KR102100611B1 - Metal complex catalysts for selective formation of cyclic carbonates and process for preparing cyclic carbonate using the same - Google Patents
Metal complex catalysts for selective formation of cyclic carbonates and process for preparing cyclic carbonate using the same Download PDFInfo
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- KR102100611B1 KR102100611B1 KR1020180096069A KR20180096069A KR102100611B1 KR 102100611 B1 KR102100611 B1 KR 102100611B1 KR 1020180096069 A KR1020180096069 A KR 1020180096069A KR 20180096069 A KR20180096069 A KR 20180096069A KR 102100611 B1 KR102100611 B1 KR 102100611B1
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- KR
- South Korea
- Prior art keywords
- formula
- alkyl
- compound
- hydrogen
- metal complex
- Prior art date
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- 150000005676 cyclic carbonates Chemical class 0.000 title claims abstract description 39
- 239000003054 catalyst Substances 0.000 title claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 150000004696 coordination complex Chemical class 0.000 title claims description 8
- 230000015572 biosynthetic process Effects 0.000 title description 2
- -1 metal complex compound Chemical class 0.000 claims abstract description 64
- 150000001875 compounds Chemical class 0.000 claims abstract description 51
- 239000003446 ligand Substances 0.000 claims abstract description 49
- 238000006243 chemical reaction Methods 0.000 claims abstract description 41
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract description 40
- 238000000034 method Methods 0.000 claims abstract description 24
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 20
- 239000001569 carbon dioxide Substances 0.000 claims abstract description 19
- 229910052751 metal Inorganic materials 0.000 claims abstract description 10
- 239000002184 metal Substances 0.000 claims abstract description 10
- 239000001257 hydrogen Substances 0.000 claims description 37
- 229910052739 hydrogen Inorganic materials 0.000 claims description 37
- 125000000217 alkyl group Chemical group 0.000 claims description 27
- 150000002431 hydrogen Chemical class 0.000 claims description 24
- 125000002947 alkylene group Chemical group 0.000 claims description 20
- 229910052736 halogen Inorganic materials 0.000 claims description 19
- 150000002367 halogens Chemical class 0.000 claims description 18
- 125000003118 aryl group Chemical group 0.000 claims description 15
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 15
- CDAWCLOXVUBKRW-UHFFFAOYSA-N ortho-hydroxyaniline Natural products NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 claims description 15
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 13
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 9
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 8
- 230000000737 periodic effect Effects 0.000 claims description 7
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 claims description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical group CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 6
- 125000006701 (C1-C7) alkyl group Chemical group 0.000 claims description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 5
- 150000001412 amines Chemical class 0.000 claims description 5
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical group [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 claims description 5
- KYCQOKLOSUBEJK-UHFFFAOYSA-M 1-butyl-3-methylimidazol-3-ium;bromide Chemical compound [Br-].CCCCN1C=C[N+](C)=C1 KYCQOKLOSUBEJK-UHFFFAOYSA-M 0.000 claims description 4
- FHDQNOXQSTVAIC-UHFFFAOYSA-M 1-butyl-3-methylimidazol-3-ium;chloride Chemical compound [Cl-].CCCCN1C=C[N+](C)=C1 FHDQNOXQSTVAIC-UHFFFAOYSA-M 0.000 claims description 4
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 claims description 4
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 claims description 4
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 3
- 229960000549 4-dimethylaminophenol Drugs 0.000 claims description 2
- CXRFDZFCGOPDTD-UHFFFAOYSA-M Cetrimide Chemical compound [Br-].CCCCCCCCCCCCCC[N+](C)(C)C CXRFDZFCGOPDTD-UHFFFAOYSA-M 0.000 claims description 2
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 claims description 2
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 claims description 2
- XKBGEWXEAPTVCK-UHFFFAOYSA-M methyltrioctylammonium chloride Chemical compound [Cl-].CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC XKBGEWXEAPTVCK-UHFFFAOYSA-M 0.000 claims description 2
- DPKBAXPHAYBPRL-UHFFFAOYSA-M tetrabutylazanium;iodide Chemical compound [I-].CCCC[N+](CCCC)(CCCC)CCCC DPKBAXPHAYBPRL-UHFFFAOYSA-M 0.000 claims description 2
- YQIVQBMEBZGFBY-UHFFFAOYSA-M tetraheptylazanium;bromide Chemical compound [Br-].CCCCCCC[N+](CCCCCCC)(CCCCCCC)CCCCCCC YQIVQBMEBZGFBY-UHFFFAOYSA-M 0.000 claims description 2
- ODTSDWCGLRVBHJ-UHFFFAOYSA-M tetrahexylazanium;chloride Chemical compound [Cl-].CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC ODTSDWCGLRVBHJ-UHFFFAOYSA-M 0.000 claims description 2
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 claims description 2
- QBVXKDJEZKEASM-UHFFFAOYSA-M tetraoctylammonium bromide Chemical compound [Br-].CCCCCCCC[N+](CCCCCCCC)(CCCCCCCC)CCCCCCCC QBVXKDJEZKEASM-UHFFFAOYSA-M 0.000 claims description 2
- SPALIFXDWQTXKS-UHFFFAOYSA-M tetrapentylazanium;bromide Chemical compound [Br-].CCCCC[N+](CCCCC)(CCCCC)CCCCC SPALIFXDWQTXKS-UHFFFAOYSA-M 0.000 claims description 2
- BGQMOFGZRJUORO-UHFFFAOYSA-M tetrapropylammonium bromide Chemical compound [Br-].CCC[N+](CCC)(CCC)CCC BGQMOFGZRJUORO-UHFFFAOYSA-M 0.000 claims description 2
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims 8
- 239000003426 co-catalyst Substances 0.000 claims 3
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 claims 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims 1
- 239000002994 raw material Substances 0.000 abstract description 4
- 238000002360 preparation method Methods 0.000 description 23
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- 238000005481 NMR spectroscopy Methods 0.000 description 14
- 125000005843 halogen group Chemical group 0.000 description 12
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 239000003960 organic solvent Substances 0.000 description 8
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 150000002924 oxiranes Chemical class 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 125000002723 alicyclic group Chemical group 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- LVTJOONKWUXEFR-FZRMHRINSA-N protoneodioscin Natural products O(C[C@@H](CC[C@]1(O)[C@H](C)[C@@H]2[C@]3(C)[C@H]([C@H]4[C@@H]([C@]5(C)C(=CC4)C[C@@H](O[C@@H]4[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@@H](O)[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@H](CO)O4)CC5)CC3)C[C@@H]2O1)C)[C@H]1[C@H](O)[C@H](O)[C@H](O)[C@@H](CO)O1 LVTJOONKWUXEFR-FZRMHRINSA-N 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical compound C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 2
- FWFSEYBSWVRWGL-UHFFFAOYSA-N cyclohexene oxide Natural products O=C1CCCC=C1 FWFSEYBSWVRWGL-UHFFFAOYSA-N 0.000 description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical class OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 125000001188 haloalkyl group Chemical group 0.000 description 2
- 239000002815 homogeneous catalyst Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Natural products C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 1
- DOPJTDJKZNWLRB-UHFFFAOYSA-N 2-Amino-5-nitrophenol Chemical compound NC1=CC=C([N+]([O-])=O)C=C1O DOPJTDJKZNWLRB-UHFFFAOYSA-N 0.000 description 1
- SWFNPENEBHAHEB-UHFFFAOYSA-N 2-amino-4-chlorophenol Chemical compound NC1=CC(Cl)=CC=C1O SWFNPENEBHAHEB-UHFFFAOYSA-N 0.000 description 1
- RPJUVNYXHUCRMG-UHFFFAOYSA-N 2-amino-4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C(N)=C1 RPJUVNYXHUCRMG-UHFFFAOYSA-N 0.000 description 1
- ZMXYNJXDULEQCK-UHFFFAOYSA-N 2-amino-p-cresol Chemical compound CC1=CC=C(O)C(N)=C1 ZMXYNJXDULEQCK-UHFFFAOYSA-N 0.000 description 1
- BATCUENAARTUKW-UHFFFAOYSA-N 4-[(4-hydroxyphenyl)-diphenylmethyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 BATCUENAARTUKW-UHFFFAOYSA-N 0.000 description 1
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- MVQDMAYYMYOZOD-UHFFFAOYSA-N 4-[1-(4-hydroxyphenyl)cyclohexyl]phenol Chemical compound OC1=CC=C(C=C1)C1(CCCCC1)C1=CC=C(C=C1)O.OC1=CC=C(C=C1)C1(CCCCC1)C1=CC=C(C=C1)O MVQDMAYYMYOZOD-UHFFFAOYSA-N 0.000 description 1
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- 229910021617 Indium monochloride Inorganic materials 0.000 description 1
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- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
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- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- 238000006170 formylation reaction Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000006358 imidation reaction Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 1
- APHGZSBLRQFRCA-UHFFFAOYSA-M indium(1+);chloride Chemical compound [In]Cl APHGZSBLRQFRCA-UHFFFAOYSA-M 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 125000006413 ring segment Chemical group 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000012916 structural analysis Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- WROMPOXWARCANT-UHFFFAOYSA-N tfa trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F.OC(=O)C(F)(F)F WROMPOXWARCANT-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
- C07F3/06—Zinc compounds
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- B01J31/18—Catalysts comprising hydrides, coordination complexes or organic compounds containing coordination complexes containing nitrogen, phosphorus, arsenic or antimony as complexing atoms, e.g. in pyridine ligands, or in resonance therewith, e.g. in isocyanide ligands C=N-R or as complexed central atoms
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- C07D317/32—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
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Abstract
본 발명은 고리형 카보네이트를 제조하기 위한 신규 금속 착화합물 및 이를 촉매로 이용하여 고리형 카보네이트를 제조하는 방법에 관한 것으로, 보다 상세하게는 신규 구조의 리간드 화합물과 2가 금속을 포함하는 금속 착화합물을 촉매로 사용하여 다양한 구조의 에폭사이드 화합물과 이산화탄소를 원료 물질로 사용하여 기존 촉매에 비해 높은 전환율로 고리형 카보네이트를 고수율로 선택적으로 제조하는 방법에 관한 것이다.The present invention relates to a novel metal complex compound for producing a cyclic carbonate and a method for preparing a cyclic carbonate using the same as a catalyst, and more specifically, a catalyst for a metal complex compound containing a novel structure of a ligand compound and a divalent metal It relates to a method for selectively producing a cyclic carbonate with a high conversion rate with a high conversion rate compared to a conventional catalyst using epoxide compounds and carbon dioxide of various structures as raw materials.
Description
본 발명은 고리형 카보네이트를 제조하기 위한 신규 금속 착화합물 및 이를 촉매로 이용하여 알킬렌 옥사이드 화합물과 이산화탄소를 반응시켜 고리형 카보네이트를 제조하는 방법에 관한 것이다.The present invention relates to a novel metal complex compound for producing a cyclic carbonate and a method for producing a cyclic carbonate by reacting an alkylene oxide compound with carbon dioxide using the catalyst.
고리형 카보네이트는 유기 용제, 합성 섬유 가공제, 의약품 원료, 화장품 첨가제, 리튬 전지용 전해액 용매로서, 나아가서는 알킬렌글리콜 및 디알킬카보네이트 합성의 중간체로서 넓은 용도에 사용되는 중요한 화합물의 하나이다.Cyclic carbonates are one of the important compounds used in a wide range of applications as organic solvents, synthetic fiber processing agents, pharmaceutical raw materials, cosmetic additives, and electrolyte solvents for lithium batteries, and further, as intermediates for alkylene glycol and dialkyl carbonate synthesis.
종래, 이 고리형 카보네이트는 에폭사이드와 이산화탄소를 균일계 촉매의 존재하, 적당한 가압 조건하에서 반응시킴으로써 합성되고 있었다. 이와 같은 균일계 촉매로는, 알칼리 금속 등의 할로겐화물이나 제 4 급 암모늄염 등의 오늄염이 예로부터 알려져 있으며, 공업적으로도 사용되고 있다.Conventionally, this cyclic carbonate was synthesized by reacting epoxide and carbon dioxide in the presence of a homogeneous catalyst and under appropriate pressure conditions. As such a homogeneous catalyst, halides such as alkali metals and onium salts such as quaternary ammonium salts are known from the past and are also used industrially.
일예로, 중국특허 제101921257호에서는 상이한 할로겐이온을 갖는 강염기성 구형 스티렌 이온교환수지로 구성된 촉매를 이용하여 5-원 고리형 카보네이트를 합성하였으며, 일본공개특허 소56-128778은 알칼리금속 화합물과 크라운 화합물로 이루어진 촉매계에서 고리형 카보네이트를 제조하였으며, 일본공개특허 소59-13776은 4급 암모늄과 알코올을 사용하였고, 일본공개특허 제2006-151891호에서는 Bu2SnI2 및 InCl3의 존재 하에서 에폭시 화합물과 CO2를 반응시켜 고리형 카보네이트를 제조하였고, WO 2005/003113은 테트라알킬 포스포늄 할라이드(tetraalkyl phosphnium halide)를 사용하였고, 한국공개특허 제2005-0115694호는 금속염과 지방족고리 아민염으로 구성된 촉매계를 사용하고 있다. For example, in Chinese Patent No. 101921257, 5-membered cyclic carbonate was synthesized using a catalyst composed of a strong basic spherical styrene ion exchange resin having different halogen ions, and Japanese Patent Publication No. 56-128778 discloses an alkali metal compound and a crown. A cyclic carbonate was prepared in a catalyst system composed of a compound, Japanese Patent Publication No. 59-13776 used quaternary ammonium and alcohol, and Japanese Patent No. 2006-151891 discloses an epoxy compound in the presence of Bu 2 SnI 2 and InCl 3 And CO2 were reacted to prepare a cyclic carbonate, and WO 2005/003113 used tetraalkyl phosphnium halide, and Korean Patent Publication No. 2005-0115694 discloses a catalyst system composed of a metal salt and an aliphatic amine salt. I am using it.
그러나 이들의 합성방법에 따르면 온화한 반응조건하에서는 반응 수율이 낮아 수율을 높이기 위해서는 높은 온도와 긴 반응시간이 필요하고, 원료인 이산화탄소와 알킬렌옥사이드의 수분함량을 수백 ppm 이하로 조절해야 하는 문제점이 있다.However, according to their synthesis method, under a mild reaction condition, the reaction yield is low, and a high temperature and a long reaction time are required to increase the yield, and there is a problem in that the moisture content of carbon dioxide and alkylene oxides, which are raw materials, must be controlled to several hundred ppm or less. .
본 발명의 목적은 신규 구조의 리간드 화합물 및 이를 포함하는 금속 착화합물을 제공하는데 있다.It is an object of the present invention to provide a novel complex ligand compound and a metal complex compound containing the same.
본 발명의 또 다른 목적은 상기 금속 착화합물을 촉매로 이용하여 알킬렌 옥사이드와 이산화탄소를 반응시켜 고효율 및 선택적으로 고리형 카보네이트를 제조하는 방법을 제공하는 것이다.Another object of the present invention is to provide a method for producing a highly efficient and selectively cyclic carbonate by reacting alkylene oxide and carbon dioxide using the metal complex compound as a catalyst.
본 발명은 하기 화학식 1로 표시되는 리간드와 주기율표상 2족, 6족, 8족, 9족, 10족, 11족 또는 12족 2가 금속을 포함하는 금속 착화합물을 제공한다.The present invention provides a metal complex containing a ligand represented by Formula 1 and a Group 2, 6, 8, 9, 10, 11 or 12 divalent metal on the periodic table.
[화학식 1][Formula 1]
(상기 화학식 1에서, (In the formula 1,
R1 및 R2는 각각 독립적으로 수소, C1-C10알킬, 할로겐 또는 나이트로이고;R 1 and R 2 are each independently hydrogen, C 1 -C 10 alkyl, halogen or nitro;
R3 및 R4는 각각 독립적으로 수소, C1-C10알킬, 할로C1-C10알킬 또는 C6-C20아릴이거나, 상기 R3과 R4는 서로 연결되어 고리를 형성할 수 있다.)R 3 and R 4 are each independently hydrogen, C 1 -C 10 alkyl, halo C 1 -C 10 alkyl or C 6 -C 20 aryl, or R 3 and R 4 may be connected to each other to form a ring.)
또한, 본 발명은 하기 화학식 1로 표시되는 리간드 화합물을 제공한다.In addition, the present invention provides a ligand compound represented by Formula 1 below.
[화학식 1][Formula 1]
(상기 화학식 1에서, (In the formula 1,
R1 및 R2는 각각 독립적으로 수소, C1-C10알킬, 할로겐 또는 나이트로이고;R 1 and R 2 are each independently hydrogen, C 1 -C 10 alkyl, halogen or nitro;
R3 및 R4는 각각 독립적으로 수소, C1-C10알킬, 할로C1-C10알킬 또는 C6-C20아릴이거나, 상기 R3과 R4는 서로 연결되어 고리를 형성할 수 있다.)R 3 and R 4 are each independently hydrogen, C 1 -C 10 alkyl, halo C 1 -C 10 alkyl or C 6 -C 20 aryl, or R 3 and R 4 may be connected to each other to form a ring.)
또한, 본 발명은 하기 화학식 A의 비스(4-하이드록시페닐) 화합물 및 화학식 B의 헥사메틸렌테트라아민(Hexamethylenetetramin)을 반응시켜 화학식 C의 알데히드 화합물을 제조하는 단계; 및 화학식 C의 알데히드 화합물 및 화학식 D의 2-아미노페놀 화합물을 반응시켜 상기 화학식 1의 리간드 화합물을 제조하는 단계;를 포함하는 상기 화학식 1의 리간드 화합물의 제조방법을 제공한다.In addition, the present invention comprises the steps of preparing an aldehyde compound of formula C by reacting a bis (4-hydroxyphenyl) compound of formula A and hexamethylenetetramin of formula B; And preparing a ligand compound of Formula 1 by reacting an aldehyde compound of Formula C and a 2-aminophenol compound of Formula D.
[화학식 A][Formula A]
[화학식 B][Formula B]
[화학식 C][Chemical Formula C]
[화학식 D][Formula D]
(상기 화학식 A, C 및 D에서, (In the above formula A, C and D,
R1 및 R2는 각각 독립적으로 수소, C1-C10알킬, 할로겐 또는 나이트로이고;R 1 and R 2 are each independently hydrogen, C 1 -C 10 alkyl, halogen or nitro;
R3 및 R4는 각각 독립적으로 수소, C1-C10알킬, 할로C1-C10알킬 또는 C6-C20아릴이거나, 상기 R3과 R4는 서로 연결되어 고리를 형성할 수 있다.)R 3 and R 4 are each independently hydrogen, C 1 -C 10 alkyl, halo C 1 -C 10 alkyl or C 6 -C 20 aryl, or R 3 and R 4 may be connected to each other to form a ring.)
또한, 본 발명은 상기 금속 착화합물을 촉매로 사용하여 알킬렌 옥사이드 화합물과 이산화탄소를 반응시켜 고리형 카보네이트를 선택적으로 제조하는 방법을 제공한다.In addition, the present invention provides a method for selectively preparing a cyclic carbonate by reacting an alkylene oxide compound with carbon dioxide using the metal complex compound as a catalyst.
본 발명에 따른 금속 착화합물은 신규 구조의 리간드 화합물과 주기율표상 2족, 6족, 8족, 9족, 10족, 11족 또는 12족 2가 금속을 포함하는 착화합물로, 에폭사이드와 이산화탄소를 반응시켜 고리형 카보네이트를 합성하기 위해서 사용하는 촉매로서 유용하다.The metal complex compound according to the present invention is a complex compound containing a ligand compound of a novel structure and a group 2, 6, 8, 9, 10, 11 or 12 divalent metal on the periodic table, reacting epoxide and carbon dioxide It is useful as a catalyst used to synthesize cyclic carbonates.
또한, 본 발명의 금속 착화합물을 이용한 고리형 카보네이트의 제조방법에 의해 높은 전화율로 고리형 카보네이트를 제조할 수 있다.In addition, the cyclic carbonate can be produced at a high conversion rate by the method for producing a cyclic carbonate using the metal complex compound of the present invention.
도 1 - 실시예 6에서 제조된 금속 착화합물 Zn-1a의 결정 구조 (Red : O, Gray : C, White : H, Blue : N, Purple : Zn)Figure 1-Crystal structure of the metal complex Zn-1a prepared in Example 6 (Red: O, Gray: C, White: H, Blue: N, Purple: Zn)
이하 본 발명을 상세히 설명한다. 이때 사용되는 기술 용어 및 과학 용어에 있어서 다른 정의가 없다면, 이 발명이 속하는 기술 분야에서 통상의 지식을 가진 자가 통상적으로 이해하고 있는 의미를 가지며, 하기의 설명에서 본 발명의 요지를 불필요하게 흐릴 수 있는 공지 기능 및 구성에 대한 설명은 생략한다. Hereinafter, the present invention will be described in detail. At this time, unless there are other definitions in the technical terms and scientific terms used, those skilled in the art to which this invention belongs have meanings that are commonly understood, and the following description may unnecessarily obscure the subject matter of the present invention. Descriptions of known functions and configurations are omitted.
본 발명에 기재된 용어 「알킬」은 탄소 및 수소 원자만으로 구성된 1가의 직쇄 또는 분쇄 포화 탄화수소 라디칼을 의미하는 것으로, 이러한 알킬 라디칼의 예는 메틸, 에틸, 프로필, 이소프로필, 부틸, 이소부틸, t-부틸, 펜틸, 헥실, 옥틸, 도데실 등을 포함하지만 이에 한정되지는 않는다.The term "alkyl" described in the present invention refers to a monovalent straight-chain or ground saturated hydrocarbon radical consisting only of carbon and hydrogen atoms, examples of such alkyl radicals being methyl, ethyl, propyl, isopropyl, butyl, isobutyl, t- Butyl, pentyl, hexyl, octyl, dodecyl, and the like.
본 발명에 기재된 용어 「할로알킬」는 상기 정의된 할로겐 원자로 치환된 알킬라디칼을 의미하는 것으로, 할로알킬의 예는 플루오로메틸, 디플루오로메틸, 트리플루오로메틸, 플루오로에틸, 디플루오로에틸, 브로모프로필 등을 포함하지만 이에 한정되지는 않는다.The term "haloalkyl" described in the present invention means an alkyl radical substituted with a halogen atom as defined above, and examples of haloalkyl include fluoromethyl, difluoromethyl, trifluoromethyl, fluoroethyl, and difluoro Ethyl, bromopropyl, and the like.
본 발명에 기재된 용어 「아릴」는 하나의 수소 제거에 의해서 방향족 탄화수소로부터 유도된 유기 라디칼로, 각 고리에 적절하게는 4 내지 7개, 바람직하게는 5 또는 6개의 고리원자를 포함하는 단일 또는 융합고리계를 포함하며, 다수개의 아릴이 단일결합으로 연결되어 있는 형태까지 포함한다. 구체적인 예로 페닐, 나프틸, 비페닐, 안트릴, 인데닐(indenyl), 플루오레닐 등을 포함하지만, 이에 한정되지는 않는다. The term "aryl" described in the present invention is an organic radical derived from an aromatic hydrocarbon by removal of one hydrogen, single or fused, preferably containing 4 to 7, preferably 5 or 6 ring atoms in each ring. It includes a ring system, and includes a form in which a plurality of aryls are connected by a single bond. Specific examples include, but are not limited to, phenyl, naphthyl, biphenyl, anthryl, indenyl, fluorenyl, and the like.
본 발명은 고리형 카보네이트를 제조하기 위한 신규 금속 착화합물 및 이를 촉매로 이용하여 알킬렌 옥사이드 화합물과 이산화탄소를 반응시켜 고리형 카보네이트를 제조하는 방법에 관한 것이다. The present invention relates to a novel metal complex compound for producing a cyclic carbonate and a method for producing a cyclic carbonate by reacting an alkylene oxide compound with carbon dioxide using the catalyst.
본 발명의 금속 착화합물은 하기 화학식 1로 표시되는 리간드 화합물 및 주기율표상 2족, 6족, 8족, 9족, 10족, 11족 또는 12족 2가 금속을 포함한다.The metal complex compound of the present invention includes a ligand compound represented by the following Chemical Formula 1 and a Group 2, 6, 8, 9, 10, 11 or 12 divalent metal in the periodic table.
[화학식 1][Formula 1]
(상기 화학식 1에서, (In the formula 1,
R1 및 R2는 각각 독립적으로 수소, C1-C10알킬, 할로겐 또는 나이트로이고;R 1 and R 2 are each independently hydrogen, C 1 -C 10 alkyl, halogen or nitro;
R3 및 R4는 각각 독립적으로 수소, C1-C10알킬, 할로C1-C10알킬 또는 C6-C20아릴이거나, 상기 R3과 R4는 서로 연결되어 고리를 형성할 수 있다.)R 3 and R 4 are each independently hydrogen, C 1 -C 10 alkyl, halo C 1 -C 10 alkyl or C 6 -C 20 aryl, or R 3 and R 4 may be connected to each other to form a ring.)
본 발명의 일실시예에 따른 리간드 화합물에 있어서, 상기 R1은 수소, C1-C7알킬 또는 할로겐이고; R2는 수소 또는 나이트로이고; R3 및 R4는 각각 독립적으로 C1-C7알킬, 할로C1-C7알킬 또는 C6-C12아릴이거나, 상기 R3과 R4는 C2-C7알킬렌으로 연결되어 지환족 고리를 형성할 수 있다.In the ligand compound according to an embodiment of the present invention, R 1 is hydrogen, C 1 -C 7 alkyl or halogen; R 2 is hydrogen or nitro; R 3 and R 4 are each independently C 1 -C 7 alkyl, halo C 1 -C 7 alkyl or C 6 -C 12 aryl, or R 3 and R 4 may be connected to C 2 -C 7 alkylene to form an alicyclic ring.
보다 바람직하게는 상기 R1은 수소, C1-C4알킬 또는 할로겐이고; R2는 수소 또는 나이트로이고; R3 및 R4는 각각 독립적으로 C1-C4알킬, 할로C1-C4알킬 또는 C6-C12아릴이거나, 상기 R3과 R4는 C4-C5알킬렌으로 연결되어 지환족 고리를 형성할 수 있다.More preferably, R 1 is hydrogen, C 1 -C 4 alkyl or halogen; R 2 is hydrogen or nitro; R 3 and R 4 are each independently C 1 -C 4 alkyl, halo C 1 -C 4 alkyl or C 6 -C 12 aryl, or R 3 and R 4 may be connected to C 4 -C 5 alkylene to form an alicyclic ring.
본 발명의 일실시예에 따른 리간드 화합물에 있어서, 상기 화학식 1의 리간드 화합물은 하기 구조로부터 선택될 수 있으나, 이에 한정이 있는 것은 아니다:In the ligand compound according to an embodiment of the present invention, the ligand compound of Formula 1 may be selected from the following structures, but is not limited thereto:
(상기 R1은 C1-C4알킬 또는 할로겐, 보다 바람직하게는 메틸, 부틸 또는 클로로이고; R3 및 R4는 각각 독립적으로 C1-C4알킬, 할로C1-C4알킬 또는 C6-C12아릴, 보다 바람직하게는 메틸, 에틸, 프로필, 부틸, 트리플루오로메틸 또는 페닐이다.)(R 1 is C 1 -C 4 alkyl or halogen, more preferably methyl, butyl or chloro; R 3 and R 4 are each independently C 1 -C 4 alkyl, halo C 1 -C 4 alkyl or C 6 -C 12 aryl, more preferably It is methyl, ethyl, propyl, butyl, trifluoromethyl or phenyl.)
또한, 본 발명은 상기 화학식 1의 리간드 화합물을 제조하는 방법에 관한 것으로, 상기 화학식 1의 리간드는 더프 반응(Duff's reaction) 및 이민화 반응을 통해 효율적으로 제조될 수 있다.In addition, the present invention relates to a method for preparing the ligand compound of Formula 1, wherein the ligand of Formula 1 can be efficiently prepared through a Duff's reaction and an imidation reaction.
보다 구체적으로 화학식 1의 리간드 화합물은 하기의 단계로 제조될 수 있다:More specifically, the ligand compound of Formula 1 can be prepared by the following steps:
하기 화학식 A의 비스(4-하이드록시페닐) 화합물 및 화학식 B의 헥사메틸렌테트라아민(Hexamethylenetetramin)을 반응시켜 화학식 C의 알데히드 화합물을 제조하는 단계; 및Preparing a aldehyde compound of formula C by reacting a bis (4-hydroxyphenyl) compound of formula A and a hexamethylenetetraamine of formula B; And
화학식 C의 알데히드 화합물 및 화학식 D의 2-아미노페놀 화합물을 반응시켜 화학식 1의 리간드 화합물을 제조하는 단계.Reacting an aldehyde compound of formula C and a 2-aminophenol compound of formula D to prepare a ligand compound of formula 1.
[화학식 1][Formula 1]
[화학식 A][Formula A]
[화학식 B][Formula B]
[화학식 C][Chemical Formula C]
[화학식 D][Formula D]
(상기 화학식 1, A, C 및 D에서, (In the formula 1, A, C and D,
R1 및 R2는 각각 독립적으로 수소, C1-C10알킬, 할로겐 또는 나이트로이고;R 1 and R 2 are each independently hydrogen, C 1 -C 10 alkyl, halogen or nitro;
R3 및 R4는 각각 독립적으로 수소, C1-C10알킬, 할로C1-C10알킬 또는 C6-C20아릴이거나, 상기 R3과 R4는 서로 연결되어 고리를 형성할 수 있다.)R 3 and R 4 are each independently hydrogen, C 1 -C 10 alkyl, halo C 1 -C 10 alkyl or C 6 -C 20 aryl, or R 3 and R 4 may be connected to each other to form a ring.)
상기 화학식 A의 비스(4-하이드록시페닐) 화합물의 구체적인 예로는 2,2-비스(4-하이드록시페닐)프로페인(2,2-Bis(4-hydroxyphenyl)propane), 2,2-비스(4-하이드록시페닐)헥사플루오로프로페인(2,2-Bis(4-hydroxyphenyl)hexafluoropropane), 2,2-비스(4-하이드록시페닐)-4-메틸펜테인(2,2-Bis(4-hydroxyphenyl)-4-methylpentane), 비스(4-하이드록시페닐)다이페닐메테인(Bis(4-hydroxyphenyl)diphenylmethane), 2,2-비스(4-하이드록시페닐)뷰테인(2,2-Bis(4-hydroxyphenyl)butane), 1,1-비스(4-하이드록시페닐)-1-페닐에테인(1,1-Bis(4-hydroxyphenyl)-1-phenylethane), 4,4'-사이클로헥실리덴비스페놀(4,4'-Cyclohexylidenebisphenol) 등이 있으나, 이에 한정이 있는 것은 아니다.Specific examples of the bis (4-hydroxyphenyl) compound of Chemical Formula A are 2,2-bis (4-hydroxyphenyl) propane, 2,2-bis (4-hydroxyphenyl) hexafluoropropane (2,2-Bis (4-hydroxyphenyl) hexafluoropropane), 2,2-bis (4-hydroxyphenyl) -4-methylpentane (2,2-Bis (4-hydroxyphenyl) -4-methylpentane), bis (4-hydroxyphenyl) diphenylmethane, 2,2-bis (4-hydroxyphenyl) butane (2, 2-Bis (4-hydroxyphenyl) butane), 1,1-bis (4-hydroxyphenyl) -1-phenylethane (1,1-Bis (4-hydroxyphenyl) -1-phenylethane), 4,4'- Cyclohexylidene bisphenol (4,4'-Cyclohexylidenebisphenol), and the like, but is not limited thereto.
공지의 더프 반응(Duff's reaction)을 이용하여 상기 화학식 A의 비스(4-하이드록시페닐) 화합물의 하이드록시기의 오쏘 위치에 포밀기가 도입된 알데히드 화합물(화학식 C)을 제조한다. 즉 화학식 A의 비스(4-하이드록시페닐) 화합물을 화학식 B의 헥사메틸렌테트라아민(Hexamethylenetetramin)과 반응시켜 화학식 C의 알데히드 화합물을 제조한다. An aldehyde compound (Formula C) in which a formyl group is introduced at the ortho position of the hydroxy group of the bis (4-hydroxyphenyl) compound of Formula A is prepared using a known Duff's reaction. That is, an aldehyde compound of Formula C is prepared by reacting a bis (4-hydroxyphenyl) compound of Formula A with hexamethylenetetraamine of Formula B.
상기 포밀화 반응은 산 존재 하에서 수행될 수 있으며, 트리플루오로아세트산, 메탄설폰산 또는 폴리인산 등과 같은 강산을 용매로 사용하는 것이 바람직하다.The formylation reaction can be carried out in the presence of an acid, and it is preferable to use a strong acid such as trifluoroacetic acid, methanesulfonic acid or polyphosphoric acid as a solvent.
상기 화학식 B의 헥사메틸렌테트라아민은 화학식 A의 비스(4-하이드록시페닐) 화합물에 대하여 과량 사용하며, 바람직하게는 화학식 A의 비스(4-하이드록시페닐) 화합물 1당량에 대하여 30 내지 50당량으로 사용한다. The hexamethylenetetraamine of Formula B is used in excess with respect to the bis (4-hydroxyphenyl) compound of Formula A, preferably 30 to 50 equivalents with respect to 1 equivalent of bis (4-hydroxyphenyl) compound of Formula A Use as
상기 화학식 C의 알데히드 화합물과 화학식 D의 2-아미노페놀 화합물을 반응시켜 화학식 1의 리간드 화합물을 제조한다. 상기 화학식 D의 2-아미노페놀 화합물은 화학식 C의 알데히드 화합물 1당량에 대하여 적어도 4당량으로 사용한다. 상기 이민화 반응은 좋게는 20 내지 40 ℃에서 수행될 수 있다.The ligand compound of Formula 1 is prepared by reacting the aldehyde compound of Formula C with the 2-aminophenol compound of Formula D. The 2-aminophenol compound of Formula D is used in at least 4 equivalents based on 1 equivalent of the aldehyde compound of Formula C. The imidization reaction can be preferably performed at 20 to 40 ° C.
상기 화학식 1의 리간드 화합물의 제조는 유기 용매 하에서 이루어질 수 있으며, 상기 반응물질을 용해할 수 있는 것이라면 유기용매에 제한을 둘 필요는 없다. 상기 반응의 용매로는 메탄올, 에탄올, 이소프로판올, 아세톤, 에틸 아세테이트, 아세토니트릴, 이소프로필 에테르, 메틸에틸케톤, 메틸렌 클로라이드, 다이클로로벤젠, 클로로벤젠, 다이클로로에탄, 테트라하이드로퓨란, 톨루엔, 벤젠 및 크실렌으로 이루어진 군으로부터 선택되는 불활성 용매인 것이 반응물의 용해성 및 제거의 용이성을 고려할 때 바람직하며, 메탄올, 에탄올 또는 이들의 혼합용매를 사용하는 것이 더욱 바람직하다.The preparation of the ligand compound of Formula 1 may be performed under an organic solvent, and there is no need to limit the organic solvent as long as it can dissolve the reactant. Solvents of the reaction include methanol, ethanol, isopropanol, acetone, ethyl acetate, acetonitrile, isopropyl ether, methyl ethyl ketone, methylene chloride, dichlorobenzene, chlorobenzene, dichloroethane, tetrahydrofuran, toluene, benzene and An inert solvent selected from the group consisting of xylene is preferable in view of the solubility of the reactants and ease of removal, and more preferably, methanol, ethanol, or a mixed solvent thereof.
상기 모든 반응은 TLC 등을 통하여 출발물질이 모두 소모되었음을 확인 후 반응을 완결시키도록 한다. 반응이 완결되면 필요에 따라 감압 하에서 용매를 증류시킨 후, 여과, 관 크로마토그래피, 재결정 등의 통상의 방법을 통하여 목적물을 분리 정제할 수 있다.All of the reactions are completed by confirming that all starting materials have been consumed through TLC or the like. When the reaction is completed, the solvent may be distilled under reduced pressure as necessary, and then the target product may be separated and purified through conventional methods such as filtration, tube chromatography, and recrystallization.
본 발명의 금속 착화합물은 더욱 구체적으로 하기 화학식 2로 표시된다.The metal complex compound of the present invention is more specifically represented by the following formula (2).
[화학식 2][Formula 2]
(상기 화학식 2에서, (In the formula 2,
M은 주기율표상 2족, 6족, 8족, 9족, 10족, 11족 또는 12족 2가 금속이고;M is a Group 2, 6, 8, 9, 10, 11 or 12 divalent metal on the periodic table;
R1 및 R2는 각각 독립적으로 수소, C1-C10알킬, 할로겐 또는 나이트로이고;R 1 and R 2 are each independently hydrogen, C 1 -C 10 alkyl, halogen or nitro;
R3 및 R4는 각각 독립적으로 수소, C1-C10알킬, 할로C1-C10알킬 또는 C6-C20아릴이거나, 상기 R3과 R4는 서로 연결되어 고리를 형성할 수 있다.)R 3 and R 4 are each independently hydrogen, C 1 -C 10 alkyl, halo C 1 -C 10 alkyl or C 6 -C 20 aryl, or R 3 and R 4 may be connected to each other to form a ring.)
본 발명의 일실시예에 따른 리간드 화합물에 있어서, 상기 M은 Mg2 +, Cr2 +, Fe2+, Co2 +, Ni2 +, Cu2 +, 또는 Zn2 +이고; R1은 수소, C1-C7알킬 또는 할로겐이고; R2는 수소 또는 나이트로이고; R3 및 R4는 각각 독립적으로 C1-C7알킬, 할로C1-C7알킬 또는 C6-C12아릴이거나, 상기 R3과 R4는 C2-C7알킬렌으로 연결되어 지환족 고리를 형성할 수 있다.In the ligand compound according to an embodiment of the present invention, the M is Mg 2 + , Cr 2 + , Fe 2+ , Co 2 + , Ni 2 + , Cu 2 + , or Zn 2 + ; R 1 is hydrogen, C1-C7 alkyl or halogen; R 2 is hydrogen or nitro; R 3 and R 4 are each independently C 1 -C 7 alkyl, halo C 1 -C 7 alkyl or C 6 -C 12 aryl, or R 3 and R 4 may be connected to C 2 -C 7 alkylene to form an alicyclic ring.
본 발명의 일실시예에 따른 리간드 화합물에 있어서, 상기 화학식 1의 리간드 화합물은 하기 구조로부터 선택될 수 있으나, 이에 한정이 있는 것은 아니다: In the ligand compound according to an embodiment of the present invention, the ligand compound of Formula 1 may be selected from the following structures, but is not limited thereto:
(상기 M은 Mg2 +, Cr2 +, Fe2 +, Co2 +, Ni2 +, Cu2 + 또는 Zn2 +이고; R1은 C1-C4알킬 또는 할로겐, 보다 바람직하게는 메틸, 부틸 또는 클로로이고; R3 및 R4는 각각 독립적으로 C1-C4알킬, 할로C1-C4알킬 또는 C6-C12아릴, 보다 바람직하게는 메틸, 에틸, 프로필, 부틸, 트리플루오로메틸 또는 페닐이다.)(Wherein M is Mg 2 +, Cr 2 +, Fe 2 +, Co 2 +, Ni 2 +, Cu 2 + or Zn 2 + a; R 1 is C1-C4 alkyl or halogen, more preferably methyl, butyl Or chloro; R 3 and R 4 are each independently C 1 -C 4 alkyl, halo C 1 -C 4 alkyl or C 6 -C 12 aryl, more preferably methyl, ethyl, propyl, butyl, trifluoromethyl or phenyl.)
상기 화학식 2의 금속 착화합물은 상기 화학식 1의 리간드 화합물과 금속 아세테이트, 즉 M(OAc)2를 반응시켜 제조될 수 있으며, 상기 M은 주기율표상 2족, 6족, 8족, 9족, 10족, 11족 또는 12족 2가 금속이다.The metal complex compound of Formula 2 may be prepared by reacting the ligand compound of Formula 1 with a metal acetate, that is, M (OAc) 2 , wherein M is a Group 2, 6, 8, 9, or 10 periodic table. , Group 11 or 12 is a divalent metal.
또한, 본 발명은 상기 금속 착화합물을 촉매로 하여 이산화탄소와 알킬렌 옥사이드를 반응시켜 고리형 카보네이트를 제조하는 방법을 제공하는 것으로, 반응물인 알킬렌 옥사이드는 화합물 구조 내에 하나 이상의 에폭사이드를 포함하며, 이산화탄소와 반응 시 모든 에폭사이드가 반응하여 고리형 카보네이트를 형성할 수 있다.In addition, the present invention provides a method for preparing a cyclic carbonate by reacting carbon dioxide and alkylene oxide using the metal complex compound as a catalyst, and the reactant alkylene oxide includes one or more epoxides in the compound structure, and carbon dioxide When reacting with all epoxides can react to form cyclic carbonates.
본 발명의 일실시예에 있어서, 상기 금속 착화합물은 상기 화학식 2의 금속 착화합물일 수 있다.In one embodiment of the present invention, the metal complex compound may be a metal complex compound of Formula 2.
더욱 상세하게는 상기 화학식 2의 금속 착화합물을 촉매로 하여 이산화탄소와 하기 화학식 3으로 표시되는 알킬렌 옥사이드를 반응시켜 하기 화학식 4로 표시되는 고리형 카보네이트를 제조하는 방법을 제공한다.More specifically, a method for preparing a cyclic carbonate represented by the following Chemical Formula 4 is provided by reacting carbon dioxide and an alkylene oxide represented by the following Chemical Formula 3 using the metal complex compound of the Chemical Formula 2 as a catalyst.
[화학식 3][Formula 3]
[화학식 4][Formula 4]
(상기 화학식 3 및 4에서, (In the formulas 3 and 4,
Ra 및 Rb는 각각 독립적으로 수소, C1-C10알킬 또는 C6-C20아릴이거나, Ra와 Rb는 융합고리를 포함하거나 포함하지 않는 C3-C7알킬렌으로 연결되어 고리를 형성할 수 있다.)R a and R b are each independently hydrogen, C 1 -C 10 alkyl or C 6 -C 20 aryl, or R a and R b may be linked by C 3 -C 7 alkylene with or without fused rings to form a ring. .)
본 발명의 일 실시예에 따른 고리형 카보네이트의 제조방법에 있어서, 상기 화학식 3으로 표시되는 알킬렌 옥사이드는 구체적으로 하기 구조로부터 선택될 수 있으나, 이에 한정되는 것은 아니다.In the method for producing a cyclic carbonate according to an embodiment of the present invention, the alkylene oxide represented by Chemical Formula 3 may be specifically selected from the following structures, but is not limited thereto.
(상기 Rb는 C1-C7알킬 또는 C6-C12아릴이다.)(The above R b is C1-C7 alkyl or C6-C12 aryl.)
본 발명의 일 실시예에 따른 고리형 카보네이트의 제조방법에 있어서, 상기 화학식 2의 금속 착화합물의 사용량은 특별히 제한되지는 않지만, 상기 화학식 3의 알킬렌 옥사이드에 대해 0.05 내지 1.0 몰%, 보다 바람직하게는 0.1 내지 1.0 몰%로 사용될 수 있다. 상기 범위 내에서 적절한 반응속도와 선택성을 나타낼 수 있다. In the method for producing a cyclic carbonate according to an embodiment of the present invention, the amount of the metal complex compound of Formula 2 is not particularly limited, but 0.05 to 1.0 mol%, more preferably, with respect to the alkylene oxide of Formula 3 Can be used in 0.1 to 1.0 mol%. Appropriate reaction rates and selectivity can be exhibited within the above range.
본 발명의 일 실시예에 따른 고리형 카보네이트의 제조방법에 있어서, 향상된 반응속도 및 고수율을 위해 암모늄계 또는 아민계 조촉매를 더 포함할 수 있으며, 상기 암모늄계 또는 아민계 조촉매는 상기 화학식 3의 알킬렌 옥사이드에 대해 0.1 내지 5.0 몰%, 좋게는 0.3 내지 1.0 몰%, 보다 좋게는 0.3 내지 0.5 몰%로 사용될 수 있다. 상기 암모늄계 조촉매로는 지방족 아민염, 방향족 아민염 또는 헤테로방향족 아민염을 사용할 수 있으며, 구체적으로는 테트라부틸암모늄 브로마이드(NBu4Br), 테트라메틸암모늄 브로마이드(NMe4Br), 테트라에틸암모늄 테트라플루오로보레이트(NEt4BF4), 테트라프로필암모늄 브로마이드(NPr4Br), 테트라헥실암모늄 클로라이드(N[(CH2)5CH3]4Cl), 테트라펜틸암모늄 브로마이드(N[(CH2)4CH3]4Br), 테트라헵틸암모늄 브로마이드(N[(CH2)6CH3]4Br), 테트라옥틸암모늄 브로마이드(N[CH2)7CH3]4Br), 트리메틸도데실암모늄 클로라이드(CH3(CH2)11N(CH3)3Cl), 트리메틸테트라데실암모늄 브로마이드(CH3(CH2)13N(CH3)3Br), 트리메틸헥사데실암모늄 클로라이드(CH3(CH2)15N(CH3)3Cl), 메틸트리옥틸암모늄 클로라이드(CH3N[(CH2)7CH3]3Cl), 테트라부틸암모늄 플루오라이드(NBu4F), 테트라부틸암모늄 클로라이드(NBu4Cl), 테트라부틸암모늄 아이오다이드(NBu4I), 1-부틸-3-메틸이미다졸륨 브로마이드([bmim]Br), 1-부틸-3-메틸이미다졸륨 클로라이드([bmim]Cl), 비스(트리페닐포스핀)이미늄 클로라이드([((C6H5)3P)2N]Cl, PPNCl) 로 이루어진 군으로부터 선택될 수 있으며, 상기 아민계 조촉매는 구체적으로 트리에틸아민(Et3N), 1,8-디아자바이사이클로운데-7-킨(DBU), 피리딘(C5H5N) 및 4-디메틸아미노피리딘(C7H10N2, DMAP)로 이루어진 군으로부터 선택될 수 있으며, 상기 조촉매로 테트라부틸암모늄 브로마이드(NBu4Br)를 사용하는 것이 바람직하다.In the method for producing a cyclic carbonate according to an embodiment of the present invention, an ammonium-based or amine-based cocatalyst may be further included for improved reaction rate and high yield. 0.1 to 5.0 mol%, preferably 0.3 to 1.0 mol%, more preferably 0.3 to 0.5 mol%, relative to the alkylene oxide of 3. As the ammonium-based cocatalyst, an aliphatic amine salt, an aromatic amine salt or a heteroaromatic amine salt can be used, and specifically, tetrabutylammonium bromide (NBu 4 Br), tetramethylammonium bromide (NMe 4 Br), tetraethylammonium Tetrafluoroborate (NEt 4 BF4), tetrapropylammonium bromide (NPr 4 Br), tetrahexylammonium chloride (N [(CH 2 ) 5 CH 3 ] 4 Cl), tetrapentylammonium bromide (N [(CH 2 ) 4 CH 3 ] 4 Br), tetraheptylammonium bromide (N [(CH 2 ) 6 CH 3 ] 4 Br), tetraoctylammonium bromide (N [CH 2 ) 7 CH 3 ] 4 Br), trimethyldodecylammonium chloride (CH 3 (CH 2 ) 11 N (CH 3 ) 3 Cl), trimethyltetradecylammonium bromide (CH 3 (CH 2 ) 13 N (CH 3 ) 3 Br), trimethylhexadecylammonium chloride (CH 3 (CH 2 ) 15 N (CH 3) 3 Cl), methyl trioctyl ammonium chloride (CH 3 N [(CH 2 ) 7 CH 3] 3 Cl), tetrabutyl ammonium Fluoride (NBu 4 F), tetrabutylammonium chloride (NBu 4 Cl), tetrabutylammonium iodide (NBu 4 I), 1- butyl-3-methylimidazolium bromide ([bmim] Br), 1- Butyl-3-methylimidazolium chloride ([bmim] Cl), bis (triphenylphosphine) iminium chloride ([((C 6 H 5 ) 3 P) 2 N] Cl, PPNCl) The amine-based cocatalyst may be specifically triethylamine (Et 3 N), 1,8-diazabicyclone-7-kin (DBU), pyridine (C 5 H 5 N) and 4-dimethylamino It may be selected from the group consisting of pyridine (C 7 H 10 N 2 , DMAP), it is preferable to use tetrabutylammonium bromide (NBu 4 Br) as the cocatalyst.
본 발명의 일 실시예에 따른 고리형 카보네이트의 제조방법에 있어서, 상기 반응 온도는 40 내지 100℃가 바람직하고, 반응온도가 너무 낮으면 반응속도가 느려지고, 반응온도가 너무 높으면 원료인 알킬렌 옥사이드가 분해되어 최종 수율이 저하될 수 있다. 또한, 상기 반응에서 이산화탄소는 1 내지 10 bar의 압력으로 반응기에 공급된다. 반응 압력이 1 bar 미만이면 반응속도가 현저히 느려지고, 10bar 초과하면 반응속도의 증진 효과가 없으므로 비경제적이다.In the method for preparing a cyclic carbonate according to an embodiment of the present invention, the reaction temperature is preferably 40 to 100 ° C, and if the reaction temperature is too low, the reaction rate becomes slow, and if the reaction temperature is too high, the raw material alkylene oxide May decompose and the final yield may deteriorate. In addition, carbon dioxide in the reaction is supplied to the reactor at a pressure of 1 to 10 bar. If the reaction pressure is less than 1 bar, the reaction rate becomes significantly slower, and if it exceeds 10 bar, there is no effect of enhancing the reaction rate, which is uneconomical.
본 발명의 일 실시예에 따른 고리형 카보네이트의 제조방법에 있어서, 상기 반응은 유기 용매 하에서 또는 니트(neat)로도 이루어질 수 있다. 니트(neat)라 함은 유기 용매를 사용하지 않고 이산화탄소와 알킬렌카보네이트를 반응시키는 것이다. 경우에 따라 급격한 발열을 방지하기 위하여 유기 용매를 사용할 수 있다. 사용가능한 유기용매로는 당해 분야에서 통상 사용되는 용매면 채용가능하다. 예를 들면, 메틸렌 클로라이드, 클로로포름, 에틸아세테이트, tert-메틸부틸에테르, 톨루엔, 이소프로필알코올, 다이옥산, 아세토나이트릴, 알킬렌 카보네이트 등의 유기 용매가 사용가능하나, 이것에 제한되는 것은 아니다.In the method for preparing a cyclic carbonate according to an embodiment of the present invention, the reaction may be carried out under an organic solvent or in a neat. Neat is to react carbon dioxide and alkylene carbonate without using an organic solvent. In some cases, an organic solvent may be used to prevent rapid heat generation. As the usable organic solvent, a solvent surface commonly used in the art may be employed. For example, organic solvents such as methylene chloride, chloroform, ethyl acetate, tert-methylbutyl ether, toluene, isopropyl alcohol, dioxane, acetonitrile, and alkylene carbonate can be used, but are not limited thereto.
이하, 실시예를 통하여 본 발명의 구성을 보다 구체적으로 설명하지만, 하기의 실시예들은 본 발명에 대한 이해를 돕기 위한 것으로서, 본 발명의 범위가 여기에 국한된 것은 아니다.Hereinafter, the configuration of the present invention will be described in more detail through examples, but the following examples are provided to help understanding of the present invention, and the scope of the present invention is not limited thereto.
상업적으로 이용가능한 시약 및 이산화탄소(99.99 %)는 추가적인 정제 또는 건조 없이 사용하였다. 모든 반응은 150 ml 스테인리스 스틸 반응기(bomb reactor)에서 수행하였다.Commercially available reagents and carbon dioxide (99.99%) were used without further purification or drying. All reactions were carried out in a 150 ml stainless steel reactor (bomb reactor).
[실시예 1 내지 5] 리간드 1a 내지 1e의 제조[Examples 1 to 5] Preparation of ligands 1a to 1e
화합물 C의 제조Preparation of compound C
250 mL 둥근바닥플라스크에 2,2-비스(4-하이드로페닐)프로페인 (화합물 A) (3.00 g, 13 mmol)과 헥사메틸렌테트라아민 (HMTA, 화합물 B) (73,7 g, 526 mmol)을 넣고 삼불화초산 (TFA) (100 mL)을 아이스배스(ice bath)에서 교반하며 천천히 가하였다. 아이스배스를 제거한 후 질소 대기 하, 7일간 110 ℃에서 환류시켰다. 반응 종결 후 4 M 염산 수용액 (600 mL)을 가한 후 이틀동안 교반한다 생성된 옅은 노란색의 침전을 클로로폼에 녹인 후 감압 여과하여 녹지 않는 불순물을 제거하였다. 여액을 취하여 클로로폼을 증발시켜 생성된 노란색의 침전을 메틸렌클로라이드에 녹인 후, 에틸아세테이트를 전개액으로 하여 컬럼 크로마토그래피로 정제하여 표제 화합물인 화합물 C를 수득하였다(수득량 : 1.40 g, 수율 : 31.3 %).2,2-bis (4-hydrophenyl) propane (Compound A) (3.00 g, 13 mmol) and hexamethylenetetraamine (HMTA, Compound B) (73,7 g, 526 mmol) in a 250 mL round bottom flask Was added and trifluoroacetic acid (TFA) (100 mL) was slowly added while stirring in an ice bath. After removing the ice bath, it was refluxed at 110 ° C. under nitrogen atmosphere for 7 days. After completion of the reaction, 4 M hydrochloric acid aqueous solution (600 mL) was added and stirred for 2 days. The resulting pale yellow precipitate was dissolved in chloroform and filtered under reduced pressure to remove insoluble impurities. The filtrate was taken and the yellow precipitate produced by evaporating chloroform was dissolved in methylene chloride, and purified by column chromatography using ethyl acetate as a developing solution to obtain the title compound C (yield: 1.40 g, yield: 31.3%).
1H NMR (300 MHz, CDCl3-d1) ; δ 1.77 (s, 6H), 7.83 (s, 2H), 10.22 (s, 4H), 11.56 (s, 2H). 1 H NMR (300 MHz, CDCl 3 -d 1 ); δ 1.77 (s, 6H), 7.83 (s, 2H), 10.22 (s, 4H), 11.56 (s, 2H).
리간드 1a의 제조 (Preparation of ligand 1a ( 실시예Example 1) One)
100 mL 비커에 화합물 C (1 g, 2.94 mmol)와 메탄올 (50 mL)을 넣고 상온에서 교반해주면서, 메탄올 (50 mL)에 용해된 2-아미노페놀 (화합물 Da, 1.35 g, 11.7 mmol, 4 equiv.)을 가하였다. 하루동안 교반한 뒤 짙은 빨간색 침전물을 여과하고 메탄올로 씻어 짙은 빨간색 고체로 표제 화합물인 리간드 1a을 수득하였다(수득량 : 1. 80 g, 수율 : 87 %).In a 100 mL beaker, add compound C (1 g, 2.94 mmol) and methanol (50 mL) and stir at room temperature, 2-aminophenol dissolved in methanol (50 mL) (Compound Da, 1.35 g, 11.7 mmol, 4 equiv) .) Was added. After stirring for one day, the dark red precipitate was filtered and washed with methanol to obtain the title compound, ligand 1a, as a dark red solid (yield: 1. 80 g, yield: 87%).
1H NMR (300 MHz, DMSO-d6) : δ 1.82 (s, 6H), 6.85 (t, 4H), 6.93 (d, 4H), 7.10 (t, 4H), 7.30 (d, 4H), 7.98 (s, 4H), 9.07 (s, 4H), 9.49 (br, 4H), 15.26 (br, 2H) 1 H NMR (300 MHz, DMSO-d 6 ): δ 1.82 (s, 6H), 6.85 (t, 4H), 6.93 (d, 4H), 7.10 (t, 4H), 7.30 (d, 4H), 7.98 (s, 4H), 9.07 (s, 4H), 9.49 (br, 4H), 15.26 (br, 2H)
리간드 1b의 제조 (Preparation of ligand 1b ( 실시예Example 2) 2)
2-아미노페놀(화합물 Da) 대신에 2-아미노-4-메틸페놀 (화합물 Db, 11.7 mmol, 4 equiv.)를 사용하는 것을 제외하고는 실시예 1의 리간드 1a의 제조 방법과 동일한 방법으로 반응시켜 리간드 1b를 수득하였다(갈색 고체, 수율 : 83 %).The reaction was carried out in the same manner as in the preparation of ligand 1a of Example 1, except that 2-amino-4-methylphenol (Compound Db, 11.7 mmol, 4 equiv.) Was used instead of 2-aminophenol (Compound Da). To give ligand 1b (brown solid, yield: 83%).
1H NMR (300 MHz, DMSO-d6) : δ 1.81 (s, 6H), 2.24 (s, 12H), 6.82 (d, 4H), 6.90 (d, 4H), 7.13 (s, 4H), 7.97 (s, 4H), 9.06 (s, 4H), 9.23 (br, 4H), 15.29 (br, 2H) 1 H NMR (300 MHz, DMSO-d 6 ): δ 1.81 (s, 6H), 2.24 (s, 12H), 6.82 (d, 4H), 6.90 (d, 4H), 7.13 (s, 4H), 7.97 (s, 4H), 9.06 (s, 4H), 9.23 (br, 4H), 15.29 (br, 2H)
리간드 1c의 제조 (Preparation of ligand 1c ( 실시예Example 3) 3)
2-아미노페놀(화합물 Da) 대신에 2-아미노-4-t-부틸페놀 (화합물 Dc, 11.7 mmol, 4 equiv.)를 사용하는 것을 제외하고는 실시예 1의 리간드 1a의 제조 방법과 동일한 방법으로 반응시켜 리간드 1c를 수득하였다(짙은갈색 고체, 수율 : 80 %).The same method as in Preparation of Ligand 1a of Example 1, except that 2-amino-4-t-butylphenol (Compound Dc, 11.7 mmol, 4 equiv.) Was used instead of 2-aminophenol (Compound Da). Reaction was carried out to obtain ligand 1c (dark brown solid, yield: 80%).
1H NMR (300 MHz, DMSO-d6) : δ 1.27 (s, 36H), 1.88 (s, 6H), 6.55 (d, 4H), 7.02 (d, 4H), 7.53 (s, 4H), 7.78 (s, 4H), 8.97 (s, 4H), 9.73 (br, 4H), 14.89 (br, 2H) 1 H NMR (300 MHz, DMSO-d 6 ): δ 1.27 (s, 36H), 1.88 (s, 6H), 6.55 (d, 4H), 7.02 (d, 4H), 7.53 (s, 4H), 7.78 (s, 4H), 8.97 (s, 4H), 9.73 (br, 4H), 14.89 (br, 2H)
리간드 1d의 제조 (Preparation of ligand 1d ( 실시예Example 4) 4)
2-아미노페놀(화합물 Da) 대신에 2-아미노-4-클로로페놀 (화합물 Dd, 11.7 mmol, 4 equiv.)를 사용하는 것을 제외하고는 실시예 1의 리간드 1a의 제조 방법과 동일한 방법으로 반응시켜 리간드 1d를 수득하였다(갈색 고체, 수율 : 35 %).The reaction was carried out in the same manner as in the preparation of ligand 1a in Example 1, except that 2-amino-4-chlorophenol (Compound Dd, 11.7 mmol, 4 equiv.) Was used instead of 2-aminophenol (Compound Da). To give ligand 1d (brown solid, yield: 35%).
1H NMR (300 MHz, DMSO-d6) : δ 1.73 (s, 6H), 6.94 (d, 4H), 7.13 (d, 4H), 7.38 (s, 4H), 7.98 (s, 4H), 9.06 (s, 4H), 9.83 (br, 4H), 14.89 (br, 2H) 1 H NMR (300 MHz, DMSO-d 6 ): δ 1.73 (s, 6H), 6.94 (d, 4H), 7.13 (d, 4H), 7.38 (s, 4H), 7.98 (s, 4H), 9.06 (s, 4H), 9.83 (br, 4H), 14.89 (br, 2H)
리간드 1e의 제조 (Preparation of Ligand 1e ( 실시예Example 5) 5)
2-아미노페놀(화합물 Da) 대신에 2-아미노-5-나이트로페놀 (화합물 De, 11.7 mmol, 4 equiv.)를 사용하는 것을 제외하고는 실시예 1의 리간드 1a의 제조 방법과 동일한 방법으로 반응시켜 리간드 1e를 수득하였다(갈색 고체, 수율 : 10 %).Except for using 2-amino-5-nitrophenol (Compound De, 11.7 mmol, 4 equiv.) Instead of 2-aminophenol (Compound Da), in the same manner as in Preparation of Ligand 1a of Example 1. Reaction gave ligand 1e (brown solid, yield: 10%).
1H NMR (300 MHz, DMSO-d6) : δ 1.73 (s, 6H), 7.23 (d, 4H), 7.32 (d, 4H), 7.76 (s, 4H), 7.86 (s, 4H), 9.18 (s, 4H), 9.83 (br, 4H), 14.89 (br, 2H) 1 H NMR (300 MHz, DMSO-d 6 ): δ 1.73 (s, 6H), 7.23 (d, 4H), 7.32 (d, 4H), 7.76 (s, 4H), 7.86 (s, 4H), 9.18 (s, 4H), 9.83 (br, 4H), 14.89 (br, 2H)
금속 착화합물 Zn-1a, Zn-1b, Zn-1c, Zn-1d 및 Zn-1e의 제조Preparation of metal complex compounds Zn-1a, Zn-1b, Zn-1c, Zn-1d and Zn-1e
[실시예 6] 금속 착화합물 Zn-1a의 제조[Example 6] Preparation of metal complex compound Zn-1a
메탄올 (20 mL)에 용해된 Zn(OAc)2 (312 mg, 1.70 mmol, 4 equiv.)을 리간드 1a (300 mg, 0.42 mmol)와 THF (20 mL)의 혼합물에 가한 다음, 3시간동안 교반하였다. 교반이 끝난 후 생성된 주황색 고체를 여과하고 THF와 메탄올로 씻어 표제 화합물인 금속 착화합물 Zn-1a를 수득하였다(수율 : 89 %).Zn (OAc) 2 (312 mg, 1.70 mmol, 4 equiv.) Dissolved in methanol (20 mL) was added to a mixture of ligand 1a (300 mg, 0.42 mmol) and THF (20 mL), followed by stirring for 3 hours. Did. After the stirring was completed, the resulting orange solid was filtered and washed with THF and methanol to obtain the metal complex Zn-1a as the title compound (yield: 89%).
1H NMR (300 MHz, DMSO-d6) : δ 1.77 (s, 6H), 1.89 (s, 6H), 6.37 (t, 4H), 6.60 (d, 4H), 6.96 (t, 4H), 7.55 (d, 4H), 7.72 (s, 4H), 8.97 (s, 4H); 엑스선 회절을 통한 구조 분석에 필요한 결정은 Zn-1a의 포화 피리딘 용액에 펜테인(Pentane)을 천천히 확산시켜주어 얻었다[도 1]. 1 H NMR (300 MHz, DMSO-d 6 ): δ 1.77 (s, 6H), 1.89 (s, 6H), 6.37 (t, 4H), 6.60 (d, 4H), 6.96 (t, 4H), 7.55 (d, 4H), 7.72 (s, 4H), 8.97 (s, 4H); Crystals required for structural analysis through X-ray diffraction were obtained by slowly diffusing pentane into a saturated pyridine solution of Zn-1a [FIG. 1].
[실시예 7] 금속 착화합물 Zn-1b의 제조[Example 7] Preparation of metal complex compound Zn-1b
리간드 1a 대신에 리간드 1b (0.42 mmol)를 사용하는 것을 제외하고는 실시예 6의 금속 착화합물 Zn-1a의 제조 방법과 동일한 방법으로 반응시켜 금속 착화합물 Zn-1b를 수득하였다(수율 : 87 %).The metal complex compound Zn-1b was obtained by reacting in the same manner as in the method for preparing the metal complex compound Zn-1a of Example 6, except that ligand 1b (0.42 mmol) was used instead of the ligand 1a (yield: 87%).
1H NMR (300 MHz, DMSO-d6) : δ 1.76 (s, 6H), 1.90 (s, 6H), 2.17 (s, 12H), 6.54 (d, 4H), 6.81 (d, 4H), 7.40 (s, 4H), 7.73 (s, 4H), 8.94 (s, 4H) 1 H NMR (300 MHz, DMSO-d 6 ): δ 1.76 (s, 6H), 1.90 (s, 6H), 2.17 (s, 12H), 6.54 (d, 4H), 6.81 (d, 4H), 7.40 (s, 4H), 7.73 (s, 4H), 8.94 (s, 4H)
[실시예 8] 금속 착화합물 Zn-1c의 제조[Example 8] Preparation of metal complex compound Zn-1c
리간드 1a 대신에 리간드 1c (0.42 mmol)를 사용하는 것을 제외하고는 실시예 6의 금속 착화합물 Zn-1a의 제조 방법과 동일한 방법으로 반응시켜 금속 착화합물 Zn-1c를 수득하였다(수율 : 81 %).The metal complex compound Zn-1c was obtained by reacting in the same manner as the method for preparing the metal complex compound Zn-1a of Example 6, except that ligand 1c (0.42 mmol) was used instead of the ligand 1a (yield: 81%).
1H NMR (300 MHz, DMSO-d6) : δ 1.27 (s, 36H), 1.83 (s, 6H), 1.88 (s, 6H), 6.56 (d, 4H), 7.03 (d, 4H), 7.54 (s, 4H), 7.78 (s, 4H), 8.97 (s, 4H) 1 H NMR (300 MHz, DMSO-d 6 ): δ 1.27 (s, 36H), 1.83 (s, 6H), 1.88 (s, 6H), 6.56 (d, 4H), 7.03 (d, 4H), 7.54 (s, 4H), 7.78 (s, 4H), 8.97 (s, 4H)
[실시예 9] 금속 착화합물 Zn-1d의 제조[Example 9] Preparation of metal complex compound Zn-1d
리간드 1a 대신에 리간드 1d (0.42 mmol)를 사용하는 것을 제외하고는 실시예 6의 금속 착화합물 Zn-1a의 제조 방법과 동일한 방법으로 반응시켜 금속 착화합물 Zn-1d를 수득하였다(수율 : 85 %).The metal complex compound Zn-1d was obtained by reacting in the same manner as the method for preparing the metal complex compound Zn-1a of Example 6, except that ligand 1d (0.42 mmol) was used instead of the ligand 1a (yield: 85%).
1H NMR (300 MHz, DMSO-d6) : δ 1.76 (s, 6H), 1.88 (s, 6H), 6.57 (d, 4H), 6.94 (d, 4H), 7.64 (s, 4H), 7.78 (s, 4H), 9.01 (s, 4H) 1 H NMR (300 MHz, DMSO-d 6 ): δ 1.76 (s, 6H), 1.88 (s, 6H), 6.57 (d, 4H), 6.94 (d, 4H), 7.64 (s, 4H), 7.78 (s, 4H), 9.01 (s, 4H)
[실시예 10] 금속 착화합물 Zn-1e의 제조[Example 10] Preparation of metal complex compound Zn-1e
리간드 1a 대신에 리간드 1e (0.42 mmol)를 사용하는 것을 제외하고는 실시예 6의 금속 착화합물 Zn-1a의 제조 방법과 동일한 방법으로 반응시켜 금속 착화합물 Zn-1e를 수득하였다(수율 : 25 %).The metal complex compound Zn-1e was obtained by reacting in the same manner as in the method for preparing the metal complex compound Zn-1a of Example 6, except that ligand 1e (0.42 mmol) was used instead of the ligand 1a (yield: 25%).
1H NMR (300 MHz, DMSO-d6) : δ 1.75 (s, 6H), 1.88 (s, 6H), 7.26 (d, 4H), 7.30 (s, 4H), 7.76 (d, 4H), 7.86 (s, 4H), 9.17 (s, 4H) 1 H NMR (300 MHz, DMSO-d 6 ): δ 1.75 (s, 6H), 1.88 (s, 6H), 7.26 (d, 4H), 7.30 (s, 4H), 7.76 (d, 4H), 7.86 (s, 4H), 9.17 (s, 4H)
[실시예 11] 이산화탄소와 프로필렌 옥사이드를 이용한 고리형 카보네이트의 제조[Example 11] Preparation of cyclic carbonate using carbon dioxide and propylene oxide
150 mL 테플론 용기에 금속 착화합물 촉매 (0.1 몰%), 테트라부틸암모늄브로마이드 (NBu4Br, TBAB, 0.4 몰%), 프로필렌 옥사이드 (3.24 mL, 52.02 mmol)를 투입하였다. 상기 테플론 용기를 스테인리스 스틸 반응기(bomb reactor)에 넣고, 상기 반응기에 5 bar의 CO2를 채우고 비워주는 과정을 진행한 후 최종적으로 10 bar의 CO2를 채워주었다. 그 후 반응기를 잠근 후 하기 표 1에 기재된 온도에서 교반하면서 반응을 진행시켰다. 반응이 완료되면 반응 혼합물의 일부를 떠서 CDCl3에 녹인 후 1H-NMR을 이용하여 분석하여 그 결과를 하기 표 1에 기재하였다.In a 150 mL Teflon container, a metal complex catalyst (0.1 mol%), tetrabutylammonium bromide (NBu 4 Br, TBAB, 0.4 mol%), and propylene oxide (3.24 mL, 52.02 mmol) were added. The Teflon vessel was placed in a stainless steel reactor (bomb reactor), and after the process of filling and emptying 5 bar of CO 2 into the reactor, 10 bar of CO 2 was finally filled. Then, after the reactor was locked, the reaction proceeded with stirring at the temperature shown in Table 1 below. After the reaction was completed, a portion of the reaction mixture was suspended, dissolved in CDCl 3 , and analyzed using 1 H-NMR to show the results in Table 1 below.
하기 표 1에 사용한 촉매, 온도, 반응시간 및 생성물의 전환율을 기재하였다.The catalyst, temperature, reaction time and conversion rate of the product used in Table 1 are described.
[실시예 12] 이산화탄소와 스타이렌 옥사이드(styrene oxide)를 이용한 고리형 카보네이트의 제조[Example 12] Preparation of cyclic carbonate using carbon dioxide and styrene oxide
프로필렌 옥사이드 (3.24 mL)를 사용하는 대신에 스타이렌 옥사이드 (5.96 mL, 52.18 mmol)를 사용하는 것을 제외하고는 프로필렌 옥사이드를 이용한 고리형 카보네이트의 제조하는 것과 동일한 방법으로 반응시켰으며, 그 결과를 하기 표 2에 기재하였다. The reaction was carried out in the same manner as in the preparation of a cyclic carbonate using propylene oxide, except that styrene oxide (5.96 mL, 52.18 mmol) was used instead of propylene oxide (3.24 mL). It is described in Table 2.
[실시예 13] 이산화탄소와 사이클로헥센 옥사이드(cyclohexene oxide)를 이용한 고리형 카보네이트의 제조[Example 13] Preparation of cyclic carbonate using carbon dioxide and cyclohexene oxide
프로필렌 옥사이드 (3.24 mL)를 사용하는 대신에 사이클로헥센 옥사이드 (5.27 mL, 52.19 mmol)를 사용하는 것을 제외하고는 프로필렌 옥사이드를 이용한 고리형 카보네이트의 제조하는 것과 동일한 방법으로 반응시켰으며, 그 결과를 하기 표 3에 기재하였다. The reaction was carried out in the same manner as in the preparation of a cyclic carbonate using propylene oxide, except that cyclohexene oxide (5.27 mL, 52.19 mmol) was used instead of propylene oxide (3.24 mL). It is listed in Table 3.
이상의 결과로부터, 이산화탄소와 다양한 구조의 에폭사이드 화합물을 이용한 고리형 카보네이트의 제조시, 본 발명의 금속 착화합물을 촉매로 사용하는 경우 50% 이상의 높은 전환율로 고리형 카보네이트를 제조하는 것을 알 수 있었다.From the above results, it was found that when producing the cyclic carbonate using carbon dioxide and the epoxide compound of various structures, when the metal complex compound of the present invention was used as a catalyst, the cyclic carbonate was produced with a high conversion rate of 50% or more.
Claims (15)
[화학식 1]
(상기 화학식 1에서,
R1은 수소, C1-C10알킬 또는 할로겐이고;
R2는 수소 또는 나이트로이고;
R3 및 R4는 각각 독립적으로 수소 또는 C1-C10알킬이다.)A metal complex containing a ligand represented by Formula 1 and a Group 2, 11 or 12 divalent metal on the periodic table:
[Formula 1]
(In the formula 1,
R 1 is hydrogen, C1-C10 alkyl or halogen;
R 2 is hydrogen or nitro;
R 3 and R 4 are each independently hydrogen or C1-C10 alkyl.)
상기 금속 착화합물은 하기 화학식 2로 표시되는 것을 특징으로 하는 금속 착화합물:
[화학식 2]
(상기 화학식 2에서,
M은 주기율표상 2족, 11족 또는 12족 2가 금속이고;
R1은 수소, C1-C10알킬 또는 할로겐이고;
R2는 수소 또는 나이트로이고;
R3 및 R4는 각각 독립적으로 수소 또는 C1-C10알킬이다.)According to claim 1,
The metal complex compound is a metal complex compound represented by the following formula (2):
[Formula 2]
(In the formula 2,
M is a Group 2, 11 or 12 divalent metal on the periodic table;
R 1 is hydrogen, C1-C10 alkyl or halogen;
R 2 is hydrogen or nitro;
R 3 and R 4 are each independently hydrogen or C1-C10 alkyl.)
상기 M은 Mg2+, Cu2+, 또는 Zn2+이고; R1은 수소, C1-C7알킬 또는 할로겐이고; R2는 수소 또는 나이트로이고; R3 및 R4는 각각 독립적으로 C1-C7알킬인, 금속 착화합물.According to claim 2,
M is Mg 2+ , Cu 2+ , or Zn 2+ ; R 1 is hydrogen, C1-C7 alkyl or halogen; R 2 is hydrogen or nitro; R 3 and R 4 are each independently C1-C7 alkyl, a metal complex.
하기 화합물들로부터 선택되는 금속 착화합물.
(상기 M은 Mg2+, Cu2+ 또는 Zn2+이고;
R1은 C1-C4알킬 또는 할로겐이고;
R3 및 R4는 각각 독립적으로 C1-C4알킬이다.)According to claim 3,
A metal complex compound selected from the following compounds.
(M is Mg 2+ , Cu 2+ or Zn 2+ ;
R 1 is C1-C4 alkyl or halogen;
R 3 and R 4 are each independently C1-C4 alkyl.)
[화학식 1]
(상기 화학식 1에서,
R1은 수소, C1-C10알킬 또는 할로겐이고;
R2는 수소 또는 나이트로이고;
R3 및 R4는 각각 독립적으로 수소 또는 C1-C10알킬이다.)Ligand compound represented by the following formula (1).
[Formula 1]
(In the formula 1,
R 1 is hydrogen, C1-C10 alkyl or halogen;
R 2 is hydrogen or nitro;
R 3 and R 4 are each independently hydrogen or C1-C10 alkyl.)
상기 R1은 수소, C1-C7알킬 또는 할로겐이고; R2는 수소 또는 나이트로이고; R3 및 R4는 각각 독립적으로 C1-C7알킬인, 리간드 화합물.The method of claim 5,
R 1 is hydrogen, C 1 -C 7 alkyl or halogen; R 2 is hydrogen or nitro; R 3 and R 4 are each independently C1-C7 alkyl, a ligand compound.
화학식 C의 알데히드 화합물 및 화학식 D의 2-아미노페놀 화합물을 반응시켜 화학식 1의 리간드 화합물을 제조하는 단계;
를 포함하는 화학식 1의 리간드 화합물의 제조방법:
[화학식 1]
[화학식 A]
[화학식 B]
[화학식 C]
[화학식 D]
(상기 화학식 1, A, C 및 D에서,
R1은 수소, C1-C10알킬 또는 할로겐이고;
R2는 수소 또는 나이트로이고;
R3 및 R4는 각각 독립적으로 수소 또는 C1-C10알킬이다.)Preparing a aldehyde compound of formula C by reacting a bis (4-hydroxyphenyl) compound of formula A and a hexamethylenetetraamine of formula B; And
Preparing a ligand compound of Formula 1 by reacting an aldehyde compound of Formula C and a 2-aminophenol compound of Formula D;
Method for preparing a ligand compound of Formula 1 comprising:
[Formula 1]
[Formula A]
[Formula B]
[Chemical Formula C]
[Formula D]
(In the formula 1, A, C and D,
R 1 is hydrogen, C1-C10 alkyl or halogen;
R 2 is hydrogen or nitro;
R 3 and R 4 are each independently hydrogen or C1-C10 alkyl.)
상기 알킬렌 옥사이드는 하기 화학식 3으로 표시되며, 상기 고리형 카보네이트는 하기 화학식 4로 표시되는 제조방법.
[화학식 3]
[화학식 4]
(상기 화학식 3 및 4에서,
Ra 및 Rb는 각각 독립적으로 수소, C1-C10알킬 또는 C6-C20아릴이거나, Ra와 Rb는 융합고리를 포함하거나 포함하지 않는 C3-C7알킬렌으로 연결되어 고리를 형성할 수 있다.)The method of claim 8,
The alkylene oxide is represented by the following formula (3), and the cyclic carbonate is a production method represented by the following formula (4).
[Formula 3]
[Formula 4]
(In the formulas 3 and 4,
R a and R b are each independently hydrogen, C 1 -C 10 alkyl or C 6 -C 20 aryl, or R a and R b may be linked by C 3 -C 7 alkylene with or without fused rings to form a ring. .)
상기 금속 착화합물은 상기 알킬렌 옥사이드에 대해 0.05 내지 1.0 몰%로 사용되는 것을 특징으로 하는 제조방법.The method of claim 8,
The metal complex is a manufacturing method characterized in that it is used in an amount of 0.05 to 1.0 mol% with respect to the alkylene oxide.
암모늄계 조촉매 또는 아민계 조촉매를 더 포함하는 것을 특징으로 하는 제조방법.The method of claim 8,
Production method characterized in that it further comprises an ammonium-based co-catalyst or an amine-based co-catalyst.
상기 암모늄계 조촉매 또는 아민계 조촉매는 상기 알킬렌 옥사이드에 대해 0.1 내지 5.0 몰%로 사용되는 것을 특징으로 하는 제조방법.The method of claim 11,
The ammonium-based co-catalyst or amine-based cocatalyst is a manufacturing method characterized in that it is used in an amount of 0.1 to 5.0 mol% with respect to the alkylene oxide.
상기 암모늄계 조촉매는 테트라부틸암모늄 브로마이드(NBu4Br), 테트라메틸암모늄 브로마이드(NMe4Br), 테트라에틸암모늄 테트라플루오로보레이트(NEt4BF4), 테트라프로필암모늄 브로마이드(NPr4Br), 테트라헥실암모늄 클로라이드(N[(CH2)5CH3]4Cl), 테트라펜틸암모늄 브로마이드(N[(CH2)4CH3]4Br), 테트라헵틸암모늄 브로마이드(N[(CH2)6CH3]4Br), 테트라옥틸암모늄 브로마이드(N[CH2)7CH3]4Br), 트리메틸도데실암모늄 클로라이드(CH3(CH2)11N(CH3)3Cl), 트리메틸테트라데실암모늄 브로마이드(CH3(CH2)13N(CH3)3Br), 트리메틸헥사데실암모늄 클로라이드(CH3(CH2)15N(CH3)3Cl), 메틸트리옥틸암모늄 클로라이드(CH3N[(CH2)7CH3]3Cl), 테트라부틸암모늄 플루오라이드(NBu4F), 테트라부틸암모늄 클로라이드(NBu4Cl), 테트라부틸암모늄 아이오다이드(NBu4I), 1-부틸-3-메틸이미다졸륨 브로마이드([bmim]Br), 1-부틸-3-메틸이미다졸륨 클로라이드([bmim]Cl), 비스(트리페닐포스핀)이미늄 클로라이드([((C6H5)3P)2N]Cl, PPNCl)로 이루어진 군으로부터 선택되는 하나 또는 둘 이상의 혼합물이고, 상기 아민계 조촉매는 트리에틸아민(Et3N), 1,8-디아자바이사이클로운데-7-킨(DBU), 피리딘(C5H5N) 및 4-디메틸아미노피리딘(C7H10N2, DMAP)로 이루어진 군으로부터 선택되는 하나 또는 둘 이상의 혼합물인 것을 특징으로 하는 제조방법.The method of claim 11,
The ammonium-based cocatalyst is tetrabutylammonium bromide (NBu 4 Br), tetramethylammonium bromide (NMe 4 Br), tetraethylammonium tetrafluoroborate (NEt 4 BF4), tetrapropylammonium bromide (NPr 4 Br), tetra Hexylammonium chloride (N [(CH 2 ) 5 CH 3 ] 4 Cl), tetrapentylammonium bromide (N [(CH 2 ) 4 CH 3 ] 4 Br), tetraheptylammonium bromide (N [(CH 2 ) 6 CH 3 ] 4 Br), tetraoctylammonium bromide (N [CH 2 ) 7 CH 3 ] 4 Br), trimethyldodecylammonium chloride (CH 3 (CH 2 ) 11 N (CH 3 ) 3 Cl), trimethyltetradecylammonium Bromide (CH 3 (CH 2 ) 13 N (CH 3 ) 3 Br), trimethylhexadecylammonium chloride (CH 3 (CH 2 ) 15 N (CH 3 ) 3 Cl), methyltrioctylammonium chloride (CH 3 N [ (CH 2 ) 7 CH 3 ] 3 Cl), tetrabutylammonium fluoride (NBu 4 F), tetrabutylammonium chloride (NBu 4 Cl), tetrabutylammonium iodide (NBu 4 I), 1-butyl-3-methylimidazolium bromide ([bmim] Br), 1-butyl-3-methylimidazolium chloride ([bmim] Cl), bis (triphenylphosphine) already One or two or more mixtures selected from the group consisting of nium chloride ([(((C 6 H 5 ) 3 P) 2 N] Cl, PPNCl), wherein the amine-based cocatalyst is triethylamine (Et 3 N), 1 One or more mixtures selected from the group consisting of, 8-diazabicyclone-7-kin (DBU), pyridine (C 5 H 5 N) and 4-dimethylaminopyridine (C 7 H 10 N 2 , DMAP) Manufacturing method characterized in that.
상기 반응 온도는 40 내지 100 ℃이고, 반응 압력은 1 내지 10 bar인 것을 특징으로 하는 제조방법.The method of claim 8,
The reaction temperature is 40 to 100 ℃, the reaction pressure is a production method characterized in that 1 to 10 bar.
상기 반응은 니트(neat) 반응인 것을 특징으로 하는 제조방법.The method of claim 8,
The reaction is a production method characterized in that the neat (neat) reaction.
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