KR101938000B1 - Liquid crystal display device and manufacturing method of the same - Google Patents

Abstract

A liquid crystal display according to an exemplary embodiment of the present invention includes a first substrate, a thin film transistor located on the first substrate, a pixel electrode connected to the thin film transistor, a second substrate facing the first substrate, A common electrode made of conductive particles and a polymer, an insulating layer disposed on the common electrode, and a liquid crystal layer interposed between the pixel electrode and the insulating layer, And spacers.

Description

TECHNICAL FIELD [0001] The present invention relates to a liquid crystal display device and a method of manufacturing the same,

The present invention relates to a liquid crystal display device and a manufacturing method thereof.

2. Description of the Related Art Recently, various portable electronic devices such as a mobile phone, a PDA, and a notebook computer have been developed. Accordingly, a demand for a lightweight thin flat panel display device is increasing. As such flat panel display devices, a liquid crystal display (LCD), a plasma display panel (PDP) and an organic light emitting diode (OLED) have been actively studied. A liquid crystal display device in which the ease of driving means and the realization of a high image quality are easily spotlighted.

Such a liquid crystal display device includes a first substrate including a light source, a thin film transistor and a pixel electrode, a color filter, a black matrix and a second substrate including an overcoat layer and a common electrode covering the first substrate, And a liquid crystal layer. Accordingly, the electric field between the pixel electrode and the common electrode changes in accordance with the on / off operation of the thin film transistor, and the liquid crystal arrangement of the liquid crystal layer changes in accordance with the change in the electric field. The light emitted from the light source passes through the liquid crystal layer and displays red, green, and blue through a color filter, thereby realizing full color.

In the liquid crystal display device, a liquid crystal layer is injected after a first substrate on which pixel electrodes are formed and a second substrate on which a common electrode is formed, and then the liquid crystal layer is injected. At this time, the pixel electrode and the common electrode face each other with the liquid crystal layer interposed therebetween. When the foreign matter penetrates into the foreign object, the pixel electrode and the common electrode are short-circuited by the foreign object, thereby causing a defect in the defect of a dark spot.

In addition, since the overcoat layer is formed on the color filter and the common electrode is formed, the manufacturing cost is increased.

The present invention provides a liquid crystal display device capable of reducing manufacturing cost, facilitating a process, and preventing a defect in a dark spot, and a method of manufacturing the same.

According to an aspect of the present invention, there is provided a liquid crystal display device including a first substrate, a thin film transistor disposed on the first substrate, and a pixel electrode connected to the thin film transistor, A second substrate, a black matrix and a color filter disposed on one surface of the second substrate, a common electrode formed of conductive particles and a polymer covering the color filter, an insulating layer disposed on the common electrode, A liquid crystal layer interposed between the insulating layers, and a spacer.

The common electrode may directly contact the color filter and the insulating layer.

The conductive particles may be any one selected from the group consisting of ITO nanoparticles, IZO nanoparticles, conductive polymers, and Ag nanowires.

The polymer may include a polymer including a hydrophobic functional group, an acrylic polymer, a photoreactive polymer, and a photoinitiator.

The polymer containing the hydrophobic functional group may include a fluorinated epoxy and a siloxane-based compound.

The photoreactive polymer may be a monomer containing an ethylenically unsaturated double bond.

The first substrate and the second substrate may be bonded to each other, and the conductive seal may be connected to the common electrode.

According to another aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device including forming a thin film transistor and a pixel electrode on a first substrate, forming a spacer on the first substrate, A method of manufacturing a color filter, comprising the steps of: forming a black matrix and a color filter; applying a common electrode paste in which conductive particles and a polymer are mixed on the color filter; soft-baking the second substrate coated with the common electrode paste; And developing the liquid crystal layer to form a common electrode and an insulating layer, and injecting the liquid crystal layer by cementing the first substrate and the second substrate.

The conductive particles may be any one selected from the group consisting of ITO nanoparticles, IZO nanoparticles, conductive polymers, and Ag nanowires.

The polymer may include a polymer including a hydrophobic functional group, an acrylic polymer, a photoreactive polymer, and a photoinitiator.

The polymer containing the hydrophobic functional group may include a fluorinated epoxy and a siloxane-based compound.

The photoreactive polymer may be a monomer containing an ethylenically unsaturated double bond.

The step of bonding the first substrate and the second substrate may include applying a conductive film to contact the common electrode of the first substrate and bonding the first substrate and the second substrate.

The liquid crystal display device according to an embodiment of the present invention has a common electrode that simultaneously performs a role of a conventional overcoat layer, which is advantageous in that manufacturing cost and manufacturing process can be simplified. Further, there is an advantage that an insulating layer is provided on the common electrode so that the common electrode and the pixel electrode can be prevented from being shorted by foreign matter.

1 is a view illustrating a liquid crystal display device according to an embodiment of the present invention.
FIGS. 2A to 2E are views illustrating a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present invention.
3 is a graph illustrating the sheet resistance of a common electrode according to an exemplary embodiment of the present invention.
4 is a graph showing the transmittance of the common electrode according to the wavelength band of the common electrode manufactured according to the embodiment of the present invention and the comparative example.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a view illustrating a liquid crystal display device according to an embodiment of the present invention.

1, a liquid crystal display 100 according to an exemplary embodiment of the present invention includes a first substrate 110, a second substrate 160 facing and bonded to the first substrate 110, And a liquid crystal layer 190 formed between the substrate 110 and the second substrate 160.

The first substrate 110 includes a thin film transistor (TFT) formed on the first substrate 110, a pixel electrode 145 electrically connected to the thin film transistor (TFT), a thin film transistor And a passivation film 140 formed thereon.

More specifically, the gate electrode 115 is located on the first substrate 110. The gate insulating film 120 is located on the gate electrode 115. A semiconductor layer 125 is located on the gate insulating film 120. The semiconductor layer 125 may be doped with a p-type or n-type impurity. The semiconductor layer 125 may include an impurity to form a source region and a drain region, and may include a channel region other than the source region and the drain region.

A source electrode 135a and a drain electrode 135b are located on the semiconductor layer 125. [ More specifically, the source electrode 135a is located in the source region of the semiconductor layer 125, and the drain electrode 135b is located in the drain region of the semiconductor layer 125. [ A source electrode 135a and a drain electrode 135b are formed between the semiconductor layer 125 and the source electrode 135a and between the semiconductor layer 125 and the drain electrode 135b to form ohmic contact with the semiconductor layer 125, A contact layer (not shown) may be further formed. The thin film transistor TTF including the gate electrode 115, the semiconductor layer 125, the source electrode 135a and the drain electrode 135b is located on the first substrate 110. [ A data line 135c is located in a region spaced apart from the thin film transistor (TFT).

A passivation film 140 is disposed on a first substrate 110 including a thin film transistor TFT. The pixel electrode 145 is located on the passivation film 140. The pixel electrode 145 may be electrically connected to the drain electrode 135b exposed by the passivation film 140. [ The thin film transistor TFT supplies the data voltage from the data line to the pixel electrode 145 in response to the gate on / off voltage from the gate line, and the supplied data voltage is applied to the liquid crystal layer 190 through the pixel electrode 145. [ .

A common wiring 147 is located outside the first substrate 110 on which the thin film transistor TFT and the pixel electrode 145 are formed. The common wiring 147 serves to apply a common voltage to the common electrode 180 of the second substrate 160 to be described later. The spacer 197 is positioned in a region corresponding to the position of the data line 135c and serves to maintain a cell gap with the second substrate 160 to be attached later.

On the other hand, the second substrate 160 includes a color filter 170 formed for color implementation on the second substrate 160, a black matrix 165 formed between the color filters 170, And an insulating layer 185 formed on the electrode 180 and the common electrode 180.

The black matrix 165 serves to improve the resolution by blocking light between the color filters 170, and is made of carbon black, black resin, or the like. The color filter 170 may comprise red, green, and blue color filters to implement color.

A common electrode 180 is located on the color filter 170. The common electrode 180 serves to apply a common voltage to the liquid crystal layer 190 together with the pixel electrode 145 and to protect the color filter 170 and to flatten the stepped portion by the color filter 170. The common electrode 180 includes conductive particles and a polymer, and the conductive particles include any one selected from the group consisting of ITO nanoparticles, IZO nanoparticles, conductive polymers, and Ag nanowires. The conductive polymer may be, for example, poly (3,4-ethylenedioxythiophene) (PEDOT). The polymer includes a polymer containing a hydrophobic functional group, an acrylic polymer, a photoreactive polymer, and a photoinitiator.

An insulating layer 185 is located on the common electrode 180. The insulating layer 185 is formed of a polymer including a hydrophobic group to prevent the common electrode 180 and the pixel electrode 145 from being short-circuited by foreign matter. The common electrode 180 and the insulating layer 185 will be described later in detail.

A conductive chamber 195 is formed between the first substrate 110 and the second substrate 160 to bond the first substrate 110 and the second substrate 160 together. The conductive chamber 195 is in contact with the common wiring 147 of the first substrate 110 and is in contact with the common electrode 180 of the second substrate 160. Therefore, the conductive chamber 195 applies a common voltage applied to the common electrode 180 through the common wiring 147. A liquid crystal layer 190 is formed between the first substrate 110 and the second substrate 160 to constitute a liquid crystal display device according to an embodiment of the present invention.

The liquid crystal display device according to an embodiment of the present invention has a common electrode that simultaneously performs a role of a conventional overcoat layer, which is advantageous in that manufacturing cost and manufacturing process can be simplified. Further, there is an advantage that an insulating layer is provided on the common electrode so that the common electrode and the pixel electrode can be prevented from being shorted by foreign matter.

Hereinafter, the common electrode and the insulating layer provided in the above-described liquid crystal display device will be described in more detail.

The common electrode paste for forming the common electrode and the insulating layer according to an embodiment of the present invention includes conductive particles and a polymer. The conductive particles are composed of any one selected from the group consisting of ITO nanoparticles, IZO nanoparticles, conductive polymers, and Ag nanowires. The conductive polymer may be, for example, poly (3,4-ethylenedioxythiophene) (PEDOT).

The polymer includes a polymer containing a hydrophobic functional group, an acrylic polymer, a photoreactive polymer, and a photoinitiator. The polymer containing a hydrophobic functional group includes a fluorinated epoxy and a siloxane-based compound, and the siloxane-based compound may be, for example, tetraethylorthosilicate (TEOS).

The acrylic polymer serves as a binder. Examples of the acrylic polymer include ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, tetramethylene glycol diacrylate, propylene glycol diacrylate, 1,4- Cyclohexanediol diacrylate, trimethylol propane triacrylate, pentaerythritol triacrylate, tetraethylene glycol diacrylate, dipentaerythritol triacrylate, dipentaerythritol tetraacrylate, Sorbitol triacrylate, sorbitol tetracrylate, sorbitol pentacrilate, sorbitol hexacrylate, tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, ethylene glycol dimethacrylate , Trimethylol ethane trime Pentaerythritol dimethacrylate, dipentaerythritol dimethacrylate, pentaerythritol trimethacrylate, bis [p- (3-methacryloxy-2 2-ethylhexyl acrylate, 2-ethylhexyl acrylate, 2-ethylhexyl acrylate, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate, Hydroxyethyl acrylate, 2-hydroxypropyl acrylate, dimethylaminoethyl acrylate, diethylaminoethyl acrylate, isobornyl acrylate, n-vinyl pyrrolidone, 1,4-butylene glycol diacrylate, , 6-hexanediol diacrylate, diethylene glycol diacrylate, neopentyl glycol diacrylate, tripropylene glycol diacrylate, polyethylene glycol diacrylate, pentaerythritol diacrylate There may be used, in addition to these monomers, dimethylacetyl trimethacrylate, dipentaerythritol hexacrylate, tetrahydroperfuryl methacrylate, glycidyl acrylate, pentaerythritol tetraacrylate, vinyl acetate and triallyl cyanurate. And prepolymers such as trimers can also be effectively used.

The photoreactive polymer is a monomer having an ethylenically unsaturated double bond. Monomers having an ethylenically unsaturated double bond include, for example, hexanediol triacylate, tripropylene glycol triacrylate, trimethylolpropane triacrylate, stearyl acrylate, stearyl acrylate, acrylate, tetrahydrofurfuryl acrylate, lauryl acrylate, 2-phenoxyethyl acrylate, isodecyl acrylate, isooctyl acrylate, tridecyl acrylate, Ethoxylated nonylphenol acrylate, 1,3-butanediol diacrylate, 1,4-butanediol diacrylate, diethylene glycol di (meth) acrylate, Acrylate, tetraethylene glycol diacrylate, triethylene glycol diacrylate, ethoxylate bisphenol A Propoxylated neopentyl glycol diacrylate, tris (2-hydroxyethyl) isocyanurate triacrylate, ethoxylated bisphenol A diacrylate, tris (2-hydroxyethyl) isocyanurate triacrylate, , Ethoxylate trimethylol propane triacrylate, pentaerythritol triacrylate, propoxylated triethylolpropane triacrylate, propoxylated glyceryl triacrylate, pentaerythritol triacrylate, But are not limited to, pentaerythritol tetraacrylate, ditrimethylolpropane tetraacrylate, dipentaerythritol hyroxypentaacrlate, ethoxylate pentaerythritol tetraacrylate, tetrahydrofurfuryl methacrylate, cyclohexyl Methacrylate, isodecyl methacrylate Diethylene glycol dimethacrylate, ethylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, 1,4-butanediol dimethacrylate, diethylene glycol dimethacrylate, diethylene glycol dimethacrylate, Hexanediol dimethacrylate, 1,6-hexanediol dimethacrylate, neopentyl glycol dimethacrylate, 1,3-butylene glycol dimethacrylate, ethoxyate bisphenol A dimethacrylate, trimethylolpropane methacrylate and the like .

Examples of the photoinitiator include benzoin, benzoin ethyl ether, benzoin isobutyl ether, benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-benzoyl-4'-methyl di Phenyl sulfide, benzyl dimethyl ketal, 2-n-butoxy-4-dimethylaminobenzoic acid salt, 2-chlorothioxanthone, 2,4-diethylthioxanthone, 2,4- Propylthioxanthone, 2-dimethylaminoethylbenzoate, ethyl p-dimethylaminobenzoate, isoamyl p-dimethylamino acid salt, 3,3'-dimethyl-4-methoxybenzophenone, 2,4- 1-one, 2,2'-dimethoxy-1,2-diphenylethane-1-one, hydroxycyclohexyl Methyl-1-phenylpropane-1-one, 1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy- -1-one, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane- (2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -1-butanone , Bis (2,6-dimethoxybenzoyl) -2,4,4-trimethylpentylphosphine oxide, and bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide.

The common electrode paste further includes an organic solvent. Examples of the organic solvent include alcohols such as dipropylene glycol monomethyl ether, and alcohol acetic acid salts such as ethylcarbitol acetate. Can be used.

Hereinafter, a method for manufacturing the liquid crystal display device of the present invention will be described using the above-described common electrode paste. FIGS. 2A to 2E are views illustrating a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present invention.

First, referring to FIG. 2A, a gate electrode 215 is formed on a first substrate 210. The gate electrode 215 is formed of a material selected from the group consisting of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper Any one of them or an alloy thereof. The gate electrode 215 may be formed of a material selected from the group consisting of Mo, Al, Cr, Au, Ti, Ni, Ne, Or an alloy of any one selected from the above. For example, the gate electrode 215 may be a double layer of molybdenum (Mo) / aluminum-neodymium (AlNd) or molybdenum (Mo) / aluminum (Al).

Next, a gate insulating film 220 is formed on the gate electrode 215. The gate insulating layer 220 may be a silicon oxide layer (SiOx), a silicon nitride layer (SiNx), or a multilayer thereof. Next, a semiconductor layer 225 is formed on the gate insulating film 220. The semiconductor layer 225 may be formed of amorphous silicon or an inorganic material including polycrystalline silicon obtained by crystallizing amorphous silicon, but is not limited thereto. The semiconductor layer 225 may be doped with p-type or n-type impurities. If the semiconductor layer 225 contains an impurity, a source region and a drain region may be formed, and a channel region other than the source region and the drain region may be included.

Next, a source electrode 235a, a drain electrode 235b, and a data line 235c are formed on the semiconductor layer 225. Then, At this time, a source electrode 235a is formed in the source region of the semiconductor layer 225, and a drain electrode 235b is formed in the drain region of the semiconductor layer 225. The data line 235c is formed apart from the semiconductor layer 225. [ The source electrode 235a and the drain electrode 235b may be formed of a single layer or a multilayer and may be formed of a metal such as molybdenum (Mo), aluminum (Al), aluminum And may be made of any one selected from the group consisting of chrome (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd) and copper (Cu)

When the source electrode 235a and the drain electrode 235b are multilayered, a double layer of molybdenum (Mo) / aluminum-neodymium (AlNd), a layer of titanium (Ti) / aluminum (Al) / titanium Mo) / aluminum (Al) / molybdenum (Mo) or molybdenum (Mo) / aluminum-neodymium (AlNd) / molybdenum (Mo). A source electrode 235a and a drain electrode 235b are formed between the semiconductor layer 225 and the source electrode 235a and between the semiconductor layer 225 and the drain electrode 235b, An ohmic contact layer (not shown) may be further formed to form a contact. A thin film transistor TTF including a gate electrode 215, a semiconductor layer 225, a source electrode 235a and a drain electrode 235b is formed on the first substrate 210. [

Next, a passivation film 240 is formed on the first substrate 210 including the thin film transistor (TFT). The passivation film 240 may be a silicon oxide film (SiOx), a silicon nitride film (SiNx), or a multilayer thereof, similar to the gate insulating film 220.

Next, the pixel electrode 245 and the common wiring 247 are formed on the passivation film 240. The pixel electrode 245 is electrically connected to the drain electrode 235b exposed by the passivation film 240. [ The pixel electrode 245 and the common wiring 247 are formed of a transparent metal such as silver indium tin oxide (ITO), indium zinc oxide (IZO), or the like. A spacer 297 is formed in a region corresponding to the data line 235c to maintain a cell gap with the second substrate 260 later.

Next, referring to FIG. 2B, a second substrate 260 is prepared, and a black matrix 265 is formed on the second substrate 260. The black matrix 265 is formed by coating and patterning carbon black or black resin. Next, a color filter 270 is formed on the second substrate 260 on which the black matrix 265 is formed. The color filter 270 is made of a resin including red, green, and blue pigments or dyes.

Next, the above-described common electrode paste 300 is applied onto the second substrate 260 on which the color filter 270 is formed. The common electrode paste 300 includes the conductive particles 320 and the polymer 330 and in particular the polymer 330 includes the hydrophobic functional group 310. Since the common electrode paste 300 has been described in detail in the foregoing, description thereof will be omitted.

Next, referring to FIG. 2C, the second substrate 260 on which the common electrode paste 300 is coated is soft-baked. At this time, the soft-bake is performed for about several minutes at a temperature of 80 to 130 degrees. When the soft-baking is performed, the hydrophobic functional group 310 in the common electrode paste 300 is phase-separated with the polymer 300 and aligned on the upper surface of the common electrode paste 300. At this time, the conductive particles 320 dispersed in the common electrode paste 300 are also separated together with the polymer 300.

Next, referring to FIG. 2D, the soft-baked common electrode paste 300 is exposed to UV light, developed, and then hard baked. At this time, the common electrode paste 300 contains a photoinitiator and a photoreactive polymer, and is developed by UV exposure. The polymer including the hydrophobic functional group 310 through hard baking is crosslinked with the acrylic resin used as a binder to prevent the polymer containing the hydrophobic functional group 310 from being dissolved.

The common electrode paste 300 hardens through hard baking. The cured common electrode paste 300 is formed such that the polymer region in which the conductive particles 320 are distributed according to the phase separation is formed of the common electrode 280 and the polymer region in which the hydrophobic functional group 310 is aligned on the surface is the insulating layer 285 . Therefore, the common electrode 280 and the insulating layer 285 are simultaneously formed by using the common electrode paste 300. [

Finally, referring to FIG. 2E, a conductive chamber 295 is coated on the second substrate 260, and the liquid crystal layer 290 is formed after bonding the first substrate 210 with the previously prepared conductive substrate. At this time, the conductive chamber 295 is in contact with the common electrode 280 of the second substrate 260 and is in contact with the common wiring 247 of the first substrate 210. Therefore, the liquid crystal display device of the present invention is manufactured.

The liquid crystal display device according to an embodiment of the present invention has a common electrode that simultaneously performs a role of a conventional overcoat layer, which is advantageous in that manufacturing cost and manufacturing process can be simplified. Further, there is an advantage that an insulating layer is provided on the common electrode so that the common electrode and the pixel electrode can be prevented from being shorted by foreign matter.

Hereinafter, the common electrode manufactured using the common electrode paste of the present invention will be described in detail in the following examples. However, the following examples are illustrative of the present invention, but the present invention is not limited to the following examples.

Example

60 parts by weight of ITO nanoparticles, 10 parts by weight of TEOS, 10 parts by weight of an acrylic resin binder, 10 parts by weight of hexaediol triacrylate, 3 parts by weight of benzoin and 7 parts by weight of toluene were mixed and then coated on a substrate, Soft-baking, exposure, developing and hard-baking to form a common electrode and an insulating layer.

Comparative Example

ITO was deposited on the substrate to form a common electrode.

3, and the transmittance of the common electrode according to the examples and the comparative examples was measured to determine the transmittance of the common electrode according to the wavelengths of the common electrodes according to Examples and Table 1 .

Wavelength band Comparative Example Example 400 nm 92.1 94.9 550 nm 81.2 82.5 700 nm 96.2 99.0 Average 91.3 95.0

Referring to FIG. 3, in the case of the common electrode manufactured according to the embodiment of the present invention, the sheet resistance is about 42 (Ω / □) at a thickness of 1500 Å used in a liquid crystal display device, Respectively. Referring to FIG. 4 and Table 1, it can be seen that the transmittance of each wavelength band is about 2 to 3% higher than that of the common electrode manufactured according to the embodiment of the present invention.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It will be understood that the invention may be practiced. It is therefore to be understood that the embodiments described above are to be considered in all respects only as illustrative and not restrictive. In addition, the scope of the present invention is indicated by the following claims rather than the detailed description. Also, all changes or modifications derived from the meaning and scope of the claims and their equivalents should be construed as being included within the scope of the present invention.

100: liquid crystal display device 110: first substrate
120: gate insulating film 140: passivation film
145: pixel electrode 160: second substrate
165: black matrix 170: color filter
180: common electrode 185: insulating layer
195: Challenge chamber 197: Spacer

Claims (17)

A first substrate;
A thin film transistor positioned on the first substrate and a pixel electrode connected to the thin film transistor;
A common wiring located on the first substrate outside the thin film transistor and the pixel electrode;
A second substrate facing the first substrate;
A black matrix and a color filter disposed on one surface of the second substrate;
A common electrode having a surface covering the color filter and made of conductive particles and a polymer;
An insulating layer located on the other surface of the common electrode;
A liquid crystal layer and a spacer interposed between the pixel electrode and the insulating layer; And
And a conductive chamber for bonding the first substrate and the second substrate together and connecting the common wiring and the common electrode.
The method according to claim 1,
And the common electrode directly contacts the color filter and the insulating layer.
The method according to claim 1,
Wherein the conductive particles are any one selected from the group consisting of ITO nanoparticles, IZO nanoparticles, conductive polymers, and Ag nanowires.
The method according to claim 1,
Wherein the polymer comprises a polymer including a hydrophobic functional group, an acrylic polymer, a photoreactive polymer, and a photoinitiator.
5. The method of claim 4,
Wherein the polymer comprising the hydrophobic functional group comprises a fluorinated epoxy and a siloxane-based compound.
5. The method of claim 4,
Wherein the photoreactive polymer is a monomer containing an ethylenically unsaturated double bond.
delete Forming a thin film transistor, a pixel electrode, and a common wiring on the first substrate so that the common wiring is located outside the thin film transistor and the pixel electrode;
Forming a spacer on the first substrate;
Forming a black matrix and a color filter on one surface of a second substrate;
Applying a common electrode paste in which conductive particles and a polymer are mixed on the color filter;
Baking the second substrate to which the common electrode paste is applied, UV exposure and development to form a common electrode having one side in contact with the color filter and an insulating layer in contact with the other side of the common electrode at the same time ; And
And bonding the first substrate and the second substrate to each other to inject a liquid crystal layer,
Wherein the step of bonding the first substrate and the second substrate comprises:
A conductive film is applied to contact the common wiring of the first substrate and the common electrode, and the first substrate and the second substrate are bonded together.
9. The method of claim 8,
Wherein the conductive particles are any one selected from the group consisting of ITO nanoparticles, IZO nanoparticles, conductive polymers, and Ag nanowires.
9. The method of claim 8,
Wherein the polymer comprises a polymer containing a hydrophobic functional group, an acrylic polymer, a photoreactive polymer, and a photoinitiator.
11. The method of claim 10,
Wherein the polymer containing the hydrophobic functional group comprises a fluorine-based epoxy and a siloxane-based compound.
11. The method of claim 10,
Wherein the photoreactive polymer is a monomer containing an ethylenically unsaturated double bond.
delete The method according to claim 1,
Wherein the common wiring and the pixel electrode are disposed on the same layer.
9. The method of claim 8,
Wherein the common wiring and the pixel electrode are disposed on the same layer.
The method according to claim 1,
Wherein the pixel electrode receives a data voltage, the common electrode receives a common voltage through the common wiring, and an electric field formed by the pixel electrode and the common electrode is applied to the liquid crystal layer.
9. The method of claim 8,
Wherein the pixel electrode is supplied with a data voltage, the common electrode receives a common voltage through the common wiring, and an electric field formed by the pixel electrode and the common electrode is applied to the liquid crystal layer .

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