KR101796999B1 - Transparent Panel Deposing Anti-Wearing Layer and Method for Deposing Anti-Wear Layer on The Same - Google Patents

Abstract

The present invention relates to a method of depositing a wear resistant layer of a transparent plate and a transparent plate on which a wear resistant layer having improved durability is deposited. According to an embodiment of the present invention, a transparent synthetic resin base, An abrasion-resistant layer deposited on the functional layer, an abrasion-resistant layer formed between the base and the functional layer, and a bonding layer formed between the functional layer and the abrasion-resistant layer and formed through a pretreatment including a plurality of plasma treatments, Is provided.

Description

[0001] The present invention relates to a method for depositing a wear resistant layer on a transparent plate and a transparent plate on which a wear resistant layer is deposited,

The present invention relates to a method of depositing a wear resistant layer of a transparent plate and a transparent plate on which a wear resistant layer having improved durability is deposited.

Cars and buildings use clear glass for mining and visibility.

Among these glasses, glass used for automobiles must continuously withstand ultraviolet rays and infrared rays, and endure vibration continuously applied during driving. In particular, it must withstand the impacts caused by automobile accidents, In some cases.

In recent years, there has been a need to reduce the weight of a vehicle in order to increase the fuel consumption of a vehicle. However, there is a problem in that it is difficult to reduce the weight of the vehicle in order to meet the limitations and necessary requirements of the glass material.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and it is an object of the present invention to provide a transparent plate which is lightweight and satisfies various conditions.

The problems of the present invention are not limited to the above-mentioned problems, and other problems not mentioned can be clearly understood by those skilled in the art from the following description.

According to an embodiment of the present invention, there is provided a method of manufacturing a semiconductor device, comprising the steps of: forming a base of a transparent synthetic resin material, a functional layer deposited on the base, an antiwear layer deposited on the functional layer, And a bonding layer formed through a pretreatment including a plurality of plasma treatments.

According to another embodiment of the present invention, there is provided a plasma processing apparatus comprising: a base made of a transparent synthetic resin material; an abrasion-resistant layer deposited on the base; a bonding layer formed between the base and the abrasion- A transparent plate on which an abrasion-resistant layer containing a layer is deposited can be provided.

The abrasion resistant layer may be formed by depositing SiC or SiOC.

The bonding layer may be formed on the surface of the functional layer through a pretreatment including a first plasma treatment using a first gas and a second plasma treatment using a second gas.

The functional layer may include an ultraviolet blocking layer blocking ultraviolet rays.

The UV blocking layer may be formed of a silicon nitride (SiNx) layer formed on the surface of the base.

The ratio (Si / N) of silicon (Si) to nitrogen (N) of the silicon nitride layer may range from 0.9 to 2.0.

The first gas may be argon, and the second gas may be a mixed gas of hydrogen and nitrogen.

The first gas may be argon, and the second gas may be a mixed gas of oxygen and nitrogen.

The first gas may be argon, and the second gas may be oxygen.

According to an embodiment of the present invention, there is provided a method of depositing an inner layer of a transparent plate, the method comprising: a chamber bringing a base of a transparent material into a chamber; a first gas injected into the chamber into which the base is introduced; A first pretreatment step of modifying a surface of a base introduced into the chamber, the first pretreatment step including a second plasma treatment step of injecting a second gas after the first plasma treatment step and plasma treatment, A first plasma processing step of plasma-treating the first functional layer after injecting a first gas into a chamber in which the functional layer is formed; A second pre-treatment step of injecting a second gas after the first plasma treatment step and then performing a plasma treatment on the second plasma treatment step, After the system, the wear-resistant layer deposition method of the transparent plate material comprising a deposition step for depositing a wear-resistant layer abrasion resistant layer is provided.

According to another embodiment of the method for depositing the inner layer of the transparent plate of the present invention, the method includes the steps of: bringing a base of a transparent material into a chamber; injecting a first gas into the chamber into which the base is introduced; A pretreatment step of reforming a surface of a base introduced into the chamber, the pretreatment step including a first plasma processing step of performing a plasma processing after injecting a second gas after the first plasma processing step, A step of depositing an abrasion-resistant layer after the pretreatment of the surface of the abrasion-resistant layer is performed, and a step of depositing a wear-resistant layer.

The first gas may be argon, and the second gas may be a mixed gas of hydrogen and nitrogen.

The first gas may be argon, and the second gas may be a mixed gas of oxygen and hydrogen.

The first gas may be argon, and the second gas may be oxygen.

The functional layer deposition step may include a gas injection step of injecting SiH4 and N2 at a flow rate of 1.5 to 2.5 into the chamber, and a deposition step of depositing SiH4 and N2 injected into the chamber as a silicon nitride layer on the base .

According to the deposition method of the wear resistant layer of the transparent plate and the transparent plate in which the abrasion resistant layer is deposited, the following effects can be obtained.

First, as a transparent plate, lightweight polycarbonate material is used instead of heavy weight glass, so that it is light in weight, so when applied to the window of a vehicle, the fuel economy of the vehicle is improved, have.

Second, the shape can be formed more easily by using a polycarbonate material having good processability instead of glass.

Thirdly, when the abrasion-resistant layer and the ultraviolet barrier layer are deposited, the bonding layer is formed through the two pretreatment processes, and then the durability of the deposited layer can be remarkably increased.

The effects of the present invention are not limited to the effects mentioned above, and other effects not mentioned can be clearly understood by those skilled in the art from the description of the claims.

The foregoing summary, as well as the detailed description of the preferred embodiments of the present application set forth below, may be better understood when read in conjunction with the appended drawings. For the purpose of illustrating the invention, there are shown preferred embodiments in the figures. It should be understood, however, that this application is not limited to the precise arrangements and instrumentalities shown.
1 is a cross-sectional view illustrating a transparent plate on which a wear resistant layer is deposited according to an embodiment of the present invention;
2 is a graph showing ultraviolet and visible light transmittances according to a flow rate ratio of SiH4 and N2 supplied to the chamber;
3 is a graph showing the ratio of Si to N deposited on the base (Si / N) according to the flow rate ratio of SiH4 and N2 supplied to the chamber;
4 is a cross-sectional view illustrating a transparent plate on which a wear resistant layer is deposited according to another embodiment of the present invention;
5 is a flow chart showing one embodiment of a method for depositing a wear resistant layer of a transparent plate of the present invention;
6 is a table showing the durability of deposition of the abrasion resistant layer according to the output of the pretreatment stage and the kind of reaction gas;
7 is a flowchart showing another embodiment of the method for depositing the wear resistant layer of the transparent plate of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. In describing the present embodiment, the same designations and the same reference numerals are used for the same components, and further description thereof will be omitted.

The first embodiment of the transparent plate on which the wear resistant layer according to the present embodiment is deposited includes the base 110, the functional layer 120, the wear resistant layer 130, and the bonding layer 140, . ≪ / RTI >

The base 110 may be made of a transparent synthetic resin material, and in this embodiment, the base 110 is formed of a polycarbonate material.

The functional layer 120 may be deposited on the base 110 and may function as a layer that performs various functions. For example, it can block the infrared rays and cut off the ultraviolet rays.

The abrasion-resistant layer 130 may be deposited on the functional layer 120, and SiOC or SiC may be deposited on the abrasion-resistant layer. The abrasion resistant layer 130 may also be classified as a layer that performs a function different from that of the functional layer 120 in the description of the present embodiment although it may also belong to a functional layer as a layer that performs an abrasion resistance function.

A bonding layer 140 may be formed between the base 110 and the functional layer 120 and between the functional layer 120 and the wear resistant layer 130.

The bonding layer 140 is formed to increase the durability of deposition of the layer to be deposited, and may be formed through a plurality of plasma treatments.

Meanwhile, the functional layer 120 may be an ultraviolet blocking layer for blocking ultraviolet rays.

When the transparent plate on which the wear resistant layer 130 of this embodiment is deposited is applied to a window of a vehicle, there is a need to appropriately block the ultraviolet rays and properly transmit the visible rays.

In this embodiment, the ultraviolet barrier layer may be a silicon nitride (SiNx) layer formed on the surface of the base.

The ratio of silicon (Si) to nitrogen (N) deposited on the ultraviolet blocking layer may be 0.9 to 2.0, preferably 1.3 to 1.5, in order to satisfy both of the ultraviolet shielding performance and the visible light transmittance described above. 1.5. ≪ / RTI >

When the ultraviolet ray blocking layer is laminated on the base 110, the base 110 is placed in the plasma chamber and then laminated using plasma. At this time, the gas supplied into the chamber is a mixed gas of SiH4 and N2 Lt; / RTI >

FIG. 2 is a graph showing the transmittance of the ultraviolet barrier layer stacked on the base 110 according to the flow rate of SiH 4 and N 2 gases supplied. In the graph, 400 nm or less is the ultraviolet ray region, and 400 nm or more is the visible ray region.

As described above, when the transparent plate on which the abrasion-resistant layer of this embodiment is deposited is applied to a vehicle window, the visible rays must be appropriately transmitted while appropriately shielding the ultraviolet rays.

As shown in the graph of FIG. 2, when the flow rate ratio of SiH4 and N2 gas is 6: 3, it is understood that ultraviolet rays are shielded appropriately while visible light is appropriately transmitted.

3 is a graph showing the ratio (Si / N) of silicon (Si) to nitrogen (N) deposited on the ultraviolet barrier layer () according to the flow rate ratio of supplied SiH4 and N2 gases.

As described above, when the flow rate ratio of SiH4 and N2 gas is about 6: 3, that is, about 2, the ultraviolet rays are shielded appropriately while the visible rays are appropriately transmitted. At this time, The ratio of nitrogen (N) is within the range of 0.9 to 2.0, more preferably 1.3 to 1.5.

The band gap at this time is 2.5 to 3.2 ev, more preferably 2.8 ev.

A coupling layer 140 may be formed between the base 110 and the functional layer 120.

As described above, the bonding layer 140 is a layer for increasing the durability of deposition of a layer to be deposited. The bonding layer 140 may include a first plasma treatment using a first gas and a second plasma treatment using a second gas on the surface of the base 110, And may be formed through a pretreatment process including a plasma treatment.

At this time, the first gas may be argon, and the second gas may be a mixture gas of hydrogen and nitrogen. Alternatively, the second gas may be a mixed gas of oxygen and hydrogen. Alternatively, the second gas may be oxygen.

In the present invention, the second gas is not limited to the above example, and various gases such as nitrogen or hydrogen may be applied.

That is, after the first plasma treatment is performed on the base 110 using a first gas such as argon, the second plasma treatment is performed using the second gas, and then the functional layer 120, which is the ultraviolet blocking layer, Stacked.

The functional layer 120 is strongly stacked on the base 110 by the bonding layer 140 formed through the first plasma treatment and the second plasma treatment to improve the durability of lamination.

The functional layer 120 may include an infrared ray blocking layer for blocking infrared rays. The infrared ray blocking layer may be formed by sputtering silver (Ag) or aluminum (Al).

Further, the infrared-ray shielding layer and the ultraviolet-shielding layer may be repeatedly laminated to form a plurality of layers.

On the other hand, the wear resistant layer 130 may be deposited on the functional layer 120.

The bonding layer 140 may be formed between the wear resistant layer 130 and the functional layer 120 to improve the durability of the wear resistant layer 130.

The bonding layer 140 may be formed between the base 110 and the functional layer 120 and between the functional layer 120 and the wear resistant layer 130.

The abrasion resistant layer 130 may be formed by depositing SiC or SiOC as a layer having a strong abrasion or scratches, and may be formed on the outermost layer among a plurality of layers formed on the base 110. [

Therefore, since the wear-resistant layer 130 is formed on the outermost layer among the plurality of layers stacked on the base 110, it can be more resistant to scratches and abrasion. In addition, since the abrasion resistant layer 130 is bonded by the bonding layer formed through the plasma treatment a plurality of times, the durability of the deposition can be improved.

Meanwhile, the transparent plate on which the wear-resistant layer is deposited according to the second embodiment of the present invention may include a base 210, a bonding layer 240 and an abrasion-resistant layer 230 as shown in FIG. 4 .

Since the base 210 and the abrasion-resistant layer 230 are the same as those of the first embodiment, description thereof will be omitted. However, in the above-described embodiment, the transparent plate on which the abrasion-resistant layer is deposited is formed between the base 110 and the functional layer 120, the wear-resistant layer 130, between the base 110 and the functional layer 120, The wear resistant layer 230 may be formed on the base 210 in place of the functional layer 130 in the present embodiment. The deposition will be described as an example.

A wear resistant layer 230 is deposited on the base 210 and a bonding layer 240 is formed between the base 210 and the wear resistant layer 230. Of course, functional layers for performing various functions may be stacked on the outer side of the abrasion resistant layer 230.

The first embodiment of the method for depositing the wear resistant layer of the transparent plate of the present invention will now be described.

5, the method of depositing a wear resistant layer of a transparent plate according to the present embodiment includes a chamber bring-in step S110, a first pre-processing step S120, a functional layer deposition step S130, a second pre- () And a wear resistant layer deposition step ().

The bringing-in step (S110) is a step of bringing the base 110 made of a transparent material into the chamber. The base 110 may be a plate made of transparent synthetic resin. In this embodiment, polycarbonate is used as an example.

The first preprocessing step S120 may include a first plasma processing step S122 and a second plasma processing step S124 for modifying the surface of the base 110 brought into the chamber .

The first plasma processing step S122 is a step of plasma processing after injecting a first gas into the chamber in which the base 110 is located.

At this time, the first gas may be argon (Ar), and the first plasma processing step (S122) may be a high density plasma (HDP) method.

The second gas may be a mixed gas of hydrogen and nitrogen or a mixed gas of oxygen and hydrogen or oxygen. Of course, various gases may be applied to the second gas. In the second plasma processing step (S124), a high density plasma (HDP) method may also be applied.

In this case, in the first plasma processing step S122 and the second plasma processing step S124, the flow rate of the first gas and the second gas may be 10 to 50 sccm, and in this embodiment, Let's take an example as an example.

In the first plasma processing step S122 and the second plasma processing step S124, each plasma reaction time may be 30 to 240 seconds. In the present embodiment, the plasma reaction time is 60 to 90 seconds. .

In addition, in the first plasma processing step (S122) and the second plasma processing step (S124), the output (MW) of the plasma may be 1.5 KW to 1.7 or more. This is because if the output of the plasma is too low, the deposition may not be performed properly, or if the output is too high, the base 110 may be damaged.

FIG. 6 is a table showing the durability of the deposition layer according to the output of the pretreatment step and the kind of reaction gas.

In the table of FIG. 6, X failed in the adhesion test, passes the adhesion test, failed in the thermal durability test, and O passed both the adhesion strength test, the thermal durability test and the domestic test.

The adhesion test is a test to check whether or not a defect such as peeling occurs on the surface while attaching the box tape to the surface of the deposition layer.

The thermal durability test confirms the heat resistance of the laminated layer, and is a test to check whether a defect or deformation occurs after being left at 90 degrees Celsius for 28 days.

In addition, the internal water test was conducted for 2 hours in boiling water, and after 10 cycles of 4 hours at 90 ° C and 40 ° C at 40 ° C in a relative humidity of 80%, it was checked whether defects or deformation occurred It is a test.

In the first pretreatment step (S120), the first gas to the second gas were adjusted to a flow rate of 10 sccm, and the plasma reaction time was between 60 and 90 seconds.

As can be seen from the table in FIG. 5, when the output was low, most of the reaction gases did not pass the test, and when the output was high (1.7 kW), significant results were obtained in some kinds of gases.

More specifically, even when the output is 1.7 kW, when only the first plasma treatment step S122 is performed with only the first gas without the second gas, the test can not be passed regardless of the kind of the gas, and the first plasma treatment Argon (Ar) is applied in the first plasma processing step in the example in which both the step S122 and the second plasma processing step (S124) are performed and the oxygen (O2) or nitrogen (N2) is applied in the second plasma processing step (S124) Good results are obtained when hydrogen (H2), a mixed gas of oxygen and hydrogen (O2 + H2), and a mixed gas of hydrogen and nitrogen (N2 + H2) are applied.

The functional layer deposition step S130 may be performed on the bonding layer 140 formed on the base 110 through the first pretreatment step.

The functional layer 120 may be an ultraviolet blocking layer on which silicon nitride (SiNx) is deposited.

The functional layer deposition step S130 includes a gas injection step S132 for injecting SiH4 and N2 into the chamber in which the base 110 is located, a deposition step for depositing the injected gas on the base with a silicon nitride layer (S134).

The ratio of the flow rate (sccm) of SiH4: N2 injected in the gas injecting step (S132) may be 6: 3.

Alternatively, the ratio of SiH4 to N2 flow rate (sccm) may range from 1.5 to 2.5.

This is because, as described above, since a suitable ultraviolet ray blocking rate and an appropriate visible ray tube ratio are both required, the band gap can be set to be 2.5 eV to 3.2 eV.

As described above, when the band gap is 2.5 to 3.2 eV, the ratio of Si / N deposited on the surface of the base is 0.9 to 2.0, and the ratio of SiH4 to N2 ranges from 1.5 to 2.5. Of course, the deposition ratio of Si / N may range from 1.3 to 1.5.

Also, after the SiH4 and N2 implantation is completed, the deposition step (S134) is performed so that SiH4 and N2 in the chamber can be stacked on the surface of the base 110 in the form of SiNx. At this time, a high-density plasma method can be used as a deposition method.

Also, a second pre-processing step (S140) of forming a bonding layer 140 on the functional layer 120 may be performed.

The bonding layer 140 formed on the functional layer 120 is the same as the bonding layer 140 formed on the base 110 described above.

In addition, after the second pre-treatment step (S150), the wear resistant layer deposition step S150 in which the wear resistant layer 130 is deposited may be performed.

The abrasion resistant layer 130 may be formed by depositing SiC or SiOC as described above. In the abrasion resistant layer deposition step S150, OMCTS (OctaMethylCycloTetraSiloxane) is applied as a silicon precursor, and helium (He ) May be applied. As the plasma gas, various gases such as argon (Ar), oxygen (O 2), nitrogen (N 2), hydrogen (H 2) and mixed gas of nitrogen and hydrogen can be used. Further, the plasma output (MW) may be 1.2 to 1.7 kW.

On the other hand, a bonding layer may be formed on the base 210, and an abrasion-resistant layer 230 may be deposited on the bonding layer 240, as in the second embodiment of the transparent plate on which the abrasion-resistant layer is deposited .

In this case, the method of depositing the wear resistant layer of the transparent plate may include a chamber bring-in step (S210), a pre-treatment step (S220) and a wear resistant layer deposition step (S230), as shown in FIG.

The chamber bring-in step S210 and the pre-processing step S220 may be substantially the same as the chamber bring-in step S110 and the first pre-processing step S120.

The wear resistant layer deposition step S230 is a step of depositing the wear resistant layer 230 on the bonding layer 240 formed through the preprocessing step S220. . ≪ / RTI >

It will be apparent to those skilled in the art that the present invention can be embodied in other specific forms without departing from the spirit or scope of the invention as defined in the appended claims. It is obvious to them. Therefore, the above-described embodiments are to be considered as illustrative rather than restrictive, and the present invention is not limited to the above description, but may be modified within the scope of the appended claims and equivalents thereof.

110: base 120: functional layer
130: wear resistant layer 140: bonding layer
S110: Chamber carry-in step S120: First pre-processing step
S122: First plasma processing step S124: Second plasma processing step
S130: functional layer deposition step S132: gas injection step
S134: deposition step S140: second plasma processing step
S150: deposition step of abrasion resistant layer

Claims (16)

delete delete delete delete delete delete delete delete delete delete Placing a base of a transparent material in a chamber;
A first plasma processing step of injecting a first gas into the chamber into which the base is loaded and then plasma processing the plasma; a plasma processing step of injecting a second gas different from the first gas after the first plasma processing step, A first pretreatment step of sequentially performing the first plasma treatment step and the second plasma treatment step to reform the surface of the base carried into the chamber,
A functional layer deposition step of depositing a functional layer including an ultraviolet blocking layer after the first pre-processing step;
A first plasma processing step of injecting a first gas into a chamber in which the functional layer is formed and then performing plasma processing; a second plasma processing step of injecting a second gas after the first plasma processing step and then performing a plasma processing; A second pre-processing step sequentially performing the first plasma processing step and the second plasma processing step, including the steps of:
An abrasion-resistant layer deposition step of depositing an abrasion-resistant layer after the second pre-treatment step;
Of the transparent substrate. Placing a base of a transparent material in a chamber;
A first plasma processing step of injecting a first gas into the chamber into which the base is loaded and then plasma processing the plasma; a plasma processing step of injecting a second gas different from the first gas after the first plasma processing step, 2 preprocessing step of sequentially performing the first plasma processing step and the second plasma processing step to reform the surface of the base carried into the chamber,
Depositing an abrasion resistant layer after the surface of the base is pretreated;
Of the transparent substrate. 13. The method according to claim 11 or 12,
Wherein the first gas is argon, and the second gas is a mixed gas of hydrogen and nitrogen. 13. The method according to claim 11 or 12,
Wherein the first gas is argon and the second gas is a mixed gas of oxygen and hydrogen. 13. The method according to claim 11 or 12,
Wherein the first gas is argon and the second gas is oxygen. 12. The method of claim 11,
The functional layer deposition step may include:
A gas injecting step of injecting SiH4 and N2 into the chamber at a flow rate of 1.5 to 2.5;
Depositing SiH4 and N2 implanted into the chamber with a silicon nitride layer on the base;
Of the transparent substrate.

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