KR101678596B1 - Diffracting grating choice type phase contrast xray imaging system - Google Patents
Diffracting grating choice type phase contrast xray imaging system Download PDFInfo
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- KR101678596B1 KR101678596B1 KR1020150093948A KR20150093948A KR101678596B1 KR 101678596 B1 KR101678596 B1 KR 101678596B1 KR 1020150093948 A KR1020150093948 A KR 1020150093948A KR 20150093948 A KR20150093948 A KR 20150093948A KR 101678596 B1 KR101678596 B1 KR 101678596B1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
- G01N2223/056—Investigating materials by wave or particle radiation by diffraction, scatter or reflection diffraction
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/10—Different kinds of radiation or particles
- G01N2223/101—Different kinds of radiation or particles electromagnetic radiation
- G01N2223/1016—X-ray
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/306—Accessories, mechanical or electrical features computer control
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/40—Imaging
- G01N2223/42—Imaging image digitised, -enhanced in an image processor
Abstract
In the process of transferring a single X-ray generator (X-ray source) 30 to a beamline 30a for acquiring a phase difference image of a subject P from a single equipment, a high transmittance of 100 kV class, 120 kv class and 160 kV class It is possible to acquire the x-ray diffraction image in the environment while allowing the phase difference image and the visible image by x-ray diffraction and scattering by combining the x-ray diffraction grating (G) image processing technology, Ray diffraction grating-selective phase-contrast X-ray imaging apparatus.
Description
BACKGROUND OF THE
In general, X-ray imaging devices are mainly composed of linear detectors and flat plate detectors.
The technology of the domestic X-ray-based imaging device has been actively studied since the early 1990's, and it is starting to be expanded from the medical research and development to the industrial search system which takes the X-ray applied to the human body and the industrial non-destructive inspection There is a limit to the morphological information of morphology using X-ray transmission image according to the density of the object (object) to be searched. An example of the technology of such an X-ray-based imaging device is a linear detector, and a specific example thereof is mentioned in the prior art document.
1 is a view for explaining a phenomenon that occurs when the X-ray mentioned in the prior art document (Korean Patent Laid-Open Publication No. 2014-0145682) is transmitted through a target object.
As shown in FIG. 1, when an X-ray having both particle and wave characteristics is grasped as an electromagnetic wave, the X-ray passes through the object (subject) and the amplitude decreases and a phase shift (delta) occurs. The decrease in the amplitude of the x-ray is because the x-ray is absorbed (β) by the material constituting the object, and this is called the attenuation of the x-ray.
2 is a view for explaining a process of acquiring an x-ray image using the attenuation characteristics of the x-rays mentioned in the prior art document.
The attenuation characteristic of the X-ray, that is, the degree of absorption of the X-ray differs for each substance constituting the object. In the prior art document, an image using an attenuation characteristic of an x-ray is defined as an absorption image. 2, an X-ray is generated from the
The reason why the X-ray passes through the object and its phase is shifted is that the X-ray is refracted and interfered by the material constituting the object. The sensitivity ratio (? /?), Which is the ratio of the two coefficients, is shown in FIG. 3, where an index representing the attenuation characteristic of the X-ray is? And an index representing the phase shift characteristic is?.
3 is a graph showing sensitivity of the attenuation characteristic and phase shift characteristic of the X-ray mentioned in the prior art document.
Referring to FIG. 3, although the sensitivity ratio varies depending on the energy of the X-ray and the material constituting the object, it can be seen that the phase shift characteristic is sensitive up to several thousand times as much as the attenuation characteristic.
FIG. 4A is a diagrammatic representation of the internal constituent material of the breast mentioned in the prior art document, and FIG. 4B is a graph showing the attenuation coefficient for the internal constituent material of the breast mentioned in the prior art document.
4A, the tissue of the
In addition, since the breast is made of soft tissues only, there is little difference in the X-ray attenuation characteristics between the internal constituent materials as shown in FIG. 4B. Therefore, it can be seen that it is difficult to obtain accurate information on the internal constituent material of the breast only by the absorbed image.
On the other hand, the 1970's X-ray phase image, which was the basis of the first phase-contrast imaging technique, was measured using a monocrystalline silicon interferometer), and these measurements were limited to large facilities such as synchrotron facilities, It has been used in basic physics research and it is possible to measure the phase transition of X-ray very precisely, but there is a limitation that information about phase can not be obtained in the form of image.
In the 2000s, research has been reported that phase images can be obtained from a laboratory-scale crew, and this research can be implemented on a simple pinhole scale using Laplace information of phase using spatial coherence. However, The time is very long and it takes a long time to restore the phase.
For example, in FIG. 3, since the phase shift characteristic of the X-ray appears to be several tens to several thousands times more sensitive than the attenuation characteristic, a subject having a small difference in attenuation characteristic for each constituent material such as a breast may use the phase shift characteristic To obtain clearer, more sensitive x-ray images.
The technique of imaging the inside of the object is called a phase contrast imaging technique using the fact that the phase shift characteristics of the X-rays are different for each substance constituting the object, and the image generated through the phase difference imaging technique is called a phase difference image contrast image.
Examples of the method of generating the phase difference image include interferometry, grating interferometry, diffraction-enhanced imaging, and in-line phase contrast imaging. The double in-line phase difference imaging method or the spatial advancement phase difference imaging method can be implemented in a configuration similar to a general X-ray imaging apparatus without requiring a separate optical part such as a diffraction grating or a reflection plate. For example, It is understood that the phase difference image is obtained by applying the in-line phase difference imaging method through the X-ray imaging apparatus according to the present invention.
5 is a view for explaining a process of acquiring the phase difference image mentioned in the prior art document.
5, the
The space between the object ob and the
FIG. 6A is a schematic diagram showing an X-ray phase difference imaging apparatus using a Talbot-Lau interferometer, FIG. 6B is a schematic diagram showing an X-ray diffraction grating applied to an X-ray phase difference imaging apparatus using a Talbot- , And an analysis grid).
In recent years, studies on X-ray phase studies using a Talbot-Lau interferometer have been actively carried out in recent years, and as shown in FIG. 6, not only information on the phase of the object using the Talbot-Lau interferometer but also the visibility (Dark Field) images. This method not only reduces the phase contrast ratio of high sensitivity but also acquires image information about the microstructure of the material. The measurement time is not much different from the general non-destructive image acquisition time, and thus it is possible to use it industrially.
In recent years, with the development of the domestic and overseas industry, there has been a growing interest in industrial inspection equipment due to the demand for verification of the precision of high-density parts.
The demand for a new concept of X-ray continuous X-ray inspection apparatus which can distinguish the foreign matter and the degree of corruption which can not be distinguished by the conventional inspection equipment by applying the high resolution X-ray diffraction grating to the image of the search object is increasing in the whole industry. In other words, it can be used as an alternative in the industry to prove the integrity of products manufactured according to the demand of the consumer.
However, up to now, a phase-contrast X-ray imaging system using a flat-plate detector using an X-ray diffraction grating has been used for a single X-ray source (up to 100 kV maximum for X-ray generators) And there is a limitation in that the X-ray diffraction image can not be obtained actively according to various subject conditions.
In other words, due to the structural problem that depends on the energy level of the x-ray beam of the x-ray generator, which is the limit of the x-ray diffraction grating, the phase contrast image, the dark field ) There has been a limitation that the image can not be obtained.
More specifically, the conventional phase-contrast X-ray imaging apparatus is composed of one X-ray source and a single-nano structure silicon (Si) X-ray diffraction grating and detection system.
The X-ray source used in the conventional phase-contrast X-ray imaging apparatus is limited to a maximum of 100 kV at several tens kV due to difficulty in fabricating the nano-structured silicon (Si) X-ray diffraction grating. .
The silicon (Si) x-ray diffraction grating of FIG. 6 (b) shows the calculated effective energy of the incident x-ray source and the calculated effective energy of the x- Si) wafer. ≪ / RTI >
With this effective energy, the nano-structured silicon (Si) x-ray diffraction grating is fabricated in the phase-contrast X-ray imaging device design process.
This is because the phase-contrast X-ray imaging apparatus manufactured once has a limitation that only energy of a single X-ray source should be used.
The limit of the acceleration voltage of 100kV used in the conventional technique is insufficient to obtain the transmitted image of the industrial part. The image acquisition of the industrial part is currently obtaining the non-destructive image using several MeV at a few hundred kV. to be.
In summary, conventional phase-contrast X-ray imaging devices consist of a single x-ray source (up to 100 kV or less) and a single nano-structured silicon (Si) x-ray diffraction grating and a single plate detection system, The larger the thickness of the energy source is, the higher the energy is, the lower energy is the energy).
Therefore, in order to use an x-ray source having other effective energy, a separate nano-structured silicon (Si) x-ray diffraction grating according to the corresponding effective energy must be mounted.
In general, linear detectors have characteristics of large-scale low-speed, flat-plate detectors have small-scale high-speed characteristics, but they can not flexibly cope with all the characteristics desired by the user.
On the other hand, the content of the X-ray diffraction grating is disclosed in Korean Patent No. 1292918 (image measuring instrument for a grating interferometer), Japanese Laid-Open Patent Application No. 2013-122487 (metal grid manufacturing method, metal grid and X- Korean Patent No. 1272902 (X-ray phase difference imaging apparatus), Korean Patent No. 1378757 (radiation element imaging apparatus capable of obtaining material element information and image level) and Korean Patent No. 1369368 (metal embedding with high aspect ratio penetration structure) Method) and the like, so a detailed description thereof will be omitted.
It is an object of the present invention to provide an X-ray diffraction grating that can obtain an X-ray diffraction image of a subject in a much more active manner by configuring a plurality of kinds of X-ray diffraction gratings according to the case of varying the energy level of the X- And an optional phase difference X-ray imaging apparatus.
It is an object of the present invention to provide an X-ray diffraction grating which can be applied to higher effective energy due to the development of future X-ray diffraction grating manufacturing technology, And an X-ray diffraction grating-selective phase-contrast X-ray imaging apparatus capable of directly obtaining a phase difference image.
The object of the present invention is to provide a method and apparatus for transferring a single X-ray generator (X-ray source) to a beamline for obtaining a phase difference image (flat panel detector) X-ray diffraction grating image processing technology enables flexible acquisition of X-ray diffraction images and enables X-ray diffraction and scattering to produce phase difference images and visibility images, thereby making it possible to more accurately and accurately determine the object. And a lattice-selective phase-contrast X-ray imaging apparatus.
It is an object of the present invention to provide a G0 tray, a G1 tray, and a G2 tray, in which the energy of the x-ray beam of the x-ray generator corresponding to the additional condition of the subject Ray diffraction grating region so that the diffraction grating region can be further included so that the diffraction grating region can be further added to the diffraction grating.
The object of the present invention is to develop the world's highest level of high aspect ratio lattice fabrication technology for the acquisition of advanced image by fusing the micro-lattice manufacturing technology for X-ray imaging applying the nano-based semiconductor processing technology and the new nano structure manufacturing technology, It is possible to substitute radiation imaging technology used in industrial / medical applications. Even if it is limited by the limitation of the manufacturing technology of silicon nano structure diffraction grating of current nano structure, it can be used even in high penetration environment of 160 kV or more Ray diffraction grating selective phase-contrast X-ray imaging apparatus capable of nondestructive inspection using an X-ray.
In order to achieve the above object,
Ray shielding enclosure having a base, a side supporter and an upper plate, a transfer line for transferring the object from one side of the x-ray shielding housing to the other side, and an x-ray diffractor mounted on the upper plate for x- In the lattice-selective phase-contrast X-ray imaging apparatus,
Wherein the x-ray generator forms a beamline as a downward scan of the x-ray beam at a point at which the subject is transported through the transfer line,
Ray diffraction image through a planar detector using an x-ray diffraction grating when the subject is transferred through the transfer line and coincided with a beam line of the x-ray generator,
Wherein the x-ray diffraction grating comprises a source grating, a phase grating, and an analysis grating that are assembled along the side supporter in accordance with the beam line of the x-
The source grating, the phase grating, and the analysis grating are each composed of a low energy X-ray diffraction grating, a medium energy X-ray diffraction grating, and a high energy X-ray diffraction grating so as to be in agreement with the energy magnitudes of the X- And it is a basic characteristic of the technical structure.
According to the present invention, a plurality of types of x-ray diffraction gratings are formed in accordance with the energy level of the x-ray beam of the x-ray generator according to the conditions of the subject, so that the x-ray diffraction image of the subject can be obtained much more actively.
The present invention is based on the development of a future x-ray diffraction grating manufacturing technology, so that when a nano-structured silicon x-ray diffraction grating that can be applied to a higher effective energy is manufactured, the x-ray diffraction grating can be selectively changed Phase difference image can be obtained.
The present invention relates to a process for transferring a single X-ray generator (X-ray source) to a beam line for acquiring a phase difference image (flat panel detector) The diffraction image can be acquired flexibly and the X-ray diffraction grating image processing technique is combined with the phase difference image and the visibility image by the X-ray diffraction and scattering, thereby enabling the subject to be more actively and accurately and accurately judged.
The present invention is directed to the G0 tray, the G1 tray, and the G2 tray, respectively, in consideration of the energy of the X-ray beam of the X-ray generator corresponding to the additional condition of the subject, It is possible to further include the spare energy X-ray diffraction grating region so as to further conform to the present invention, thereby enabling further placement of the X-ray diffraction grating due to future development.
The present invention is to develop the world's highest level of high aspect ratio lattice fabrication technology for the acquisition of advanced image by fusing micro lattice manufacturing technology for x-ray imaging using nanotechnology-based semiconductor processing technology and new nano structure manufacturing technology, It is possible to substitute radiation imaging technology used for medical treatment. Even if it is limited by the limitation of the manufacturing technology of silicon nano structure of silicon x-ray diffraction grating, it is possible to use X-rays even in high penetration environment of 160kV or more, There is an effect that non-destructive inspection using can be performed.
The present invention can be applied to applications of industrial precision nondestructive inspection system, alternative application of security inspection system, application to biomedical field, application of inline food inspection system.
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a view for explaining a phenomenon occurring when X-rays mentioned in the prior art document (Korean Patent Laid-Open No. 2014-0145682) are transmitted through a target object.
FIG. 2 is a diagram for explaining a process of acquiring an X-ray image using the attenuation characteristics of an X-ray mentioned in the prior art document. FIG.
FIG. 3 is a graph showing the sensitivity of the attenuation characteristic and the phase shift characteristic of the X-ray mentioned in the prior art document.
Figure 4a is a schematic representation of the internal components of the breast mentioned in the prior art.
Figure 4b is a graph depicting attenuation coefficients for internal components of the breast mentioned in the prior art.
5 is a diagram for explaining a process of acquiring a phase difference image mentioned in the prior art document.
6 (a) is a schematic diagram showing an X-ray phase difference imaging apparatus using a Talbot-Lau interferometer.
FIG. 6 (b) is a sectional view showing an X-ray diffraction grating (source grating, phase grating, and analytical grating) applied to an X-ray phase difference imaging apparatus using a Talbot-Lau interferometer.
FIGS. 7A to 7C are virtual views illustrating an operation process of a selective phase-difference X-ray imaging apparatus according to the present invention;
8A and 8B are a perspective view and a front view showing an X-ray diffraction grating selection type phase-contrast X-ray imaging apparatus according to the present invention.
FIG. 8C is a partially enlarged view of an analysis grating and a flat panel detector applied to an X-ray diffraction grating-selective phase-contrast X-ray imaging apparatus according to the present invention, viewed from the side direction.
FIG. 8D is a partially enlarged view showing a source grating and an X-ray generator applied to an X-ray diffraction grating-selective phase-contrast X-ray imaging apparatus according to the present invention;
8E is a partially enlarged view showing a phase grating and a transfer line applied to an X-ray diffraction grating selection type phase-contrast X-ray imaging apparatus according to the present invention.
FIG. 8F is a partial enlarged view showing an analysis grating and a flat plate type detector applied to an X-ray diffraction grating selective phase-contrast X-ray imaging apparatus according to the present invention.
A preferred embodiment of the X-ray diffraction grating selection type phase-contrast X-ray imaging apparatus according to the present invention will be described with reference to the drawings, and there can be a plurality of embodiments thereof, and the objects, features and advantages I can understand them better.
FIGS. 7A through 7C are virtual views illustrating the operation of the selective phase-contrast X-ray imaging apparatus according to the present invention.
7A to 7C, the X-ray diffraction grating selection type phase-contrast X-ray imaging apparatus according to the present invention is a flat
In order to overcome the disadvantage that the conventional phase-contrast X-ray imaging apparatus is composed of one X-ray source (maximum 100 kV or less), a single-nano-structured silicon (Si) X-ray diffraction grating G and a single plate- The X-ray diffraction grating-selective phase-contrast X-ray imaging apparatus according to the present invention comprises a plurality of kinds of X-ray diffraction gratings G in accordance with the case of varying the energy level of the X-ray beam of the
In other words, when a nano-structured silicon (Si) x-ray diffraction grating (G) capable of being applied to higher effective energy is fabricated due to the development of future x-ray diffraction grating (G) manufacturing technology, So that the phase difference image can be obtained immediately by selecting and changing the grating G for each type.
8A and 8B are a perspective view and a front view showing an X-ray diffraction grating selection type phase-contrast X-ray imaging apparatus according to the present invention, FIG. 8C is a perspective view showing an analysis grid G2 applied to the X- 8D is a partially enlarged view showing a source grating G0 and an
8A to 8F, the X-ray diffraction grating selection type phase-contrast X-ray imaging apparatus according to the present invention includes a
The
A single x-ray generator (x-ray source) 30 is transferred from a single x-ray generator (x-ray source) 30 to a
For example, when the subject P is an electronic component such as a PCB, a 100 kV class X-ray beam is irradiated from the
On the other hand, the plate-
The source grating G0, the phase grating G1 and the analysis grating G2 are assembled to the
Further, the
The X-ray diffraction grating selection type phase-contrast X-ray imaging apparatus according to the present invention having the above-described constitution can be applied to a high-performance image processing apparatus, such as a micro-grating manufacturing technology for X-ray imaging employing a nano- (Si) X-ray diffraction grating (G) manufacturing technology of the present nano-structure, it is possible to apply the radiation imaging technology currently used in industry / It is possible not only to perform the nondestructive inspection using the X-ray of the object P but also to the following areas even in the high permeability environment of the 160 kV or higher level required for the conventional industrial use.
○ Application of industrial precision nondestructive inspection system
At present, in many industrial fields, radiation inspection devices can be used to enhance the quality of products. In the present technology for evaluating articles with images obtained by absorption ratio, X-ray imaging technology using phase difference is applied to acquire more image information Thereby enabling more precise and effective inspection.
Industrial and new product development applications can be extended to Li battery non-destructive testing, non-destructive testing of semiconductors and sensor components, non-destructive testing of three-dimensional microstructures, and micro-structure 3D image measuring devices for research.
○ Alternative application of security check system
Generally, airports obtain absorption images through an X-ray, but there are limitations in that it is difficult to distinguish substances having a minute size or substances having a low X-ray absorption coefficient. However, when the present invention is applied, Increased sensitivity to substances makes it possible to distinguish substances such as explosives and food inspections, which can lead to an increase in security technology.
○ Application to life and medical field
In general medical X-ray equipment images, relatively high bone images can be distinguished comparatively easily compared with organs with different densities, but there is a limit to the difficulty of distinguishing organs in the human body having similar atomic numbers and densities. However, when the present invention is applied, a highly sensitive image can be obtained as compared with an absorbed image, so that the diagnosis of a lesion of a patient can be made much smoother.
○ Application of inline food inspection system
Currently, food inspections use direct image samples or images using X-ray absorpti ons. However, it takes a long time to inspect samples directly and absorbed images using X-rays are not easily distinguishable have. However, when the present invention is applied, there is an advantage that the structure of the substance which can not be seen in the conventional absorption image can be clearly seen, and thus the internal state of the substance can be accurately and accurately confirmed without sample inspection.
According to the data released by the Korea Food and Drug Administration, overseas food imports are growing by 20% annually. In 2012, Korea's total food imports amounted to $ 14370 million and 13757 thousand tons in 129 countries including China, the US and Japan, The tariffs are being abolished through free trade agreements, and imports from overseas countries are increasing.
In order to cope with the deterioration of food and corruption caused by the importation process of foreign food, foreign substances in the food groups, and so on, it is possible to contribute to the health of the nation and the safety of the nation. , Railway, etc. require new effective inspection methods.
As the processed food industry grows, the distribution period and the shelf life of the food become longer and the side effect is also generated in the opposite side from the positive side. Therefore, public opinion on the safety of processed foods is created and the method The present invention can satisfy all of these requirements.
INDUSTRIAL APPLICABILITY The present invention can be used in industrial fields such as industrial precision nondestructive inspection system application, alternative application of security inspection system, application to biomedical field, and inline food inspection system.
10: x-ray shielding housing 11: base
12: side supporter 13: upper plate
20: Transfer line P: Subject
30:
50: Plate detector G: X-ray diffraction grating
G0: source grating G1: phase grating
G2: Analytical grating Ga: Low energy X-ray diffraction grating
Gb: Medium energy X-ray diffraction grating Gc: High energy X-ray diffraction grating
61: G0 Tray 62: G1 tray
63: G2 tray L: LM Guide (Linear Motion Guide)
S: Spare energy X-ray diffraction grating area
Claims (3)
The X-ray generator 30 forms a beam line 30a as a downward scan of the X-ray beam at a position where the subject P is transferred through the transfer line 20,
When the subject P is conveyed through the conveying line 20 to be aligned with the beam line 30a of the X-ray generator 30, the X-ray diffraction is performed through the plate- Designed to acquire images,
The X-ray diffraction grating G is composed of a source grating G0, a phase grating G1 and an analysis grating G2 which are assembled along the side supporter 12 in alignment with the beam line 30a of the X-ray generator 30 under,
The source grating G0, the phase grating G1 and the analytical grating G2 are arranged in such a manner that the source grating G0, the phase grating G1, and the analysis grating G2 are aligned with the energy magnitudes of the x-ray beams of the x- (Ga), a medium energy x-ray diffraction grating (Gb), and a high energy x-ray diffraction grating (Gc).
Wherein the flat plate type detector (50) is installed in the side supporter (12) below the analysis grid (G2).
The source grating G0, the phase grating G1 and the analysis grating G2 are assembled to the G0 tray 61, the G1 tray 62 and the G2 tray 63 fixed to the side supporter 12,
The source grating G0, the phase grating G1 and the analysis grating G2 are connected to a beam line 30a corresponding to the energy level of the x-ray beam of the x-ray generator 30 corresponding to the condition of the subject P Is reciprocated back and forth along the G0 tray (61), the G1 tray (62), and the G2 tray (63) by the LM Guide (L).
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| KR101300269B1 (en) * | 2012-07-06 | 2013-08-23 | 이비테크(주) | 3d computed tomography |
| KR101378757B1 (en) | 2012-08-30 | 2014-03-27 | 한국원자력연구원 | Radiation imaging equipment and method available to obtain element date of material and select dimensions of image |
| KR101369368B1 (en) | 2013-01-21 | 2014-03-04 | 한국과학기술원 | High aspect ratio through structure metal filling method |
| KR101426245B1 (en) * | 2013-06-03 | 2014-08-05 | 이비테크(주) | Three-dimensional computed tomography apparatus |
| KR20140145682A (en) | 2013-06-13 | 2014-12-24 | 삼성전자주식회사 | X-ray imaging apparatus and control method thereof |
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