KR101827726B1 - Multiple and diffracting grating choice type phase contrast x­ray imaging system - Google Patents

Abstract

An absorption image which can not be detected as an X-ray diffraction grating G in the process of conveying a subject P is acquired in advance by the linear detector 40 and then a plate-like detector 50 using an X-ray diffraction grating G Ray beam generator 30 is designed to acquire an X-ray diffraction image in a post-acquisition manner, and the energy level of the X-ray beam of the X-ray generator 30 is varied according to the condition of the subject P while allowing the subject P to be more precisely and accurately grasped Ray diffraction grating (G), and a plurality of kinds of X-ray diffraction gratings (G) are formed so that X-ray diffraction images of the subject (P) can be obtained much more actively.

Description

[0001] MULTIPLE AND DIFFRACTING GRATING CHOICE TYPE PHASE CONTRAST XRAY IMAGING SYSTEM [0002]

More particularly, the present invention relates to an X-ray diffraction grating selective phase-contrast X-ray imaging apparatus, and more particularly, to an X-ray diffraction grating It is possible to acquire an X-ray diffraction image as a flat plate detector, thereby obtaining a more precise and accurate image of the object. However, the X-ray diffraction grating can be classified into a plurality of types according to the condition of the X- Dimensional x-ray diffraction images of a subject in a far more active manner.

In general, industrial X-ray imaging devices are mainly composed of linear detectors and flat panel detectors.

The technology of the domestic X-ray-based imaging device has been actively studied since the early 1990's, and it is starting to be expanded from the medical research and development to the industrial search system which takes the X-ray applied to the human body and the industrial non-destructive inspection There is a limit to the morphological information of morphology using X-ray transmission image according to the density of the object (object) to be searched. An example of the technology of such an X-ray-based imaging device is a linear detector, and a specific example thereof is mentioned in the prior art document.

1 is a view for explaining a phenomenon that occurs when the X-ray mentioned in the prior art document (Korean Patent Laid-Open Publication No. 2014-0145682) is transmitted through a target object.

As shown in FIG. 1, when an X-ray having both particle and wave characteristics is grasped as an electromagnetic wave, the X-ray passes through the object (subject) and the amplitude decreases and a phase shift (delta) occurs. The decrease in the amplitude of the x-ray is because the x-ray is absorbed (β) by the material constituting the object, and this is called the attenuation of the x-ray.

2 is a view for explaining a process of acquiring an x-ray image using the attenuation characteristics of the x-rays mentioned in the prior art document.

The attenuation characteristic of the X-ray, that is, the degree of absorption of the X-ray differs for each substance constituting the object. In the prior art document, an image using an attenuation characteristic of an x-ray is defined as an absorption image. 2, an X-ray is generated from the X-ray source 1 to irradiate the X-ray to the object ob and the X-rays transmitted through the object ob are transmitted to the X-ray detector 2, . Since the intensity of the detected X-ray includes the attenuation information of the X-ray, the absorbed image of the object (ob) can be generated by using the intensity.

The reason why the X-ray passes through the object and its phase is shifted is that the X-ray is refracted and interfered by the material constituting the object. The sensitivity ratio (? /?), Which is the ratio of the two coefficients, is shown in FIG. 3, where an index representing the attenuation characteristic of the X-ray is? And an index representing the phase shift characteristic is?.

3 is a graph showing sensitivity of the attenuation characteristic and phase shift characteristic of the X-ray mentioned in the prior art document.

Referring to FIG. 3, although the sensitivity ratio varies depending on the energy of the X-ray and the material constituting the object, it can be seen that the phase shift characteristic is sensitive up to several thousand times as much as the attenuation characteristic.

FIG. 4A is a diagrammatic representation of the internal constituent material of the breast mentioned in the prior art document, and FIG. 4B is a graph showing the attenuation coefficient for the internal constituent material of the breast mentioned in the prior art document.

4A, the tissue of the breast 10 includes a fibrous tissue 11 surrounding the periphery of the breast to maintain its shape, an adipose tissue 12 distributed throughout the breast, a mammary gland tissue 13, And a duct structure (14), which is a moving passage of the breast milk. The tissue related to the production and supply of breast milk, such as the mammary gland tissue 13 and the ductal tissue 14, is called a fibrolandular tissue of the breast, and as shown in FIG. 4b, And the damping coefficient (μ) of the x-ray are similar.

In addition, since the breast is made of soft tissues only, there is little difference in the X-ray attenuation characteristics between the internal constituent materials as shown in FIG. 4B. Therefore, it can be seen that it is difficult to obtain accurate information on the internal constituent material of the breast only by the absorbed image.

On the other hand, the 1970's X-ray phase image, which was the basis of the first phase-contrast imaging technique, was measured using a monocrystalline silicon interferometer), and these measurements were limited to large facilities such as synchrotron facilities, It has been used in basic physics research and it is possible to measure the phase transition of X-ray very precisely, but there is a limitation that information about phase can not be obtained in the form of image.

In the 2000s, research has been reported that phase images can be obtained from a laboratory-scale crew, and this research can be implemented on a simple pinhole scale using Laplace information of phase using spatial coherence. However, The time is very long and it takes a long time to restore the phase.

For example, in FIG. 3, since the phase shift characteristic of the X-ray appears to be several tens to several thousands times more sensitive than the attenuation characteristic, a subject having a small attenuation characteristic difference such as a breast is less likely to have a phase shift characteristic To obtain clearer, more sensitive x-ray images.

The technique of imaging the inside of the object is called a phase contrast imaging technique using the fact that the phase shift characteristics of the X-rays are different for each substance constituting the object, and the image generated through the phase difference imaging technique is called a phase difference image contrast image.

Examples of the method of generating the phase difference image include interferometry, grating interferometry, diffraction-enhanced imaging, and in-line phase contrast imaging. The double in-line phase difference imaging method or the spatial advancement phase difference imaging method can be implemented in a configuration similar to a general X-ray imaging apparatus without requiring a separate optical part such as a diffraction grating or a reflection plate. For example, It is understood that the phase difference image is obtained by applying the in-line phase difference imaging method through the X-ray imaging apparatus according to the present invention.

5 is a view for explaining a process of acquiring the phase difference image mentioned in the prior art document.

5, the X-ray detector 2, that is, the flat plate detector is positioned at a distance R2 from the object ob, and the object ob is irradiated by the X-ray source 1, RTI ID = 0.0 > R1. ≪ / RTI > When the X-ray is irradiated to the object ob in the X-ray source 1, the irradiated X-rays are detected by the X-ray detector 2 spaced by R2 from the object ob after passing through the object ob. Here, R1 and R2 can be determined according to the characteristics of the object (ob) and the X-ray imaging conditions.

The space between the object ob and the x-ray detector 2 is referred to as a free space and while the x-ray transmitted through the object ob is propagated in the free space, the phase shift of the x- The intensity of the X-ray detected by the X- That is, when the object ob and the X-ray detector 2 are spaced apart by a certain distance R2 and free space exists between them, information on the phase shift of the X-ray generated while transmitting the object ob, Of the population.

FIG. 6A is a schematic diagram showing an X-ray phase difference imaging apparatus using a Talbot-Lau interferometer, FIG. 6B is a schematic diagram showing an X-ray diffraction grating applied to an X-ray phase difference imaging apparatus using a Talbot- , And an analysis grid).

In recent years, studies on X-ray phase studies using a Talbot-Lau interferometer have been actively carried out in recent years, and as shown in FIG. 6, not only information on the phase of the object using the Talbot-Lau interferometer but also the visibility (Dark Field) images. This method not only reduces the phase contrast ratio of high sensitivity but also acquires image information about the microstructure of the material. The measurement time is not much different from the general non-destructive image acquisition time, and thus it is possible to use it industrially.

In recent years, with the development of the domestic and overseas industry, there has been a growing interest in industrial inspection equipment due to the demand for verification of the precision of high-density parts.

The demand for a new concept of X-ray continuous X-ray inspection apparatus which can distinguish the foreign matter and the degree of corruption which can not be distinguished by the conventional inspection equipment by applying the high resolution X-ray diffraction grating to the image of the search object is increasing in the whole industry. In other words, it can be used as an alternative in the industry to prove the integrity of products manufactured according to the demand of the consumer.

Nevertheless, so far, there has been a limitation in verifying the integrity of a product by rely only on x-ray imaging devices which depend on each of X-ray transmission image (absorption image), phase contrast image and visual field .

Meanwhile, the conventional phase-contrast X-ray imaging apparatus is composed of one X-ray source and a single-nano structure silicon (Si) X-ray diffraction grating and detection system.

The X-ray source used in the conventional phase-contrast X-ray imaging apparatus is limited to a maximum of 100 kV at several tens kV due to the difficulty of manufacturing a nano-structured silicon (Si) X-ray diffraction grating. .

The silicon (Si) x-ray diffraction grating of FIG. 6 (b) shows the calculated effective energy of the incident x-ray source and the calculated effective energy of the x- Si) wafer. ≪ / RTI >

With this effective energy, the nano-structured silicon (Si) x-ray diffraction grating is fabricated in the phase-contrast X-ray imaging device design process.

This is because the phase-contrast X-ray imaging device once manufactured has a limitation that only the energy of a single X-ray source must be used.

The limit of the acceleration voltage of 100kV used in the conventional technique is insufficient to obtain the transmitted image of the industrial part. The image acquisition of the industrial part is currently obtaining the non-destructive image using several MeV at a few hundred kV. to be.

In summary, the conventional phase-contrast X-ray imaging system consists of a single X-ray source (up to 100kV) and a single-nano-structured silicon (Si) X-ray diffraction grating and single plate detector, There is a problem in that the X-ray source having the same effective energy must always be used even if the thickness is large and the energy required is low and the thickness of the object to be searched is small, low energy is required).

Therefore, in order to use an x-ray source having other effective energy, a separate nano-structured silicon (Si) x-ray diffraction grating according to the corresponding effective energy must be mounted.

In general, linear detectors have characteristics of large-scale low-speed, flat-plate detectors have small-scale high-speed characteristics, but they are not able to flexibly respond to all the characteristics desired by users.

On the other hand, the content of the X-ray diffraction grating is disclosed in Korean Patent No. 1292918 (image measuring instrument for a grating interferometer), Japanese Laid-Open Patent Application No. 2013-122487 (metal grid manufacturing method, metal grid and X- Korean Patent No. 1272902 (X-ray phase difference imaging apparatus), Korean Patent No. 1378757 (radiation element imaging apparatus capable of obtaining material element information and image level) and Korean Patent No. 1369368 (metal embedding with high aspect ratio penetration structure) Method) and the like, so that a detailed description thereof will be omitted.

Korean Patent Publication No. 2014-0145682 (x-ray imaging apparatus and control method thereof) Korean Patent No. 1292918 (image measuring instrument for a grating interferometer) Japanese Laid-Open Patent Publication No. 2013-122487 (a method for manufacturing a metal grid, a metal grid and an X-ray imaging device) Korean Patent No. 1272902 (X-ray phase difference imaging apparatus) Korean Patent No. 1378757 (radiation image acquisition device capable of acquiring material element information and selecting an image level) Korean Patent No. 1369368 (method of embedding metal with high aspect ratio through structure)

An object of the present invention is to first acquire an absorptive image which can not be detected as an x-ray diffraction grating in the course of moving a subject by a linear detector and then obtain an x-ray diffraction image as a flat plate detector using an x- Ray diffraction gratings can be obtained more precisely, and the x-ray diffraction images of the subject can be obtained much more actively by configuring a plurality of types of x-ray diffraction gratings according to the case that the energy level of the x-ray beam of the x- And an X-ray diffraction grating-selective phase-contrast X-ray imaging apparatus.

An object of the present invention is to provide a method and apparatus for transferring a single X-ray generator (X-ray source) to a second beamline for obtaining a phase difference image (flat panel detector) It is possible to acquire the x-ray diffraction image in the permeability environment smoothly, and it is possible to make the phase difference image and the visibility image by x-ray diffraction and scattering by combining the x-ray diffraction grating image processing technology so that the object can be judged more actively and precisely And an X-ray diffraction grating-selective phase-contrast X-ray imaging apparatus.

It is an object of the present invention to provide a G0 tray, a G1 tray, and a G2 tray, in which the energy of the x-ray beam of the x-ray generator corresponding to the additional condition of the subject X-ray diffraction grating, and further can include a spare energy X-ray diffraction grating region so as to be additionally combined with the X-ray diffraction grating.

It is an object of the present invention to provide a method and system for multiple and more precise adjustment of the x-ray source, allowing the x-ray generator to reciprocate back and forth along the upper plate in accordance with the first beamline and the second beamline, And an X-ray diffraction grating-selective phase-contrast X-ray imaging apparatus.

The object of the present invention is to provide a high-aspect-ratio grating fabrication technology of the world's highest level for acquiring advanced image by combining x-ray transmission image acquisition technology, micro-lattice manufacturing technology for x-ray imaging employing nano-based semiconductor processing technology and new nano- , It is possible to substitute the radiation imaging technology currently used in industry and medical care. Even if it is limited by the limitation of the manufacturing technology of silicon (Si) X-ray diffraction grating of the present nano structure, Ray diffraction grating selection type phase-contrast X-ray imaging apparatus capable of performing nondestructive inspection using an X-ray even in a high penetration power environment of 160 kV or more as required.

According to an aspect of the present invention,

Ray shielding enclosure having a base, a side supporter and an upper plate, a transfer line for transferring a subject from one side of the x-ray shielding housing to the other side, and an x-ray generator mounted on the upper plate for scanning the x- An X-ray diffraction grating-selective phase-contrast X-ray imaging apparatus,

Wherein the X-ray generator reciprocates back and forth along the upper plate in accordance with the first beam line and the second beam line of the object to be conveyed through the transfer line,

Ray detector, and when the subject is transferred through the conveyance line and coincided with the first beamline of the X-ray generator, the absorbed image is acquired in advance through the linear detector,

Ray diffraction image through a plate-type detector using an x-ray diffraction grating when the subject is transferred through the transfer line and coincided with a second beamline of the x-ray generator,

Wherein the x-ray diffraction grating comprises a source grating, a phase grating, and an analysis grating that are assembled along the side supporter in alignment with a second beam line of the x-

The source grating, the phase grating, and the analysis grating are each composed of a low energy X-ray diffraction grating, a medium energy X-ray diffraction grating, and a high energy X-ray diffraction grating so as to be in agreement with the energy magnitudes of the X- And it is a basic characteristic of the technical structure.

In the present invention, an absorption image that can not be detected as an x-ray diffraction grating in the course of moving a subject is first acquired by a linear detector, and then a x-ray diffraction image is acquired as a flat plate type detector using an x-ray diffraction grating, Ray diffraction gratings according to the condition of the object and the x-ray beam energy of the x-ray beam generator is varied according to the condition of the subject, thereby obtaining the x-ray diffraction image of the subject much more actively have.

The present invention acquires a transmission X-ray image (absorption image) through a high-power X-ray beam and a linear detector and acquires an X-ray diffraction image with a flat plate detector using an X-ray diffraction grating to obtain a structure defect It is possible to accurately grasp even if it is.

The present invention relates to a process for transferring a single X-ray generator (X-ray source) to a second beam line for acquiring a phase difference image (flat panel detector) of a subject in a single apparatus, a high penetration environment of 100 kV, 120 kv and 160 kV The X-ray diffraction grating image processing technology enables to acquire the X-ray diffraction image smoothly, and enables the phase difference image and the visible image by the X-ray diffraction and scattering, so that the object can be judged more actively and precisely and accurately have.

The present invention is directed to the G0 tray, the G1 tray, and the G2 tray, respectively, in consideration of the energy of the X-ray beam of the X-ray generator corresponding to the additional condition of the subject, It is possible to further include the spare energy X-ray diffraction grating region so as to further conform to the present invention, thereby enabling further placement of the X-ray diffraction grating due to future development.

The present invention has an effect that the X-ray generator can be adjusted much more precisely by allowing the object to reciprocate back and forth along the upper plate in accordance with the first beam line and the second beam line of the object to be transported through the transfer line.

The present invention proposes a technology of producing the highest level of high aspect ratio lattice of the world for the acquisition of advanced image by combining x-ray transmission image acquisition technology and micro-lattice manufacturing technology for x-ray imaging using nano-based semiconductor processing technology and new nano structure manufacturing technology (Si) X-ray diffraction grating manufacturing technology of the present nano structure, it is possible to apply the radiation imaging technology of 160 kV It is possible to perform nondestructive inspection using an X-ray of a subject even in a high penetration environment.

The present invention can be applied to applications of industrial precision nondestructive inspection system, alternative application of security inspection system, application to biomedical field, application of inline food inspection system.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a view for explaining a phenomenon occurring when X-rays mentioned in the prior art document (Korean Patent Laid-Open No. 2014-0145682) are transmitted through a target object.
FIG. 2 is a diagram for explaining a process of acquiring an X-ray image using the attenuation characteristics of an X-ray mentioned in the prior art document. FIG.
FIG. 3 is a graph showing the sensitivity of the attenuation characteristic and the phase shift characteristic of the X-ray mentioned in the prior art document.
Figure 4a is a schematic representation of the internal components of the breast mentioned in the prior art.
Figure 4b is a graph depicting attenuation coefficients for internal components of the breast mentioned in the prior art.
5 is a diagram for explaining a process of acquiring a phase difference image mentioned in the prior art document.
6 (a) is a schematic diagram showing an X-ray phase difference imaging apparatus using a Talbot-Lau interferometer.
FIG. 6 (b) is a sectional view showing an X-ray diffraction grating (source grating, phase grating, and analytical grating) applied to an X-ray phase difference imaging apparatus using a Talbot-Lau interferometer.
7A to 7D are virtual diagrams showing an operation process of the multiple X-ray imaging apparatus according to the present invention.
FIGS. 8A and 8B are a perspective view and a front view showing a multiple and an X-ray diffraction grating-selective phase-contrast X-ray imaging apparatus according to the present invention;
FIG. 8C is a partially enlarged view of an analysis grating and a flat panel detector applied to multiple and X-ray diffraction grating-selective phase-contrast X-ray imaging apparatus according to the present invention, viewed from the side direction.
FIG. 8D is a partial enlarged view of a source grating and an X-ray generator applied to multiple and X-ray diffraction grating-selective phase-contrast X-ray imaging apparatus according to the present invention.
8E is a partially enlarged view showing a phase grating and a transfer line applied to multiple and X-ray diffraction grating selection type phase-contrast X-ray imaging apparatus according to the present invention.
FIG. 8F is a partially enlarged view showing an analyzing grating and a flat plate detector applied to multiple and X-ray diffraction grating selective phase-contrast X-ray imaging apparatus according to the present invention. FIG.

A plurality of X-ray diffraction grating selection type phase-contrast X-ray imaging apparatuses according to the present invention will be described with reference to the accompanying drawings. And advantages of the invention.

7A to 7D are hypothetical views illustrating an operation process of the multiple X-ray diffraction grating selection type phase-contrast X-ray imaging apparatus according to the present invention.

7A to 7D, the multiple and X-ray diffraction grating-selective phase-contrast X-ray imaging apparatus according to the present invention is a system in which an absorption image which can not be detected as an X-ray diffraction grating G in the process of transferring a subject P is detected by a linear detector 40, and is then designed to acquire an X-ray diffraction image as a planar detector 50 utilizing an X-ray diffraction grating G, so that the subject P can be grasped more precisely and precisely .

That is, the multiple X-ray diffraction grating selection type phase-contrast X-ray imaging apparatus according to the present invention is configured such that the high-transmittance X-ray beam of the X-ray generator 30, which is the limit of the silicon (Si) X-ray diffraction grating G, In order to solve the problem that is limited by the limitation of the manufacturing technology of the silicon (Si) X-ray diffraction grating (G) of the present nano structure, the disadvantage that is not used, that is, The X-ray diffraction image is acquired by the plate-like detector 50 using the X-ray diffraction grating G again after obtaining the transmission X-ray image (absorption image) through the high-power X-ray beam and the linear detector 40, Thereby making it possible to more precisely and accurately grasp a structural defect or internal confirmation of the subject P.

In addition, the conventional phase-contrast X-ray imaging apparatus overcomes the disadvantage that it is composed of one X-ray source (maximum 100 kV or less), a single-nano-structured silicon (Si) X-ray diffraction grating G and a single plate- The multiple and X-ray diffraction grating-selective phase-contrast X-ray imaging apparatus according to the present invention is designed such that the type of the X-ray diffraction grating G is adjusted according to the condition of the subject P when the energy level of the X- It is proposed to obtain an X-ray diffraction image of a subject P much more actively.

In other words, when a nano-structured silicon (Si) x-ray diffraction grating (G) capable of being applied to higher effective energy is fabricated due to the development of future x-ray diffraction grating (G) manufacturing technology, So that the phase difference image can be obtained immediately by selecting and changing the grating G for each type.

8A and 8B are a perspective view and a front view showing the multiple and X-ray diffraction grating selection type phase-contrast X-ray imaging apparatus according to the present invention, and FIG. 8C is a perspective view and a front view showing an X- And FIG. 8D is a partially enlarged view showing the source grating G0 and the X-ray generator 30 applied to the multiple and X-ray diffraction grating selective phase-contrast X-ray imaging apparatus according to the present invention. 8E is a partially enlarged view showing a phase grating G1 and a transfer line 20 applied to the multiple and X-ray diffraction grating selection type phase-contrast X-ray imaging apparatus according to the present invention, and FIG. 8F is a partial enlarged view showing a multiple X- FIG. 5 is a partial enlarged view showing an analysis grating G2 and a flat plate detector 50 applied to a grating-selectable phase-contrast X-ray imaging apparatus. FIG.

More specifically, the multiple X-ray imaging apparatus according to the present invention includes an x-ray shielding housing 10 having a base 11, a side supporter 12 and an upper plate 13 as shown in Figs. 7A to 8F, A transfer line 20 for transferring the subject P from one side of the X-ray shielding housing 10 to the other side and an X-ray generator 30 mounted on the upper plate 13 for scanning the X-ray beam downward.

At this time, the X-ray generator 30 moves forward and backward along the upper plate 13 in accordance with the first beam line 31 and the second beam line 32 of the point where the subject P is conveyed through the conveying line 20 And when the subject P is conveyed through the conveying line 20 and coincides with the first beam line 31 of the X-ray generator 30, the absorbing image is acquired in advance through the linear detector 40, Ray diffraction image is transmitted through the plate-like detector 50 using the x-ray diffraction grating G when the subject P is conveyed through the first beam line 20 and coincides with the second beam line 32 of the x- It is designed to acquire.

A first beamline 31 for the linear detector 40 along with a single x-ray generator 30 (x-ray source 30) and a second beamline 32 for the flat plate detector 50, i.e. two beamlines, Absorbed by the linear detector 40 in the high penetration environment of 160 kV or higher required for the industrial process in the process of transferring the object P to the second beam line 32 for obtaining the phase difference image (flat plate detector 50) Ray diffraction grating G and the flat plate type detector 50 through a 120 kV or higher level x-ray generator (x-ray source 30), an x-ray diffraction grating G and a flat plate detector 50, The phase difference image or the visibility image due to x-ray diffraction and scattering can be obtained by grafting, and the object P is judged more accurately.

In addition, the X-ray generator 30 forms a second beamline 32 as a downward scan of the x-ray beam at the point at which the object P is transported through the transfer line 20, Ray diffraction image is acquired through the plate-type detector 50 using the X-ray diffraction grating G when the X-ray diffraction grating G is transferred to the second beam line 32 of the X-ray generator 30, 6, the grating G is disposed along the side supporter 12 in alignment with the second beam line 32 of the X-ray generator 30 as applied to the X-ray phase difference imaging apparatus using the Talbot-Lau interferometer, as shown in FIG. A source grating G0, a phase grating G1 and an analyzer grating G2 which are assembled together and the source grating G0, the phase grating G1 and the analysis grating G2, Ray beam of the X-ray generator 30 corresponding to the condition of the subject P Energy X-ray diffraction grating (Ga), medium energy x-ray diffraction grating (Gb), and high energy x-ray diffraction grating (Gc).

The source grating G0, the phase grating G1 and the analysis grating G2 are assembled to the G0 tray 61, the G1 tray 62 and the G2 tray 63 respectively fixed to the side supporter 12, The source grating G0, the phase grating G1 and the analysis grating G2 are matched to the second beamline 32 which corresponds to the energy level of the x-ray beam of the x-ray generator 30 corresponding to the condition of the subject P Backward movement along the G0 tray 61, the G1 tray 62 and the G2 tray 63 by the LM Guide (Linear Motion Guide) to ensure quick and precise movement.

A high transmittance environment of 100 kV class, 120 kv class and 160 kV class or higher required for the industrial process in the process of transferring the single beam from the single X-ray generator (X-ray source) 30 to one equipment to the second beam line 32 for acquiring the phase difference image of the object (P) It is possible to acquire the X-ray diffraction image flexibly and to realize phase difference image and visibility image by X-ray diffraction and scattering by combining X-ray diffraction grating (G) image processing technology, It is to judge.

For example, when the subject P is an electronic component such as a PCB, a 100 kV class X-ray beam is irradiated from the X-ray generator 30 and a corresponding low-energy x-ray diffraction grating Ga, for example, The grating Ga is made to coincide with the second beam line 32 and the 120 kV class X-ray beam is irradiated from the x-ray generator 30 when the subject P is the food tuna can, and the corresponding middle energy x-ray diffraction grating Gb ), For example, the 120 kV class energy X-ray diffraction grating Gb is made to coincide with the second beam line 32, and when the object P is an automobile engine cylinder and a piston, which are electronic parts, Ray generator 30 so that the high-energy X-ray diffraction grating Gc corresponding to the high-energy X-ray diffraction grating Gc, for example, the high-energy X-ray diffraction grating Gc of 160 kV is made to coincide with the second beamline 32, And flat- Group 50 also to as an active type arrangement of the x-ray diffraction grid (G) to obtain the X-ray diffraction image, to Cain more flexible and accurate speed precisely identify the object (P).

At this time, the X-ray generator 30 generates an X-ray beam by the LM Guide (Linear Motion Guide) L in accordance with the first beam line 31 and the second beam line 32 of the point where the subject P is transported through the transfer line 20 So that it can be reciprocated back and forth along the upper plate 13 to ensure quick and precise movement.

The linear detector 40 is installed on the base 11 in alignment with the first beam line 31 of the x-ray generator 30 and the x-ray diffraction grating G is arranged on the second beam line 32 of the x- A phase grating G1 and an analysis grating G2 which are assembled along the side supporter 12 and the plate type detector 50 is constituted by a side supporter 12 under the analysis grating G2, ).

The multiple X-ray imaging apparatus according to the present invention having such a structure can be used for the acquisition of advanced images by combining X-ray transmission image acquisition technology, micro-grid fabrication technology for X-ray imaging employing nano-based semiconductor processing technology and new nano- It is possible to substitute the radiation imaging technology currently used in industry / medical care through the proposal of the world's highest level of aspect ratio lattice manufacturing technology and it is possible to apply the present nano-structured silicon (Si) X-ray diffraction grating (G) It is possible to perform the nondestructive inspection using the X-ray of the object P even in the high permeability environment of 160 kV or more, which is required for the conventional industrial use, and it can be applied to the following areas as well.

○ Application of industrial precision nondestructive inspection system

At present, in many industrial fields, radiation inspection devices can be used to enhance the quality of products. In the present technology for evaluating articles with images obtained by absorption ratio, X-ray imaging technology using phase difference is applied to acquire more image information Thereby enabling more precise and effective inspection.

Industrial and new product development applications can be extended to Li battery non-destructive testing, non-destructive testing of semiconductors and sensor components, non-destructive testing of three-dimensional microstructures, and micro-structure 3D image measuring devices for research.

○ Alternative application of security check system

Generally, airports obtain absorption images through an X-ray, but there are limitations in that it is difficult to distinguish substances having a minute size or substances having a low X-ray absorption coefficient. However, when the present invention is applied, Increased sensitivity to substances makes it possible to distinguish substances such as explosives and food inspections, which can lead to an increase in security technology.

○ Application to biomedical field

In general medical X-ray equipment images, relatively high bone images can be distinguished comparatively easily compared with organs with different densities, but there is a limit to the difficulty of distinguishing organs in the human body having similar atomic numbers and densities. However, when the present invention is applied, a highly sensitive image can be obtained as compared with an absorbed image, so that the diagnosis of a lesion of a patient can be made much smoother.

○ Application of inline food inspection system

Currently, food inspections use direct image samples or images using X-ray absorpti ons. However, it takes a long time to inspect samples directly and absorbed images using X-rays are not easily distinguishable have. However, when the present invention is applied, there is an advantage that the structure of the substance which can not be seen in the conventional absorption image can be clearly seen, and thus the internal state of the substance can be accurately and accurately confirmed without sample inspection.

According to the data released by the Korea Food and Drug Administration, overseas food imports are growing by 20% annually. In 2012, Korea's total food imports amounted to $ 14370 million and 13757 thousand tons in 129 countries including China, the US and Japan, The tariffs are being abolished through free trade agreements, and imports from overseas countries are increasing.

In order to cope with the deterioration of food and corruption caused by the importation process of foreign food, foreign substances in the food groups, and so on, it is possible to contribute to the health of the nation and the safety of the nation. , Railway, etc. require new effective inspection methods.

As the processed food industry grows, the distribution period and the shelf life of the food become longer and the side effect is also generated in the opposite side from the positive side. Therefore, public opinion about the safety of processed foods is created and the method The present invention can satisfy all of these requirements.

INDUSTRIAL APPLICABILITY The present invention can be used in industrial fields such as industrial precision nondestructive inspection system application, alternative application of security inspection system, application to biomedical field, and inline food inspection system.

10: x-ray shielding housing 11: base
12: side supporter 13: upper plate
20: Transfer line P: Subject
30: X-ray generator 31: 1st beam line
32: second beam line 40: linear detector
50: Plate detector G: X-ray diffraction grating
G0: source grating G1: phase grating
G2: Analysis Grid L: LM Guide (Linear Motion Guide)
Ga: Low energy X-ray diffraction grating Gb: Medium energy X-ray diffraction grating
Gc: High energy X-ray diffraction grating 61: G0 tray
62: G1 tray 63: G2 tray

Claims (4)

Ray shielding enclosure 10 having a base 11, a side supporter 12 and an upper plate 13 and a transfer line 20 for transferring a subject P from one side of the x- And an X-ray generator (30) mounted on the upper plate (13) for scanning the X-ray beam in a downward direction, the multiple X-ray diffraction grating selection type phase-
The X-ray generator 30 is configured to move forward and backward along the upper plate 13 in accordance with the first beam line 31 and the second beam line 32 of the point at which the subject P is transported through the transfer line 20. [ Reciprocating,
The subject P is conveyed through the conveying line 20 to be aligned with the first beam line 31 of the X-ray generator 30 to acquire the absorbed image through the linear detector 40,
When the subject P is conveyed through the conveying line 20 to be aligned with the second beam line 32 of the X-ray generator 30, the X-ray diffraction grating G passes through the plate- Designed to acquire x-ray diffraction images afterwards,
The x-ray diffraction grating G includes a source grating G0, a phase grating G1 and an analysis grating G2 that are assembled along the side supporter 12 in alignment with the second beam line 32 of the x- Lt; / RTI >
The source grating G0, the phase grating G1 and the analytical grating G2 are arranged in such a manner that the source grating G0, the phase grating G1, and the analysis grating G2 are aligned with the energy magnitudes of the x-ray beams of the x- (Ga), a medium energy x-ray diffraction grating (Gb) and a high energy x-ray diffraction grating (Gc)
The linear detector 40 is installed on the base 11 in alignment with the first beam line 31 of the X-ray generator 30,
The x-ray diffraction grating G includes a source grating G0, a phase grating G1 and an analysis grating G2 that are assembled along the side supporter 12 in alignment with the second beam line 32 of the x- Lt; / RTI >
And the flat plate type detector (50) is installed in the side supporter (12) below the analysis grid (G2). The method according to claim 1,
The X-ray generator 30 includes an X-ray generator 30 and a X-ray generator 30. The X-ray generator 30 includes a first beam line 31 and a second beam line 32, which correspond to the first beam line 31 and the second beam line 32, Are reciprocated back and forth along the X-ray diffraction grating (13). delete 3. The method according to claim 1 or 2,
The source grating G0, the phase grating G1 and the analysis grating G2 are assembled to the G0 tray 61, the G1 tray 62 and the G2 tray 63 fixed to the side supporter 12,
The source grating G0, the phase grating G1 and the analytical grating G2 are connected to a second beamline 32 (see FIG. 2), which corresponds to the energy level of the x- Is reciprocated back and forth along the G0 tray (61), the G1 tray (62), and the G2 tray (63) by the LM Guide (L).

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