KR101875360B1 - Turntablewith air bearing capable of reduced rolling resistance and uniform pressure distribution - Google Patents
Turntablewith air bearing capable of reduced rolling resistance and uniform pressure distribution Download PDFInfo
- Publication number
- KR101875360B1 KR101875360B1 KR1020180023721A KR20180023721A KR101875360B1 KR 101875360 B1 KR101875360 B1 KR 101875360B1 KR 1020180023721 A KR1020180023721 A KR 1020180023721A KR 20180023721 A KR20180023721 A KR 20180023721A KR 101875360 B1 KR101875360 B1 KR 101875360B1
- Authority
- KR
- South Korea
- Prior art keywords
- air
- hole
- bearing
- air supply
- housing
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
- B65G47/74—Feeding, transfer, or discharging devices of particular kinds or types
- B65G47/80—Turntables carrying articles or materials to be transferred, e.g. combined with ploughs or scrapers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2812/00—Indexing codes relating to the kind or type of conveyors
- B65G2812/14—Turntables
Abstract
Description
The present invention relates to a turntable having an air bearing capable of reducing rotational resistance and achieving a uniform pressure distribution. More specifically, the present invention relates to a turntable in which air supplied to the inside of a turntable flows, And an air bearing capable of reducing rotation resistance and achieving a uniform pressure distribution so as to prevent defective machining of the workpiece by improving the rotation accuracy of the turntable.
The rotary table is typically used for manufacturing various precision instruments, semiconductor components, and manufacturing apparatuses manufactured by rotation. The rotary table is rotated using a pulley or a chain, or rotated using air pressure or hydraulic pressure.
On the other hand, among these air bearings, since the bearing surface and the moving surface are in contact with each other through the sliding film formed of the lubricating oil, there is a slight difference depending on the type of lubricating oil. However, friction, noise, A certain degree of mechanical loss becomes inevitable.
A pneumatic bearing developed to improve the performance of the bearing by eliminating such mechanical loss is a pneumatic bearing as a representative example of the bearing.
The air bearing supports the load by lifting the slider by the air pressure formed by injecting the compressed air into the bearing gap between the guide rail and the slider, and can be divided into a rectangular shape or a T shape depending on the shape of the slider and the guide rail.
As shown in FIG. 1, the conventional turntable using an air bearing includes a
The second
In the case where a workpiece positioned on the
In addition to the above-described prior art, a rotary table using an air bearing (Japanese Patent Laid-Open No. 10-2009-0013299) is provided with a cylindrical shaft having an upper rim protruding outward, a shaft collar coupled to a lower portion of the shaft, A cover provided on an upper portion of the air bearing; a housing spaced apart from a side surface of the air bearing by a predetermined space; A base plate installed at a lower portion of the housing and coupled to form a space at a lower portion of a shaft collar coupled to the inside of the housing; and an upper portion of the air bearing is firmly coupled to the cover and the upper portion of the housing, An air inlet port through which the air hose installed at one side of the side of the side of the housing is coupled, And a silencer provided at a lower side of the rotary table.
The above-mentioned conventional technology has a problem that rotation resistance is generated between the shaft and the shaft due to the direction in which the first air is introduced into the rotating shaft in a linear direction, and the rotation accuracy is inevitably lowered.
Therefore, it is an object of the present invention to provide a thrust bearing in which air is supplied through an air inlet of a thrust bearing, air is supplied to the upper plate while moving through the first and second air supply holes, An air amplification hole extending from the air supply hole and formed to be wider than the left and right width of the second air supply hole to amplify the amount of air to be moved to form more air contact surfaces at the lower portion of the upper plate, And a plurality of rotation induction holes extending from the second air supply hole along the outer circumference of the radial bearing formed in the inner periphery of the thrust bearing, Wherein the spacer is formed so as to be inclined in the same direction as the rotation direction of the spacer formed on the inner periphery of the radial bearing, An air bearing capable of reducing the rotational resistance and enabling a uniform pressure distribution so as to improve the rotation accuracy of the upper plate by reducing the vibration with the upper plate by forming a rotation inducing groove at a position corresponding to the rotation inducing hole on the outer side of the spacer And the technical problem was solved by focusing on providing the composed turntable.
As a technical concept to achieve the above object, a
The
The thrust bearing 80 is provided with a plurality of third
According to the turntable having the air bearing capable of reducing the rotation resistance and distributing the pressure uniformly according to the present invention, it is possible to maintain the original purpose of the turntable and to supply the air in the direction in which the top plate is rotated, The rotary accuracy is improved by minimizing the amount of air supplied to the upper plate, and the amount of air supplied to the upper plate can be further amplified to provide a uniform pressure to the lower portion of the upper plate, thereby stably supporting the upper plate.
1 is a cross-sectional view showing a turntable having a conventional air bearing,
2 is a cross-sectional view showing a preferred embodiment of the present invention,
Figure 3 is a drawing illustrating rotated and non-rotating configurations of the present invention;
4 is a front sectional view showing a radial bearing, a thrust bearing, and a spacer according to the present invention,
5 is a plan view showing a preferred embodiment of aa of Fig. 4
6 is a plan sectional view showing another embodiment of aa in Fig. 5
7 is a comparative drawing showing the conventional air flow and the air flow of the present invention
Figure 8 is an operating state diagram illustrating a preferred embodiment of the present invention.
9 is a view showing a preferred embodiment of the air distribution of the present invention
Fig. 10 is a front sectional view showing another embodiment of the present invention
According to the present invention, the air supplied to the inside of the turntable flows, reducing the rotational resistance of the upper plate and providing a uniform pressure distribution, thereby improving deflection and rotation accuracy of the upper plate, The present invention provides a turntable having an air bearing capable of uniform pressure distribution.
BRIEF DESCRIPTION OF THE DRAWINGS The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate embodiments of the invention and, together with the description, serve to explain the principles of the invention.
Prior to describing the present invention, the structure will be described with reference to FIGS. 2 to 5, wherein the
3, the
As described above, the present invention is based on the organic combination of the rotating components and the non-rotating components, wherein when the
In the case of the
The
As shown in FIGS. 2, 4 and 5, the thrust bearing 80 is formed of a ceramic-based BN (boronitride) material and is configured to have high rigidity. The thrust bearing 80 is formed in a donut shape on the upper side, An
4, the air that flows through the second
7 or 9, the
In other words, the air is moved through the configuration of the
That is, the thrust bearing (80) of the present invention can provide the optimum pressure condition provided by the top plate (90).
2, 4, 5 and 6, the radial bearing 70 is made of the same ceramic-type BN (boronitride) material as the thrust bearing 80, And a
5, the air that is moved through the first
6, the first
2, 5 and 8, the
8, a
As shown in FIG. 10, the thrust bearing 80 is provided with a plurality of
At this time, the third
According to the turntable having the air bearing capable of reducing the rotation resistance and distributing the pressure uniformly according to the present invention, it is possible to maintain the intrinsic purpose of the turntable and to supply the air in the direction in which the top plate is rotated, The rotation accuracy is improved and the amount of air supplied to the upper plate can be further amplified to stably support the lower portion of the upper plate to prevent sagging and the like.
10: Base plate
20: housing 21: rotary housing 23: stationary housing
30: Lower plate
40: spacer 41: rotation guide groove
50: drive motor
60: Shaft
70: radial bearing 71: rotation induction hole
80: thrust bearing 81: air inlet 83: first air supply hole
85: second air supply hole 87: air amplification hole 89: third air supply hole
90: top plate
Claims (3)
The base plate 10, the housing 20, the radial bearing 70, and the thrust bearing 80 are formed of a ceramic material,
The thrust bearing 80 is formed in an upper portion of the thrust bearing 80 and has an air amplification hole (not shown) extending in the second air supply hole 85 and having a width wider than the width of the second air supply hole 85 87)
Wherein a rotation induction hole (71) extending from the second air supply hole (85) and inclining in the same direction as the rotation direction of the upper plate (90) is formed on a side surface of the radial bearing (70) Turntable with air bearings with reduced resistance and uniform pressure distribution.
The spacer 40 has the same orientation as the rotation inducing hole 71 of the radial bearing 70 and has a rotation inducing groove 41 at a position corresponding to the rotation inducing hole 71 And a turntable with an air bearing capable of uniform pressure distribution.
The thrust bearing 80 is provided with a plurality of third air supply holes 89 spaced apart from the outer circumference of the air amplification hole 87 and extending in a direction perpendicular to the first air supply hole 83, The air bearing being capable of reducing rotational resistance and distributing the pressure uniformly.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020180023721A KR101875360B1 (en) | 2018-02-27 | 2018-02-27 | Turntablewith air bearing capable of reduced rolling resistance and uniform pressure distribution |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020180023721A KR101875360B1 (en) | 2018-02-27 | 2018-02-27 | Turntablewith air bearing capable of reduced rolling resistance and uniform pressure distribution |
Publications (1)
Publication Number | Publication Date |
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KR101875360B1 true KR101875360B1 (en) | 2018-07-05 |
Family
ID=62920603
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020180023721A KR101875360B1 (en) | 2018-02-27 | 2018-02-27 | Turntablewith air bearing capable of reduced rolling resistance and uniform pressure distribution |
Country Status (1)
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KR (1) | KR101875360B1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022146691A1 (en) * | 2020-12-28 | 2022-07-07 | Mattson Technology, Inc. | Workpiece support for a thermal processing system |
CN117212338A (en) * | 2023-11-07 | 2023-12-12 | 无锡星微科技有限公司杭州分公司 | High-bearing precision air-floatation turntable |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002066854A (en) | 2000-08-29 | 2002-03-05 | Ntn Corp | Static pressure gas bearing spindle |
JP2009012120A (en) | 2007-07-04 | 2009-01-22 | Toshiba Mach Co Ltd | Turning table device |
JP2011208724A (en) | 2010-03-30 | 2011-10-20 | Ntn Corp | Static pressure journal bearing spindle |
-
2018
- 2018-02-27 KR KR1020180023721A patent/KR101875360B1/en active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002066854A (en) | 2000-08-29 | 2002-03-05 | Ntn Corp | Static pressure gas bearing spindle |
JP2009012120A (en) | 2007-07-04 | 2009-01-22 | Toshiba Mach Co Ltd | Turning table device |
JP2011208724A (en) | 2010-03-30 | 2011-10-20 | Ntn Corp | Static pressure journal bearing spindle |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022146691A1 (en) * | 2020-12-28 | 2022-07-07 | Mattson Technology, Inc. | Workpiece support for a thermal processing system |
CN117212338A (en) * | 2023-11-07 | 2023-12-12 | 无锡星微科技有限公司杭州分公司 | High-bearing precision air-floatation turntable |
CN117212338B (en) * | 2023-11-07 | 2024-02-06 | 无锡星微科技有限公司杭州分公司 | High-bearing precision air-floatation turntable |
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