KR101995752B1 - Nanomicro based diffractive optical element and method for forming thereof - Google Patents

Abstract

The present invention relates to a nanomicro-based diffractive optical device which can be manufactured to have a large area, enables a continuous process using a roll stamp, and can implement various kinds of optical functions that cannot be realized by a geometric optical device; and a formation method therefor. To this end, the present invention comprises: a substrate provided with nanomicro structures corresponding to the pattern of a hologram to be formed; and functional layers slantly deposited on the nanomicro structures to be deposited on the upper and lateral surfaces of the nanomicro structures. The upper surfaces of the nanomicro structures are formed in the shape of a circle, a polygon having rounded vertexes, or a combination thereof. An angle formed between the upper and lateral surfaces of the nanomicro structures ranges from 45 to 85°. A recess portion is formed between the nanomicro structures of the substrate. Each of the functional layers is not deposited in the recess portion.

Description

[0001] The present invention relates to a nanomicro-based diffractive optical element and a method for forming the same,

[0001] The present invention relates to a nanomicro-based diffractive optical element and a method of forming the same, and more particularly, to a nanomicro-based diffractive optical element capable of realizing various types of optical functions that can be implemented in a large area and a continuous process using a roll stamp, The present invention relates to a nanomicro-based diffractive optical element and a method of forming the same.

Recent breakthroughs in nano process technology and computer performance have accelerated the development of diffractive optics. Recently, advanced photonics structures such as photonic crystals, plasmonic metamaterials, and aperiodic volume diffraction gratings, which are actively researched recently, are being opened on the basis of diffraction optics.

Diffractive optical elements (DOEs) are key elements in the field of diffraction optics. Diffractive optical elements are elements made up of various micro- and nanoscale concave-convex structures. By modulating the phase and amplitude of light incident on such a surface structure, And converts the light wave into a light wave having a desired wave-form.

The light wave whose wavefront is modulated by the diffractive optical element travels in a space or a medium phase according to the law of wave diffraction. The wavefront modulation function of the diffractive optical element makes it possible to engineer a desired diffraction wave on a space or a medium , And can perform holograms, biosensing, and fingerprint recognition by using them.

In order to manufacture such a diffractive optical element, a surface concave-convex structure is formed on the surface of a silicon, quartz, or metal film, and the above-described concavo-convex structure is generally formed by multi-level optical lithography, etching, laser direct processing, .

However, the above process has a complicated process, requires a relatively long process time, and requires expensive equipment.

In addition, the conventional diffractive optical element must be manufactured with an accurate standard, which may cause additional process steps.

Also, there is a need for a technique that can be mass-produced in order to apply the technology using the diffractive optical element to the holographic 3D imaging and display application technology.

Korean Registered Patent No. 10-1482811 (Title: Hologram Pattern Forming Method, Film Production Method Having Hologram Pattern, Laminated Film and Container, Registered Date: Jan. 08, 2015)

A problem to be solved by the present invention is to provide a nano-micro-based diffractive optical element capable of realizing various kinds of optical functions that can be realized by a large area and a continuous process using a roll stamp and which can not be implemented in a geometrical optical element and a method for forming the same. .

According to an aspect of the present invention, there is provided a method of fabricating a nano-micro-structure, including: a substrate having a nano-microstructure formed thereon corresponding to a pattern of a hologram to be formed; Wherein an upper surface of the nano micro structure is formed in a shape of a polygon having a circular shape or a curved vertex, or an aggregate thereof, the angle formed by the upper surface of the nano micro structure and the side surface of the nano micro structure is 45 to 85 °, wherein a concave portion is formed between the nano-microstructures of the substrate, and the functional layer is not deposited on the concave portion.

In the nanomicro-based diffractive optical element according to the present invention, the period of the nano-microstructures ranges from 200 nm to 50 m, the height of the nano-microstructures ranges from 10 nm to 10 m, Lt; RTI ID = 0.0 > nm. ≪ / RTI >

In the nanomicro-based diffractive optical element according to the present invention, the thickness of the upper surface functional layer deposited on the upper surface of the nano-micro structure of the functional layer is in the range of 5 nm to 1,000 nm, The thickness of the side surface functional layer deposited on the side surface is in the range of 1 nm to 1,000 nm and the length of the side surface functional layer from the top surface has a range of half the thickness of the top surface functional layer to a height of the nano micro structure have.

In the nano-micro-based diffractive optical element according to the present invention, the functional layer may be formed of a material selected from the group consisting of aluminum, silver, gold, titanium, tin, platinum, tungsten, titanium-tungsten, silicon oxide, silicon nitride, polysilicon, A single layer composed of a material selected from the group consisting of indium zinc oxide, titanium oxide, zinc oxide, magnesium fluoride, and organic materials, or a metal thin film layer made of a metal and a non-metal thin film layer made of a nonmetal may be laminated.

In the nanomicro-based diffractive optical element according to the present invention, when the functional layer is formed of a laminated film, the functional thin film layer and the non-thin metal film layer may be alternately laminated.

According to another aspect of the present invention, there is provided a method of manufacturing a semiconductor device, comprising: preparing a stamp having a nano-microstructure processed on one surface thereof corresponding to a hologram pattern to be formed; A substrate molding step of forming a nano-microstructure corresponding to the holographic pattern, and a functional layer forming step of forming a functional layer on a surface of the substrate on which the nano-microstructure is formed, wherein the nano- And a side surface of the nano micro structure is formed at an angle of 45 ° to 85 °, a concave portion is formed between the nano micro structures of the substrate, and the functional layer in the functional layer forming step is formed of a plurality of different And the angle of the nano microstructures Is deposited on the upper surface and the side surface, the recess is to provide a micro-nano-based diffractive optical element forming method, it characterized in that the functional layer is not deposited.

According to another aspect of the present invention, there is provided a method of manufacturing a stamp, comprising: preparing a stamp having a nano-microstructure processed on one side thereof corresponding to a hologram pattern to be formed; applying a resin layer on the substrate; A resin layer molding step in which a nano-microstructure corresponding to a hologram pattern is formed on the resin layer as the structure is press-fitted, cured and separated on the resin layer; Wherein an angle formed between the upper surface of the nano-microstructure and the side surface of the nano-microstructure formed in the resin layer molding step is 45 to 85 degrees, and the nano-microstructure of the nano- A concave portion is formed between the microstructures, and the function Are each inclined deposited in a number of different directions provides the nano-micro-structure, each of the upper surface is deposited on the side surface, the nano-micro-based diffractive optical element forming method for the recessed portion, characterized in that the functional layer is not deposited.

In the method of forming a nano micro-based diffractive optical element according to the present invention, the period of the nano-microstructures ranges from 200 mm to 50 m, the height of the nano-microstructures ranges from 10 nm to 10 m, And may have a range of 1 nm to 1,000 nm.

In the method of forming a functional layer according to the present invention, the functional layer forming step may include a metal thin film layer deposition step of depositing a metal thin film layer on the nano micro structure, a non-metal thin film layer deposition step of depositing a non- Step < / RTI >

The nanomicro-based diffractive optical element and the method for forming the same according to the present invention have the following effects.

First, through the process of press-fitting and separating the stamp, a nano-microstructure having an upper surface and a side surface at a certain angle is formed without any further processing, and when the functional layer is obliquely deposited on the nano-microstructure, the functional layer is not deposited on the recess The hologram effect can be more effectively generated.

Second, through the stamping and separation process, a nano micro structure having a predetermined angle is formed on the upper surface and the side surface without additional processing. Thus, a faster and simpler process can be performed, and various types of optics The advantage is that the function can be implemented.

Thirdly, there is an advantage that a large number of diffractive optical elements capable of realizing the hologram can be easily manufactured through the continuous process of functional layer deposition described above.

FIG. 1 is a view showing an embodiment of a nanomicro-based diffractive optical element according to the present invention.
FIG. 2 is a cross-sectional photograph of the nanomicro-based diffractive optical element of FIG. 1. FIG.
FIGS. 3 and 4 are views showing functional layers of the nano-micro-based diffractive optical element according to the present invention.
5 is a top view of a nano-micro-based diffractive optical element for identifying a pattern of a nano-micro-based diffractive optical element according to the present invention.
6 is a block diagram illustrating an embodiment of a method for forming a nano-micro-based diffractive optical element according to the present invention.
FIG. 7 is a photograph of a holographic film manufactured according to the method of forming a nano-micro-based diffractive optical element of FIG.
8 is a photograph of a hologram image formed in a holographic film manufactured according to the method of forming a nano-micro-based diffractive optical element of FIG.
9 is a block diagram showing another embodiment of a method for forming a nano-micro-based diffractive optical element according to the present invention.
FIG. 10 is a view showing a nano-micro-based diffractive optical element manufactured by the method of forming a nano-micro-based diffractive optical element of FIG.

Hereinafter, preferred embodiments of the present invention in which the above-mentioned problems to be solved can be specifically realized will be described with reference to the accompanying drawings. In describing the embodiments, the same names and the same symbols are used for the same configurations, and additional description thereof will be omitted in the following.

When an element such as a layer, a film, an area, a plate, or the like is referred to as being "on" another element throughout the specification, it includes not only the element "directly above" another element but also the element having another element in the middle. And "above" means located above or below the object portion, and does not necessarily mean that the object is located on the upper side with respect to the gravitational direction.

When an element is referred to as "including" an element throughout the specification, it means that the element may further include other elements unless specifically stated otherwise. The sizes and thicknesses of the respective components shown in the drawings are arbitrarily shown for convenience of explanation, and the present invention is not limited to the illustrated ones.

1 and 2, an embodiment of a nanomicro-based diffractive optical element according to the present invention will now be described.

1 and 2, a nanomicro-based diffractive optical element according to the present invention includes a substrate 100 and a functional layer 200.

The substrate 100 is made of a polymer material, and a nano-microstructure 110 corresponding to a pattern of a hologram to be formed is formed on the substrate 100. The nano- The functional layer 200 is not deposited on the concave portion and the upper surface of the nano micro structure 110 and the side surface of the nano micro structure 110 are not The angle formed (? In Fig. 1) is formed at 45 to 85 degrees.

For example, when the angle formed by the upper surface of the nano micro structure 110 and the side surface of the nano micro structure 110 is less than 45 degrees, the functional layer formed on the upper surface of the nano micro structure 110 200 may be brought into contact with each other and deposition of the functional layer 200 on the side surface of the nano micro structure 110 becomes difficult. Therefore, the degree of expression of the hologram effect to be realized in the nano- Can be reduced.

In addition, when the angle formed by the upper surface of the nano micro structure 110 and the side surface of the nano micro structure 110 exceeds 85, the functional layer 200 can be deposited on the depression, The hologram effect to be realized in the nanomicro-based diffractive optical element can be hardly developed.

Therefore, it is preferable that an angle formed between the upper surface of the nano micro structure 110 and the side surface of the nano micro structure 110 is 45 ° to 85 °.

The period of the nano micro structure 110 ranges from 200 nm to 50 m and the height a of the nano micro structure 110 ranges from 10 nm to 10 m. Or a polygon formed by curving vertices or an aggregate thereof, and the top surface of the functional layer is also formed into a polygon having a circular shape or a curved vertex, or an aggregate thereof.

At this time, it is preferable that the distance between the nano-micro structures 100 is narrowed as the angle between the top and side surfaces of the nano-micro structures 100 increases.

This is to prevent the functional layer 200 from being deposited on the concave portion by forming a narrow distance between the nano-micro structures 100 as the angle of the nano-micro structure 100 increases. The nano-micro-based diffractive optical element can more effectively realize the hologram phenomenon.

The nano-microstructures 110 may be formed by stamping (not shown) having nano-microstructures formed on one surface of the substrate 100 so as to correspond to the hologram pattern to be formed.

10, a resin layer 300 is formed on a substrate 100, and the resin layer 300 is formed on the substrate 100 by heat or ultraviolet rays. The nano-micro-based diffractive optical element according to the present invention is not limited to this, And is made of a material that is hardened by the heat.

The stamp is pressed into the resin layer 300 and cured by applying heat or ultraviolet rays to the resin layer 300 and then the stamp is separated to form the nano micro structure 310 in the resin layer 300.

For example, the shape of the nano-microstructures 110 and 310 formed as the stamp is press-fitted into and separated from the substrate 100 or the resin layer 300 may be formed on the upper surface of the nano- The cross-sectional area of the nano-microstructure may be reduced toward the bottom of the nano-microstructure.

This occurs when the nanomicro-structure 110 is shrunk during the process of curing the nanomicro-structure formed on the resin layer 300 by heat or ultraviolet rays or during the curing process of the substrate 100.

Specifically, the nano-microstructure may be cured by 50-99% curing using a thermal or ultraviolet-curable resin having a shrinkage ratio of 1-15%, followed by releasing, and heat or ultraviolet rays are added to the nano-microstructure An angle of 45 DEG to 85 DEG is formed on the upper surface of the nano-microstructure and the side surface of the nano-microstructure by shrinkage as it is cured by curing.

Alternatively, when molding is performed using a thermal or ultraviolet ray-curable resin having a shrinkage ratio of 1-15%, the resin is cured by 50-95%, and the upper surface of the nano-microstructure is pressed by pressing the upper surface of the nano- An angle of 45 DEG to 85 DEG is formed on the side surface of the structure, and heat or ultraviolet rays are applied to the microstructure to form a structure of the nanomicrostructure.

Of course, the nano-microstructure having the angle of 45 ° to 85 ° on the upper surface of the nano-microstructure and the side surface of the nano-microstructure is not limited to this, and various conditions such as the shape of the molding, the temperature condition, As shown in FIG.

5, the shape of the upper surface of the nano-microstructures 110 and 310 formed as the stamp is press-fitted into and separated from the substrate 100 or the resin layer 300 may have a circular or vertex shape A curved polygon, or an aggregate thereof.

As a result, the multi-level optical lithography, etch process, laser direct process, nanoimprint process for forming the shape of the nano micro structure 110 into a regular polyhedron, a rectilinear polyhedron or a cylinder by the above- The nano-microstructures 110 and 310 are formed on the substrate 100 or the resin layer 300 without any additional processing such as the step of FIG. In addition, it is possible to implement various kinds of optical functions such as hologram, biosensing, and fingerprint recognition which can not be realized in conventional geometrical optical elements.

The angle formed between the upper surface of the nano micro structure 110 and the side surface of the nano micro structure 110 is in the range of 45 ° to 85 ° so that when the functional layer is obliquely deposited, The hologram effect can be generated more effectively by preventing the functional layer from being deposited.

The functional layer 200 may be formed of a material selected from the group consisting of aluminum, silver, gold, titanium, tin, platinum, tungsten, titanium-tungsten, silicon oxide, silicon nitride, polysilicon, aluminum oxide, indium tin oxide, indium zinc oxide, Magnesium fluoride, and organic material, or a metal thin film layer made of a metal among the above-mentioned materials and a non-metal thin film layer made of a nonmetal can be laminated and formed as a laminated film.

The functional layer 200 includes a top functional layer 210 which is obliquely deposited on the nano micro structure 110 and is deposited on the top surface of the nano micro structure 110 and a side functional layer 220 which is deposited on the side surface, .

The upper surface functional layer 210 reflects or absorbs not only visible light irradiated on the upper surface or the lower surface of the nanomicro-structure 110, but also visible light irradiated on the upper and lower surfaces including visible light having a tilt, The hologram effect is expressed by the refraction or the visible light is irradiated to the back side of the nano-micro structure 110, and the nano-micro structure 110 is reflected, absorbed or refracted to thereby exhibit the hologram effect.

Top surface functional layer thickness
(nm) Height of nano micro structure
(nm) Hologram characteristic manifestation 1-2 100 X 5-10 100 ○ 100 100 ○ 1,000 100 △ 2,000 100 X 10,000 100 X

The thickness c of the upper surface functional layer 210 is in the range of 5 nm to 1,000 nm and the minimum value 5 nm in the range of the thickness c of the upper surface functional layer 210 means the minimum thickness that can be realized by deposition The refractive index, and the absorptivity of the nano-micro-structure 110 may be substantially the same as the thickness of the nano-micro-structure 110. For example, Table 1 shows the hologram characteristics according to the thickness of the upper surface functional layer 210 when the thickness is 100 nm.

As shown in Table 1, when the thickness of the upper surface functional layer 210 is less than 5 nm, the hologram characteristic is not exhibited. When the thickness of the upper surface functional layer 210 is 1000 nm, the hologram characteristic is expressed, appear. Therefore, the thickness of the upper surface functional layer 210 is preferably in the range of 5 nm to 1,000 nm.

For example, when the functional layer 200 is made of aluminum, the threshold value of aluminum is 50 nm. Therefore, when the functional layer 200 is formed of aluminum, 200 have a thickness in the range of 5 nm to 50 nm.

The side surface functional layer 220 serves to firmly attach the top surface functional layer 210 to the top surface of the nano micro structure 110 and also to irradiate the side surface of the nano micro structure 110 Reflects, absorbs, or refracts visible light to enhance the hologram effect.

Side function layer thickness
(nm) Height of nano micro structure
(nm) Hologram characteristic manifestation 1-2 100 ○ 5-10 100 ○ 100 100 ○ 1,000 100 △ 2,000 100 X 10,000 100 X

The thickness b of the side surface functional layer 220 is in the range of 1 nm to 1,000 nm and the minimum value of 1 nm is the minimum thickness that can be realized by deposition. The maximum value of 1000 nm means a threshold at which the transmittance, the refractive index, and the absorption rate hardly change, and the threshold value may be changed according to the kind of material constituting the functional layer 200 as described above.

The length d of the side surface functional layer 220 from the top surface may have a range from a half of the thickness c of the top surface functional layer 210 to a height a of the nano micro structure 110, The minimum value of the length (d) of the side functional layer 220 means the minimum thickness that can be achieved by deposition.

For example, when the height of the nano micro structure 110 is 100 nm, the hologram characteristics according to the thickness of the side functional layer 220 are shown in Table 2.

As shown in Table 2, when the thickness of the side functional layer 220 is 1 nm, the hologram characteristic is normally exhibited. When the thickness of the side functional layer 220 is 1000 nm, the hologram characteristic is expressed but the effect is incomplete appear. Therefore, the thickness of the side functional layer 220 is preferably in the range of 1 nm to 1,000 nm.

As described above, the nanomicro-based diffractive optical element according to the present invention is characterized in that a function layer 200 is deposited on the top and side surfaces of the nano-micro structure 110, and when visible light is irradiated from the top of the substrate 100 The functional layer 200 reflects, absorbs, or refracts visible light, thereby exhibiting the hologram effect.

Also, when the visible light is irradiated from the lower part of the substrate 100, visible light is transmitted through the substrate 100, and the functional layer 200 reflects, absorbs, or refracts, thereby exhibiting the hologram effect.

The functional layer 200 deposited on the nano microstructure of the nano-micro-based diffractive optical element according to the present invention will now be described with reference to FIGS. 3 to 5. FIG.

3 and 4, the functional layer 200 according to the present invention may be formed of a lamination layer, wherein the functional layer 200 is formed by alternately stacking a metal thin film layer and a non-metal thin film layer .

For example, the functional layer 200 may be laminated in the order of a first metal thin film layer 211a, a first non-metal thin film layer 212a, and a second metal thin film layer 211b as shown in FIG. 3, The first metal thin film layer 212a, the first metal thin film layer 211a, and the second non-metal thin film layer 212b may be stacked in this order.

That is, the functional layer 200 is formed of a metal-inorganic-metal (MIM) structure by alternately laminating a metal thin film layer and a non-metal thin film layer. By forming the functional layer 200 in the MIM structure, the hologram effect can be improved by controlling the transmittance, the reflectivity, and the absorption rate of the functional layer 200.

As a result, as shown in FIG. 5, the functional layer 200 is deposited on the nano-microstructure 110 in the form of a polygon having a circular or curved vertex or an aggregate thereof, and the functional layer 200 is irradiated It is possible to raise the hologram effect by reflecting, absorbing or refracting not only visible light but also visible light having a slope and visible light other than the upper surface.

A method of forming a nano-micro-based diffractive optical element according to the present invention will now be described with reference to FIG.

6, a nanomicro-based diffractive optical element forming method according to the present invention includes a stamp preparing step (S110), a substrate molding step (S120), and a functional layer forming step (S130).

The stamp preparation step S110 is a step of preparing a stamp (not shown) having a nano microstructure processed on one side thereof corresponding to a hologram pattern to be formed on the substrate 100. The stamp may be a polymer, glass, silicon It can be made of various materials.

In the substrate molding step S120, the nanomicrostructures 110 corresponding to the hologram pattern are formed on the substrate 100 as the nanomicrostructures processed in the stamp are pressed into and separated from the substrate 100 The method of manufacturing the nano micro structure 110 is the same as that of the nano micro-based diffractive optical element according to the present invention, and a detailed description thereof will be omitted.

The period of the nano micro structure 110 ranges from 200 nm to 10 m and the height a of the nano micro structure 110 ranges from 10 nm to 10 m. Or a polygon whose vertices are curved, or an aggregate thereof.

In the substrate molding step S120, the stamp is separated from the substrate 100 and the nanomicro-structure 110 is shrunk while the nanomicro-structure 110 is cured, Has a shape in which the cross-sectional area decreases toward the concave portion side of the nano-microstructure 110, that is, the cross-sectional area decreases from the upper surface to the lower surface, or the shape decreases.

The average angle between the side surface of the nano micro structure 110 and the upper surface of the nano micro structure 110 ranges from 45 ° to 85 °, and the manufacturing method thereof is the same as that described above.

The shape of the nano micro structure 110 in the substrate molding step S120 of the method of forming a nano micro-based diffractive optical element according to the present invention is not limited to the shape of the nano micro structure 110 The process can be performed more quickly and simply by omitting the process of forming the upper surface and the side surface.

In the functional layer forming step S130, the functional layer 200 is formed on the surface of the substrate 100 on which the nano microstructures 110 are formed, and the functional layer 200 is formed by obliquely depositing And are deposited on the top and side surfaces of each of the nano micro structures 110.

Specifically, the functional layer forming step (S130) includes a metal thin film layer deposition step (S131) for depositing the metal thin film layer and a non-metal thin film layer deposition step (S132) for depositing the non-metal thin film layer.

As the functional layer 200 is alternately formed between the metal thin film layer deposition step S131 and the non-metal thin film layer deposition step S132 in the functional layer forming step S130, the metal thin film layer and the non-metal thin film layer are stacked And is formed in a laminated structure.

The functional layer 200 formed in a laminated structure in which the metal thin film layer and the non-metal thin film layer are stacked has different thicknesses depending on the stacked positions.

The thickness c of the upper surface functional layer 210 deposited on the upper surface of the nano micro structure 110 is in the range of 5 nm to 1000 nm and the thickness of the side surface functional layer 220 deposited on the nano micro structure 110 side, (B) has a thickness in the range of 1 nm to 1000 nm.

As the functional layer 200 is deposited on the upper surface as well as the side surface of the nano-micro-structure 110, the effect of the hologram displayed on the nano-micro-based diffractive optical element according to the present invention can be enhanced.

9 and 10, another embodiment of a method for forming a nano micro-based diffractive optical element according to the present invention will be described.

The step of preparing the stamp according to the present embodiment and the step of depositing the functional layer are substantially the same as those of the embodiment described above, and therefore, the description thereof will be omitted.

However, this embodiment further includes a resin layer applying step (S220) of applying a resin layer 300 on the substrate 100, and the resin layer 300 is made of a material that is cured by heat or ultraviolet rays have.

Thereafter, the stamp is pressed into the resin layer 300 through the resin layer molding step S230, the resin layer 300 is cured by applying heat or ultraviolet rays to the resin layer 300, The nano micro structure 310 may be formed.

As a result, as shown in FIGS. 7 and 8, a hologram image can be realized by manufacturing the hologram film through the method of forming a nano-micro-based diffractive optical element according to the present invention.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, Modify or modify the Software.

100: substrate
110, 310: nano microstructure
200: functional layer
210: upper surface functional layer
211a: first metal thin film layer
211b: second metal thin film layer
212a: first nonmetal thin film layer
212b: second nonmetal thin film layer
220: side functional layer
300: resin layer

Claims (9)

A substrate on which a nano-microstructure corresponding to a pattern of a hologram to be formed is formed; And
And a functional layer deposited on the nano-microstructure by being obliquely deposited on the top and side surfaces of the nano-microstructure,
Wherein the upper surface of the nano-microstructure is formed in a shape of a circle or a polygon formed by curving vertices,
Wherein an angle formed by the upper surface of the nano-micro-structure and the side surface of the nano-micro-structure is between 45 ° and 85 °,
A concave portion is formed between the nano-microstructures of the substrate,
And the functional layer is not deposited on the concave portion. The method according to claim 1,
The period of the nano-microstructure ranges from 200 nm to 50 m,
The height of the nano-microstructure is in the range of 10 nm to 10 m,
Wherein the functional layer has a thickness ranging from 1 nm to 1,000 nm. 3. The method of claim 2,
Wherein a thickness of the upper surface functional layer deposited on the upper surface of the nano-micro structure of the functional layer is in the range of 5 nm to 1,000 nm,
The thickness of the side functional layer deposited on the side surface of the nano-micro structure of the functional layer is in the range of 1 nm to 1,000 nm,
Wherein the length of the side surface functional layer from the top surface ranges from one half of the thickness of the top surface functional layer to a height of the nano micro structure. 4. The method according to any one of claims 1 to 3,
Wherein the functional layer is selected from the group consisting of aluminum, silver, gold, titanium, tin, platinum, tungsten, titanium-tungsten, silicon oxide, silicon nitride, polysilicon, aluminum oxide, indium tin oxide, indium zinc oxide, titanium oxide, Organic material, or a metal thin film layer made of a metal among the above-mentioned materials and a non-metal thin film layer made of a non-metal are laminated and formed as a laminated film. 5. The method of claim 4,
Wherein when the functional layer is formed of a laminate film, the functional thin film layer and the non-metal thin film layer are alternately laminated. A stamp preparation step of preparing a stamp in which a nano microstructure is machined on one surface so as to correspond to a hologram pattern to be formed;
A substrate molding step in which a nano-microstructure corresponding to a hologram pattern is formed on the substrate as the nano-microstructure of the stamp is pressed into and separated from the top of the substrate; And
Forming a functional layer on a surface of the substrate on which the nano-microstructure is formed,
Wherein an angle formed between the upper surface of the nano-microstructure and the side surface of the nano-microstructure formed at the substrate molding step is 45 ° to 85 °, a recess is formed between the nano-microstructures of the substrate,
Wherein the functional layer in the functional layer forming step is obliquely deposited in a plurality of different directions to be deposited on the top and side surfaces of each of the nano micro structures and the functional layer is not deposited on the concave portions. Based diffractive optical element. A stamp preparation step of preparing a stamp in which a nano microstructure is machined on one surface so as to correspond to a hologram pattern to be formed;
A resin layer applying step of applying a resin layer on the substrate;
A resin layer molding step in which the nano microstructure corresponding to the holographic pattern is formed on the resin layer as the nano microstructure of the stamp is press-fitted, cured and separated on the resin layer; And
And forming a functional layer on a surface of the resin layer on which the nano-microstructure is formed,
Wherein an angle formed by the upper surface of the nano-microstructure and the side surface of the nano-microstructure formed at the resin layer molding step is in a range of 45 ° to 85 °, a recess is formed between the nano-microstructures of the resin layer,
Wherein the functional layer in the functional layer forming step is obliquely deposited in a plurality of different directions to be deposited on the top and side surfaces of each of the nano micro structures and the functional layer is not deposited on the concave portions. Based diffractive optical element. 8. The method according to claim 6 or 7,
The period of the nano-microstructures ranges from 200 mm to 50 m,
The height of the nano-microstructures ranges from 10 nm to 10 m,
Wherein the functional layer has a thickness ranging from 1 nm to 1,000 nm. 8. The method according to claim 6 or 7,
The functional layer forming step includes a metal thin film layer deposition step of depositing a metal thin film layer on the nano micro structure and a non-metal thin film layer deposition step of depositing a non-metal thin film layer on the nano micro structure. Way.

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