KR101799967B1 - In-situ head-driven washing method of groundwater wells - Google Patents

Abstract

According to the present invention, disclosed is an in-situ head-driven washing apparatus for groundwater wells and a method thereof. The present invention is configured to automatically and variably adjust a pressure and flux of washing fluid introduced into a washing chamber according to a change amount of water level of underground water while one washing chamber is formed by installing packers in an upper and lower portions of a washing tool, respectively after forming the washing tool in a water level observation member installed through the inside of a tube of underground water. Accordingly, washing efficiency with respect to the inner portion of the tube of the underground water between a screen section where underground water is introduced into the tube of the underground water and an installation section of a submersible motor pump can be maximized, the screen provided in the tube of the underground water can be prevented from being blocked, and introduction of underground water into the tube of the underground water can be smoothly achieved.

Description

[0001] In-situ head-driven washing method of groundwater wells [

The present invention relates to a well washing technique, and more particularly, to a well washing technique, in which a washing hole is formed in a water level observing member installed in a groundwater well, and a packer is installed at each of upper and lower portions of the washing hole, (P) and the flow rate (Q) of the fluid to be introduced into the cleaning chamber are variably controlled in accordance with the variation of the ground water level when a certain amount of the cleaning fluid is introduced into the cleaning chamber, The present invention relates to a head-driven well cleaning apparatus and method for maximizing the cleaning efficiency of the inside of a groundwater well between a screen section where an underwater motor pump is installed and an installation section of an underwater motor pump.

In general, groundwater is less expensive than surface water and can produce much water in a small area, unlike reservoir, and has a merit that water pollution is small and stable water quantity can be obtained by short term construction.

In other words, the ground water temperature is about 15 ℃ and bacteria pollution such as Escherichia coli is small and not only the minerals such as a large amount of minerals are contained but also the water volume does not fluctuate rapidly and the temperature is also constant and is used as drinking water. Cooling water, tourism water, etc., and the production unit cost is lower than that of the general waterworks, so that a certain amount of groundwater development is indispensable for industrial activities.

In order to cope with the level of the groundwater, a groundwater well having a multi-stage groundwater inflow screen is installed on the circumferential surface, and an underwater motor pump for pumping the groundwater flowing through the groundwater inflow hole to the ground is installed in the groundwater well. I installed it.

In addition, conventionally, in order to clean a groundwater well, a tube is inserted into a groundwater well with an opening of a groundwater well located on the ground, and then a cleaning gas (e.g., nitrogen, oxygen, hydrogen or argon compressed gas) The groundwater and contaminants are raised by the injected cleaning gas, and the groundwater is sprayed to the ground through the inlet of the tunnel so that the cleaning is performed.

However, according to the conventional cleaning method of the groundwater tank cleaning method, when the foreign substance adsorbed on the screen (groundwater inflow hole) of the groundwater tank is sprayed by spraying the cleaning gas, the cleaning is performed by the washing device having a constant pressure and constant flow rate regardless of the ground water level , When the groundwater level is high, the pressure of the cleaning gas injected into the groundwater channel is weakened and the foreign matter adsorbed on the screen can not be properly removed. On the other hand, when the groundwater level is low, the pressure of the cleaning gas injected into the groundwater well is too strong The outer side filter material of the screen (groundwater inflow hole) and various contaminants collapse and flow back into the inside of the groundwater well through the screen to cause clogging of the screen, But also had a problem of shortening the lifetime of the housing All.

Patent Registration No. 10-0651052 (registered on November 22, 2006) Open Patent Publication No. 10-2012-0094192 (public date 2012.08.24)

SUMMARY OF THE INVENTION Accordingly, the present invention has been made to solve the above-mentioned problems occurring in the prior art, and it is an object of the present invention to provide a water level monitoring member, The pressure P and the flow rate Q of the cleaning fluid introduced into the cleaning chamber can be variably controlled automatically in accordance with the variation of the ground water level in the state where the cleaning chamber is formed, This system is designed to maximize the efficiency of cleaning the inside of the groundwater tank between the section and the installation section of the underwater motor pump and to prevent the screen provided in the groundwater tank from being blocked and to smoothly introduce the groundwater into the groundwater tank. A well washing apparatus and a method thereof.

In order to accomplish the above object, the present invention provides a well-connected home-and-pit type well cleaning device, comprising: an underwater motor pump connected to a discharge line extending to the ground; a screen having a multi-stage inflow hole for inflow of groundwater; A water level observing member having a length corresponding to the length of the ground water well and having a plurality of washing holes for spraying the washing gas on the outer surface; Upper and lower packers respectively formed on upper and lower sides of the inside of the level observation member so as to form a cleaning chamber for spraying the cleaning gas into the groundwater well through the cleaning hole in the level observation member; A water head measuring unit formed in the washing chamber and measuring a water head change amount of the washing chamber to detect a ground water level in the ground water well; Wherein the cleaning head is connected to a gas supply line to the cleaning chamber and is connected to the cleaning head in such a manner that the pressure and the flow rate of the cleaning gas injected into the groundwater channel through the cleaning hole are kept constant, A cleaning supply unit for supplying a cleaning gas whose pressure and flow rate are controlled to the inside of the chamber; .

In addition, the water level observing member is a tube made of a steel material.

In addition, the washing hole is formed on the circumferential surface of the water level observer so that the washing gas is concentratedly injected into the screen in the section where the underwater motor pump and the screen are formed.

The water head measuring unit is electrically connected to the cleaning supply unit through the gas supply line.

Further, the cleaning gas is nitrogen gas.

According to another aspect, a well cleaning method implemented by the in-situ coupled headed well cleaning apparatus comprises the steps of: (a) measuring a head of a head measurement from a water level observing member fixedly installed in a groundwater well; (b) determining whether the groundwater level in the groundwater well is higher or lower than the reference water level or the reference water level from the water head measurement measured from step (a); (c) According to the result of the step (b), the washing and supplying unit adjusts the pressure and flow rate of the washing gas from the variation of the groundwater level, supplies the washing gas to the washing chamber of the water level observation member, Washing the screen of the groundwater well by spraying through a washbowl; And (d) operating the submersible motor pump when the pollutant removed through washing from the step (c) is accumulated on the lower side of the groundwater well, discharging the pollutant to the ground through the discharge line; .

In the step (c), if the reference level is determined as a result of the determination in the step (b), the cleaning supply unit supplies the cleaning gas to the cleaning chamber with the set reference pressure and the reference flow rate, Cleaning the screen of the groundwater well; As a result of the determination in the step (b), if the first water level is lower than the reference water level, the cleaning supply unit supplies the cleaning gas to the cleaning chamber with the set reference pressure and the first flow rate reduced from the reference flow rate, Cleaning the screen of the groundwater well by ejecting the washing gas with a first blowing pressure through the ball; And a second water level higher than the reference water level as a result of the determination in the step (b), the cleaning supply unit supplies the cleaning gas to the cleaning chamber at a second pressure and a second flow rate that are higher than the reference pressure and the reference flow rate, Cleaning the screen of the groundwater well by ejecting the washing gas with a second blowing pressure through the washing hole of the washing chamber; As shown in FIG.

In addition, the reference water level is a part of the wash water which is vertically multi-stage formed in the water level observer, is submerged by groundwater, and the first water level is formed by multi- , And the second water level is formed by vertically multi-stage water-leveling members, all of which are submerged by groundwater.

The reference pressure and the reference flow rate are a pressure and a flow rate that are adjusted in response to a reference water level that is influenced by a part of the ground water level, and the first pressure and the first flow rate are the first and second flow rates, And the second pressure and the second flow rate are a pressure and a flow rate that are adjusted to a high level corresponding to the second water level to be influenced by many groundwater levels.

The first and second ejection pressures of the cleaning gas may be the same as or equal to the reference ejection pressure ejected through the cleaning hole into the screen of the groundwater well.

As described above, according to the present invention, a washing hole is formed in a water level observing member installed into a groundwater well, and a packer is installed at each of upper and lower portions of the washing hole, The pressure (P) and the flow rate (Q) of the cleaning fluid to be injected are variably controlled automatically according to the variation of the groundwater level. Through this, the groundwater in the groundwater can be automatically controlled between the screen section It is possible to maximize the efficiency of cleaning the inside of the groundwater well and to prevent the screen provided in the groundwater well from being blocked, and to smoothly introduce the groundwater into the groundwater well.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a general schematic view showing the structure of a home-and-water coupled type well cleaning apparatus according to an embodiment of the present invention. FIG.
2 is an enlarged cross-sectional view showing the structure of a water level observation member according to a reference water level according to an embodiment of the present invention.
FIG. 3 is an enlarged cross-sectional view showing the structure of a water level observation member according to an embodiment of the present invention with respect to a first water level lower than a reference water level. FIG.
FIG. 4 is an enlarged cross-sectional view showing the structure of a water level observation member according to a second water level higher than a reference water level according to an embodiment of the present invention. FIG.
Figure 5 is a flow chart of a method for cleaning the in-situ coupled headed well in an embodiment of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS The advantages and features of the present invention, and how to accomplish them, will become apparent by reference to the embodiments described in detail below with reference to the accompanying drawings. However, it should be understood that the present invention is not limited to the disclosed embodiments, but may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. It will be understood by those of ordinary skill in the art that various changes in form and detail may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.

The terminology used herein is for the purpose of illustrating embodiments and is not intended to be limiting of the present invention. In the present specification, the singular form includes plural forms unless otherwise specified in the specification.

In this specification, the terms "comprises" or "having ", and the like, specify that the presence of stated features, integers, steps, operations, elements, But do not preclude the presence or addition of one or more other features, integers, steps, operations, components, parts, or combinations thereof.

In addition, the embodiments described herein will be described with reference to cross-sectional views and / or plan views, which are ideal illustrations of the present invention. In the drawings, the thicknesses of the films and regions are exaggerated for an effective description of the technical content. Thus, the shape of the illustrations may be modified by manufacturing techniques and / or tolerances. Accordingly, the embodiments of the present invention are not limited to the specific forms shown, but may include variations in shapes that are created or required according to the manufacturing process. For example, the area shown at right angles may be rounded or may have a shape with a certain curvature. Thus, the regions illustrated in the figures have schematic attributes, and the shapes of the regions illustrated in the figures are intended to illustrate specific forms of regions of the apparatus and are not intended to limit the scope of the invention.

Like reference numerals refer to like elements throughout the specification. Accordingly, although the same reference numerals or similar reference numerals are not mentioned or described in the drawings, they may be described with reference to other drawings. Further, even if the reference numerals are not shown, they can be described with reference to other drawings.

Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.

2 is an enlarged cross-sectional view showing the structure of a water level observing member according to a reference water level according to an embodiment of the present invention. FIG. 2 is a cross- FIG. 3 is an enlarged cross-sectional view showing the structure of a water level observing member according to a first water level lower than a reference water level according to an embodiment of the present invention. FIG. 3 is an enlarged cross-sectional view showing the structure of FIG.

Referring to FIGS. 1 to 4, an apparatus for cleaning a well-connected home-and-pit type well according to an embodiment of the present invention includes an underwater motor pump 11 connected to a discharge line extending to the ground, A plurality of washing holes 21 having a length corresponding to the length of the groundwater well 10 and spraying the washing gas to the outer circumferential surface are formed in the groundwater well 10 having the screen 12 formed with the inflow holes The washing chamber S1 and the packers 30 and 40 and the head measuring unit 50 are installed on the water level monitoring member 20 in a state where the water level observation members 20 are formed in parallel to each other, And the washing chamber S1 is connected to the ground washing and supplying unit 60 through the gas supplying line L1.

The water level observing member 20 is a tube made of a steel material and the washing hole 21 is made of a steel material so as to be provided between the underwater motor pump 11 and the screen 12, And the water level measurement member 20 is formed in a multi-stage configuration perpendicular to the circumferential surface of the water level observation member 20.

The packers 30 and 40 are an upper and a lower structure in which the washing gas is sprayed into the screen 12 of the groundwater well 10 through the washing hole 21 inside the water level monitoring member 20 Respectively, so as to form a washing chamber (S1) for the water level measurement member (20).

The water head measuring unit 50 is formed in the washing chamber P1 and is configured to measure the water head change amount in the washing chamber P1 to detect the ground water level in the groundwater well 10 will be.

That is, when groundwater is introduced into the groundwater well 10 through the screen 12 of the groundwater well 10, the groundwater flows through the washing hole 21 into the inside of the water level observation member 20 The water head measuring unit 50 measures the amount of water head change in the groundwater flowing into the washing chamber S1 in the water level monitoring member 20 and then measures the amount of water To the supply unit (60).

The washing and supplying unit 60 is connected to the gas supply line L1 in the washing chamber S1 while being installed on the ground and is sprayed into the groundwater well 10 through the washing hole 21. [ The pressure P and the pressure P are supplied into the washing chamber S1 in conjunction with the head variation measured by the head measuring unit 50 so that the pressure P and the flow rate Q of the washing gas, And a cleaning gas whose flow rate Q is adjusted is supplied.

That is, according to an embodiment of the present invention, the apparatus for cleaning a well-connected home and water head may measure the change in water level in the groundwater well through the water head measuring unit 50, (P) and the flow rate (Q) of the nitrogen gas are increased when the ground water level is higher than the reference water level by increasing or decreasing the pressure P and the flow rate Q of the gas. When the ground water level is lower than the reference water level, The pressure and the flow rate of the nitrogen gas as a scrubber discharged through the cleaning hole 21 of the level monitoring member 20 while injecting the cleaning gas into the pressure pulse such as lowering the flow rate P and the flow rate Q, So that the cleaning efficiency of the screen 12 in the groundwater well 10 due to the spraying of the nitrogen gas can be maximized.

As shown in FIGS. 1 to 5, when the groundwater well 10 is cleaned by the screen 12 provided at the lower end of the groundwater well 10, When the groundwater flows into the washing chamber S1 formed by the upper and lower packers 30 and 40 through the washing hole 21 of the leveling member 20, The water head measuring unit 50 formed in the washing chamber S1 measures the water head according to the level of the introduced ground water and provides it to the ground washing and supplying unit 60 electrically connected through the gas supplying line L1.

The washing and supplying unit 60 determines whether the groundwater level in the groundwater well 10 is higher or lower than the reference water level or the reference water level according to the water head information measured by the water head measuring unit 50, The pressure and the flow rate of the washing gas are adjusted and then supplied to the washing chamber S1 of the water level observation member 20. [

That is, when the groundwater level in the groundwater well 10 is a reference water level according to the measured head from the water head measuring unit 50 as shown in FIG. 2, And the reference flow rate Q to the cleaning chamber S1.

3, the reference level represents a state in which a part of the washing hole 21, which is vertically multi-stage formed in the water level observer 20, is locked by groundwater, and the reference pressure P) and the reference flow rate (Q) describe the pressure and flow rate controlled in response to the reference water level, which is affected by some groundwater levels.

The cleaning gas is discharged to the groundwater well 10 by the reference blowing pressure P100 so that the screen 12 of the groundwater well 10, Lt; / RTI >

If the groundwater level in the groundwater well 10 is a first water level lower than the reference water level according to the measured head from the water head measuring unit 50 as shown in FIG. 3, the wash supply unit 60 The cleaning gas is supplied to the cleaning chamber S1 by the first pressure P1, P> P1 and the first flow rate Q1, Q> Q1, which are lower than the set reference pressure P and the reference flow rate Q.

Here, the first water level is a state in which the washing holes 21, which are vertically multi-stage formed in the water level observing member 20, are not all immersed by the ground water, and the first pressure P1 and the first flow rate Q1) describes the pressure and flow rate that are adjusted to a low level corresponding to the first level that is not affected by the groundwater level at all.

Accordingly, in the washing hole 21 of the washing chamber S1, the washing gas is blown out to the groundwater well 10 by the first blowing pressure P200, and the screen of the groundwater well 10, 12 may be washed.

On the other hand, if the groundwater level in the groundwater well 10 is a second water level higher than the reference water level, as shown in FIG. 4, attached to the water head measured by the water head measuring unit 50, The cleaning gas is supplied to the cleaning chamber S1 by the second pressure P2 and P2> P and the second flow rate Q2 and Q2> Q, which are increased from the reference pressure P and the reference flow rate Q, respectively.

Here, the second water level is a state in which all the washing holes 21 formed in the upper and lower stages of the water level observer 20 are all submerged by groundwater, and the second pressure P2 and the second flow rate Q2 ) Is to account for highly regulated pressures and flows in response to the second level, which is influenced by many groundwater levels.

Accordingly, in the washing hole 21 of the washing chamber S1, the washing gas is discharged to the groundwater well 10 by the second spraying pressure P300, and the screen of the groundwater well 10, 12 may be washed.

At this time, the first and second ejection pressures P200 and P300 of the cleansing gas are equal to the reference ejection pressure P100 ejected to the screen 12 of the groundwater well 10 through the cleansing hole 21 The pressure of the cleaning gas ejected through the cleaning hole 21 is maintained equal to the reference ejection pressure P100 in accordance with the variation of the groundwater level. To maximize the cleaning effect on the screen 12, while maintaining the pressure at or above the reference ejection pressure P100.

Meanwhile, as described above, the cleaning gas is blown out through the cleaning hole 21 to remove the contaminants from the screen 12 on which the groundwater flows, as well as the inner circumferential surface of the groundwater tank 10, The underwater motor pump 11 is operated in the groundwater conduit 10 and the pollutant is discharged from the operation of the underwater motor pump 11 to the ground through the discharge line, The washing operation for the groundwater well 10 is terminated.

While the present invention has been described in connection with the accompanying drawings, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the invention.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit and scope of the invention as defined by the appended claims. It is to be understood that such changes and modifications are within the scope of the claims.

10; Groundwater observation 11; Underwater motor pump
12; Screen 20; Water level observation member
21; Washing ball 30; Upper packer
40; Lower packer 50; Head of water measurement
60; Cleaning supply section S1; Washing chamber

Claims (8)

delete delete delete (a) measuring the head of water head measurement from a water level observing member fixedly installed inside the groundwater well; (b) determining whether the groundwater level in the groundwater well is higher or lower than the reference water level or the reference water level from the water head measurement measured from step (a); (c) According to the result of the step (b), the washing and supplying unit adjusts the pressure and flow rate of the washing gas from the variation of the groundwater level, supplies the washing gas to the washing chamber of the water level observation member, Washing the screen of the groundwater well by spraying through a washbowl; And (d) operating the submersible motor pump when the pollutant removed through washing from the step (c) is accumulated on the lower side of the groundwater well, discharging the pollutant to the ground through the discharge line; ≪ / RTI >
In the step (c), if the reference level is determined as a result of the determination in the step (b), the cleaning supply unit supplies the cleaning gas to the cleaning chamber with the set reference pressure and the reference flow rate, Spraying a gas to wash the screen of the groundwater well; As a result of the determination in the step (b), if the first water level is lower than the reference water level, the cleaning supply unit supplies the cleaning gas to the cleaning chamber with the set reference pressure and the first flow rate reduced from the reference flow rate, Cleaning the screen of the groundwater well by ejecting the washing gas with a first blowing pressure through the ball; And a second water level higher than the reference water level as a result of the determination in the step (b), the cleaning supply unit supplies the cleaning gas to the cleaning chamber at a second pressure and a second flow rate that are higher than the reference pressure and the reference flow rate, Cleaning the screen of the groundwater well by ejecting the washing gas with a second blowing pressure through the washing hole of the washing chamber; Further comprising the steps of: (a) removing the wells from the wells; delete 5. The method of claim 4,
Wherein the reference water level is a state in which a part of the wash water which is vertically formed in the water level observer member is locked by the ground water,
Wherein the first water level is a state in which the washing holes formed in the upper and lower stages of the water level observer are not immersed by the ground water,
Wherein the second water level is a state in which the washing holes formed in the upper and lower stages of the water level observing member are all submerged by the groundwater. The method according to claim 6,
The reference pressure and the reference flow rate are a pressure and a flow rate adjusted in response to a reference water level that is affected by a part of groundwater level,
Wherein the first pressure and the first flow rate are a pressure and a flow rate which are adjusted to be low in correspondence with the first water level which is not affected by the groundwater level at all,
Wherein the second pressure and the second flow rate are a pressure and a flow rate that are highly regulated corresponding to the second water level to be influenced by many groundwater levels. 8. The method of claim 7,
Wherein the first and second ejection pressures of the cleansing gas are equal to or equal to a reference ejection pressure ejected to the screen of the groundwater well through the cleansing ball, Cleaning method.

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