KR101836682B1 - Nail tip and method for manufacturing the same - Google Patents

Nail tip and method for manufacturing the same Download PDF

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Publication number
KR101836682B1
KR101836682B1 KR1020160107460A KR20160107460A KR101836682B1 KR 101836682 B1 KR101836682 B1 KR 101836682B1 KR 1020160107460 A KR1020160107460 A KR 1020160107460A KR 20160107460 A KR20160107460 A KR 20160107460A KR 101836682 B1 KR101836682 B1 KR 101836682B1
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KR
South Korea
Prior art keywords
layer
pattern
coated
formed
base layer
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KR1020160107460A
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Korean (ko)
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KR20180022270A (en
Inventor
강명석
박성한
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(주)쓰리에스엠케이
주식회사 엔에스디자인
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Priority to KR1020160107460A priority Critical patent/KR101836682B1/en
Publication of KR20180022270A publication Critical patent/KR20180022270A/en
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    • AHUMAN NECESSITIES
    • A45HAND OR TRAVELLING ARTICLES
    • A45DHAIRDRESSING OR SHAVING EQUIPMENT; MANICURING OR OTHER COSMETIC TREATMENT
    • A45D31/00Artificial nails
    • AHUMAN NECESSITIES
    • A44HABERDASHERY; JEWELLERY
    • A44CJEWELLERY; BRACELETS; OTHER PERSONAL ADORNMENTS; COINS
    • A44C15/00Other forms of jewellery
    • AHUMAN NECESSITIES
    • A44HABERDASHERY; JEWELLERY
    • A44CJEWELLERY; BRACELETS; OTHER PERSONAL ADORNMENTS; COINS
    • A44C15/00Other forms of jewellery
    • A44C15/0045Jewellery specially adapted to be worn on a specific part of the body not fully provided for in groups A44C1/00 - A44C9/00
    • A44C15/0075Jewellery specially adapted to be worn on a specific part of the body not fully provided for in groups A44C1/00 - A44C9/00 on the hand or nails
    • A44C15/008Jewellery specially adapted to be worn on a specific part of the body not fully provided for in groups A44C1/00 - A44C9/00 on the hand or nails on the nails
    • AHUMAN NECESSITIES
    • A44HABERDASHERY; JEWELLERY
    • A44CJEWELLERY; BRACELETS; OTHER PERSONAL ADORNMENTS; COINS
    • A44C27/00Making jewellery or other personal adornments
    • AHUMAN NECESSITIES
    • A45HAND OR TRAVELLING ARTICLES
    • A45DHAIRDRESSING OR SHAVING EQUIPMENT; MANICURING OR OTHER COSMETIC TREATMENT
    • A45D29/00Manicuring or pedicuring implements
    • A45D29/18Manicure or pedicure sets, e.g. combinations without case, etui, or the like
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B44DECORATIVE ARTS
    • B44CPRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C3/00Processes, not specifically provided for elsewhere, for producing ornamental structures
    • B44C3/02Superimposing layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C2045/0086Runner trees, i.e. several articles connected by a runner

Abstract

A nail tip according to an embodiment of the present invention includes a nail body including a curved surface; A three-dimensional film formed so as to be three-dimensionally viewed in a pattern of concavo-convex shapes formed on the base layer and curved to cover the curved surface of the nail body; And a bonding portion for bonding the nail body and the three-dimensional film.

Description

NAIL TIP AND METHOD FOR MANUFACTURING THE SAME [0002]

The present invention relates to a method of manufacturing a nail tip and a nail tip.

Recently, interest in beauty and decoration has increased not only for women but also for men.

Among these props for beauty and decoration, the nail tip is attached to a person's nail and is a decorative item that makes the nail look more beautiful.

Nail tips are readily available in the market and are universal enough to be used by private beauty shops or individuals.

As such, nail tips have become popular, and various studies are underway on nail tips that can provide different beauty from competitors.

Patent Publication 10-2008-0076257 (Publication date: 2008.08.20)

A method of manufacturing a nail tip and a nail tip according to an embodiment of the present invention is to provide a nail tip capable of providing a three-dimensional feeling.

The task of the present application is not limited to the above-mentioned problems, and another task which is not mentioned can be clearly understood by a person skilled in the art from the following description.

According to an aspect of the present invention, there is provided a nail body including a curved surface; A three-dimensional film formed so as to be three-dimensionally viewed in a pattern of concavo-convex shapes formed on the base layer and curved to cover the curved surface of the nail body; And a bonding portion for bonding the nail body and the three-dimensional film.

According to another aspect of the present invention, there is provided a method of manufacturing a nail comprising: preparing a nail body having a curved surface; Inserting a three-dimensional film formed in a base layer so that the pattern of concavo-convex shapes is seen in three dimensions; Bending the three-dimensional film by applying heat to the metal mold; And joining the nail body and the nail body such that a fin portion of the stereoscopic film corresponds to a curved surface of the nail body.

A method of manufacturing a nail tip and a nail tip according to an embodiment of the present invention is to provide a nail tip capable of providing a three-dimensional feeling by attaching a three-dimensional film to a nail body.

The effects of the present application are not limited to the effects mentioned above, and other effects not mentioned can be clearly understood by those skilled in the art from the following description.

1A to 1D show a method of manufacturing a nail tip according to an embodiment of the present invention.
2 is a side view schematically showing a three-dimensional film.
3 is an enlarged side view of the color conversion layer shown in Fig.
FIG. 4 is a side view showing an image in which light reflected by the pattern layer of the base layer shown in FIG. 3 is guided to the both sides. FIG.
5 is a modification of Fig.
Fig. 6 is a flowchart showing a method for manufacturing the three-dimensional film of Fig.
7 is a side view schematically showing a glass master specimen produced according to the method of FIG.
8 is a side view schematically showing a three-dimensional film according to the second embodiment.
Fig. 9 is a modification of Fig.
10 is a flowchart showing a method for manufacturing the three-dimensional film of Fig.
11 is a view showing slot masks for depositing on a base layer according to the method of FIG.
12 shows a three-dimensional film of another structure.
13 shows an example of the shape of the pattern portion.
Figs. 14A to 14D show a method of manufacturing the three-dimensional film of Fig.
Fig. 15 is intended to explain a general method for producing a three-dimensional film.
Figs. 16 and 17 show modifications of the stereoscopic film of Fig. 12. Fig.
Figs. 18A to 18C show the change of the focal length according to the protective portion.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. It is to be understood, however, that the appended drawings illustrate the present invention in order to more easily explain the present invention, and the scope of the present invention is not limited thereto. You will know.

Also, the terms used in the present application are used only to describe certain embodiments and are not intended to limit the present invention. The singular expressions include plural expressions unless the context clearly dictates otherwise.

In the present application, the terms "comprises" or "having" and the like are used to specify that there is a feature, a number, a step, an operation, an element, a component or a combination thereof described in the specification, But do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, or combinations thereof.

Next, a method of manufacturing a nail tip according to an embodiment of the present invention will be described with reference to the drawings.

As shown in Fig. 1A, a nail body 11 having a curved surface is prepared. The nail body 11 may be made of resin but is not limited thereto. The nail body 11 may be made of a transparent material, a semi-transparent material, or a material difficult to transmit light. The nail body 11 may have various colors such as a chromatic or achromatic color.

A plurality of nail bodies 11 may be connected by the connecting member 10 as shown in FIG. 1A, but a nail body 11 not connected to the connecting member 10 may be prepared.

When the plurality of nail bodies 11 are connected to the connecting member 10, the user can remove the nail tip according to the embodiment of the present invention from the connecting member 10 whenever necessary.

1A is a cross-sectional view of the nail body 11, and as can be seen from the cross-sectional view, the nail body 11 can have a curved surface.

As shown in Fig. 1B, the three-dimensional film 15 formed so that the pattern of concavo-convex shapes formed on the base layer is three-dimensionally viewed is inserted into the mold section 13. [ The stereoscopic film 15 will be described later in detail with reference to the drawings.

The mold part 13 is for molding the three-dimensional film 15 to be bent and one side of the upper part of the mold part 13 can have a concave curved surface corresponding to the curved surface of the nail body 11, One side of the lower part may have a convex curved surface. At this time, the curvature of the curved surface of the mold part 13 may be the same as or different from the curvature of the nail body 11.

As shown in Fig. 1C, heat is applied to the mold section 13 to warp the three-dimensional film 15. That is, the metal mold portions 13 located on both sides of the three-dimensional film 15 move toward the three-dimensional film 15 to apply force and heat to the three-dimensional film 15. Whereby the three-dimensional film 15 is bent.

At this time, the mold section 13 can supply heat of 150 degrees or more and 250 degrees or less to the three-dimensional film 15 so that the three-dimensional film 15 can be bent. When less than 150 degrees of heat is supplied to the three-dimensional film 15, the three-dimensional film 15 may not be sufficiently bent. Also, when the heat of more than 250 degrees is supplied, the resin material constituting the three-dimensional film 15 may be melted and the shape of the three-dimensional film 15 may be deformed or broken.

The dichroic film 15 and the nail body 11 are engaged so that the bent portion of the three-dimensional film 15 corresponds to the curved surface of the nail body 11, as shown in Fig. The bonding of the three-dimensional film 15 and the nail body 11 may be performed using an adhesive 17 such as an adhesive or an adhesive sheet, but the present invention is not limited thereto.

Accordingly, the nail tip according to the embodiment of the present invention includes a nail body 11 including a curved surface, a concavo-convex pattern formed on the base layer to be seen in three dimensions, (15), and a bonding portion (17) for bonding the nail body (11) and the three - dimensional film (15).

At this time, the adhering portion 17 may be attached to the three-dimensional film 15 in advance, or separately from the three-dimensional film 15 and may be attached to the three-dimensional film 15 and the nail body 11 in the manufacturing process.

On the other hand, the three-dimensional film 15 can be bent by the curvature of the curved surface of the nail body 11. As described above, the three-dimensional film 15 can be bent by the metal mold part 13. When the degree of bending is equal to the curvature of curvature of the nail body 11, The gap between the nail body and the three-dimensional film 15 can be smoothly aligned and engaged with each other.

Next, the three-dimensional film 15 will be described in detail with reference to the drawings.

The three-dimensional film can be formed in a large number of nanostructures so that the nanostructures are separated from each other to form a fine pattern of multi-layered forms having one or more stepped layers.

Here, the nanostructure is shown in Figs. 3 and 8 in the first embodiment and the second embodiment. The first embodiment may be formed by coating a color conversion layer having a multi-coating layer on a base layer having a plurality of stepped multi-layer shapes spaced apart from each other. Here, the color conversion layer may be formed by sequentially depositing a reflective layer or a total reflection layer, a dielectric layer, a transparent layer or a semi-transparent layer, and the like.

In addition, the second embodiment can be formed by sequentially depositing a reflective layer or a total reflection layer, a multi-layered dielectric layer in the form of a step, and a transparent layer or a semi-transparent layer by vacuum deposition on the base layer. Here, each of the layers may be formed so that the width thereof may gradually decrease laterally in the heightwise direction on the side surface, or may be formed such that the planar area thereof becomes narrower.

The stereoscopic film including such a nanostructure can express the color of each layer as it is according to the viewing angle, and the colors of the respective layers may be mixed with each other, so that two or three or more colors may be mixed to represent a new color , These colors may be expressed in the same or different layers. In other words, it can express the sense of depth in addition to multi-layer, multicolor color conversion.

In addition, the dielectric layer can have a more varied color by adjusting the color at the corresponding region and / or position by making the thickness of each region different in each multilayer form or making the thickness different according to the position of neighboring multilayer forms, A variety of depths can be expressed through differences in depth. ≪ Embodiment 1 >

The stereoscopic film according to the first embodiment of the present invention includes a nanostructure 100 and a protective film layer 300 as shown in FIG.

The nanostructure 100 has a base layer 110 formed on an upper portion of the base layer 110 so as to form a plurality of substantially patterned pattern layers 120 spaced from each other and a color conversion layer 130 is coated on the base layer 110.

3, the base layer 121, the primary pattern layer 122, the secondary pattern layer 123, and the tertiary pattern layer 124 are formed on the base layer 110, And a pattern layer 120 of the pattern layer 120, and can be formed at three locations on the side surface.

Of course, the pattern layer 120 may be formed only of the first pattern layer 122 in addition to the base layer 121, and only the first and second pattern layers 122 and 123 may be formed, The higher pattern layers including the layers 122, 123 and 124 may be molded, as well as molded at one, two, or four or more sides on the side.

The spacing between the pattern layers 120 may be constant or may not be constant. The pattern layer 120 may be formed independently of each other, and may be formed in a stepped shape on one side only, or in a stepped shape on two or more sides, and may be formed into a polygonal shape including planar, circular, triangular, .

At this time, the first pattern layer 122 may have a wider surface area than the second pattern layer 123, and the second pattern layer 123 may have a wider surface area than the third pattern layer 124.

The base layer 110 may be a resin-based film. Here, the film may be formed of a material selected from the group consisting of polyethylene terephthalate (PET), polycarbonate (PC), polyvinyl chloride (PVC), thermoplastic polyurethane (TPU), polypropylene ), Or may be a transparent or hard transparent material, or may be an opaque material.

The color conversion layer 130 includes a reflective layer 131, a dielectric layer 132, and a transparent layer 133 sequentially coated on a base layer 110 having a pattern layer 120. Here, the reflective layer 131 may be replaced with some reflective layer or all reflective layer, and the transparent layer 133 may be replaced with a translucent layer.

The reflective layer 131 is coated on the base layer 110. The reflective layer 131 is formed by coating a metal material having a high reflectivity in a visible ray region such as aluminum (Al), silver (Ag), and gold (Au) by vacuum evaporation, and may have the same function as a mirror.

The reflective layer 131 may be coated uniformly over the entire area of the base layer 110, and may be coated only on the first, second, and third pattern layers 122, 123, and 124, for example. In another example, the first, second, and third pattern layers 122, 123, and 124 may be coated only on a part of the base layer 121 between the pattern layers.

Also, the reflective layer 131 is preferably made of gold that is beautiful, easy to process, does not discolor or corrode, and has a reflective effect enough to reflect up to about 98% of the incident infrared rays. Of course, the reflective layer 131 may include a metal material capable of obtaining a reflective effect in addition to aluminum, silver, and gold.

The reflective layer 131 may be formed by a retroreflective method in which fine glass beads or a minute reflective material is coated so that incident light returns in the same direction, or a glass bead or a reflective material is coated, Or may be fabricated as a smooth surface, and may be manufactured by a regular reflection method in which incident light is reflected in a predetermined direction.

At this time, a diffuse reflection method is preferable in order to express more various colors by mixing more colors. This diffuse reflection may cause the hemispherical glass beads or reflective material to be arranged and coated at random angles or the glass beads or reflective material may be coated such that the coating surface is irregularly irregular so that the incident light is reflected in an unpredictable direction .

In addition, the diffuse reflection method or the regular reflection method may divide the flat surface and reflect the light in a predetermined direction so as to be reflected in various predictable directions.

The dielectric layer 132 is coated on the reflective layer 131. This dielectric layer 132 can be uniformly formed over the entire area of the reflection layer 131. [ The dielectric layer 132 may be vacuum deposited by a silicon oxide (SiO 2) film and may be coated to a thickness of about 200 to 550 nm to obtain various color conversion effects.

The dielectric layer 132 may be formed to have various thicknesses for a part or each of the pattern layers 120 so that the heights h1 and h2 of the pattern layers 120 are different from each other such as the height h1 and the height h2 of the nanostructure 100 .

Therefore, the depth of the nanostructure 100 can be varied depending on the thickness of the dielectric layer 132 as well as various color conversion effects. In addition, the thickness of the dielectric layer 132 may vary depending on the color to be expressed, and the number of the dielectric layer 132 may also be varied as needed.

The height of at least one of the first, second, and third pattern layers 122, 123, and 124 may be different from each other to obtain the same effect as the thickness variation of the dielectric layer 132, The change of the thickness of the display panel 132 may be simultaneously set to express more various colors and depths.

The transparent layer 133 is formed on the dielectric layer 132. The transparent layer 133 may be made of a transparent material, and may be made of chromium (Cr). In addition, since the color observed from the outside can be changed according to optical properties such as transparency or refractive index, the transparent layer 133 can be appropriately selected to suit a desired color conversion effect.

Here, the transparent layer 133 may be a simple surface that is not printed, or a surface may be printed after the primer coating. In addition, a transparent print layer may be formed by primer coating instead of the transparent layer 133, or a transparent primer-coated print layer may be formed on the transparent layer 133.

As shown in FIG. 3, the nanostructure 100 thus formed is dispersed in four layers of the base layer 121 and the first, second and third pattern layers 122, 123, and 124, The reflected single color or diffracted mixed color is guided to both eyes of the observer so that a multi-color as well as a deep feeling can be realized (see FIG. 4).

If the nanostructure 100 is a soft material and adheres to the curved surface of the product, the distance between adjacent layers of the pattern layers 120 may be different from that of the flat surface, and the diffraction angle of light may be changed. As a result, for example, the three-dimensional film can be expressed by mixing three or more colors in a phenomenon in which two colors are mixed on a plane where the color diffracted in each layer is mixed, so that more various colors can be expressed.

Further, the protective film layer 300 is formed on the color conversion layer 130. The protective film layer 300 may be a transparent resin including acrylate or the like. The protective film layer 300 prevents damages that may occur during attachment of the three-dimensional film 15 to the nail body 11 and prevents the impact caused by the actual use of the nail tip with the three- , The base layer can be protected from contamination and life spots.

<Modifications>

5 shows a modified example of the nanostructure 100 shown in FIG. 3. Referring to FIG. 5, a printed layer 140 on which a unique character, pattern, symbol, etc. is printed on the pattern layer 120, And a through hole 150 formed through the reflective layer 131 and the dielectric layer 132 in a direction perpendicular to the first direction.

The printed layer 140 is printed on the pattern layer 120 by printing letters, numbers, patterns and the like of the three-dimensional film. The printed layer 140 may be coated on some or all of the areas of the primary pattern layer 122, the secondary pattern layer 123, and / or the tertiary pattern layer 124.

The print layer 140 may be printed with letters, numbers, symbols, or patterns for decorating or recognizing that the three-dimensional film is genuine. That is, the printing layer 140 printed with characters, numbers, symbols, or patterns of each of the three-dimensional films may be coated.

The printed layer 140 may be coated by a number of letters, numbers, or patterns, may be coated on the pattern layer 120 on any part of the three-dimensional film, and may be coated on one pattern layer 120, The patterned layer 120 of FIG.

The through holes 150 are processed so as to penetrate through the dielectric layer 132 and form a space while being directed upward of the print layer 140. That is, the through hole 150 can be processed so that the print layer 140 is disposed inside the reflective layer 131 and the dielectric layer 132.

The through hole 150 is used for visually confirming characters, numbers, symbols, or patterns printed on the print layer 140. The color of the reflective layer 131 and the dielectric layer 132 is used for character, The reflection layer 131 and the dielectric layer 132 may be processed to prevent a phenomenon in which a number, a symbol or a pattern may not be recognized.

The through hole 150 may further include a micro lens array layer having a convex lens function to enlarge the letter, number, symbol, or pattern of the print layer 140. Further, the through hole 150 may be further processed to penetrate the transparent layer 133. The through hole 150 may be formed through deposition or etching using a slot mask when the reflection layer 131 or the dielectric layer 132 is coated or deposited.

Hereinafter, a method for manufacturing the three-dimensional film according to the first embodiment will be described with reference to FIGS. 6 and 7. FIG.

First, a metal original plate is manufactured (S10). A photoresist, which is a photo-sensitive material, is applied to a glass plate substrate or a silicon substrate, a laser beam, an electron beam or an X-ray is two-dimensionally exposed to the photoresist, a developer is injected into the exposed photoresist, The photoresist pattern is formed by developing the photoresist pattern.

A metal plate is manufactured through a electro-forming process using a slot mask on the thus-formed photoresist pattern. Fig. 7 shows a glass master specimen of a four-layer structure for producing a metal original plate.

For example, in the case of manufacturing a four-layered metal base plate, first, a fine pattern corresponding to two layers is exposed and developed in order to form a two-layer base on a single-layer base, and hot- . At this time, the primary substrate metal mold can be manufactured in a temporary state without performing electro-plating through hot heating.

Further, in order to form the three layers, a fine pattern corresponding to three layers is exposed and developed, and hot heating is performed to fabricate a secondary substrate mold in a temporary state. In order to form the fourth layer, a fine pattern corresponding to four layers is exposed and developed, and then hot heating is performed to manufacture a third substrate mold of a permanent state.

Thereafter, it is finally possible to perform all the operations. The primary pattern layer 122 formed on the base layer 110 has a wider exposed area than the secondary pattern layer 123 and the secondary pattern layer 123 has a larger exposed area than the tertiary pattern layer 124 . In this manner, a fourth or higher order substrate mold can be produced, or a five-layer or more mold original plate can be manufactured.

Next, one or both sides of the base layer 110 of the nanostructure 100 are pressed with a metal plate to form a multi-layer fine pattern (S11). At this time, ultraviolet curing type embossing (UV embossing) can be utilized.

The base layer 110 may be formed of a material selected from the group consisting of polyethylene terephthalate (PET), polycarbonate (PC), polyvinyl chloride (PVC), thermoplastic polyurethane (TPU) PP, polypropylene).

For example, the base layer 110 may be formed of the first, second, and third pattern layers 122, 123, and 124 as shown in FIG. Of course, the pattern layer 120 of one layer or two layers or the pattern layer 120 of three or more layers can be formed.

Next, the color conversion layer 130 of the nanostructure 100 is formed by applying a special coating to the formed fine pattern of the base layer 110 to add a color conversion element by vacuum deposition (S12). The reflective layer 131, the dielectric layer 132, and the transparent layer 133 may be successively coated on the base layer 110 by vacuum deposition to form the color conversion layer 130. [

The reflective layer 131 can be formed by at least one of the above-described recursive reflection, diffuse reflection and regular reflection. For example, when a multi-layer deposition of one color is performed, a three-dimensional effect of the nanostructure 100 and a monochromatic product can be obtained. This is because the initial product of the first stage, which can obtain a result similar to the nano- . Multilayer coatings of three or more layers on such an initial product can be multi-layered, multicolor, color-changing, three-dimensional films that change color depending on direction and time.

Here, when the color conversion layer 130 is implemented using the local slot mask, it is possible to obtain different discoloration effects for each local region in the multi-layered pattern layer 120, And can be used as a double security element. In addition, the reflective layer 131 of the color conversion layer 130 may reflect light and colors in various directions through a method of reflex reflection, diffusive reflection, or regular reflection.

On the other hand, the printed layer 140 on which the characters, numbers, symbols, or patterns are printed is coated on the pattern layer 120 of the base layer 110. The printing layer 140 may be coated on the pattern layer 120 before the reflective layer is coated on the base layer 110. The printing layer 140 may be coated or adhered after the through hole 150 is processed.

When the reflection layer 131 and the dielectric layer 132 are vacuum deposited on the base layer 110, the through hole 150, which is an empty space in the upward direction of the print layer 140, is processed using a slot mask (S12- 2). The through hole 150 is processed through the reflective layer 131 and the dielectric layer 132 and can be processed through the transparent layer 133. In addition, a process of further providing a microlens array layer having a convex lens function may be added to the through hole 150 to enlarge the letter, number, symbol, or pattern of the print layer 140.

Next, a primer film for adhering to the final product is coated and printed or the adhesive portion 17 is formed (S13). Here, the bonding portion 17 may be provided on the opposite side of one surface of the base layer 110 on which the fine pattern is formed. In addition, the primer film-coated printing may replace the transparent layer 133 of the color conversion layer 130, or may be coated and printed on the transparent layer 133.

The adhesive portion 17 may be provided during the production of the three-dimensional film 15 as described above, but may be provided during the bonding of the three-dimensional film 15 and the nail body 11.

Finally, a protective film made of a highly-hardened coating is attached to the front surface for attachment to the final product (S14).

As shown in FIG. 3, the multi-layered and multicolor three-dimensional color conversion stereoscopic films manufactured through the above processes can diffuse the light reflected from the base layer 121 while dispersing an image for each of the pattern layers 120, The light reflected from the layer 122, the light reflected from the second pattern layer 123, and the light reflected from the third pattern layer 124 are reflected in a certain direction of rotation so as to be reflected by the two eyes of the observer A nano-optical three-dimensional film for realizing a three-dimensional structure can be produced. Further, a three-dimensional pattern corresponding to the depth can be realized through the ultraviolet curing type embossing of 1 degree or more.

Such a three-dimensional film 15 attached to the nail body 11 can provide a three-dimensional aesthetics of the nail tip, so that a user who uses the nail tip according to the embodiment of the present invention has aesthetic satisfaction .

&Lt; Embodiment 2 >

8, the three-dimensional film according to the second embodiment includes a nanostructure 100a, a bonding portion 17 (not shown in FIG. 8), and a protective film layer (not shown in FIG. 8) . This basic structure is the same as in the first embodiment.

However, since there is a difference in the structure and manufacturing method of the nanostructure 100a, it will be described in detail. Since the adhesive portion and the protective film layer 300 are the same as those in the first embodiment, the description thereof will be replaced with the above description.

The nanostructure 100a is formed by coating a base layer 110 with a color conversion layer 130a formed by forming a plurality of substantially step-like pattern layers.

Here, the base layer 110 has a regular flat shape with a certain thickness. The base layers 110a and 110 may be resin-based films. The film is made of polyethylene terephthalate (PET), polycarbonate (PC), polyvinyl chloride (PVC), thermoplastic polyurethane (TPU), polypropylene (PP) Or may be a hard or soft transparent material, or may be an opaque material.

The color conversion layer 130a includes the total reflection layer 134, the dielectric layers 132-1, 132-2, and 132-3, and the light transmission layer 135 sequentially coated as shown in FIG. At this time, the dielectric layers 132-1, 132-2, and 132-3 are deposited in a step-like manner through a plurality of slot masks to form a pattern layer 120a. Thus, the color conversion layer 130a can be formed into a substantially stepped shape. Further, the total reflection layer 134 may be replaced with some reflective layer or a semitransparent reflective layer.

A fully reflective mirror 134 is evenly coated over the base layer 110. The total reflection layer 134 is fabricated by coating a metal material having a high reflectance in a visible ray region such as aluminum (Al), silver (Ag) and gold (Au) by vacuum evaporation, .

The total reflection layer 134 is preferably made of gold that is beautiful, easy to process, does not discolor or corrode, and has a reflective effect enough to reflect up to about 98% of the incident infrared rays. Of course, the total reflection layer 134 may include all of metal materials capable of obtaining a reflection effect in addition to aluminum, silver and gold.

Also, the total reflection layer 134 may be formed by a retroreflective method in which fine glass beads or a minute reflective material is coated and incident light is returned in the same direction, or a glass bead or a reflective material is coated, Or may be fabricated with a smooth reflection surface and a regular reflection method in which incident light is reflected in a certain direction.

At this time, a diffuse reflection method is preferable in order to express more various colors by mixing more colors. This diffuse reflection may cause the hemispherical glass beads or reflective material to be arranged and coated at random angles or the glass beads or reflective material may be coated such that the coating surface is irregularly irregular so that the incident light is reflected in an unpredictable direction .

In addition, the diffuse reflection method or the regular reflection method may divide the flat surface and reflect the light in a predetermined direction so as to be reflected in various predictable directions.

The dielectric layers 132-1, 132-2, and 132-3 are coated on the total reflection layer 134 to form a stepwise multilayered pattern layer 120a. The dielectric layers 132-1, 132-2, and 132-3 are formed by a special masking coating technique using vacuum deposition, and a multi-layered structure having a stepped shape is formed, and the multi-layered structure can be formed at regular or non- .

The dielectric layers 132-1, 132-2, and 132-3 can be vacuum-deposited with a silicon oxide (SiO2) to form a plurality of multi-layer structures. The thickness of the dielectric layers 132-1, 132-2, and 132-3 can be adjusted to approximately 200 to 550 nm, Can be obtained.

At this time, the height of the first dielectric layer 132-1, the second dielectric layer 132-2, and the third dielectric layer 132-3 of the multi-layered pattern layer 120a may be the same or different as shown in FIG. 8 . That is, the heights of the nanostructures 100a may vary as shown in FIG. 3 of the first embodiment depending on the heights of the first, second, and third dielectric layers 132-1, 132-2, and 132-3. Of course, the multi-layered pattern layer 120a structure of the dielectric layers 132-1, 132-2, and 132-3 may be formed into one layer, two layers, or four or more layers. As a result, the reflection angle of the color changes depending on the heights of the dielectric layers 132-1, 132-2, and 132-3, and the color mixing according to the angles also changes. As a result, various colors of the nanostructure 100a The difference can be given to the depth as well as the effect.

In addition, various depths of feeling can be expressed as well as various colors depending on various thickness settings of the dielectric layers 132-1, 132-2, and 132-3. The dielectric layer 132a may be formed into a polygon including a circle, a triangle, a square, a pentagon 132-1, 132-2 and 132-3 and a hexagon on a plane, and may be formed into a polygon including 1, 2, Or more. In addition, it may be a step-like shape only on one surface, or two or more surfaces may have a step-shaped shape.

At this time, since the dielectric layers 132-1, 132-2, and 132-3 are stepwise, the first dielectric layer 132-1 may have a wider surface area than the second dielectric layer 132-2, and the second dielectric layer 132-2 may have a wider surface area than the third dielectric layer 132-3.

The light-transmitting layer 135 is formed on the dielectric layers 132-1, 132-2, and 132-3. The light-transmitting layer 135 may be made of any material that is transparent or translucent, and may be chromium (Cr) material.

In addition, the light-transmitting layer 135 may be suitably selected to suit a desired color conversion effect because the color observed from the outside may vary depending on optical characteristics such as transparency or refractive index.

Here, the light-transmitting layer 135 may be a simple surface that is not printed, or a surface may be printed after the primer coating. Alternatively, a transparent print layer may be formed by primer coating instead of the light-transmitting layer 135, or a transparent primer-coated print layer may be formed on the transparent layer 133.

<Modifications>

9 shows an example of a modification of the nanostructure 100a shown in FIG. 8. In FIG. 9, an identification print layer 140 on which a letter, number, symbol or pattern is printed on the base layer 110, Through holes 150 processed through the total reflection layer 134 and the dielectric layers 132-1, 132-2, and 132-3 in the direction of the dielectric layer 132-1, 132-2, and 132-3.

The printed layer 140 is printed on the base layer 110 by printing characters, numbers, symbols or patterns of the three-dimensional film. The print layer 140 may be coated on the entire surface of the base layer 110 or may be coated only on the lower portions of the dielectric layers 132-1, 132-2, and 132-3.

The printing layer 140 may be printed with letters, numbers, symbols, or patterns for decorating or recognizing that the three-dimensional film is genuine. That is, the printing layer 140 printed with characters, numbers, symbols, or patterns of each of the three-dimensional films may be coated.

The printed layer 140 may be coated by a number of letters, numbers, symbols, patterns, or the like, and may be coated only under the dielectric layer 132a on any part of the three-dimensional film, and one dielectric layer 132a or a plurality of May be coated underneath the dielectric layer 132a. The printed layer 140 may be coated or attached through the through hole 150 after the through hole 150 is processed.

The through hole 150 is formed so as to penetrate through the total reflection layer 134 and the dielectric layers 132-1, 132-2, and 132-3 in the upward direction of the print layer 140 to form a space. That is, the through hole 150 can be processed to pass through the total reflection layer 134 and the dielectric layers 132-1, 132-2, and 132-3 while the printed layer 140 is disposed therein.

This through hole 150 is for visually confirming characters, numbers, symbols, or patterns printed on the print layer 140 from the outside. The total reflection layer 134 and the dielectric layers 132-1, 132-2, The total reflection layer 134 and the dielectric layers 132-1, 132-2, and 132-3 may be penetrated to prevent a phenomenon in which characters, numbers, symbols, .

The through hole 150 may further include a microlens array layer having a convex lens function to enlarge the letter, number, symbol, or pattern of the print layer 140. The through-hole 150 may be formed through deposition or etching using a slot mask when coating or depositing the total reflection layer 134 and / or the dielectric layer 132a.

Hereinafter, a method for manufacturing the three-dimensional film according to the second embodiment will be described with reference to FIG. For example, it is assumed that the dielectric layers 132-1, 132-2, and 132-3 having three-layer structures are formed.

First, the total layer deposition is performed on the transparent base layer 110 to form the total reflection layer 134 (S20). The total reflection layer 134 may be a substrate on which a reflector is coated and sold.

In this case, the base layer 110 may be a resin-based film, and the film may be made of polyethylene terephthalate (PET), polycarbonate (PC), polyvinyl chloride (PVC), thermoplastic polyurethane resin Thermoplastic polyurethane (TPU), polypropylene (PP), or the like.

The total reflection layer 134 totally reflects light forward, which can serve as a simple reflective mirror that serves to emit the color-converted image to the front. Further, the total reflection layer 134 can be formed by at least one of the above-described recursive reflection, diffuse reflection and regular reflection.

A printed layer 140 on which a letter, number, symbol or pattern is printed is coated on the base layer 110 (not shown). The print layer 140 may be coated in advance at the position where the dielectric layers 132-1, 132-2, and 132-3 are to be coated before the total reflection layer 134 is coated on the base layer 110. [ The printing layer 140 may be coated or adhered after the through hole 150 is processed.

Further, when the total reflection layer 134 is vacuum-deposited, the through hole 150, which is an empty space in the upward direction of the print layer 140, is processed by utilizing a slot mask. The through hole 150 may further include a step of providing a microlens array layer having a convex lens function to enlarge the letter, number, symbol, or pattern of the print layer 140.

Next, stepped multi-layer dielectric layers 132-1, 12-2, and 132-3 are formed on the total reflection layer 134 using a slot mask (S21) so that the exposed area gradually decreases in the height direction.

For example, when the dielectric layers 132-1, 12-2, and 132-3 are formed to process the three-layer pattern layer 120a, first the slot mask of FIG. 11 is formed on the top of the total reflection layer 134 After performing the masking operation, the nano-depositing process for realizing the primary dielectric color is performed and the first dielectric layer 132-1 is formed by coating a dielectric material having a thickness of approximately 200 to 250 nm.

Next, a nano-deposition process is performed in which the second slot mask shown in FIG. 11 is placed on the substrate and masking is performed to realize a secondary dielectric color, and the added dielectric material is coated on the second dielectric layer 132 -2).

Finally, the third slot mask of FIG. 11 is masked on the substrate, a nano-deposition process is performed to realize a tertiary dielectric color, and a further dielectric layer of about 100 to 200 nm thick is coated to form a third dielectric layer 132 -3).

Masking for forming these step-like dielectric layers 132-1, 132-2, and 132-3 is performed in a normal operation mode. Of course, the first dielectric layer 132-1, the second dielectric layer 132-2, and the third dielectric layer 132-3 can be formed to have a smaller exposed area in that order.

Here, when the first dielectric layer 132-1, the second dielectric layer 132-2, and the third dielectric layer 132-3 are vacuum-deposited, each slot mask is used or a slot mask is used to form the print layer The through hole 150 is formed in the total reflection layer 134 so as to extend through the through hole 150.

Next, the entire exposed surface of the total reflection layer 134 and the dielectric layers 132-1, 132-2, and 132-3 is coated with a translucent coating to form a light transmitting layer (S22). At this time, between the dielectric layers 132a132-1, 132-2, and 132-3 are not formed, that is, between the dielectric layers 132a132-1, 132-2, and 132-3, the light- 135 may be directly coated and coated on the exposed surfaces of the dielectric layers 132a 132-1, 132-2, and 132-3.

Next, a primer film for adhering to the final product is coated and printed or the adhesive portion 17 is formed (S23). Here, the bonding portion 17 may be provided on the opposite side of one surface of the base layer 110a on which the fine pattern is formed. In addition, the primer film-coated printing may replace the light-transmitting layer 135 of the color conversion layer 130a and may be coated and printed on the light-transmitting layer 135. [

As described above, the production of the adhesive portion 17 may not be performed during the production of the three-dimensional film 15.

Finally, a protective film made of a highly-hardened coating is attached to the front surface for attachment to the final product (S24).

Meanwhile, for example, the three dielectric layers 132a132-1, 132-2, and 132-3 may be fabricated to have a pattern thickness of about 200 nm to 600 nm for the same wavelength in order to realize color.

In this case, the A region having the thickness of 200 nm of the first dielectric layer 132-1, the B region having the thickness of 300 nm of the first and second dielectric layers 132a132-1, 132-2 and 132-3, A C region having a thickness of 400 nm which is a sum of the three dielectric layers 132a132-1, 132-2 and 132-3 and a D region not coated with the dielectric layers 132a132-1, 132-2 and 132-3, .

In this case, when the stereoscopic film is moved from the vertical to the side, the color of the region in the initial color is changed to another color as shown in [Table 1] below, A color conversion effect can be obtained.

domain Front Color Colors on the side A region green Purple B region Orange State of the Union C region blue gold D region silver silver

Next, the three-dimensional film 15 different from the above-described structure will be described with reference to the drawings.

Fig. 12 shows a three-dimensional film 15 having another structure. 12 includes a base layer 1100, a lens portion 1300, a pattern portion 1500, and a reflection portion 1700. The base film 1100 includes a base film 1100, a lens portion 1300, At this time, the adhesive portion 17 can be attached to the lower portion of the reflection portion. Accordingly, the reflective portion 1700, the adhesive portion 17, and the nail body 11 may be formed in this order.

The base layer 1100 may be made of a resin capable of passing light such as PC (Polycarbonate) or PCABS (Polycarbonate Acrylonitrile Butadiene Styrene), but is not limited thereto.

The lens portion 1300 is made of the same material as the base layer 1100 on one side of the base layer 1100. The lens unit 1300 focuses the light reflected from the reflection unit 1700 and transmits the light toward the outside of the lens unit 1300. The focal length of the lens unit 1300 can be set during the design process of the three-dimensional film 15, and the focal length can be satisfied by changing the diameter, thickness, curvature, or the like of the lens unit 1300.

The pattern unit 1500 is formed of irregularities formed on the other side of the opposite side. Accordingly, the pattern unit 1500 may be formed of the same material as that of the base layer 1100. In FIG. 12, the pattern unit 1500 includes patterns of the same size and shape, but may include patterns of different sizes or shapes. For example, as shown in Fig. 13, the pattern may have a stepped shape. 13, the illustration of the lens unit 1300 and the reflection unit 1700 is omitted for convenience of explanation.

The pattern unit 1500 may reflect light incident from one side of the base layer 1100 or light reflected by the reflection unit 1700 and propagate toward one side of the base layer 1100, The shape of the pattern unit 1500 can be changed.

The reflective portion 1700 is provided on the other side of the base layer 1100 so as to be in contact with the pattern portion 1500 and reflects the light toward the lens portion 1300. The reflective portion 1700 will be described in more detail later.

As described above, light incident through one side of the base layer 1100 reaches the reflective portion 1700 through the pattern portion 1500, and the reflective portion 1700 transmits light to one side of the base layer 1100 And can reflect. In this process, the pattern unit 1500 may scatter incident or reflected light.

The lens unit 1300 can focus the reflected or scattered light according to the focal distance, so that the observer outside the three-dimensional film 15 can feel the depth feeling on the pattern visually, so that the three-dimensional feeling of the pattern can be felt.

Such a manufacturing method for manufacturing the three-dimensional film 15 can simultaneously form the lens portion 1300, the base layer 1100, and the pattern portion 1500.

A first stamp 3300 for forming the lens portion 1300 and a second stamp 3300 for forming the pattern portion 1500 are prepared as shown in FIG. The first stamp 3100 is formed with a first stamp pattern formed concavely corresponding to the shape of the lens portion 1300. The second stamp 3300 is also formed with a second stamp pattern opposite to the concavity and convexity of the pattern unit 1500 so as to correspond to the pattern unit 1500.

The first mold 3110 and the second mold 3310 may cover the outside of the first stamp 3100 and the second stamp 3300 to protect the first stamp 3100 and the second stamp 3300 . The first stamp pattern and the second stamp pattern of the first stamp 3100 and the second stamp 3300 can be formed through the microstructure manufactured through the LIGA process.

The LIGA process refers to a fine processing technique consisting of three steps: X-ray lithography, electroplating and injection molding. The first letter of the German Lithographie, Galvanoformung and Abformung It is the abbreviation quoted.

Here, photolithography using X-rays is a process of forming a fine resist structure by irradiating a resist through an X-ray mask and developing the X-ray.

Electroplating is a process of growing a metal by electroplating on a portion where a resist is removed from a manufactured fine resist structure, filling the metal with a resist, and then removing the remaining resist to form a fine metal structure.

Injection molding is a process of injecting microstructures of various shapes using a manufactured fine metal structure as a mold.

The first stamp 3100 having the first stamp pattern and the second stamp 3300 having the second stamp pattern can be manufactured by pressing the microstructure produced by the LIGA process on the object.

At this time, the first stamp 3100 and the second stamp 3300 may be made of nickel, and the nickel may realize a curved surface of the microstructure corresponding to the lens portion 1300 close to a circular shape.

As shown in FIG. 14B, a resin is injected between the first stamp 3100 and the second stamp 3300 thus implemented.

The first stamp 3100 and the second stamp 3300 are separated from each other after the cooling of the resin to form the lens portion 1300 and the pattern portion 1500 on one side and the other side of the base layer 1100, . By using the first stamp 3100 and the second stamp 3300, the base layer 1100, the lens portion 1300, and the pattern portion 1500 can be formed at the same time.

Fig. 15 is a view for explaining a general three-dimensional film. As shown in Fig. 15, a pattern layer 20 can be realized by a printing process after a lens sheet 10 with a lens is prepared. That is, in the case of a general three-dimensional film, the lens and the pattern are not simultaneously realized.

14A to 14D, the manufacturing method of the three-dimensional film 15 includes the steps of forming the lens portion 1300 and the pattern portion 1500 simultaneously through the first stamp 3100 and the second stamp 3300, The process can be simplified.

As described above, since the lens portion 1300 and the pattern portion 1500 are formed through the first stamp 3100 and the second stamp 3300, the base film 1100, the lens portion 1300 and the pattern unit 1500 may be made of the same material. On the other hand, a general three-dimensional film forms a pattern layer by printing an ink component on a lens sheet, so that the lens sheet and the pattern layer can be made of different materials.

14D, a reflective portion 1700 for reflecting light toward the lens portion 1300 is coated on the other side of the base layer 1100 so as to be in contact with the pattern portion 1500. As shown in FIG.

As described above, since the manufacturing method of the three-dimensional film 15 is made of the first stamp 3100 and the second stamp 3300 realized through the LIGA process using X-rays, the lens portion 1300 and the pattern portion The line width of the lens unit 1500 and the thickness of the lens unit 1300 can be reduced.

Since the thickness of the lens portion 1300 is reduced, the thickness of the lens portion 1300, the base layer 1100, and the pattern layer can also be reduced.

That is, as shown in FIG. 12, the line widths L1 and L2 of the lens portion 1300 or the pattern portion 1500 may be 5 nm or more and 20 占 퐉 or less. The thickness D1 of the lens portion 1300, the base layer 1100, and the pattern portion 1500 may be 30 占 퐉 or more and less than 300 占 퐉.

On the other hand, in the case of a general three-dimensional film, a printing technique is used. In the case of a printing technique, there is a limitation in reducing the line width and the thickness of the lens. Accordingly, as shown in FIG. 15, the line widths L3 and L4 of a general three- Mu m, and the thickness D2 of the three-dimensional film and the pattern layer may be 300 mu m to 400 mu m.

In the case of a general three-dimensional film as described above, since the lens thickness increases, the lens can be easily damaged by an external impact. To prevent this, a protective film 30 for protecting the lens is added in the case of a general three-dimensional film, whereby the thickness of the three-dimensional film can be further increased.

On the other hand, since the stereoscopic film 15 described above with reference to FIGS. 14A to 14D can form a fine lens portion 1300, the durability against an external impact can be higher than that of a general stereoscopic film, There may be no.

12 and 14D, the reflection portion 1700 may include a reflection layer 1710 that contacts the pattern portion 1500 so as to reflect light toward the lens portion 1300. As shown in FIG. At this time, the reflective layer 1710 may reflect a part or all of the incident light.

16, the reflection portion 1700 includes a reflection layer 1710 that reflects light toward the lens portion 1300, and a reflective layer 1710 that is positioned between the pattern portion 1500 and the reflection layer 1710, And a dielectric layer 1730 in which the color of light reflected by the reflective layer 1710 is changed.

The dielectric layer 1730 may be vacuum deposited with a silicon oxide (SiO 2 ) layer and may be coated to a thickness of about 200 to 550 nm to obtain various color conversion effects.

Further, the dielectric layer 1730 may be formed to have various thicknesses for some or each of the patterns of the pattern portion 1500.

Therefore, the depth of the dielectric layer 1730 can be varied depending on the thickness of the dielectric layer 1730 as well as various color conversion effects of the pattern. In addition, the thickness of the dielectric layer 1730 may vary depending on the color to be expressed.

On the other hand, by making the thickness of some of the patterns forming the pattern unit 1500 different from the thickness of the other parts, the same effect as the change in the thickness of the dielectric layer 1730 can be obtained.

The reflective layer 1710 shown in FIG. 12, FIG. 14D and FIG. 16 can be manufactured by coating a metal material having a high reflectivity in a visible ray region such as aluminum (Al), silver (Ag) However, it is not limited to such a material.

When the reflective layer 1710 is made of gold, the reflective layer 1710 is beautiful, easy to process, does not discolor or corrode, and can excellently reflect.

The reflective layer 1710 may be coated uniformly over the entire other side of the base layer 1100, only the pattern of the pattern unit 1500, or may be coated only between the pattern and the pattern.

The reflective layer 1710 may comprise fine glass beads or fine reflective particles and thus may be fabricated in a retroreflective fashion to allow the incident light to return in the same direction, Or may be fabricated as a diffuse reflection method in which incident light is reflected in various directions, or in a regular reflection method in which incident light is reflected in a certain direction by making a smooth surface.

In the diffusive reflection method, the hemispherical glass beads or the reflection particles are arranged at a disordered angle, or the glass beads or the reflection particles are coated so that the coating surface of the reflection layer 1710 is irregularly irregular so that the incident light is reflected in an unexpected direction It is possible.

In the above description, the stereoscopic film 15 does not have a component for protecting the lens unit 1300, but may further include a protection unit for protecting the lens unit 1300 as needed.

17, the protective portion 1900 is coated on the lens portion 1300 to protect the lens portion 1300, and the lens portion 1300 is provided at a position farther than the focal distance of the lens portion 1300 1300 to be focused.

18A to 18C, since the refractive indexes of the protective portion 1900 and the lens portion 1300 are different from each other, the refractive index of the lens portion 1300 when the protective portion 1900 is absent The light is focused at a point F3 farther than the focal distance F1 of the first lens group 1300. The focal length F1 of the lens portion 1300 can be set to be smaller than the final focal distance F3 along the protection portion 1900. [

The protection unit 1900 includes a first protection layer 1910 made of a resin and a second protection layer 1910 disposed between the first protection layer 1910 and the lens unit 1300 and made of a conductive material capable of transmitting light, Layer 1930 as shown in FIG. At this time, the second passivation layer 1930 may be made of a transparent conductive material such as ITO (Indium Tin Oxide) or SiO 2 , but is not limited thereto.

The material of the first protective layer 1910 is substantially similar to the material of the lens portion 1300 and the base layer 1100 so that the refractive index of the lens portion 1300 and the refractive index of the first protective layer 1910, The first protective layer 1910 and the lens unit 1300 can not be distinguished from each other.

The second protective layer 1930 made of a material having a refractive index different from that of the first protective layer 1910 and the lens portion 1300 is positioned between the first protective layer 1910 and the lens portion 1300, So that the focal distance F3 can be formed.

Such a protective portion 1900 may be applied to the three-dimensional film 15 of Fig.

It will be apparent to those skilled in the art that the present invention may be embodied in other specific forms without departing from the spirit or scope of the invention as defined in the appended claims. . Therefore, the above-described embodiments are to be considered as illustrative rather than restrictive, and the present invention is not limited to the above description, but may be modified within the scope of the appended claims and equivalents thereof.

The connecting member (10)
Nail Body (11)
The mold part (13)
The three-dimensional film (15)
The adhesive portion (17)

Claims (13)

  1. A nail body including a curved surface;
    A three-dimensional film formed so as to be three-dimensionally viewed in a pattern of concavo-convex shapes formed on the base layer and curved to cover the curved surface of the nail body; And
    And a bonding portion for bonding the nail body and the three-dimensional film,
    Wherein the three-dimensional film includes a multi-layered nano structure having a stepped shape so that an exposed area gradually decreases in a height direction.
  2. The method according to claim 1,
    Wherein the three-dimensional film is bent by a curvature of the curved surface.
  3. delete
  4. The method according to claim 1,
    The nanostructure may be formed,
    A color conversion layer having a reflective layer coated on the base layer, a dielectric layer coated on the reflective layer, and a transparent layer coated on the dielectric layer, wherein the base layer has a multi-layered pattern layer that is processed in a step- And a nail tip.
  5. The method according to claim 1,
    The nanostructure may be formed,
    A liquid crystal display device comprising: a base layer; a total reflection layer coated on the base layer; a plurality of dielectric layers forming a pattern layer on the total reflection layer in a height direction on at least one surface thereof; and a light transmission layer layer coated on the total reflection layer and the dielectric layer And a color conversion layer.
  6. The method according to claim 4 or 5,
    Wherein the nanostructure further comprises a printing layer and a through hole,
    Wherein at least one of letters, numbers, patterns, and symbols is printed on the base layer and coated on the base layer,
    Wherein the through hole is formed into an empty space through the dielectric layer and upwardly of the printing layer so that at least one of the letter, the number, the pattern, and the symbol can be externally recognized.
  7. The method according to claim 4 or 5,
    Further comprising a protective film layer coated on the color conversion layer (130, 130a).
  8. The method according to claim 1,
    The three-
    A lens part made of the same material as the base layer on one side of the base layer, a pattern part made of irregularities formed on the other side of the opposite side of the base part, and a lens part provided on the other side of the base layer to contact the pattern part, Wherein the nail tip comprises a reflective portion that is reflective towards the nail tip.
  9. 9. The method of claim 8,
    The reflector includes:
    And a reflective layer contacting the pattern portion to reflect light toward the lens portion.
  10. 9. The method of claim 8,
    The reflector includes:
    A reflective layer for reflecting light toward the lens portion; and a dielectric layer positioned between the pattern portion and the reflective layer to change color of light reflected by the reflective layer according to the thickness.
  11. 9. The method of claim 8,
    Further comprising a protection unit that is coated on the lens unit to protect the lens unit and focuses light passing through the lens unit at a position farther than the focal length of the lens unit.
  12. 12. The method of claim 11,
    The protection unit includes:
    And a second protective layer disposed between the first protective layer and the lens portion and made of a conductive material capable of transmitting light.
  13. Preparing a nail body having a curved surface;
    Inserting a three-dimensional film including a multi-layered multi-layered nanostructure into a mold so that an exposed area gradually decreases in a height direction so that a concavo-convex pattern formed on the base layer is viewed in three dimensions;
    Bending the three-dimensional film by applying heat to the metal mold; And
    And combining the stereoscopic film and the nail body such that a fin portion of the stereoscopic film corresponds to a curved surface of the nail body.
KR1020160107460A 2016-08-24 2016-08-24 Nail tip and method for manufacturing the same KR101836682B1 (en)

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PCT/KR2017/009193 WO2018038522A1 (en) 2016-08-24 2017-08-23 Nail tip and method for producing nail tip

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR200338786Y1 (en) * 2003-09-04 2004-01-24 조점섭 artificial nail equipped thin plate
KR101207315B1 (en) * 2011-07-11 2012-12-03 장성용 Manufacturing method of artificial nail with 3-dimension ornament

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100765334B1 (en) * 2006-09-19 2007-10-09 장성용 Manufacturing method for artificial nails
KR20090062607A (en) * 2007-12-13 2009-06-17 제이씨아이 씨오., 엘티디 Artificial nail
KR102040897B1 (en) * 2012-05-31 2019-11-06 (주)아모레퍼시픽 Apparatus, System and Method for Nail Art using Magnetism

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR200338786Y1 (en) * 2003-09-04 2004-01-24 조점섭 artificial nail equipped thin plate
KR101207315B1 (en) * 2011-07-11 2012-12-03 장성용 Manufacturing method of artificial nail with 3-dimension ornament

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