KR102066086B1 - DUAL Display device and MANUFACTURING METHOD OF THE SAME - Google Patents

Abstract

In one embodiment of the present application, the display area is defined to include a plurality of first and second pixel areas for emitting light in directions opposite to each other, the display device capable of displaying an image from both sides, the plurality of A first electrode formed on the cell array, corresponding to each of the first and second pixel regions; An emission layer formed on the first electrode corresponding to each of the plurality of first and second pixel regions; A second electrode formed on the light emitting layer so as to face the first electrode of each of the plurality of first and second pixel regions; A first reflective layer formed between the cell array and the light emitting layer corresponding to each of the plurality of first pixel regions; And a second reflective layer formed between the emission layer and the second electrode corresponding to each of the plurality of second pixel regions, wherein the second electrodes of each of the plurality of first and second pixel regions are interconnected. It provides a double-sided display device formed to be.

Description

DUAL DISPLAY DEVICE AND MANUFACTURING METHOD OF THE SAME

The present invention relates to a device for displaying an image on both sides, and particularly relates to a double-side display device and a method of manufacturing the same that is advantageous in large areas.

As the information age enters full swing, the display field for visually displaying electrical information signals is rapidly developing. Accordingly, researches for developing various flat panel display devices such as large area, thinner, lighter weight, and low power consumption have continued.

Representative examples of such flat panel display devices include liquid crystal display devices (LCDs), plasma display panel devices (PDPs), field emission display devices (FEDs), and electroluminescent display devices. Electroluminescent display device (ELD), electro-wetting display device (EWD), and organic light emitting display device (OLED).

Among these, the organic light emitting display device displays an image by using an organic light emitting diode (OLED) which is a self-luminous device. The organic light emitting diode display includes two or more organic light emitting diodes that emit light of different colors in correspondence to each pixel, thereby realizing a color image without a separate color filter. In addition, since a separate light source is not required, an advantage of miniaturization, thinning, and weight reduction than a liquid crystal display device, a wide viewing angle, and a reaction speed of more than 1000 times are provided, resulting in less afterimage.

In addition, the organic light emitting diode display may include a top emission type and a bottom emission type organic light emitting diode, and thus may be easily implemented as a double-sided display.

In the double-sided display device, however, the cathode of the top-emitting organic light emitting diode is generally formed of a transparent conductive material having a relatively high resistance. As a result, the farther the front emission type organic light emitting diode is from the power source, the lower the luminance due to the voltage drop caused by the resistance of the cathode electrode.

That is, due to the difference in luminance between pixels due to the resistance of the cathode, the image quality of the front image is lower than that of the rear image.

In particular, the larger the area of the double-sided display device, the worse the image quality of the front image due to the resistance of the cathode electrode, and thus there is a problem in that the area of the double-sided display device is limited.

The present invention is to provide a double-side display device and a method for manufacturing the same, which can prevent the degradation of the image quality of the front image due to the resistance of the cathode electrode of the front-emitting organic light emitting device, and thereby to realize a large area more easily. .

In order to solve this problem, an embodiment of the present application is defined to include a plurality of first and second pixel areas in which the display area emits light in directions opposite to each other, so that an image can be displayed on both sides. A first electrode formed on a cell array corresponding to each of the plurality of first and second pixel regions; An emission layer formed on the first electrode corresponding to each of the plurality of first and second pixel regions; A second electrode formed on the light emitting layer so as to face the first electrode of each of the plurality of first and second pixel regions; A first reflective layer formed between the cell array and the light emitting layer corresponding to each of the plurality of first pixel regions; And a second reflective layer formed between the light emitting layer and the second electrode to correspond to each of the plurality of second pixel regions. Here, the first and second electrodes are formed of a transparent conductive material, the first and second reflective layers are formed of a reflective metal material having a lower resistance than the transparent conductive material, and the plurality of first and second electrodes The second electrode of each pixel area is formed to be connected to each other.

In addition, an embodiment of the present invention is defined to include a plurality of first and second pixel areas in which the display area emits light in directions opposite to each other. Providing a cell array; Forming a first reflective layer on the cell array, the first reflective layer corresponding to each of the plurality of first pixel regions made of a metal material; Forming a first electrode corresponding to each of the plurality of first and second pixel regions on the cell array including the first reflective layer, using a transparent conductive material; Forming a light emitting layer corresponding to each of the plurality of first and second pixel regions on the first electrode, using a light emitting organic material; Forming a second reflective layer on the light emitting layer, the second reflective layer corresponding to each of the plurality of second pixel regions, from the metal material; And forming a second electrode on the light emitting layer including the second reflective layer, the second electrode facing the first electrode, the transparent conductive material corresponding to each of the plurality of first and second pixel regions. Provided is a method of manufacturing a device. Here, the metal material has a lower resistance than the transparent conductive material, and in the forming of the second electrode, the second electrodes of each of the plurality of first and second pixel regions are formed to be connected to each other.

The double-sided display device according to the exemplary embodiment of the present invention includes a plurality of first and second pixel areas that emit light in opposite directions, and corresponds to each of the plurality of first and second pixel areas, respectively, on the emission layer. A second electrode formed to face the first electrode, and a second reflective layer formed between the light emitting layer and the second electrode, corresponding to each of the plurality of second pixel regions.

In this case, the second electrode is formed of a transparent conductive material having a relatively high resistance, but the first and second reflective layers are formed of a reflective metal material having a lower resistance than the transparent conductive material, and the plurality of first and second pixel regions Since each second electrode is formed to be connected to each other, not only the second electrode of each of the plurality of second pixel regions, but also the second electrode of each of the plurality of first pixel regions is electrically connected to the second reflective layer.

Accordingly, the resistance of the second electrode corresponding to each of the plurality of first pixel regions may be reduced, and thus, the image quality of the plurality of first pixel regions, that is, the front image may be deteriorated by the resistance of the second electrode. This can be prevented, whereby a large area of the double-sided display device can be implemented more easily.

1 is an illustration showing a pixel array structure of a double-side display device according to a first embodiment of the present application.
2 is a cross-sectional view illustrating a part of each of the first and second pixel areas illustrated in FIG. 1.
3 is a flowchart illustrating a method of manufacturing a double-sided display device according to a first embodiment of the present application.
4A through 4H are flowcharts illustrating the flowchart of FIG. 3.
5 is a diagram illustrating a pixel array structure of a double-sided display device according to a second embodiment of the present disclosure.
6 is a cross-sectional view illustrating a part of each of the first and second pixel areas illustrated in FIG. 5.

Hereinafter, a double-sided display device and a method of manufacturing the same according to embodiments of the present disclosure will be described in detail with reference to the accompanying drawings.

First, referring to FIGS. 1 and 2, a double-sided display device according to a first embodiment of the present disclosure will be described.

1 is a diagram illustrating a pixel array structure of a double-side display device according to a first exemplary embodiment of the present disclosure, and FIG. 2 is a cross-sectional view illustrating a part of each of the first and second pixel areas illustrated in FIG. 1.

As shown in FIG. 1, the double-sided display device according to the first exemplary embodiment of the present disclosure is configured to emit light in directions opposite to each other, corresponding to a display area (AA), which is an effective area in which an image is displayed. First and second pixel areas PA1 and PA2 are included.

For example, in order to display the front image, the plurality of first pixel areas PA1 is an area that emits light to the outside through an optical path not including the cell array, and the plurality of second pixel areas PA2 are rear surfaces In order to display an image, the image may be an area that emits light to the outside through an optical path including a cell array.

The plurality of first and second pixel areas PA1 and PA2 are alternately disposed on the display area AA in at least one of horizontal and vertical directions. That is, as illustrated in FIG. 1, the plurality of first and second pixel areas PA1 and PA2 may be alternately disposed in the horizontal and vertical directions.

In addition, although not shown in detail in FIG. 1, each of the plurality of first and second pixel areas PA1 and PA2 may include three or more subpixel areas that emit red light, green light, and blue light. And sub-pixel regions of the second pixel region may be alternately arranged.

That is, the subpixel regions of the first pixel region and the subpixel regions of the second pixel region are sequentially arranged, or the red light subpixel regions of the first and second pixel regions, respectively, of the first and second pixel regions, respectively. The green light subpixel regions of the light emitting diodes and the blue light subpixel regions of the first and second pixel regions may be sequentially disposed.

As shown in FIG. 2, the double-sided display device includes a switch element TFT corresponding to each of the plurality of first and second pixel regions PA1 and PA2, and each of the plurality of first pixel regions PA1. And a second organic light emitting element EL2 corresponding to each of the plurality of second pixel regions PA2.

Here, the first organic light emitting element EL1 is a top emission type that emits light of an optical path not including the substrate 11 (in FIG. 2, which is an upward block arrow). In addition, the second organic light emitting element EL2 emits light of a light path including the substrate 11 (in FIG. 2, which is a downward block arrow).

Each of the first and second organic light emitting diodes EL1 and EL2 includes a light emitting layer 13b between the first and second electrodes 13a and 13c and the first and second electrodes 13a and 13c facing each other. Include. The first organic light emitting element EL1 is formed under the light emitting layer 13b to reflect the first reflective layer 13d that reflects the light of the light emitting layer 13b toward the second electrode 13c opposite to the substrate 11. It includes more. On the other hand, the second organic light emitting element EL2 further includes a second reflective layer 13e formed on the light emitting layer 13b to reflect the light of the light emitting layer 13b to the substrate 11 side.

In detail, the double-sided display device includes a cell array 12 including a switch element TFT corresponding to each of the plurality of first and second pixel regions PA1 and PA2 formed on the substrate 11, and the plurality of first elements. And corresponding to each of the second pixel regions PA1 and PA2, corresponding to each of the first electrode 13a and the plurality of first and second pixel regions PA1 and PA2 formed on the cell array 12. An agent formed on the light emitting layer 13b so as to face the light emitting layer 13b formed on the first electrode 13a and the first electrode 13a of each of the plurality of first and second pixel regions PA1 and PA2. The first reflective layer 13d formed between the cell array 12 and the light emitting layer 13b corresponding to each of the second electrode 13c, the plurality of first pixel regions PA1, and the plurality of second pixel regions PA2. 2), the second reflective layer 13e is formed between the light emitting layer 13b and the second electrode 13c.

The double-sided display device is formed on the front surface of the bank layer 13f and the second electrode 13c formed on the cell array 12 to correspond to the outer peripheries of the plurality of first and second pixel areas PA1 and PA2. It further includes a protective layer 14 and a cover layer 15 formed on the protective layer 14 so as to face the cell array 12 and sealing the light emitting layer 13b.

In addition, the double-sided display device may further include a light shielding layer 16 formed on the second electrode 13c to correspond to each of the plurality of second pixel areas PA2.

The substrate 11 is made of a light transmissive and insulating material.

Each switch element TFT of the cell array 12 includes at least a portion of the gate electrode 12a formed on the substrate 11 and the gate electrode 12a formed on the gate insulating film 12b covering the gate electrode 12a. A semiconductor layer 12c formed to overlap, and a source electrode 12d and a drain electrode 12e formed on the gate insulating film 12b so as to overlap with both sides of the semiconductor layer 12c, respectively.

Each switch element TFT is covered by an interlayer insulating film 12f. That is, the interlayer insulating film 12f is formed to cover the semiconductor layer 12c, the source electrode 12d, and the drain electrode 12e on the entire surface of the gate insulating film 12b, and the gate insulating film 12b is formed on the substrate 11. It is formed to cover the gate electrode 12a on the front surface.

The first reflective layer 13d is formed of a reflective metal material on the interlayer insulating film 12f to correspond to each of the plurality of first pixel regions PA1. In this case, the reflective metallic material is a material having a lower resistance than at least the transparent conductive material.

The first electrode 13a is formed of a transparent conductive material on the interlayer insulating film 12f including the first reflective layer 13d to correspond to each of the plurality of first and second pixel regions PA1 and PA2. That is, in the first pixel area PA1, the first electrode 13a is formed on at least a portion of the first reflective layer 13d. On the other hand, in the second pixel area PA2, the first electrode 13a is formed on the interlayer insulating film 13f.

In addition, the first electrode 13a is connected to at least a portion of the drain electrode 12e exposed through the contact hole penetrating the interlayer insulating film 12f. As a result, the switch element TFT of the cell array 12 selectively supplies a driving signal corresponding to each pixel area PA1 to the first electrode 13a.

The bank layer 13f is formed on the interlayer insulating film 12f to correspond to the periphery of each of the plurality of first and second pixel regions PA1 and PA2. In this case, the bank layer 13f may overlap at least a portion of the first electrode 13a at the outside of each pixel area PA1 and PA2.

The light emitting layer 13b is formed of a light emitting organic material on the first electrode 13a to correspond to each of the plurality of first and second pixel areas PA1 and PA2. In this case, the light emitting layer 13b may be formed on at least a portion of the bank layer 13f.

The second reflective layer 13e is formed of a reflective metal material on the light emitting layer 13b to correspond to each of the plurality of second pixel regions PA2.

The second electrode 13c is formed of a transparent conductive material on the light emitting layer 13b including the second reflective layer 13e to face the first electrode 13a of each of the first and second pixel regions PA1 and PA2. do. Accordingly, in each pixel area PA1 and PA2, the first and second electrodes 13a and 13c are disposed to face each other with the light emitting layer 13b interposed therebetween.

The second electrodes 13c of the plurality of first and second pixel areas PA1 and PA2 are connected to each other. That is, the second electrode 13c is formed on the entire surface of the interlayer insulating film 12f of the cell array 12 to cover the light emitting layer 13b, the second reflective layer 13e, and the bank layer 13f. Accordingly, the second electrodes 13c of each of the first and second pixel areas PA1 and PA2 are integrally connected to each other.

At this time, in each of the second pixel areas PA2, since the second electrode 13c is formed on at least a portion of the second reflective layer 13e, the second electrode 13c and the second reflective layer 13e are electrically connected to each other. Connected. The second electrodes 13c of the plurality of first and second pixel areas PA1 and PA2 are connected to each other. As a result, the second electrode 13c of each of the plurality of first pixel regions PA1 is also electrically connected to the second reflective layer 13e.

As such, by being electrically connected to the second reflective layer 13e, the resistance of the second electrode 13c corresponding to each of the plurality of first pixel regions PA1 may be reduced. Therefore, by the resistance of the second electrode 13c, the image quality of the plurality of first pixel regions PA1, that is, the image quality of the front image, can be prevented from being lowered. Therefore, the large area of the double-sided display device can be implemented more easily.

The protective layer 14 is formed of an insulating material on the entire surface of the cell array 12 including the second electrode 13c. The protective layer 14 may be for shielding penetration of oxygen, moisture, and the like into the light emitting layer 13b.

The cover layer 15 is bonded to the substrate 11 with the light emitting layer 13b interposed therebetween. The cover layer 15 may be provided in the form of a substrate having transparency, or a film having transparency and flexibility. In this manner, the substrate 11 and the cover layer 15 are bonded to each other so that the light emitting layer 13b is sealed to prevent penetration of external moisture and oxygen.

The light shielding layer 16 is formed to overlap with the light emitting layer 13b on the upper side of the second electrode 13c to correspond to each of the plurality of second pixel regions PA2. By the light shielding layer 16, light generated from the light emitting layer 13b and passing through the second electrode 13c in the plurality of second pixel areas PA2 may be shielded.

Although not shown in detail in FIG. 2, a light shielding layer (not shown) overlapping the light emitting layer 13b is further formed below the first electrode 13a to correspond to each of the plurality of first pixel regions PA1. Can be. The light shielding layer of the first pixel area PA1 is generated from the light emitting layer 13b in the plurality of first pixel areas PA1 and passes through the first electrode 13a and the substrate 11 to the outside. The light emitted can be shielded.

By the light shielding layer 16, the front image and the rear image can be minimized to influence each other, the contrast ratio of each of the front image and the rear image can be further improved.

Next, referring to FIGS. 3 and 4A to 4H, a manufacturing method of the double-side display device according to the first embodiment of the present disclosure will be described.

3 is a flowchart illustrating a method of manufacturing the double-sided display device according to the first exemplary embodiment of the present application, and FIGS. 4A to 4H are flowcharts illustrating the flowchart of FIG. 3.

As shown in FIG. 3, in the method of manufacturing the double-sided display device according to the first embodiment of the present application, providing a cell array for selectively supplying driving signals of each of the plurality of first and second pixel regions (S10). ), Forming a first reflective layer corresponding to each of the plurality of first pixel regions on the cell array (S11), and a plurality of first and second pixel regions on the cell array including the first reflective layer. Forming a first electrode corresponding to each of the transparent conductive material (S12), and forming a bank layer corresponding to an outer portion of each of the plurality of first and second pixel regions on a cell array including the first electrode; (S13), forming a light emitting layer corresponding to each of the plurality of first and second pixel regions on the first electrode (S14), and forming a second reflective layer corresponding to each of the plurality of second pixel regions on the light emitting layer. Forming from a metal material (S15), including a second reflective layer Forming a second electrode facing the first electrode of each of the plurality of first and second pixel regions with a transparent conductive material on the light emitting layer (S16), and forming a protective layer on the entire surface on the second electrode (S17). And forming a cover layer sealing the light emitting layer on the protective layer so as to face the cell array (S18).

As shown in FIG. 4A, a switch element TFT corresponding to each of the plurality of first and second pixel regions is formed on the substrate 11 to form a cell array 12. (S10)

In this case, in the preparing of the cell array 12 (S10), the gate electrode 12a is formed on the substrate 11, and the gate insulating layer 12b covering the gate electrode 12a on the entire surface of the substrate 11 is formed. ), Forming a semiconductor layer 12c overlapping at least a portion of the gate electrode 12a on the gate insulating film 12b, and overlapping both sides of the semiconductor layer 12c on the gate insulating film 12b, respectively. Forming a source electrode 12d and a drain electrode 12e, and an interlayer insulating film 12f covering the semiconductor layer 12c, the source electrode 12d, and the drain electrode 12e over the gate insulating film 12b. Forming a step.

The preparing of the cell array 12 may further include forming a contact hole through the interlayer insulating layer 12f to expose at least a portion of the drain electrode 12e. However, this is merely an example, and the forming of the contact hole may be performed after the forming of the first reflective layer 12d (S11).

As shown in FIG. 4B, a first reflective layer 13d corresponding to each of the plurality of first pixel regions PA1 is formed on the interlayer insulating film 12f. Here, the first reflective layer 13d is formed of a metal material having a lower resistance and reflectivity than the transparent conductive material.

As shown in FIG. 4C, the first electrode 13a corresponding to each of the plurality of first and second pixel regions PA1 and PA2 is disposed on the interlayer insulating film 12f including the first reflective layer 13d. Form of malleable material. Here, the first electrode 13a is connected to the drain electrode 12e of the switch element TFT through a contact hole penetrating through the interlayer insulating layer 12f. As a result, driving signals corresponding to the pixel areas PA1 and PA2 are selectively supplied to the first electrode 13a.

In the plurality of first pixel areas PA1, the first electrode 13a is formed to overlap on at least a portion of the first reflective layer 13d. In addition, since the plurality of first pixel areas PA1 do not emit light through an optical path including the substrate 11, the first electrode 13a may be disposed at a position overlapping the switch element TFT.

As shown in FIG. 4D, a bank layer 13f corresponding to the periphery of each of the plurality of first and second pixel regions PA1 and PA2 is formed on the interlayer insulating film 12f of the cell array 12. . In this case, the bank layer 13f may be formed to overlap at least part of the first electrode 13a at edges of each of the first and second pixel areas PA1 and PA2.

As shown in FIG. 4E, the light emitting layer 13b corresponding to each of the plurality of first and second pixel regions PA1 and PA2 is formed on the first electrode 13a including the bank layer 13f. In this case, the light emitting layer 13b may be formed of any of a self-luminous material, such as a light emitting organic material.

As shown in FIG. 4F, a second reflective layer 13e corresponding to each of the plurality of second pixel regions PA2 is formed on the light emitting layer 13b. In this case, like the first reflective layer 13d, the second reflective layer 13e is formed of a metal material having lower resistance and reflectivity than the transparent conductive material.

As shown in Fig. 4G, on the light emitting layer 13b including the second reflective layer 13e, a second electrode 13c facing the first electrode 13a is formed of a transparent conductive material. Here, in operation S16, the second electrode 13c is formed such that the second electrodes 13c of the plurality of first and second pixel regions PA1 and PA2 are connected to each other. Laminating a transparent conductive material to cover the light emitting layer 13b and the second reflective layer 13e on the entire surface of the interlayer insulating film 12f.

That is, the second electrode 13c of each of the plurality of first and second pixel areas PA1 and PA2 is integrally formed.

As shown in FIG. 4H, a protective layer 14 is formed on the entire surface of the second electrode 13c (S17), and on the protective layer 14, the light emitting layer 13b is interposed between the substrate 11 and the substrate 11. The facing cover layer 15 is bonded. In operation S18, before or after forming the cover layer 15, the light shielding layer 16 overlapping the emission layer 13b corresponding to each of the plurality of second pixel regions PA2 is further included. Can be formed.

As described above, according to the first exemplary embodiment of the present application, the second electrode 13c of the first pixel region PA1 is formed of a transparent conductive material having a relatively high resistance, but is formed on at least a portion of the second reflective layer 13e. Since the second electrode 13c of the formed second pixel area PA2 is electrically connected to each other, the resistance of the second electrode 13c may be lowered by the second reflective layer 13e made of a metal material having low resistance. Can be.

As a result, not only the second electrode 13c of the second pixel region PA2 directly connected to the second reflective layer 13e, but also the first pixel region connected to the second electrode 13c of the second pixel region PA2 ( The second electrode 13c of PA1 also has a resistance lowered by the second reflective layer 13e. Therefore, due to the high resistance of the second electrode 13c, a large voltage drop can be prevented and the luminance of some of the first pixel areas PA1 spaced apart from the power source can be prevented from being lowered. That is, deterioration of the image quality of the front image due to the high resistance of the second electrode 13c can be prevented, whereby the large area can be realized more easily.

Next, referring to FIGS. 5 and 6, a double-sided display device according to a second embodiment of the present disclosure will be described.

5 is a diagram illustrating a pixel array structure of a double-sided display device according to a second exemplary embodiment of the present disclosure, and FIG. 6 is a cross-sectional view illustrating a part of each of the first and second pixel areas illustrated in FIG. 5.

As shown in FIG. 5, the display area AA ′ of the double-sided display device according to the second exemplary embodiment of the present disclosure is a transparent area TA defined as at least a portion between the first and second pixel areas PA1 and PA2. It includes more.

That is, as shown in FIG. 6, according to the second embodiment, each of the gate insulating film 12b, the interlayer insulating film 12f, and the second electrode 13c formed on the entire surface of the substrate 11 is a transparent area TA. It is formed to correspond more to).

Since the transparent area TA penetrates the rear surface of the double-sided display device, the transparent area TA generates an optical illusion in which the double-sided display device is transparent.

As described above, the double-sided display device according to the second embodiment of the present application is the same as the first embodiment of the present application except that the display device further includes a transparent area TA to be implemented as a transparent display. The description will be omitted.

The present invention described above is not limited to the above-described embodiment and the accompanying drawings, it is conventional in the art that various substitutions, modifications and changes are possible within the scope without departing from the technical spirit of the present invention. It will be evident to those who have knowledge of.

AA: display area PA1: first pixel area
PA2: second pixel region 11: substrate
TFT: switch element 12a: gate electrode
12b: gate insulating film 12c: semiconductor layer
12d: source electrode 12e: drain electrode
12f: interlayer insulating film EL1, EL2: first and second organic light emitting elements
13a: first electrode 13b: light emitting layer
13c: second electrode 13d: first reflective layer
13e: second reflective layer 13f: bank layer
14: protective layer 15: cover layer
16: Light shielding layer TA: transparent area

Claims (11)

In a double-side display device in which a display area is defined to include a plurality of first and second pixel areas that emit light in directions opposite to each other, and which can display an image from both sides,
A first electrode formed on the cell array corresponding to each of the plurality of first and second pixel regions;
An emission layer formed on the first electrode corresponding to each of the plurality of first and second pixel regions;
A second electrode formed on the light emitting layer so as to face the first electrode of each of the plurality of first and second pixel regions;
A first reflective layer formed between the cell array and the light emitting layer corresponding to each of the plurality of first pixel regions;
A second reflective layer formed between the light emitting layer and the second electrode corresponding to each of the plurality of second pixel regions;
A cover layer formed on an entire surface of the second electrode to face the cell array and sealing the light emitting layer; And
A light shielding layer formed between the second electrode and the cover layer to correspond to the plurality of second pixel regions and shielding light emitted from the light emitting layer from the outside through the cover layer;
The first and second electrodes are formed of a transparent conductive material,
The first and second reflective layers are formed of a reflective metal material having a lower resistance than the transparent conductive material,
And the second electrode of each of the plurality of first and second pixel regions is connected to each other. The method of claim 1,
And the second electrode is formed on the entire surface of the cell array to cover the light emitting layer and the second reflecting layer, and is electrically connected to the second reflecting layer. The method of claim 1,
The display area further includes a transparent area defined as at least a portion between the first and second pixel areas,
And the second electrode is further formed on the cell array to correspond to the transparent area. The method of claim 1,
And the cell array includes a switch element for supplying driving signals corresponding to each of the plurality of first and second pixel regions to the first electrode. The method of claim 1,
A bank layer formed on the cell array so as to correspond to outer peripheries of the plurality of first and second pixel regions; And
Further comprising a protective layer formed between the second electrode and the cover layer,
And the light shielding layer is positioned between the protective layer and the cover layer. delete 1. A method of manufacturing a double-side display device in which a display area is defined to include a plurality of first and second pixel areas that emit light in directions opposite to each other, and capable of displaying an image on both sides.
Providing a cell array;
Forming a first reflective layer on the cell array, the first reflective layer corresponding to each of the plurality of first pixel regions, from a metal material;
Forming a first electrode corresponding to each of the plurality of first and second pixel regions on the cell array including the first reflective layer, using a transparent conductive material;
Forming a light emitting layer corresponding to each of the plurality of first and second pixel regions on the first electrode, using a light emitting organic material;
Forming a second reflective layer on the light emitting layer, the second reflective layer corresponding to each of the plurality of second pixel regions, from the metal material;
Forming a second electrode on the light emitting layer including the second reflective layer, the second electrode facing the first electrode, the transparent conductive material corresponding to each of the plurality of first and second pixel regions;
Forming a cover layer on the front surface of the second electrode to seal the light emitting layer so as to face the cell array; And
Forming a light shielding layer between the second electrode and the cover layer to shield light emitted from the light emitting layer corresponding to the plurality of second pixel regions from being emitted to the outside through the cover layer;
The metal material has a lower resistance than the transparent conductive material,
And in the forming of the second electrode, the second electrode of each of the plurality of first and second pixel regions is formed to be connected to each other. The method of claim 7, wherein
Forming the second electrode
Stacking the transparent conductive material on the entire surface of the cell array to cover the light emitting layer and the second reflective layer. The method of claim 7, wherein
The display area further includes a transparent area defined as at least a portion between the first and second pixel areas,
In the forming of the second electrode, the second electrode is further formed on the cell array corresponding to the transparent region. The method of claim 7, wherein
After forming the first electrode,
Forming a bank layer on the cell array, the bank layer corresponding to outer peripheries of the plurality of first and second pixel regions;
After forming the second electrode,
Forming a protective layer on an entire surface of the second electrode;
And the light shielding layer is formed between the protective layer and the cover layer. delete

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