KR101982101B1 - 중성자 변환층을 구비하는 박막 구조체, 이의 제조 방법 및 이를 포함하는 중성자 검출기 - Google Patents
중성자 변환층을 구비하는 박막 구조체, 이의 제조 방법 및 이를 포함하는 중성자 검출기 Download PDFInfo
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- KR101982101B1 KR101982101B1 KR1020170103373A KR20170103373A KR101982101B1 KR 101982101 B1 KR101982101 B1 KR 101982101B1 KR 1020170103373 A KR1020170103373 A KR 1020170103373A KR 20170103373 A KR20170103373 A KR 20170103373A KR 101982101 B1 KR101982101 B1 KR 101982101B1
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- boron
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- 239000010409 thin film Substances 0.000 title claims abstract description 73
- 238000006243 chemical reaction Methods 0.000 title claims abstract description 53
- 238000000034 method Methods 0.000 title claims description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 69
- 229910052796 boron Inorganic materials 0.000 claims abstract description 69
- 239000002086 nanomaterial Substances 0.000 claims abstract description 47
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 239000002245 particle Substances 0.000 claims abstract description 25
- 239000011230 binding agent Substances 0.000 claims abstract description 16
- 230000007423 decrease Effects 0.000 claims abstract description 9
- 239000002904 solvent Substances 0.000 claims description 30
- 238000001704 evaporation Methods 0.000 claims description 16
- 230000008020 evaporation Effects 0.000 claims description 15
- 239000004094 surface-active agent Substances 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 abstract description 7
- 239000002105 nanoparticle Substances 0.000 description 41
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 24
- 238000004519 manufacturing process Methods 0.000 description 18
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 16
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 15
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 15
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 238000001514 detection method Methods 0.000 description 10
- 229910052580 B4C Inorganic materials 0.000 description 7
- 229910052582 BN Inorganic materials 0.000 description 7
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 7
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 6
- 239000004020 conductor Substances 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000001913 cellulose Substances 0.000 description 3
- 229920002678 cellulose Polymers 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229920002307 Dextran Polymers 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920000609 methyl cellulose Polymers 0.000 description 2
- 239000001923 methylcellulose Substances 0.000 description 2
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 2
- 229920002401 polyacrylamide Polymers 0.000 description 2
- 229920000193 polymethacrylate Polymers 0.000 description 2
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000005033 polyvinylidene chloride Substances 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 238000000342 Monte Carlo simulation Methods 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 description 1
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T3/00—Measuring neutron radiation
- G01T3/08—Measuring neutron radiation with semiconductor detectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T3/00—Measuring neutron radiation
- G01T3/008—Measuring neutron radiation using an ionisation chamber filled with a gas, liquid or solid, e.g. frozen liquid, dielectric
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- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- High Energy & Nuclear Physics (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Measurement Of Radiation (AREA)
Abstract
Description
도 1은 본 발명의 일 실시예에 따른 박막 구조체의 단면을 나타낸 단면도이다.
도 2는 본 발명의 다른 실시예에 따른 박막 구조체의 단면을 개략적으로 나타낸 도면이다.
도 3은 본 발명의 또 다른 실시예에 따른 박막 구조체의 단면을 개략적으로 나타낸 도면이다.
도 4는 본 발명의 일 실시예에 따른 박막 구조체의 제조 방법을 나타낸 도면이다.
도 5는 본 발명의 다른 실시예에 따른 박막 구조체의 제조 방법을 개략적으로 나타낸 도면이다.
도 6은 본 발명의 또 다른 실시예에 따른 박막 구조체의 제조 방법을 개략적으로 나타낸 도면이다.
도 7은 본 발명의 일 실시예에 따른 박막의 제조 방법에서 사용되는 조(bath)의 구조를 개략적으로 나타낸 도면이다.
도 8은 본 발명의 일 실시예에 따른 중성자 검출기의 모식도이다.
도 9는 실시예 1의 주사 전자 현미경(scanning electron microscope: SEM) 사진을 도시한 것이다.
도 10은 실시예 2의 SEM 사진을 도시한 것이다.
도 11은 실시예 3의 SEM 사진을 도시한 것이다.
도 12는 실시예 4의 SEM 사진을 도시한 것이다.
도 13은 실시예 5의 SEM 사진을 도시한 것이다.
도 14는 실시예 6의 SEM 사진을 도시한 것이다.
도 15는 평가예 1의 결과를 나타낸 그래프이다.
도 16은 평가예 2의 결과를 나타낸 그래프이다.
도 17은 시뮬레이션 값과 평가예 2의 결과를 비교하여 나타낸 그래프이다.
중성자 변환 효율(%) (LLD가 300KeV일 때) |
중성자 변환 효율(%) (LLD가 500KeV일 때) |
|
실시예 3 | 1.81 | 1.19 |
Claims (17)
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 조(bath) 내에 위치한 베이스 기판 상에 붕소 함유 나노 물질, 바인더 및 서로 다른 증발 속도를 갖는 복수의 용매들을 포함하는 조성물을 제공하는 단계; 및
상기 복수의 용매들의 증발 속도를 조절하면서 상기 복수의 용매들을 제거함으로써, 일 방향을 따라 상기 붕소 함유 나노 물질의 평균 입경이 점진적으로 커지거나 작아지는 중성자 변환층을 형성하는 단계;
를 포함하는, 박막 구조체의 제조 방법.
- 삭제
- 제11항에 있어서,
상기 중성자 변환층을 형성하는 단계 동안,
상기 조가 소정의 시간 동안 완전히 밀폐된 다음, 개방되는, 박막 구조체의 제조 방법.
- 제11항에 있어서,
상기 조는 공기 주입구와 공기 배출구를 갖고,
상기 중성자 변환층을 형성하는 단계 동안,
상기 공기 주입구와 상기 공기 배출구를 통해 공기가 흐르는, 박막 구조체의 제조 방법.
- 제11항에 있어서,
상기 조성물은 계면활성제를 더 포함하는, 박막 구조체의 제조 방법.
- 삭제
- 삭제
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KR20240028187A (ko) | 2022-08-24 | 2024-03-05 | 주식회사 엠원인터내셔널 | 보론 박막 침착 방법 및 이를 이용한 중성자 검출기 |
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JP2013527111A (ja) * | 2010-05-18 | 2013-06-27 | オー.ティー.エヌ.ディー.−オネット テクノロジーズ ニュークリア デコミッショニング | ホウ素ナノ粒子を調製する方法 |
US20140014846A1 (en) * | 2011-03-31 | 2014-01-16 | Japan Atomic Energy Agency | Scintillator plate, radiation measuring apparatus, radiation imaging apparatus, and scintillator plate manufacturing method |
JP2015052451A (ja) * | 2013-09-05 | 2015-03-19 | 株式会社トクヤマ | 中性子シンチレーター及び中性子検出器 |
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JP2013527111A (ja) * | 2010-05-18 | 2013-06-27 | オー.ティー.エヌ.ディー.−オネット テクノロジーズ ニュークリア デコミッショニング | ホウ素ナノ粒子を調製する方法 |
US20140014846A1 (en) * | 2011-03-31 | 2014-01-16 | Japan Atomic Energy Agency | Scintillator plate, radiation measuring apparatus, radiation imaging apparatus, and scintillator plate manufacturing method |
JP2015052451A (ja) * | 2013-09-05 | 2015-03-19 | 株式会社トクヤマ | 中性子シンチレーター及び中性子検出器 |
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KR20240028187A (ko) | 2022-08-24 | 2024-03-05 | 주식회사 엠원인터내셔널 | 보론 박막 침착 방법 및 이를 이용한 중성자 검출기 |
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