KR102119529B1 - Organic light emitting display device and manufacturing method thereof - Google Patents

Abstract

A substrate, a plurality of first electrodes formed on the substrate, a pixel defining layer (PDL) formed between the plurality of first electrodes to separate the plurality of first electrodes from each other, and the plurality of first A light emitting layer formed on the electrode, a second electrode formed on the light emitting layer and a filter portion formed on the second electrode, the filter unit, a black matrix layer having an opening, the opening and a lens form formed on the black matrix layer It provides an organic light emitting display device including an organic layer and a color filter layer formed on the organic layer in the form of a lens.

Description

Organic light-emitting display device and its manufacturing method {ORGANIC LIGHT EMITTING DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF}

The present invention relates to an organic light emitting display device and a method of manufacturing the same, and more particularly, to an organic light emitting display device having a simplified manufacturing process and improved viewing angle characteristics, and a manufacturing method thereof.

The organic light emitting display device has been spotlighted as a next-generation display due to advantages such as low voltage driving, light weight, thinness, wide viewing angle, and fast response speed. In particular, in recent years, research on a flexible display device using an organic light emitting device has been actively conducted.

When the device is viewed in an environment with external light such as sunlight, such an organic light emitting display has a problem that visibility is deteriorated due to light reflected from the device.

As an example for solving this problem, a method of attaching a polarizer or a polaroid film on the Encapsulation layer of the organic light emitting display may be applied as illustrated in FIG. 1.

The organic light emitting display device illustrated in FIG. 1 includes a substrate 110, a first electrode 120 disposed on the substrate 110, and a pixel defining layer 130 for distinguishing the first electrode 120, the Light emitting layers 140R, 140G, and 140B formed on the first electrode 120, a second electrode 150 formed on the light emitting layer 140, and a protective layer 160 formed on the second electrode 150 are included. In order to prevent external light reflection, a polarizer or polaroid film polarized in one direction is disposed on the protective layer 160.

As illustrated in FIG. 1, reflection due to external light may be prevented by attaching a polarizing plate or a polarizing film to the organic light emitting display. However, there is a problem in that the extraction efficiency of light generated in the light emitting layer is reduced due to the polarizing plate or the polarizing film.

Accordingly, an example of the present invention is to provide an organic light emitting display device with improved viewing angle characteristics while improving a problem of reduced visibility due to external light.

A substrate, a plurality of first electrodes formed on the substrate, a pixel defining layer (PDL) formed between the plurality of first electrodes to separate the plurality of first electrodes from each other, and the plurality of first A light emitting layer formed on the electrode, a second electrode formed on the light emitting layer and a filter portion formed on the second electrode, the filter unit, a black matrix layer having an opening, the opening and a lens form formed on the black matrix layer It provides an organic light emitting display device including an organic layer and a color filter layer formed on the organic layer in the form of a lens.

The emission layer may include a red emission layer, a green emission layer, and a blue emission layer, and the color filter layer may include a red filter, a green filter, and a blue filter corresponding to the emission layer.

The light emitting layer may include a white light emitting material and a red filter, a green filter, and a blue filter disposed on the white light emitting material.

The black matrix may be formed at a position corresponding to an upper portion of the pixel definition layer.

The black matrix may have light absorption.

An emboss in the form of a convex lens may be formed on the organic layer.

An emboss in the form of a concave lens may be formed on the organic layer.

The emboss may be formed at a position corresponding to the top of the light emitting layer.

The embossing may be formed one per pixel divided by the pixel defining layer.

Two or more embosses may be formed per pixel divided by the pixel defining layer.

The organic layer may have a refractive index of 1.7 or more.

The organic layer may be formed by including a positive photoresist composition.

The positive photoresist composition may be formed of poly methyl methacrylate (PMMA), poly methyl glutarimide (PMGI), Phenol formaldehyde resin (DNQ/Novolac) and AZ-based materials.

The organic layer may have a refractive index of 1.3 or less.

The organic layer may be formed by including a negative photoresist composition.

The negative photoresist (Negative Photoresist) composition may be formed of a novolak resin, HMMM (hexa methoxy methyl melamine) and SU-8-based materials.

The angle formed by the embossed substrate may be 15 to 70 degrees.

On the substrate, a plurality of thin film transistor layers and an insulating layer formed on the plurality of thin film transistor layers may be formed.

A protective layer may be formed between the second electrode and the filter unit.

Between the first electrode and the light emitting layer may be formed including at least one of HIL and HTL.

Between the light emitting layer and the second electrode may be formed including at least one of ETL and EIL.

Forming a black matrix having an opening on a thin film bag, applying an organic layer on the black matrix, exposing the organic layer to the front, developing the organic layer, and color filters corresponding to the light emitting layer on the organic layer It provides a method for manufacturing an organic light emitting display device comprising the step of forming a planarization.

The organic layer to be applied may include a positive photoresist composition.

The organic layer to be applied may include a negative photoresist composition.

The organic light emitting display device according to an example of the present invention can improve external light visibility and viewing angle characteristics. In addition, the organic light emitting display device according to an example of the present invention can simplify the manufacturing process.

1 is a view showing a conventional polarizing plate or an organic light emitting display device with a polarizing film attached.
2 is a view showing an organic light emitting display device according to an embodiment of the present invention.
3A is an example of an emboss shape formed in an organic layer in one embodiment according to FIG. 2.
3B is another example of an emboss shape formed in the organic layer in the embodiment according to FIG. 2.
4A to 4J are diagrams for describing a method of manufacturing an organic light emitting display device according to an embodiment of the present invention.
5A and 5B are examples of comparing light output efficiency between an embodiment of the present invention and a comparative example.
6 is an example of comparing viewing angle characteristics in an organic light emitting display device according to an embodiment and a comparative example of the present invention.
7 is a view showing an organic light emitting display device according to another embodiment of the present invention.
8A to 8D are diagrams illustrating a method of manufacturing an organic light emitting display device according to another embodiment of the present invention.

Hereinafter, examples of the present invention will be described in more detail with reference to specific drawings. The scope of the present invention is not limited to the examples or drawings described below. There may be various equivalents and modifications from the embodiments described in the following description and drawings.

For reference, in the above drawings, each component and its shape are briefly drawn or exaggerated for ease of understanding. Elements indicated by the same reference numerals in the drawings mean the same elements.

In addition, when a layer or component is described as being "on" another layer or component, as well as when the layer or component is disposed in direct contact with the other layer or component, the It is meant to include all until a third layer is interposed between them.

2 is a view showing an organic light emitting display device according to an embodiment of the present invention.

The organic light emitting display device of FIG. 2 includes a substrate 210, a plurality of first electrodes 220 formed on the substrate 210, and a pixel defining layer 230 formed between the plurality of first electrodes 220, the The emission layers 240R, 240G, and 240B formed on the first electrode 220, the second electrode 250 formed on the emission layer 240, and the protective layer 260 formed on the second electrode 250, the A filter unit 270 formed on the protective layer 260 is included. Here, the filter unit 270 is an organic layer formed on a black matrix 271 formed at a position corresponding to the pixel defining layer 230 and a protective layer 260 on which the black matrix 271 is patterned ( 272) and color filter layers 273R, 273G, and 273B formed on the organic layer 272 and having a color corresponding to the light emitting layer 240.

The substrate 210 may be formed of various materials such as glass, metal, and plastic, or may be formed using a flexible material. In the case of the back light emitting in which the image is implemented in the direction of the substrate, the substrate 210 should be formed of a light transmissive material, but in the case of the front light emission, it is not necessary to form the light transmissive material. Hereinafter, a case of a front emission type organic light emitting display device will be described as an example for unification.

A first electrode 220 may be formed on the substrate 210. The first electrode 220 is gold (Au), platinum (Pt), nickel (Ni), tungsten (W), chromium (Cr), molybdenum (Mo), iron (Fe), cobalt (Co), copper ( Cu), palladium (Pd), titanium (Ti) and a reflective film formed of these compounds. The reflective film may further include a transparent film formed of indium tin oxide (ITO) and indium zinc oxide (IZO) having high work function. In addition, the first electrode 220 may be formed of various materials known in the art. In addition, the first electrode 220 may function as an anode electrode.

Although not illustrated in FIG. 2, a thin film transistor and an insulating layer protecting the thin film transistor may be further included between the substrate 210 and the first electrode 220. In this case, the thin film transistor is formed at least one for each pixel, and may be electrically connected to the first electrode 220.

Between the plurality of first electrodes 220, a pixel definition layer 230 that overlaps an end of the first electrode 220 and divides the first electrode 220 in units of pixels ( A pixel define layer (PDL) may be formed. That is, the pixel defining layer 230 may electrically cut off the plurality of first electrodes 220 as an insulating layer.

The pixel defining layer 230 covers only a portion of the upper surface of the first electrode 220, and the remaining portion of the first electrode 220 not covered by the pixel defining layer 230 forms an opening. Can be. A light emitting layer 240 to be described later may be formed on a region defined by the opening. Of course, the emission layer 240 need not be formed only in the region defined by the opening, but may be formed in a part of the pixel defining layer 230 as shown in FIG. 2.

As an example, the organic light emitting display device according to FIG. 2 is of a front emission type, and the second electrode 250 may be provided as a transmissive electrode. For example, thin metals having low work functions such as alkali metals such as lithium (Li) and cesium (Cs), alkaline earth metals such as magnesium (Mg), calcium (Ca) and strontium (Sr), and compounds thereof The second electrode may be formed of a semi-transmissive film. A transparent conductive film such as indium tin oxide (ITO) and indium zinc oxide (IZO) may be further formed on or above the metal semi-transmissive film. The second electrode 250 may act as a cathode electrode.

A light emitting layer 240 may be provided between the first electrode 220 and the second electrode 250. Although not illustrated in FIG. 2, a hole transport layer (HTL) and a hole injection layer (HIL) may be formed between the first electrode 220 and the emission layer 240. In addition, an electron transport layer (ETL) and an electron injection layer (EIL) may be formed between the emission layer 240 and the second electrode 250.

The emission layer 240 may include a red emission layer 240R, a green emission layer 240G, and a blue emission layer 240B.

The emission layer 240 may include a white emission layer and a red color filter, a green color filter, and a blue color filter formed on the white emission layer.

A protective layer 260 may be provided on the second electrode 250 to protect the light emitting layer 240 from external environments such as moisture or oxygen.

The protective layer 260 may be formed of a transparent substrate such as a thin film encapsulation layer or Encap glass, in which a plurality of organic layers and inorganic layers are stacked by crossing.

When the protective layer 260 is a thin film encapsulation layer, the protective layer 260 may include a plurality of organic material layers and a plurality of inorganic material layers that are alternately stacked. The organic material layer may include an acrylate-based material, and the inorganic material layer may include an oxide-based material.

A black matrix 271 may be formed at a position corresponding to the pixel defining layer 230 on the passivation layer 260.

The black matrix 271 is formed using an opaque metal such as chromium (Cr) or chromium oxide (CrOx) or a black resin-based material that absorbs light.

The black matrix 271 may absorb light exposed to the organic layer during the manufacturing process of the organic light emitting display device. Therefore, the exposure amount of the region where the black matrix 271 is formed and the region where the black matrix 271 is not formed are different from each other. That is, the black matrix may serve to control the exposure amount for each region during the exposure process.

In addition, the black matrix 271 may be formed in a non-pixel area of the organic light emitting display device to block light leakage at the boundary of the pixel area, thereby improving contrast.

After the black matrix 271 is applied to the protective layer 260, an opaque metal such as chromium (Cr) or chromium oxide (CrOx) or a black resin-based material that absorbs light is applied to the mask. It may be formed through a photo lithograpy method patterning through the process.

In addition, the black matrix 271 may be formed by a vacuum deposition method using a micro transfer molding method. In addition, the black matrix 271 may be formed through various process methods known in the art.

An organic layer 272 is formed on the black matrix 271 and the openings of the black matrix 271.

The organic layer 272 may have an embossed lens shape that is convex in the direction of the light exit surface. The angle formed by the emboss with the horizontal surface of the substrate may have a range of 10 degrees to 70 degrees. In addition, the embo may form one embo per pixel, and may form two or more embos per pixel.

The organic layer 272 may be formed by including a negative photoresist composition. The negative photoresist (Negative Photoresist), after exposure (exposure), refers to the photoresist (Photoresist) where the exposed part remains as a pattern, and the part exposed to light is chemically combined and is not exposed to light during development after exposure The part is less washed out in the developing solution and can form a pattern.

The negative photoresist composition that can be used as the organic layer 272 may use a photoresist generally known in the art, and may use a commercially available product or manufacture it.

Meanwhile, the refractive index of the organic layer 272 may be formed of a material having a refractive index greater than that of the color filter 273 (1.5). Preferably it can be formed using a material having a refractive index of 1.7 or more.

In addition, the organic layer 272 may be formed of a transparent material.

The organic layer 272 may be formed using a novolac resin, hexa methoxy methyl melamine (HMMM), and SU-8-based materials.

In addition, all of the negative photoresist compositions known in the art may be used as a material for the organic layer 272.

A method of forming an emboss in the form of a convex lens on the organic layer 271 uses a photo-lithograpy process.

A negative photoresist composition is uniformly applied on the protective layer 260, and the negative photoresist composition is entirely exposed using an exposure device such as a stepper.

Even if the entire surface of the organic layer 272 is exposed, the black matrix (1) is affected by the light reflected from the first electrode 220 and the second electrode 250 once more in the portion without the black matrix 271. 271), there will be more exposure amount in the region.

In addition, since the organic layer 272 uses a negative photoresist composition in which the bonding force increases in proportion to the exposure amount, the portion with a large amount of exposure becomes more reactive than the portion with no exposure, and as a result, a convex lens-shaped organic layer Can form.

A color filter 273 is disposed on the organic layer 272. The color filter includes a red color filter 273R, a green color filter 273G, and a blue color filter 273B.

The color filters 273R, 273G, and 273B are formed at positions corresponding to the light emitting layers 240R, 240G, and 240B.

The color filter 273 may be formed by a process such as a pigment dispersion method, a dyeing method, an electrodeposition method or a thermal transfer method. In addition, it may be formed using a color filter forming method known in the art.

3A is an example of an emboss shape formed in an organic layer in one embodiment according to FIG. 2. As illustrated in FIG. 3A, one embo per pixel may be formed in the organic layer.

3B is another example of an emboss shape formed in the organic layer in the embodiment according to FIG. 2. As illustrated in FIG. 3B, two or more embosses may be formed per pixel in the organic layer.

4A to 4J are diagrams illustrating a method of manufacturing an organic light emitting display device according to an embodiment of the present invention.

An organic light emitting display device according to an embodiment of the present invention includes (a) forming a plurality of first electrodes 220 on the substrate 210, and (b) between the plurality of first electrodes 220. Forming a pixel defining layer 230, (c) forming a light emitting layer 240R, 240G, 240B on the first electrode 220, (d) a second electrode on the light emitting layer 240 Forming 250), (e) forming a protective layer 260 on the second electrode 250, and (f) forming a black matrix pattern 271 on the protective layer 260. , (g) applying a negative photoresist (Negative Photoresist) composition on the black matrix 271 patterned protective layer 260, (h ~ i) exposing the negative photoresist (Negative Photoresist) composition to the front And then developing to form an emboss in the form of a convex lens and (j) forming color filters 273R, 273G, 273B of the color corresponding to the light emitting layer on the negative photoresist composition on which the emboss is formed. It is formed including the steps.

<Light extraction efficiency>

A light extraction simulation model for confirming an improvement in light extraction efficiency of an organic light emitting display device according to an embodiment of the present invention may be set as follows.

For comparison, an organic light emitting display device including a flat organic layer and a flat color filter can be used as a comparative example. Here, the refractive index of the color filter is 1.5, and a commonly used color filter is used.

The organic light emitting display device according to the exemplary embodiment of the present invention may include an organic layer in which embosses in the form of convex lenses are formed in the direction of the light exit surface (see FIG. 2 ). The angle at which the embo forms with the substrate is 60 degrees, and the refractive index of the organic layer on which the embo is formed is 1.8. A color filter is stacked on the organic layer. The color filter has a refractive index of 1.5, and a commonly used color filter is used.

5A and 5B are simulation diagrams showing the amount of light emitted from the organic light emitting display device of the comparative example and the organic light emitting display device according to an example of the present invention, respectively.

When the embossed lens-formed organic layer is provided in the direction of the light exit surface as in the embodiment of the present invention, the amount of light emitted to the front can be improved by 115% compared to the case where the emboss is not formed as in the comparative example have.

<Improved viewing angle>

6 is an example of comparing viewing angle characteristics in an organic light emitting display device according to an example and a comparative example of the present invention.

In the graph illustrated in FIG. 6, the x-axis direction represents an angle and the y-axis direction represents a luminance change amount. That is, it is a graph showing the change in the luminance ratio at each angle compared to the luminance at the 0 degree when the luminance is measured in a range from 0 to 60 degrees based on a virtual line perpendicular to the light exit surface. Therefore, it can be said that the smaller the amount of change according to the angle change, the better the viewing angle characteristic.

6, the WAD value of the comparative example is 0.03 at 60 degrees, and the WAD value of the example of the present invention is 0.018 at 60 degrees. That is, it can be seen that the viewing angle characteristic of the organic light emitting device including the organic layer on which the emboss is formed is improved than the structure without the emboss as in the above embodiment.

7 is a view showing an organic light emitting display device according to another embodiment of the present invention.

The organic light emitting display device of FIG. 7 includes a substrate 310, a plurality of first electrodes 320 formed on the substrate 310, a pixel defining layer 330 formed between the plurality of first electrodes 320, and the The emission layers 340R, 340G, and 340B formed on the first electrode 320, the second electrode 350 formed on the emission layer 340, and the protective layer 360 formed on the second electrode 350, the It includes a filter portion 370 formed on the protective layer 360. Here, the filter unit 370 is an organic layer formed on a black matrix 371 formed at a position corresponding to the pixel defining layer 330 and a protective layer 360 on which the black matrix 371 is patterned ( 372) and color filter layers 373R, 373G, and 373B formed on the organic layer 372 and having a color corresponding to the light emitting layer 340.

Among the components of the organic light emitting display device of FIG. 7, description of overlapping with the components of the organic light emitting display device of FIG. 2 will be omitted.

The organic layer 372 may have a lens-shaped emboss that is concave in the direction of the light exit surface. The angle formed by the emboss with the horizontal surface of the substrate may have a range of 10 degrees to 70 degrees. In addition, the embo may form one embo per pixel, and may form two or more embos per pixel.

The organic layer 372 may be formed of a positive photoresist composition. The positive photoresist (Positive Photoresist) composition, after exposure (exposure), refers to the photoresist (Photoresist) in which the part except for the exposed part remains in a pattern, and the exposed part is chemically decomposed and washed in the developer after exposure It is an outgoing photoresist.

The positive photoresist composition that can be used as the organic layer 372 may use a photoresist generally known in the art, and may use a commercially available product or manufacture it.

Meanwhile, the refractive index of the organic layer 372 may be formed of a material having a refractive index smaller than the refractive index 1.5 of the color filter 373. Preferably, it can be formed using a material having a refractive index of 1.3 or less.

In addition, the organic layer 372 may be formed of a transparent material.

The organic layer 372 may be formed using materials such as poly methyl methacrylate (PMMA), poly methyl glutarimide (PMGI), Phenol formaldehyde resin (DNQ/Novolac) and AZ-based photoresist.

In addition, all of the positive photoresist compositions known in the art may be used as the material of the organic layer 372.

A method of forming an embossed concave lens shape on the organic layer 372 uses a photo-lithograpy process.

A positive photoresist composition is uniformly applied on the protective layer 360, and the negative photoresist composition is entirely exposed using an exposure device such as a stepper.

The black matrix (because the black matrix 371 is affected by light reflected from the first electrode 320 and the second electrode 350 layer once more even if the black matrix 371 is not exposed even if the entire surface is exposed to the organic layer 372. 371), the exposure amount is greater in the region without.

In addition, since the organic layer 372 uses a positive photoresist composition in which the decomposition power increases in proportion to the exposure amount, the portion with a large amount of exposure becomes more reactive than the portion with no exposure, resulting in a concave lens-shaped organic layer Can form.

8A to 8D are diagrams illustrating a method of manufacturing an organic light emitting display device according to another embodiment of the present invention.

* Here, a step after FIG. 4F, that is, (a) forming a plurality of first electrodes 320 on the substrate 310, and (b) a pixel defining layer between the plurality of first electrodes 320 ( Forming 330, (c) forming light emitting layers 340R, 340G, and 340B on the first electrode 320, and (d) forming a second electrode 350 on the light emitting layer 340. Step (e) forming a protective layer 360 on the second electrode 350, and (f) forming a black matrix pattern 371 on the protective layer 360 are shown.

8A is a step of applying a positive photoresist composition on the protective layer 360 on which the black matrix 371 is patterned, and FIGS. 8B and 8C are front views of the positive photoresist composition. After exposure, it develops and forms a concave lens-shaped emboss, and FIG. 8D shows color filters 373R, 373G, and 373B corresponding to the light emitting layer on the positive photoresist composition on which the emboss is formed. It shows the step of forming. By this method, it is possible to manufacture the organic light emitting display device shown in FIG. 7.

110,210,310: substrate 120,220,320: first electrode
130,230,330: pixel defining layer 140,240,340: emitting layer
150,250,350: second electrode 160,260,360: protective layer
270,370: filter layer 271,371: black matrix
272,372: organic layer 273,373: color filter layer

Claims (21)

Board;
A pixel array including a plurality of pixels configured to emit visible light in a direction away from the substrate, the pixel array formed on one surface of the substrate; And
And a lens layer formed on the pixel array and including a plurality of lens units.
When viewed in a direction perpendicular to one surface of the substrate, the one or more lens units correspond to any one of the plurality of pixels, and the lens unit has one surface facing the substrate and another surface facing the opposite direction to one surface of the lens unit, and The other surface of the lens portion has a curved surface, the curved surface is located in the center of the lens portion, an organic light emitting display device. The black matrix of claim 1, wherein the black matrix layer is formed on the pixel array and provides a plurality of openings when viewed in a direction perpendicular to the one surface, each opening corresponding to any one of the plurality of pixels. An organic light emitting display device further comprising a layer; The pixel of claim 1, wherein the plurality of pixels includes red light pixels, green light pixels, and blue light pixels, and the organic light emitting display device includes a plurality of color filters, and the plurality of color filters comprises the red light pixels and the green light pixels. And a red filter, a green filter, and a blue filter corresponding to the blue light pixel. The pixel of claim 1, wherein each of the plurality of pixels includes a white light emitting material, the organic light emitting display device includes a plurality of color filters, and the plurality of color filters includes a red filter, a green filter, and a blue filter. , The red filter, the green filter and the blue filter are respectively disposed on the white light emitting material of any one of the plurality of pixels. The method of claim 2, further comprising a pixel defining layer configured to separate a plurality of the pixels from each other when viewed in the direction, wherein the black matrix layer is formed to overlap the pixel defining layer when viewed in the direction. Organic light emitting display device. The organic light emitting display device of claim 1, wherein each of the lens units has a convex lens shape. The organic light emitting display device of claim 1, wherein each of the lens units has a concave lens shape. The method of claim 1, wherein the pixel array,
A plurality of first electrodes formed on the substrate;
A pixel defining layer (PDL) formed on the substrate and separating the plurality of first electrodes from each other when viewed in a thickness direction of the organic light emitting display device;
A plurality of light emitting layer portions, each of the plurality of light emitting layer portions being formed on any one of the plurality of first electrodes, the plurality of light emitting layer portions;
At least one second electrode formed on the plurality of light emitting layer portions; And
It includes a filter formed on the at least one second electrode,
Organic light emitting display device. The organic light emitting display device of claim 1, wherein the lens unit is formed one for each of the plurality of pixels. The organic light emitting display device of claim 1, wherein two or more lens units are formed for each of the plurality of pixels. The organic light emitting display device of claim 6, wherein the lens unit in the form of a convex lens has a refractive index of 1.7 or more. 12. The organic light emitting display device of claim 11, wherein the lens layer comprises a negative photoresist composition. The method of claim 12, wherein the negative photoresist (Negative Photoresist) composition is an organic light emitting display device, characterized in that it comprises at least one selected from the group consisting of novolak resin, hexa methoxy methyl melamine (HMMM) and SU-8 series. The organic light emitting display device of claim 7, wherein a refractive index of the plurality of lens units in the form of the concave lens is 1.3 or less. The organic light emitting display device of claim 7, wherein the lens layer comprises a positive photoresist composition. 16. The method of claim 15, The positive photoresist (Positive Photoresist) composition is at least one selected from the group consisting of Poly methyl methacrylate (PMMA), Poly methyl glutarimide (PMGI), Phenol formaldehyde resin (DNQ / Novolac) and AZ series Organic light emitting display device comprising a. The organic light emitting display device of claim 1, wherein an angle between the lens unit and a surface parallel to the substrate is 15 to 70 degrees. The organic light emitting display device of claim 1, further comprising a plurality of thin film transistor layers and an insulating layer formed on the plurality of thin film transistor layers on the substrate. The organic light emitting display device of claim 1, further comprising a protective layer formed between the pixel array and the lens layer. delete Board;
A pixel array including a plurality of pixels configured to emit visible light in a direction away from the substrate, the pixel array formed on one surface of the substrate; And
And a lens layer formed on the pixel array and including a plurality of lens units.
The pixel array includes a pixel defining layer that provides a plurality of openings when viewed in a direction perpendicular to one surface of the substrate, and the plurality of openings respectively correspond to the plurality of pixels,
When viewed in a direction perpendicular to one surface of the substrate, the at least one lens unit corresponds to any one of the plurality of pixels, the organic light emitting display device.

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