KR102092712B1 - Laser processing apparatus and method - Google Patents

Abstract

The present invention includes a chamber having a space therein, a transmission window installed on one side of the chamber so as to be positioned in the path of the laser beam, and a stage movably installed in the chamber so as to position the substrate in the path of the laser beam, The laser processing apparatus including a suction unit installed between the transmission window and the stage and spaced apart from each other in the moving direction of the stage with a path of the laser beam interposed therebetween, and moving the stage in the process proceeding direction, the The process of irradiating the laser beam to the substrate, while moving the stage in the process progress direction, the process of inhaling foreign matter by using the suction unit installed spaced apart from each other in the process progress direction with the progress path of the laser beam therebetween, the chamber In the laser processing method comprising the step of taking the substrate out, The laser processing apparatus and method are provided that can suppress or prevent the contamination by.

Description

Laser processing apparatus and method

The present invention relates to a laser processing apparatus and method, and more particularly, to a laser processing apparatus and method that can suppress or prevent contamination by foreign matter.

The flexible display is a next-generation display that can be manufactured in various forms because it is thin, light, shock-resistant, and can be folded or bent without loss of function.

Since a substrate for manufacturing a flexible display, such as a PI film, is difficult to handle, in order to manufacture a flexible display, in the state where the PI film is fixed to the carrier glass, various elements or thin films are laminated on the PI film, and then PI in the carrier glass The film must be separated.

A typical laser lift off (LLO) process is a process of separating a thin film formed on a substrate using an excimer laser beam, and performing this process can separate the PI film from the carrier glass during manufacture of a flexible display. have.

On the other hand, during the laser lift-off process, a large amount of fume is generated as a by-product of the chemical action between heat and the substrate by the laser beam in the irradiation section of the excimer laser beam for separation of the thin film or device. A large amount of fume scatters to the top of the substrate and contaminates the interior of the chamber, such as being attached to an optical lens or being fixed to a stage supporting the substrate.

Conventionally, a suction unit is installed in the vicinity of the traveling path of the excimer laser beam to inhale fumes generated during the process. Conventional suction unit is a structure that is connected to a blower and receives suction power, but also sucks fume through a port. In this structure, the suction flow rate and the suction cross-sectional area cannot be sufficiently secured, and the exhaust is not smooth as the pressure decreases from the blower to the port.

Particularly, during the process, the substrate is supported on the stage and moves at high speed, so the suction unit has to handle a large amount of suction flow in a large area on the substrate for a short time. In the conventional suction unit, the substrate is subject to the structural limitations described above. There is a problem that can not be removed by sufficiently inhaling the large amount of fume generated in the.

The technology that is the background of the present invention is published in the following patent documents.

KR 10-2009-0089161 A KR 10-2009-0105423 A KR 10-2011-0111209 A

The present invention provides a laser processing apparatus and method capable of inhaling foreign substances smoothly by utilizing airflow generated inside the chamber.

The present invention provides a laser processing apparatus and method capable of effectively inhaling foreign substances using a Coanda effect.

The present invention provides a laser processing apparatus and method that can suppress or prevent contamination by foreign matter.

The laser processing apparatus according to the embodiment of the present invention includes a chamber having a space therein; A transmission window installed on one side of the chamber so as to be positioned in a path of the laser beam; A stage movably installed in the chamber so as to position the substrate in the path of the laser beam; And a suction unit installed between the transmission window and the stage, wherein the suction unit is installed spaced apart in a moving direction of the stage with a path of the laser beam interposed therebetween.

The suction unit may be formed to control suction power using the Coanda effect.

The stage is movably installed in a direction crossing the progress path of the laser beam, and each suction unit may be installed to face the direction crossing the progress path of the laser beam.

It may include; a control unit for controlling each suction unit to operate alternately according to the moving direction of the stage.

The control unit may be formed to select and operate a preceding suction unit with respect to a direction in which the stage moves.

The suction unit is installed in a direction intersecting the path of the laser beam, the nozzle is formed with a suction port toward the path of the laser beam; It may include; in the direction toward the inside of the nozzle from the inlet, the amplifier is mounted to enable injection of fluid inside the nozzle.

The nozzle, the first suction port is formed on one surface facing the progress path of the laser beam, the second suction port is formed on the lower surface facing the stage, the amplifier, the inside of the nozzle, the laser beam progress path Accordingly, they are spaced apart and respectively mounted in contact with the first suction port, and slits may be formed on each side facing the inside of the nozzle.

The suction unit includes: an exhaust port mounted on the other side of the nozzle facing the first suction port; A first supply port mounted on the side of each amplifier to supply fluid; A second supply port mounted on the exhaust port to eject fluid; It may include a; a deflector that is mounted on the upper surface of one of the amplifier relatively positioned on the lower side, and spaced apart from the lower surface of the other amplifier located on the relatively upper side.

The slit is formed by penetrating one surface of the amplifier in a direction intersecting the progress path of the laser beam, and the lengths of the upper and lower surfaces facing each other spaced apart from each other along the progress path of the laser beam among the inner surfaces may be different. .

A removal unit spaced apart from the suction unit and installed toward the stage; An exhaust unit connected to the suction unit and the removal unit to apply suction force; And a fluid supply unit connected to the suction unit to supply fluid.

The removal unit may include an ultrasonic output port and a suction port on the lower surface.

A laser processing method according to an embodiment of the present invention includes the steps of bringing a substrate into a chamber and providing it on a stage; Moving the stage in a process proceeding direction, and irradiating a laser beam to the substrate; And carrying out the substrate from the chamber; while moving the stage in the process proceeding direction, suck the foreign matter by using the suction unit installed spaced apart from each other in the process proceeding direction with the progress path of the laser beam therebetween. The process can be performed.

After the process of discharging the substrate from the chamber, the stage is moved in the process proceeding direction, the process of irradiating ultrasonic waves to the stage; including, while irradiating ultrasonic waves to the stage, using the suction unit foreign matter Inhalation process; can be performed.

In the process of suctioning the foreign material using the suction unit, after selecting the suction unit having a suction direction corresponding to the airflow generated inside the chamber by the movement of the stage, the selected suction unit is operated to suck the foreign matter. Process; may include.

The process of inhaling foreign substances using the suction unit may include controlling a suction force of the suction unit using a Coanda effect.

The process of controlling the suction force of the suction unit may include, in the direction of suction of the suction unit, increasing a suction force by spraying a fluid inside the suction unit.

The fluid includes compressed air, and the foreign matter may contain fume.

According to the embodiment of the present invention, it is possible to smoothly inhale foreign substances by utilizing the airflow generated inside the chamber, and effectively inhale foreign substances using the Coanda effect. Therefore, it is possible to suppress or prevent contamination of the interior of the chamber by foreign matter.

For example, when applied to a laser lift-off process using an excimer laser beam, each nozzle installed spaced apart in the moving direction of the stage with the traveling path of the excimer laser beam therebetween is operated alternately according to the movement of the stage, and the chamber caused by the movement of the stage It is possible to match the suction direction of the nozzle to the internal air flow. If the suction direction of the nozzle matches the airflow inside the chamber, the airflow inside the chamber blows into the nozzle and pushes the fume toward the nozzle, so the nozzle can suck the fume smoothly. Therefore, the nozzle can smoothly inhale fume by utilizing the air flow inside the chamber.

In addition, as each nozzle alternately operates, compressed air is injected into the working nozzle to increase the suction power of the nozzle to increase the flow rate of the gas sucked into the nozzle several tens of times. That is, it is possible to effectively inhale fume by increasing the suction power of the nozzle by using the Coanda effect by compressed air injected into the inside of the nozzle.

From this, a large amount of fume generated during the processing of the substrate by irradiating the excimer laser beam scatters inside the chamber and can effectively suppress or prevent contamination of the transmission window and the stage.

1 is a schematic diagram of a laser processing apparatus according to an embodiment of the present invention.
2 is a schematic diagram of a suction unit according to an embodiment of the present invention.
3 to 5 is an operation diagram of the suction unit according to an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, and will be implemented in various different forms. Only the embodiments of the present invention are provided to make the disclosure of the present invention complete, and to fully inform the scope of the invention to those skilled in the art. The drawings may be exaggerated to describe embodiments of the present invention, and the same reference numerals in the drawings refer to the same elements.

1 is a schematic view of a laser processing apparatus according to an embodiment of the present invention, and FIG. 2 is a schematic view of a suction unit according to an embodiment of the present invention. At this time, Figure 2 (a) is a schematic view showing the overall shape of the suction unit, Figure 2 (b) is a schematic view showing the separation of the nozzle of the suction unit. 2 (c) is a schematic view showing the inside of the suction unit by removing one side of the nozzle, and FIG. 2 (d) is a schematic view showing the inside of the suction unit by cutting one side.

3 to 5 is an operation diagram of the suction unit according to an embodiment of the present invention. At this time, Figure 3 is an operation diagram showing the process of moving the stage forward in the process proceeding direction, and suctioning the foreign material with the suction unit, Figure 4 is moving the stage backward in the process progressing direction, and suction the foreign matter with the suction unit It is an operation diagram showing the process. 5 is an operation diagram illustrating a process of irradiating ultrasonic waves to the stage and sucking foreign substances through the removal unit and the suction unit.

1 to 5, the laser processing apparatus according to the embodiment of the present invention, the chamber 100, the light irradiation unit 200, the light source 300, the stage 400, the suction unit 500, removal It may include a unit 600, an exhaust unit 700, a fluid supply unit (not shown) and the control unit 800. Hereinafter, an embodiment will be described with reference to a laser processing apparatus that performs a laser lift-off process for separating a thin film element on a substrate from a substrate using an excimer laser beam.

The chamber 100 has a space in which the substrate S can be processed, and the cross section has a rectangular cylindrical shape, but is not limited thereto, and may be changed into various shapes corresponding to the shape of the substrate S. . On one side of the chamber 100, for example, on one side of the upper wall, a transmission window 210 made of quartz is installed. The transmission window 210 is installed on one side of the upper wall of the chamber 100, and the light irradiation unit ( 200) may be installed to cover the upper portion. Of course, the transmission window 210 may be installed at any position that satisfies that the light output from the light source 300 can be guided to the light irradiation unit 200 side. A gate (not shown) is provided on the sidewall of the chamber 100, and the substrate S may enter and exit the chamber 100 through the gate. The chamber 100 may further include a vacuum pump (not shown) or a gas supply (not shown) to control the internal atmosphere, for example, a vacuum atmosphere, a low pressure atmosphere, or an inert atmosphere.

The substrate S may include, for example, a thin film device substrate in which various devices or thin films are stacked on a PI (Polyimide) film, and may be provided on the carrier glass g. Of course, the substrate may be various, such as a silicon substrate for manufacturing a semiconductor device or a glass substrate for manufacturing a display device in which a process in which various thin films or elements are formed on the upper surface is in progress or terminated, and the shape thereof is a disk shape or a square plate shape. It can vary.

The light irradiation unit 200 is installed on the upper wall of the chamber 100, may be installed to position the transmission window 210 in the traveling path of light, for example, a laser beam L, output from the light source 300 Light may be guided to the interior of the chamber 100. The light irradiation unit 200 is mounted on the lower portion of the first body 220 and the first body 220 having a passage in the vertical direction, such as the Y-axis direction Y, through which light can pass, and the first body 220 The second body 230 having a passage communicating with the passage of the up and down direction, is installed on one side of the chamber 100 so as to be located in the traveling path of the light beam, for example, the laser beam, the upper end of the passage of the first body 220 It is mounted, it may include a transmission window 210 through which light can be transmitted. The light irradiation unit 200 may be equipped with a suction unit 500 on the lower surface, and thus, the transmission window 210 may be suppressed or prevented from contamination by foreign substances by the suction unit 500 located below the light transmission unit 200. have.

The light irradiation unit 200 is incident on the substrate (S), a cutter (not shown), which is inclined to be in contact with a path of light from the upper side of the transmission window 210 so as to cut a portion of the light output from the light source 300 To further reflect the reflected light passing through the transmission window 210 after being reflected, a dump (not shown) spaced apart from the light traveling path on the upper side of the transmission window 210, a cooling block (not shown) for cooling the dump, and the like are further added. It may include.

The light source 300 is installed outside the chamber 100 and may output light, such as an excimer laser beam (hereinafter referred to as a laser beam), for processing the substrate S. The laser beam L is output from the light source 300, passes through the light irradiation unit 200, and is then irradiated to the interface between the substrate S and the carrier glass g to transfer the substrate S from the carrier glass g. Can be separated. As the light source 300, various laser sources may be used according to the wavelength of the laser beam to be used, such as an Ar laser, Kr laser, and excimer laser. The laser beam can be processed into the shape of a line beam.

The stage 400 may be movably installed inside the chamber 100 so as to position the substrate S in a path of light, for example, a laser beam L. The stage S may have the substrate S placed on the upper surface, and the substrate S may be horizontally transferred in the process progress direction. Here, the process progress direction is a direction that intersects the progress path of the laser beam L, that is, the stage 400 may be movably installed in a direction that intersects the progress path of the laser beam L. The stage 400 may be supported, for example, in an LM guide (not shown), such as to move forward (+ X) and reverse (-X) in the process direction, for example, the X-axis direction (X).

The suction unit 500 is installed between the transmission window 210 and the stage 400, and is spaced apart in the movement direction of the stage 400, for example, in the X-axis direction (X), with the path of the laser beam therebetween. Can be. For example, the suction unit 500 is a structure that is spaced apart on both sides of a process progress direction, for example, the X-axis direction (X), centering on the progress path of the laser beam (L). Each suction unit 500 may be installed to face in a direction crossing the path of the laser beam. Each suction unit 500 serves to selectively remove foreign substances, such as fume, generated from the substrate S by irradiation of a laser beam while being selectively operated by suction (or suction).

The suction unit 500 may be formed in a structure capable of controlling suction power using a Coanda effect by injection of a fluid such as compressed air. In this case, in detail, the suction unit 500 is a suction unit control structure using the Coanda effect, and the suction unit 500 is located on the inner wall side of the suction unit 500 at a faster speed than the suction unit 500 sucks gas. It has a structure that has an amplifier 520 capable of injecting a small amount of fluid in the suction direction of, and thus, it is possible to control the suction force using the Coanda effect.

The suction unit 500 is installed in a direction intersecting the traveling path of the laser beam, and the nozzle 510 is formed with a suction port to face the traveling path of the laser beam, and the inside of the nozzle 510 at the suction port of the nozzle 510 It may include an amplifier 520 that is mounted to eject a fluid such as compressed air (Fc) inside the nozzle 510 in a direction toward the.

The nozzle 510 is a hollow nozzle extending in the width direction of the laser beam, for example, in the Z-axis direction (Z), and the entire surface of the one side facing the path of the laser beam L is opened to form the first suction port 511 The second suction port 512 may be formed by opening a part of the lower surface facing the stage 400. At this time, the second suction port 412 may contact and communicate with the first suction port 511. The nozzle 510 receives suction force from the exhaust unit 700 and serves to intake airflow Fa and fume generated inside the chamber 100.

The amplifier 520 is a hollow tube extending in the width direction of the laser beam, for example, in the Z-axis direction (Z), and is provided in plural, each spaced along the traveling path of the laser beam L inside the nozzle 510 Each may be mounted in contact with the first suction port 511.

The whole of the first suction port 511 is not opened by the amplifiers 520, but the central and lower portions of the first suction port 511 are opened respectively, and the second suction port 512 is located below the first suction port 511. ) Is opened in communication. Gas may be sucked into the inside of the nozzle 510 through these spaces, but rather than having one suction port structure, if it has a suction structure that is spaced up and down as in the embodiment of the present invention, and has a locally opened suction structure, The foreign matter scattered upwards, such as fume (f), can be removed more smoothly by suction.

Each amplifier 520 may be formed with a slit 521 on each side facing the inside of the nozzle 510, and through this slit 521, the compressed air supplied into the amplifier 520 through the nozzle ( 510).

The amplifier 520 serves to increase the suction power of the nozzle 510 by injecting a fluid such as a small amount of compressed air Fc into the nozzle 510. For example, when compressed air is injected from the inlet of the nozzle 510 toward the inside of the nozzle 510, the compressed air flows rapidly along the inner wall of the nozzle 510 and the inlet of the nozzle 510 by the Coanda effect Ambient air flow is accelerated to be smoothly sucked into the inside of the nozzle 510, and can be smoothly exhausted to the exhaust port 530 described later. At this time, the compressed air also serves to prevent the fume sucked into the nozzle 510 from escaping again, and also serves to smoothly guide the gas and foreign substances sucked into the nozzle 510 to the exhaust port 730. Perform.

The increase in flow velocity and flow rate due to the Coanda effect is sufficiently explained by research literature or patent literature in various technical fields such as an aircraft structure or an internal combustion engine, and thus the description thereof is omitted here.

The suction unit 500 includes an exhaust port 530 mounted on the other surface of the nozzle 510 facing the first suction port 511, and a first supply port mounted on a side of each amplifier 520 to supply fluid ( 540), a second supply port 550 that is mounted on the exhaust port 530 to inject fluid. The exhaust port 530 is connected to the exhaust unit 700 and may transmit suction power generated by the exhaust unit 700 to the inside of the nozzle 510. The gas (Fs) and the fume (f) sucked into the nozzle 510 from the inside of the chamber 100 may be sucked into the exhaust unit 700 through the exhaust port 530. The first supply port 540 serves to supply compressed air to the amplifier 520, and may be connected to a fluid supply unit (not shown) for this purpose.

The second supply port 550 serves to amplify the flow rate and flow rate of gas flowing inside the exhaust port 530 by injecting a small amount of compressed air into the exhaust port 530. The Coanda effect can be applied to this. For example, when the second supply port 550 injects a fluid such as compressed air into the exhaust port 530, the compressed air flows rapidly along the inner surface of the exhaust port 530 by the Coanda effect. As the flow rate inside the exhaust port 530 increases, the flow rate increases. The second supply port 550 may be connected to a fluid supply unit (not shown) to receive compressed air.

The suction unit 500 may further include a deflector 560 mounted on an upper surface of one amplifier positioned relatively lower among the amplifiers 520 and spaced apart from the lower surface of another amplifier positioned relatively higher. The deflector 560 may be formed with an upper surface such that one end toward the first suction port 511 is inclined downward in the direction toward the first suction port 511 from the exhaust port 530. Due to the inclination of the upper surface, when the gas is sucked into the space between the amplifiers 520 spaced up and down, the flow area is reduced while adding speed and direction to the flow, so that the suction of the nozzle 510 is more smooth. You can. That is, the position where the deflector 560 is installed gives an effect corresponding to the nozzle neck, so that the gas can be inhaled more smoothly.

On the other hand, looking at the structure of the amplifier 520, as shown in Figure 2 (d), the slit 521 is formed by penetrating one surface of the amplifier 520 in a direction crossing the path of the laser beam, the slit The lengths of the upper and lower surfaces 522 and 523 that are spaced apart from each other along the traveling path of the laser beam among the inner surfaces of 521 are formed differently. Accordingly, the compressed air passing through the slit 521 flows along the upper surface 522 of the slit 521 in a direction crossing the path of the laser beam, for example, in the X-axis direction X, and can be sprayed to have directionality, Accordingly, the Coanda effect by compressed air may be more effective.

One surface of the amplifier 520 may be inclined upward in the direction toward the first inlet 511 from the exhaust port 530, with the center of the slit 521 as the center, and the lower portion of the first intake port at the exhaust port 530 ( 511). That is, due to the inclination of the outer surface, the gas Fs sucked from each intake port flows through the inclined surfaces at one surface of the amplifier 520 and is smoothly sucked into compressed air, and the flow rate and flow rate can be increased.

Since the suction unit 500 formed as described above is a structure that can utilize the Coanda effect, for example, the laser beam L is lengthened in the width direction, and the generation region of the fume f is the width direction of the laser beam L Even if it becomes wider, it can be removed by inhaling the fume (f) smoothly. That is, even if the shape of the laser beam L is adjusted and the generation range of the fume f becomes longer or shorter in the width direction or the length direction, the fume f can be smoothly processed without structural restrictions on it.

The removal unit 600 may include, for example, an ultra-sonic dry cleaner (USC) unit. The removal unit 600 is spaced apart from the suction unit 500 and can be installed toward the stage 400, and the installation location or structure is not particularly limited. The removal unit 600 may be provided with an ultrasonic output port 610 at a center position of the lower surface, and may have suction ports 620 at both edges of the lower surface. The removal unit 600 outputs ultrasonic waves to the stage 400 positioned below the ultrasonic output port 610, and the gas between the removal unit 600 and the stage 400 is vibrated by the ultrasonic wave, and the stage 400 ) By vibrating, the remaining fume f attached to the stage 400 may be scattered upward. In addition, the removal unit 600 may remove residual fumes scattered from the upper surface of the stage 400 by ultrasonic waves through the suction port 620. Meanwhile, the structure and method for ultrasonic generation of the removal unit 600 are not particularly limited.

The exhaust unit 700 is connected to the suction unit 500 and the removal unit 600 and serves to apply suction force. The exhaust unit 700 may include an exhaust line 710, a control valve 720, an air amplifier 730, a vacuum filter 740, a pressure gauge 750 and a ring blower 760.

The exhaust line 710 may be composed of one main pipe and a plurality of branch pipes. Each branch pipe may have one end connected to each suction unit 500 and removal unit 600, and the other end connected to the main pipe. The main pipe may be connected to each branch pipe at one end, and the other end may be connected to the ring blower 760. Each branch pipe is equipped with a control valve 720 and an air amplifier 730, and may be mounted in the order of the control valve 720 and the air amplifier 730 in order from one end to the other. Meanwhile, an air amplifier 730 may be mounted on the main pipe, and at this time, an air amplifier 730 may be mounted on the upstream side of the vacuum filter 740.

The control valve 720 is connected to the control unit 800, the control valve 720 is operated by the control of the control unit 800, it is possible to control the opening and closing of each branch. The air amplifier 730 may inject a small amount of compressed air in a direction in which the gas flows in the inside of the branch pipe and the main pipe to increase the flow rate and flow rate of the gas flowing through the branch pipe and the main pipe. For example, the ring-shaped housings are respectively mounted to surround the inner circumference of the branch pipe and the main pipe with the air amplifier 730, and compressed air is injected from the housing to the interior of the branch pipe and the main pipe to accelerate fluid flowing through the branch pipe and the main pipe. At this time, the air amplifier 730 may be connected to a fluid supply unit (not shown) to receive compressed air. The structure of the air amplifier 730 is not limited to the above structure, and may be changed to various structures capable of increasing the flow rate and flow rate of gas flowing through a branch pipe, for example.

The decrease in pressure and speed of the gas sucked into the exhaust line 710 by the air amplifier 730 may be suppressed or prevented. The air amplifier 730 is mounted to each of the branch pipes and the main pipe, and may be mounted in one or more numbers for each branch or main pipe depending on the length of the branch pipe and the main pipe.

The vacuum filter 740 is mounted on the main pipe at the upstream side of the ring blower 760 and serves to remove foreign matter flowing with the gas, such as fume (f). The structure and method of the vacuum filter are not particularly limited. The pressure gauge 750 is mounted on the main pipe between the vacuum filter 740 and the ring blower 760 to measure pressure, and injects into the inside of the main pipe and main pipe from each air amplifier 730 according to the pressure measurement value The intake force and intake flow rate of the exhaust unit 700 can be stably adjusted by adjusting the injection amount and injection pressure of compressed air. The ring blower 760 may be mounted on the other end of the exhaust line 710 to provide suction power therein.

The fluid supply unit (not shown) is connected to the suction unit 500 and the exhaust unit 700 to supply compressed air used for amplifying the flow rate and flow rate to each. The fluid supply unit may be various structures capable of supplying compressed air to each component at a desired pressure, and is not particularly limited. For example, an air tank containing compressed air or an air compressor capable of supplying compressed air may be used.

The control unit 800 may individually control each suction unit 500 to alternately operate according to the moving direction of the stage 400. That is, the control unit 800 may be formed to select and operate the preceding suction unit 500 with respect to the direction in which the stage 400 moves. At this time, the control unit 800 is a sensor (not shown) for detecting the moving direction of the stage 400, and a controller for controlling the operation of each control valve 720 and the ring blower 760 of the exhaust unit 700 (Not shown). The control unit 800 detects a moving direction of the stage 400 using a sensor, and selectively opens and closes each control valve 720 using a controller to respond to this, and selectively applies suction force to the suction unit 500. The suction unit 500 may be selectively operated.

For example, when the stage 400 moves forward (+ X), airflow Fa is generated in the direction opposite to the forward movement of the stage 400 in the vicinity of the stage 400, and at this time, a plurality of suction units 500 ), The suction unit 500 corresponding to the flow direction of the air flow Fa generated in the direction opposite to the forward movement of the stage 400 is selected and operated, for example, the suction unit that precedes the process progress direction. Select 500 to operate.

In addition, when the stage 400 moves backward (-X), an air flow Fa is generated in the direction opposite to the backward movement of the stage 400 in the vicinity of the stage 400, and at this time, a plurality of suction units ( Among the 500), the suction unit 500 that matches the flow direction of the air flow Fa generated in the direction opposite to the backward movement of the stage 400 is selected and operated, for example, a suction that follows the process direction. The unit 500 is selected and operated.

That is, the control unit 800 stops the suction unit 500 facing the air flow Fa generated in the chamber 100, and the suction unit facing the air flow Fa generated in the chamber 100. 500 can be operated. When the suction unit 500 is operated in this way, the nozzle 510 can inhale gas in accordance with the air flow without destroying the internal air flow Fa of the chamber 100. Thus, the fume (f) can be sucked into the nozzle 510 while maintaining the inertia by the air flow (Fa), it is possible to smoothly remove the fume (f) from the interior of the chamber (100).

On the other hand, "preceding" means a position that faces the stage 400 that is moved forward or backward in the process proceeding direction relatively first, and, conversely, "preceding" refers to the stage 400 that is transported forward or backward in the process proceeding direction. It means that it is a position that you will be facing later.

That is, the positions indicated by the preceding and the following may vary according to the moving direction of the stage 400. For example, as shown in FIG. 3, when the stage 400 moves from left to right on the drawing, the left suction unit is the preceding suction unit and the right suction unit is the subsequent suction unit when viewed on the drawing. Conversely, as shown in FIG. 4, when the stage 400 moves from right to left in the drawing, the right suction unit is the leading suction unit when viewed in the drawing, and the left suction unit is the trailing suction unit.

On the other hand, in a modified example of the present invention, the control unit 800 may further include a sensor (not shown) capable of detecting the flow direction of the gas, and by using this, the internal gas of the chamber 100 at the upper side of the stage 400 By sensing the flow, the suction unit 500 at a position having a suction direction corresponding to the flow direction may be selectively operated. Alternatively, the suction unit 500 at a trailing position based on the flow direction of the gas inside the chamber 100 may be selected and operated.

A laser processing method according to an embodiment of the present invention will be described with reference to FIGS. 1 to 5. In the laser processing method according to an embodiment of the present invention, a process of preparing a substrate on a stage by bringing the substrate into the chamber, moving the stage in a process progress direction, irradiating a laser beam to the substrate, and removing the substrate from the chamber It includes.

First, the substrate S is brought into the chamber 100 to be provided on the stage 400. At this time, the substrate S may be provided by being supported on the carrier glass g.

When the substrate S is seated on the stage 400, the laser beam is irradiated to the substrate S while moving the stage 400 in the process progress direction. That is, the laser beam L is output through the light source 300 and irradiated to the substrate S through the light irradiation unit 200. At this time, the laser beam is irradiated to the interface between the substrate S and the carrier glass g to separate their bonds.

As described above, while moving the stage 400 in the process progress direction, a process of inhaling foreign substances such as fume is performed using a suction unit installed spaced apart from each other in the process progress direction with the progress path of the laser beam interposed therebetween. At this time, the suction unit 500 is operated at the preceding position based on the direction in which the stage 400 moves, and the fume f is sucked. At this time, when the foreign matter is sucked using the suction unit 500, the suction unit having a suction direction corresponding to the air flow generated inside the chamber 100 by the movement of the stage 400 is selected, and then the selected suction unit is selected. It can be activated to inhale foreign objects.

Referring to FIG. 3, while irradiating the laser beam L on the substrate S moving forward (+ X) in the process proceeding direction, the preceding suction unit 500 is operated based on the process proceeding direction, and on the stage. The fume may be removed by inhaling the gas inside the chamber 100 in a direction consistent with the flow of the air flow Fa. Looking at the drawing, it can be seen that the direction of the gas Fs sucked into the nozzle 510 (this is referred to as the suction direction) coincides with the direction of the air flow Fa generated inside the chamber 100. As described above, when the suction direction of the nozzle 510 and the air flow direction in the chamber 100 coincide, since the air flow inside the chamber 100 is not destroyed, the fume f can be smoothly sucked without being disengaged.

For example, when the air flow Fa inside the chamber 100 is destroyed, turbulence is formed in the lower portion of the permeation window 210 or the gas flow becomes unstable, so that the fume f is not sucked into the nozzle 510 and scatters around. Is done. However, in an embodiment of the present invention, the nozzle 510 inhales the inside of the chamber 100 in accordance with the flow of the air flow Fa generated inside the chamber 100, so that the fume f is smoothly removed and removed. can do.

On the other hand, even if the substrate (S) is not processed by one transfer, but is processed while being reciprocated several times, as shown in order in FIGS. 3 and 4, the advancement of the stage 400 in the process progress direction (+ X ) And reverse (-X), alternately operate the suction unit 500 and can smoothly inhale?. On the other hand, when operating the suction unit 500, it is possible to improve the suction power by using the Coanda effect by spraying compressed air (Fc) into the interior of the nozzle 510. For example, in the suction direction of the suction unit 500, the suction unit 500 may be increased by injecting a small amount of compressed air into the inside of the nozzle 510 in detail.

Then, when the processing of the substrate S is completed, the stage 400 is moved horizontally to transfer the substrate S to its original position, and the substrate is taken out of the chamber 100. On the other hand, after the process of taking out the substrate from the chamber 100, a process of moving the stage in the process progress direction and irradiating ultrasonic waves to the stage may be performed. At this time, a process of inhaling foreign substances using the suction unit may be performed together.

For example, while moving the stage 400 and applying ultrasonic waves to the stage 400 with the removal unit 600, foreign matter such as fume attached to the upper surface of the stage 400 is scattered by the ultrasonic wave, and the removal unit 600 ), While suctioning and removing the suction port 620, as shown in FIG. 5, the suction unit 500 may be used to inhale residual foreign matter.

At this time, after selecting the suction unit having a suction direction corresponding to the airflow generated inside the chamber 100 by the movement of the stage 400, the selected suction unit can be operated to suck foreign matter, and the Coanda effect can be selected. It is possible to control the suction force of the suction unit 500.

On the other hand, while the suction unit 500 is operating, the exhaust unit 700 is an air amplifier 730 so that the suction force generated by the ring blower 760 can be transmitted without decreasing to the nozzle 510 of the suction unit 500. ) Can be activated.

As described above, in the embodiment of the present invention, when the substrate S is processed using the laser beam L, the fume f scattering to the top of the substrate S is removed in real time using the suction unit 500 However, at this time, the suction unit 500 installed in a dual structure spaced before and after the path of the laser beam alternately operated or asymmetrically operated to stabilize the flow in the vicinity of the suction unit 500, and the suction unit 500 By injecting a small amount of compressed air to the inside of the can increase the suction power. In addition, after unloading the substrate, the suction unit 500 is operated to remove the fume smoothly by removing the fume adhering to the stage 400 while irradiating ultrasonic waves to the stage 400 using the removal unit 600. In this case, the suction unit 500 can be selectively operated according to the moving direction of the stage 400 to stabilize the flow around the stage. Accordingly, diffusion of the fume f is prevented, and contamination of the transmission window 210, such as an optical lens, can be prevented.

For example, in the laser lift-off process, air flow occurs in different directions inside the chamber according to the moving direction of the stage 400, and the air flow flows through the flow of fume scattered to the upper part of the substrate S. Direction. When the fume is inhaled by destroying this flow, the fume may be irregularly diffused by turbulence or vortex in the chamber, but in the embodiment of the present invention, the fume can be sucked without destroying the airflow in the chamber. Fumes can be removed by suction while preventing diffusion.

In addition, since the structure of the suction unit 500 is provided with a structure that can apply the Coanda effect using compressed air, the suction amount increases by about 30 to 40 times compared to the existing structure, and thus, the stage moving at high speed ( 400) in response to the movement of the fume in a wide area within a short time can be exhausted to the outside of the chamber (100).

In addition, even in the case of the exhaust unit 700, the air amplifier 730 is installed at each position of each exhaust line 710 so that the Coanda effect can be used. Even if the layout of the exhaust unit 700 is long and complicated, Pressure loss in the exhaust line 710 can be prevented, and reverse flow can be prevented. In addition, the suction force applied to the suction unit 500 by the air amplifier 730 may be further increased than the suction force by the ring blower 760, thereby ensuring a high discharge pressure and suction force of the suction unit 500, A large amount of fume can be removed by suction. Of course, it is natural that the pressure, flow rate and flow rate of the gas flowing inside the exhaust line 710 can be smoothly controlled by the air amplifier 730.

By the above, it is possible to reduce the defect rate of various processes to which the laser processing apparatus and the laser processing method according to an embodiment of the present invention are applied, and to increase productivity.

The above embodiments of the present invention are for the purpose of describing the present invention and not for the limitation of the present invention. It should be noted that the configurations and methods disclosed in the above embodiments of the present invention may be modified in various forms by combining or crossing each other, and such modified examples may be viewed as the scope of the present invention. That is, the present invention will be implemented in a variety of different forms within the scope of the claims and equivalent technical spirit, and various embodiments are possible within the scope of the technical spirit of the present invention. Will be able to understand.

100: chamber 200: light irradiation unit
210: transmission window 400: stage
500: suction unit 510: nozzle
520: amplifier 600: removal unit
700: exhaust unit 800: control unit

Claims (17)

A hermetic chamber having a space therein and formed to control the inner atmosphere;
A transmission window installed on one side of the chamber so as to be positioned in a path of the laser beam;
A stage movably installed in the chamber so as to position the substrate in the path of the laser beam;
A suction unit installed between the transmission window and the stage; And
Includes; control unit for controlling the operation of the suction unit,
The suction units are installed to be spaced apart from each other in the moving direction of the stage with the progress path of the laser beam interposed therebetween, so as to face each other in a direction crossing the progress path of the laser beam, and the intake port is directed toward the progress path of the laser beam. It includes a nozzle to be formed,
The control unit stops the suction unit facing the airflow generated in the direction opposite to the moving direction of the stage by the movement of the stage, and operates a laser processing device that operates the suction unit facing the airflow. The method according to claim 1,
The suction unit is a laser processing device that is formed to control the suction force using the Coanda effect. The method according to claim 1 or claim 2,
The stage is a laser processing device is installed to be movable in a direction crossing the path of the laser beam. delete delete The method according to claim 1 or claim 2,
The suction unit,
And an amplifier mounted in the direction of the suction port toward the inside of the nozzle so as to be capable of spraying fluid inside the nozzle. The method according to claim 6,
The nozzle, the first suction port is formed on one surface facing the path of the laser beam, the second suction port is formed on the lower surface facing the stage,
The amplifier, the laser processing apparatus is spaced along the path of the laser beam inside the nozzle, respectively, is mounted in contact with the first suction port, a slit is formed on each side facing the inside of the nozzle. The method according to claim 7,
The suction unit,
An exhaust port mounted on the other surface of the nozzle facing the first suction port;
A first supply port mounted on the side of each amplifier to supply fluid;
A second supply port mounted on the exhaust port to eject fluid;
And a deflector mounted on the upper surface of one of the amplifiers positioned at the lower side of the amplifier and spaced apart from the lower surface of another amplifier positioned at the upper side of the amplifier. The method according to claim 7,
The slit is formed by penetrating one surface of the amplifier in a direction crossing the progress path of the laser beam, and processing lasers having different lengths of the upper and lower surfaces spaced apart from each other along the progress path of the laser beam among the inner surfaces. Device. The method according to claim 1 or claim 2,
A removal unit spaced apart from the suction unit and installed toward the stage;
An exhaust unit connected to the suction unit and the removal unit to apply suction force; And
And a fluid supply unit connected to the suction unit to supply fluid. The method according to claim 10,
The removal unit is a laser processing device having an ultrasonic output port and a suction port on the lower surface. A process of bringing a substrate into a sealed chamber formed to control an internal atmosphere and preparing the substrate on a stage;
Moving the stage in a process proceeding direction, and irradiating a laser beam to the substrate; And
The process of taking out the substrate from the chamber; includes,
While moving the stage in the process progress direction, a process of sucking foreign matters using suction units installed spaced apart from each other in the process progress direction with the progress path of the laser beam interposed therebetween.
The process of inhaling foreign substances by using the suction unit,
Including the process of stopping the suction unit facing the air flow generated in the interior of the chamber in the direction opposite to the moving direction of the stage by the movement of the stage, and suctioning foreign matter by operating the suction unit facing the air flow Laser treatment method. The method according to claim 12,
After the process of removing the substrate from the chamber,
The process of moving the stage in the process proceeding direction, and irradiating ultrasound to the stage; includes,
The laser processing method of performing; while irradiating ultrasonic waves to the stage, using a suction unit to inhale foreign matter. delete The method according to claim 12 or 13,
The process of inhaling foreign substances by using the suction unit,
And controlling a suction force of the suction unit using the Coanda effect. The method according to claim 15,
The process of controlling the suction force of the suction unit,
And injecting a fluid into the suction unit to increase suction power in the suction direction of the suction unit. The method according to claim 16,
The fluid contains compressed air,
A laser treatment method comprising fume for the foreign material.

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