KR101750209B1 - Interference lithography apparatus - Google Patents

Abstract

An interference lithography apparatus is disclosed. The interference lithography apparatus includes a light source for providing source light traveling in the Z-axis direction; A first deflection element for deflecting the source light provided from the light source in a Y axis direction perpendicular to the Z axis; And a second deflecting element for deflecting the light deflected by the first deflecting element in the X-axis direction perpendicular to the Z-axis and the Y-axis.

Description

[0001] Interference lithography apparatus [0002]

Field of the Invention [0002] The present invention relates to an interference lithography apparatus, and more particularly, to an interference lithography apparatus using a deflection element to form an interference fringe pattern.

In general, interference lithography is a process technology used to produce periodic patterns in related fields such as semiconductor processing and display processing.

The interferometric lithography process technique uses an interfering fringe using a coherent light source such as a laser and irradiates the interfered signal to a substrate coated with a photoresist, Such as the intensity distribution of the light intensity distribution.

To date, three to four optics have been utilized as interferometric lithography systems that implement this process technology, the most widely used of which are the Lloyd type interferometric lithography system and the two-beam interferometer lithography system.

FIG. 1 is a schematic view for explaining the principle of a Lloyd type interference lithography apparatus, and a pattern period and a direction are determined according to the wavelength of a light source used and the rotation of a rotating table.

FIG. 2 is a schematic diagram of a two-beam interferometric lithography apparatus, in which two mirrors M ₁ and M ₂ located on a path through which two beams pass, along with the wavelength of a laser used, Is determined.

As described above, since the above-mentioned methods determine the period and direction of the pattern by the mechanical movement, that is, the rotation of the rotary table or the rotation of the mirrors, the above-mentioned mechanical movement must be changed in order to change the period and direction of the pattern. In this case, there is a problem that various patterns can not be adjusted at high speed due to a time delay due to a change in mechanical motion.

The present invention provides an interference lithography apparatus capable of rapidly changing the period and direction of an interference fringe pattern.

An interference lithography apparatus according to the present invention includes: a light source for providing source light traveling in a Z-axis direction; A first deflection element for deflecting the source light provided from the light source in a Y axis direction perpendicular to the Z axis; And a second deflecting element for deflecting the light deflected by the first deflecting element in the X-axis direction perpendicular to the Z-axis and the Y-axis.

Also, the first deflection element is capable of adjusting the deflection angle of the light in the Y-axis direction, and the second deflection element is capable of adjusting the deflection angle of the light in the X-axis direction.

In addition, the first and second deflecting elements may include any one of AOD, EOD, and MOD.

The first polarizing plate includes a first deflected light of the source light, and the first deflected light of the source light passes through the first polarizing plate. And a first beam splitter for separating the primary deflected light of the source light having passed through the first polarizer into reflected light and transmitted light, wherein the reflected light and the transmitted light are incident on the second deflecting element.

The primary deflected light of the source light includes a light component polarized in the X-axis direction and a light component polarized in the Y-axis direction, and the light component polarized in the X-axis direction and the polarized light component polarized in the Y- One of the light components may be reflected by the first beam splitter and provided as the reflected light, and the other may be provided as the transmitted light by transmitting through the first beam splitter.

The first polarizer may have a polarization direction of 45 degrees with respect to the Y axis.

Further, the light deflected by the first deflecting element further includes a zero-order deflected light of the source light, and is positioned between the first polarizing plate and the first beam splitter, And may further include a blocking plate.

The light deflected by the second deflecting element includes primary deflected light of the reflected light and primary deflected light of the transmitted light, and the primary deflected light of the reflected light and the primary deflected light of the transmitted light pass through. 2 polarizer; And a second beam splitter that reflects either one of the primary deflected light of the reflected light and the primary deflected light of the transmitted light that has passed through the second polarizer and transmits the other.

The second polarizer may include a first region having a polarization direction in a direction parallel to the X axis; And a second region having a polarization direction in a direction parallel to the Y-axis.

Further, the light deflected by the second deflecting element includes the zero-order deflected light of the reflected light and the zero-order deflected light of the transmitted light, and is positioned between the second polarizing plate and the second beam splitter, And a second blocking plate for blocking the primary deflected light and the zero-order deflected light of the transmitted light.

A first pass filter located between the first deflecting element and the second deflecting element and passing only a part of the light deflected by the first deflecting element; And a second pass filter located at the rear end of the second deflecting element and passing only a part of the light deflected by the second deflecting element.

In addition, the second pass filter may pass only two deflected light beams out of the deflected light beams in the second deflective element.

Also, the second pass filter can pass only the two deflected lights of the same order among the beams deflected by the second deflecting element.

The first pass filter may have slit openings extending in the X-axis direction in the longitudinal direction, and slit openings in the Y-axis direction in the longitudinal direction may be formed in the second pass filter.

According to the present invention, it is possible to adjust the period and direction of the interference fringe pattern by adjusting the inclination of two beams incident on the processing surface of the object.

In addition, according to the present invention, it is possible to easily adjust the inclination directions of two beams incident on the processing surface of an object by adjusting the frequency magnitude of the RF signal applied to the deflecting element.

1 is a schematic diagram for explaining the principle of a Lloyd type interference lithography apparatus.
2 is a schematic diagram of a two-beam interferometric lithography apparatus.
3 is a simplified illustration of an interference lithography apparatus according to an embodiment of the present invention.
4 is a photograph showing dots of an interference fringe pattern formed using the interference lithography apparatus of the present invention.
5 is a simplified illustration of a beam deflection and separation unit according to an embodiment of the present invention.
Fig. 6 is a view showing the area A of the beam deflection and separation unit of Fig. 5;
7 is a diagram showing an example in which an AOD is used as a first deflecting element, according to an embodiment of the present invention.
8 is a view showing a first polarizing plate according to an embodiment of the present invention.
9 is a diagram showing the optical components of the deflected light that has passed through the first polarizer plate according to the embodiment of the present invention.
10 is a diagram showing the light components of transmitted light and reflected light output from the first beam splitter.
11 is a view showing a second deflecting element according to an embodiment of the present invention.
12 is a view showing a principle of forming an interference fringe pattern by meeting two beams.
13 is a view showing area A of FIG. 5 according to another embodiment of the present invention.
14 is a view showing the second polarizing plate of Fig.
15 is a view schematically showing a beam deflection and separation unit according to yet another embodiment of the present invention.
16 is a view showing a first deflecting element according to an embodiment of the present invention.
17 to 20 are views showing an interference fringe pattern formed according to the first pass filter and the second pass filter according to various embodiments of the present invention.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the technical spirit of the present invention is not limited to the embodiments described herein but may be embodied in other forms. Rather, the embodiments disclosed herein are provided so that the disclosure can be thorough and complete, and will fully convey the scope of the invention to those skilled in the art.

In this specification, when an element is referred to as being on another element, it may be directly formed on another element, or a third element may be interposed therebetween. Further, in the drawings, the thicknesses of the films and regions are exaggerated for an effective explanation of the technical content.

Also, while the terms first, second, third, etc. in the various embodiments of the present disclosure are used to describe various components, these components should not be limited by these terms. These terms have only been used to distinguish one component from another. Thus, what is referred to as a first component in any one embodiment may be referred to as a second component in another embodiment. Each embodiment described and exemplified herein also includes its complementary embodiment. Also, in this specification, 'and / or' are used to include at least one of the front and rear components.

The singular forms "a", "an", and "the" include plural referents unless the context clearly dictates otherwise. It is also to be understood that the terms such as " comprises "or" having "are intended to specify the presence of stated features, integers, Should not be understood to exclude the presence or addition of one or more other elements, elements, or combinations thereof. Also, in this specification, the term "connection " is used to include both indirectly connecting and directly connecting a plurality of components.

In the following description of the present invention, a detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

3 is a simplified illustration of an interference lithography apparatus according to an embodiment of the present invention.

Referring to FIG. 3, the interferometric lithography apparatus 10 may be used to form a periodic optical interference fringe pattern in a semiconductor or display manufacturing process. The interference lithography apparatus 1 includes a light source 10, a beam deflection and separation unit 20, and a dot image formation unit 30.

The light source 10 provides the source light SL with coherence. Further, the light source 10 may provide the source light SL having partial coherence. According to the embodiment, laser light can be provided as the source light SL. The light source 10 may provide pulsed laser light as the source light SL. The pulsed laser light SL may include light of any one of a nanosecond laser, a picosecond laser, and a femto second laser. The source light SL provided in the light source 10 travels in a constant direction. For convenience of explanation, the direction in which the source light SL advances is referred to as a Z-axis direction, and the directions perpendicular to the Z-axis direction are referred to as an X-axis direction and a Y-axis direction. The Y-axis direction is perpendicular to the X-axis direction. The optical interference fringe pattern is formed in an XY plane perpendicular to the Z axis direction.

The beam deflecting and separating unit 10 deflects the source light SL provided from the light source 10 in the X-axis and Y-axis directions and radiates and separates into two lights. The beam deflection and separation unit SL will be described in detail below.

The dot image forming unit 30 forms an interference fringe pattern by causing the two deflected lights PL1 and PL2 separated from the beam forming and separation unit 20 to enter the processing surface of the object 40. [ The object 40 may be a semiconductor manufacturing substrate or a display manufacturing substrate. In addition, the object 40 may be various objects to be processed which require formation of an optical interference fringe pattern in the manufacturing process.

The dot image forming unit 30 includes an aperture part 31, a first dot image forming lens 32, and a second dot image forming lens 33.

The aperture unit 31 is located behind the beam deflection and separation unit 20 and has an opening 31a through which the deflected light PL1 and PL2 separated by the two are passed. The opening 31a may be formed in various shapes. The outer shape of the interference fringe pattern formed on the processed surface of the object 40, that is, the shape of the dot is determined according to the shape of the opening 31a. For example, in the case of the rectangular opening 31a, rectangular dots are formed on the processing surface of the object 40 as shown in Fig.

The first dot imaging lens 32 outputs the light having passed through the aperture 31a in parallel. According to the embodiment, the first dot imaging lens 32 may be a tube lens.

The second dot image forming lens 33 condenses the light output from the first dot image forming lens 32 onto the processing surface of the object 40. The size of the dots formed on the processed surface of the object 40 may be several to several tens of μm ² . The second dot image forming lens 33 condenses light for dot formation of a small size. The second dot image forming lens 33 may be an object lens.

FIG. 5 is a simplified illustration of a beam deflection and separation unit according to an embodiment of the present invention, and FIG. 6 is a view showing the A region of the beam deflection and separation unit of FIG. Fig. 5 is shown on the YZ plane, and Fig. 6 is shown on the XZ plane.

5 and 6, the beam deflection and separation unit 20 includes a first deflection element 110, a first polarizer 120, a first shield plate 130, a first beam splitter 140, Two deflection elements 150, a second blocking plate 170, a second beam splitter 180, and a plurality of relay lenses 191-198.

The first deflecting element 110 deflects the source light SL provided from the light source 10 in the Y-axis direction. The first deflection element 110 is capable of adjusting the deflection angle of the light SL. The first deflecting element 110 may be an Acoustic Optical Deflector (AOD), an Electro Optical Deflector (EOD), or a Magnetic Optical Deflector (MOD). In this embodiment, the use of AOD as the first deflecting element 110 will be described by way of example.

7 is a diagram showing an example in which AOD is used as a first deflection element according to an embodiment of the present invention. The first deflection element 110 includes a crystal body 111, a piezoelectric 112, an absorber 113 ), And an RF application unit 114.

An RF signal is applied from the RF applying unit 114 to the piezoelectric vibrator 112 and an acoustic wave (AW) is transmitted into the crystal body 111 by the vibration generated in the piezoelectric vibrator 112 when the RF signal is applied. The sound wave AW is formed in the crystal body 111 in a normal waveform. The absorber 113 absorbs the acoustic wave AW transmitted through the crystal body 111. According to the embodiment, the crystal body 111 is arranged in the height direction in the Y axis direction, and the sound wave AW is formed in the normal waveform along the Y axis direction. Due to the acoustic wave AW, the source light SL incident into the crystal body 111 is deflected in the Y-axis direction and output.

According to the arrangement of the crystal body 111, the source light SL is divided into a zeroth-order deflected light, a ± first-order deflected light, a ± second-order deflected light, Lt; / RTI > The zeroth-order deflected light is light output in the same direction as the direction of incidence of the source light SL, and the primary-deflected light is deflected at the smallest angle with respect to the Z-axis and output. The ± second-order deflected light is the light deflected at a small angle after the ± first-order deflected light. According to the embodiment, the first deflecting element 110 is arranged so as to output only the zero-order deflected light PL1 and the primary deflected light PL2.

The deflection angle formed by the two deflected lights PL1 and PL2 depends on the frequency magnitude of the RF signal. As the frequency of the RF signal increases, the period of the sound wave in the crystal body 111 becomes shorter and the deflection angle of the deflected lights PL1 and PL2 becomes larger.

The deflection efficiency of the deflected lights PL1 and PL2 is adjusted according to the magnitude of the RF amplitude. By adjusting the magnitude of the RF amplitude, the output intensity of the deflected lights PL1 and PL2 for each order can be adjusted.

5, the first polarizer 120 is located behind the first deflecting element 110 and is disposed between the zeroth deflected light PL1 and the primary deflected light PL2 ).

8 is a view showing a first polarizing plate according to an embodiment of the present invention. Referring to FIG. 8, the first polarizer 120 may have a polarization direction 121 that is inclined at a predetermined angle with respect to the Y-axis. According to the embodiment, the polarization direction 121 is formed in a direction inclined at 45 degrees with respect to the Y axis. The deflected lights PL3 and PL4 having passed through the polarizing plate 120 are polarized in the direction of 45 degrees as shown in Fig. The polarization direction deflected lights PL3 and PL4 of 45 degrees are expressed by the sum of the X axis direction polarized light components PL3x and PL4x and the Y axis direction polarized light components PL3y and PL4y.

A relay lens 191 is provided behind the first polarizing plate 120. The relay lens 191 changes the path direction of the deflected lights PL3 and PL4 that have passed through the first polarizing plate 120. [ The relay lens 191 may be a tube lens.

The first blocking plate 130 is positioned between the first polarizer 120 and the first beam splitter 140. The first blocking plate 130 blocks the zero order deflected light PL3 of the source light. Thereby, the first beam splitter side 140 is provided with the primary deflected beam PL4 of the source beam.

A relay lens 192 may be provided between the first blocking plate 130 and the first beam splitter 140. The relay lens 192 changes the path of the primary deflected light PL4 of the source light to the side of the first beam splitter 140. [

The first beam splitter 140 copies and separates the primary deflected light PL4 of the source light into two beams. According to the embodiment, the first beam splitter 140 may be provided with a plate beam splitter.

The primary deflected light PL4 of the passage light source light of the first polarizing plate 120 is divided into an X-axis direction polarized light component PL4x and a Y-axis direction polarized light component PL4y. The X-axis direction polarized light component PL4x And the Y-axis direction polarized light component PL4y are transmitted through the beam splitter 140 and output as transmitted light PL5 and the other is reflected by the first beam splitter 140 and output as reflected light PL6 do. According to the embodiment, the X-axis direction polarized light component PL4x can be output as the transmitted light PL5 and the Y-axis direction polarized light component PL4y can be output as the reflected light PL6, as shown in Fig.

Between the first beam splitter 140 and the second deflecting element 150, relay lenses 193 and 194 are provided. The relay lenses 193 and 194 change the optical path so that the path of the transmitted light PL5 and the reflected light PL6 is converged on the second deflecting element 150. [ According to the embodiment, the relay lenses 193 and 194 may be provided with one tube lens and one object lens, respectively.

11 is a view showing a second deflecting element according to an embodiment of the present invention.

Referring to FIGS. 6 and 11, the second deflecting element 150 may be the same element as the first deflecting element 110. According to the embodiment, AOD is used as the second deflecting element 150, and the height direction of the crystal body 151 is arranged in the X-axis direction. The crystal body 151 of the second deflecting element 150 and the crystal body 111 of the first deflecting element 110 are arranged vertically in the height direction. A sound wave AW of a normal waveform is generated in the crystal body 111 along the X axis direction by the vibration generated in the piezoelectric body 152. [ Due to the sound wave AW, the transmitted light PL5 and the reflected light PL6 incident into the crystal body 151 are deflected in the X-axis direction and output. The deflection angles of the transmitted light PL5 and the deflected lights PL7 to PL10 of the reflected light PL6 vary depending on the frequency magnitude of the applied RF signal.

According to the embodiment, the second deflecting element 150 is arranged so that only the zero-order deflected light PL7, PL9 of the incident light PL5, PL6 and the primary deflected light PL8, PL10 are outputted. Therefore, in the second deflecting element 150, the zero-order deflected light PL7 and the primary deflected light PL8 of the transmitted light PL5 and the zero-order deflected light PL9 and the primary deflected light PL9 of the reflected light PL6 PL10) are outputted.

A relay lens 195 is provided behind the second deflecting element 150. The relay lens 195 changes the path of the deflected light PL7 to PL10 output from the second deflecting element 150. [ The relay lens 195 may be a tube lens.

The second blocking plate 170 is located behind the relay lens 195. The second blocking plate 170 blocks the zeroth-order deflected light PL9 of the reflected light PL6 and the zeroth-order deflected light PL7 of the transmitted light PL5. The first deflected light PL10 of the reflected light PL6 and the primary deflected light PL8 of the transmitted light PL5 are provided to the second beam splitter 180 side.

A relay lens 196 may be provided between the second blocking plate 170 and the second beam splitter 180. The relay lens 196 changes the primary deflected light PL10 of the reflected light PL6 and the primary deflected light PL8 of the transmitted light PL5 to the second beam splitter 180 side.

The second beam splitter 180 is provided with primary deflected light PL10 of reflected light PL6 and primary deflected light PL8 of transmitted light PL5. In the second beam splitter 180, one of the primary deflected light PL10 of the reflected light PL6 and the primary deflected light PL8 of the transmitted light PL5 is transmitted and the other is reflected. For example, the primary deflected light PL10 of the reflected light PL6 is reflected by the second beam splitter 180 and is output to the reflected light PL12, and the primary deflected light PL8 of the transmitted light PL5 is reflected by the second beam splitter 180. [ The light can be transmitted through the transmission line 180 and output as the transmitted light PL11. Or conversely the primary deflected light PL10 of the reflected light PL6 may be output as the transmitted light PL11 and the primary deflected light PL8 of the transmitted light PL5 may be output as the reflected light PL12. Thus, the second beam splitter 180 outputs two lights PL11 and PL12.

Relay lenses 197 and 198 are sequentially provided at the rear of the second beam splitter 180. The relay lenses 187 and 198 change paths of the two lights PL11 and PL12 output from the second beam splitter 180. [ Two light beams PL11 and PL12 whose light paths are changed in the relay lenses 197 and 198 are incident on the aperture 31a of the aperture unit 31. [

The reflected light PL12 and the transmitted light PL11 form an interference fringe pattern on the object 40 via the dot image forming unit 30 described above.

12 is a view showing a principle of forming an interference fringe pattern by meeting two beams. Referring to FIG. 12, when two beams L1 and L2, which are wavelengths, are incident on the upper surface of the sample S with a slant angle?, The interference fringes P, . At this time, the pattern period Λ and the pattern direction can be adjusted by adjusting the inclination direction of the incident two beams L1 and L2 with respect to the sample (P) plane.

The pattern period and the pattern direction of the interference fringes can be adjusted by adjusting the inclination of the reflection light PL12 and the transmitted light PL11 on the upper surface of the object 40 in accordance with the above-described principle. Adjustment of the inclination direction of the reflected light PL12 and the transmitted light PL11 is performed through adjustment of a deflection angle at the first deflection element 110 and adjustment of a deflection angle at the second deflection element 150. [ As described above, the interference lithography apparatus 1 according to the present invention can easily adjust the pattern period and the pattern direction of the interference fringe by adjusting the frequency magnitude of the RF signal applied to the first and second deflecting elements 110 and 150 have.

FIG. 13 is a view showing region A of FIG. 5 according to another embodiment of the present invention, and FIG. 14 is a view showing a second polarizer of FIG.

13 and 14, the beam deflecting and separating unit 20 further includes a second polarizing plate 160. As shown in FIG. The second polarizing plate 160 is located behind the second deflecting element 150 and detects the 0th order deflection light PL9 and the primary deflection light PL10 of the reflected light PL6 and the 0th order deflection light PL5 of the transmitted light PL5, The light PL7 and the primary deflection light PL8 pass through. The second polarizing plate 160 includes a first region 161 and a second region 162 in which the polarization directions 161a and 162a are formed in different directions. According to the embodiment, the polarization direction 161a is arranged at 0 degrees with respect to the X axis in the first region 161 and the polarization direction 162a is arranged at 90 degrees with respect to the X axis in the second region 162 . A light component in the X-axis direction passes through the first region 161 and a light component in the Y-axis direction passes through the second region 162. [

15 is a view schematically showing a beam deflection and separation unit according to yet another embodiment of the present invention. In Fig. 15, region A is shown on the YZ plane, and region B is shown on the XZ plane

15, the beam deflection and separation unit 20 'includes a first deflection element 210, a first pass filter 220, a second deflection element 230, a second pass filter 240, And relay lenses 251 to 254 of FIG.

The first deflecting element 210 deflects the source light SL provided in the light source (10 in Fig. 3) in the Y-axis direction. The first deflection element 210 is capable of adjusting the deflection angle of the light SL. According to the embodiment, an AOM (Acoustic Optical Modulator) may be used as the first deflecting element 210.

16 is a view showing a first deflecting element according to an embodiment of the present invention. 15 and 16, the crystal body 211 of the first deflecting element 210 is arranged in the height direction in the Y-axis direction. The first deflecting element 210 emits the 0th order deflected ray PL1 of the source light SL, the ± 1st order deflected rays PL2 and PL3, the ± 2nd order deflected rays PL4 and PL5, Is output.

The relay lens 251 is located behind the first deflecting element 210 and changes the path of the deflected light PL1 to PL5 of the source light described above.

The first pass filter 220 is located behind the relay lens 251 and passes some of the deflected lights PL1 to PL5 of the source light and blocks the rest. According to the embodiment, the first pass filter 220 may be a Y pass filter. The Y-pass filter 220 is formed with a slit opening whose longitudinal direction is parallel to the X-axis direction.

A relay lens 252 is provided behind the first pass filter 220. The relay lens 252 changes the path so that the deflected light of the source light that has passed through the first pass filter 220 is incident on the second deflecting element 230.

The second deflecting element 230 is located behind the relay lens 253 and deflects the deflected light of the source light in the X-axis direction. The second deflecting element 230 may be the same element as the first deflecting element 210. [ According to the embodiment, an AOM (Acoustic Optical Modulator) can be used as the second deflecting element 230. The crystal body of the second deflecting element 230 is arranged in the height direction in the X-axis direction. The deflected light of the source light incident on the second deflecting element 230 is the zero-order deflected light deflected in the X-axis direction, the ± first-order deflected light, the ± second-order deflected light, .

The second pass filter 240 is located behind the second deflecting element 230, passing some of the deflected light described above, and blocking the other. The final two deflected lights are output through the second pass filter 240. According to the embodiment, the second pass filter 240 may be an X-pass filter. The X-pass filter 240 is formed with a slit opening whose longitudinal direction is parallel to the X-axis direction.

The two deflected lights having passed through the second pass filter 240 are provided to the dot image forming unit 30 of Fig. 3 through the relay lens 254. The period and direction of the interference fringe pattern formed on the object 40 are determined according to the angles of the two deflected lights incident on the object 40. [ The angle of the deflected light incident on the object 40 is determined by the frequency magnitude of the RF signal applied to the first deflecting element 210 and the second deflecting element 230 and the magnitude of the frequency of the RF signal applied to the first and second pass filters 220 and 240, Is determined according to the shape of the slit opening formed in the opening.

17 to 20 are views showing an interference fringe pattern formed according to the first pass filter and the second pass filter according to various embodiments of the present invention. 17 to 20, (a) shows a first pass filter, (b) shows a second pass filter, and (c) shows an interference fringe pattern.

First, referring to FIG. 17, slit openings 221a and 221b are formed in the first pass filter 220a only on the path of the primary deflected lights PL2 and PL3 of the source light. Therefore, only the primary deflected lights PL2 and PL3 of the deflected lights deflected by the first deflecting device 220a pass through and the remaining deflected lights PL1, PL4, PL5, ... are blocked. In the case of this embodiment, the second deflecting element 230 is stopped. The primary deflected lights PL2 and PL3 of the source light pass through the second deflecting element 230 without generating a deflection in the X axis direction. The +/- primary deflected lights PL2 and PL3 pass through the second pass filter 240a without generating light interruption. The primary deflected lights PL2 and PL3 are transmitted through the dot image forming unit 30 to the optical path in which the + 1st-order deflected light PL2 is inclined downward and the -1st order deflected light PL3 is upwardly inclined Is incident on the object 40 by a path, and forms an interference fringe pattern parallel to the X-axis direction.

Referring to Fig. 18, slit openings 222a and 222b are formed in the first pass filter 220b only on the path of the primary deflected lights PL2 and PL3 of the source light. Therefore, only the primary deflected lights PL2 and PL3 of the deflected light beams deflected by the first deflecting element 210 pass through and the remaining deflected lights PL1, PL, and PL5 are blocked. The primary deflected lights PL2 and PL3 of the source light are deflected in the X axis direction while passing through the second deflecting element 230. [ The + first-order light PL2 of the source light in the second deflecting element 230 is incident on the X-axis direction zero-order deflected light, the + first-order deflected light, the + And the -1st order polarized light PL3 is output in the X-axis direction as 0th order deflected light, ± 1st order deflected light, ± 2nd order deflected light, . The deflected lights pass through the second pass filter 240b. In the second pass filter 240b, two slit openings 241a and 241b are formed at different heights. The + 1st-order deflected light among the deflected lights in the X-axis direction of the + 1st order polarized light PL2 passes through the slit opening 241b located at the bottom and the remaining deflected lights are blocked. The -1 st order deflected light among the deflected lights in the X-axis direction of the -1 st order polarized light PL3 passes through the slit opening 241a located at the upper side and the remaining deflected lights are blocked. The +1 st order deflected light and the -1 st order deflected light having passed through the second pass filter 240b are imaged on the object 40 via the dot image forming unit 30. One of the +1 st order deflected light and the -1 st order deflected light is incident on the downwardly sloping optical path from the upper left side and the other is incident on the upwardly sloped optical path from the lower right side. Due to the interference between the +1 st order deflected light and the -1 st order deflected light, a downwardly sloping fringe pattern is formed on the object from the upper right side to the lower left side.

19, a slit opening 223a is formed in the first pass filter 220c only on the path of the zeroth deflection light PL1 of the source light. Therefore, only the zero-order deflected light PL1 passes through the deflected light deflected by the first deflecting element 220c, and the remaining deflected lights PL2 through PL5 are blocked. The zero-order deflected light PL1 of the source light is deflected in the X-axis direction while passing through the second deflecting element 220. [ In the second deflecting element 220, the zero order light PL1 of the source light is an X-axis direction zero-order deflected light, a first-order deflected light, a second-order deflected light, . The second pass filter 240c is provided with slit openings 242a and 242b only on the path of the ± first-order deflected light in the X-axis direction. Therefore, only the ± first-order deflected light in the X-axis direction deflected light passes through the second pass filter 240c and the remaining deflected lights are blocked. The X-axis direction ± primary deflected light is imaged on the object 40 via the dot image forming unit 30. [ The + 1st-order deflected light in the X-axis direction is incident obliquely from the right to the left, and the -1st-order deflected light in the X-axis direction is incident obliquely from the left to the right. The interference fringe pattern in the vertical direction is formed on the object by the interference of the primary deflected light in the X-axis direction.

20, slit openings 224a and 224b are formed in the first pass filter 220d only on the path of the primary deflected lights PL2 and PL3 of the source light. Therefore, only the primary deflected lights PL2 and PL3 of the deflected lights deflected by the first deflecting device 210 pass through and the remaining deflected lights PL1, PL4, and PL5 are blocked. The primary deflected lights PL2 and PL3 of the source light are deflected in the X axis direction while passing through the second deflecting element 230. [ The + first-order light PL2 of the source light in the second deflecting element 230 is incident on the X-axis direction zero-order deflected light, the + first-order deflected light, the + And the -1st order polarized light PL3 is output in the X-axis direction as 0th order deflected light, ± 1st order deflected light, ± 2nd order deflected light, . The deflected lights pass through the second pass filter 240d. In the second pass filter 240d, the two slit openings 243a and 243b are formed at different heights. The + 1st-order deflected light among the deflected lights in the X-axis direction of the +1 st order polarized light PL2 passes through the slit opening 243a located at the top and the remaining deflected lights are blocked. The -1 st order deflected light among the deflected lights in the X-axis direction of the -1 st order polarized light PL3 passes through the slit opening 243b located at the bottom and the other deflected lights are blocked. The +1 st order deflected light and the -1 st order deflected light having passed through the second pass filter 240d are imaged on the object 40 via the dot image forming unit 30. One of the +1 st order deflected light and the -1 st order deflected light is incident on the downward inclined optical path from the upper right side and the other is incident on the upwardly inclined optical path from the lower left side. Due to the interference between the +1 st order deflected light and the -1 st order deflected light, an interference fringe pattern inclined downward from the upper left to the lower right is formed in the object 40.

As described above, the first and second deflecting elements 210 and 230 and the first and second pass filters 220 and 240 can form interference pattern patterns in various directions. In addition, the pattern period of the interference fringe pattern can be adjusted by changing the frequency magnitude of the RF signal applied to the crystal bodies of the first and second deflecting elements 210 and 230.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the scope of the present invention is not limited to the disclosed exemplary embodiments. It will also be appreciated that many modifications and variations will be apparent to those skilled in the art without departing from the scope of the invention.

1: interference lithography apparatus
10: Light source
20, 20 ': beam deflection and separation unit
30: Dot image forming unit
31: Apperception
32: first dot image forming lens
33: second dot image forming lens
110, 210: a first deflection element
120: first polarizer plate
130: first blocking plate
140: 1st beam splitter
150, 230: a second deflecting element
170: second blocking plate
180: second beam splitter
191 to 196, 251 to 254: relay lens
220: 1st pass filter
230: second pass filter

Claims (14)

A light source for providing source light traveling in the Z-axis direction;
A first deflection element for deflecting the source light provided from the light source in a Y axis direction perpendicular to the Z axis; And
And a second deflecting element for deflecting the light deflected by the first deflecting element in the X-axis direction perpendicular to the Z-axis and the Y-axis,
Wherein the light deflected by the first deflecting element includes primary deflected light of the source light,
A first polarizer through which the primary deflected light of the source light passes; And
And a first beam splitter which separates the primary deflected light of the source light that has passed through the first polarizer into reflected light and transmitted light,
And the reflected light and the transmitted light are incident on the second deflecting element. The method according to claim 1,
The first deflection element is capable of adjusting a deflection angle of light in the Y-axis direction,
Wherein the second deflecting element is capable of adjusting a deflection angle of light in the X-axis direction. 3. The method of claim 2,
Wherein the first deflecting element and the second deflecting element comprise one of AOD, EOD, and MOD. delete The method according to claim 1,
The primary deflected light of the source light includes a light component deflected in the X-axis direction and a deflected light component in the Y-axis direction,
One of a light component deflected in the X-axis direction and a light component deflected in the Y-axis direction is reflected by the first beam splitter and is provided as the reflected light, and the other is transmitted through the first beam splitter, Lt; / RTI > The method according to claim 1,
Wherein the first polarizer has a deflection direction of 45 degrees with respect to the Y axis. The method according to claim 1,
Wherein the light deflected by the first deflecting element further includes zero-order deflected light of the source light,
And a first blocking plate located between the first polarizer plate and the first beam splitter and blocking the zero order deflection light of the source light. The method according to claim 1,
Wherein the light deflected by the second deflecting element includes primary deflected light of the reflected light and primary deflected light of the transmitted light,
A second polarizer through which the primary deflected light of the reflected light and the primary deflected light of the transmitted light pass; And
And a second beam splitter that reflects one of the primary deflected light of the reflected light and the primary deflected light of the transmitted light that has passed through the second polarizer and transmits the other. 9. The method of claim 8,
The second polarizer plate
A first region having a deflection direction in a direction parallel to the X axis; And
And a second region having a deflection direction in a direction parallel to the Y-axis. 9. The method of claim 8,
Wherein the light deflected by the second deflecting element includes zero-order deflected light of the reflected light and zero-order deflected light of the transmitted light,
And a second blocking plate disposed between the second polarizing plate and the second beam splitter and blocking the zero order deflected light of the reflected light and the zero order deflected light of the transmitted light. A light source for providing source light traveling in the Z-axis direction;
A first deflection element for deflecting the source light provided from the light source in a Y axis direction perpendicular to the Z axis; And
And a second deflecting element for deflecting the light deflected by the first deflecting element in the X-axis direction perpendicular to the Z-axis and the Y-axis,
A first pass filter located between the first deflecting element and the second deflecting element and passing only a part of the light deflected by the first deflecting element; And
And a second pass filter located behind the second deflecting element and passing only a portion of the light deflected by the second deflecting element. 12. The method of claim 11,
Wherein the second pass filter passes only two deflected light beams out of the deflected light beams in the second deflecting element. 13. The method of claim 12,
Wherein the second pass filter passes only two deflected lights of the same order among the beams deflected by the second deflecting element. 12. The method of claim 11,
Wherein the first pass filter is formed with a slit opening whose length direction is parallel to the X axis direction,
Wherein the second pass filter is provided with slit openings whose longitudinal direction is parallel to the Y-axis direction.

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