KR102014402B1 - A deposition apparatus for a film capacitor having two masks - Google Patents

Abstract

The present invention relates to a deposition apparatus for a film capacitor having two masks, and more particularly, to rapidly and uniformly form a heavy edge when depositing aluminum on the surface of a film, which is a dielectric for manufacturing a film capacitor. While minimizing the contamination of the mask to significantly extend the service life of the mask to reduce the management cost, the present invention relates to a deposition apparatus for a film capacitor having a two masks improved to increase the production efficiency.
In particular, a film capacitor using a film in which aluminum is deposited on polypropylene is used in a field using a direct current power source. Among these, an aluminum reinforced electrode film in which the edge portion of the film is reinforced with aluminum is more reliable in forming a metal spray electrode. It is widely used because of its excellent durability and relates to its improvement.

Description

A deposition apparatus for a film capacitor having two masks}

The present invention relates to a deposition apparatus for a film capacitor having two masks, and more particularly, to rapidly and uniformly form a heavy edge when depositing aluminum on the surface of a film, which is a dielectric for manufacturing a film capacitor. While minimizing the contamination of the mask to significantly extend the service life of the mask to reduce the management cost, the present invention relates to a deposition apparatus for a film capacitor having a two masks improved to increase the production efficiency.

In particular, a film capacitor using a film in which aluminum is deposited on polypropylene is used in a field using a direct current power source. Among these, an aluminum reinforced electrode film in which the edge portion of the film is reinforced with aluminum is more reliable in forming a metal spray electrode. It is widely used because of its excellent durability and relates to its improvement.

In general, a capacitor is a device capable of storing electricity, and is called a "capacitor". The basic structure of such a capacitor is a structure in which a dielectric is inserted between both electrodes.

Such an electrode can be any conductor, but it must have basic characteristics such as low cost, excellent solderability and good oxidation in the manufacturing process.

Aluminum and zinc are used as an electrode of a film capacitor, and silver, copper, nickel, and palladium are used for a ceramic capacitor.

In the electrolytic capacitor, aluminum, tantalum, or the like is used.

On the other hand, a basic unit composed of a dielectric and an electrode is called an element, and in order to increase the capacity, the structure of the element is laminated or wound, and a capacitor used in an electronic device is generally composed of one element, but power In the capacitor, dozens of elements are connected in series and in parallel to form the necessary capacitance.

The capacity unit of the ceramic capacitor of the short-term device is picoparad, while the capacity unit of the film capacitor of the somewhat smaller product is used.

In addition, in order to miniaturize a product, a metal deposition film capacitor in which a dielectric and an electrode are integrated is common.

The basic principle of the capacitor's storage of electricity is due to the polarization of the dielectric. That is, in an electric field state, the electric dipoles in the dielectric are disorderly distributed and have the same properties as an insulator, but when an electric field is generated by applying a voltage to the electrode, the dipoles are aligned in the direction of the electric field. This phenomenon is called polarization. The stronger the polarization (the higher the number of dipoles), the higher the dielectric constant.

When polarization occurs, positive charges accumulate on one electrode and negative charges on the opposite electrode, thereby storing electricity.

Meanwhile, the metal deposition film constituting the film capacitor is heated and evaporated through the aluminum deposition boat 120 with the mask 110 installed at a very narrow interval with the coating drum 100 at several millimeters, as shown in FIG. The aluminum-deposited metal 130 is manufactured to be deposited on the surface of the base film 150 moving along the surface of the coating drum 100.

At this time, the metal deposition film is made of a vacuum deposition method that is deposited while maintaining a constant vacuum in the vacuum chamber 140.

Then, as illustrated in FIG. 2, the aluminum deposition layer 151 is formed on the base film 150, and the reinforcing electrode layer is partially formed on the slitting edge portion of the aluminum deposition layer 151. 152 is formed to form a reinforcing electrode (Heavy Edge), the layer except for the reinforcing electrode in the aluminum deposition layer 151 becomes the active electrode (active area) that is a non-reinforced portion.

In addition, the aluminum deposition layer 151 of the electrode metal film has a margin M of a predetermined width on one surface of the base film 150, and the thickness t2 of the aluminum deposition layer 151 is an aluminum heavy edge layer. It is formed thinner than the thickness t1 of 152.

Since the thickness of the active electrode is thin, the resistance value is increased, so that the loss of the electrode occurs in the metal film portion on the margin part M side, which causes the capacitor to decrease in capacity, thereby thickening only the slitting edge part. To supplement.

To do this, as shown in FIG. 1, the mask 110 is formed on the first deposition passage 112 in which an active area is deposited so that the mask 110 may be deposited on a portion forming the heavy edge. It has a shape having a second deposition passage 114 having a substantially rhombus shape unfolded from side to side at a predetermined interval.

However, when one mask 110 is used, aluminum deposits mainly adhere to the second deposition passage 114 in which the aluminum heavy edges are formed, and when the narrower and narrower, the width and thickness of the reinforcing electrode become thinner. It leads to a problem of rapidly shortening the service life and it is impossible to produce a large amount of film length.

Usually, the deposited metal 130 is unrolled in the form of a roll, the total length of the roll is approximately 2-30,000 meters, and due to the above-mentioned phenomenon, the roll of the deposited metal 130 cannot be used in the middle. Since the mask needs to be cleaned or replaced after the process, the process loss is very large, and the work can be performed after the vacuum condition is set again. Therefore, productivity and cost loss cannot be achieved.

This problem is complicated despite the long time since the introduction of the technology in the field, the special characteristics of vacuum deposition, the difficult process conditions, and the concern about defects caused by the improvement of the mask itself. The reality is that it has been passed down until now without changing or improving the concept itself.

In particular, a film capacitor using a film in which aluminum is deposited on polypropylene is used in a field using a direct current power source. Among these, an aluminum reinforced electrode film in which the edge portion of the film is reinforced with aluminum is more reliable in forming a metal spray electrode. Although it is widely used because of its excellent durability and the conventional technology, since the coating amount of the reinforcing electrode portion is higher than that of the active electrode because a single mask is used, there is a problem that a large amount of length cannot be manufactured due to the accumulation of deposits on the mask. .

Moreover, this problem is due to the fact that the aluminum thickness of the reinforcing electrode and the active electrode is larger than 2: 1 while the same quantity of deposition boats are used to coat the same amount of evaporation. The evaporation boat quantity and arrangement need to be adjusted.

Republic of Korea Patent Application Publication No. 10-1998-066056 (October 15, 1998), 'Aluminum metal deposition film for capacitors with reinforced spray surface and its manufacturing method' Republic of Korea Patent Application Publication No. 10-2000-0042117 (July 15, 2000), 'Metal deposition film for a capacitor having two reinforcing layers and a manufacturing method thereof' Republic of Korea Patent Publication No. 10-2017-0010244 (2017.01.26.), 'Vacuum deposition apparatus of metal deposition film' Republic of Korea Patent Publication No. 10-2017-0067278 (2017.06.16.), 'Film Capacitor'

The present invention was created in view of the above-described problems in the prior art, and it is possible to quickly and uniformly form the formation of a reinforcing electrode (Heavy Edge) when depositing aluminum on the surface of a film which is a dielectric for manufacturing a film capacitor. The main purpose of the present invention is to provide a deposition apparatus for a film capacitor having two masks, which is improved to minimize the contamination of the mask and significantly extend the service life of the mask, thereby reducing the management cost and increasing the production efficiency.

The present invention is a means for achieving the above object, the vacuum chamber 10; A coating drum (40) installed in the vacuum chamber (10); A base film 20 towed along the coating drum 40; In the deposition apparatus for a film capacitor comprising a; a mask (50) provided at intervals with the coating drum (40); The mask 50 includes a heavy edge mask 52 for forming a heavy edge and an active mask 54 for forming an active area; A first boat B1 for heating and evaporating the first deposited metal 30 is installed at a lower portion of the haze edge mask 52; A second boat B2 is installed below the active mask 54 to heat-evaporate the second deposited metal 30 '; The first deposition metal 30 is zinc, the second deposition metal (30 ') provides a deposition apparatus for a film capacitor having two masks, characterized in that the aluminum.

At this time, the first boat (B1) is a plurality of first deposition metal 30 that is installed from the first boat (B1) with a plurality of predetermined intervals in the direction of the first deposition metal passage (H1) is deposited first. It is installed to pass through the metal passage (H1) overlapping; A plurality of second boats B2 are installed at predetermined intervals in the direction of the second deposition metal passage H2, and the second deposition metals 30 'coming from the second boats B2 are second deposition metals. There is also a feature in that the passages H2 are provided to overlap each other.

According to the present invention, when depositing aluminum on the surface of the film as a dielectric for manufacturing a film capacitor, it is possible to rapidly and uniformly form a heavy edge and minimize the contamination of the mask to significantly extend the service life of the mask. Improved effects can be obtained to reduce costs and increase production efficiency.

1 is a schematic diagram showing the main portion of the deposition apparatus for manufacturing a metal deposition film according to the prior art.
Figure 2 is an exemplary view showing a part of the structure of the metal deposition film formed according to the prior art.
3 is an exemplary view showing the main portion of the deposition apparatus for a film capacitor having two masks according to the present invention.
4 is an exemplary view for explaining an arrangement example of a boat according to the present invention.

Hereinafter, with reference to the accompanying drawings will be described in detail a preferred embodiment according to the present invention.

Prior to the description of the present invention, the following specific structures or functional descriptions are merely illustrated for the purpose of describing embodiments according to the inventive concept, and the embodiments according to the inventive concept may be implemented in various forms, It should not be construed as limited to the embodiments described herein.

In addition, embodiments in accordance with the concepts of the present invention may be modified in various ways and may have various forms, specific embodiments will be illustrated in the drawings and described in detail herein. However, this is not intended to limit the embodiments in accordance with the concept of the present invention to a particular disclosed form, it should be understood to include all modifications, equivalents, and substitutes included in the spirit and scope of the present invention.

As shown in FIG. 3, the present invention reverses the conventional mask concept and utilizes two masks instead of one to solve a conventional problem very simply and easily, so that a roll of deposited metal reaches 2-30,000 meters. Even though the deposition process was performed using all the (one roll), the mask has almost no problem of narrowing passages as before, thus contributing to productivity improvement, defect reduction, cost reduction, and process loss prevention.

That is, the deposition apparatus for film capacitors having two masks according to the present invention includes a vacuum chamber 10.

The vacuum chamber 10 is for depositing the first and second deposition metals 30 and 30 'on the surface of the base film 20 under vacuum, and a high vacuum of about 10 ⁻⁴ torr is preferable.

The base film 20 is preferably polypropylene (PP) or polyethylene terephthalate (PET) film having good dielectric properties as a dielectric.

In addition, a coating drum 40 is installed inside the vacuum chamber 10 to pull the base film 20 in close contact, and two masks 50 are spaced apart from the coating drum 40. It is composed of separate.

In this case, the mask 50 is separated by spaced apart from each other as the haze edge mask 52 and the active mask 54. In this case, the order of the heavy edge mask 52 and the active mask 54 may be interchanged.

That is, the heavy edge mask 52 is for forming a reinforcing electrode, and the first deposition metal having a substantially rhombus shape to the left and right to pass only the first deposition metal 30. It has a structure in which a plurality of passages H1 are formed.

In addition, the active mask 54 is used to form an active area, and the second deposition metal passage H2 having a straight slit shape to pass only the second deposition metal 30 ′ is formed. ) Has a formed structure.

In addition, a first boat B1 for heating and evaporating the first deposition-deposited metal 30 is provided under the seaweed edge mask 52, and a second boat B2 is disposed below the active mask 54. ) Is provided.

In addition, since the thickness of the reinforcing electrode portion and the active electrode is different, it is necessary to adjust the quantity and arrangement of aluminum evaporation boats according to different deposition requirements.

For example, when one mask is conventionally used, if one evaporation boat is disposed under the reinforcement part 3 to 4 second metal deposition passages 114, the case of two masks includes 4 to 5 seaweed edges. If one evaporation boat is configured in the mask 52, both masks may extend the service life.

In this configuration, the narrowing of the passageway to the first deposition metal passage H1 of the haze edge mask 52 is greatly reduced.

Therefore, even if the exhausted metal rolls of 2-30,000 meters are used up, the passage of the mask is not narrowed, and there is no need to set up and maintain the equipment in the middle of the process, so that no process loss occurs and manufacturing cost is reduced. In addition, the production efficiency can be improved and product defects can be prevented.

In addition, as illustrated in FIG. 4, a plurality of first and second boats B1 and B2 disposed at the lower portions of the haze edge mask 52 and the active mask 54, respectively, are disposed at predetermined intervals, and each passage, That is, the first deposition metal passage H1 or the second deposition metal passage H2 overlaps the first and second deposition metals 30 and 30 'so as to increase the deposition rate to reduce the processing time. Can be.

In other words, a plurality of first boats B1 installed on the lower portion of the haze edge mask 52 may be installed at a predetermined interval in the direction of the first deposition metal passage H1 to rise from the first boats B1. The deposition rate of the first deposition metal 30 can be increased by allowing the first deposition metal 30 to pass through the first deposition metal passage H1.

In this case, the interval between the first boats B1 may be designed to maintain the most appropriate interval through a number of experiments.

Preferably, one first boat B1 may be installed per three to four first deposition metal passages H1.

Similarly, a plurality of second boats B2 installed on the lower portion of the active mask 54 may be installed at a predetermined interval in the direction of the second deposition metal passage H2 to rise from the second boats B2. The deposition rate of the second deposition metal 30 'can be increased by allowing the deposition metal 30' to pass through the second deposition metal passage H2.

Also in this case, preferably, one second boat B2 may be installed per 3-4 of the second deposition metal passages H2.

As described above, the present invention looks very simple and simple, but it has a remarkable effect of achieving both production efficiency, process efficiency and cost reduction while eliminating the problems that have not been disclosed so far and which have not been solved until now. to provide.

10: vacuum chamber
20: base film
30: first deposition metal
30 ': second deposited metal
40: coating drum
50: mask

Claims (2)

A vacuum chamber 10; A coating drum (40) installed in the vacuum chamber (10); A base film 20 towed along the coating drum 40; In the deposition apparatus for a film capacitor comprising a; a mask (50) provided at intervals with the coating drum (40);
The mask 50 includes a heavy edge mask 52 for forming a heavy edge and an active mask 54 for forming an active area;
A first boat B1 for heating and evaporating the first deposited metal 30 is installed at a lower portion of the haze edge mask 52;
A second boat B2 is installed below the active mask 54 to heat-evaporate the second deposited metal 30 ';
The first deposition metal (30) is zinc, the second deposition metal (30 ') is a deposition apparatus for a film capacitor having two masks, characterized in that the aluminum.
The method according to claim 1,
A plurality of first boats B1 are installed at a predetermined interval in the direction of the first deposition metal passage H1, and the first deposition metal 30 coming from the first boats B1 is the first deposition metal passage. (H1) is installed to pass through;
A plurality of second boats B2 are installed at predetermined intervals in the direction of the second deposition metal passage H2, and the second deposition metals 30 'coming from the second boats B2 are second deposition metals. Deposition apparatus for a film capacitor having two masks, characterized in that the passage is installed so as to overlap the passage (H2).

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