention of penetration of and the like are further improved.
그러므로, 본 발명은 수축률이 작고, 기재 계면 간의 접착력이 우수하며, 수분이나 산소의 침투 방지 기능이 우수하여 양자점 필름 제조 등의 용도에 사용될 수 있는 광학 재료용 조성물을 제공하는 것을 목적으로 한다. Therefore, it is an object of the present invention to provide a composition for an optical material that can be used in applications such as quantum dot film production because of its low shrinkage, excellent adhesion between substrate interfaces, and excellent moisture or oxygen intrusion prevention function.
또한, 본 발명은 한번의 공정으로 간단하게 에스터 폴리티올 혼합물을 제조할 수 있는 제조방법을 제공하는 것을 목적으로 한다.In addition, it is an object of the present invention to provide a manufacturing method capable of simply preparing an ester polythiol mixture in one step.
또한, 본 발명은 상기 광학 재료용 조성물을 사용함으로써, 고온 및 고습 환경에서 우수한 휘도를 나타내며, 에지 탈색 등의 방지에 의한 우수한 내구성을 갖는 양자점 필름, 백라이트 유닛 및 액정표시장치를 제공하는 것을 목적으로 한다. In addition, the present invention is to provide a quantum dot film, a backlight unit, and a liquid crystal display device that exhibits excellent luminance in a high temperature and high humidity environment, and has excellent durability by preventing edge discoloration, by using the composition for an optical material. do.
상기 목적을 달성하기 위하여, 본 발명은, In order to achieve the above object, the present invention,
하기 화학식 1로 표시되는 에스터 폴리티올 화합물, 및An ester polythiol compound represented by the following formula (1), and
하기 화학식 2로 표시되는 티오에스터 작용기를 포함하는 에스터 폴리티올 화합물을 포함하는 광학 재료용 조성물을 제공한다:It provides a composition for an optical material comprising an ester polythiol compound containing a thioester functional group represented by the following formula (2):
[화학식 1][Formula 1]
[화학식 2][Formula 2]
상기 화학식 1 및 화학식 2에서In Formula 1 and Formula 2,
A는 각각 독립적으로 불포화기를 포함하거나 포함하지 않는 선형(linear), 가지(branched) 또는 시클릭(cyclic)의, 헤테로기를 포함하거나 포함하지 않는 C1~C12의 지방족 탄화수소기이며,A is a C1 ~ C12 aliphatic hydrocarbon group, each independently containing or not containing an unsaturated group, of a linear, branched or cyclic, hetero group,
R1, R2, R3 및 R4는 각각 독립적으로 수소 또는 C1 내지 C5의 알킬기이며,R 1 , R 2 , R 3 and R 4 are each independently hydrogen or a C1 to C5 alkyl group,
k 및 l은 각각 독립적으로 0 내지 3의 정수이며, k and l are each independently an integer of 0 to 3,
o는 2 내지 6의 자연수이며, p는 0 내지 5의 자연수이며, q는 1 내지 6의 자연수이며, p+q = 2 내지 6의 자연수이며, o is a natural number from 2 to 6, p is a natural number from 0 to 5, q is a natural number from 1 to 6, p+q = a natural number from 2 to 6,
m 및 n은 각각 독립적으로 1 내지 5의 자연수이며,m and n are each independently a natural number of 1 to 5,
상기 m 및 n개로 표시된 알킬렌기는 C1 내지 C5로 치환 또는 비치환된 것일 수 있다. The alkylene groups represented by m and n may be substituted or unsubstituted with C1 to C5.
또한, 본 발명은 In addition, the present invention
하기 화학식 3으로 표시되는 화합물 및 화학식 4로 표시되는 화합물의 축합 에스터 반응에 의해, 제1항의 화학식 1로 표시되는 화합물 및 화학식 2로 표시되는 화합물을 하나의 공정으로 제조하는 방법으로서, A method of preparing a compound represented by Formula 1 and a compound represented by Formula 2 in one step by condensation ester reaction of a compound represented by the following Formula 3 and a compound represented by Formula 4,
축합에 의해 생성되는 물을 공비증류법을 이용하여 제거하되, 이론 탈수량의 95 내지 110%의 물을 외부로 탈수시켜 제거하여 정반응을 지속적으로 유도하는 공정을 수행하는 것을 특징으로 하는 에스터 폴리티올 혼합물의 제조방법을 제공한다:An ester polythiol mixture, characterized in that the water produced by condensation is removed using an azeotropic distillation method, but a process of continuously inducing a positive reaction by removing 95 to 110% of water of the theoretical dehydration amount to the outside by dehydrating it. Provides a method of manufacturing:
[화학식 3][Formula 3]
[화학식 4][Formula 4]
상기 화학식 3 및 화학식 4에서In Chemical Formula 3 and Chemical Formula 4
A는 각각 독립적으로 불포화기를 포함하거나, 포함하지 않는 선형(linear), 가지(branched) 또는 시클릭(cyclic)의, 헤테로기를 포함하거나 포함하지 않는 C1~C12의 지방족 탄화수소기이며, R1 및 R2는 각각 독립적으로 수소 또는 C1 내지 C5의 알킬기이며,A is a C1-C12 aliphatic hydrocarbon group, each independently containing or not containing an unsaturated group, of a linear, branched, or cyclic, hetero group, and R 1 and R 2 is each independently hydrogen or a C1 to C5 alkyl group,
x는 2 내지 6의 자연수며, x is a natural number from 2 to 6,
m은 1 내지 5의 자연수이며,m is a natural number from 1 to 5,
상기 m개로 표시된 알킬렌기는 C1 내지 C5로 치환 또는 비치환된 것일 수 있다. The alkylene groups represented by m may be substituted or unsubstituted with C1 to C5.
또한, 본 발명은In addition, the present invention
제1 배리어층; 제2 배리어층; 및 상기 제1 배리어 층과 상기 제2 배리어 층 사이에 위치하는 양자점층을 포함하며, A first barrier layer; A second barrier layer; And a quantum dot layer positioned between the first barrier layer and the second barrier layer,
상기 양자점층은 양자점을 포함하는 본 발명의 광학 재료용 조성물에 의해 형성된 것을 특징으로 하는 양자점 필름을 제공한다.The quantum dot layer provides a quantum dot film, characterized in that formed by the composition for an optical material of the present invention including quantum dots.
또한, 본 발명은 In addition, the present invention
상기 양자점 필름을 포함하는 백라이트 유닛 및 상기 백라이트 유닛을 포함하는 액정표시장치를 제공한다.It provides a backlight unit including the quantum dot film and a liquid crystal display device including the backlight unit.
본 발명의 광학 재료용 조성물은 수축률이 작고, 기재 계면 간의 접착력이 우수하며, 수분이나 산소의 침투 방지 기능이 우수하여 양자점 필름 제조 등의 용도에 유용하게 사용될 수 있다. The composition for an optical material of the present invention has a small shrinkage, excellent adhesion between substrate interfaces, and excellent function of preventing penetration of moisture or oxygen, so that it can be usefully used in applications such as manufacturing a quantum dot film.
또한, 본 발명의 에스터 폴리티올 혼합물의 제조방법은 한번의 공정으로 간단하게 에스터 폴리티올 혼합물을 제조할 수 있는 효과를 제공한다.In addition, the method for preparing an ester polythiol mixture of the present invention provides an effect of simply preparing an ester polythiol mixture in a single process.
또한, 본 발명의 양자점 필름, 백라이트 유닛 및 액정표시장치는 상기 광학 재료용 조성물을 사용함으로써, 고온 및 고습 환경에서 우수한 휘도를 나타내며, 에지 탈색 등의 방지에 의한 우수한 내구성을 제공한다. In addition, the quantum dot film, the backlight unit and the liquid crystal display of the present invention exhibit excellent luminance in a high temperature and high humidity environment by using the composition for an optical material, and provide excellent durability by preventing edge discoloration.
도 1 내지 4는 본 발명의 합성예 1 내지 4에서 제조된 에스터 폴리티올 혼합물의 고속액체크로마토그래피(HPLC) 분석 스펙트럼을 나타내는 그래프이다.1 to 4 are graphs showing high-speed liquid chromatography (HPLC) analysis spectra of ester polythiol mixtures prepared in Synthesis Examples 1 to 4 of the present invention.
이하, 본 발명을 상세히 설명한다.Hereinafter, the present invention will be described in detail.
본 발명자들은 에스터 폴리티올 화합물 제조시 불순물을 제거하여 순도를 높이는 것보다, 인위적으로 특정의 부반응물을 생성시키는 경우 광학 재료용 조성물 및 이를 이용한 광학 필름의 수축률, 기재 계면 간의 접착력, 및 수분이나 산소의 침투 방지 등에 대한 물성이 더 향상되는 것을 발견하여 본 발명을 완성하였다. In the case of artificially generating a specific side-reactant, rather than increasing the purity by removing impurities in the preparation of the ester polythiol compound, the present inventors believe that the composition for an optical material and the shrinkage rate of the optical film using the same, adhesion between the substrate interface, and moisture or oxygen The present invention was completed by finding that the physical properties for prevention of penetration of and the like are further improved.
일반적으로 에스터 폴리티올 화합물은 다가의 지방족 알코올과 카르복실기와 티올기가 한 분자내에 존재하는 머캅토 알킬 카르복실산의 반응으로 제조할 수 있다. 즉, 지방족 알코올과 카르복실기의 축합 에스터 반응으로 에스터기를 포함하는 에스터 폴리티올 화합물이 합성되고, 부산물로 물이 생성된다. In general, ester polythiol compounds can be prepared by reacting a polyhydric aliphatic alcohol with a mercapto alkyl carboxylic acid having a carboxyl group and a thiol group in one molecule. That is, an ester polythiol compound containing an ester group is synthesized through a condensation ester reaction of an aliphatic alcohol and a carboxyl group, and water is produced as a by-product.
본 발명자들은 상기 축합 에스터 반응을 과반응으로 진행시킴으로써, 에스터 폴리티올 화합물(하기 화학식 1의 화합물)과 함께 이미 제조된 에스터 폴리티올 화합물의 티올 작용기와 미반응된 머캅토 알킬 카르복실산의 카르복실기의 부반응에 의해 티오에스터기를 포함하는 에스터 폴리티올 화합물(하기 화학식 2의 화합물)을 얻음으로써, 에스터 폴리티올 화합물(하기 화학식 1의 화합물)과 티오에스터기를 포함하는 에스터 폴리티올 화합물(하기 화학식 2의 화합물)을 포함하는 광학 재료용 조성물을 제조하여 본 발명을 완성하였다. 상기 에스터 폴리티올 화합물(하기 화학식 1의 화합물)과 티오에스터기를 포함하는 에스터 폴리티올 화합물(화학식 2의 화합물)은 별도로 각각 제조하여 혼합하는 경우도 가능하다. The present inventors have carried out the condensation ester reaction as an overreaction, so that the carboxyl group of the unreacted mercapto alkyl carboxylic acid with the thiol functional group of the ester polythiol compound already prepared together with the ester polythiol compound (compound of formula 1) By obtaining an ester polythiol compound containing a thioester group (a compound of the following formula 2) by a side reaction, an ester polythiol compound (a compound of the following formula 1) and an ester polythiol compound containing a thioester group (a compound of the following formula 2) ) To complete the present invention by preparing a composition for an optical material containing. The ester polythiol compound (the compound of Formula 1) and the ester polythiol compound (compound of Formula 2) containing a thioester group may be separately prepared and mixed.
본 발명은 하기 화학식 1로 표시되는 에스터 폴리티올 화합물, 및The present invention is an ester polythiol compound represented by the following formula (1), and
하기 화학식 2로 표시되는 티오에스터기를 포함하는 에스터 폴리티올 화합물을 포함하는 광학 재료용 조성물에 관한 것이다:It relates to a composition for an optical material comprising an ester polythiol compound containing a thioester group represented by the following Formula 2:
[화학식 1][Formula 1]
[화학식 2][Formula 2]
상기 화학식 1 및 화학식 2에서In
A는 각각 독립적으로 불포화기를 포함하거나 포함하지 않는 선형(linear), 가지(branched) 또는 시클릭(cyclic)의, 헤테로기를 포함하거나 포함하지 않는 C1~C12의 지방족 탄화수소기이며,A is each independently a linear, branched, or cyclic, C1-C12 aliphatic hydrocarbon group containing or not containing an unsaturated group, and
R1, R2, R3 및 R4는 각각 독립적으로 수소 또는 C1 내지 C5의 알킬기이며,R 1 , R 2 , R 3 and R 4 are each independently hydrogen or a C1 to C5 alkyl group,
k 및 l은 각각 독립적으로 0 내지 3의 정수이며, k and l are each independently an integer of 0 to 3,
o는 2 내지 6의 자연수이며, p는 0 내지 5의 자연수이며, q는 1 내지 6의 자연수이며, p+q = 2 내지 6의 자연수이며, o is a natural number from 2 to 6, p is a natural number from 0 to 5, q is a natural number from 1 to 6, p+q = a natural number from 2 to 6,
m 및 n은 각각 독립적으로 1 내지 5의 자연수이며,m and n are each independently a natural number of 1 to 5,
상기 m 및 n개로 표시된 알킬렌기는 C1 내지 C5로 치환 또는 비치환된 것일 수 있다. The alkylene groups represented by m and n may be substituted or unsubstituted with C1 to C5.
상기 m 및 n개로 표시된 알킬렌기는 C1 내지 C5로 치환 또는 비치환된 것일 수 있으며, 상기에서 C1 내지 C5의 알킬기는 직쇄 또는 분지쇄일 수 있다. The alkylene groups represented by m and n may be substituted or unsubstituted with C1 to C5, and the C1 to C5 alkyl group may be linear or branched.
본 발명의 일 실시형태에 있어서, 상기 화학식 1의 에스터 폴리티올 화합물과 상기 화학식 2의 티오에스터 작용기를 포함하는 에스터 폴리티올 화합물의 중량비는 1.80 ~ 2.30 : 1일 수 있다. In one embodiment of the present invention, the weight ratio of the ester polythiol compound of
또한, 상기 광학 재료용 조성물을 고속액체크로마토그래피(HPLC)로 분석하는 경우, 고속액체크로마토그래피(HPLC) 스펙트럼에서 상기 화학식 1의 에스터 폴리티올 화합물의 피크 면적과 상기 화학식 2의 티오에스터 작용기를 포함하는 에스터 폴리티올 화합물의 피크 면적은 하기의 수학식 1에 의해 계산된 X 값이 1.80 내지 2.30을 만족시킬 수 있다. 각각의 화합물의 피크 면적을 전체 피크 면적으로 나눈 값은 각각의 화합물의 중량 비율과 동일하므로, 하기 수학식 1의 X 값은 화학식1의 에스터 폴리티올과 화학식2의 티오에스터기를 포함하는 폴리티올 화합물의 중량 비율과 동일하다. In addition, when the composition for an optical material is analyzed by high-speed liquid chromatography (HPLC), the peak area of the ester polythiol compound of
[수학식 1][Equation 1]
X = 화학식 1의 에스터 폴리티올 화합물의 피크 면적의 합 / 화학식 2의 티오에스터기를 포함하는 폴리티올 화합물의 피크 면적의 합X = the sum of the peak areas of the ester polythiol compound of
상기 “/”는 나누기를 의미한다. The “/” means division.
상기 X 값이 1.80 미만인 경우는 부반응 생성물인 화학식 2의 티오에스터 기를 포함하는 에스터 폴리티올 화합물이 더욱 더 많아 진다는 의미이다. 화학식 2의 티오에스터 기를 포함하는 에스터 폴리티올 화합물이 많아지는 경우, 광학용 조성물에 적용시 수축률을 감소시키고, 기재 계면간의 접착력을 증대시키며, 수분이나 산소의 침투를 막아 주는 역할이 증대되는 효과를 얻을 수 있다. When the X value is less than 1.80, it means that more and more ester polythiol compounds containing a thioester group represented by Formula 2 as a side reaction product increase. When the amount of the ester polythiol compound containing the thioester group of Formula 2 is increased, the effect of reducing the shrinkage when applied to an optical composition, increasing the adhesion between the substrate interface, and preventing the penetration of moisture or oxygen increases. Can be obtained.
그러나, 화학식 2의 티오에스터 작용기를 포함하는 에스터 폴리티올 화합물의 함량을 증가시키기 위해 반응시간을 연장하는 경우, X 값이 1.8보다 낮아지지는 않으며 오히려 티올 작용기 사이의 디 설파이드 구조가 생성되어 원하지 않는 폴리티올 다이머의 구조가 생성된다. 이러한 디설파이드 구조는 쉽게 산소와 결합하여(산화) 분해되는 구조로서 폴리 티올의 색상을 악화시키는 원인이 된다. However, in the case of extending the reaction time to increase the content of the ester polythiol compound containing the thioester functional group of Formula 2, the X value is not lower than 1.8, rather, a disulfide structure between thiol functional groups is generated, which is not desired. The structure of the polythiol dimer is created. This disulfide structure is a structure that is easily combined with oxygen (oxidized) and decomposed, which causes the color of polythiol to deteriorate.
반면 X 값이 2.3을 초과할 경우에는 화학식 2의 티오에스터 기를 포함하는 에스터 폴리티올 화합물의 함량이 부족해지므로 상기 언급된 바와 같은 효과를 기대하기 어렵다. On the other hand, when the X value exceeds 2.3, the content of the ester polythiol compound containing the thioester group of Formula 2 is insufficient, and thus it is difficult to expect the above-mentioned effects.
본 발명의 일 실시형태에 있어서, 상기 광학 재료용 조성물에 대하여 습식 적정으로 측정된 SH 값(g/eq.) α와 이론적으로 계산된 SH 값(g/eq.) β를 이용하여 계산한 하기 수학식 2의 P 값은 1.03 내지 1.07일 수 있다. In one embodiment of the present invention, the following calculated using the SH value (g/eq.) α measured by wet titration for the composition for optical materials and the theoretically calculated SH value (g/eq.) β The P value of Equation 2 may be 1.03 to 1.07.
[수학식 2][Equation 2]
상기 P 값이 1.03 미만일 경우, 상기 화학식 2의 티오에스터기를 포함하는 에스터 폴리티올의 함량이 적어 경화성 조성물에 투입시 수축률이 커지므로 기재와의 밀착력이 감소하고, 수분이나 산소의 투가가 용의해져 디스플레이재료의 신뢰성에 문제가 발생될 수 있으며, 1.07을 초과할 경우 티올 작용기 사이의 디 설파이드 구조가 생성되어 원하지 않는 폴리티올 다이머 구조의 불순물이 많이 포함되므로 액상의 색상이 나빠지고, 경화물의 조성에 투입시 경화성이 느려지는 문제가 발생될 수 있다. When the P value is less than 1.03, the content of the ester polythiol containing the thioester group of Formula 2 is small, so the shrinkage rate increases when added to the curable composition, so the adhesion to the substrate decreases, and the permeation of moisture or oxygen is convenient. If it exceeds 1.07, a disulfide structure between thiol functional groups is generated, which contains a lot of unwanted impurities of the polythiol dimer structure, resulting in poor liquid color and composition of the cured product. When added to, a problem of slowing curability may occur.
또한, 상기 광학 재료용 조성물을 L*a*b* 표색계로 나타내었을 때, 액상 b*가 2.0 이하일 수 있다. 상기 b*가 2.0을 초과하는 경우 상기 조성물의 액상의 색상이 불투명하거나 황색의 상태를 의미하며, 상기 조성물을 이용한 경화물의 색상도 황색이거나 불투명한 성상을 보이므로 맑고 투명해야 하는 디스플레이 재료에는 적용이 어려운 문제가 발생할 수 있어 바람직하지 않다. In addition, when the composition for an optical material is represented by an L*a*b* color system, the liquid b* may be 2.0 or less. When the b* exceeds 2.0, it means that the color of the liquid phase of the composition is opaque or yellow, and the color of the cured product using the composition is yellow or opaque, so it is not applicable to display materials that must be clear and transparent. Difficult problems can arise, which is not desirable.
본 발명의 일 실시형태에 있어서, In one embodiment of the present invention,
상기 화학식 1 및 화학식 2에 있어서, In
A는 4가 알코올인 펜타에리트리톨이고,A is pentaerythritol, a tetrahydric alcohol,
R1, R2, R3 및 R4는 각각 독립적으로 수소 또는 C1 내지 C5의 알킬기이며,R 1 , R 2 , R 3 and R 4 are each independently hydrogen or a C1 to C5 alkyl group,
k는 0 또는 1이며, k가 0인 경우 o는 4이고, k가 1인 경우 o는 3이며,k is 0 or 1, o is 4 when k is 0, o is 3 when k is 1,
l은 0 또는 1이며, l이 0인 경우 p는 3이고 q는 1이며, l이 1인 경우 p는 2이고, q는 1이며; l is 0 or 1, when l is 0, p is 3 and q is 1, when l is 1, p is 2, and q is 1;
m 및 n은 각각 독립적으로 1 내지 3의 자연수일 수 있다. m and n may each independently be a natural number of 1 to 3.
구체적으로 상기에서 화학식 1의 화합물은 하기 화학식 5 및 화학식 6을 포함하며, 화학식 2의 화합물은 하기 화학식 7 및 화학식 8을 포함할 수 있다.Specifically, the compound of
[화학식 5][Formula 5]
[화학식 6][Formula 6]
[화학식 7][Formula 7]
[화학식 8][Formula 8]
본 발명의 광학 재료용 조성물에서 상기 화학식 1의 에스터 폴리티올 화합물은 수산기를 1개 이상 포함하는 화합물과 수산기를 포함하지 않는 화합물을 포함하며,In the composition for an optical material of the present invention, the ester polythiol compound of
상기 화학식 2의 티오에스터기를 포함하는 에스터 폴리티올 화합물은 수산기를 1개 이상 포함하는 화합물과 수산기를 포함하지 않는 화합물을 포함할 수 있다. The ester polythiol compound containing a thioester group of Formula 2 may include a compound containing one or more hydroxyl groups and a compound not containing a hydroxyl group.
상기 화학식 1의 에스터 폴리티올 화합물 중 수산기를 포함하지 않는 화합물은 에틸렌글리콜디머캅토아세테이트, 트리메틸올프로판트리머캅토아세테이트, 펜타에리트리톨테트라머캅토아세테이트, 디펜타에리트리톨 헥사머캅토아세테이트, 에틸렌 글리콜 디(3-머캅토프로피오네이트), 트리메틸올프로판 트리(3-머캅토프로피오네이트), 펜타에리트리톨 테트라(3-머캅토프로피오네이트), 디펜타에리트리톨 헥사(3-머캅토프로피오네이트), 에톡시레이티드트리메틸올프로판 트리(3-머캅토프로피오네이트), 트리스[2-(3-머캅토프로피오닐옥시)에틸]이소시아누레이트, 폴리카프로락톤 테트라(3-머캅토프로피오네이트), 펜타에리트리톨 테트라(3-머캅토부틸레이트), 1,4-비스(3-머캅토부티릴옥시)부탄, 1,3,5-트리스(3-머캅토부틸옥시에틸)-1,3,5-트리아진-2,4,6(1H,3H,5H)-트리온, 및 트리메틸올프로판트리스(3-머캅토부틸레이트)로 이루어진 군으로부터 선택되는 1종 이상일 수 있다. Among the ester polythiol compounds of
본 발명의 광학 재료용 조성물은 상기 화학식 1의 에스터 폴리티올 화합물 및 상기 화학식 2의 티오에스터 작용기를 포함하는 에스터 폴리티올 화합물에 포함된 티올 1당량을 기준으로, The composition for an optical material of the present invention is based on 1 equivalent of thiol contained in the ester polythiol compound of
에틸렌성 불포화 이중결합 0.8 내지 20.0 당량을 포함하는 불포화 이중결합을 갖는 활성 에너지선 경화성 화합물;An active energy ray-curable compound having an unsaturated double bond containing 0.8 to 20.0 equivalents of an ethylenically unsaturated double bond;
에폭시기 0.8 내지 20.0 당량을 포함하는 에폭시 화합물; 및An epoxy compound containing 0.8 to 20.0 equivalents of an epoxy group; And
이소시아네이트기 0.8 내지 1.2 당량을 포함하는 이소시아네이트 화합물; 중에서 선택되는 1종 이상을 더 포함할 수 있다. An isocyanate compound containing 0.8 to 1.2 equivalents of an isocyanate group; It may further include one or more selected from among.
상기에서 불포화 이중결합을 갖는 활성 에너지선 경화성 화합물이 포함되는 경우에는 광개시제가 추가로 포함되며;In the case where the active energy ray-curable compound having an unsaturated double bond is included, a photoinitiator is further included;
상기 에폭시 화합물이 포함되는 경우에는 아민 경화제, 산무수물 경화제, 아민계 경화촉진제, 및 인계 경화촉진제 중에서 선택되는 1종 이상이 더 포함되며;When the epoxy compound is included, at least one selected from an amine curing agent, an acid anhydride curing agent, an amine-based curing accelerator, and a phosphorus curing accelerator is further included;
상기 이소시아네이트 화합물이 포함되는 경우에는 주석계 반응촉매 및 아민계 반응촉매 중에서 선택되는 1종 이상이 더 포함될 수 있다. When the isocyanate compound is included, at least one selected from a tin-based reaction catalyst and an amine-based reaction catalyst may be further included.
상기에서 불포화 이중결합을 갖는 활성 에너지선 경화성 화합물 및 광개시제; 에폭시 화합물, 아민 경화제, 산무수물 경화제, 아민계 경화촉진제, 및 인계 경화촉진제; 및 이소시아네이트 화합물, 주석계 반응촉매 및 아민계 반응촉매;로는 이 분야에서 공지된 성분이 제한없이 사용될 수 있다. An active energy ray-curable compound having an unsaturated double bond and a photoinitiator; Epoxy compounds, amine curing agents, acid anhydride curing agents, amine curing accelerators, and phosphorus curing accelerators; And an isocyanate compound, a tin-based reaction catalyst, and an amine-based reaction catalyst; components known in the art may be used without limitation.
상기 에스터 폴리티올 혼합물을 포함하는 광학 재료용 조성물은 다양한 분야에 적용될 수 있다. 예를 들어, 광경화용 티오-엔(thio-ene) 조성물, 티오 우레탄계 케스팅 성형 조성물, 에폭시 경화시스템의 경화제로서 사용 가능하다. The composition for an optical material including the ester polythiol mixture can be applied to various fields. For example, it can be used as a thio-ene composition for photocuring, a thio urethane-based casting molding composition, and a curing agent for an epoxy curing system.
광경화용 티오-엔 조성물은 비닐, 아릴, (메타)아크릴계 화합물과 상기 에스터 폴리티올 화합물의 혼합으로 산소에 침투를 막아 경화 효율을 높일 수 있고, 수축율을 줄일 수 있으며, 금속성 기재나 결정성 고분자 기재에 밀착력을 증대시킬 수 있다. 또한, 상기 에스터 폴리티올의 소수성 성질로 인해 수분 침투력을 낮출 수 있는 여러 장점이 있다. 광경화용 티오-엔(thio-ene) 조성물은 상기 광학 재료용 조성물에 포함된 에스터 폴리티올 화합물 및 티오에스터 작용기를 포함하는 에스터 폴리티올 화합물에 포함된 티올 1 당량에 대하여 에틸렌성 불포화 이중결합 0.8 내지 20.0 당량을 혼합하고 추가로 광개시제를 포함한다. 에틸렌성 불포화 이중 결합을 갖는 활성 에너지선 경화성 화합물은 이중결합을 지니고 있는 화합물이면 상관이 없으나, 바람직하게는(메타)아크릴레이트 계열이 좋다. 상기(메타)아크릴레이트 올리고머 및/또는 모노머를 포함할 수 있다. 상기 광경화형(메타)아크릴레이트 올리고머로는 경화물의 기계적 물성 및 경화 수축을 조절하기 위하여 사용할 수 있으며, 그 예로는 에폭시(메타)아크릴레이트, 우레탄(메타)아크릴레이트, 폴리에스터(메타)아크릴레이트, 멜라민(메타) 아크릴레이트, 인산(메타)아크릴레이트, 실리콘(메타)아크릴레이트드 등을 사용할 수 있다. 상기(메타)아크릴로일기를 갖는 모노머는 혼합물의 점도를 낮추며 경화 후 외관 및 물성에 영향을 주므로 용도에 맞게 적절하게 선택하여 사용할 수 있다. 그 예로는 네오펜틸글리콜아크릴레이트, 1,6-헥산디올(메타)아크릴레이트, 프로필렌글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 디프로필렌글리콜디(메타)아크릴레이트, 폴리에틸렌글리콜디(메타)아크릴레이트, 폴리프로필렌글리콜디(메타)아크릴레이트, 트리메틸올프로판트리(메타)아크릴레이트, 트리메틸올에탄트리(메타)아크릴레이트, 1,2,4-시클로헥산테트라(메타)아크릴레이트, 펜타글리세롤트리(메타)아크릴레이트, 펜타에리스리톨테트라(메타)아크릴레이트, 펜타에리스리톨트리(메타)아크릴레이트, 디펜타에리스리톨트리(메타)아크릴레이트, 디펜타에리스리톨펜타(메타)아크릴레이트, 디펜타에리스리톨테트라(메타)아크릴레이트, 디펜타에리스리톨헥사(메타)아크릴레이트,트리펜타에리스리톨트리(메타)아크릴레이트, 트리펜타에리스리톨헥사(메타)아크릴레이트, 비스(2-하이드록시에틸)이소시아누레이트디(메타)아크릴레이트, 하이드록시에틸(메타)아크릴레이트, 하이드록시프로필(메타)아크릴 레이트, 하이드록시부틸(메타)아크릴레이트, 이소옥틸(메타)아크릴레이트, 이소덱실(메타)아크릴레이트, 스테아릴(메타)아크릴레이트, 테트라하이드로퍼푸릴(메타)아크릴레이트, 페녹시에틸(메타)아크릴레이트, 및 이소보네올(메타)아크릴레이트로 이루어진 군으로부터 1종 이상 선택될 수 있다.The photocurable thio-ene composition is a mixture of vinyl, aryl, (meth)acrylic compounds and the ester polythiol compound to prevent penetration of oxygen, thereby increasing curing efficiency, reducing shrinkage, and metal substrates or crystalline polymer substrates. You can increase the adhesion. In addition, due to the hydrophobic properties of the ester polythiol, there are several advantages that can lower moisture penetration. The photocurable thio-ene composition is 0.8 to ethylenically unsaturated double bonds based on 1 equivalent of thiol contained in the ester polythiol compound and the ester polythiol compound containing a thioester functional group in the composition for optical materials. Mix 20.0 equivalents and additionally contain a photoinitiator. The active energy ray-curable compound having an ethylenically unsaturated double bond is irrelevant as long as it is a compound having a double bond, but a (meth)acrylate type is preferable. The (meth) acrylate oligomer and/or monomer may be included. The photocurable (meth)acrylate oligomer may be used to control the mechanical properties and curing shrinkage of the cured product, examples of which include epoxy (meth)acrylate, urethane (meth)acrylate, polyester (meth)acrylate , Melamine (meth) acrylate, phosphoric acid (meth) acrylate, silicone (meth) acrylate, and the like can be used. The monomer having the (meth)acryloyl group lowers the viscosity of the mixture and affects the appearance and physical properties after curing, so it can be appropriately selected and used according to the purpose. Examples thereof include neopentyl glycol acrylate, 1,6-hexanediol (meth) acrylate, propylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, Polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, trimethylol propane tri (meth) acrylate, trimethylol ethane tri (meth) acrylate, 1,2,4-cyclohexanetetra (meth) )Acrylate, pentaglycerol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate , Dipentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, tripentaerythritol tri(meth)acrylate, tripentaerythritol hexa(meth)acrylate, bis(2-hydroxyethyl)iso Cyanurate di (meth) acrylate, hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, isooctyl (meth) acrylate, isodexyl (meth) It may be selected from the group consisting of acrylate, stearyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, phenoxyethyl (meth) acrylate, and isoborneol (meth) acrylate. .
상기 광개시제는 당해 기술분야에서 사용되는 것이라면 제한되지 않고 사용될 수 있다. 구체적으로, 2-메틸-1-[4-(메틸티오)페닐]2-모폴린프로판온-1, 디페닐케톤 벤질디메틸케탈, 2-히드록시-2-메틸-1-페닐-1-온, 4-히드록시시클로페닐케톤, 디메톡시-2-페닐아세토페논, 안트라퀴논, 플루오렌, 트리페닐아민, 카바졸, 3-메틸아세토페논, 4-클로로아세토페논, 4,4-디메톡시아세토페논, 4,4-디아미노벤조페논, 1-히드록시시클로헥실페닐케톤, 2,4,6-트리 메틸 벤조일 디 페닐 포스핀 옥사이드, 비스-(2,6-다이메톡시벤조일)-2,4,4- 트리 메틸 펜틸 포스핀 옥사이드 및 벤조페논으로 이루어진 군으로부터 선택된 1종 이상이 사용될 수 있다. 상기 광경화용 티오-엔(thio-ene) 조성물에 사용되는 기재는 유리, 금속 등의 비 유기기재, 폴리 에틸렌 텔레프탈레이트(PET), 폴리 카보네이트(PC), 폴리에틸렌 나프탈레이트(PEN), 폴리에틸렌(PE), 폴리프로필렌(PP), 폴리이미드(PI), 폴리아마이드(PA) 등 결정성/비결정성 고분자 기재에 사용될 수 있으며, 특히 유기 고분자 프라이머 처리가 되어 있지 않는 결정성 고분자 기재, 또는 금속 옥사이드가 증착되어 있는 금속 표면의 고분자 기재에 밀착력이 우수한 특성을 가지고 있다. 또한 광경화용 티오-엔(thio-ene) 조성물은 수축율이 적어 3D 프린팅용 잉크젯 소재로 적용이 가능하다. The photoinitiator may be used without limitation as long as it is used in the art. Specifically, 2-methyl-1-[4-(methylthio)phenyl]2-morpholinepropanone-1, diphenylketone benzyldimethylketal, 2-hydroxy-2-methyl-1-phenyl-1-one , 4-hydroxycyclophenylketone, dimethoxy-2-phenylacetophenone, anthraquinone, fluorene, triphenylamine, carbazole, 3-methylacetophenone, 4-chloroacetophenone, 4,4-dimethoxyaceto Phenone, 4,4-diaminobenzophenone, 1-hydroxycyclohexylphenylketone, 2,4,6-trimethyl benzoyl diphenyl phosphine oxide, bis-(2,6-dimethoxybenzoyl)-2, At least one selected from the group consisting of 4,4-tri methyl pentyl phosphine oxide and benzophenone may be used. The substrate used in the photocuring thio-ene composition is a non-organic substrate such as glass and metal, polyethylene telephthalate (PET), polycarbonate (PC), polyethylene naphthalate (PEN), polyethylene (PE ), polypropylene (PP), polyimide (PI), polyamide (PA), and other crystalline/amorphous polymer substrates, especially crystalline polymer substrates that are not treated with organic polymer primers, or metal oxides. It has excellent adhesion to the polymer substrate on the surface of the deposited metal. In addition, the photocuring thio-ene composition has a low shrinkage and can be applied as an inkjet material for 3D printing.
상기 티오 우레탄계 케스팅 성형 조성물은 상기 광학 재료용 조성물에 포함된 에스터 폴리티올 화합물 및 티오에스터 작용기를 포함하는 에스터 폴리티올 화합물에 포함된 티올 1당량에 대하여 이소시아네이트 0.8 내지 1.2 당량, 중합성 촉매, 내부 이형제를 포함하는 조성으로 케스팅 성형용 혼합물을 제조할 수 있다. 상기 이소시아네트 화합물은 1분자 중에 적어도 2개 이상의 이소시아네이트기를 가지는 폴리 이소시아네이트 화합물이면 특별히 한정되지 않는다. 구체적으로, 헥사메틸렌디이소시아네이트, 1,5-펜탄디이소시아네이트, 2,2-디메틸펜탄디이소시아네이트, 2,2,4-트리메틸헥산디이소시아네이트, 부텐디이소시아네이트, 1,3-부타디엔-1,4-디이소시아네이트, 2,4,4-트리메틸헥사메틸렌디이소시아네이트, 1,6,11-운데칸트리이소시아네이트, 1,3,6-헥사메틸렌트리이소시아네이트, 1,8-디이소시아나토-4-이소시아나토메틸옥탄, 비스(이소시아나토에틸)카보네이트, 비스(이소시아나토에틸)에테르, 리진디이소시아나토메틸에스터, 리진트리이소시아네이트, 1,2-디이소티오시아나토에탄, 1,6-디이소티오시아나토헥산, 이소포론디이소시아네이트, 비스(이소시아나토메틸)시클로헥산, 디시클로헥실메탄디이소시아네이트, 시클로헥산디이소시아네이트, 메틸시클로헥산디이소시아네이트, 디시클로헥실디메틸메탄이소시아네이트, 2,5-비스(이소시아나토메틸)-비시클로[2.2.1]헵탄, 2,6-비스(이소시아나토메틸)-비시클로[2.2.1]헵탄, 3,8-비스(이소시아나토메틸)트리시클로데칸, 3,9-비스(이소시아나토메틸)트리시클로데칸, 4,8-비스(이소시아나토메틸)트리시클로데칸, 4,9-비스(이소시아나토메틸)트리시클로데칸, 비스(4-이소시아나토시클로헥실)메탄, 1,3-비스(이소시아나토메틸)시클로헥산, 1,4-비스(이소시아나토메틸)시클로헥산, 시클로헥산디이소티오시아네이트 등의 지방족 폴리이소시아네이트 화합물; 1,2-디이소시아나토벤젠, 1,3-디이소시아나토벤젠, 1,4-디이소시아나토벤젠, 톨릴렌디이소시아네이트, 2,4-디이소시아나토톨루엔, 2,6-디이소시아나토톨루엔, 에틸페닐렌디이소시아네이트, 이소프로필 페닐렌디이소시아네이트, 디메틸페닐렌디이소시아네이트, 디에틸페닐렌디이소시아네이트, 디이소프로필페닐렌디이소시아네이트, 트리메틸벤젠트리이소시아네이트, 벤젠트리이소시아네이트, 비페닐디이소시아네이트, 톨루엔디이소시아네이트, 톨루이딘디이소시아네이트, 4,4'-메틸렌비스(페닐이소시아네이트), 4,4'-메틸렌비스(2-메틸페닐이소시아네이트), 디벤질-4,4'-디이소시아네이트, 비스(이소시아나토페닐)에틸렌, 비스(이소시아나토메틸)벤젠, m-크실릴렌디이소시아네이트, 비스(이소시아나토에틸)벤젠, 비스(이소시아나토프로필)벤젠, α,α,α',α'-테트라메틸크실릴렌디이소시아네이트, 비스(이소시아나토부틸)벤젠, 비스(이소시아나토메틸)나프탈렌, 비스(이소시아나토메틸페닐)에테르, 비스(이소시아나토에틸)프탈레이트, 2,5-디(이소시아나토메틸)푸란, 1,2-디이소티오시아나토벤젠, 1,3-디이소티오시아나토벤젠, 1,4-디이소티오시아나토벤젠, 2,4-디이소티오시아나토톨루엔,2,5-디이소티오시아나토-m-크실렌, 4,4'-메틸렌비스(페닐이소티오시아네이트), 4,4'-메틸렌비스(2-메틸페닐이소티오시아네이트), 4,4'-메틸렌비스(3-메틸페닐이소티오시아네이트), 4,4'-디이소티오시아나토벤조페논, 4,4'-디이소티오시아나토-3,3'-디메틸벤조페논, 비스(4-이소티오시아나토페닐)에테르 등의 방향족 폴리이소티오시아네이트 화합물; 비스(이소시아나토메틸)술피드, 비스(이소시아나토에틸)술피드, 비스(이소시아나토프로필)술피드,비스(이소시아나토헥실)술피드, 비스(이소시아나토메틸)술폰, 비스(이소시아나토메틸)디술피드, 비스(이소시아나토에틸)디술피드, 비스(이소시아나토프로필)디술피드, 비스(이소시아나토메틸티오)메탄, 비스(이소시아나토에틸티오)메탄, 비스(이소시아나토메틸티오)에탄, 비스(이소시아나토에틸티오)에탄, 1,5-디이소시아나토-2-이소시아나토메틸-3-티아펜탄, 1,2,3-트리스(이소시아나토메틸티오)프로판, 1,2,3-트리스(이소시아나토에틸티오)프로판, 3,5-디티아-1,2,6,7-헵탄테트라이소시아네이트, 2,6-디이소시아나토메틸-3,5-디티아-1,7-헵탄디이소시아네이트, 2,5-디이소시아네이트메틸티오펜, 4-이소시아나토에틸티오-2,6-디티아-1,8-옥탄디이소시아네이트, 티오비스(3-이소티오시아나토프로판), 티오비스(2-이소티오시아나토에탄), 디티오비스(2-이소티오시아나토에탄), 2,5-디이소시아나토테트라히드로티오펜, 2,5-디이소시아나토메틸테트라히드로티오펜, 3,4-디이소시나토메틸테트라히드로티오펜, 2,5-디이소시아나토-1,4-디티안, 2,5-디이소시아나토메틸-1,4-디티안, 4,5-디이소시아나토-1,3-디티오란, 4,5-비스(이소시아나토메틸)-1,3-디티오란, 4,5-디이소시아나토메틸-2-메틸-1,3-디티오란 등의 함황 지방족 폴리이소시아네이트 화합물; 2-이소시아나토페닐-4-이소시아나토페닐술피드, 비스(4-이소시아나토페닐)술피드, 비스(4-이소시아나토메틸페닐)술피드 등의 방향족 술피드계 폴리이소시아네이트 화합물; 비스(4-이소시아나토페닐)디술피드, 비스(2-메틸-5-이소시아나토페닐)디술피드, 비스(3-메틸-5-이소시아나토페닐)디술피드, 비스(3-메틸-6-이소시아나토페닐)디술피드, 비스(4-메틸-5-이소시아나토페닐)디술피드, 비스(4-메톡시-3-이소시아나토페닐)디술피드 등의 방향족 디술피드계 폴리이소시아네이트 화합물을 들 수 있다. 보다 구체적으로, 상기 폴리이소시아네이트 화합물이 1,3-비스(이소시아나토메틸) 시클로헥산, 헥사메틸렌디이소시아네이트, 이소포론디이소시아네이트, m-크실릴렌디이소시아네이트, 톨루엔디이소시아네이트 또는 이들의 혼합물일 수 있다. 상기 내부 이형제로는 퍼플루오르알킬기, 히드록시알킬기 또는 인산에스터기를 지닌 불소계 비이온 계면활성제; 디메틸폴리실록산기, 히드록시알킬기 또는 인산에스터기를 가진 실리콘계 비이온 계면활성제; 트리메틸세틸 암모늄염, 트리메틸스테아릴, 디메틸에틸세틸 암모늄염, 트리에틸도데실 암모늄염, 트리옥틸메틸 암모늄염, 디에틸시클로헥사도데실 암모늄염 등과 같은 알킬계 4급 암모늄염; 및 산성 인산에스터 중에서 선택된 성분이 단독으로 또는 2종 이상이 함께 사용될 수 있다. 상기 중합촉매는 티올과 이소시아네이트의 중합을 활성화할 수 있는 촉매이면 상관없이 사용할 수 있다. 일반적으로 틴(주석)계 촉매와 아민계 촉매를 사용하며 바람직하게는 디부틸틴 디클로라이드, 디메틸틴 디클로라이드 등의 할로겐화 틴 중합 촉매를 사용할 수 있다.The thiourethane-based casting molding composition includes 0.8 to 1.2 equivalents of isocyanate, polymerizable catalyst, and internal mold release agent based on 1 equivalent of thiol contained in the ester polythiol compound and the ester polythiol compound containing a thioester functional group in the composition for optical materials. It is possible to prepare a mixture for casting molding with a composition comprising a. The isocyanate compound is not particularly limited as long as it is a polyisocyanate compound having at least two or more isocyanate groups in one molecule. Specifically, hexamethylene diisocyanate, 1,5-pentane diisocyanate, 2,2-dimethylpentane diisocyanate, 2,2,4-trimethylhexane diisocyanate, butene diisocyanate, 1,3-butadiene-1,4- Diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, 1,6,11-undecan triisocyanate, 1,3,6-hexamethylene triisocyanate, 1,8-diisocyanato-4-isocyanato Methyloctane, bis (isocyanatoethyl) carbonate, bis (isocyanatoethyl) ether, lysine diisocyanatomethyl ester, lysine triisocyanate, 1,2-diisothiocyanatoethane, 1,6-diisothio Cyanatohexane, isophorone diisocyanate, bis(isocyanatomethyl)cyclohexane, dicyclohexylmethane diisocyanate, cyclohexane diisocyanate, methylcyclohexanediisocyanate, dicyclohexyldimethylmethane isocyanate, 2,5-bis( Isocyanatomethyl)-bicyclo[2.2.1]heptane, 2,6-bis(isocyanatomethyl)-bicyclo[2.2.1]heptane, 3,8-bis(isocyanatomethyl)tricyclodecane , 3,9-bis(isocyanatomethyl)tricyclodecane, 4,8-bis(isocyanatomethyl)tricyclodecane, 4,9-bis(isocyanatomethyl)tricyclodecane, bis(4- Aliphatic polyisocyanate compounds such as isocyanatocyclohexyl)methane, 1,3-bis(isocyanatomethyl)cyclohexane, 1,4-bis(isocyanatomethyl)cyclohexane, and cyclohexanediisothiocyanate; 1,2-diisocyanatobenzene, 1,3-diisocyanatobenzene, 1,4-diisocyanatobenzene, tolylene diisocyanate, 2,4-diisocyanatotoluene, 2,6-diisocyanatotoluene, ethyl Phenylene diisocyanate, isopropyl phenylene diisocyanate, dimethylphenylene diisocyanate, diethylphenylenediisocyanate, diisopropylphenylene diisocyanate, trimethylbenzene triisocyanate, benzene triisocyanate, biphenyl diisocyanate, toluene diisocyanate, toluidine diisocyanate 4,4'-methylenebis(phenylisocyanate), 4,4'-methylenebis(2-methylphenylisocyanate), dibenzyl-4,4'-diisocyanate, bis(isocyanatophenyl)ethylene, bis(isocyanate) Nattomethyl)benzene, m-xylylenediisocyanate, bis(isocyanatoethyl)benzene, bis(isocyanatopropyl)benzene, α,α,α',α'-tetramethylxylylenediisocyanate, bis(iso Cyanatobutyl)benzene, bis(isocyanatomethyl)naphthalene, bis(isocyanatomethylphenyl)ether, bis(isocyanatoethyl)phthalate, 2,5-di(isocyanatomethyl)furan, 1,2- Diisothiocyanatobenzene, 1,3-diisothiocyanatobenzene, 1,4-diisothiocyanatobenzene, 2,4-diisothiocyanatotoluene, 2,5-diisothiocyanato- m-xylene, 4,4'-methylenebis(phenylisothiocyanate), 4,4'-methylenebis(2-methylphenylisothiocyanate), 4,4'-methylenebis(3-methylphenylisothiocyanate) Acid), 4,4'-diisothiocyanatobenzophenone, 4,4'-diisothiocyanato-3,3'-dimethylbenzophenone, bis(4-isothiocyanatophenyl) ether, etc. Polyisothiocyanate compounds; Bis (isocyanatomethyl) sulfide, bis (isocyanatoethyl) sulfide, bis (isocyanatopropyl) sulfide, bis (isocyanatohexyl) sulfide, bis (isocyanatomethyl) sulfone, bis (Isocyanatomethyl) disulfide, bis (isocyanatoethyl) disulfide, bis (isocyanatopropyl) disulfide, bis (isocyanatomethylthio) methane, bis (isocyanatoethylthio) methane, bis (Isocyanatomethylthio)ethane, bis(isocyanatoethylthio)ethane, 1,5-diisocyanato-2-isocyanatomethyl-3-thiapentane, 1,2,3-tris (isocyanato Methylthio)propane, 1,2,3-tris(isocyanatoethylthio)propane, 3,5-dithia-1,2,6,7-heptanetetraisocyanate, 2,6-diisocyanatomethyl-3 ,5-dithia-1,7-heptanediisocyanate, 2,5-diisocyanate methylthiophene, 4-isocyanatoethylthio-2,6-dithia-1,8-octane diisocyanate, thiobis( 3-isothiocyanatopropane), thiobis (2-isothiocyanatoethane), dithiobis (2-isothiocyanatoethane), 2,5-diisocyanatotetrahydrothiophene, 2,5-di Socyanatomethyltetrahydrothiophene, 3,4-diisocinatomethyltetrahydrothiophene, 2,5-diisocyanato-1,4-ditian, 2,5-diisocyanatomethyl-1,4-dithione An, 4,5-diisocyanato-1,3-dithiolane, 4,5-bis(isocyanatomethyl)-1,3-dithiolane, 4,5-diisocyanatomethyl-2-methyl-1 Sulfur-containing aliphatic polyisocyanate compounds such as ,3-dithiolane; Aromatic sulfide-based polyisocyanate compounds such as 2-isocyanatophenyl-4-isocyanatophenyl sulfide, bis(4-isocyanatophenyl)sulfide, and bis(4-isocyanatomethylphenyl)sulfide; Bis(4-isocyanatophenyl)disulfide, bis(2-methyl-5-isocyanatophenyl)disulfide, bis(3-methyl-5-isocyanatophenyl)disulfide, bis(3-methyl- Aromatic disulfide polyisocyanates such as 6-isocyanatophenyl) disulfide, bis(4-methyl-5-isocyanatophenyl) disulfide, and bis(4-methoxy-3-isocyanatophenyl) disulfide And compounds. More specifically, the polyisocyanate compound may be 1,3-bis(isocyanatomethyl) cyclohexane, hexamethylene diisocyanate, isophorone diisocyanate, m-xylylene diisocyanate, toluene diisocyanate, or a mixture thereof. . Examples of the internal mold release agent include fluorine-based nonionic surfactants having a perfluoroalkyl group, a hydroxyalkyl group, or a phosphate ester group; Silicone-based nonionic surfactants having a dimethylpolysiloxane group, a hydroxyalkyl group or a phosphate ester group; Alkyl quaternary ammonium salts such as trimethylcetyl ammonium salt, trimethylstearyl, dimethylethylcetyl ammonium salt, triethyldodecyl ammonium salt, trioctylmethyl ammonium salt, diethylcyclohexadodecyl ammonium salt, etc.; And components selected from among acidic phosphate esters may be used alone or in combination of two or more. The polymerization catalyst may be used regardless of a catalyst capable of activating the polymerization of thiol and isocyanate. In general, a tin (tin)-based catalyst and an amine-based catalyst are used, and a halogenated tin polymerization catalyst such as dibutyltin dichloride or dimethyltin dichloride may be used.
상기 에폭시 경화시스템의 경화제로서 에스터 폴리티올 화합물 및 티오에스터 작용기를 포함하는 에스터 폴리티올 화합물에 포함된 폴리 티올을 사용할 수 있다. 경화제로서 폴리티올을 사용하고, 경화 촉진제로서 3급 아민, 포스핀(phosphine)류, 포스포니늄 염, 4차 암모늄 염 등과 포함하여 제조되는 에폭시 수지 조성물은 상온에서 경화가능한 저온 속경화성 에폭시 수지 조성물로서 공지되어 있으며, (순간)접착제, 밀봉제, 주형(注型) 등에 적용할 수 있다. 추가로 붕산 에스터 화합물, 고체의 잠재성 경화제를 혼합하여 경화속도와 안정성을 확보할 수 있다. 상기 에폭시 수지는 평균적으로 1 분자당 2개 이상의 에폭시 그룹을 갖는 것이면 어느 것이든 사용 가능하다. 구제적인 예로는 비스페놀 A, 비스페놀 F, 비스페놀 AD, 카테콜, 레조르시놀 등의 다가 페놀, 또는 글리세린, 폴리에틸렌 글리콜 등의 다가 알콜과 에피클로로하이드린을 반응시켜 수득되는 폴리글리시딜 에테르; p-하이드록시벤조산, β-하이드록시나프토에산과 같은 하이드록시카본산과 에피클로로하이드린을 반응시켜 수득되는 글리시딜 에테르 에스터; 프탈산, 테레프탈산과 같은 폴리카본산과 에피클로로하이드린을 반응시켜 수득되는 폴리글리시딜 에스터; 및 에폭시화 페놀노볼락 수지, 에폭시화 크레졸노볼락 수지, 에폭시화 폴리올레핀, 지환족 에폭시 수지, 기타 우레탄-개질된 에폭시 수지등이 있다. 경화 촉진제 및 붕산 에스터 화합물, 고체 잠제성 경화제등은 공지의 문헌에서 확인할 수 있다. 상기 에폭시 수지 조성물은 상기 광학 재료용 조성물에 포함된 에스터 폴리티올 화합물 및 티오에스터 작용기를 포함하는 에스터 폴리티올 화합물에 포함된 티올 1 당량에 대하여 에폭시 관능기 0.8 내지 20.0 당량을 혼합하여 사용하며, 이러한 함량비는 용도와 경화 공정에 따라 조절될 수 있다. As a curing agent for the epoxy curing system, a polythiol contained in an ester polythiol compound and an ester polythiol compound containing a thioester functional group may be used. The epoxy resin composition prepared by using polythiol as a curing agent and including tertiary amines, phosphines, phosphonium salts, quaternary ammonium salts, etc. as a curing accelerator is a low-temperature fast-curing epoxy resin composition that can be cured at room temperature It is known as, and can be applied to (instantaneous) adhesives, sealants, molds, and the like. In addition, a boric acid ester compound and a solid latent curing agent may be mixed to secure curing speed and stability. Any epoxy resin can be used as long as it has two or more epoxy groups per molecule on average. Specific examples include polyglycidyl ether obtained by reacting a polyhydric phenol such as bisphenol A, bisphenol F, bisphenol AD, catechol, and resorcinol, or a polyhydric alcohol such as glycerin and polyethylene glycol with epichlorohydrin; glycidyl ether esters obtained by reacting hydroxycarboxylic acids such as p-hydroxybenzoic acid and β-hydroxynaphthoic acid with epichlorohydrin; Polyglycidyl ester obtained by reacting a polycarboxylic acid such as phthalic acid and terephthalic acid with epichlorohydrin; And epoxidized phenol novolak resins, epoxidized cresol novolac resins, epoxidized polyolefins, alicyclic epoxy resins, and other urethane-modified epoxy resins. Curing accelerators, boric acid ester compounds, solid latent curing agents, and the like can be found in known literature. The epoxy resin composition is used by mixing 0.8 to 20.0 equivalents of an epoxy functional group with respect to 1 equivalent of thiols contained in the ester polythiol compound and the ester polythiol compound containing a thioester functional group included in the composition for optical materials, and this content The ratio can be adjusted depending on the application and curing process.
본 발명은 또한,The present invention also,
하기 화학식 3으로 표시되는 화합물 및 화학식 4로 표시되는 화합물의 축합 에스터 반응에 의해, 제1항의 화학식 1로 표시되는 화합물 및 화학식 2로 표시되는 화합물을 하나의 공정으로 제조하는 방법으로서, A method of preparing a compound represented by
축합에 의해 생성되는 물을 공비증류법을 이용하여 제거하되, 이론 탈수량의 95 내지 110%의 물을 외부로 탈수시켜 제거하여 정반응을 지속적으로 유도하는 공정을 수행하는 것을 특징으로 하는 에스터 폴리티올 혼합물의 제조방법에 관한 것이다:An ester polythiol mixture, characterized in that the water produced by condensation is removed using an azeotropic distillation method, but a process of continuously inducing a positive reaction by removing 95 to 110% of water of the theoretical dehydration amount to the outside by dehydrating it. Regarding the manufacturing method of:
[화학식 3] [Formula 3]
[화학식 4] [Formula 4]
상기 화학식 3 및 화학식 4에서In Chemical Formula 3 and Chemical Formula 4
A는 각각 독립적으로 C1~C12의 지방족 탄화수소기이며,A is each independently C1 ~ C12 aliphatic hydrocarbon group,
R1 및 R2는 각각 독립적으로 수소 또는 C1 내지 C5의 알킬기이며,R 1 and R 2 are each independently hydrogen or a C1 to C5 alkyl group,
K는 2 내지 6의 자연수며,K is a natural number from 2 to 6,
m은 1 내지 5의 자연수이며,m is a natural number from 1 to 5,
상기 m개로 표시된 알킬렌기는 C1 내지 C5로 치환 또는 비치환된 것일 수 있다. The alkylene groups represented by m may be substituted or unsubstituted with C1 to C5.
상기에서 축합에 의해 생성되는 물을 공비증류법을 이용하여 제거할 때, 이론 탈수량의 95 내지 110%의 물을 외부로 탈수시켜 제거하는 것이 더욱 바람직하다.When removing the water produced by condensation in the above using an azeotropic distillation method, it is more preferable to remove water in an amount of 95 to 110% of the theoretical dehydration to the outside by dehydrating it.
상기에서 이론 탈수량의 95% 미만의 물을 외부로 탈수시키는 경우 미반응한 수산기가 비교적 많아지고, 축합 에스터 반응이 과반응으로 진행되지 않으므로 제조된 에스터 폴리티올 화합물의 티올 작용기와 미반응된 머캅토 알킬 카르복실산의 카르복실산의 부반응이 잘 일어나지 않아, 화학식 2의 티오에스터 작용기를 포함하는 에스터 폴리티올 화합물을 얻기 어렵다. 또한, 110%를 초과하기 위하여 반응을 과반응을 시행하는 경우 탈수량은 추가로 늘지 않고, 말단의 티올기끼리 반응되는 디설파이드가 생성되어 경화반응에 문제가 생기는데 이는 습식적정법의 SH 값이 상승하는 것으로 확인 할 수 있으며, 고속크로마토 그래피(HPLC) 분석 피크상에도 확인불가능한 불순물 Peak가 다량으로 발견되는 것으로도 예상이 가능하다. 또한 상기 디설파이드는 산소와 쉽게 반응하여 산화되므로 에스터 폴리티올 색상이 노란색 또는 적색으로 변하는 문제가 발생하므로 바람직하지 않다. In the case of dehydrating water less than 95% of the theoretical dehydration amount to the outside, unreacted hydroxyl groups are relatively large, and the condensation ester reaction does not proceed to overreaction. Therefore, the thiol functional group of the prepared ester polythiol compound is unreacted. It is difficult to obtain an ester polythiol compound containing a thioester functional group of Formula 2 because the side reaction of the carboxylic acid of the captoalkyl carboxylic acid does not occur easily. In addition, if the reaction is overreacted to exceed 110%, the amount of dehydration does not increase further, and disulfide that reacts with the thiol groups at the ends is produced, which causes a problem in the curing reaction, which increases the SH value of the wet titration method. It can be confirmed that a large amount of impurity peaks that cannot be identified even on the high-speed chromatography (HPLC) analysis peak can be expected. In addition, since the disulfide is easily oxidized by reacting with oxygen, the ester polythiol color changes to yellow or red, which is not preferable.
상기 제조방법은 상기 화학식 3의 화합물에 포함된 수산기 1 당량을 기준으로 상기 화학식 4의 화합물에 포함된 카르복실기 1.01 내지 1.10 당량을 반응시키는 방법으로 수행될 수 있다.The preparation method may be carried out by reacting 1.01 to 1.10 equivalents of carboxyl groups contained in the compound of Formula 4 based on 1 equivalent of hydroxyl groups contained in the compound of Formula 3 above.
상기에서 화학식 4의 화합물에 포함된 카르복실기를 1 당량 미만으로 반응시키는 경우, 축합 에스터 반응이 과반응으로 진행되는 양이 상대적으로 낮아, 제조된 에스터 폴리티올 화합물의 티올 작용기와 미반응된 머캅토 알킬 카르복실산의 부반응물의 양이 상대적으로 적어 질 수 있어, 화학식 2의 티오에스터 작용기를 포함하는 에스터 폴리티올 화합물의 양을 충분하게 얻기 어렵다. 또한, 1.10 당량을 초과하는 경우 축합 에스터 반응이 과반응으로 진행되는 양이 많아, 제조된 에스터 폴리티올 화합물의 티올 작용기와 미반응된 머캅토 알킬 카르복실산의 부반응물의 양이 상대적으로 많아 질 수 있어, 화학식 2의 티오에스터 작용기를 포함하는 에스터 폴리티올 화합물의 양을 충분하게 얻을 수 있으나, 반응되는 머캅토 알킬 카르복실산에 대하여 반응되지 않고 추후 정제과정에서 버려지는 머캅토 알킬 카르복실산의 양이 증대되어 제조비용이 높아지고, 과량의 머캅토 알킬 카르복실산에의해 생성되는 디설피이드 양이 늘어나 색상에 문제가 발생하므로 바람직하지 않다. In the case where the carboxyl group contained in the compound of Formula 4 is reacted with less than 1 equivalent, the amount of the condensation ester reaction proceeding to the overreaction is relatively low, and thus the unreacted mercapto alkyl with the thiol functional group of the prepared ester polythiol compound Since the amount of the side-reactant of the carboxylic acid may be relatively small, it is difficult to obtain a sufficient amount of the ester polythiol compound containing the thioester functional group of Formula 2. In addition, when the amount exceeds 1.10 equivalents, the amount of condensation ester reaction proceeds as overreaction, and the amount of side-reactants of the unreacted mercapto alkyl carboxylic acid with the thiol functional group of the prepared ester polythiol compound will be relatively large. It is possible to obtain a sufficient amount of the ester polythiol compound containing the thioester functional group of Formula 2, but the mercapto alkyl carboxylic acid is discarded in the subsequent purification process without being reacted with the reacted mercapto alkyl carboxylic acid It is not preferable because the amount of is increased, the manufacturing cost is increased, and the amount of disulfide produced by the excess mercapto alkyl carboxylic acid increases, causing color problems.
상기 제조방법은 예를 들어 하기 반응식 1 및 2로 표시될 수 있다:The preparation method can be represented, for example, by the following
[반응식1][Scheme 1]
[반응식2][Scheme 2]
상기 반응식 2에 나타낸 티올기와 카르복실산의 반응은 반응식 1에 나타낸 알코올과 카르복실산의 반응보다 반응성이 떨어져 주반응이라 할 수 없지만, 상기 에스터 폴리티올 제조 공정의 말기에는 다량의 수산기가 대부분 소진되므로, 잔량의 머캅토 알킬 카르복실 산이 티올 작용기와 반응할 수 있는 가능성이 높아진다. The reaction between the thiol group and the carboxylic acid shown in Reaction Scheme 2 is less reactive than the reaction between the alcohol and carboxylic acid shown in
상기 2관능 이상의 알코올(1-1)은 머캅토 알킬 카르복실산 화합물(1-2)과 에스터 축합반응으로 에스터 폴리티올 화합물(1-3)을 형성한다. 상기 2관능 이상의 알코올(1-1)로는 예를 들어, C2 내지 C12의 알킬렌글리콜, 디에틸렌글리콜, 글리세롤, 디프로필렌글리콜, 트리메틸올프로판, 펜타에리트리톨 및 디펜타에리트리톨 등에서 선택되는 1종 또는 2종 이상이 사용될 수 있다. The bifunctional or higher alcohol (1-1) forms an ester polythiol compound (1-3) through an ester condensation reaction with a mercapto alkyl carboxylic acid compound (1-2). As the bifunctional or higher alcohol (1-1), for example, one selected from C2 to C12 alkylene glycol, diethylene glycol, glycerol, dipropylene glycol, trimethylolpropane, pentaerythritol, dipentaerythritol, etc. Alternatively, two or more types may be used.
상기 알킬렌글리콜로는 에틸렌글리콜, 트리메틸렌글리콜, 1,2-프로필렌글리콜, 1,2-부탄디올, 1,3-부탄디올, 2,3-부탄디올 및 테트라메틸렌글리콜 등에서 선택되는 1종 또는 2종 이상이 사용될 수 있다. The alkylene glycol is one or two or more selected from ethylene glycol, trimethylene glycol, 1,2-propylene glycol, 1,2-butanediol, 1,3-butanediol, 2,3-butanediol, and tetramethylene glycol. Can be used.
상기 머캅토 알킬 카르복실산 화합물(1-2)로는 예를 들어, 티오클리코릭산, 3-머캅토프로피온산, 2-머캅토프로피온산, 3-머캅토부틸산, 2-머캅토이소부틸산, 및 3-머캅토이소부틸산 등에서 선택되는 1종 또는 2종 이상이 사용될 수 있다.As the mercapto alkyl carboxylic acid compound (1-2), for example, thioglycolic acid, 3-mercaptopropionic acid, 2-mercaptopropionic acid, 3-mercaptobutyl acid, 2-mercaptoisobutyl acid, And one or two or more selected from 3-mercaptoisobutyl acid and the like may be used.
상기 에스터 축합 반응은 공비증류법을 이용하여 생성되는 물을 외부로 제거함으로써 정반응을 지속적으로 유도할 수 있다. The ester condensation reaction may continuously induce a forward reaction by removing the generated water to the outside using an azeotropic distillation method.
상기 반응을 상세하게 설명하면, 촉매 존재 하에 2관능 이상의 다가 알코올(1-1)과 머캅토 알킬 카르복실산(1-2)을 유기용매 중에서 유기용매의 끓는점까지 서서히 승온시켜 공비증류함으로써 에스터화 반응을 수행할 수 있다. 이때, 반응 온도는 용매의 끓는점으로 결정될 수 있으며, 60 내지 130℃일 수 있다. 상기 머캅토 알킬 카르복실산 화합물(1-2)은 2관능 이상의 다가 알코올에 포함된 수산기 1 당량에 대하여 과량으로 사용할 수 있으며, 구체적으로, 1.01 내지 1.10 당량을 사용할 수 있다. 상기 반응 시 촉매로서 파라톨루엔설폰산, 황산, 벤젠설폰산, 나프탈렌설폰산, 플루오로설폰산, 클로로설폰산 등의 설폰산 계열을 사용할 수 있다. 상기 유기용매로는 비점이 60 내지 130℃로서 물과 공비증류가 가능하며 에스터 교환반응이 일어나지 않는 유기용매를 사용하는 것이 바람직하며, 예를 들면, 톨루엔, 크실렌, 벤젠, 헥산, 헵탄 등의 유기용매를 사용할 수 있다. 유기 용매의 비점이 60℃보다 낮으면 반응이 진행되기 어려울 수 있고, 130℃보다 높으면 티올 간의 반응으로 디설파이드가 형성되어 합성된 화합물의 점도와 분자량이 급격하게 증가할 수 있다.If the above reaction is described in detail, esterification by azeotropic distillation by gradually increasing the temperature of a bifunctional or higher polyhydric alcohol (1-1) and mercapto alkyl carboxylic acid (1-2) in an organic solvent to the boiling point of the organic solvent in the presence of a catalyst. The reaction can be carried out. In this case, the reaction temperature may be determined by the boiling point of the solvent, and may be 60 to 130°C. The mercapto alkyl carboxylic acid compound (1-2) may be used in an excessive amount based on 1 equivalent of hydroxyl groups contained in the bifunctional or higher polyhydric alcohol, and specifically, 1.01 to 1.10 equivalents may be used. As a catalyst during the reaction, a sulfonic acid series such as paratoluenesulfonic acid, sulfuric acid, benzenesulfonic acid, naphthalenesulfonic acid, fluorosulfonic acid, and chlorosulfonic acid may be used. As the organic solvent, it is preferable to use an organic solvent having a boiling point of 60 to 130°C, capable of azeotropic distillation with water and not undergoing transesterification reaction.For example, organic solvents such as toluene, xylene, benzene, hexane, and heptane A solvent can be used. When the boiling point of the organic solvent is lower than 60° C., the reaction may be difficult to proceed, and when it is higher than 130° C., disulfide is formed by reaction between thiols, and the viscosity and molecular weight of the synthesized compound may rapidly increase.
상기 [반응식2]의 반응을 진행시키기 위해서는 이론 탈수량의 95% 내지 110%의 물을 외부로 탈수시키면서 진행할 수 있다. 추가로 부산물인 물을 외부로 효과적으로 방출하기 위하여 질소 등 불활성 기체를 충분히 투입하여 공비 증류를 원활하게 도와 진행할 수 있다. 또한 공비 증류에 사용되는 지방족 또는 방향족 용제의 비점보다 10℃, 바람직하게는 20℃ 높은 온도로 열매의 온도를 올려 공비 증류를 급격하게 진행시켜 탈수물을 효과적으로 외부로 방출시켜 [반응식2]의 부반응을 촉진할 수 있다. 상기 [반응식 2]에 의한 부반응으로 생성된 화합물로는 예를 들어, 하기 화학식 7 및 화학식 8의 화합물을 들 수 있다. 하기 화학식 8의 화합물은 구조적 입제 장애로 미반응된 수산기가 존재하는 에스터 폴리티올 화합물(1-3)에 [반응식2]의 부반응이 일어나 생성된 화합물이다.In order to proceed with the reaction of [Scheme 2], water of 95% to 110% of the theoretical dehydration amount may be dehydrated to the outside. In addition, in order to effectively discharge water as a by-product to the outside, an inert gas such as nitrogen is sufficiently introduced to facilitate azeotropic distillation. In addition, by raising the temperature of the fruit to a
[화학식 7][Formula 7]
[화학식 8][Formula 8]
본 발명은 또한,The present invention also,
제1 배리어층; 제2 배리어층; 및 상기 제1 배리어 층과 상기 제2 배리어 층 사이에 위치하는 양자점층을 포함하며, A first barrier layer; A second barrier layer; And a quantum dot layer positioned between the first barrier layer and the second barrier layer,
상기 양자점층은 양자점을 포함하는 본 발명의 광학 재료용 조성물에 의해 형성된 것을 특징으로 하는 양자점 필름에 관한 것이다. The quantum dot layer relates to a quantum dot film, characterized in that formed by the composition for an optical material of the present invention including quantum dots.
상기 양자점 필름의 경화 공정은 생산성 측면에서 경화속도가 빠른 광에 의한 경화 공정이 바람직하나 이에 한정하 되지 않는다. 구체적으로 상기 경화는 광에 의하여 경화하는 공정, 광과 열 두가지 방법을 혼합하여 경화하는 공정, 열 단독으로 경화하는 공정 등을 제한없이 사용하여 실시될 수 있다. The curing process of the quantum dot film is preferably a curing process by light having a high curing speed in terms of productivity, but is not limited thereto. Specifically, the curing may be performed using, without limitation, a process of curing by light, a process of curing by mixing two methods of light and heat, a process of curing by heat alone, and the like.
상기 제1 배리어 층 및 제2 배리어 층으로는 수분이나 산소의 투과가 적은 투명 결정성 고분자 기재에 금속 옥사이드계 성분이 증착되어 있는 필름이 사용될 수 있으며, 바람직하게는 투명한 폴리 에틸렌 텔레프탈레이트(PET) 필름에 알킬실란이 증착되어 있는 제품이 좋다. 상기 양자점 입자는 코어층과 상기 코어층 외곽에 위치하는 쉘층을 포함하고, 상기 코어층 및 상기 쉘층 중 적어도 하나가 알루미늄, 실리콘, 티타늄, 마그네슘 및 아연 중 적어도 하나로 도핑되고, 상기 코어층은 III-V족 화합물을 포함하는 것을 사용할 수 있으나 이에 한정되는 것은 아니다. As the first barrier layer and the second barrier layer, a film in which a metal oxide-based component is deposited on a transparent crystalline polymer substrate with little penetration of moisture or oxygen may be used, and preferably, transparent polyethylene telephthalate (PET) Products with alkylsilane deposited on the film are good. The quantum dot particles include a core layer and a shell layer positioned outside the core layer, at least one of the core layer and the shell layer is doped with at least one of aluminum, silicon, titanium, magnesium, and zinc, and the core layer is III- It may be used that includes a group V compound, but is not limited thereto.
상기 코어층의 III-V족 화합물로는 GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb 및 이들의 혼합물로 이루어진 군에서 선택되는 이원소 화합물; GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs AlPSb, InNP, InNAs, InNSb, InPAs, InPSb 및 이들의 혼합물로 이루어진 군에서 선택되는 삼원소 화합물; 및 GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, GaAlNP, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb 및 이들의 혼합물로 이루어진 군에서 선택되는 사원소 화합물 등이 사용될 수 있다. Examples of the group III-V compound of the core layer include a binary compound selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; A ternary compound selected from the group consisting of GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, and mixtures thereof; And GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, GaAlNP, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, and a quaternary compound selected from the group consisting of a mixture thereof.
상기 코어층은 바람직하게는 In 및 P를 포함하고, 상기 쉘층은 Zn, Se 및 S 중에서 적어도 하나를 포함하며, 탄소수 5 내지 30의 무극성 리간드를 추가로 포함하는 것일 수 있다.The core layer preferably includes In and P, and the shell layer includes at least one of Zn, Se and S, and may further include a non-polar ligand having 5 to 30 carbon atoms.
상기 산란입자(E)는 실리카(Silica), 알루미나(Alumina), 실리콘(Silicon), 알루미나(Alumina), 이산화티타늄(TiO2), 지르코니아(ZrO2), 황산바륨(Barium Sulfate), 산화아연(ZnO), 폴리메타크릴산메틸(Poly(methylmethacrylate), PMMA) 및 벤조구아나민(Benzoguanamine)계 폴리머 등으로 이루어진 군으로부터 선택되는 1종 이상의 것일 수 있다. 또한, 평균 입경이 10 내지 100 나노미터인 것이 바람직하게 사용될 수 있다. The scattering particles (E) are silica (Silica), alumina (Alumina), silicon (Silicon), alumina (Alumina), titanium dioxide (TiO 2 ), zirconia (ZrO 2 ), barium sulfate (Barium Sulfate), zinc oxide ( ZnO), poly(methylmethacrylate), PMMA), and may be one or more selected from the group consisting of benzoguanamine-based polymers. In addition, those having an average particle diameter of 10 to 100 nanometers may be preferably used.
상기 양자점 필름은 440㎚∼460㎚ 범위의 주파장을 갖는 광을 방출하는 청색 LED의 방출광의 경로 상에 배치될 수 있으며, 상기 양자점 필름 내의 양자점 입자는 상기 방출광의 적어도 일부 파장을 녹생광으로 변환하는 제1 양자점 입자와 상기 방출광의 적어도 일부 파장을 적색광으로 변환하는 제2 양자점 입자를 동시에 포함하는 것일 수 있으나, 이에 한정되는 것은 아니다. The quantum dot film may be disposed on a path of emission light of a blue LED emitting light having a dominant wavelength in the range of 440 nm to 460 nm, and the quantum dot particles in the quantum dot film convert at least some wavelengths of the emission light into green light. The first quantum dot particles and the second quantum dot particles that convert at least some wavelengths of the emitted light into red light may be included, but are not limited thereto.
또한, 본 발명은In addition, the present invention
상기 본 발명의 양자점 필름을 포함하는 백라이트 유닛 및 상기 백라이트 유닛을 포함하는 액정표시장치에 관한 것이다.It relates to a backlight unit including the quantum dot film of the present invention and a liquid crystal display device including the backlight unit.
상기 양자점 필름, 백라이트 유닛 및 액정표시장치에 있어서, 양자점을 포함하는 본 발명의 광학 재료용 조성물로 형성된 양자점층 및 이를 포함하는 양자점 필름을 포함하는 구성을 제외한 다른 구성에 대해서는 이 분야에 공지된 기술이 제한 없이 사용될 수 있다. In the quantum dot film, the backlight unit, and the liquid crystal display, for other configurations other than the configuration including the quantum dot layer formed of the composition for an optical material of the present invention including quantum dots and a quantum dot film including the same, techniques known in the art It can be used without this limitation.
이하 본 발명의 이해를 돕기 위하여 바람직한 실시예를 제시하나, 하기 실시예는 본 발명을 예시하는 것일 뿐, 본 발명의 범주 및 기술사상 범위 내에서 다양한 변경 및 수정이 가능함은 당업자에게 있어서 명백한 것이며, 이러한 변경 및 수정이 첨부된 특허청구범위에 속하는 것도 당연한 것이다.Hereinafter, preferred embodiments are presented to aid in the understanding of the present invention, but the following examples are only illustrative of the present invention, and it is obvious to those skilled in the art that various changes and modifications are possible within the scope and spirit of the present invention, It is natural that such changes and modifications fall within the scope of the appended claims.
시험예 1:Test Example 1:
하기 화학식 1 및 화학식 2 화합물 및 이들을 포함하는The following
(1) 고속 액체 크로마토 그래피 측정(1) High performance liquid chromatography measurement
시마츠 사 LC-20AT를 사용하였으며, 컬럼은 Acclaim 120 C18(충진된 실리카 입자의 크기 5㎛, 공극 120ÅA, 컬럼 사이즈 4.6×250mm) 2개를 연결하여 사용하였다. 이동상은 아세토니트릴과 0.01M 포타슘 포스페이트 수용액을 4/6비율로 시작하여 최종적으로는 아세토리트릴 단독으로 종료하여 농도 구배를 통하여 분리능을 개선하였다. 측정 파장은 230 nm, 유속은 1.0 ml/min, 주입량은 20㎕, 시료는 시료 0.16 g에 대하여 아세토니트릴 10 g을 혼합하여 전처리하였다. Shimadzu LC-20AT was used, and two columns were connected to Acclaim 120 C18 (filled silica particle size 5㎛, pore 120ÅA, column size 4.6×250mm). The mobile phase started with acetonitrile and 0.01M potassium phosphate aqueous solution at a ratio of 4/6 and finally terminated with acetotrile alone to improve the resolution through a concentration gradient. The measurement wavelength was 230 nm, the flow rate was 1.0 ml/min, the injection amount was 20 μl, and the sample was pretreated by mixing 10 g of acetonitrile with 0.16 g of the sample.
(2) SH 값 측정(2) SH value measurement
비커에 제조된 에스터 폴리티올 혼합물 약 0.1 g을 넣은 후, 클로로포름 50 mL를 추가하여 10 분간 교반한 다음, 이소프로필 알콜 10 mL를 추가하여 10분간 다시 교반 하였다. 상기 용액을 0.05 N 요오드 표준용액(Wako사)을 이용하여 적정하고, 하기 수학식 2에 적용하여 SH 값(g/eq.) α를 계산하였다.After putting about 0.1 g of the prepared ester polythiol mixture in a beaker, 50 mL of chloroform was added and stirred for 10 minutes, and then 10 mL of isopropyl alcohol was added, followed by stirring for 10 minutes. The solution was titrated using a 0.05 N iodine standard solution (Wako), and the SH value (g/eq.) α was calculated by applying to Equation 2 below.
[수학식 2][Equation 2]
α = (시료무게(g))/(0.05 × 소비된 요오드양(L) × 요오드 용액의 팩터)α = (sample weight (g))/(0.05 × amount of iodine consumed (L) × factor of iodine solution)
(3) 이론 SH 값 계산(3) Calculation of theoretical SH value
이론 SH 값(g/eq.)은 하기 수학식 3의 β 값으로 나타낼 수 있다. The theoretical SH value (g/eq.) can be represented by the β value of Equation 3 below.
[수학식 3][Equation 3]
β = (에스터 티올의 이론 분자량)/(에스터 티올의 이론 관능기수)β = (theoretical molecular weight of ester thiol)/(theoretical functional group number of ester thiol)
상기에서 에스터 티올의 이론 분자량과 이론 관능기수는 화학식 1의 화합물 중 미반응 수산기를 포함하지 않는 화합물의 구조로 결정한다. In the above, the theoretical molecular weight and the number of theoretical functional groups of the ester thiol are determined by the structure of the compound of
(4) P 값 계산(4) P value calculation
상기 수학식 2와 수학식 3에서 계산된 값을 이용하여 하기 수학식 4에 의해 P 값을 계산할 수 있다. Using the values calculated in Equations 2 and 3, the P value may be calculated by Equation 4 below.
[수학식 4][Equation 4]
P = α/β P = α/β
P 값은 1보다 작을 수 없고, P값이 1에 가까울수록 순도는 높다.The P value cannot be less than 1, and the closer the P value is to 1, the higher the purity.
(5) b* 측정 (5) b* measurement
내부의 두께가 10 m 인 석영 셀 중에 혼합물을 주입하고, 색차계(CM-3700A, 미놀타사)를 이용하여 b*를 구하였다. b* 값이 작을수록 액상의 색상이 무색 투명한 것으로 판단할 수 있다.The mixture was injected into a quartz cell having an inner thickness of 10 m, and b* was calculated using a color difference meter (CM-3700A, Minolta). As the b* value is smaller, it can be determined that the color of the liquid is colorless and transparent.
합성예 1: 화학식 1 및 화학식 2 화합물 포함Synthesis Example 1: Including the compounds of
온도계, 기계식 교반기, 딘스탁, 질소 투입 관이 구비된 4구 2L 이중자켓 반응기에 수산기에 대한 카르복실기의 당량비가 1.10이 되도록 펜타에리트리톨 113.7g(0.84몰)과 3-머캅토프로피온산 392.3g(3.70몰), 파라톨루엔 설포닉산 1.6g, 톨루엔 669.6g을 투입하였다. 이때 이중자켓 반응기에 연결된 열매의 온도를 140℃로 유지하고 질소를 투입하면서 톨루엔을 공비증류하여 부산물로 생성되는 물을 외부로 제거하였다. 이때, 반응기 내부 온도는 110±5℃로 유지되었다. 물의 탈수량이 61.7g(이론치 60.1g 대비 102.6% 수득)에서 2시간 반응을 추가로 진행하였지만 더 이상의 물은 외부로 나오지 않았다. 이때 반응을 종료하고 분액 깔대기에 반응물과 10% 탄산 나트륨 수용액 410 g를 넣어 촉매 및 미반응한 3-머캅토프로피온산을 제거하고 증류수 410 g로 추가로 3회 세정하였다.In a 4-neck 2L double jacket reactor equipped with a thermometer, mechanical stirrer, Deanstock, and nitrogen inlet tube, 113.7 g (0.84 mol) of pentaerythritol and 392.3 g (3.70 of 3-mercaptopropionic acid) and 3-mercaptopropionic acid so that the equivalent ratio of carboxyl groups to hydroxyl groups is 1.10. Mol), 1.6 g of paratoluene sulfonic acid, and 669.6 g of toluene were added. At this time, the temperature of the heat medium connected to the double jacket reactor was maintained at 140°C, and toluene was azeotropically distilled while nitrogen was introduced to remove water generated as a by-product to the outside. At this time, the temperature inside the reactor was maintained at 110±5°C. The reaction was further carried out for 2 hours at the dehydration amount of water 61.7g (102.6% obtained compared to the theoretical value of 60.1g), but no more water came out. At this time, the reaction was terminated, and the reactant and 410 g of 10% sodium carbonate aqueous solution were added to a separatory funnel to remove the catalyst and unreacted 3-mercaptopropionic acid, and washed three times with 410 g of distilled water.
이후 가열 감압 공정을 통해 톨루엔과 미량의 물을 완전히 제거한 후, 1 ㎛의 테프론 필터로 여과하여 에스터 폴리티올 혼합물 381g(수득율 95.2%)을 제조하였다. Thereafter, toluene and a trace amount of water were completely removed through a heating and decompression process, and then filtered through a 1 μm Teflon filter to prepare 381 g of an ester polythiol mixture (yield 95.2%).
13C-NMR -CH2-SH 19.6ppm, -CH2- 33.8ppm, -C- 37.9ppm, -CH2-O- 62.4ppm 13 C-NMR -CH 2 -SH 19.6ppm , -CH 2 - 33.8ppm, -C- 37.9ppm, -CH 2 -O- 62.4ppm
-CH2-OH 64.9ppm, -O-(C=O)- 171.1ppm, -S-(C=O)- 199.3ppm-CH 2 -OH 64.9ppm, -O-(C=O)- 171.1ppm, -S-(C=O)- 199.3ppm
FT-IR 에테르 신축 1100cm-1, 에스터 신축 1760cm-1, 티올 신축 2451cm-1 FT-IR ether stretch 1100cm -1 , ester stretch 1760cm -1 , thiol stretch 2451cm -1
b* 0.62b* 0.62
SH 값 α= 126.43g/eq.(측정값), β=488.64/4=122.16 g/eq.(이론값)SH value α= 126.43g/eq.(measured value), β=488.64/4=122.16 g/eq.(theoretical value)
HPLC(고속 액체 크로마토 그래피) 측정값(표 1)HPLC (high-speed liquid chromatography) measurements (Table 1)
합성예 2: 화학식 1 및 화학식 2 화합물 포함Synthesis Example 2: Including the compounds of
수산기에 대한 카르복실기의 당량비가 1.03이 되도록 펜타에리트리톨 128.5g(0.94몰)과 티오글리콜산 356.3g(3.86몰), 파라톨루엔 설포닉산 1.8g을 사용한 것을 제외하고 합성예 1과 동일하게 반응을 진행하였다. 물의 탈수량 66.3g(이론 탈수량 67.9g 대비 97.6% 수득)에서 반응을 2시간 추가로 진행하였지만 더 이상 물이 탈수되지 않았으며, 이때 반응을 종료하였다. 정제공정을 및 용제 제거공정을 통해 수득된 에스터 폴리티올 혼합물 387g(수득율 96.8%)였다. The reaction was carried out in the same manner as in Synthesis Example 1 except that 128.5 g (0.94 mol) of pentaerythritol, 356.3 g (3.86 mol) of thioglycolic acid, and 1.8 g of paratoluene sulfonic acid were used so that the equivalent ratio of the carboxyl group to the hydroxyl group was 1.03. I did. The reaction proceeded for an additional 2 hours at 66.3 g of dehydration amount of water (97.6% of the theoretical dehydration amount of 67.9 g was obtained), but no more water was dehydrated, and the reaction was terminated at this time. It was 387 g (yield 96.8%) of an ester polythiol mixture obtained through a purification process and a solvent removal process.
13C-NMR -CH2-SH 26.5ppm, -C- 37.9ppm, -CH2-O- 61.7ppm 13 C-NMR -CH 2 -SH 26.5ppm, -C- 37.9ppm, -CH 2 -O- 61.7ppm
-CH2-OH 64.9ppm, -O-(C=O)- 170.7ppm, -S-(C=O)- 196.5ppm-CH 2 -OH 64.9ppm, -O-(C=O)- 170.7ppm, -S-(C=O)- 196.5ppm
FT-IR 에테르 신축 1100cm-1, 에스터 신축 1760cm-1, 티올 신축 2451cm-1 FT-IR ether stretch 1100cm -1 , ester stretch 1760cm -1 , thiol stretch 2451cm -1
b* 0.53b* 0.53
SH 값 α= 113.87g/eq.(측정값) β=432.54/4=108.14 g/eq.(이론값)SH value α = 113.87g/eq.(measured value) β=432.54/4=108.14 g/eq.(theoretical value)
HPLC(고속 액체 크로마토 그래피) 측정값(표 2)HPLC (high-speed liquid chromatography) measurements (Table 2)
합성예 3: 화학식 1 및 화학식 2 화합물 포함Synthesis Example 3: Including compounds of
수산기에 대한 카르복실기의 당량비가 1.03이 되도록 3-머캅토프로피온산 365.5g(3.44몰)을 사용한 것을 제외하고 합성예 1과 동일하게 반응을 진행하였고, 물의 탈수량이 65.9 g(이론치 60.1 g 대비 109.7% 수득)에서 10시간 동안 반응을 유지하였으며, 이때 총 물의 탈수량은 66.2g(이론치 60.1g 대비 110.2%) 이였으며, 더 이상 물이 탈수되지 않아, 반응을 종료하였다. 정제공정을 및 용제 제거공정을 통해 수득된 에스터 폴리티올 혼합물 343g(수득율 85.3%)을 제조하였다. The reaction was carried out in the same manner as in Synthesis Example 1 except that 365.5 g (3.44 mol) of 3-mercaptopropionic acid was used so that the equivalent ratio of the carboxyl group to the hydroxyl group was 1.03, and the dehydration amount of water was 65.9 g (109.7% compared to the theoretical value 60.1 g). Obtained) was maintained for 10 hours, at this time, the total amount of dehydration of water was 66.2 g (110.2% compared to the theoretical value of 60.1 g), the water was no longer dehydrated, the reaction was terminated. 343 g of an ester polythiol mixture (yield 85.3%) obtained through the purification process and the solvent removal process was prepared.
13C-NMR -CH2-SH 19.6ppm, -CH2- 33.8ppm, -C- 37.9ppm, -CH2-O- 62.4ppm 13C -NMR -CH 2 -SH 19.6ppm, -CH 2 - 33.8ppm, -C- 37.9ppm, -CH 2 -O- 62.4ppm
-CH2-OH 64.9ppm, -O-(C=O)- 171.1ppm, -S-(C=O)- 199.3ppm-CH 2 -OH 64.9ppm, -O-(C=O)- 171.1ppm, -S-(C=O)- 199.3ppm
FT-IR 에테르 신축 1100cm-1, 에스터 신축 1760cm-1, 티올 신축 2451cm-1 FT-IR ether stretch 1100cm -1 , ester stretch 1760cm -1 , thiol stretch 2451cm -1
b* 3.24b* 3.24
SH 값 α= 132.17g/eq.(측정값) β=488.64/4=122.16 g/eq.(이론값)SH value α = 132.17g/eq.(measured value) β=488.64/4=122.16 g/eq.(theoretical value)
HPLC(고속 액체 크로마토 그래피) 측정값(표 3)HPLC (high-speed liquid chromatography) measurements (Table 3)
합성예 4: 화학식 1 및 화학식 2 화합물 포함Synthesis Example 4: Including compounds of
수산기에 대한 카르복실기의 당량비가 1.15이 되도록 티오글리콜산 397.9 g(4.32 몰)을 사용한 것을 제외하고 합성예 2와 동일하게 반응을 진행하였고, 물의 탈수량이 63.3g(이론치 67.9g 대비 93.2% 수득)에서 반응을 종료하고, 정제공정을 및 용제 제거공정을 통해 수득된 에스터 폴리티올 혼합물 331g(수득율 82.8%)을 제조하였다. The reaction was carried out in the same manner as in Synthesis Example 2, except that 397.9 g (4.32 mol) of thioglycolic acid was used so that the equivalent ratio of the carboxyl group to the hydroxyl group was 1.15, and the amount of water dehydration was 63.3 g (93.2% compared to the theoretical value 67.9 g). At the end of the reaction, 331 g (yield 82.8%) of an ester polythiol mixture obtained through a purification process and a solvent removal process was prepared.
C-NMR -CH2-SH 26.5ppm, -C- 37.9ppm, -CH2-O- 61.7ppmC-NMR -CH 2 -SH 26.5ppm, -C- 37.9ppm, -CH 2 -O- 61.7ppm
-CH2-OH 64.9ppm, -O-(C=O)- 170.7ppm, -S-(C=O)- 196.5ppm-CH 2 -OH 64.9ppm, -O-(C=O)- 170.7ppm, -S-(C=O)- 196.5ppm
FT-IR 에테르 신축 1100cm-1, 에스터 신축 1760cm-1, 티올 신축 2451cm-1 FT-IR ether stretch 1100cm -1 , ester stretch 1760cm -1 , thiol stretch 2451cm -1
b* 0.49b* 0.49
SH 값 α= 109.21g/eq.(측정값) β= 432.54/4 = 108.14 g/eq.(이론값)SH value α= 109.21 g/eq. (measured value) β= 432.54/4 = 108.14 g/eq. (theoretical value)
HPLC(고속 액체 크로마토 그래피) 측정값(표 4)HPLC (high-speed liquid chromatography) measurements (Table 4)
제조예 1: 양자점 입자 합성Preparation Example 1: Synthesis of quantum dot particles
인듐 아세테이트(indium acetate) 0.2 mmol, 팔미트산(palmitic acid) 0.6 mmol, 1-옥타데센(octadecene) 10 mL를 반응기에 넣고 진공 하에 120℃로 가열하였다. 수 시간 후 반응기 내 분위기를 질소로 전환하였다. 280℃로 가열한 후 트리스(트리메틸실릴)포스핀(tris(trimethylsilyl)phosphine) 0.1 mmol 및 트리옥틸포스핀 0.5 mL의 혼합 용액을 신속히 주입하고 20분간 반응시켰다. 상온으로 신속하게 식힌 반응 용액에 아세톤을 넣고 원심 분리하여 얻은 침전을 톨루엔에 분산시켰다. 얻어진 InP 반도체 나노 결정은, 반응시간에 따라 입자크기가 결정되고 입자크기에 따라 UV 최대 파장 420 내지 600 nm를 나타냈다. 아연 아세테이트(zinc acetate) 0.3 mmoL(0.056g), 올레산(oleic acid) 0.6 mmol(0.189g), 및 트리옥틸아민(trioctylamine) 10 mL를 반응 플라스크에 넣고 120℃에서 10분간 진공 처리했다. N2로 반응 플라스크 안을 치환한 후 220℃로 승온시켰다. 위에서 제조한 InP 반도체 나노 결정의 톨루엔 분산액(OD: 0.15) 및 TOPS 0.6 mmol(트리옥틸포스핀 내에 분산/용해된 황)을 상기 반응 플라스크에 넣고 280℃로 승온하여 30분 반응시켰다. 반응 종료 후, 반응용액을 상온으로 신속히 냉각하여 InP/ZnS 양자점을 포함한 반응물을 얻었다. 상기 InP/ZnS 양자점을 포함한 반응물에 과량의 에탄올을 넣고 원심 분리하여 상기 양자점에 존재하는 여분의 유기물을 제거하였다. 원심분리 후 상층액을 버리고, 원심 분리된 침전물을 건조하고 나서 톨루엔에 분산시켜 UV-vis 흡광 스펙트럼을 측정여 적색 발광 또는 녹색 발광을 확인하였다. 상기 방법으로 각각의 적색발광 또는 녹색발광 되는 양자점 입자 분산액을 제조하였다.0.2 mmol of indium acetate, 0.6 mmol of palmitic acid, and 10 mL of 1-octadecene were placed in a reactor and heated to 120° C. under vacuum. After several hours the atmosphere in the reactor was converted to nitrogen. After heating to 280°C, a mixed solution of 0.1 mmol of tris(trimethylsilyl)phosphine and 0.5 mL of trioctylphosphine was rapidly injected and reacted for 20 minutes. Acetone was added to the reaction solution quickly cooled to room temperature, and the precipitate obtained by centrifugation was dispersed in toluene. In the obtained InP semiconductor nanocrystal, the particle size was determined according to the reaction time, and the maximum UV wavelength was 420 to 600 nm according to the particle size. Zinc acetate (zinc acetate) 0.3 mmoL (0.056g), oleic acid (oleic acid) 0.6 mmol (0.189g), and trioctylamine (trioctylamine) 10 mL was added to the reaction flask was vacuum-treated at 120 ℃ 10 minutes. After replacing the inside of the reaction flask with N 2 , the temperature was raised to 220°C. Toluene dispersion (OD: 0.15) and TOPS 0.6 mmol (sulfur dispersed/dissolved in trioctylphosphine) prepared above of the InP semiconductor nanocrystals prepared above were added to the reaction flask and heated to 280° C. and reacted for 30 minutes. After completion of the reaction, the reaction solution was rapidly cooled to room temperature to obtain a reaction product including InP/ZnS quantum dots. Excess ethanol was added to the reactant including the InP/ZnS quantum dots and centrifuged to remove excess organic matter present in the quantum dots. After centrifugation, the supernatant was discarded, and the centrifuged precipitate was dried and then dispersed in toluene to measure the UV-vis absorption spectrum to confirm red or green emission. In the above method, a dispersion of quantum dot particles emitting red light or green light was prepared.
실시예 1: 광학 재료용 조성물의 제조Example 1: Preparation of a composition for an optical material
상기 합성예 1의 에스터 폴리티올 혼합물 40중량부, 트리메틸올프로판 트리아크릴레이트(미원스페샬리티 케미칼사 M300) 60중량부, 상기 제조예 1의 양자점 입자 중 적색발광 입자 0.3 중량부, 청색 발광 입자 0.7중량부, 산란제로 아연옥사이드(사카이케미칼사 FINEX 30, 평균입경 35nm) 5중량부, 광개시제로 2,4,6-트리벤조일디페닐포스핀옥사이드(아이지엠사 Darocure TPO) 3 중량부를 동일하게 고속 교반기를 통하여 500rpm의 속도로 균일하게 혼합하였다. 40 parts by weight of the ester polythiol mixture of Synthesis Example 1, 60 parts by weight of trimethylolpropane triacrylate (M300 from Miwon Specialty Chemical), 0.3 parts by weight of red light-emitting particles among the quantum dot particles of Preparation Example 1, and 0.7 blue light-emitting particles 5 parts by weight of zinc oxide as a scattering agent (
실시예 2: 광학 재료용 조성물의 제조Example 2: Preparation of composition for optical material
상기 합성예 2의 에스터 폴리티올 혼합물 40중량부를 투입한 것을 제외하고 실시예 1과 동일 하게 조성물을 제조하였다. A composition was prepared in the same manner as in Example 1, except that 40 parts by weight of the ester polythiol mixture of Synthesis Example 2 was added.
실시예 3: 광학 재료용 조성물의 제조Example 3: Preparation of composition for optical material
상기 합성예 1의 에스터 폴리티올 혼합물 20중량부, 트리메틸올프로판 트리아크릴레이트(미원스페샬리티 케미칼사 M300) 80중량부를 투입한 것을 제외하고 실시예 1과 동일하게 조성물을 제조하였다. A composition was prepared in the same manner as in Example 1, except that 20 parts by weight of the ester polythiol mixture of Synthesis Example 1 and 80 parts by weight of trimethylolpropane triacrylate (Miwon Specialty Chemical Co., Ltd. M300) were added.
실시예 4: 광학 재료용 조성물의 제조 Example 4: Preparation of composition for optical material
상기 합성예 2의 에스터 폴리티올 혼합물 20중량부, 트리메틸올프로판 트리아크릴레이트(미원스페샬리티 케미칼사 M300) 80중량부를 투입한 것을 제외하고는 상기 실시예 1과 동일하게 조성물을 제조하였다. A composition was prepared in the same manner as in Example 1, except that 20 parts by weight of the ester polythiol mixture of Synthesis Example 2 and 80 parts by weight of trimethylolpropane triacrylate (Miwon Specialty Chemical M300) were added.
비교예 1: 광학 재료용 조성물의 제조Comparative Example 1: Preparation of composition for optical material
상기 합성예 3의 에스터 폴리티올 혼합물 40 중량부를 투입한 것을 제외하고는 상기 실시예 1과 동일하게 조성물을 제조하였다.A composition was prepared in the same manner as in Example 1, except that 40 parts by weight of the ester polythiol mixture of Synthesis Example 3 was added.
비교예 2: 광학 재료용 조성물의 제조Comparative Example 2: Preparation of composition for optical material
상기 합성예 4의 에스터 폴리티올 혼합물 40중량부를 투입한 것을 제외하고는 상기 실시예 1과 동일하게 조성물을 제조하였다. A composition was prepared in the same manner as in Example 1, except that 40 parts by weight of the ester polythiol mixture of Synthesis Example 4 was added.
실시예 5~8 및 비교예 3~4: 양자점 필름의 제조Examples 5 to 8 and Comparative Examples 3 to 4: Preparation of quantum dot film
제1필름과 제2필름은 50μm 두께를 갖는 폴리에틸렌텔레프탈레이트 필름(도요보사 A4300)을 사용하였다. 상기 실시예 1 내지 4 및 비교예 1 내지 2로 제조된 바인더 수지 조성물을 0.2 μm 테프론 재질의 필터로 여과한 후, 30 분간 감압하여 바인더 수지 조성물 내의 기포를 완전히 제거하였다. 상기 바인더 수지 조성물을 제1필름에 마이크로 바를 이용하여 코팅을 진행하고, 그 위에 제2필름을 기포가 발생하지 않도록 고무롤을 이용하여 라미네이트하여 자외선 경화를 진행하였다. 이때 자외선 경화장치는 메탈할라이드 램프가 장착된 리트젠사의 UV경화기(UVMH1001)를 이용하였으며, EIT사의 UV Puck II를 이용하여 측정한 UVA영역의 광량은 1500 mJ 이였다. 경화된 바인더 수지 조성물의 두께는 50±2μm를 유지하였다. For the first film and the second film, a polyethylene terephthalate film (Toyobo A4300) having a thickness of 50 μm was used. The binder resin compositions prepared in Examples 1 to 4 and Comparative Examples 1 to 2 were filtered through a filter made of 0.2 μm Teflon, and then reduced pressure for 30 minutes to completely remove air bubbles in the binder resin composition. The binder resin composition was coated on the first film by using a micro bar, and the second film was laminated on the second film using a rubber roll so as not to generate bubbles, thereby performing ultraviolet curing. At this time, the UV curing device used a Litgen UV curing machine (UVMH1001) equipped with a metal halide lamp, and the amount of light in the UVA region measured using the EIT's UV Puck II was 1500 mJ. The thickness of the cured binder resin composition was maintained at 50±2 μm.
시험예 2: 양자점 필름의 물성 평가Test Example 2: Evaluation of physical properties of quantum dot film
상기에서 제조된 양자점 필름의 물성을 평가하고, 그 결과를 하기 표 3 및 표 4에 나타내었다.The physical properties of the quantum dot film prepared above were evaluated, and the results are shown in Tables 3 and 4 below.
1) O1) O 22 투과율(cc/m/일/atm) Transmittance (cc/m/day/atm)
Mocon OX-TRAN 모델 2/21 장치(Mocon, Inc., Minneapolis, MN)를 사용하여 측정하였다. 23 ℃에서 3% O2 및 97% N2의 시험 가스를 사용하여 ASTM 방법 D3985(1981년 1월 30일 전기량 센서(Coulometric Sensor)를 사용한 플라스틱 필름 및 시팅(Sheeting)을 통한 산소 가스 투과율의 표준 시험 방법)에 개시된 방식으로 측정하였다.Measurements were made using a Mocon OX-TRAN Model 2/21 apparatus (Mocon, Inc., Minneapolis, MN). ASTM Method D3985 (January 30, 1981 Standard of oxygen gas permeability through plastic film and sheeting using a Coulometric Sensor) using test gases of 3% O 2 and 97% N 2 at 23 °C Test method).
2) 투습도 측정2) Measurement of moisture permeability
투습도 측정기(MOCON, AQUATRAN MODEL 2)를 이용하여 양자점 필름의 투습도를 측정하였다.The moisture permeability of the quantum dot film was measured using a moisture permeability meter (MOCON, AQUATRAN MODEL 2).
3) 휘도 측정3) luminance measurement
양자점 필름을 A4크기에 맞게 자른 후 삼성 SUHD TV JS6500 모델의 백라이After cutting the quantum dot film to fit A4 size, the backlight of the Samsung SUHD TV JS6500 model
트의 중앙부에 장착하여 전원을 인가한 후 휘도계(CS-2000, 미놀타사)를 이용하여 13개의 지점의 휘도(Y)를 측정하여 평균값을 구하였다. 초기 휘도 대비, 250시간 동안 내열(80℃) 및 고온고습(90℃, 60%) 방치 후 휘도(Y) 및 이를 바탕으로 초기 휘도 대비 변화율(Y(%))을 측정하였다. After the power was applied by installing it in the center of the panel, the luminance (Y) of 13 points was measured using a luminance meter (CS-2000, Minolta) to obtain an average value. Compared to the initial luminance, the luminance (Y) and the rate of change (Y (%)) compared to the initial luminance were measured after leaving heat resistance (80°C) and high temperature and high humidity (90°C, 60%) for 250 hours.
4) 에지(Edge) 탈색4) Edge discoloration
양자점 필름을 A4크기에 맞게 자른 후 85℃?, 습도 85% 조건에서 필름을 48시간 방치후, 삼성 SUHD TV JS6500 모델의 백라이의 중앙부에 장착하여 전원을 인가한 후 각 모서리에 색 빠짐 현상 유무를 육안으로 확인하여 색 빠짐이 없으면 ◎, 미세한 색 빠짐이 있으면 ○, 사면 중 2면 이상 확실한 색 빠짐이 있으면 △, 사면 중 3면 이상 확실한 색 빠짐이 있으면 X로 표시하였다.After cutting the quantum dot film to fit A4 size, leave the film at 85℃ and 85% humidity for 48 hours, attach it to the center of the backlight of the Samsung SUHD TV JS6500 model, apply power, and see if there is any color loss in each corner Visually, if there is no color loss, ◎, if there is a slight color loss, ○, if there is obvious color loss on two or more of the slopes, △, and if there is obvious color loss on three or more of the slopes, it is marked with X.
(cc/m/일/atm)Oxygen permeability
(cc/m/day/atm)
±0.0020.021
±0.002
±0.0020.020
±0.002
±0.0020.024
±0.002
±0.0020.024
±0.002
±0.0030.031
±0.003
±0.0030.029
±0.003
(Y(%))High temperature luminance
(Y(%))
(98.9)581.1
(98.9)
(99.6)583.6
(99.6)
(96.8)561.3
(96.8)
(96.9)563.1
(96.9)
(89.6)521.7
(89.6)
(86.8)508.7
(86.8)
(Y(%))High temperature and high humidity
(Y(%))
(89.1)523.4
(89.1)
(89.2)552.6
(89.2)
(88.2)511.3
(88.2)
(87.7)509.6
(87.7)
(79.5)462.8
(79.5)
(73.6)431.6
(73.6)
상기 표 5로부터 확인되는 바와 같이, 본 발명의 광학 재료용 조성물을 사용하여 제조된 양자점 필름(실시예 5~8)은 비교예의 광학 재료용 조성물을 사용하여 제조된 양자점 필름(비교예 3~4)과 비교하여 산소투과도 및 투습도에 대한 물성이 우수하고, 고온 및 고온&고습 환경에서의 휘도도 현저하게 우수하였으며, 에지 탈색 특성에 있어서도 매우 우수한 것으로 확인되었다. As can be seen from Table 5, the quantum dot film (Examples 5 to 8) prepared using the composition for an optical material of the present invention is a quantum dot film prepared using the composition for an optical material of Comparative Example (Comparative Examples 3 to 4 ), the physical properties for oxygen permeability and moisture permeability were excellent, the luminance in high temperature and high temperature & high humidity environments was remarkably excellent, and it was confirmed to be very excellent in edge bleaching characteristics.
Claims (13)
하기 화학식 2로 표시되는 티오에스터 작용기를 포함하는 에스터 폴리티올 화합물을 포함하는 광학 재료용 조성물로서,
상기 광학 재료용 조성물은 습식 적정으로 측정된 SH 값(g/eq.) α와 이론적으로 계산된 SH 값(g/eq.) β를 이용하여 계산한 하기 수학식 2의 P 값이 1.03 내지 1.07 인 것을 특징으로 하는 광학 재료용 조성물:
[수학식 2]
[화학식 1]
[화학식 2]
상기 화학식 1 및 화학식 2에서
A는 각각 독립적으로 불포화기를 포함하거나 포함하지 않는 선형(linear), 가지(branched) 또는 시클릭(cyclic)의, 헤테로기를 포함하거나 포함하지 않는 C1~C12의 지방족 탄화수소기이며,
R1, R2, R3 및 R4는 각각 독립적으로 수소 또는 C1 내지 C5의 알킬기이며,
k 및 l은 각각 독립적으로 0 내지 3의 정수이며,
o는 2 내지 6의 자연수이며, p는 0 내지 5의 자연수이며, q는 1 내지 6의 자연수이며, p+q = 2 내지 6의 자연수이며,
m 및 n은 각각 독립적으로 1 내지 5의 자연수이며,
상기 m 및 n개로 표시된 알킬렌기는 C1 내지 C5로 치환 또는 비치환된 것일 수 있다. An ester polythiol compound represented by the following formula (1), and
As a composition for an optical material comprising an ester polythiol compound containing a thioester functional group represented by the following formula (2),
The composition for an optical material has a P value of 1.03 to 1.07 calculated by using the SH value (g/eq.) α measured by wet titration and the theoretically calculated SH value (g/eq.) β. Composition for an optical material, characterized in that:
[Equation 2]
[Formula 1]
[Formula 2]
In Formula 1 and Formula 2,
A is a C1 ~ C12 aliphatic hydrocarbon group, each independently containing or not containing an unsaturated group, of a linear, branched or cyclic, hetero group,
R 1 , R 2 , R 3 and R 4 are each independently hydrogen or a C1 to C5 alkyl group,
k and l are each independently an integer of 0 to 3,
o is a natural number from 2 to 6, p is a natural number from 0 to 5, q is a natural number from 1 to 6, p+q = a natural number from 2 to 6,
m and n are each independently a natural number of 1 to 5,
The alkylene groups represented by m and n may be substituted or unsubstituted with C1 to C5.
상기 광학 재료용 조성물을 고속액체크로마토그래피(HPLC)로 분석하는 경우, 고속액체크로마토그래피(HPLC)스펙트럼에서 상기 화학식 1의 에스터 폴리티올 화합물의 피크 면적과 상기 화학식 2의 티오에스터기를 포함하는 에스터 폴리티올 화합물의 피크 면적은 하기의 수학식 1에 의해 계산된 X 값이 1.80 내지 2.30을 만족시키는 것을 특징으로 하는 광학 재료용 조성물:
[수학식 1]
X = 화학식 1의 에스터 폴리티올 화합물의 피크 면적의 합 / 화학식 2의 티오에스터기를 포함하는 에스터 폴리티올 화합물의 피크 면적의 합The method of claim 1,
When the composition for an optical material is analyzed by high-speed liquid chromatography (HPLC), the peak area of the ester polythiol compound of Formula 1 and the thioester group of Formula 2 in the high-speed liquid chromatography (HPLC) spectrum The peak area of the thiol compound is a composition for an optical material, characterized in that the X value calculated by the following equation (1) satisfies 1.80 to 2.30:
[Equation 1]
X = Sum of the peak areas of the ester polythiol compound of Formula 1 / Sum of the peak areas of the ester polythiol compound containing the thioester group of Formula 2
상기 광학 재료용 조성물은 L*a*b* 표색계로 나타내었을 때, b*가 2.0 이하인 것을 특징으로 하는 광학 재료용 조성물. The method of claim 1,
The composition for an optical material, wherein the composition for an optical material has a b* of 2.0 or less when expressed by an L*a*b* color system.
상기 화학식 1의 화합물은 하기 화학식 5의 화합물 및 하기 화학식 6의 화합물을 포함하며, 상기 화학식 2의 화합물은 하기 화학식 7의 화합물 및 화학식 8의 화합물을 포함하는 것을 특징으로 하는 광학 재료용 조성물:
[화학식 5]
[화학식 6]
[화학식 7]
[화학식 8]
상기 식에서 R1, R2, R3 및 R4는 각각 독립적으로 수소 또는 C1 내지 C5의 알킬기이며;
m 및 n은 각각 독립적으로 1 내지 3의 자연수이다. The method of claim 1,
The compound of Formula 1 includes a compound of Formula 5 and a compound of Formula 6, wherein the compound of Formula 2 comprises a compound of Formula 7 and a compound of Formula 8 below:
[Formula 5]
[Formula 6]
[Formula 7]
[Formula 8]
In the above formula, R 1 , R 2 , R 3 and R 4 are each independently hydrogen or a C1 to C5 alkyl group;
m and n are each independently a natural number of 1 to 3.
상기 화학식 1의 에스터 폴리티올 화합물은 수산기를 1개 이상 포함하는 화합물과 수산기를 포함하지 않는 화합물을 포함하며,
상기 화학식 2의 티오에스터기를 포함하는 에스터 폴리티올 화합물은 수산기를 1개 이상 포함하는 화합물과 수산기를 포함하지 않는 화합물을 포함하는 것을 특징으로 하는 광학 재료용 조성물.The method of claim 1,
The ester polythiol compound of Formula 1 includes a compound containing at least one hydroxyl group and a compound not containing a hydroxyl group,
The ester polythiol compound containing a thioester group of Formula 2 is a composition for an optical material comprising a compound containing at least one hydroxyl group and a compound not containing a hydroxyl group.
상기 광학 재료용 조성물은 수산기를 포함하지 않는 화학식 1의 화합물을 40 내지 60 중량%를 포함하는 것을 특징으로 하는 광학 재료용 조성물.The method of claim 5,
The composition for an optical material comprises 40 to 60% by weight of the compound of Formula 1 that does not contain a hydroxyl group.
상기 화학식 1의 에스터 폴리티올 화합물 중 수산기를 포함하지 않는 화합물은 에틸렌글리콜디머캅토아세테이트, 트리메틸올프로판트리머캅토아세테이트, 펜타에리트리톨테트라머캅토아세테이트, 디펜타에리트리톨 헥사머캅토아세테이트, 에틸렌 글리콜 디(3-머캅토프로피오네이트), 트리메틸올프로판 트리(3-머캅토프로피오네이트), 펜타에리트리톨 테트라(3-머캅토프로피오네이트), 디펜타에리트리톨 헥사(3-머캅토프로피오네이트), 에톡시레이티드트리메틸올프로판 트리(3-머캅토프로피오네이트), 트리스[2-(3-머캅토프로피오닐옥시)에틸]이소시아누레이트, 폴리카프로락톤 테트라(3-머캅토프로피오네이트), 펜타에리트리톨 테트라(3-머캅토부틸레이트), 1,4-비스(3-머캅토부티릴옥시)부탄, 1,3,5-트리스(3-머캅토부틸옥시에틸)-1,3,5-트리아진-2,4,6(1H,3H,5H)-트리온, 및 트리메틸올프로판트리스(3-머캅토부틸레이트)로 이루어진 군으로부터 선택되는 1종 이상인 것을 특징으로 하는 광학 재료용 조성물.The method of claim 5,
Among the ester polythiol compounds of Formula 1, compounds that do not contain a hydroxyl group include ethylene glycol dimercaptoacetate, trimethylolpropane trimercaptoacetate, pentaerythritol tetramercaptoacetate, dipentaerythritol hexamercaptoacetate, and ethylene glycol di( 3-mercaptopropionate), trimethylolpropane tri(3-mercaptopropionate), pentaerythritol tetra (3-mercaptopropionate), dipentaerythritol hexa (3-mercaptopropionate) ), ethoxylated trimethylolpropane tri(3-mercaptopropionate), tris[2-(3-mercaptopropionyloxy)ethyl]isocyanurate, polycaprolactone tetra(3-mercaptopro) Cypionate), pentaerythritol tetra(3-mercaptobutylate), 1,4-bis(3-mercaptobutyryloxy)butane, 1,3,5-tris(3-mercaptobutyloxyethyl)- It is characterized in that at least one selected from the group consisting of 1,3,5-triazine-2,4,6(1H,3H,5H)-trione, and trimethylolpropanetris (3-mercaptobutylate) A composition for an optical material.
상기 광학 재료용 조성물은 상기 화학식 1의 에스터 폴리티올 화합물 및 상기 화학식 2의 티오에스터기를 포함하는 에스터 폴리티올 화합물에 포함된 티올 1당량을 기준으로,
에틸렌성 불포화 이중결합 0.8 내지 20.0 당량을 포함하는 불포화 이중결합을 갖는 활성 에너지선 경화성 화합물;
에폭시기 0.8 내지 20.0 당량을 포함하는 에폭시 화합물; 및
이소시아네이트기 0.8 내지 1.2 당량을 포함하는 이소시아네이트 화합물; 중에서 선택되는 1종 이상을 더 포함하는 것을 특징으로 하는 광학 재료용 조성물.The method of claim 1,
The composition for an optical material is based on 1 equivalent of thiol contained in the ester polythiol compound of Formula 1 and the ester polythiol compound including the thioester group of Formula 2,
An active energy ray-curable compound having an unsaturated double bond containing 0.8 to 20.0 equivalents of an ethylenically unsaturated double bond;
An epoxy compound containing 0.8 to 20.0 equivalents of an epoxy group; And
An isocyanate compound containing 0.8 to 1.2 equivalents of an isocyanate group; Composition for an optical material, characterized in that it further comprises at least one selected from among.
상기 광학 재료용 조성물은 양자점 필름 제조용으로 사용되는 것을 특징으로 하는 광학 재료용 조성물.The method according to any one of claims 1 to 8,
The composition for an optical material is a composition for an optical material, characterized in that used for producing a quantum dot film.
상기 광학 재료용 조성물을 고속액체크로마토그래피(HPLC)로 분석하는 경우, 상기 화학식 5 화합물 및 화학식 6 화합물의 피크 면적과 상기 화학식 7 화합물 및 화학식 8 화합물의 피크 면적은 하기의 수학식 5에 의해 계산된 X 값이 1.80 내지 2.30을 만족시키는 것을 특징으로 하는 광학 재료용 조성물:
[수학식 5]
X = 화학식 5의 화합물 및 화학식 6의 화합물의 피크 면적의 합 / 화학식 7의 화합물 및 화학식 8의 화합물의 피크 면적의 합The method of claim 4,
When the composition for an optical material is analyzed by high-speed liquid chromatography (HPLC), the peak areas of the compounds of Formula 5 and 6 and the peak areas of the compounds of Formula 7 and Formula 8 are calculated by Equation 5 below. The composition for an optical material, characterized in that the X value satisfies 1.80 to 2.30:
[Equation 5]
X = the sum of the peak areas of the compound of formula 5 and the compound of formula 6 / the sum of the peak areas of the compound of formula 7 and the compound of formula 8
상기 양자점층은 양자점을 포함하는 제1항 내지 제8항 중 어느 한 항의 광학 재료용 조성물에 의해 형성된 것을 특징으로 하는 양자점 필름.A first barrier layer; A second barrier layer; And a quantum dot layer positioned between the first barrier layer and the second barrier layer,
The quantum dot layer is a quantum dot film, characterized in that formed of the composition for an optical material of any one of claims 1 to 8 including quantum dots.
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