KR101913197B1 - Scrubber apparatus - Google Patents

Abstract

The present invention relates to a scrubber device which can efficiently neutralize noxious gas generated in various industrial fields through a filter module. More specifically, the present invention relates to a scrubber device which sprays a processing liquid in contact with the noxious gas to a predetermined size, improves contact efficiency of the noxious gas and the processing liquid, separates a passage through which the noxious gas moves by sections and is easy to replace and maintenance. The scrubber device comprises: a case (100); a suction port (200); a unit scrubber (300); an outlet (400); a storage tank (500); a liquid spraying part (600); a pH measuring part (700); a pH concentration adjusting part (800); and a control part (900).

Description

The present invention relates to a scrubber apparatus,

The present invention relates to a scrubber device capable of effectively neutralizing noxious gases generated in various industrial fields through a filter module. The scrubber device is designed to spray a treating solution in contact with a noxious gas to a certain size to improve the contact efficiency between the noxious gas and the treating solution The present invention relates to a scrubber apparatus that is easy to replace and maintain.

Hazardous materials that adversely affect human health or the environment are mostly wastewater treatment facilities, manure treatment facilities, food waste treatment facilities, food processing plants, composting plants, petrochemical plants, tire plants, paint manufacturing plants, Site and environmental treatment facilities.

Common harmful substances such as ammonia (NH 3), methyl mercaptan (MM), hydrogen sulfide (H 2 S), methyl sulfide (DMS), methyl disulfide (DMDS), trimethyl amine (TMA), acetaldehyde, And volatile organic compounds (VOCs) that destroy the ozone layer in the atmosphere or harmful to the human body such as benzene, toluene, xylene, dichlorobenzene, and dichloromethane. These harmful substances are strongly regulated at the national level, and the substances to be regulated are also expanding. Therefore, if harmful substances are externally introduced, it may cause a serious threat to human body. Therefore, it is necessary to remove the oxidation component, flammable component and toxic component of the waste gas and discharge it to the atmosphere.

For this reason, in the past, equipment such as a scrubber or a fume hood has been developed which collects and purifies noxious gases in consideration of the safety of the operator and the surrounding environment, and then discharges the purified gas to the atmosphere.

 The scrubber can be roughly classified into three types. Firstly, it is an indirect combustion wet type, which is also called a heatwet scrubber which uses an induction heating method to dry off the waste gas and to filter it once more by using water. Secondly, it is also referred to as wet scrubber as a method of collecting waste gas using water as a wet type and then purifying water. Third, it is a direct burning wet type, which is called burnwet by burning waste gas with high temperature flame and then collecting it with water.

Among the scrubbers, a wet scrubber corresponding to a wet scrubber is provided with a plurality of filters to neutralize impurities and noxious gases together with sprinkling of water. Such wet towers are used for various process conditions and conditions There is an inefficient disadvantage that it must be used continuously without changing its assembly state.

In addition, the conventional wet scrubber has a disadvantage in that the filter or the like is clogged with sediments or the like reacting with impurities or noxious gases as the use period is long, the cleaning rate gradually decreases, and the replacement method of the filter or the like is very inconvenient .

1. Korean Patent No. 10-1501910 'Scrubber module system for removing harmful substances from small and medium sized ships and method for removing harmful substances using the same' (filed on December 31, 2013) 2. Korean Patent No. 10-0669501 'Wet Tower of Scrubber for treating semiconductor waste gas' (filed on Mar. 2006, 2006) 3. Korean Patent Laid-Open Publication No. 10-2017-0135271 'Wet scrubber module, system for removing harmful substances using the same, and removal method' (filed on May 31, 2016)

SUMMARY OF THE INVENTION The present invention has been conceived to solve the problems as described above, and it is an object of the present invention to eliminate harmful substances contained in noxious gases emitted from various industrial fields, to guide the movement path of noxious gases from the upper side to the lower side, And it is an object of the present invention to provide a scrubber device capable of increasing the efficiency.

It is another object of the present invention to provide a scrubber device which can be arbitrarily changed in the number of filters stacked in accordance with the kind of a noxious gas and installation conditions, do.

The scrubber device of the present invention includes a case 100 including a front panel 110 having a receiving space S1 therein and being detachably attached to one surface thereof and an internal partition 120 separating the receiving space S1 at regular intervals ); A suction port 200 provided on the upper surface of the case 100 to suck noxious gas from the outside; A unit scrubber (300) provided in the accommodation space (S1) for removing harmful substances contained in the noxious gas by receiving noxious gas from the suction port (200); An exhaust port 400 provided at an upper end of the case 100 to communicate with the unit scrubber 300 to suck and remove harmful gas from which the harmful substances have been removed from the unit scrubber 300; A storage tank 500 in which a treatment solution for removing harmful substances contained in the noxious gas is received and a drain pipe 510 for discharging the treatment solution is formed at a lower end thereof; Further comprising a solution spraying unit (600) for spraying the treatment solution to the unit scrubber (300) so that the treatment solution is received from the storage tank (500) and the noxious gas is contacted with the treatment solution,

A PH measurement unit 700 for measuring the PH concentration of the treatment solution contained in the storage tank 500; A pH concentration controller 800 for supplying the pH adjusting solution to the storage tank 500 to maintain the pH concentration of the treatment solution at a predetermined PH concentration value; And a controller 900 for controlling the operation of the PH concentration adjusting unit 800 by comparing the PH concentration measured by the PH measuring unit 700 with the arbitrarily set pH concentration value.

In the present invention, the unit scrubber 300 is stacked on the upper end of the storage tank 500 to discharge the treatment solution in contact with the noxious gas to the storage tank 500, A first processing unit 310 connected to remove harmful substances included in the noxious gas firstly; And is disposed in the receiving space S1 to receive the noxious gas from the first processing unit 310. One side of the noxious gas is connected to the discharge port 400 to remove harmful substances contained in the noxious gas secondarily, And a second processing unit (320)

Another embodiment of the unit scrubber 300 may include a first processing unit 310 communicating with the storage tank 500 and removing toxic substances contained in the noxious gas. A second processing unit 320 connected to the storage tank 500 and connected to the first processing unit 310 to receive the noxious gas from the first processing unit 310 to remove harmful substances contained in the noxious gas, A third processing unit 330 stacked on top of the first processing unit 310 and disposed between the first processing unit 310 and the suction port 200 to remove harmful substances; And a fourth processing unit 340 for removing harmful substances by receiving the noxious gas from the second processing unit 320 while being stacked on the upper end of the second processing unit 320. [

The solution spraying part 600 of the present invention is connected to the storage tank 500 and receives the treatment solution. The solution spraying part 600 passes through the lower end of the second treatment part 320, A supply pipe 610 vertically installed to be disposed inside the fourth processing unit 340; The first processing unit 310 and the third processing unit 330 are configured to supply the processing solution supplied from the supply pipe 610 to the first processing unit 310 and the third processing unit 330 in which noxious gas is received, And an injection nozzle 620 provided inside the fourth processing unit 340.

The solution dispenser 600 may include a first nozzle (not shown) disposed in the first and third processing units 310 and 330 to spray the processing solution so that the noxious gas and the processing solution are in contact with each other, 630 and a third nozzle 650; A second nozzle 640 and a fourth nozzle 660 which are respectively provided in the second processing unit 320 and the fourth processing unit 340 and inject the processing solution so that the noxious gas and the processing solution are in contact with each other; And is connected to the storage tank 500 to supply the processing solution to the first nozzle 630 and the third nozzle 650 and to the second nozzle 640 and the fourth nozzle 660, A first supply pipe 670 and a second supply pipe 680 which are connected to each other.

The first supply pipe 670 passes through the lower side of the first processing unit 310 and is connected to the storage tank 500 at one side and the first processing unit 310 at the other side toward the third processing unit 330, A first supply pipe 671 vertically installed inside the processing unit 310; And a second supply pipe 672, one side of which is fastened to the other side of the first supply pipe 671 and which is vertically installed in the third processing unit 330 and is fastened to one side of the third nozzle 650, ); The second supply pipe 680 passes through the lower side of the second processing unit 320 and is connected to the storage tank 500 at one side and the second processing unit 340 at the other side toward the fourth processing unit 340 A second-1 supply pipe (681) vertically installed in the interior of the second pipe (320); A second-2 supply pipe 682, one side of which is connected to the other side of the second-1 supply pipe 681 and is vertically installed in the fourth processing unit 340 and the fourth nozzle 660 is fastened to one side, ; And

In addition, the second processing unit 320 and the fourth processing unit 340 of the present invention are characterized in that a plurality of the second processing unit 320 and the fourth processing unit 340 are provided so as to be mutually connected and stacked according to the kind and discharge amount of the noxious gas.

The present invention improves the contact efficiency between the noxious gas and the treatment solution by guiding the movement path of the noxious gas from the upper side to the lower side and spraying the treatment solution, and a plurality of unit scrubbers are stacked in the upper direction, And it is easy to separate and replace the filter module, which is convenient in maintenance.

1 is a perspective view showing the overall appearance of the present invention.
FIG. 2 is an exploded perspective view showing the main internal structure of the case of the present invention. FIG.
FIG. 3 is a cross-sectional view showing a main structure of a noxious gas moving path, a unit scrubber and a solution injecting part of the present invention.
4 is a cross-sectional view showing another embodiment of the unitary scrubber and solution spraying part of the noxious gas moving path of the present invention.
5 is a cross-sectional view showing another embodiment of the unit scrubber and the solution injection unit of the present invention.
6 is a cross-sectional view showing one embodiment of the unitary scrubber coupling of the present invention.

Hereinafter, an embodiment of the scrubber apparatus of the present invention will be described in detail with reference to the drawings.

FIG. 3 is a cross-sectional view showing a main structure of a unitary scrubber and a solution injecting part of the present invention. FIG. 3 is a cross- And FIG. 5 is a sectional view showing another embodiment of the unitary scrubber and the solution spraying part of the noxious gas moving path of the present invention, and FIG. 6 is a cross-sectional view showing one embodiment of unit scrubber fastening of the present invention.

Referring to FIGS. 1 and 2, the present invention has a case 100. The case 100 is hollow and has a shape open at one side to form a receiving space S1 therein. A front panel 110 is detachably attached to a case 100 on one side of the case 100. The front panel 110 is provided with an auxiliary door 110 for opening and closing the accommodation space S1 of the case 100, May be further included. Inside the case 100, an internal partition wall 120 is formed to partition the accommodation space S1 at regular intervals. The inner partition 120 separates the accommodation space S1 in the horizontal direction.

Referring to FIGS. 1 and 2, a suction port 200 is provided on the upper surface of the case 100. The suction port 200 sucks noxious gas from the outside. That is, the suction port 200 receives harmful gas generated in a fume hood, a draft chamber, and the like. The suction port 200 may be provided with a suction fan for sucking noxious gas. Hazardous gas generally corresponds to gas generated when handling hazardous materials or hazardous chemicals in a specific work space. The hazardous materials and dangerous chemicals mentioned above may mainly correspond to liquids having strong acidity.

Referring to FIG. 2, a unit scrubber 300 is provided in the housing space S1 of the case 100. As shown in FIG. The unit scrubber 300 is connected to the suction port 200 to receive the noxious gas from the suction port 200. The unit scrubber 300 removes harmful substances contained in the noxious gas. The unit scrubber 300 may include a filter for filtering foreign substances contained in the noxious gas and a plurality of air rings for improving the contact ratio of the noxious gas to the processing solution to be described later. Accordingly, the moving speed of the noxious gas passing through the unit scrubber 300 is reduced while foreign substances contained in the noxious gas are removed.

Referring to FIGS. 1 and 2, a discharge port 400 communicating with the unitary scrubber 300 is formed at an upper end of the case 100. The discharge port 400 sucks the noxious gas from which the harmful substances have been removed from the unit scrubber 300 and discharges the noxious gas to the outside. A separate suction fan capable of sucking noxious gas may be provided in the discharge port 400.

Referring to FIG. 2, a solution dispenser 600 connected to the storage tank 500 and the storage tank 500 is provided in the case 100.

The interior of the storage tank 500 is hollow, and a treatment solution for removing harmful substances of the harmful gas is received in the hollow interior while being in contact with the noxious gas. A drain pipe 510, which can be opened and closed by a user, may further be provided at the lower end of the storage tank 500 to discharge the treatment solution.

The solution injector 600 receives the treatment solution from the storage tank 500 and injects the treatment solution into the unit scrubber 300. At this time, the treatment solution can be sprayed in the form of a mist with a constant radius. The direction of the sprayed processing solution is injected in the direction of movement of the noxious gas or in the direction opposite to the direction of movement of the noxious gas. The noxious gas is acidic, the treating solution is a basic solution, the noxious gas and the treating solution react with each other to neutralize the noxious gas, the foreign substances contained in the noxious gas are agglomerated, And discharged to the outside.

That is, the harmful gas corresponds to a vaporized gas of hydrogen chloride (HCl), and the treating solution corresponds to a basic liquid in which sodium hydroxide (NaOH) is dissolved. The reaction liquid generated when the harmful gas and the treatment solution come into contact with each other in the unit scrubber 300 is composed of sodium chloride (NaCl) and water (H2O).

At this time, the reaction liquid moves to the lower side of the unit scrubber 300, and the unit scrubber 300 and the storage tank 500 are communicated with each other, so that the reaction liquid is moved to the hollow interior of the storage tank 500 do. If a large amount of sodium chloride is accumulated in the storage tank 500 due to the continuous reaction of the harmful gas and the treatment solution, the drain pipe 510 may be opened to discharge the sodium chloride.

2, at one side of the storage tank 500, a PH measurement unit 700 for measuring the PH concentration of the treatment solution contained in the storage tank 500 and a PH concentration control unit 800 are provided . The front panel 110 is further provided with a controller 900 for controlling the operation of the PH concentration controller 800.

The PH concentration control unit 800 has a purpose of supplying the PH adjusting solution to the storage tank 500. That is, the PH measuring unit 700 measures the PH concentration of the treatment solution contained in the storage tank 500, and when the PH concentration of the treatment solution is equal to or less than the PH concentration value arbitrarily set by the user, And maintains the PH concentration value set by the user.

The PH concentration control unit 800 includes a solution storage tank 810 in which the PH adjusting solution is accommodated and a supply pump 820 for supplying the PH adjusting solution from the solution storing tank 810 to the storage tank 500, ).

At this time, the control unit 900 controls the operation of the PH concentration control unit 800 by comparing the PH concentration measured by the H measurement unit 700 with the set PH concentration value.

Referring to FIG. 3, the unit scrubber 300 includes a first processing unit 310 and a second processing unit 320. The first processing unit 310 is connected to the suction port 200 to receive the noxious gas, and firstly removes harmful substances included in the noxious gas. That is, the first processing unit 310 contacts the noxious gas and the processing solution while the processing solution of the solution injecting unit 600 is sprayed to the first processing unit 310, And is connected to the storage tank 500 while being stacked on the upper end of the storage tank 500 to move the storage tank 500.

The second processing unit 320 is provided at one side of the first processing unit 310 and in the receiving space S1 of the case 100 and communicates with the first processing unit 310 to receive the noxious gas. One side of the second processing unit 320 is connected to the discharge port 400 to discharge the toxic gas of the harmful gas secondarily and the noxious gas from which the harmful substance has been removed to the outside while the treatment solution is sprayed into the second treatment unit 320. [ ). The second processing unit 320 is also stacked on top of the storage tank 500 and communicates with the storage tank 500.

Another embodiment of the unit scrubber 300 will be described with reference to FIG.

The unit scrubber 300 includes a first processing unit 310, a second processing unit 320, a third processing unit 330, and a fourth processing unit 340.

The first processing unit 310 communicates with the storage tank 500 to remove harmful substances included in the noxious gas and the second processing unit 320 communicates with the storage tank 500 and is connected to the first processing unit 310 And is connected to the first processing unit 310 so as to receive the noxious gas to remove harmful substances contained in the noxious gas.

The third processing unit 330 is stacked on the top of the first processing unit 310 and the third processing unit 330 is provided between the first processing unit 310 and the inlet 200. The third processing unit 330 communicates with the first processing unit 310 and transfers the noxious gas through the inlet 200 to the first processing unit 310 while removing harmful substances.

The fourth processing unit 340 is also stacked on top of the second processing unit 320 and a fourth processing unit 340 is provided between the second processing unit 320 and the discharge port 400. The fourth processing unit 340 communicates with the second processing unit 320 and receives the noxious gas from the second processing unit 320 to finally remove the harmful substances contained in the noxious gas and discharge the same through the discharge port 200 .

That is, the third processing unit 330 and the fourth processing unit 340 are integrally formed with each other, and a plurality of the processing units 330 and the plurality of processing units 340 are stacked in the upward direction or the lateral direction depending on the kind and amount of the generated noxious gas, .

At this time, the first processing unit 310 and the third processing unit 330 are seated on the inner partition wall 120 of the case 100 and the second processing unit 320 and the fourth processing unit 340 can be seated and each processing unit can be firmly fixed to the inside of the case 100.

Referring to FIG. 4, the solution jetting unit 600 includes a supply pipe 610 and a jetting nozzle 620. One side of the supply pipe 610 is connected to the storage tank 500 and receives the treatment solution. The supply pipe 610 passes through the lower end of the second treatment unit 320 and is positioned inside the second treatment unit 320 and the fourth treatment unit 340 Up direction. In this case, when the filter 301 is provided inside the second processing unit 320 and the fourth processing unit 340, a through hole 301-1 through which the supply pipe 610 penetrates is formed at the center of the filter 301.

The injection nozzle 620 is provided inside the first processing unit 310 and the fourth processing unit 340. The injection nozzle 620 receives the treatment solution from the supply pipe 610 and injects the treatment solution supplied to the first treatment part 310 and the third treatment part 330 in which the noxious gas is received. This is advantageous in that it can smoothly move and remove harmful substances without being disturbed by the flow of noxious gas by spraying the treatment solution in the direction of movement of noxious gas.

At this time, a hygroscopic filter 302 for removing moisture contained in the harmful gas is further provided inside the fourth processing unit 340 so that the discharged noxious gas can maintain a uniform humidity.

Another embodiment of the solution injector 600 will be described in detail with reference to FIGS. 2 and 5. FIG.

The solution injector 600 includes a first nozzle 630 and a third nozzle 650 and a second nozzle 640 and a fourth nozzle 660. The first nozzle 640 and the second nozzle 660 include a first supply pipe 370 and a second supply pipe 380 do.

The first nozzle 630 and the third nozzle 650 are respectively provided in the first processing part 310 and the third processing part 330 so that the processing solution is in a mist type .

The second nozzle 640 and the fourth nozzle 660 are respectively provided in the second processing unit 320 and the fourth processing unit 340 so that the processing solution is in a mist type .

One side of the first supply pipe 370 is connected to the storage tank 500 to supply the treatment solution to the first nozzle 630 and the third nozzle 650. The second supply pipe 380 has one side connected to the storage tank 500, (500) to supply the treatment solution to the second nozzle (640) and the fourth nozzle (660).

The first supply pipe 670 and the second supply pipe 680 may each be provided with a pump 690 that supplies a constant pressure to supply the processing solution to the respective nozzles.

Referring to FIGS. 5 and 6, the first supply pipe 370 is connected to the first supply pipe 671 and the first supply pipe 671, which pass through the lower side of the first treatment unit 310 and are vertically installed, And a second supply pipe 672 connected to the second supply pipe 672.

The first supply pipe 671 is vertically installed in the first processing unit 310 so that one end thereof is connected to the storage tank 500 and the other end thereof is directed to the third processing unit 330. The first nozzle 630 is mounted on the other end of the first supply pipe 671.

One side of the first supply pipe 672 is fastened to the other side of the first supply pipe 371 and the third nozzle 650 is fastened to the other side of the third processing unit 330 in the vertical direction .

The second supply pipe 380 passes through the lower portion of the second processing unit 320 and is connected to the second-first supply pipe 681 and the second-second supply pipe 682 ).

The second supply pipe 681 is vertically installed inside the second processing unit 320 so that one end thereof is connected to the storage tank 500 and the other end thereof is directed to the fourth processing unit 350. A second nozzle 620 is mounted on the other end of the second-first supply pipe 681.

One end of the second-2 supply pipe 682 is connected to the other end of the second-first supply pipe 381 and is vertically installed in the fourth processing unit 350, and the fourth nozzle 660 is provided at the other end. Respectively.

Further, finishing caps 672-1 and 682-1 are further provided at the ends of the first and second supply pipes 672 and 682 located at the uppermost position to prevent leakage of the processing solution.

When the third processing unit 330 and the fourth processing unit 340 are stacked in the upward direction due to the configuration of the first and second supply pipes 370 and 380, A plurality of second supply pipes 682 may be provided so as to be extended by the number of times the third processing unit 330 and the fourth processing unit 340 are stacked.

Accordingly, when the user further includes the third processing unit 330 and the fourth processing unit 340 in accordance with the kind of the noxious gas, the degree of contamination, and the amount of the discharged noxious gas, the first pipe 670 and the second pipe 680 Can be facilitated.

The first supply pipe 670 and the second supply pipe 680 are disposed inside the first through fourth processing units 310, 320, 330 and 340 so that the first supply pipe 670 and the second supply pipe 680 are aged or replaced It is possible to replace only the aged supply pipe when necessary, and the treatment solution is not leaked to the outside, which makes it easy to maintain and manage.

100: Case 110: Front panel
120: inner bulkhead 200: inlet
300: unit scrubber 310: first processing unit
320: second processing unit 330: third processing unit
340: fourth processor 400: outlet
500: storage tank 510: drain pipe
600: solution spraying part 610: supply pipe
620: jet nozzle 630: first nozzle
640: second nozzle 650: third nozzle
660: fourth nozzle 700: PH measuring section
800: PH concentration adjusting section 900:

Claims (7)

A case 100 including a front panel 110 having a receiving space S1 formed therein and detachably attached to one surface thereof and an internal partition 120 separating the receiving space S1 at regular intervals;
A suction port 200 provided on the upper surface of the case 100 to suck noxious gas from the outside;
A unit scrubber (300) provided in the accommodation space (S1) for removing harmful substances contained in the noxious gas by receiving noxious gas from the suction port (200);
An exhaust port 400 provided at an upper end of the case 100 to communicate with the unit scrubber 300 to suck and remove harmful gas from which the harmful substances have been removed from the unit scrubber 300;
A storage tank 500 in which a treatment solution for removing harmful substances contained in the noxious gas is received and a drain pipe 510 for discharging the treatment solution is formed at a lower end thereof;
Further comprising a solution spraying unit (600) for spraying the treatment solution to the unit scrubber (300) so that the treatment solution is received from the storage tank (500) and the noxious gas is contacted with the treatment solution,
A PH measurement unit 700 for measuring the PH concentration of the treatment solution contained in the storage tank 500;
A pH concentration controller 800 for supplying the pH adjusting solution to the storage tank 500 to maintain the pH concentration of the treatment solution at a predetermined PH concentration value;
And a control unit (900) for controlling the operation of the PH concentration control unit (800) by comparing the PH concentration measured by the PH measurement unit (700) with the arbitrarily set PH concentration value,
The unit scrubber 300 includes a first processing unit 310 that communicates with the storage tank 500 and removes harmful substances contained in the noxious gas.
A second processing unit 320 connected to the storage tank 500 and connected to the first processing unit 310 to receive the noxious gas from the first processing unit 310 to remove harmful substances contained in the noxious gas, );
A third processing unit 330 stacked on top of the first processing unit 310 and disposed between the first processing unit 310 and the suction port 200 to remove harmful substances; And
A fourth processing unit 340 that receives the noxious gas from the second processing unit 320 and removes harmful substances while the lower end of the fourth processing unit 320 is stacked on the upper side of the second processing unit 320;
Wherein the scrubber device comprises: delete delete The method according to claim 1,
The solution dispenser 600 is connected to the storage tank 500 and receives the processing solution. The solution dispenser 600 penetrates the lower end of the second processing unit 320 and is connected to the second processing unit 320, A supply pipe 610 which is vertically installed to be disposed on the inner side of the discharge pipe 340;
The first processing unit 310 and the third processing unit 330 are configured to supply the processing solution supplied from the supply pipe 610 to the first processing unit 310 and the third processing unit 330 in which noxious gas is received, An injection nozzle 620 provided inside the fourth processing unit 340;
Wherein the scrubber device is a scrubber. The method according to claim 1,
The solution injector 600 includes a first nozzle 630 disposed inside the first and third processing units 310 and 330 to inject the processing solution so that the noxious gas and the processing solution are in contact with each other, And a third nozzle (650);
A second nozzle 640 and a fourth nozzle 660 which are respectively provided in the second processing unit 320 and the fourth processing unit 340 and inject the processing solution so that the noxious gas and the processing solution are in contact with each other;
And is connected to the storage tank 500 to supply the processing solution to the first nozzle 630 and the third nozzle 650 and to the second nozzle 640 and the fourth nozzle 660, A first supply pipe 670 and a second supply pipe 680;
Wherein the scrubber device is a scrubber. 6. The method of claim 5,
The first supply pipe 670 passes through the lower part of the first processing part 310 and is connected to the storage tank 500 at one side and the first processing part A first supply pipe 671 vertically installed inside the first supply pipe 671;
And a second supply pipe 672, one side of which is fastened to the other side of the first supply pipe 671 and which is vertically installed in the third processing unit 330 and is fastened to one side of the third nozzle 650, );
The second supply pipe 680 passes through the lower side of the second processing unit 320 and is connected to the storage tank 500 at one side and the second processing unit 340 at the other side toward the fourth processing unit 340 A second-1 supply pipe (681) vertically installed in the interior of the second pipe (320);
A second-2 supply pipe 682, one side of which is connected to the other side of the second-1 supply pipe 681 and is vertically installed in the fourth processing unit 340 and the fourth nozzle 660 is fastened to one side, And wherein the scrubber device comprises: 7. The method according to any one of claims 1 to 6,
Wherein the second processing unit (320) and the fourth processing unit (340) are provided so as to be stacked so as to communicate with each other depending on the kind and discharge amount of the noxious gas.

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