KR101930247B1 - Touch screen intergrated display device and method of fabricating the same - Google Patents

Abstract

Disclosed is a touch screen integrated display capable of recognizing by touching with minimal cost.
The disclosed touch screen integrated display device includes a first substrate including a plurality of gate lines and a plurality of data lines, a thin film transistor formed at intersections of the gate lines and the data lines, and pixel electrodes formed by gate lines and data lines, and; A second substrate on which a color filter and a black matrix pattern are formed on a first substrate with a liquid crystal layer interposed therebetween; A second sensing electrode formed on the first substrate at the same time when the thin film transistor is formed; And a first sensing electrode crossing the second sensing electrode by a screen printing method on the other surface of the second substrate.

Description

TECHNICAL FIELD [0001] The present invention relates to a touch screen integrated type display device and a method of manufacturing the same,

BACKGROUND OF THE INVENTION 1. Field of the Invention [0002] The present invention relates to a display device, and more particularly, to a touch screen integrated type display device capable of recognition by touch and a method of manufacturing the same.

2. Description of the Related Art In recent years, liquid crystal display devices and organic light emitting display devices having advantages such as light weight, thinness, and low power consumption driving have been used in office automation equipment, audio / video equipment and the like.

The liquid crystal display device includes a liquid crystal layer as an electro-optical active layer, and the organic light emitting display includes an organic light emitting layer as an electro-optical active layer.

The liquid crystal display displays an image by changing an electric signal into time information using a characteristic that a light transmittance of a liquid crystal, which is an intermediate state material between a liquid and a crystal, changes according to an applied voltage. A typical liquid crystal display device is composed of two substrates provided with electrodes and a liquid crystal layer sandwiched between two substrates. Such a liquid crystal display device is light in weight, small in volume, and operates with a small power as compared with other display devices having the same screen size.

The liquid crystal display device is a device for displaying images due to the light generated from the light source on the rear surface being selectively transmitted through each pixel of the liquid crystal display panel on the front side as a kind of optical switch. That is, while a conventional cathode ray tube (CRT) controls brightness by controlling the intensity of an electron beam, a liquid crystal display controls the intensity of light generated from a light source to display a screen.

In the liquid crystal display panel of the liquid crystal display as described above, the color filter substrate (upper substrate) on which the color filter is formed and the thin film transistor substrate (lower substrate) on which the thin film transistor (TFT) .

2. Description of the Related Art In recent years, products capable of being driven by a touch by attaching a touch screen panel on the liquid crystal display device have been released.

The touch screen panel may be defined as a user interface that is generally mounted on a display device and detects an electrical characteristic that changes at a touch point that is in contact with an opaque object such as a finger or a touch pen.

The liquid crystal display equipped with the touch screen panel detects a point where a user's finger or a touch pen touches the screen, and can implement various applications based on the detected information.

Meanwhile, a general capacitive sensing In Cell Touch technology is a method of detecting a change amount of a capacitance formed between two electrodes existing in a thin film transistor substrate, Are formed. Therefore, the display device of the in-cell touch can implement a display device equipped with a touch function without a separate touch screen panel.

In a display device having a general touch screen panel, a separate touch screen panel is mounted on the liquid crystal display device, thereby increasing the thickness of the entire display device and increasing the manufacturing cost.

A general in-cell touch display device includes a thin film transistor of a liquid crystal display device and a process for forming separate electrodes for touch sensing when forming various lines. Here, the electrodes for the touch sensing are formed through a photolithography process, and thus development cost and manufacturing cost are increased by a photolithography process using a separate mask. In addition, the display device of a general insensitive touch may increase the frequency of pattern defects compared to a general liquid crystal display device due to an increase in photolithography process steps using a mask, which may cause a reduction in yield.

An object of the present invention is to provide a touch screen integrated type display device capable of recognizing by touch and a method of manufacturing the same.

According to an embodiment of the present invention,

A first substrate including a thin film transistor which intersects a plurality of gate lines and data lines and which is formed at an intersection region of the gate lines and the data lines and a pixel electrode formed by the gate lines and the data lines; A second substrate on which a color filter and a black matrix pattern are formed on a first substrate with a liquid crystal layer interposed therebetween; A second sensing electrode formed on the first substrate at the same time when the thin film transistor is formed; And a first sensing electrode crossing the second sensing electrode on the other surface of the second substrate by a screen printing method.

According to another aspect of the present invention, there is provided a method of manufacturing a touch screen integrated type display device,

A plurality of gate lines and a plurality of data lines are formed on a transparent first substrate, a thin film transistor is formed in an intersection region of the gate lines and the data lines, and pixel electrodes are formed in the pixel regions; Simultaneously forming a second sensing electrode in the structure of the touch sensor at the time of forming the thin film transistor; Forming a color filter and a black matrix pattern on one surface of a transparent second substrate facing the first substrate; And forming a first sensing electrode on the other surface of the second substrate, the sensing electrode crossing the second sensing electrode by a screen printing method in the structure of the touch sensor.

In the touch screen integrated type display device of the present invention, the first sensing electrode is formed on the upper surface of the color filter substrate using a screen printing method, and the second sensing electrode is formed on the thin film transistor substrate So that the touch screen can be included in the display device without adding a photolithography process using a separate mask.

Therefore, the touch screen integrated display device of the present invention can realize the slimness and improve the manufacturing cost and the manufacturing time.

1 is a schematic view of a touch screen integrated display device according to an embodiment of the present invention.
2 is a cross-sectional view schematically showing the touch screen integrated display device of FIG.
3 is a cross-sectional view illustrating one pixel of the touch screen integrated display device of FIG.
4A to 4I are cross-sectional views illustrating a step of manufacturing a lower substrate of a touch screen integrated display device of the present invention.
5A to 5C are cross-sectional views illustrating steps of forming a first electrode of the touch screen integrated display device of the present invention.

A first substrate including a thin film transistor which intersects a plurality of gate lines and data lines and is formed at an intersection region of gate lines and data lines, and a pixel electrode formed by gate lines and data lines; A second substrate on which a color filter and a black matrix pattern are formed on a first substrate with a liquid crystal layer interposed therebetween; A second sensing electrode formed on the first substrate at the same time when the thin film transistor is formed; And a first sensing electrode crossing the second sensing electrode by a screen printing method on the other surface of the second substrate.

According to another aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, including: forming a plurality of gate lines and data lines on a transparent first substrate so that a thin film transistor is formed at intersections of gate lines and data lines; Forming a second sensing electrode simultaneously with the configuration of the touch sensor at the time of forming the thin film transistor; Forming a color filter and a black matrix pattern on one surface of a transparent second substrate facing the first substrate; And forming a first sensing electrode on the other surface of the second substrate, the first sensing electrode crossing the second sensing electrode by a screen printing method in the structure of a touch sensor.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Referring to the accompanying drawings, embodiments of the present invention will be described in detail.

One embodiment of the present invention is intended to enable a person skilled in the art to fully understand the technical idea of the present invention. Therefore, the present invention is not limited to the embodiments described below, and other embodiments can be added on the basis of the technical idea of the present invention.

FIG. 1 is a schematic view of a touch screen integrated display device according to an embodiment of the present invention, and FIG. 2 is a schematic cross-sectional view of the integrated touch screen display device of FIG.

1 and 2, the touch screen integrated display device of the present invention includes a display panel 60 including a touch sensor TS, a gate driver (not shown) for driving a pixel array in the display panel 60 50, a data driver 40, a timing controller 20 for controlling the gate driver 50 and the data driver 40, a touch controller 30 for driving the touch sensor TS, 20 and a system 10 for controlling the touch controller 30.

The display panel 30 defines a pixel PX by intersecting a plurality of gate lines GL and a plurality of data lines DL and defines a pixel PX at an intersection of the gate line GL and the data line DL. A transistor TFT is formed.

The upper polarizer 103 and the lower polarizer 105 are attached to the upper and lower surfaces of the display panel 60 and the display panel 60 The protective glass 101 may be provided.

The display panel 60 includes a pixel array in which a plurality of pixels PX are arranged and a touch sensor array in which a plurality of touch sensors TS are arranged in the pixel array. The pixel array displays a graphical user interface (GUI) and other information including pointers or cursors. The touch array senses the user's touch and allows the user to communicate with the graphical user interface displayed on the pixel array. Here, the display panel 60 is described as being limited to the liquid crystal display panel, but the present invention is not limited thereto, and an organic electroluminescent display panel, a plasma display panel, and the like can also be applied.

The display panel 60 includes an upper substrate 103 on which a color filter pattern and a black matrix pattern are formed and a lower substrate 110 on which a thin film transistor TFT, a gate line GL and a data line DL are formed And a liquid crystal layer 120 is formed between the upper substrate 130 and the lower substrate 110.

Here, the upper substrate 130 may be defined as a color filter substrate, and the lower substrate 110 may be defined as a thin film transistor substrate.

The touch array of the display panel 60 includes a touch sensor TS including the first and second sensing electrodes 210 and 230.

The first sensing electrode 210 is formed on the upper substrate 130 and the second sensing electrode 230 is formed on the lower substrate 110.

The touch sensor TS may be defined as a capacitive touch sensor that recognizes a touch according to a capacitive variable. That is, when a conductor such as a human body is touched, the touch sensor TS recognizes a touch through a change in capacitance between the first and second sensing electrodes 210 and 230, .

For example, the touch sensor TS forms a touch capacitor Cf by the touch of a conductor to vary the capacitance between the first light second sensing electrodes 210 and 230 to recognize a touch. The touch sensor TS may be formed one by one for each pixel according to a design, and may be formed for each of a plurality of pixels.

As described above, the touch screen integrated display device including the touch sensor TS is driven by dividing the display mode section in which the image is displayed and the touch sensing mode section in which the touch is recognized.

The system 10 supplies video data and a plurality of sync signals to the timing controller 20. [ In addition, the system 10 controls the timing controller 20 using touch information such as a touch position, a touch frequency, and a touch time input from the touch controller 30.

The timing controller 20 processes the image data input from the system 10 and supplies the image data to the data driver 40. The timing controller 20 receives the image data from the data driver 40 And a gate control signal for controlling the driving timing of the gate driver 50 are generated and supplied.

The gate driver 50 supplies a gate-on voltage scan pulse to each gate line GL in response to a gate control signal from the timing controller 20. [

The data driver 40 supplies a data signal to a plurality of data lines DL formed in a pixel array of the display panel 60 in response to a data control signal from the timing controller 20. [ The data driver 40 converts the digital data input from the timing controller 20 into a positive / negative analog data signal by using a gamma voltage, and outputs a data signal every time each gate line GL is driven To the data line DL.

The touch controller 30 calculates touch information from the touch sensor array through a touch signal output from the touch sensor TS and outputs the touch information to the system 10. The touch controller 40 senses a touch signal from the touch array to calculate touch coordinates, calculates a touch frequency and a touch time within a unit time, and outputs the touch frequency to the system 10.

The touch sensor TS of the present invention does not use an additional photolithography process and a first sensing electrode 210 is formed on the upper surface of the upper substrate 130 by a screen printing method, (230) are formed at the same time when a thin film transistor (TFT) is formed on the lower substrate (110).

The structure and manufacturing method of the touch sensor (TS) of the present invention will be described in detail with reference to FIGS. 3 to 5C.

3 is a cross-sectional view illustrating one pixel of the touch screen integrated display device of FIG.

As shown in FIG. 3, the upper substrate 130 and the lower substrate 110 are bonded together with the liquid crystal layer 120 interposed therebetween, in the touch screen integrated display device according to an embodiment of the present invention.

The lower substrate 110 is provided with a thin film transistor in a crossing region between a gate line (not shown) and a data line DL as a switching element for each pixel.

The thin film transistor includes a gate electrode 111 formed on a transparent first substrate 110a and an active pattern formed on the gate electrode 111 and the gate insulating layer 114 formed on the first substrate 110a And a source electrode 113s and a drain electrode 113d formed separately from each other on the active pattern 112a.

In the thin film transistor, an ohmic contact pattern 112b is further formed on the active pattern 112a.

A protective layer 115 is formed on the gate insulating layer 114 including the source / drain electrodes 113s and 113d.

The drain electrode 113d is exposed to the outside by a contact hole through which the passivation layer 115 is removed and is electrically connected to the pixel electrode 116 formed on the passivation layer 115. [

The touch screen integrated type display device of the present invention further includes a second sensing electrode 230 formed for each pixel.

The second sensing electrode 230 may be formed simultaneously with the formation of the source / drain electrodes 113s and 113d and the data line DL.

That is, the second sensing electrode 230 may include a first lower pattern including first and second semiconductor patterns 232a and 232b formed simultaneously with the active pattern 112a and the ohmic contact pattern 112b, 232 and a first upper pattern 233 formed on the first lower pattern 232.

The data line DL includes a second lower pattern 332 including third and fourth semiconductor patterns 332a and 332b formed at the same time when the active pattern 112a and the ohmic contact pattern 112b are formed, And a second upper pattern 333 formed on the second lower pattern 332.

That is, the second sensing electrode 230 of the present invention is formed on the lower substrate 110 when the source / drain electrodes 113s and 113d are formed without adding a photolithography process using a separate mask, Cost and manufacturing time are not increased, and it is advantageous in that it is formed on the lower substrate 110 and is advantageous for slimming.

The upper substrate 130 includes a black matrix pattern 131 including a gate line (not shown) and a data line DL on a transparent second substrate 130a to prevent light leakage, And a color filter pattern 133 formed in correspondence with the pixel array.

The upper substrate 130 of the present invention includes a first sensing electrode 210 formed adjacent to the second sensing electrode 230 on a top surface thereof.

Although not shown in detail in the figure, the first and second sensing electrodes 210 and 230 are formed to intersect with each other. That is, the first and second sensing electrodes 210 and 230 have a structure similar to the matrix structure of the gate line (not shown) and the data line (DL).

In other words, the first sensing electrode 210 intersects the data line DL, and the second sensing electrode 230 is formed in parallel with the data line DL.

The first sensing electrode 210 may be formed on the upper surface of the second substrate 130a by a screen printing method.

That is, the first sensing electrode 210 is formed on the other surface of the second substrate 130a in which the black matrix pattern 131 and the color filter pattern 133 are formed.

The first sensing electrode 210 is made of a transparent metal material.

That is, the first sensing electrode 210 may be formed by forming a transparent metal layer made of any one of ITO, ZnO, and IZO on the upper surface of the second substrate 130a, printing the etching paste using a screen printing method, Process. ≪ / RTI >

The transparent metal layer is formed to a thickness of 300 to 1500 ANGSTROM.

Specifically, the etching paste for forming the first sensing electrode 210 includes a corrosive agent, a pigment for pattern formation of the etching paste, and a solvent for delaying the drying together with water for acid activation.

The corrosive agent is phosphoric acid, nitric acid, sulfuric acid, acetic acid or the like, and the acid content of the etching paste is 40 to 60 wt%.

In order to optimally control the low curing temperature, the short curing time, the straightness of the pattern, and the spread of the linewidth, 5 to 50 nm of carbon black is added in an amount of 5 to 10 wt% as compared with the general etching process.

In addition, the solvent can be added with 5 ~ 15wt% of water, and 10 ~ 20% of other solvents such as Ethyl carbitol, Butyl carbitol, NMP and the like can be added.

The above-described etching paste is printed on the transparent metal layer and heated to 120 to 160 캜 for 3 to 6 minutes using a heating apparatus.

With this process condition, the present invention can form the optimized first sensing electrode 210 having a line width of 20 to 40 nm and a width of 50 to 80 nm between adjacent patterns.

Therefore, the integrated touch screen display device of the present invention forms the first sensing electrode 210 on the upper surface of the second substrate 130a using a screen printing method, and when the source / drain electrodes 113a and 113b are formed The second sensing electrode 230 may be formed on the first substrate 110a and the touch screen may be mounted on the display device without adding a photolithography process using a separate mask.

Therefore, the touch screen integrated display device of the present invention can realize the slimness and improve the manufacturing cost and the manufacturing time.

4A to 4I are cross-sectional views illustrating a step of manufacturing a lower substrate of a touch screen integrated display device of the present invention.

4A to 4C, a conductive first metal layer 111a is deposited on a transparent first substrate 110a, a photoresist layer PR is formed on the first metal layer 11a, the gate electrode 111 is formed using the first mask M1 having the transparent region a2 and the non-transparent region a1.

The photoresist pattern PP is formed on the first metal layer 111a by the first mask M1 and is etched using the photoresist pattern PP as a mask The gate electrode 111 is formed.

4D to 4F, a gate insulating layer 114, first and second semiconductor layers 112, a second metal layer 113a, and a gate insulating layer 114 are formed on a first substrate 110a including the gate electrode 111, The photoresist layer PR is sequentially deposited and the active pattern 112a and the ohmic contact pattern a2 are formed by using the second mask M2 having the transmissive area a2, the semi-transmissive area a3 and the non- A source electrode 112b and source / drain electrodes 113s and 113d are formed.

The second sensing electrode 230 and the data line (not shown) are formed on the first substrate 110a simultaneously with the formation of the active pattern 112a, the ohmic contact pattern 112b, and the source / drain electrodes 113s and 113d. DL) are formed.

The photoresist layer PR is formed with first and second photoresist patterns PP1 and PP2 having different heights on the second metal layer 113a by the second mask M2, The ohmic contact pattern 112b, the source / drain electrodes 113s and 113d, and the second sensing electrode 112b are etched using the first and second photoresist patterns PP1 and PP2 as a mask. (230) and the data line (DL) are formed.

The second sensing electrode 230 may include a first lower pattern including first and second semiconductor patterns 232a and 232b formed at the same time when the active pattern 112a and the ohmic contact pattern 112b are formed. 232 and a first upper pattern 233 formed on the first lower pattern 232.

The data line DL includes a second lower pattern 332 including third and fourth semiconductor patterns 332a and 332b formed at the same time when the active pattern 112a and the ohmic contact pattern 112b are formed, And a second upper pattern 333 formed on the second lower pattern 332.

Referring to FIG. 4G, a protective layer 115 is formed on the gate insulating layer 114 including the source / drain electrodes 113s and 113d, the second sensing electrode 230, and the data line DL A photoresist layer PR is formed on the protective layer 115 and a part of the protective layer 115 is formed by a third mask M3 including a transmissive area a2 and a non- So that the drain electrode 113d is exposed.

Referring to FIG. 4H, a transparent metal layer 116a is formed on the passivation layer 115 and the drain electrode 113d, and a photoresist layer PR is formed on the transparent metal layer 116a. the pixel electrode 116 electrically connected to the drain electrode 113d is formed by the fourth mask M4 including the transparent region a2 and the non-transmissive region a1. Thus, the fabrication of the lower substrate 110 is completed.

Although not shown in the figure, a common electrode (not shown) may be formed on the lower substrate 110 to drive the liquid crystal by a potential difference with the pixel electrode 116.

5A to 5C are cross-sectional views illustrating steps of forming a first electrode of the touch screen integrated display device of the present invention.

5A to 5C, the first sensing electrode 210 may be formed after the upper substrate 130 and the lower substrate 110 are bonded together.

A transparent metal layer 210a is deposited on the upper surface of the transparent second substrate 130a of the upper substrate 130. [ Here, the transparent metal layer 210a may be formed of any one of ITO, ZnO, and IZO.

The transparent metal layer 210a is formed to a thickness of 300 to 1500 ANGSTROM.

A screen printing mask 330 is mounted on the transparent metal layer 210a and an etching paste 310 is applied to the transparent metal layer 210a via a screen printing mask 330 by a squeegee unit 300 . Here, the screen printing mask 330 includes a blocking pattern corresponding to a region where the first sensing electrode 210 is formed.

Therefore, the etching paste 310 may be formed on the transparent metal layer 210a in the exposed region O where the blocking pattern does not exist.

The etch paste 310 includes a caustic, a pigment for patterning the etch paste 310, and a solvent for delaying the drying with water for acid activation.

The etching agent is phosphoric acid, nitric acid, sulfuric acid, acetic acid or the like, and the acid content of the etching paste 310 is 40 to 60 wt%.

In order to optimally control the low curing temperature, the short curing time, the straightness of the pattern, and the spread of the linewidth, 5 to 50 nm of carbon black is added in an amount of 5 to 10 wt% as compared with the general etching process.

In addition, the solvent can be added with 5 ~ 15wt% of water, and 10 ~ 20% of other solvents such as Ethyl carbitol, Butyl carbitol, NMP and the like can be added.

In the present invention as described above, the etching paste 310 is printed on the transparent metal layer 210a and heated to 120 to 160 ° C using a heating apparatus, and the etching is continued for 3 to 6 minutes.

With this process condition, the present invention can form the optimized first sensing electrode 210 having a line width of 20 to 40 nm and a width of 50 to 80 nm between adjacent patterns.

3 to 5C, the touch screen integrated type display device of the present invention forms the first sensing electrode 210 on the upper surface of the second substrate 130a using a screen printing method, and the source / When the drain electrodes 113s and 113d are formed, the second sensing electrode 230 is formed on the first substrate 110a, and a touch screen is mounted on the display device without adding a photolithography process using a separate mask .

Therefore, the touch screen integrated display device of the present invention can realize the slimness and improve the manufacturing cost and the manufacturing time.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention. Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification, but should be defined by the claims.

210: first sensing electrode 230: second sensing electrode
310: Etching paste 330: Screen printing mask

Claims (10)

A first substrate including a thin film transistor which intersects a plurality of gate lines and data lines and which is formed at an intersection region of the gate lines and the data lines and a pixel electrode formed by the gate lines and the data lines;
A second substrate on which a color filter and a black matrix pattern are formed on a first substrate with a liquid crystal layer interposed therebetween;
A second sensing electrode formed between the first substrate and the pixel electrode; And
And a first sensing electrode crossing the second sensing electrode on the other surface of the second substrate. The method according to claim 1,
Wherein the first sensing electrode is patterned by an etching paste,
A caustic agent having an acid content of 40 to 60 wt%;
5 to 10% by weight of 5 to 50 nm carbon black; And
5 to 15 wt% of water and 10 to 20% of ethyl carbitol, butyl carbitol and NMP. The method according to claim 1,
Wherein the first sensing electrode is formed of any one of ITO, ZnO, and IZO, and is formed to a thickness of 300 to 1500 ANGSTROM. The method according to claim 1,
Wherein the thin film transistor includes a source electrode and a drain electrode, and the second sensing electrode is formed at the same time when the source electrode and the drain electrode are formed. A plurality of gate lines and a plurality of data lines are formed on a transparent first substrate, a thin film transistor is formed in an intersection region of the gate lines and the data lines, and pixel electrodes are formed in the pixel regions;
Forming a second sensing electrode between the first substrate and the pixel electrode in the structure of a touch sensor at the time of forming the thin film transistor;
Forming a color filter and a black matrix pattern on one surface of a transparent second substrate facing the first substrate; And
And forming a first sensing electrode on the other surface of the second substrate, the sensing electrode crossing the second sensing electrode by a screen printing method in the structure of the touch sensor. 6. The method of claim 5,
Wherein the step of forming the first sensing electrode comprises forming the first sensing electrode to a thickness of 300 to 1500 ANGSTROM and patterning the same using an etching paste. The method according to claim 6,
The etchant paste includes a paste for forming a pattern of an etchant paste and a solvent for delaying the drying with water for activating an acid. The etchant paste is prepared by adding 40 to 60 wt% of phosphoric acid, nitric acid, sulfuric acid, Wherein the method comprises the steps of: 8. The method of claim 7,
Wherein the pigment is added with 5 to 10 wt% of carbon black of 5 to 50 nm. 8. The method of claim 7,
Wherein the solvent comprises 5 to 15 wt% of water, and 10 to 20% of ethylcarbitol, butyl carbitol, and NMP are added to the other solvent. The method according to claim 6,
Wherein the first sensing electrode is formed by printing the etchant paste on a transparent metal layer and heating the first and second sensing electrodes at 120 to 160 ° C. for 3 to 6 minutes using a heating device.

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