KR101768537B1 - Device for controlling lithography and laser apparatus having dual bus - Google Patents
Device for controlling lithography and laser apparatus having dual bus Download PDFInfo
- Publication number
- KR101768537B1 KR101768537B1 KR1020150106999A KR20150106999A KR101768537B1 KR 101768537 B1 KR101768537 B1 KR 101768537B1 KR 1020150106999 A KR1020150106999 A KR 1020150106999A KR 20150106999 A KR20150106999 A KR 20150106999A KR 101768537 B1 KR101768537 B1 KR 101768537B1
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- motion
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3071—Process control means, e.g. for replenishing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Automation & Control Theory (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
An exposure laser apparatus control system for controlling an exposure laser apparatus, discloses a control system having an architecture that can be reused. The control system includes a server, a main controller, a driver, and an auxiliary controller. Depending on the performance of the required control system, the availability of the auxiliary control device and the data processing capabilities of the auxiliary control device may be determined. Even when one of the server, the main controller, the driving device, and the auxiliary control device is changed, the other devices can be reused. To effectively design such a control system, a dual bus is introduced.
Description
To a control apparatus for controlling an exposure laser apparatus.
Each part of the exposure laser apparatus having the exposure part and the laser part is moved or moved in position by the drive motor according to the purpose. However, the reliability of the exposure laser apparatus may be degraded if the respective drive motors of the exposure laser apparatus to operate with high precision are not operated in synchronization with each other, and there is a delay between drive signals for controlling the respective drive motors.
In order to precisely control each of the driving units of the exposure laser apparatus, a method of feedback controlling information about each constituent part of the exposure laser apparatus, for example, an encoder, a motor, a laser interferometer, . However, this feedback information may have a very large amount of data. According to the prior art, there is a problem in that a control system for controlling each driving part of the exposure laser device has a bus structure which is not suitable for processing such a large amount of data have.
Further, there is a need to provide various levels of precision of the control system for controlling the exposure laser apparatus, as the user needs. However, if only a part of each component constituting the control system can be replaced by performing a similar function, it is possible to increase the reusability of other components. However, according to the related art, since such a control system is provided integrally, Reusability is not being considered.
In the present invention, there is provided an apparatus for controlling an exposure laser apparatus, the apparatus having an architecture capable of replacing modules according to various control levels and having an internal bus structure suitable for synchronizing and controlling a plurality of driving units of the exposure laser apparatus .
It is possible to provide a main controller for generating a set of control signals for controlling the driving
At this time, the driving device may be a device for driving the moving part of the exposure laser device.
Here, the main controller may further include a first switch unit, and the first switch unit is controlled to sequentially transmit the set of control signals composed of the control signals generated by the plurality of motion control units to the driving unit .
At this time, the observation information is transmitted from the driving device or transmitted from an auxiliary control device that processes information sensed by a separate sensing part that senses the state of a predetermined part of the target device driven by the driving device .
According to another aspect of the present invention, an exposure laser apparatus control system for controlling the exposure laser apparatus can be provided. The system may be a device consisting of a plurality of devices that can be separated from each other. The system comprises: a server; Main controller; And a driving device. The main control unit includes: a plurality of motion control units; Motion control host; Control bus; And a traffic bus. The motion control host generates control information for controlling operations of the plurality of motion control units based on a control command provided from the server and provides the control information to the plurality of motion control units via the control bus have. The plurality of motion control units generate control signals for controlling the plurality of driving motors included in the driving device, respectively. And a control unit for controlling the plurality of motion control units so that the plurality of motion control units generate the control signal through the traffic bus, the observation information measuring the result of the operation of the driving unit, So that the control signal flows.
At this time, the driving device includes a driving unit control device; A plurality of drivers; And the plurality of driving motors respectively controlled by the plurality of driving units. The driving unit control device may receive the generated control signal for controlling the plurality of driving motors, and control the plurality of driving units at the same time.
At this time, the system may further include an auxiliary control device. Wherein said auxiliary control device is adapted to receive said set of fine sensing information from a sensing section for sensing a state of predetermined portions of said exposure laser device and producing a set of precision sensing information, The main control unit may provide the main control unit with a set of auxiliary information generated by processing the precision detection information into a form that can be used by the plurality of motion control units.
At this time, the observation information may be transmitted from the driving apparatus.
At this time, the observation information may be the set of auxiliary information.
According to still another aspect of the present invention, there is provided an exposure laser apparatus control system for controlling an exposure laser apparatus. This exposure laser apparatus control system comprises: a server; A main control unit including a plurality of motion control units and a motion control host; And a driving device. The motion control host generates control information for controlling operations of the plurality of motion control units based on a control command provided from the server, and provides the control information to the plurality of motion control units. And the plurality of motion control units generate control signals for controlling the plurality of driving motors included in the driving apparatus based on the control information, respectively. The plurality of motion control units may generate observation information using the observation information measured by the external device such as the driving device or the auxiliary control device and measure the result of the operation of the driving device to generate a control signal . And the generated control signal is provided to the driving device so as to control the plurality of driving motors.
According to the present invention, there is provided an apparatus for controlling an exposure laser apparatus, the apparatus having an architecture capable of replacing modules according to various control levels and having an internal bus structure suitable for synchronously controlling a plurality of driving units of the exposure laser apparatus, Can be provided.
1 shows a structure of an exposure laser apparatus control system according to an embodiment of the present invention.
2 illustrates a structure of a server according to an embodiment of the present invention.
3 shows a structure of a driving apparatus according to an embodiment of the present invention.
4 illustrates a structure of a main controller according to an embodiment of the present invention.
5 illustrates a structure of an auxiliary control apparatus according to an embodiment of the present invention.
FIG. 6 is an illustration of the integrated information shown in FIG. 1 to FIG. 5.
FIG. 7 is a flowchart showing an operation sequence of the exposure laser apparatus control system according to an embodiment of the present invention.
8 is a flowchart showing an operation sequence of the exposure laser apparatus control system according to another embodiment of the present invention.
9 is a flowchart showing an operation sequence of the exposure laser apparatus control system according to another embodiment of the present invention.
Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described herein, but may be implemented in various other forms. The terminology used herein is for the purpose of understanding the embodiments and is not intended to limit the scope of the present invention. Also, the singular forms as used below include plural forms unless the phrases expressly have the opposite meaning.
<Overview of Exposure Laser Device Control System>
Fig. 1 shows the structure of an exposure laser
An exposure laser
The
The
The
The
The
<Server>
2 shows a structure of a
<Driving device>
3 shows a structure of a
The driving
The
Each of the
<Main control device>
4 shows the structure of the
The
The
Each of the
The
The
The 'control information' exchanged between the
The 'traffic information' exchanged between the
The information provided from the
The information provided from the
The
The operation of each part constituting the
<Auxiliary control device>
5 shows a structure of an
The
The
The precision detection information may be transmitted to the measurement
The
FIG. 6 is an illustration of the integrated information shown in FIG. 1 to FIG. 5.
≪ Operation Example 1 of Exposure Laser Device Control System >
FIG. 7 is a flowchart showing an operation sequence of the exposure laser apparatus control system according to an embodiment of the present invention.
The
The
In step S13, each of the
The
In step S15, the driving
In step S16, the driving
The embodiment according to Fig. 7 shows an embodiment in which the
≪ Operation Example 2 of Exposure Laser Device Control System >
8 is a flowchart showing an operation sequence of the exposure laser apparatus control system according to another embodiment of the present invention.
Steps S24 to S25 in the flowchart shown in Fig. 8 are modified from steps S14 to S15 in the flowchart shown in Fig. Steps S21 to S23 and S26 in the flowchart shown in Fig. 8 are the same as steps S11 to S13 and S16 in the flowchart shown in Fig. 7, respectively. Therefore, the description of steps S21 to S23 and S26 is omitted.
In step S14, the
The embodiment according to Fig. 8 shows an embodiment in which the
≪ Operation Example 3 of Exposure Laser Device Control System >
9 is a flowchart showing an operation sequence of the exposure laser apparatus control system according to another embodiment of the present invention.
The
The
In step S33, each of the
The
For example, the
Then, the
In step S35, the driving
In step S36, the
The embodiment according to Fig. 9 shows an embodiment in which the
≪ Advantages of the Present Invention &
The
First, since four modules called the
Second, on the basis of the modular architecture as described above, a bus existing in the
It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the essential characteristics thereof. The contents of each claim in the claims may be combined with other claims without departing from the scope of the claims.
Claims (9)
A plurality of motion control units (11-14); A motion control host 15; A control bus 16; And a traffic bus 17,
The motion control host generates control information for controlling operations of the plurality of motion control units based on a control command provided from the server 4 and provides the control information to the plurality of motion control units via the control bus Respectively,
Wherein each of the plurality of motion control units is adapted to generate a control signal for controlling a plurality of drive motors included in the drive unit according to the control information,
Wherein the plurality of motion control units are provided to the plurality of motion control units so that the plurality of motion control units can generate the control signal through observation of the results of the operation of the driving unit, The control signal is made to flow,
Main control device.
server; Main controller; And a drive device,
The main control unit includes: a plurality of motion control units; Motion control host; Control bus; And a traffic bus,
The motion control host generates control information for controlling operations of the plurality of motion control units based on a control command provided from the server and provides the control information to the plurality of motion control units via the control bus However,
Wherein each of the plurality of motion control units is configured to generate a control signal for controlling a plurality of drive motors included in the driving device,
Wherein the plurality of motion control units are provided to the plurality of motion control units so that the plurality of motion control units can generate the control signal through observation of the results of the operation of the driving unit, The control signal is made to flow,
Exposure laser device control system.
The driving device includes a driving unit control device (22); A plurality of driving units 231 to 234; And a plurality of driving motors (241 to 244) respectively controlled by the plurality of driving units,
Wherein the driving unit control device is configured to receive the generated control signal for controlling the plurality of driving motors and simultaneously control the plurality of driving units,
Exposure laser device control system.
Further comprising an auxiliary control device,
The auxiliary control device includes:
To receive the set of fine-grained sensing information from a sensing section for sensing a state of predetermined portions of the exposure laser device to produce a set of precision sensing information,
And providing the set of auxiliary information to the main control unit by processing the received set of fine control information into a form usable by the plurality of motion control units,
Exposure laser device control system.
Priority Applications (1)
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KR1020150106999A KR101768537B1 (en) | 2015-07-29 | 2015-07-29 | Device for controlling lithography and laser apparatus having dual bus |
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KR1020150106999A KR101768537B1 (en) | 2015-07-29 | 2015-07-29 | Device for controlling lithography and laser apparatus having dual bus |
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KR20170014139A KR20170014139A (en) | 2017-02-08 |
KR101768537B1 true KR101768537B1 (en) | 2017-08-16 |
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KR1020150106999A KR101768537B1 (en) | 2015-07-29 | 2015-07-29 | Device for controlling lithography and laser apparatus having dual bus |
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002089619A (en) | 2000-09-14 | 2002-03-27 | Canon Inc | Active vibration resistant device, method of calculation of mode matrix, and exposure device using them |
JP2003037986A (en) | 2001-07-25 | 2003-02-07 | Nikon Corp | Motor drive device, stage device and exposure device having the same |
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2015
- 2015-07-29 KR KR1020150106999A patent/KR101768537B1/en active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002089619A (en) | 2000-09-14 | 2002-03-27 | Canon Inc | Active vibration resistant device, method of calculation of mode matrix, and exposure device using them |
JP2003037986A (en) | 2001-07-25 | 2003-02-07 | Nikon Corp | Motor drive device, stage device and exposure device having the same |
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KR20170014139A (en) | 2017-02-08 |
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