KR101781197B1 - Photosesitive coating compositoin, low reflection film, and anti-reflective film - Google Patents
Photosesitive coating compositoin, low reflection film, and anti-reflective film Download PDFInfo
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- KR101781197B1 KR101781197B1 KR1020150108183A KR20150108183A KR101781197B1 KR 101781197 B1 KR101781197 B1 KR 101781197B1 KR 1020150108183 A KR1020150108183 A KR 1020150108183A KR 20150108183 A KR20150108183 A KR 20150108183A KR 101781197 B1 KR101781197 B1 KR 101781197B1
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- fluorine
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- photoreactive functional
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- C09D7/1216—
Abstract
The present invention relates to photopolymerizable compounds; Hollow silica particles; A fluorine-based compound containing a photoreactive functional group; And an antireflection film comprising a coating layer comprising a photopolymerization of a coating composition comprising a photopolymerization initiator.
Description
The present invention relates to an antireflection film, and more particularly to an antireflection film which has low mechanical properties such as abrasion resistance and scratch resistance together with a low reflectance and a high light transmittance and which does not significantly change appearance characteristics and mechanical properties even when exposed to an alkali Lt; / RTI >
Generally, a flat panel display device such as a PDP or an LCD is equipped with an antireflection film for minimizing reflection of light incident from the outside.
As a method for minimizing the reflection of light, a method in which a filler such as an inorganic fine particle is dispersed in a resin and is coated on a substrate film to impart irregularities (anti-glare: AG coating); A method of forming a plurality of layers having different refractive indexes on a base film to use interference of light (anti-reflection (AR coating)) or a method of mixing them.
In the case of the AG coating, the absolute amount of the reflected light is equivalent to a general hard coating, but a low reflection effect can be obtained by reducing the amount of light entering the eye by using light scattering through the irregularities. However, since the AG coating deteriorates the sharpness of the screen due to the surface irregularities, much research on AR coating has been conducted recently.
As the film using the AR coating, a multi-layer structure in which a hard coating layer (high refractive index layer), a low reflection coating layer, and the like are laminated on a substrate film has been commercialized. However, the method of forming a plurality of layers as described above is disadvantageous in that the interlayer adhesion force (interfacial adhesion) is weak and the scratch resistance is deteriorated by separately performing the steps of forming each layer.
Therefore, although much research has been conducted to reduce the absolute reflection amount of light incident from the outside and to improve the scratch resistance of the surface, the degree of improvement of the physical properties is insufficient.
An object of the present invention is to provide an antireflection film having mechanical properties such as excellent abrasion resistance or scratch resistance with low reflectance and high light transmittance, and which does not significantly change appearance characteristics and mechanical properties even when exposed to alkali.
In the present specification, photopolymerizable compounds; Hollow silica particles; A fluorine-based compound containing a photoreactive functional group; And a photopolymerization initiator; and a coating layer containing a photo-cured product of the coating composition.
An antireflection film according to a specific embodiment of the present invention will be described in more detail below.
In the present specification, a photopolymerizable compound is collectively referred to as a compound which, when irradiated with light, generates a polymerization reaction, for example, when visible light or ultraviolet light is irradiated.
Also, (meth) acrylate is meant to include both acrylate and methacrylate.
Also, the term "hollow silica particles" refers to silica particles derived from a silicon compound or an organosilicon compound, in which voids are present on the surface and / or inside of the silica particles.
According to one embodiment of the invention, a photopolymerizable compound; Hollow silica particles; A fluorine-based compound containing a photoreactive functional group; And a photopolymerization initiator; and a coating layer containing a photo-cured product of the coating composition.
The inventors of the present invention conducted research on an antireflection film and found that when a coating composition containing a fluorine-containing compound containing a photoreactive functional group and hollow silica particles is used, a low reflectance and a high light transmittance can be realized and mechanical properties such as abrasion resistance and scratch resistance The present inventors have confirmed through experiments that the antireflection film can improve the sharpness of the screen of a display device and can realize excellent mechanical properties, and completed the invention.
In particular, the antireflection film of this embodiment does not suffer any deterioration in mechanical properties such as reflectance or transmittance and mechanical properties such as abrasion resistance and scratch resistance even when exposed to alkali, so that the application of an additional protective film for protecting the external surface is omitted The production process can be simplified and the production cost can be reduced.
Specifically, the antireflection film of one embodiment does not significantly change appearance characteristics such as average reflectance and color, scratch resistance and the like even when exposed to an alkali, and for example, It is confirmed that the change in the physical properties is less than 10% or 5% before and after the exposure to the alkali, and the physical-chemical change due to the alkali exposure is relatively small.
In the past, a method of adding various nanometer-sized particles (for example, particles of silica, alumina, zeolite or the like) to improve antiscratching properties of the antireflection film has been mainly attempted. However, There is a disadvantage that the effect of improving the scratch resistance is not sufficient.
On the other hand, the antireflection film includes a fluorine-based compound including the photoreactive functional group to realize a low reflectance and a high light transmittance, thereby securing mechanical properties such as excellent abrasion resistance or scratch resistance without deteriorating the sharpness of the screen of the display device And the performance or quality of the applied display device can be increased.
The fluorine-based compound may include at least one photoreactive functional group, and the photoreactive functional group means a functional group capable of participating in the polymerization reaction by irradiation of light, for example, by irradiation of visible light or ultraviolet light. The photoreactive functional group may include various functional groups known to be capable of participating in the polymerization reaction by irradiation of light. Specific examples thereof include a (meth) acrylate group, an epoxy group, a vinyl group or a thiol group. .
The fluorine-based compound containing the photoreactive functional group may have a fluorine content of 1 wt% to 20 wt%. If the content of fluorine in the fluorine compound containing the photoreactive functional group is too small , the fluorine component can not be sufficiently arranged on the surface of the coating layer obtained from the coating composition , so that it may be difficult to sufficiently secure physical properties such as alkali resistance. If the content of fluorine in the fluorine-containing compound containing the photoreactive functional group is too large, the surface characteristics of the coating layer obtained from the coating composition may be lowered, or the rate of occurrence of defective products may increase during the subsequent step for obtaining the final product.
The fluorine compound containing the photoreactive functional group may further contain silicon or a silicon compound. That is, the fluorine-based compound containing the photoreactive functional group may optionally contain silicon or a silicon compound, and specifically, the content of silicon in the fluorine-containing compound containing the photoreactive functional group may be 0.1 wt% to 10 wt% .
The silicon contained in the fluorine-containing compound containing the photoreactive functional group can prevent the haze from being generated in the coating layer obtained from the coating composition, thereby enhancing transparency. On the other hand, if the content of silicon in the fluorine compound containing the photoreactive functional group is too large, the alkali resistance of the coating layer or the antireflection film may be deteriorated.
The fluorine compound containing the photoreactive functional group may have a weight average molecular weight of 2,000 to 20,000. If the weight average molecular weight of the fluorine-containing compound containing the photoreactive functional group is too small, the antireflection film may not have sufficient alkali resistance. If the weight average molecular weight of the fluorine-containing compound containing the photoreactive functional group is too large, the antireflection film may not have sufficient durability and scratch resistance.
Specific examples of the fluorine-based compound containing the photoreactive functional group include: i) an aliphatic compound or an aliphatic cyclic compound in which at least one photoreactive functional group is substituted and at least one fluorine is substituted for at least one carbon; ii) a heteroaliphatic compound or heteroaliphatic ring compound substituted with at least one photoreactive functional group, at least one hydrogen substituted with fluorine and at least one carbon substituted with silicon; iii) a polydialkylsiloxane-based polymer (for example, a polydimethylsiloxane-based polymer) in which at least one photoreactive functional group is substituted and at least one fluorine is substituted for at least one silicon; iv) a polyether compound which is substituted by at least one photoreactive functional group and at least one of which is substituted by fluorine, or a mixture of at least two of i) to iv), or a copolymer thereof.
Meanwhile, the coating composition may contain 1 to 60 parts by weight of the fluorine-based compound containing the photoreactive functional group per 100 parts by weight of the photopolymerizable compound. When the fluorine-based compound containing the photoreactive functional group is added in excess to the photopolymerizable compound, the coating property of the coating composition may be lowered, or the coating layer obtained from the coating composition may not have sufficient durability or scratch resistance. Also, if the amount of the fluorine-based compound containing the photoreactive functional group is too small as compared with the photopolymerizable compound, the coating layer obtained from the coating composition may not have sufficient alkali resistance.
The photopolymerizable compound may comprise a monomer or oligomer comprising a (meth) acrylate or vinyl group. Specifically, the photopolymerizable compound may include monomers or oligomers containing one or more, or two or more, or three or more (meth) acrylates or vinyl groups.
Specific examples of the monomer or oligomer including (meth) acrylate include pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa Acrylate, trimethylolpropane tri (meth) acrylate, tripentaerythritol tri (meth) acrylate, tripentaerythritol tri (meth) acrylate, tripentaerythritol hexa Butylene glycol dimethacrylate, hexaethyl methacrylate, butyl methacrylate, or a mixture of two or more thereof, or a urethane-modified acrylate oligomer, an epoxy Acrylate oligomers, Thermal acrylate oligomer, Den laundry may include ticks acrylate oligomer, or a mixture of these two or more kinds. The molecular weight of the oligomer is preferably 1,000 to 10,000.
Specific examples of the monomer or oligomer containing the vinyl group include divinylbenzene, styrene or paramethylstyrene.
Meanwhile, the photopolymerizable compound may further include a fluorine-based (meth) acrylate-based compound in addition to the monomer or oligomer described above. When the fluorine-based (meth) acrylate compound is further included, the weight ratio of the fluorine-based (meth) acrylate based compound to the monomer or oligomer containing the (meth) acrylate or vinyl group is 0.1% to 10% .
Specific examples of the fluorine-based (meth) acrylate-based compound include at least one compound selected from the group consisting of the following formulas (11) to (15).
(11)
Wherein R 1 is a hydrogen group or an alkyl group having 1 to 6 carbon atoms, a is an integer of 0 to 7, and b is an integer of 1 to 3.
[Chemical Formula 12]
In the above formula (12), c is an integer of 1 to 10.
[Chemical Formula 13]
In the above formula (13), d is an integer of 1 to 11.
[Chemical Formula 14]
In Formula 14, e is an integer of 1 to 5.
[Chemical Formula 15]
In the above formula (15), f is an integer of 4 to 10.
On the other hand, the hollow silica particles mean silica particles having voids on the surface and / or inside of the particles. The hollow silica particles have a lower refractive index than hollow particles and can exhibit excellent antireflection properties.
The hollow silica particles may have a number average particle diameter of 10 to 100 nm, preferably 20 to 70 nm, more preferably 30 to 70 nm; The shape of the particles is preferably spherical, but may be irregular.
The hollow silica particles may be used alone or in combination with a hollow silica particle whose surface is not coated with a fluorine compound, the surface of which is coated with a fluorine compound. When the surface of the hollow silica particles is coated with a fluorine-based compound, the surface energy can be further lowered, so that the hollow silica particles can be more uniformly distributed in the coating composition, and the coating layer or anti- The durability and the scratch resistance can be further improved.
The method of coating the surface of the hollow silica particles with the fluorine compound can be widely used without any limitations, for example, the particle coating method and the polymerization method. For example, when the hollow silica particles and the fluorine- - gel reaction to bond the fluorine compound to the surface of the hollow silica particles through hydrolysis and condensation reaction.
The hollow silica particles may be contained in the composition in a colloidal state dispersed in a predetermined dispersion medium. The colloidal phase containing the hollow silica particles may contain an organic solvent as a dispersion medium.
At this time, the hollow silica may include a predetermined functional group repurified on the surface to be more easily dispersed in the organic solvent. Examples of the organic functional group substitutable on the surface of the hollow silica particles are not limited to a great degree. For example, the (meth) acrylate group, vinyl group, hydroxyl group, amine group, allyl group, epoxy group, hydroxyl group, isocyanate group, amine Group, fluorine, or the like may be substituted on the surface of the hollow silica.
The solid content of the hollow silica particles on the colloidal phase of the hollow silica particles may be determined in consideration of the content range of the hollow silica in the coating composition or the viscosity of the coating composition. For example, the solid content of the hollow silica particles The content may be from 5% by weight to 60% by weight.
Examples of the organic solvent in the dispersion medium include alcohols such as methanol, isopropyl alcohol, ethylene glycol and butanol; Ketones such as methyl ethyl ketone and methyl isobutyl ketone; Aromatic hydrocarbons such as toluene and xylene; Dimethylformamide. Amides such as dimethylacetamide and N-methylpyrrolidone; Esters such as ethyl acetate, butyl acetate and gamma-butylolactone; Ethers such as tetrahydrofuran and 1,4-dioxane; Or mixtures thereof.
The coating composition may include 10 to 360 parts by weight of the hollow silica particles per 100 parts by weight of the photopolymerizable compound. When the hollow particles are added in an excessive amount, the scratch resistance and abrasion resistance of the coating layer may be lowered due to a decrease in the content of the binder.
The photopolymerization initiator may be any compound known to be usable in the photocurable resin composition. The photopolymerization initiator may be a benzophenone based compound, an acetophenone based compound, a nonimidazole based compound, a triazine based compound, a oxime based compound, Mixtures of two or more of these may be used.
The photopolymerization initiator may be used in an amount of 1 to 100 parts by weight based on 100 parts by weight of the photopolymerizable compound. If the amount of the photopolymerization initiator is too small, a material that remains uncured in the photocuring step of the coating composition may be released. If the amount of the photopolymerization initiator is too large, the unreacted initiator may remain as an impurity or the crosslinking density may be lowered, so that the mechanical properties of the produced film may be deteriorated or the reflectance may be greatly increased.
On the other hand, the coating composition may further include an organic solvent.
Non-limiting examples of the organic solvent include ketones, alcohols, acetates and ethers, and mixtures of two or more thereof.
Specific examples of such an organic solvent include ketones such as methyl ethyl ketone, methyl isobutyl ketone, acetylacetone or isobutyl ketone; Alcohols such as methanol, ethanol, n-propanol, i-propanol, n-butanol, i-butanol or t-butanol; Ethyl acetate, i-propyl acetate, or polyethylene glycol monomethyl ether acetate; Ethers such as tetrahydrofuran or propylene glycol monomethyl ether; Or a mixture of two or more thereof.
The organic solvent may be added to the coating composition at the time of mixing the components contained in the coating composition or may be added to the coating composition while the components are dispersed or mixed in the organic solvent. If the content of the organic solvent in the coating composition is too low, the flowability of the coating composition may be deteriorated, resulting in defects such as streaks in the finally produced film. In addition, when the organic solvent is added in an excess amount, the solid content is lowered and the coating and film formation are not sufficiently performed, so that the physical properties and surface characteristics of the film may be deteriorated, and defects may occur during the drying and curing process. Accordingly, the coating composition may comprise an organic solvent such that the concentration of the total solids of the components involved is from 1 wt% to 50 wt%, or from 2 wt% to 20 wt%.
The photopolymerizable compound; Hollow silica particles; A fluorine-based compound containing a photoreactive functional group; And a photopolymerization initiator; or a coating layer containing the photopolymerization of the antireflection film containing the same Appearance characteristics such as average reflectance and color and scratch resistance show a not so large rate of change even when exposed to alkaline, for example, within 10% or within 5%, and the physical-chemical change due to alkali exposure is relatively small .
The coating layer can be obtained by applying the coating composition on a predetermined substrate and photo-curing the coated product. The specific type and thickness of the substrate are not limited to a great extent, and descriptions known to be used in the production of a low reflection film or an antireflection film can be used without any particular limitation.
For example, a bar coating method such as a Meyer bar method, a gravure coating method, a 2 roll reverse coating method, a vacuum slot die coating method, 2 roll coating method or the like can be used.
The coating layer may have a thickness of 1 nm to 300 nm, or 50 nm to 200 nm. Accordingly, the thickness of the coating composition applied on the predetermined substrate may be about 1 nm to 300 nm, or 50 nm to 200 nm.
The coating layer may be a low refractive layer of an antireflection film.
In the step of photo-curing the coating composition, ultraviolet rays or visible rays having a wavelength of 200 to 400 nm may be irradiated, and an exposure dose of 100 to 4,000 mJ / cm 2 is preferable. The exposure time is not particularly limited, and can be appropriately changed according to the exposure apparatus used, the wavelength of the irradiation light, or the exposure dose.
In the step of photo-curing the photocurable coating composition, nitrogen purging or the like may be applied to apply nitrogen atmosphere conditions.
The coating layer may have an average reflectance of 2% or less, or 1% or less.
As described above, the antireflection film of the above-mentioned embodiment includes the photopolymerizable compound; Hollow silica particles; A fluorine-based compound containing a photoreactive functional group; And a photopolymerization initiator; and a coating layer containing a photopolymerization product of the coating composition.
More specifically, the coating layer comprises a binder resin comprising a crosslinked polymer between the photopolymerizable compound and a fluorine-containing compound containing a photoreactive functional group; And hollow silica particles dispersed in the binder resin.
As the above-mentioned coating composition is photocured, the photopolymerizable compound and the fluorine compound containing the photoreactive functional group may cause a polymerization reaction or a crosslinking reaction. Accordingly, the coating layer may include a binder resin including a crosslinked polymer between a photopolymerizable compound and a fluorine-based compound containing a photoreactive functional group.
The hollow silica particles may be dispersed in the binder resin. The hollow silica particles may also be in a state of being bonded to the binder resin by a cross-linking reaction or a polymerization reaction, or may be mixed with the binder resin and dispersed.
The anti-reflection film may further include a hard coating layer bonded on one side of the coating layer.
The anti-reflection film may further include a substrate bonded to the other surface of the hard coat layer.
According to the present invention, it is possible to provide an antireflection film having mechanical properties such as excellent abrasion resistance or scratch resistance, capable of realizing a low reflectance and a high light transmittance, exhibiting excellent mechanical properties while enhancing the clarity of a screen of a display device.
Even when the antireflection film is exposed to an alkali, the appearance characteristics such as the reflectance or the light transmittance and the mechanical properties such as abrasion resistance or scratch resistance are not greatly reduced. Therefore, the application of the additional protective film for protecting the external surface can be omitted, Can be simplified and the production cost can be reduced.
The invention will be described in more detail in the following examples. However, the following examples are illustrative of the present invention, and the present invention is not limited by the following examples.
< Manufacturing example >
Production Example 1 : Preparation of Hard Coating Solution Composition
20 weight% of dipentaerythritol pentaacrylate, 20 weight% of pentaerythritol triacrylate, 2 weight% of Irgacure-184, 3 weight% of nano silica, 30 weight% of methyl ethyl ketone and 25 weight% A composition was prepared.
Production Example 2 To 4: Preparation of coating composition for producing antireflection film
The ingredients of Table 1 below were mixed and diluted to a solids content of 5% by weight in MIBK (methyl isobutyl ketone) solvent.
37 parts by weight
27.5 parts by weight
11 parts by weight
* The content in Table 1 is based on 100 parts by weight of dipentaerythritol pentaacrylate
1) RS907 (manufactured by DIC): a fluorine compound containing a photoreactive functional group is diluted to a solid content of 30% by weight in a MIBK solvent
2) RS922 (manufactured by DIC): a fluorine compound containing a photoreactive functional group and a small amount of Si component are diluted to a solid content of 30% by weight in a MIBK solvent
3) F444 (manufactured by DIC): fluorine-based compound not containing photoreactive functional group (solid content 100%)
4) THRULYA 4320 (catalysable product): The hollow silica dispersion (solid content 20% by weight in MIBK solvent)
< Example And Comparative Example : Preparation of antireflection film >
1. Preparation of Hard Coating Film
The hard coating liquid composition obtained in Preparation Example 1 was coated on a triacetylcellulose film with a # 10 mayer bar and dried at 90 ° C for 1 minute. The dried material was irradiated with ultraviolet rays of 150 mJ / cm 2 to prepare a hard coating film having a thickness of 10 탆.
2. Preparation of anti-reflection film Example 1 to 2 and Comparative Example )
On the hard coating film thus prepared, the coating compositions obtained in Production Examples 2 to 4 were coated with # 3 mayer bar and dried at 60 ° C for 1 minute. Then, the dried material was irradiated with ultraviolet rays of 180 mJ / cm 2 under a nitrogen purge to form a coating layer having a thickness of 110 nm (Examples 1 to 2 and Comparative Examples).
< Experimental Example : Measurement of physical properties of antireflection film>
The following items were tested on the antireflection films obtained in Examples 1 to 2 and Comparative Examples.
1. Alkali Pretreatment
The antireflection films obtained in Examples 1 to 2 and Comparative Examples were immersed in an aqueous solution of NaOH at 60 ° C diluted with distilled water to 10% for 1 minute, washed with water, and then washed with water.
2. Reflectance measurement
At the point before and after the pretreatment, the visible reflectance was measured using a Solidspec 3700 (SHIMADZU) to measure the minimum reflectance.
3. Color coordinate value (b *)
At the time before and after the pretreatment, the color coordinate values were measured at a wavelength measured using Solidspec 3700 (SHIMADZU).
4. Scratch resistance Measure
At the time before and after the pretreatment, the surface of the antireflection film obtained in Examples 1 to 2 and Comparative Example was rubbed by reciprocating ten times at a speed of 24 rpm while applying a load to the steel wool. The maximum load at which one or less scratches of 1 cm or less observed with the naked eye was observed was measured.
5. Surface fluorine content
The ratio of fluorine atoms existing on the surface of the antireflection film obtained in Examples 1 to 2 and Comparative Example was measured using the ESCA method.
As shown in Table 2, the antireflection films of Examples 1 and 2 were found to have not only a high surface fluorine content but also no significant change in the average reflectance and color coordinate values even before and after alkali pretreatment as compared with Comparative Examples .
Further, it was confirmed that the antireflection films of Examples 1 and 2 have more excellent scratch resistance or scratch resistance than the comparative example.
Accordingly, even when the antireflection film of the embodiment is exposed to the alkali in the manufacturing process of the display device, the appearance properties such as the reflectance or the light transmittance and the mechanical properties such as abrasion resistance or scratch resistance are not greatly reduced. Therefore, The application of the protective film or the coating layer can be omitted, thereby simplifying the production process and reducing the production cost.
In addition, the antireflection film of the embodiment has a relatively low reflectance and a high light transmittance, does not lower the sharpness of the screen of the display device, secures mechanical properties such as excellent abrasion resistance or scratch resistance, And improve the quality.
Claims (15)
Wherein the fluorine-based compound containing the photoreactive functional group has a fluorine content of 1 wt% to 20 wt%.
Wherein the photoreactive functional group contained in the fluorine-based compound comprises a (meth) acrylate group, an epoxy group, a vinyl group (Vinyl), or a thiol group.
Wherein the fluorine-based compound containing the photoreactive functional group further comprises 0.1 to 10% by weight of silicon.
The fluorine-based compound containing the photoreactive functional group may be selected from i) an aliphatic compound or aliphatic cyclic compound in which at least one photoreactive functional group is substituted and at least one fluorine is substituted for at least one carbon; ii) a heteroaliphatic compound or heteroaliphatic ring compound substituted with at least one photoreactive functional group, at least one hydrogen substituted with fluorine and at least one carbon substituted with silicon; iii) a polydialkylsiloxane-based polymer (for example, a polydimethylsiloxane-based polymer) in which at least one photoreactive functional group is substituted and at least one fluorine is substituted for at least one silicon; And iv) at least one polyether compound substituted with at least one photoreactive functional group and at least one hydrogen substituted with fluorine.
Antireflection film.
The fluorine-based compound containing the photoreactive functional group has a weight average molecular weight of 2,000 to 20,000.
Wherein said photopolymerizable compound comprises a monomer or oligomer comprising a (meth) acrylate or vinyl group.
Wherein the hollow silica particles have a number average particle diameter of 10 to 100 nm.
Wherein the photopolymerization initiator comprises at least one selected from the group consisting of a benzophenone-based compound, an acetophenone-based compound, a nonimidazole-based compound, a triazine-based compound, and an oxime-based compound.
Wherein the coating layer comprises a binder resin comprising a crosslinked polymer between the photopolymerizable compound and a fluorine compound containing a photoreactive functional group; And hollow silica particles dispersed in the binder resin.
Wherein the coating layer has an average reflectance of 2% or less.
Wherein the coating layer has a thickness of 1 nm to 300 nm.
And a hard coating layer bonded on one side of the coating layer.
Further comprising a substrate bonded to the other surface of the hard coat layer.
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| KR1020140103635 | 2014-08-11 | ||
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| WO2020184865A1 (en) * | 2019-03-12 | 2020-09-17 | 주식회사 엘지화학 | Anti-reflective film, polarizing plate, and display device |
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| KR101889956B1 (en) | 2016-03-09 | 2018-08-20 | 주식회사 엘지화학 | Anti-reflective film |
| WO2017155336A1 (en) * | 2016-03-09 | 2017-09-14 | 주식회사 엘지화학 | Antireflective film |
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| KR101951863B1 (en) * | 2016-03-14 | 2019-02-25 | 주식회사 엘지화학 | Anti-reflective film and display device |
| KR101889955B1 (en) * | 2016-03-14 | 2018-08-20 | 주식회사 엘지화학 | Anti-reflective film |
| KR101951864B1 (en) * | 2016-03-14 | 2019-02-25 | 주식회사 엘지화학 | Anti-reflective film and display device |
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| WO2017160027A1 (en) * | 2016-03-14 | 2017-09-21 | 주식회사 엘지화학 | Antireflection film |
| EP4024091A4 (en) * | 2020-03-16 | 2023-08-30 | LG Chem, Ltd. | Anti-refractive film |
| CN114685701A (en) * | 2022-05-09 | 2022-07-01 | 张启明 | Composite material supporting four-dimensional optical data storage and preparation method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2014077228A1 (en) * | 2012-11-14 | 2014-05-22 | 富士フイルム株式会社 | Photosensitive transfer material, substrate having photosensitive low refractive index transfer layer, method for producing photosensitive low refractive index transfer layer, method for forming permanent film, optical device and method for manufacturing optical device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2014077228A1 (en) * | 2012-11-14 | 2014-05-22 | 富士フイルム株式会社 | Photosensitive transfer material, substrate having photosensitive low refractive index transfer layer, method for producing photosensitive low refractive index transfer layer, method for forming permanent film, optical device and method for manufacturing optical device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020184865A1 (en) * | 2019-03-12 | 2020-09-17 | 주식회사 엘지화학 | Anti-reflective film, polarizing plate, and display device |
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| KR20160019367A (en) | 2016-02-19 |
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