KR102022250B1 - Display device with coating layer improved AR / IR reflectance and transmittance by sputtering process - Google Patents

Abstract

The present invention relates to a display device having a coating layer with improved reflectivity and transmittance of AR/infrared rays (IR) using a sputtering process and, more specifically, to a display device having a coating layer with improved reflectivity and transmittance of AR/IR using a sputtering process, which has reflectivity less than or equal to 5% in a visible ray section and equal to or more than 45% in an IR section, transmittance equal to or more than 90% in the visible ray section, and a solar light shielding ratio equal to or more than 25% in the IR section by forming an AR/IR coating layer by the sputtering process. To this end, the display device having a coating layer formed by using a sputtering process comprises: a glass as the display device, on which multiple layers of Nb205 and SiO2 are alternately deposited; a first layer of Nb2O5 deposited on the glass; a second layer of SiO2 deposited on the first layer; a third layer of Nb2O5 deposited on the second layer; a fourth layer of SiO2 deposited on the third layer; a fifth layer of Nb2O5 deposited on the fourth layer; and a sixth layer of SiO2 deposited on the fifth layer, wherein the reflectivity is less than or equal to 5% in a visible ray section (550 nm) and equal to or more than 45% in an infrared ray section (1100 nm), the transmittance is equal to or more than 92% in the visible ray section (550 nm), and the solar light shielding ratio is equal to or more than 25% in the infrared ray section (1100 nm).

Description

Display device with coating layer improved AR / IR reflectance and transmittance by sputtering process}

The present invention relates to a display device having a coating layer having improved AR / IR reflectance and transmittance using a sputtering process. More particularly, the present invention relates to a display device in which an AR / IR coating layer is formed by a sputtering process, thereby reflecting light in a visible light section. Reflectance and transmittance of AR / IR using sputtering process with less than 5%, more than 45% in infrared (IR), more than 90% in visible, and more than 25% in the infrared. A display device having an improved coating layer formed thereon.

The touch screen panel is a panel that does not use an input device such as a keyboard or a mouse, and detects the position of a person's hand or an object on a screen or a specific position to process a specific function. Touch screens to which the touch screen panel is applied are widely used in portable terminals such as mobile phones and navigation devices and fixed terminals such as guide screens for tourism / publicity because they are portable and easy to operate.

The touch screen panel is basically composed of a touch screen panel, a controller, a driver SW, and the like. The touch screen panel is composed of a top plate (Film) and a bottom plate (Film or Glass) on which a transparent conductive film (ITO: Indium Tin Oxide) is deposited, and determines whether there is a contact input, detects input coordinates, and transmits a signal to the controller. The controller converts a signal transmitted from the touch screen panel into a digital signal and outputs the coordinates on the display. The driver SW receives a digital signal from the controller and implements the touch screen panel for each operating system. to be.

The touch screen panel may include a resistive method, a capacitive method, a surface accoustic wave (SAW) method, a resistive film multi-touch method, and an IR (according to an implementation method). Infrared: Infrared).

The resistive film is coated with a resistive material on a glass or plastic plate and covered with a polyethylene film thereon, and insulating bars are installed at regular intervals so that the two surfaces do not touch each other. The principle of operation is that if a constant current flows through both ends of the resistive film, the resistive film acts like a resistor having a resistive component, so that a voltage is applied at both ends. When contact is made with a finger, the upper surface of the polyester film is bent and connected. Therefore, the resistance component of the two surfaces leads to a parallel connection of the resistors, resulting in a change in the resistance value.

At this time, a change in voltage also occurs due to the current flowing through both ends, and the position of the touched finger can be known by the degree of change in the voltage. The resistive method has a high resolution and the fastest response time by operating by surface pressure, but has a disadvantage in that the risk of breakage is great because only one point is executed.

The capacitive type is made by coating transparent special conductive metal (TAO) on both surfaces of the glass which are heat treated. Applying voltage to the four corners of the screen spreads the high frequency across the front of the sensor. When a finger touches the screen, the flow of electrons changes and this change is detected to determine the coordinates. Capacitive type has the advantage of being able to execute by pressing several points at the same time, high resolution and good durability, while low response speed and difficult to install.

The resistive film multi-touch method is implemented by implementing the same as the capacitive method by supplementing and improving the maximum disadvantage of the resistive film method that can be executed only one point.

The touch screen panel has not only problems of signal amplification, difference in resolution, difficulty of design and processing technology, but also the optical, electrical, mechanical, environmental, input, durability, and economic characteristics of each touch screen panel. It is selected for the electronic products of the individual in consideration of such as, in particular, in the mobile phone, portable PC, etc., the resistive film type and the capacitive type are widely used.

Meanwhile, in the manufacturing technology of the touch screen panel, the thickness of the touch screen panel is manufactured to be made thinner to have sufficient durability while minimizing the conventional complicated process, which is the same as that of the existing products even though the display brightness is increased by increasing the light transmittance. Implementing it can reduce power consumption and increase battery life.

Looking at the configuration of a typical resistive touch screen panel,

A window film provided on one surface of the liquid crystal display device, and a first and second ITO film attached to the lower surface of the window film and provided to electrically input information to the liquid crystal display module, wherein the window film includes a first ITO film. It is provided to protect the fabric is made of a general PET (Poly Ethylen Terephthalate) film, the first ITO film is attached to the window film by an optical clear adhesive (OCA: Optical Clear Adhesive). The first and second ITO films are printed with first and second electrode layers using silver provided at edges, respectively, and double-sided tape is attached between the first and second electrode layers for insulation. The Dot Spacer is spaced at regular intervals and is electrically connected to each other when external pressure (touch) using a finger or a touch pen is sensed, thereby detecting the correct touch position.

However, the configuration made as described above is not only the light transmittance is lowered by the lamination process using a light transparent adhesive between the window film and the first ITO film, but also the window film is placed and attached to the first ITO film by the light transparent adhesive. Since a separate process must be performed, the process is complicated and the process cost increases.

In addition, since the ITO film on which the ITO film is formed is patterned through laser wet etching, the above structure cannot selectively coat ITO on a desired area of the window film.

Korean Patent No. 0974073 has been disclosed as a conventional technique proposed to solve this problem.

The prior art is a method of manufacturing a window touch screen panel, the manufacturing method is a window film for protecting an indium tin oxide film having a sensing electrode function, and the ITO Integrating the film to produce a window ITO film by a sputtering method and by patterning an electrical wiring circuit on the lower surface of the manufactured window ITO film layer (Printing the first electrode layer and the printed terminal of the first electrode layer) Forming a first transparent printed layer to protect the upper substrate, and manufacturing an upper substrate, and preparing a double-sided tape having an insulating property of adhering the first electrode layer of the upper substrate and the second electrode layer of the lower substrate to each other. The cutting of the double-sided tape to the size of the upper and lower substrates, 0.8mm in diameter to meet the center reference point of the cut double-sided tape Perforating an id, a half cut to perform a half knife operation for peeling the visible region of the substrates, and removing and peeling an unnecessary double-sided tape of the half cut visible region. It has a preparatory step for laminating the substrate, and also prevents the usual contact between the upper substrate and the lower substrate, and energizes when pressure is applied by a touch pen or finger, and when the pressure is released, the upper substrate is restored to elastic force. Forming a dot spacer on an upper surface of the ITO-coated ITO Tempered GlasS layer having an electrode function, and placing the dot spacer at a predetermined distance from the upper substrate, wherein the electric van is disposed on the upper surface of the ITO tempered glass layer. The lower circuit is fabricated by patterning the line circuit to form a second transparent printed layer for printing the second electrode layer and protecting the printed terminal of the second electrode layer. Laminating the polycarbonate (PC) on the lower surface of the ITO tempered glass layer of the lower substrate, and computer numerical control (CNC) to determine whether the film is cut or cut to fit the cell size of the film after lamination. : A method of manufacturing a slim window touch screen panel comprising the step of performing Computer Numerical Control.

In the prior art, the thickness is thicker than the center of the touch screen by painting the inside of the edge of the touch screen or silk screen printing, and thus, the step difference between the edge and the center of the touch screen is increased, resulting in poor durability and easy product defects. There was a downside. In addition, the ITO coated film or ITO coated glass on the back of the glass including the screen printing layer, there was a disadvantage in manufacturing cost and cost of the product.

On the other hand, in the above-mentioned conventional technique, sputtering is a type of vacuum deposition method used in integrated circuit production line process, and accelerates an inert gas such as argon ionized plasma at a relatively low vacuum degree to impinge on the target, and eject atoms to emit wafers or glass. The film is made on the same substrate. In sputtering equipment, the target side is the cathode and the substrate side is the anode.

Looking more closely at this principle of sputtering, a low pressure argon gas is flowed into the chamber after bringing the chamber close to a vacuum. When a negative voltage is applied to the negative electrode, an electric field is formed between the negative electrode (with the target material to be deposited) and the positive electrode (substrate such as wafer or glass), and the argon gas exposed to the electric field is ionized with Ar + and the substrate Plasma is generated between the cathode and the cathode. Since the surface of the target material mounted on the cathode is maintained at a negative potential than that of the substrate, Ar + (argon ions) is accelerated to the target surface and collided, and source atoms and molecules are released from the target surface and fly to the substrate to be deposited. The thin film made by the growth of the material behind the substrate is called a thin film.

Such a stuffing method is characterized in that the deposition ability, the ability to maintain a complex alloy is superior to the distillation method, and the ability to deposit heat-resistant metal at high temperatures. In addition, the yield of the sputtering process is determined by the incident angle of the collision ions, the composition and bonding structure of the target material, the type of the collision ions, the energy of the collision ions, and the like.

In addition, the sputtering method has the advantages of compact film formation, strong film quality, stable deposition process, and precise control of film thickness, whereas glow discharge (ionizing reaction gas into an enclosed space by ionizing inert gas) The application of electricity to both electrodes causes a large amount of gas to be used to cause the gas to be ionized and collided with each other. Secondary electrons such as ionized anions are irradiated to the anode, resulting in a high temperature of the substrate substrate.

(0001) Republic of Korea Registered Patent No. 0974073

The present invention solves the above problems, in particular, the reflectance of AR / IR using a sputtering process that improves the performance of reflectance and transmittance for AR (Anti-reflection) and IR (Infrared: Infrared) using a sputtering process And it is an object to provide a display device formed with a coating layer having improved transmittance.

In addition, the present invention can implement a variety of colors, such as transparent or red, violet, the solar shielding rate is 25% or more in the infrared region 1050 ~ 1150nm to prevent coloring by deterioration, AR using a sputtering process to improve the durability It is an object of the present invention to provide a display device with a coating layer having improved reflectance and transmittance of / IR.

In order to achieve the above object, the present invention provides a display device in which a coating layer is formed by using a sputtering process, wherein a glass 10 as the display device and Nb205 and SiO 2 are alternately alternately formed on the glass. A first layer 21 of Nb 2 O 5 deposited on the glass, a second layer 22 of SiO 2 deposited on the first layer, and a third layer of Nb 2 O 5 deposited on the second layer (23), a fourth layer 24 of SiO2 deposited on the third layer, a fifth layer 25 of Nb2O5 deposited on the fourth layer, and SiO2 deposited on the fifth layer Including the sixth layer 26 of the reflectance , the reflectance is 5% or less in the visible light section at 540 to 560 nm, and is 45% or more in the infrared light section at 1050 to 1150 nm, and the transmittance is 92% or more at the visible light section at 540 to 560 nm. The solar shielding rate is 25% or more at an infrared region of 1050 to 1150 nm .

The thickness of Nb205 deposited on glass or SiO2 is 5 to 130 nm, and the thickness of SiO2 is deposited on Nb205 is 10 to 190 nm.

The thickness of Nb205 constituting the first layer 21 is 10-20 nm, the thickness of SiO2 constituting the second layer 22 is 30-50 nm, and the thickness of Nb205 constituting the third layer 23 is The thickness is 110-130 nm, the thickness of SiO2 constituting the fourth layer 24 is 170-190 nm, the thickness of Nb205 constituting the fifth layer 25 is 80-110 nm, and the sixth layer ( The thickness of SiO2 constituting 26) is 70-90 nm, which is colorless.

The thickness of Nb205 constituting the first layer 21 is 110 to 130 nm, the thickness of SiO2 constituting the second layer 22 is 120 to 140 nm, and the thickness of Nb205 constituting the third layer 23 is measured. The thickness is 10 to 30 nm, the thickness of SiO2 constituting the fourth layer 24 is 50 to 70 nm, the thickness of Nb205 constituting the fifth layer 25 is 90 to 110 nm, and the sixth layer ( 26) the thickness of SiO2 constituting 80 ~ 100nm, the front side is colorless, the side represents Violot,

The reflectance is 5% or less in the visible light section at 540 to 560 nm, 45% or more in the infrared light section at 1050 to 1150 nm, and the transmittance is 92% or more at 540 to 560 nm in the visible light section. More than 30% at 1150nm .
In a display device in which a coating layer is formed using a sputtering process,

A glass 10 as the display device, a multilayer alternating deposition of Nb205 and SiO 2 on the glass, the first layer 21 of Nb 2 O 5 deposited on the glass and having a thickness of 10 to 20 nm; A second layer 22 of SiO 2 having a thickness of 20 to 30 nm deposited on the first layer, a third layer 23 of Nb 2 O 5 having a thickness of 100 to 120 nm, and deposited on the second layer; A fourth layer 24 of SiO 2 having a thickness of 150 to 170 nm deposited on the third layer and a fifth layer 25 of Nb 2 O 5 having a thickness of 15 to 25 nm deposited on the fourth layer. And a sixth layer 26 of SiO 2 deposited on the fifth layer and having a thickness of 10 to 15 nm, and a seventh layer of Nb 2 O 5 deposited and deposited on the sixth layer and having a thickness of 70 to 90 nm. 27) and an eighth layer 28 of SiO 2 having a thickness of 75 to 85 nm deposited on the seventh layer, the reflectance of which is less than 5% in the visible light section 540 to 560 nm, and the infrared section 1050. 45% or more at ~ 1150nm Rate, and more than 92% in the visible range 540 ~ 560nm, sunlight shielding rate is characterized in that at least 25% in the infrared region 1050 ~ 1150nm.

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In a display device in which a coating layer is formed using a sputtering process,

A glass 10 as the display device, a multilayer alternating deposition of Nb205 and SiO2 on the glass, the first layer 21 of Nb2O5 deposited on the glass and having a thickness of 5 to 25 nm; A second layer 22 of SiO 2 having a thickness of 25 to 45 nm deposited on the first layer, a third layer 23 of Nb 2 O 5 having a thickness of 100 to 125 nm deposited on the second layer, A fourth layer 24 of SiO 2 having a thickness of 135 to 155 nm deposited on the third layer, and a fifth layer 25 of Nb 2 O 5 having a thickness of 5 to 15 nm deposited on the fourth layer. And a sixth layer 26 of SiO 2 deposited on the fifth layer and having a thickness of 5 to 20 nm, and a seventh layer of Nb 2 O 5 deposited and deposited on the sixth layer and having a thickness of 70 to 90 nm. 27) and an eighth layer 28 of SiO 2 having a thickness of 50 to 75 nm deposited on the seventh layer, the reflectance being 5% or less at visible light 550 nm and 45% or more at infrared light 1100 nm. The transmittance is visible light 55 It is 90% or more at 0 nm, and a solar shielding rate is 30% or more at 1100 nm of infrared rays.

The present invention made as described above, in the proposal of the display device, the reflectance and transmittance in the visible light section and the infrared section is improved compared to the reference value it can provide a display device having a reflectance and transmittance required by the user, It is possible to ensure a stable yield in the manufacturing process has the advantage of improving the economics and productivity.

In other words, the reflectance is 5% or less in the visible light section at 540 to 560 nm, 45% or more in the infrared light section at 1050 to 1150 nm, and the transmittance is 92% or more at 540 to 560 nm in the visible light section. In addition, by displaying more than 25% in the infrared region 1050 ~ 1150nm, it has the effect of improving the performance, such as visibility, optical properties, sheet resistance, transmittance required in the display device.

In addition, the present invention can implement a variety of colors, such as transparent or red, violet, solar shielding rate is 30% or more in the infrared section 1050 ~ 1150nm to prevent coloring by deterioration, and has the effect of improving durability.

1 is an exemplary view showing a display device having a coating layer having improved reflectance and transmittance of AR / IR using a sputtering process according to the present invention.
FIG. 2 is a graph showing measured values of reflection spectra of the first to third models according to an embodiment of the present invention. FIG.
3 is a graph showing measured values of transmission spectra of the first to third models according to an embodiment of the present invention.
4 is a graph illustrating values of reflection spectra of fourth to sixth models according to another exemplary embodiment of the present invention.
5 is a graph showing measured values of transmission spectra of models 4 to 6 according to another embodiment of the present invention.
Figure 6a is an exemplary view showing the measurement position of the first model to the third model according to the present invention.
Figure 6b is an exemplary view showing the measurement position of the fourth model to sixth model according to the present invention.
7 is a graph measuring reflectance among optical characteristics of the display device according to the present invention;
8 is a graph measuring transmittance among optical characteristics of the display device according to the present invention;
9 is an exemplary view showing an actual product of a display device molded according to an embodiment of the present invention.
10 is a schematic diagram illustrating plasma deposition in a typical sputtering apparatus.

Hereinafter, other objects and features of the present invention in addition to the above object will be apparent through a description of the embodiments with reference to the accompanying drawings.

Unless defined otherwise, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art. Terms such as those defined in the commonly used dictionaries should be construed as having meanings consistent with the meanings in the context of the related art, and shall not be construed in ideal or excessively formal meanings unless expressly defined in this application. Do not.

Hereinafter, with reference to the accompanying drawings will be described a preferred embodiment of the display device is formed with a coating layer to improve the reflectance and transmittance of the AR / IR using the sputtering process according to the present invention.

The display device 1 having a coating layer having improved reflectivity and transmittance of AR / IR using a sputtering process according to the present invention is coated with glass 10 as a display device and the glass in order through a sputtering process. First to sixth layers (21, 22, 23, 24, 25, 26).

The display device is mainly used for a touch screen panel or a billboard for indoor / outdoor advertising.

In the present invention, sputtering refers to plasma deposition, sputtering deposition, chemical vapor deposition (CVD), reactive sputtering, magnetron sputtering, dc sputtering, rf It can be interpreted by various deposition techniques such as sputtering (Radio Frequency Sputtering).

Preferably, in the present invention, a plasma deposition technique using plasma is used, and the plasma deposition may be interpreted as a method or apparatus for depositing a thin film by chemically activating a reactant using plasma.

In addition, the apparatus for the sputtering process in the present invention comprises a vacuum chamber, a power supply, a pump, a gas control unit and a plurality of valves, the vacuum chamber, the pump connected to the outlet connected to the chamber, and the cathode disposed in the chamber A power supply for supplying power to the power supply, a gun that is attached to the target and connected to the power supply, a shutter that opens and closes between the substrate and the target, a gas system for supplying gas into the chamber, The shield mounted to the target mounted on the gun to sputter only the desired portion and to maintain the stability of the discharge.

Plasma deposition in this sputtering apparatus is as shown in FIG.

FIG. 10 schematically illustrates a process of depositing a thin film on a target in a vacuum chamber of a general sputtering apparatus, and a cooling system for fixing the target and lowering a temperature generated during thin film deposition.

The glass 10 is disposed in the vacuum chamber as a panel of the touch screen.

Then, Nb205 and SiO 2 are alternately deposited on the glass.

In the order in which they are deposited here,

A first layer 21 of Nb 2 O 5 deposited on the glass,

A second layer 22 of SiO 2 deposited on the first layer,

A third layer 23 of Nb 2 O 5 deposited on the second layer,

A fourth layer 24 of SiO 2 deposited on the third layer,

A fifth layer 25 of Nb 2 O 5 deposited on the fourth layer,

And a sixth layer 26 of SiO 2 deposited on the fifth layer.

Nb205 is

The thickness deposited on glass or SiO2 is 5 to 130 nm,

SiO2 is,

The thickness deposited on the Nb205 is characterized in that 10 ~ 190nm.

As shown in (a) of FIG. 1, the display device 1 according to an embodiment of the present invention may include a glass 10 and first layers laminated alternately on the glass 10. Including the sixth layer,

The thickness of Nb205 which comprises the said 1st layer 21 is 10-20 nm, Preferably it is 15 nm,

The thickness of SiO2 constituting the second layer 22 is 30-50 nm, preferably 40 nm,

The thickness of Nb205 which comprises the said 3rd layer 23 is 110-130 nm, Preferably it is 120 nm,

The thickness of SiO2 constituting the fourth layer 24 is 170 to 190 nm, preferably 180 nm,

The thickness of Nb205 which comprises the said 5th layer 25 is 80-110 nm, Preferably it is 100 nm,

The thickness of SiO2 constituting the sixth layer 26 is 70 to 90 nm, preferably 90 nm.

Here, the reason for limiting the numerical value in the process of alternately depositing Nb205 and SiO2 on the glass is that the reflectance is 5% or less in the visible light section 540 to 560 nm, 45% or more in the infrared section 1050 to 1150 nm, and the transmittance is 92% or more at 540 ~ 560nm in visible light section and 25% or more at 1050 ~ 1150nm in infrared section to improve the performance of visibility, optical properties, sheet resistance, transmittance, etc. As shown in FIG. 2 and FIG. 3, the reflectance is 5% or less in the visible light section, and the transmittance is 90% or more, showing a stable characteristic as a near flat line.

In addition, the billboard exhibits colorlessness, prevents coloring due to deterioration, and improves durability.

The first to sixth layers described above are sequentially deposited on the glass 10 through a sputtering process.

Nb205 refers to niobium oxide, and SiO 2 refers to silicon dioxide.

As a result of selecting a plurality of specimens of the display device 1 made as described above and inspecting their optical characteristics, the results are shown in Tables 1 to 3 below.

ITEM SPEC. n Avg Min Max Optical properties


Y (D65) total light transmittance (%) over 90 4 92.28 92.27 92.28 Y (D65) Total Light Reflectance (%) 5.0% or less 4 4.56 4.52 4.59 Color coordinates x, 0.30 or less 2 0.29 0.29 0.29 Color coordinate y 0.30 or less 2 0.29 0.29 0.29

ITEM SPEC. n Avg Min Max Optical properties


Y (D65) total light transmittance (%) over 90 4 92.41 92.28 92.54 Y (D65) Total Light Reflectance (%) 5.0% or less 4 4.60 4.57 4.62 Color coordinates x, 0.30 or less 2 0.29 0.29 0.29 Color coordinate y 0.30 or less 2 0.29 0.29 0.29

ITEM SPEC. n Avg Min Max Optical properties


Y (D65) total light transmittance (%) over 90 4 93.14 93.14 93.14 Y (D65) Total Light Reflectance (%) 5.0% or less 4 4.56 4.54 4.58 Color coordinates x, 0.30 or less 2 0.29 0.29 0.29 Color coordinate y 0.30 or less 2 0.30 0.29 0.29

In Table 1 to Table 3, the inspection of the optical properties was performed by measuring the surfaces coated with the first to sixth layers deposited on the selected specimens, and the reflectance was measured using Minolta CM-3600D. will be.

Wherein the first model to the third model is composed of 55 inches each size, as shown in Figure 6a, the coated surface is facing forward, the position of the first and fourth of the four points on both sides of the left and right were measured.

Looking at the Table 1 to Table 3 in more detail,

First, in Table 1, the first model T1 to be measured is measured in the range of 92.27 to 92.28 when the Y (D65) total light transmittance (%) is 90% or more as a reference, and on average, 92.28%.

In addition, the Y (65) total light reflectance (%) was measured in the range of 4.52-4.59 when it was 5.0% or less of the reference | standard, and was measured by 4.56% on average.

On the other hand, the color coordinate x was measured as 0.29 when the reference is 0.30 or less, and the color coordinate y was measured as 0.29 when the reference was 0.30 or less.

In the following Table 2, the second model (T2) to be measured was measured in the range of 92.28 ~ 92.54 when the Y (D65) total light transmittance (%) is 90% or more as a reference, and averaged at 92.41%.

In addition, the Y (65) total light reflectance (%) was measured in the range of 4.57-4.62 when it was 5.0% or less of the reference | standard, and measured as 4.60% on average.

On the other hand, the color coordinate x was measured as 0.29 when the reference is 0.30 or less, and the color coordinate y was measured as 0.29 when the reference was 0.30 or less.

In Table 3, the third model (T3), which is the measurement target, was measured to be 93.14% on average when the total light transmittance (%) of Y (D65) was 90% or more as a reference.

In addition, the Y (65) total light reflectance (%) was measured in the range of 4.54 to 4.58 when the reference value was 5.0% or less, and was measured to be 4.56% on average.

On the other hand, the color coordinate x was measured as 0.29 when the reference is 0.30 or less, and the color coordinate y was measured by 0.29 when the reference was 0.30 or less and on average 0.30.

The optical characteristics of the display device 1 according to the present invention through the optical characteristics test, the transmittance is higher than the measurement reference value, the reflectance is lower than the measurement reference value, which is the first layer to the sixth layer It can be seen that the transmittance and reflectance of the coated display device of the present invention is improved compared to the conventional art.

Next, FIG. 2 is a graph illustrating reflection spectra of the first to third models, which are the measurement targets.

Here, the wavelength is represented by the X-axis and the reflectance (Reflectance) by the Y-axis, and the graph shows the change in the Y-axis reflectivity when the X-axis wavelength is changed from a minimum of 360 nm to a maximum of 740 nm.

Here, the wavelength of the X axis means a range of 380 nm to 780 nm, which is a visible light range.

That is, the display device 1 according to the present invention shows a sharp drop in the wavelength band entering the visible light section for the first time, and can be confirmed that the display device 1 remains flat at 5% or less in the visible light section.

3 is a graph showing transmission spectra of the first to third models, which are the measurement targets.

Here, the wavelength is represented by the X-axis and the reflectance (Reflectance) by the Y-axis, and the graph shows the change in the Y-axis reflectivity when the X-axis wavelength is changed from a minimum of 360 nm to a maximum of 740 nm.

Here, the wavelength of the X axis means a range of 380 nm to 780 nm, which is a visible light range.

As shown in FIG. 3, the display device 1 according to the present invention can be seen to maintain a flat transmittance of 90% or more after a rapid increase in transmittance at the time of entering the visible light section.

Through the measurement graphs of reflectance and transmittance shown in FIGS. 2 and 3, the display device 1 according to the present invention is visible light through the coating layers of the first to sixth layers in which Nb205 and SiO 2 are alternately deposited on glass. Reflectance and transmittance in the interval can be confirmed an improved measurement compared to the reference range, which is to meet the expected effect of the improved reflectance and transmittance in AR and IR through the present invention.

On the other hand, the first layer inner sixth layer according to another embodiment of the present invention,

The thickness of Nb205 constituting the first layer 21 is 110 to 130 nm, preferably 120 nm,

The thickness of SiO2 constituting the second layer 22 is 120-140 nm, preferably 130 nm,

The thickness of Nb205 which comprises the said 3rd layer 23 is 10-30 nm, Preferably it is 20 nm,

The thickness of SiO2 constituting the fourth layer 24 is 50 to 70 nm, preferably 60 nm,

The thickness of Nb205 which comprises the said 5th layer 25 is 90-110 nm, Preferably it is 100 nm,

The thickness of SiO2 constituting the sixth layer 26 is 80 to 100 nm, preferably 90 nm.

According to another embodiment of the present invention, the manufactured display device has a color. The display device according to the present embodiment has a transparent front surface, a violet color on a side surface, and a reflectance of 5% or less at 550 nm of visible light. It is 45% or more at 1100 nm of infrared rays, the transmittance | permeability is 90% or more at 550 nm of visible rays, and the solar shielding rate shows 30% or more characteristics at 1100 nm of infrared rays.

As shown in FIG. 9, the display device of the above-described embodiment is made of non-color, and the display device of the other embodiment is of violet color.

Tables 4 to 6 below show measurement of optical characteristics of randomly selected fourth to sixth models in the display device manufactured according to the above embodiment.

In addition, the optical properties of the fourth to sixth models were measured by the same conditions and the same equipment as the optical properties of the first to third models.

However, each of the fourth to sixth models is 55 inches in size, and as shown in FIG. 6B, the coated surface faces forward, and the three points of the central portion are divided into upper, middle, and lower portions, respectively. It is measured.

ITEM SPEC. n Avg Min Max Optical properties


Transmittance (%) over 90 3 93.76 93.45 93.96 Reflectance (%) 5.0% or less 3 4.49 4.46 4.55 Color coordinates x, 0.30 or less 3 0.29 0.29 0.30 Color coordinate y 0.30 or less 3 0.30 0.28 0.29

ITEM SPEC. n Avg Min Max Optical properties


Transmittance (%) over 90 3 94.05 93.64 94.31 Reflectance (%) 5.0% or less 3 4.66 4.47 4.76 Color coordinates x, 0.30 or less 3 0.30 0.29 0.30 Color coordinate y 0.30 or less 3 0.30 0.30 0.30

ITEM SPEC. n Avg Min Max Optical properties


Transmittance (%) over 90 3 94.05 93.97 94.22 Reflectance (%) 5.0% or less 3 4.71 4.46 4.84 Color coordinates x, 0.30 or less 3 0.30 0.30 0.31 Color coordinate y 0.30 or less 3 0.31 0.30 0.31

On the other hand, Tables 4 to 6 are measured with the coating surface of the measurement object facing forward, the three points of the central part divided into upper, middle, and lower, respectively, and then measured the lowest point and the highest point and their The average value is calculated.

As an example, Table 7 below shows detailed values of Table 6 below.

Transmittance (%)
@ 550nm reflectivity(%)
@ 550nm Color coordinate x Color coordinate y Prize 93.45 4.55 0.2984 0.3023 medium 93.96 4.47 0.3014 0.3039 Ha 93.86 4.46 0.2816 0.2812

In contrast to the above [Table 7] and [Table 6], the lowest and highest values of the transmittance values measured in [Table 7] are taken as the measured values of [Table 6], and their average values are calculated at the same time.

Tables 1 to 6 above are all calculated through the same measuring machine and method.

In Table 4, the fourth model T4 to be measured is measured in the range of 93.45 to 93.96 when the transmittance (%) is 90% or more as a reference, and is averaged to 93.76%.

In addition, the reflectance (%) was measured in the range of 4.46 to 4.55 when the reference value was 5.0% or less, and measured to 4.49% on average.

On the other hand, the color coordinate x was measured in the range of 0.28 to 0.30 when the reference 0.30 or less, on average 0.29,

The color coordinate y was measured in the range of 0.28 to 0.30 when the reference point was 0.30 or less, and on average 0.30.

In Table 5, the fifth model T5 to be measured is measured in the range of 93.64 to 94.31 when the transmittance (%) is 90% or more as a reference, and is measured to be 94.05% on average.

In addition, the reflectance (%) was measured in the range of 4.47 to 4.76 when the reference value was 5.0% or less, and was measured to be 4.66% on average.

On the other hand, the color coordinate x was measured in the range of 0.29 to 0.30 when the reference is 0.30 or less, on average 0.30,

The color coordinate y was measured to be 0.30 when the reference was 0.30 or less.

In Table 6, the sixth model T6 to be measured was measured in the range of 93.97 to 94.22 when the transmittance (%) was 90% or more, and was measured to be 94.05% on average.

In addition, the reflectance (%) was measured in the range of 4.46-4.84 when it was 5.0% or less of the reference | standard, and measured as 4.71% on average.

On the other hand, the color coordinate x was measured in the range of 0.30 to 0.31 when the reference is 0.30 or less, on average 0.30,

The color coordinate y was measured in the range of 0.30 to 0.31 when the reference point was 0.30 or less, and on average, 0.31.

As can be seen from the above measurement result, the optical properties of the fourth to sixth models according to another exemplary embodiment of the present invention were measured to have all other measured values except the color coordinate y of the model 6 improved than the reference range.

Here, the measured value of the color coordinate y of the model 6 exceeds the reference value, but it is within the error range of the measured value and does not particularly indicate a decrease in performance.

Next, FIG. 4 is a graph illustrating reflection spectra of the fourth to sixth models that are the measurement targets.

Here, the wavelength is represented by the X-axis and the reflectance (Reflectance) by the Y-axis, and the graph shows the change in the Y-axis reflectivity when the X-axis wavelength is changed from a minimum of 360 nm to a maximum of 740 nm.

Here, the wavelength of the X axis means a range of 380 nm to 780 nm, which is a visible light range.

On the other hand, the position measured in the fourth to sixth model of the measurement object is a portion corresponding to the position of the upper (up) at the position divided into the upper, middle, lower three points of the center of the measurement object .

As shown in FIG. 4, the reflectance spectra of the fourth to sixth models according to another embodiment of the present invention, that is, the reflectance shows a sharp drop in entering the 440 nm wavelength after the start of measurement, and then the average of 4.7% reflectance is measured up to the 650 nm wavelength. After the 650 nm wavelength, the reflectance increases as the wavelength increases.

Meanwhile, in FIG. 4, the measured values of the fourth model and the fifth model are almost the same, and the measurement graphs of both models are overlapped.

The reflectance spectrum, that is, the reflectance measurement value, was confirmed that the display device 1 according to another embodiment of the present invention exhibited stable reflectance since the 400 nm wavelength passed after the display device 1 suddenly dropped as it entered the visible light section. This proved that the display device has an improved reflectance by having a reflectance lower than a reference value in the visible light section within the range that the viewer visually checks.

Meanwhile, 'phase' described in FIG. 4 means measuring the upper part of the fourth model, 'phase' means measuring the upper part of the fifth model, and 'phase' means measuring the upper part of the sixth model. Means that.

Next, FIG. 5 is a graph illustrating transmission spectra of the fourth to sixth models that are the measurement targets.

Here, the wavelength is represented by the X-axis and the reflectance (Reflectance) by the Y-axis, and the graph shows the change in the Y-axis reflectivity when the X-axis wavelength is changed from a minimum of 360 nm to a maximum of 740 nm.

Here, the wavelength of the X axis means a range of 380 nm to 780 nm, which is a visible light range.

At this time, the transmission spectrum of the fourth to sixth models, that is, the position of the measurement object for measuring the transmittance is the same as the position of the measurement object for measuring the reflectance.

As shown in FIG. 5, the reflectance spectra of the fourth to sixth models according to another exemplary embodiment of the present invention, that is, the reflectance is rapidly increased upon entering the 440 nm wavelength after the start of measurement, and then averaged 94% to the 650 nm wavelength. The measurement of the reflectance was shown, and the gradually decreasing transmittance was measured after the 650 nm wavelength.

It was confirmed that the above transmission spectrum, i.e., the measured value measuring the transmittance, showed a stable transmittance after 400 nm wavelength after rising as it entered the visible light section. This proved that the display device has an improved transmittance by having a transmittance higher than a reference value in the visible light section within the range visually confirmed by the viewer.

Meanwhile, in FIG. 5, the measured values of the fourth model and the fifth model are almost the same, and the measurement graphs of both models are overlapped.

As shown in FIG. 1B, the display device 1 according to still another embodiment of the present invention has a glass 10 and a first layer laminated alternately on the glass 10. To eighth layer,

The first layer to eighth layer

The thickness of Nb205 which comprises the said 1st layer 21 is 10-20 nm, Preferably it is 10 nm,

The thickness of SiO2 constituting the second layer 22 is 20-30 nm, preferably 25 nm,

The thickness of Nb205 which comprises the said 3rd layer 23 is 100-120 nm, Preferably it is 110 nm,

The thickness of SiO2 constituting the fourth layer 24 is 150-170 nmnm, preferably 160nm,

The thickness of Nb205 which comprises the said 5th layer 25 is 15-25 nm, Preferably it is 20 nm,

The thickness of SiO2 constituting the sixth layer 26 is 10-15 nm, preferably 15 nm,

The thickness of Nb205 which comprises the said 7th layer 27 is 70-90 nm, Preferably it is 80 nm,

The thickness of SiO2 constituting the eighth layer 28 is 75 to 85 nm, preferably 80 nm.

The present invention provides a glass 10 as a display device according to another embodiment,

Alternate deposition of Nb205 and SiO2 on the glass;

A first layer 21 of Nb 2 O 5 deposited on the glass and having a thickness of 5 to 25 nm;

A second layer 22 of SiO 2 deposited on the first layer and having a thickness of 25 to 45 nm;

A third layer 23 of Nb 2 O 5 deposited on the second layer and having a thickness of 100 to 125 nm;

A fourth layer 24 of SiO 2 deposited on the third layer and having a thickness of 135 to 155 nm;

A fifth layer 25 of Nb 2 O 5 deposited on the fourth layer and having a thickness of 5 to 15 nm;

A sixth layer 26 of SiO 2 deposited on the fifth layer and having a thickness of 5 to 20 nm;

The seventh layer 27 of Nb2O5 deposited and deposited on the sixth layer is 70-90 nm, and the eighth layer 28 of SiO2 deposited and deposited on the seventh layer is 50-75 nm. Including, the reflectance is 5% or less in the visible light section 540 ~ 560nm, 45% or more in the infrared section 1050 ~ 1150nm, the transmittance is 90% or more in the visible light section 540 ~ 560nm, It is more than 30% at 1050 ~ 1150nm in the infrared section, the front is transparent and the side has violet color.

That is, in another embodiment of the present invention, a multilayer alternating deposition of Nb205 and SiO2 on the glass, the deposited layer is composed of a total of eight layers.

The manufactured display device can implement various colors among the red system such as transparent, red, and violet, and includes the features of the display device, and the solar shielding rate is 25% or more in the infrared region (1100 nm).

Wherein the thickness of the glass is selected in the range of 1 ~ 8t and the selection of the sixth or eighth layer in the above embodiments is selected according to the use of the display device, the classification of the use is used for indoor or outdoor advertising (Digital Signage).

In addition, Figure 7 is a graph showing the measurement of the reflectance of the optical characteristics of the display device with a coating layer according to the present invention,

The X axis is wavelength (nm), and the Y axis is reflectance (%).

As shown in FIG. 7, it can be seen that the display device according to the present invention satisfies 5% or less in the visible light region (550 nm) and 45% or more in the infrared region (1100 nm).

8 is a graph illustrating the measurement of the transmittance among optical characteristics of the display device having a coating layer according to the present invention.

The X axis is wavelength (nm) and the Y axis is transmittance (%).

As shown in FIG. 8, the display device according to the present invention satisfies 92% or more in the visible light section (550 nm) and maintains 90% in the vicinity of the 1700 nm wavelength after a temporary drop in the infrared section (1100 nm). have.

According to the present invention made as described above, the reflectance and the transmittance in the visible light section and the infrared section is improved compared to the reference value, thereby providing a display device having the reflectance, transmittance and solar shielding rate required by the user. It can be, and can ensure a stable yield in the manufacturing process has the advantage of improving the economics and productivity.

In the present invention, the solar shielding rate refers to the degree of blocking the deterioration of the optical properties of the glass by blocking the heat incident to the glass from the sunlight.

In the present invention as described above has been described by the specific embodiments, such as specific components and limited embodiments and drawings, but this is provided to help a more general understanding of the present invention, the present invention is not limited to the above embodiments. For those skilled in the art, various modifications and variations are possible from these descriptions.

Therefore, the spirit of the present invention should not be limited to the described embodiments, and all of the equivalents and equivalents of the claims, as well as the claims described below, belong to the scope of the present invention. .

1: display device according to the present invention
10: glass
21: first layer 22: second layer
23; Third floor 24: fourth floor
25: 5th layer 26: 6th layer
27: 7th layer 28: 8th layer

Claims (7)

In a display device in which a coating layer is formed using a sputtering process,
Glass 10 as the display device,
Alternate deposition of Nb205 and SiO2 on the glass;
A first layer 21 of Nb 2 O 5 deposited on the glass,
A second layer 22 of SiO 2 deposited on the first layer,
A third layer 23 of Nb 2 O 5 deposited on the second layer,
A fourth layer 24 of SiO 2 deposited on the third layer,
A fifth layer 25 of Nb 2 O 5 deposited on the fourth layer,
Including a sixth layer 26 of SiO 2 deposited on the fifth layer,
The reflectance is 5% or less in the visible light section at 540 to 560 nm, 45% or more in the infrared light section at 1050 to 1150 nm, and the transmittance is 92% or more at 540 to 560 nm in the visible light section. 25% or more at ~ 1150 nm,
The thickness of Nb205 constituting the first layer 21 is 10-20 nm, the thickness of SiO2 constituting the second layer 22 is 30-50 nm, and the thickness of Nb205 constituting the third layer 23 is The thickness is 110-130 nm, the thickness of SiO2 constituting the fourth layer 24 is 170-190 nm, the thickness of Nb205 constituting the fifth layer 25 is 80-110 nm, and the sixth layer ( 26) the thickness of SiO2 constituting the 70-90nm,
The first layer through the sixth layer is deposited on the glass in order through a sputtering process, the color reflectance of AR / IR reflectance of the sputtering process characterized in that the transparent colorless to improve the durability and Display device formed with a coating layer with a light transmittance. delete delete The method according to claim 1,
The thickness of Nb205 constituting the first layer 21 is 110 to 130 nm, the thickness of SiO2 constituting the second layer 22 is 120 to 140 nm, and the thickness of Nb205 constituting the third layer 23 is measured. The thickness is 10 to 30 nm, the thickness of SiO2 constituting the fourth layer 24 is 50 to 70 nm, the thickness of Nb205 constituting the fifth layer 25 is 90 to 110 nm, and the sixth layer ( 26) a display device having a coating layer having improved reflectivity and transmittance of AR / IR using a sputtering process, characterized in that the thickness of SiO2 constituting 80 ~ 100nm. The method according to claim 4,
The reflectance is 5% or less at visible light 550 nm, 45% or more at infrared light 1100 nm,
The transmittance is 90% or more at visible light 550 nm,
Solar shielding rate is more than 30% at 1100nm infrared rays ,
A display device having a coating layer having improved reflectivity and transmittance of AR / IR using a sputtering process, wherein the front surface is colorless and the side surface is violet. In a display device in which a coating layer is formed using a sputtering process,
Glass 10 as the display device,
Alternate deposition of Nb205 and SiO2 on the glass;
A first layer 21 of Nb 2 O 5 having a thickness of 10 to 20 nm and being deposited on the glass;
A second layer 22 of SiO 2 deposited on the first layer and having a thickness of 20 to 30 nm;
A third layer 23 of Nb 2 O 5 deposited on the second layer and having a thickness of 100 to 120 nm;
A fourth layer 24 of SiO 2 deposited on the third layer and having a thickness of 150 to 170 nm;
A fifth layer 25 of Nb 2 O 5 deposited on the fourth layer and having a thickness of 15 to 25 nm;
A sixth layer 26 of SiO 2 deposited on the fifth layer and having a thickness of 10 to 15 nm;
The seventh layer 27 of Nb 2 O 5 deposited on the sixth layer and having a thickness of about 70 nm to about 90 nm;
Including the eighth layer 28 of SiO 2 deposited on the seventh layer and having a thickness of 75 to 85 nm,
The reflectance is 5% or less in the visible light section at 540 to 560 nm, 45% or more in the infrared light section at 1050 to 1150 nm, and the transmittance is 92% or more at 540 to 560 nm in the visible light section. It is more than 25% at ~ 1150nm ,
The first layer through the sixth layer is deposited on the glass in order through a sputtering process, the reflectance of the AR / IR using a sputtering process, characterized in that the transparent colorless to prevent coloring due to deterioration, improve durability Display device having a coating layer having improved transmittance. In a display device in which a coating layer is formed using a sputtering process,
Glass 10 as the display device,
Alternate deposition of Nb205 and SiO2 on the glass;
A first layer 21 of Nb 2 O 5 deposited on the glass and having a thickness of 5 to 25 nm;
A second layer 22 of SiO 2 deposited on the first layer and having a thickness of 25 to 45 nm;
A third layer 23 of Nb 2 O 5 deposited on the second layer and having a thickness of 100 to 125 nm;
A display apparatus in which a coating layer is formed by using a sputtering process deposited on the third layer.
Glass 10 as the display device,
Alternate deposition of Nb205 and SiO2 on the glass;
A first layer 21 of Nb 2 O 5 deposited on the glass and having a thickness of 5 to 25 nm;
A second layer 22 of SiO 2 deposited on the first layer and having a thickness of 25 to 45 nm;
A third layer 23 of Nb 2 O 5 deposited on the second layer and having a thickness of 100 to 125 nm;
A fourth layer 24 of SiO 2 deposited on the third layer and having a thickness of 135 to 155 nm;
A fifth layer 25 of Nb 2 O 5 deposited on the fourth layer and having a thickness of 5 to 15 nm;
A sixth layer 26 of SiO 2 deposited on the fifth layer and having a thickness of 5 to 20 nm;
The seventh layer 27 of Nb 2 O 5 deposited on the sixth layer and having a thickness of about 70 nm to about 90 nm;
The eighth layer 28 of SiO 2 having a thickness of 50 to 75 nm deposited on the seventh layer and deposited thereon,
The first to eighth layers are deposited in order on the glass through a sputtering process,
The reflectance is 5% or less at visible light 550nm , 45% or more at infrared light 1100nm ,
The transmittance is 90% or more at 550 nm of visible light ,
Solar shielding rate is 30% or more at 1100nm infrared rays ,
A display device having a coating layer having improved AR and IR reflectance and transmittance using a sputtering process, wherein the front surface is transparent and colorless to prevent coloring due to deterioration and improve durability .

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