KR101881816B1 - 진공 처리 장치 - Google Patents
진공 처리 장치 Download PDFInfo
- Publication number
- KR101881816B1 KR101881816B1 KR1020120092554A KR20120092554A KR101881816B1 KR 101881816 B1 KR101881816 B1 KR 101881816B1 KR 1020120092554 A KR1020120092554 A KR 1020120092554A KR 20120092554 A KR20120092554 A KR 20120092554A KR 101881816 B1 KR101881816 B1 KR 101881816B1
- Authority
- KR
- South Korea
- Prior art keywords
- processing device
- vacuum processing
- vacuum
- processing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020120092554A KR101881816B1 (ko) | 2012-08-23 | 2012-08-23 | 진공 처리 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020120092554A KR101881816B1 (ko) | 2012-08-23 | 2012-08-23 | 진공 처리 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20140026852A KR20140026852A (ko) | 2014-03-06 |
KR101881816B1 true KR101881816B1 (ko) | 2018-07-25 |
Family
ID=50641224
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020120092554A KR101881816B1 (ko) | 2012-08-23 | 2012-08-23 | 진공 처리 장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR101881816B1 (ko) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20070111899A (ko) * | 2006-05-19 | 2007-11-22 | 주식회사 아이피에스 | 진공처리장치 |
KR20090124210A (ko) * | 2008-05-29 | 2009-12-03 | 주식회사 에스에프에이 | 화학 기상 증착 장치 |
KR20110117485A (ko) * | 2010-04-21 | 2011-10-27 | 주성엔지니어링(주) | 인젝터 어셈블리 및 이를 구비한 기판 처리 장치 |
-
2012
- 2012-08-23 KR KR1020120092554A patent/KR101881816B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20070111899A (ko) * | 2006-05-19 | 2007-11-22 | 주식회사 아이피에스 | 진공처리장치 |
KR20090124210A (ko) * | 2008-05-29 | 2009-12-03 | 주식회사 에스에프에이 | 화학 기상 증착 장치 |
KR20110117485A (ko) * | 2010-04-21 | 2011-10-27 | 주성엔지니어링(주) | 인젝터 어셈블리 및 이를 구비한 기판 처리 장치 |
Also Published As
Publication number | Publication date |
---|---|
KR20140026852A (ko) | 2014-03-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant |