KR102102178B1 - Plasma dispersion system - Google Patents

Abstract

Provided is a plasma dispersion system capable of widely dispersing plasma. The plasma dispersion system comprises: a moving tube providing a moving path of plasma; and a rotation unit coupled to the moving tube. The rotation unit is coupled to the moving tube to be rotatable around an axis in parallel with an extension direction of the moving tube, wherein the rotation unit includes a magnet.

Description

Plasma dispersion system

The present invention relates to a plasma dispersion system, and more particularly, to a plasma dispersion system capable of evenly distributing plasma.

The vacuum arc vapor deposition method refers to a processing method in which a metal is heated in a vacuum to evaporate and then evaporated molecules are attached to a base material at a temperature lower than the vapor temperature to form a thin film.

In vacuum arc deposition, the process of thin film formation can be disturbed by large macro particles. That is, in addition to the metal particles evaporated on the surface of the base material, large particles may adhere to degrade the quality of the thin film.

In order to remove these large particles before the thin film, a filter vacuum arc system (hereinafter, FVAS) using a magnetic field has been proposed. FVAS flows the plasma containing evaporated metal particles into the duct where the path is curved, and guides the path of the charged particles of the plasma by a magnetic field caused by an electromagnet or the like surrounding the duct. At this time, the large particles cannot be bent by a magnetic field and can be removed from the plasma by being collected in a baffle or the like in the duct.

The problem to be solved by the present invention is to provide a plasma dispersion system capable of widely dispersing plasma.

The problem to be solved by the present invention is to provide a plasma dispersion system capable of forming a wide thin film.

The problem to be solved by the present invention is to provide a plasma dispersion system applicable to mass production products.

The problem to be solved by the present invention is to provide a plasma dispersion system capable of uniformly dispersing plasma.

The problem to be solved by the present invention is to provide a plasma dispersion system capable of improving the thin film quality by removing macron particles.

The problem to be solved by the present invention is to provide a plasma dispersion system capable of controlling the degree of dispersion of plasma.

The problem to be solved by the present invention is to provide a plasma dispersion system capable of forming thin films of various sizes.

The problems to be solved by the present invention are not limited to the problems mentioned above, and other problems not mentioned will be clearly understood by those skilled in the art from the following description.

Plasma dispersion system according to an exemplary embodiment of the present invention in order to achieve the object to be solved is a moving tube that provides a moving path of the plasma; And a rotating part coupled to the moving tube. Including, the rotating portion is coupled to the moving tube so as to be rotatable about an axis parallel to the extension direction of the moving tube, may include a magnet.

To achieve the problem to be solved, the plasma dispersion system according to an exemplary embodiment of the present invention may further include a driving unit providing rotational power to the rotating unit.

In order to achieve the problem to be solved, the plasma dispersion system according to an exemplary embodiment of the present invention includes: the rotating part: a rotating body surrounding the outer surface of the moving tube while the magnet is located; And a connection unit transmitting rotational power from the driving unit to the rotating body. It may include.

In order to achieve the problem to be solved, the plasma dispersion system according to an exemplary embodiment of the present invention may be connected to the driving unit and the connection unit by a power band.

In order to achieve the object to be solved, the plasma dispersion system according to an exemplary embodiment of the present invention may include a motor of the driving unit.

In order to achieve the problem to be solved, the plasma dispersion system according to an exemplary embodiment of the present invention is provided with a plurality of magnets, and the magnets may be spaced apart from each other in a direction intersecting the extending direction of the moving tube.

To achieve the problem to be solved, the plasma dispersion system according to an exemplary embodiment of the present invention may further include an inlet pipe extending in an extending direction and an inclined direction of the moving pipe.

Plasma dispersion system according to an exemplary embodiment of the present invention to achieve the problem to be solved is a first coil coupled to the inlet pipe; And a second coil coupled to the moving tube. It may further include.

In order to achieve the object to be solved, the plasma dispersion system according to an exemplary embodiment of the present invention may further include a plasma generator coupled to the inlet pipe.

In order to achieve the problem to be solved, the plasma dispersion system according to an exemplary embodiment of the present invention may be rotatable about an axis where the magnet intersects an extension direction of the moving tube.

Plasma dispersion system according to an exemplary embodiment of the present invention in order to achieve the object to be solved is a moving tube that provides a moving path of the plasma; And a rotating part coupled to the moving tube. Including, but the rotating portion includes a magnet, the magnet may be rotatable about an axis intersecting the extension direction of the moving tube.

In order to achieve the object to be solved, the plasma dispersion system according to an exemplary embodiment of the present invention may include a rotating body in which the rotating part is positioned with the magnet, and surrounding a part of the outer surface of the moving tube.

In order to achieve the object to be solved, the plasma dispersion system according to an exemplary embodiment of the present invention may further include an adjustment unit for rotating the magnet about an axis intersecting the extension direction of the moving tube.

In order to achieve the problem to be solved, the plasma dispersion system according to an exemplary embodiment of the present invention includes: a fixed body coupled to an outer surface of the rotating body; An adjustment shaft extending from the fixed body to the magnet; And an adjusting body that rotates the rotating rod. It may include.

To achieve the problem to be solved, a plasma dispersion system according to an exemplary embodiment of the present invention may be coupled to the moving tube such that the rotating part is rotatable around an axis parallel to the extending direction of the moving tube.

To achieve the problem to be solved, the plasma dispersion system according to an exemplary embodiment of the present invention may further include a driving unit providing rotational power to the rotating unit.

In order to achieve the problem to be solved, the plasma dispersion system according to an exemplary embodiment of the present invention is provided with a plurality of magnets, and the magnets may be spaced apart from each other in a direction intersecting the extending direction of the moving tube.

To achieve the problem to be solved, the plasma dispersion system according to an exemplary embodiment of the present invention may further include an inlet pipe extending in an extending direction and an inclined direction of the moving pipe.

In order to achieve the problem to be solved, the plasma dispersion system according to an exemplary embodiment of the present invention further includes a connecting pipe connecting the inlet pipe and the moving pipe, the connecting pipe from the extending direction of the inlet pipe It can be bent in the extending direction of the moving tube.

Specific details of other embodiments are included in the detailed description and drawings.

According to the plasma dispersion system of the present invention, there is an effect capable of dispersing a wide range of plasma.

According to the plasma dispersion system of the present invention, it is possible to form a wide thin film.

According to the plasma dispersion system of the present invention, there is an effect applicable to mass production products.

According to the plasma dispersion system of the present invention, there is an effect capable of uniformly dispersing the plasma.

According to the plasma dispersion system of the present invention, it is possible to improve the thin film quality by removing the macron particles.

According to the plasma dispersion system of the present invention, there is an effect that can control the degree of dispersion of the plasma.

According to the plasma dispersion system of the present invention, it is possible to form a thin film of various sizes.

The effects of the present invention are not limited to the effects mentioned above, and other effects not mentioned will be clearly understood by those skilled in the art from the following description.

1 is a perspective view showing a plasma dispersion system according to exemplary embodiments of the present invention.
2 is a side view showing a plasma dispersion system according to exemplary embodiments of the present invention.
3 is a cross-sectional view showing a plasma dispersion system according to exemplary embodiments of the present invention.
4 is a front view showing a plasma dispersion system according to exemplary embodiments of the present invention.
5 is a cross-sectional view showing a state in which the rotating body of the plasma dispersion system according to the exemplary embodiments of the present invention is cut into a D2-D3 plane.
6 is a cross-sectional view showing a state in which the rotating body of the plasma dispersion system according to the exemplary embodiments of the present invention is cut into a D1-D2 plane.
7 is a perspective view showing a rotating method of a rotating part of a plasma dispersion system according to exemplary embodiments of the present invention.
8 is a perspective view showing a thin film formed by a plasma dispersion system according to exemplary embodiments of the present invention.

In order to fully understand the configuration and effects of the technical spirit of the present invention, preferred embodiments of the technical spirit of the present invention will be described with reference to the accompanying drawings. However, the technical spirit of the present invention is not limited to the embodiments disclosed below, and may be implemented in various forms and various changes may be made. However, the disclosure of the technical spirit of the present invention is made through the description of the present embodiments, and is provided to completely inform the scope of the invention to those skilled in the art to which the present invention pertains.

Parts indicated by the same reference numerals throughout the specification indicate the same components. Embodiments described in the present specification will be described with reference to block diagrams, perspective views, and / or cross-sectional views, which are ideal examples of the technical spirit of the present invention. In the drawings, the thickness of the regions is exaggerated for effective description of technical content. Accordingly, the regions illustrated in the figures have schematic properties, and the shapes of the regions illustrated in the figures are intended to illustrate specific shapes of regions of the device and are not intended to limit the scope of the invention. Although various terms are used to describe various elements in various embodiments of the present specification, these elements should not be limited by these terms. These terms are only used to distinguish one component from another component. The embodiments described and illustrated herein also include its complementary embodiments.

The terminology used herein is for describing the embodiments and is not intended to limit the present invention. In this specification, the singular form also includes the plural form unless otherwise specified in the phrase. As used herein, 'comprises' and / or 'comprising' does not exclude the presence or addition of one or more other components.

Hereinafter, the present invention will be described in detail by describing preferred embodiments of the technical spirit of the present invention with reference to the accompanying drawings.

1 is a perspective view showing a plasma dispersion system according to exemplary embodiments of the present invention, and FIG. 2 is a side view showing a plasma dispersion system according to exemplary embodiments of the present invention.

Hereinafter, D1 in FIG. 1 may be referred to as a first direction, D2 as a second direction, and D3 as a third direction.

Referring to FIGS. 1 and 2, the plasma dispersion system F may include a plasma generator 9, a tube 3, a coil 5, a rotating part 1 and a flange 7.

The plasma generating unit 9 may include a plasma generating pipe 91 and a gas supply pipe 93. Plasma may be generated inside the plasma generating tube 91. More specifically, the plasma generating tube 91 may generate a plasma by applying a voltage using a trigger electrode to a target where an arc evaporation material is generated. The target may include metal or the like. The generated plasma may include metal particles, electrons and ions. In embodiments, the plasma may be further provided with macro-particles. The plasma can be moved along the tube 3. The gas supply pipe 93 may be coupled to the plasma generating pipe 91. The interior of the gas supply pipe 93 may communicate with the interior of the plasma generating pipe 91. Gas may be supplied to the plasma generation pipe 91 through the gas supply pipe 93. Plasma generated in the plasma generating tube 91 reacts with gas to form a material necessary for thin film formation.

The tube 3 may provide a movement path of plasma generated in the plasma generating unit 9. The pipe 3 may include an inlet pipe 31, a moving pipe 35, and a connecting pipe 33. The inlet pipe 31 may be coupled to the plasma generator 9. The inner space of the inlet pipe 31 may communicate with the inner space of the plasma generating pipe 91. Plasma generated in the plasma generating pipe 91 may be introduced into the inlet pipe 31. The moving tube 35 may provide a moving path of plasma. The moving pipe 35 may be connected to the inlet pipe 31. The expression connection used in the present specification may include both directly connecting and connecting both components and indirectly connecting through other components. The moving tube 35 may extend in the first direction D1. The extending direction of the moving pipe 35 may be different from the extending direction of the inlet pipe 31. The extension direction X1 of the moving pipe 35 may form a certain angle a with the extension direction X2 of the inflow pipe 31. In embodiments, a may not be 0 degrees or 180 degrees. The rotating part 1 may be movably coupled to the moving tube 35. The connecting pipe 33 may be located between the inlet pipe 31 and the moving pipe 35. The connecting pipe 33 may connect the inlet pipe 31 and the moving pipe 35. The connector 33 can be bent. The portion connected to the inlet pipe 31 in the connecting pipe 33 may extend in the extending direction of the inlet pipe 31. The portion connected to the moving pipe 35 in the connecting pipe 33 may extend in the extending direction of the moving pipe 35. In embodiments, the connecting pipe 33 may be bent from the X2 direction to the X1 direction. A portion extending in the X2 direction may be referred to as a first connector 331 and a portion extending in the X1 direction may be referred to as a second connector 333. Plasma of the inlet pipe 31 may move to the moving pipe 35 through the connecting pipe 33.

The coil 5 can be coupled to the tube 3. In embodiments, the coil 5 may include a first coil portion 51 and a second coil portion 53. The first coil part 51 may be coupled to the inlet pipe 31. The first coil part 51 may include a first coil seating table 513 and a first coil 511. The first coil seating table 513 may surround a portion of the inlet pipe 31. The first coil 511 may be coupled to the first coil seating table 513. Therefore, the first coil 511 may surround a portion of the inlet pipe 31. A voltage may be applied to the first coil 511. The first coil 511 may be an electromagnet. The electromagnet may provide a magnetic field inside the inlet pipe 31 and around the inlet pipe 31. The plasma may be guided through the path by the magnetic field provided by the first coil 511. More specifically, the charged particles of the plasma passing inside the inlet pipe 31 and the adjacent inlet pipe 31 may be moved by a magnetic field provided by the first coil 511. The second coil part 53 may be coupled to the moving tube 35. The second coil part 53 may include a second coil seating table 533 and a second coil 531. The second coil seating table 533 may surround a part of the moving tube 35. The second coil 531 may be coupled to the second coil seating table 533. Therefore, the second coil 531 may surround a part of the moving tube 35. A voltage may be applied to the second coil 531. The second coil 531 may be an electromagnet. The electromagnet may provide a magnetic field inside the moving tube 35 and around the moving tube 35. The plasma may be guided through the path by the magnetic field provided by the second coil 531. More specifically, the charged particles of the plasma passing through the inside of the moving tube 35 and the adjacent position of the moving tube 35 may be moved by the magnetic field provided by the second coil 531. In embodiments, the magnetic field provided by the first coil 511 and the magnetic field provided by the second coil 531 overlap and the charged particles of the plasma passing through the connector 33 may be guided through the path. In the above, it has been described that two coils are provided, but the number and location of the coils are not limited thereto. That is, only one coil may be provided, or three or more coils may be provided in various positions.

The rotating part 1 may be coupled to the moving tube 35. The rotating part 1 may surround a part of the moving tube 35. In embodiments, the rotating part 1 may be provided between the second coil part 53 and the flange 7. The rotating part 1 may be movably coupled to the moving tube 35. More specifically, the rotating part 1 may be rotatably coupled to the moving tube 35. The rotating part 1 may include a rotating body 11 and a connecting part 13. The rotating body 11 may include a magnet. The connecting portion 13 may be coupled to the rotating body 11. The connecting portion 13 may transmit power to the rotating body 11. Details of the rotating part 1 will be described later.

The flange 7 can be coupled to the end of the moving tube 35. The plasma diffusion system F can be coupled to other configurations through the flange 7.

3 is a cross-sectional view showing a plasma dispersion system according to exemplary embodiments of the present invention.

Referring to FIG. 3, in the plasma generation tube 91 of the plasma generation unit 9, plasma including evaporation particles from the target may be generated by the trigger electrode. The plasma can react with the gas supplied from the gas supply pipe 93. Plasma may be introduced into the inlet pipe 31 after passing through the plasma generating pipe 91.

The plasma including the charged particles may be moved in the extending direction of the inlet pipe 31 by the magnetic field induced by the first coil 511. Plasma may flow through the inlet pipe 31 and into the connecting pipe 33. By the magnetic field formed by overlapping the first coil 511 and the second coil 531, the path of movement of the plasma including the charged particles may be bent along the connection pipe 33. Therefore, the plasma including the charged particles can naturally flow from the first connector 331 to the second connector 333. Macron particles and the like may not be affected by the magnetic field. Macro particles and the like may not flow due to bending from the first connection pipe 331 to the second connection pipe 333. Macron particles or the like may not move to the second connector 333. Macron particles or the like can be attached to the inner wall of the tube 3. In embodiments, a configuration such as a baffle (not shown) may be further provided on the inner wall of the tube 3. Macron particles and the like can be collected in a baffle or the like. Therefore, macron particles and the like can be removed from the plasma.

The plasma of which the path is bent to the second connection pipe 333 may continuously move in the opposite direction of the first direction D1 through the moving pipe 35. The plasma may be guided by a magnetic field induced by the second coil 531.

The rotating part 1 can rotate. More specifically, the rotation unit 1 may rotate a line parallel to the first direction D1 in the rotation axis. When the rotating part 1 rotates, the magnetic field caused by the magnet of the rotating part 1 may change. By the magnetic field induced by the magnet, the plasma passing through the interior of the rotating part 1 and the vicinity of the rotating part 1 can be dispersed. Dispersed plasma may move to other configurations coupled to the flange 7. In embodiments, a process chamber or the like may be coupled to the flange 7. A thin film forming object and the like may be provided in the process chamber. Plasma can be distributed inside the process chamber past the flange 7. The dispersed plasma can reach the thin film formation target of the process chamber. Hereinafter, the details of the rotating part 1 will be described with reference to FIGS. 4 to 7.

4 is a front view showing a plasma dispersion system according to exemplary embodiments of the present invention.

Referring to FIG. 4, the rotating part 1 can rotate. When the rotating part 1 is rotated, other configurations such as the flange 7 may not be rotated. The rotating part 1 may rotate around an axis parallel to the extending direction of the moving tube 35 (see FIG. 3). That is, the rotating unit 1 may rotate about the axis of movement of the plasma passing through the moving tube “? 藪 * parallel axis. In FIG. 4, the rotating unit 1 is illustrated as rotating clockwise, but is not limited thereto. The rotating part 1 may also rotate counterclockwise.

5 is a cross-sectional view showing a state in which the rotating body of the plasma dispersion system according to the exemplary embodiments of the present invention is cut into a D2-D3 plane.

Referring to FIG. 5, the rotating body 11 may rotate about an axis parallel to the first direction D1. The rotating body 11 can rotate clockwise or counterclockwise. Rotation of the rotating body 11 may be performed by a drive unit 8 (see FIG. 7). Details of this will be described later.

The rotating body 11 may be provided with a magnet receiving hole. A plurality of magnet receiving holes may be provided. In embodiments, the magnet receiving hole may include a first magnet receiving hole 1131h and a second magnet receiving hole 1133h. The first magnet accommodating hole 1131h and the second magnet accommodating hole 1133h may be spaced apart in the third direction D3. A first magnet 1131 may be provided in the first magnet receiving hole 1131h. The first magnet 1131 may be smaller than the first magnet receiving hole 1131h. A second magnet 1133 may be provided in the second magnet accommodation hole 1133h. The second magnet 1133 may be smaller than the second magnet receiving hole 1133h. The first magnet 1131 and the second magnet 1133 may each provide a magnetic field. The number and location of the magnets are not limited to this, and only one magnet may be provided, or three or more magnets may be provided.

In embodiments, a control unit may be further provided on the rotating body 11. The adjusting unit may include a first adjusting unit 115 and a second adjusting unit 117. The first adjustment unit 115 may rotate the first magnet 1131. The first adjustment unit 115 may include a first adjustment shaft 1151, a first adjustment body 1153, and a first fixed body 1155. The first adjustment shaft 1151 may be coupled to the first magnet 1131. The first adjustment shaft 1151 may penetrate the rotating body 11. The first adjustment shaft 1151 may extend in a direction intersecting the first direction D1. The first adjustment body 1153 may be coupled to the first adjustment shaft 1151. The first adjustment body 1153 may be located outside the rotating body 11. The first adjustment body 1153 may rotate in a direction intersecting the first direction D1. When the first adjustment body 1153 rotates, the first adjustment shaft 1151 and the first magnet 1131 may rotate. The first fixed body 1155 may be coupled to the outer surface of the rotating body (11). The first fixed body 1155 may support the first adjustment body 1153. The first adjustment body 1153 and the first fixed body 1155 may be rotatable relative to each other. That is, even if the first adjustment body 1153 rotates, the first fixed body 1155 may not be rotated and may be fixed. The rotation of the first adjustment body 1153 may be made manually. However, the present invention is not limited thereto, and other mechanisms and / or driving means for rotating the first magnet 1131 may be used. The second adjustment unit 117 may rotate the second magnet 1133. The second adjustment unit 117 may include a second adjustment shaft 1171, a second adjustment body 1173, and a second fixed body 1175. Each of the second adjustment shaft 1171, the second adjustment body 1173, and the second fixed body 1175, of the first adjustment shaft 1151, the first adjustment body 1153, and the first fixed body 1155 It may be the same or similar to each.

6 is a cross-sectional view showing a state in which the rotating body of the plasma dispersion system according to the exemplary embodiments of the present invention is cut into a D1-D2 plane.

Referring to FIG. 6, the first magnet 1131 may rotate through rotation of the first adjustment body 1153. The first magnet receiving hole 1131h formed inside the rotating body 11 may provide an appropriate shape to rotate the first magnet 1131. That is, when the first magnet 1131 is rectangular, the first magnet accommodating hole 1131h may include a part of a circular shape. The first magnet 1131 may be rotated by a certain angle b. In embodiments, b may be greater than 0 degrees and less than 180 degrees.

7 is a perspective view showing a rotating method of a rotating part of a plasma dispersion system according to exemplary embodiments of the present invention.

Referring to FIG. 7, a driving unit 8 may be further provided. The driving unit 8 can rotate the rotating unit 1. The driving unit 8 may include a driving body 81 and a rotating rod 83. The driving body 81 may be coupled to the moving tube 35 through the support 81a. In embodiments, the drive body 81 may include a motor or the like. However, the present invention is not limited thereto, and the driving body 81 may include other components capable of providing or transmitting rotational power. The rotating rod 83 may extend from the first body 81. The rotating rod 83 can be rotated by the driving body 81. The rotating rod 83 may rotate the connecting portion 13 through a band B or the like. When the connecting portion 13 is rotated, the rotating body 11 coupled to the connecting portion 13 can also rotate. The driving body 81 can adjust the rotation speed. In embodiments, a speed adjusting device (not shown) for adjusting the rotation speed may be further included. The speed of change of the magnetic field by the magnet can also be controlled by adjusting the rotation speed by the speed adjusting device.

According to the plasma dispersion system according to the embodiments of the present invention, as the rotating part provided with the magnet rotates, the magnetic field may change. Plasma affected by the magnetic field can be widely dispersed. The plasma passing through the rotating part can be widely distributed and flows through the flange and enters the process chamber. Therefore, plasma can be uniformly reached to a thin film formation object in the empty space chamber. In addition, the plasma may reach farther, and thus, a thinner film of a wider shape may be formed. The quality of the thin film can be improved, and various types of thin film can be formed, so it can be suitable for mass production. In addition, the degree of plasma dispersion can be controlled by adjusting the rotation speed of the rotating part, and thus, it can flexibly respond to manufacturing various types of thin films.

According to the plasma dispersion system according to the embodiments of the present invention, since the angle of the magnet can be adjusted, the direction of the magnetic field can be adjusted. Therefore, the dispersion direction and dispersion form of the plasma can be easily adjusted, and various types of thin films can be formed.

According to the plasma dispersion system according to embodiments of the present invention, since the macro particles in the plasma can be filtered, the quality of the thin film can be improved. Therefore, the yield of the thin film forming process can be improved.

8 is a perspective view showing a thin film formed by a plasma dispersion system according to exemplary embodiments of the present invention.

Referring to FIG. 8, a case where a TiN thin film is deposited using a general arc source and a case where a TiN thin film is deposited using a filtered arc source of the present invention can be compared. From the three samples with the surface enlarged 50 times, it can be seen that the surface is more even when the TiN thin film is formed using the filtered arc source of the present invention. For example, when a general arc source is used, the surface roughness Ra may be 50 nm. When using the present invention, the surface roughness Ra may be 1.6 nm. Therefore, when applying the plasma dispersion system of the present invention, it is possible to obtain a better surface roughness.

Plasma dispersion system according to embodiments of the present invention can be used in the manufacture of dental implant head coatings and precision cutting tools. However, the present invention is not limited to this, and it can be applied to other fields.

The embodiments of the present invention have been described above with reference to the accompanying drawings, but those skilled in the art to which the present invention pertains can be implemented in other specific forms without changing the technical spirit or essential features of the present invention. You will understand that there is. Therefore, it should be understood that the embodiments described above are illustrative in all respects and not restrictive.

F: Plasma dispersion system
1: rotating part
11: rotating body
1131: first magnet
1133: second magnet
1131h: First magnet housing
1133h: Second magnet housing
115: first adjustment unit
1151: first adjustment shaft
1153: first adjustment body
1155: first fixed body
117: second adjustment unit
13: Connection
3: tube
31: inlet pipe
33: connector
35: moving tube
5: coil
51: 1st coil part
511: first coil
513: first coil seat
53: second coil portion
531: second coil
533: Second coil seat
7: Flange
8: Drive
81: driving body
81a: Support
83: rotating bar
9: Plasma generator
91: plasma generating tube
93: gas supply pipe

Claims (19)

A moving tube providing a moving path of plasma; And
A rotating part coupled to the moving tube; It includes,
The rotating portion is coupled to the moving tube so as to be rotatable about an axis parallel to the extending direction of the moving tube, and includes a magnet,
The magnet is a plasma dispersion system that can be rotated about an axis intersecting the extending direction of the moving tube.
According to claim 1,
A plasma dispersion system further comprising a driving unit that provides rotational power to the rotating unit.
According to claim 2,
The rotating part:
The magnet is located, the rotating body surrounding a portion of the outer surface of the moving tube; And
A connection unit that transmits rotational power from the driving unit to the rotating body; Plasma dispersion system comprising a.
The method of claim 3,
The driving unit and the connection unit is a plasma dispersion system connected by a power band.
According to claim 2,
The drive unit comprises a plasma dispersion system comprising a motor.
According to claim 1,
A plurality of the magnets are provided,
The magnets are spaced apart from each other in a direction crossing the direction of extension of the moving tube plasma dispersion system.
According to claim 1,
Plasma dispersion system further comprises an inlet pipe extending in an inclined direction with the extending direction of the moving tube.
The method of claim 7,
A first coil coupled to the inlet pipe; And
A second coil coupled to the moving tube; Plasma dispersion system further comprising a.
The method of claim 8,
A plasma dispersion system further comprising a plasma generator coupled to the inlet pipe.
According to claim 1,
Wherein the rotating portion, the magnet is located, further comprising a rotating body surrounding a portion of the outer surface of the moving tube,
The rotating body provides a magnet receiving hole for receiving the magnet,
The size of the magnet is a plasma dispersion system smaller than the size of the magnet receiving hole.
A moving tube providing a moving path of plasma; And
A rotating part coupled to the moving tube; Including,
The rotating part:
magnet; And
An adjustment unit for rotating the magnet around an axis intersecting the extending direction of the moving tube; Plasma dispersion system comprising a.
The method of claim 11,
Wherein the rotating portion, the magnet is located, including a rotating body surrounding a portion of the outer surface of the moving tube,
The rotating body is a plasma dispersion system providing a magnet receiving hole for receiving the magnet.
The method of claim 12,
The size of the magnet is a plasma dispersion system smaller than the size of the magnet receiving hole.
The method of claim 12,
The adjustment unit:
A fixed body coupled to the outer surface of the rotating body;
An adjustment shaft extending from the fixed body to the magnet; And
An adjusting body that rotates the adjusting shaft; Plasma dispersion system comprising a.
The method of claim 11,
The rotating part is a plasma dispersion system coupled to the moving tube so as to be rotatable about an axis parallel to the extension direction of the moving tube.
The method of claim 15,
A plasma dispersion system further comprising a driving unit that provides rotational power to the rotating unit.
The method of claim 11,
A plurality of the magnets are provided,
The magnets are spaced apart from each other in a direction crossing the direction of extension of the moving tube plasma dispersion system.
The method of claim 11,
Plasma dispersion system further comprises an inlet pipe extending in an inclined direction with the extending direction of the moving tube.
The method of claim 18,
Further comprising a connecting pipe connecting the inlet pipe and the mobile pipe,
The connecting pipe is a plasma dispersion system that is bent in the extending direction of the moving tube from the extending direction of the inlet tube.

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