KR101738876B1

KR101738876B1 - Source head

Info

Publication number: KR101738876B1
Application number: KR1020150167409A
Authority: KR
Inventors: 노대섭
Original assignee: (주)거성
Priority date: 2015-11-27
Filing date: 2015-11-27
Publication date: 2017-05-23

Abstract

A source head is disclosed. The source head of the present invention relates to an ion implantation apparatus used for injecting impurities into a wafer during a semiconductor process. The source head comprises: an arc chamber which forms a space where ions are formed by collision between thermal electrons and gas; a head body which is located behind the arc chamber and to which the arc chamber is fixed and coupled; a housing which has a cylindrical shape and surrounds the arc chamber and the head body; and a housing flange which is detached from and coupled to the rear end of the housing, has a head insertion hole provided at the center thereof to receive the head body, and is fixed and coupled to the head body. According to the source head of the present invention, since the housing is detachable from a housing plate, only a housing part can be easily separated from the source head. In addition, the housing can be easily coupled and separated, and an anti-contamination protrusion is provided inside the housing so that, when ions introduced into the housing from the front side of the housing move backward along the inner surface of the housing, a considerable portion of the ions adheres on the anti-contamination protrusion, thereby effectively preventing the ions from moving to the rear side of the housing.

Description

Source Head {SOURCE HEAD}

Field of the Invention [0002] The present invention relates to a source head, and more particularly, to a source head constituting an ion implantation facility used for implanting impurities into a wafer during semiconductor processing.

BACKGROUND ART [0002] Ion implantation is one of methods for producing an impurity semiconductor, in which ion impurities are accelerated to form an ion beam, which is injected into a substrate of a semiconductor.

In the ion implantation process, an ion source head is used as an apparatus for forming ionized impurities implanted into the wafer. In the ion source head, the ion generator includes a reaction chamber for generating ions therein, A filament for reflecting the thermoelectrons emitted from the filament, and a repeller for reflecting the thermoelectrically emitted from the filament.

Korean Patent No. 10-1149826 discloses a " source head of semiconductor manufacturing equipment "in connection with such an ion source head and ion generating portion, and specifically, a head body made of a vertical tube member having a space therein, An arc chamber which is supported on an upper portion of the head main body and has a filament and a repeller opposed to each other in the inside of the head main body and a filament insulator which is positioned between the lower end of the arc chamber and the upper end of the head main body and is attached to the filament side and the re- A filament clamp and a repeller clamp which are respectively supported by the insulator and the filer insulator and which hold the filament and the refeller; and an upper end portion of the filament and the refeller clamp which are connected to the connecting pin connected to the clamp side, 1 feedthroughs and a second feedthrough; and a second feedthrough disposed vertically along the inner space of the head body, A gas supply pipe or the like communicating with the inside of the arc chamber, thereby reducing the number of components of the source head and reducing the overall cost of simplification of the structure.

On the other hand, in the ion implantation process, a manipulator for extracting ions generated in the ion generating portion by using a potential difference is used. As related prior arts, Korean Patent Laid-Open Nos. 10-2000-0015115, -2004-0042918 and Korean Patent No. 10-0997680.

The manipulator is installed separately at a predetermined distance from the front of the source head (on which the ion generating portion is formed), and has two ion passing portions (slot shapes), while ions from the ion generating portion pass through the respective ion passing portions So as to move in the vertical direction.

Conventional ion implantation apparatuses including a source head have the following problems, and the present invention attempts to solve such a problem.

First of all, the source head has a large number of individual assembled parts, and the structure is complicated, so it takes a long time to assemble and disassemble. Particularly, since the weight of the source head is heavy, It can be deformed.

The manipulator is formed separately from the source head to form a separate assembly. Since a number of parts for mounting and connecting the manipulator are used, the manipulator also becomes a weight body. In addition, the weight of the manipulator is increased by providing two ion- However, the mounting space is narrow and it becomes difficult to attach and detach.

In particular, it is necessary to align the manipulator so that the ion beam from the ion generating part can pass through the ion passing portion of the manipulator precisely because the arrangement for alignment is increased and the two ion passing portions are alternately controlled and aligned The structure becomes a very complicated device.

(0001) Korea Patent No. 10-1149826 (Registered on May 18, 2012) (0002) Korean Patent No. 10-0997680 (Registered on November 25, 2010)

An object of the present invention is to provide a source head capable of easily replacing the housing in consideration of wear caused by use of the housing and capable of preventing or mitigating contamination of the source head by ions.

An object of the present invention is to provide an ion implantation apparatus for implanting impurities into a wafer during a semiconductor process, the ion implantation apparatus comprising: an arc chamber forming a space in which ions collide with a hot electron; A head body located behind the arc chamber and to which the arc chamber is fixedly coupled; A housing having a cylindrical shape and surrounding the arc chamber and the head body; And a housing flange separated from and coupled to a rear end of the housing and having a head insertion hole at a center thereof, the head body being inserted, and the housing flange fixedly coupled to the head body.

The source head according to the present invention is characterized in that the housing flange is provided with a housing seating portion having an inner diameter corresponding to the outer diameter of the rear end of the housing in front of the head insertion hole and being separable and engageable with the housing flange, And a stationary piece for fixing the housing in a state where a rear end of the housing is seated in the seating part.

The base flange has a base seating portion having an inner diameter corresponding to an outer diameter of the base plate at a rear side of the head insertion hole, And a clamping assembly for fixing the base plate in a state where the base plate is seated on the base seating part.

At this time, the clamping assembly includes: a base pin fixedly coupled to a back surface of the housing flange and extending in the front-rear direction; A slider coupled to the base pin and reciprocating in a forward and backward direction; A base spring for elastically supporting the slider backward against the base pin; And a finger portion which is fixed to the slider and moves together with the slider, protrudes toward the head insertion hole, and one end of the finger portion is in close contact with the back surface of the base plate.

In addition, in the source head according to the present invention, the inner circumferential surface of the housing may be provided with a contamination prevention protrusion protruding inwardly and protruding at a constant height in the entire circumferential direction.

Wherein the head body includes: a base plate having a diameter expanded at a rear end; And a contamination prevention plate disposed between the arc chamber and the base plate and having a diameter enlarged. The inner diameter of the contamination prevention chuck may be smaller than the diameter of the contamination prevention plate.

In addition, the contamination prevention plate may be located behind the pollution prevention lip.

According to the present invention, since the housing is detachably coupled to the housing plate, only the housing part can be easily separated from the source head, the housing can be easily coupled and separated, and the contamination- It is possible to provide a source head capable of effectively blocking the movement of the ions to the rear side of the housing.

1 is a perspective view showing a source head according to an embodiment of the present invention,
FIG. 2 is an exploded perspective view showing the source head shown in FIG. 1,
FIG. 3 is a side view showing only the housing portion in the source head shown in FIG. 1,
4 is an exploded perspective view of the source head according to the present invention, excluding the housing and the housing flange,
FIG. 5 is a cross-sectional view showing a partial structure of the source head shown in FIG. 4,
6 is a view for explaining each configuration of the ion generating section in the source head according to the present invention,
7 is an exploded perspective view showing an aperture according to the present invention,
8 is a rear perspective view showing the source head shown in Fig.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the following description of the present invention, the well-known functions or constructions are not described in order to simplify the gist of the present invention.

1 is a perspective view showing a source head 1 according to an embodiment of the present invention, FIG. 2 is an exploded perspective view showing a source head 1 shown in FIG. 1, and FIG. 3 is a cross- 4 is a disassembled perspective view of the source head 1 according to the present invention, excluding the housing 600 and the housing flange 700, and FIG. FIG. 5 is a sectional view showing a part of the configuration of the source head 1 shown in FIG. 4, FIG. 6 is a view for explaining each configuration of the ion generating section 100 in the source head 1 according to the present invention, FIG. 7 is an exploded perspective view showing the aperture 111 according to the present invention, and FIG. 8 is a rear perspective view showing the source head 1 shown in FIG.

The source head 1 according to the present invention includes an arc chamber 110, a head body 200, a manipulator 300, and a fixed bar assembly 400, which are devices for forming ionized impurities injected into a wafer .

The ions generated inside the arc chamber 110 move toward the manipulator 300 and thus the overall flow of the ion beam is performed while moving toward the manipulator 300 from the arc chamber 110 side.

Accordingly, in the explanation of the source head 1 according to the present invention, the manipulator 300 side is set to be relatively forward while the head body 200 side is set to be relatively backward, .

The arc chamber 110 is a part forming a space in which a hot electron collides with a gas to form ions, and constitutes the ion generating part 100.

The ion generating part 100 further includes a filament 120, a repeller 130, and a cathode 140 in addition to the arc chamber 110. (See FIG. 6)

The filament 120 and the cathode 140 are formed on one side of the arc chamber 110 and the repeller 130 is formed on the opposite side.

The arc chamber 110 is formed with a hole through which gas (for example, BF ₃ ) is injected, and a hole through which ions formed in the arc chamber 110 are discharged.

The filament 120 is heated by the supplied electric energy to release the thermoelectrons. The gas supplied to the inside of the arc chamber 110 and the hot electrons collide with each other and react with each other to form ions in the arc chamber 110.

In the source head 1 according to the present invention, the filament 120 is fixedly coupled to the clamping bar 150.

A fixing screw 160 and a fixing nut 170 are provided on the clamping bar 150 so that the filament 120 can be stably fixed.

The fixing screw 160 is coupled with the clamping bar 150 through the clamping bar 150. In this state, the fixing nut 170 is fastened to the end of the fixing screw 160, The fixing screw 160 and the fixing nut 170 are fixed.

The end of the filament 120 passes through the clamping bar 150 and the fixing screw 160 before the fixing screw 160 is completely engaged on the clamping bar 150. In this state, The fastening screw 160 is fastened.

A first insertion hole 151 is formed in the clamping bar 150 and a second insertion hole 161 is formed in the fixing screw 160. When the fixing screw 160 is inserted into the clamping bar 150, The end of the filament 120 is inserted into the first insertion hole 151 and the second insertion hole 161 and then the fixing nut 170 is fastened to the fixing screw 160, The coupling of the filament 120 is completed.

Conventionally, a method of using the tension is used for coupling the filament 120 constituting the conventional ion generating part. In this case, since the filament 120 may be deformed due to heat, there is a problem that the filament 120 is unstably supported. The clamping bar 150, the fixing screw 160, and the fixing nut 170 as described above, so that the filament 120 can be stably supported.

On the other hand, the fixing nut 170 is preferably made of a ceramic insulator or graphite in consideration of operating temperature and releasability.

The cathode 140 surrounds the filament 120 and is exposed toward the interior of the arc chamber 110.

The repeller 130 is configured to reflect the thermoelectrons emitted by the filament 120, and a plurality of concave grooves 131 may be formed in the repeller 130.

At this time, the concave groove 131 may be formed in a lattice shape.

The surface area of the repeller 130 is increased by forming the concave groove 131 in the repeller 130.

When a compound (for example, WF _n molecules) is deposited on the surface of the repeller 130 according to the use of the ion generating part 100, the compound molecules fill the concave groove 131 of the repeller 130 , The cohesive force of the compound is weakened to minimize the increase in the size of the film (film formed by compound deposition).

Even if the compound film is formed on the repeller 130 according to the use of the ion generating part 100, the increase in thickness and size thereof can be alleviated (the concave groove 131 is formed as compared with the case where the concave groove 131 is not formed) It is possible to increase the use time of the ion generating part 100. (The formation of the film itself can be carried out in a short time inside the arc chamber 110, and a risk of short circuit is increased if a part of the membrane falls off the surface of the repeller 130)

In addition, when the compound film is deposited on the repeller 130 having the concave groove 131, the compound film is more strongly bonded at the concave groove 131, so that some pieces of the compound film are peeled off from the repeller 130 And it is possible to prevent occurrence of a short circuit due to such fragments during use of the ion generating part 100.

In the source head 1 according to the present invention, concave grooves 113 in the same shape as the concave groove 131 described above can be formed on the inner side of the arc chamber 110, .

On the other hand, the arc chamber 110 is provided with an aperture 111, and the aperture 111 forms a wall surface (front wall surface) through which the ions escape. That is, the wall surface of the slit 112 side where the ions are discharged from the arc chamber 110 corresponds to the aperture 111 (see FIGS. 6 and 7).

Particularly in the source head 1 according to the present invention, the aperture 111 includes a liner portion 111d, a body portion 111b and a slit 111b. And each portion is assembled to form an aperture 111. The aperture 111c is an aperture 111c.

The liner portion 111d constitutes the inner surface of the aperture 111 and the body portion 111b forms the outer surface of the aperture 111 (the outer surface of the arc chamber 110) ). The liner portion 111d and the body portion 111b are preferably made of different materials.

The liner portion 111d is formed in the form of a flat plate and the side to which the liner portion 111d is coupled in the body portion 111b is formed in a flat plate shape so as to be in close contact with the liner portion 111d.

The slit portion 111c is a portion constituting the slit 112 of the arc chamber 110. The slit portion 111c is engaged with the body portion 111b in such a manner as to be interposed in the center of the body portion 111b, The liner portion 111d is coupled to the body portion 111b, and the aperture 111 is assembled.

The liner portion 111d (or the liner portion 111d and the slit portion 111c) in the source head 1 according to the present invention may be made of a sintered metal and may be made of tungsten in particular, The durability of the aperture 111 in the arc chamber 110 can be ensured.

On the other hand, the body portion 111b of the aperture 111 can be made of graphite. By making the aperture 111 in this way, the weight of the entire aperture 111 can be reduced and durability can be improved.

The head body 200 is positioned behind the arc chamber 110 and the arc chamber 110 is fixedly coupled to the head body 200.

In the source head 1 according to the present invention, the head body 200 comprises a central body 210, a base plate 220 and a first plate 230, .

The central body 210 is generally formed in a long cylindrical shape along the longitudinal direction.

A gas line 250 and a cooling line 260 are formed in the central body 210 (see FIG. 5)

The gas line 250 has a tubular shape passing through the central body 210 in the longitudinal direction and injects gas into the arc chamber 110 through the gas line 250.

The cooling line 260 is formed in the shape of a long tube along the longitudinal direction of the central body 210. The cooling line 260 is in the form of a double tube and has an inner tube 261 and an outer tube 262 spaced apart from each other, .

The cooling water injected into the cooling line 260 for cooling the source head 1 is moved to the front side of the central body 210 through the outer tube 262, May be made to be returned to the rear of the central body 210 through the inner tube 261, and the cooling water may be introduced and discharged through one line.

In the source head 1 according to the present invention, the source head 1 is provided in which the cooling line 260 is provided inside the central body 210 while being formed in a double pipe shape, thereby simplifying the structure and effectively cooling the source head 1 .

The base plate 220 forms a rear end of the source head 1 and has a diameter expanded from the rear of the central body 210 and can be integrated with the central body 210.

The base plate 220 is formed in a generally flat disc shape, and the center body 210 protrudes forward from the center of the base plate 220. That is, the center of the base plate 220 and the center of the central body 210 are formed on the same line.

The fixed portion 271 of the chamber power supply line 270 is mounted on the base plate 220 and the first and second feedthroughs 280 and 290 are mounted.

The chamber power supply line 270 is a line for supplying power to the arc chamber 110 and includes a conductor for supplying power to the repeller 130 and a conductor for supplying power to the filament 120. This chamber power supply line 270 may include a feed-through 272 in the form of a long rod in the anteroposterior direction, as shown in Fig. 5, and the feed-through 272 is made of a conductor And is electrically separated from the base plate 220.

And the chamber power supply line 270 (the feedthrough 272) on the base plate 220 while the base plate 220 and the chamber power supply line 270 (the feedthrough 272) are electrically insulated from each other. The fixing portion 271 is provided for stable fixing and the fixing portion 271 is made of an insulator and is directly fastened to the base plate 220.

The first feedthrough 280 is connected to the sensing line 330 of the manipulator 300 and mounted on the base plate 220. The sensing line 330 is provided to detect the amount of the ion beam flowing into the manipulator 300 from the ion generator 100 and detect whether the manipulator 300 is aligned or not. 280 and the manipulator 300 are electrically connected to each other.

The first feedthrough 280 includes a first energizing pin 281 made of a conductor, a first rear insulator 282 formed of an insulator and surrounding the back of the first energizing pin 281 and fixedly coupled to the base plate 220, And a first front insulator 283 made of an insulator and surrounding the front side of the first energizing pin 281 and spaced apart from the first back insulator 282.

The front end of the first energizing pin 281 protrudes toward the front of the first front insulator 283 and is coupled to the sensing line 330.

The second feedthrough 290 is connected to the current line 340 of the manipulator 300 and mounted on the base plate 220. The current line 340 is a means provided to supply a current to the manipulator 300 and electrically connects the second feedthrough 290 and the manipulator 300.

The second feedthrough 290 includes a second energizing pin 291 made of a conductor and a second back insulator 292 formed of an insulator and surrounding the rear side of the second energizing pin 291 and fixedly coupled to the base plate 220, And a second front insulator 293 made of an insulator and surrounding the front side of the second energizing fin 291 and spaced apart from the second rear insulator 292.

The front end of the second energizing pin 291 protrudes toward the front of the second front insulator 293 and is coupled to the current line 340.

In the source head 1 according to the present invention, the sensing line 330 and the current line 340 of the manipulator 300 are connected to the base plate 220 constituting the head body 200, And the entire structure of the manipulator 300 can be simplified and all the electrical means on the base plate 220 can be combined to provide a source head 1 that is easy to maintain.

The sensing line 330 and the current line 340 of the manipulator 300 are connected to the first and second feed-throughs 280 and 290 as described above, And the current line 340 can be effectively prevented from being electrically short-circuited with the head main body 200. [

The contamination prevention plate 240 is formed in a shape in which the diameter is expanded between the arc chamber 110 and the base plate 220.

It is preferable that the center of the contamination prevention plate 240 is formed on the same line as the center of the base plate 220 and that the contamination prevention plate 240 is formed as a whole, And the center of the central body 210 are formed on the same line.

The anti-contamination plate 240 may be separate from the central body 210 and coupled to the central body 210.

The diameter of the contamination prevention plate 240 can be made sufficiently large in a range in which it is spaced apart from the inner diameter of the housing 600 to be described later. However, the contamination prevention plate 240 is smaller than the diameter of the head insertion hole 710 of the housing flange 700, which will be described later.

The contamination prevention plate 240 is spaced apart from the arc chamber 110 and is spaced apart from the base plate 220.

The contamination prevention plate 240 is provided to cover the fixed portion 271 of the chamber power supply line 270, the first feed through 280 and the second feed through 290 when viewed from the arc chamber 110 side It is made up to the size that it can be.

The contamination prevention plate 240 is also configured to allow the chamber power supply line 270, the sensing line 330 and the current line 340 of the manipulator 300 to penetrate therethrough, The sensing line 330 and the current line 340 of the manipulator 300. [

The ions generated in the ion generating part 100 move toward the manipulator 300 but a part of the ions can enter the source head 1. In the source head 1 according to the present invention, The contamination prevention plate 240 is provided on the front side so that the ions can be effectively deposited on the source head 1 to cause a short circuit or contamination. Particularly, the outer diameter of the contamination prevention plate 240 is close to the inner diameter of the housing 600 (the outer diameter of the contamination prevention plate 240 is slightly smaller than the inner diameter of the housing 600) .

In addition, as described above, various lines (conductors) to which electrical connection is made are coupled on the base plate 220. The anti-contamination plate 240 according to the present invention is mounted on the fixed portion 271 The first feed-through 280 and the second feed-through 290 can be shielded, so that the ions entering the base plate 220 can be effectively blocked, and the lifetime of the source head 1 can be increased .

The first plate 230 is formed such that the diameter of the first plate 230 is expanded at the front end of the central body 210.

It is preferable that the first plate 230 is formed as an entirely flat disc shape and the center of the first plate 230 is formed on the same line at the center of the center body 210.

The diameter of the first plate 230 can be made sufficiently large in a range in which the first plate 230 is spaced apart from the inner diameter of the housing 600, which will be described later. However, the first plate 230 is smaller than the diameter of the head insertion hole 710 of the housing flange 700, which will be described later.

The ion generating part 100 is coupled to the upper surface of the first plate 230 and a pair of hook assemblies 500 are provided for coupling the ion generating part 100 (see FIG. 6).

One of the hook assemblies 500 fixes one end of the ion generating part 100 and the other hook assembly 500 fixes the other end of the ion generating part 100. The hook assembly 500 fixes the arc chamber 110 of the ion generator 100 on the first plate 230 and the hook assembly 500 according to the present invention, The ion generating part 100 (particularly, the arc chamber 110) can be maintained in a fixed state even if deformation occurs.

To this end, the hook assembly 500 according to the present invention includes a hook 510, a first washer 520, a hook spring 530, and a second washer 540.

The hook 510 is formed in a substantially U shape and surrounds the front portion of the ion generating portion 100 (the arc chamber 110) and has an end projecting behind the first plate 230.

Particularly, the hook 510 is fixed to a portion of the aperture 111 of the ion generating part 100, and a hook 510 (not shown) is formed on the upper surface of the aperture 111 for stable coupling between the hook 510 and the aperture 111. [ Is inserted into the groove.

The first washer 520 is provided in a pair and is fixedly coupled to both ends of the hook 510. The first washer 520 is preferably made of a ceramic insulator in consideration of heat transfer.

The first washer 520 is positioned behind the first plate 230 and spaced apart from the first plate 230 with the hook assembly 500 coupled to the source head 1.

The second washer 540 is also provided in a pair and is engaged with the hook 510 in such a manner as to be spaced apart from the first washer 520 and fit in the hook 510. The second washer 540 is coupled in a movable form along the longitudinal direction of the hook 510. The second washer 540 is preferably made of a ceramic insulator in consideration of heat transfer.

The second washer 540 is positioned behind the first plate 230 and is in close contact with the first plate 230 with the hook assembly 500 coupled to the source head 1. That is, the second washer 540 is in close contact with the back surface of the first plate 230.

The hook springs 530 are also provided as a pair and interposed between the first washer 520 and the second washer 540.

The hook spring 530 may be in the form of a conventional coil spring and may be compressed sufficiently to allow the hook assembly 500 to be stably fixed in the state of being coupled to the source head 1 Thereby forming the hook assembly 500. [ The hook spring 530 is preferably made of a heat resistant spring in consideration of thermal deformation due to high temperature.

In the source head 1 according to the present invention, since the hook assembly 500 is provided for fixing the ion generating part 100, it is easy to assemble the ion generating part 100, . In other words, when the source head 1 is used, a considerably high temperature is generated. The hook assembly 500 according to the present invention is excellent in heat transfer and resistant to thermal deformation, And the second washer 540 is strongly adhered to the back surface of the first plate 230, so that the ion generating part 100 is stably fixed.

The manipulator 300 extracts ions generated in the ion generator 100 using a potential difference. In the source head 1 according to the present invention, the manipulator 300 performs the same operation as a conventional manipulator .

However, the manipulator 300 according to the present invention differs from the conventional case in that it is directly coupled with the source head 1 and a single slot 320 is provided.

The manipulator 300 is provided with a second plate 310 and the second plate 310 is formed as a rear end face of the manipulator 300,

When the manipulator 300 is coupled to the head body 200, the second plate 310 is parallel to the first plate 230. At this time, the center of the second plate 310 is aligned with the center of the central body 210 and the center of the first plate 230.

The diameter of the second plate 310 may be sufficiently large in a range in which the second plate 310 is spaced apart from the inner diameter of the housing 600, which will be described later. However, the second plate 310 is smaller than the diameter of the head insertion hole 710 of the housing flange 700, which will be described later.

When the manipulator 300 is coupled to the head body 200, the second plate 310 is spaced apart from the first plate 230 as well as the aperture 111 of the ion generating part 100. At this time, the single slot 320 of the manipulator 300 is arranged so as to be aligned with the slit 112 formed in the aperture 111 of the ion generating section 100.

In this state, the fixed bar assembly 400 is used for the fixed connection between the manipulator 300 and the head body 200 (see FIGS. 4 and 5).

In the source head 1 according to the present invention, the stationary bar assembly 400 may be divided into a first stationary bar assembly 410 and a second stationary bar assembly 420.

The first fixing bar assembly 410 may include a central insulator 411, a rear cover 412, and a front cover 413.

The central insulator 411 is made of ceramic for insulation between the manipulator 300 and the head body 200.

The rear cover 412 is in the form of a container opened forward, and can be formed in a cylindrical shape, and a central insulator 411 is inserted into the rear cover 412. The length of the rear cover 412 is shorter than the length of the central insulator 411 so that the front side of the central insulator 411 is exposed to the outside in a state where only the rear cover 412 is coupled to the central insulator 411 do.

The rear cover 412 is preferably made of a metal having a high melting point for protecting the central insulator 411, and is preferably made of molybdenum.

The rear end of the rear cover 412 is fixedly coupled to the head body 200 and is fixedly coupled to the front side of the first plate 230.

The front cover 413 is in the form of a container opened rearward, and may be formed in a cylindrical shape, and a central insulator 411 is inserted into the front cover 413. The length of the front cover 413 is shorter than the length of the central insulator 411 so that the back of the central insulator 411 is exposed to the outside in a state where only the front cover 413 is coupled to the central insulator 411 do.

The front cover 413 is spaced apart from the rear cover 412 such that one of the rear cover 412 and the front cover 413 surrounds at least a part of the other. For example, the front cover 413 may be made larger in diameter than the rear cover 412, and the rear end of the front cover 413 may surround the front end of the rear cover 412.

The front cover 413 is preferably made of a metal having a high melting point for protecting the central insulator 411, and is preferably made of molybdenum.

The front end of the front cover 413 is fixedly coupled to the manipulator 300 side, and particularly to the rear side of the second plate 310.

The second stationary bar assembly 420 may include a stationary bar 421 and an insulation block 422.

The fixing bar 421 is electrically connected to the sensing line 330 and is preferably made of graphite. The front end of the fixing bar 421 is fixedly coupled to the manipulator 300 side and is fixedly coupled to the rear side of the second plate 310.

The insulating block 422 is made of an insulator and bonds the fixing bar 421 and the head body 200 to each other at the rear side of the first plate 230.

In the source head 1 according to the present invention, the manipulator 300 is fixedly coupled to the source head 1 by the first fixing bar assembly 410 and the second fixing bar assembly 420, And it is not necessary to form a separate assembly for fixing the manipulator 300, so that the parts can be simplified and the total weight can be reduced.

Further, in the present invention, the structure can be further simplified by using the fixing bar 421 constituting the sensing line 330 of the manipulator 300 as the fixing means of the manipulator 300.

The housing 600 has a cylindrical shape and surrounds the arc chamber 110 and the head body 200 when the source head 1 is assembled. The housing 600 is used to prevent or mitigate ions from sticking to the surface of the source head 1 and to prevent contamination, or since the housing 600 can not completely seal the surface of the source head 1 , It is difficult to completely block the inflow of ions into the housing 600.

In the source head 1 according to the present invention, however, even if ions are introduced into the housing 600, contamination of the source head 1 by ions is prevented as much as possible. And a pollution control tuck 610 are provided.

The edges of the contamination prevention plate 240, the first plate 230 and the second plate 310 are spaced apart from the inner circumferential surface of the housing 600 in the housing 600 when the source head 1 is assembled, The distance between the plate 240 and the housing 600 is constant along the circumferential direction.

The distance between the first plate 230 and the housing 600 is also constant along the circumferential direction and the distance between the second plate 310 and the housing 600 is also constant along the circumferential direction.

In the source head 1 according to the present invention, the above-mentioned pollution control tuck 610 is formed on the inner circumferential surface of the housing 600.

The pollution control tucks 610 protrude inward from the inner circumferential surface of the housing 600 and the pollution control tucks 610 protrude with a certain size and a protrusion height in the entire circumferential direction, The inner diameter of the housing 600 is smaller than the inner diameter of the other portion of the housing 600.

The contamination preventing plate 610 is positioned immediately in front of the contamination preventing plate 240 and the inner diameter of the contamination preventing plate 610 is smaller than the outer diameter of the contamination preventing plate 240. [

As a result, the ions introduced into the interior of the housing 600 from the front side of the housing 600 move backward along the inner surface of the housing 600, and a considerable portion of the ions move to the rear side of the housing 600 It can be effectively blocked.

Even when there is ions moving beyond the pollution control pin 610 and moving toward the back of the housing 600, the pollution control plate 240 is made to have an outer diameter larger than the inner diameter of the pollution control pin 610, Prevention plate 240, and most of the ions can be adhered to the front surface of the contamination-preventing plate 240. [0053]

In the source head 1 according to the present invention, the housing 600 itself is not coupled to the head body 200 of the source head 1 but is coupled to the head body 200 through the housing flange 700 do. That is, the housing 600 is coupled to the housing flange 700 and the housing flange 700 is coupled to the head body 200 (particularly, coupled to the base plate 220).

The housing flange 700 is generally formed in a donut shape, but in a generally flat plate shape.

The center of the housing flange 700 is provided with a head insertion hole 710 penetrating in the forward and backward direction and is formed in the front of the head insertion hole 710 to correspond to the outer diameter of the housing 600 (Equal to or slightly larger than the outer diameter of the base plate 220) of the base plate 220 at the rear of the head insertion hole 710. The inner diameter of the housing receiving portion 720 And a base mounting portion 730 having a base mounting portion 730.

The diameter of the head insertion hole 710 is smaller than the outer diameter of the housing 600 and the outer diameter of the base plate 220.

First, the coupling between the housing 600 and the housing flange 700 will be described.

A fixed section 721 is provided for coupling the housing 600 and the housing flange 700. The fixed section 721 is coupled to the housing flange 700 and can be separated from the housing flange 700. One end of the fixed section 721 is connected to the housing 600 (not shown) of the outer side surface.

The stationary piece 721 can be coupled to the housing flange 700 through the bolt 722 in a state where the rear end of the housing 600 is seated on the housing seating portion 720 of the housing flange 700, A part of the outer surface of the housing 600 is engaged with the fixed piece 721, thereby coupling the housing flange 700 and the housing 600 together.

The fixed slice 721 and the bolt 722 may be provided along the circumferential direction of the housing 600. The fixed slice 721 and the bolt 722 are preferably arranged at regular intervals .

According to the present invention, since the housing 600 is detachably coupled to the housing flange 700, only the portion of the housing 600 can be easily separated from the source head 1, .

Next, the coupling between the housing flange 700 and the head body 200 (particularly, the base plate 220) will be described.

The head body 200 passes through the head insertion hole 710 while moving forward from the rear side of the housing flange 700 and the front edge of the base plate 220 is brought into close contact with the rear end of the base seating portion 730.

In this state, coupling between the housing flange 700 and the base plate 220 can be achieved through the clamping assembly 740 (see Figure 8).

Specifically, the clamping assembly 740 may comprise a base pin 741, a slider 742, a finger fence 743, and a base spring 744.

The base pin 741 is fixedly coupled to the rear surface of the housing flange 700 from the outside of the head insertion hole 710 and is elongated in the front-rear direction. The base end of the base pin 741 is formed to have a larger diameter than the rear end of the base pin 741, and the base spring 744 and the slider 742 are not engaged with the base end of the base pin 744.

The base spring 744 is configured to resiliently support the slider 742 backward relative to the base pin 741. The base spring 744 is shaped like a conventional coil spring and is inserted into the base pin 741 Can be. The base spring 744 is interposed between the base pin 741 and the slider 742 in a compressed state to store the elastic force.

The slider 742 is configured to surround the base pin 741 and the base spring 744 and is configured to reciprocate along the longitudinal direction (front-rear direction) of the base pin 741. The slider 742 has a space in which the base spring 744 is inserted and the base spring 744 is further compressed as the slider 742 moves backward with respect to the base pin 741, Thereby storing a stronger elastic force.

The fingering protrusion 743 is fixedly coupled to the slider 742 or integral with the slider 742 and protrudes toward the head insertion hole 710. The fingering protrusion 743 is in contact with the rear surface of the base plate 220 .

The base plate 220 can be brought into close contact with the base seating portion 730 while the slider 742 and the finger fingers 743 sufficiently move to the back of the base pin 741 while compressing the base spring 744 In this state, the slider 742 and the finger fingers 743 can be advanced to fix the base plate 220.

The clamping assemblies 740 may be provided along the circumferential direction of the housing flange 700, and each clamping assembly 740 may be arranged at regular intervals.

The housing flange 700 and the housing 600 can be easily coupled to the head body 200 and the coupling and detachment of the housing 600 can be facilitated by the provision of the clamping assembly 740, .

As described above, according to the source head 1 of the present invention, since the manipulator 300 is integrally fixed to the source head 1, the structure for mounting and connecting the manipulator 300 can be simplified, It is possible to provide the source head 1 having the slots 320 of the manipulator 300 as one so as to facilitate the alignment of the manipulator 300 for passing the ion beam.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It is obvious to those who have. Accordingly, it should be understood that such modifications or alterations should not be understood individually from the technical spirit and viewpoint of the present invention, and that modified embodiments fall within the scope of the claims of the present invention.

1: source head 100: ion generator
110: arc chamber 111: aperture
112: slit 120: filament
130: Repeller 131: Concave groove
140: cathode 150: clamping bar
151: first insertion hole 160: fixing screw
161: second insertion hole 170: fixing nut
200: head body 210: central body
220: base plate 230: first plate
240: Pollution prevention plate 250: Gas line
260: Cooling line 261: Inner tube
262: outer tube 270: chamber power supply line
271: Fixing portion 272: Feedthrough
280: first feedthrough 281: first energizing pin
282: first rear insulator 283: first front insulator
290: second feedthrough 291: second energizing pin
292: second rear insulator 293: second front insulator
300: Manipulator 310: Second plate
320: Slot
400: stationary bar assembly 410: first stationary bar assembly
411: central insulator 412: rear cover
413: front cover 420: second fixing bar assembly
421: Fixing bar 422: Insulation block
500: Hook assembly 510: Hook
520: first washer 530: hook spring
540: Second washer
600: housing 610:
700: housing flange 710: head insertion hole
720: Housing seating part 730: Base seating part
740: clamping assembly 741: base pin
742: Slider 743:
744: Base spring

Claims

An ion implantation apparatus used for implanting impurities into a wafer during a semiconductor process,
An arc chamber forming a space in which ions collide with a hot electron;
A head body located behind the arc chamber and to which the arc chamber is fixedly coupled;
A housing having a cylindrical shape and surrounding the arc chamber and the head body; And
And a housing flange separated from and coupled to a rear end of the housing and having a head insertion hole at the center thereof and inserted into the head body and fixedly coupled to the head body,
Wherein the head body includes a base plate whose diameter is expanded at a rear end thereof,
Wherein the housing flange is provided with a base seating portion having an inner diameter corresponding to an outer diameter of the base plate at a rear side of the head insertion hole,
And a clamping assembly for securing the base plate with the base plate seated in the base seating part.

The method according to claim 1,
Wherein the housing flange is provided with a housing seating portion having an inner diameter corresponding to an outer diameter of a rear end of the housing in front of the head insertion hole,
And a stationary piece which is detachably coupled to the housing flange and fixes the housing in a state where a rear end of the housing is seated in the housing seating part.

delete

The method according to claim 1,
The clamping assembly comprises:
A base pin fixedly coupled to a rear surface of the housing flange and elongated in a front-rear direction;
A slider coupled to the base pin and reciprocating in a forward and backward direction;
A base spring for elastically supporting the slider backward against the base pin; And
And a finger portion which is fixed to the slider and moves together with the slider, and protrudes toward the head insertion hole, and one end of which is in close contact with the back surface of the base plate.

The method according to claim 1,
Wherein the inner surface of the housing is protruded inwardly, and a contamination preventing jaw protruding at a constant height in the entire circumferential direction is provided.

6. The method of claim 5,
The head body includes:
A base plate having a diameter enlarged at a rear end thereof; And
And a contamination prevention plate disposed between the arc chamber and the base plate and having a diameter enlarged,
Wherein an inner diameter of the contamination preventing chuck is smaller than a diameter of the contamination preventing plate.

The method according to claim 6,
And the contamination prevention plate is located behind the contamination prevention trough.